TWM577347U - Fluidized desorption device, fluidized adsorption-desorption concentration unit and waste gas purification system thereof - Google Patents

Fluidized desorption device, fluidized adsorption-desorption concentration unit and waste gas purification system thereof Download PDF

Info

Publication number
TWM577347U
TWM577347U TW108200843U TW108200843U TWM577347U TW M577347 U TWM577347 U TW M577347U TW 108200843 U TW108200843 U TW 108200843U TW 108200843 U TW108200843 U TW 108200843U TW M577347 U TWM577347 U TW M577347U
Authority
TW
Taiwan
Prior art keywords
desorption
adsorption
gas
outlet
fluidized
Prior art date
Application number
TW108200843U
Other languages
Chinese (zh)
Inventor
張豐堂
Original Assignee
傑智環境科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 傑智環境科技股份有限公司 filed Critical 傑智環境科技股份有限公司
Priority to TW108200843U priority Critical patent/TWM577347U/en
Publication of TWM577347U publication Critical patent/TWM577347U/en

Links

Landscapes

  • Treating Waste Gases (AREA)

Abstract

一種流體化脫附裝置,包括一直立槽體,直立槽體裝有多個吸附粒,直立槽體包括一入流分散部、一脫附部及一冷卻部;脫附部用以令吸附粒陸續經由脫附部入口進入,並在脫附多孔板之間的空間流體化浮動而迂迴落下,而後經由脫附部出口陸續離開脫附部;脫附部更用以令一脫附氣體經由脫附氣體入口進入,並通過氣體分散板及脫附多孔板中的氣孔向上流動,而後經由脫附氣體出口排出脫附部;冷卻部連通於脫附出口,用以冷卻通過的吸附粒。藉此,脫附部內的吸附粒密度低於習用流動化脫附塔,能減少吸附粒的使用量,降低流體化脫附裝置的成本。A fluidized desorption device comprises an upright trough body, the upright trough body is provided with a plurality of adsorption particles, the upright trough body comprises an inflow dispersion portion, a desorption portion and a cooling portion; and the desorption portion is used to make the adsorption particles successively Entering through the inlet of the desorption portion, and fluidizing and floating in the space between the desorbed porous plates to fall back and forth, and then gradually exiting the desorption portion via the outlet of the desorption portion; the desorption portion is further used to desorb a desorbed gas The gas inlet enters and flows upward through the gas dispersion plate and the pores in the desorption perforated plate, and then discharges the desorption portion via the desorption gas outlet; the cooling portion communicates with the desorption outlet to cool the passing adsorbent particles. Thereby, the density of the adsorbed particles in the desorption portion is lower than that of the conventional fluidized desorption tower, which can reduce the amount of adsorbed particles used and reduce the cost of the fluidized desorption device.

Description

流體化脫附裝置、流體化吸脫附濃縮單元及其廢氣淨化系統Fluidized desorption device, fluidized adsorption and desorption concentration unit and exhaust gas purification system thereof

本創作是關於一種VOC吸脫附設備及其廢氣淨化系統,特別是關於一種流體化VOC吸脫附設備及其廢氣淨化系統。The present invention relates to a VOC suction and desorption device and an exhaust gas purification system thereof, and more particularly to a fluidized VOC suction and desorption device and an exhaust gas purification system thereof.

活性碳吸附處理技術是去除揮發性有機化合物(Volatile Organic Compounds,簡稱VOC)的一種常見技術。以往多以兩塔或多塔式的固定床吸脫附系統將廢氣中的VOC加以吸附以及吸附飽和後的活性碳脫附再生。固定床吸脫附系統有其缺點在於,處理高反應性VOC時,常因被吸附的化學品在脫附時發生水解反應,造成碳床腐蝕或產生氧化反應,反應所產生的熱能在固定式的碳床散熱不佳,易有碳床著火的風險。Activated carbon adsorption treatment technology is a common technique for removing volatile organic compounds (VOCs). In the past, a fixed-bed adsorption and desorption system of two or more columns was used to adsorb VOC in the exhaust gas and desorb and regenerate the activated carbon after adsorption. The fixed bed suction and desorption system has the disadvantage that when dealing with highly reactive VOC, the hydrolysis reaction occurs when the adsorbed chemical is desorbed, causing corrosion or oxidation reaction of the carbon bed, and the heat energy generated by the reaction is fixed. The carbon bed is not well cooled, and there is a risk of a carbon bed catching fire.

為了改善固定床吸脫附的缺點,目前發展出一種針對揮發性有機氣體的球狀活性碳流體化床的濃縮系統,該系統包括流體化吸附塔、流動式脫附塔、輸送設備及終處理的冷凝或燃燒設備。該系統依其使用目的可包括VOC回收或有機廢氣濃縮淨化。In order to improve the disadvantages of fixed bed suction and desorption, a concentrating system for a spherical activated carbon fluidized bed for volatile organic gases has been developed, which system includes a fluidized adsorption tower, a flow desorption tower, a conveying device and a final treatment. Condensation or combustion equipment. The system may include VOC recovery or organic waste gas concentration purification depending on the purpose of use.

請參考圖1,所繪示者為習用流動式脫附塔,其為一直立槽體,其中區分有一脫附加熱部1、一冷卻部2及一儲槽部3,脫附加熱部1用以對吸附粒加熱,使吸附粒中的VOC被脫附出來,脫附加熱部底側引入脫附氣體,脫附氣體向上流動並帶走自吸附粒脫離的VOC,從而完成吸附粒的脫附再生。經過脫附加熱部1繼續向下移動至冷卻部2進行冷卻,冷卻後的吸附粒流動至儲槽部3,後續可被送回吸附塔。換言之,在脫附塔中,吸附粒堆積充填在脫附加熱部1、冷卻部2及儲槽部3,並藉由重力使吸附粒逐漸向下移動。Please refer to FIG. 1 , which is a conventional flow type desorption tower, which is an upright trough body, wherein a de-addition heat part 1, a cooling part 2 and a storage tank part 3 are distinguished, and the de-heating part 1 is used. By heating the adsorption particles, the VOC in the adsorption particles is desorbed, and the desorbed gas is introduced into the bottom side of the desorption hot portion, and the desorbed gas flows upward and takes away the VOC desorbed from the adsorption particles, thereby completing the desorption of the adsorption particles. regeneration. The de-heating unit 1 continues to move downward to the cooling unit 2 for cooling, and the cooled adsorbed particles flow to the sump portion 3, and can be subsequently sent back to the adsorption tower. In other words, in the desorption column, the adsorption particle deposit is filled in the de-heating portion 1, the cooling portion 2, and the reservoir portion 3, and the adsorption particles are gradually moved downward by gravity.

如申請人所申請獲准之中華民國發明專利I577439所述,習用的流動式脫附塔有其缺點在於,吸附粒除安息角上方少數空間外,實質填滿了脫附塔,而由於吸附粒的成本高昂,這使得流動式脫附塔的造價提高,且吸脫附濃縮單元中吸附粒的循環時間顯著增加,實有改善的必要外;另申請人所申請獲准之中華民國發明專利I367779所述習用的流動式脫附塔若因脫附氣流於脫附塔內局部區域之流速因偏流作用而有大於或等於吸附粒最低流體化速度或最終吹出速度造成推積不均勻,衍生受熱溫度不均勻或吸附粒吹出等問題,有其改善的必要。As described in the applicant's application for the Republic of China invention patent I577439, the conventional mobile desorption tower has the disadvantage that the adsorbent particles substantially fill the desorption tower except for a few spaces above the angle of repose, and due to the adsorption of particles The cost is high, which increases the cost of the flow-type desorption column, and the cycle time of the adsorbed particles in the adsorption and desorption unit is significantly increased, which is necessary for improvement; and the applicant has applied for the approval of the Republic of China invention patent I367779. If the flow rate of the desorption tower in the localized region of the desorption tower due to the desorption flow is greater than or equal to the minimum fluidization velocity or the final blowing velocity of the adsorption pellet, the deconvolution is uneven, and the derivation heating temperature is uneven. Or problems such as adsorption of particles, there is a need for improvement.

本創作之主要目的在於提供一種能減少吸附粒使用量的脫附塔、以及應用該脫附塔的吸脫附濃縮單元及其廢氣淨化系統。The main object of the present invention is to provide a desorption column capable of reducing the amount of adsorbed particles used, and a suction and desorption concentrating unit to which the desorption column is applied, and an exhaust gas purification system therefor.

