TWM511501U - Smart plating rack - Google Patents

Smart plating rack Download PDF

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Publication number
TWM511501U
TWM511501U TW104200499U TW104200499U TWM511501U TW M511501 U TWM511501 U TW M511501U TW 104200499 U TW104200499 U TW 104200499U TW 104200499 U TW104200499 U TW 104200499U TW M511501 U TWM511501 U TW M511501U
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Taiwan
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current
plating
rack
processor
coupled
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TW104200499U
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Chinese (zh)
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jin-kun Guan
Xin-Ji You
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jin-kun Guan
Xin-Ji You
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Priority to TW104200499U priority Critical patent/TWM511501U/en
Publication of TWM511501U publication Critical patent/TWM511501U/en

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Description

智能電鍍掛具 Intelligent plating hanger

一種智能電鍍掛具(Smart Plating Rack),尤指一種在每一個電鍍掛具上,皆獨立設有一個電流調整器,將輸入之DC固定電源依電鍍需求,直接輸出穩定電流至鍍件,使每一鍍件均可取得穩定的最佳電流值之智能掛具。 A smart plating rack (Smart Plating Rack), in particular, a current regulator is provided on each of the plating racks, and the input DC fixed power source directly outputs a steady current to the plated parts according to the plating requirement, so that Each of the plated parts can achieve a stable optimal current value of the smart rack.

按,電鍍製程主要是對鍍件(例如:電路板)表面進行鍍銅或鍍銀等表面處理,其利用一吊掛於導電板上的掛具(Rack),來吊掛電路板至加工槽進行電鍍加工作業。 According to the plating process, the surface of the plated part (for example, the circuit board) is mainly subjected to surface treatment such as copper plating or silver plating, and the rack is suspended from the conductive plate (Rack) to suspend the circuit board to the processing slot. Perform electroplating operations.

圖1及圖2所示,係習用一種電鍍系統80及掛具90之示意圖,其包括一個電鍍槽81、整流器82、陽極桿83、電鍍陽極831、陰極桿84與掛具90,電鍍槽81內裝載有電鍍液,用於對電路板(P)進行電鍍,整流器82之正、負極分別與陽極桿83與陰極桿84電性連接,電鍍陽極831連接於陽極桿83,掛具90連接於陰極桿84,電鍍陽極831與掛具90均設置在電鍍槽81內,整流器82供電後,電鍍陽極831析出之金屬離子在電流作用下沈積鍍覆在該電路板(P)上,此時,該電路板(P)相當於陰極。 1 and 2, a schematic diagram of a plating system 80 and a hanger 90 is used, which includes a plating tank 81, a rectifier 82, an anode rod 83, a plating anode 831, a cathode rod 84 and a hanger 90, and a plating tank 81. The electroplating solution is filled therein for electroplating the circuit board (P). The positive and negative poles of the rectifier 82 are electrically connected to the anode rod 83 and the cathode rod 84, respectively, and the plating anode 831 is connected to the anode rod 83, and the hanger 90 is connected to the anode rod 83. The cathode rod 84, the plating anode 831 and the hanger 90 are both disposed in the plating tank 81. After the rectifier 82 is powered, the metal ions deposited by the plating anode 831 are deposited and plated on the circuit board (P) under the action of current. This board (P) is equivalent to a cathode.

由於電路板(P)之直流電源係藉由掛具90之導電夾91導入,且習用電鍍系統80只有一台整流器82,但同時提供同一電鍍槽81多個掛具90使用(如圖1所示之3組),然因每一個掛具90之電阻,接觸不良等因素,導致不易取得平均分配電流;再者,實際運作之總設定電流不變時,單一台整流器82同時應付多個輸出端A、B、C,各該輸出端A、B、C會相互影響電流,使各組被鍍件所感受該輸出端A、B、C之電流不相同,導致各組之鍍層厚度 產生變異而無法一致,影響電鍍品質。 Since the DC power supply of the circuit board (P) is introduced by the conductive clip 91 of the hanger 90, and the conventional plating system 80 has only one rectifier 82, at the same time, the same plating tank 81 is provided with a plurality of hangers 90 (as shown in FIG. 1). Show 3 groups), but due to the resistance of each hanger 90, poor contact and other factors, it is difficult to obtain the average distribution current; in addition, when the total set current of the actual operation is constant, the single rectifier 82 simultaneously copes with multiple outputs. Terminals A, B, and C, each of the output terminals A, B, and C affect each other, so that the currents of the output terminals A, B, and C are different for each group of plated parts, resulting in coating thickness of each group. Variations occur and cannot be consistent, affecting plating quality.

