TWM650249U - Evaporation machine with positioning system - Google Patents
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Abstract
一種具有定位系統的蒸鍍機台,包含坩堝盤、傳動組件、第一定位感測系統、第二定位感測系統及控制裝置。該傳動組件具有位於該坩堝盤的底部以帶動該坩堝盤的底盤齒輪、馬達、與馬達的轉軸連軸的傳動軸,及設置於傳動軸並用以帶動該底盤齒輪的傳動齒輪;該第一定位感測系統具有由該傳動軸帶動的第一定位齒輪及用於感測該第一定位齒輪之轉動情形的第一感測單元;該第二定位感測系統具有由該底盤齒輪帶動的定位轉盤及用於偵測該定位轉盤之轉動情形的第二感測器;該控制裝置據以比對該第一、二定位感測系統的檢測訊號以得到定位檢測結果。An evaporation machine with a positioning system, including a crucible plate, a transmission component, a first positioning sensing system, a second positioning sensing system and a control device. The transmission assembly has a chassis gear located at the bottom of the crucible plate to drive the crucible plate, a motor, a transmission shaft connected to the rotating shaft of the motor, and a transmission gear provided on the transmission shaft and used to drive the chassis gear; the first positioning The sensing system has a first positioning gear driven by the transmission shaft and a first sensing unit used to sense the rotation of the first positioning gear; the second positioning sensing system has a positioning turntable driven by the chassis gear and a second sensor for detecting the rotation of the positioning turntable; the control device compares the detection signals of the first and second positioning sensing systems to obtain the positioning detection result.
Description
本新型是有關於一種蒸鍍機台,特別是指一種具有定位系統的蒸鍍機台。The invention relates to an evaporation machine, in particular to a evaporation machine with a positioning system.
習知用於執行蒸鍍(Evaporation)製程的蒸鍍機台(圖未示)大致包含一可轉動且供放置蒸鍍材料的坩堝盤、一用於轉動該坩堝盤的傳動組件、一用以對該坩堝盤的轉動情形進行定位偵測的定位系統,及一用於加熱該蒸鍍材料的加熱源。其中,該傳動組件至少具有一馬達,以及一由該馬達帶動且與該坩堝盤相接觸的傳動齒輪組。該坩堝盤具有多個供用以放置不同蒸鍍材料的容槽,經由轉動該坩堝盤能帶動該等容槽移動至預定位置。A conventional evaporation machine (not shown) used to perform an evaporation process generally includes a rotatable crucible plate for placing evaporation materials, a transmission assembly for rotating the crucible plate, and a A positioning system for positioning and detecting the rotation of the crucible plate, and a heating source for heating the evaporation material. Wherein, the transmission assembly at least has a motor and a transmission gear set driven by the motor and in contact with the crucible plate. The crucible plate has a plurality of containers for placing different evaporation materials, and the rotation of the crucible plate can drive the containers to move to predetermined positions.
使用該蒸鍍機台進行蒸鍍時,先經由該傳動組件帶動該坩堝盤轉動,使預定的其中一容槽移動至預定位置並對位於該加熱源,以對符合製程需求的蒸鍍材料進行加熱。而在轉動該坩堝盤的過程中,會經由該定位系統對該傳動組件的轉動情形進行定位偵測,以確認欲進行製程的容槽是否正確對位於該加熱源,避免因對位不正確而選用了不符合製程需求的蒸鍍材料或是未能充分加熱蒸鍍材料等問題,導致製程良率下降。When the evaporation machine is used for evaporation, the transmission assembly drives the crucible plate to rotate first, so that one of the predetermined containers moves to a predetermined position and is located at the heating source to evaporate the evaporation material that meets the process requirements. Heat. During the process of rotating the crucible plate, the positioning system will perform positioning detection on the rotation of the transmission component to confirm whether the container to be processed is correctly aligned with the heating source, so as to avoid accidents due to incorrect alignment. Problems such as selecting evaporation materials that do not meet the process requirements or failing to fully heat the evaporation materials lead to a decrease in process yield.
然而,由於該定位系統以及該傳動組件均是以機械方式作動,隨著操作時間增長,部分元件(例如齒輪或聯軸器等)容易產生磨損、鬆脫或跳齒等問題,而出現該坩堝盤的轉動情形不符合預期導致感測定位錯誤,或是該定位系統之定位偵測的準確性下降等問題。However, since the positioning system and the transmission assembly are both mechanically actuated, as the operation time increases, some components (such as gears or couplings, etc.) are prone to wear, looseness, or skipped teeth, resulting in the crucible The rotation of the disk is not as expected, resulting in sensing positioning errors, or the positioning detection accuracy of the positioning system is reduced, and other problems.
