TWM574515U - Recycling device by mixing gas and liquid - Google Patents

Recycling device by mixing gas and liquid Download PDF

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TWM574515U
TWM574515U TW107215188U TW107215188U TWM574515U TW M574515 U TWM574515 U TW M574515U TW 107215188 U TW107215188 U TW 107215188U TW 107215188 U TW107215188 U TW 107215188U TW M574515 U TWM574515 U TW M574515U
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Taiwan
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gas
layer
liquid
recovery device
water
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TW107215188U
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Chinese (zh)
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林豪傑
呂志鵬
陳韻慈
邱學樑
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關東鑫林科技股份有限公司
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Priority to TW107215188U priority Critical patent/TWM574515U/en
Publication of TWM574515U publication Critical patent/TWM574515U/en

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Abstract

A recycling device by mixing gas and liquid is disclosed, which comprise: a case with a gas inlet, a liquid outlet and a gas outlet; an airflow homogenizer disposed in the case and above the gas inlet and the liquid outlet; a first nozzle layer disposed in the case and above the airflow homogenizer; a first gas liquid mixing layer disposed in the case and above the first nozzle layer; and a dehumidification layer disposed in the case and above the first gas liquid mixing layer, wherein the gas outlet is disposed above the dehumidification layer.

Description

氣液混合回收裝置Gas-liquid mixing recovery device

本揭露提供一種氣液混合回收裝置,其可用以回收高濃度氣體。The present disclosure provides a gas-liquid mixing recovery device that can be used to recover a high concentration gas.

於氣體樣品(例如含氨氣或氫氣等親水性強的化學物質)操作時,例如樣品取樣或樣品填充時,對於逸散的氣體樣品需進行處理。然而,若以原先的洗滌設施處理逸散的樣品氣體,所排放出的廢水仍須進一步處理。When operating on a gas sample (eg, a highly hydrophilic chemical such as ammonia or hydrogen), such as sample sampling or sample filling, the fugitive gas sample needs to be treated. However, if the escaped sample gas is treated with the original washing facility, the discharged wastewater must be further processed.

有鑑於此,目前亟需發展一種裝置,其可處理逸散的氣體樣品,並轉為可利用的產品,藉此,可減少原洗滌設施所排放之廢水,更可符合生產再循環的環保經濟。In view of this, there is an urgent need to develop a device that can process fugitive gas samples and convert them into usable products, thereby reducing waste water discharged from the original washing facilities and meeting the environmentally friendly economy of production recycling. .

本揭露提供一種氣液混合回收裝置,其可用以回收高濃度氣體。The present disclosure provides a gas-liquid mixing recovery device that can be used to recover a high concentration gas.

本揭露的氣液混合回收裝置包括:一殼體,具有一氣體入口、一液體出口及一氣體出口;一氣流均佈單元,設於殼體中且位於氣體入口及液體出口上方;一第一噴嘴層,設於殼體中且位於氣流均佈單元上方;一第一水氣混合層,設於殼體中且位於第一噴嘴層上方;以及一除霧層,設於殼體中且位於第一水氣混合層上方,且氣體出口位於除霧層上方。The gas-liquid mixing recovery device of the present disclosure comprises: a casing having a gas inlet, a liquid outlet and a gas outlet; and a gas distribution unit disposed in the casing and located above the gas inlet and the liquid outlet; a nozzle layer disposed in the housing and located above the airflow uniform unit; a first water-gas mixing layer disposed in the housing and above the first nozzle layer; and a defogging layer disposed in the housing and located Above the first moisture mixing layer, and the gas outlet is above the defogging layer.