是以,針對習用電鍍系統以一台整流器控制多個掛具所產生之問題點,為本創作所欲解決之課題。 Therefore, the problem of controlling a plurality of hangers by a rectifier for the conventional plating system is a problem to be solved by the creation.

緣是,本創作之主要目的,係在提供一種智能電鍍掛具,其係在每一個電鍍掛具上皆獨立設有一個電流調整器,將輸入之DC固定電源依電鍍之需求直接輸出穩定電流至鍍件,使每一鍍件均可取得穩定的最佳電流值,以確保電鍍之品質。 The reason is that the main purpose of this creation is to provide an intelligent electroplating hanger, which is provided with a current regulator independently on each electroplating hanger, and the input DC fixed power supply directly outputs a steady current according to the demand of electroplating. To the plated parts, each plated part can obtain a stable optimum current value to ensure the quality of the plating.

本創作之又一目的,則在提供一種智能電鍍掛具,其進一步可以紀錄電鍍過程所用之平均電流等數據,透過無線傳輸方式,把數據回饋至控制中心管理系統,加強電鍍品質控制及方便製程調整等之功效增進。 Another purpose of the creation is to provide an intelligent plating hanger, which can further record the average current and other data used in the electroplating process, and feed the data back to the control center management system through wireless transmission mode, strengthen the electroplating quality control and facilitate the process. The effect of adjustment, etc. is enhanced.

本創作之另一目的,在提供一種智能電鍍掛具,其除了可透過無線傳輸方式,控制每一個掛具的穩定電流輸出之外,亦可透過手動輸入介面,直接由面板上調整及取得電流數據之方便性。 Another purpose of this creation is to provide an intelligent electroplating rack that can control the steady current output of each rack in addition to the wireless transmission mode, and can also directly adjust and obtain current through the panel through the manual input interface. The convenience of the data.

為達上述目的,本創作所採用之技術手段包含:一導電架,係裝設在一電鍍系統之電極板上,並由此處取得DC固定電源;一控制機體,係連接在該導電架上,該控制機體包括:一處理器;一記憶體,係耦接該處理器;一電流調整器,係耦接該處理器,且電性連接該導電架,該電流調整器根據該處理器的控制來輸出穩定的電流;一電流偵測單元,係耦接該處理器及該電流調整器的輸出端;一電流顯示器,係耦接該電流偵測單元,其顯示面係裸露在該控制機體表面,用以顯示輸出電流值;一手動輸入介面,係設在該控制機體表面且耦接該處理器;一第一無線傳輸單元,係耦接該處理器,用以將電鍍過程所獲得的數據,透 過無線傳送方式回饋至一管理系統;以及一掛具(Rack),係連接該控制機體,其上端具有導電板連接該電流輸出端,用以取得經過該電流調整器後的穩定輸出電流,送至該掛具上之鍍件。 In order to achieve the above objectives, the technical means adopted by the present invention comprises: a conductive frame mounted on an electrode plate of an electroplating system, and a DC fixed power source is obtained therefrom; a control body is connected to the conductive frame The control body includes: a processor; a memory coupled to the processor; a current regulator coupled to the processor and electrically connected to the conductive frame, the current regulator according to the processor Controlling to output a stable current; a current detecting unit coupled to the processor and the output of the current regulator; a current display coupled to the current detecting unit, the display surface of which is exposed in the control body a surface for displaying an output current value; a manual input interface is disposed on the surface of the control body and coupled to the processor; a first wireless transmission unit coupled to the processor for obtaining the electroplating process Data The wireless transmission mode is fed back to a management system; and a rack (Rack) is connected to the control body, and the upper end has a conductive plate connected to the current output end for obtaining a stable output current after passing the current regulator, and sending To the plated parts on the hanger.

