TWM632517U - Plasma processing device and insulation window - Google Patents

Abstract

A plasma processing device and an insulating window, wherein the insulating window includes: an insulating window body; a gas channel opened in the insulating window body; a hot gas source and a cold gas source communicated with the gas channel for supplying The hot gas and the cold gas are transported in the gas channel; the valve device is connected with the hot gas source and the cold gas source, and is used to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel, so as to control the The temperature of the gas in the gas channel; the controller, connected with the valve device, is used to control the valve device to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel. The temperature of the insulating window is dynamically controllable and has good uniformity.

Description

Plasma processing device and insulating window

The invention relates to the field of semiconductors, in particular to a plasma processing device and an insulating window.

Plasma processing devices are widely used in the field of semiconductors for high-precision processing of substrates to be processed, such as plasma etching and chemical vapor deposition. Among them, inductively coupled plasma processing devices have high etching rates and selectivity The characteristics of high ratio and large-area uniformity are widely used in the field of silicon etching. The inductively coupled plasma processing device includes an insulating window, and a plasma etching process is performed in the inductively coupled plasma processing device. During the plasma etching process, for a more stable process, the insulating window needs to be heated and maintained at a relatively High temperature to match the temperature of the plasma in the reaction chamber of the plasma processing apparatus. Usually, the method for controlling the temperature of the insulating window includes: attaching a heater on the surface of the insulating window, and installing a cooling fan to maintain balance. Due to the limited exhaust, when the plasma is strong, the insulation window is still in an uncontrollable excess of the set value even when the heater has no output.

Therefore, it is necessary to provide a method capable of dynamically and controllably adjusting the temperature of the insulating window.

The technical problem solved by the invention is to provide a plasma processing device and an insulating window to dynamically and controllably adjust the temperature of the insulating window.

In order to solve the above technical problems, this invention provides an insulating window, which includes: an insulating window body; a gas channel opened in the insulating window body; a hot gas source and a cold gas source connected to the gas channel for supplying Conveying hot and cold gas in the gas channel; the valve A device, connected with the hot gas source and the cold gas source, is used to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel, so as to control the temperature of the gas in the gas channel; the controller, and The valve device is connected to control the valve device to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel.

Preferably, it also includes: a temperature sensor for detecting the temperature of the insulating window body and sending the detection result to the controller, and the controller sends the temperature sensor to the valve device according to the detection result and the target temperature The indication signal indicates to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel.

Preferably, the temperature range of the hot gas of the hot gas source is: 100 degrees Celsius to 150 degrees Celsius; the temperature range of the cold gas of the cold gas source is: 0 degrees Celsius to 40 degrees Celsius.

Preferably, the gas channel includes: an annular channel and a radial channel located in the annular channel, both ends of the radial channel communicate with the annular channel, and the gas channel is also provided with an inlet communicating with the annular channel and the outlet, the inlet and the outlet are isolated from each other; the hot gas source and the cold gas source communicate with the inlet, and after the hot gas of the hot gas source and the cold gas of the cold gas source are transported in the gas channel, output through the outlet.

Preferably, the gas channel is a helical channel, and the helical channel includes an inlet and an outlet, the inlet is an end inside the helical channel, and the outlet is an end outside the helical channel.

Preferably, it also includes: a confluence input pipeline, used for merging the hot gas from the hot gas source and the cold gas from the cold gas source, and transporting the mixed gas to the gas channel.

Preferably, it also includes: an output pipeline for outputting the gas in the gas channel.

Preferably, the output pipeline is in communication with a hot gas source.

Preferably, the material of the insulating window includes: ceramic material or quartz.

Correspondingly, the present invention also provides a plasma processing device, comprising: a reaction chamber including a side wall of the reaction chamber; the above-mentioned insulating window located above the side wall of the reaction chamber; and an inductance coil located above the insulating window.

Preferably, it also includes: a radio frequency power source electrically connected to the inductance coil; a bias power source electrically connected to the base.

Compared with the conventional technology, the technical solution of the embodiment of the invention has the following beneficial effects: In the plasma processing device provided by the technical solution of the invention, since a gas channel is added in the insulating window body, the gas channel is used for Conveying the cold air provided by the cold air source and the hot air provided by the hot air source, the controller controls the valve device to adjust the mixing ratio of the hot air and cold air flowing in the air channel, which is beneficial to make the actual temperature of the insulating window consistent with the set temperature , and can dynamically and controllably adjust the temperature of the insulating window.

