TWM536829U - De-bonding type flexible substrate - Google Patents

De-bonding type flexible substrate Download PDF

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TWM536829U
TWM536829U TW105211769U TW105211769U TWM536829U TW M536829 U TWM536829 U TW M536829U TW 105211769 U TW105211769 U TW 105211769U TW 105211769 U TW105211769 U TW 105211769U TW M536829 U TWM536829 U TW M536829U
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Taiwan
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release layer
layer
flexible substrate
release
support carrier
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TW105211769U
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Chinese (zh)
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Yen-Po Huang
Tsung-Hsien Tsai
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Taimide Tech Incoporation
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Description

可離型之軟性基板 Releaseable flexible substrate

本創作係關於一種可離型之軟性基板及其製造方法,特別係指一種應用於電子元件之軟性基板,可將軟性基板自支撐載體上剝離,而可獲得具有電子元件之軟性基板。 The present invention relates to a detachable flexible substrate and a method of manufacturing the same, and particularly to a flexible substrate applied to an electronic component, which can be detached from a support carrier to obtain a flexible substrate having electronic components.

習知之平面顯示器使用厚重且易碎之玻璃基板,因薄型化及降低成本之考量,已漸被塑膠軟性基板所取代,而塑膠軟性基板顯示器的製造包括一支撐載體、以形成於該支撐載體上之塑膠軟性基板以及形成於該軟性基板上的積體電路或各種電子電路,接著進行剝離程序,將軟性基板與支撐載體分離,而得到塑膠軟性基板顯示器。 Conventional flat panel displays use thick and fragile glass substrates, which have been gradually replaced by plastic flexible substrates due to thinning and cost reduction, and the manufacture of plastic flexible substrate displays includes a support carrier for forming on the support carrier. The plastic flexible substrate and the integrated circuit or various electronic circuits formed on the flexible substrate are then subjected to a peeling process to separate the flexible substrate from the support carrier to obtain a plastic flexible substrate display.

習知一種將軟性基板與支撐載體分離的方式,係採用雷射進行剝離,惟,雷射剝離方式將造成軟性基板及其上之積體電路因熱效應產生熱膨脹而損傷,且雷射設備成本高昂,為業者成本支出造成相當大之付擔。 A method for separating a flexible substrate from a support carrier is performed by using a laser for peeling. However, the laser stripping method causes damage to the flexible substrate and the integrated circuit thereon due to thermal effects, and the laser device is expensive. It is a considerable burden for the cost of the operator.

TWI444114為一種具有離型層的軟性基板及其製造方法,其係將一離型層可脫離地附著於支撐載體上,將軟性基板塗佈於該離型層 上,在完成顯示元件設置後,再將離型層自支撐載體上剝璃,而得到一具有顯示元件之軟性基板。 TWI444114 is a flexible substrate having a release layer and a manufacturing method thereof, wherein a release layer is detachably attached to a support carrier, and a flexible substrate is coated on the release layer. Then, after the display element is set, the release layer is stripped from the support carrier to obtain a flexible substrate having the display element.

惟,上述具有離型層之軟性基板及其製造方法,其欲製作軟性基板時,皆須再先行製作一離型層,其製作程序較為繁瑣且成本較高。 However, in the above flexible substrate having a release layer and a method for manufacturing the same, when a flexible substrate is to be produced, a release layer must be produced first, and the production process is cumbersome and costly.

本創作係提供一種可離型之軟性基板及其製造方法,係包括有一支撐載體;一離型層,係附著於該支撐載體上,其包括構成該離型層主結構之聚醯亞胺、接著劑及離型劑,該聚醯亞胺係由二胺及二酐反應而成,該接著劑用以提高該離型層與該支撐載體之附著力;一聚醯亞胺層,係由二胺及二酐反應而成、其係附著於該離型層上,其中,該離型劑用以提高該聚醯亞胺層與該離型層之離型力,使該離型層與支撐載體之附著度大於該聚醯亞胺層與該離型層之附著度,而可使該聚醯亞胺層可自該離型層上剝離,而該離型層仍附著於該支撐載體上。 The present invention provides a removable substrate and a method of manufacturing the same, comprising a support carrier; a release layer attached to the support carrier, comprising a polyimine comprising the main structure of the release layer, a binder and a release agent, wherein the polyimide is formed by reacting a diamine and a dianhydride, and the adhesive is used to improve the adhesion between the release layer and the support carrier; The diamine and the dianhydride are reacted and attached to the release layer, wherein the release agent is used to increase the release force of the polyimide layer and the release layer, so that the release layer and the release layer The adhesion of the support carrier is greater than the adhesion of the polyimide layer to the release layer, and the polyimide layer can be peeled off from the release layer, and the release layer is still attached to the support carrier. on.

