TWM491206U - Pattern unnoticeable transparent conductive structure for touch panel - Google Patents

Pattern unnoticeable transparent conductive structure for touch panel Download PDF

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TWM491206U
TWM491206U TW103213299U TW103213299U TWM491206U TW M491206 U TWM491206 U TW M491206U TW 103213299 U TW103213299 U TW 103213299U TW 103213299 U TW103213299 U TW 103213299U TW M491206 U TWM491206 U TW M491206U
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transparent conductive
conductive structure
refractive
structure according
convex portion
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TW103213299U
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Chinese (zh)
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Zhong-Ping Guo
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Apex Material Technology Corp
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Description

圖形不顯著之觸控面板用透明導電構造體Transparent conductive structure for touch panel with insignificant graphics

本創作係關於觸控面板,特別是關於一種蝕刻圖案之圖形不顯著之觸控面板用透明導電構造體。The present invention relates to a touch panel, and more particularly to a transparent conductive structure for a touch panel in which the pattern of an etching pattern is not conspicuous.

觸控面板,又稱為觸控螢幕、輕觸式屏幕(英文:Touch panel、Touchscreens、Touch pad等),是個可接收觸頭(如:手指或膠筆尖等)等輸入訊號的感應式液晶顯示裝置,當接觸了螢幕上的圖形按鈕時,螢幕上的觸覺反饋系統可根據預先編程的程式驅動各種連結裝置,可用以取代機械式的按鈕面板。目前觸控面板的觸控技術較為熟知的有:電阻式(Analog Resistive)、表面電容式(Surface Capacitive)、投射電容式(Projected Capacitive)、紅外線式、聲波式、光學式、電磁感應式與數位式等。其中投射電容式最大的優勢即是觸頭無須直接接觸,面板可置於透明基材下方而得到良好的保護,即便是帶著手套亦可以使投射電容式面板作動。Touch panel, also known as touch screen, touch screen (English: Touch panel, Touchscreens, Touch pad, etc.), is an inductive liquid crystal display that can receive input signals such as fingers or glue pen tips. The device, when touched on the graphic button on the screen, the tactile feedback system on the screen can drive various linkage devices according to a pre-programmed program, which can be used to replace the mechanical button panel. At present, the touch technology of the touch panel is well known: Analog Resistive, Surface Capacitive, Projected Capacitive, Infrared, Acoustic, Optical, Electromagnetic Inductive and Digital And so on. The biggest advantage of the projected capacitive type is that the contacts do not need to be in direct contact, and the panel can be placed under the transparent substrate to obtain good protection. Even with the glove, the projected capacitive panel can be actuated.

如圖1所示,投射電容式觸控面板係由氧化銦錫玻璃80、垂直電極列82、水平電極列81及硬殼層83所組成,而垂直電極列82與水平電極列81彼此間必須留有間隙(gap),才不會於兩者之間造成短路。當人體手指觸碰電容式觸控面板的表面時,相應位置的電容量會受到改變,因而得以偵測到觸碰位置,也會造成垂直電極列82與水平電極列81間之XY交會處間的電容值產生變化。如圖2所示,當使用者由上俯視觸控面板時,垂直電極列與水平電極列會在視覺中產生視覺痕跡(trace)現象(或稱為光學可視性),導致使用者在使用時會看到內部蝕刻圖案,如:格紋或菱形紋,令使用者在視覺體驗上受到影響。As shown in FIG. 1 , the projected capacitive touch panel is composed of indium tin oxide glass 80 , vertical electrode array 82 , horizontal electrode array 81 and hard shell layer 83 , and vertical electrode array 82 and horizontal electrode array 81 must be mutually There is a gap (gap) to prevent a short circuit between the two. When the human finger touches the surface of the capacitive touch panel, the capacitance of the corresponding position is changed, so that the touch position is detected, and the XY intersection between the vertical electrode column 82 and the horizontal electrode column 81 is also caused. The capacitance value changes. As shown in FIG. 2, when the user views the touch panel from above, the vertical electrode column and the horizontal electrode column may cause a visual trace phenomenon (or optical visibility) in the visual, resulting in the user in use. You will see internal etched patterns, such as plaid or diamond-shaped patterns, which will affect the user's visual experience.