為了達成上述及其他目的,本創作提供一種流體化脫附裝置,其包括一直立槽體,直立槽體中裝有多個吸附粒,直立槽體由上而下包括一入流分散部、一脫附部及一冷卻部;入流分散部具有一供與外部吸附粒輸送裝置連結的進料口,入流分散部用以讓吸附粒堆積分散,入流分散部具有一位於進料口下方的分散部出口,用以讓分散部內的吸附粒陸續離開入流分散部;脫附部具有一脫附氣體入口、一脫附氣體出口、一脫附部入口及一脫附部出口,脫附氣體入口及脫附部出口低於脫附氣體出口及脫附部入口,脫附部入口連通於分散部出口,脫附部更具有一脫附氣體分散板及多層脫附多孔板,該些脫附多孔板在直立槽體的高度方向上間隔設置於脫附氣體分散板與脫附氣體出口之間,脫附部出口設於脫附氣體分散板;脫附部用以令吸附粒陸續經由脫附部入口進入,並在該些脫附多孔板之間的空間流體化浮動而迂迴落下,而後經由脫附部出口陸續離開脫附部;脫附部更用以令一脫附氣體經由脫附氣體入口進入,並通過氣體分散板及脫附多孔板中的氣孔向上流動,而後經由脫附氣體出口排出脫附部;冷卻部連通於脫附出口,用以冷卻通過的吸附粒。In order to achieve the above and other objects, the present invention provides a fluidized desorption device comprising an upright trough body, wherein the upright trough body is provided with a plurality of adsorption particles, and the upright trough body includes an inflow dispersion portion from top to bottom. An inlet portion and a cooling portion; the inflow dispersion portion has a feed port for connecting with the external adsorption particle conveying device, the inflow dispersion portion is for dispersing and dispersing the adsorption particles, and the inflow dispersion portion has a dispersion portion outlet located below the feed port The adsorption particles in the dispersion portion are successively separated from the inflow dispersion portion; the desorption portion has a desorption gas inlet, a desorption gas outlet, a desorption portion inlet, and a desorption portion outlet, desorption gas inlet and desorption The outlet of the outlet is lower than the outlet of the desorption gas and the inlet of the desorption portion, and the inlet of the desorption portion is connected to the outlet of the dispersing portion, and the desorption portion further has a desorption gas dispersion plate and a plurality of desorption porous plates, and the desorption porous plates are erected The height direction of the tank body is disposed between the desorption gas dispersion plate and the desorption gas outlet, the desorption portion outlet is disposed on the desorption gas dispersion plate; and the desorption portion is configured to allow the adsorption particles to successively pass through the desorption portion inlet And the space between the desorbed porous plates is fluidized and floated to fall back, and then gradually leaves the desorption portion via the outlet of the desorption portion; the desorption portion is further used to allow a desorption gas to enter through the desorption gas inlet And flowing upward through the gas dispersion plate and the pores in the desorption porous plate, and then discharging the desorption portion via the desorption gas outlet; the cooling portion is connected to the desorption outlet for cooling the passed adsorption particles.

為了達成上述及其他目的,本創作還提供一種流體化吸脫附濃縮單元,其包括如前所述的流體化脫附裝置、一流體化吸附塔及一吸附粒輸送裝置,流體化吸附塔具有一待處理氣體入口、一處理後氣體出口、一吸附粒輸入口及一吸附粒輸出口,待處理氣體入口與吸附粒輸出口低於處理後氣體出口及吸附粒輸入口,流體化吸附塔更具有一待處理氣體分散板及多層吸附多孔板,待處理氣體分散板鄰近待處理氣體入口,該些吸附多孔板在流體化吸附塔的高度方向上間隔設置於待處理氣體分散板與處理後氣體出口之間;流體化吸附塔用以令該些吸附粒陸續經由吸附粒輸入口進入,並在該些吸附多孔板之間的空間迂迴落下,而後經由吸附粒輸出口離開流體化吸附塔;流體化吸附塔更用以令一待處理氣體經由待處理氣體入口進入,並通過待處理氣體分散板及該些吸附多孔板中的氣孔向上流動,而後經由處理後氣體出口離開流體化吸附塔;吸附粒輸送裝置連接流體化吸附塔及流體化脫附裝置,用以將流體化脫附裝置處理後的吸附粒輸送至吸附粒輸入口,並用以將自吸附粒輸出口離開的吸附粒輸送至進料口。In order to achieve the above and other objects, the present invention also provides a fluidized adsorption and desorption concentration unit comprising a fluidized desorption device, a fluidized adsorption column and an adsorption particle delivery device as described above, the fluidized adsorption column having a gas inlet to be treated, a treated gas outlet, an adsorption particle inlet and an adsorption particle outlet, the gas inlet and the adsorption particle outlet of the treatment are lower than the treated gas outlet and the adsorption particle inlet, and the fluidized adsorption tower is further The utility model has a gas dispersion plate to be treated and a multi-layer adsorption porous plate, wherein the gas dispersion plate to be treated is adjacent to the gas inlet to be treated, and the adsorption porous plates are arranged at intervals in the height direction of the fluidization adsorption tower on the gas dispersion plate to be treated and the treated gas. Between the outlets; the fluidized adsorption tower is configured to allow the adsorption particles to enter through the adsorption particle inlet, and to fall back and forth between the adsorption porous plates, and then exit the fluidization adsorption column through the adsorption particle output port; The adsorption tower is further configured to allow a gas to be treated to enter through the inlet of the gas to be treated, and pass through the gas dispersion plate to be treated and the The pores in the perforated plate flow upward, and then exit the fluidized adsorption column through the treated gas outlet; the adsorption particle transport device is connected to the fluidized adsorption column and the fluidized desorption device for adsorbing the adsorbed particles after the fluidized desorption device It is sent to the adsorption particle inlet and used to transport the adsorption particles leaving the adsorption particle outlet to the feed port.

為了達成上述及其他目的,本創作還提供一種廢氣淨化系統,其包括如前所述的流體化吸脫附濃縮單元及一後處理單元,後處理單元連結脫附氣體出口並用以對自脫附氣體出口排出的脫附氣體進行後處理。In order to achieve the above and other objects, the present invention also provides an exhaust gas purification system comprising a fluidized absorption and desorption concentration unit and a post-processing unit as described above, the post-processing unit being coupled to the desorbing gas outlet for self-desorption The desorbed gas discharged from the gas outlet is post-treated.

藉由上述設計,本創作的流體化脫附裝置預期較習用流動式脫附塔減少約三分之二的吸附粒使用量,能夠顯著降低系統造價,並可減少吸附粒的循環時間。With the above design, the fluidized desorption device of the present invention is expected to reduce the use of adsorbed particles by about two-thirds compared with the conventional mobile desorption column, which can significantly reduce the system cost and reduce the cycle time of the adsorbed particles.

請參考第2A圖,所繪示者為本創作流體化脫附裝置的第一實施例,其包括一直立槽體10,直立槽體10中裝有多個吸附粒20,直立槽體10由上而下包括一入流分散部30、一脫附部40及一冷卻部50。Please refer to FIG. 2A, which is a first embodiment of the present fluidization desorption device, which comprises an upright trough body 10, and the vertical trough body 10 is provided with a plurality of adsorption particles 20, and the vertical trough body 10 is composed of The upper and lower portions include an inflow dispersion portion 30, a desorption portion 40, and a cooling portion 50.

吸附粒20為球狀或粒狀,其材質可為但不限於親水性或殊水性的沸石、活性碳、活性氧化鋁、矽膠或其他對待處理VOC具有吸附活性的材質,其中親水性沸石例如為A型、13X型或低矽鋁比Y型沸石,殊水性沸石則例如為ZSM-5型、MCM型(Mobil composite of matter)或高矽鋁比Y型沸石,所述MCM型沸石例如可為具六角晶狀結構(hexagonal)的MCM-41、具立方結構(cubic)的MCM-48、具層狀結構(lamellar)的MCM-50等M41S族沸石。舉例而言,吸附粒20可為日本吳羽株式會社所販售之GBACψ0.72mm壢青基球狀活性碳或陶氏化學公司(Dow Chemical Company)所販售型號為DOWEX OPTIPORE V503的球狀吸附粒。The adsorbent particles 20 are spherical or granular, and the material thereof may be, but not limited to, hydrophilic or water-soluble zeolite, activated carbon, activated alumina, tannin or other materials having adsorption activity to the VOC to be treated, wherein the hydrophilic zeolite is, for example, A type, 13X type or low bismuth aluminum ratio Y type zeolite, the special aqueous zeolite is, for example, ZSM-5 type, MCM type (Mobil composite of matter) or high bismuth aluminum ratio Y type zeolite, and the MCM type zeolite may be, for example, M41S group zeolite such as MCM-41 with hexagonal hexagonal structure, MCM-48 with cubic structure, MCM-50 with lamellar structure. For example, the adsorbent particles 20 may be a GBAC ψ 0.72 mm indigo-based spherical activated carbon sold by Japan Wu Yu Co., Ltd. or a spherical adsorbent sold by the Dow Chemical Company under the model number DOWEX OPTIPORE V503. grain.

