TWM558936U - A touch apparatus - Google Patents
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- TWM558936U TWM558936U TW106212957U TW106212957U TWM558936U TW M558936 U TWM558936 U TW M558936U TW 106212957 U TW106212957 U TW 106212957U TW 106212957 U TW106212957 U TW 106212957U TW M558936 U TWM558936 U TW M558936U
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Abstract
Description
本創作係有一種觸控裝置,其特別有關於可將電容性觸控元件整合線偏光元件,或整合指紋辨識元件的觸控裝置。 The present invention relates to a touch device, which particularly relates to a touch device capable of integrating a capacitive touch element with a line polarizing element or integrating a fingerprint recognition element.
西元1970年代,人們發展出了可以判斷位置的觸控技術,讓人們可以藉由按壓位置來輸入特定資訊。透過交錯配置兩個呈相互垂直方向的電場,可在觸控感應時藉由交錯位置的訊號差異辨識出觸控所指的位置,藉以達到觸控的效果。此後,西元1994年時,美商IBM(International Business Machines Corporation)發表了具有觸控顯示螢幕的手機,進一步帶動了具觸控功能的顯示面板於各類可攜式電子產品中的發展。 In the 1970s, people developed touch technology that can determine the position, allowing people to enter specific information by pressing the position. By alternately arranging two electric fields that are perpendicular to each other, the position of the touch can be recognized by the signal difference of the interlaced position during the touch sensing, thereby achieving the touch effect. Since then, in 1994, the International Business Machines Corporation (IBM) published a mobile phone with a touch display screen, which further promoted the development of touch-enabled display panels in various portable electronic products.
然而,習知技術之觸控顯示螢幕,其顯示器模組或觸控面板(Touch Panel,TP)所採用的不透明電極將影響整體透明出光的開口率(Aperture Ratio),使其達成所需照度的功率難以降低;並且,其電極的線徑寬度與從事半導體生產製造的黃光微影製程(Lithography)有關係。由於線徑寬度越小所需的曝光光源與模具等裝置之精密度越高,故生產設備與成本越高,且越精密所相差的成本級距越高,對於生產製造觸控顯示螢幕的業者而言必須於開口率及生產製造成本中取一平衡。另一方面,不透明電極的材料一般為金屬材料所構成,其對於自然光線具有相當程度的反射率,尤其是在其線徑寬度不夠小及/或於大角度視角使用時,容易造成使用前述之觸控顯示螢幕時受到不透明電極的反光影響觀賞及觸控操作上的舒適度。近年來,金屬網線(Metal mesh)使用於大尺寸觸控面板的觸控結構,因為具 有生產容易的優點,受到廣大的重視。 However, in the touch display screen of the prior art, the opaque electrode used in the display module or the touch panel (TP) will affect the aperture ratio of the overall transparent light to achieve the desired illumination. The power is difficult to reduce; and the wire diameter of the electrode is related to the Lithography process for semiconductor manufacturing. The smaller the wire diameter is, the higher the precision of the exposure light source and the mold, etc., so the higher the production equipment and the cost, and the higher the precision, the higher the cost step distance, for the manufacturer of the touch display screen. In terms of aperture ratio and manufacturing cost, a balance must be taken. On the other hand, the material of the opaque electrode is generally composed of a metal material, which has a considerable degree of reflectivity for natural light, especially when the wire diameter is not sufficiently small and/or is used at a large angle of view, which is easy to use. When the touch display screen is illuminated by the opaque electrode, the viewing and touch operation comfort is affected. In recent years, a metal mesh has been used for a touch structure of a large-sized touch panel because It has the advantage of being easy to produce and has received extensive attention.
然而上述技術在量產,然有需多問題需要克服,(一)要讓視覺上看不到金屬線,其金屬線寬可能必須小於5um,需要高精度設備;(二)為了達到使用者可以接受的98%的透光度,感應面積要減少98%,相對的觸控感應量也可能縮小50倍;(三)金屬網格的間距太大,互電容太小以至於量不到感應訊號。 However, the above technologies are in mass production, but there are many problems that need to be overcome. (1) To make the metal lines visually invisible, the metal line width may have to be less than 5um, requiring high-precision equipment; (2) in order to reach the user Accepting 98% transmittance, the sensing area is reduced by 98%, and the relative touch sensing amount may be reduced by 50 times; (3) The spacing of the metal grid is too large, and the mutual capacitance is too small to be less than the sensing signal. .
