TWM596759U - Trichlorosilane generator - Google Patents

Trichlorosilane generator Download PDF

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TWM596759U
TWM596759U TW108214593U TW108214593U TWM596759U TW M596759 U TWM596759 U TW M596759U TW 108214593 U TW108214593 U TW 108214593U TW 108214593 U TW108214593 U TW 108214593U TW M596759 U TWM596759 U TW M596759U
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fluid
fluids
tank
silicon tetrachloride
trichlorosilane
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TW108214593U
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蘇建榮
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實聯精密化學股份有限公司
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Abstract

本創作所提供的三氯矽烷生成設備,可以回收再利用反應槽內未完全反應的四氯化矽材料與氫氣材料而減少材料的浪費,並可將反應槽內未完全反應的冶金級矽材料析出,而避免反應產物的輸出管路受到反應槽內未完全反應的冶金級矽材料的堵塞,藉以增加三氯矽烷生成設備的使用壽命。另外,本創作還可以將反應產物中的次產物析出,以留下三氯矽烷的主產物,藉以提高三氯矽烷的生成物的純度。The trichlorosilane production equipment provided by this creation can recycle and reuse the incompletely reacted silicon tetrachloride material and hydrogen material in the reaction tank to reduce the waste of materials, and can also react the incompletely reacted metallurgical grade silicon material in the reaction tank Precipitation, and to avoid the output pipe of the reaction product from being blocked by metallurgical grade silicon material that has not completely reacted in the reaction tank, thereby increasing the service life of the trichlorosilane production equipment. In addition, in this creation, the secondary products in the reaction product can be precipitated to leave the main product of trichlorosilane, thereby improving the purity of the product of trichlorosilane.

Description

三氯矽烷生成設備Trichlorosilane production equipment

本創作係為一種三氯矽烷生成設備,詳言之,係為一種具有可以去除金屬固廢及矽粉的三氯矽烷生成設備。This creation is a trichlorosilane production equipment. In detail, it is a trichlorosilane production equipment that can remove solid metal waste and silica powder.

按照現有三氯矽烷生成設備及其方法中,一般都會將冶金級矽材料(矽含量90%以上,又稱MGS)、氫氣材料(H 2)及四氯化矽材料(SiCl 4)三者分別置入反應槽,進行反應式為Si+2H 2+3SiCl 4→4SiHCl 3的反應而生成三氯矽烷(SiHCl 3),由於冶金級矽材料包含有其他也會參與反應的非含矽材料,所以除了生成三氯矽烷之外也會產生例如為重沸物或輕沸物的次產物,且反應槽中未完全反應的冶金級矽材料、氫氣材料、四氯化矽材料常會伴隨著已經生成的三氯矽烷及次產物離開反應槽而進入輸出管路中,如此,可能會造成未完全反應的四氯化矽材料與氫氣材料的浪費、輸出管路受到冶金級矽材料的堵塞、以及生成物夾雜次產物的液體混合物而影響純度,這些議題都是現有三氯矽烷生成設備經常發生的問題,如此,不僅增加了三氯矽烷生成設備反應槽及輸出管路的保養費用、無法回收再利用未完全反應就離開氫氯化反應槽的四氯化矽材料與氫氣材料,更因無其相關設備能夠將次產物與三氯矽烷分離而降低了三氯矽烷的生成物的純度。 According to the existing trichlorosilane production equipment and methods, metallurgical grade silicon materials (silicon content above 90%, also known as MGS), hydrogen material (H 2 ) and silicon tetrachloride material (SiCl 4 ) are generally separated Placed in the reaction tank, the reaction formula is Si+2H 2 +3SiCl 4 →4SiHCl 3 to generate trichlorosilane (SiHCl 3 ). Since the metallurgical grade silicon material contains other non-silicon-containing materials that will also participate in the reaction, so In addition to the formation of trichlorosilane, secondary products such as heavy or light boilers are also produced, and metallurgical grade silicon materials, hydrogen materials, and silicon tetrachloride materials that have not completely reacted in the reaction tank are often accompanied by the generated three Chlorosilane and by-products leave the reaction tank and enter the output pipeline, which may cause the waste of incompletely reacted silicon tetrachloride material and hydrogen material, the output pipeline is blocked by metallurgical grade silicon material, and the product is mixed The liquid mixture of by-products affects the purity. These issues are problems that often occur in existing trichlorosilane production equipment. This not only increases the maintenance cost of the reaction tank and output pipeline of the trichlorosilane production equipment, and cannot be recycled. Incomplete The silicon tetrachloride material and the hydrogen material that leave the hydrochlorination reaction tank after the reaction can reduce the purity of the product of trichlorosilane due to the separation of secondary products and trichlorosilane without related equipment.

因此,如何提供一種三氯矽烷生成設備,以解決上述種種問題,遂為現在業界亟欲挑戰克服的技術議題。Therefore, how to provide a trichlorosilane production equipment to solve the above problems has become a technical issue that the industry is eager to challenge and overcome.

鑒於上述先前技術之缺點,本創作係提供一種三氯矽烷生成設備,係包括:一反應槽,該反應槽係具有一槽內空間,該槽內空間係提供導入一冶金級矽材料、一氫氣材料與一四氯化矽材料,並使導入的該冶金級矽材料、該氫氣材料與該四氯化矽材料反應而生成一反應產物;一輸出管路,該輸出管路係連通該槽內空間,以輸出來自於該槽內空間的一第一二流體,其中,該第一二流體包含該反應產物的部分、該冶金級矽材料的部分、該氫氣材料的部分與該四氯化矽材料的部分,而該反應產物係包含一三氯矽烷與一次產物;一第一流體分離構件,該第一流體分離構件係連通該輸出管路以接收該第一二流體,並對該第一二流體提供流體分離,而將該第一二流體分離出一第二七流體與一第二三流體,其中,該第二七流體包含該冶金級矽材料的部分;一第一流體處理構件,該第一流體處理構件係連通該第一流體分離構件以接收該第二三流體,並對該第二三流體提供氫氣回收,而回收該第二三流體中的該氫氣材料的部分以生成一第三四流體;一第二流體分離構件,該第二流體分離構件係連通該第一流體處理構件以接收該第三四流體,並對該第三四流體提供流體分離,而將該第三四流體分離出一第四五流體與一第四六流體;一第二流體處理構件,該第二流體處理構件係連通該第二流體分離構件以接收該第四五流體,並對該第四五流體提供四氯化矽回收,而回收該第四五流體中的該四氯化矽材料的部分,以生成一第五六流體與該三氯矽烷的成品;以及一第三流體處理構件,該第三流體處理構件係分別連通該第二流體分離構件與該第二流體處理構件以接收該第四六流體與該第五六流體,並對該第四六流體與該第五六流體提供四氯化矽回收,而回收該第四六流體與該第五六流體中的該四氯化矽材料的部分,以生成一第六七流體,其中,該第六七流體包含該第四六流體與該第五六流體中的該次產物的部分;以及一三氯矽烷成品槽,該三氯矽烷成品槽E係提供收容該三氯矽烷的成品。In view of the above-mentioned shortcomings of the prior art, the present invention provides a trichlorosilane production equipment, including: a reaction tank, the reaction tank has a space in the tank, the space in the tank provides the introduction of a metallurgical grade silicon material, a hydrogen Material and a silicon tetrachloride material, and the introduced metallurgical-grade silicon material and the hydrogen material react with the silicon tetrachloride material to form a reaction product; an output pipeline, the output pipeline is connected to the tank Space to output a first two fluids from the space in the tank, wherein the first two fluids contain the reaction product part, the metallurgical grade silicon material part, the hydrogen material part and the silicon tetrachloride Part of the material, and the reaction product includes a trichlorosilane and a primary product; a first fluid separation member, the first fluid separation member communicates with the output line to receive the first two fluids, and to the first The two fluids provide fluid separation, and the first two fluids are separated into a second seven fluid and a second three fluid, wherein the second seven fluid includes a portion of the metallurgical grade silicon material; a first fluid processing member, The first fluid processing member communicates with the first fluid separation member to receive the second three fluids, and provides hydrogen recovery for the second three fluids, and recovers a portion of the hydrogen material in the second three fluids to generate a A third fluid; a second fluid separation member, the second fluid separation member communicates with the first fluid processing member to receive the third fluid, and provides fluid separation for the third fluid, and the third fluid Four fluids separate a fourth fluid and a fourth fluid; a second fluid processing member, the second fluid processing member communicates with the second fluid separation member to receive the fourth fluid and the fourth fluid Five fluids provide silicon tetrachloride recovery, and recover a portion of the silicon tetrachloride material in the fourth five fluids to generate a finished product of the fifth and sixth fluids and the trichlorosilane; and a third fluid processing member, The third fluid treatment member communicates the second fluid separation member and the second fluid treatment member respectively to receive the fourth and sixth fluids and the fifth and sixth fluids, and provides the fourth and sixth fluids and the fifth and sixth fluids Silicon tetrachloride is recovered, and the portions of the silicon tetrachloride material in the fourth and sixth fluids and the fifth and sixth fluids are recovered to generate a sixth and seventh fluids, wherein the sixth and seventh fluids include the fourth and sixth fluids The fluid and the part of the secondary product in the fifth and sixth fluids; and a trichlorosilane finished product tank, the trichlorosilane finished product tank E is provided to contain the trichlorosilane finished product.