依據前揭特徵,該掛具(Rack)可由一吊架所構成,該吊架包括在該導電板下方電性連接設有一橫桿及複數個導電夾。 According to the foregoing feature, the rack can be formed by a hanger, and the hanger includes a cross bar and a plurality of conductive clips electrically connected under the conductive plate.

此外,又一可行實施例中,該掛具(Rack)可由一托架所構成,該托架包括在該導電板下方電性連接設有一框體,且框體之任一對邊設有複數個導電夾。 In addition, in another possible embodiment, the rack (Rack) may be formed by a bracket, and the bracket includes a frame electrically connected under the conductive plate, and any pair of sides of the frame are provided with a plurality of frames. Conductive clips.

依據前揭特徵,更包括一管理中心,其係設在該電鍍設備之週邊,其包含一中央控制單元及一儲存單元,且一第二無線傳輸單元,係耦接該中央控制單元,並與該第一無線傳輸單元具有互相傳輸功能。一可行實施例中,該中央控制單元及該儲存單元可為一電腦所構成。 According to the foregoing features, a management center is further disposed at a periphery of the electroplating apparatus, and includes a central control unit and a storage unit, and a second wireless transmission unit is coupled to the central control unit, and The first wireless transmission unit has a mutual transmission function. In a possible embodiment, the central control unit and the storage unit can be a computer.

依據前揭特徵,更包括一遙控器,用以將訊號傳送至該控制機體,透過該電流調整器控制該電流輸出端至該掛具之電流值。 According to the foregoing feature, a remote controller is further provided for transmitting a signal to the control body, and the current value of the current output terminal to the hanger is controlled by the current regulator.

依據前揭特徵,該控制機體之手動輸入介面包括為一按鍵或一轉鈕所構成,透過該手動輸入介面可設定該電流輸出端至該掛具之電流值。 According to the foregoing feature, the manual input interface of the control body comprises a button or a rotary button, and the current value of the current output terminal to the hanger can be set through the manual input interface.

藉助上揭技術手段,本創作每一個電鍍掛具上皆獨立設有一個電流調整器,以『一對一』取代傳統的『一對多』的電流控制方式,解決了習用電流不平均的問題點,使每一鍍件均可取得穩定的最佳電流值,以確保電鍍之品質。且進一步可以紀錄電鍍過程所用之平均電流等數據,透過無線傳輸方式,把數據回饋至控制中心管理系統,加強電鍍 品質控制及方便製程調整等之功效增進。 With the help of the above-mentioned technical means, each electroplating rack has a current regulator independently, which replaces the traditional one-to-many current control method with "one-to-one" to solve the problem of irregular current usage. Point, so that each plated piece can obtain a stable optimal current value to ensure the quality of plating. Further, the average current and other data used in the electroplating process can be recorded, and the data can be fed back to the control center management system through wireless transmission to enhance plating. Improved quality control and ease of process adjustment.

