TWM654945U - Chemical separation and purification equipment - Google Patents

Chemical separation and purification equipment Download PDF

Info

Publication number
TWM654945U
TWM654945U TW112213234U TW112213234U TWM654945U TW M654945 U TWM654945 U TW M654945U TW 112213234 U TW112213234 U TW 112213234U TW 112213234 U TW112213234 U TW 112213234U TW M654945 U TWM654945 U TW M654945U
Authority
TW
Taiwan
Prior art keywords
distillation tower
purification device
packing
chemical separation
condenser
Prior art date
Application number
TW112213234U
Other languages
Chinese (zh)
Inventor
王嘉淳
廖振宇
陳俊良
拉傑 庫馬爾 席伐拉
Original Assignee
富宸材料國際股份有限公司
Filing date
Publication date
Application filed by 富宸材料國際股份有限公司 filed Critical 富宸材料國際股份有限公司
Publication of TWM654945U publication Critical patent/TWM654945U/en

Links

Images

Abstract

本創作提供一種化學品分離純化裝置,其包含一蒸餾塔、一進料管線、一加熱器、一冷凝器以及一收集槽,其中,該進料管線與該蒸餾塔的底部連接,該加熱器與該蒸餾塔的底部連接,該冷凝器的一端與該蒸餾塔的頂部連接,該冷凝器的另一端與該收集槽連接,其中,該蒸餾塔包含一填料部與一塔板部,且該填料部與該塔板部沿縱向排列設置於該蒸餾塔中。本創作提供之化學品分離純化裝置具有減少佔地面積以及減少能源消耗的功效。The invention provides a chemical separation and purification device, which includes a distillation tower, a feed pipeline, a heater, a condenser and a collection tank, wherein the feed pipeline is connected to the bottom of the distillation tower, the heater is connected to the bottom of the distillation tower, one end of the condenser is connected to the top of the distillation tower, and the other end of the condenser is connected to the collection tank, wherein the distillation tower includes a packing part and a tray part, and the packing part and the tray part are arranged in the distillation tower in a longitudinal direction. The chemical separation and purification device provided by the invention has the effect of reducing the occupied area and reducing energy consumption.

Description

化學品分離純化裝置Chemical separation and purification equipment

本創作係關於一種化學品分離純化裝置,尤指一種蒸餾塔相關的化學品分離純化裝置。This work is about a chemical separation and purification device, especially a chemical separation and purification device related to a distillation column.

近年來,半導體科技業的發展蓬勃,半導體產業不停追求生產出更小、更節能、擁有更佳穩定性與可靠性的電子產品。然而,由於半導體元件極其敏感,即使微小的雜質都可能對其性能產生不良的影響。在半導體繁複的製程中,仰賴各種高純度的化學品以控制雜質的含量,確保產生的半導體成品擁有良好的性能。舉凡製程中用來注入設備的氣體、用來沉積晶圓的材料、清洗晶圓表面髒汙的潔淨品、晶圓加工進行黃光蝕刻等的試劑都需要高純度的化學品參與其中。因此半導體化學品的純化技術在半導體製程良率的控制中扮演著至關重要的腳色。In recent years, the semiconductor technology industry has been booming, and the semiconductor industry has been constantly pursuing the production of smaller, more energy-efficient, and more stable and reliable electronic products. However, since semiconductor components are extremely sensitive, even tiny impurities may have an adverse effect on their performance. In the complex semiconductor manufacturing process, various high-purity chemicals are relied on to control the content of impurities to ensure that the semiconductor products produced have good performance. For example, the gases used to inject equipment in the process, the materials used to deposit wafers, the cleaning products for cleaning the surface dirt of wafers, and the reagents for yellow light etching during wafer processing all require the participation of high-purity chemicals. Therefore, the purification technology of semiconductor chemicals plays a vital role in the control of the yield of semiconductor manufacturing processes.

在半導體化學品的純化技術中,蒸餾是一種常見的純化方式,相較於其他純化方法如離子交換、過濾、溶液結晶、氣相清潔、化學吸附等,其最大的優點有二,一為透過蒸餾所純化的化學品能夠實現極高的純度,往往高達4N(即99.99%)或5N(即99.999%),二為蒸餾可透過多次循環的重複動作來進一步提高化學品的純度,蒸餾的可重複性有助於確保每批產品擁有高一致性的純度。Distillation is a common purification method in semiconductor chemical purification technology. Compared with other purification methods such as ion exchange, filtration, solution crystallization, gas phase cleaning, chemical adsorption, etc., it has two biggest advantages. First, the chemicals purified by distillation can achieve extremely high purity, often as high as 4N (i.e. 99.99%) or 5N (i.e. 99.999%). Second, distillation can further improve the purity of chemicals through repeated actions in multiple cycles. The repeatability of distillation helps to ensure that each batch of products has a highly consistent purity.

然而,透過蒸餾進行半導體化學品純化的技術也存在一些缺陷。例如,廠區地坪有限且昂貴,倘若需要橫向串接板式塔、填料塔和其他設備單元才得以組裝成一化學品分離純化裝置,將大幅提高整體分離純化裝置所需的佔地面積;再者,蒸餾塔本身亟需高壓以及高溫的操作環境,亦會導致高能源消耗的製作成本。因此,目前實有必要進一步研究如何降低化學品分離純化裝置的佔地面積以及減少能源消耗,以期為半導體發展提供更為精簡及效率的生產方式。However, the technology of purifying semiconductor chemicals by distillation also has some drawbacks. For example, the floor space of the factory is limited and expensive. If plate towers, packed towers and other equipment units need to be connected in series horizontally to assemble a chemical separation and purification device, the floor space required for the entire separation and purification device will be greatly increased; furthermore, the distillation tower itself urgently requires a high-pressure and high-temperature operating environment, which will also lead to high energy consumption and manufacturing costs. Therefore, it is necessary to further study how to reduce the floor space occupied by chemical separation and purification equipment and reduce energy consumption, in order to provide a more streamlined and efficient production method for semiconductor development.