有鑑於此,本創作提供一種圖形不顯著之觸控面板用透明導電構造體,其可作為觸控面板之上板或下板之結構。此透明導電構造體藉由複數個光調節結構的配置,獲得令圖案化後之透明導電層的凸起部的蝕刻圖形變得不顯著之技術效果,從而降低或避免使用者在使用觸控面板時視覺體驗上受到的蝕刻圖案之影響。In view of this, the present invention provides a transparent conductive structure for a touch panel that is inconspicuous in graphics, and can be used as a structure of an upper or lower panel of a touch panel. The transparent conductive structure obtains the technical effect of making the etching pattern of the convex portion of the patterned transparent conductive layer inconspicuous by the arrangement of the plurality of light adjusting structures, thereby reducing or avoiding the user's use of the touch panel. The effect of the etching pattern on the visual experience.

本創作之一實施例提出一種圖形不顯著之觸控面板用透明導電構造體,其包括:透明基板、透明導電層及複數個光調節結構。透明導電層係被圖案化而形成在透明基板之至少一表面,透明導電層具有複數個凸起部。複數個光調節結構之各個係配置到複數個凸起部中一對應的凸起部。One embodiment of the present invention provides a transparent conductive structure for a touch panel that is inconspicuous in graphics, comprising: a transparent substrate, a transparent conductive layer, and a plurality of light adjusting structures. The transparent conductive layer is patterned to form at least one surface of the transparent substrate, and the transparent conductive layer has a plurality of convex portions. Each of the plurality of light adjustment structures is disposed to a corresponding one of the plurality of raised portions.

本創作之另一實施例提出一種圖形不顯著之觸控面板用透明導電構造體,其包括:透明基板、透明導電層及複數個光調節結構。複數個光調節結構之各個係配置到該複數個凸起部中對應之至少二相鄰的凸起部之間並覆蓋該二相鄰的凸起部之至少一部分。Another embodiment of the present invention provides a transparent conductive structure for a touch panel that is inconspicuous in graphics, comprising: a transparent substrate, a transparent conductive layer, and a plurality of light adjusting structures. Each of the plurality of light adjustment structures is disposed between the corresponding at least two adjacent raised portions of the plurality of raised portions and covers at least a portion of the two adjacent raised portions.

又本創作之一些實施態樣中,前述複數個光調節結構各個包括:第一折射部及第二折射部,其中第一折射部的折射率高於第二折射部的折射率。In some implementations of the present invention, the plurality of light adjustment structures each include: a first refractive portion and a second refractive portion, wherein a refractive index of the first refractive portion is higher than a refractive index of the second refractive portion.

又本創作之一些實施態樣中,前述透明導電層可包括諸如氧化銦錫(ITO)、奈米複合材或金屬網格之成分。In some embodiments of the present invention, the transparent conductive layer may include components such as indium tin oxide (ITO), a nano composite, or a metal mesh.

為了讓上述本發明的各方面以及其他方面更為明顯易懂,於下文中將以多個實施例助以對應相關之圖式來進行詳細之說明。In order to make the various aspects and the aspects of the present invention described above more readily apparent, the detailed description of the embodiments will be described in the accompanying drawings.

以下將參照相關圖式,說明依本創作之觸控面板用透明導電構造體之實施例,為便於理解,下述實施例中之相同元件係以相同之符號標示來說明。The embodiments of the transparent conductive structure for a touch panel according to the present invention will be described below with reference to the related drawings. For the sake of understanding, the same components in the following embodiments are denoted by the same reference numerals.

請參考圖3,其顯示一種觸控面板用透明導電構造體之第一實施例。例如圖1所示的電容式觸控面板或電阻式觸控面板等各種的觸控面板的上板及下板中至少一者,皆可基於此實施例的透明導電構造體1而實現。此透明導電構造體1藉由複數個光調節結構12的配置,獲得令圖案化後之透明導電層13的凸起部130的蝕刻圖形變得不顯著之技術效果,從而降低或避免使用者在使用觸控面板時視覺體驗上受到的蝕刻圖案之影響。Please refer to FIG. 3, which shows a first embodiment of a transparent conductive structure for a touch panel. For example, at least one of the upper and lower plates of various touch panels such as the capacitive touch panel or the resistive touch panel shown in FIG. 1 can be realized based on the transparent conductive structure 1 of the embodiment. The transparent conductive structure 1 has a technical effect of making the etching pattern of the convex portion 130 of the patterned transparent conductive layer 13 inconspicuous by the arrangement of the plurality of light adjusting structures 12, thereby reducing or avoiding the user's The effect of the etched pattern on the visual experience when using the touch panel.

