TWM571579U - Separation equipment - Google Patents

Separation equipment

Info

Publication number
TWM571579U
TWM571579U TWM571579U TW M571579 U TWM571579 U TW M571579U TW M571579 U TWM571579 U TW M571579U
Authority
TW
Taiwan
Prior art keywords
carrier
base
separation
separating
target
Prior art date
Application number
Other languages
Chinese (zh)
Publication date

Links

Abstract

一種分離設備,係包括:基座、承載複數目標物之承載件以及取像裝置,以於該基座帶動該承載件而使該承載件變形後,藉由該取像裝置擷取該目標物之位置以判斷該目標物是否位於預定位置上。 A separating device includes: a base, a carrier carrying a plurality of targets, and an image capturing device, wherein the carrier is driven by the base to deform the carrier, and the target is captured by the image capturing device The position is to determine whether the target is at a predetermined position.

Description

分離設備 Separation equipment

本創作係關於一種分離設備,尤係關於一種用於半導體晶圓劈裂製程之分離設備。 This creation is directed to a separation apparatus, and more particularly to a separation apparatus for a semiconductor wafer splitting process.

習知半導體製程中,晶圓於製造完成後,會進行薄化製程、切單製程、封裝製程等,其中,切單製程之方式繁多,例如、雷射切割、機械切割、劈裂分離等。 In the conventional semiconductor process, after the wafer is manufactured, the thinning process, the singulation process, the packaging process, and the like are performed. Among them, the singulation process is various, for example, laser cutting, mechanical cutting, splitting and the like.

第1A至1C圖係為習知劈裂分離方式之切單製程。如第1A圖所示,先將晶圓9貼附於一膠膜1上,再將該膠膜1設於劈裂機台之受台(圖略)上。接著,將該劈裂機台之劈刀8對位於該晶圓9之溝槽90之背面位置A上,使該劈刀8碰觸該晶圓9,以令該晶圓9沿該溝槽90裂開(如裂痕S)而形成複數晶粒9a。之後,如第1B圖所示,進行擴張該膠膜1之作業,使該些晶粒9a之間相隔一預定距離t。最後,如第1C圖所示,將該膠膜1之邊緣1b切除,並將該膠膜1之保留部分1a上之該些晶粒9a轉貼至另一載盤(圖略)上,以進行後續製程。 The 1A to 1C drawings are the single-cutting processes of the conventional splitting separation method. As shown in FIG. 1A, the wafer 9 is first attached to a film 1, and the film 1 is placed on a receiving table (not shown) of the splitting machine. Next, the boring tool 8 of the splitting machine is placed on the back surface A of the groove 90 of the wafer 9, so that the boring tool 8 touches the wafer 9 so that the wafer 9 is along the groove. 90 cracks (such as cracks S) form a plurality of crystal grains 9a. Thereafter, as shown in Fig. 1B, the operation of expanding the film 1 is performed such that the crystal grains 9a are separated by a predetermined distance t. Finally, as shown in FIG. 1C, the edge 1b of the film 1 is cut off, and the crystal grains 9a on the remaining portion 1a of the film 1 are transferred to another carrier (not shown) for performing. Follow-up process.

於正常情況下,如第1B圖所示,施予該膠膜1一擴張力f,以獲得所需之預定距離t。 Under normal circumstances, as shown in Fig. 1B, the film 1 is subjected to an expansion force f to obtain a desired predetermined distance t.

惟,習知擴膜作業中,由於該膠膜1之應力分布不均, 致使部分晶粒9a,9b之間形成一錯誤距離e、或該劈刀8於該晶圓9之各背面位置A之劈裂狀況不一致,致使該晶圓9之部分背面位置A無法沿該溝槽90裂開,因而無法如預期分離部分晶粒9b(即錯誤距離e),故於後續擴膜作業中,該些晶粒9b無法分離至預定位置上,即位於錯誤位置上,如第1B’圖所示,且劈裂製程之設備空間屬於封閉空間,以致於難以即時發現問題,導致需待該些晶粒9b轉貼至預計載盤(圖略)上後,才會發現該些晶粒9b之位置錯誤之問題,造成於進行後續預定製程(於另一機台設備上進行)時,需將所有晶粒9a,9b送回劈裂製程之機台設備上以重新進行對位排設,進而影響整體晶片製作之效率。 However, in the conventional film expansion operation, since the stress distribution of the film 1 is uneven, A misalignment e is formed between the partial dies 9a, 9b, or the cleavage condition of the trowel 8 at each back surface position A of the wafer 9 is inconsistent, so that part of the back surface position A of the wafer 9 cannot follow the groove. The groove 90 is cracked, so that part of the crystal grains 9b (ie, the wrong distance e) cannot be separated as expected, so in the subsequent film expanding operation, the crystal grains 9b cannot be separated to a predetermined position, that is, at the wrong position, such as the first B. As shown in the figure, the equipment space of the splitting process belongs to the enclosed space, so that it is difficult to find the problem in real time, and the crystal grains 9b need to be transferred to the expected carrier (not shown). The problem of the positional error of 9b is caused by the subsequent scheduled process (on another machine), and all the dies 9a, 9b need to be sent back to the machine of the cleavage process to re-align the aligning process. , which in turn affects the efficiency of overall wafer fabrication.