有鑑於上述先前技術中存在的問題,本創作之目的在於提供一種化學品分離純化裝置,其具有佔地面積小以及低能源消耗的效果。In view of the problems existing in the above-mentioned prior art, the purpose of the present invention is to provide a chemical separation and purification device, which has the effects of small footprint and low energy consumption.

為達成前述目的,本創作提供其包含一蒸餾塔、一進料管線、一加熱器、一冷凝器以及一收集槽,該進料管線與該蒸餾塔的底部連接,該加熱器與該蒸餾塔的底部連接,該冷凝器的一端與該蒸餾塔的頂部連接,該冷凝器的另一端與該收集槽連接,其中,該蒸餾塔包含一填料部與一塔板部,且該填料部與該塔板部沿縱向排列設置於該蒸餾塔中。To achieve the aforementioned purpose, the present invention provides a distillation tower, a feed pipeline, a heater, a condenser and a collecting tank, wherein the feed pipeline is connected to the bottom of the distillation tower, the heater is connected to the bottom of the distillation tower, one end of the condenser is connected to the top of the distillation tower, and the other end of the condenser is connected to the collecting tank, wherein the distillation tower comprises a packing portion and a plate portion, and the packing portion and the plate portion are arranged in the distillation tower along the vertical direction.

藉由整合所述填料部與所述塔板部並使其等沿縱向排列的技術手段,本創作之化學品分離純化裝置不僅可以降低佔地面積、減少設備成本,更能精簡運用能源,達到減少能源消耗的功效。By integrating the packing part and the tray part and arranging them in the longitudinal direction, the chemical separation and purification device of the present invention can not only reduce the floor space occupied and reduce the equipment cost, but also streamline the use of energy, thereby achieving the effect of reducing energy consumption.

在本創作的其中一實施例中,該填料部位於該塔板部上方,所述蒸餾塔還包含一支承板,該支承板位於所述塔板部與所述填料部之間,用於支撐該填料部的重量,避免該填料部掉落。具體而言,該支承板可為一薄膜或一多孔合金板,但並非僅限於此。In one embodiment of the present invention, the packing part is located above the plate part, and the distillation tower further comprises a support plate, which is located between the plate part and the packing part and is used to support the weight of the packing part to prevent the packing part from falling. Specifically, the support plate can be a film or a porous alloy plate, but is not limited thereto.

在本創作的另一實施例中,該塔板部位於該填料部上方,所述蒸餾塔還包含一支承板,該支承板位於該塔板部與該填料部之間,用於固定該填料部,避免該填料部因所述蒸餾塔內的蒸氣或抽氣等推動力而浮動。具體而言,該支承板可為所述薄膜或所述多孔合金板,但並非僅限於此。In another embodiment of the present invention, the tray portion is located above the packing portion, and the distillation tower further comprises a support plate, which is located between the tray portion and the packing portion and is used to fix the packing portion to prevent the packing portion from floating due to the driving force of steam or exhaust gas in the distillation tower. Specifically, the support plate can be the film or the porous alloy plate, but is not limited thereto.

依據本創作,由於所述支承板的設置可用於固定所述填料部內的填料,使其不致掉落、或因所述蒸餾塔內的各種推動力而浮動,因此,所述支承板上的孔洞大小小於該填料的粒徑大小。具體而言,所述支承板的孔洞直徑可介於1.0毫米至7.0毫米之間。According to the invention, since the support plate is provided to fix the filler in the filler part so that it does not fall or float due to various thrusts in the distillation tower, the size of the holes on the support plate is smaller than the particle size of the filler. Specifically, the diameter of the holes on the support plate can be between 1.0 mm and 7.0 mm.

依據本創作,該蒸餾塔可包含一個或多個填料部,所述多個填料部之間可設置有至少一個塔板部或至少一個支承板,使得多個填料部之間彼此不相鄰;該蒸餾塔可包含一個或多個塔板部,所述多個塔板部之間可設置有至少一個填料部或至少一個支承板,使得多個塔板部之間彼此不相鄰。According to the present invention, the distillation tower may include one or more packing sections, and at least one tower plate section or at least one support plate may be arranged between the multiple packing sections, so that the multiple packing sections are not adjacent to each other; the distillation tower may include one or more tower plate sections, and at least one tower plate section or at least one support plate may be arranged between the multiple tower plate sections, so that the multiple tower plate sections are not adjacent to each other.

一般而言,本創作之化學品分離純化裝置由於所述加熱器以及所述蒸餾塔內產生的大量蒸氣,會自發性的進行分離與純化的反應。如欲加快反應速度,於本創作的一實施例中,該化學品分離純化裝置還包含一抽氣系統,該抽氣系統係設置於所述蒸餾塔的頂部,以提升所述蒸餾塔塔內流體的推動力。具體而言,該抽氣系統可為一真空幫浦、一加壓幫浦或其組合,但並非僅限於此。Generally speaking, the chemical separation and purification device of the present invention will spontaneously undergo separation and purification reactions due to the large amount of steam generated in the heater and the distillation tower. To speed up the reaction, in one embodiment of the present invention, the chemical separation and purification device further includes an exhaust system, which is disposed at the top of the distillation tower to increase the driving force of the fluid in the distillation tower. Specifically, the exhaust system can be a vacuum pump, a pressure pump or a combination thereof, but is not limited thereto.