可選擇性地,針對前述的三氯矽烷生成設備,還包括一固廢處理構件,該固廢處理構件係連通該第一流體分離構件,以對該第二七流體中的固廢提供收集處理;該固廢處理構件還連通該第三流體處理構件,以對該第六七流體中的固廢提供收集處理。Optionally, for the aforementioned trichlorosilane production equipment, it further includes a solid waste treatment member connected to the first fluid separation member to provide collection treatment for the solid waste in the second seven fluids The solid waste treatment member also communicates with the third fluid treatment member to provide collection treatment for the solid waste in the sixth and seventh fluids.

可選擇性地,針對前述的三氯矽烷生成設備,其中,該第二流體處理構件係具有一第一階段析出構件、一第二階段析出構件,該第一階段析出構件係接收該第四五流體,以提供析出該第四五流體中具有一第一沸點的該次產物的部分與一階段析出流體;該第二階段次產物析出構件係接收該階段析出流體,以提供析出該階段析出流體中具有一第二沸點的該次產物的部分,而生成一第五八流體與該三氯矽烷的成品,其中,該第一沸點與該第二沸點不同使該三氯矽烷的成品純化。Optionally, for the aforementioned trichlorosilane production equipment, wherein the second fluid treatment member has a first stage precipitation member and a second stage precipitation member, the first stage precipitation member receives the fourth fifth A fluid to provide a portion of the forty-fifth fluid with a first boiling point of the secondary product and a staged precipitated fluid; the second stage secondary product precipitation member receives the staged precipitated fluid to provide the staged precipitated fluid A part of the secondary product having a second boiling point generates a 58th fluid and the finished product of trichlorosilane, wherein the first boiling point and the second boiling point are different to purify the finished product of trichlorosilane.

可選擇性地,針對前述的三氯矽烷生成設備,其中,該第一階段析出構件係包含有一回收塔,該回收塔係接收該第四五流體中的該四氯化矽材料的部分以提供四氯化矽的回收,並回收具有該第一沸點的該次產物的部分以生成該第五六流體,該回收塔係連通該第三流體處理構件,以將該第五六流體導入該第三流體處理構件中。Optionally, for the aforementioned trichlorosilane production equipment, wherein the first-stage precipitation component includes a recovery tower that receives a portion of the silicon tetrachloride material in the fourth to fifth fluid to provide The recovery of silicon tetrachloride, and recovering the portion of the secondary product with the first boiling point to generate the fifth and sixth fluids, the recovery tower is connected to the third fluid processing member to introduce the fifth and sixth fluids into the first Three fluid handling components.

可選擇性地,針對前述的三氯矽烷生成設備,還包括一廢氣處理構件,該廢氣處理構件係連通該第二流體處理構件以接收該第五八流體,並對該第五八流體提供酸鹼中和,以產生符合排放標準的廢氣;該廢氣處理構件還連通該固廢處理構件,以接收該固廢處理構件中的廢氣,並對該固廢處理構件中的廢氣提供酸鹼中和,以產生符合排放標準的廢氣。Optionally, for the aforementioned trichlorosilane production equipment, further comprising an exhaust gas treatment member, the exhaust gas treatment member communicates with the second fluid treatment member to receive the fifth fluid, and provides acid to the fifth fluid Alkali neutralization to produce exhaust gas that meets emission standards; the exhaust gas treatment member also communicates with the solid waste treatment member to receive the exhaust gas from the solid waste treatment member and provide acid-base neutralization to the exhaust gas from the solid waste treatment member To produce exhaust gas that meets emission standards.

可選擇性地,針對前述的三氯矽烷生成設備,還包括一四氯化矽材料回收構件,該四氯化矽材料回收構件係連通該槽內空間與該第二流體處理構件,以將該第四五流體中的該四氯化矽材料的部分與該第一沸點的該次產物的四氯化矽的部分導入該槽內空間再利用,而參與該槽內空間中的反應生成該反應產物;該四氯化矽材料回收構件還連通該槽內空間與該第三流體處理構件,以將該第四六流體與該第五六流體中的該四氯化矽材料的部分導入該槽內空間再利用,而參與該槽內空間中的反應生成該反應產物。Optionally, for the aforementioned trichlorosilane production equipment, a silicon tetrachloride material recovery member is further included. The silicon tetrachloride material recovery member communicates the space in the tank with the second fluid treatment member to The part of the silicon tetrachloride material in the fourth fluid and the part of the silicon tetrachloride of the secondary product of the first boiling point are introduced into the space in the tank for reuse, and participate in the reaction in the space in the tank to generate the reaction Product; the silicon tetrachloride material recovery member also communicates with the space in the tank and the third fluid processing member to introduce the portion of the silicon tetrachloride material in the fourth and sixth fluids and the fifth and sixth fluids into the tank The inner space is reused, and participates in the reaction in the space in the tank to generate the reaction product.

可選擇性地,針對前述的三氯矽烷生成設備,其中,該第一流體處理構件係具有一氫氣回收構件,該氫氣回收構件係分別連通該槽內空間與該第一流體分離構件,以將該第二三流體中的該氫氣材料的回收部分導入該槽內空間再利用,而參與該槽內空間中的反應生成該反應產物。Optionally, for the aforementioned trichlorosilane production equipment, wherein the first fluid treatment member has a hydrogen recovery member, the hydrogen recovery member respectively communicates the space in the tank with the first fluid separation member to The recovered part of the hydrogen material in the second and third fluids is introduced into the space in the tank for reuse, and participates in the reaction in the space in the tank to generate the reaction product.