因此,如何克服習知技術之晶片製作效率之問題,實為一重要課題。 Therefore, how to overcome the problem of wafer fabrication efficiency of the prior art is an important issue.

為解決上述習知技術之問題,本創作遂揭露一種分離設備,係包括:基座;承載件,係設於該基座上以承載複數目標物;以及取像裝置,係對應該承載件作配置,以於該承載件變形後,擷取該目標物之位置。 In order to solve the above problems of the prior art, the present invention discloses a separating apparatus, comprising: a base; a carrier disposed on the base to carry a plurality of targets; and an image capturing device corresponding to the bearing member The configuration is such that after the carrier is deformed, the position of the target is captured.

前述之分離設備中,該基座係帶動該承載件位移,使該承載件變形。 In the foregoing separating apparatus, the base system drives the carrier to be displaced to deform the carrier.

前述之分離設備中,該承載件係為膜體。例如,該目標物係為經切割後且未分離之半導體元件,且於該承載件變形後,各該目標物之間係相隔一預定距離。 In the above separating apparatus, the carrier is a film body. For example, the target is a diced and unseparated semiconductor component, and after the carrier is deformed, each of the targets is separated by a predetermined distance.

前述之分離設備中,該取像裝置係包含光電耦合元 件。 In the foregoing separating device, the image capturing device comprises a photoelectric coupling element Pieces.

前述之分離設備中,復包括具有開口之固定件,係固定該承載件,以令該承載件遮蓋該開口。例如,該固定件係帶動該承載件位移,使該承載件變形。 In the foregoing separating apparatus, the fixing member having an opening is fixed to fix the carrier so that the carrier covers the opening. For example, the fixing member drives the carrier to be displaced to deform the carrier.

前述之分離設備中,復包括作用裝置,係設於該承載件之其中一側,以令該目標物位於該基座與作用裝置之間。例如,該作用裝置係為劈裂裝置。 In the foregoing separating apparatus, the acting device is further disposed on one side of the carrier to position the object between the base and the acting device. For example, the action device is a splitting device.

由上可知,本創作之分離設備,主要藉由該取像裝置之設計,以於該承載件變形後,擷取該目標物之位置,故相較於習知技術,本創作之分離設備能於擴膜作業後,即時判斷該些晶粒是否位於預定位置上,以避免於切邊作業或轉貼作業後,才發現該些目標物錯置之問題。 It can be seen from the above that the separation device of the present invention mainly adopts the design of the image capturing device to capture the position of the target after the carrier is deformed, so that the separation device of the present invention can be compared with the prior art. After the film expanding operation, it is immediately determined whether the crystal grains are located at predetermined positions, so as to avoid the problem that the objects are misplaced after the trimming operation or the transfer operation.