依據本創作,本創作之化學品分離純化裝置還可包含一回流管線,所述回流管線接枝於該冷凝器以及該收集槽之間,並分支為一第一回流管線與一第二回流管線,該第一回流管線與該塔板部的頂部連接,該第二回流管線與該填料部的頂部連接,分別將冷凝後的化學品重新導入該塔板部與該填料部蒸餾,以提升化學品的純度。According to the present invention, the chemical separation and purification device of the present invention may also include a reflux line, which is grafted between the condenser and the collection tank and branched into a first reflux line and a second reflux line. The first reflux line is connected to the top of the tower plate section, and the second reflux line is connected to the top of the packing section, so as to reintroduce the condensed chemicals into the tower plate section and the packing section for distillation, respectively, to improve the purity of the chemicals.

依據本創作,本創作之化學品分離純化裝置還可包含一進氣管,所述進氣管係設置於所述蒸餾塔的頂部。在純化分離前,透過所述進氣管將惰性氣體通入所述蒸餾塔中,使得所述蒸餾塔內的氣體主要以惰性氣體為主,避免空氣中的水氣、氧氣等雜質與化學品作用或混合,影響化學品的純度。舉例而言,該惰性氣體可為氮氣、氬氣或其組合,但並非僅限於此。According to the present invention, the chemical separation and purification device of the present invention may further include an air inlet pipe, which is disposed at the top of the distillation tower. Before purification and separation, an inert gas is introduced into the distillation tower through the air inlet pipe, so that the gas in the distillation tower is mainly inert gas, to prevent impurities such as water vapor and oxygen in the air from reacting or mixing with chemicals and affecting the purity of the chemicals. For example, the inert gas may be nitrogen, argon or a combination thereof, but is not limited thereto.

較佳的,所述蒸餾塔內還包含一第一溫度感測器以及一第二溫度感測器。具體而言,所述第一溫度感測器設置於該塔板部上,用於感測該塔板部的溫度,所述第二溫度感測器設置於該填料部上,用於感測該填料部的溫度。更佳的,所述加熱器還包含一溫度控制器,該溫度控制器係連接所述加熱器,用於接受該第一溫度感測器與該第二溫度感測器所量測的溫度,調節所述加熱器的加熱溫度。Preferably, the distillation tower further comprises a first temperature sensor and a second temperature sensor. Specifically, the first temperature sensor is disposed on the tray portion to sense the temperature of the tray portion, and the second temperature sensor is disposed on the packing portion to sense the temperature of the packing portion. More preferably, the heater further comprises a temperature controller, which is connected to the heater and is used to receive the temperatures measured by the first temperature sensor and the second temperature sensor to adjust the heating temperature of the heater.

依據本創作,本創作之化學品分離純化裝置可用於分離及純化半導體製程中各種化學品。舉例而言,包含沉積、蝕刻、表面清洗技術、摻雜半導體、黃光,或其他半導體製程所使用的化學品。由於這些化學品多半具有腐蝕性,較佳的,本創作之化學品分離純化裝置中的材質為合金。具體而言,所述合金可為哈氏 (Hastelloy) 合金、蒙乃爾(Monel) 合金、不鏽鋼或其組合,但並非僅限於此。According to the present invention, the chemical separation and purification device of the present invention can be used to separate and purify various chemicals in semiconductor manufacturing processes. For example, it includes chemicals used in deposition, etching, surface cleaning technology, doped semiconductors, yellow light, or other semiconductor processes. Since most of these chemicals are corrosive, it is preferred that the material in the chemical separation and purification device of the present invention is an alloy. Specifically, the alloy can be Hastelloy alloy, Monel alloy, stainless steel or a combination thereof, but is not limited thereto.

於所述沉積製程中,本創作之化學品分離純化裝置用於純化的化學品包含乙炔 (acetylene)、氨 (ammonia)、硫化羰 (carbonyl sulfide)、氨-D3 (deuterated ammonia)、甲矽烷-D4 (deuterated silane)、二氯矽烷 (dichlorosilane)、乙矽烷(disilane)、四氯化鍺 (germanium tetrachloride)、鍺烷 (germane)、六氯矽已烷(hexachlorodisilane,HCDS)、硫化氫 (hydrogen sulfide)、甲烷 (methane) 、一氧化氮(nitric oxide)、一氧化二氮 (nitrous oxide)、氧 (oxygen)、丙烯 (propylene)、甲矽烷 (silane)、二氧化硫 (sulfur dioxide)、三氯矽烷 (trichlorosilane)、三乙基鋁 (triethylaluminum,TEA)、三甲基鋁 (trimethylaluminum、TMA)、三甲基氯矽烷 (trimethylsilane,3MS)或六氟化鎢 (tungsten hexafluoride),但並非僅限於此。較佳的,本創作之分離純化裝置用於純化的沉積化學品為六氯矽已烷(hexachlorodisilane,HCDS)或一氧化氮(nitric oxide)。In the deposition process, the chemical separation and purification device of the invention is used to purify chemicals including acetylene, ammonia, carbonyl sulfide, deuterated ammonia, deuterated silane, dichlorosilane, disilane, germanium tetrachloride, germane, hexachlorodisilane (HCDS), hydrogen sulfide, methane, nitric oxide, nitrous oxide, oxygen, propylene, silane, sulfur dioxide, trichlorosilane, triethylaluminum (TEA), trimethylaluminum (trimethylaluminum, TMA), trimethylsilane (trimethylsilane, 3MS) or tungsten hexafluoride (tungsten hexafluoride), but not limited thereto. Preferably, the separation and purification device of the present invention is used to purify the deposited chemical hexachlorosilane (hexachlorodisilane, HCDS) or nitric oxide (nitric oxide).

