TWM583133U - Lithium-ion secondary battery and electrolytic copper foil - Google Patents
Lithium-ion secondary battery and electrolytic copper foil Download PDFInfo
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Abstract
本創作公開一種鋰離子二次電池及電解銅箔。電解銅箔包括生箔層,生箔層具有第一表面及相對於第一表面的第二表面。其中,在第一表面的X光繞射光譜中,第一表面的(200)結晶面的繞射峰強度I(200)與第一表面的(111)結晶面的繞射峰強度I(111)的比值介於0.5至2.0之間。在第二表面的X光繞射光譜中,第二表面的(200)結晶面的繞射峰強度I(200)與第二表面的(111)結晶面的繞射峰強度I(111)的比值也介於0.5至2.0之間。The present invention discloses a lithium ion secondary battery and an electrolytic copper foil. The electrolytic copper foil includes a green foil layer having a first surface and a second surface opposite the first surface. Wherein, in the X-ray diffraction spectrum of the first surface, the diffraction peak intensity I (200) of the (200) crystal plane of the first surface and the diffraction peak intensity I of the (111) crystal plane of the first surface I (111 The ratio is between 0.5 and 2.0. In the X-ray diffraction spectrum of the second surface, the diffraction peak intensity I (200) of the (200) crystal plane of the second surface and the diffraction peak intensity I (111) of the (111) crystal plane of the second surface The ratio is also between 0.5 and 2.0.
Description
本創作涉及一種鋰離子二次電池及電解銅箔,特別是涉及一種具有高延伸率的電解銅箔。The present invention relates to a lithium ion secondary battery and an electrolytic copper foil, and more particularly to an electrolytic copper foil having a high elongation.
電解銅箔能用於製造各種產品,例如:鋰離子二次電池的負極電極體。一般而言,在製造電解銅箔的製程中,在電解液中使用高濃度的添加劑可以製作出具有大尺寸晶粒塊狀結晶結構的電解銅箔。此類電解銅箔通常具有較高的延伸率。在此類電解銅箔的X光繞射光譜(XRD spectrum)中,(111)結晶面的繞射峰強度I(111)較高,(200)結晶面及(220)結晶面的繞射峰強度I(200)及I(220)較低,並且I(200)與I(111)的比值通常低於0.5。Electrolytic copper foil can be used to manufacture various products such as a negative electrode body of a lithium ion secondary battery. In general, in the process of manufacturing an electrolytic copper foil, an electrolytic copper foil having a large-sized crystal grainy crystal structure can be produced by using a high concentration of an additive in an electrolytic solution. Such electrolytic copper foils generally have a high elongation. In the X-ray diffraction spectrum (XRD spectrum) of such an electrolytic copper foil, the diffraction peak intensity I (111) of the (111) crystal plane is high, and the diffraction peak of the (200) crystal plane and the (220) crystal plane is high. The intensities I (200) and I (220) are lower, and the ratio of I (200) to I (111) is usually less than 0.5.
雖然在電解液中使用高濃度的添加劑可以製作出具有較高延伸率的電解銅箔,但是同時也會產生高生產成本及製程條件不容易控制的問題。Although an electrolytic copper foil having a high elongation can be produced by using a high concentration of an additive in an electrolytic solution, it also causes a problem that high production cost and process conditions are not easily controlled.
於是,本創作人有感上述問題,特潛心研究並配合科學原理的運用,提出一種可有效改善上述問題的本創作。Therefore, the creator feels the above problems, and studies and cooperates with the application of scientific principles to propose a novel that can effectively improve the above problems.
本創作所要解決的技術問題在於,針對現有技術中,必須使用高濃度的添加劑才能製作出具有高延伸率銅箔的問題,而提供一種鋰離子二次電池及電解銅箔。The technical problem to be solved by the present invention is that, in the prior art, it is necessary to use a high concentration of an additive to produce a problem of having a high elongation copper foil, and to provide a lithium ion secondary battery and an electrolytic copper foil.
為了解決上述的技術問題,本創作所採用的其中一技術方案是,提供一種電解銅箔,包括:一生箔層,具有一第一表面及相對於所述第一表面的一第二表面;其中,在所述第一表面的X光繞射光譜中,所述第一表面的(200)結晶面的繞射峰強度I(200)與所述第一表面的(111)結晶面的繞射峰強度I(111)的比值是介於0.5至2.0之間;其中,在所述第二表面的X光繞射光譜中,所述第二表面的(200)結晶面的繞射峰強度I(200)與所述第二表面的(111)結晶面的繞射峰強度I(111)的比值也是介於0.5至2.0之間。In order to solve the above technical problem, one of the technical solutions adopted by the present invention is to provide an electrolytic copper foil comprising: a primary foil layer having a first surface and a second surface opposite to the first surface; a diffraction peak intensity I (200) of the (200) crystal plane of the first surface and a diffraction of the (111) crystal plane of the first surface in an X-ray diffraction spectrum of the first surface The ratio of the peak intensity I(111) is between 0.5 and 2.0; wherein, in the X-ray diffraction spectrum of the second surface, the diffraction peak intensity I of the (200) crystal plane of the second surface The ratio of the diffraction peak intensity I(111) of the (111) to the (111) crystal plane of the second surface is also between 0.5 and 2.0.
為了解決上述的技術問題,本創作所採用的另外一技術方案是,提供一種電解銅箔的製造方法,包括:製備一銅電解液,其中,所述銅電解液包含有至少一添加劑,並且以所述銅電解液的總重為基準,至少一所述添加劑的濃度不大於12重量百萬分率(ppm);以及實施一電鍍步驟,包含:電解所述銅電解液以形成一生箔層;其中,所述生箔層具有一第一表面及相對於所述第一表面的一第二表面;其中,在所述第一表面的X光繞射光譜中,所述第一表面的(200)結晶面的繞射峰強度I(200)與所述第一表面的(111)結晶面的繞射峰強度I(111)的比值是介於0.5至2.0之間;其中,在所述第二表面的X光繞射光譜中,所述第二表面的(200)結晶面的繞射峰強度I(200)與所述第二表面的(111)結晶面的繞射峰強度I(111)的比值也是介於0.5至2.0之間。In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a method for manufacturing an electrolytic copper foil, comprising: preparing a copper electrolyte, wherein the copper electrolyte contains at least one additive, and The total weight of the copper electrolyte is based on, the concentration of at least one of the additives is not more than 12 parts per million by weight (ppm); and performing a plating step comprising: electrolyzing the copper electrolyte to form a raw foil layer; Wherein the green foil layer has a first surface and a second surface relative to the first surface; wherein, in the X-ray diffraction spectrum of the first surface, the first surface (200) a ratio of a diffraction peak intensity I (200) of the crystal face to a diffraction peak intensity I (111) of the (111) crystal face of the first surface is between 0.5 and 2.0; wherein, in the In the X-ray diffraction spectrum of the two surfaces, the diffraction peak intensity I (200) of the (200) crystal plane of the second surface and the diffraction peak intensity I of the (111) crystal plane of the second surface I (111 The ratio is also between 0.5 and 2.0.
為了解決上述的技術問題,本創作所採用的又另外一技術方案是,提供一種鋰離子二次電池,包括一電解槽,具有一容置空間,用以容置一電解液;一正極,設置於所述電解槽的所述容置空間中;一負極,設置於所述電解槽的所述容置空間中、且與所述正極呈間隔設置;其中,所述負極包含有一電解銅箔,並且所述電解銅箔具有一第一表面及相對於所述第一表面的一第二表面;以及一隔離膜,設置於所述正極及所述負極之間;其中,在所述電解銅箔的所述第一表面的X光繞射光譜中,所述第一表面的(200)結晶面的繞射峰強度I(200)與所述第一表面的(111)結晶面的繞射峰強度I(111)的比值是介於0.5至2.0之間;其中,在所述電解銅箔的所述第二表面的X光繞射光譜中,所述第二表面的(200)結晶面的繞射峰強度I(200)與所述第二表面的(111)結晶面的繞射峰強度I(111)的比值也是介於0.5至2.0之間。In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a lithium ion secondary battery, comprising an electrolytic cell having an accommodating space for accommodating an electrolyte; In the accommodating space of the electrolytic cell; a negative electrode disposed in the accommodating space of the electrolytic cell and spaced apart from the positive electrode; wherein the negative electrode comprises an electrolytic copper foil, And the electrolytic copper foil has a first surface and a second surface opposite to the first surface; and a separator disposed between the positive electrode and the negative electrode; wherein, the electrolytic copper foil The X-ray diffraction spectrum of the first surface, the diffraction peak intensity I (200) of the (200) crystal plane of the first surface and the diffraction peak of the (111) crystal plane of the first surface The ratio of the intensity I (111) is between 0.5 and 2.0; wherein, in the X-ray diffraction spectrum of the second surface of the electrolytic copper foil, the (200) crystal face of the second surface a diffraction peak intensity I (200) and a diffraction peak intensity I (111) of the (111) crystal plane of the second surface The ratio is also between 0.5 and 2.0.
