TWM570917U - Gas distribution device and processing chamber for providing uniform gas flow - Google Patents

Abstract

A gas distribution apparatus having a delivery passage is provided, wherein the delivery passage has an inlet end, an outlet end and a plurality of slits spaced along the length. The inlet end can be connected to an inert gas source and the outlet end can be connected to a vacuum source. At the same time, there is provided a gas distribution device having a spiral conveying passage, a spiral winding conveying passage, a conveying passage for converging, a conveying passage for converging, and a conveying passage formed, wherein the inlet end and the outlet end are arranged to allow gas to flow in the conveying passage Fast exchange within.

Description

Gas distribution device and processing chamber for providing uniform gas flow

Embodiments of the present invention are generally associated with apparatus and methods for flowing a gas into a processing chamber. More specifically, embodiments of the present disclosure relate to a linear flow device for directing an airflow into a processing chamber, such as an atomic layer deposition chamber or a chemical vapor deposition chamber.

In the field of semiconductor processing, flat panel display processing or other electronic component processing, vapor deposition processing has played an important role in depositing materials on substrates. As the geometry of the electronic components continues to decrease and the component density continues to increase, the size and aspect ratio of the features become more aggressive, such as a 0.07 μm feature and an aspect ratio of 10 or higher. Therefore, the conformal deposition of materials to form these components becomes even more important.

During the atomic layer deposition (ALD) process, reactant gases are injected into the processing chamber containing the substrate. Generally, a region of the substrate is in contact with the first reactant absorbed on the surface of the substrate. The substrate system is then contacted with a second reactant that is in contact with the first reactant A deposition material is formed. A degassing gas is injected between the delivery of each reactant gas to ensure that the reaction occurs only on the surface of the substrate.

Gas distribution devices (sometimes shaped like and referred to as showerheads) distribute process gases to substrates (also referred to as wafers) in close proximity. Gas distribution equipment (including sprinklers) have a large volume that can be very difficult to clean or degas between gases. Any gas remaining in the sprinkler will react with subsequent processing gases. For ALD processing, gas separation is important in gas distribution equipment (including sprinklers) that rely on alternating gas pulses (eg, A-pulse, B-pulse, A-pulse, and B-pulse) type delivery. Accordingly, there is a need in the art for improved gas distribution equipment (including sprinklers) that are easy to clean/degasser and provide a uniform source of gas to the substrate.

One or more specific embodiments of the present work are related to a gas distribution apparatus for controlling the flow of gas into the processing chamber. The apparatus includes a delivery channel having an inlet end, an outlet end and a length, the delivery channel having a plurality of slits spaced along the length. An inlet at the inlet end of the delivery passage can be coupled to a source of gas, wherein the flow can be controlled by a gas valve in communication with the inlet. An outlet at the outlet end of the delivery passage can be coupled to a vacuum source, wherein vacuum pressure through the outlet can be controlled by an outlet valve to provide reduced pressure at the outlet. The controller is configured to adjust through the delivery passage and to the treatment by opening and closing the outlet valve during gas delivery and degassing in the passage The gas flow in the chamber controls the gas flow through the slits along the length of the passage.

In some embodiments, the gas flow through the gas distribution device has a more uniform air conductance over the axial length of the gas distribution device than the gas flow through a similar gas distribution device that is not connected to the vacuum source of the outlet. In one or more embodiments, when the gas valve is closed, the gas is purged from the delivery channel faster than a gas distribution device that is not a vacuum source.

In some embodiments, the delivery channel is a recessed channel in the back side of the gas distribution plate, and the plurality of slits extend through the gas distribution plate to the front side of the gas distribution plate.

In one or more embodiments, the gas distribution plate is round and the conveying passage is formed in a spiral shape, wherein one of the inlet end and the outlet end is located in a peripheral region of the gas distribution plate, and the inlet The other of the end and outlet ends is located in the central region of the gas distribution plate. In some embodiments, the inlet end is located in the peripheral region of the gas distribution plate and the outlet end is located in the central region of the gas distribution plate. In one or more embodiments, the outlet end is located in the peripheral region of the gas distribution plate and the inlet end is located in the central region of the gas distribution plate.

In some embodiments, there are two recessed delivery channels in the back side of the gas distribution plate. In some embodiments, each of the conveying passages is formed in a spiral shape, wherein one of the inlet end and the outlet end is located in a peripheral region of the gas distribution plate, and the inlet end and the outlet end are The other is located in the central region of the gas distribution plate. In one or more embodiments, the two delivery channels are intertwined along the spiral. In some embodiments, each delivery channel has an inlet end located in a peripheral region of the gas distribution plate and an outlet end located in a central region of the gas distribution plate. In some embodiments, each delivery channel has an outlet end located in a peripheral region of the gas distribution plate and an inlet end located in a central region of the gas distribution plate. In one or more embodiments, the inlet end of one of the delivery channels is located in the peripheral region of the gas distribution plate and the outlet end of the other delivery channel is located in the peripheral region of the gas distribution plate.

In some embodiments, the gas distribution device further includes a back cover on the back side of the gas distribution plate, the back cover covering the recessed channel. In one or more embodiments, the delivery channel is a tubular helix having a substantially flat configuration. In some embodiments, the gas distribution apparatus includes a plurality of delivery channels, each delivery channel extending substantially linearly and substantially parallel to an adjacent delivery channel.

In one or more embodiments, more than one delivery channel is coupled to the inlet such that gas flowing through the inlet flows through each of the delivery channels. In some embodiments, each of the delivery channels connected to the inlet are joined and connected to an outlet. In some embodiments, each of the delivery channels connected to the inlet has a respective outlet connected to a respective outlet valve. In one or more embodiments, the controller independently adjusts each of the outlet valves to maintain substantial transit through each of the delivery channels Uniform airflow. In a particular embodiment, the plurality of delivery channels are shaped to form one or more characters or trademarks.

In some embodiments, the plurality of delivery channels are shaped such that the pattern of holes seen by the substrate is uniform between the gas distribution devices.

Other embodiments of the present work are related to a processing chamber containing the gas distribution apparatus. In some embodiments, the gas distribution apparatus comprises a tubular spiral having a substantially flat configuration, the gas distribution device being located between the substrate support and the gas distribution plate.

Other embodiments of the present invention relate to a gas distribution apparatus comprising a gas distribution plate, a back cover, an inlet, an outlet, and a controller. The gas delivery channel is recessed in the back side of the gas distribution plate. The recessed gas delivery passage has an inlet end, an outlet end, a length, and a plurality of slits that are separated along a length extending through the gas distribution plate to a front side of the gas distribution plate such that flow through the gas The gas of the passage can exit the gas distribution plate through the slits. The back cover is located on the back side of the gas distribution plate to cover the recessed passage. The inlet can be connected to a source of gas, wherein the gas stream can be controlled by a gas valve in communication with the inlet. An outlet is connected to the outlet end of the gas delivery passage by the back cover. The outlet can be connected to a vacuum source, wherein the vacuum pressure through the outlet can be controlled by an outlet valve to provide a reduced pressure at the outlet. The controller adjusts through the delivery passage and to the treatment by opening and closing the outlet valve during gas delivery and degassing The gas flow in the chamber controls the gas flow through the slits along the length of the passage.

In some embodiments, the gas distribution plate is circular and the conveying passage is formed in a spiral shape, wherein one of the inlet end and the outlet end is located in a peripheral region of the gas distribution plate, and the inlet end is The other of the outlet ends is located in a central region of the gas distribution plate. In one or more embodiments, there are two recessed delivery channels in the back side of the gas distribution plate, the two delivery channels being intertwined along the spiral.

Other embodiments of the present work are directed to a gas distribution apparatus comprising a plurality of elongated transport channels. Each delivery channel extends from the inlet end along a length to the outlet end and has a plurality of slits spaced along the length. The inlet end is connectable to a source of gas, wherein the gas stream is controllable by a gas valve in communication with the inlet end. The outlet end can be coupled to a vacuum source, wherein vacuum pressure through the outlet end can be controlled by an outlet valve to provide reduced pressure at the outlet end. A plurality of elongated vacuum channels, each of which extends along a length. The controller adjusts the flow of gas through the gas delivery passage and into the processing chamber by opening and closing the outlet valve during gas delivery and degassing to control the gap through the length along the passage airflow. The plurality of slits of each conveying passage are separated from the plurality of slits of the adjacent conveying passages by at least one elongated vacuum passage.