10‧‧‧支撐載體 10‧‧‧Support carrier

12‧‧‧離型層 12‧‧‧ release layer

14‧‧‧聚醯亞胺層 14‧‧‧ Polyimine layer

16‧‧‧接著劑 16‧‧‧Adhesive

18‧‧‧離型劑 18‧‧‧ Release agent

第1圖係本創作可離型之軟性基板的剖視圖。 Figure 1 is a cross-sectional view of a flexible substrate that can be dispensed.

第2圖係本創作可離型之軟性基板製造方法的第一示意圖。 Fig. 2 is a first schematic view showing a method of manufacturing a flexible substrate which can be released.

第3圖係本創作可離型之軟性基板製造方法的第二示意。 Fig. 3 is a second schematic view showing a method of manufacturing a flexible substrate which can be released.

第4圖係本創作可離型之軟性基板製造方法的第三示意。 Fig. 4 is a third schematic view showing a method of manufacturing a flexible substrate which can be released.

本創作可離型之軟性基板剖視圖,其包括有一支撐載體10、離型層12及一聚醯亞胺層14。 The present invention provides a cross-sectional view of a flexible substrate that includes a support carrier 10, a release layer 12, and a polyimide layer 14.

支撐載體10可為玻璃或金屬或矽晶圓。 The support carrier 10 can be a glass or metal or germanium wafer.

離型層12,係附著於該支撐載體上,其包括構成該離型層主結構之聚醯亞胺、接著劑16及離型劑18。 The release layer 12 is attached to the support carrier and comprises a polyimide, an adhesive 16 and a release agent 18 which form the main structure of the release layer.

該聚醯亞胺係由二胺及二酐反應而成,於實施例中,該二胺單體可為4,4'-二胺基二苯醚(4,4'-oxydianiline(4,4'-ODA))、對苯二胺(phenylenediamine(p-PDA))、2,2’-雙(三氟甲基)聯苯胺(2,2'-Bis(trifluoromethyl)benzidine(TFMB))、1,3-雙(4'-胺基苯氧基)苯(1,3-bis(4-aminophenoxy)benzene(TPER))、1,4-雙(4-胺基苯氧基)苯(1,4-bis(4-aminophenoxy)benzene(TPEQ))、4,4’-二胺基-2,2’-二甲基-1,1’-聯苯(2,2'-dimethyl[1,1'-biphenyl]-4,4'-diamine(m-TB-HG))、1,3-雙(3-胺基苯氧基)苯(1,3’-Bis(3-aminophenoxy)benzene(APBN))、3,5-二胺基三氟甲苯(3,5-Diaminobenzotrifluoride(DABTF))、2,2'-雙[4-(4-胺基苯氧基苯基)]丙烷(2,2'-bis[4-(4-aminophenoxy)phenyl]propane(BAPP))、6-胺基-2-(4-胺基苯基)-苯并噁唑(6-amino-2-(4-aminophenyl)benzoxazole(6PBOA))、5-胺基-2-(4-胺基苯基)-苯并噁唑(5-amino-2-(4-aminophenyl)benzoxazole(5PBOA))等,可單獨使用或組合使用。 The polyimine is formed by reacting a diamine and a dianhydride. In the embodiment, the diamine monomer may be 4,4'-diaminodiphenyl ether (4,4'-oxydianiline (4,4). '-ODA)), phenylenediamine (p-PDA), 2,2'-Bis (trifluoromethyl)benzidine (TFMB), 1 , 3-bis(4-aminophenoxy)benzene (TPER), 1,4-bis(4-aminophenoxy)benzene (1, 4-bis(4-aminophenoxy)benzene(TPEQ)), 4,4'-diamino-2,2'-dimethyl-1,1'-biphenyl (2,2'-dimethyl[1,1 '-biphenyl]-4,4'-diamine(m-TB-HG)), 1,3-bis(3-aminophenoxy)benzene (1,3'-Bis(3-aminophenoxy)benzene (APBN )), 3,5-Diaminobenzotrifluoride (DABTF), 2,2'-bis[4-(4-aminophenoxyphenyl)]propane (2,2) '-bis[4-(4-aminophenoxy)phenyl]propane (BAPP)), 6-amino-2-(4-aminophenyl)-benzoxazole (6-amino-2-(4-aminophenyl) ) benzoxazole (6PBOA)), 5-amino-2-(4-aminophenyl)benzoxazole (5PBOA), etc., may be used alone or Used in combination.