如圖3所示,透明導電構造體1包括透明基板10、複數個光調節結構12、透明導電層13。而為了例示之緣故,透明導電構造體1更包括披覆層11及介電質14,惟其可依透明導電構造體1的各個態樣的實作需要而變化,故並不受限於此。As shown in FIG. 3, the transparent conductive structure 1 includes a transparent substrate 10, a plurality of light-adjusting structures 12, and a transparent conductive layer 13. For the sake of exemplification, the transparent conductive structure 1 further includes the cladding layer 11 and the dielectric material 14, but it may vary depending on the needs of the various aspects of the transparent conductive structure 1, and is not limited thereto.

在圖3中,透明導電層13係被圖案化而形成在透明基板10之至少一表面,透明導電層13具有複數個凸起部130。複數個光調節結構13之各個係配置到複數個凸起部130中一對應的凸起部。在圖3中,凸起部130係配置於對應的光調節結構12之上。然而,其配置方式並不受限於此,只要能令圖案化後之透明導電層13的凸起部130的蝕刻圖形變得不顯著(即得以降低顯著性)的任何配置方式皆可視為本案之實施方式;例如可選擇性地忽略某些蝕刻圖形而可不配置光調節結構,又例如改變其上下配置關係。In FIG. 3, the transparent conductive layer 13 is patterned to form at least one surface of the transparent substrate 10, and the transparent conductive layer 13 has a plurality of convex portions 130. Each of the plurality of light adjustment structures 13 is disposed to a corresponding one of the plurality of raised portions 130. In FIG. 3, the raised portions 130 are disposed on the corresponding light adjustment structure 12. However, the arrangement thereof is not limited thereto, and any configuration that can make the etching pattern of the convex portion 130 of the patterned transparent conductive layer 13 inconspicuous (ie, reduce the saliency) can be regarded as the case. Embodiments; for example, some etched patterns may be selectively ignored without the light regulating structure being disposed, and for example, the upper and lower arrangement relationship may be changed.

在透明導電構造體1的一實施態樣中,複數光調節結構12之各個具有折射率為1.70~2.50的介電質。In an embodiment of the transparent conductive structure 1, each of the plurality of light-modulating structures 12 has a dielectric having a refractive index of 1.70 to 2.50.

在透明導電構造體1的另一實施態樣中,對於複數個凸起部130之一凸起部而言,透明導電構造體1中具有該凸起部的部分和沒有該凸起部的部分至少光透過率差異小於一門檻值,從而使透明導電構造體1的透明導電層13的該凸起部的圖案不顯著。舉例而言,透明導電構造體1中具有該凸起部的部分和沒有該凸起部的部分至少光透過率之差異,係滿足以下關係: 0≦∣T1-T0∣≦TH    (條件式1), 其中T1表示具有該凸起部的部分的透明導電構造體1的光透過率,T0表示沒有該凸起部的部分的透明導電構造體1的光透過率,TH表示門檻值,而且0.5≦TH≦1.2。In another embodiment of the transparent conductive structure 1, for a convex portion of the plurality of convex portions 130, a portion of the transparent conductive structural body 1 having the convex portion and a portion without the convex portion At least the difference in light transmittance is less than a threshold value, so that the pattern of the convex portion of the transparent conductive layer 13 of the transparent conductive structure 1 is not conspicuous. For example, the difference in light transmittance between the portion having the convex portion and the portion having no such convex portion in the transparent conductive structure 1 satisfies the following relationship: 0≦∣T1-T0∣≦TH (Condition 1) Wherein T1 represents the light transmittance of the transparent conductive structure 1 having the convex portion, T0 represents the light transmittance of the transparent conductive structure 1 having no portion of the convex portion, TH represents the threshold value, and 0.5 ≦TH≦1.2.

此外,對於前述之實施態樣,透明導電構造體1中具有該凸起部的部分和沒有該凸起部的部分,對於色彩b值: 0≦∣b1-b0∣≦1.0    (條件式2), b1表示具有該凸起部的部分的透明導電構造體1的色彩b值,b0表示沒有該凸起部的部分的透明導電構造體1的色彩b值。Further, with the foregoing embodiment, the portion having the convex portion and the portion without the convex portion in the transparent conductive structural body 1 are for the color b value: 0 ≦∣ b1 - b0 ∣≦ 1.0 (Condition 2) B1 represents the color b value of the transparent conductive structural body 1 having the convex portion, and b0 represents the color b value of the transparent conductive structural body 1 having no such convex portion.