此外,在應用上,若使用次微米的金屬線,可以產生一金屬線柵偏極片(Wire Grid Polarizer,WGP)的功能。因此,若可以在傳統電容式觸控元件中,可以達到線柵偏極片的功用,則可以達到簡化光學模組感應裝置結構的功效。 In addition, in application, if a sub-micron metal wire is used, a function of a wire grid polarizer (WGP) can be produced. Therefore, if the function of the wire grid polarizer can be achieved in the conventional capacitive touch element, the effect of simplifying the structure of the optical module sensing device can be achieved.
另外,指紋辨識(Fingerprint identification)在安全級別的認證已經引起廣大的應用興趣。電容式的指紋識別解析度要求有需要達到550dpi,這是傳統金屬網線需要克服的議題。 In addition, fingerprint identification (Fingerprint identification) has attracted a lot of application interest in the certification of security level. Capacitive fingerprint resolution requires a requirement of 550 dpi, which is a topic that traditional metal meshes need to overcome.
有鑑於上述問題,有必要提出一種能夠整合其他應用的電容性觸控裝置,達到簡化結構的功效。 In view of the above problems, it is necessary to propose a capacitive touch device capable of integrating other applications to achieve a simplified structure.
鑒於前述之習知技術的缺點,本創作之主要目的係提供線寬極細且減少光反射性的觸控裝置。藉由次微米等級的導電網線的線徑寬度,且留下的阻障層具有防止反射自然光線於人眼的功能,本創作之觸控裝置可將電容性觸控元件整合線偏光元件,或整合指紋辨識元件的觸控裝置,達到了簡化結構之目的。 In view of the shortcomings of the prior art described above, the main object of the present invention is to provide a touch device having a very narrow line width and reduced light reflectivity. By adopting the wire diameter of the sub-micron-sized conductive wire, and leaving the barrier layer to prevent reflection of natural light on the human eye, the touch device of the present invention can integrate the capacitive touch component into the linear polarizing component. Or the touch device integrating the fingerprint recognition component achieves the purpose of simplifying the structure.
為達本創作之主要目的,本創作提出一種觸控裝置,至少包含:一第一感應層,其係於一第一透明基板上設置有複數條第一導電網線; 以及一第二感應層,其係於一第二透明基板上設置有複數條第二導電網線,該些第二導電網線係面對於該些第一導電網線,且該些第一導電網線的網線方向與該些第二導電網線的網線方向係互相垂直;其中該些導電網線中之部分導電網線上設置有阻障圖案層,該阻障圖案層具有不同的高度。 For the main purpose of the present invention, the present invention provides a touch device comprising: a first sensing layer, wherein a plurality of first conductive mesh lines are disposed on a first transparent substrate; And a second sensing layer, wherein the second transparent substrate is provided with a plurality of second conductive mesh wires, the second conductive mesh wires are opposite to the first conductive mesh wires, and the first conductive wires are The network cable direction of the network cable is perpendicular to the network cable direction of the second conductive network wires; wherein a part of the conductive mesh wires is provided with a barrier pattern layer having different heights. .
根據本創作之一特徵,更包含一絕緣材料層,設置於該些第一導電網線與該些第二導電網線之間。 According to one feature of the present invention, a layer of insulating material is further disposed between the first conductive mesh lines and the second conductive mesh lines.
根據本創作之一特徵,該些第一導電網線之線寬與該些第二導電網線之線寬皆介於10奈米至100微米之間。 According to one feature of the present invention, the line widths of the first conductive mesh lines and the line widths of the second conductive mesh lines are between 10 nm and 100 μm.
根據本創作之一特徵,該些第一導電網線之間距與該些第二導電網線之間距皆介於1微米至1000微米之間。 According to one feature of the present invention, the distance between the first conductive mesh lines and the second conductive mesh lines is between 1 micrometer and 1000 micrometers.
根據本創作之一特徵,該些第一感應層更包含第三複數條導電網線,設置在該些第一導電網線相鄰的兩條導電網線之間。 According to one feature of the present invention, the first sensing layers further comprise a third plurality of conductive mesh lines disposed between the two conductive mesh lines adjacent to the first conductive mesh lines.
