TWM495366U - Vacuum electrode module - Google Patents
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- TWM495366U TWM495366U TW103218362U TW103218362U TWM495366U TW M495366 U TWM495366 U TW M495366U TW 103218362 U TW103218362 U TW 103218362U TW 103218362 U TW103218362 U TW 103218362U TW M495366 U TWM495366 U TW M495366U
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Abstract
Description
本新型是有關於一種電極架構，且特別是有關於一種真空電極模組。The present invention relates to an electrode structure, and more particularly to a vacuum electrode module.
電漿技術為目前半導體製程中相當常見之鍍膜與蝕刻技術。電漿技術中之電漿增益化學氣相沉積(Plasma Enhanced CVD，PECVD)技術更是目前光電半導體產業中關鍵的鍍膜技術，可在玻璃基板上順利沉積薄膜。一般而言，電漿製程之工作原理係在密閉的反應腔體中，使製程氣體均勻流向承載待鍍膜或待蝕刻之基板的一電極。接著，透過對電極模組之電極頭施加電力，以在電極頭與電極之間產生電漿，再利用電漿將製程氣體分解後而對電極上之基板進行鍍膜或蝕刻處理。Plasma technology is a fairly common coating and etching technique in current semiconductor processes. Plasma enhanced CVD (PECVD) technology in plasma technology is the key coating technology in the optoelectronic semiconductor industry, which can deposit thin films on glass substrates. In general, the working principle of the plasma process is in a closed reaction chamber, so that the process gas flows uniformly to an electrode carrying the substrate to be coated or the substrate to be etched. Then, electric power is applied to the electrode tip of the electrode module to generate plasma between the electrode tip and the electrode, and the process gas is decomposed by the plasma to deposit or etch the substrate on the electrode.
在電漿製程中，電極模組之電極頭的水平會影響電場的分布狀況，而電場分布狀況將進一步影響電漿產生的均勻性，包含電漿密度與解離度。應用於電漿鍍膜或電漿蝕刻製程時，不均勻的電漿密度與解離率，將造成製程結果不佳。In the plasma process, the level of the electrode tip of the electrode module affects the distribution of the electric field, and the electric field distribution will further affect the uniformity of the plasma generation, including the plasma density and the degree of dissociation. When used in plasma coating or plasma etching processes, uneven plasma density and dissociation rate will result in poor process results.
因此，本新型之一態樣就是在提供一種真空電極模 組，其利用水平調整組件之三組微調元件來懸吊電極頭，其中這些微調元件可分別微調且不相互干涉行程，因而可提供三點構成平面的調校功能。故，利用這三組微調元件，可使真空電極模組之電極頭的底面呈水平。Therefore, one aspect of the present invention is to provide a vacuum electrode mold. The group uses three sets of fine adjustment elements of the level adjustment component to suspend the electrode heads, wherein the fine adjustment elements can be separately adjusted and do not interfere with each other, thereby providing a three-point alignment adjustment function. Therefore, by using the three sets of fine adjustment components, the bottom surface of the electrode tip of the vacuum electrode module can be horizontal.
本新型之另一態樣是在提供一種真空電極模組，由於其可調校電極頭而使電極頭之底面呈水平，因此可在電漿製程期間，確保電場維持均衡的分布，藉此可提高電漿之解離率與密度的均勻性，進而可提升電漿製程之品質。Another aspect of the present invention is to provide a vacuum electrode module in which the bottom surface of the electrode tip is horizontal due to its adjustable electrode tip, thereby ensuring a balanced distribution of the electric field during the plasma process. Improve the dissociation rate of the plasma and the uniformity of the density, thereby improving the quality of the plasma process.