請再參考圖3,透明導電構造體1的另一實施態樣中,複數個光調節結構12各個包括:第一折射部121及第二折射部122,第一折射部121的折射率高於第二折射部122的折射率。舉例而言,第一折射部121的折射率為1.70~2.50,其膜厚在4~20nm之範圍;第二折射部122的折射率為1.30~1.60,其膜厚在20~50nm之範圍。Referring to FIG. 3 again, in another embodiment of the transparent conductive structure 1, the plurality of light adjusting structures 12 each include: a first refractive portion 121 and a second refractive portion 122, and the refractive index of the first refractive portion 121 is higher than The refractive index of the second refractive portion 122. For example, the refractive index of the first refractive portion 121 is 1.70 to 2.50, and the film thickness thereof is in the range of 4 to 20 nm; the refractive index of the second refractive portion 122 is 1.30 to 1.60, and the film thickness is in the range of 20 to 50 nm.

對於第一實施例之透明導電構造體1來說,複數個光調節結構12係包括至少二氧化矽(SiO2)、二氧化鈦(TiO2)或五氧化二鈮(Nb2O5)。然而,其實施方式並不受限於此。For the transparent conductive structure 1 of the first embodiment, the plurality of light-regulating structures 12 include at least cerium oxide (SiO2), titanium oxide (TiO2) or tantalum pentoxide (Nb2O5). However, the embodiment thereof is not limited to this.

此外,除了可利用氧化銦錫(ITO)來作為透明導電構造體1的透明導電層13的材質以外,透明導電層13更可利用任何適當的成分或結合不同成分而成,例如是具有低電阻率及高光穿透率的成分。舉例而言,透明導電層13可包括奈米複合材,譬如奈米碳管、奈米銀或其他合適的以樹脂、橡膠、陶瓷和金屬等基體為連續相之複合材料。在另一例子中,透明導電層13包括金屬網格(metal mesh)。Further, in addition to the use of indium tin oxide (ITO) as the material of the transparent conductive layer 13 of the transparent conductive structure 1, the transparent conductive layer 13 can be formed by using any suitable component or combining different components, for example, having low electrical resistance. The composition of the rate and high light transmittance. For example, the transparent conductive layer 13 may comprise a nanocomposite, such as a carbon nanotube, nanosilver or other suitable composite material having a matrix of a resin, rubber, ceramic, and metal as a continuous phase. In another example, the transparent conductive layer 13 includes a metal mesh.

請一併參閱圖4、5,其示意的一觸控面板之上板190及下板191分別具有蝕刻圖案(pattern)呈交錯排列,其係利用微機電製程技術以蝕刻方式於上板190上製作導線X1-Xm的圖騰,於下板191上製作Y1-Yn的的圖騰,其中蝕刻圖案可基於菱形而做成,m及n皆為大於1的正整數;但本創作所能應用的觸控面板並不以此為限。上板190及下板191分別基於第一實施例而製作。如此一來,當使用者由上俯視基於本創作之實施例而實現的觸控面板時,上板190及下板191所具有之蝕刻圖案(pattern)藉由複數個光調節結構12的配置,令圖案化後之透明導電層13的凸起部130的蝕刻圖形變得不顯著,從而降低或避免使用者在視覺體驗上受到的影響。如此,降低了視覺上的痕跡(trace)現象(或稱光學顯著性)。Referring to FIG. 4 and FIG. 5 together, a touch panel upper plate 190 and a lower plate 191 are respectively arranged with staggered etching patterns, which are etched on the upper plate 190 by using microelectromechanical process technology. Making a totem of the wire X1-Xm, making a totem of Y1-Yn on the lower plate 191, wherein the etching pattern can be made based on a diamond shape, and both m and n are positive integers greater than one; but the touch that can be applied by the creation The control panel is not limited to this. The upper plate 190 and the lower plate 191 are each fabricated based on the first embodiment. In this way, when the user views the touch panel implemented based on the embodiment of the present invention, the etching patterns of the upper plate 190 and the lower plate 191 are configured by a plurality of light adjusting structures 12, The etched pattern of the raised portion 130 of the patterned transparent conductive layer 13 becomes inconspicuous, thereby reducing or avoiding the influence of the user on the visual experience. In this way, the visual trace phenomenon (or optical saliency) is reduced.

