TWM525355U - One-to-many resist recovery system - Google Patents

Description

One-to-many photoresist recycling system

The present invention relates to a photoresist recovery system, and more particularly to a one-to-many photoresist recovery system.

The conventional photoresist recycling system is based on a production line corresponding to a recycling bin and a processing device. After each type of photoresist is used, the entire recycling system needs to be cleaned. With the market demand for small and medium-sized panels and small quantities. Increasing, the panel manufacturer's production schedule begins to produce a variety of panels on the same production line. Since the photoresists used in each panel are different, it is necessary to clean the entire recycling system with a diluent before making different panels. And after the cleaning is completed, use the new liquid to fill the new liquid tank, the recovery tank and the new liquid tank in the system to the supply tank, and supply the pipeline between the barrel and the machine, and use the new liquid to produce the estimated number of pieces. The panel (about 120 pieces), the initial recovery photoresist after the initial production of the new liquid may contain the last recycled photoresist, so it will not be recycled, directly treated as waste, until the entire recycling system The proportion and viscosity of the photo-resistance liquid can be stabilized until the recovery operation is started. However, this not only causes the recovery rate of the recovery system to drop significantly, but also the production. The initial recovery photoresist produced by the panel using the new liquid to produce the estimated number of sheets must be directly treated as waste liquid, causing unnecessary waste, and greatly increasing the manufacturing cost. Therefore, it is necessary to improve the use of the photoresist recovery system. A photoresist recycling system that improves efficiency, improves overall system utilization, and reduces manufacturing costs.

The present invention provides a one-to-many photoresist recovery system, the main purpose of which is to provide a photoresist recovery system capable of improving the use efficiency, overall utilization rate and manufacturing cost of the photoresist recovery system.

To achieve the foregoing objectives, the present invention provides a one-to-many photoresist recovery system for communicating with a machine, including:

a multi-directional communication controller is connected to the machine, and the multi-directional communication controller is configured to control the flow direction of the photoresist liquid;

a plurality of recovery barrels connected to the multi-directional communication controller, wherein each of the recovery barrels and the multi-directional communication controller respectively have a recovery pipeline for placing the recovered photoresist liquid;

a regeneration barrel is connected to the recycling barrels, and the regeneration barrel and each of the recycling barrels respectively have a regeneration pipeline for receiving the recovered photoresist liquid and adjusting it to an ideal viscosity;

a dilution tank communicating with the multi-directional communication controller, the recovery barrels, and the regeneration barrel, the dilution barrel and the recovery barrel having a dilution line, and the dilution barrel and the multi-directional communication controller have a recovery storage cleaning pipeline, the dilution drum and the regeneration bucket have an adjustment cleaning pipeline for providing different dilution liquids according to different photoresist requirements;

A new liquid tank is connected to the regeneration tank, and a new liquid line is provided between the new liquid barrel and the regeneration barrel, and the new liquid barrel is used to provide different new photoresist liquids according to different photoresist requirements:

a supply tank, which is in communication with the regeneration tank, the dilution tank, the new liquid tank and the machine table, and a cleaning pipeline between the supply tank and the dilution tank, and a supply between the supply barrel and the regeneration barrel a delivery line, a second delivery line between the supply barrel and the machine, and a second new liquid line between the supply barrel and the new liquid tank, the supply barrel is mainly used for supplying recycled light Blocking or supplying new photoresist to the machine via the new night bucket;

a waste liquid tank connected to the multi-directional communication controller, the recovery barrels, the regeneration barrel and the supply barrel, wherein the waste liquid barrel and each of the recovery barrels respectively have a discharge line, and the waste liquid barrel The multi-directional communication controller has a first waste liquid pipeline between the waste liquid tank and the regeneration bucket, and a second waste liquid pipeline between the waste liquid tank and the supply bucket A waste liquid line for receiving the discharged waste photo-resistance liquid.