於本揭露的氣液混合回收裝置中,氣體入口位於裝置的下方,而氣體出口位於裝置的上方。當一含化學物質的氣體(例如含氨氣或氫氣等親水性強的化學物質)由氣體入口通入本揭露的氣液混合回收裝置中後,氣體會先通過氣流均佈單元;接著,第一噴嘴層所噴出的水霧會與氣體中的化學物質結合,而一同通過第一水氣混合層,並藉由第一水氣混合層提供較大的接觸時間及接觸面積,而可提高氣體中的化學物質與水霧的結合比例;而後,氣體和與水霧結合後的化學物質可再通過除霧層,藉此可吸附與化學物質結合的水霧,而得到一乾淨的氣體由氣體出口流出。此外,與化學物質結合的水霧可再進一步凝結成液體,而由液體出口排出。In the gas-liquid mixing recovery device of the present disclosure, the gas inlet is located below the device and the gas outlet is located above the device. When a chemical-containing gas (for example, a hydrophilic chemical such as ammonia or hydrogen) is introduced into the gas-liquid mixing recovery device of the present disclosure from the gas inlet, the gas first passes through the gas flow uniform unit; The water mist sprayed from a nozzle layer is combined with the chemical substances in the gas to pass through the first water-gas mixed layer, and the first water-gas mixed layer provides a larger contact time and contact area, thereby increasing the gas. The ratio of the chemical substance to the water mist; then, the gas and the chemical substance combined with the water mist can pass through the defogging layer, thereby adsorbing the water mist combined with the chemical substance, thereby obtaining a clean gas from the gas The exit is out. In addition, the water mist combined with the chemical substance can be further condensed into a liquid and discharged from the liquid outlet.

本揭露的氣液混合回收裝置可更包括:一第二噴嘴層,設於殼體中且位於第一水氣混合層上方;以及一第二水氣混合層,設於殼體中且位於第二噴嘴層上方,且第二水氣混合層位於除霧層下方。藉由設置第二噴嘴層與第二水氣混合層,可進一步提高氣體中的化學物質與水霧的結合比例。The gas-liquid mixing recovery device of the present disclosure may further include: a second nozzle layer disposed in the casing and located above the first water-gas mixed layer; and a second water-gas mixed layer disposed in the casing and located at the first Above the two nozzle layers, and the second water-gas mixed layer is located below the defogging layer. By providing the second nozzle layer and the second water-gas mixed layer, the ratio of the chemical substance to the water mist in the gas can be further increased.

於本揭露的氣液混合回收裝置中,第一噴嘴層與第二噴嘴層可分別為一二流體噴嘴層。其中,二流體噴嘴所噴出的水霧粒徑為微米等級;因此,由於噴出的水霧較輕,故可跟隨氣體一同向上流動,以避免降低液氣結合效率。In the gas-liquid mixing recovery device of the present disclosure, the first nozzle layer and the second nozzle layer may each be a two-fluid nozzle layer. The water mist sprayed by the two-fluid nozzle has a particle size of micrometer; therefore, since the sprayed water mist is light, it can flow upward along with the gas to avoid reducing the liquid-gas combination efficiency.

於本揭露的氣液混合回收裝置中,氣流均佈單元包括複數檔板;藉此,可避免所通入的氣體產生短流效應,以避免降低液氣結合效率。In the gas-liquid mixing recovery device disclosed in the present disclosure, the airflow uniformizing unit includes a plurality of baffles; thereby, the short-flow effect of the introduced gas can be avoided to avoid reducing the liquid-gas bonding efficiency.

本揭露的氣液混合回收裝置可更包括一截流板,設於殼體中且位於氣流均佈單元下方,其中液體出口設於殼體的一側,截流板由與該側相對的另一側朝該側向下傾斜。此外,本揭露的氣液混合回收裝置可更包括一液體收集單元,設於殼體外且對應液體出口設置。由於截流板為傾斜式設置,故可幫助與化學物質結合的液體可輕易地由液體出口排出而被液體收集單元所收集。The gas-liquid mixing recovery device of the present disclosure may further include a intercepting plate disposed in the casing and located below the airflow uniforming unit, wherein the liquid outlet is disposed at one side of the casing, and the intercepting plate is opposite to the other side of the side Tilt down towards this side. In addition, the gas-liquid mixing recovery device of the present disclosure may further include a liquid collecting unit disposed outside the casing and disposed corresponding to the liquid outlet. Since the shutoff plate is arranged in an inclined manner, the liquid which can be combined with the chemical substance can be easily discharged from the liquid outlet and collected by the liquid collecting unit.