於實施例中,該二酐單體可為3,3',4,4'-聯苯四羧酸二酸酐(3,3',4,4'-biphenyltetracarboxylic dianhydride(BPDA))、2,2-雙[4-(3,4-二羧基苯氧基)苯基]丙烷二酸酐(2,2-bis[4-(3,4dicarboxyphenoxy)phenyl]propane dianhydride(BPADA))、均苯四甲酸二酸酐(pyromellitic dianhydride(PMDA))、4,4'-(六氟異丙烯)二酞酸酐(2,2'-Bis-(3,4-Dicarboxyphenyl)hexafluoropropane dianhydride(6FDA))、二苯醚四甲酸二酸酐 (4,4-Oxydiphthalic anhydride(ODPA))、苯酮四羧酸二酸酐(Benzophenonetetracarboxylic dianhydride(BTDA))、3,3',4,4'-二環己基四甲酸二酐(3,3',4,4'-dicyclohexyltetracarboxylic acid dianhydride(HBPDA)等,可單獨使用或組合使用。 In an embodiment, the dianhydride monomer may be 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), 2,2 -2[2-(3,4-dicarboxyphenoxy)phenyl]propane dianhydride (2,2-bis[4-(3,4dicarboxyphenoxy)phenyl]propane dianhydride (BPADA)), pyromellitic acid II Pyromellitic dianhydride (PMDA), 4,4'-Bis-(3,4-Dicarboxyphenyl)hexafluoropropane dianhydride (6FDA), diphenyl ether tetracarboxylic acid Diacid anhydride (4,4-Oxydiphthalic anhydride (ODPA)), Benzophenone tetracarboxylic dianhydride (BTDA), 3,3',4,4'-dicyclohexyltetracarboxylic dianhydride (3,3', 4,4'-dicyclohexyltetracarboxylic acid dianhydride (HBPDA), etc., may be used singly or in combination.

接著劑16為矽烷化合物,其佔離型層12總重量1-10wt%,用以提高離型層12與支撐載體10之附著力,其附著力以百格刀進行接著強度測試,呈現出5B代表值(5B:切口的邊緣完全光滑,格子邊緣沒有任何剝落),詳細百格刀接著強度測試如后說明。 The adhesive agent 16 is a decane compound, which accounts for 1-10% by weight of the total weight of the release layer 12, for improving the adhesion of the release layer 12 and the support carrier 10. The adhesion is tested by the strength test with a hundred-square knife, showing 5B. Representative value (5B: the edge of the slit is completely smooth, and the edge of the lattice is not peeled off). The detailed 100-gauge knife strength test is described later.

離型劑18可為含氟填充物,其佔離型層12總重量5-45wt%,或可為含矽氧烷填充物,其佔離型層12總重量5-45wt%。 The release agent 18 can be a fluorine-containing filler which is 5 to 45 wt% based on the total weight of the release layer 12, or can be a hafnoid-containing filler which is 5 to 45 wt% based on the total weight of the release layer 12.