入流分散部30具有一供與外部吸附粒輸送裝置連結的進料口31、一位於其底部且低於進料口31的分散部出口32及一溢流管33。入流分散部30用以讓吸附粒20在其內堆積分散,並能達到阻絕脫附氣體經由入流分散部30的作用。溢流管33設置的位置低於進料口31但高於分散部出口32,其可用以讓堆積到高達溢流管33高度的吸附粒離開入流分散部30,藉此能控制後續進入脫附部40的吸附粒20的流量。The inflow dispersion portion 30 has a feed port 31 for connection to an external adsorption particle transport device, a dispersion portion outlet 32 at the bottom thereof and lower than the feed port 31, and an overflow pipe 33. The inflow dispersion portion 30 serves to allow the adsorption particles 20 to be deposited and dispersed therein, and to prevent the desorption gas from passing through the inflow dispersion portion 30. The overflow pipe 33 is disposed at a position lower than the feed port 31 but higher than the dispersion portion outlet 32, which can be used to allow the adsorbent particles accumulated up to the height of the overflow pipe 33 to exit the inflow dispersion portion 30, thereby controlling subsequent entry desorption The flow rate of the adsorption particles 20 of the portion 40.

脫附部40具有一脫附氣體入口41、一脫附氣體出口42、一脫附部入口43及一脫附部出口44,脫附氣體入口41及脫附部出口44設置的位置低於脫附氣體出口42及脫附部入口43,脫附部入口43連通於分散部出口32。此外,脫附部40還具有一脫附氣體分散板45及多層脫附多孔板46,該些脫附多孔板46在直立槽體10的高度方向上間隔設置於脫附氣體分散板45與脫附氣體出口42之間,脫附氣體分散板45及脫附多孔板46具有分散在水平方向不同位置的多個氣孔,各氣孔的孔徑不大於吸附粒20的粒徑,使脫附氣體盡可能均勻地分散到脫附部40內的不同位置,各脫附多孔板46具有多個氣孔及一落下部47,且相鄰層脫附多孔板46的落下部47彼此不正對,落下部47具有一或多個開孔471,開孔471的孔徑大於吸附粒20的粒徑,讓吸附粒20可經由落下部47掉落至下一層空間,脫附部出口44則設於脫附氣體分散板45,且脫附部出口44可設於脫附氣體分散板45的中央或周緣。The desorption portion 40 has a desorption gas inlet 41, a desorption gas outlet 42, a desorption portion inlet 43, and a desorption portion outlet 44. The desorption gas inlet 41 and the desorption portion outlet 44 are disposed at a lower position than the desorption portion 40. The gas outlet 42 and the desorption portion inlet 43 are provided, and the desorption portion inlet 43 communicates with the dispersion portion outlet 32. Further, the desorption portion 40 further has a desorption gas dispersion plate 45 and a plurality of desorption porous plates 46 which are spaced apart from the desorption gas dispersion plate 45 in the height direction of the vertical tank body 10 Between the gas outlets 42, the desorbed gas dispersion plate 45 and the desorbed porous plate 46 have a plurality of pores dispersed at different positions in the horizontal direction, and the pore diameter of each pore is not larger than the particle diameter of the adsorption particles 20, so that the desorption gas is as Evenly dispersed in different positions in the desorption portion 40, each of the desorption porous plates 46 has a plurality of pores and a lower portion 47, and the lower portions 47 of the adjacent layer desorption perforated plates 46 are not opposite each other, and the lower portion 47 has One or more openings 471 having a larger diameter than the particle size of the adsorbent particles 20, allowing the adsorbent particles 20 to fall through the lower portion 47 to the next layer space, and the desorption portion outlet 44 being disposed on the desorbed gas dispersion plate 45, and the desorption portion outlet 44 may be provided at the center or the periphery of the desorbed gas dispersion plate 45.

脫附部40可用以令吸附粒20陸續經由脫附部入口43進入,並在該些脫附多孔板46之間的空間流體化浮動而迂迴落下,除均勻脫附外亦可大幅度增加脫附塔內吸附粒20與脫附氣體接觸之脫附時間(脫附時間愈長脫附效果愈佳),而後經由脫附部出口44陸續離開脫附部40。脫附部40還可用以令一脫附氣體經由脫附氣體入口41進入,並通過氣體分散板45及脫附多孔板46中的氣孔向上流動,而後經由脫附氣體出口42排出脫附部40。The desorption portion 40 can be used to allow the adsorption particles 20 to enter through the desorption portion inlet 43 one after another, and the space between the desorption porous plates 46 fluidizes and floats and falls back, and can be greatly increased in addition to uniform desorption. The desorption time of the adsorbed particles 20 in contact with the desorbed gas in the tower (the longer the desorption time is, the better the desorption effect), and then the desorption portion 40 is successively separated via the outlet portion 44 of the desorption portion. The desorption portion 40 can also be used to allow a desorption gas to enter via the desorption gas inlet 41 and flow upward through the gas holes in the gas dispersion plate 45 and the desorption perforated plate 46, and then discharge the desorption portion 40 via the desorption gas outlet 42. .

所述脫附氣體例如可為氮氣或空氣;當流體化脫附裝置為高濃縮倍率時,優選使用氮氣作為脫附氣體,避免加熱脫附處理時造成危險。當流體化脫附裝置為低濃縮倍率(500倍以下)時,可採用空氣作為脫附氣體,同時於脫附後VOC濃度另以濃度偵測器即時量測,確保該濃度控制於VOC的爆炸下限值(LEL值)以下進行操作,例如控制於四分之一爆炸下限濃度以下進行脫附作業。The desorption gas may be, for example, nitrogen or air; when the fluidization desorption device is at a high concentration ratio, it is preferred to use nitrogen as the desorption gas to avoid the danger of the heat desorption treatment. When the fluidized desorption device is low concentration ratio (less than 500 times), air can be used as the desorption gas, and the VOC concentration after desorption is measured by the concentration detector immediately to ensure that the concentration is controlled by the explosion of VOC. The lower limit value (LEL value) is operated below, for example, the desorption operation is performed below the quarter lower limit concentration.

冷卻部50連通於脫附出口44,其具有一或多個冷卻流體流道51及一或多個吸附粒冷卻通道52,其中吸附粒冷卻通道52連通於脫附出口44,冷卻流體流道51設置於吸附粒冷卻通道52周圍但不與吸附粒冷卻通道52連通,讓冷卻流體流道51內的冷卻流體與吸附粒冷卻通道52內的吸附粒進行熱交換,從而降低吸附粒的溫度。舉例而言,冷卻部50可為管殼式熱交換器,管側為所述吸附粒冷卻通道,殼側則為冷卻流體流道,可循環引入冷卻流體(如冷空氣或低溫水等)。The cooling portion 50 is in communication with a desorption outlet 44 having one or more cooling fluid flow passages 51 and one or more adsorption pellet cooling passages 52, wherein the adsorption pellet cooling passages 52 communicate with the desorption outlets 44, the cooling fluid flow passages 51. It is disposed around the adsorption particle cooling passage 52 but does not communicate with the adsorption particle cooling passage 52, and allows the cooling fluid in the cooling fluid flow path 51 to exchange heat with the adsorption particles in the adsorption particle cooling passage 52, thereby lowering the temperature of the adsorption particles. For example, the cooling portion 50 may be a shell-and-tube heat exchanger, the tube side is the adsorption particle cooling passage, and the shell side is a cooling fluid flow passage, and a cooling fluid (such as cold air or low-temperature water, etc.) may be circulated.

請參考第2B圖,所繪示者為本創作流體化脫附裝置的第二實施例,其與前述實施例的差異在於,氣體分散板45自直立槽體10其中一側朝另一側傾斜,吸附粒冷卻通道52相較之下較窄。除此之外,入流分散部30的槽體改為截面呈倒ㄇ形的槽30A,吸附粒20在倒ㄇ形槽30A內堆積,堆積高度超過倒ㄇ形槽壁時,即會往下落至脫附部40;換言之,倒ㄇ形槽壁周緣的開放空間可視為分散部出口32與脫附部入口43的交界;藉此,入流分散部30的體積能再縮小,從而進一步減少吸附粒20的使用量。在可能的實施方式中,倒ㄇ形槽30A具有可讓脫附氣體通過的氣孔。Please refer to FIG. 2B, which is a second embodiment of the present fluidization desorption device, which differs from the previous embodiment in that the gas dispersion plate 45 is inclined from one side of the upright trough 10 to the other side. The adsorbent particle cooling passage 52 is narrower than the lower one. In addition, the groove of the inflow dispersion portion 30 is changed to a groove 30A having a reversed cross section, and the adsorption particles 20 are accumulated in the inverted groove 30A, and when the accumulation height exceeds the inverted groove wall, it will fall to The desorption portion 40; in other words, the open space of the periphery of the inverted trough wall can be regarded as the boundary between the dispersion portion outlet 32 and the desorption portion inlet 43; thereby, the volume of the inflow dispersion portion 30 can be further reduced, thereby further reducing the adsorption particles 20 The amount of use. In a possible embodiment, the inverted trough 30A has pores through which desorbed gas can pass.