本創作的其中一有益效果在於,本創作所提供的電解銅箔、其製造方法、及鋰離子二次電池,其能通過“在所述電解銅箔的第一表面的X光繞射光譜中,所述第一表面的(200)結晶面的繞射峰強度I(200)與所述第一表面的(111)結晶面的繞射峰強度I(111)的比值是介於0.5至2.0之間”、“在所述電解銅箔的第二表面的X光繞射光譜中,所述第二表面的(200)結晶面的繞射峰強度I(200)與所述第二表面的(111)結晶面的繞射峰強度I(111)的比值也是介於0.5至2.0之間”、及“所述銅電解液包含有至少一添加劑,並且以所述銅電解液的總重為基準,至少一所述添加劑的濃度不大於12重量百萬分率(ppm)”的技術方案,以使得所述電解銅箔具有高的延伸率、且能降低電解銅箔的生產成本、及提升電解銅箔的生產穩定性。One of the beneficial effects of the present invention is that the electrolytic copper foil provided by the present invention, the manufacturing method thereof, and the lithium ion secondary battery can pass "in the X-ray diffraction spectrum of the first surface of the electrolytic copper foil" The ratio of the diffraction peak intensity I (200) of the (200) crystal plane of the first surface to the diffraction peak intensity I (111) of the (111) crystal plane of the first surface is between 0.5 and 2.0 Between the X-ray diffraction spectrum of the second surface of the electrolytic copper foil, the diffraction peak intensity I (200) of the (200) crystal plane of the second surface and the second surface The ratio of the diffraction peak intensity I(111) of the (111) crystal face is also between 0.5 and 2.0", and "the copper electrolyte contains at least one additive, and the total weight of the copper electrolyte is The technical solution of the concentration of at least one of the additives is not more than 12 parts per million (ppm), so that the electrolytic copper foil has high elongation, and can reduce the production cost and improvement of the electrolytic copper foil. Production stability of electrolytic copper foil.
為使能更進一步瞭解本創作的特徵及技術內容,請參閱以下有關本創作的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本創作加以限制。In order to further understand the features and technical contents of this creation, please refer to the following detailed description and drawings of the present invention. However, the drawings are provided for reference and description only, and are not intended to limit the creation.
以下是通過特定的具體實施例來說明本創作所公開的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本創作的優點與效果。本創作可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本創作的構思下進行各種修改與變更。另外,本創作的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本創作的相關技術內容,但所公開的內容並非用以限制本創作的保護範圍。The embodiments disclosed in the present disclosure are described below by way of specific embodiments, and those skilled in the art can understand the advantages and effects of the present invention from the contents disclosed in the present specification. The present invention can be implemented or applied in various other specific embodiments. The details of the present specification can also be variously modified and changed without departing from the concept of the present invention. In addition, the drawings of the present creation are only for the purpose of simple illustration, and are not stated in advance according to the actual size. The following embodiments will further explain the related technical content of the present invention, but the disclosure is not intended to limit the scope of protection of the present invention.
應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that, although the terms "first", "second", "third", and the like may be used herein to describe various elements or signals, these elements or signals are not limited by these terms. These terms are primarily used to distinguish one element from another, or one signal and another. In addition, the term "or" as used herein may include a combination of any one or more of the associated listed items, depending on the actual situation.
[電解銅箔][electrolytic copper foil]
請參閱圖1所示,圖1為本創作實施例的電解銅箔的側視示意圖。本實施例的電解銅箔110較佳地是可以應用於鋰離子二次電池(也可稱為鋰離子蓄電池),並且可以做為鋰離子二次電池的負極電極體。本實施例的電解銅箔110包含有一生箔層111、一第一抗氧化處理層112a、及一第二抗氧化處理層112b。其中,所述生箔層111具有一第一表面S1及相對於所述第一表面S1的一第二表面S2,並且所述第一抗氧化處理層112a是設置於第一表面S1上,而所述第二抗氧化處理層112b是設置於第二表面S2上。也就是說,所述第一抗氧化處理層112a及第二抗氧化處理層112b是分別設置於生箔層111的兩個相對的表面上,藉以提升所述電解銅箔110的抗氧化特性,但本創作不受限於此。舉例來說,在本創作未繪示的實施例中,所述電解銅箔110也可以僅包含有生箔層111、而不包含有上述第一抗氧化處理層112a及第二抗氧化處理層112b。Please refer to FIG. 1. FIG. 1 is a schematic side view of an electrolytic copper foil according to an embodiment of the present invention. The electrolytic copper foil 110 of the present embodiment is preferably applicable to a lithium ion secondary battery (also referred to as a lithium ion secondary battery), and can be used as a negative electrode body of a lithium ion secondary battery. The electrolytic copper foil 110 of the present embodiment comprises a green foil layer 111, a first oxidation resistant layer 112a, and a second oxidation resistant layer 112b. The raw foil layer 111 has a first surface S1 and a second surface S2 opposite to the first surface S1, and the first oxidation resistant layer 112a is disposed on the first surface S1. The second oxidation resistant treatment layer 112b is disposed on the second surface S2. That is, the first anti-oxidation treatment layer 112a and the second anti-oxidation treatment layer 112b are respectively disposed on two opposite surfaces of the green foil layer 111, thereby improving the oxidation resistance of the electrolytic copper foil 110. However, this creation is not limited to this. For example, in an embodiment not shown in the present creation, the electrolytic copper foil 110 may also include only the raw foil layer 111, and does not include the first oxidation resistant layer 112a and the second oxidation resistant layer. 112b.
進一步地說,在本實施例中,上述第一表面S1與第二表面S2之間的距離可以定義為電解銅箔110的厚度(包含生箔層111的厚度及抗氧化處理層112a及112b的厚度)。為了讓所述電解銅箔110能應用於鋰離子二次電池,所述電解銅箔110的厚度較佳是介於2微米(μm)至20微米(μm)之間,但本創作不受限於此。Further, in the present embodiment, the distance between the first surface S1 and the second surface S2 may be defined as the thickness of the electrolytic copper foil 110 (including the thickness of the green foil layer 111 and the oxidation resistant treatment layers 112a and 112b). thickness). In order to enable the electrolytic copper foil 110 to be applied to a lithium ion secondary battery, the thickness of the electrolytic copper foil 110 is preferably between 2 micrometers (μm) and 20 micrometers (μm), but the creation is not limited. herein.
請參閱圖2所示,圖2為本創作實施例的電解銅箔的X光繞射光譜(XRD spectrum)。舉例而言,圖2顯示在電解銅箔110的兩個表面(S surface及M surface)的X光繞射光譜中,(111)結晶面在繞射角(2θ)為43.0°±1.0°的繞射峰強度以及(200)結晶面在繞射角(2θ)為50.5°±1.0°的繞射峰強度,且已知強度比值I(200)/I(111)為介於約0.5至約2.0的範圍內。Referring to FIG. 2, FIG. 2 is an X-ray diffraction spectrum of an electrolytic copper foil according to an embodiment of the present invention. For example, FIG. 2 shows that in the X-ray diffraction spectrum of the two surfaces (S surface and M surface) of the electrolytic copper foil 110, the (111) crystal plane is at a diffraction angle (2θ) of 43.0°±1.0°. The diffraction peak intensity and the diffraction peak intensity of the (200) crystal plane at a diffraction angle (2θ) of 50.5 ° ± 1.0 °, and the known intensity ratio I (200) / I (111) is between about 0.5 to about Within the scope of 2.0.
更具體地說,在本實施例中,在所述電解銅箔110的第一表面S1的X光繞射光譜中,所述第一表面S1的(200)結晶面的繞射峰強度I(200)與所述第一表面S1的(111)結晶面的繞射峰強度I(111)的比值是介於0.5至2.0之間。再者,在所述電解銅箔110的第二表面S2的X光繞射光譜中,所述第二表面S2的(200)結晶面的繞射峰強度I(200)與所述第二表面S2的(111)結晶面的繞射峰強度I(111)的比值也是介於0.5至2.0之間。More specifically, in the present embodiment, in the X-ray diffraction spectrum of the first surface S1 of the electrolytic copper foil 110, the diffraction peak intensity I of the (200) crystal plane of the first surface S1 ( 200) The ratio of the diffraction peak intensity I(111) to the (111) crystal plane of the first surface S1 is between 0.5 and 2.0. Furthermore, in the X-ray diffraction spectrum of the second surface S2 of the electrolytic copper foil 110, the diffraction peak intensity I (200) of the (200) crystal plane of the second surface S2 is opposite to the second surface The ratio of the diffraction peak intensity I(111) of the (111) crystal plane of S2 is also between 0.5 and 2.0.
也就是說,無論是在所述第一表面S1或第二表面S2的X光繞射光譜中,其I(200)與I(111)的比值皆不小於0.5、且不大於2.0。That is, the ratio of I (200) to I (111) in the X-ray diffraction spectrum of the first surface S1 or the second surface S2 is not less than 0.5 and not more than 2.0.
請繼續參閱圖1所示,所述第一抗氧化處理層112a及第二抗氧化處理層112b各自具有不大於50奈米(nm)的一厚度。再者,所述第一抗氧化處理層112a及第二抗氧化處理層112b各自包含有一非銅金屬元素。其中,以所述電解銅箔110的總重為基準,所述第一抗氧化處理層112a及第二抗氧化處理層112b皆包含有總重量含量介於1重量百萬分率(Parts per million,ppm)至1,000重量百萬分率的所述非銅金屬元素,並且所述非銅金屬元素是選自於由鉻(Cr)、鋅(Zn)、鎳(Ni)、鉬(Mo)、錳(Mn)、磷(P)及其組合物所組成的群組中的至少一種元素。Referring to FIG. 1, the first anti-oxidation treatment layer 112a and the second anti-oxidation treatment layer 112b each have a thickness of not more than 50 nanometers (nm). Furthermore, the first oxidation resistant layer 112a and the second oxidation resistant layer 112b each comprise a non-copper metal element. Wherein, the first anti-oxidation treatment layer 112a and the second anti-oxidation treatment layer 112b all contain a total weight content of 1 part per million (Parts per million) based on the total weight of the electrolytic copper foil 110. , ppm) to 1,000 parts by weight of the non-copper metal element, and the non-copper metal element is selected from the group consisting of chromium (Cr), zinc (Zn), nickel (Ni), molybdenum (Mo), At least one element selected from the group consisting of manganese (Mn), phosphorus (P), and combinations thereof.