聚醯亞胺層14,係由二胺及二酐反應而成、其係附著於離型層12上,其中,離型劑18用以提高聚醯亞胺層14與離型層12之離型力,使其剝離強度小於0.1kgf/cm,使聚醯亞胺層14可自離型層12上剝離,而離型層12與支撐載體10之附著度大於聚醯亞胺層14與離型層12之附著度,而可使聚醯亞胺層14可自離型層12上剝離,而離型層12仍附著於支撐載體10上,使離型層12可重複使用,以降低生產成本。 The polyimine layer 14 is formed by reacting a diamine and a dianhydride, and is attached to the release layer 12, wherein the release agent 18 is used to increase the distance between the polyimide layer 14 and the release layer 12. The force is such that the peel strength is less than 0.1 kgf/cm, so that the polyimide layer 14 can be peeled off from the release layer 12, and the adhesion of the release layer 12 to the support carrier 10 is greater than that of the polyimide layer 14 and The adhesion of the layer 12 allows the polyimide layer 14 to be peeled off the release layer 12, while the release layer 12 remains attached to the support carrier 10, allowing the release layer 12 to be reused to reduce production. cost.

於實施例中,聚醯亞胺層可使用與該支撐載體10完全相同、部分相同、或不同之單體。 In embodiments, the polyimine layer may use the same, partially identical, or different monomers as the support carrier 10.

於實施例中,本創作可離型之軟性基板製造方法,請參閱第2-4圖,其包括下列步驟:提供一支撐載體10,製備一第一聚醯胺酸溶液,其係由二胺單體及二酐單體反應完成後添加接著劑16及離型劑18,將第一聚醯胺酸溶液塗佈於支撐載體10上,以形成一離型層12;製備一第二聚醯 胺酸溶液,其係由二胺單體及二酐單體反應完成,將其塗佈於該離型層12上,以令聚醯胺酸溶液烤乾成聚醯亞胺層。 In an embodiment, the present invention can be used to fabricate a flexible substrate manufacturing method. Please refer to FIGS. 2-4, which includes the following steps: providing a support carrier 10 to prepare a first polyaminic acid solution, which is composed of a diamine. After the reaction of the monomer and the dianhydride monomer is completed, the adhesive 16 and the release agent 18 are added, and the first polyaminic acid solution is coated on the support carrier 10 to form a release layer 12; An amine acid solution, which is prepared by reacting a diamine monomer and a dianhydride monomer, is applied to the release layer 12 to dry the polyamic acid solution into a polyimine layer.

本創作可離型之軟性基板製造方法可利用熱轉化或化學轉化的方式形成。若採用化學轉化的方式,則於塗佈步驟前,可將脫水劑及催化劑添加至聚醯胺酸溶液中。前述所使用之溶劑、脫水劑及催化劑均可為本技術領域習知者。該溶劑可為非質子性極性溶劑,例如二甲基乙醯胺(DMAC)、N,N'-二甲基甲醯胺(DMF)、N-甲基吡咯啶酮(NMP)、二甲亞碸(DMSO)、四甲基碸、N,N'-二甲基-N,N'-丙烯基脲(DMPU)等。該脫水劑可為脂肪族酸酐(如醋酸酐及丙酸酐)、芳香族酸酐(如苯酸酐及鄰苯二甲酸酐)等。該催化劑可為雜環三級胺(例如甲吡啶(picoline)、吡啶等)、脂肪族三級胺(例如三乙基胺(TEA)等)、芳香族三級胺(例如二甲苯胺等)等。聚醯胺酸:脫水劑:催化劑之莫耳比為1:2:1,即對每莫耳之聚醯胺酸,使用約2莫耳之脫水劑及約1莫耳之催化劑。 The flexible substrate manufacturing method of the present invention can be formed by thermal conversion or chemical conversion. If chemical conversion is employed, the dehydrating agent and catalyst can be added to the polyaminic acid solution prior to the coating step. The solvent, dehydrating agent and catalyst used in the foregoing may be those skilled in the art. The solvent may be an aprotic polar solvent such as dimethylacetamide (DMAC), N,N'-dimethylformamide (DMF), N-methylpyrrolidone (NMP), dimethylene碸 (DMSO), tetramethyl hydrazine, N, N'-dimethyl-N, N'-propenyl urea (DMPU), and the like. The dehydrating agent may be an aliphatic acid anhydride (such as acetic anhydride and propionic anhydride), an aromatic acid anhydride (such as phthalic anhydride and phthalic anhydride), or the like. The catalyst may be a heterocyclic tertiary amine (such as picoline, pyridine, etc.), an aliphatic tertiary amine (such as triethylamine (TEA), etc.), an aromatic tertiary amine (such as xylylene, etc.). Wait. Polylysine: Dehydrating agent: The catalyst has a molar ratio of 1:2:1, i.e., about 2 moles of dehydrating agent and about 1 mole of catalyst per mole of polyamic acid.