於本揭露的氣液混合回收裝置中,第一水氣混合層、第二水氣混合層與該除霧層可分別為一蜂巢式且表面具有皺紋處理的濾網。藉由使用此具有特殊結構的濾網,濾網的蜂巢狀流道可提供較大的接觸時間及接觸面積,增加氣體中的化學物質與水霧的結合比例。此外,於本揭露中,濾網的表面皺紋處理可為V型斜紋,以降低濾網有縮小或變形的情形產生。In the gas-liquid mixing recovery device of the present disclosure, the first water-gas mixed layer, the second water-gas mixed layer and the de-fogging layer may each be a honeycomb type filter having a wrinkle treatment on the surface. By using this special structure filter screen, the honeycomb channel of the filter screen can provide a large contact time and contact area, and increase the ratio of the chemical substance to the water mist in the gas. In addition, in the present disclosure, the surface wrinkle treatment of the screen may be a V-shaped twill to reduce the situation in which the screen is reduced or deformed.

此外,於本揭露的氣液混合回收裝置中,氣體入口與液體出口可位於殼體的同側。Further, in the gas-liquid mixing recovery device of the present disclosure, the gas inlet and the liquid outlet may be located on the same side of the casing.

以下係藉由特定的具體實施例說明本揭露之實施方式,熟習此技藝之人士可由本說明書所揭示之內容輕易地了解本揭露之其他優點與功效。本揭露亦可藉由其他不同的具體實施例加以施行或應用,本說明書中的各項細節亦可針對不同觀點與應用,在不悖離本創作之精神下進行各種修飾與變更。The embodiments of the present disclosure are described by way of specific examples, and those skilled in the art can readily appreciate the other advantages and advantages of the disclosure. The present disclosure can also be implemented or applied by other different embodiments. The details of the present specification can also be applied to various viewpoints and applications, and various modifications and changes can be made without departing from the spirit of the present invention.

再者,說明書與權利要求中所使用的序數例如"第一”、”第二”等之用詞,以修飾權利要求之元件,其本身並不意含及代表該權利要求元件有任何之前的序數,也不代表某一請求元件與另一請求元件的順序、或是製造方法上的順序,該些序數的使用僅用來使具有某命名的一請求元件得以和另一具有相同命名的請求元件能作出清楚區分。Furthermore, the use of the ordinal numbers such as "first", "second", etc., in the <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; Does not represent the order of a request element and another request element, or the order of the manufacturing method. The use of these ordinals is only used to enable a request element with a certain name to be the same as another request element. Can make a clear distinction.

圖1為本揭露一實施例的氣液混合回收裝置的剖面示意圖。本實施例的氣液混合回收裝置包括:一殼體1,具有一氣體入口11、一液體出口12及一氣體出口13;一氣流均佈單元2,設於殼體1中且位於氣體入口11及液體出口12上方;一第一噴嘴層3,設於殼體1中且位於氣流均佈單元2上方;一第一水氣混合層4,設於殼體1中且位於第一噴嘴層3上方;以及一除霧層5,設於殼體1中且位於第一水氣混合層4上方,且氣體出口13位於除霧層5上方。1 is a schematic cross-sectional view of a gas-liquid mixing recovery device according to an embodiment of the present disclosure. The gas-liquid mixing recovery device of the present embodiment comprises: a casing 1 having a gas inlet 11, a liquid outlet 12 and a gas outlet 13; a gas distribution unit 2 disposed in the casing 1 and located at the gas inlet 11 And a liquid outlet 12; a first nozzle layer 3 disposed in the housing 1 and above the airflow uniform unit 2; a first water-gas mixing layer 4 disposed in the housing 1 and located in the first nozzle layer 3 Above; and a defogging layer 5, disposed in the casing 1 and above the first water-gas mixing layer 4, and the gas outlet 13 is located above the defogging layer 5.