根據本創作之一特徵,該些第二感應層更包含第四複數條導電網線,設置在該些第二導電網線相鄰的兩條導電網線之間。 According to one feature of the present invention, the second sensing layers further comprise a fourth plurality of conductive mesh lines disposed between the two conductive mesh lines adjacent to the second conductive mesh lines.
本創作之觸控裝置具有以下功效: The touch device of the present invention has the following effects:
1.本創作之導電網線部分具有阻障圖案層,具有防止反射自然光線於人眼的功能。 1. The conductive wire portion of the present invention has a barrier pattern layer and has a function of preventing reflection of natural light from the human eye.
2.本創作之導電網線可提供線寬極細且減少光反射性的觸控裝置,可應用於極靈敏的指紋辨識。 2. The conductive wire of the present invention can provide a touch device with extremely narrow line width and reduced light reflectivity, and can be applied to extremely sensitive fingerprint recognition.
3.本創作之導電網線可以具有金屬線柵偏極片的功能,減少一片偏光片的使用。 3. The conductive wire of the present invention can have the function of a metal wire grid polarizer to reduce the use of a polarizer.
10‧‧‧觸控裝置 10‧‧‧ touch device
100‧‧‧第一感應層 100‧‧‧first sensing layer
110‧‧‧第一透明基板 110‧‧‧First transparent substrate
120‧‧‧第一導電網線 120‧‧‧First conductive cable
124‧‧‧連接區域 124‧‧‧Connected area
132‧‧‧阻障圖案層 132‧‧‧Barrier pattern layer
140‧‧‧第三導電網線 140‧‧‧ Third conductive cable
150‧‧‧觸控晶片 150‧‧‧ touch chip
160‧‧‧導線 160‧‧‧ wire
170‧‧‧指紋辨識晶片 170‧‧‧Fingerprint Identification Wafer
180‧‧‧導線 180‧‧‧ wire
200‧‧‧第二感應層 200‧‧‧Second sensing layer
210‧‧‧第二透明基板 210‧‧‧Second transparent substrate
220‧‧‧第二導電網線 220‧‧‧Second conductive cable
224‧‧‧連接區域 224‧‧‧Connected area
232‧‧‧阻障圖案層 232‧‧‧Barrier pattern layer
240‧‧‧第四導電網線 240‧‧‧4th conductive cable
為讓本創作之上述和其他目的、特徵、和優點能更明顯易懂, 下文特舉數個較佳實施例,並配合所附圖式,作詳細說明如下。 To make the above and other purposes, features, and advantages of the present creation more apparent, Several preferred embodiments are described below in conjunction with the drawings and are described in detail below.
圖1顯示本創作之一種觸控裝置的基本示意圖。 FIG. 1 shows a basic schematic diagram of a touch device of the present invention.
圖2顯示本創作之一種觸控裝置的導電網線的結構示意圖。 FIG. 2 is a schematic view showing the structure of a conductive wire of a touch device of the present invention.
圖3顯示本創作之一種觸控裝置的第一應用實施例示意圖。 FIG. 3 is a schematic diagram showing a first application embodiment of a touch device of the present invention.
圖4顯示本創作之一種觸控裝置的第二實施例示意圖。 4 is a schematic view showing a second embodiment of a touch device of the present invention.
雖然本創作可表現為不同形式之實施例,但附圖所示者及於本文中說明者係為本創作可之較佳實施例。熟習此項技術者將瞭解,本文所特定描述且在附圖中繪示之裝置及方法係考量為本創作之一範例,非限制性例示性實施例,且本創作之範疇僅由申請專利範圍加以界定。結合一例示性實施例繪示或描述之特徵可與其他實施例之諸特徵進行結合。此等修飾及變動將包括於本創作之範疇內。 While the present invention may be embodied in a variety of forms, the embodiments shown in the drawings and described herein are the preferred embodiments of the present invention. Those skilled in the art will appreciate that the devices and methods specifically described herein and illustrated in the drawings are considered as an example of the present invention, non-limiting exemplary embodiments, and the scope of the present application is only by the scope of the patent application. Defined. Features illustrated or described in connection with an exemplary embodiment may be combined with features of other embodiments. Such modifications and variations are intended to be included within the scope of this creation.