可選擇性地,針對前述的三氯矽烷生成設備,還包括一預加熱構件,該預加熱構件係預加熱該氫氣材料與該四氯化矽材料,使導入該槽內空間的該氫氣材料與該四氯化矽材料符合一預定反應溫度。Optionally, for the aforementioned trichlorosilane generating equipment, it further includes a pre-heating member that pre-heats the hydrogen material and the silicon tetrachloride material, so that the hydrogen material introduced into the space in the tank and The silicon tetrachloride material meets a predetermined reaction temperature.

可選擇性地,針對前述的三氯矽烷生成設備,還包括一預加壓構件,該預加壓構件係預加壓該氫氣材料與該四氯化矽材料,使導入該槽內空間的該氫氣材料與該四氯化矽材料符合一預定反應壓力。Optionally, for the aforementioned trichlorosilane generating equipment, it further includes a pre-pressurizing member that pre-pressurizes the hydrogen material and the silicon tetrachloride material so that the lead-in to the space in the tank The hydrogen material and the silicon tetrachloride material meet a predetermined reaction pressure.

可選擇性地,針對前述的三氯矽烷生成設備,其中,該第一流體處理構件係具有一結晶構件,該結晶構件係使該第二三流體中的該次產物的部分冷卻結晶轉換成固體。Optionally, for the aforementioned trichlorosilane generating apparatus, wherein the first fluid processing member has a crystalline member that converts a part of the cooling crystallization of the secondary product in the second three fluid into a solid .

可選擇性地,針對前述的三氯矽烷生成設備,其中,該第一流體分離構件與該第二流體分離構件係為離心式分離器。Optionally, for the aforementioned trichlorosilane production equipment, wherein the first fluid separation member and the second fluid separation member are centrifugal separators.

相較於先前技術,本創作所提供的三氯矽烷生成設備,係利用四氯化矽回收構件與氫氣回收構件可以回收再利用反應槽內未完全反應的四氯化矽材料與氫氣材料而減少材料的浪費,並利用離心式分離器將反應槽內未完成反應的冶金級矽材料與反應產物做分離,而避免反應產物的輸出管路受到反應槽內未完全反應的冶金級矽材料的堵塞,因此,可以增加三氯矽烷生成設備的使用壽命。另外,本創作還可以將反應產物中的次產物析出,以純化三氯矽烷的主產物,藉以提高三氯矽烷的生成物的純度。Compared with the prior art, the trichlorosilane production equipment provided by this work uses the silicon tetrachloride recovery member and the hydrogen recovery member to recover and reuse the incompletely reacted silicon tetrachloride material and hydrogen material in the reaction tank. The waste of materials, and the centrifugal separator is used to separate the metallurgical grade silicon material that has not completed the reaction in the reaction tank from the reaction product, so as to avoid the output pipe of the reaction product from being blocked by the metallurgical grade silicon material that has not completely reacted in the reaction tank Therefore, the service life of trichlorosilane production equipment can be increased. In addition, in this creation, the secondary products in the reaction product can also be precipitated to purify the main product of trichlorosilane, thereby improving the purity of the product of trichlorosilane.

以下內容將搭配圖式,藉由特定的具體實施例說明本創作之技術內容,熟悉此技術之人士可由本說明書所揭示之內容輕易地了解本創作之其他優點與功效。本創作亦可藉由其他不同的具體實施例加以施行或應用。本說明書中的各項細節亦可基於不同觀點與應用,在不背離本創作之精神下,進行各種修飾與變更。尤其是,於圖式中各個元件的比例關係及相對位置僅具示範性用途,並非代表本創作實施的實際狀況。The following content will be combined with the drawings to illustrate the technical content of the creation by specific specific embodiments. Those familiar with this technology can easily understand other advantages and effects of the creation by the content disclosed in this specification. This creation can also be implemented or applied by other different specific embodiments. Various details in this manual can also be based on different views and applications, without making any changes and modifications without departing from the spirit of this creation. In particular, the proportional relationships and relative positions of the various elements in the drawings are for exemplary purposes only, and do not represent the actual status of the implementation of this creation.

針對本創作三氯矽烷生成設備的技術思想,請一併參閱圖1至圖3的揭露。For the technical idea of the creation of trichlorosilane production equipment, please refer to the disclosure of FIGS. 1 to 3 together.

如圖1所示,本創作的三氯矽烷生成設備係包括:反應槽1、輸出管路12、第一流體分離構件2、第一流體處理構件3、第二流體分離構件4、第二流體處理構件5、第三流體處理構件6與三氯矽烷成品槽E。As shown in FIG. 1, the trichlorosilane production equipment of the present creation includes: a reaction tank 1, an output line 12, a first fluid separation member 2, a first fluid treatment member 3, a second fluid separation member 4, a second fluid The processing member 5, the third fluid processing member 6, and the trichlorosilane finished product tank E.

具體而言,反應槽1係具有槽內空間11,如圖1至圖3所示,反應槽1係例如為氫氯化反應槽,而槽內空間11係提供導入冶金級矽材料、氫氣材料與四氯化矽材料,以使導入的冶金級矽材料、氫氣材料與四氯化矽材料可以在槽內空間11反應,而生成包含反應產物的第一二流體F12。輸出管路12係連通槽內空間11,以輸出來自於槽內空間11的第一二流體F12。應說明的是,槽內空間11內的材料可能不會完全反應(即槽內空間11內的部分材料不會參與反應),所以由槽內空間11輸出的第一二流體F12除了包含反應產物的部分,還具有槽內空間11內未完全反應的包含冶金級矽材料的部分等固體材料以及氫氣材料的部分與四氯化矽材料的部分等氣體材料。另外,於本創作的一實施例中,反應產物係包含三氯矽烷(即主產物)與次產物,其中,次產物具有包含三氯化鋁(AlCl3)、四氯化鈦(TiCl4)等重沸物以及包含氫氯酸(HCl)等輕沸物。Specifically, the reaction tank 1 has a space 11 in the tank. As shown in FIGS. 1 to 3, the reaction tank 1 is, for example, a hydrochlorination reaction tank, and the space 11 in the tank provides metallurgical grade silicon materials and hydrogen materials. And silicon tetrachloride material, so that the introduced metallurgical-grade silicon material, hydrogen material and silicon tetrachloride material can react in the space 11 of the tank to generate a first secondary fluid F12 containing the reaction product. The output pipeline 12 communicates with the space 11 in the tank to output the first two fluids F12 from the space 11 in the tank. It should be noted that the materials in the space 11 in the tank may not fully react (that is, some materials in the space 11 in the tank will not participate in the reaction), so the first two fluids F12 output from the space 11 in the tank contain reaction products It also has solid materials such as metallurgical grade silicon materials and other hydrogen materials and silicon tetrachloride materials and other gaseous materials that have not completely reacted in the space 11 in the tank. In addition, in an embodiment of the present invention, the reaction product includes trichlorosilane (ie, the main product) and a secondary product, wherein the secondary product has a weight including aluminum trichloride (AlCl3), titanium tetrachloride (TiCl4), etc. Boilers and light boilers including hydrochloric acid (HCl).