100‧‧‧ gas distribution equipment

102‧‧‧Transportation channel

104‧‧‧ entrance end

106‧‧‧export end

108‧‧‧ gap

110‧‧‧ entrance

112‧‧‧Export

114‧‧‧Inlet valve

116‧‧‧Export valve

150‧‧‧ Controller

302‧‧‧Substrate support bearing

304‧‧‧Substrate

306‧‧‧Gas distribution plate

400‧‧‧Gas distribution equipment

401‧‧‧ Back side

402‧‧‧Transportation channel

403‧‧‧Gas distribution plate

404‧‧‧ entrance end

405‧‧‧ front side

406‧‧‧export end

407‧‧‧Back cover

408‧‧‧ gap

410‧‧‧ entrance

412‧‧‧Export

414‧‧‧ inlet valve

416‧‧‧Export valve

420‧‧‧peripheral area

422‧‧‧Central area

424‧‧‧Flange

830‧‧‧ below

832‧‧‧ upper part

834‧‧‧First section

836‧‧‧Second section

838‧‧‧ third section

840‧‧‧ holes

900‧‧‧Gas distribution equipment

901‧‧‧ Back side

902a‧‧‧First delivery channel

902b‧‧‧Second transport channel

903‧‧‧ gas distribution plate

904a‧‧‧ first entrance

904b‧‧‧second entrance

905‧‧‧ front side

906a‧‧‧first exit end

906b‧‧‧second exit

907‧‧‧Back cover

908a‧‧‧ first gap

908b‧‧‧ second gap

910a‧‧‧first entrance

910b‧‧‧second entrance

912a‧‧ first exit

912b‧‧‧second exit

914a, 914b‧‧‧ inlet valve

916a, 916b‧‧‧Export valves

920‧‧‧peripheral area

922‧‧‧Central area

924a, 924b‧‧‧Flange

925‧‧ ‧ block connection

1500‧‧‧ gas distribution equipment

1502‧‧‧Transportation channel

1504‧‧‧ entrance end

1506‧‧‧export end

1508‧‧‧ gap

1544‧‧‧Substrate

1550‧‧‧vacuum channel

1552‧‧‧ Output channel

1554‧‧‧Entry access

1554a‧‧‧First entrance passage

1554b‧‧‧Second entry passage

1558‧‧‧vacuum gap

1558a, 1558b‧‧‧vacuum gap

1700‧‧‧Gas distribution equipment

1702‧‧‧Transportation channel

1704‧‧‧ entrance end

1706‧‧‧export end

1710‧‧‧ entrance

1712‧‧ Export

1714‧‧‧ inlet valve

1716‧‧‧Export valve

1740‧‧‧ intermediate exit

1742‧‧‧ intermediate exit

1744‧‧‧Intermediate outlet valve

1750‧‧ ‧ controller

1800‧‧‧ gas distribution equipment

1802‧‧‧Transportation channel

1802a, 1802b‧‧‧ separate transport channels

1804‧‧‧ entrance end

1806‧‧‧export end

1808‧‧‧ gap

1810‧‧‧ entrance

1812‧‧ Export

1814‧‧‧ inlet valve

1816‧‧‧Export valve

1900‧‧‧ gas distribution equipment

1902‧‧‧Transportation channel

1902a, 1902b‧‧‧ separate transport channels

1904‧‧‧ entrance end

1908‧‧‧ gap

1910‧‧‧ Entrance

1912a, 1912b‧‧‧ separate exports

1914‧‧‧ inlet valve

1916a, 1916b‧‧‧Export valve

1950‧‧‧ Controller

2000‧‧‧Gas distribution equipment

2002a~2002e‧‧‧Transportation channel

2002e‧‧‧ fifth transport channel

2014a~2014e‧‧‧ inlet valve

2016a~2016e‧‧‧Export valve

2044‧‧‧Intermediate outlet valve

2060‧‧‧Void area

2102a‧‧‧First gas delivery channel

2102b‧‧‧Second gas delivery channel

2102c‧‧‧ Third gas delivery channel

2114a~2114c‧‧‧ inlet valve

2116a~2116d‧‧‧Export valve

2201‧‧‧ Back side

2203‧‧‧Gas distribution equipment

2205‧‧‧ front side

2208‧‧‧ holes

2202a, 2202b‧‧‧ gas passage

2208a, 2208b‧‧‧ holes

2214a, 2214b‧‧‧ inlet valve

2216a, 2216b‧‧‧Export valve

For a more detailed understanding of the manner in which the above features of the cost-of-availability can be found, a more specific description of the present invention (as briefly described above) can be made with reference to specific embodiments of the present invention, which are illustrated in the accompanying drawings.

It is to be understood that the invention is not to be construed as a limitation

Figure 1 illustrates a view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 2 illustrates a view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 3 illustrates a view of a processing chamber containing one or more gas distribution devices in accordance with one or more embodiments of the present teachings.

Figure 4 illustrates a top view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 5 illustrates a cross section of a perspective view of a gas distribution apparatus in accordance with one or more embodiments of the present disclosure.

Figure 6 illustrates a perspective view of a gas distribution apparatus in accordance with one or more embodiments of the present invention.

Figure 7 illustrates a bottom view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 8 illustrates a partial cross-sectional view of a gas distribution apparatus in accordance with one or more embodiments.

Figure 9 illustrates a top view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 10 illustrates a partial cross-sectional view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 11 illustrates an exploded partial cross-sectional view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 12 illustrates a cross-sectional view of a perspective view of a gas distribution apparatus in accordance with one or more embodiments of the present disclosure.

Figure 13 illustrates a perspective view of a gas distribution apparatus in accordance with one or more embodiments of the present invention.

Figure 14 illustrates a bottom view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 15 illustrates a perspective view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 16A illustrates a partial cross-sectional view of a gas distribution apparatus in accordance with one or more embodiments of the present teachings.

Figure 16B illustrates a partial cross-sectional view of a gas distribution apparatus in accordance with one or more embodiments of the present work.

Figure 17 illustrates a gas distribution apparatus in accordance with one or more embodiments of the present invention.

Figure 18 illustrates a gas distribution apparatus in accordance with one or more embodiments of the present invention.

Figure 19 illustrates a gas distribution apparatus in accordance with one or more embodiments of the present invention.

Figure 20 illustrates a gas distribution apparatus in accordance with one or more embodiments of the present invention.

Figure 21 illustrates a gas distribution apparatus in accordance with one or more embodiments of the present invention.

Figure 22A illustrates a back side portion of a gas distribution device in accordance with one or more embodiments of the present disclosure.

Figure 22B illustrates the front side of the gas distribution apparatus of Figure 22A.

A specific embodiment of the present invention relates to a gas distribution apparatus for chemical vapor deposition type treatment. One or more specific embodiments of the present invention are directed to atomic layer deposition processes and apparatus (also referred to as cyclic deposition) that include the gas distribution apparatus. The gas distribution device is also referred to as a showerhead or gas distribution plate, but those skilled in the art will also recognize that the device does not need to be formed into a showerhead or sheet. The terms "sprinkler" and "plate" should not be used to limit the scope of this creation.

A first embodiment of the present invention is directed to an apparatus having a single spiral gas delivery passage. All gases flow through the same channel in sequence. The inlet is on the outer radial edge of the spiral (also referred to as the outer circumference) and can be mounted to the gas source. The vacuum attachment is attached to the inner end of the screw. In contrast to the inlet and outlet, the gas source can also be connected to the inside of the helix using an outlet valve at the outer end of the helix. This first embodiment uses the sequence as shown in Table 1.

The second embodiment has two spiral passages intertwined with each other, each passage having a gas inlet at the outer radial end of the spiral and an outlet valve at the inner radial end of each spiral. The inlet and outlet can be opposite or mixed. Different channels can be used for different precursors.

In a third specific embodiment, the channels are linear gas lines. Linear gas lines can utilize any suitable shape and not just linearity. Linear gas lines are available for different precursors. Some embodiments have multiple parallel paths of all gases in sequence, wherein the gas guides of the gas passages are substantially identical.

In one or more embodiments, in each of the channels, the gas passage through the passage and the air conduction through the gap are controlled by adjusting or changing the vacuum pressure at the outlet end. Changing the vacuum pressure in turn produces unique fluid dynamics that are not possible with conventional gas distribution equipment. In some embodiments, there will be a more uniform airflow over the length of each channel and a more uniform airflow through the gaps that are separated over the length of the channel. A uniform gas flow in accordance with one or more embodiments represents the absence of a dead space that substantially inhibits gas flow through or out of the gas. A vacuum supply system with or without a valve on one end of the passage and a valve at the other end of the passage allows for switching between different types of gases, such as precursors or reactant gases.

In some embodiments, the vacuum at the end of the gas delivery channel allows for rapid degassing within the channel. A source of degassing gas can be connected to the inlet of the gas delivery channel and operate in conjunction with the vacuum at the outlet of the channel to more quickly remove the reactive gases in the channel. In addition, the vacuum crucible can be separated along the length of the gas delivery channel, not just at the end of the channel.