因此,當一含化學物質的氣體(例如含氨氣或氫氣等親水性強的化學物質)由氣體入口11通入本揭露的氣液混合回收裝置中後,氣體會先通過氣流均佈單元2;接著,第一噴嘴層3所噴出的水霧會與氣體中的化學物質結合,而一同通過第一水氣混合層4,並藉由第一水氣混合層4提供較大的接觸時間及接觸面積,而可提高氣體中的化學物質與水霧的結合比例;而後,氣體和與水霧結合後的化學物質可再通過除霧層5,藉此可吸附與化學物質結合的水霧,而得到一乾淨的氣體由氣體出口13流出。此外,與化學物質結合的水霧可再進一步凝結成液體,而由液體出口12排出。Therefore, when a chemical-containing gas (for example, a highly hydrophilic chemical substance such as ammonia or hydrogen) is introduced into the gas-liquid mixing recovery device of the present disclosure from the gas inlet 11, the gas passes through the gas flow uniformizing unit 2 first. Then, the water mist sprayed from the first nozzle layer 3 is combined with the chemical substances in the gas, and passes through the first water-gas mixed layer 4, and provides a large contact time by the first water-gas mixed layer 4 and The contact area increases the ratio of the chemical substance in the gas to the water mist; then, the gas and the chemical substance combined with the water mist can pass through the defogging layer 5, thereby adsorbing the water mist combined with the chemical substance. A clean gas is obtained which is discharged from the gas outlet 13. In addition, the water mist combined with the chemical substance can be further condensed into a liquid and discharged from the liquid outlet 12.

於本實施例中,氣體入口11與液體出口12位於殼體1的同側,且氣體入口11位於液體出口12上方。然而,本揭露並不僅限於此,氣體入口11與液體出口12位於殼體1的不同側,只要氣體入口11與液體出口12位於氣液混合回收裝置的底部即可。In the present embodiment, the gas inlet 11 and the liquid outlet 12 are located on the same side of the casing 1, and the gas inlet 11 is located above the liquid outlet 12. However, the present disclosure is not limited thereto, and the gas inlet 11 and the liquid outlet 12 are located on different sides of the casing 1, as long as the gas inlet 11 and the liquid outlet 12 are located at the bottom of the gas-liquid mixing recovery device.

圖2為本實施例的氣液混合回收裝置中的氣流均佈單元的下視圖。如圖1及圖2所示,本實施例所使用的氣流均佈單元2包括:複數檔板21,其中此些檔板21係以一同心圓方式排列。在此,檔板21的數量並無特殊限制,可根據需求做調整。此外,氣流均佈單元2更包括:一支撐層22;其中,支撐層22可具有一網狀結構。然而,本揭露並不僅限於此,支撐層22的結構並無特殊限制,只要具有孔洞而可讓氣體通過氣流均佈單元2。再者,氣流均佈單元2更包括:一入風口23,而由氣體入口11通入的氣體,可經由入風口23進入氣流均佈單元2。於本實施例中,藉由氣流均佈單元2所包含的檔板21,可使由氣體入口11通入的氣體可均勻分佈,而不至於產生短流效應,故所通入的氣體可均勻的通入第一水氣混合層4,以提升液氣結合效率。Fig. 2 is a bottom view of the airflow leveling unit in the gas-liquid mixing and recovery device of the present embodiment. As shown in FIG. 1 and FIG. 2, the airflow uniform unit 2 used in this embodiment includes a plurality of baffles 21, wherein the baffles 21 are arranged in a concentric manner. Here, the number of the shutters 21 is not particularly limited and can be adjusted as needed. In addition, the airflow uniform unit 2 further includes: a support layer 22; wherein the support layer 22 can have a mesh structure. However, the present disclosure is not limited thereto, and the structure of the support layer 22 is not particularly limited as long as it has holes to allow gas to pass through the airflow uniform unit 2. Furthermore, the airflow uniform unit 2 further includes an air inlet 23, and the gas introduced by the gas inlet 11 can enter the airflow uniform unit 2 via the air inlet 23. In the present embodiment, by the baffle 21 included in the airflow homogenizing unit 2, the gas introduced through the gas inlet 11 can be uniformly distributed without generating a short-flow effect, so that the gas to be introduced can be uniformly distributed. The first water-gas mixing layer 4 is introduced to enhance the liquid-gas bonding efficiency.