於本創作中,第一流體分離構件2係例如為旋風分離器,如圖2及圖3所示,第一流體分離構件2係連通輸出管路12以接收第一二流體F12,而後對第一二流體F12提供流體分離,將第一二流體F12分離出第二七流體F27與第二三流體F23,其中,第二七流體F27具有槽內空間11內未完全反應的包含冶金級矽材料的部分等固體材料,而第二三流體F23具有包含反應產物的部分以及槽內空間11內未完全反應的氫氣材料的部分與四氯化矽材料的部分等氣體材料,因此,第一流體分離構件2係為可提供上述固體材料與上述氣體材料分離的離心式分離器。In this creation, the first fluid separation member 2 is, for example, a cyclone separator. As shown in FIGS. 2 and 3, the first fluid separation member 2 communicates with the output line 12 to receive the first two fluids F12, and then One or two fluids F12 provide fluid separation, and separate the first two fluids F12 into the second seven fluids F27 and the second three fluids F23, wherein the second seven fluids F27 have metallurgical grade silicon materials that have not completely reacted in the space 11 in the tank And other solid materials, and the second three-fluid F23 has a gas material such as a portion containing the reaction product and a portion of the hydrogen material in the tank space 11 that has not completely reacted, and a portion of the silicon tetrachloride material. Therefore, the first fluid is separated The member 2 is a centrifugal separator that can provide separation of the solid material from the gas material.

第一流體處理構件3具有氫氣回收構件31與結晶構件32,如圖2及圖3所示,氫氣回收構件31係包含分別連通槽內空間11與第一流體分離構件2的除氣槽,用以接收第二三流體F23並接著將第二三流體F23的氫氣分離(去除)以提供氫氣回收,而後再經過結晶構件32的結晶以生成一第三四流體F34,俾將第二三流體F23中的氫氣材料的回收部分導入槽內空間11再利用,而參與槽內空間11中反應生成的反應物,以減少氫氣材料的浪費。The first fluid processing member 3 includes a hydrogen recovery member 31 and a crystallizing member 32. As shown in FIGS. 2 and 3, the hydrogen recovery member 31 includes a degassing tank that communicates the space 11 in the tank with the first fluid separation member 2 respectively. In order to receive the second three-fluid F23 and then separate (remove) the hydrogen of the second three-fluid F23 to provide hydrogen recovery, and then pass through the crystallization of the crystallization member 32 to generate a third four-fluid F34, the second three-fluid F23 The recovered part of the hydrogen material in is introduced into the space 11 in the tank for reuse, and the reactants generated by the reaction in the space 11 in the tank are reduced to reduce the waste of hydrogen material.

針對結晶構件32,具體而言,結晶構件32係例如包含攪拌結晶桶,主要係利用降溫冷卻的方式將第二三流體F23中的氣體材料液化成包含有多種不同熔點成分的液體材料,而當結晶攪拌桶的溫度持續降溫冷卻而低於液體中某成分的熔點時,該成分會從液體材料中結晶固化,舉例而言,當攪拌結晶桶的溫度低於次產物中重沸物的熔點時,則由第二三流體F23液化的液體材料中的次產物中重沸物的部分則會結晶固化進而生成第三四流體F34,其中,第三四流體F34包含重沸物與冶金級矽的部分等固體材料以及包含三氯矽烷的部分、四氯化矽的部分與次產物中的輕沸物的部分等液體材料。For the crystallization member 32, specifically, the crystallization member 32 includes, for example, a stirred crystallization drum, which mainly liquefies the gas material in the second and third fluids F23 into a liquid material containing a plurality of different melting point components by cooling and cooling. When the temperature of the crystallization stirring barrel is continuously lowered and cooled below the melting point of a component in the liquid, the component will crystallize and solidify from the liquid material. For example, when the temperature of the stirring crystallization barrel is lower than the melting point of the reboil in the secondary product , The part of the reboil in the secondary product of the liquid material liquefied by the second and third fluids F23 will crystallize and solidify to form the third and fourth fluids F34, where the third and fourth fluids F34 contain the reboilers and metallurgical grade silicon Solid materials such as parts and liquid materials such as trichlorosilane parts, silicon tetrachloride parts and light-boiling parts in secondary products.

第二流體分離構件4係例如為旋風分離器,如圖2及圖3所示,第二流體分離構件4係連通第一流體處理構件3以接收第三四流體F34,並對第三四流體F34提供流體分離,而將第三四流體F34分離出第四五流體F45與第四六流體F46,於一實施例中,第四五流體F45包含有三氯矽烷的部分、四氯化矽的部分與次產物中的輕沸物的部分等液體材料,而第四六流體F46包含有次產物中的重沸物的部分與冶金級矽的部分等固體材料,因此,可選擇性地,第二流體分離構件4係為可提供上述液體材料與上述固體材料分離的離心式分離器。The second fluid separation member 4 is, for example, a cyclone separator. As shown in FIGS. 2 and 3, the second fluid separation member 4 communicates with the first fluid processing member 3 to receive the third and fourth fluids F34. F34 provides fluid separation, and separates the third and fourth fluids F34 into the fourth and fifth fluids F45 and the fourth and sixth fluids F46. In an embodiment, the fourth and fifth fluids F45 include a portion of trichlorosilane and a portion of silicon tetrachloride The liquid materials such as the light boilers in the secondary products, and the fourth and sixth fluids F46 contain solid materials such as the heavy boilers in the secondary products and the metallurgical grade silicon. Therefore, optionally, the second The fluid separation member 4 is a centrifugal separator that can separate the liquid material from the solid material.

另外,第二流體處理構件5係透過例如蒸餾方式析出第四五流體F45中不同成分的材料,如圖2及圖3所示,第二流體處理構件5包含有第一階段析出構件51與第二階段析出構件52。具體而言,第一階段析出構件51係連通第二流體分離構件4,以接收第四五流體F45,進而對第四五流體F45提供四氯化矽的回收,以回收第四五流體F45中的四氯化矽材料的部分,除此之外,如圖3所示,第一階段析出構件51可包含重沸物分離塔(例如為可分離重沸物的蒸餾塔),藉以析出第四五流體F45中具有第一沸點的次產物的部分與階段析出流體F5,其中,所述具有第一沸點的次產物的部分係包含重沸物等液體材料,階段析出流體F5係包含三氯矽烷與輕沸物等氣體材料。如圖2及圖3所示,第一階段析出構件51還可包含回收塔511,其中,回收塔511係接收第四五流體F45中的四氯化矽材料的部分以提供四氯化矽的回收,進而析出具有第一沸點的次產物的部分以生成第五六流體F56。另外,回收塔511係連通第三流體處理構件6,以將第五六流體F56導入第三流體處理構件6中。In addition, the second fluid processing member 5 is a material that separates different components in the fourth fluid F45 by, for example, distillation. As shown in FIGS. 2 and 3, the second fluid processing member 5 includes the first-stage precipitation member 51 and the first Second stage precipitation member 52. Specifically, the first-stage precipitation member 51 communicates with the second fluid separation member 4 to receive the fourth and fifth fluids F45, and then to provide silicon tetrachloride recovery to the fourth and fifth fluids F45 to recover the fourth and fifth fluids F45 In addition to the part of the silicon tetrachloride material, as shown in FIG. 3, the first stage precipitation member 51 may include a reboil separation tower (for example, a distillation tower capable of separating reboil) to precipitate the fourth The part of the five-fluid F45 having a by-product with a first boiling point and the stage precipitation fluid F5, wherein the part with the first-boiling point of the by-product includes a liquid material such as a heavy boiler, and the stage precipitation fluid F5 contains trichlorosilane With light boilers and other gas materials. As shown in FIGS. 2 and 3, the first-stage precipitation member 51 may further include a recovery tower 511, wherein the recovery tower 511 receives a portion of the silicon tetrachloride material in the fourth and fifth fluids F45 to provide silicon tetrachloride It is recovered, and a portion of the secondary product having the first boiling point is precipitated to generate the fifth and sixth fluids F56. In addition, the recovery tower 511 communicates with the third fluid processing member 6 to introduce the fifth and sixth fluids F56 into the third fluid processing member 6.