A specific embodiment of the present invention is to increase the air conduction of the gas through the holes separated in the gas delivery passage. Without being bound by any particular theory of operation, it is believed that controlling the vacuum pressure at or at the outlet end of the channel changes the fluid dynamics relative to conventional sprinklers or gas distribution plates.

See Figures 1 and 2. One or more specific embodiments are associated with a gas distribution apparatus 100 for delivering a gas to a processing chamber (not shown). Gas distribution apparatus 100 includes a delivery channel 102 having an inlet end 104 and an outlet end 106. The delivery channel 102 has a plurality of slits 108 that are spaced along the length of the delivery channel 102. The inlet 110 is connected to and in fluid communication with the inlet end 104 of the delivery passage 102. The outlet 112 is coupled to the outlet end 106 of the delivery passage 102 and is in fluid communication with the outlet end 106. The inlet 110 is for connection to a source of gas and includes an inlet valve 114 that controls the flow of air into or out of the delivery passage 102 or completely shuts off the flow. The outlet 112 is for connection to a vacuum source and includes an outlet valve 116 that controls the flow of gas into or out of the delivery channel 102 or completely shuts off the gas flow. The outlet 112 can be connected to a vacuum source (not shown) such that the vacuum pressure through the outlet 112 can be controlled by the outlet valve 116 to provide a reduced pressure at the outlet 112.

Controller 150 regulates airflow through delivery passage 102 and into the processing chamber. The controller 150 performs this adjustment by opening and closing (either at any point between fully open and fully closed) during gas delivery and degassing. This controls the flow through the gaps separated by the length of the channel (see, for example, Figure 4).

The cross-sectional shape of the delivery channel 102 can be controlled such that the gas flowing through the delivery channel can face minimal flow resistance. In some embodiments, the delivery channel 102 has a circular or elliptical cross-sectional shape. In one or more embodiments, the delivery channel 102 has a cross-sectional shape sufficient to provide bending, turning, twisting, etc., substantially free of dead zones.

The overall shape of the delivery channel 102 (relative to the cross-sectional shape) can be adjusted as needed. For example, the delivery channel 102 can be shaped to match within a particular area or conform to the shape of the substrate. Delivery channel 102 can be, for example, a straight line, a circle, a square, an oval, a rectangle, or an ellipse. Furthermore, the overall shape of the delivery channel may be constituted by repeating units that are parallel, perpendicular or concentric with each other. In one or more embodiments, the delivery channel has an overall shape in which there is substantially no dead zone that inhibits gas flow or degassing. Used in this When the manual and the scope of the patent application are attached, the term "substantially no dead zone" The degree of inhibition of the representative airflow or degassing is less than about 10%, or less than about 5%, due to the dead zone.

In some embodiments, the delivery channel 102 is a tubular spiral having a substantially flat configuration. This particular shape is exemplified by the specific embodiments shown in Figures 1 and 2. When used in the specification and the scope of the patent application, the term "substantially flat" refers to the delivery channel 102. The plurality of slits 108 are located in nearly the same plane. Since the slits are coplanar, the specific embodiments shown in Figs. 1 and 2 have a substantially flat configuration, even if the inlet end and the outlet end, and the conveying passage portion near the inlet end and the outlet end do not have a plurality of slits. Coplanar.

The delivery channel 102 can be used for plasma processing. For example, the delivery channel 102 can be polarized relative to another portion of the processing chamber to ignite the plasma within the chamber. The delivery channel 102 can be offset relative to a portion of the chamber, or a portion of the chamber can be offset relative to the delivery channel 102. For example, the delivery channel 102 can be polarized relative to the support or the support can be polarized relative to the delivery channel. The frequency of the plasma can also be adjusted. In one or more embodiments, the plasma is at a frequency of about 13.56 MHz. In some embodiments, the frequency of the plasma is about 40 MHz, 50 MHz, 60 MHz, 70 MHz, 80 MHz, 90 MHz, 100 MHz, 110 MHz, or 120 MHz.

Any suitable material can be used for the conveying channel, sprinkler or gas distribution equipment. Suitable materials include, but are not limited to, stainless steel and inert materials. In some embodiments, the delivery channel, showerhead or gas distribution plate is made of stainless steel.

Figure 3 illustrates a cross section of a portion of a processing chamber in accordance with one or more embodiments. The gas distribution device 100 is placed between the substrate support support 302 and the gas distribution plate 306. The substrate support support 302 is illustrated as a support substrate 304. The substrate support support 302 can be stationary or rotating, or the portion is treated as stationary and the portion is processed to rotate. The substrate support pedestal 302 can make the substrate processing more uniform by minimizing the different airflow patterns that occur between the processing chambers. Base of some specific embodiments The plate support support 302 includes a heater or heating mechanism. The heater can be any suitable type of heater, including a resistive heater.

The gas distribution device 100 is illustrated as a tubular spiral having a substantially flat configuration. The substrate 304 can be processed with either or both of the gas distribution plate 306 or the gas distribution device 100. The gas distribution apparatus 100 can be shaped such that it does not substantially interfere with the gas exiting the gas distribution plate 306. As used in this specification and the scope of the appended claims, the term "substantially interferes" means that the gas distribution apparatus 100 does not interfere with more than 30% of the gas flowing out of the gas distribution plate 306. For example, the front surface 308 of the gas distribution plate 306 has a plurality of slits 310 for gas to flow therethrough. The gas distribution device 100 can be shaped to avoid blocking the gap 310.

A delivery channel configured in a manner similar to that shown in Figure 3 can also be used for plasma processing. The gas distribution device 100 can be polarized relative to a portion of the chamber, or a portion of the chamber can be polarized relative to the gas distribution device 100. For example, the gas distribution device 100 can be polarized relative to the substrate support abutment 302, or the substrate support abutment 302 can be polarized relative to the gas distribution device 100. In some embodiments, the gas distribution device 100 is polarized relative to the gas distribution plate 306. In one or more embodiments, the gas distribution plate 306 is polarized relative to the substrate support support 302 and the gas flowing from the gas distribution device 100 forms a plasma. The frequency of the plasma can also be adjusted. In one or more embodiments, the frequency of the plasma is about 13.56 MHz. In some embodiments, the frequency of the plasma is about 40 MHz, 50 MHz, 60 MHz, 70 MHz, 80 MHz, 90 MHz, 100 MHz, 110 MHz, or 120 MHz.

4 through 7 illustrate another embodiment of a gas distribution apparatus 400 in which the delivery channel 402 is a recessed channel in the back side 401 of the gas distribution plate 403. The particular embodiment shown has a large inner section that is recessed in the back side 401 of the gas distribution plate 403, wherein the delivery channel 402 is even further recessed. This may allow for the addition of a back cover 407 that can be placed in a recessed area in the back side 401 to cover the delivery channel 402. When the back cover 407 is inserted into the recessed back side 401 of some embodiments, the back cover 407 creates a substantially flush back side surface of the gas distribution sheet. Those skilled in the art will appreciate that the back cover 407 does not need to fit within the recessed area of the back side 401 of the gas distribution plate 403, but may also rest directly on the back side 401 of the gas distribution plate 403. In a particular embodiment of this type, there is no large recessed area with a further recessed delivery channel. Instead, the delivery channel is recessed directly into the back side 401 of the gas distribution plate 403.

The back cover 407 can have openings for passage of the inlet and outlet tubes to be in fluid communication with the delivery passage 402. This can be seen in Figures 5 and 6. The inlet and outlet tubes can be integral components of the back cover 407 or can be separate components that are connected to the back cover 407 to avoid or minimize fluid leakage. A plurality of slits 408 extend through the gas distribution plate 403 to the front side 405 of the gas distribution plate 403. These gaps can be seen in Figures 4, 5 and 7. The plurality of slits 408 may be evenly spaced along the length of the delivery channel or may vary along the length of the channel. A variable spacing system can help produce points from the conveying channel at various points on the conveying channel More uniform airflow. For example, in a gas delivery channel having a fine shape, the spacing of the slits may vary along the length.

In the particular embodiment illustrated in Figures 4 through 7, the gas distribution plate 403 is circular and the delivery passage 402 is formed in a spiral shape. The inlet end 404 is shown at the spiral outer side of the outer peripheral region 420 of the gas distribution plate 403, and the outlet end 406 is at the spiral center in the central region 422 of the gas distribution plate 403. Those skilled in the art will appreciate that the inlet end 404 and the outlet end 406 can also be reversed, i.e., the inlet end 404 is located at the center of the helix and the outlet end 406 is located outside of the helix. In some embodiments, one of the inlet end 404 and the outlet end 406 is located in the peripheral region 420 of the gas distribution plate 403, and the other of the inlet end 404 and the outlet end 406 is located in the central region 422 of the gas distribution plate 403. in. In one or more embodiments, the inlet end 404 is located at a peripheral region 420 of the gas distribution plate 403 and the outlet end 406 is located at a central region 422 of the gas distribution plate 403. In some embodiments, the outlet end 406 is located at a peripheral region 420 of the gas distribution plate 403 and the inlet end 404 is located at a central region 422 of the gas distribution plate 403.