如圖1所示,本實施例的氣液混合回收裝置包括第一噴嘴層3,設於殼體1中且位於氣流均佈單元2上方。於本實施例中,第一噴嘴層3可為一二流體噴嘴層;且於殼體1的兩側分別裝設有一二流體噴嘴。其中,二流體噴嘴包括一液體進入口31、一氣體進入口32及一水霧噴出口33。在此,液體進入口31與氣體進入口32可位於同側,而與水霧噴出口33位於不同側。然而,本揭露並不僅限於此,只要液體進入口31所通入的液體可與氣體進入口32所通入的壓縮空氣混合,並於水霧噴出口33噴出水霧即可。於本實施例中,水霧噴出口33可噴出XY平面的水霧。As shown in FIG. 1, the gas-liquid mixing recovery device of the present embodiment includes a first nozzle layer 3 disposed in the casing 1 and above the airflow uniform unit 2. In this embodiment, the first nozzle layer 3 can be a two-fluid nozzle layer; and two fluid nozzles are respectively disposed on two sides of the housing 1. The two-fluid nozzle includes a liquid inlet port 31, a gas inlet port 32, and a water mist spray port 33. Here, the liquid inlet port 31 and the gas inlet port 32 may be located on the same side and on the different sides from the water mist discharge port 33. However, the present disclosure is not limited thereto, as long as the liquid introduced into the liquid inlet port 31 can be mixed with the compressed air introduced through the gas inlet port 32, and the water mist can be ejected from the water mist discharge port 33. In the present embodiment, the water mist discharge port 33 can eject a water mist in the XY plane.

於本實施例的氣液混合回收裝置中,第一水氣混合層4及除霧層5分別為一蜂巢式且表面具有皺紋處理的濾網。更詳細而言,第一水氣混合層4及除霧層5所使用的濾網為表面經特殊皺紋處理(蜂巢狀成型)且V型斜紋熱壓式成型的濾網,其具有永不縮小、變形等特徵。因此,當使用此濾網作為第一水氣混合層4時,可增加所通入的氣體與濕潤的蜂巢流道接觸的時間及面積;藉此,所通入的氣體中的化學物質(例如含氨氣或氫氣等親水性強的化學物質)可充分與第一噴嘴層3所噴出的水霧結合,而提升化學物質與水霧的結合比率。同樣的,當使用此濾網作為除霧層5時,也可增加濕潤氣體與蜂巢流道接觸的時間及面積;藉此,可達到充分移除濕潤氣體中的液體,而降低由氣體出口13流出的乾淨氣體的水氣。In the gas-liquid mixing and recovery device of the present embodiment, the first water-gas mixture layer 4 and the defogging layer 5 are respectively a honeycomb type filter screen having a wrinkle treatment on the surface. More specifically, the screen used in the first water-gas mixing layer 4 and the defogging layer 5 is a screen whose surface is subjected to special wrinkle treatment (honey-shaped molding) and V-type twill hot pressing molding, which has never shrinks. , deformation and other characteristics. Therefore, when the screen is used as the first water-gas mixing layer 4, the time and area of contact of the introduced gas with the wet honeycomb flow channel can be increased; thereby, the chemical substances in the introduced gas (for example) A highly hydrophilic chemical substance such as ammonia or hydrogen can be sufficiently combined with the water mist sprayed from the first nozzle layer 3 to increase the binding ratio of the chemical substance to the water mist. Similarly, when the screen is used as the defogging layer 5, the time and area of contact of the humid gas with the honeycomb channel can also be increased; thereby, the liquid in the humid gas can be sufficiently removed, and the gas outlet 13 can be lowered. The moisture of the clean gas flowing out.