由於本創作的脫附部中,吸附粒可被上升流的脫附氣體流體化,因此脫附部內的吸附粒密度顯著低於習用流動化脫附塔,能夠大幅減少吸附粒的使用量,並降低流體化脫附裝置的成本。Since the adsorbed particles in the desorption portion of the present invention can be fluidized by the desorption gas of the upward flow, the density of the adsorbed particles in the desorption portion is remarkably lower than that of the conventional fluidized desorption tower, and the amount of adsorbed particles can be greatly reduced, and Reduce the cost of fluidized desorption devices.

請參考第3圖,所繪示者為本創作流體化吸脫附濃縮單元的第一實施例,其除了包括上述流體化脫附裝置之外,更包括一流體化吸附塔100及一吸附粒輸送裝置110。Referring to FIG. 3, the first embodiment of the present invention is a fluidized adsorption and desorption concentrating unit, which comprises a fluidized adsorption tower 100 and an adsorbent particle in addition to the fluidization desorption device. Conveying device 110.

流體化吸附塔100具有一待處理氣體入口101、一處理後氣體出口102、一吸附粒輸入口103及一吸附粒輸出口104。待處理氣體入口101與吸附粒輸出口104設置的位置低於處理後氣體出口102及吸附粒輸入口103。此外,流體化吸附塔100還具有一待處理氣體分散板105及多層吸附多孔板106,待處理氣體分散板105鄰近待處理氣體入口101,該些吸附多孔板106在流體化吸附塔100的高度方向上間隔設置於待處理氣體分散板105與處理後氣體出口102之間。The fluidized adsorption column 100 has a gas inlet 101 to be treated, a treated gas outlet 102, an adsorption particle inlet 103, and an adsorption particle outlet 104. The position where the gas inlet 101 to be treated and the adsorption particle outlet 104 are disposed is lower than the treated gas outlet 102 and the adsorption particle inlet 103. In addition, the fluidized adsorption tower 100 further has a gas dispersion plate 105 to be treated and a multi-layer adsorption porous plate 106. The gas dispersion plate 105 to be treated is adjacent to the gas inlet 101 to be treated, and the adsorption porous plate 106 is at the height of the fluidization adsorption column 100. The direction is spaced between the gas dispersion plate 105 to be treated and the treated gas outlet 102.

流體化吸附塔100是用以令吸附粒陸續經由吸附粒輸入口103進入,並在該些吸附多孔板106之間的空間迂迴落下,而後經由吸附粒輸出口104離開流體化吸附塔100。此外,流體化吸附塔100還用以令一待處理氣體經由待處理氣體入口101進入,並通過待處理氣體分散板105及該些吸附多孔板106中的氣孔向上流動,而後經由處理後氣體出口102離開流體化吸附塔100。The fluidized adsorption column 100 is configured to allow the adsorbent particles to enter through the adsorption particle inlet 103 successively, and to fall back and forth between the adsorption porous plates 106, and then exit the fluidized adsorption column 100 via the adsorption particle output port 104. In addition, the fluidized adsorption tower 100 is further configured to allow a gas to be treated to enter through the gas inlet 101 to be treated, and flow upward through the pores in the gas dispersion plate 105 to be treated and the adsorption porous plates 106, and then through the treated gas outlet. 102 exits the fluidized adsorption column 100.

吸附粒輸送裝置110連接流體化吸附塔100及流體化脫附裝置120,用以將經流體化脫附裝置120處理後的吸附粒輸送至吸附粒輸入口103,並用以將自吸附粒輸出口104離開的吸附粒輸送至進料口131,亦可用以將自溢流管133離開的吸附粒輸送至流體化吸附塔100中鄰近吸附粒輸出口104的上游。本實施例中,吸附粒輸送裝置110包含複數個輸送器111a、111b、112a、112b、一輸送氣源113及複數管路114a、114b、114c、115a、115b、115c、116。其中,管路114a、114b、114c配置有輸送器111a、111b,用以將流體化吸附塔100中已吸附VOC的吸附粒輸送至流體化脫附裝置120的進料口131。管路115a、115b、115c則配置有輸送器112a、112b,用以將流體化脫附裝置120脫附再生後的吸附粒輸送至流體化吸附塔100的吸附粒輸入口103,而管路116則用以將溢流管133排出的吸附粒藉由重力輸送至流體化吸附塔100中鄰近吸附粒輸出口104的上游,藉此構成吸附粒的循環回路,輸送氣源113則用以送出輸送器111a、111b、112a、112b工作所需的空氣或氮氣,將吸附粒向上推送。在其他可能的實施方式中,溢流管133所排出的吸附粒也可改為輸送至管路114a、114b、114c、115a、115b或115c,必要時可增設額外的輸送器實現輸送。The adsorption granule conveying device 110 is connected to the fluidized adsorption tower 100 and the fluidized desorption device 120 for conveying the adsorbed particles processed by the fluidized desorption device 120 to the adsorption granule input port 103 and used for the self-adsorption granule output port. The leaving adsorbent particles are transported to the feed port 131, and may also be used to transport the adsorbent particles exiting the overflow pipe 133 to the upstream of the adsorbent particle output port 104 in the fluidized adsorption column 100. In the present embodiment, the adsorption particle conveying device 110 includes a plurality of conveyors 111a, 111b, 112a, 112b, a conveying gas source 113, and a plurality of pipes 114a, 114b, 114c, 115a, 115b, 115c, 116. Among them, the pipes 114a, 114b, and 114c are provided with conveyors 111a and 111b for conveying the adsorbed particles of the VCO adsorbed in the fluidized adsorption column 100 to the feed port 131 of the fluidized desorption device 120. The conduits 115a, 115b, 115c are provided with conveyors 112a, 112b for conveying the adsorbent particles desorbed and regenerated by the fluidized desorption device 120 to the adsorption particle inlet 103 of the fluidized adsorption column 100, while the line 116 Then, the adsorbent particles for discharging the overflow pipe 133 are gravity-fed to the upstream of the adsorbent particle output port 104 in the fluidized adsorption column 100, thereby forming a circulation loop of the adsorbed particles, and the transport gas source 113 is used for sending and transporting. The air or nitrogen required for the operation of the devices 111a, 111b, 112a, 112b pushes the adsorbent particles upward. In other possible embodiments, the adsorbent particles discharged from the overflow pipe 133 may also be transported to the pipes 114a, 114b, 114c, 115a, 115b or 115c, and an additional conveyor may be added for transportation if necessary.

從而,待處理氣體中的VOC可在流體化吸附塔中被吸附粒所吸附,使處理後氣體中的VOC濃度大幅減低。吸附粒在流體化吸附塔中吸附VOC後,被吸附粒輸送裝置輸送至流體化脫附裝置進行脫附再生,之後可再被吸附粒輸送裝置輸送至流體化吸附塔循環利用。脫附氣體在流體化脫附裝置內將吸附粒所吸附的VOC加以脫附,使得脫附氣體含有較高濃度的VOC,達到濃縮的效果,後續可再被其他後處理單元進行後處理。Thereby, the VOC in the gas to be treated can be adsorbed by the adsorbed particles in the fluidized adsorption column, so that the VOC concentration in the treated gas is greatly reduced. After adsorbing VOC in the fluidized adsorption tower, the adsorbent particles are transported to the fluidized desorption device by the adsorption particle transport device for desorption regeneration, and then can be transported to the fluidized adsorption tower for recycling by the adsorption particle transport device. The desorbed gas desorbs the VOC adsorbed by the adsorbed particles in the fluidized desorption device, so that the desorbed gas contains a higher concentration of VOC to achieve a concentration effect, which can be further post-treated by other post-processing units.