請參見第1圖,其說明應用本創作之一種觸控裝置的基本示意圖。在該觸控裝置10,至少包含兩個一第一感應層100與一第二感應層200。該第一感應層100係於一第一透明基板110上設置有複數條第一導電網線120;該第二感應層200,其係於一第二透明基板210上設置有複數條第二導電網線220。該些第一導電網線120與該些第二導電網線220係互相面對,且該些第一導電網線120的網線方向與該些第二導電網線220的網線方向係互相垂直。亦即是,該觸控裝置10基本上是一個電容式觸控裝置。 Please refer to FIG. 1 , which illustrates a basic schematic diagram of a touch device to which the present invention is applied. The touch device 10 includes at least two first sensing layers 100 and a second sensing layer 200. The first sensing layer 100 is provided with a plurality of first conductive mesh lines 120 on a first transparent substrate 110. The second sensing layer 200 is disposed on a second transparent substrate 210 and has a plurality of second conductive layers. Network cable 220. The first conductive mesh 120 and the second conductive mesh 220 face each other, and the mesh direction of the first conductive mesh 120 and the mesh direction of the second conductive mesh 220 are mutually vertical. That is, the touch device 10 is basically a capacitive touch device.
其中該些第一導電網線120之線寬與該些第二導電網線220之線寬皆介於10奈米至100微米之間。該些第一導電網線120之間距與該些第二導電網線220之間距皆介於1微米至1000微米之間。 The line widths of the first conductive mesh lines 120 and the line widths of the second conductive mesh lines 220 are between 10 nm and 100 μm. The distance between the first conductive mesh lines 120 and the second conductive mesh lines 220 is between 1 micrometer and 1000 micrometers.
該觸控裝置10更包含一絕緣材料層300,設置於該些第一導電網線120與該些第二導電網線220之間。該絕緣材料層300之材料可以二氧化矽,氮化矽,或是氮氧化矽等。藉此,該觸控裝置10可以具有更好的電容式觸控的功用。 The touch device 10 further includes an insulating material layer 300 disposed between the first conductive mesh lines 120 and the second conductive mesh lines 220. The material of the insulating material layer 300 may be cerium oxide, cerium nitride, or cerium oxynitride. Thereby, the touch device 10 can have a better function of capacitive touch.
請參照第2圖,其顯示本創作之一種觸控裝置的導電網線的結構示意圖,亦即是顯示該些第一導電網線120與該些第二導電網線220之結構示意圖。第2(a)圖係說明該些第一導電網線120,且第2(b)圖係說明該些第二導電網線220。 Please refer to FIG. 2 , which shows a schematic structural view of a conductive wire of a touch device of the present invention, that is, a schematic structural view of the first conductive mesh 120 and the second conductive mesh 220 . The second (a) diagram illustrates the first conductive mesh lines 120, and the second (b) diagram illustrates the second conductive mesh lines 220.
在第2(a)圖中,該些第一導電網線120,形成於該透明基板110上。其中該些導電網線120中之部分導電網線上設置有對應的阻障圖案層132。其主要特徵,在於該阻障圖案層132可以具有不同的高度,也可以具有相同的高度。亦即是,該阻障圖案層132具有高低差。在該透明基板110上,同時有部分的該導電圖案,是完全去除該阻障圖案層。因此完全去除該阻障圖案層之該導電圖案可以作為一連接區域124。該連接區域124係作為該第一感應層100與其他元件的電性連接的接點,或機械連接的焊點。 In the second (a) diagram, the first conductive mesh lines 120 are formed on the transparent substrate 110. A portion of the conductive mesh wires 120 is provided with a corresponding barrier pattern layer 132. The main feature is that the barrier pattern layer 132 may have different heights or may have the same height. That is, the barrier pattern layer 132 has a height difference. On the transparent substrate 110, a portion of the conductive pattern is simultaneously removed from the barrier pattern layer. Therefore, the conductive pattern completely removing the barrier pattern layer can serve as a connection region 124. The connection region 124 serves as a contact point for electrical connection of the first sensing layer 100 with other components, or a solder joint for mechanical connection.