根據本新型之上述目的，提出一種真空電極模組，適用以裝設於電漿處理腔體。真空電極模組包含法蘭組件、電極頭以及水平調整組件。法蘭組件適用以設置在電漿處理腔體之頂板中。電極頭設於法蘭組件之下方。水平調整組件接合在法蘭組件與電極頭之間。水平調整組件包含連結件、三支撐件、三調整接頭以及三調整件。連結件與法蘭組件之底面連接。每一支撐件接合在連結件之底面與電極頭之間。三調整接頭以可相對於電極頭轉動的方式嵌設於電極頭中，其中每一調整接頭包含延伸部，且這些延伸部分別延伸穿過前述支撐件。三調整件位於連結件上，且分別與前述延伸部結合。According to the above object of the present invention, a vacuum electrode module is proposed, which is suitable for being installed in a plasma processing chamber. The vacuum electrode module includes a flange assembly, an electrode tip, and a leveling assembly. The flange assembly is adapted to be placed in the top plate of the plasma processing chamber. The electrode tip is disposed below the flange assembly. The leveling assembly is engaged between the flange assembly and the electrode tip. The horizontal adjustment assembly includes a link, three supports, three adjustment joints, and three adjustment members. The link is connected to the bottom surface of the flange assembly. Each support member is coupled between the bottom surface of the joint and the electrode tip. The three adjustment joints are embedded in the electrode tip in a manner rotatable relative to the electrode tip, wherein each adjustment joint includes an extension, and the extensions extend through the aforementioned support members, respectively. The three adjustment members are located on the joint and are respectively combined with the aforementioned extensions.
依據本新型之一實施例，上述之法蘭組件上設有第一電性接頭，電極頭上設有第二電性接頭，且真空電極模組更包含軟性金屬線電性連接第一電性接頭與第二電性接頭。According to an embodiment of the present invention, the flange assembly is provided with a first electrical connector, the electrode tip is provided with a second electrical connector, and the vacuum electrode module further comprises a flexible metal wire electrically connected to the first electrical connector. And a second electrical connector.
依據本新型之另一實施例，上述之連結件包含環狀 部、三連接部以及三懸吊部。上述之三調整件位於環狀部上。三連接部自環狀部向外延伸，且分別鄰近這些調整件。三懸吊部分別將這些連接部與法蘭組件之底面連接。According to another embodiment of the present invention, the above connecting member comprises a ring shape Part, three connections and three suspensions. The above three adjustment members are located on the annular portion. The three connecting portions extend outward from the annular portion and are adjacent to the adjusting members, respectively. The three suspension portions respectively connect the connecting portions to the bottom surface of the flange assembly.
依據本新型之又一實施例，上述每一支撐件係一中空絕緣陶瓷柱。According to still another embodiment of the present invention, each of the support members is a hollow insulating ceramic column.
依據本新型之再一實施例，上述每一調整接頭係一半圓螺絲接頭，且包含互相接合之半圓接頭與上述之延伸部。According to still another embodiment of the present invention, each of the adjustment joints is a semi-circular screw joint and includes a semi-circular joint that is joined to each other and the extension portion.
依據本新型之再一實施例，上述每一延伸部為一螺紋部，且每一調整件為一螺帽。According to still another embodiment of the present invention, each of the extending portions is a threaded portion, and each of the adjusting members is a nut.
依據本新型之再一實施例，上述之真空電極模組更包含水冷組件設於法蘭組件之底面與電極頭之間。According to still another embodiment of the present invention, the vacuum electrode module further includes a water cooling component disposed between the bottom surface of the flange assembly and the electrode tip.
依據本新型之再一實施例，上述之法蘭組件包含至少一第一入水口，電極頭包含至少一第二入水口，且水冷組件包含至少一軟管連通前述至少一第一入水口與至少一第二入水口。According to still another embodiment of the present invention, the flange assembly includes at least one first water inlet, the electrode tip includes at least one second water inlet, and the water cooling assembly includes at least one hose communicating with the at least one first water inlet and at least A second water inlet.
依據本新型之再一實施例，上述之水冷組件更包含至少一絕緣件對應包覆上述至少一軟管。According to still another embodiment of the present invention, the water cooling assembly further includes at least one insulating member corresponding to the at least one hose.