於本創作中,由二胺單體及二酐單體經縮合反應而形成聚醯亞胺,且該二胺與該二酐以約為等莫耳之比例(1:1)進行反應,例如0.9:1.1、或0.98:1.02。 In the present invention, a diamine monomer and a dianhydride monomer are subjected to a condensation reaction to form a polyimine, and the diamine and the dianhydride are reacted at a ratio of about equimolar (1:1), for example, 0.9: 1.1, or 0.98: 1.02.

構成該基底層主結構之聚醯亞胺及聚醯亞胺層之聚醯亞胺並未特別限制。 The polyimine of the polyimine and the polyimide layer constituting the main structure of the underlayer is not particularly limited.

以下實施例詳述本創作。 The following examples detail the creation.

實施例1Example 1

製備本創作可離型之軟性基板。 The soft substrate which can be separated from the creation is prepared.

<實施例1><Example 1>

第一聚醯胺酸溶液製備Preparation of first polyaminic acid solution

將52.63克之ODA與溶劑440克之DMAc置入三頸瓶中,待其攪拌至完全溶解後加入57.4克之PMDA,其中,單體佔反應溶液總重之20wt%。接著,於25℃持續攪拌並反應25個小時,反應完後加入1wt%的矽烷化合物及20wt%的含氟填充物,即可得到第一聚醯胺酸溶液。 52.63 g of ODA and 440 g of DMAc of the solvent were placed in a three-necked flask, and after stirring until completely dissolved, 57.4 g of PMDA was added, wherein the monomer accounted for 20 wt% of the total weight of the reaction solution. Then, stirring was continued at 25 ° C for 25 hours. After the reaction, 1 wt% of a decane compound and 20 wt% of a fluorine-containing filler were added to obtain a first polyaminic acid solution.

第二聚醯胺酸溶液製備Preparation of second polyaminic acid solution

將71.67克之TFMB與溶劑412.5克之DMAc置入三頸瓶中,待其攪拌至完全溶解後加入65.84克之BPDA,其中,單體佔反應溶液總重之25wt%。接著,於25℃持續攪拌並反應25個小時,即可得到第二聚醯胺酸溶液。 71.67 g of TFMB and 412.5 g of DMAc of the solvent were placed in a three-necked flask, and after stirring until completely dissolved, 65.84 g of BPDA was added, wherein the monomer accounted for 25 wt% of the total weight of the reaction solution. Then, stirring was continued at 25 ° C for 25 hours to obtain a second polyaminic acid solution.

聚醯亞胺層製備Polyimine layer preparation

將所獲第一聚醯胺酸溶液塗佈於玻璃基板上,並放入80℃的烘箱內加熱約30分鐘,以移除大部份的溶劑,而後將上述塗有第一聚醯胺酸溶液之玻璃基板放入170℃~370℃的烘箱內,加熱約4小時,即形成離型層。將第二聚醯胺酸溶液塗佈於該離型層上,並放入80℃烘箱內加熱約30分鐘,而後將塗有第二聚醯胺酸溶液之玻璃基板放入170℃~370℃的烘箱內,加熱約4小時,以令聚醯胺酸溶液烤乾成聚醯亞胺層。該聚醯亞胺層與該離型層上之剝離強度為小於0.1kgf/cm,可使聚醯亞胺層14自離型層12上剝離。離型層12與之支撐載體10之接著強度測試為5B。 The obtained first polyaminic acid solution was coated on a glass substrate and heated in an oven at 80 ° C for about 30 minutes to remove most of the solvent, and then the first polylysine was coated thereon. The glass substrate of the solution was placed in an oven at 170 ° C to 370 ° C and heated for about 4 hours to form a release layer. Applying a second polyaminic acid solution to the release layer, and heating in an oven at 80 ° C for about 30 minutes, and then placing the glass substrate coated with the second polyaminic acid solution at 170 ° C to 370 ° C The oven was heated for about 4 hours to allow the polyamic acid solution to be dried to form a polyimide layer. The peel strength of the polyimide layer and the release layer is less than 0.1 kgf/cm, and the polyimide layer 14 can be peeled off from the release layer 12. The adhesion strength test of the release layer 12 with the support carrier 10 was 5B.