10‧‧‧導電架 10‧‧‧ Conductive frame

20‧‧‧控制機體 20‧‧‧Control body

21‧‧‧處理器 21‧‧‧ Processor

22‧‧‧記憶體 22‧‧‧ memory

23‧‧‧電流調整器 23‧‧‧ Current Regulator

231‧‧‧電流輸出端 231‧‧‧current output

24‧‧‧電流偵測單元 24‧‧‧current detection unit

25‧‧‧電流顯示器 25‧‧‧ Current display

26‧‧‧手動輸入介面 26‧‧‧Manual input interface

27‧‧‧第一無線傳輸單元 27‧‧‧First wireless transmission unit

30‧‧‧掛具 30‧‧‧ hanging

31‧‧‧導電板 31‧‧‧ Conductive plate

32A‧‧‧吊架 32A‧‧‧ hanger

32B‧‧‧托架 32B‧‧‧ bracket

33‧‧‧橫桿 33‧‧‧crossbar

34‧‧‧導電夾 34‧‧‧conductive clip

35‧‧‧框體 35‧‧‧ frame

40‧‧‧智能電鍍掛具 40‧‧‧Smart plating hanger

50‧‧‧控制中心管理系統 50‧‧‧Control Center Management System

51‧‧‧中央控制單元 51‧‧‧Central Control Unit

52‧‧‧儲存單元 52‧‧‧ storage unit

53‧‧‧第二無線傳輸單元 53‧‧‧Second wireless transmission unit

54‧‧‧電腦 54‧‧‧ computer

60‧‧‧遙控器 60‧‧‧Remote control

70‧‧‧電鍍系統 70‧‧‧ plating system

71‧‧‧電極板 71‧‧‧Electrode plate

72‧‧‧DC固定電源 72‧‧‧DC fixed power supply

圖1係習用電鍍掛架之正面示意圖。 Figure 1 is a front elevational view of a conventional plating rack.

圖2係習用電鍍掛架之側面剖視圖。 Figure 2 is a side cross-sectional view of a conventional plating rack.

圖3係本創作之一可行實施例之立體圖。 Figure 3 is a perspective view of one possible embodiment of the present invention.

圖4係圖3中4-4斷面剖視圖。 Figure 4 is a cross-sectional view taken along line 4-4 of Figure 3.

圖5係本創作另一可行實施例之立體圖。 Figure 5 is a perspective view of another possible embodiment of the present invention.

圖6係本創作之電路結構方塊圖。 Figure 6 is a block diagram of the circuit structure of the present creation.

圖7係本創作之電流控制流程圖。 Figure 7 is a flow chart of the current control of the present creation.

在本創作說明書及後續的專利請求項當中使用了某些詞彙來指稱特定的元件。所屬技術領域中具有通當知識者應可理解,硬體製造商可能會用不同的名詞來稱呼一個元件。本說明書及後續的專利請求項當中並不以名稱的差異來作為區分元件的方式,而是以元件在功能上的差異來作為區分的準則。在說明書及後續的請求項當中所提及的「包含」係為一開放式的用語,故應解釋成「包含但不限定於」。此外,「耦接」一詞在此係包含任何直接及間接的電性連接手段,因此,若文中描述一第一電路耦接於一第二電路,則代表該第一電路可直接電性連接於該第二電路,或者透過其他裝置或連接手段間接地電性連接至該第二電路。 Certain terms are used in this specification and subsequent patent claims to refer to particular elements. It should be understood by those skilled in the art that a hardware manufacturer may refer to a component by a different noun. In the present specification and subsequent patent claims, the difference in name is not used as the means for distinguishing the elements, but the difference in function of the elements is used as the criterion for distinguishing. The term "including" as used in the specification and subsequent claims is an open term and should be interpreted as "including but not limited to". In addition, the term "coupling" is used herein to include any direct and indirect electrical connection means. Therefore, if a first circuit is coupled to a second circuit, it means that the first circuit can be directly electrically connected. The second circuit is electrically connected to the second circuit indirectly via other devices or connection means.

首先,請參閱圖3~圖7所示,本創作智能電鍍掛具40一較佳可行實施例包含:一導電架10,係裝設在一電鍍系統70之電極板71上,並由此處取得DC固定電源72;一控制機體20,係連接在該導電架10上,該 控制機體20包括:一處理器21;一記憶體22,係耦接該處理器21;一電流調整器23,係耦接該處理器21,且電性連接該導電架10,該電流調整器23根據該處理器21的控制來調整輸出電流。由於電鍍電源有穩壓限流和穩流限壓兩種工作模式,本實施例中,透過該電流調整器23,可將該DC固定電源72依需求透過調壓或分流等方式,例如以可變電阻等方式,直接控制輸出電流,並可透過一電流偵測單元24及一電流顯示器25,將設定值顯示在控制機體20表面。 First, referring to FIG. 3 to FIG. 7, a preferred embodiment of the present intelligent electroplating rack 40 includes: a conductive frame 10 mounted on an electrode plate 71 of a plating system 70, and is Obtaining a DC fixed power source 72; a control body 20 is connected to the conductive frame 10, The control unit 20 includes: a processor 21; a memory 22 coupled to the processor 21; a current regulator 23 coupled to the processor 21, and electrically connected to the conductive frame 10, the current regulator 23 adjusts the output current according to the control of the processor 21. Since the electroplating power supply has two working modes of a regulated current limiting and a steady current limiting voltage, in the embodiment, the DC fixed power supply 72 can be transmitted through a voltage regulating or shunting method according to requirements, for example, The variable resistance or the like directly controls the output current, and the set value is displayed on the surface of the control body 20 through a current detecting unit 24 and a current display 25.