100‧‧‧真空電極模組100‧‧‧vacuum electrode module
102‧‧‧電漿處理腔體102‧‧‧ Plasma processing chamber
104‧‧‧頂板104‧‧‧ top board
106‧‧‧腔室106‧‧‧ chamber
108‧‧‧電極頭108‧‧‧electrode head
110‧‧‧底面110‧‧‧ bottom
112‧‧‧電極112‧‧‧ electrodes
114‧‧‧上表面114‧‧‧ upper surface
116‧‧‧待處理基板116‧‧‧Substrate to be processed
118‧‧‧法蘭組件118‧‧‧Flange components
120‧‧‧水平調整組件120‧‧‧Horizontal adjustment components
122‧‧‧板體122‧‧‧ board
124‧‧‧第一電性接頭124‧‧‧First electrical connector
126‧‧‧第一入水口126‧‧‧ first water inlet
128‧‧‧連結件128‧‧‧Links
130‧‧‧支撐件130‧‧‧Support
132‧‧‧調整接頭132‧‧‧Adjust joints
134‧‧‧弧形接頭134‧‧‧Shaped joint
136‧‧‧延伸部136‧‧‧Extension
138‧‧‧調整件138‧‧‧Adjustment
140‧‧‧環狀部140‧‧‧Rings
142‧‧‧連接部142‧‧‧Connecting Department
144‧‧‧懸吊部144‧‧‧suspension
146‧‧‧底面146‧‧‧ bottom
148‧‧‧水冷組件148‧‧‧Water-cooled components
150‧‧‧第二電性接頭150‧‧‧Second electrical connector
152‧‧‧第二入水口152‧‧‧Second water inlet
154‧‧‧軟管154‧‧‧Hose
156‧‧‧絕緣件156‧‧‧Insulation
158‧‧‧軟性金屬線158‧‧‧Soft metal wire
160‧‧‧底面160‧‧‧ bottom
162‧‧‧開孔162‧‧‧ openings
164‧‧‧第一部分164‧‧‧Part 1
166‧‧‧第二部分166‧‧‧Part II
為讓本新型之上述和其他目的、特徵、優點與實施例能更明顯易懂，所附圖式之說明如下：第1圖係繪示依照本新型之一實施方式的一種真空電極模組裝設於電漿處理腔體之示意圖。The above and other objects, features, advantages and embodiments of the present invention will become more apparent and understood. The description of the drawings is as follows. FIG. 1 is a schematic diagram of a vacuum electrode mold assembly according to an embodiment of the present invention. A schematic diagram of the plasma processing chamber.
第2圖係繪示依照本新型之一實施方式的一種真空電極模組之裝置示意圖。2 is a schematic view of a device of a vacuum electrode module according to an embodiment of the present invention.
第3圖係繪示依照本新型之一實施方式的一種電極頭與部分之水平調整組件的裝置示意圖。3 is a schematic diagram of an apparatus for an electrode tip and a partial level adjustment assembly according to an embodiment of the present invention.
請參照第1圖，其係繪示依照本新型之一實施方式的一種真空電極模組裝設於電漿處理腔體之示意圖。在本實施方式中，真空電極模組100可裝設於電漿處理腔體102中。電漿處理腔體102之腔室106內設有電極112，待處理基板116可設置在電極112之上表面114上。當真空電極模組100裝設在電漿處理腔體102中時，真空電極模組100之電極頭108可與電極112之上表面114相對，而使電極頭108之底面110可面對電極112之上表面114上之待處理基板116，以利對待處理基板116進行電漿處理，例如鍍膜處理或蝕刻處理。蝕刻處理除了一般的圖案結構定義外，也包含汙染物去除的清潔處理。Please refer to FIG. 1 , which is a schematic diagram showing the assembly of a vacuum electrode mold in a plasma processing chamber according to an embodiment of the present invention. In the present embodiment, the vacuum electrode module 100 can be installed in the plasma processing chamber 102. An electrode 112 is disposed in the chamber 106 of the plasma processing chamber 102, and the substrate 116 to be processed may be disposed on the upper surface 114 of the electrode 112. When the vacuum electrode module 100 is installed in the plasma processing chamber 102, the electrode tip 108 of the vacuum electrode module 100 can face the upper surface 114 of the electrode 112, so that the bottom surface 110 of the electrode tip 108 can face the electrode 112. The substrate 116 to be processed on the upper surface 114 is subjected to a plasma treatment such as a plating treatment or an etching treatment for the substrate 116 to be processed. The etching process includes a cleaning process for removing contaminants in addition to the general pattern structure definition.