根據上述電解銅箔110的結構及材料的設計,所述電解銅箔110可以具有良好的拉伸強度及延展性。更具體地說,所述電解銅箔110於一室溫環境下(如:20℃至30℃)、且未經過任何熱處理步驟前,所述電解銅箔110具有介於28 kgf/mm 2至40 kgf/mm 2的一拉伸強度、及不小於7%的一延伸率(也可稱為延伸率)。再者,所述電解銅箔110經過一熱處理步驟後,所述電解銅箔110有介於25 kgf/mm 2至35 kgf/mm 2的一拉伸強度、及不小於9.5%的一延伸率。其中,上述熱處理步驟包含將所述電解銅箔置放於130℃至250℃的溫度環境下進行烘烤0.5小時至1.5小時。較佳地,上述熱處理步驟包含將所述電解銅箔置放於180℃的溫度環境下進行烘烤1.0小時。 According to the design of the structure and material of the above-mentioned electrolytic copper foil 110, the electrolytic copper foil 110 can have good tensile strength and ductility. More specifically, the electrolytic copper foil 110 has a temperature of 28 kgf/mm 2 to a room temperature environment (e.g., 20 ° C to 30 ° C) without any heat treatment step. A tensile strength of 40 kgf/mm 2 and an elongation of not less than 7% (also referred to as elongation). Furthermore, after the electrolytic copper foil 110 is subjected to a heat treatment step, the electrolytic copper foil 110 has a tensile strength of 25 kgf/mm 2 to 35 kgf/mm 2 and an elongation of not less than 9.5%. . Wherein, the heat treatment step comprises baking the electrolytic copper foil at a temperature of 130 ° C to 250 ° C for 0.5 hours to 1.5 hours. Preferably, the heat treatment step comprises baking the electrolytic copper foil at a temperature of 180 ° C for 1.0 hour.
也就是說,在本實施例中,所述電解銅箔110在經過熱處理步驟後的拉伸強度能大致維持其在未經過任何熱處理步驟前的拉伸強度的65%至95%,並且所述電解銅箔110在經過熱處理步驟後的延伸率大致為其在未經過任何熱處理步驟前的延伸率的100%至140%。That is, in the present embodiment, the tensile strength of the electrolytic copper foil 110 after the heat treatment step can be substantially maintained from 65% to 95% of the tensile strength before the heat treatment step, and The elongation of the electrolytic copper foil 110 after the heat treatment step is approximately 100% to 140% of the elongation before the heat treatment step.
請參閱圖3所示,圖3為本創作實施例的電解銅箔的聚焦離子束(Focused Ion Beam,簡稱FIB)影像圖。其中,所述電解銅箔110具有多個晶粒(圖未標號),並且所述多個晶粒在未經過任何熱處理步驟前的晶粒尺寸是介於20奈米(nm)至45奈米(nm)之間,並且較佳是介於21.5奈米至40.5奈米之間,但本創作不受限於此。其中,上述晶粒尺寸是利用X光繞射(XRD)光譜的半高寬(full width at half maximum,FWHM)計算。Referring to FIG. 3, FIG. 3 is a view of a focused ion beam (Focused Ion Beam, FIB for short) image of an electrolytic copper foil according to an embodiment of the present invention. Wherein, the electrolytic copper foil 110 has a plurality of crystal grains (not numbered), and the grain size of the plurality of crystal grains before the heat treatment step is between 20 nm (nm) and 45 nm. Between (nm), and preferably between 21.5 nm and 40.5 nm, the creation is not limited thereto. Wherein, the above grain size is calculated by full width at half maximum (FWHM) of X-ray diffraction (XRD) spectrum.
再者,在本實施例中,所述電解銅箔110在經過熱處理步驟後的多個晶粒的晶粒尺寸為其在未經過任何熱處理步驟前的多個晶粒的晶粒尺寸的90%至130%之間,並且較佳是介於95%至120%之間。也就是說,根據上述電解銅箔110的設計,所述電解銅箔110無論是否經過熱處理步驟,皆能夠維持具有大尺寸晶粒的塊狀結晶結構,從而具有高的延伸率。Furthermore, in the present embodiment, the grain size of the plurality of crystal grains of the electrolytic copper foil 110 after the heat treatment step is 90% of the grain size of the plurality of crystal grains before the heat treatment step is not performed. It is between 130%, and preferably between 95% and 120%. That is, according to the design of the above-described electrolytic copper foil 110, the electrolytic copper foil 110 can maintain a bulk crystal structure having large-sized crystal grains regardless of whether or not the heat treatment step is performed, thereby having high elongation.
請繼續參閱圖2,在本實施例的電解銅箔的X光繞射(XRD)光譜中,所述電解銅箔的兩個表面的I(200)與I(111)的比值皆是介於0.5至2.0之間。也就是說,所述電解銅箔的(200)結晶面的繞射峰強度I(200)是接近於其(111)結晶面的繞射峰強度I(111)。再者,由圖2可以得知,所述電解銅箔的(200)結晶面的繞射峰強度I(200)與其(111)結晶面的繞射峰強度I(111),皆遠高於其(220)結晶面的繞射峰強度I(220)。Referring to FIG. 2, in the X-ray diffraction (XRD) spectrum of the electrolytic copper foil of the embodiment, the ratio of I(200) to I(111) of the two surfaces of the electrolytic copper foil is between Between 0.5 and 2.0. That is, the diffraction peak intensity I (200) of the (200) crystal plane of the electrolytic copper foil is a diffraction peak intensity I (111) close to the (111) crystal plane. Furthermore, as can be seen from FIG. 2, the diffraction peak intensity I (200) of the (200) crystal plane of the electrolytic copper foil and the diffraction peak intensity I (111) of the (111) crystal plane are much higher than The diffraction peak intensity I (220) of the (220) crystal plane.
進一步地說,由於本實施例的電解銅箔110的結晶位向是以(200)結晶面及(111)結晶面為主,因此所述電解銅箔110的多個晶粒之間容易產生滑移的現象,從而使得所述電解銅箔110能具有高的延伸率。從另一個角度說,由於本實施例的電解銅箔110的結晶結構為塊狀的結晶結構,因此所述電解銅箔110能具有高的延伸率。Further, since the crystal orientation of the electrodeposited copper foil 110 of the present embodiment is mainly a (200) crystal plane and a (111) crystal plane, the crystal grains of the electrodeposited copper foil 110 are likely to slip. The phenomenon of shifting allows the electrolytic copper foil 110 to have a high elongation. From another point of view, since the crystal structure of the electrolytic copper foil 110 of the present embodiment is a bulk crystal structure, the electrolytic copper foil 110 can have a high elongation.
[電解銅箔的製造方法][Method of Manufacturing Electrolytic Copper Foil]
以上為本實施例的電解銅箔110的結構及材料的相關說明,而以下將根據本創作的實施例,詳細描述電解銅箔110的製造方法。The above is a description of the structure and material of the electrolytic copper foil 110 of the present embodiment, and a method of manufacturing the electrolytic copper foil 110 will be described in detail below based on the embodiment of the present invention.
本實施例公開一種電解銅箔110的製造方法。所述電解銅箔110的製造方法包含步驟S110、步驟S120、及步驟S130。必須說明的是,本實施例所載之各步驟的順序與實際的操作方式可視需求而調整,並不限於本實施例所載。This embodiment discloses a method of manufacturing the electrolytic copper foil 110. The manufacturing method of the electrolytic copper foil 110 includes step S110, step S120, and step S130. It should be noted that the order of the steps and the actual operation mode of the present embodiment may be adjusted according to requirements, and is not limited to the embodiment.
步驟S110為製備一銅電解液,其中,所述銅電解液包含有至少一添加劑,並且以所述銅電解液的總重為基準,至少一所述添加劑的濃度不大於12重量百萬分率(ppm)。Step S110 is to prepare a copper electrolyte, wherein the copper electrolyte contains at least one additive, and the concentration of at least one of the additives is not more than 12 parts per million based on the total weight of the copper electrolyte. (ppm).
更具體地說,在本實施例中,所述銅電解液的成分中除了上述添加劑外,其尚包含有銅離子、氯離子、及硫酸。其中,在所述銅電解液中,所述銅離子的濃度較佳為30 g/L至90 g/L,且更佳為50 g/L至70 g/L;所述硫酸的濃度較佳為50 g/L至140 g/L,且更佳為70 g/L至120 g/L;所述氯離子的濃度較佳為10 ppm至50 ppm,且更佳為10 ppm至30 ppm。另外,在本實施例中,所述銅離子的來源為硫酸銅,並且所述氯離子的來源為鹽酸,但本創作不受限於此。More specifically, in the present embodiment, in addition to the above additives, the composition of the copper electrolytic solution further contains copper ions, chloride ions, and sulfuric acid. Wherein, in the copper electrolyte, the concentration of the copper ions is preferably from 30 g/L to 90 g/L, and more preferably from 50 g/L to 70 g/L; the concentration of the sulfuric acid is preferably It is from 50 g/L to 140 g/L, and more preferably from 70 g/L to 120 g/L; the concentration of the chloride ion is preferably from 10 ppm to 50 ppm, and more preferably from 10 ppm to 30 ppm. Further, in the present embodiment, the source of the copper ions is copper sulfate, and the source of the chloride ions is hydrochloric acid, but the creation is not limited thereto.