如圖6所示,該電流偵測單元24,係耦接該處理器21及該電流調整器23的輸出端;該電流顯示器25,係耦接該電流偵測單24元,其顯示面係裸露在該控制機體20表面,用以顯示輸出電流值;本實施例中,該電流偵測單元24及該電流顯示器25可由一電流計28所構成,目前市售之電流計即具有電流量測及電流顯示功能。 As shown in FIG. 6, the current detecting unit 24 is coupled to the output end of the processor 21 and the current regulator 23. The current display 25 is coupled to the current detecting unit 24, and its display surface is displayed. Exposed on the surface of the control body 20 for displaying the output current value. In this embodiment, the current detecting unit 24 and the current display 25 can be formed by an ammeter 28, and the current commercially available ammeter has current measurement. And current display function.

如圖3所示,一手動輸入介面26,係設在該控制機體20表面且耦接該處理器21;一第一無線傳輸單元27,係耦接該處理器21,用以將電鍍過程所獲得的數據,透過無線傳送方式回饋至一控制中心管理系統50。該控制機體20之手動輸入介面26包括為一按鍵或一轉鈕所構成,透過該手動輸入介面26可設定該電流輸出端231至該掛具30之電流值。至於,該控制中心管理系統50係設在該電鍍系統70週邊,容後再述。 As shown in FIG. 3, a manual input interface 26 is disposed on the surface of the control body 20 and coupled to the processor 21; a first wireless transmission unit 27 is coupled to the processor 21 for the electroplating process. The obtained data is fed back to a control center management system 50 by wireless transmission. The manual input interface 26 of the control body 20 is formed by a button or a rotary button. The current input terminal 231 can be used to set the current value of the current output terminal 231 to the hanger 30. As for the control center management system 50, it is provided around the plating system 70, and will be described later.

一掛具30,係連接該控制機體20,其上端具有一導電板31連接該電流輸出端231,用以取得經過該電流調整器23後的穩定輸出電流,並送至該掛具30上之鍍件(P)。如圖3及圖4所示,本實施例中,該掛具30可由一吊架32A所構成,該吊架32A包括在該導電板31下方電性連接設有一橫桿33及複數個導電夾34;但不限定於此。請參閱圖5所示,該掛具30亦可由一托架32B所構成,該托架32B包括在該導電板31下方電性連 接設有一框體35,且框體35之任一對邊設有複數個導電夾34。是以,本實施例中,該掛具30無論是那一種型態,皆可實施。 A rack 30 is connected to the control body 20, and a conductive plate 31 is connected to the current output end 231 at the upper end for obtaining a stable output current after passing through the current regulator 23, and is sent to the rack 30. Plated parts (P). As shown in FIG. 3 and FIG. 4 , in the embodiment, the hanger 30 can be formed by a hanger 32A. The hanger 32A includes a cross bar 33 and a plurality of conductive clips electrically connected to the conductive plate 31 . 34; but is not limited to this. Referring to FIG. 5, the hanger 30 can also be formed by a bracket 32B. The bracket 32B includes an electrical connection under the conductive plate 31. A frame 35 is attached, and a plurality of conductive clips 34 are disposed on either side of the frame 35. Therefore, in this embodiment, the hanger 30 can be implemented regardless of the type.