為了提升本實施例的氣液混合回收裝置的液氣結合效率,本實施例的氣液混合回收裝置可更包括:一第二噴嘴層6,設於殼體1中且位於第一水氣混合層4上方;以及一第二水氣混合層7,設於殼體1中且位於第二噴嘴層6上方,且第二水氣混合層7位於除霧層5下方。In order to improve the liquid-gas mixing efficiency of the gas-liquid mixing and recovery device of the present embodiment, the gas-liquid mixing recovery device of the present embodiment may further include: a second nozzle layer 6 disposed in the housing 1 and located in the first water-gas mixture Above the layer 4; and a second water-gas mixed layer 7 disposed in the casing 1 and above the second nozzle layer 6, and the second water-gas mixed layer 7 is located below the defogging layer 5.

與第一噴嘴層3相似,第二噴嘴層6可為一二流體噴嘴層;且於殼體1的兩側分別裝設有一二流體噴嘴。其中,二流體噴嘴包括一液體進入口61、一氣體進入口62及一水霧噴出口63。在此,液體進入口61與氣體進入口62可位於同側,而與水霧噴出口63位於不同側。然而,本揭露並不僅限於此,只要液體進入口61所通入的液體可與氣體進入口62所通入的壓縮空氣混合,並於水霧噴出口63噴出水霧即可。於本實施例中,水霧噴出口63可噴出XY平面的水霧。Similar to the first nozzle layer 3, the second nozzle layer 6 can be a two-fluid nozzle layer; and a two-fluid nozzle is respectively disposed on both sides of the housing 1. The two-fluid nozzle includes a liquid inlet port 61, a gas inlet port 62, and a water mist discharge port 63. Here, the liquid inlet port 61 and the gas inlet port 62 may be located on the same side and on the different sides from the water mist discharge port 63. However, the present disclosure is not limited thereto, as long as the liquid introduced through the liquid inlet port 61 can be mixed with the compressed air introduced through the gas inlet port 62, and the water mist can be ejected from the water mist discharge port 63. In the present embodiment, the water mist discharge port 63 can eject a water mist in the XY plane.

此外,於本實施例中,第二水氣混合層7可具有與第一水氣混合層4相似結構,故在此不再贅述。In addition, in the present embodiment, the second water-gas mixed layer 7 may have a similar structure to the first water-gas mixed layer 4, and thus will not be described herein.

本實施例的氣液混合回收裝置可更包括一截流板8,設於殼體1中且位於氣流均佈單元2下方,其中液體出口12設於殼體1的一側(圖中右側),截流板8由與該側相對的另一側朝該側向下傾斜,即由圖中左側朝圖中右側傾斜。此外,本實施例的氣液混合回收裝置可更包括一液體收集單元9,設於殼體1外且對應液體出口12設置。因此,經與化學物質結合的液體(例如,氨氣與水結合所形成的氨水),可透過液體的本身的重量向下流動,並順著截流板8朝液體出口12流出,而收集於液體收集單元9;藉此,可達到回收所通入的氣體中的化學物質的目的。The gas-liquid mixing and recovery device of the present embodiment may further include a shutoff plate 8 disposed in the casing 1 and located below the airflow uniform unit 2, wherein the liquid outlet 12 is disposed on one side of the casing 1 (on the right side in the figure). The shutoff plate 8 is inclined downward toward the side by the other side opposite to the side, i.e., from the left side in the drawing toward the right side in the drawing. In addition, the gas-liquid mixing recovery device of the present embodiment may further include a liquid collecting unit 9 disposed outside the casing 1 and disposed corresponding to the liquid outlet 12. Therefore, the liquid combined with the chemical substance (for example, ammonia water formed by combining ammonia and water) can flow downward through the weight of the liquid itself, and flows out along the shutoff plate 8 toward the liquid outlet 12 to be collected in the liquid. The collecting unit 9; whereby the purpose of recovering the chemical substances in the introduced gas can be achieved.