因此,本新型的目的,即在提供一種具有定位系統的蒸鍍機台,用於對其配置的坩堝盤進行定位,並提升定位的準確性。Therefore, the purpose of the present invention is to provide an evaporation machine with a positioning system for positioning the crucible plate configured therein and to improve the accuracy of positioning.
於是,本新型具有定位系統的蒸鍍機台,包含一坩堝盤、一傳動組件、一第一定位感測系統、一第二定位感測系統,及一控制裝置。Therefore, the new evaporation deposition machine with a positioning system includes a crucible plate, a transmission component, a first positioning sensing system, a second positioning sensing system, and a control device.
該坩堝盤具有多個容槽。The crucible plate has a plurality of receptacles.
該傳動組件包括一用以帶動該坩堝盤轉動的轉動單元,及一用以帶動該轉動單元的傳動單元。該轉動單元具有一設置於該坩堝盤底部的底盤齒輪。該傳動單元具有一馬達、一與該馬達之轉軸連軸的傳動軸,及一設置至於該傳動軸遠離於該馬達一端用於帶動該底盤齒輪的傳動齒輪。The transmission assembly includes a rotation unit for driving the crucible plate to rotate, and a transmission unit for driving the rotation unit. The rotating unit has a chassis gear arranged at the bottom of the crucible plate. The transmission unit has a motor, a transmission shaft connected to the rotating shaft of the motor, and a transmission gear arranged at an end of the transmission shaft away from the motor for driving the chassis gear.
該第一定位感測系統具有一經由該傳動軸帶動而轉動的第一定位齒輪,以及一設置於該第一定位齒輪周緣的第一感測單元。該第一感測單元用於感測該第一定位齒輪的轉動情形,以取得一第一感測訊號。The first positioning sensing system has a first positioning gear driven to rotate by the transmission shaft, and a first sensing unit arranged around the periphery of the first positioning gear. The first sensing unit is used to sense the rotation of the first positioning gear to obtain a first sensing signal.
該第二定位感測系統具有一由該底盤齒輪帶動的定位轉盤,以及一設置於該定位轉盤側邊的第二感測器。該第二感測器用於偵測該定位轉盤的轉動情形,以取得一第二感測訊號。The second positioning sensing system has a positioning turntable driven by the chassis gear, and a second sensor disposed on the side of the positioning turntable. The second sensor is used to detect the rotation of the positioning turntable to obtain a second sensing signal.
該控制裝置與該第一感測單元及該第二感測器訊號連接,用於比對該第一感測訊號及該第二感測訊號,以得到一定位檢測結果。The control device is connected to the first sensing unit and the second sensor signal, and is used to compare the first sensing signal and the second sensing signal to obtain a positioning detection result.
本新型的功效在於:利用該第一定位感測系統以及該第二定位感測系統分別針對用以轉動該坩堝盤的該傳動軸以及被該底盤齒輪所帶動的定位轉盤進行定位感測,以取得該第一感測訊號及該第二感測訊號,再利用該控制裝置依據由兩種不同偵測方式所得到的定位結果進行交互比對進行雙重確認,以提升對於該坩堝盤之定位偵測的準確性。The function of the present invention is to use the first positioning sensing system and the second positioning sensing system to perform positioning sensing respectively on the transmission shaft used to rotate the crucible plate and the positioning turntable driven by the chassis gear, so as to Obtain the first sensing signal and the second sensing signal, and then use the control device to perform interactive comparison and double confirmation based on the positioning results obtained by the two different detection methods, so as to improve the positioning detection of the crucible plate. measurement accuracy.
在本新型被詳細描述前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。有關本新型之相關技術內容、特點與功效,在以下配合參考圖式之實施例的詳細說明中,將可清楚的呈現。此外,要說明的是,本新型圖式僅為表示元件間的結構及/或位置相對關係,與各元件的實際尺寸並不相關。Before the present invention is described in detail, it should be noted that similar components are represented by the same numbers in the following description. The relevant technical contents, features and functions of the present invention will be clearly presented in the following detailed description of the embodiments with reference to the drawings. In addition, it should be noted that the drawings of the present invention only represent the relative structure and/or positional relationship between components, and are not related to the actual size of each component.