進一步地說,在本實施例中,至少一所述添加劑包含有一第一添加劑、一第二添加劑、及一第三添加劑。Further, in this embodiment, at least one of the additives comprises a first additive, a second additive, and a third additive.
所述第一添加劑為一明膠(gelatin),且較佳為一工業級電鍍明膠。其中,在所述銅電解液中,所述明膠的濃度較佳為不大於5 ppm。再者,所述明膠的重量平均分子量較佳是介於1,000至5,000之間,並且更佳是介於2,000至4,000之間。進一步地說,所述明膠可以例如是選自由豬膠、牛膠、或魚膠所組成的群組中的至少一種。在本實施例中,所述第一添加劑較佳為豬膠,但本創作不受限於此。The first additive is a gelatin and is preferably an industrial grade electroplated gelatin. Wherein, in the copper electrolyte, the concentration of the gelatin is preferably not more than 5 ppm. Further, the gelatin preferably has a weight average molecular weight of from 1,000 to 5,000, and more preferably from 2,000 to 4,000. Further, the gelatin may be, for example, at least one selected from the group consisting of pig gum, bovine gum, or fish gelatin. In the embodiment, the first additive is preferably pig rubber, but the creation is not limited thereto.
所述第二添加劑為包含硫原子化合物的磺酸或其金屬鹽類。其中,在所述銅電解液中,所述包含硫原子化合物的磺酸或其金屬鹽類的濃度較佳為不大於2 ppm。進一步地說,所述包含硫原子化合物的磺酸或其金屬鹽類可以例如是選自由雙-(3-磺丙基)-二硫二鈉鹽(bis-(3-sulfopropyl)-disulfide disodium salt, SPS)、3-巰基-1-丙烷磺酸(3-mercapto-1-propanesulfonic acid, MPS)、3-(N,N-二甲基胺硫甲醯基)-硫代丙烷磺酸鈉鹽(3-(N,N-dimethylthiocarbamoyl)-thiopropanesulfonate sodium salt, DPS)、3-〔(氨基-亞胺基甲基)硫基〕-1-丙烷磺酸鈉鹽(3-〔(amino-iminomethyl)thio〕-1-propanesulfonate sodium salt, UPS)、o-乙基二硫代碳酸酯-S-(3-磺丙基)-酯鈉鹽(o-ethyldithiocarbonato-S-(3-sulfopropyl)-ester sodium salt, OPX)、3-(苯並噻唑基-2-巰基)-丙基-磺酸鈉鹽(3-(benzothiazolyl-2-mercapto)-propyl-sulfonic acid sodium salt, ZPS)、乙烯二硫代二丙基磺酸鈉鹽(ethylenedithiodipropylsulfonic acid sodium salt)、硫代乙醇酸(thioglycolic acid)、硫代磷酸-o-乙基-雙-(ω-磺丙基)酯二鈉鹽(thiophosphoric acid-o-ethyl-bis-(ω-sulfopropyl)ester disodium salt)以及硫代磷酸-參-(ω-磺丙基)酯三鈉鹽(thiophosphoric acid-tris-(ω-sulfopropyl)ester trisodium salt)所組成的群組中的至少一種。在本實施例中,所述第二添加劑較佳為3-巰基-1-丙烷磺酸(3-mercapto-1-propanesulfonic acid, MPS),但本創作不受限於此。The second additive is a sulfonic acid or a metal salt thereof containing a sulfur atom compound. Among them, in the copper electrolytic solution, the concentration of the sulfonic acid or a metal salt thereof containing the sulfur atom compound is preferably not more than 2 ppm. Further, the sulfonic acid or a metal salt thereof containing the sulfur atom compound may be, for example, selected from the group consisting of bis-(3-sulfopropyl)-disulfide disodium salt. , SPS), 3-mercapto-1-propanesulfonic acid (MPS), 3-(N,N-dimethylaminethiomethane)-thiopropane sulfonate sodium salt (3-(N,N-dimethylthiocarbamoyl)-thiopropanesulfonate sodium salt, DPS), 3-[(amino-iminomethyl)thio]-1-propanesulfonic acid sodium salt (3-[(amino-iminomethyl)) Thio]-1-propanesulfonate sodium salt, UPS), o-ethyldithiocarbonate-S-(3-sulfopropyl)-ester sodium Salt, OPX), 3-(benzothiazolyl-2-mercapto)-propyl-sulfonic acid sodium salt (ZPS), ethylene dithio Ethylenedithiodipropylsulfonic acid sodium salt, thioglycolic acid, thiophosphoric acid-o-ethyl-bis-(ω-sulfopropyl) disodium salt (thiophosphoric acid-o) -ethyl-bis-(ω-sulfopropyl)ester disodium salt) And at least one of the group consisting of thiophosphoric acid-tris-(ω-sulfopropylester ester trisodium salt). In the present embodiment, the second additive is preferably 3-mercapto-1-propanesulfonic acid (MPS), but the creation is not limited thereto.
所述第三添加劑為一非離子水溶性高分子。其中,在所述銅電解液中,所述非離子水溶性高分子的濃度較佳為不大於5 ppm。進一步地說,所述非離子水溶性高分子可以例如是選自由羥乙基纖維素(hydroxyethyl cellulose, HEC)、聚乙二醇(poly(ethylene oxide), PEG)、聚甘油(polyglycerin)、羧甲基纖維素(carboxymethylcellulose)、壬基酚聚乙二醇醚(nonylphenol polyglycol ether)、辛烷二醇-雙-(聚烯烴二醇醚)(octane diol-bis-(polyalkylene glycol ether))、辛醇聚烯烴二醇醚(octanol polyalkylene glycol ether)、油酸聚乙二 醇醚(oleic acid polyglycol ether)、聚乙烯丙二醇(polyethylene propylene glycol)、聚乙二醇二甲基醚(polyethylene glycol dimethyl ether)、聚氧化丙烯二醇(polyoxypropylene glycol)、聚乙烯醇、ß-萘酚聚乙二醇醚(ß-naphthol polyglycol ether)、硬脂酸聚乙二醇醚(stearic acid polyglycol ether)以及硬脂醇聚乙二醇醚(stearyl alcohol polyglycol ether)所組成的群組至少一種。在本實施例中,所述第三添加劑較佳為羥乙基纖維素(hydroxyethyl cellulose, HEC),但本創作不受限於此。The third additive is a nonionic water soluble polymer. Wherein, in the copper electrolyte, the concentration of the nonionic water-soluble polymer is preferably not more than 5 ppm. Further, the nonionic water-soluble polymer may be, for example, selected from the group consisting of hydroxyethyl cellulose (HEC), polyethylene (poly(ethylene oxide), PEG), polyglycerin, and carboxylate. Carboxymethylcellulose, nonylphenol polyglycol ether, octane diol-bis-(polyalkylene glycol ether), xin Otanal polyalkylene glycol ether, oleic acid polyglycol ether, polyethylene propylene glycol, polyethylene glycol dimethyl ether , polyoxypropylene glycol, polyvinyl alcohol, ß-naphthol polyglycol ether, stearic acid polyglycol ether, and stearyl alcohol At least one group consisting of stearyl alcohol polyglycol ether. In the present embodiment, the third additive is preferably hydroxyethyl cellulose (HEC), but the creation is not limited thereto.
其中,以所述銅電解液的總重為基準,所述第一添加劑、第二添加劑、及第三添加劑的濃度的總和較佳為不大於12 ppm,並且更佳為不大於10 ppm。再者,上述各種添加劑的使用目的主要是在於提升電解銅箔110的表面光澤度、及降低電解銅箔110的表面粗糙度。Wherein, the sum of the concentrations of the first additive, the second additive, and the third additive is preferably not more than 12 ppm, and more preferably not more than 10 ppm, based on the total weight of the copper electrolytic solution. Further, the above various additives are mainly used for improving the surface glossiness of the electrolytic copper foil 110 and reducing the surface roughness of the electrolytic copper foil 110.
步驟S120為實施一電鍍步驟,包含:電解所述銅電解液以形成一生箔層111。Step S120 is to perform a plating step, comprising: electrolyzing the copper electrolyte to form a green foil layer 111.
更具體地說,所述電鍍步驟包含:將所述銅電解液加熱至一預定溫度,其中,所述預定溫度是介於50℃至60℃之間,且更佳是介於50℃至55℃之間;接著,藉由在所述預定溫度下的銅電解液中,在電極板和旋轉電鍍輪(rotating electrode drum)之間形成電流密度為30 A/dm 2至80 A/dm 2的電流密度來進行電鍍,以在所述旋轉電鍍輪上形成所述生箔層111。 More specifically, the electroplating step comprises: heating the copper electrolyte to a predetermined temperature, wherein the predetermined temperature is between 50 ° C and 60 ° C, and more preferably between 50 ° C and 55 Between ° C; then, a current density of 30 A/dm 2 to 80 A/dm 2 is formed between the electrode plate and the rotating electrode drum in the copper electrolyte at the predetermined temperature. Electroplating is performed to form the green foil layer 111 on the rotating plating wheel.
其中,如同上述實施例的描述,所述生箔層111具有一第一表面S1及相對於所述第一表面S1的一第二表面S2。其中,在所述第一表面S1的X光繞射光譜中,所述第一表面S1的(200)結晶面的繞射峰強度I(200)與所述第一表面S1的(111)結晶面的繞射峰強度I(111)的比值是介於0.5至2.0之間。其中,在所述第二表面S2的X光繞射光譜中,所述第二表面S2的(200)結晶面的繞射峰強度I(200)與所述第二表面S2的(111)結晶面的繞射峰強度I(111)的比值也是介於0.5至2.0之間。Wherein, as described in the above embodiment, the green foil layer 111 has a first surface S1 and a second surface S2 opposite to the first surface S1. Wherein, in the X-ray diffraction spectrum of the first surface S1, a diffraction peak intensity I (200) of the (200) crystal plane of the first surface S1 and (111) crystallization of the first surface S1 The ratio of the diffraction peak intensity I(111) of the face is between 0.5 and 2.0. Wherein, in the X-ray diffraction spectrum of the second surface S2, a diffraction peak intensity I (200) of the (200) crystal plane of the second surface S2 and (111) crystallization of the second surface S2 The ratio of the diffraction peak intensity I(111) of the face is also between 0.5 and 2.0.