1‧‧‧膠膜 1‧‧ ‧ film

1b‧‧‧邊緣 1b‧‧‧ edge

1a‧‧‧保留部分 1a‧‧‧Reserved part

2‧‧‧分離設備 2‧‧‧Separation equipment

20‧‧‧基座 20‧‧‧ Pedestal

21‧‧‧固定件 21‧‧‧Fixed parts

210‧‧‧開口 210‧‧‧ openings

22‧‧‧作用裝置 22‧‧‧Action device

23‧‧‧承載件 23‧‧‧ Carrying parts

23a‧‧‧邊緣 23a‧‧‧ edge

24‧‧‧取像裝置 24‧‧‧Image capture device

240‧‧‧鏡頭 240‧‧‧ lens

8‧‧‧劈刀 8‧‧‧劈

9‧‧‧晶圓 9‧‧‧ wafer

9a,9b‧‧‧晶粒 9a, 9b‧‧‧ grain

90‧‧‧溝槽 90‧‧‧ trench

A‧‧‧背面位置 A‧‧‧back position

D‧‧‧徑長 D‧‧‧ path length

e‧‧‧錯誤距離 E‧‧‧Error distance

f‧‧‧擴張力 f‧‧‧Expansion

S‧‧‧裂痕 S‧‧‧ crack

t‧‧‧預定距離 t‧‧‧Predetermined distance

W‧‧‧寬度 W‧‧‧Width

第1A至1C圖係為習知劈裂製程之側視示意圖;第1B’圖係為第1B圖之不良狀態示意圖;以及第2A至2B圖係為本創作之分離設備的側視示意圖。 1A to 1C are schematic side views of a conventional cleaving process; 1B' is a schematic view of the defective state of Fig. 1B; and Figs. 2A to 2B are schematic side views of the separating device of the present invention.

以下藉由特定的具體實施例說明本創作之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本創作之其他優點及功效。 The embodiments of the present invention are described below by way of specific embodiments, and those skilled in the art can readily appreciate other advantages and functions of the present invention from the disclosure of the present disclosure.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本創作可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例 關係之改變或大小之調整,在不影響本創作所能產生之功效及所能達成之目的下,均應仍落在本創作所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「下」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本創作可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本創作可實施之範疇。 It is to be understood that the structure, the proportions, the size and the like of the drawings are only used in conjunction with the disclosure of the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. The qualifications are not technically meaningful, the modification or proportion of any structure Changes in the relationship or adjustment of the relationship should not fall within the scope of the technical content disclosed in this creation without affecting the effectiveness of the creation and the purpose for which it can be achieved. In the meantime, the terms "upper", "lower" and "one" as used in this specification are for convenience of description only, and are not intended to limit the scope of the invention, the relative relationship may be changed or Adjustments, if there is no material change in the content of the technology, are also considered to be the scope of implementation of this creation.

第2A及2B圖係為本創作之分離設備2之側面示意圖。 Figures 2A and 2B are schematic illustrations of the side of the separation device 2 of the present invention.

如第2A圖所示,該分離設備2係為劈裂製程所用之機台設備,其包括:一機台本體(圖略)、一配置於該機台本體下側之基座20、一具有開口210之固定件21、一固定於該固定件21上以遮蓋該開口210之承載件23、一配置於該機台本體上側之作用裝置22、以及一對應該承載件23作配置之取像裝置24。 As shown in FIG. 2A, the separation device 2 is a machine tool for a cleaving process, and includes: a machine body (not shown), a base 20 disposed on a lower side of the machine body, and a a fixing member 21 of the opening 210, a carrier member 23 fixed to the fixing member 21 to cover the opening 210, an action device 22 disposed on the upper side of the machine body, and a pair of images to be disposed by the carrier member 23 Device 24.

所述之固定件21係設於該機台本體上並於劈裂作業之過程中(如第2A圖所示)位於該基座20與該作用裝置22之間。 The fixing member 21 is disposed on the machine body and is located between the base 20 and the acting device 22 during the splitting operation (as shown in FIG. 2A).

於本實施例中,該固定件21係為導體環(例如,金屬環,如鐵環)或絕緣環。 In the embodiment, the fixing member 21 is a conductor ring (for example, a metal ring such as a hoop) or an insulating ring.

再者,該固定件21之開口210之徑長D(或該承載件23之寬度)係大於該基座20之寬度W,使該基座20位於該開口210之投影位置內。 Moreover, the diameter D of the opening 210 of the fixing member 21 (or the width of the carrier 23) is greater than the width W of the base 20 such that the base 20 is located within the projected position of the opening 210.

所述之承載件23係設於該基座20上以承載一物件,且該基座20與承載件23係組構為供相對位移者。 The carrier member 23 is disposed on the base 20 to carry an object, and the base 20 and the carrier member 23 are configured to be relatively displaced.

於本實施例中,該承載件23係為膜體,如離形膠片(release tape)、紫外線膠帶(UV tape)或熱分離膠帶(thermal tape)等之黏性片體。 In the embodiment, the carrier 23 is a film body, such as a release sheet, a UV tape or a thermal tape.

再者,該物件係為晶圓9,其具有如第1A圖所示之溝槽90。 Furthermore, the article is a wafer 9 having a trench 90 as shown in FIG. 1A.