參閱圖1和圖2,本新型具有定位系統的蒸鍍機台的一實施例,包含一坩堝盤2、一傳動組件3、一第一定位感測系統4、一第二定位感測系統5,及一控制裝置6。其中,圖1繪示了前述元件的相對位置關係,但要說明的是,該蒸鍍機台還包含一供用於容置該坩堝盤2的反應腔室10、一用以加熱放置於該坩堝盤2之蒸鍍材料的加熱源(圖未示),以及其它細部構件。其中,該反應腔室10、該加熱源以及其它細部構件依據製程需求可有不同態樣,且其結構設計及元件配置條件已為相關領域所知悉,在此不多加贅述。Referring to Figures 1 and 2, an embodiment of the new evaporation deposition machine with a positioning system includes a
該坩堝盤2具有多個供用以放置蒸鍍材料的容槽21,經由轉動該坩堝盤2,可帶動其中一容槽21對位於該蒸鍍機台的一電子束源。在本實施例中,是以該坩堝盤2具有六個尺寸相同的容槽21為例作說明,但並不以此為限。The
該傳動組件3包括一用以帶動該坩堝盤2轉動的轉動單元31,及一用以帶動該轉動單元31的傳動單元32。The
該轉動單元31具有一設置於該坩堝盤2底部的底盤齒輪311、一與該底盤齒輪311相接觸,用以帶動該底盤齒輪311轉動的第一齒輪312,以及一與該第一齒輪312連軸的第二齒輪313。該傳動單元32具有一馬達321、一與該馬達321之轉軸3211連軸的傳動軸322、一設置至於該傳動軸322遠離於該馬達321一端並用於帶動該底盤齒輪311的傳動齒輪323,以及一環設於該傳動軸322的傳動定位齒輪324。其中,該傳動齒輪323與該轉動單元31的第二齒輪313相接處,用以帶動該第二齒輪313轉動,該馬達321的轉軸3211是經由一聯軸器325與該傳動軸322連軸。The
當啟動該馬達321轉動時,會帶動與該馬達321的轉軸3211連軸的該傳動軸322同步轉動,並依序帶動該傳動齒輪323、該第二齒輪313、該第一齒輪312,以及該底盤齒輪311轉動,進而帶動該坩堝盤2轉動。When the
在其它實施例中,該轉動單元31也可選用不同形式的齒輪組合以替代該第一齒輪312及該第二齒輪313,而不以前述之舉例以及圖式為限,只要令該底盤齒輪311可被該傳動齒輪323帶動即可。在另一些實施例中,也可令設置於該傳動軸322上的傳動齒輪323直接與該底盤齒輪311相接觸,而無須額外設置該第一齒輪312和該第二齒輪313。In other embodiments, the rotating
配合參閱圖3,該第一定位感測系統4具有一第一定位齒輪41、一第一感測單元42,以及一設置於該第一定位齒輪41上且與該第一定位齒輪41同軸轉動的定位輪43。該第一感測單元42具有多個設置於該第一定位齒輪41周緣的第一感測器421,用於感測該第一定位齒輪41的轉動情形。而利用該第一感測單元42所測得的該第一感測訊號,即可據以評估該傳動軸322,及經由該傳動組件3所帶動之坩堝盤2的轉動情形。Referring to FIG. 3 , the first
在本實施例中,是以該等第一感測器421的數量與該等容槽21的數量相同,並依據該等容槽21於該坩堝盤2上的分布位置對應設置於該第一定位齒輪41周緣為例作說明。該等第一感測器421選自紅外線遮斷器,並藉由感測該定位輪43,以對與該定位輪43同軸轉動之該第一定位齒輪41的轉動情形進行定位偵測。In this embodiment, the number of the
詳細地說,當該傳動軸322轉動時,該第一定位齒輪41與該傳動定位齒輪324相接觸而被該傳動軸322帶動而轉動,進而帶動該定位輪43同軸轉動。其中,該定位輪43如圖3所示,於其周緣鄰近該等第一感測器421處形成有一缺口431。當該定位輪43的缺口431通過其中一第一感測器421(紅外線遮斷器)時,該第一感測器421所發出的紅外線光源會通過該缺口431,而被位於該缺口另一側的接收器所接收,進而產生該第一感測訊號。由於該等第一感測器421是對應該等容槽21的位置設置,因此利用該第一感測訊號即可據以評估該定位輪43的缺口431與該等第一感測器421之間的相對位置變化,並據以取得該坩堝盤2的轉動情形,以及該等容槽21於轉動後的停止位置。In detail, when the
該第二定位感測系統5具有一與該底盤齒輪311相接觸而可被該底盤齒輪311帶動的被動齒輪53、一與該被動齒輪53連軸的第二傳動齒輪54、一與該第二傳動齒輪54相接觸而可被帶動的第二定位齒輪55、一設置於該第二定位齒輪55上的定位轉盤51,以及一設置於該定位轉盤51側邊的第二感測器52。該第二感測器52用於偵測該定位轉盤51的轉動情形,以取得一第二感測訊號。其中,該被動齒輪53是經由一聯軸器56與該第二傳動齒輪54連軸。The second positioning sensing system 5 has a driven gear 53 that is in contact with the chassis gear 311 and can be driven by the chassis gear 311, a