Preferably, the number of the recycling barrels is three, and the three recycling barrels are respectively a first recycling barrel, a second recycling barrel, and a third recycling barrel:

The recovery line between the first recovery barrel and the multi-directional communication controller is a first recovery line, and the regeneration line between the first recovery barrel and the regeneration barrel is a first regeneration line. The dilution pipeline between the first recovery tank and the dilution tank is a first dilution pipeline, and the discharge pipeline between the first recovery tank and the waste liquid tank is a first discharge pipeline;

The recovery line between the second recovery barrel and the multi-directional communication controller is a second recovery line, and the regeneration line between the second recovery barrel and the regeneration barrel is a second regeneration line. The dilution pipeline between the second recovery tank and the dilution tank is a second dilution pipeline, and the discharge pipeline between the first recovery tank and the waste liquid tank is a second discharge pipeline;

The recovery line between the third recovery barrel and the multi-directional communication controller is a third recovery line, and the regeneration line between the third recovery barrel and the regeneration barrel is a third regeneration line. The dilution pipeline between the third recovery tank and the dilution tank is a third dilution pipeline, and the discharge pipeline between the third recovery tank and the waste liquid tank is a third discharge pipeline;

Preferably, the first recovery tank, the first recovery pipeline, the first regeneration pipeline, the first dilution pipeline and the first discharge pipeline are collectively referred to as a first recovery storage device; a recovery tank, the second recovery line, the second regeneration line, and the second dilution line, the second discharge line is collectively referred to as a second recovery storage device; the third recovery barrel, the third recovery The pipeline, the third regeneration pipeline, and the third dilution pipeline are collectively referred to as a third recovery storage device.

It can be seen from the foregoing that the novel one-to-multiple photoresist recovery system mainly utilizes the multi-directional communication controller and the plurality of recycling barrels, so that the manufacturer can make a single type of photoresist when using different photoresists to produce different panels. The liquid is matched with one of the recovery tanks, so that the first recovery storage device, the second recovery storage device and the third recovery storage device are mutually separated and independent, so that the one-to-multiple photoresist recovery system can be used before producing different panels Except for cleaning the entire system, it is only necessary to sequentially clean the first recovery storage device, the second recovery storage device and the third recovery storage device, and the first recovery step, the second recovery step and the The three recovery steps are simultaneously recovered and then sequentially cleaned and used. The time sequence can be simultaneously or sequentially, and the initial recovery of the photoresist produced by using the new liquid to produce the estimated number of sheets is eliminated, so that the light in the recovery system is recovered. The step of blocking the liquid and the viscosity to reach the level of normal operation, thereby achieving an improvement in the use efficiency, overall utilization rate and reduction of the photoresist recovery system Causing recovery system of the present object of the photoresist.

To enable your review committee to have a better understanding and understanding of the purpose, characteristics and efficacy of this new model, please follow the brief description of the following:

The present invention provides a one-to-many photoresist recovery system for communicating with a machine X, as shown in FIG. 1, comprising:

a multi-directional communication controller 10 connected to the machine X, the multi-directional communication controller 10 is configured to control the flow of the photoresist liquid;

A plurality of recovery bins 20 are connected to the multi-directional communication controller 10, and each of the recovery bins 20 and the multi-directional communication controller 10 respectively have a recovery line 12 for collecting the recovered photoresist liquid;

A regeneration tank 30 is connected to the recovery tanks 20, and a regeneration line 32 is respectively disposed between the regeneration barrels 30 and each of the recovery barrels 20, and the regeneration barrels 30 are used for receiving the recovered photoresist liquid and Adjust to the desired viscosity;

A dilution tank 40 is connected to the multi-directional communication controller 10, the recovery tanks 20, and the regeneration tank 30. The dilution tank 40 and the recovery tanks 20 respectively have a dilution pipeline 42 for the dilution tank 40. There is a recovery and storage cleaning line 41 between the multi-directional communication controller 10, and an adjustment cleaning line 43 between the dilution tank 40 and the regeneration barrel 30, and the dilution tank 40 is used according to different photoresist requirements. Provide different dilutions;

a new liquid tank 50 communicating with the regeneration tank 30. The new liquid tank 50 and the regeneration tank 30 have a first new liquid pipeline 53 for differently depending on different photoresist requirements. New photoresist:

A supply tank 60 is connected to the regeneration tank 30, the dilution tank 40, the new liquid tank 50 and the machine table X. The supply tank 60 and the dilution tank 40 have a cleaning pipeline 64 and the supply tank 60. There is a first conveying line 63 between the supply barrel 60 and the machine table X, and a second conveying line 60X between the supply barrel 60 and the new tank 50. a new liquid line 56, the supply tank 60 is mainly used to supply a recovery photoresist or to supply a new photoresist to the machine X via the new liquid tank 50;

a waste liquid tank 70 is connected to the multi-directional communication controller 10, the recovery barrels 20, the regeneration barrel 30 and the supply barrel 60, and a waste tube 70 and each of the recovery barrels 20 respectively have a discharge tube The road 72 has a first waste liquid pipeline 71 between the waste liquid tank 70 and the multi-directional communication controller 10, and a second waste liquid pipeline 73 between the waste liquid tank 70 and the regeneration bucket 30. There is a third waste liquid pipeline 76 between the waste liquid tank 70 and the supply tank 60, and the waste liquid tank 70 is configured to receive the discharged waste light blocking liquid;

a gas supply system Y, which is in communication with the recovery tank 20, the regeneration tank 30, the dilution tank 40, the new liquid tank 50, and the supply tank 60, the gas supply system Y is for supplying gas to the recovery barrels 20. The regeneration bucket 30, the dilution tank 40, the new liquid tank 50 and the supply bucket 60 are air-dried;

a pressure relief system Z, which is connected to the recovery tank 20, the regeneration tank 30, the dilution tank 40, the new liquid tank 50 and the supply tank 60, and the pressure relief system Z is used for the recycling barrels 20, The regeneration drum 30, the dilution tank 40, the new liquid tank 50 and the excess gas in the supply tank 60 are discharged;

a plurality of one-way 筏U, the regeneration pipelines 32, the dilution pipelines 42, the discharge pipelines 72, the recovery storage cleaning pipeline 41, the adjustment cleaning pipeline 43, and the first new fluid pipeline 53. The first delivery line 63, the cleaning line 64, the second new liquid line 56, the second delivery line 60X, the first waste liquid line 71, the second waste liquid line 73, The third waste liquid pipeline 76, the pressure relief system Z and the recovery tanks 20, between the pressure relief system Z and the dilution tank 40, between the pressure relief system Z and the regeneration tank 30, Between the pressure relief system Z and the new liquid tank 50, between the pressure relief system Z and the supply tank 60, between the gas supply system Y and each of the recovery tanks 20, the gas supply system Y and the dilution tank 40 Between the gas supply system Y and the regeneration tank 30, between the gas supply system Y and the new liquid tank 50, and between the gas supply system Y and the supply tank 60, a one-way 筏U is respectively disposed. ;as well as

The plurality of pumps P are provided in the regeneration line 32, the adjustment cleaning line 43, the first delivery line 63, and the second delivery line 60X, respectively.

In the preferred embodiment of the present invention, the number of the recycling bins 20 is three, and the three recycling bins 20 are a first recycling bin 21, a second recycling bin 22, and a third recycling bin 23:

The recovery line 12 between the first recovery tank 21 and the multi-directional communication controller 10 is a first recovery line 121, and the regeneration line 32 between the first recovery barrel 21 and the regeneration barrel 30 is a The first regeneration line 321 , the dilution line 42 between the first recovery barrel 21 and the dilution tank 40 is a first dilution line 421 , and the discharge between the first recovery barrel 21 and the waste liquid tank 70 The pipeline 72 is a first discharge pipeline 721;

The recovery line 12 between the second recovery tank 22 and the multi-directional communication controller 10 is a second recovery line 122, and the regeneration line 32 between the second recovery barrel 22 and the regeneration barrel 30 is a The second regeneration line 322, the dilution line 42 between the second recovery barrel 22 and the dilution tank 40 is a second dilution line 422, and the discharge between the first recovery barrel 21 and the waste liquid tank 70 The pipeline 72 is a second discharge conduit 722;

The recovery line 12 between the third recovery tank 23 and the multi-directional communication controller 10 is a third recovery line 123, and the regeneration line 32 between the third recovery barrel 23 and the regeneration tank 30 is a The third regeneration line 323, the dilution line 42 between the third recovery tank 23 and the dilution tank 40 is a third dilution line 423, and the discharge between the third recovery barrel 23 and the waste liquid tank 70 Line 72 is a third discharge line 723.