同理,在第2(b)圖中,該些第二導電網線220,形成於該透明基板210上。其中該些導電網線220中之部分導電網線上設置有對應的阻障圖案層232。其主要特徵,在於該阻障圖案層232可以具有不同的高度,也可以具有相同的高度。亦即是,該阻障圖案層132具有高低差。在該透明基板210上,同時有部分的該導電圖案,是完全去除該阻障圖案層。因此完全去除該阻障圖案層之該導電圖案可以作為一連接區域224。該連接區域224係作為該第二感應層200與其他元件的電性連接的接點,或機械連接的焊點。 Similarly, in the second (b) diagram, the second conductive mesh wires 220 are formed on the transparent substrate 210. A portion of the conductive mesh wires 220 is provided with a corresponding barrier pattern layer 232. The main feature is that the barrier pattern layer 232 may have different heights or may have the same height. That is, the barrier pattern layer 132 has a height difference. On the transparent substrate 210, a portion of the conductive pattern is simultaneously removed from the barrier pattern layer. Therefore, the conductive pattern completely removing the barrier pattern layer can serve as a connection region 224. The connection region 224 serves as a contact point for electrical connection of the second sensing layer 200 with other components, or a solder joint for mechanical connection.
該透明基板110與該透明基板210係選自軟性透明基板、藍 寶石(Sapphire)、透明石英或玻璃之一。軟性透明基板包含了有機聚合物,例如聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)、聚碳酸酯(Polycarbonate,PC)、、聚酸甲酯(Polymethylmethacrylate,PMMA)、聚乙烯醇縮丁醛(Polyvinyl Butyral,PVB)、、三醋酸纖維素(Tri-cellulose Acetate,TCA)、環烯烴聚合物(Cyclo Olefin Copolymer,COC)、聚醯亞胺(Polyimide,PI)等。該透明基板110與該透明基板210主要的特徵是在可見光的光穿透度可以達到80%以上。 The transparent substrate 110 and the transparent substrate 210 are selected from a soft transparent substrate and a blue One of sapphire, transparent quartz or glass. The flexible transparent substrate comprises an organic polymer, such as polyethylene terephthalate (PET), polycarbonate (Polycarbonate, PC), polymethylmethacrylate (PMMA), polyvinyl ketal Polyvinyl Butyral (PVB), Tri-cellulose Acetate (TCA), Cyclo Olefin Copolymer (COC), Polyimide (PI), and the like. The transparent substrate 110 and the transparent substrate 210 are mainly characterized in that the light transmittance in visible light can reach 80% or more.
該些第一導電網線120與該些第二導電網線220之材料係選自金屬、金屬氧化物、碳基材料所組成族群之一。金屬例如銀、銅、鋁、鐵、鎂、錫、鎳、金、鈷、鈦、鉬、釹及其合金。金屬氧化物係特別是透明導電的金屬氧化物,例如摻雜氟之氧化錫(Sn2O3:F,FTO)、摻雜錫之氧化銦(In2O3:Sn,ITO)、摻雜鋅之氧化銦(In2O3:Zn)、摻雜硼之氧化銦(In2O3:B)、摻雜氫之氧化銦(In2O3:H)、摻雜鋁之氧化鋅(ZnO:Al,AZO)、摻雜鎵之氧化鋅(ZnO:Ga,GZO)、摻雜硼之氧化鋅(ZnO:B,BZO)或其組成之一。碳基材料包含了:可透明導電的奈米碳材,例如:富勒烯、奈米碳管與石墨烯與其組合之材料。較佳地,在本創作中,該些第一導電網線120與該些第二導電網線220之材料係為選自銀、鋁或銅所組成族群之一。 The materials of the first conductive mesh 120 and the second conductive mesh 220 are selected from one of the group consisting of metal, metal oxide and carbon-based materials. Metals such as silver, copper, aluminum, iron, magnesium, tin, nickel, gold, cobalt, titanium, molybdenum, niobium and alloys thereof. The metal oxide is particularly a transparent conductive metal oxide such as fluorine-doped tin oxide (Sn 2 O 3 :F, FTO), tin-doped indium oxide (In 2 O 3 :Sn, ITO), doping Indium oxide of zinc (In 2 O 3 : Zn), boron-doped indium oxide (In 2 O 3 : B), hydrogen-doped indium oxide (In 2 O 3 : H), aluminum-doped zinc oxide ( ZnO: Al, AZO), gallium-doped zinc oxide (ZnO: Ga, GZO), boron-doped zinc oxide (ZnO: B, BZO) or one of its compositions. The carbon-based material comprises: a transparent carbon nanomaterial, such as a material obtained by combining fullerenes, carbon nanotubes and graphene. Preferably, in the present invention, the materials of the first conductive mesh 120 and the second conductive mesh 220 are one selected from the group consisting of silver, aluminum or copper.