承上,該控制中心管理系統50,其包含一中央控制單元51及一儲存單元52,一第二無線傳輸單元53,係耦接該中央控制單元51,並與該第一無線傳輸單元27具有互相傳輸功能。本實施例中,該中央控制單元51及該儲存單元52可為一電腦54所構成。該控制中心管理系統50,為電鍍系統70所具備之裝置,非本創作之主要專利特徵;惟,本創作智能掛具40透過該第一無線傳輸單元27,可以將電鍍過程所獲得的數據,例如:電鍍過程中鍍件(P)所用之平均電流值等,以無線傳送方式回饋至該控制中心管理系統50,加強電鍍品質控制及方便製程調整等之功效增進。又,該第一、二無線傳輸單元包括為WiFi、BlueTooth、RFID…等任一所構成。 The control center management system 50 includes a central control unit 51 and a storage unit 52. The second wireless transmission unit 53 is coupled to the central control unit 51 and has a first wireless transmission unit 27. Transfer each other. In this embodiment, the central control unit 51 and the storage unit 52 can be configured by a computer 54. The control center management system 50 is a device of the electroplating system 70, which is not a major patent feature of the present invention; however, the data obtained by the electroplating process can be obtained by the creative smart device 40 through the first wireless transmission unit 27, For example, the average current value used for the plated part (P) during the electroplating process is fed back to the control center management system 50 by wireless transmission, which enhances the electroplating quality control and facilitates process adjustment and the like. Moreover, the first and second wireless transmission units are configured to be any of WiFi, BlueTooth, RFID, and the like.

本實施例中,更包括一遙控器60,用以將訊號傳送至該控制機體20,透過該電流調整器23控制該電流輸出端231至該掛具30之電流值。 In this embodiment, a remote controller 60 is further included for transmitting a signal to the control body 20, and the current regulator 23 controls the current value of the current output terminal 231 to the hanger 30.

本創作之電流控制係如圖7所示之流程圖,其開始後的步驟包括: The current control system of this creation is shown in the flow chart shown in Figure 7, and the steps after the start include:

步驟S1:將智能電鍍掛具40掛載鍍件(P)進入電鍍系統70的電極板71。 Step S1: The smart plating hanger 40 is mounted with the plating member (P) into the electrode plate 71 of the plating system 70.

步驟S2:提供DC固定電源72透過電極板71送至智能電鍍掛具40。 Step S2: The DC fixed power source 72 is supplied to the smart plating hanger 40 through the electrode plate 71.

步驟S3:電流調整器23依鍍件(P)規格調整控制穩定的輸出電流值,其能以手動輸入介面26設定或遙控器60設定電流值。在一可行實施例中,但不限定於此,電流調整器23係可透過一A/D轉換器及D/A轉換器,使DC固定電源72之類比信號至A/D轉換器後,可轉換成數位信號,使處理器21藉由數位信號得知目前電流 值,而該記憶體22可暫時記憶鍍件(P)規格與電流值的關係,當鍍件(P)規格確定後,則處理器21即可判斷所需之電流值,於是在目前電流值範圍之下可控制所需之電流值,並以D/A轉換器將所需之電流值的數位信號轉換成類比信號,使類比信號送至電流輸出端231。惟,電流調整及控制之方式有多種,容不贅述。 Step S3: The current regulator 23 adjusts and controls the stable output current value according to the plating (P) specification, which can be set by the manual input interface 26 or the remote controller 60 to set the current value. In a possible embodiment, but not limited to, the current regulator 23 can transmit an analog signal of the DC fixed power source 72 to the A/D converter through an A/D converter and a D/A converter. Converting to a digital signal, causing processor 21 to know the current by digital signal The value of the memory 22 can temporarily memorize the relationship between the plating plate (P) specification and the current value. When the plating component (P) specification is determined, the processor 21 can determine the required current value, and thus the current current value. Below the range, the desired current value can be controlled, and the digital signal of the desired current value is converted to an analog signal by the D/A converter, and the analog signal is sent to the current output terminal 231. However, there are many ways to adjust and control the current.

步驟S4:紀錄電鍍過程相關數據,例如:記憶體22可記錄電鍍時間、平均電流值等。 Step S4: Recording data related to the plating process, for example, the memory 22 can record the plating time, the average current value, and the like.