於所述蝕刻製程與表面清洗技術中,本創作之化學品分離純化裝置用於純化的化學品包含三氯化硼 (boron trichloride)、一氧化碳 (carbon monoxide)、二氧化碳 (carbon dioxide)、氯 (chlorine)、三氟化氯 (chlorine trifluoride)、四氟化碳 (tetrafluoromethane)、六氟乙烷 (hexafluoroethane)、八氟丙烷 (octafluoropropane)、六氟-1,3-丁二烯 (hexafluoro-1,3-butadiene)、八氟環丁烷 (octafluorocyclobutane)、八氟環戊烯 (octafluorocyclopentene)、二氟甲烷 (difluoromethane)、三氟甲烷 (trifluoromethane)、氟甲烷 (fluoromethane)、溴化氫 (hydrogen bromide)、氟 (fluorine)、氮 (nitrogen)、氯化氫 (hydrogen chloride)、氫氟酸 (hydrogen fluoride)、三氟化氮 (nitrogen fluoride)、五氟乙烷 (pentafluoroethane)、四氟化矽 (silicon tetrafluoride)、六氟化硫 (sulphur hexafluoride)或二氟化氙 (xenon difluoride),但並非僅限於此。較佳的,本創作之分離純化裝置用於純化的蝕刻化學品與表面清洗技術化學品為三氯化硼(boron trichloride)、六氟-1,3-丁二烯 (hexafluoro-1,3-butadiene)或溴化氫 (hydrogen bromide)。In the etching process and surface cleaning technology, the chemical separation and purification device of the invention is used to purify chemicals including boron trichloride, carbon monoxide, carbon dioxide, chlorine, chlorine trifluoride, tetrafluoromethane, hexafluoroethane, octafluoropropane, hexafluoro-1,3-butadiene, octafluorocyclobutane, octafluorocyclopentene, difluoromethane, trifluoromethane, fluoromethane, hydrogen bromide, fluorine, nitrogen, hydrogen chloride, hydrogen fluoride, nitrogen trifluoride, fluoride), pentafluoroethane, silicon tetrafluoride, sulphur hexafluoride or xenon difluoride, but not limited thereto. Preferably, the etching chemicals and surface cleaning technology chemicals used for purification by the separation and purification device of the present invention are boron trichloride, hexafluoro-1,3-butadiene or hydrogen bromide.

於所述摻雜製程中,本創作之化學品分離純化裝置用於純化的化學品包含氟化鍺 (germanium tetrafluoride)、砷化氫 (arsine)、三氟化硼 (boron trifluoride)、三氟化硼-11 (boron-11 trifluoride)、二乙基鋅 (diethylzinc)、乙硼烷 (diborane)、乙硼-11-烷 (diborane-11)、氫化鍺 (germane)、磷化氫 (phosphine)、硼酸三甲酯 (trimethyl-boron),但並非僅限於此。較佳的,本創作之分離純化裝置用於純化的摻雜化學品為氟化鍺 (germanium tetrafluoride)。In the doping process, the chemical separation and purification device of the present invention is used to purify chemicals including germanium tetrafluoride, arsine, boron trifluoride, boron-11 trifluoride, diethylzinc, diborane, diborane-11, germanium hydride, phosphine, trimethyl-boron, but is not limited thereto. Preferably, the doping chemical used to be purified by the separation and purification device of the present invention is germanium tetrafluoride.

於所述黃光製程與其他半導體相關製程中,本創作之化學品分離純化裝置用於純化的化學品包含氬、氟與氖的混合氣體,氪、氟與氖的混合氣體,氬、氙與氖的混合氣體,氪與氖的混合氣體,氖、氯化氫、與氫的混合氣體、氖、氙,氬、氘、氦、氫或氮,但並非僅限於此。In the above-mentioned yellow light process and other semiconductor-related processes, the chemical separation and purification device of the present invention is used to purify chemicals including a mixed gas of argon, fluorine and neon, a mixed gas of krypton, fluorine and neon, a mixed gas of argon, xenon and neon, a mixed gas of krypton and neon, a mixed gas of neon, hydrogen chloride, and hydrogen, neon, xenon, argon, deuterium, helium, hydrogen or nitrogen, but is not limited to these.

此外,為了易於說明,本說明書可能使用例如「位於…的頂部」、「位於…的底部」、「位於…之間」、「連接」、等空間相對性用語來闡述所示一個元件或特徵與另一(其他)元件或特徵的關係。空間相對性用語旨在囊括除圖中所繪示的方向外,裝置在使用或操作中的不同定向。設備可另外定向(旋轉90度或處於其他定向),且本文中所使用的空間相對性描述可同樣相應地進行解釋。Additionally, for ease of explanation, this specification may use spatially relative terms such as "located on top of," "located at the bottom of," "located between," "connected to," etc. to describe the relationship of one element or feature to another (other) element or feature. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptions used herein should be interpreted accordingly.

以下係以具體實施例說明本創作之實施方式,熟習此技藝者可經由本說明書之內容輕易地了解本創作所能達成之優點與功效,並且於不悖離本創作之精神下進行各種修飾與變更,以施行或應用本創作之內容。The following is a specific example to illustrate the implementation of the present invention. Those skilled in the art can easily understand the advantages and effects that can be achieved by the present invention through the contents of this manual, and make various modifications and changes without departing from the spirit of the present invention to implement or apply the contents of the present invention.

實施例Embodiment 11

如圖1所示,實施例1之化學品分離純化裝置包含一蒸餾塔1、一進料管線2、一加熱器3、一冷凝器4、一收集槽5、一抽氣系統6、一回流管線7以及一進氣管8。As shown in FIG. 1 , the chemical separation and purification device of Example 1 comprises a distillation tower 1, a feed pipeline 2, a heater 3, a condenser 4, a collecting tank 5, a vacuum system 6, a reflux pipeline 7, and an air inlet pipe 8.