綜上所述,本揭露所提供的氣液混合回收,因第一噴嘴層3及第二噴嘴層6所噴出的水霧較輕,而可與所通入的氣體採相同的流動方向,而提升液氣結合效率。此外,藉由使用具有特殊結構(表面經特殊皺紋處理(蜂巢狀成型)且V型斜紋熱壓式成型的濾網)的第一水氣混合層4及第二水氣混合層7,而可提升氣體與水霧的接觸時間及面積,增加氣體與水霧的結合比率。再者,於本實施例中,第一噴嘴層3及第二噴嘴層6所噴出的水霧為微米級粒徑的水霧,故可提供較大的氣體接觸面積,而可減少液體的使用量。In summary, the gas-liquid mixture recovery provided by the present disclosure is that the water mist sprayed by the first nozzle layer 3 and the second nozzle layer 6 is lighter, and the same flow direction can be adopted as the gas to be introduced. Improve the efficiency of liquid-gas combination. Further, by using the first water-gas mixed layer 4 and the second water-gas mixed layer 7 having a special structure (a screen having a special wrinkle treatment (honeycomb molding) and a V-type twill hot press molding), Increase the contact time and area of gas and water mist, and increase the ratio of gas to water mist. Furthermore, in the present embodiment, the water mist sprayed by the first nozzle layer 3 and the second nozzle layer 6 is a water mist having a micron-sized particle diameter, so that a large gas contact area can be provided, and the use of the liquid can be reduced. the amount.

1‧‧‧殼體1‧‧‧shell

11‧‧‧氣體入口 11‧‧‧ gas inlet

12‧‧‧液體出口 12‧‧‧Liquid exports

13‧‧‧氣體出口 13‧‧‧ gas export

2‧‧‧氣流均佈單元 2‧‧‧Airflow uniform unit

21‧‧‧檔板 21‧‧‧Baffle

22‧‧‧支撐層 22‧‧‧Support layer

23‧‧‧入風口 23‧‧‧Air inlet

3‧‧‧第一噴嘴層 3‧‧‧First nozzle layer

31,61‧‧‧液體進入口 31,61‧‧‧ liquid inlet

32,62‧‧‧氣體進入口 32,62‧‧‧ gas inlet

33,63‧‧‧水霧噴出口 33,63‧‧‧Water spray outlet

4‧‧‧第一水氣混合層 4‧‧‧First water-gas mixed layer

5‧‧‧除霧層 5‧‧‧Defogging layer

6‧‧‧第二噴嘴層 6‧‧‧second nozzle layer

7‧‧‧第二水氣混合層 7‧‧‧Second water-gas mixed layer

8‧‧‧截流板 8‧‧‧ interceptor

9‧‧‧液體收集單元 9‧‧‧Liquid collection unit

X,Y,Z‧‧‧座標 X, Y, Z‧‧‧ coordinates

圖1為本揭露一實施例的氣液混合回收裝置的剖面示意圖。1 is a schematic cross-sectional view of a gas-liquid mixing recovery device according to an embodiment of the present disclosure.

圖2為本揭露一實施例的氣液混合回收裝置中的氣流均佈單元的下視圖。2 is a bottom view of the airflow uniform unit in the gas-liquid mixing recovery device according to an embodiment of the present disclosure.