如圖3所示,第二階段析出構件52係可包含連通第一階段析出構件51的輕沸物分離塔(例如為可分離輕沸物的蒸餾塔),藉以接收階段析出流體F5,進而提供析出階段析出流體F5中具有第二沸點的次產物的部分,而生成第五八流體F58與三氯矽烷的成品,所述具有第二沸點的次產物的部分係包含輕沸物等氣體材料。另外應說明的是,三氯矽烷成品槽E係連接第二階段析出構件52,以接收第二階段析出構件52所生成的三氯矽烷的成品並提供收容。As shown in FIG. 3, the second stage precipitation member 52 may include a light boiler separation tower (e.g., a distillation tower capable of separating light boilers) connected to the first stage precipitation member 51, thereby receiving the stage precipitation fluid F5, thereby providing In the precipitation stage, a part of the secondary product with a second boiling point in the fluid F5 is precipitated to produce a finished product of the fifth fluid F58 and trichlorosilane, and the secondary product part with the second boiling point contains a gas material such as a light boiler. In addition, it should be noted that the trichlorosilane finished product tank E is connected to the second stage precipitation member 52 to receive the trichlorosilane finished product generated by the second stage precipitation member 52 and provide accommodation.

另言之,由於材料的溫度到達熔點或沸點時可由固體液化成液體或液體氣化成氣體,因此,若改變流體的溫度則可以析出流體不同熔點或沸點的材料,所以,第一階段析出構件51可將第四五流體F45中具有第一沸點的次產物的部分(例如重沸物)析出,而第二階段析出構件52係可將階段析出流體F5中具有第二沸點的次產物的部分(例如輕沸物)析出,其中,第一沸點與第二沸點係不同,如此使三氯矽烷的成品得以純化。In other words, when the temperature of the material reaches the melting point or boiling point, the solid can be liquefied into a liquid or the liquid can be vaporized into a gas. Therefore, if the temperature of the fluid is changed, materials with different melting points or boiling points of the fluid can be precipitated. Therefore, the first stage precipitation member 51 A portion of the fourth-fifth fluid F45 having a secondary product with a first boiling point (for example, a reboil) can be precipitated, and the second-stage precipitation member 52 can separate a portion of the secondary product with a second boiling point in the fluid F5 ( For example, light boilers are precipitated, wherein the first boiling point and the second boiling point are different, so that the finished product of trichlorosilane can be purified.

相應地,本創作的三氯矽烷生成設備還包括第三流體處理構件6,如圖3所示,第三流體處理構件6係例如包含有蒸氣加熱構件SH的重沸物收集桶,其係分別連通第二流體分離構件4與第二流體處理構件5,以分別接收第四六流體F46與第五六流體F56,並藉由蒸氣加熱構件SH分別對第四六流體F46與第五六流體F56加熱,使第四六流體F46與第五六流體F56的溫度到達四氯化矽材料的沸點,使第四六流體F46與第五六流體F56中的四氯化矽材料的部分氣化析出,藉以提供回收四氯化矽材料的部分,而第四六流體F46與第五六流體F56中未氣化的部分係成為第六七流體F67,其中,第六七流體F67係包含第四六流體F46與第五六流體F56中的次產物的重沸物的部分。Correspondingly, the trichlorosilane production equipment of the present invention further includes a third fluid processing member 6, as shown in FIG. 3, the third fluid processing member 6 is, for example, a heavy boiler collection barrel containing a steam heating member SH, which are respectively The second fluid separation member 4 and the second fluid treatment member 5 are connected to receive the fourth and sixth fluids F46 and F56, respectively, and the fourth and sixth fluids F46 and F56 are respectively controlled by the steam heating member SH Heating, so that the temperature of the fourth hexafluid F46 and the fifth hexafluid F56 reaches the boiling point of the silicon tetrachloride material, so that part of the silicon hexachloride material in the fourth hexafluid F46 and the fifth hexafluid F56 is vaporized and precipitated, In order to provide a part of the recovered silicon tetrachloride material, the ungasified parts of the fourth and sixth fluids F46 and F56 become the sixth and seventh fluids F67, wherein the sixth and seventh fluids F67 include the fourth and sixth fluids The part of the reboiled product of the secondary products in F46 and F56.

於本創作中,三氯矽烷生成設備還包括四氯化矽材料回收構件9,如圖2及圖3所示,四氯化矽材料回收構件9係例如包含四氯化矽回收槽,且可將槽內空間11與第二流體處理構件5連通,以將第四五流體F45中回收的四氯化矽材料的部分導入槽內空間11再利用,而參與該槽內空間11中的反應生成反應產物,如此可以減少四氯化矽材料的浪費。此外,四氯化矽材料回收構件9還可將槽內空間11與第三流體處理構件6連通,以將第四六流體F46與第五六流體F56中回收的四氯化矽材料的部分導入槽內空間11再利用,而參與該槽內空間11中的反應生成反應產物,如此可以減少四氯化矽材料的浪費。另外值得一提的是,如圖2及圖3所示,本創作的三氯矽烷生成設備還設有冷凝器C與泵浦P1,冷凝器C可冷凝液化回收的四氯化矽材料,泵浦P1可提供壓力將液化的四氯化矽材料導入槽內空間11再利用。In this creation, the trichlorosilane production equipment also includes a silicon tetrachloride material recovery member 9, as shown in FIGS. 2 and 3, the silicon tetrachloride material recovery member 9 includes, for example, a silicon tetrachloride recovery tank, and can The space 11 in the tank is communicated with the second fluid processing member 5 to introduce a part of the silicon tetrachloride material recovered in the fourth fluid F45 into the space 11 in the tank for reuse, and participate in the reaction generation in the space 11 in the tank The reaction product can reduce the waste of silicon tetrachloride material. In addition, the silicon tetrachloride material recovery member 9 can also communicate the space 11 in the tank with the third fluid treatment member 6 to introduce part of the recovered silicon tetrachloride material in the fourth and sixth fluids F46 and F56 The space 11 in the tank is reused, and participates in the reaction in the space 11 in the tank to generate a reaction product, so that the waste of silicon tetrachloride material can be reduced. It is also worth mentioning that, as shown in Figures 2 and 3, the trichlorosilane production equipment of this creation also has a condenser C and a pump P1. The condenser C can condense and liquefy the recovered silicon tetrachloride material and pump Pu P1 can provide pressure to introduce liquefied silicon tetrachloride material into the space 11 in the tank for reuse.

如圖1所示,於本創作中,三氯矽烷生成設備還包括固廢處理構件7,固廢處理構件7係分別連通第一流體分離構件2與第三流體處理構件6,以對第二七流體F27中的固廢(包含槽內空間11內未完全反應的包含冶金級矽材料的部分等固體材料)與第六七流體F67中的固廢(包含第四六流體F46與第五六流體F56中的次產物的重沸物的部分)提供收集。As shown in FIG. 1, in the present creation, the trichlorosilane production equipment further includes a solid waste treatment member 7. The solid waste treatment member 7 is respectively connected to the first fluid separation member 2 and the third fluid treatment member 6 to separate the second Solid waste in Seven Fluids F27 (including solid materials such as metallurgical grade silicon materials that have not completely reacted in the space 11 in the tank) and solid waste in Sixth Seventh Fluids F67 (including fourth and sixth fluids F46 and Fifth Sixth) The portion of the reboil of the secondary product in fluid F56 provides collection.