Preferably, the first recovery tank 21, the first recovery line 121, the first regeneration line 321, the first dilution line 421 and the first discharge line 721 are collectively referred to as a first recovery storage. Device S1;

The second recovery tank 22, the second recovery line 122, the second regeneration line 322, the second dilution line 422, the second discharge line 722 is collectively referred to as a second recovery storage device S2;

The third recovery tank 23, the third recovery line 123, the third regeneration line 323, and the third dilution line 423 are collectively referred to as a third recovery storage device S3.

The present invention provides a method for controlling a one-to-many photoresist recovery system. In the first embodiment, as shown in FIG. 2, the one-to-multiple photoresist recovery system recovers only two kinds of photoresist liquids, and the one-to-multiple light is recovered. Control methods for the resistance recovery system include:

In the first recycling step A1, the first photoresist liquid is recovered to be stored in the first recovery drum 21, and the first recovered photoresist liquid is sent from the first recovery drum 21 to the regeneration tank 30, and is released from the dilution tank 40. The dilution liquid corresponding to the first photoresist liquid is sent to the regeneration tank 30, and the new photoresist liquid corresponding to the first photoresist liquid is released from the new liquid tank 50 to the regeneration barrel 30, and the first type is in the regeneration barrel 30. Recovering the photoresist, the new photoresist, and the diluent for the first liquid mixing and adjusting the viscosity to the desired viscosity, and then transferring the viscosity-adjusted photoresist to the supply tank 60 for use by the machine X;

Partial cleaning step B, before using different photoresists to produce different panels, first output the dilution liquid from the dilution tank 40 to the multi-directional communication controller 10, the supply tank 60, the regeneration barrel 30, the new liquid tank 50, and the adjustment cleaning pipeline. 43. The cleaning line 64, the recovery and storage cleaning line 41, the first new liquid line 53, the second new liquid line 56, the first conveying line 63, and the second conveying line 60X are cleaned and opened first The waste liquid pipeline 71, the second waste liquid pipeline 73 and the third waste liquid pipeline 76 remove the original photoresist liquid, and the waste liquid is discharged into the waste liquid tank 70, and the original part of the recovered photoresist liquid is left in the waste liquid. The first recycling bucket 21 is reserved;

The partial air drying step C is provided by the gas supply system Y to supply the gas to the dilution tank 40, the new liquid tank 50, the supply tank 60, and the regeneration barrel 30 to be air-dried, and then the dilution tank 40, the new liquid tank 50, and the supply by the pressure relief system Z. Excess gas in the barrel 60 and the regeneration tank 30 is discharged;

In the second recovery step A2, the second photoresist liquid is recovered to be stored in the second recovery barrel 22, and the second recovered photoresist liquid is transferred from the second recovery barrel 22 to the regeneration barrel 30, and is released by the dilution tank 40. The second photoresist solution corresponds to the dilution liquid to the regeneration tank 30, the new liquid pressure tank 50 releases a new photoresist liquid corresponding to the second photoresist liquid, and the second recovery photoresist liquid is in the regeneration barrel 30, The new photoresist and the diluent are mixed for the first time and adjusted to the desired viscosity, and then the photoresist after adjusting the viscosity is sent to the supply tank 60 for use by the machine X;