In Figures 5 and 6, the inlet end 404 and the outlet end 406 are illustrated as small tubular members extending from the back cover 407 of the gas distribution plate 403. The tubular member extends between the inlet 410 and the back cover 407 through the inlet valve 414. Another tube may extend between the outlet 412 and the back cover 407 through the outlet valve 416. The tubular member can be attached to the back cover 407 by any suitable connection known to those skilled in the art and can be sealed to avoid fluid leakage through the tubular member into the delivery channel 402. Suitable sealing device Including, but not limited to, an O-ring located between the flange 424 and the back cover 407. The flange 424 can be integrally formed with the tubular member or can be a separate component for securing the tubular member to the back cover. The flange 424 can be coupled to the back cover 407 by any suitable mechanical connection, including, but not limited to, a screw.

8 is a cross-sectional view of a portion of the delivery channel 402 and a slit 408 in the gas distribution plate 403 in accordance with one or more embodiments of the present disclosure. Those skilled in the art will appreciate that the transport channels and slits depicted in Figure 8 are for illustrative purposes only and are not to be considered as limiting the scope of the present invention. Those skilled in the art will appreciate that there are many ways to create a flow from the delivery channel 402 through the gas distribution plate 403. The delivery channel 402 shown in Figure 8 has two sections: an upper portion 832 and a lower portion 830. These portions are depicted in separate regions, but it should be understood that there may be a seamless transition between the upper portion 832 and the lower portion 830.

Moreover, it will be understood that the upper portion 832 is not necessary and need not be included in the delivery channel 402. When there is no upper portion 832, the lower portion 830 is the only portion. Thus, the delivery channel can have any suitable shape. In some embodiments, the delivery channel is shaped such that it does not substantially interfere with gas flow through the channel.

The upper portion 832 can have any suitable shape. In the particular embodiment illustrated in Figure 8, the upper portion 832 has a wall portion that extends orthogonal to the surface of the back side 401 of the gas distribution plate 403. However, it will be understood that the upper portion 832 can have a wall that slopes from a right angle to the back side 401. This tilt can provide a larger opening at the back side 401 of the gas distribution plate 403 and taper to a smaller opening. In addition, this tilt can be at the back side 401 Provide a smaller opening and gradually increase to a larger opening. The length of the upper portion 832 can be adjusted as needed.

In some embodiments, the upper portion has a side that is substantially perpendicular to the back side 401 of the gas distribution plate 403 and extends a length L below the surface of the back side 401 (the length L ranges from about 0.01 吋 to about 0.3) Inches). When used in the specification and the scope of the claims, the term "substantially perpendicular to" means that the wall portion of the upper portion has an angle of from about 85 degrees to about 95 degrees with respect to the back side of the gas distribution sheet. In some embodiments, the upper portion extends below the backside surface by a range of from about 0.02 吋 to about 0.2 、, or from about 0.05 吋 to about 0.15 、, or from about 0.08 吋 to about 0.12. A length L of the range of 吋. In one or more embodiments, the upper portion extends a length of about 0.1 下方 below the back side surface.

The rounded lower portion 830 can have any suitable cross-section including, but not limited to, a semi-circular shape and a semi-elliptical shape. The width of the rounded lower portion (also referred to as the diameter of the lower portion of the rounded) can be adjusted as needed. The width of the upper part can be adjusted as needed. In general, the diameter of the delivery channel has the effect of the number of helical turns. In some embodiments, as shown in Figure 8, the width of the upper portion is substantially equal to the diameter of the lower portion. The delivery channels of various embodiments have a diameter in the range of from about 0.3 吋 to about 0.45 ,, or in the range of from about 0.325 吋 to about 0.425 ,, or in the range of from about 0.35 吋 to about 0.40 吋. Inside. In one or more embodiments, the delivery channel has a diameter of about 0.375 inches.

The particular shape of the slit 408 can vary depending on the desired air flow through the slit. In the particular embodiment of FIG. 8, slot 408 has three separate sections: a first section 834, a second section 836, and a third section 838. Similarly, the number of segments and the shape of the segments are merely illustrative of a particular embodiment, and the number of segments and the shape of the segments should not be considered as limiting the scope of the present invention. The first section 834 extends from the rounded lower portion 830 of the delivery passage 402 toward the front side 405 of the gas distribution plate 403. The first section 834 has a first diameter D1. The second section 836 extends from the first section 834 toward the front side 405 and has a diameter that tapers from a first diameter D1 to a second diameter D2 that is generally smaller than the first diameter. The third section 838 extends from the end of the second section 836 and terminates at the front side 405 of the gas distribution plate 403. A hole 840 is formed at the intersection of the third section 838 and the front side 405. The gas system flowing through the delivery channel 402 exits the gas distribution plate 403 through the aperture 840 and enters the processing chamber. The hole 840 has a diameter substantially the same as the second diameter D2. In various embodiments, the diameter of the aperture 840 is in the range of from about 0.01 吋 to about 0.25 ,, or in the range of from 0.02 吋 to about 0.2 ,, or from about 0.03 吋 to about 0.15. Within the range of 吋, or in the range of about 0.04 吋 to about 0.1 。. In some embodiments, the aperture 840 has a diameter of less than about 0.1 ,, or less than about 0.08 吋, or less than about 0.06 吋, or less than about 0.04 吋, or less than about 0.02 吋, or less than about 0.01 吋.

Since the conveying passage is formed from the outer peripheral edge of the gas distribution plate to the central region (or vice versa), a plurality of adjacent passages on the surface can be observed in the cross section, even though the adjacent passage may be a single passage. Road. Figure 5 depicts a plurality of channels on these surfaces. The channels (or the separation between the spiral loops) are separated by a distance. In some embodiments, the distance between the channels (or loops of a single channel) (from the center) is in the range of from about 0.375 吋 to about 0.475 ,, or between about 0.40 吋 to It is in the range of about 0.45 Torr, or in the range of about 0.41 Torr to about 0.43 Torr. In one or more embodiments, the average distance between the centers of adjacent channels is about 0.42 inches.

The length of the gas passages shown in Figures 4 through 7 can vary depending on several factors including, but not limited to, the diameter of the passage and the distance between adjacent passages. In various embodiments, the delivery channel has a length ranging from 140 吋 to about 340 ,, or ranging from 180 吋 to about 300 ,, or between 200 吋 to about 280 吋. Within the range, or in the range of 220 吋 to about 260 。. In one or more embodiments, the delivery channel has a length of approximately 240 angstroms.

The number of slits is also dependent on a number of factors including, but not limited to, the length of the transport channel and the spacing of the slits. In some embodiments having a single spiral channel, there are gaps in the range of from about 300 to about 900, or gaps in the range of from about 400 to about 800, or A gap in the range of about 500 to about 700. In various embodiments, there are more than about 300, 400, 500, 600, 700 or 800 slits along the length of the channel. In one or more embodiments, there are approximately 600 slits along the length of the delivery channel.

In one embodiment, as shown in FIG. 4, the gas delivery plate 403 includes a single delivery channel 402 in the back side of the gas delivery plate 403. The delivery channel 402 has an inlet end 404 located in the peripheral region 420 of the gas distribution plate 403. The delivery channel 402 follows an inward spiral path from the inlet end 404 to the outlet end 406 located in the central region 422 of the gas distribution plate 403. The delivery channel 402 has an overall length defined as the distance between the inlet end 404 and the outlet end 406 (approximately 240 吋). A plurality of slits 408 are separated over the entire length of the delivery channel 402. There are gaps in the range of from about 500 to about 700 along the entire length of the delivery channel 403. The delivery channel 403 has an average diameter of about 0.375 吋 and a central portion of the adjacent portion of the spiral channel is separated by about 0.42 吋.

Some embodiments of the present work include more than one delivery channel 402. These multi-channel visual processing systems are intertwined or separated from each other. Some of the channels may be recessed into a gas distribution sheet (as shown in Figure 4) or may be individual tubes (as shown in Figure 1). In some embodiments, a combination of separate tubular members and recessed channels is provided. An exemplary embodiment of this type is illustrated in Figure 3, wherein the gas distribution plate has at least one recessed delivery channel therein and the additional delivery channel is located between the gas distribution plate and the substrate surface.