蒸餾塔1具有一塔板部11、一填料部12、一支承板13、一第一溫度感測器14以及一第二溫度感測器15,塔板部11與填料部12沿縱向排列設置於蒸餾塔1中,支承板13位於塔板部11和填料部12之間。於本實施例中,填料部12位於塔板部11上方,第一溫度感測器14設置於塔板部11上,用於感測塔板部11的溫度,第二溫度感測器15設置於填料部12上,用於感測填料部12的溫度。於本實施例中,該支承板13為一多孔合金板,用於支撐填料部12避免填料部12中的填料掉落。The distillation tower 1 comprises a tray section 11, a packing section 12, a support plate 13, a first temperature sensor 14 and a second temperature sensor 15. The tray section 11 and the packing section 12 are arranged in a longitudinal direction in the distillation tower 1, and the support plate 13 is located between the tray section 11 and the packing section 12. In this embodiment, the packing section 12 is located above the tray section 11, the first temperature sensor 14 is arranged on the tray section 11 for sensing the temperature of the tray section 11, and the second temperature sensor 15 is arranged on the packing section 12 for sensing the temperature of the packing section 12. In this embodiment, the support plate 13 is a porous alloy plate for supporting the packing section 12 to prevent the packing in the packing section 12 from falling.

進料管線2與蒸餾塔1的底部連接,將待分離的化學品透過進料管線2送入蒸餾塔1中。The feed pipeline 2 is connected to the bottom of the distillation tower 1, and the chemical to be separated is fed into the distillation tower 1 through the feed pipeline 2.

加熱器3與蒸餾塔1的底部連接,加熱器3可用以加熱來自蒸餾塔1中待分離的化學品,將加熱後的化學品送回蒸餾塔1中。於本實施例中,待分離的化學品送入蒸餾塔1的塔板部11後,可先經加熱器3加熱後送回塔板部11進行分離純化,再流經填料部12進行分離純化。加熱器3具有一溫度控制器31,溫度控制器31連接加熱器3,其可接受第一溫度感測器14以及第二溫度感測器15所感測的溫度,並調控加熱器3的加熱溫度。The heater 3 is connected to the bottom of the distillation tower 1. The heater 3 can be used to heat the chemicals to be separated from the distillation tower 1 and send the heated chemicals back to the distillation tower 1. In this embodiment, after the chemicals to be separated are sent to the tray section 11 of the distillation tower 1, they can be heated by the heater 3 and then sent back to the tray section 11 for separation and purification, and then flow through the packing section 12 for separation and purification. The heater 3 has a temperature controller 31, which is connected to the heater 3 and can receive the temperatures sensed by the first temperature sensor 14 and the second temperature sensor 15, and adjust the heating temperature of the heater 3.

冷凝器4與蒸餾塔1的頂部連接,冷凝器4可用以冷凝來自蒸餾塔1中經蒸餾而得的純化化學品。The condenser 4 is connected to the top of the distillation tower 1 , and the condenser 4 can be used to condense the purified chemicals obtained by distillation in the distillation tower 1 .

收集槽5與冷凝器4連接,收集槽5用於收集經冷凝器4冷凝的純化化學品。The collecting tank 5 is connected to the condenser 4 and is used to collect the purified chemicals condensed by the condenser 4.

抽氣系統6與蒸餾塔1的頂部連接,抽氣系統6的設置是為了將蒸餾塔1內抽真空、或是進行減壓,藉此加強氣體向上流動的推動力,加快蒸餾反應的進行。The exhaust system 6 is connected to the top of the distillation tower 1. The exhaust system 6 is provided to evacuate or reduce the pressure in the distillation tower 1, thereby increasing the driving force of the gas to flow upward and accelerating the distillation reaction.

回流管線7接枝於冷凝器4與收集槽5之間,並分支成一第一回流管線71與一第二回流管線72,第一回流管線71與塔板部11的頂部連接,第二回流管線72與填料部12的頂部連接。The reflux line 7 is connected between the condenser 4 and the collecting tank 5 and branches into a first reflux line 71 and a second reflux line 72. The first reflux line 71 is connected to the top of the plate portion 11, and the second reflux line 72 is connected to the top of the packing portion 12.

進氣管8與蒸餾塔1的頂部連接,進氣管8的設置是為了使得蒸餾塔1內的氣體主要以惰性氣體為主,避免空氣中的水氣和氧氣等雜質與化學品作用或混合影響純度。The air inlet pipe 8 is connected to the top of the distillation tower 1. The purpose of the air inlet pipe 8 is to make the gas in the distillation tower 1 mainly inert gas, so as to prevent impurities such as water vapor and oxygen in the air from reacting or mixing with chemicals to affect the purity.

實施例Embodiment 22

如圖2所示,實施例2之化學品分離純化裝置大致上與實施例1之化學品分離純化裝置雷同,其亦包含一蒸餾塔1、一進料管線2、一加熱器3、一冷凝器4、一收集槽5、一抽氣系統6、一回流管線7以及一進氣管8,前述構件之間的連結關係大致上如實施例1中所述,於此不再贅述。As shown in FIG2 , the chemical separation and purification device of Example 2 is substantially the same as the chemical separation and purification device of Example 1, and also comprises a distillation tower 1, a feed pipeline 2, a heater 3, a condenser 4, a collecting tank 5, a vacuum system 6, a reflux pipeline 7 and an air inlet pipe 8. The connection relationship between the aforementioned components is substantially the same as that described in Example 1 and will not be described in detail herein.