基於上述製程條件,包括:添加劑的種類選擇、明膠的分子量選擇、添加劑的濃度調整(不大於12 ppm)、氯離子的濃度調整、及銅電解液的溫度調整,本實施例的電解銅箔110的結晶位向是以(200)結晶面及(111)結晶面為主,因此所述電解銅箔110的多個晶粒之間容易產生滑移的現象,從而使得所述電解銅箔110能具有高的延伸率。也就是說,本實施例的電解銅箔110能夠藉由上述製程條件,而在低的添加劑濃度的使用下,仍能夠具有良好的延伸特性,從而大幅降低了添加劑的使用成本,並且改善了生產時製程不好控制的問題。The electrolytic copper foil 110 of the present embodiment is based on the above process conditions, including: selection of the type of the additive, selection of the molecular weight of the gelatin, adjustment of the concentration of the additive (not more than 12 ppm), adjustment of the concentration of the chloride ion, and temperature adjustment of the copper electrolyte. The crystal orientation is mainly composed of a (200) crystal plane and a (111) crystal plane, so that a phenomenon of slippage between the plurality of crystal grains of the electrolytic copper foil 110 is likely to occur, so that the electrolytic copper foil 110 can Has a high elongation. That is to say, the electrolytic copper foil 110 of the present embodiment can still have good elongation characteristics under the use of a low additive concentration by the above-described process conditions, thereby greatly reducing the use cost of the additive and improving the production. The problem of poor control of the process.
進一步地說,在本實施例中,所述生箔層111的第一表面S1進一步限定為在電鍍過程中與旋轉電鍍輪接觸的一光澤表面SS(也稱作S面,S surface),並且所述生箔層111的第二表面進一步限定為與光澤表面SS相對的另一個光澤表面MS(也稱作M面,M surface)。Further, in the present embodiment, the first surface S1 of the green foil layer 111 is further defined as a glossy surface SS (also referred to as S surface, S surface) that is in contact with the rotating plating wheel during electroplating, and The second surface of the green foil layer 111 is further defined as another glossy surface MS (also referred to as M surface) opposite the glossy surface SS.
其中,在所述S面的X光繞射光譜中,所述S面的(200)結晶面的繞射峰強度I(200)與所述S面的(111)結晶面的繞射峰強度I(111)的比值定義為一第一繞射峰強度比值。並且在所述M面的X光繞射光譜中,所述M面的(200)結晶面的繞射峰強度I(200)與所述M面的(111)結晶面的繞射峰強度I(111)的比值定義為一第二繞射峰強度比值。Wherein, in the X-ray diffraction spectrum of the S-plane, a diffraction peak intensity I (200) of the (200) crystal plane of the S-plane and a diffraction peak intensity of the (111) crystal plane of the S-plane The ratio of I(111) is defined as a first diffraction peak intensity ratio. And in the X-ray diffraction spectrum of the M-plane, the diffraction peak intensity I (200) of the (200) crystal plane of the M plane and the diffraction peak intensity I of the (111) crystal plane of the M plane The ratio of (111) is defined as a second diffraction peak intensity ratio.
其中,在本實施例中,所述第一繞射峰強度比值較佳地是小於所述第二繞射峰強度比值,並且所述第一繞射峰強度比值較佳地是與所述第二繞射峰強度比值的差值的絕對值不小於0.01、且不大於0.30,相關內容請參閱下述表1及表2的分析。In the embodiment, the first diffraction peak intensity ratio is preferably smaller than the second diffraction peak intensity ratio, and the first diffraction peak intensity ratio is preferably the same as the first The absolute value of the difference between the two diffraction peak intensity ratios is not less than 0.01 and not more than 0.30. For the related content, please refer to the analysis in Table 1 and Table 2 below.
步驟S130為實施一抗氧化處理步驟,包含:在所述生箔層111的第一表面S1上形成一第一抗氧化處理層112a,並且在所述生箔層111的第二表面S2上形成一第二抗氧化處理層112b,以使得所述生箔層111、第一抗氧化處理層112a、及第二抗氧化處理層112b共同形成為一電解銅箔110。其中,以所述電解銅箔110的總重為基準,所述第一抗氧化處理層112a及第二抗氧化處理層112b皆包含有總重量含量介於1重量百萬分率(Parts per million,ppm)至1,000重量百萬分率的一非銅金屬元素,並且所述非銅金屬元素是選自於由鉻、鋅、鎳、鉬、錳、磷及其組合物所組成的群組中的至少一種元素。Step S130 is to perform an anti-oxidation treatment step, comprising: forming a first anti-oxidation treatment layer 112a on the first surface S1 of the green foil layer 111, and forming on the second surface S2 of the green foil layer 111. A second oxidation resistant layer 112b is formed such that the green foil layer 111, the first oxidation resistant layer 112a, and the second oxidation resistant layer 112b are collectively formed as an electrolytic copper foil 110. Wherein, the first anti-oxidation treatment layer 112a and the second anti-oxidation treatment layer 112b all contain a total weight content of 1 part per million (Parts per million) based on the total weight of the electrolytic copper foil 110. , ppm) to a non-copper metal element of 1,000 parts by weight, and the non-copper metal element is selected from the group consisting of chromium, zinc, nickel, molybdenum, manganese, phosphorus, and combinations thereof. At least one element.
更具體地說,所述抗氧化處理步驟包含:使用包含有所述非銅金屬元素(如:鉻、鋅、鎳、鉬、錳、及磷中至少一種元素)的處理溶液對所述生箔層111進行電鍍處理或者是含浸處理,以使得所述生箔層111的第一表面S1上形成有第一抗氧化處理層112a,並且使得所述生箔層111的第二表面S2上形成有第二抗氧化處理層112b,藉此,所述電解銅箔110的抗氧化特性能被有效地提升。其中,上述處理溶液可以例如是包含有0.1 g/L至5.0 g/L的氧化鉻、硫酸鋅、硫酸鎳、鉬酸鈉、硫酸猛、或磷酸。再者,上述電鍍處理的電流密度可以例如介於0.3 A/dm 2至3.0 A/dm 2之間。上述含浸處理的浸泡時間可以例如是2秒至20秒之間,但本創作不受限於此。 More specifically, the anti-oxidation treatment step includes: treating the green foil with a treatment solution containing the non-copper metal element (eg, at least one of chromium, zinc, nickel, molybdenum, manganese, and phosphorus) The layer 111 is subjected to a plating treatment or an impregnation treatment such that the first anti-oxidation treatment layer 112a is formed on the first surface S1 of the green foil layer 111, and the second surface S2 of the green foil layer 111 is formed thereon. The second oxidation-resistant layer 112b, whereby the oxidation resistance of the electrolytic copper foil 110 is effectively improved. Wherein, the above treatment solution may, for example, contain 0.1 g/L to 5.0 g/L of chromium oxide, zinc sulfate, nickel sulfate, sodium molybdate, sulfuric acid, or phosphoric acid. Further, the current density of the above plating treatment may be, for example, between 0.3 A/dm 2 and 3.0 A/dm 2 . The soaking time of the above impregnation treatment may be, for example, between 2 seconds and 20 seconds, but the present creation is not limited thereto.
[實驗數據測試][Experimental data test]
以下,參照示範例1至5與比較例1至3詳細說明本創作之內容。然而,以下實施例僅作為幫助了解本創作的實施例,本創作的範圍並不限於這些實施例。Hereinafter, the contents of the present creation will be described in detail with reference to the exemplary examples 1 to 5 and the comparative examples 1 to 3. However, the following examples are merely examples to help understand the present creation, and the scope of the present creation is not limited to these embodiments.
在電解液中的電極板和旋轉電鍍輪之間產生電流以在旋轉電鍍輪上形成生箔層。銅電解液包含50 g/L至70 g/L的銅離子、70 g/L至120 g/L的硫酸。電鍍的電流密度介於30 A/dm 2至80 A/dm 2。用於電鍍的銅電解液溫度、氯離子濃度、明膠的重量平均分子量、明膠濃度(第一添加劑濃度)、MPS濃度(第二添加劑濃度)、及HEC濃度(第三添加劑濃度)等製程條件如下表1所示。通過浸泡通過電鍍形成生箔層,通過抗氧化處理形成抗氧化處理層,然後乾燥完成電解銅箔。 An electric current is generated between the electrode plates in the electrolyte and the rotating plating wheel to form a green foil layer on the rotating plating wheel. The copper electrolyte contains 50 g/L to 70 g/L of copper ions and 70 g/L to 120 g/L of sulfuric acid. The current density of the plating is between 30 A/dm 2 and 80 A/dm 2 . Process conditions such as copper electrolyte temperature, chloride ion concentration, gelatin weight average molecular weight, gelatin concentration (first additive concentration), MPS concentration (second additive concentration), and HEC concentration (third additive concentration) for electroplating are as follows Table 1 shows. The green foil layer is formed by electroplating by immersion, an oxidation resistant treatment layer is formed by an oxidation treatment, and then the electrolytic copper foil is dried.