此外,可選擇性地,如圖2及圖3所示,固廢處理構件7包含固廢收集桶及具有蒸氣加熱構件SH的固廢接收桶,且可利用攪拌器攪拌固廢接收桶的固廢,並藉由蒸氣加熱構件SH提供蒸氣加熱,使固廢接收桶時內的固廢釋出具腐蝕性酸性的氯矽烷廢氣,接著,再將氮氣通入固廢接收桶中以迫使氯矽烷廢氣離開固廢接收桶,而後,將固廢接收桶內的固廢送入固廢收集桶中收集。In addition, optionally, as shown in FIGS. 2 and 3, the solid waste treatment member 7 includes a solid waste collection barrel and a solid waste receiving barrel having a steam heating member SH, and the solid waste receiving barrel can be stirred with a stirrer. Waste, and steam heating is provided by the steam heating member SH, so that the solid waste in the solid waste receiving barrel releases corrosive and acidic chlorosilane waste gas, and then, nitrogen gas is passed into the solid waste receiving barrel to force the chlorosilane waste gas After leaving the solid waste receiving barrel, the solid waste in the solid waste receiving barrel is sent to the solid waste collection barrel for collection.

於本創作中,三氯矽烷生成設備還包括廢氣處理構件8,如圖1所示,廢氣處理構件8係連通固廢處理構件7,以接收具腐蝕性酸性的氯矽烷廢氣,並對具腐蝕性酸性的氯矽烷等廢氣提供酸鹼中和以使廢氣符合排放標準。另外,廢氣處理構件8還可連通第二流體處理構件5,以接收該第五八流體F58中的廢氣,並對第五八流體F58中的具腐蝕性酸性廢氣提供酸鹼中和,以使廢氣符合排放標準。In this creation, the trichlorosilane production equipment also includes an exhaust gas treatment member 8. As shown in FIG. 1, the exhaust gas treatment member 8 is connected to the solid waste treatment member 7 to receive the corrosive and acidic chlorosilane waste gas and corrode it. Exhaust gas such as acidic chlorosilane provides acid-base neutralization to make the exhaust gas meet emission standards. In addition, the exhaust gas treatment member 8 can also communicate with the second fluid treatment member 5 to receive the exhaust gas in the fifth eighth fluid F58 and provide acid-base neutralization to the corrosive acidic exhaust gas in the fifth eighth fluid F58, so that Exhaust gas meets emission standards.

可選擇性地,在本創作中,三氯矽烷生成設備還包括預加壓構件P與預加熱構件H。如圖2及圖3所示,預加壓構件P係例如包含有四氯化矽材料用的泵浦P1以及氫氣材料用的氫氣壓縮機P2等,可以預加壓氫氣材料與四氯化矽材料,使導入槽內空間11的氫氣材料與四氯化矽材料符合預定反應壓力,而提高三氯矽烷的生成效率(即提升三氯矽烷的轉化率)。優選地,所述預定反應壓力係介於20-30kg/cm 2之間。 Optionally, in the present creation, the trichlorosilane production equipment further includes a pre-pressing member P and a pre-heating member H. As shown in FIGS. 2 and 3, the pre-pressurizing member P includes, for example, a pump P1 for silicon tetrachloride material and a hydrogen compressor P2 for hydrogen material. The hydrogen material and silicon tetrachloride can be prepressurized. Materials, so that the hydrogen material introduced into the space 11 of the tank and the silicon tetrachloride material meet the predetermined reaction pressure, thereby improving the production efficiency of trichlorosilane (ie, increasing the conversion rate of trichlorosilane). Preferably, the predetermined reaction pressure is between 20-30 kg/cm 2 .

預加熱構件H係預加熱氫氣材料與四氯化矽材料,使導入槽內空間11的氫氣材料與四氯化矽材料符合預定反應溫度,而提高三氯矽烷的生成效率(即提升三氯矽烷的轉化率)。優選地,如圖2及圖3所示,預加熱構件H係例如包含有四氯化矽預熱器與電熱式交換器,其中,四氯化矽預熱器係例如包含有蒸氣加熱構件SH,藉由蒸氣加熱構件SH的蒸氣加熱使液態的四氯化矽材料到達沸點而氣化,而後,氫氣材料與氣化的四氯化矽材料再通過電熱式交換器加熱,使符合預定反應溫度。The preheating member H is a preheating hydrogen material and silicon tetrachloride material, so that the hydrogen material and silicon tetrachloride material introduced into the space 11 of the tank conform to a predetermined reaction temperature, thereby improving the generation efficiency of trichlorosilane (ie, enhancing trichlorosilane Conversion rate). Preferably, as shown in FIGS. 2 and 3, the preheating member H system includes, for example, a silicon tetrachloride preheater and an electrothermal exchanger, wherein the silicon tetrachloride preheater system includes, for example, a steam heating member SH , By steam heating of the steam heating member SH, the liquid silicon tetrachloride material reaches the boiling point and is vaporized, and then, the hydrogen material and the vaporized silicon tetrachloride material are heated by an electric heat exchanger to meet the predetermined reaction temperature .

綜上所述,本創作係提供一種三氯矽烷生成設備,係透過四氯化矽回收構件與氫氣回收構件回收再利用反應槽內未完全反應的四氯化矽材料與氫氣材料,而減少反應槽內未完全反應的材料的浪費。另外,還透過流體分離構件,將反應槽內未完全反應的冶金級矽材料與反應產物做分離,而避免反應產物的輸出管路受到反應槽內未完全反應的冶金級矽材料的堵塞,如此,可以增加三氯矽烷生成設備的使用壽命,也降低了清除堵塞輸出管路的維護成本。再者,本創作還透過流體處理構件,將反應產物中的次產物析出,以純化三氯矽烷的主產物,藉以提高三氯矽烷的純度。To sum up, this creative department provides a trichlorosilane production equipment, which recovers and reuses the incompletely reacted silicon tetrachloride material and hydrogen material in the reaction tank through the silicon tetrachloride recovery member and the hydrogen recovery member to reduce the reaction Waste of incompletely reacted material in the tank. In addition, through the fluid separation member, the metallurgical grade silicon material that has not completely reacted in the reaction tank is separated from the reaction product, and the output pipe of the reaction product is prevented from being blocked by the metallurgical grade silicon material that has not completely reacted in the reaction tank. , Can increase the service life of trichlorosilane production equipment, but also reduce the maintenance cost of removing clogged output pipelines. In addition, this work also uses fluid processing components to separate the secondary products in the reaction products to purify the main product of trichlorosilane, thereby increasing the purity of trichlorosilane.

上述實施例僅例示性說明本創作之原理及功效,而非用於限制本創作。任何熟習此項技術之人士均可在不違背本創作之精神及範疇下,對上述實施例進行修飾與改變。因此,本創作之權利保護範圍,應如本創作申請專利範圍所列。The above-mentioned embodiments are only illustrative of the principles and effects of this creation, and are not intended to limit this creation. Anyone who is familiar with this technology can modify and change the above embodiments without violating the spirit and scope of this creation. Therefore, the scope of protection of the rights of this creation should be as listed in the scope of patent applications for this creation.

