TWM509418U - Suction type offline type automatic filtering system - Google Patents

Description

Suction type offline automatic filtration system

The present invention relates to a filtration system, and more particularly to an offline automatic filtration system.

Chemical-Mechanical Planarization (CMP) is a very important part of the manufacturing process for semiconductor wafers, which is used to planarize the surface of wafers. Generally, a polishing pad is attached to a polishing platform, and the surface of the polishing pad is impregnated with a slurry, and the surface of a wafer is contacted with the polishing pad to rotate the polishing platform and the wafer. The surface of the wafer is planarized by the mechanical friction generated.

The slurry primarily consists of chemical components that react with the surface of the wafer and abrasive particles that are used to remove reactants from the wafer surface. Depending on the purpose of the grinding, the chemical composition can be divided into two types for removing oxides and metals; as for the abrasive particles, for example, SiO2, Al2O3, and CeO2 are used. The polishing liquid in use is liable to cause agglomeration of the abrasive particles due to the operation of the pump or the friction of the pipeline, the valve member, etc., so if it is not filtered, it will be generated and agglomerated into larger particles. In addition, the large particles will cause scratches on the surface of the wafer during the CMP process. Therefore, large particles in the slurry must be properly filtered during operation to avoid wafer scratching during polishing. It is conventional to place a filter in the slurry circulation supply line to filter out the particles in the slurry by the filter core of the filter, which is disclosed in US Patent No. 8,303,373, Slurry apparatus and method of Polishing semiconductor wafer utilizing same.

Such a method of inserting a filter into the slurry circulation supply line causes a brief pressure drop when the filter element in the filter is replaced, so that the supply amount of the slurry is shortened due to the pressure drop, which causes In chemical mechanical polishing, there is a possibility that the wafer is scratched due to insufficient amount of the polishing liquid.

The main purpose of the present invention is to disclose an off-line automatic filtration system that does not have a pressure drop in replacing the filter core to meet the demand for continuous supply of the slurry.

To achieve the above object, the present invention provides a suction-type off-line automatic filtration system for providing a slurry to at least one polishing system, including a supply tank, a feed line, a feed pump, and at least one diverter valve. a filter line and a filter unit.

The supply tub has an accommodating space and an opening for connecting the accommodating space, the accommodating space is for accommodating the polishing liquid, and the two ends of the liquid supply pipe are connected to the supply tub, and the liquid supply pump is disposed at The liquid supply line is pressurized to allow the liquid supply line to circulate the slurry, and the at least one diverter valve is disposed in the liquid supply line and connected to the at least one grinding system.

The filter line has an inlet end and an outlet end. The inlet end and the outlet end respectively extend into the polishing liquid through the opening. The filter unit is disposed in the filter line and has a diaphragm pump and a magnetic force. Pumping a filter cartridge for filtering the slurry, the filter cartridge is for mounting a filter core, the diaphragm pump is for extracting the slurry into the magnetic pump, and the magnetic pump is pressurized to pass the slurry through the filter cartridge to The filter is filtered through the filter and re-entered into the supply tank from the outlet end.

According to this, since the filter line and the liquid supply line are disposed independently of each other, when the filter core of the filter unit is replaced, the liquid supply line can still maintain normal operation without pressure drop. The problem is that the slurry supplied to the at least one polishing system is not short, so that the at least one polishing system can maintain its polishing quality to meet the demand for use.

The detailed description and technical content of this new model are described below with the following diagram:

Please refer to FIG. 1 , which is a suction type offline automatic filtering system for providing a polishing liquid to at least one grinding system 10 , including a supply tank 20 , a liquid supply line 30 , and a The liquid pump 40, at least one diverter valve 50, a filter line 60 and a filter unit 70.

The supply tank 20 has an accommodating space 21 and an opening 22 communicating with the accommodating space 21, the accommodating space 21 is for containing the polishing liquid, and the two ends of the liquid supply pipe 30 are connected to the supply tub 20 The liquid supply pump 40 is disposed in the liquid supply pipe 30, and pressurizes the liquid supply pipe 30 to circulate the slurry, and the at least one diverter valve 50 is disposed in the liquid supply pipe 30, and connects the at least A grinding system 10.