請一併參照第1圖與第2圖，其中第2圖係繪示依照本新型之一實施方式的一種真空電極模組之裝置示意圖。在一些實施例中，真空電極模組100包含法蘭組件118、電極頭108以及水平調整組件120。法蘭組件118主要包含板體122。如第1圖所示，真空電極模組100裝設於電漿處理腔體102時，板體122之一部分可覆蓋在電漿處理腔體102之頂板104上，板體122之另一部分可嵌合在頂板104中，以使電漿處理腔體102之腔室106呈密閉狀 態。法蘭組件118可設有第一電性接頭124，外部供應電源可與此第一電性接頭124電性連接，以利供應電力予真空電極模組100。外部供應電源可例如為直流電源或射頻(RF)電源。Please refer to FIG. 1 and FIG. 2 together. FIG. 2 is a schematic diagram of a vacuum electrode module according to an embodiment of the present invention. In some embodiments, the vacuum electrode module 100 includes a flange assembly 118, an electrode tip 108, and a leveling assembly 120. The flange assembly 118 primarily includes a plate body 122. As shown in FIG. 1, when the vacuum electrode module 100 is installed in the plasma processing chamber 102, a portion of the plate body 122 may be covered on the top plate 104 of the plasma processing chamber 102, and another portion of the plate body 122 may be embedded. Cooperating in the top plate 104 to make the chamber 106 of the plasma processing chamber 102 tightly closed state. The flange assembly 118 can be provided with a first electrical connector 124. The external power supply can be electrically connected to the first electrical connector 124 to supply power to the vacuum electrode module 100. The externally supplied power source can be, for example, a direct current power source or a radio frequency (RF) power source.
如第2圖所示，電極頭108設於法蘭組件118之下方。電極頭108可由耐熱材料所組成，例如鉬(Mo)。在一些例子中，電極頭108上可設有第二電性接頭150。另一方面，真空電極模組100可進一步包含軟性金屬線158，且此軟性金屬線158電性連接法蘭組件118之第一電性接頭124第二電性接頭150。透過第一電性接頭124、軟性金屬線158與第二電性接頭150，可將外部電源所供應之電力輸送到電極頭108。As shown in FIG. 2, the electrode tip 108 is disposed below the flange assembly 118. The electrode tip 108 may be composed of a heat resistant material such as molybdenum (Mo). In some examples, a second electrical connector 150 can be disposed on the electrode tip 108. On the other hand, the vacuum electrode module 100 can further include a flexible metal wire 158, and the flexible metal wire 158 is electrically connected to the first electrical connector 124 of the flange component 118 and the second electrical connector 150. The electric power supplied from the external power source can be supplied to the electrode tip 108 through the first electrical connector 124, the flexible metal wire 158, and the second electrical connector 150.
請再次參照第2圖，水平調整組件120接合在法蘭組件118與電極頭108之間。即，水平調整組件120之一端接合在法蘭組件118之底面146，而水平調整組件120之相對另一端則與電極頭108接合，藉此可將電極頭108懸掛在法蘭組件118之底面146下。Referring again to FIG. 2, the leveling assembly 120 is engaged between the flange assembly 118 and the electrode tip 108. That is, one end of the leveling assembly 120 engages the bottom surface 146 of the flange assembly 118, and the opposite end of the horizontal adjustment assembly 120 engages the electrode tip 108, whereby the electrode tip 108 can be suspended from the bottom surface 146 of the flange assembly 118. under.
請一併參照第2圖與第3圖，其中第3圖係繪示依照本新型之一實施方式的一種電極頭與部分之水平調整組件的裝置示意圖。在一些例子中，水平調整組件120包含連結件128與三組微調元件，即由三支撐件130、三調整接頭132以及三調整件138所構成之三組微調元件。連結件128與法蘭組件118之底面146接合，且支撐件130之一端均接合在連結件128之底面160，藉此連結件128可連結法 蘭組件118與支撐件130。Please refer to FIG. 2 and FIG. 3 together, wherein FIG. 3 is a schematic diagram of a device for adjusting the electrode tip and a part of the horizontal adjustment assembly according to an embodiment of the present invention. In some examples, the level adjustment assembly 120 includes a link 128 and three sets of fine adjustment elements, that is, three sets of fine adjustment elements composed of three support members 130, three adjustment joints 132, and three adjustment members 138. The coupling member 128 is engaged with the bottom surface 146 of the flange assembly 118, and one end of the support member 130 is coupled to the bottom surface 160 of the coupling member 128, whereby the coupling member 128 can be coupled. Blue assembly 118 and support member 130.