根據本創作的觸控裝置100,可以應用於金屬線柵偏極片(Wire Grid Polarizer,WGP)或指紋辨識(Fingerprint identification)。 According to the touch device 100 of the present invention, it can be applied to a Wire Grid Polarizer (WGP) or a Fingerprint Identification.
配合第1圖,並請參照第3圖,其顯示本創作之一種觸控裝置的第一應用實施例示意圖。該實施例係根據本創作的觸控裝置100應用於金屬線柵偏極片之示意圖。在該些第一感應層100更包含第三複數條導電網線140,設置在該些第一導電網線120相鄰的兩條導電網線之間。該些第三導電網線140之線寬介於10奈米至100微米之間,該些第三導電網線140之間距介於10奈米至10微米之間。其中該些第三導電網線140作為金屬線柵偏極片。當作為光柵之該些第三導電網線140尺寸小於操作 波長時,光波通過此類結構後,光柵之週期參數與幾何形狀將對光波呈現出特定之雙折射特性,使得與結構垂直之入射電場振動分量不受光柵參數影響而通過,但與結構平行之電場振動分量卻因產生破壞性干涉,表現出強反射特性。該觸控裝置10,更包含一觸控晶片150,具有複數條導線160,電性連接至該些第一導電網線120與該些第二導電網線220。由於該些第三導電網線140使用次微米的金屬線,可以產生一線偏光的功能,如此可以減少一層偏光片的使用。在有激發光二極體的觸控中,可以在極化片(polarizer)之上或下產生或是貼合本創作之該觸控裝置10。 With reference to FIG. 1 and FIG. 3, a schematic diagram of a first application embodiment of a touch device of the present invention is shown. This embodiment is a schematic diagram of a touch device 100 according to the present invention applied to a metal wire grid polarizer. The first sensing layer 100 further includes a third plurality of conductive mesh lines 140 disposed between the two conductive mesh lines adjacent to the first conductive mesh lines 120. The third conductive mesh wires 140 have a line width of between 10 nanometers and 100 micrometers, and the third conductive mesh wires 140 have a distance of between 10 nanometers and 10 micrometers. The third conductive mesh wires 140 serve as metal wire grid polarizing plates. When the third conductive mesh lines 140 as gratings are smaller in size At the wavelength, after the light wave passes through such a structure, the periodic parameters and geometry of the grating will exhibit a specific birefringence characteristic to the light wave, so that the vibration component of the incident electric field perpendicular to the structure is not affected by the grating parameter, but is parallel with the structure. The electric field vibration component exhibits strong reflection characteristics due to destructive interference. The touch device 10 further includes a touch wafer 150 having a plurality of wires 160 electrically connected to the first conductive mesh wires 120 and the second conductive mesh wires 220. Since the third conductive mesh lines 140 use sub-micron metal lines, a function of one-line polarization can be generated, which can reduce the use of a layer of polarizers. In the touch with the excitation light diode, the touch device 10 of the present invention can be created or attached to the polarizer.