Figures 9 through 14 illustrate another embodiment of the present work. A gas distribution device 900 includes two delivery channels 902a, 902b recessed in the back side 901 of the gas distribution plate 903. It will be appreciated that the delivery channel may not need to be recessed into the back of the gas distribution sheet, but may be The individual fittings shown in Figures 1 and 15 are shown. The first delivery passage 902a has a first inlet end 904a and a first outlet end 906a, and a plurality of first slits 908a spaced along the length of the first delivery passage 902a. The second delivery passage 902b has a second inlet end 904b and a second outlet end 906b, and a plurality of second slits 908b spaced along the length of the second delivery passage 902b.

The first inlet 910a is connected to the first inlet end 904a of the first delivery channel 902a. The first inlet 910a is for connection to a gas source. The first outlet 912a is coupled to the first outlet end 906a of the first delivery channel 902a. The first outlet 912a is for connection to a vacuum source. The second inlet 910b is connected to the second inlet end 904b of the second delivery channel 902b. The second inlet 910b is for connection to a gas source. The second outlet 912b is connected to the second outlet end 906b of the second delivery passage 902b. The second outlet 912b is for connection to a vacuum source.

In the specific embodiment shown in Figures 9 through 14, each of the delivery channels 902a, 902b is formed in a spiral shape. One or more embodiments shown in the figures have two delivery channels 902a, 902b that are intertwined along a helical length. Those skilled in the art will appreciate that the two delivery channels 902a, 902b can have shapes other than spirals and do not need to be intertwined with each other. In some embodiments, the plurality of first slits 908a and 908b extend through the gas distribution plate 903 to the front side 905 of the gas distribution plate 903.

In some embodiments, each of the delivery channels 902a, 902b is formed in a spiral shape, and the inlet ends of the respective delivery channels 902a, 902b One of the 904a, 904b and outlet ends 906a, 906b is located in the peripheral region 920 of the gas distribution plate 903, while the other of the inlet ends 904a, 904b and the outlet ends 906a, 906b are located in the central region 922 of the gas distribution plate 903. . In one or more embodiments, the inlet ends 904a, 904b of the two delivery channels 902a, 902b are located in the peripheral region 920, and the outlet ends 906a, 906b of the two delivery channels 902a, 902b are located in the gas distribution plate 903. Central area 922. In some embodiments, the inlet ends 904a, 904b of the two delivery channels 902a, 902b are located in the central region 922, while the outlet ends 906a, 906b of the two delivery channels 902a, 902b are located in the peripheral region of the gas distribution plate 903. 920. In one or more embodiments, one of the inlet ends 904a, 904b is located in the peripheral region 920, the other inlet end 904a, 904b is located in the central region 922, and the outlet ends 906a, 906b are located in each Do not transport the other end of the channels 902a, 902b.

Figure 11 illustrates the back cover 907 of the gas distribution plate 903 as shown in Figure 9. Four holes (not numbered) are provided in the back cover 907 that are generally aligned with the inlet ends 904a, 904b and the outlet ends 906a, 906b of the delivery channels 902a, 902b. The holes may be used to provide an access point for connection to the delivery channels 902a, 902b in the inlets 910a, 910b and the outlets 912a, 912b. In some embodiments, the inlets 910a, 910b and the outlets 912a, 912b are integrally formed with the back cover 907. Further, as shown in Figures 12 and 13, there may be one or more inlet valves 914a, 914b and outlet valves 916a, 916b.

Figures 12 and 13 illustrate perspective views of a gas distribution apparatus 900 in accordance with various embodiments of the present teachings. The inlets 910a, 910b are shown connected to the back cover 907 with flanges 924a, 924b. The attachment and hermetic sealing of the flanges 924a, 924b can be accomplished by any suitable mechanism and technique known to those skilled in the art. The outlets 912a, 912b may be coupled to the back cover 907 by a flange or stop connection 925. The stop 925 can be integrally formed with the back cover 907 or can be a separate component. The stop 925 provides additional support and space for the outlet valves 916a, 916b such that the connecting tube projects from the back cover 907 at an angle. Although the inlets 910a, 910b and the inlet valves 914a, 914b are shown on the outer peripheral region 920 of the gas distribution plate 903, the outlets 912a, 912b and the outlet valves 916a, 916b are shown in the central region of the gas distribution plate 903. At 922, it should be understood that these components may also be reversed or intermixed, and the drawings are merely illustrative of one particular embodiment.

As the delivery channel forms a helix (or vice versa) from the peripheral edge of the gas distribution plate to the central region, a plurality of adjacent channels on the surface can be observed in cross section. Since the spirals are intertwined, the gas system in each adjacent channel comes from the other inlets 910a, 910b. The channel is separated from the adjacent channel by a distance. In some embodiments, the distance between the channels (from the center of the channel) is in the range of from about 0.375 吋 to about 0.475 ,, or in the range of from about 0.40 吋 to about 0.45 吋. Or in the range of about 0.41 吋 to about 0.43 。. In one or more embodiments, the average distance between the centers of adjacent channels is about 0.42 inches.

The length of the gas passages shown in Figures 9 through 14 may vary depending on several factors including, but not limited to, the diameter of the passage and the distance between adjacent passages. In various embodiments, each delivery channel has a length ranging from 70 吋 to about 170 ,, or ranging from 90 吋 to about 150 ,, or between 100 吋 to about 140 Within the range of 吋, or in the range of 110吋 to about 130吋. In one or more embodiments, the delivery channel has a length of approximately 120 inches.

The number of slits is also dependent on a number of factors including, but not limited to, the length of the transport channel and the spacing of the slits. In some embodiments having a single spiral channel, there are gaps in the range of from about 150 to about 450, or gaps in the range of from about 200 to about 400, or A gap of about 250 to about 350. In various embodiments, there are more than about 150, 200, 250, 300, 350 or 400 slits along the length of the channel. In one or more embodiments, there are approximately 300 slits along the length of the delivery channel.

The apparatus shown in Figures 4 through 14 can be used for plasma processing. For example, the delivery channel, gas distribution device, or showerhead can be polarized relative to another portion of the processing chamber to ignite the plasma within the chamber. The delivery channel, gas distribution device, or showerhead can be polarized relative to a portion of the chamber, or a portion of the chamber can be offset relative to the delivery channel, gas distribution device, or showerhead. For example, the delivery channel, gas distribution device or showerhead can be polarized relative to the support, or the support can be polarized relative to the delivery channel. The frequency of the plasma can also be adjusted. In one or more In the embodiment, the plasma is at a frequency of about 13.56 MHz. In some embodiments, the frequency of the plasma is about 40 MHz, 50 MHz, 60 MHz, 70 MHz, 80 MHz, 90 MHz, 100 MHz, 110 MHz, or 120 MHz.

In some embodiments of the apparatus illustrated in Figures 4 through 14, there is an insulating material (not shown) between the back cover of the gas distribution apparatus and the main body portion (i.e., the portion containing the gas delivery passage). This insulating material provides electrical isolation between the back cover of the gas distribution device and the main body portion such that the back cover can be polarized relative to the main body portion. Doing so allows the plasma to be ignited within the gas distribution device or within the delivery channel. The plasma can flow through a plurality of slits into the processing region of the processing chamber, which is the region between the gas distribution device and the support. This form is called remote plasma because the plasma is formed outside the processing area (eg, ignited).

15, 16A and 16B illustrate another illustrative embodiment of a gas distribution device 1500. The illustrated gas distribution apparatus is particularly useful for spatially separated atomic layer deposition processes in which different portions of the substrate are simultaneously exposed to different deposition gases, and the substrate 1544 is moved relative to the gas distribution device such that all portions of the substrate are Exposure to each deposition gas in sequence. In these particular embodiments, gas distribution apparatus 1500 includes a plurality of delivery channels 1502, each delivery channel 1502 extending substantially linearly and substantially parallel to an adjacent delivery channel. Each delivery channel 1502 has an inlet end 1504 and an outlet end 1506 with a plurality of spaced slits 1508 between the inlet end 1504 and the outlet end 1506.

The gas distribution apparatus shown in Figs. 15, 16A and 16B has a plurality of elongated conveying passages 1502 and a plurality of elongated vacuum passages 1550. Each delivery channel 1502 is coupled to an output channel 1552 at a front surface of the gas distribution device. Each delivery channel 1502 is configured to flow one or more reactive gases with a degassing gas. Each delivery channel 1502 is coupled to the output channel 1552 by a plurality of separation slits 1508. Each vacuum channel 1550 is connected to the inlet channel 1554 by a plurality of spaced vacuum slits 1558. The plurality of slits 1508 of each of the conveying passages 1502 are separated from the plurality of slits 1508 of the respective adjacent conveying passages 150 by at least one of the plurality of vacuum slits 1558 from the vacuum passages 1550.