接著強度測試Strength test

使用百格刀進行接著強度測試,測試方法如下。準備長5cm,寬5cm之聚醯亞胺膜,用百格刮刀,刀角尖在塗裝面切出十字格子 圖形,切口直至基材,在中間四方型成100小格,每格長1mm,寬1mm。接著使用刷子將塗裝面以對角線方向各刷五次,將塗裝面及剮凹表面輕輕清除乾淨。最後用標準膠帶(3M的Transparent Tape 600或610),黏在100小格表面,用橡皮擦一端(例如使用一端有橡皮擦之鉛筆)按壓表面,使膠帶完全密合平整,瞬間以180°方式撕拉膠帶。判定方法則使用ASTM D3359-95,5B:切口的邊緣完全光滑,格子邊緣沒有任何剝落。4B:在切口的相交處有小片剝落,劃格區內實際破損5%。3B:切口的邊緣和/或相交處有被剝落,其面積大於5%~15%。2B:沿切口邊緣有部分剝落或整大片剝落,或部分格子被整片剝落。剝落的面積超過15%~35%。1B:切口邊緣大片剝落/或者一些方格部分部分或全部剝落,其面積大於劃格區的35%~65%。0B:在劃線的邊緣及交叉點處有成片的油漆脫落,且脫落總面積大於65%。在本發明中,則定義5B為接著強度基本要求。 The adhesion strength test was performed using a hex cutter, and the test method was as follows. Prepare a polythene film with a length of 5cm and a width of 5cm. Cut a cross-grid pattern on the coating surface with a squeegee and a knife tip. The incision is made up to the base material. In the middle square shape, it is 100 small cells, each length is 1mm. 1mm wide. Then use a brush to brush the painted surface five times in a diagonal direction to gently clean the painted surface and the concave surface. Finally, use standard tape (3M Transparent Tape 600 or 610), stick to the surface of 100 small cells, and press the surface with one end of the eraser (for example, using a pencil with an eraser at one end) to make the tape completely close and flat, in an instant 180°. Tear off the tape. The method of determination uses ASTM D3359-95, 5B: the edges of the slits are completely smooth and the edges of the lattice are free of any peeling. 4B: There is a small piece of peeling at the intersection of the incisions, and the actual damage in the cross-cut area 5%. 3B: The edges and/or intersections of the incisions are peeled off, and the area is greater than 5% to 15%. 2B: Partial peeling or peeling off along the edge of the slit, or part of the lattice is peeled off. The area of peeling is more than 15% to 35%. 1B: Large pieces of the edge of the slit are peeled off or some of the square parts are partially or completely peeled off, and the area is larger than 35% to 65% of the cross-cut area. 0B: There is a piece of paint peeling off at the edge and intersection of the line, and the total area of shedding is greater than 65%. In the present invention, the definition 5B is the basic requirement of the strength.

實施例2Example 2

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為5wt%矽烷化合物及20wt%含氟填充物。 The procedure of Example 1 was repeated except that the components of the first polyaminic acid solution were changed to 5 wt% decane compound and 20 wt% fluorine-containing filler.

實施例3Example 3

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為5wt%矽烷化合物及5wt%含氟填充物。 The procedure of Example 1 was repeated except that the components of the first polyamic acid solution were changed to 5 wt% decane compound and 5 wt% fluorine-containing filler.

實施例4Example 4

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為5wt%矽烷化合物及45wt%含氟填充物。 The procedure of Example 1 was repeated except that the components of the first polyamic acid solution were changed to 5 wt% decane compound and 45 wt% fluorine-containing filler.