在一些示範例子中，如第2圖與第3圖所示，連結件128包含環狀部140、三連接部142以及三懸吊部144。環狀部140可呈圓環狀，而三連接部142均自環狀部140之外側向外延伸。這三個連接部142可均勻設置在環狀部140之外圍。舉例而言，調整件138設於環狀部140上，而這三個連接部142分別鄰近這些調整件138。三懸吊部144分別將連接部142與法蘭組件118之底面146連接，亦即每個懸吊部144之一端接合在法蘭組件118之底面，每個懸吊部144之另一端則與對應之連接部142接合。In some exemplary examples, as shown in FIGS. 2 and 3, the link 128 includes an annular portion 140, a triple connecting portion 142, and a triple hanging portion 144. The annular portion 140 may have an annular shape, and the three connecting portions 142 each extend outward from the outer side of the annular portion 140. The three connecting portions 142 may be evenly disposed at the periphery of the annular portion 140. For example, the adjusting member 138 is disposed on the annular portion 140, and the three connecting portions 142 are respectively adjacent to the adjusting members 138. The three suspension portions 144 respectively connect the connecting portion 142 with the bottom surface 146 of the flange assembly 118, that is, one end of each suspension portion 144 is joined to the bottom surface of the flange assembly 118, and the other end of each suspension portion 144 is The corresponding connecting portions 142 are joined.
每個支撐件130接合在水平調整組件120之連結件128與電極頭108之間。舉例而言，每個支撐件130之一端與連結件128之環狀部140的底面160接合，每個支撐件130之另一端則與電極頭108接合。在一些示範例子中，支撐件130為中空絕緣陶瓷柱，以避免支撐件130成為放電對象。Each support member 130 is engaged between the link 128 of the leveling assembly 120 and the electrode tip 108. For example, one end of each support member 130 engages the bottom surface 160 of the annular portion 140 of the link member 128, and the other end of each support member 130 engages the electrode tip 108. In some exemplary examples, the support member 130 is a hollow insulating ceramic post to prevent the support member 130 from becoming a discharge object.
調整接頭132以可相對於電極頭108轉動的方式嵌設於電極頭108中，且三支撐件130分別對應套接在這三個調整接頭132外。調整接頭132之材料可例如為不鏽鋼。在一些例子中，如第3圖所示，電極頭108具有三個開孔162，其中每個開孔162具有彼此連通的第一部分164與第二部分166。第一部分164可為弧形孔，例如半圓形孔。第二部分166為圓柱形孔。在這些例子中，調整接頭132可為弧形螺絲接頭，例如半圓形螺絲接頭。此外，調整接頭 132可包含互相接合之弧形接頭134與延伸部136，其中弧形接頭134可例如為半圓接頭，延伸部136可為螺紋部。 弧形接頭134與延伸部136分別對應設置在開孔162之第一部分164與第二部分166中，且延伸部136可從電極頭108而對應延伸穿過支撐件130。The adjusting joint 132 is embedded in the electrode tip 108 so as to be rotatable relative to the electrode tip 108, and the three supporting members 130 are respectively sleeved outside the three adjusting joints 132. The material of the adjustment joint 132 can be, for example, stainless steel. In some examples, as shown in FIG. 3, the electrode tip 108 has three openings 162, each of which has a first portion 164 and a second portion 166 that are in communication with each other. The first portion 164 can be a curved aperture, such as a semi-circular aperture. The second portion 166 is a cylindrical bore. In these examples, the adjustment joint 132 can be a curved screw joint, such as a semi-circular screw joint. In addition, adjust the joint The 132 can include an arcuate joint 134 and an extension 136 that engage each other, wherein the arcuate joint 134 can be, for example, a semi-circular joint and the extension 136 can be a threaded portion. The curved joint 134 and the extension 136 are respectively disposed in the first portion 164 and the second portion 166 of the opening 162, and the extending portion 136 can extend from the electrode head 108 correspondingly through the support member 130.