於本實施例之蒸餾塔1也具有一塔板部11、一填料部12、一支承板13、一第一溫度感測器14以及一第二溫度感測器15,塔板部11與填料部12沿縱向排列,支承板13位於塔板部11和填料部12之間。於本實施例中,塔板部11位於填料部12上方,第一溫度感測器14設置於塔板部11上,用於感測塔板部11的溫度,第二溫度感測器15設置於填料部12上,用於感測填料部12的溫度。於本實施例中,該支承板13為一多孔合金板,避免填料部12因蒸氣或抽氣等推動力向上浮動。The distillation tower 1 in this embodiment also has a tray section 11, a packing section 12, a support plate 13, a first temperature sensor 14 and a second temperature sensor 15. The tray section 11 and the packing section 12 are arranged in the vertical direction, and the support plate 13 is located between the tray section 11 and the packing section 12. In this embodiment, the tray section 11 is located above the packing section 12, the first temperature sensor 14 is arranged on the tray section 11 to sense the temperature of the tray section 11, and the second temperature sensor 15 is arranged on the packing section 12 to sense the temperature of the packing section 12. In this embodiment, the support plate 13 is a porous alloy plate to prevent the packing section 12 from floating upward due to the pushing force of steam or exhaust.

於本實施例中,溫度控制器31連接至加熱器3,回流管線7接枝於冷凝器4與收集槽5之間,並分支成一第一回流管線71與一第二回流管線72,第一回流管線71與塔板部11的頂部連接,第二回流管線72與填料部12的頂部連接。In this embodiment, the temperature controller 31 is connected to the heater 3, the reflux line 7 is grafted between the condenser 4 and the collecting tank 5, and is branched into a first reflux line 71 and a second reflux line 72, the first reflux line 71 is connected to the top of the tower plate part 11, and the second reflux line 72 is connected to the top of the packing part 12.

本創作之化學品分離純化裝置藉由整合填料部與塔板部並使其等之縱向排列的技術手段,能具有以下三功效:其一為減少填料部與塔板部各自佔據的佔地面積;其二為減少設立多個進料管線、加熱器、冷凝器、抽氣系統、回流管線或其他裝置的佔地面積及設備成本;其三更可將亟需耗能的設備單元(如:加熱器、抽氣系統等裝置)同時共用於塔板部與填料部,以利節省蒸餾塔整體所需的能源。舉例而言,通常知識者皆明瞭,蒸餾塔需設有一加熱器產生蒸氣,用以作為蒸餾塔內向上進行氣液質量傳遞的推動力來源,藉由將塔板部與填料部整合在同一蒸餾塔內的方式,本創作之化學品分離純化裝置不需於每一獨立的蒸餾塔內重複裝設加熱器,進而避免耗費大量能源提供多個蒸餾塔內高溫高壓的操作環境。因此,本創作之化學品分離純化裝置可以有效降低重複的操作流程,尤其減少高溫高壓的操作條件下所帶來的能源消耗。The chemical separation and purification device of this invention can have the following three effects by integrating the packing part and the tray part and arranging them longitudinally. First, the floor space occupied by the packing part and the tray part can be reduced. Second, the floor space occupied by multiple feed pipelines, heaters, condensers, exhaust systems, reflux pipelines or other devices and the equipment cost can be reduced. Third, the equipment units that require high energy consumption (such as heaters, exhaust systems and other devices) can be shared by the tray part and the packing part at the same time, so as to save the energy required for the entire distillation tower. For example, it is generally known that a distillation tower needs to be equipped with a heater to generate steam as a driving force for upward gas-liquid mass transfer in the distillation tower. By integrating the tray section and the packing section in the same distillation tower, the chemical separation and purification device of the present invention does not need to repeatedly install a heater in each independent distillation tower, thereby avoiding the consumption of a large amount of energy to provide a high-temperature and high-pressure operating environment in multiple distillation towers. Therefore, the chemical separation and purification device of the present invention can effectively reduce repeated operating processes, especially reduce energy consumption under high-temperature and high-pressure operating conditions.

實施例1之化學品分離純化裝置的分離純化流程如下:The separation and purification process of the chemical separation and purification device of Example 1 is as follows:

首先,透過進氣管8將氮氣以及氬氣通入蒸餾塔1內,以排除留存於蒸餾塔1中水氣和氧氣等雜質,避免在分離純化的過程中,化學品與該等雜質作用或混合影響化學品的純度。接著,將一化學品透過進料管線2通入蒸餾塔1,該化學品流入加熱器3加溫至沸騰產生蒸氣。蒸氣由蒸餾塔1的底部向上依序穿過塔板部11與填料部12;同時,塔板部11與填料部12也存在向下流動的液體,使得蒸氣與液體在塔板部11與填料部12內進行接觸,其中,填料部12更可透過吸收以及吸附來去除流體中的雜質,提高化學品的純度。最終,向上蒸發的蒸氣通過冷凝器4將蒸氣冷凝成液體,冷凝成液體後的化學品部分匯入收集槽5內儲存,部分經第二回流管線72流回填料部12內,部分經第一回流管線71流回塔板部11內,回流入蒸餾塔1的化學品繼續蒸餾以取得更高純度的化學品。此外,在蒸餾過程中,支承板13可用於支撐填料部12避免填料部12中的填料掉落,第一溫度感測器14以及第二溫度感測器15可分別感測塔板部11與填料部12的溫度,將其溫度訊號回傳到溫度控制器31中,藉此調控整體蒸餾塔1的溫度,抽氣系統6則能調配蒸餾塔1內的壓力,將蒸餾塔1內抽真空、或是進行減壓,藉此加強氣體向上流動的推動力,加快蒸餾反應的進行。First, nitrogen and argon are introduced into the distillation tower 1 through the air inlet pipe 8 to remove impurities such as water vapor and oxygen remaining in the distillation tower 1, so as to prevent the chemical from reacting or mixing with the impurities during the separation and purification process to affect the purity of the chemical. Next, a chemical is introduced into the distillation tower 1 through the feed pipeline 2, and the chemical flows into the heater 3 to be heated to boiling to generate steam. The steam passes through the plate section 11 and the packing section 12 in sequence from the bottom of the distillation tower 1 upward; at the same time, there is liquid flowing downward in the plate section 11 and the packing section 12, so that the steam and the liquid come into contact in the plate section 11 and the packing section 12, wherein the packing section 12 can remove impurities in the fluid through absorption and adsorption to improve the purity of the chemical. Finally, the vapor evaporated upward is condensed into liquid by the condenser 4. The condensed liquid chemical is partially introduced into the collecting tank 5 for storage, partially flows back into the packing part 12 through the second reflux line 72, and partially flows back into the tray part 11 through the first reflux line 71. The chemical refluxed into the distillation tower 1 continues to be distilled to obtain a chemical with a higher purity. In addition, during the distillation process, the support plate 13 can be used to support the packing part 12 to prevent the packing in the packing part 12 from falling. The first temperature sensor 14 and the second temperature sensor 15 can respectively sense the temperature of the tower plate part 11 and the packing part 12, and transmit their temperature signals back to the temperature controller 31 to adjust the temperature of the entire distillation tower 1. The exhaust system 6 can adjust the pressure in the distillation tower 1, evacuate the distillation tower 1, or reduce the pressure, thereby strengthening the driving force of the gas to flow upward and accelerating the distillation reaction.