1:反應槽 11:槽內空間 12:輸出管路 2:第一流體分離構件 3:第一流體處理構件 31:氫氣回收構件 32:結晶構件 4:第二流體分離構件 5:第二流體處理構件 511:回收塔 51:第一階段析出構件 52:第二階段析出構件 6:第三流體處理構件 7:固廢處理構件 8:廢氣處理構件 9:四氯化矽材料回收構件 C:冷凝器 E:三氯矽烷成品槽 F12:第一二流體 F23:第二三流體 F27:第二七流體 F34:第三四流體 F45:第四五流體 F46:第四六流體 F5:階段析出流體 F56:第五六流體 F58:第五八流體 F67:第六七流體 H:預加熱構件 P:預加壓構件 P1:泵浦 P2:氫氣壓縮機 SH:蒸氣加熱構件1: reaction tank 11: Space in the tank 12: output pipeline 2: The first fluid separation member 3: The first fluid processing member 31: Hydrogen recovery component 32: Crystal components 4: Second fluid separation member 5: Second fluid processing member 511: Recovery tower 51: The first stage precipitation component 52: The second stage precipitation component 6: Third fluid processing member 7: Solid waste treatment components 8: Exhaust gas treatment components 9: Silicon tetrachloride material recycling component C: condenser E: Trichlorosilane finished product tank F12: the first two fluids F23: Second and third fluids F27: Second seven fluid F34: third and fourth fluids F45: the fourth and fifth fluids F46: the fourth and sixth fluids F5: Staged fluid F56: Fifth and sixth fluids F58: Fifth eighth fluid F67: Sixth and seventh fluids H: Pre-heated component P: Pre-pressurized member P1: Pump P2: Hydrogen compressor SH: Steam heating component

圖1,係本創作三氯矽烷生成設備的第一系統架構圖。Figure 1 is the first system architecture diagram of the original trichlorosilane production equipment.

圖2,係本創作三氯矽烷生成設備的第二系統架構圖。Figure 2 is the second system architecture diagram of the original trichlorosilane production equipment.

圖3,係本創作三氯矽烷生成設備的第三系統架構圖。Figure 3 is the third system architecture diagram of the original trichlorosilane production equipment.

1:反應槽 1: reaction tank

11:槽內空間 11: Space in the tank

12:輸出管路 12: output pipeline

2:第一流體分離構件 2: The first fluid separation member

3:第一流體處理構件 3: The first fluid processing member

4:第二流體分離構件 4: Second fluid separation member

5:第二流體處理構件 5: Second fluid processing member

6:第三流體處理構件 6: Third fluid processing member

7:固廢處理構件 7: Solid waste treatment components

8:廢氣處理構件 8: Exhaust gas treatment components

9:四氯化矽材料回收構件 9: Silicon tetrachloride material recycling component

E:三氯矽烷成品槽 E: Trichlorosilane finished product tank

F12:第一二流體 F12: the first two fluids

F23:第二三流體 F23: Second and third fluids

F27:第二七流體 F27: Second seven fluid

F34:第三四流體 F34: third and fourth fluids

F45:第四五流體 F45: the fourth and fifth fluids

F46:第四六流體 F46: the fourth and sixth fluids

F56:第五六流體 F56: Fifth and sixth fluids

F58:第五八流體 F58: Fifth eighth fluid

F67:第六七流體 F67: Sixth and seventh fluids

H:預加熱構件 H: Pre-heated component

P:預加壓構件 P: Pre-pressurized member

Claims (10)