弧形接頭134可在開孔162之第一部分164中轉動，而延伸部136可在第二部分166中上下移動，且延伸部136亦可隨著弧形接頭134的轉動而在第二部分166中擺動。藉由設計開孔162之第二部分166的孔徑與延伸部136之直徑的尺寸，即設計開孔162之第二部分166與延伸部136之間的間距，可調整弧形接頭134在第一部分164中可轉動偏擺的幅度。延伸部136可延伸過支撐件130而穿出水平調整組件120之環狀部140，並與調整件138對應結合。當延伸部136為螺紋部時，設於連結件128之環狀部140上的調整件138可為螺帽，且延伸部136可與調整件138對應螺合。The curved joint 134 is rotatable in the first portion 164 of the opening 162, and the extension 136 is movable up and down in the second portion 166, and the extension 136 can also be in the second portion 166 as the curved joint 134 rotates. Swinging in. By designing the aperture of the second portion 166 of the aperture 162 and the diameter of the extension 136, i.e., the spacing between the second portion 166 of the aperture 162 and the extension 136, the curved joint 134 can be adjusted in the first portion. The amplitude of the yaw that can be rotated in 164. The extension portion 136 can extend through the support member 130 to pass through the annular portion 140 of the horizontal adjustment assembly 120 and be coupled to the adjustment member 138. When the extending portion 136 is a threaded portion, the adjusting member 138 disposed on the annular portion 140 of the connecting member 128 can be a nut, and the extending portion 136 can be screwed correspondingly to the adjusting member 138.
藉由旋轉一調整件138，可控制對應之延伸部136的上下移動，而在另外二延伸部138並未相對環狀部140上下移動的情況下，藉此可進一步控制此調整件138所對應連接之弧形接頭134相對於電極頭108的偏擺角度。也就是說，微調每個調整接頭132時，另二個調整接頭132並不會干涉此進行微調之調整接頭132的行程。請再次參照第2圖與第3圖，由於三個調整接頭132均係嵌設在電極頭108中，而三點可定義出一平面，因此藉由微調一或 二或三個調整接頭132的偏擺角度，可使電極頭108之底面110平行水平面。如此一來，如第1圖所示，可使電極頭108之底面110與電極112之上表面114平行，而形成密度與解離度均勻之電漿來對待處理基板116進行電漿處理。當然，在一些特定例子中，亦可根據製程需求，而藉由微調調整接頭132的偏擺角度，來使電極頭108之底面110相對水平面傾斜一角度。By rotating an adjusting member 138, the vertical movement of the corresponding extending portion 136 can be controlled, and in the case where the other two extending portions 138 are not moved up and down with respect to the annular portion 140, the corresponding adjustment member 138 can be further controlled. The yaw angle of the connected arcuate joint 134 relative to the electrode tip 108. That is to say, when each adjustment joint 132 is finely adjusted, the other two adjustment joints 132 do not interfere with the stroke of the adjustment joint 132 which is finely adjusted. Referring again to FIGS. 2 and 3, since the three adjustment joints 132 are embedded in the electrode tip 108, and the three points define a plane, by fine tuning one or The yaw angle of the two or three adjustment joints 132 allows the bottom surface 110 of the electrode tip 108 to be parallel to the horizontal plane. In this way, as shown in FIG. 1, the bottom surface 110 of the electrode tip 108 can be parallel to the upper surface 114 of the electrode 112, and a plasma having a uniform density and dissociation degree can be formed to perform plasma treatment on the substrate to be processed 116. Of course, in some specific examples, the bottom surface 110 of the electrode tip 108 may be inclined at an angle with respect to the horizontal plane by fine-tuning the yaw angle of the joint 132 according to the process requirements.
請再次參照第2圖，在一些例子中，真空電極模組100更可選擇性地包含水冷組件148，其中此水冷組件148設於法蘭組件118之底面146與電極頭108之間。水冷組件148可例如包含一或多個軟管154。軟管154之材料可例如為鐵氟龍。在一些示範例子中，水冷組件148更可包含一或多個絕緣件156對應包覆軟管154，藉以避免軟管154成為放電的對象，達到保護軟管154與穩定電漿系統的效果。Referring again to FIG. 2, in some examples, the vacuum electrode module 100 more preferably includes a water cooling assembly 148 disposed between the bottom surface 146 of the flange assembly 118 and the electrode tip 108. The water cooling assembly 148 can, for example, include one or more hoses 154. The material of the hose 154 can be, for example, Teflon. In some exemplary embodiments, the water-cooling assembly 148 may further include one or more insulating members 156 corresponding to the covering hose 154, so as to avoid the hose 154 becoming the object of discharge, to achieve the effect of protecting the hose 154 and stabilizing the plasma system.