值得一提的是,在示範例1至示範例5中,以銅電解液的總重為基準,上述明膠濃度(第一添加劑濃度)、MPS濃度(第二添加劑濃度)、及HEC濃度(第三添加劑濃度)的總和皆不大於12 ppm,並且更佳為不大於10 ppm。It is worth mentioning that in the first to the fifth examples, the gelatin concentration (first additive concentration), the MPS concentration (second additive concentration), and the HEC concentration (the first) are based on the total weight of the copper electrolyte. The sum of the three additive concentrations) is not more than 12 ppm, and more preferably not more than 10 ppm.
[表1 示範例與比較例的製程參數條件] 項目銅電解液溫度(℃)氯離子濃度(ppm)明膠重量平均分子量明膠濃度(ppm)MPS濃度(ppm)HEC濃度(ppm)示範例150302,0004.00.94.0示範例253302,0004.00.54.0示範例353134,0003.00.23.0示範例453134,0001.00.50.5示範例553134,0001.00.42.0比較例153304,00070.010.020.0比較例253134,00070.010.020.0比較例35830>10,0004.01.04.0[Table 1 Process Parameter Conditions of Exemplary and Comparative Examples] Item Copper electrolyte temperature (°C) Chloride ion concentration (ppm) Gelatin Weight average molecular weight Gelatin concentration (ppm) MPS concentration (ppm) HEC concentration (ppm) Example 150302,0004.00.94.0 Example 253302,0004.00.54.0 Example 353134 , 0003.00.23.0 Example 453134,0001.00.50.5 Example 553134,0001.00.42.0 Comparative Example 153304, 00070.010.020.0 Comparative Example 253134, 00070.010.020.0 Comparative Example 35830> 10,0004.01.04.0
由示範例1至5與比較例1至3所得的電解銅箔中,測量該些電解銅箔的第一表面(也即與旋轉電鍍輪接觸的光澤表面,簡稱S面)與第二表面(也即與S面相對的另一光澤面,簡稱M面)在未經過任何熱處理步驟前及在經過一熱處理步驟後的相關特性數值,包含:XRD分析數值、拉伸強度、及延伸率,測試結果如下表2所示。其中,上述熱處理步驟指得是將電解銅箔置放於180℃的溫度環境下進行烘烤1.0小時。From the electrolytic copper foils obtained in Exemplary Examples 1 to 5 and Comparative Examples 1 to 3, the first surface of the electrolytic copper foil (that is, the glossy surface in contact with the rotary plating wheel, referred to as the S surface) and the second surface were measured (referred to as the S surface). That is, the other characteristic surface of the other glossy surface opposite to the S surface, referred to as M surface) before and after a heat treatment step, includes: XRD analysis value, tensile strength, and elongation, and testing The results are shown in Table 2 below. The heat treatment step refers to baking the electrolytic copper foil at a temperature of 180 ° C for 1.0 hour.
XRD測量:量測由示範例1至示範例5以及比較例1至比較例3所製得之電解銅箔的S面及M面的X光繞射(XRD)光譜(如:圖2),藉此,I(200)/I(111)的比值及(I220)/(I111)的比值能被計算出來。更具體地說,電解銅箔的XRD測量是利用Bruker的D2Phaser機台進行分析,且是通過在20°至95°的繞射角內進行X射線繞射(X-ray diffraction)[標靶:銅K α1,2θ之間隔:0.01°,和2θ之掃瞄速率:0.13度/分秒]獲得具有對應n個晶面的峰的一XRD圖(例如其中存在對應於晶面(111)、(200)、(220)和(311)的峰的XRD圖)。並從XRD圖獲得各該晶面(hkl)的XRD繞射(光)強度[I(hkl)]。藉此,I(200)/I(111)的比值及(I220)/(I111)的比值能被計算出來。XRD measurement: X-ray diffraction (XRD) spectra of S and M faces of the electrodeposited copper foils obtained in Exemplary Examples 1 to 5 and Comparative Examples 1 to 3 (for example, FIG. 2) were measured. Thereby, the ratio of I(200)/I(111) and the ratio of (I220)/(I111) can be calculated. More specifically, the XRD measurement of the electrolytic copper foil was performed by Bruker's D2 Phaser machine, and X-ray diffraction was performed by a diffraction angle of 20 to 95 [target: The interval between copper K α1, 2θ: 0.01°, and the scan rate of 2θ: 0.13 degrees/minute second] obtains an XRD pattern having peaks corresponding to n crystal faces (for example, where there is a corresponding crystal face (111), ( XRD patterns of peaks of 200), (220) and (311). The XRD diffraction (light) intensity [I(hkl)] of each of the crystal faces (hkl) was obtained from the XRD pattern. Thereby, the ratio of I(200)/I(111) and the ratio of (I220)/(I111) can be calculated.
拉伸強度及延伸率測量:處理由示範例1至示範例5以及比較例1至比較例3所製得之電解銅箔。該些電解銅箔可根據IPC-TM-650 2.4.18B標準,在十字頭速度(crosshead velocity)為50.8毫米/分鐘下進行這些拉伸樣本的拉伸試驗。測得之拉伸強度的最大荷重(load)稱為室溫拉伸強度(RTS),且破裂時的延伸率稱為室溫延伸率(REL)。本文之室溫代表20℃至30℃。接著,將用於室溫拉伸強度以及延伸率之量測之相同的電解銅箔於180℃下進行1小時的熱處理,接著在室溫下以相同的方法量測其拉伸強度以及延伸率,所測得之拉伸強度與延伸率稱為熱後拉伸強度(ATS)與熱後延伸率(AEL)。Tensile strength and elongation measurement: The electrolytic copper foils obtained in Examples 1 to 5 and Comparative Examples 1 to 3 were treated. These electrolytic copper foils can be subjected to tensile tests of these tensile specimens according to the IPC-TM-650 2.4.18B standard at a crosshead velocity of 50.8 mm/min. The maximum load of the measured tensile strength is called room temperature tensile strength (RTS), and the elongation at break is called room temperature elongation (REL). The room temperature herein represents 20 ° C to 30 ° C. Next, the same electrolytic copper foil for measuring the tensile strength at room temperature and the elongation was subjected to heat treatment at 180 ° C for 1 hour, and then the tensile strength and elongation were measured in the same manner at room temperature. The measured tensile strength and elongation are referred to as thermal post tensile strength (ATS) and post thermal extensibility (AEL).
[表2 示範例與比較例的測試實驗數據] 示範例1示範例2示範例3示範例4示範例5比較例1比較例2比較例3I(200)/I(111)S面 熱處理前0.580.670.520.860.830.250.240.25M面 熱處理前0.720.810.581.080.930.250.240.20S面 熱處理後0.710.710.601.170.900.290.260.32M面 熱處理後0.750.790.671.290.950.240.230.30I(220)/I(111)S面 熱處理前0.150.150.130.150.140.140.330.15M面 熱處理前0.160.160.140.150.140.170.190.21S面 熱處理後0.180.150.140.180.140.200.300.16M面 熱處理後0.140.140.160.160.130.270.170.20RTS(kgf/mm 2) 32.233.733.534.234.432.431.839.4REL(%)8.39.78.97.99.25.85.13.0ATS(kgf/mm 2) 31.130.729.629.730.832.229.029.6AEL(%)15.011.910.19.713.49.28.94.0[Table 2 Test Experimental Data of Exemplary and Comparative Examples] Example 1 Example 2 Example 3 Example 4 Example 5 Comparative Example 1 Comparative Example 2 Comparative Example 3I (200) / I (111) S surface heat treatment before 0.580.670.520.860.830.250.240.25M face before heat treatment 0.720. After 810.581.080.930.250.240.20S surface heat treatment 0.710.710.601.170.900.290.260.32M surface heat treatment 0.750.790.671.290.950.240.230.30I(220)/I(111)S surface heat treatment before 0.150.150.130.150.140.140.330 .15M surface heat treatment before 0.160.160.140.150.140.170.190.21S surface heat treatment 0.180.150.140.180.140.200.300.16M surface heat treatment 0.140.140.160.160.160.130.270.170.20RTS (kgf/mm 2) 32.233.733.534.234.432.431.839.4REL(%)8.39.78.97.99.25.85.13.0ATS(kgf/mm 2) 31.130.729.629.730.832.229.029.6AEL(%)15.011.910.19.713.49.28.94.0
由表2可以得知,示範例1至示範例5的電解銅箔,以XRD分析之I(200)/I(111)比值,大致是落在0.5至2.0的範圍內,更精確地說是落在0.52至1.29的範圍內。比較例1至比較例3的電解銅箔,以XRD分析之I(200)/I(111)比值皆小於0.5,更精確地說是落在0.2至0.33的範圍內。也就是說,示範例1至示範例5的電解銅箔的I(200)/I(111)比值相較於比較例1至比較例3的電解銅箔的I(200)/I(111)比值來得高出許多。As can be seen from Table 2, the electrolytic copper foils of Examples 1 to 5 have an I(200)/I(111) ratio analyzed by XRD, which falls substantially in the range of 0.5 to 2.0, more precisely, It falls within the range of 0.52 to 1.29. In the electrolytic copper foils of Comparative Examples 1 to 3, the I(200)/I(111) ratios by XRD analysis were all less than 0.5, more precisely, falling within the range of 0.2 to 0.33. That is, the I(200)/I(111) ratio of the electrolytic copper foils of Exemplary Examples 1 to 5 was I(200)/I(111) compared with the electrolytic copper foils of Comparative Examples 1 to 3. The ratio is much higher.