請參考第4圖,所繪示者為本創作流體化吸脫附濃縮單元的第二實施例,其與第3圖所示的實施例大致雷同,差異之處在於,吸附粒輸出口204的高度高於進料口231的高度,因此可藉重力經由管路211自然落下,相較前述實施例,本實施例可以省略兩個輸送器。Please refer to FIG. 4 , which is a second embodiment of the fluidized adsorption and desorption concentrating unit of the present invention, which is substantially the same as the embodiment shown in FIG. 3 , and the difference is that the adsorption particle output port 204 is The height is higher than the height of the feed port 231, so that it can be naturally dropped by the pipe 211 by gravity, and the present embodiment can omit two conveyors compared to the foregoing embodiment.

在其他可能的實施方式中,流體化吸附塔及流體化脫附裝置的相對位置可以改變,吸附粒輸送裝置的管路、輸送器配置也可能有相應的調整變化。In other possible embodiments, the relative positions of the fluidized adsorption tower and the fluidized desorption device may be changed, and the piping and the conveyor configuration of the adsorption granular conveying device may also have corresponding adjustment changes.

請參考第5圖,所繪示者為本創作廢氣淨化系統的第一實施例,其包括了如第3圖所示的流體化吸脫附濃縮單元以及一後處理單元360,後處理單元360連結脫附氣體出口342並用以對自脫附氣體出口342排出的脫附氣體進行後處理。本實施例中,後處理單元360為一蓄熱式焚化爐(Regenerative Thermal Oxidizer,RTO),其包括一燃燒室361、二蓄熱槽362a、362b、一氣流控制設備363、一加熱設備364及一熱交換單元365,蓄熱槽362a、362b連通燃燒室361,且蓄熱槽362a、362b填充有蓄熱材料,所述蓄熱材料可為但不限於氧化鋁陶瓷(Alumina Oxide Porcelain)、多孔性莫來石(Mullite)、堇青石(Cordierite)、多孔性堇青石及其他可蓄熱的陶瓷或礫石。加熱設備364包括一爐頭3641及一溫度控制器3642,爐頭3641設於燃燒室361內,用以產生燃燒火焰,溫度控制器3642用以控制爐頭3641而調節燃燒室361內的溫度。氣流控制設備363用以切換脫附氣體的流動路線,選擇性地將脫附氣體導入其中一蓄熱槽362a、362b,使脫附氣體先行加熱,隨後脫附氣體通過燃燒室361,其所含有的VOC被焚化處理,焚化尾氣隨後進入另一蓄熱槽362a、362b,使焚化尾氣與蓄熱槽內的蓄熱材料進行熱交換,提高蓄熱材料的溫度,焚化尾氣接著經由器流控制設備363排出至熱交換單元365,與即將進入流體化脫附裝置330的一股脫附氣體進行熱交換,較佳者,在熱交換後可使脫附氣體升溫至100-250℃,以利後續對吸附粒進行脫附再生。Please refer to FIG. 5 , which is a first embodiment of the inventive exhaust gas purification system, which includes a fluidized absorption and desorption concentration unit as shown in FIG. 3 and a post-processing unit 360, and a post-processing unit 360. The desorbed gas outlet 342 is connected and used to post-treat the desorbed gas discharged from the desorbed gas outlet 342. In this embodiment, the post-processing unit 360 is a Regenerative Thermal Oxidizer (RTO), which includes a combustion chamber 361, two heat storage tanks 362a, 362b, a gas flow control device 363, a heating device 364, and a heat. The exchange unit 365, the heat storage tanks 362a, 362b communicate with the combustion chamber 361, and the heat storage tanks 362a, 362b are filled with a heat storage material, which may be, but not limited to, alumina ceramic (Alumina Oxide Porcelain), porous mullite (Mullite) ), cordierite, porous cordierite and other regenerable ceramic or gravel. The heating device 364 includes a burner 3641 and a temperature controller 3642. The burner 3641 is disposed in the combustion chamber 361 for generating a combustion flame. The temperature controller 3642 is configured to control the burner 3641 to adjust the temperature in the combustion chamber 361. The airflow control device 363 is configured to switch the flow path of the desorbed gas, selectively introduce the desorbed gas into one of the regenerators 362a, 362b, and heat the desorbed gas first, and then desorb the gas through the combustion chamber 361, which contains The VOC is incinerated, the incineration tail gas then enters another heat storage tank 362a, 362b, heat exchanges the incineration tail gas with the heat storage material in the heat storage tank, and the temperature of the heat storage material is increased, and the incineration tail gas is then discharged to the heat exchange via the flow control device 363. The unit 365 exchanges heat with a desorbed gas that is about to enter the fluidized desorption device 330. Preferably, after the heat exchange, the desorbed gas is heated to 100-250 ° C to facilitate subsequent removal of the adsorbed particles. Attached to regeneration.

請參考第6圖,所繪示者為本創作廢氣淨化系統的第二實施例,其與第5圖所示的實施例大致雷同,其後處理單元460同樣為一蓄熱式焚化爐,差異之處在於,其蓄熱式焚化爐包括一電熱式加熱單元464,且其熱交換單元465設於燃燒室461內,電熱式加熱單元464包括二電熱式加熱器4641、4642,電熱式加熱器4641、4642設於燃燒室461內並分別位於熱交換單元465兩側,熱交換單元465具有一進氣管4651及一出氣管4652,即將進入流體化脫附裝置430的脫附氣體可經由進氣管4651而在熱交換單元465內與燃燒室461內的熱空氣進行熱交換,隨後經由出氣管4652排出並導引至流體化脫附裝置430。除此之外,作為冷卻流體的冷空氣在冷卻部450與吸附粒熱交換之後,被導入熱交換單元465作為所述脫附氣體,從而進行二次熱交換。Please refer to FIG. 6 , which is a second embodiment of the inventive exhaust gas purification system, which is substantially the same as the embodiment shown in FIG. 5 , and the post-processing unit 460 is also a regenerative incinerator. The regenerative incinerator includes an electrothermal heating unit 464, and the heat exchange unit 465 is disposed in the combustion chamber 461. The electrothermal heating unit 464 includes two electrothermal heaters 4641, 4642, and an electric heater 4641. 4642 is disposed in the combustion chamber 461 and is respectively located at two sides of the heat exchange unit 465. The heat exchange unit 465 has an intake pipe 4651 and an air outlet pipe 4652. The desorption gas entering the fluidization desorption device 430 can pass through the intake pipe. 4651 is exchanged with hot air within the combustion chamber 461 within the heat exchange unit 465, and then discharged through the gas outlet tube 4652 and directed to the fluidization desorption device 430. In addition to this, the cold air as the cooling fluid is introduced into the heat exchange unit 465 as the desorbed gas after the heat exchange between the cooling portion 450 and the adsorbent particles, thereby performing secondary heat exchange.

請參考第7圖,所繪示者為本創作廢氣淨化系統的第三實施例,其包括了如第3圖所示的流體化吸脫附濃縮單元以及一後處理單元560,後處理單元560連結脫附氣體出口542並用以對自脫附氣體出口542排出的脫附氣體進行後處理。本實施例中,後處理單元560為一直燃式焚化爐,其直燃式焚化爐包括一第一熱交換單元561、一燃燒室562、及一第二熱交換單元563,自脫附氣體出口542排出的脫附氣體在第一熱交換單元561預熱後,導入燃燒室562進行焚化處理,焚化尾氣先流經第一熱交換單元561與脫附氣體進行熱交換後,再導向第二熱交換單元563與另一股流體進行熱交換,隨後,熱交換後的另一股流體可被升溫至100-250℃,而可作為脫附氣體進入流體化脫附裝置530。本實施例中,廢氣淨化系統還包括一前處理設備570,其可包括過濾裝置、除濕裝置、控溫裝置或其組合,藉以對待處理氣體進行過濾、控溫、除濕等前處理。Please refer to FIG. 7 , which is a third embodiment of the inventive exhaust gas purification system, which includes a fluidized absorption and desorption concentration unit as shown in FIG. 3 and a post-processing unit 560 , and a post-processing unit 560 . The desorbed gas outlet 542 is connected and used to post-treat the desorbed gas discharged from the desorbed gas outlet 542. In this embodiment, the aftertreatment unit 560 is a constant-fired incinerator, and the direct-fired incinerator includes a first heat exchange unit 561, a combustion chamber 562, and a second heat exchange unit 563, and a self-desorption gas outlet. The desorbed gas discharged from 542 is preheated by the first heat exchange unit 561, and then introduced into the combustion chamber 562 for incineration treatment. The incineration tail gas first flows through the first heat exchange unit 561 to exchange heat with the desorbed gas, and then leads to the second heat. The exchange unit 563 exchanges heat with another fluid, and then the other fluid after the heat exchange can be heated to 100-250 ° C and can enter the fluidized desorption device 530 as a desorbed gas. In this embodiment, the exhaust gas purification system further includes a pre-processing device 570, which may include a filtering device, a dehumidifying device, a temperature control device, or a combination thereof, for pre-processing such as filtration, temperature control, dehumidification, and the like of the gas to be treated.