請參考圖6,其顯示觸控面板用透明導電構造體之第二實施例。例如圖1所示的電容式觸控面板或圖4、5的觸控面板或電阻式觸控面板等各種的觸控面板的上板及下板中至少一者,皆可基於此實施例的透明導電構造體2而實現。此透明導電構造體2藉由複數個光調節結構22的配置,令圖案化後之透明導電層23的凸起部230的蝕刻圖形變得不顯著,從而降低或避免使用者在視覺體驗上受到的影響。Please refer to FIG. 6, which shows a second embodiment of a transparent conductive structure for a touch panel. For example, at least one of the upper and lower panels of the capacitive touch panel shown in FIG. 1 or the touch panel or the resistive touch panel of FIGS. 4 and 5 can be based on this embodiment. The transparent conductive structure 2 is realized. The transparent conductive structure 2 is configured such that the etched pattern of the raised portion 230 of the patterned transparent conductive layer 23 becomes inconspicuous by the arrangement of the plurality of light adjusting structures 22, thereby reducing or avoiding the user's visual experience. Impact.

如圖6所示,透明導電構造體2包括透明基板10、複數個光調節結構22、透明導電層23。而為了例示之緣故,透明導電構造體1更包括披覆層11及介電質24,惟其可依透明導電構造體2的各個態樣的實作需要而變化,故並不受限於此。As shown in FIG. 6, the transparent conductive structure 2 includes a transparent substrate 10, a plurality of light adjustment structures 22, and a transparent conductive layer 23. For the sake of exemplification, the transparent conductive structure 1 further includes the cladding layer 11 and the dielectric material 24, but it may vary depending on the needs of the various aspects of the transparent conductive structure 2, and is not limited thereto.

在圖6中,透明導電層23係被圖案化而形成在透明基板10之至少一表面,透明導電層23具有複數個凸起部230。複數光調節結構22之各個係配置到複數個凸起部230中對應之至少二相鄰的凸起部之間並覆蓋該二相鄰的凸起部之至少一部分。在圖6中,一個光調節結構22如同以填充在二相鄰的凸起部230之間的方式來配置;然而,其配置方式並不受限於此,只要能令圖案化後之透明導電層23的凸起部230的蝕刻圖形變得不顯著(即得以降低顯著性)的任何配置方式皆可視為本案之實施方式;例如可選擇性地忽略某些蝕刻圖形而可不配置光調節結構,又例如改變其上下配置關係。In FIG. 6, the transparent conductive layer 23 is patterned to form at least one surface of the transparent substrate 10, and the transparent conductive layer 23 has a plurality of convex portions 230. Each of the plurality of light adjustment structures 22 is disposed between at least two adjacent raised portions of the plurality of raised portions 230 and covers at least a portion of the two adjacent raised portions. In FIG. 6, a light-adjusting structure 22 is disposed in such a manner as to be filled between two adjacent convex portions 230; however, the configuration thereof is not limited thereto, as long as the patterned transparent conductive can be obtained. Any configuration in which the etched pattern of the raised portion 230 of the layer 23 becomes insignificant (ie, reduces significance) can be considered as an embodiment of the present invention; for example, some etched patterns can be selectively ignored without the light modulating structure being disposed. For example, the upper and lower configuration relationship is changed.

又本實施例的透明導電構造體2亦可參照第一實施例的透明導電構造體1的各個實施態樣來實現。Further, the transparent conductive structure 2 of the present embodiment can also be realized by referring to each embodiment of the transparent conductive structure 1 of the first embodiment.

例如,請再參考圖6,透明導電構造體2的一實施態樣中,複數個光調節結構22各個包括:第一折射部221及第二折射部222,第一折射部221的折射率高於第二折射部222的折射率。舉例而言,第一折射部221的折射率為1.70~2.50,其膜厚在4~20nm之範圍;第二折射部222的折射率為1.30~1.60,其膜厚在20~50nm之範圍。For example, referring to FIG. 6 , in an embodiment of the transparent conductive structure 2 , the plurality of light adjusting structures 22 each include a first refractive portion 221 and a second refractive portion 222 , and the first refractive portion 221 has a high refractive index. The refractive index of the second refractive portion 222. For example, the refractive index of the first refractive portion 221 is 1.70 to 2.50, and the film thickness thereof is in the range of 4 to 20 nm; the refractive index of the second refractive portion 222 is 1.30 to 1.60, and the film thickness is in the range of 20 to 50 nm.