實施例2之化學品分離純化裝置的分離純化流程大致與實施例1相同,唯獨不同的是,實施例2的塔板部11在填料部12上,因此,該待純化的化學品從蒸餾塔1的底部透過加熱器3加熱成蒸氣後,會先穿過填料部12再穿過塔板部11,並透過冷凝器4冷凝成液體,最終匯入收集槽5儲存,其中,支承板13的設置可固定住填料部12,阻擋填料部12因蒸餾塔1內向上流動的蒸氣或是抽氣系統6所提供之推動力而浮動,進料管線2、第一回流管線71、第二回流管線72、第一溫度感測器14、第二溫度感測器15、溫度控制器31、抽氣系統6以及進氣管8的設置目的均與實施例1相同。The separation and purification process of the chemical separation and purification device of Example 2 is substantially the same as that of Example 1, except that the tray portion 11 of Example 2 is on the packing portion 12. Therefore, the chemical to be purified is heated to vapor from the bottom of the distillation tower 1 by the heater 3, passes through the packing portion 12 and then the tray portion 11, and is condensed into liquid by the condenser 4, and finally is introduced into the collection tank 5 for storage, wherein, The support plate 13 can fix the packing part 12 to prevent the packing part 12 from floating due to the steam flowing upward in the distillation tower 1 or the thrust provided by the exhaust system 6. The feed pipeline 2, the first reflux pipeline 71, the second reflux pipeline 72, the first temperature sensor 14, the second temperature sensor 15, the temperature controller 31, the exhaust system 6 and the air inlet pipe 8 are arranged for the same purpose as in Example 1.

綜上所述,藉由將填料部與塔板部整合於同一蒸餾塔內,本創作之化學品分離純化裝置能節省所佔用的廠房面積以及設備成本,更能精簡的運用蒸餾塔內的能源,達到降低能源消耗的效果。In summary, by integrating the packing part and the tray part in the same distillation tower, the chemical separation and purification device of this invention can save the occupied plant area and equipment cost, and can more efficiently utilize the energy in the distillation tower, thereby achieving the effect of reducing energy consumption.

上述實施例僅係為了方便說明而舉例而已,本創作所主張之權利範圍自應以申請專利範圍所述為準,而非僅限於上述實施例。The above embodiments are merely examples for the convenience of explanation. The scope of rights claimed by this invention should be based on the scope of the patent application, and is not limited to the above embodiments.

1:蒸餾塔 11:塔板部 12:填料部 13:支承板 14:第一溫度感測器 15:第二溫度感測器 2:進料管線 3:加熱器 31:溫度控制器 4:冷凝器 5:收集槽 6:抽氣系統 7:回流管線 71:第一回流管線 72:第二回流管線 8:進氣管 1: Distillation tower 11: Plate section 12: Packing section 13: Support plate 14: First temperature sensor 15: Second temperature sensor 2: Feed pipeline 3: Heater 31: Temperature controller 4: Condenser 5: Collection tank 6: Exhaust system 7: Reflux pipeline 71: First reflux pipeline 72: Second reflux pipeline 8: Inlet pipe

請結合圖式閱讀以下詳細說明,可更佳地理解本創作的實施態樣。應說明的是,根據本領域的慣例,各種特徵未必按實際比例繪製。事實上,為有利於清晰辨識本創作之技術特徵論述起見,可視情況任意增大或減小各種元件或特徵的尺寸。Please read the following detailed description in conjunction with the drawings to better understand the implementation of this invention. It should be noted that, according to the practice in the field, various features may not be drawn in actual proportion. In fact, in order to facilitate the clear identification of the technical features of this invention, the size of various components or features may be arbitrarily increased or decreased as appropriate.

圖1係實施例1之化學品純化分離裝置示意圖。FIG1 is a schematic diagram of a chemical purification and separation device according to Embodiment 1.

圖2係實施例2之化學品純化分離裝置示意圖。FIG. 2 is a schematic diagram of a chemical purification and separation device according to Embodiment 2.