In the particular embodiment illustrated in Figure 16A, each central vacuum channel 1550 (non-end vacuum channel) is connected to the two inlet channels 1554 by slits 151a, 151b. End vacuum channel 1550 is only connected to a single inlet channel 1554. It should be understood that this is for illustrative purposes only and should not be construed as limiting the scope of the invention. Each inlet channel 1554 can have a dedicated vacuum channel 1550, or a single vacuum channel 1550 can be coupled to more than two inlet channels 1554 via a plurality of slots 151a, 151b.

Each delivery channel appears to be the same, but different flows through each delivery channel. For example, the degassing channel (labeled P) has a degassing gas flowing therethrough, each first reactive gas channel (labeled A) having a first reactive gas flowing therethrough, and each second reaction The gas passage (labeled B) has a second reactive gas flowing therethrough. A vacuum channel (labeled V) is connected to the vacuum source. See In Fig. 16A, the substrate 1544 (or more specifically, the fixed point on the substrate) moving from left to right sequentially passes through the vacuum gas channel, the degassing gas channel, the vacuum gas channel, the first reactive gas channel, and the vacuum. The gas passage, the degassing gas passage, the vacuum gas passage, the second reactive gas passage, the vacuum gas passage, and the like are determined depending on the size of the gas distribution plate.

The use of a delivery channel having an inlet end and an outlet end allows for rapid exchange of gas within the delivery channel. For example, after the substrate (or a fixed point on the substrate) is exposed to the second reactive gas channel (labeled B), the exit end of the delivery channel can be opened, the gas within the channel is removed, and then different A reactive gas, such as gas C, can flow into the delivery channel. Therefore, when the substrate returns to the gas passage, the substrate will be exposed to the gas C instead of the gas B. This example is directed to a second reactive gas, but those skilled in the art will appreciate that any gas delivery channel (first reactive gas, second reactive gas, or degassed gas) can be degassed or replaced with Different gases.

The conveying passages of Figures 15, 16A and 16B can also be used for plasma processing. Gas distribution device 1500 can be polarized relative to another portion of the chamber. For example, the gas distribution device 1500 can be polarized relative to the mount or the mount can be polarized relative to the gas distribution device. The frequency of the plasma can also be adjusted. In one or more embodiments, the frequency of the plasma is about 13.56 MHz. In some embodiments, the frequency of the plasma is about 40 MHz, 50 MHz, 60 MHz, 70 MHz, 80 MHz, 90 MHz, 100 MHz, 110 MHz, or 120 MHz.

Figure 16B illustrates one embodiment of a single delivery channel 1502 and a single vacuum channel 1550. The delivery channel 1502 and the vacuum channel 1550 each have two sets of slits extending from the delivery channel 1502 and the vacuum channel 1550. In the case of vacuum channel 1550, one set of vacuum slits 1558a are connected to first inlet channel 1554a and another set of vacuum slits 1558b are connected to second inlet channel 1554b. Transport channel 1502, on the other hand, has two sets of slits 1508 that extend to a single output channel 1552.

In one or more specific embodiments, the gas distribution device includes more than one outlet connected to a vacuum source. Figure 17 illustrates a spiral gas distribution apparatus 1700 that is similar to the gas distribution apparatus 100 of Figure 1. The gas distribution apparatus includes a delivery channel 1702 having an inlet end 1704 and an outlet end 1706. The inlet 1710 is coupled to the inlet end 1704 of the delivery channel 1702 and to the inlet end 1704 of the delivery channel 1702. The outlet 1712 is coupled to the outlet end 1706 of the delivery channel 1702 and is in communication with the outlet end 1706 of the delivery channel 1702. The inlet 1710 can be coupled to a gas source and includes an inlet valve 1714 that can control the flow of gas into and out of the delivery channel 1702 or completely shut off the gas flow. The outlet 1712 can be coupled to a vacuum source (not shown) and includes an outlet valve 1716 that can control the flow of gas into and out of the delivery channel 1702 or completely shut off the vacuum source from the delivery channel 1702. An intermediate outlet 1742 connectable to a vacuum source (not shown) is located over the length of the delivery channel 1702. The illustrated intermediate outlet 1742 is connected to the delivery channel 1702 at approximately the middle of the length of the delivery channel 1702 and is coupled via the intermediate outlet 1740. Connected to the delivery channel 1702. The intermediate outlet 1742 includes an intermediate outlet valve 1744 that controls the flow of gas into and out of the delivery channel 1702 or completely shuts off the vacuum source from the delivery channel 1702. The inlet valve 1714 of the inlet 1710, the outlet valve 1716 of the outlet 1712, and the intermediate outlet valve 1744 of the intermediate outlet 1740 are coupled to the controller 1750. The controller can independently turn any or all of the valves on or off to adjust the pressure of the gas flowing through the delivery channel 1702 or degas the delivery channel 1702 of an existing gas. For example, Table 2 illustrates the processing sequence that can be used with the specific embodiment shown in FIG. Those skilled in the art will understand that this is for illustrative purposes only and should not be construed as limiting the scope of the invention.

At any point during the process, the valve shown in Table 2 is open, closed or partially open. In step 3a, after the degassing of the delivery path of the precursor A, the intermediate outlet valve is partially opened to accelerate the flow of the precursor B through the delivery channel and then closed in step 3b. This is only one possible order of use and should not be construed as limiting the scope of this creation.

The embodiment shown in Fig. 17 can effectively comprise two outlets, one at the end of the delivery channel and the other at the middle. Those skilled in the art will appreciate that any number of outlets may be provided along the length of the delivery channel, which may be anywhere at the length of the channel; for example, the intermediate outlet 1740 may be located at the length of the channel. 1/3. In addition, there may be any number of outlets; for example, the delivery channel may have four outlets, one at the end, and one at each of 1/4, 1/2, and 3/4 of the length of the delivery channel. In another example, the delivery channel includes four outlets, one at the end, and one at each of 1/4, 3/4, and 9/10 of the length of the delivery channel. In some embodiments, the delivery channel comprises a total of 2, 3, 4, 5, 6, 7, 8, 9, 10, or 11 outlets (including the outlet at the outlet end of the channel).

Figure 18 illustrates another embodiment of the present creation in which the gas distribution device 1800 includes a multi-path delivery channel 1802. Here, gas distribution device 1800 includes a delivery channel 1802 having an input 1804 and an output 1806. The inlet 1810 is coupled to the inlet end 1804 of the delivery channel 1802 and to the inlet end 1804 of the delivery channel 1802. The outlet 1812 is coupled to the outlet end 1806 of the delivery channel 1802 and to the outlet end 1806 of the delivery channel 1802. The inlet 1810 can be coupled to a source of gas (not shown) and can include an inlet valve 1814 that can control the flow of gas into and out of the delivery channel 1802 or completely shut off the gas flow. The outlet 1812 can be coupled to a vacuum source (not shown) and includes an outlet valve 1816 that can control the flow of gas into and out of the delivery channel 1802 or completely shut off the vacuum source from the delivery channel 1802. The conveying channel 1802 is near the inlet end 1804 is divided into three separate delivery channels 1802a, 1802b, 1802c and merged back to a single channel near the exit end 1806. A plurality of slits 1808 are separated along the length of each channel such that a single gas flowing into the inlet 1810 can be directed along multiple paths and coupled to a single outlet 1812. The slits 1808 are evenly spaced or unevenly spaced along the length of the delivery channel 1802.

The particular embodiment shown divides the delivery channel into three separate channels along the length of the channel. However, those skilled in the art will appreciate that this is merely exemplary and that the delivery channel can be divided into any number of channels. In some embodiments, the delivery channel is divided into 2, 3, 4, 5, 6, 7, 8, 9, or 10 individual delivery channels. For example, a channel can be divided into two along the length of the channel, merged into one, and then divided into three.

The air flow through the multi-channel gas distribution apparatus as shown in Fig. 18 may not be uniform between the three channels. The uniformity of airflow between the channels can be affected by several factors including, but not limited to, gas pressure, vacuum pressure, temperature, flow, and pressure drop from static pressure along the length. Figure 19 illustrates another embodiment of a gas distribution apparatus 1900 in which the delivery channel 1902 is subdivided into three respective delivery channels 1902a, 1902b, 1902c, each having its own outlet valve 1916a, 1916b, 1916c. The illustrated gas distribution device 1900 includes an inlet end 1904 that is coupled to an inlet 1910 via an inlet valve 1914. Delivery channel 1902 includes a plurality of slits 1908 that are separated along the length of each respective delivery channel 1902a, 1902b, 1902c. These gaps can be evenly spaced along the length of the channel, or unevenly divided Separate. Each channel has a respective outlet 1912a, 1912b, 1912c having respective outlet valves 1916a, 1916b, 1916c. Each of the outlet valves 1916a, 1916b, 1916c is coupled to a controller 1950 that can independently control each of the outlet valves 1916a, 1916b, 1916c. In this particular embodiment, controller 1950 can set the outlet valve to be closed, fully open, or any point in between. For example, if the airflow through one of the channels is smaller than the others, the controller 1950 will open the outlet valve of the channel to accelerate the flow, or open the outlet valves of the other channels to accelerate the flow and allow less gas to exit through the gap. Channels to create a more even flow.