故此,參照第一實施例的透明導電構造體1的各個實施態樣,第二實施例的透明導電構造體2亦具有多種不同實施態樣,其中對應的元件、結構、參數、材料或條件式皆可依此類推而完成,故此不再贅述。Therefore, referring to various embodiments of the transparent conductive structure 1 of the first embodiment, the transparent conductive structure 2 of the second embodiment also has various implementations in which corresponding components, structures, parameters, materials or conditional expressions are used. It can be done in the same way as it is, so it will not be described again.

如前述實施例所例示的透明導電構造體,係藉由複數個光調節結構的配置,獲得令圖案化後之透明導電層的凸起部的蝕刻圖形變得不顯著之技術效果,從而降低或避免使用者在使用觸控面板時視覺體驗上受到的蝕刻圖案之影響。The transparent conductive structure as exemplified in the foregoing embodiment has a technical effect of making the etching pattern of the convex portion of the patterned transparent conductive layer inconspicuous by the arrangement of the plurality of light adjusting structures, thereby reducing or Avoid the influence of the etched pattern on the visual experience when the user uses the touch panel.

惟以上所述者,僅為本創作之實施例而已,並非用以限定本創作實施之範圍,故該所屬技術領域中具有通常知識者,或是熟悉此技術所作出等效或輕易的變化者,在不脫離本創作之精神與範圍下所作之均等變化與修飾,皆應涵蓋於本創作之專利範圍內。However, the above description is only for the embodiments of the present invention, and is not intended to limit the scope of the present invention, so that those skilled in the art having ordinary knowledge or equivalent or easy changes in the art. Equivalent changes and modifications made without departing from the spirit and scope of this creation shall be covered by the scope of this creation.

1、2‧‧‧透明導電構造體
10‧‧‧基材
11‧‧‧披覆層
12、22‧‧‧光調節結構
121、221‧‧‧第一折射部
122、222‧‧‧第二折射部
13、23‧‧‧透明導電層
130、230‧‧‧透明導電層之凸起部
14、24‧‧‧介電層
80‧‧‧氧化銦錫玻璃
81‧‧‧水平電極列
82‧‧‧垂直電極列
83‧‧‧硬殼層
91‧‧‧上部基板
92‧‧‧下部基板
90‧‧‧氧化銦錫
190‧‧‧上板
191‧‧‧下板
1, 2‧‧‧ Transparent Conductive Structure
10‧‧‧Substrate
11‧‧‧coating
12, 22‧‧‧Light adjustment structure
121, 221‧‧‧ First Refraction
122, 222‧‧‧second refraction
13, 23‧‧‧ Transparent conductive layer
130, 230‧‧‧The convex part of the transparent conductive layer
14, 24‧‧‧ dielectric layer
80‧‧‧Indium tin oxide glass
81‧‧‧ horizontal electrode column
82‧‧‧Vertical electrode column
83‧‧‧ hard shell
91‧‧‧Upper substrate
92‧‧‧Lower substrate
90‧‧‧Indium tin oxide
190‧‧‧Upper board
191‧‧‧ Lower board

圖1係為習知觸控面板之示意圖。 圖2係為習知觸控面板之示意圖。 圖3係為本創作之圖形不顯著之觸控面板用透明導電構造體之第一實施例之剖面圖。 圖4係為本創作之圖形不顯著之觸控面板之實施例之示意圖。 圖5係為本創作之圖形不顯著之觸控面板之實施例之剖面示意圖。 圖6係為本創作之圖形不顯著之觸控面板用透明導電構造體之第二實施例之剖面圖。FIG. 1 is a schematic diagram of a conventional touch panel. 2 is a schematic diagram of a conventional touch panel. Fig. 3 is a cross-sectional view showing a first embodiment of a transparent conductive structure for a touch panel in which the pattern of the creation is not conspicuous. FIG. 4 is a schematic diagram of an embodiment of a touch panel in which the created graphics are not conspicuous. FIG. 5 is a schematic cross-sectional view showing an embodiment of a touch panel in which the graphic of the creation is not conspicuous. Fig. 6 is a cross-sectional view showing a second embodiment of the transparent conductive structure for a touch panel in which the pattern of the creation is not conspicuous.