請參照第4圖,其顯示本創作之一種觸控裝置的第二實施例示意圖。該實施例係根據本創作的觸控裝置10應用於指紋辨識之示意圖。在本創作中,當使用者把手指放到本創作的該觸控裝置10時,它會擷取表皮層之下真皮層的高解析度指紋影像,利用導電的電位差測量出紋脊線和凹谷之間的差異。該些第一感應層100更包含第三複數條導電網線140,設置在該些第一導電網線120相鄰的兩條導電網線之間。該些第三導電網線140之線寬介於10奈米至100微米之間,該些第三導電網線140之間距介於10奈米至10微米之間。該些第二感應層200更包含第四複數條導電網線240,設置在該些第二導電網線220相鄰的兩條導電網線之間。該些第四導電網線240之線寬介於10奈米至100微米之間,該些該些第四導電網線240之間距介於10奈米至10微米之間。該觸控裝置10,更包含一觸控晶片150,具有複數條導線160,電性連接至該些第一導電網線120與該些第二導電網線220。此外,該觸控裝置10,更包含一指紋辨識晶片170,具有複數條導線180,電性連接至該些第三導電網線140與該些第四導電網線240。 Please refer to FIG. 4, which shows a schematic diagram of a second embodiment of a touch device of the present invention. This embodiment is a schematic diagram of the touch device 10 according to the present invention applied to fingerprint recognition. In the present creation, when the user puts a finger on the created touch device 10, it captures a high-resolution fingerprint image of the dermis layer under the epidermis layer, and measures the ridge line and the concave shape by using the potential difference of the electric conduction. The difference between the valleys. The first sensing layer 100 further includes a third plurality of conductive mesh lines 140 disposed between the two conductive mesh lines adjacent to the first conductive mesh lines 120. The third conductive mesh wires 140 have a line width of between 10 nanometers and 100 micrometers, and the third conductive mesh wires 140 have a distance of between 10 nanometers and 10 micrometers. The second sensing layer 200 further includes a fourth plurality of conductive mesh wires 240 disposed between the two conductive mesh wires adjacent to the second conductive mesh wires 220. The line width of the fourth conductive mesh 240 is between 10 nm and 100 microns, and the distance between the fourth conductive wires 240 is between 10 nm and 10 microns. The touch device 10 further includes a touch wafer 150 having a plurality of wires 160 electrically connected to the first conductive mesh wires 120 and the second conductive mesh wires 220. In addition, the touch device 10 further includes a fingerprint identification chip 170 having a plurality of wires 180 electrically connected to the third conductive mesh wires 140 and the fourth conductive mesh wires 240.
藉由本創作提出微米或次微米級金屬網格,可以形成一透明導電層。在低解析度(低密度網格)的該些第一導電網線120與該些第二導電網線220中,放進高解析度(高密度網格)的該些第三導電網線140與該些 第四導電網線240以形成電容式指紋識別。對於高屏佔比及面板整合化(in-display)相形重要。該指紋辨識讀取指紋的極細部特徵,採用電容式觸控技術進行分析。該觸控裝置10應用在指紋識別的安全級別的認證上,指紋識別解析度~550dpi。 A transparent conductive layer can be formed by proposing a micro or sub-micron metal mesh. In the low-resolution (low-density mesh) of the first conductive mesh lines 120 and the second conductive mesh wires 220, the third conductive mesh wires 140 of high resolution (high-density mesh) are placed. With these The fourth conductive mesh 240 is formed to form a capacitive fingerprint. It is important for high screen ratio and panel in-display. The fingerprint recognition reads the extremely fine features of the fingerprint and uses capacitive touch technology for analysis. The touch device 10 is applied to the authentication of the security level of fingerprint recognition, and the fingerprint recognition resolution is ~550 dpi.
綜上所述,本創作之觸控裝置具有以下功效: In summary, the touch device of the present invention has the following effects:
1.本創作之導電網線部分具有阻障圖案層,具有防止反射自然光線於人眼的功能。 1. The conductive wire portion of the present invention has a barrier pattern layer and has a function of preventing reflection of natural light from the human eye.
2.本創作之導電網線可提供線寬極細且減少光反射性的觸控裝置,可應用於極靈敏的指紋辨識。 2. The conductive wire of the present invention can provide a touch device with extremely narrow line width and reduced light reflectivity, and can be applied to extremely sensitive fingerprint recognition.
3.本創作之導電網線可以具有金屬線柵偏極片的功能,減少一片偏光片的使用。 3. The conductive wire of the present invention can have the function of a metal wire grid polarizer to reduce the use of a polarizer.
雖然本創作已以前述較佳實施例揭示,然其並非用以限定本創作,任何熟習此技藝者,在不脫離本創作之精神和範圍內,當可作各種之更動與修改。如上述的解釋,都可以作各型式的修正與變化,而不會破壞此新型的精神。因此本創作之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the foregoing preferred embodiments, it is not intended to limit the present invention, and various modifications and changes can be made without departing from the spirit and scope of the invention. As explained above, all types of corrections and changes can be made without destroying the spirit of this new type. Therefore, the scope of protection of this creation is subject to the definition of the scope of the patent application attached.
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