TWM504949U - Thin-film measuring apparatus - Google Patents

Description

Film measuring equipment

A film measuring device, especially a film measuring device capable of improving film measuring accuracy and greatly reducing measurement area.

The semiconductor process involves a lot of work, in which a thin film coating of a film or an LCD-related product is deposited on a semiconductor, and both the film and the coating need to be subjected to thickness inspection to confirm whether the quality of the product is defective or not.

A device for measuring film thickness and refractive index widely used in general semiconductor processes is a reflectance-based measuring tool, and a reflectometer called a film layer measuring system is capable of measuring characteristics of a multilayer film, and can also be used without Non-contact and non-destructive measuring devices that can be directly measured by special pre-treatment of the object before measurement.

Conventional film measurements still have disadvantages, such as limited by the aperture of the fiber and the multiple of the objective lens, making it difficult to measure the entire product surface of less than 20 μm, and because it is necessary to observe and inspect the film thickness and the surface of the wafer containing high circuit density. The profile state thus creates a problem of resolution when the circuit designation portion on the substrate is inspected during processing of the high circuit density of the semiconductor wafer.

In addition, a new reflectivity versus film thickness value for the new calibration substrate will be propagated to the product substrate as soon as the wafer process is changed.

However, there is a common serious drawback in the prior art that since the film thickness value is determined by comparing the measured thickness value with the database prepared by using the calibration substrate, the measurement result value of the film thickness is greatly affected by the calibration wafer database. That is, the database of the reflectance of the calibration substrate versus the thickness of the film is simply a table representing the correspondence between the reflectance and the film thickness, which is generated by averaging and arranging the entire calibration substrate value, and thus, when the measured thickness and the calibration substrate are And when the reflectivity of the product substrate has a reasonable uniformity, its accuracy can be ensured, but when the surface relationship between the reflectance and the film thickness is irregular due to the uneven surface condition of the substrate, the film thickness is reduced. Accuracy.

Therefore, in order to effectively solve the above problems, the main purpose of the present invention is to provide a film measuring device capable of improving film measurement accuracy.

In order to achieve the above object, the present invention provides a film measuring device, comprising: a carrier, a light source unit, a beam splitter, a lens group, an auxiliary lens, a first measuring unit, and a second quantity. a measuring unit, an objective lens, and a data processing device; the carrier has a loading platform, the loading platform and the bearing system are slidably assembled; the light source unit is disposed at a side of the loading platform, and the The light source unit is disposed in parallel with the load platform; the beam splitter is disposed above the load platform to refract light that is illuminated by the light source unit to the load platform; the lens assembly is disposed on the beam splitter Between the light source unit and the light source unit; the first measurement unit is disposed above the load platform, and receives the light reflected by the light source unit after being irradiated to the load platform; the second measurement unit is disposed on the load platform and the The first measuring unit can also receive the light reflected by the light source unit after being irradiated to the loading platform; the auxiliary lens is disposed between the first and second measuring units and the loading platform; the objective lens is disposed at The beam splitter and the Was between platform; the lines are connected to data processing means calculates and analyzes the information received by the aforementioned first and second measuring units electrically.

The main purpose of the film measuring device of the present invention is to integrate two film measuring devices at the same time, and to perform more precise film thickness measurement for a wide range of objects to be tested or a small range of objects to be tested (less than 1 μm), and At the same time, the film thickness measurement in a wide range or a very small area (less than 1 μm) can be performed at the same time, and the integration of the two film measuring devices is integrated, which not only saves space for machine installation, but also saves time for the user to set up the object to be tested. .

1‧‧‧Film measuring equipment

11‧‧‧Carrier

111‧‧‧Loading platform

112‧‧‧Motor

113‧‧‧slide unit

12‧‧‧Light source unit

13‧‧‧beam splitter

14‧‧‧ lens group

141‧‧‧ Concentrating lens

142‧‧‧Iris

143‧‧‧first lens

15‧‧‧Auxiliary lens

16‧‧‧First measuring unit

161‧‧‧Micro-motion platform

162‧‧‧Optical fiber rod

163‧‧‧First Spectrometer

17‧‧‧Second measurement unit

171‧‧‧First eyepiece setting slot

172‧‧‧Second eyepiece setting slot

173‧‧‧CCD lens

174‧‧‧Second Spectrometer

175‧‧‧Optical fiber rod

18‧‧‧ Objective lens

19‧‧‧Data processing device

2‧‧‧Test object

3‧‧‧Display device

4‧‧‧Ellipsometer

Fig. 1 is a schematic view showing the configuration of a first embodiment of the film measuring apparatus of the present invention.