在其他可能的實施方式中,後處理單元也可能為一恢復式直燃焚化爐(Recuperative Thermal Oxidizer),該恢復式直燃焚化爐除了燃燒室外,還包括一熱交換器殼體及若干熱交換管模組,使焚化尾氣可與包括但不限於脫附氣體的其他流體進行熱交換。In other possible embodiments, the aftertreatment unit may also be a recovery direct incinerator (Recovererative Thermal Oxidizer), which includes a heat exchanger casing and several heat exchanges in addition to the combustion chamber. The tube module allows the incineration off-gas to exchange heat with other fluids including, but not limited to, desorbed gases.

請參考第8圖,所繪示者為本創作廢氣淨化系統的第四實施例,其與第7圖所示的實施例局部雷同,差異之處在於,該前處理設備670為一濃縮轉輪,濃縮轉輪包括一吸附區、一脫附區及一冷卻隔離區,含有VOC的廢氣在濃縮轉輪的吸附區內進行吸附處理,而後作為待處理氣體導入流體化吸附塔610。另一股轉輪脫附氣體則被依序導向濃縮轉輪的冷卻隔離區及脫附區,並在脫附區內對轉輪進行脫附,成為含有濃縮VOC的脫附尾氣,在與從流體化脫附裝置630排出的脫附氣體合流後,導向直燃式焚化爐的燃燒室進行焚化處理,焚化尾氣分別經過數個熱交換單元與其他流體進行熱交換,所述流體包括後續進入流體化脫附裝置630的脫附氣體。本實施例中,濃縮轉輪的濃縮倍率可為5-30倍,流體化吸脫附濃縮單元的濃縮倍率則可為50-500倍。另一方面,濃縮轉輪脫附處理後的尾氣可一部份回收至前端製程區690,以供前端製程(例如塗裝製程)所需。Please refer to FIG. 8 , which is a fourth embodiment of the inventive exhaust gas purification system, which is partially the same as the embodiment shown in FIG. 7 , except that the pre-processing device 670 is a concentrated revolver. The concentration runner includes an adsorption zone, a desorption zone, and a cooling isolation zone. The VOC-containing exhaust gas is adsorbed in the adsorption zone of the concentration runner, and then introduced into the fluidization adsorption tower 610 as a gas to be treated. The other desorbing gas of the runner is sequentially directed to the cooling isolation zone and the desorption zone of the concentrated rotor, and the rotor is desorbed in the desorption zone to become a desorbed tail gas containing concentrated VOC. After the desorption gas discharged from the fluidization desorption device 630 is combined, the combustion chamber of the direct combustion incinerator is incinerated, and the incineration exhaust gas is exchanged with other fluids through a plurality of heat exchange units, respectively, including the subsequent fluid. The desorption gas of the desorption device 630 is degraded. In this embodiment, the concentration ratio of the concentration runner can be 5-30 times, and the concentration ratio of the fluidized adsorption desorption concentration unit can be 50-500 times. On the other hand, the exhaust gas after the concentrated rotor desorption process can be partially recovered to the front end process zone 690 for use in the front end process (e.g., the coating process).

請參考第9圖,所繪示者為本創作廢氣淨化系統的第四實施例,其與第8圖所示的實施例大致雷同,差異之處在於,自脫附氣體出口742排出的脫附氣體改為導向濃縮轉輪的吸附區進行後處理,此時濃縮轉輪除了是前處理設備之外,同時也作為後處理設備使用。較佳者,自脫附氣體出口742排出的脫附氣體的餘溫僅為50-150℃。Please refer to FIG. 9 , which is a fourth embodiment of the inventive exhaust gas purification system, which is substantially the same as the embodiment shown in FIG. 8 , except that the desorption from the desorption gas outlet 742 is discharged. The gas is changed to the adsorption zone of the concentrating runner for post-treatment. At this time, the concentrating runner is used as a post-processing device in addition to the pre-processing equipment. Preferably, the residual temperature of the desorbed gas discharged from the desorbed gas outlet 742 is only 50-150 °C.

請參考第10圖,所繪示者為本創作廢氣淨化系統的第四實施例,其與第9圖所示的實施例大致雷同,差異之處在於,自脫附氣體出口842排出的脫附氣體的餘溫可能介於100-200℃,為免其溫度過高影響濃縮轉輪吸附區的運作,該股脫附氣體先經由一冷卻器880降溫至約25-50℃,才被導入濃縮轉輪。Please refer to FIG. 10, which is a fourth embodiment of the inventive exhaust gas purification system, which is substantially the same as the embodiment shown in FIG. 9 except that the desorption from the desorption gas outlet 842 is discharged. The residual temperature of the gas may be between 100 and 200 ° C. In order to prevent the temperature from being too high, the operation of the adsorption zone of the concentrated rotor is affected. The desorbed gas is cooled to about 25-50 ° C through a cooler 880 before being introduced into the concentration. Runner.

在其他可能的實施方式中,後處理單元可以是焚化爐、濃縮轉輪以外的處理裝置對VOC進行後處理,例如後處理單元也可以是冷凝器,用以將脫附裝置中的VOC加以冷凝回收;又例如,後處理單元可以是觸媒轉化裝置。In other possible embodiments, the post-processing unit may be a post-processing of the VOC by a processing device other than the incinerator and the concentration reel. For example, the post-processing unit may also be a condenser for condensing the VOC in the desorption device. Recycling; for example, the post-processing unit may be a catalyst conversion device.

最後,必須再次說明的是,本創作於前揭實施例中所揭露的構成元件僅為舉例說明,並非用來限制本案之範圍,其他等效元件的替代或變化,亦應為本案之申請專利範圍所涵蓋。此外,圖式所繪示的各元件之間的尺寸比例僅為示意,各元件的實際尺寸比例並不以圖式所繪示者為限。Finally, it must be stated that the constituent elements disclosed in the foregoing embodiments are merely illustrative and are not intended to limit the scope of the present invention. Alternatives or variations of other equivalent elements should also be applied for in this case. Covered by the scope. In addition, the dimensional ratios between the various elements shown in the drawings are only schematic, and the actual size ratio of each element is not limited to the one shown in the drawings.

1‧‧‧脫附加熱部1‧‧‧De-heating department

2‧‧‧冷卻部 2‧‧‧The cooling department

3‧‧‧儲槽部 3‧‧‧ Storage section

10‧‧‧直立槽體 10‧‧‧Upright trough

20‧‧‧吸附粒 20‧‧‧Adsorption particles

30‧‧‧入流分散部 30‧‧‧Inflow and Dispersal Department

30A‧‧‧槽 30A‧‧‧ slots

31‧‧‧進料口 31‧‧‧ Feed inlet

32‧‧‧分散部出口 32‧‧‧Distribution Department Export

33‧‧‧溢流管 33‧‧‧Overflow tube

40‧‧‧脫附部 40‧‧‧Detaining Department

41‧‧‧脫附氣體入口 41‧‧‧Desorption gas inlet

42‧‧‧脫附氣體出口 42‧‧‧Desorbed gas outlet

43‧‧‧脫附部入口 43‧‧‧Departure entrance

44‧‧‧脫附部出口 44‧‧‧Deportation exit

45‧‧‧脫附氣體分散板 45‧‧‧Dissociated gas dispersion plate

46‧‧‧脫附多孔板 46‧‧‧Desorbed porous plate

47‧‧‧落下部 47‧‧‧ Lower part

471‧‧‧開孔 471‧‧‧ openings

50‧‧‧冷卻部 50‧‧‧ Cooling Department

51‧‧‧冷卻流體流道 51‧‧‧Cooling fluid flow path

52‧‧‧吸附粒冷卻通道 52‧‧‧Adsorption particle cooling channel

100‧‧‧流體化吸附塔 100‧‧‧ Fluidized adsorption tower

101‧‧‧待處理氣體入口 101‧‧‧ gas inlet to be treated

102‧‧‧處理後氣體出口 102‧‧‧Processed gas outlet

103‧‧‧吸附粒輸入口 103‧‧‧Adsorption particle input

104‧‧‧吸附粒輸出口 104‧‧‧Adsorption particle outlet

105‧‧‧待處理氣體分散板 105‧‧‧ gas dispersion plate to be treated

106‧‧‧吸附多孔板 106‧‧‧Adsorption porous plate

110‧‧‧吸附粒輸送裝置 110‧‧‧Adsorption pellet conveyor

111a、111b、112a、112b‧‧‧輸送器 111a, 111b, 112a, 112b‧‧‧ conveyor

113‧‧‧輸送氣源 113‧‧‧Conveying gas source

114a、114b、114c、115a、115b、115c、116‧‧‧管路 114a, 114b, 114c, 115a, 115b, 115c, 116‧‧‧ pipeline