Multiple separate channels can also be used. Figure 20 illustrates a specific embodiment of a gas distribution apparatus 2000 having five individual gas delivery channels 2002a, 2002b, 2002c, 2002d, 2002e. Each of the conveying passages 2002a, 2002b, 2002c, 2002d, 2002e includes inlet valves 2014a, 2014b, 2014c, 2014d, 2014e and outlet valves 2016a, 2016b, 2016c, 2016d, 2016e. The four spiral transport channels 2002a-d are depicted leaving a void region 2060 at the center of the four channels. The fifth delivery channel 2002e is oscillated between the spirals and in the void region 2060 to avoid dead zones in the gas flow. The fifth delivery passage 2002e is illustrated as having an intermediate outlet valve 2044. Each delivery channel can be configured to deliver the same gas or can deliver a separate gas.

In one embodiment, the five channels cover a single substrate and each channel carries the same reactive gas. The substrate can be rotated below the delivery channel or the channel can be rotated or oscillated above the substrate. In another In a particular embodiment, an alternate delivery channel (e.g., 2002a, 2002c) can deliver a first reactive gas, while other delivery channels (e.g., 2002b, 2002d) can deliver a second reactive gas. The fifth delivery channel 2002e can be configured to deliver an inert gas to form a curtain between the individual channels to separate the gases and avoid gas phase reactions. Rotating the substrate underneath these channels exposes the alternating quarter portion to the same gas and then to the second reactive gas to deposit the film. In this particular embodiment, the portion of the substrate in void region 2060 has no deposited layer.

In another embodiment, each channel can deliver the same gas, but each channel is sized such that a single substrate can be covered by a single delivery channel, which can be performed by moving the substrate from a delivery channel to an adjacent channel. Processing of the substrates. Each channel can be configured to deliver the same gas or individual gases, and the fifth channel can be configured to deliver an inert gas to form a gas curtain that separates the reaction zone adjacent the delivery channel. The fifth delivery channel, as well as any other gas delivery channels described herein, can have multiple inlets and a single outlet or multiple outlets. For example, the fifth delivery channel shown may have an inlet at either end and a single outlet at the middle to create a stronger gas curtain to separate the other delivery channels.

Similarly, the shape and number of outlets vary depending on the intended use. The spiral shown in Fig. 20 is merely illustrative and should not be construed as limiting the scope of the invention. The shape of the gas delivery channel can be modified for several reasons. In some embodiments, the gas delivery channel is formed by spelling out text (eg, "Applied Materials") or forming a trademark. For example, Figure 21 illustrates three delivery channels 2102a, 2102b, 2102c, three delivery channels 2102a, 2102b, 2102c It is roughly a trademark of Applied Materials Co., Ltd. of Santa Clara, California. The first delivery channel 2102a and the second delivery channel 2102b each have a single inlet valve 2114a, 2114b and a single outlet valve 2116a, 2116b. The third delivery passage 2102c has a single inlet valve 2114c and two outlet valves 2116c, 2116d. The third delivery channel 2102c is divided into two channels along the length, reshaped into a single channel, and then split into two channels again. In another embodiment, the inlet valve of the third delivery passage can be opposite the outlet valve, so there can be two inlet valves and a single outlet valve.

The gas flow from the surface of the gas distribution device as seen by the substrate may be uniform or striped. For example, alternating substrates are seen through the substrate below the double helix gas distribution device shown in FIG. In some embodiments, the plurality of delivery channels are shaped such that the pattern of holes seen by the substrate is uniform throughout the gas distribution device. Figures 22A and 22B illustrate a portion of an embodiment of a gas delivery device 2203 in which the gas flow seen by the substrate will be uniform. Figure 22A illustrates the back side 2201 of the gas distribution apparatus 2203 having a plurality of alternating gas passages 2202a, 2202b. The gas passages 2202a, 2202b undulate with the holes 2208a, 2208b spaced apart along the length of the gas passage, so that the pattern of holes 2208 seen on the front side 2205 in Figure 22B is uniform. In addition, the airflow seen by the substrate will be uniform because there are holes evenly distributed in front of the gas distribution device. Referring to Figure 22B, the uppermost column of holes 2208 will alternate between the first gas and the second gas, while the next column will have the opposite pattern. So, at the 12 shown In one of the holes 2208, the first gas will flow out of the six holes and the second gas will flow out of the other six holes.

There may be a plurality of inlet valves 2214a, 2214b, as shown in Figure 22A, or may be a single valve divided into multiple channels. In addition, there may be a plurality of outlet valves 2216a, 2216b, as shown in Fig. 22B, or may be a single outlet valve that engages each passage.

The gas distribution apparatus can be used to form one or more layers in a plasma enhanced atomic layer deposition (PEALD) process. In partial processing, the use of plasma provides sufficient energy to promote the species to an excited state, making surface reactions favorable and possible. The plasma can be introduced into the treatment to be continuous or pulsed. In some embodiments, continuous pulses and plasma of the precursor (or reactive gas) are used to treat the film layer. In some embodiments, the reactants may be ionized either locally (i.e., within the treatment zone) or distal (i.e., outside of the treatment zone). Distal ionization can occur upstream of the deposition chamber such that ions or other high energy or luminescent species are not in direct contact with the deposited film. In a partial PEALD process, the plasma is generated external to the processing chamber, such as by a remote plasma processor system. The plasma can be produced by any suitable plasma generating procedure or technique known to those skilled in the art. For example, the plasma can be generated by one or more of a microwave (MW) frequency generator or a radio frequency (RF) generator. The plasma frequency can be adjusted depending on the particular reactive species used. Suitable frequencies include, but are not limited to, 2 MHz, 13.56 MHz, 40 MHz, 60 MHz, and 100 MHz. Although plasma is used in the deposition procedure disclosed herein, care should be taken that plasma is also not required.

According to one or more embodiments, the gas distribution apparatus can be used to treat the substrate before and/or after forming the layer. This treatment can be performed in the same chamber, or in one or more separate processing chambers. In some embodiments, the substrate is moved from the first chamber to the respective second chamber for further processing. The substrate can be moved directly from the first chamber to the respective processing chamber, or the substrate can be moved from the first chamber to the one or more transfer chambers and then to the respective processing chambers required. Therefore, the processing device includes a plurality of chambers in communication with the transfer station. This type of equipment is called a "cluster tool" or a "cluster system".

In general, a clustering tool is a modular system that includes a plurality of chambers that perform various functions, including finding substrate centering and orientation, degassing, annealing, depositing, and/or etching. According to one or more embodiments, the cluster tool includes at least a first chamber and a central transfer chamber. The central transfer chamber surrounds the robot, and the robot can transport the substrate between the processing chamber and the load lock chamber. The transfer chamber is typically maintained in a vacuum condition and provides an intermediate stage for transporting substrates from one chamber to another and/or to a load lock chamber at the front end of the cluster tool. Two well-known clustering tools available for this creation are Centura® and Endura®, both supplied by Applied Materials, Inc. of Santa Clara, Calif. A detail of such a staged vacuum substrate processing apparatus is disclosed in U.S. Patent No. 5,186,718, entitled "Stage Vacuum Wafer Processing Apparatus and Method", issued February 16, 1993 by Tepman et al. However, the precise alignment and combination of chambers can be adjusted to perform the specific steps of the processing described herein. Other processing chambers that may be used include, but are not limited to, cycling Layer deposition (CLD), atomic layer deposition (ALD), chemical vapor deposition (CVD), physical vapor deposition (PVD), etching, pre-cleaning, chemical cleaning, heat treatment (eg RTP), plasma nitridation, degassing , orientation, hydrogenation and other substrate processing. By performing the treatment in the chamber of the cluster tool, surface contamination of the substrate by atmospheric impurities can be avoided without oxidation prior to deposition of the subsequent film.

In accordance with one or more embodiments, the substrate is continuously under vacuum or "load lock" conditions and is not exposed to ambient air as it moves from the chamber to the next chamber. The transfer chamber is thus under vacuum and "pumped down" under vacuum pressure. An inert gas is present in the processing chamber or transfer chamber. In some embodiments, the inert gas system acts as a degassing gas to remove some or all of the reactants after forming a layer of tantalum on the surface of the substrate. In accordance with one or more embodiments, a degassing system is injected at the exit of the deposition chamber to avoid movement of reactants from the deposition chamber to the transfer chamber and/or other processing chambers. Therefore, the flow of the inert gas forms a gas curtain at the outlet of the chamber.