一種三氯矽烷生成設備,係包括: 一反應槽,該反應槽係具有一槽內空間,該槽內空間係提供導入一冶金級矽材料、一氫氣材料與一四氯化矽材料,並使導入的該冶金級矽材料、該氫氣材料與該四氯化矽材料反應而生成一反應產物; 一輸出管路,該輸出管路係連通該槽內空間,以輸出來自於該槽內空間的一第一二流體,其中,該第一二流體包含該反應產物的部分、該冶金級矽材料的部分、該氫氣材料的部分與該四氯化矽材料的部分,而該反應產物係包含一三氯矽烷與一次產物; 一第一流體分離構件,該第一流體分離構件係連通該輸出管路以接收該第一二流體,並對該第一二流體提供流體分離,而將該第一二流體分離出一第二七流體與一第二三流體,其中,該第二七流體包含該冶金級矽材料的部分; 一第一流體處理構件,該第一流體處理構件係連通該第一流體分離構件以接收該第二三流體,並對該第二三流體提供氫氣回收,而回收該第二三流體中的該氫氣材料的部分以生成一第三四流體; 一第二流體分離構件,該第二流體分離構件係連通該第一流體處理構件以接收該第三四流體,並對該第三四流體提供流體分離,而將該第三四流體分離出一第四五流體與一第四六流體; 一第二流體處理構件,該第二流體處理構件係連通該第二流體分離構件以接收該第四五流體,並對該第四五流體提供四氯化矽回收,而回收該第四五流體中的該四氯化矽材料的部分,以生成一第五六流體與該三氯矽烷的成品;以及 一第三流體處理構件,該第三流體處理構件係分別連通該第二流體分離構件與該第二流體處理構件以接收該第四六流體與該第五六流體,並對該第四六流體與該第五六流體提供四氯化矽回收,而回收該第四六流體與該第五六流體中的該四氯化矽材料的部分,以生成一第六七流體,其中,該第六七流體包含該第四六流體與該第五六流體中的該次產物的部分;以及 一三氯矽烷成品槽,該三氯矽烷成品槽係提供收容該三氯矽烷的成品。 A trichlorosilane production equipment, including: A reaction tank, the reaction tank has a space in the tank, the space in the tank is provided to introduce a metallurgical grade silicon material, a hydrogen material and a silicon tetrachloride material, and the introduced metallurgical grade silicon material and the hydrogen gas The material reacts with the silicon tetrachloride material to form a reaction product; An output pipeline connecting the space in the tank to output a first two fluids from the space in the tank, wherein the first two fluids contain a part of the reaction product, the metallurgical grade silicon material Part, the hydrogen material part and the silicon tetrachloride material part, and the reaction product includes a trichlorosilane and a primary product; A first fluid separation member, the first fluid separation member communicates with the output line to receive the first two fluids, and provides fluid separation for the first two fluids, and separates the first two fluids to a second Seven fluids and one second three fluids, wherein the second seven fluids contain a portion of the metallurgical grade silicon material; A first fluid processing member, the first fluid processing member communicates with the first fluid separation member to receive the second three fluids, and provides hydrogen recovery for the second three fluids, and recovers the second three fluids Part of the hydrogen material to produce a third fluid; A second fluid separation member, the second fluid separation member communicates with the first fluid treatment member to receive the third fluid, and provides fluid separation for the third fluid, and separates the third fluid Forty-fifth fluid and one forty-sixth fluid; A second fluid processing member, the second fluid processing member communicates with the second fluid separation member to receive the fourth fluid, and provides silicon tetrachloride recovery for the fourth fluid, and recovers the fourth fluid A portion of the silicon tetrachloride material to produce a fifth and sixth fluid and the trichlorosilane finished product; and A third fluid treatment member, the third fluid treatment member is respectively connected to the second fluid separation member and the second fluid treatment member to receive the fourth and sixth fluids and the fifth and sixth fluids, and the fourth and sixth fluids Providing silicon tetrachloride recovery with the fifth and sixth fluids, and recovering portions of the silicon tetrachloride material in the fourth and sixth fluids and the fifth and sixth fluids to generate a sixth and seventh fluids, wherein the sixth Seven fluids include the fourth and sixth fluids and the fifth and sixth fluids in the secondary product; and A trichlorosilane finished product tank, the trichlorosilane finished product tank is provided to contain the trichlorosilane finished product. 如申請專利範圍第1項所述的三氯矽烷生成設備,還包括一固廢處理構件,該固廢處理構件係連通該第一流體分離構件,以對該第二七流體中的固廢提供收集處理;該固廢處理構件還連通該第三流體處理構件,以對該第六七流體中的固廢提供收集處理。The trichlorosilane production equipment as described in item 1 of the scope of the patent application further includes a solid waste treatment member connected to the first fluid separation member to provide solid waste in the second seven fluids Collection treatment; the solid waste treatment member also communicates with the third fluid treatment member to provide collection treatment for the solid waste in the sixth and seventh fluids. 如申請專利範圍第1項所述的三氯矽烷生成設備,其中,該第二流體處理構件係具有一第一階段析出構件、一第二階段析出構件,該第一階段析出構件係接收該第四五流體,以提供析出該第四五流體中具有一第一沸點的該次產物的部分與一階段析出流體;該第二階段次產物析出構件係接收該階段析出流體,以提供析出該階段析出流體中具有一第二沸點的該次產物的部分,而生成一第五八流體與該三氯矽烷的成品,其中,該第一沸點與該第二沸點不同使該三氯矽烷的成品純化。The trichlorosilane production equipment as described in item 1 of the patent application scope, wherein the second fluid processing member has a first stage precipitation member and a second stage precipitation member, and the first stage precipitation member receives the first stage precipitation member Four or five fluids to provide a portion of the fourth to fifth fluid with a first boiling point of the secondary product and a staged precipitation fluid; the second stage secondary product precipitation member receives the staged fluid to provide the staged precipitation Precipitating a portion of the secondary product with a second boiling point in the fluid to produce a fifth and eighth fluid and the trichlorosilane finished product, wherein the first boiling point and the second boiling point are different to purify the trichlorosilane finished product . 如申請專利範圍第3項所述的三氯矽烷生成設備,其中,該第一階段析出構件係包含有一回收塔,該回收塔係接收該第四五流體中的該四氯化矽材料的部分以提供四氯化矽的回收,並回收具有該第一沸點的該次產物的部分以生成該第五六流體,該回收塔係連通該第三流體處理構件,以將該第五六流體導入該第三流體處理構件中。The trichlorosilane production equipment as described in item 3 of the patent application scope, wherein the first-stage precipitation member includes a recovery tower that receives a portion of the silicon tetrachloride material in the fourth to fifth fluids In order to provide the recovery of silicon tetrachloride and recover the portion of the secondary product with the first boiling point to generate the fifth and sixth fluids, the recovery tower is connected to the third fluid treatment member to introduce the fifth and sixth fluids In the third fluid processing member. 如申請專利範圍第3項所述的三氯矽烷生成設備,還包括一廢氣處理構件,該廢氣處理構件係連通該第二流體處理構件以接收該第五八流體,並對該第五八流體提供酸鹼中和,以產生符合排放標準的廢氣;該廢氣處理構件還連通該固廢處理構件,以接收該固廢處理構件中的廢氣,並對該固廢處理構件中的廢氣提供酸鹼中和,以產生符合排放標準的廢氣。The trichlorosilane production equipment as described in item 3 of the patent application scope further includes an exhaust gas treatment member, the exhaust gas treatment member communicates with the second fluid treatment member to receive the fifth fluid, and the fifth fluid Provide acid-base neutralization to produce exhaust gas that meets emission standards; the exhaust gas treatment member also communicates with the solid waste treatment member to receive the exhaust gas from the solid waste treatment member and provide acid and alkali to the solid waste treatment member Neutralize to produce exhaust gas that meets emission standards. 如申請專利範圍第1項所述的三氯矽烷生成設備,還包括一四氯化矽材料回收構件,該四氯化矽材料回收構件係連通該槽內空間與該第二流體處理構件,以將該第四五流體中的該四氯化矽材料的部分與該第一沸點的該次產物的四氯化矽的部分導入該槽內空間再利用,而參與該槽內空間中的反應生成該反應產物;該四氯化矽材料回收構件還連通該槽內空間與該第三流體處理構件,以將該第四六流體與該第五六流體中的該四氯化矽材料的部分導入該槽內空間再利用,而參與該槽內空間中的反應生成該反應產物。The trichlorosilane production equipment as described in item 1 of the patent application scope further includes a silicon tetrachloride material recovery member, the silicon tetrachloride material recovery member connecting the space in the tank with the second fluid treatment member, The part of the silicon tetrachloride material in the fourth fluid and the part of the silicon tetrachloride of the secondary product of the first boiling point are introduced into the space of the tank for reuse, and participate in the reaction formation in the space of the tank The reaction product; the silicon tetrachloride material recovery member also communicates with the space in the tank and the third fluid treatment member to introduce part of the silicon tetrachloride material in the fourth and sixth fluids and the fifth and sixth fluids The space in the tank is reused, and participates in the reaction in the space in the tank to generate the reaction product. 如申請專利範圍第1項所述的三氯矽烷生成設備,其中,該第一流體處理構件係具有一氫氣回收構件,該氫氣回收構件係分別連通該槽內空間與該第一流體分離構件,以將該第二三流體中的該氫氣材料的回收部分導入該槽內空間再利用,而參與該槽內空間中的反應生成該反應產物。The trichlorosilane production equipment as described in item 1 of the patent application scope, wherein the first fluid treatment member has a hydrogen recovery member, and the hydrogen recovery member separately connects the space in the tank with the first fluid separation member, The recovered part of the hydrogen material in the second and third fluids is introduced into the space in the tank for reuse, and participates in the reaction in the space in the tank to generate the reaction product. 如申請專利範圍第1項所述的三氯矽烷生成設備,還包括一預加熱構件,該預加熱構件係預加熱該氫氣材料與該四氯化矽材料,使導入該槽內空間的該氫氣材料與該四氯化矽材料符合一預定反應溫度。The trichlorosilane production equipment as described in item 1 of the patent application scope further includes a pre-heating member that pre-heats the hydrogen material and the silicon tetrachloride material so that the hydrogen gas introduced into the space in the tank The material and the silicon tetrachloride material meet a predetermined reaction temperature. 如申請專利範圍第1項所述的三氯矽烷生成設備,還包括一預加壓構件,該預加壓構件係預加壓該氫氣材料與該四氯化矽材料,使導入該槽內空間的該氫氣材料與該四氯化矽材料符合一預定反應壓力。The trichlorosilane production equipment as described in item 1 of the scope of the patent application further includes a pre-pressurizing member that pre-pressurizes the hydrogen material and the silicon tetrachloride material to be introduced into the space in the tank The hydrogen material and the silicon tetrachloride material meet a predetermined reaction pressure. 如申請專利範圍第1項所述的三氯矽烷生成設備,其中,該第一流體處理構件係具有一結晶構件,該結晶構件係使該第二三流體中的該次產物的部分冷卻結晶轉換成固體;該第一流體分離構件與該第二流體分離構件係為離心式分離器。The trichlorosilane production device as described in item 1 of the patent application scope, wherein the first fluid processing member has a crystalline member that converts a part of the secondary product in the second three fluid to cooling crystallization Into a solid; the first fluid separation member and the second fluid separation member are centrifugal separators.
TW108214593U 2019-11-04 2019-11-04 Trichlorosilane generator TWM596759U (en)

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