In the total cleaning step D, in each of the storage tanks 21 and 22 in each of the above-mentioned recovery storage devices S1 and S2, a recovery liquid of one specification is stored, and if the recovery liquid of each of the above specifications is repeatedly used, local cleaning can be performed. After the step, the new photoresist is replaced by the multi-directional communication controller 10 to select the corresponding recovery storage devices S1 and S2, and the utility model can be used immediately, without wasting the initial recovery photoresist liquid generated by the estimated number of pieces, if it is necessary to use new When the photoresist is produced, the size of the recovery liquid with the least usage rate in each of the above-mentioned recovery storage devices S1 and S2 can be selected for cleaning, and the new photoresist can be replaced, and other common specifications of the recovery liquid are left, and the replacement liquid is to be completely replaced. When using a new photoresist, to discard the old photoresist, a total cleaning step must be performed, that is, the dilution liquid is output from the dilution tank 40 to the multi-directional communication controller 10, the regeneration tank 30, the new liquid tank 50, the supply tank 60, and the cleaning and cleaning. The pipeline 43, the cleaning pipeline 64, the recovery storage cleaning pipeline 41, the first new liquid pipeline 53, the second new liquid pipeline 56, the first delivery pipeline 63, and the second delivery pipeline 60X are cleaned and opened. First waste liquid pipeline 71, second waste liquid The third waste liquid pipeline 76 of the pipeline 73 is simultaneously cleaned by the first recovery storage device S1 and the second recovery storage device S2, and the original photoresist liquid is removed, and the waste liquid is discharged into the waste liquid tank 70;

In the total air drying step E, the gas supply system supplies gas to the dilution tank 40, the new liquid tank 50, the supply tank 60, the regeneration tank 30, the first recovery barrel 20, and the second recovery barrel 30 to be air-dried, and then the pressure is released. The system discharges the excess gas in the dilution tank 40, the new liquid tank 50, the supply tank 60, the regeneration tank 30, the first recovery tank 20, and the second recovery tank 30.

In the second embodiment, as shown in FIG. 3, the one-to-multi-photoresist recovery system recovers three kinds of photoresist liquids, and the control method of the one-to-multi-photoresist recovery system includes:

The first recovery step A1, the partial cleaning step B, the partial air drying step C, the second recovery step A2, and the like are the same as the pre-recovering two photoresist liquid processes, and the third recovery liquid has a subsequent process. Procedure, including;

Partial cleaning step B, before using different photoresists to produce different panels, first output the dilution liquid from the dilution tank to the multi-directional communication controller 10, the supply tank 60, the regeneration tank 30, the new liquid tank 50, and the adjustment cleaning pipeline 43 The cleaning line 64, the recovery and storage cleaning line 41, the first new liquid line 53, the second new liquid line 56, the first delivery line 63, and the second delivery line 60X are cleaned and the first waste is turned on. The liquid pipeline 71, the second waste liquid pipeline 73 and the third waste liquid pipeline 76 remove the original photoresist liquid, and the waste liquid is discharged into the waste liquid tank 70;

The partial air drying step C is provided by the gas supply system Y to supply the gas to the dilution tank 40, the new liquid tank 50, the supply tank 60, and the regeneration barrel 30 to be air-dried, and then the dilution tank 40, the new liquid tank 50, and the supply by the pressure relief system Z. Excess gas in the barrel 60 and the regeneration tank 30 is discharged;

In the third recovery step A3, the third photoresist liquid is recovered to the third recovery barrel 23 for storage, and the third recovered photoresist liquid is sent from the third recovery barrel 23 to the regeneration barrel 30, and is released from the dilution tank 40. The diluent corresponding to the third photoresist liquid is transferred to the regeneration tank 30, the new photoresist liquid corresponding to the third photoresist liquid is released from the new liquid tank 50, and the third recovered photoresist liquid is regenerated in the regeneration tank 30. , the new photoresist liquid, the diluent is subjected to the first liquid mixing and adjusted to the desired viscosity, and then the photoresist after adjusting the viscosity is sent to the supply tank 60 for use by the machine X;