120‧‧‧流體化脫附裝置 120‧‧‧ Fluidized desorption device

131‧‧‧進料口 131‧‧‧ Feed inlet

133‧‧‧溢流管 133‧‧‧Overflow tube

204‧‧‧吸附粒輸出口 204‧‧‧Adsorption particle outlet

231‧‧‧進料口 231‧‧‧ Feed inlet

211‧‧‧管路 211‧‧‧ pipeline

330‧‧‧流體化脫附裝置 330‧‧‧ Fluidized desorption device

342‧‧‧脫附氣體出口 342‧‧‧Desorbed gas outlet

360‧‧‧後處理單元 360‧‧‧post processing unit

361‧‧‧燃燒室 361‧‧‧ combustion chamber

362a、362b‧‧‧蓄熱槽 362a, 362b‧‧‧ heat storage tank

363‧‧‧氣流控制設備 363‧‧‧Airflow control equipment

364‧‧‧加熱設備 364‧‧‧heating equipment

3641‧‧‧爐頭 3641‧‧‧ burner

3642‧‧‧溫度控制器 3642‧‧‧temperature controller

365‧‧‧熱交換單元 365‧‧‧Heat exchange unit

430‧‧‧流體化脫附裝置 430‧‧‧ Fluidized desorption device

450‧‧‧冷卻部 450‧‧‧The cooling department

460‧‧‧後處理單元 460‧‧‧post processing unit

461‧‧‧燃燒室 461‧‧‧ combustion chamber

464‧‧‧電熱式加熱單元 464‧‧‧Electrical heating unit

4641、4642‧‧‧電熱式加熱器 4641, 4642‧‧‧Electrical heater

465‧‧‧熱交換單元 465‧‧‧Heat exchange unit

4651‧‧‧進氣管 4651‧‧‧Intake pipe

4652‧‧‧出氣管 4652‧‧‧Exhaust pipe

530‧‧‧流體化脫附裝置 530‧‧‧ Fluidized desorption device

542‧‧‧脫附氣體出口 542‧‧‧Desorbed gas outlet

560‧‧‧後處理單元 560‧‧‧post processing unit

561‧‧‧第一熱交換單元 561‧‧‧First heat exchange unit

562‧‧‧燃燒室 562‧‧‧ combustion chamber

563‧‧‧第二熱交換單元 563‧‧‧Second heat exchange unit

570‧‧‧前處理設備 570‧‧‧Pre-treatment equipment

610‧‧‧流體化吸附塔 610‧‧‧ Fluidized adsorption tower

630‧‧‧流體化脫附裝置 630‧‧‧ Fluidized desorption device

670‧‧‧前處理設備 670‧‧‧Pre-treatment equipment

690‧‧‧前端製程區 690‧‧‧ front-end process area

742‧‧‧脫附氣體出口 742‧‧‧Desorbed gas outlet

842‧‧‧脫附氣體出口 842‧‧‧Desorbed gas outlet

880‧‧‧冷卻器 880‧‧‧cooler

第1圖為習用流動式脫附塔的示意圖。Figure 1 is a schematic diagram of a conventional mobile desorption column.

第2A圖為本創作流體化脫附裝置第一實施例的示意圖。Fig. 2A is a schematic view showing the first embodiment of the fluidizing desorption device of the present invention.

第2B圖為本創作流體化脫附裝置第二實施例的示意圖。2B is a schematic view of a second embodiment of the fluidizing desorption apparatus of the present invention.

第3圖為本創作流體化吸脫附濃縮單元第一實施例的示意圖。Fig. 3 is a schematic view showing the first embodiment of the fluidizing absorption and desorption concentrating unit of the present invention.

第4圖為本創作流體化吸脫附濃縮單元第二實施例的示意圖。Fig. 4 is a schematic view showing a second embodiment of the fluidizing absorption and desorption concentrating unit of the present invention.

第5圖為本創作廢氣淨化系統第一實施例的示意圖。Figure 5 is a schematic view of the first embodiment of the inventive exhaust gas purification system.

第6圖為本創作廢氣淨化系統第二實施例的示意圖。Figure 6 is a schematic view of a second embodiment of the inventive exhaust gas purification system.

第7圖為本創作廢氣淨化系統第三實施例的示意圖。Figure 7 is a schematic view of a third embodiment of the inventive exhaust gas purification system.

第8圖為本創作廢氣淨化系統第四實施例的示意圖。Figure 8 is a schematic view of a fourth embodiment of the inventive exhaust gas purification system.

第9圖為本創作廢氣淨化系統第五實施例的示意圖。Figure 9 is a schematic view of a fifth embodiment of the inventive exhaust gas purification system.

第10圖為本創作廢氣淨化系統第六實施例的示意圖。Figure 10 is a schematic view of a sixth embodiment of the inventive exhaust gas purification system.

Claims (10)