Further, the insulating window is heated by hot gas instead of the resistance wire, which is beneficial to avoid the interference of the resistance wire to the radio frequency.

10: Reaction chamber

11: opening

12: Insulation window

120,201: insulating window body

121a: Ring channel

121b: radial channel

122,202: hot gas source

123,203: cold gas source

124,213: cold gas piping

125, 212: hot gas piping

126,214: Confluent input line

127: output pipeline

13: Inductive coupling coil

130,240: temperature sensor

14: Lining

140,220: Controller

15: Gas injection port

150,230: valve device

16: RF power source

17,19: RF matching network

18: Bias RF power source

210: gas channel

3: Bottom electrode element

A, C: Entrance

B, D: export

W: Substrate

FIG. 1 is a schematic structural diagram of a plasma processing device of the present invention; FIG. 2 is a schematic structural diagram of an insulating window of the present invention; and FIG. 3 is a schematic structural diagram of another insulating window of the present invention.

As stated in the prior art, there is an urgent need to dynamically and controllably adjust the temperature of the insulating window in an insulating window. For this reason, the present creation is dedicated to providing an insulating window and a plasma processing device including the insulating window, which will be described in detail below : FIG. 1 is a schematic structural diagram of a plasma processing device of the present invention.

Please refer to FIG. 1 , the plasma processing apparatus 1 includes: a reaction chamber 10 , which is a vacuum environment, and includes a sidewall of the reaction chamber; an insulating window 12 is located above the sidewall of the reaction chamber.

The inside of the reaction chamber 10 is a vacuum environment, which includes a substantially cylindrical reaction chamber sidewall made of metal material, and an opening 11 is provided on the reaction chamber sidewall to allow the substrate to enter and exit. An insulating window 12 is arranged above the side wall of the reaction chamber, and the material of the insulating window 12 includes ceramic material Or quartz, the inductive coupling coil 13 is arranged above the insulating window 12 , and the radio frequency power source 16 applies the radio frequency voltage to the inductive coupling coil 13 through the radio frequency matching network 17 .

A liner 14 is arranged inside the reaction chamber 10 to protect the inner wall of the reaction chamber 10 from being corroded by plasma. A gas injection port 15 is provided on the side wall of the reaction chamber near the insulating window 12. In other embodiments, the insulating window 12 can also be A gas injection port 15 is set in the central area of the gas injection port 15, and the gas injection port 15 is used to inject the reaction gas into the reaction chamber 10. The radio frequency power of the radio frequency power source 16 drives the inductively coupled coil 13 to generate a strong high frequency alternating magnetic field, so that the reaction chamber 10 The internal low-pressure reactive gas is ionized to produce a plasma. A lower electrode element 3 is arranged at the bottom of the reaction chamber 10 to carry the substrate W to be processed. Plasma contains a large number of active particles such as electrons, ions, excited atoms, molecules, and free radicals. The above-mentioned active particles can undergo various physical and chemical reactions with the surface of the substrate to be treated, resulting in changes in the morphology of the substrate surface. , which completes the etching process. A bias RF power source 18 applies a bias RF voltage to the susceptor through an RF matching network 19 for controlling the bombardment direction of charged particles in the plasma.

Because the plasma is filled between the insulating window 12 and the lower electrode element 3, the bottom of the insulating window 12 will be in contact with the plasma, and the intensity of the plasma is higher, which will make the temperature of the insulating window 12 higher, so The level and uniformity of the temperature of the insulating window 12 will affect the stability of the process. Therefore, it is urgent to improve the controllability of the temperature of the insulating window 12 to improve the controllability and stability of the process.

How to improve the temperature controllability of the insulating window 12 is described in detail as follows: FIG. 2 is a schematic structural diagram of an insulating window of this invention.

Please refer to Fig. 2, the insulating window 12 includes: an insulating window body 120; a gas channel, opened in the insulating window body 120; a hot gas source 122 and a cold gas source 123, connected with the gas channel, for Conveying hot gas and cold gas in the gas channel; valve device 150, connected with the hot gas source 122 and the cold gas source 123, is used to adjust the mixing ratio of the hot gas relative to the cold gas circulating in the gas channel, so as to Control the gas in the gas channel The temperature of the body; the controller 140, connected with the valve device 150, is used to control the valve device 150 to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel.