In the total cleaning step D, the first recovery tank 21, the second recovery tank 22, and the third recovery tank 23 in the first recovery storage device S1, the second recovery storage device S2, and the third recovery storage device S3 are respectively The recovery liquid of one specification is stored. If the recovery liquid of the above specifications is repeatedly used, the partial cleaning step can be performed, and the new photoresist is replaced by the multi-directional communication controller 10 to select the corresponding recovery storage device S1 and S2. , S3, can be used immediately, without wasting the initial recovery of photoresist produced by the estimated number of sheets, if you must use new photoresist production, you can choose the least of the above recycling storage devices S1, S2, S3 The standard of the recovery liquid can be replaced with a new photoresist, leaving the recovery solution of other common specifications. When the new photoresist is to be completely replaced, the total cleaning step D must be performed. The dilution liquid is output from the dilution tank 40 to the multi-directional communication controller 10, the regeneration tank 30, the new liquid tank 50, the supply tank 60, the adjustment cleaning pipeline 43, the cleaning pipeline 64, the recovery storage cleaning pipeline 41, and the first new liquid. Line 53 and second new liquid line 56 The first delivery line 63 and the second delivery line 60X are cleaned, and the first waste liquid line 71, the second waste liquid line 73, and the third waste liquid line 76 are simultaneously cleaned. The first recovery storage device S1, the second recovery storage device S2 and the third recovery storage device S3 remove the original photoresist liquid, and discharge the waste liquid into the waste liquid tank 70;

The total air drying step E provides a gas pair dilution tank 40, a new liquid tank 50, a supply tank 60, a regeneration tank 30, the first recovery tank 20, the second recovery tank 30, and the third recovery tank by the gas supply system Y. 40 is air-dried, and then the pressure reducing system Z removes the dilution tank 40, the new liquid tank 50, the supply tank 60, the regeneration tank 30, the first recovery barrel 20, the second recovery barrel 30, and the third recovery barrel 40. The gas is discharged.

It can be seen from the foregoing that the novel one-to-multiple photoresist recovery system and the control method thereof mainly rely on the cooperation of the multi-directional communication controller 10 and the plurality of recovery barrels 20, so that the operator can produce different panels by using different photoresist liquids. A single type of photoresist liquid is matched with one of the recovery tanks 20, so that the first recovery storage device S1, the second recovery storage device S2, and the third recovery storage device S3 are separated from each other and are independent of each other, so that the one-to-many The photoresist recovery system can avoid cleaning the entire system before producing different panels, and only needs to sequentially clean the first recovery storage device S1, the second recovery storage device S2 and the third recovery storage device S3, or the foregoing The first recovery step A1, the second recovery step A2, and the third recovery step A3 are simultaneously recovered and sequentially used for cleaning, and the time sequence can be simultaneously or sequentially, and more sets of recovery storage devices can be added as the case may be. S, in order to benefit from a small amount of diversification, and to eliminate the initial recovery of photoresist used in the production of the estimated number of panels using the new liquid, and to make the proportion of the photoresist in the recovery system and thick The degree of stability to the normal operation is achieved, thereby achieving a purpose of improving the efficiency of the photoresist recovery system, the overall utilization rate, and the manufacturing cost reduction of the photoresist recovery system.

10‧‧‧Multidirectional controller
12‧‧‧Recycling pipeline
121‧‧‧First recovery line
122‧‧‧Second recovery line
123‧‧‧ Third recovery line
20‧‧‧Recycling bin
21‧‧‧First recycling bin
22‧‧‧Second recycling bin
23‧‧‧ Third recycling bin
30‧‧‧Recycled barrel
32‧‧‧Renewable pipeline
321‧‧‧First regeneration line
322‧‧‧Second regeneration line
323‧‧‧ Third regeneration line
40‧‧‧Dilution bucket
41‧‧‧Recycling storage and cleaning pipeline
42‧‧‧Dilution line
421‧‧‧First dilution line
422‧‧‧Second dilution line
423‧‧‧ Third dilution line
43‧‧‧Adjust the cleaning line
50‧‧‧ new liquid barrel
53‧‧‧First new liquid pipeline
60‧‧‧ supply bucket
63‧‧‧First delivery line
64‧‧‧cleaning pipeline
56‧‧‧Second new fluid pipeline
60X‧‧‧Second conveying line
70‧‧‧Waste tank
71‧‧‧First waste line
72‧‧‧Drainage line
721‧‧‧First discharge line
722‧‧‧Second discharge line
723‧‧‧ Third discharge line
73‧‧‧Second waste line
76‧‧‧ third waste liquid pipeline
S1‧‧‧First recycling storage device
S2‧‧‧Second recovery storage device
S3‧‧‧ third recycling storage device
U‧‧‧ one-way
X‧‧‧ machine
Y‧‧‧ gas supply system
Z‧‧‧ Pressure Relief System
A1‧‧‧First recovery step
A2‧‧‧Second recovery steps
A3‧‧‧ third recovery step
B‧‧‧Local cleaning steps
C‧‧‧Local air drying steps
D‧‧‧General cleaning steps
E‧‧‧ total air drying steps