所述之作用裝置22係於劈裂作業(可參考第1A圖所述之方式)之過程中(如第2A圖所示)位於該承載件23上方,以作用於該物件上,使該物件形成複數目標物(如第2A圖所示之虛線作為裂開線)。 The action device 22 is located above the carrier 23 during the splitting operation (as shown in FIG. 1A) (as shown in FIG. 2A) to act on the object to make the object A plurality of targets are formed (such as a broken line shown in FIG. 2A as a split line).

於本實施例中,該作用裝置22係為物理供力裝置,例如切割件、震動件、風力件、劈裂刀具(如第1A圖所示之劈刀8)或其它裝置等,以產生劈裂效果。 In the present embodiment, the action device 22 is a physical power supply device, such as a cutting member, a vibrating member, a wind power member, a splitting tool (such as the file 8 shown in FIG. 1A) or the like, to generate a flaw. Split effect.

再者,該目標物係為經切割後且未分離之半導體元件,如晶粒9a。 Furthermore, the target is a diced and unseparated semiconductor component such as a die 9a.

所述之取像裝置24係於分離作業之過程中(如第2B圖所示)可配置於能擷取到該目標物之該承載件23之周圍,如該承載件23之上側或下側。 The image capturing device 24 is disposed in the process of the separating operation (as shown in FIG. 2B) and can be disposed around the carrier 23 capable of capturing the target, such as the upper side or the lower side of the carrier 23. .

於本實施例中,該取像裝置24係為電荷耦合裝置(Charge Coupled Device,簡稱CCD)攝影機,如第2B圖所示,其包括鏡頭240與一接收器(圖略),且該接收器係用以接收該鏡頭240所擷取之影像,以於該承載件23變形後,檢測該目標物之位置。例如,該承載件23變形後,如第2B圖所示,各該目標物之間係相隔一預定距離t,以令該取像裝置24擷取各該目標物之相對位置之關係圖。應可 理解地,有關取像裝置24之種類繁多,並不限於上述。 In this embodiment, the image capturing device 24 is a Charge Coupled Device (CCD) camera, as shown in FIG. 2B, which includes a lens 240 and a receiver (not shown), and the receiver The image is taken by the lens 240 to detect the position of the target after the carrier 23 is deformed. For example, after the carrier 23 is deformed, as shown in FIG. 2B, each of the objects is separated by a predetermined distance t so that the image capturing device 24 captures a map of the relative positions of the objects. Should be It is understood that the variety of the image capturing device 24 is various and is not limited to the above.

於進行第2A圖所示之劈裂作業後,進行第2B圖所示之分離作業。於進行分離作業時,因該基座20與承載件23係組構為可相對位移,故該基座20相對該固定件21移動(例如,上升該基座20以帶動該承載件23或下降該固定件21以帶動該承載件23),以令該基座20撐起該承載件23的中間部分,使該承載件23的中間部分向上位移而變形,且其邊緣23a呈斜坡狀,以令該承載件23產生一擴張力,致使各該晶粒9a相互分開而彼此相隔一預定距離t。接著,該取像裝置24擷取各該晶粒9a之間的相對位置之關係圖,以即時判斷各該晶粒9a是否位於正確的位置上。 After performing the splitting operation shown in Fig. 2A, the separation operation shown in Fig. 2B is performed. During the separation operation, since the base 20 and the carrier 23 are configured to be relatively displaceable, the base 20 is moved relative to the fixing member 21 (for example, the base 20 is raised to drive the carrier 23 or descend. The fixing member 21 drives the carrier member 23) to support the base portion 20 to support the intermediate portion of the carrier member 23, so that the intermediate portion of the carrier member 23 is displaced upward and deformed, and the edge 23a thereof is sloped to The carrier 23 is caused to have a expanding force such that the respective dies 9a are separated from each other by a predetermined distance t from each other. Next, the image capturing device 24 captures a relationship diagram of the relative positions between the respective crystal grains 9a to instantly determine whether each of the crystal grains 9a is located at the correct position.

因此,若所有的晶粒9a均位於正確的位置上,則進行後續作業(如第1C圖所示之切邊及轉貼等作業),例如,將該承載件23之邊緣切除,並將該承載件23之保留部分上之該些晶粒9a轉貼至另一載盤(圖略)上。另一方面,若至少一晶粒9a位於錯誤位置上,則可即時重新進行劈裂作業,以避免進行後續製程或將該些錯置之目標物送至下一機台設備上。 Therefore, if all of the crystal grains 9a are located at the correct positions, subsequent operations (such as trimming and rewinding as shown in FIG. 1C) are performed, for example, the edges of the carrier 23 are cut off, and the load is carried. The die 9a on the remaining portion of the member 23 is transferred to another carrier (not shown). On the other hand, if at least one of the dies 9a is located at the wrong position, the cleavage operation can be re-executed immediately to avoid subsequent processes or to deliver the misplaced objects to the next machine.