1:蒸餾塔 1: Distillation tower

11:塔板部 11: Plate section

12:填料部 12: Filling section

13:支承板 13: Support plate

14:第一溫度感測器 14: First temperature sensor

15:第二溫度感測器 15: Second temperature sensor

2:進料管線 2: Feeding pipeline

3:加熱器 3: Heater

31:溫度控制器 31: Temperature controller

4:冷凝器 4: Condenser

5:收集槽 5: Collection tank

6:抽氣系統 6: Exhaust system

7:回流管線 7: Reflux pipeline

71:第一回流管線 71: First reflux pipeline

72:第二回流管線 72: Second reflux pipeline

8:進氣管 8: Intake pipe

Claims (9)

一種化學品分離純化裝置,其包含一蒸餾塔、一進料管線、一加熱器、一冷凝器以及一收集槽,該進料管線與該蒸餾塔的底部連接,該加熱器與該蒸餾塔的底部連接,該冷凝器的一端與該蒸餾塔的頂部連接,該冷凝器的另一端與該收集槽連接,其中,該蒸餾塔包含一填料部與一塔板部,且該填料部與該塔板部沿縱向排列設置於該蒸餾塔中。A chemical separation and purification device comprises a distillation tower, a feed pipeline, a heater, a condenser and a collecting tank, wherein the feed pipeline is connected to the bottom of the distillation tower, the heater is connected to the bottom of the distillation tower, one end of the condenser is connected to the top of the distillation tower, and the other end of the condenser is connected to the collecting tank, wherein the distillation tower comprises a packing part and a tray part, and the packing part and the tray part are arranged in the distillation tower along the vertical direction. 如請求項1所述之化學品分離純化裝置,其中,該填料部位於該塔板部上方,且該蒸餾塔還包含一支承板,該支承板位於該填料部與該塔板部之間。A chemical separation and purification device as described in claim 1, wherein the packing portion is located above the tray portion, and the distillation tower further comprises a support plate located between the packing portion and the tray portion. 如請求項2所述之化學品分離純化裝置,其中,該支承板為薄膜或多孔合金板。A chemical separation and purification device as described in claim 2, wherein the support plate is a film or a porous alloy plate. 如請求項1所述之化學品分離純化裝置,其中,該塔板部位於該填料部上方,且該蒸餾塔還包含一支承板,該支承板位於該填料部與該塔板部之間。A chemical separation and purification device as described in claim 1, wherein the tray portion is located above the packing portion, and the distillation tower further comprises a support plate located between the packing portion and the tray portion. 如請求項4所述之化學品分離純化裝置,其中,該支承板為薄膜或多孔合金板。A chemical separation and purification device as described in claim 4, wherein the support plate is a film or a porous alloy plate. 如請求項1至5中任一項所述之化學品分離純化裝置,其中,該化學品分離純化裝置還包含一抽氣系統,該抽氣系統與該蒸餾塔的頂部連接。A chemical separation and purification device as described in any one of claims 1 to 5, wherein the chemical separation and purification device further comprises an exhaust system connected to the top of the distillation tower. 如請求項1至5中任一項所述之化學品分離純化裝置,其中,該化學品分離純化裝置還包含一回流管線,該回流管線接枝於該冷凝器與該收集槽之間,並分支為一第一回流管線與一第二回流管線,該第一回流管線與該第二回流管線分別與該塔板部和該填料部的頂部連接。A chemical separation and purification device as described in any one of claims 1 to 5, wherein the chemical separation and purification device further comprises a reflux line, which is grafted between the condenser and the collection tank and branches into a first reflux line and a second reflux line, and the first reflux line and the second reflux line are respectively connected to the top of the tower plate section and the packing section. 如請求項1至5中任一項所述之化學品分離純化裝置,其中,該蒸餾塔還包含一第一溫度感測器以及一第二溫度感測器,該第一溫度感測器以及該第二溫度感測器分別設置於該塔板部與該填料部上。A chemical separation and purification device as described in any one of claims 1 to 5, wherein the distillation tower further comprises a first temperature sensor and a second temperature sensor, and the first temperature sensor and the second temperature sensor are respectively arranged on the tower plate portion and the packing portion. 如請求項1至5中任一項所述之化學品分離純化裝置,其中,該蒸餾塔還包含一進氣管,該進氣管與該蒸餾塔的頂部連接。 A chemical separation and purification device as described in any one of claims 1 to 5, wherein the distillation tower further comprises an air inlet pipe connected to the top of the distillation tower.
TW112213234U 2023-12-04 Chemical separation and purification equipment TWM654945U (en)

Publications (1)

Publication Number Publication Date
TWM654945U true TWM654945U (en) 2024-05-01

Family

ID=

Similar Documents

Publication Publication Date Title
US7314506B2 (en) Fluid purification system with low temperature purifier
US6050283A (en) System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing
RU2540618C2 (en) Method and device to produce trisilylamine
US5722442A (en) On-site generation of ultra-high-purity buffered-HF for semiconductor processing
CN100593513C (en) Method for producing silicon
US9988714B2 (en) Process for producing polysilicon
US8506682B2 (en) Process for purification of monosilane
US6350425B2 (en) On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
CN100525882C (en) Fluid purification system with low temperature purifier
US5846387A (en) On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
US6032483A (en) System and method for delivery of a vapor phase product to a point of use
CN1988948A (en) Removal of metal contaminants from ultra-high purity gases
TWM654945U (en) Chemical separation and purification equipment
US3901182A (en) Silicon source feed process
US20060211248A1 (en) Purifier for chemical reactor
WO1996039651A1 (en) System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing
CN102390836A (en) Trichlorosilane synthesis process and equipment
US6372022B1 (en) Ionic purifier
CN113603112B (en) Device for preparing electronic-grade ammonia water and preparation process thereof
CN106517094B (en) The method that purifying has High Purity Hydrogen or high-purity chlorosilane containing phosphorus impurities
JP7219494B2 (en) Method and apparatus for removing impurities from chlorosilanes
CN111081611B (en) Gas delivery line and semiconductor device
WO1996039264A1 (en) On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
US9061916B2 (en) Processes and systems for purifying silane
JP2000319095A (en) Apparatus and method for vaporizing and supplying trichlorosilane