Figure 1 is a schematic diagram of a novel one-to-multiple photoresist recovery system. Figure 2 is a schematic diagram of the control method of the novel one-to-multiple photoresist recovery system. FIG. 3 is a schematic diagram of a control method of a preferred embodiment of a novel one-to-multiple photoresist recovery system.

10‧‧‧Multidirectional controller

12‧‧‧Recycling pipeline

121‧‧‧First recovery line

122‧‧‧Second recovery line

123‧‧‧ Third recovery line

20‧‧‧Recycling bin

21‧‧‧First recycling bin

22‧‧‧Second recycling bin

23‧‧‧ Third recycling bin

30‧‧‧Recycled barrel

32‧‧‧Renewable pipeline

321‧‧‧First regeneration line

322‧‧‧Second regeneration line

323‧‧‧ Third regeneration line

40‧‧‧Dilution bucket

41‧‧‧Recycling storage and cleaning pipeline

42‧‧‧Dilution line

421‧‧‧First dilution line

422‧‧‧Second dilution line

423‧‧‧ Third dilution line

43‧‧‧Adjust the cleaning line

50‧‧‧ new liquid barrel

53‧‧‧First new liquid pipeline

56‧‧‧Second new fluid pipeline

60‧‧‧ supply bucket

63‧‧‧First delivery line

64‧‧‧cleaning pipeline

60X‧‧‧Second conveying line

70‧‧‧Waste tank

71‧‧‧First waste line

72‧‧‧Drainage line

721‧‧‧First discharge line

722‧‧‧Second discharge line

723‧‧‧ Third discharge line

73‧‧‧Second waste line

76‧‧‧ third waste liquid pipeline

S1‧‧‧First recycling storage device

S2‧‧‧Second recovery storage device

S3‧‧‧ third recycling storage device

U‧‧‧ one-way

X‧‧‧ machine

Y‧‧‧ gas supply system

Z‧‧‧ Pressure Relief System

Claims (6)