在這樣的例子中，法蘭組件118更包含一或多個第一入水口126，這些第一入水口126穿設於板體122中。另一方面，電極頭108包含一或多個第二入水口152。第一入水口126及第二入水口152之數量均與軟管154之數量對應，藉此每個軟管154可連接對應之第一入水口126與第二入水口152。冷卻用流體可從第一入水口126導入，經由水冷組件148之軟管154與第二入水口152而流入電極頭108中，以冷卻電極頭108之溫度。In such an example, the flange assembly 118 further includes one or more first water inlets 126 that are disposed in the plate body 122. In another aspect, the electrode tip 108 includes one or more second water inlets 152. The number of the first water inlet 126 and the second water inlet 152 are both corresponding to the number of the hoses 154, whereby each of the hoses 154 can be connected to the corresponding first water inlet 126 and second water inlet 152. The cooling fluid can be introduced from the first water inlet 126, and flows into the electrode tip 108 via the hose 154 of the water-cooling assembly 148 and the second water inlet 152 to cool the temperature of the electrode tip 108.
由上述之實施方式可知，本新型之一優點就是因為 本新型之真空電極模組利用水平調整組件之三組微調元件來懸吊電極頭，其中這些微調元件可分別微調且不相互干涉行程，因而可提供三點構成平面的調校功能。因此，利用這三組微調元件，可使真空電極模組之電極頭的底面呈水平。It can be seen from the above embodiments that one of the advantages of the present invention is because The vacuum electrode module of the present invention suspends the electrode heads by using three sets of fine adjustment components of the horizontal adjustment component, wherein the fine adjustment components can be separately adjusted and do not interfere with each other, thereby providing a three-point adjustment function of the plane. Therefore, by using the three sets of fine adjustment components, the bottom surface of the electrode tip of the vacuum electrode module can be made horizontal.
由上述之實施方式可知，本新型之另一優點就是因為本新型之真空電極模組可調校電極頭而使電極頭之底面呈水平，因此可在電漿製程期間，確保電場維持均衡的分布，藉此可提高電漿之解離率與密度的均勻性，進而可提升電漿製程之品質。It can be seen from the above embodiments that another advantage of the present invention is that the bottom surface of the electrode tip is horizontal because the vacuum electrode module of the present invention can adjust the electrode tip, thereby ensuring a balanced distribution of the electric field during the plasma process. Thereby, the dissociation rate and density uniformity of the plasma can be improved, thereby improving the quality of the plasma process.
雖然本新型已以實施例揭露如上，然其並非用以限定本新型，任何在此技術領域中具有通常知識者，在不脫離本新型之精神和範圍內，當可作各種之更動與潤飾，因此本新型之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of this new type is subject to the definition of the scope of the patent application.
108‧‧‧電極頭108‧‧‧electrode head
120‧‧‧水平調整組件120‧‧‧Horizontal adjustment components
128‧‧‧連結件128‧‧‧Links
130‧‧‧支撐件130‧‧‧Support
132‧‧‧調整接頭132‧‧‧Adjust joints
134‧‧‧弧形接頭134‧‧‧Shaped joint
136‧‧‧延伸部136‧‧‧Extension
138‧‧‧調整件138‧‧‧Adjustment
140‧‧‧環狀部140‧‧‧Rings
142‧‧‧連接部142‧‧‧Connecting Department
160‧‧‧底面160‧‧‧ bottom
162‧‧‧開孔162‧‧‧ openings
164‧‧‧第一部分164‧‧‧Part 1
166‧‧‧第二部分166‧‧‧Part II
Claims (9)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103218362U TWM495366U (en) | 2014-10-16 | 2014-10-16 | Vacuum electrode module |
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| Application Number | Priority Date | Filing Date | Title |
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| TW103218362U TWM495366U (en) | 2014-10-16 | 2014-10-16 | Vacuum electrode module |
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| Publication Number | Publication Date |
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| TWM495366U true TWM495366U (en) | 2015-02-11 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107606692A (en) * | 2016-07-11 | 2018-01-19 | 馗鼎奈米科技股份有限公司 | Plasma purification module |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107606692A (en) * | 2016-07-11 | 2018-01-19 | 馗鼎奈米科技股份有限公司 | Plasma purification module |
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