Claims (10)

一種氣液混合回收裝置,包括: 一殼體,具有一氣體入口、一液體出口及一氣體出口; 一氣流均佈單元,設於該殼體中且位於該氣體入口及該液體出口上方; 一第一噴嘴層,設於該殼體中且位於該氣流均佈單元上方; 一第一水氣混合層,設於該殼體中且位於該第一噴嘴層上方;以及 一除霧層,設於該殼體中且位於該第一水氣混合層上方,且該氣體出口位於該除霧層上方。A gas-liquid mixing recovery device comprises: a casing having a gas inlet, a liquid outlet and a gas outlet; a gas distribution unit disposed in the casing and located above the gas inlet and the liquid outlet; a first nozzle layer disposed in the housing and located above the airflow uniform unit; a first water-gas mixing layer disposed in the housing and above the first nozzle layer; and a defogging layer In the housing and above the first water-gas mixing layer, the gas outlet is located above the de-fogging layer. 如申請專利範圍第1項所述的氣液混合回收裝置,更包括: 一第二噴嘴層,設於該殼體中且位於該第一水氣混合層上方;以及 一第二水氣混合層,設於該殼體中且位於該第二噴嘴層上方,且該第二水氣混合層位於該除霧層下方。The gas-liquid mixing recovery device of claim 1, further comprising: a second nozzle layer disposed in the casing and above the first water-gas mixture layer; and a second water-gas mixture layer Provided in the housing and above the second nozzle layer, and the second water-gas mixed layer is located below the defogging layer. 如申請專利範圍第1項所述的氣液混合回收裝置,其中該第一噴嘴層為一二流體噴嘴層。The gas-liquid mixing recovery device of claim 1, wherein the first nozzle layer is a two-fluid nozzle layer. 如申請專利範圍第2項所述的氣液混合回收裝置,其中該第二噴嘴層為一二流體噴嘴層。The gas-liquid mixing recovery device of claim 2, wherein the second nozzle layer is a two-fluid nozzle layer. 如申請專利範圍第1項所述的氣液混合回收裝置,其中該氣流均佈單元包括複數檔板。The gas-liquid mixing recovery device of claim 1, wherein the airflow uniform unit comprises a plurality of baffles. 如申請專利範圍第1項所述的氣液混合回收裝置,更包括一截流板,設於該殼體中且位於該氣流均佈單元下方,其中該液體出口設於該殼體的一側,該截流板由與該側相對的另一側朝該側向下傾斜。The gas-liquid mixing and recovery device of claim 1, further comprising a shutoff plate disposed in the casing and located below the airflow uniform unit, wherein the liquid outlet is disposed at one side of the casing. The interceptor is inclined downwardly toward the side by the other side opposite the side. 如申請專利範圍第1項所述的氣液混合回收裝置,更包括一液體收集單元,設於該殼體外且對應該液體出口設置。The gas-liquid mixing recovery device according to claim 1, further comprising a liquid collecting unit disposed outside the casing and corresponding to the liquid outlet. 如申請專利範圍第1項所述的氣液混合回收裝置,其中該第一水氣混合層與該除霧層分別為一蜂巢式且表面具有皺紋處理的濾網。The gas-liquid mixing recovery device according to claim 1, wherein the first water-gas mixed layer and the defogging layer are respectively a honeycomb type filter having a wrinkle treatment on the surface. 如申請專利範圍第2項所述的氣液混合回收裝置,其中該第二水氣混合層為一蜂巢式且表面具有皺紋處理的濾網。The gas-liquid mixing recovery device according to claim 2, wherein the second water-gas mixed layer is a honeycomb type filter having a wrinkle treatment on the surface. 如申請專利範圍第1項所述的氣液混合回收裝置,其中該氣體入口與該液體出口位於該殼體的同側。The gas-liquid mixing recovery device of claim 1, wherein the gas inlet and the liquid outlet are located on the same side of the housing.
TW107215188U 2018-11-08 2018-11-08 Recycling device by mixing gas and liquid TWM574515U (en)

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