A one-to-many photoresist recovery system for communicating with a machine, comprising: a multi-directional communication controller connected to the machine, the multi-directional communication controller is used for controlling the flow of the photoresist liquid; The barrel is connected to the multi-directional communication controller, and each of the recycling barrels and the multi-directional communication controller respectively have a recovery pipeline for arranging the recovered photoresist; a regeneration bucket, and the The recycling barrels are connected to each other, and the regeneration barrel and each of the recycling barrels respectively have a regeneration pipeline for receiving the recovered photoresist liquid and adjusting it to an ideal viscosity; a dilution barrel, and the multi-directional The communication controller, the recycling barrels and the regeneration barrel are connected to each other, and the dilution barrel and the recovery barrel have a dilution pipeline, and the dilution barrel and the multi-directional communication controller have a recovery storage cleaning pipeline. An adjustment cleaning line is provided between the dilution barrel and the regeneration barrel, the dilution barrel is used to provide different dilution liquid according to different photoresist requirements; a new liquid tank is connected with the regeneration barrel, the new liquid barrel and the regeneration barrel Have a first new a new liquid barrel for providing different new photoresist liquids according to different photoresist requirements: a supply tank, which is connected with the regeneration barrel, the dilution tank, the new liquid tank and the machine table, and the supply barrel and the There is a cleaning pipeline between the dilution tanks, a first conveying pipeline between the supply tub and the regeneration tub, and a second conveying pipeline between the supply tub and the machine, the supply tub and the new liquid Between the buckets, there is a second new liquid pipeline, the supply bucket is mainly for supplying the recovery photoresist to the machine; and a waste liquid tank, the multi-directional communication controller, the recycling buckets, the regeneration bucket And the supply bucket is connected, the waste liquid tank and each of the recovery buckets respectively have a discharge pipeline, and the waste liquid bucket and the multi-directional communication controller have a first waste liquid pipeline, the waste liquid bucket There is a second waste liquid pipeline between the waste water tank and the supply tank, and a waste liquid pipeline is provided between the waste liquid tank and the supply tank, and the waste liquid tank is provided to receive the discharged waste light blocking liquid. For example, in the multi-photoresist recycling system described in claim 1, wherein the number of the recycling barrels is three, and the three recycling barrels are respectively a first recycling barrel, a second recycling barrel, and a third Recycling bin: the recycling pipe between the first recycling bin and the multi-directional communication controller is a first recovery pipe, and the regeneration pipe between the first recycling bin and the regenerative drum is a first regeneration pipe a dilution line between the first recovery tank and the dilution tank is a first dilution line, and a discharge line between the first recovery barrel and the waste liquid tank is a first discharge line; The recovery line between the second recovery barrel and the multi-directional communication controller is a second recovery line, and the regeneration line between the second recovery barrel and the regeneration barrel is a second regeneration line, the first The dilute pipeline between the second recovery tank and the dilution tank is a second dilution pipeline, and the discharge pipeline between the first recovery tank and the waste liquid tank is a second discharge pipeline; the third recycling bucket The recovery line between the multi-directional communication controller is a third recovery line, and the third recovery barrel and the regeneration barrel The regenerating pipeline is a third regeneration pipeline, and the dilution pipeline between the third recovery tank and the dilution tank is a third dilution pipeline, and the third recovery tank and the waste liquid tank The discharge line is a third discharge line. The one-to-multi-photoresist recovery system according to claim 1 or 2, further comprising a gas supply system and a pressure relief system, and the recycling barrel, the regeneration barrel, the dilution barrel, The new liquid tank is connected to the supply tank, and the gas supply system is configured to supply gas to perform air drying operation on the recycling barrel, the regeneration barrel, the dilution tank, the new liquid tank and the supply barrel, and the pressure relief system and the pressure relief system The recycling drum, the regeneration drum, the dilution drum, the new liquid tank and the supply barrel are connected, and the pressure relief system is used for the recycling barrel, the regeneration barrel, the dilution barrel, the new liquid tank and the supply Excess gas in the barrel is discharged. The one-to-multi-photoresist recovery system of claim 1 or 2, further comprising a plurality of pumps, the adjustment cleaning pipeline, the first delivery pipeline, the second delivery One pump is set in the pipeline. The one-to-multi-photoresist recovery system of claim 3, further comprising a plurality of one-way rafts, the regeneration pipelines, the dilution pipelines, the discharge pipelines, and the recovery storage cleaning a pipeline, the regulating cleaning pipeline, the first new fluid pipeline, the first conveying pipeline, the cleaning pipeline, the second new fluid pipeline, the second transportation pipeline, the first waste liquid pipeline, the a second waste liquid pipeline, a third waste liquid pipeline, between the pressure relief system and the recovery tanks, between the pressure relief system and the dilution tank, between the pressure relief system and the regeneration bucket, and the discharge a pressure system and the new liquid tank, between the pressure relief system and the supply tank, between the gas supply system and each of the recovery tanks, between the gas supply system and the dilution tank, the gas supply system and the One one-way crucible is disposed between the regeneration tubs, between the gas supply system and the new liquid tub, and between the gas supply system and the supply tub. The one-to-multi-photoresist recovery system of claim 3, wherein the first recovery tank, the first recovery pipeline, the first regeneration pipeline, the first dilution pipeline, and the The first discharge line is collectively referred to as a first recovery storage device; the second recovery tank, the second recovery line, the second regeneration line, the second dilution line, and the second discharge line are collectively referred to Is a second recovery storage device; the third recovery tank, the third recovery pipeline, the third regeneration pipeline, and the third dilution pipeline, the third discharge pipeline is collectively referred to as a third recovery storage device .