Figure 2 is a schematic view showing the configuration of the first embodiment of the film measuring apparatus of the present invention.

Fig. 3 is a schematic view showing the configuration of a second embodiment of the film measuring apparatus of the present invention.

The above object of the present invention, as well as its structural and functional features, will be described in accordance with the preferred embodiments of the drawings.

Please refer to the first and second figures, which are schematic diagrams of the configuration of the first embodiment of the film measuring device of the present invention. As shown in the figure, the film measuring device 1 of the present invention comprises: a carrier 11 and a light source. The unit 12, a beam splitter 13, a lens group 14, an auxiliary lens 15, a first measuring unit 16, a second measuring unit 17, an objective lens 18, a data processing device 19;

The carrier 11 has a load platform 111, and the carrier platform 111 is slidably assembled with the carrier 11 for carrying a test object 2 and passing through the load platform. 111, the object to be tested 2 is freely horizontally translated on the carrier 11 to any position to be detected. The carrier 11 further has a motor 112 and a slide unit 113, and the motor 112 is a stepping motor or Any one of a servo motor or a linear motor that can drive the load platform 111 to perform a translational movement in a horizontal direction corresponding to the slide rail unit 113.

The light source unit 12 is disposed on a side of the load platform 111, and the light source unit 12 is disposed in parallel with the load platform 111.

The beam splitter 13 is disposed above the load platform 111 and refracts the light that is irradiated by the light source unit 12 to the load platform 111, that is, the light source 13 is used to cause the original light source unit 12 to illuminate the load in parallel. The light of the platform 111 is rotated 90 degrees through the beam splitter 13 to vertically illuminate the load platform 111, and the lens group 14 is disposed between the beam splitter 13 and the light source unit 12. The lens group 14 is more concentrated. The light lens 141 and an iris 142 and a first lens 143, and the lens group 14 interposed between the light source unit 12 and the beam splitter 13 are a collecting lens 141, an iris 142, and a first lens 143.

The first measuring unit 16 is disposed above the loading platform 111 and receives the light reflected by the light source unit 12 after being irradiated to the loading platform 111. The first measuring unit 16 further has a micro-motion platform 161 and an optical fiber. The wire 162 and a first spectrometer 163, and the first spectrometer 163 is a full-spectrum reflective film thickness measuring instrument, and the micro-motion platform 161 carries the optical fiber 162 and the first spectrometer 163 relative to the carrier 11 is slidably horizontally movable, and the micro-motion stage 111 is configured to cause the first measuring unit 16 to perform a slight range of movement of the micro-motion or inching in the horizontal direction with respect to the loading platform 111.

The second measuring unit 17 is disposed between the loading platform 111 and the first measuring unit 16, and can also receive the light reflected by the light source unit 12 after being irradiated to the loading platform 111. The second measurement The unit is a microscope having a first eyepiece setting groove 171 and a second eyepiece setting groove 172. The first eyepiece setting groove 171 is abutted against a CCD lens 173, and the second eyepiece is provided with a groove 172. A second spectrometer 174 and a fiber optic wire 175 are connected to each other. The second spectrometer 174 is a full spectrum reflective film thickness measuring instrument, and the CCD lens 173 is further connected to a display device 3.

The auxiliary lens 15 is disposed between the first and second measuring units 16 and 17 and the loading platform 111. The objective lens 18 is disposed between the beam splitter 13 and the loading platform 111. The auxiliary lens 15 is As a magnification of the object to be tested 2 directly improve the measurement accuracy.

The data processing device 19 is electrically connected to the first and second measuring units 16 and 17 respectively, and analyzes and calculates the received information. The data processing device 19 is configured to analyze the first and second measuring units 16, 17 The measured data generated is further analyzed for information such as the film thickness of the test object 2.