As shown in FIG. 2 , the filter line 60 has an inlet end 601 and an outlet end 602 . The inlet end 601 and the outlet end 602 respectively extend into the polishing liquid through the opening 22 . The filter unit 70 is disposed in the filter line 60, and has a diaphragm pump 71, a magnetic pump 72 and a filter cartridge 73 for filtering the slurry. The filter cartridge 73 is provided with a filter 731, and the diaphragm pump 71 extracts the filter unit 71. The slurry enters the magnetic pump 72 and the diaphragm pump 71 is turned off after the siphon effect is generated, and the magnetic pump 72 pressurizes the slurry to pass through the filter cartridge 73 to be filtered through the filter 731, and The outlet end 602 re-enters the supply tub 20. In order to clean and replace the filter 731 in the filter cartridge 73, the inlet end 601 and the outlet end 602 can be respectively provided with an inlet valve 61 and an outlet valve 62, which can be closed by closing the inlet valve 61 and the outlet valve 62. The slurry is no longer entered into the filtration line 60 to facilitate cleaning of the filter cartridge 73.

Moreover, the present invention further has a flow sensor 80 for detecting whether the slurry passes, and the flow sensor 80 is disposed at the inlet end 601 and located before the inlet valve 61, so as long as the flow sense is observed The detector 80 can know whether the filter line 60 has the passage of the slurry, and if not, forcibly stop. Further, the filter line 60 is provided with a pressure sensor 81 (Pressure Transmitter) for detecting the pressure of the filter line 60 at the two ends of the filter tube 73. The pressure sensor 81 is used for detecting the filter line 60. When the pressure difference between the two ends of the filter cartridge 73 is too large, it means that the filter cartridge 73 and the filter core 731 need to be cleaned and replaced, so as to facilitate the time for replacing the filter 731.

For the sake of convenience in cleaning, the creation may further include a flushing water inlet pipe 90 and a flushing water outlet pipe 91, and the flushing water inlet pipe 90 and the flushing water outlet pipe 91 respectively communicate with the filter cartridge 73, the flushing The water inlet pipe 90 can be introduced into the cleaning liquid (deionized water), and the flushing water outlet pipe 91 can discharge the cleaning liquid to achieve the cleaning effect. The flushing water inlet pipe 90 and the flushing water outlet pipe 91 can respectively have a flushing water inlet valve 901 and a flushing water outlet valve 911. The flushing inlet water valve 901 and the flushing water outlet valve 911 can be normally closed to avoid normal use. When the cleaning liquid is mixed into the polishing liquid, when the inlet valve 61 and the outlet valve 62 are closed, and the flushing water inlet valve 901 and the flushing water outlet valve 911 are opened, the flushing water inlet pipe 90 can be utilized. Flushing with the flushing water line 91.

In order to improve the cleaning efficiency, the flushing water inlet line 90 can be directly connected to a deionized water line 92 and a nitrogen line 93, and the deionized water line 92 and the nitrogen line 93 are arranged in parallel, and the deionized water tube The path 92 and the nitrogen line 93 can be respectively communicated with the flushing water line 90 through a deionization valve 921 and a nitrogen valve 931. The deionized water line 92 can provide deionized water as long as the deionization valve 921 is opened. The cleaning liquid is supplied, and the nitrogen gas line 93 can be supplied with nitrogen gas by opening the nitrogen valve 931 and dried.

In order to fully clean the filter line 60 and the filter cartridge 73, the present invention may further include a flushing water branch line 94 between the outlet valve 62 and the filter cartridge 73, and the flushing out After the flushing water outlet valve 911, the water pipeline 91 communicates with both ends of the flushing water outlet pipe 94, that is, after the cleaning is used, the slurry can be used for flushing, and the flushing water branch pipe 94 is used. Discharged to sufficiently clean the filter line 60 and the filter cartridge 73, and the flushing water branch line 94 may be provided with a water outlet pipe valve 941, which is kept in a normally closed state, and needs to be used in the flushing water When the line 94 is branched, the outlet branch valve 941 (closed outlet valve 62) and the inlet valve 61 are opened, and the filtration line 60 and the filter cartridge 73 can be cleaned by the slurry.

In summary, the filter line of the present invention is independently provided, and the filter line and the liquid supply line are not connected to each other. Therefore, when the filter line is cleaned and replaced, it does not Affecting the supply of the slurry to the liquid supply line, that is, the supply line has no problem of pressure drop, and the slurry can be stably and continuously supplied to the at least one polishing system for the at least one grinding system It can have enough polishing liquid to maintain its grinding quality to meet the needs of use.

Therefore, this new type is highly progressive and meets the requirements for applying for a new type of patent. It is required to apply in accordance with the law, and the Bureau of Health will grant patents as soon as possible.