The increase of the temperature of the insulating window 12 depends on the heating of the hot gas of the hot gas source 122 and the plasma below the insulating window 12, and the reduction of the temperature of the insulating window 12 depends on the cooling of the cold gas of the cold gas source 123 . Wherein, the temperature range of the hot gas of the hot gas source 122 is: 100 degrees Celsius to 150 degrees Celsius; the temperature range of the cold gas of the cold gas source 123 is: 0 degrees Celsius to 40 degrees Celsius.

The insulating window 12 also includes: a temperature sensor 130, the temperature sensor 130 is used to detect the temperature of the surface of the insulating window body 120, and send the detected result to the controller 140. The controller 140 sends an instruction signal to the valve device 150 according to the detection result and the target temperature, instructing to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel. For example: when the temperature sensor 130 detects the temperature of the insulating window body 120 and sends it to the controller 140, the controller 140 judges that the temperature of the detection result is lower than the target temperature according to the detection result and the target temperature. The mixing ratio of the gas, while reducing the mixing ratio of the cold gas, is conducive to making the temperature of the insulating window body 120 consistent with the target temperature; on the contrary, when the controller 140 judges that the temperature of the detection result is higher than the target temperature according to the detection result and the target temperature When the target temperature is reached, the temperature of the insulating window body 120 can be consistent with the target temperature by reducing the mixing ratio of the hot gas and increasing the mixing ratio of the cold gas. Through the above detection and feedback, it is beneficial to make the temperature of the insulating window 12 consistent with the target, and to improve the controllability of the temperature of the insulating window 12 .

In this embodiment, the gas channel includes: an annular channel 121a and a radial channel 121b located in the annular channel 121a, the two ends of the radial channel 121b communicate with the annular channel 121a, and the gas channel is also provided with There is an inlet A and an outlet B communicating with the annular channel 121a, and the inlet A and the outlet B are isolated from each other; the hot gas source 122 and the cold gas source 123 are communicated with the inlet A, and the hot gas source 122 After the hot gas and cold gas from the cold gas source 123 are transported in the gas channel, they are output through the outlet B. Due to the radiation in the gas channel The radial channels 121b are uniformly arranged, so that the gas flowing in the gas channels can uniformly control the temperature of the insulating window body 120 .

Moreover, in this embodiment, the insulating window body 120 is heated by hot gas, which is beneficial to avoid the influence of radio frequency interference by the resistance wire heating.

In this embodiment, the inlet A and the outlet B are disposed on the sidewall of the insulating window body 120 . In other embodiments, the inlet A and the outlet B are disposed above or below the insulating window body 120 .

In this embodiment, the hot gas source 122 delivers hot gas through a hot gas pipeline 125, the cold gas source 123 delivers cold gas through a cold gas pipeline 124, and the hot gas and cold gas pass through a confluence input pipeline 126 and The inlet A is connected, and is used to deliver mixed hot gas and cold gas into the gas channel. Since the hot gas and cold gas are mixed before entering the gas channel, making the temperature of the gas more uniform is beneficial to better control the temperature of the insulating window body 120 .

In addition, in this embodiment, the gas flowing out through the outlet B of the gas channel is transported to the hot gas source 122 by the output pipeline 127, instead of being directly discharged into the atmosphere, which is beneficial to the recycling of the gas and avoids resources waste.

In other embodiments, the gas flowing out through the outlet of the gas channel is vented directly to the atmosphere.

Fig. 3 is a structural schematic diagram of another insulating window of this invention.

Please refer to FIG. 3 , the insulating window 12 includes: an insulating window body 201; a gas channel 210, which is opened in the insulating window body 201; a hot gas source 202 and a cold gas source 203, communicated with the gas channel 210, for The gas channel 210 transports hot gas and cold gas; the valve device 230 is connected with the hot gas source 202 and the cold gas source 203, and is used to adjust the ratio of the hot gas flowing in the gas channel 210 relative to the cold gas. Mixing ratio, to control the temperature of the gas in the gas passage 210; the controller 220, connected with the valve device 230, is used to control the The valve device 230 is used to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel 210 .