1‧‧‧透明導電構造體 1‧‧‧Transparent Conductive Structure

10‧‧‧基材 10‧‧‧Substrate

11‧‧‧披覆層 11‧‧‧coating

12‧‧‧光調節結構 12‧‧‧Light adjustment structure

121‧‧‧第一折射部 121‧‧‧First Refraction

122‧‧‧第二折射部 122‧‧‧Second Refraction

13‧‧‧透明導電層 13‧‧‧Transparent conductive layer

130‧‧‧透明導電層之凸起部 130‧‧‧Protruding part of transparent conductive layer

14‧‧‧介電層 14‧‧‧Dielectric layer

Claims (22)

一種圖形不顯著之觸控面板用透明導電構造體,包括:一透明基板;一透明導電層,其被圖案化而形成在該透明基板之至少一表面,該透明導電層具有複數個凸起部;及複數個光調節結構,該複數光調節結構之各個係配置到該複數個凸起部中一對應的凸起部。A transparent conductive structure for a touch panel, comprising: a transparent substrate; a transparent conductive layer patterned to form at least one surface of the transparent substrate, the transparent conductive layer having a plurality of convex portions And a plurality of light adjustment structures, each of the plurality of light adjustment structures being disposed to a corresponding one of the plurality of protrusions. 如請求項1所記載之透明導電構造體,其中該複數光調節結構之各個具有折射率為1.70~2.50的介電質。The transparent conductive structure according to claim 1, wherein each of the plurality of light adjusting structures has a dielectric having a refractive index of 1.70 to 2.50. 如請求項1所記載之透明導電構造體,其中對於該複數個凸起部之一凸起部,該透明導電構造體中具有該凸起部的部分和沒有該凸起部的部分至少光透過率差異小於一門檻值,從而使該透明導電構造體的該透明導電層的該凸起部的圖案不顯著。The transparent conductive structure according to claim 1, wherein a portion of the transparent conductive structure having the convex portion and a portion having the convex portion are at least light-transmitting for one of the plurality of convex portions The difference in rate is less than a threshold value such that the pattern of the raised portion of the transparent conductive layer of the transparent conductive structure is not significant. 如請求項3所記載之透明導電構造體,其中該透明導電構造體中具有該凸起部的部分和沒有該凸起部的部分至少光透過率之差異,係滿足以下關係:0≦∣T1-T0∣≦TH,其中T1表示具有該凸起部的部分的該透明導電構造體的光透過率,T0表示沒有該凸起部的部分的該透明導電構造體的光透過率,TH表示該門檻值,而且0.5≦TH≦1.2。The transparent conductive structure according to claim 3, wherein a difference in light transmittance between a portion having the convex portion and a portion having the convex portion in the transparent conductive structure satisfies the following relationship: 0≦∣T1 -T0∣≦TH, where T1 represents the light transmittance of the transparent conductive structure having the portion of the raised portion, T0 represents the light transmittance of the transparent conductive structure without the portion of the raised portion, and TH represents the light transmittance The threshold is ,, and 0.5≦TH≦1.2. 如請求項4所記載之透明導電構造體,其中該透明導電構造體中具有該凸起部的部分和沒有該凸起部的部分,對於色彩b值:0≦∣b1-b0∣≦1.0,b1表示具有該凸起部的部分的該透明導電構造體的色彩b值,b0表示沒有該凸起部的部分的該透明導電構造體的色彩b值。The transparent conductive structure according to claim 4, wherein the portion having the convex portion and the portion having the convex portion in the transparent conductive structure have a color b value of 0≦∣b1-b0∣≦1.0, B1 represents the color b value of the transparent conductive structure having the portion of the convex portion, and b0 represents the color b value of the transparent conductive structure without the portion of the convex portion. 如請求項1所記載之透明導電構造體,其中該複數個光調節結構各個包括:一第一折射部;及一第二折射部,該第一折射部的折射率高於該第二折射部的折射率。The transparent conductive structure of claim 1, wherein the plurality of light adjustment structures each comprise: a first refractive portion; and a second refractive portion, the first refractive portion having a higher refractive index than the second refractive portion Refractive index. 如請求項6所記載之透明導電構造體,其中該第一折射部的折射率為1.70~2.50,該第一折射部的膜厚在4~20nm之範圍,該第二折射部的折射率為1.30~1.60,該第二折射部的膜厚在20~50nm之範圍。