從另一個角度觀察,示範例1至示範例5的電解銅箔,在熱處理前,其S面的I(200)/I(111)比值相較於其M面的I(200)/I(111)比值皆來得低。再者,示範例1至示範例5的電解銅箔,在熱處理後,其S面的I(200)/I(111)比值相較於其M面的I(200)/I(111)比值也皆來得低,但是兩者之間的差值有縮小的趨勢。From another point of view, the electrolytic copper foils of Examples 1 to 5 have a ratio of I(200)/I(111) of the S surface to I(200)/I of the M plane before heat treatment. 111) The ratio is low. Further, in the electrolytic copper foils of Exemplary Examples 1 to 5, after the heat treatment, the I (200) / I (111) ratio of the S surface is compared with the I (200) / I (111) ratio of the M surface thereof. It is also low, but the difference between the two has a tendency to shrink.
再者,在示範例1至示範例5中,無論是S面或者是M面,其在熱處理前的I(200)/I(111)比值大部分低於其在熱處理後的I(200)/I(111)比值。也就是說,熱處理將會使得電解銅箔的I(200)/I(111)比值些微地提升。Furthermore, in Examples 1 to 5, the I(200)/I(111) ratio before heat treatment is mostly lower than the I (200) after heat treatment, whether it is the S surface or the M surface. /I(111) ratio. That is to say, the heat treatment will cause the I(200)/I(111) ratio of the electrolytic copper foil to be slightly increased.
更具體地說,示範例1至示範例5的電解銅箔,在熱處理前,其S面的I(200)/I(111)比值是落在0.52至0.86的範圍內,而在熱處理後,其S面的I(200)/I(111)比值是落在0.60至1.17的範圍內。示範例1至示範例5的電解銅箔,在熱處理前,其M面的I(200)/I(111)比值是落在0.58至1.08的範圍內,而在熱處理後,其S面的I(200)/I(111)比值是落在0.67至1.29的範圍內。More specifically, in the electrolytic copper foils of Exemplary Examples 1 to 5, the I (200) / I (111) ratio of the S surface of the first embodiment is in the range of 0.52 to 0.86, and after the heat treatment, The I(200)/I(111) ratio of the S plane thereof falls within the range of 0.60 to 1.17. In the electrolytic copper foils of Exemplary Examples 1 to 5, the I(200)/I(111) ratio of the M-plane before the heat treatment is in the range of 0.58 to 1.08, and after the heat treatment, the S-plane I The (200)/I(111) ratio falls within the range of 0.67 to 1.29.
其中,上述S面(光澤表面)的I(200)/I(111)比值可以定義為一第一繞射峰強度比值,並且上述M面(另一光澤表面)的I(200)/I(111)比值可以定義為一第二繞射峰強度比值。也就是說,示範例1至示範例5的電解銅箔,無論是在熱處理前或者是在熱處理後,其第一繞射峰強度比值皆是小於其第二繞射峰強度比值,並且其第一繞射峰強度比值與其第二繞射峰強度比值的差值的絕對值皆不小於0.01、且皆不大於0.30。Wherein, the I(200)/I(111) ratio of the S surface (glossy surface) may be defined as a first diffraction peak intensity ratio, and the above M surface (the other gloss surface) is I(200)/I ( 111) The ratio can be defined as a second diffraction peak intensity ratio. That is, the electrolytic copper foils of Examples 1 to 5 have a first diffraction peak intensity ratio smaller than the second diffraction peak intensity ratio before or after the heat treatment, and the first The absolute value of the difference between the diffraction peak intensity ratio and the second diffraction peak intensity ratio is not less than 0.01, and is not more than 0.30.
再者,由表2可以得知,示範例1至示範例5的電解銅箔,在熱處理前,其室溫拉伸強度(RTS)大致是落在28 kgf/mm 2至40 kgf/mm 2的範圍內,並且其室溫延伸率(REL)皆不小於7%。 Further, as can be seen from Table 2, the electrolytic copper foils of Exemplary Examples 1 to 5 have a room temperature tensile strength (RTS) of approximately 28 kgf/mm 2 to 40 kgf/mm 2 before heat treatment. Within the range, and its room temperature elongation (REL) is not less than 7%.
示範例1至示範例5的電解銅箔,在熱處理後,其熱後拉伸強度(ATS)大致是落在25 kgf/mm 2至35 kgf/mm 2的範圍內,並且其熱後延伸率(AEL)皆不小於9.5%。值得一提的是,無論是在熱處理前及熱處理後,示範例1至示範例5的電解銅箔的延伸率,皆明顯高於比較例1至比較例3在延伸率。顯然,示範例1至示範例5的電解銅箔具有較佳的延伸率表現。 The electrolytic copper foils of Exemplary Examples 1 to 5 have a heat tensile strength (ATS) of approximately 25 kgf/mm 2 to 35 kgf/mm 2 after heat treatment, and their post-heat elongation (AEL) are not less than 9.5%. It is worth mentioning that the elongation of the electrolytic copper foils of Exemplary Examples 1 to 5 was significantly higher than that of Comparative Examples 1 to 3 before and after the heat treatment. It is apparent that the electrolytic copper foils of Exemplary Examples 1 to 5 have a better elongation performance.
進一步地說,示範例1至示範例5的添加劑濃度(包含明膠濃度、MPS濃度、HEC濃度)皆遠低於比較例1及比較例2的添加劑濃度。能夠在使用低添加劑濃度的條件下仍能製造出具有高REL及AEL的電解銅箔的原因在於,上述各製程條件(包括:添加劑的種類選擇、明膠的分子量選擇、氯離子的濃度調整、及銅電解液的溫度調整)彼此之間有適當的搭配。Further, the additive concentrations (including gelatin concentration, MPS concentration, and HEC concentration) of Examples 1 to 5 were much lower than the additive concentrations of Comparative Example 1 and Comparative Example 2. The reason why the electrolytic copper foil having high REL and AEL can be produced under the condition of using low additive concentration is the above various process conditions (including: selection of additives, molecular weight selection of gelatin, concentration adjustment of chloride ions, and The temperature adjustment of the copper electrolyte is properly matched to each other.
藉此,示範例1至示範例5的電解銅箔的結晶位向是以(200)結晶面及(111)結晶面為主,從而能具有高的延伸率。也就是說,示範例1至示範例5的電解銅箔能夠藉由上述製程條件,而在低的添加劑濃度的使用下,仍能夠具有良好的延伸特性,從而大幅降低了添加劑的使用成本,並且改善了生產時製程不好控制的問題。Thereby, the crystal orientation of the electrodeposited copper foils of the example 1 to the example 5 is mainly a (200) crystal plane and a (111) crystal plane, and thus can have a high elongation. That is, the electrolytic copper foils of Exemplary Examples 1 to 5 can still have good elongation characteristics by using the above-described process conditions, and at a low additive concentration, thereby greatly reducing the use cost of the additive, and Improved the problem of poor control of the process during production.
另外,由表2之比較例3可以看出明膠分子量選擇的重要性。更具體地說,儘管比較例3的製程條件(包括:銅電解液溫度、氯離子濃度、及各種添加劑的濃度)是接近於示範例1的製程條件。然而,由於比較例3所選擇的明膠分子量過大(大於10,000),因此由比較例3的製程條件所製得的電解銅箔,其(200)結晶面的繞射峰強度I(200)無法接近其(111)結晶面的繞射峰強度I(111),並且其I(200)/I(111)比值小於0.5,因此比較例3的電解銅箔在REL及AEL的表現上皆不如示範例1在REL及AEL的表現。In addition, the importance of gelatin molecular weight selection can be seen from Comparative Example 3 of Table 2. More specifically, although the process conditions of Comparative Example 3 (including: copper electrolyte temperature, chloride ion concentration, and concentration of various additives) were close to the process conditions of Example 1. However, since the gelatin molecular weight selected in Comparative Example 3 was too large (greater than 10,000), the electrolytic peak copper obtained by the process conditions of Comparative Example 3 had a diffraction peak intensity I (200) of the (200) crystal face which could not be obtained. The diffraction peak intensity I (111) of the (111) crystal plane, and its I (200) / I (111) ratio is less than 0.5, so the electrolytic copper foil of Comparative Example 3 is inferior to the example in the performance of REL and AEL. 1 performance in REL and AEL.
[鋰離子二次電池][Lithium ion secondary battery]
請參閱圖4及圖5所示,圖4為本創作實施例的負極的側視示意圖,並且圖5為本創作實施例的鋰離子二次電池的示意圖。在本實施例中,上述電解銅箔110可以應用於鋰離子二次電池E(也可稱為鋰離子蓄電池),並且可以做為鋰離子二次電池E的負極100材料。Referring to FIG. 4 and FIG. 5, FIG. 4 is a schematic side view of the negative electrode of the present embodiment, and FIG. 5 is a schematic view of the lithium ion secondary battery of the present embodiment. In the present embodiment, the above-described electrolytic copper foil 110 can be applied to a lithium ion secondary battery E (which may also be referred to as a lithium ion secondary battery), and can be used as a material of the negative electrode 100 of the lithium ion secondary battery E.
其中,上述鋰離子二次電池E可以為儲能型、動力型、或能量型的蓄電池,並且可以應用為車用電池。上述車用電池可以應用於電動車、電動巴士、及油電混合車等,但本創作不受限於此。The lithium ion secondary battery E may be an energy storage type, a power type, or an energy type storage battery, and may be applied as a battery for a vehicle. The above-described vehicle battery can be applied to an electric vehicle, an electric bus, a hybrid electric vehicle, etc., but the creation is not limited thereto.