The film measuring device 1 of the present invention can be completed regardless of whether the object to be tested 2 is subjected to ordinary measurement or measurement of a very small portion (less than 1 μm), and can be quickly moved to a large extent through the load platform 111 when performing ordinary measurement. The portion of the object 2 to be measured is measured by the second measuring unit 17. If the portion to be measured and small (less than 1 μm) is to be measured, the first measuring unit 16 is used for measurement. Because the micro-motion platform 161 can make the first measuring unit 16 move relative to the loading platform 111 in a small range of inching or inching in the horizontal direction, the first and second measuring units 16 and 17 can mutually Compensate each other's measurement work and save the time to re-arrange the test object.

Please refer to FIG. 3 , which is a schematic view of the assembly of the second embodiment of the present invention. As shown in the figure, the embodiment has the same structural and technical features as the first embodiment, so The difference between this embodiment and the foregoing first embodiment is that the ellipsometer 4 is further disposed on the loading platform 111, that is, through the foregoing The first and second measuring units 16, 17 together form a film measuring device 1 having a composite measuring unit.

1‧‧‧Film measuring equipment

11‧‧‧Carrier

111‧‧‧Loading platform

112‧‧‧Motor

113‧‧‧slide unit

12‧‧‧Light source unit

13‧‧‧beam splitter

14‧‧‧ lens group

141‧‧‧ Concentrating lens

142‧‧‧Iris

143‧‧‧first lens

15‧‧‧Auxiliary lens

16‧‧‧First measuring unit

17‧‧‧Second measurement unit

18‧‧‧ Objective lens

19‧‧‧Data processing device

2‧‧‧Test object

3‧‧‧Display device

Claims (8)

[Item 1] A film measuring device comprising:
a carrier having a load platform, the load platform and the carrier system being slidably assembled;
a light source unit is disposed on a side of the load platform, and the illumination direction of the light source unit is disposed in parallel with the load platform;
a beam splitter disposed above the load platform to refract light that is illuminated by the light source unit to the load platform;
a lens group disposed between the beam splitter and the light source unit;
a first measuring unit is disposed above the loading platform to receive the light reflected by the light source unit after being irradiated to the loading platform;
a second measuring unit is disposed between the loading platform and the first measuring unit, and can also receive the light reflected by the light source unit after being irradiated to the loading platform;
An auxiliary lens is disposed between the first and second measuring units and the loading platform;
An objective lens is disposed between the beam splitter and the load platform;
A data processing device is electrically connected to the first and second measuring units respectively and analyzes and calculates the received information. [Item 2] The film measuring device of claim 1, wherein the first measuring unit further comprises a micro-motion platform and a fiber optic wire and a first spectrometer, wherein the micro-motion platform carries the optical fiber wire and the first A spectrometer is slidably horizontally moved relative to the carrier. [Item 3] The film measuring device according to claim 2, wherein the first spectrometer is a full spectrum reflective film thickness measuring instrument. [Item 4] The film measuring device according to claim 1, wherein the second measuring unit is a microscope, the microscope has a first eyepiece setting groove and a second eyepiece setting groove, the first The eyepiece setting slot is connected to a CCD lens, the second eyepiece setting slot is connected to a second spectrometer and a fiber optic wire, and the second spectrometer is a full spectrum reflective film thickness measuring instrument. [Item 5] The film measuring device of claim 1, wherein the lens group further comprises a collecting lens and an iris and a first lens, and the lens group is interposed between the light source unit and the beam splitter. The ordering is a concentrating lens, an iris, and a first lens. [Item 6] The film measuring device of claim 1, further comprising a motor and a rail unit, wherein the motor is a stepping motor or a servo motor or a linear motor, the motor is drivable The loading platform moves in a horizontal direction corresponding to the sliding rail unit. [Item 7] The film measuring device of claim 4, wherein the CCD lens is further connected to a display device. [Item 8] The film measuring device according to claim 1, wherein an ellipsometer is further disposed, and the ellipsometer is disposed above the load platform.