步驟S5:透過無線傳輸將數據回饋至控制中心管理系統50,亦即控制中心管理系統50以該第二無線傳輸單元53接收智能電鍍掛具40所回饋之數據,並藉由儲存單元52予以儲存,俾能透過手動輸入介面26設定或遙控器60來控制每一個智能電鍍掛具40的輸出電流值。 Step S5: The data is fed back to the control center management system 50 by wireless transmission, that is, the control center management system 50 receives the data fed back by the smart plating rack 40 by the second wireless transmission unit 53, and stores it by the storage unit 52. The output current value of each of the smart plating tongs 40 can be controlled by the manual input interface 26 or the remote controller 60.

步驟S6:電鍍完成,清除智能電鍍掛具40之紀錄資料,例如:記憶體22可清除上一個鍍件(P)的所有資料,如此一來,該智能電鍍掛具40又可以重新回到電鍍系統70的開始端,再裝上新的鍍件。最後結束。 Step S6: After the electroplating is completed, the record data of the smart plating hanger 40 is cleared. For example, the memory 22 can clear all the materials of the previous plating component (P), so that the smart plating hanger 40 can be returned to the electroplating again. At the beginning of system 70, a new plated part is placed. Finally ended.

藉助上揭技術特徵,本創作每一個電鍍掛具上皆獨立設有一個電流調整器,以『一對一』取代傳統的『一對多』的電流控制方式,並透過紀錄、回饋、以及無線或手動控制等手段,使每一鍍件均可取得穩定的最佳電流值,以確保電鍍品質之功效增進。 With the technical features of the above-mentioned technology, each electroplating fixture has a current regulator independently, which replaces the traditional one-to-many current control method with one-to-one, through record, feedback, and wireless. Or manual control, etc., so that each plated part can obtain a stable optimal current value to ensure the improvement of plating quality.

綜上所述,本創作所揭示之技術手段,確具「新穎性」、「進步性」及「可供產業利用」等新型專利要件,祈請 鈞局惠賜專利,以勵新型,無任德感。惟,上述所揭露之圖式、說明,僅為本創作之較 佳實施例,大凡熟悉此項技藝人士,依本案精神範疇所作之修飾或等效變化,仍應包括本案申請專利範圍內。 In summary, the technical means revealed in this creation are indeed new types of patents such as "novelty", "progressiveness" and "available for industrial use", and pray for the patents to be promoted by the bureau. German sense. However, the above-mentioned drawings and descriptions are only for the purpose of this creation. For the best example, the modifications or equivalent changes made by those who are familiar with this skill in the spirit of the case should still include the scope of the patent application in this case.

10‧‧‧導電架 10‧‧‧ Conductive frame

20‧‧‧控制機體 20‧‧‧Control body

25‧‧‧電流顯示器 25‧‧‧ Current display

26‧‧‧手動輸入介面 26‧‧‧Manual input interface

30‧‧‧掛具 30‧‧‧ hanging

31‧‧‧導電板 31‧‧‧ Conductive plate

32A‧‧‧吊架 32A‧‧‧ hanger

33‧‧‧橫桿 33‧‧‧crossbar

34‧‧‧導電夾 34‧‧‧conductive clip

40‧‧‧智能電鍍掛具 40‧‧‧Smart plating hanger

50‧‧‧控制中心管理系統 50‧‧‧Control Center Management System

60‧‧‧遙控器 60‧‧‧Remote control

70‧‧‧電鍍系統 70‧‧‧ plating system

71‧‧‧電極板 71‧‧‧Electrode plate

72‧‧‧DC固定電源 72‧‧‧DC fixed power supply

Claims (9)