In this embodiment, the gas channel 210 is a spiral channel, and the spiral channel includes an inlet C and an outlet D, the inlet C is the end of the spiral channel, and the outlet D is the end of the spiral channel. the end of. The hot gas source 202 delivers hot gas through a hot gas pipeline 212 , the cold gas source 203 delivers cold gas through a cold gas pipeline 213 , and the hot gas and cold gas communicate with the inlet C through a combined input pipeline 214 . It also includes: a temperature sensor 240, which is used to measure the temperature of the surface of the insulating window body 201, and sends the detected result to the controller 220, and the controller 220 sends a signal to the valve device according to the detection result and the target temperature. 230 sends an instruction signal to instruct to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel 210 . For example: when the temperature sensor 240 detects the temperature of the insulating window body 201 and sends it to the controller 220, the controller 220 judges that the temperature of the detection result is lower than the target temperature according to the detection result and the target temperature. The mixing ratio of the gas, while reducing the mixing ratio of the cold gas, is conducive to making the temperature of the insulating window body 201 consistent with the target temperature; on the contrary, when the controller 220 judges that the temperature of the detection result is higher than the target temperature according to the detection result and the target temperature When the target temperature is reached, the temperature of the insulating window body 201 can be consistent with the target temperature by decreasing the mixing ratio of the hot gas and increasing the mixing ratio of the cold gas. Through the above detection and feedback, it is beneficial to make the temperature of the insulating window 12 consistent with the target, and it is beneficial to improve the controllability of the temperature of the insulating window 12 .

Moreover, since the intensity of the plasma is the strongest in the central region of the insulating window 12, the temperature of the central region of the insulating window 12 is higher than that of the edge region, and the temperature of the mixed gas is the lowest when it first enters the gas channel 210. Therefore, the The mixed hot gas and cold gas first enter the area above the central area of the insulating window 12, then pass through the gas channel 210 in turn, and output from the outlet D, which is beneficial to improve the temperature consistency between the edge area and the central area of the insulating window 12.

Although the invention is disclosed as above, the invention is not limited thereto. Anyone with ordinary knowledge in the technical field to which this creation belongs will not depart from it. Various changes and modifications can be made within the spirit and scope of this creation, so the protection scope of this creation should be based on the scope limited by the scope of the patent application.

12: Insulation window

120: insulation window body

121a: Ring channel

121b: radial channel

122: hot gas source

123: cold gas source

124: Cold gas pipeline

125: Hot gas pipeline

126: confluence input pipeline

127: output pipeline

130: temperature sensor

140: Controller

150: valve device

A: Entrance

B: export

Claims (11)

An insulating window, which includes: an insulating window body; a gas channel opened in the insulating window body; a hot gas source and a cold gas source communicated with the gas channel for delivering a Hot gas and a cold gas; a valve device, connected with the hot gas source and the cold gas source, used to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel, to control the gas channel the temperature of the gas; and a controller, connected to the valve device, for controlling the valve device to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel. The insulating window according to claim 1, further comprising: a temperature sensor for detecting the temperature of the insulating window body and sending a detection result to the controller, the controller according to the detection result and a The target temperature sends an indication signal to the valve device, instructing to adjust the mixing ratio of the hot gas relative to the cold gas flowing in the gas channel. The insulating window as described in Claim 1, wherein the temperature range of the hot gas of the hot gas source is: 100 degrees Celsius to 150 degrees Celsius; the temperature range of the cold gas of the cold gas source is: 0 degrees Celsius to 40 degrees Celsius. The insulating window as described in claim 1, wherein the gas channel includes: an annular channel and a radial channel located in the annular channel, both ends of the radial channel communicate with the annular channel, and the gas channel is also provided with There is an inlet and an outlet communicating with the annular channel, the inlet and the outlet are isolated from each other; the hot gas source and the cold gas source are communicated with the inlet, the hot gas and the cold gas source of the hot gas source After the cold gas is transported in the gas channel, it is output through the outlet. The insulating window according to claim 1, wherein the gas channel is a spiral channel, the spiral channel includes an inlet and an outlet, and the inlet is an end in the spiral channel, The outlet is the outer end of the helical channel. The insulating window as described in claim 1 or 4 or 5, further comprising: a confluence input pipeline for merging the hot gas of the hot gas source and the cold gas of the cold gas source, and mixing the The gas is delivered to the gas channel. The insulating window according to claim 6, further comprising: an output pipeline for outputting the gas in the gas channel. The insulating window of claim 7, wherein the output line is in communication with the hot gas source. The insulating window according to claim 1, wherein the material of the insulating window includes: ceramic material or quartz. A plasma processing device, comprising: a reaction chamber including a side wall of the reaction chamber; an insulating window as described in any one of claim 1 to claim 9, located above the side wall of the reaction chamber; and a The inductance coil is located above the insulating window. The plasma processing device according to claim 10, further comprising: a radio frequency power source electrically connected to the inductance coil; a base disposed at the bottom of the reaction chamber; and a bias power source connected to the The base is electrically connected.

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