實施例5Example 5

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為5wt%矽烷化合物及5wt%矽氧烷填充物。 The procedure of Example 1 was repeated except that the components of the first polyaminic acid solution were changed to 5 wt% decane compound and 5 wt% decane alkane filler.

實施例6Example 6

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為5wt%矽烷化合物及20wt%矽氧烷填充物。 The procedure of Example 1 was repeated except that the components of the first polyamidonic acid solution were changed to 5 wt% decane compound and 20 wt% decane alkane filler.

實施例7Example 7

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為5wt%矽烷化合物及45wt%矽氧烷填充物。 The procedure of Example 1 was repeated except that the components of the first polyaminic acid solution were changed to 5 wt% decane compound and 45 wt% decane alkane filler.

實施例8Example 8

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為5wt%矽烷化合物及20wt%含氟填充物。 The procedure of Example 1 was repeated except that the components of the first polyaminic acid solution were changed to 5 wt% decane compound and 20 wt% fluorine-containing filler.

比較例1Comparative example 1

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改無添加矽烷化合物及4wt%含氟填充物。 The procedure of Example 1 was repeated except that the components of the first polyamic acid solution were changed without the addition of a decane compound and a 4 wt% fluorine-containing filler.

比較例2Comparative example 2

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為1wt%矽烷化合物及4wt%矽氧烷填充物。 The procedure of Example 1 was repeated except that the components of the first polyamic acid solution were changed to 1 wt% decane compound and 4 wt% decane alkane filler.

比較例3Comparative example 3

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為15wt%矽烷化合物及20wt%矽氧烷填充物。 The procedure of Example 1 was repeated except that the components of the first polyamic acid solution were changed to 15 wt% decane compound and 20 wt% decane alkane filler.

比較例4Comparative example 4

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為添加5wt%矽烷化合物及50wt%矽氧烷填充物。 The procedure of Example 1 was repeated, except that the components of the first polyamidonic acid solution were changed to add 5 wt% of a decane compound and 50 wt% of a decane alkane filler.

比較例5Comparative Example 5

重複實施例1之步驟,但第一聚醯胺酸溶液各成分改為添加5wt%矽烷化合物及50wt%含氟填充物。 The procedure of Example 1 was repeated except that the components of the first polyaminic acid solution were changed to add 5 wt% of a decane compound and 50 wt% of a fluorine-containing filler.

剝離強度測試:使用萬能材料試驗機(Hounsfield H10ks)依據IPC-TM650 2.4.9方式測量。 Peel strength test: measured using a universal material testing machine (Hounsfield H10ks) according to IPC-TM650 2.4.9.

接著強度與剝離性測試結果如下表所示 Then the strength and peelability test results are shown in the table below.

上述特定實施例之內容係為了詳細說明本創作,然而,該等實施例係僅用於說明,並非意欲限制本創作。熟習本領域之技藝者可理解,在不悖離後附申請專利範圍所界定之範疇下針對本創作所進行之各種變化或修改係落入本創作之一部分。 The above specific embodiments are intended to describe the present invention in detail, however, these embodiments are for illustrative purposes only and are not intended to limit the present invention. It will be understood by those skilled in the art that various changes or modifications to the present invention are within the scope of the present invention without departing from the scope of the appended claims.

10‧‧‧支撐載體 10‧‧‧Support carrier

12‧‧‧離型層 12‧‧‧ release layer

14‧‧‧聚醯亞胺層 14‧‧‧ Polyimine layer

16‧‧‧接著劑 16‧‧‧Adhesive

18‧‧‧離型劑 18‧‧‧ Release agent

Claims (6)