The substrate can be processed in a single substrate deposition chamber using, for example, a gas distribution device as described herein. In such chambers, the single substrate is loaded, processed, and unloaded before another substrate is processed. The substrate can also be processed in a continuous manner, such as a conveyor system, wherein a plurality of substrates can be individually loaded into the first component of the chamber, moved through the chamber, and unloaded from the second component of the chamber. The shape of the chamber and associated transport system can form a straight path or a curved path. In addition, the processing chamber can be a swirling system in which multiple The substrate can be moved along a central axis and exposed via a swirling system path for deposition, etching, annealing, cleaning, and the like.

The substrate can be heated or cooled during processing. This heating or cooling can be accomplished by any suitable means including, but not limited to, varying the temperature of the substrate support and flowing heated or cooled gas to the substrate surface. In some embodiments, the substrate holder includes a heater/cooler that can be controlled to conductively change the substrate temperature. In one or more embodiments, the gas (reactive gas or inert gas) used is heated or cooled to locally alter the substrate temperature. In some embodiments, the heater/cooler is located within the chamber adjacent the surface of the substrate to convectively change the substrate temperature.

The substrate can also be stationary or rotating during processing. The rotating substrate can be rotated continuously or in discrete steps. For example, the substrate can be rotated throughout the process, or the substrate can be rotated a small amount between exposure to different reactive or degassed gases. Rotating the substrate (whether continuous or stepped) during processing can help produce more uniform deposition or etching by minimizing, for example, geometrical local variability of the gas flow.

The present invention has been described with reference to the specific embodiments, which are intended to illustrate the principles and applications of the present invention. Those skilled in the art can make various modifications and changes to the method and equipment of the present invention without departing from the spirit and scope of the present invention. Therefore, the present invention is intended to cover modifications and variations as defined in the appended claims.

Claims (28)

A gas distribution device comprising: a gas distribution plate having a front side surface and a back side surface, wherein the back side surface is opposite to the front side surface; a first spiral gas delivery passage formed on the back of the gas distribution sheet a side surface, wherein the first spiral gas transport channel extends from a central region of the back side surface to a peripheral region of the back side surface; a second spiral gas transport channel formed on the back of the gas distribution plate a side surface, wherein the second spiral gas delivery channel extends from the central region of the back side surface to the outer peripheral region of the back side surface, and the first spiral gas delivery channel and the second spiral gas delivery channel are mutually Winding; a plurality of first slits spaced along a length of the first spiral gas delivery channel, wherein each of the plurality of first slits extends from the front side surface to a surface of the first spiral gas delivery channel; And a plurality of second slits separated along a length of the second spiral gas delivery channel, wherein each of the plurality of second slits is from the Side surfaces extending to a surface of the second coil of the gas delivery channel. The gas distribution device of claim 1, wherein: The first spiral gas delivery channel and the second spiral gas delivery channel each further comprise an upper portion disposed between a lower portion and the back side surface, wherein the surface of the lower portion has a rounded shape. The gas distribution device according to claim 2, wherein the rounded shape of the surface of the lower portion is a semicircular or semi-elliptical shape. The gas distribution device of claim 2, wherein the plurality of first slits extend from the surface of the lower portion of the first spiral gas delivery passage to the front side surface. The gas distribution device of claim 4, wherein the plurality of second slits extend from the surface of the lower portion of the second spiral gas delivery passage to the front side surface. The gas distribution device of claim 1, wherein: each of the plurality of first slits and the plurality of second slits comprises a first segment and a second segment having a first diameter a third section having a second diameter, wherein the second section has a shape that tapers from the first diameter to the second diameter. The gas distribution apparatus of claim 6, wherein the second diameter is between 0.03 吋 (0.762 mm) and 0.15 吋 (3.81 mm). The gas distribution device of claim 1, wherein: each of the plurality of first slits and the plurality of second slits has a front side surface and is between 0.03 吋 (0.762 mm) and 0.15 吋. One of the diameters between (3.81 mm). The gas distribution device of claim 1, wherein: each of the plurality of first slits and the plurality of second slits has a diameter on the front side surface and less than 0.08 吋 (2.03 mm). The gas distribution device of claim 1, wherein: each of the plurality of first slits and the plurality of second slits has a first spiral gas delivery channel or the second spiral gas delivery channel The surface of the lower portion is less than one diameter of 0.02 吋 (0.508 mm). The gas distribution device of claim 1, wherein: The plurality of first slits comprise from 300 to 900 slits, and the plurality of second slits comprise from 300 to 900 slits. The gas distribution device according to claim 1, wherein the first spiral gas delivery channel and the second spiral gas delivery channel each have a relationship between 0.3 吋 (7.62 mm) and 0.425 吋 (10.8 mm). a width. The gas distribution device of claim 1, wherein: a center of the first spiral gas delivery channel and a center of the second spiral gas delivery channel are between 0.375 吋 (9.52 mm) and 0.475 吋 (12.07 PCT) One of the distances between PCT), wherein the distance is measured along a direction parallel to the backside surface. A gas distribution device comprising: a gas distribution plate having a front side surface and a back side surface; a recessed area formed on the back side surface, wherein the lower surface of the recessed area is a recessed surface, the recessed surface being configured Separating a distance from the back side surface, and the recessed surface is opposite to the front side surface; a first spiral gas transport channel formed on the gas distribution plate The surface of the recess, wherein the first spiral gas transport channel extends from a central region of the recessed surface to a peripheral region of the recessed surface; a second spiral gas transport passage formed in the recess of the gas distribution plate a surface, wherein the second spiral gas transport channel extends from the central region of the recessed surface to the peripheral region of the recessed surface, and the first spiral gas transport channel and the second spiral gas transport channel are separated and intertwined a plurality of first slits spaced along a length of the first spiral gas delivery passage, wherein each of the plurality of first slits extends from the front side surface to a surface of the first spiral gas delivery passage; And a plurality of second slits spaced along a length of the second spiral gas delivery passage, wherein each of the plurality of second slits extends from the front side surface to a surface of the second spiral gas delivery passage. The gas distribution device of claim 14, wherein: the first spiral gas delivery channel and the second spiral gas delivery channel each further comprise an upper portion disposed between a lower portion and the back side surface, wherein The surface of the lower portion has a rounded shape. The gas distribution device according to claim 15, wherein the rounded shape of the surface of the lower portion is a semicircular or semi-elliptical shape. The gas distribution device of claim 15, wherein: the plurality of first slits extend from the surface of the lower portion of the first spiral gas delivery passage to the front side surface. The gas distribution apparatus of claim 17, wherein: the plurality of second slits extend from the surface of the lower portion of the second spiral gas delivery passage to the front side surface. The gas distribution device of claim 14, wherein: each of the plurality of first slits and the plurality of second slits comprises a first segment and a second segment having a first diameter a third section having a second diameter, wherein the second section has a shape that tapers from the first diameter to the second diameter. The gas distribution device of claim 14, wherein: each of the plurality of first slits and the plurality of second slits comprises a first segment and a second segment having a first diameter a third section having a second diameter, wherein the second diameter is between Between 0.03 吋 (0.762 mm) and 0.15 吋 (3.81 mm). The gas distribution device of claim 14, wherein: each of the plurality of first slits and the plurality of second slits has a front side surface and is between 0.03 吋 (0.762 mm) and 0.15 吋. One of the diameters between (3.81 mm). The gas distribution device according to claim 21, wherein the first spiral gas delivery channel and the second spiral gas delivery channel each have a relationship between 0.3 吋 (7.62 mm) and 0.425 吋 (10.8 mm). a width. The gas distribution device of claim 22, wherein: the plurality of first slits comprises 300 to 900 slits, and the plurality of second slits comprise 300 to 900 slits. The gas distribution apparatus of claim 14, wherein: each of the plurality of first slits and the plurality of second slits has a diameter on the front side surface and less than 0.08 吋 (2.03 mm). The gas distribution apparatus of claim 14, wherein: Each of the plurality of first slits and the plurality of second slits has the surface located at a lower portion of the first spiral gas delivery passage or the second spiral gas delivery passage and is less than 0.02 吋 (0.508 mm) ) One of the diameters. The gas distribution device according to claim 14, wherein the distance between the first spiral gas delivery channel and the second spiral gas delivery channel is between 0.375 吋 (9.52 mm) and 0.475 吋 (12.07 mm). Between the two, wherein the distance is measured along a direction parallel to the backside surface. The gas distribution device of claim 14, wherein the recessed area is configured to receive a back cover, wherein a surface of the back cover is configured to substantially cover the first spiral gas transport when the back cover is located in the recessed area a channel and the second spiral gas delivery channel. The gas distribution device of claim 14, wherein the back cover is configured to contact the recessed surface when the back cover is in the recessed region.