請繼續參閱圖5所示,上述鋰離子二次電池E包含一負極100(或稱陽極)、一正極200(或稱陰極)、一隔離膜300、及一電解槽400。其中,所述電解槽400具有一容置空間R,其用以容置一電解液(圖未繪示)。所述負極100設置於電解槽400的容置空間R中。所述正極200也設置於電解槽400的容置空間R中、且與所述負極100呈間隔地設置。所述隔離膜300設置於負極100及正極200之間。其中,當所述電解槽400容置電解液時,所述電解液可以提供環境讓鋰離子能於正極200和負極100之間移動,所述隔離膜300可電性絕緣正極200和負極100,藉以避免鋰離子二次電池E的內部發生短路的情況。Referring to FIG. 5, the lithium ion secondary battery E includes a negative electrode 100 (or an anode), a positive electrode 200 (or a cathode), a separator 300, and an electrolytic cell 400. The electrolytic cell 400 has an accommodating space R for accommodating an electrolyte (not shown). The anode 100 is disposed in the accommodating space R of the electrolytic cell 400. The positive electrode 200 is also disposed in the accommodating space R of the electrolytic cell 400 and is disposed at a distance from the negative electrode 100. The separator 300 is disposed between the anode 100 and the cathode 200. Wherein, when the electrolytic cell 400 houses the electrolyte, the electrolyte can provide an environment for lithium ions to move between the positive electrode 200 and the negative electrode 100, and the separator 300 can electrically insulate the positive electrode 200 and the negative electrode 100, By avoiding a short circuit inside the lithium ion secondary battery E.
其中,上述鋰離子二次電池E的正極200包含有一鋁箔及塗覆於所述鋁箔上的正極活性材料(圖未繪示),但本創作不受限於此。The positive electrode 200 of the lithium ion secondary battery E includes an aluminum foil and a positive electrode active material (not shown) coated on the aluminum foil, but the creation is not limited thereto.
請繼續參閱圖4所示,上述鋰離子二次電池E的負極100包含所述電解銅箔110、一第一活性材料層120a、及一第二活性材料層120b。所述第一活性材料層120a及第二活性材料層120b分別設置於電解銅箔110的兩個位於相反側的表面上。更具體地說,所述第一活性材料層120a是設置於第一抗氧化處理層112a的遠離生箔層111的一表面上,並且所述第二活性材料層120b是設置於第二抗氧化處理層112b的遠離生箔層111的一表面上。Referring to FIG. 4, the negative electrode 100 of the lithium ion secondary battery E includes the electrolytic copper foil 110, a first active material layer 120a, and a second active material layer 120b. The first active material layer 120a and the second active material layer 120b are respectively disposed on the two opposite surfaces of the electrolytic copper foil 110. More specifically, the first active material layer 120a is disposed on a surface of the first oxidation resistant layer 112a away from the raw foil layer 111, and the second active material layer 120b is disposed on the second antioxidant. The surface of the treatment layer 112b is away from the surface of the green foil layer 111.
需說明的是,在本實施例中,圖4及圖5雖然是以第一活性材料層120a及第二活性材料層120b分別設置於電解銅箔110的兩個表面上為例作說明,但本創作不受限於此。在本創作未繪示的實施例中,所述鋰離子二次電池E的負極100也可以僅包含第一活性材料層120a及第二活性材料層120b的其中一者做為其活性材料層。In the present embodiment, FIGS. 4 and 5 are exemplified by the fact that the first active material layer 120a and the second active material layer 120b are respectively disposed on both surfaces of the electrolytic copper foil 110, but This creation is not limited to this. In the embodiment not shown in the present creation, the anode 100 of the lithium ion secondary battery E may include only one of the first active material layer 120a and the second active material layer 120b as its active material layer.
其中,上述第一活性材料層120a及第二活性材料層120b可包含作為負極活性材料的至少一活性材料,並且所述活性材料選自碳、矽、包含鍺、錫、鋰、鋅、鎂、鎘、鈰、鎳、或鐵之金屬、該金屬之合金、該金屬的氧化物、該金屬和碳的組成物所組成的群組中的至少一種。The first active material layer 120a and the second active material layer 120b may include at least one active material as a negative electrode active material, and the active material is selected from the group consisting of carbon, germanium, containing antimony, tin, lithium, zinc, magnesium, At least one of a group consisting of a metal of cadmium, tellurium, nickel, or iron, an alloy of the metal, an oxide of the metal, and a composition of the metal and carbon.
[實施例的有益效果][Advantageous Effects of Embodiments]
本創作的其中一有益效果在於,本創作所提供的電解銅箔110、其製造方法、及鋰離子二次電池E,其能通過“在所述電解銅箔110的第一表面S1的X光繞射光譜中,所述第一表面S1的(200)結晶面的繞射峰強度I(200)與所述第一表面S1的(111)結晶面的繞射峰強度I(111)的比值是介於0.5至2.0之間”、“在所述電解銅箔110的第二表面S2的X光繞射光譜中,所述第二表面S2的(200)結晶面的繞射峰強度I(200)與所述第二表面S2的(111)結晶面的繞射峰強度I(111)的比值也是介於0.5至2.0之間”、及“所述銅電解液包含有至少一添加劑,並且以所述銅電解液的總重為基準,至少一所述添加劑的濃度不大於12重量百萬分率(ppm)”的技術方案,以使得所述電解銅箔110具有高的延伸率、且能降低電解銅箔110的生產成本、及提升電解銅箔110的生產穩定性。One of the advantageous effects of the present invention is that the electrolytic copper foil 110 provided by the present invention, the method of manufacturing the same, and the lithium ion secondary battery E can pass the "X-ray on the first surface S1 of the electrolytic copper foil 110". The ratio of the diffraction peak intensity I (200) of the (200) crystal plane of the first surface S1 to the diffraction peak intensity I (111) of the (111) crystal plane of the first surface S1 in the diffraction spectrum Is between 0.5 and 2.0", "in the X-ray diffraction spectrum of the second surface S2 of the electrolytic copper foil 110, the diffraction peak intensity I of the (200) crystal plane of the second surface S2 ( 200) a ratio of a diffraction peak intensity I(111) of the (111) crystal plane of the second surface S2 is also between 0.5 and 2.0", and "the copper electrolyte contains at least one additive, and The concentration of at least one of the additives is not more than 12 parts by weight (ppm) based on the total weight of the copper electrolyte, so that the electrolytic copper foil 110 has a high elongation, and The production cost of the electrolytic copper foil 110 can be reduced, and the production stability of the electrolytic copper foil 110 can be improved.
進一步地說,由於本實施例的電解銅箔110的結晶位向是以(200)結晶面及(111)結晶面為主,因此所述電解銅箔110的多個晶粒之間容易產生滑移的現象,從而使得所述電解銅箔110能具有高的延伸率。從另一個角度說,由於本實施例的電解銅箔110的結晶結構為塊狀的結晶結構,因此所述電解銅箔110能具有高的延伸率。Further, since the crystal orientation of the electrodeposited copper foil 110 of the present embodiment is mainly a (200) crystal plane and a (111) crystal plane, the crystal grains of the electrodeposited copper foil 110 are likely to slip. The phenomenon of shifting allows the electrolytic copper foil 110 to have a high elongation. From another point of view, since the crystal structure of the electrolytic copper foil 110 of the present embodiment is a bulk crystal structure, the electrolytic copper foil 110 can have a high elongation.
以上所公開的內容僅為本創作的優選可行實施例,並非因此侷限本創作的申請專利範圍,所以凡是運用本創作說明書及圖式內容所做的等效技術變化,均包含於本創作的申請專利範圍內。The above disclosure is only a preferred and feasible embodiment of the present invention, and is not intended to limit the scope of the patent application of the present invention. Therefore, any equivalent technical changes made by using the present specification and the content of the schema are included in the application for this creation. Within the scope of the patent.
E‧‧‧鋰離子二次電池E‧‧‧Lithium ion secondary battery
100‧‧‧負極 100‧‧‧negative
110‧‧‧電解銅箔 110‧‧‧electrolytic copper foil
111‧‧‧生箔層 111‧‧‧ Raw foil layer
S1‧‧‧第一表面 S1‧‧‧ first surface
S2‧‧‧第二表面 S2‧‧‧ second surface
SS‧‧‧光澤表面(S面) SS‧‧‧Glossy surface (S surface)
MS‧‧‧另一光澤表面(M面) MS‧‧‧ another glossy surface (M side)
112a‧‧‧第一抗氧化處理層 112a‧‧‧First anti-oxidation treatment layer
112b‧‧‧第二抗氧化處理層 112b‧‧‧Second antioxidant treatment layer
120a‧‧‧第一活性材料層 120a‧‧‧First active material layer
120b‧‧‧第二活性材料層 120b‧‧‧Second active material layer
200‧‧‧正極 200‧‧‧ positive
300‧‧‧隔離膜 300‧‧‧Separator
400‧‧‧電解槽 400‧‧‧electrolyzer
R‧‧‧容置空間 R‧‧‧ accommodating space
圖1為本創作實施例的電解銅箔的側視示意圖。Figure 1 is a side elevational view of an electrolytic copper foil of the presently-created embodiment.
圖2為本創作實施例的電解銅箔的X光繞射光譜。2 is an X-ray diffraction spectrum of the electrolytic copper foil of the present embodiment.
圖3為本創作實施例的電解銅箔的聚焦離子束(FIB)影像圖。Fig. 3 is a view showing a focused ion beam (FIB) image of an electrolytic copper foil according to an embodiment of the invention.
圖4為本創作實施例的負極極電體的側視示意圖。4 is a side view showing the negative electrode of the present embodiment.
圖5為本創作實施例的鋰離子二次電池的示意圖。Fig. 5 is a schematic view of a lithium ion secondary battery of the present embodiment.
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