一種可離型之軟性基板,係包括:一支撐載體;一離型層,係附著於該支撐載體上,其包括構成該離型層主結構之聚醯亞胺、接著劑及離型劑,該聚醯亞胺係由二胺及二酐反應而成,該接著劑用以提高該離型層與該支撐載體之附著力;一聚醯亞胺層,係由二胺及二酐反應而成,其係附著於該離型層上,其中,該離型劑用以提高該聚醯亞胺層與該離型層之離型力,使該離型層與支撐載體之附著度大於該聚醯亞胺層與該離型層之附著度,而可使該聚醯亞胺層可自該離型層上剝離,而該離型層仍附著於該支撐載體上。 A detachable flexible substrate comprising: a support carrier; a release layer attached to the support carrier, comprising a polyimine, an adhesive and a release agent constituting the main structure of the release layer, The polyimide is formed by reacting a diamine and a dianhydride, the adhesive is used to improve the adhesion of the release layer to the support carrier; and the polyimine layer is reacted by a diamine and a dianhydride. The release agent is attached to the release layer, wherein the release agent is used to increase the release force of the polyimide layer and the release layer, so that the adhesion of the release layer to the support carrier is greater than The adhesion of the polyimide layer to the release layer allows the polyimide layer to be peeled off from the release layer while the release layer remains attached to the support carrier. 如申請專利範圍第1項所述之可離型之軟性基板,其中,該支撐載體可為玻璃或金屬或矽晶圓。 The detachable flexible substrate of claim 1, wherein the support carrier is a glass or a metal or germanium wafer. 如申請專利範圍第1項所述之可離型之軟性基板,其中,該離型劑為含氟填充物,其佔該離型層總重量5~45wt%,該接著劑為矽烷化合物,其佔該離型層總重量1~10wt%。 The detachable flexible substrate according to claim 1, wherein the release agent is a fluorine-containing filler, which accounts for 5 to 45 wt% of the total weight of the release layer, and the adhesive is a decane compound. It accounts for 1~10wt% of the total weight of the release layer. 如申請專利範圍第1項所述之可離型之軟性基板,其中,該離型劑為矽氧烷填充物,該含矽氧烷填充物佔該離型層總重量5~45wt%,該接著劑為矽烷化合物,其佔該離型層總重量1~10wt%。 The detachable flexible substrate according to claim 1, wherein the release agent is a decane-filled filler, and the siloxane-containing filler comprises 5 to 45 wt% of the total weight of the release layer. The subsequent agent is a decane compound which accounts for 1 to 10% by weight based on the total weight of the release layer. 如申請專利範圍第1項所述之可離型之軟性基板,其中,該聚醯亞胺層係由選自4,4'-二胺基二苯醚(4,4'-ODA)、對苯二胺(p-PDA)、2,2’-雙(三氟甲基)聯苯胺(TFMB)所成群組之二胺及選自由均苯四甲酸二酐 (PMDA)、3,3',4,4'-聯苯四羧酸二酐(BPDA)、2,2-雙[4-(3,4-二羧基苯氧基)苯基]丙烷二酐(BPADA)所成群組之二酐反應而得。 The detachable flexible substrate according to claim 1, wherein the polyimine layer is selected from the group consisting of 4,4'-diaminodiphenyl ether (4,4'-ODA), a diamine in the group consisting of phenylenediamine (p-PDA) and 2,2'-bis(trifluoromethyl)benzidine (TFMB) and selected from pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), 2,2-bis[4-(3,4-dicarboxyphenoxy)phenyl]propane dianhydride (BPADA) is obtained by reacting a group of dianhydrides. 如申請專利範圍第1項所述之可離型之軟性基板,其中,構成該離型層主結構之該聚醯亞胺係由選自4,4'-二胺基二苯醚(4,4'-ODA)、對苯二胺(p-PDA)、2,2’-雙(三氟甲基)聯苯胺(TFMB)所成群組之二胺及選自由均苯四甲酸二酐(PMDA)、3,3',4,4'-聯苯四羧酸二酐(BPDA)、2,2-雙[4-(3,4-二羧基苯氧基)苯基]丙烷二酐(BPADA)所成群組之二酐反應而得。 The detachable flexible substrate according to claim 1, wherein the polyimine constituting the main structure of the release layer is selected from the group consisting of 4,4'-diaminodiphenyl ether (4, 4'-ODA), diamines in the group consisting of p-phenylenediamine (p-PDA), 2,2'-bis(trifluoromethyl)benzidine (TFMB), and selected from pyromellitic dianhydride ( PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), 2,2-bis[4-(3,4-dicarboxyphenoxy)phenyl]propane dianhydride ( BPADA) is obtained by reacting a group of dianhydrides.
TW105211769U 2016-08-04 2016-08-04 De-bonding type flexible substrate TWM536829U (en)

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