一種流體化脫附裝置,包括一直立槽體,該直立槽體中裝有多個吸附粒,該直立槽體由上而下包括: 一入流分散部,具有一供與外部吸附粒輸送裝置連結的進料口,該入流分散部用以讓該些吸附粒堆積分散,該入流分散部具有一位於該進料口下方的分散部出口,用以讓分散部內的該些吸附粒陸續離開該入流分散部; 一脫附部,具有一脫附氣體入口、一脫附氣體出口、一脫附部入口及一脫附部出口,該脫附氣體入口及該吸附部出口低於該脫附氣體出口及該脫附部入口,該脫附部入口連通於該分散部出口,該脫附部更具有一脫附氣體分散板及多層脫附多孔板,該些脫附多孔板在該直立槽體的高度方向上間隔設置於該脫附氣體分散板與該脫附氣體出口之間,該脫附部出口設於該脫附氣體分散板;該脫附部用以令該些吸附粒陸續經由該脫附部入口進入,並在該些脫附多孔板之間的空間迂迴落下,而後經由該脫附部出口陸續離開該脫附部;該脫附部更用以令一脫附氣體經由該脫附氣體入口進入,並通過該氣體分散板及脫附多孔板中的氣孔向上流動,而後經由該脫附氣體出口排出該脫附部;以及 一冷卻部,連通於該脫附出口,用以冷卻通過的所述吸附粒。A fluidized desorption device comprises an upright trough body, wherein the upright trough body is provided with a plurality of adsorbing particles, the upright trough body comprising: an inflow dispersing portion having an inflow and dispersing portion a feed inlet, the inflow dispersion portion is configured to disperse and disperse the adsorption particles, and the inflow dispersion portion has a dispersion outlet located below the feed port for allowing the adsorption particles in the dispersion portion to continuously exit the inflow a desorption portion having a desorption gas inlet, a desorption gas outlet, a desorption portion inlet, and a desorption portion outlet, the desorption gas inlet and the adsorption portion outlet being lower than the desorption gas outlet And the desorption portion inlet, the desorption portion inlet is connected to the dispersion portion outlet, the desorption portion further has a desorption gas dispersion plate and a plurality of desorption porous plates, wherein the desorption porous plates are in the upright trough a height direction is disposed between the desorption gas dispersion plate and the desorption gas outlet, and the desorption portion outlet is disposed on the desorption gas dispersion plate; the desorption portion is configured to make the adsorption particles successively pass through the desorption Entrance to the annex, The space between the desorbed porous plates is dropped back and then exits the desorption portion through the outlet of the desorption portion; the desorption portion is further configured to allow a desorption gas to enter through the desorption gas inlet and pass through The gas dispersion plate and the pores in the desorbed porous plate flow upward, and then the desorption portion is discharged through the desorption gas outlet; and a cooling portion is connected to the desorption outlet for cooling the adsorbed particles passing therethrough. 如請求項1所述的流體化脫附裝置,其中該入流分散部更具有一溢流管,該溢流管低於該進料口但高於該分散部出口,該溢流管用以讓堆積到高達該溢流管高度的所述吸附粒離開該入流分散部。The fluidized desorption device of claim 1, wherein the inflow dispersion portion further has an overflow pipe that is lower than the feed port but higher than the outlet of the dispersion portion, the overflow pipe is used for stacking The adsorbent particles up to the height of the overflow pipe exit the inflow dispersion. 如請求項1所述的流體化脫附裝置,其中該冷卻部具有至少一冷卻流體流道及至少一吸附粒冷卻通道,該吸附粒冷卻通道連通於該脫附出口,該冷卻流體流道設置於該吸附粒冷卻通道周圍但不與該吸附粒冷卻通道連通。The fluidized desorption apparatus according to claim 1, wherein the cooling portion has at least one cooling fluid flow path and at least one adsorption particle cooling passage, the adsorption particle cooling passage is connected to the desorption outlet, and the cooling fluid flow path is set Around the adsorption particle cooling channel but not in communication with the adsorption particle cooling channel. 如請求項1所述的流體化脫附裝置,其中各該脫附多孔板具有一落下部,該落下部具有至少一開孔,該開孔孔徑大於該些吸附粒的粒徑。The fluidized desorption apparatus according to claim 1, wherein each of the desorbed porous plates has a lower portion having at least one opening having a pore diameter larger than a particle diameter of the adsorbed particles. 如請求項4所述的流體化脫附裝置,其中各該脫附多孔板的落下部不正對相鄰層脫附多孔板的落下部。The fluidized desorption apparatus according to claim 4, wherein the lower portion of each of the desorbed porous plates does not deviate from the adjacent layer to the lower portion of the perforated plate. 一種流體化吸脫附濃縮單元,包括: 一如請求項1、3至5中任一項所述的流體化脫附裝置; 一流體化吸附塔,具有一待處理氣體入口、一處理後氣體出口、一吸附粒輸入口及一吸附粒輸出口,該待處理氣體入口與該吸附粒輸出口低於該處理後氣體出口及吸附粒輸入口,該流體化吸附塔更具有一待處理氣體分散板及多層吸附多孔板,該待處理氣體分散板鄰近該待處理氣體入口,該些吸附多孔板在該流體化吸附塔的高度方向上間隔設置於該待處理氣體分散板與該處理後氣體出口之間;該流體化吸附塔用以令該些吸附粒陸續經由該吸附粒輸入口進入,並在該些吸附多孔板之間的空間迂迴落下,而後經由該吸附粒輸出口離開該流體化吸附塔;該流體化吸附塔更用以令一待處理氣體經由該待處理氣體入口進入,並通過該待處理氣體分散板及該些吸附多孔板中的氣孔向上流動,而後經由該處理後氣體出口離開該流體化吸附塔;以及 一吸附粒輸送裝置,連接該流體化吸附塔及該流體化脫附裝置,用以將該流體化脫附裝置處理後的所述吸附粒輸送至該吸附粒輸入口,並用以將自該吸附粒輸出口離開的所述吸附粒輸送至該進料口。A fluidized absorption and desorption concentration unit comprising: a fluidization desorption device according to any one of claims 1 to 3; 5; a fluidization adsorption column having a gas inlet to be treated and a treated gas An outlet, an adsorption particle inlet and an adsorption particle outlet, the gas inlet to be treated and the adsorption particle outlet are lower than the treated gas outlet and the adsorption particle inlet, and the fluidized adsorption tower has a gas dispersion to be treated. a plate and a multi-layer adsorption porous plate, the gas dispersion plate to be treated is adjacent to the gas inlet to be treated, and the adsorption porous plates are spaced apart from the gas dispersion plate to be treated and the treated gas outlet at a height direction of the fluidization adsorption column The fluidized adsorption tower is configured to allow the adsorption particles to enter through the adsorption particle inlet port, and to fall back and forth between the adsorption porous plates, and then exit the fluidization adsorption through the adsorption particle output port. a fluidization adsorption tower is further configured to allow a gas to be treated to enter through the gas inlet to be treated, and pass through the gas dispersion plate to be treated and the adsorption porous plates The pores flow upward, and then exit the fluidization adsorption tower through the treated gas outlet; and an adsorption particle delivery device is connected to the fluidization adsorption column and the fluidization desorption device for treating the fluidization desorption device The adsorbent particles are transported to the adsorbent particle inlet and used to deliver the adsorbent particles exiting the adsorbent particle outlet to the feed port. 如請求項6所述的流體化吸脫附濃縮單元,其中該入流分散部更具有一溢流管,該溢流管低於該進料口但高於該分散部出口,該溢流管用以讓堆積到高達該溢流管高度的所述吸附粒離開該入流分散部。The fluidized absorption and desorption concentration unit according to claim 6, wherein the inflow dispersion portion further has an overflow pipe, the overflow pipe being lower than the feed port but higher than the outlet of the dispersion portion, wherein the overflow pipe is used for The adsorbent particles deposited up to the height of the overflow pipe are allowed to exit the inflow dispersion. 如請求項7所述的流體化吸脫附濃縮單元,其中該吸附粒輸送裝置更用以將自該溢流管離開的所述吸附粒輸送至該流體化吸附塔鄰近該吸附粒輸出口的上游處。The fluidized adsorption and desorption concentration unit according to claim 7, wherein the adsorption particle delivery device is further configured to transport the adsorption particles leaving the overflow pipe to the fluidization adsorption tower adjacent to the adsorption particle output port. Upstream. 一種廢氣淨化系統,包括: 一如請求項6所述的流體化吸脫附濃縮單元;以及 一後處理單元,連結該脫附氣體出口並用以對自該脫附氣體出口排出的所述脫附氣體進行後處理。An exhaust gas purification system comprising: the fluidized absorption and desorption concentration unit of claim 6, and a post-processing unit coupled to the desorption gas outlet for desorbing the desorption gas outlet The gas is post-treated. 如請求項9所述的廢氣淨化系統,更包括一熱交換器,其中該後處理單元為一焚化單元,用以焚化該脫附氣體自該脫附氣體出口排出的所述脫附氣體並產生一焚化尾氣,該熱交換器用以令該焚化尾氣與即將進入該脫附部的所述脫附氣體進行熱交換。The exhaust gas purification system according to claim 9, further comprising a heat exchanger, wherein the aftertreatment unit is an incineration unit for incinerating the desorbed gas discharged from the desorption gas outlet by the desorption gas and generating An incineration tail gas is used to exchange heat between the incineration tail gas and the desorbed gas that is about to enter the desorption portion.
TW108200843U 2019-01-18 2019-01-18 Fluidized desorption device, fluidized adsorption-desorption concentration unit and waste gas purification system thereof TWM577347U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW108200843U TWM577347U (en) 2019-01-18 2019-01-18 Fluidized desorption device, fluidized adsorption-desorption concentration unit and waste gas purification system thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW108200843U TWM577347U (en) 2019-01-18 2019-01-18 Fluidized desorption device, fluidized adsorption-desorption concentration unit and waste gas purification system thereof

Publications (1)

Publication Number Publication Date
TWM577347U true TWM577347U (en) 2019-05-01

Family

ID=67352708

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108200843U TWM577347U (en) 2019-01-18 2019-01-18 Fluidized desorption device, fluidized adsorption-desorption concentration unit and waste gas purification system thereof

Country Status (1)

Country Link
TW (1) TWM577347U (en)

Similar Documents

Publication Publication Date Title
TWI629092B (en) High efficiency purification system and method using series-connected rotary wheels
CN110898555A (en) Waste gas treatment device
CN103977778B (en) A kind of active coke regeneration device
JP2009090979A (en) Small desiccant air conditioner
CN206715626U (en) Runner high efficiency cleaning system
TWM577347U (en) Fluidized desorption device, fluidized adsorption-desorption concentration unit and waste gas purification system thereof
US7309379B2 (en) Moving bed adsorber/desorber and low flow (high yield) desorber devices and their methods of use
US11933495B2 (en) Fluid bed regenerative thermal oxidizer and a method for its use
CN203862251U (en) Active coke regeneration device
KR101625029B1 (en) Oxidation apparatus of volatile organic compound
JP4565111B2 (en) Fluidized bed desiccant air conditioning system
JP2009083851A (en) Small desiccant air conditioner
CN106693610B (en) Save the desorption apparatus and fluidized bed continous way adsorption desorption system of absorption grain dosage
KR20230153764A (en) Apparatus For Concentration And Disposal VOCs
CN208032235U (en) A kind of separate type emission-control equipment
CN113230882A (en) Integrative equipment of laboratory exhaust-gas treatment
JP3068856B2 (en) Adsorption reactor for separating unwanted components from fluids
JP4352139B2 (en) Small desiccant air conditioner
JP5470671B2 (en) Desiccant air conditioner
CN108114575A (en) A kind of separate type emission-control equipment and processing method
TWI779384B (en) Organic waste gas adsorption, desorption, concentration and purification system and method capable of increasing temperature and controlling humidity
CN114345082A (en) A remove bed processing apparatus for adsorbing contain organic volatile matter waste gas
US20230272908A1 (en) Fluid bed regenerative thermal oxidizer and a method for its use
TWM614947U (en) Organic waste gas adsorption, desorption, concentration and purification system capable of increasing temperature and controlling humidity
JP5503191B2 (en) Outside air purification device