綜上所述,本創作之分離設備2係藉由該取像裝置24之設計,以於擴膜作業後,即時擷取及判斷該些晶粒9a是否位於預定位置上,故相較於習知技術,本創作之分離設備2能於切邊作業或轉貼作業之前,發現該些目標物錯置之問題,因而能提升整體晶片製作之效率。 In summary, the separating device 2 of the present invention is designed by the image capturing device 24 to immediately capture and judge whether the crystal grains 9a are located at predetermined positions after the film expanding operation. Knowing the technology, the separation device 2 of the present invention can find the misplaced objects before the trimming operation or the transfer operation, thereby improving the efficiency of the overall wafer fabrication.

上述實施例係用以例示性說明本創作之原理及其功效,而非用於限制本創作。任何熟習此項技藝之人士均可在不違背本創作之精神及範疇下,對上述實施例進行修改。因此本創作之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are intended to illustrate the principles of the present invention and its effects, and are not intended to limit the present invention. Anyone who is familiar with the art may modify the above embodiments without departing from the spirit and scope of the creation. Therefore, the scope of protection of this creation should be as listed in the scope of patent application described later.

Claims (8)

一種分離設備,係包括:基座;承載件,係設於該基座上以承載複數目標物;以及取像裝置,係對應該承載件作配置,以於該承載件變形後,擷取該目標物之位置。 A separating device includes: a base; a carrier disposed on the base to carry a plurality of targets; and an image capturing device configured to configure the carrier to capture the carrier after the carrier is deformed The location of the target. 如申請專利範圍第1項所述之分離設備,其中,該基座係帶動該承載件位移,使該承載件變形。 The separation device of claim 1, wherein the base member drives the carrier to be displaced to deform the carrier. 如申請專利範圍第1項所述之分離設備,其中,該承載件係為膜體。 The separation device of claim 1, wherein the carrier is a film body. 如申請專利範圍第1項所述之分離設備,其中,該取像裝置係包含光電耦合元件。 The separating apparatus of claim 1, wherein the image taking device comprises a photoelectric coupling element. 如申請專利範圍第1項所述之分離設備,復包括具有開口之固定件,係固定該承載件,以令該承載件遮蓋該開口。 The separating device according to claim 1, further comprising a fixing member having an opening for fixing the carrier to cover the opening. 如申請專利範圍第5項所述之分離設備,其中,該目標物係半導體元件。 The separation device of claim 5, wherein the target is a semiconductor component. 如申請專利範圍第1項所述之分離設備,復包括作用裝置,係設於該承載件之其中一側,以令該目標物位於該基座與作用裝置之間。 The separating device according to claim 1, further comprising an acting device disposed on one side of the carrier to position the object between the base and the acting device. 如申請專利範圍第7項所述之分離設備,其中,該作用裝置係為劈裂裝置。 The separation device of claim 7, wherein the action device is a splitting device.

Family

ID=

Similar Documents

Publication Publication Date Title
US9779993B2 (en) Wafer processing method including attaching a protective tape to a front side of a functional layer to prevent debris adhesion
US9269624B2 (en) Wafer processing method
US7579260B2 (en) Method of dividing an adhesive film bonded to a wafer
US9093519B2 (en) Wafer processing method
US10889097B2 (en) Wafer debonding system and method
US9379016B2 (en) Wafer processing method
US20070105348A1 (en) Wafer processing method
US20100015784A1 (en) Semiconductor device manufacturing method
US9768127B2 (en) Wafer processing method
US7341926B2 (en) Wafer dividing method
US20150357242A1 (en) Wafer processing method
JP6270671B2 (en) Semiconductor manufacturing apparatus and semiconductor device manufacturing method
US9698301B2 (en) Wafer processing method
KR20140051772A (en) Wafer machining method
US7960250B2 (en) Method for manufacturing device
US20160163597A1 (en) Wafer processing method
TWM571579U (en) Separation equipment
JP6689023B2 (en) Break device
JP2015092525A (en) Wafer processing method
US8389386B2 (en) Stacked wafer manufacturing method
JP6633446B2 (en) Wafer processing method
KR102351929B1 (en) Breaking apparatus
TWI767009B (en) Wafer processing method
US11158541B2 (en) Method of processing wafer
JP2012124300A (en) Wafer breaking method and wafer breaking device