詳細地說,當該底盤齒輪311轉動而帶動該坩堝盤2轉動時,也會依序帶動該被動齒輪53、該第二傳動齒輪54,以及該第二定位齒輪55轉動,並進而帶動設置於該第二定位齒輪55上的該定位轉盤51轉動。因此,利用該第二感測器52偵測該定位轉盤51的轉動所測得的該第二感測訊號,即可據以評估該底盤齒輪311,以及經由該底盤齒輪311所帶動之坩堝盤2的轉動情形。In detail, when the chassis gear 311 rotates to drive the
配合參閱圖4,在本實施例中,是以該定位轉盤51的側邊形成多個凹槽511,該第二感測器52為一機械式開關為例作說明,該等凹槽511與該等容槽21的數量相同,且依據該等容槽21於該坩堝盤2上的分布位置對應形成於該定位轉盤51側邊,該第二感測器52經由接觸式感測方式偵測該等凹槽511,以取得該第二定位訊號。詳細地說,該定位轉盤51側邊形成有六個間隔設置的凹槽511,且在該定位轉盤51轉動的過程中,該第二感測器52會在接觸到任一凹槽511時開啟或關閉,並在每一次開啟或關閉之間切換時據以產生該第二感測訊號。Referring to FIG. 4 , in this embodiment, a plurality of
該控制裝置6與該第一感測單元42及該第二感測器52訊號連接,用於比對該第一感測訊號及該第二感測訊號,以得到一定位檢測結果。The control device 6 is connected to the
詳細地說,該控制裝置6利用該第一定位感測系統4及該第二定位感測系統5分別針對用以對動該坩堝盤2轉動的該傳動軸322,以及被該坩堝盤2所帶動的定位轉盤51的轉動情形進行測量,以得到該第一感測訊號及該第二感測訊號,並各自計算取得該坩堝盤2的轉動情形,以此得知該坩堝盤2之容槽21的定位情況。而該定位檢測結果即是用於比對兩種不同的定位偵測方式所測得的定位結果是否相符。因此,即便該蒸鍍機台的部分元件(例如齒輪或聯軸器等)在傳動過程中有磨損、鬆脫或跳齒的問題,造成該坩堝盤2的轉動及/或其中一定位感測系統的偵測發生偏差,該控制裝置6能藉由比對該第一感測訊號及該第二感測訊號以進行雙重確認,而能提升對於該坩堝盤2之定位偵測的準確性。In detail, the control device 6 uses the first
在一些實施例中,當該控制裝置6比對該第一感測訊號及該第二感測訊號,且所得到的定位檢測結果彼此相符時,則該控制裝置6會發出一停止訊號,使該坩堝盤2在轉動至一預定位置後停止運行;當該控制裝置6比對該第一感測訊號及該第二感測訊號,且所得到的定位檢測結果彼此不相符時,則該控制裝置6會發出一警示訊號。In some embodiments, when the control device 6 compares the first sensing signal and the second sensing signal, and the obtained positioning detection results are consistent with each other, the control device 6 will send a stop signal to cause The
綜上所述,本新型具有定位系統的蒸鍍機台利用該第一定位感測系統4以及該第二定位感測系統5分別針對該傳動軸322以及該底盤齒輪311的轉動情形進行感測,而以不同的定位感測方式各自評估該坩堝盤2的轉動情形,再經由該控制裝置6交互比對該第一感測訊號及該第二感測訊號以對定位結果進行雙重確認,而能提升定位感測的準確性,故確實可達成本新型的目的。To sum up, the new evaporation deposition machine with a positioning system of the present invention uses the first
惟以上所述者,僅為本新型的實施例而已,當不能以此限定本新型實施的範圍,凡是依本新型申請專利範圍及專利說明書內容所作的簡單的等效變化與修飾,皆仍屬本新型專利涵蓋的範圍內。However, the above are only examples of the present invention, and should not be used to limit the scope of the present invention. All simple equivalent changes and modifications made based on the patent scope of the present invention and the content of the patent specification are still within the scope of the present invention. Within the scope covered by this new patent.