一種智能電鍍掛具,包含:一導電架,係裝設在一電鍍系統之電極板上,並由此處取得DC固定電源;一控制機體,係連接在該導電架上,該控制機體包括:一處理器;一記憶體,係耦接該處理器;一電流調整器,係耦接該處理器,且電性連接該導電架,該電流調整器根據該處理器的控制來輸出穩定的電流;一電流偵測單元,係耦接該處理器及該電流調整器的輸出端;一電流顯示器,係耦接該電流偵測單元,其顯示面係裸露在該控制機體表面,用以顯示輸出電流值;一手動輸入介面,係設在該控制機體表面且耦接該處理器;一第一無線傳輸單元,係耦接該處理器,用以將電鍍過程所獲得的數據,透過無線傳送方式回饋至一控制中心管理系統;以及一掛具,係連接該控制機體,其上端具有一導電板連接該電流輸出端,用以取得經過該電流調整器後的穩定輸出電流,並送至該掛具上之鍍件。 An intelligent electroplating rack comprises: a conductive frame mounted on an electrode plate of a plating system, and a DC fixed power source is obtained therefrom; a control body is connected to the conductive frame, the control body comprises: a processor coupled to the processor; a current regulator coupled to the processor and electrically coupled to the conductive frame, the current regulator outputting a stable current according to the control of the processor a current detecting unit coupled to the processor and the output of the current regulator; a current display coupled to the current detecting unit, the display surface of which is exposed on the surface of the control body for displaying output a current input interface is disposed on the surface of the control body and coupled to the processor; a first wireless transmission unit coupled to the processor for transmitting data obtained by the electroplating process through wireless transmission Feedback to a control center management system; and a rack connected to the control body, the upper end of which has a conductive plate connected to the current output terminal for obtaining stability after passing the current regulator Output current, and sent to the plating on the rack. 如請求項1所述之智能電鍍掛具,其中,該掛具係由一吊架所構成,該吊架包括在該導電板下方電性連接設有一橫桿及複數個導電夾。 The smart plating hanger of claim 1, wherein the hanger is composed of a hanger, and the hanger comprises a crossbar and a plurality of conductive clips electrically connected under the conductive plate. 如請求項1所述之智能電鍍掛具,其中,該掛具可由一托架所構成,該托架包括在該導電板下方電性連接設有一框體,且框體之任一對邊設有複數個導電夾。 The smart plating rack of claim 1, wherein the rack is formed by a bracket, the bracket includes a frame electrically connected under the conductive plate, and any one side of the frame is disposed There are a plurality of conductive clips. 如請求項1所述之智能電鍍掛具,其中,該控制中心管理系統,係設在該電鍍設備之週邊,其包含一中央控制單元及一儲存單元,且一第二無線傳輸單元,係耦接該中央控制單元,並與該第一無線傳輸單元具有互相傳輸功能。 The intelligent electroplating rack of claim 1, wherein the control center management system is disposed around the electroplating apparatus, and includes a central control unit and a storage unit, and a second wireless transmission unit coupled The central control unit is connected to and has a mutual transmission function with the first wireless transmission unit. 如請求項4所述之智能電鍍掛具,其中,該中央控制單元及該儲存單元可為一電腦所構成。 The smart plating rack of claim 4, wherein the central control unit and the storage unit are formed by a computer. 如請求項1所述之智能電鍍掛具,更包括一遙控器,用以將訊號傳送至該控制機體,透過該電流調整器控制該電流輸出端至該掛具之電流值。 The smart plating rack of claim 1, further comprising a remote controller for transmitting a signal to the control body, and controlling the current value of the current output to the rack through the current regulator. 如請求項1所述之智能電鍍掛具,其中,該控制機體之輸入介面包括為一按鍵或一轉鈕所構成,透過該手動輸入介面可設定該電流輸出端至該掛具之電流值。 The smart plating device of claim 1, wherein the input interface of the control body comprises a button or a button, and the current value of the current output terminal to the device can be set through the manual input interface. 如請求項4所述之智能電鍍掛具,其中,該第一、二無線傳輸單元包括為WiFi、BlueTooth、RFID任一所構成。 The smart plating device of claim 4, wherein the first and second wireless transmission units comprise any of WiFi, BlueTooth, and RFID. 如請求項1所述之智能電鍍掛具,其中,該電流偵測單元及該電流顯示器可由一電流計所構成。 The smart plating device of claim 1, wherein the current detecting unit and the current display are formed by an ammeter.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI623997B (en) * 2016-02-19 2018-05-11 斯庫林集團股份有限公司 Plating apparatus and plating method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI623997B (en) * 2016-02-19 2018-05-11 斯庫林集團股份有限公司 Plating apparatus and plating method

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