The present invention has been described in detail above, but the above is only a preferred embodiment of the present invention, and the scope of the present invention is not limited. That is, the equal changes and modifications made in accordance with the scope of this new application shall remain within the scope of the patent of this new type.

10‧‧‧ grinding system
20‧‧‧ supply bucket
21‧‧‧ accommodating space
22‧‧‧ openings
30‧‧‧Supply line
40‧‧‧Supply pump
50‧‧‧Diverter
60‧‧‧Filter line
601‧‧‧ entrance end
602‧‧‧export end
61‧‧‧Inlet valve
62‧‧‧Export valve
70‧‧‧Filter unit
71‧‧‧ diaphragm pump
72‧‧‧ magnetic pump
73‧‧‧Filter cartridge
731‧‧‧ filter heart
80‧‧‧Flow Sensor
81‧‧‧pressure sensor
90‧‧‧ Flush into the water pipeline
901‧‧‧ Flush into the water valve
91‧‧‧ flushing water outlet
911‧‧‧ flushing water valve
92‧‧‧Deionized water pipeline
921‧‧‧Deionization valve
93‧‧‧nitrogen pipeline
931‧‧‧ nitrogen valve
94‧‧‧ Flush out the water branch line
941‧‧‧water branch pipe valve

FIG. 1 is a system architecture diagram of a preferred embodiment of the present invention. 2 is a schematic view of a filtration unit pipeline according to a preferred embodiment of the present invention.

10‧‧‧ grinding system

20‧‧‧ supply bucket

21‧‧‧ accommodating space

22‧‧‧ openings

30‧‧‧Supply line

40‧‧‧Supply pump

50‧‧‧Diverter

60‧‧‧Filter line

601‧‧‧ entrance end

602‧‧‧export end

70‧‧‧Filter unit

Claims (9)

A suction-type off-line automatic filtering system for providing a polishing liquid to at least one polishing system, comprising: a supply tank having an accommodation space and an opening communicating with the accommodation space, the accommodation a liquid containing the liquid; a liquid supply line, the two ends of the liquid supply line are connected to the supply tank; a liquid supply pump, the liquid supply pump is disposed in the liquid supply line, and is pressurized to allow the liquid supply tube The pipeline circulates the slurry; at least one diverter valve is disposed in the liquid supply pipeline and connected to the at least one grinding system; a filtration pipeline having an inlet end and an outlet end The inlet end and the outlet end respectively extend into the polishing liquid through the opening; a filter unit, the filter unit is disposed in the filter line, and has a diaphragm pump, a magnetic pump and a filter for filtering the slurry a filter cartridge for mounting a filter core, the diaphragm pump extracts the slurry into the magnetic pump, and the magnetic pump pressurizes the slurry to pass through the filter cartridge to filter through the filter core, and the outlet is The end re-enters the supply bucket. The suction type offline automatic filtering system according to claim 1, wherein the inlet end and the outlet end are respectively provided with an inlet valve and an outlet valve. The suction type offline automatic filtering system of claim 2, further comprising a flow sensor for detecting whether the slurry passes, the flow sensor being disposed at the inlet end and located at the inlet end Before the inlet valve. The suction type offline automatic filtering system of claim 2, wherein the filter line is provided with a pressure sensor for detecting the pressure of the filter line at both ends of the filter tube. The suction type offline automatic filtering system according to claim 2, further comprising a flushing water inlet pipe and a flushing water outlet pipe, wherein the flushing water inlet pipe and the flushing water outlet pipe respectively communicate with the filter cartridge . The suction type offline automatic filtering system according to claim 5, wherein the flushing water inlet pipe and the flushing water outlet pipe respectively have a flushing water inlet valve and a flushing water outlet valve. The suction type offline automatic filtering system according to claim 6, wherein the flushing water inlet line is connected to a deionized water line and a nitrogen line, and the deionized water line is connected in parallel with the nitrogen line. And the deionized water pipeline and the nitrogen pipeline are respectively connected to the flushing water pipeline through a deionization valve and a nitrogen valve. The suction type offline automatic filtering system according to claim 6, further comprising a flushing water branch line, wherein the filter line is between the outlet valve and the filter tube, and the flushing water line After the flushing of the water outlet valve, the two ends of the flushing water branch line are respectively connected. The suction type offline automatic filtering system according to claim 8, wherein the flushing water branch line is provided with a water outlet branch valve.