10:反應腔室
2:坩堝盤
21:容槽
3:傳動組件
31:轉動單元
311:底盤齒輪
312:第一齒輪
313:第二齒輪
32:傳動單元
321:馬達
3211:轉軸
322:傳動軸
323:傳動齒輪
324:傳動定位齒輪
325、56:聯軸器
4:第一定位感測系統
41:第一定位齒輪
42:第一感測單元
421:第一感測器
43:定位輪
431:缺口
5:第二定位感測系統
51:定位轉盤
511:凹槽
52:第二感測器
53:被動齒輪
54:第二傳動齒輪
55:第二定位齒輪
6:控制裝置10: Reaction chamber
2: Crucible plate
21: Container
3: Transmission components
31: Rotating unit
311: Chassis gear
312:First gear
313: Second gear
32: Transmission unit
321: Motor
3211:Shaft
322: Drive shaft
323: Transmission gear
324:
本新型的其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一示意圖,說明本新型具有定位系統的蒸鍍機台的一實施例; 圖2是一俯視示意圖,說明該蒸鍍機台的一坩堝盤; 圖3是一俯視示意圖,說明該蒸鍍機台的一第一定位齒輪、一定位輪,及一第一感測單元;及 圖4是一俯視示意圖,說明該蒸鍍機台的一定位轉盤,及一第二感測器。Other features and functions of the present invention will be clearly presented in the embodiments with reference to the drawings, in which: Figure 1 is a schematic diagram illustrating an embodiment of the evaporation machine with a positioning system of the present invention; Figure 2 is a A top view schematic diagram illustrates a crucible plate of the evaporation deposition machine; Figure 3 is a top view schematic diagram illustrating a first positioning gear, a positioning wheel, and a first sensing unit of the evaporation deposition machine; and Figure 4 is A top view schematic diagram illustrating a positioning turntable and a second sensor of the evaporation deposition machine.
10:反應腔室 10: Reaction chamber
2:坩堝盤 2: Crucible plate
3:傳動組件 3: Transmission components
31:轉動單元 31: Rotating unit
311:底盤齒輪 311: Chassis gear
312:第一齒輪 312:First gear
313:第二齒輪 313: Second gear
32:傳動單元 32: Transmission unit
321:馬達 321: Motor
3211:轉軸 3211:Shaft
322:傳動軸 322: Drive shaft
323:傳動齒輪 323: Transmission gear
324:傳動定位齒輪 324: Transmission positioning gear
325、56:聯軸器 325, 56: Coupling
4:第一定位感測系統 4: First positioning sensing system
41:第一定位齒輪 41: First positioning gear
42:第一感測單元 42: First sensing unit
421:第一感測器 421: First sensor
43:定位輪 43: Positioning wheel
5:第二定位感測系統 5: Second positioning sensing system
51:定位轉盤 51: Positioning turntable
511:凹槽 511: Groove
52:第二感測器 52: Second sensor
53:被動齒輪 53: Passive gear
54:第二傳動齒輪 54:Second transmission gear
55:第二定位齒輪 55:Second positioning gear
6:控制裝置 6:Control device
Claims (8)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112210846U TWM650249U (en) | 2023-10-06 | 2023-10-06 | Evaporation machine with positioning system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112210846U TWM650249U (en) | 2023-10-06 | 2023-10-06 | Evaporation machine with positioning system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWM650249U true TWM650249U (en) | 2024-01-01 |
Family
ID=90455675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112210846U TWM650249U (en) | 2023-10-06 | 2023-10-06 | Evaporation machine with positioning system |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWM650249U (en) |
-
2023
- 2023-10-06 TW TW112210846U patent/TWM650249U/en unknown
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