The transparent conductive structure according to claim 6, wherein the refractive index of the first refractive portion is 1.70 to 2.50, the film thickness of the first refractive portion is in the range of 4 to 20 nm, and the refractive index of the second refractive portion is 1.30~1.60, the film thickness of the second refractive portion is in the range of 20 to 50 nm. 如請求項1至7中任一項所記載之透明導電構造體,其中該複數個光調節結構係包括至少二氧化矽(SiO2 )、二氧化鈦(TiO2 )或五氧化二鈮(Nb2 O5 )。The transparent conductive structure according to any one of claims 1 to 7, wherein the plurality of light-regulating structures comprise at least cerium oxide (SiO 2 ), titanium dioxide (TiO 2 ) or bismuth pentoxide (Nb 2 O). 5 ). 如請求項1至7中任一項所記載之透明導電構造體,其中該透明導電層包括奈米複合材。The transparent conductive structure according to any one of claims 1 to 7, wherein the transparent conductive layer comprises a nano composite. 如請求項9所記載之透明導電構造體,其中該透明導電層包括奈米銀。The transparent conductive structure according to claim 9, wherein the transparent conductive layer comprises nano silver. 如請求項1至7中任一項所記載之透明導電構造體,其中該透明導電層包括金屬網格(metal mesh)。The transparent conductive structure according to any one of claims 1 to 7, wherein the transparent conductive layer comprises a metal mesh. 一種觸控面板用透明導電構造體,包括:一透明基板;一透明導電層,其被圖案化而形成在該透明基板之至少一表面,該透明導電層具有複數個凸起部;及複數個光調節結構,該複數光調節結構之各個係配置到該複數個凸起部中對應之至少二相鄰的凸起部之間並覆蓋該二相鄰的凸起部之至少一部分。A transparent conductive structure for a touch panel, comprising: a transparent substrate; a transparent conductive layer patterned to form at least one surface of the transparent substrate, the transparent conductive layer having a plurality of convex portions; and a plurality of And a light adjustment structure, wherein each of the plurality of light adjustment structures is disposed between the corresponding at least two adjacent protrusions of the plurality of protrusions and covers at least a portion of the two adjacent protrusions. 如請求項12所記載之透明導電構造體,其中該複數光調節結構之各個具有折射率為1.70~2.50的介電質。The transparent conductive structure according to claim 12, wherein each of the plurality of light adjusting structures has a dielectric having a refractive index of 1.70 to 2.50. 如請求項12所記載之透明導電構造體,其中對於該複數個凸起部之一凸起部,該透明導電構造體中具有該凸起部的部分和沒有該凸起部的部分至少光透過率差異小於一門檻值,從而使該透明導電構造體的該透明導電層的該凸起部的圖案不顯著。The transparent conductive structure according to claim 12, wherein for the convex portion of the plurality of convex portions, a portion of the transparent conductive structural body having the convex portion and a portion without the convex portion are at least light-transmitting The difference in rate is less than a threshold value such that the pattern of the raised portion of the transparent conductive layer of the transparent conductive structure is not significant. 如請求項14所記載之透明導電構造體,其中該透明導電構造體中具有該凸起部的部分和沒有該凸起部的部分至少光透過率差異,係滿足以下關係:0≦∣T1-T0∣≦TH,其中T1表示具有該凸起部的部分的該透明導電構造體的光透過率,T0表示沒有該凸起部的部分的該透明導電構造體的光透過率,TH表示該門檻值,而且0.5≦TH≦1.2。The transparent conductive structure according to claim 14, wherein the portion having the convex portion and the portion without the convex portion of the transparent conductive structure have at least a difference in light transmittance, and the following relationship is satisfied: 0≦∣T1- T0∣≦TH, where T1 represents the light transmittance of the transparent conductive structure having the portion of the convex portion, T0 represents the light transmittance of the transparent conductive structure without the portion of the convex portion, and TH represents the threshold Value, and 0.5 ≦ TH ≦ 1.2. 如請求項15所記載之透明導電構造體,其中該透明導電構造體中具有該凸起部的部分和沒有該凸起部的部分,對於色彩b值:0≦∣b1-b0∣≦1.0,b1表示具有該凸起部的部分的該透明導電構造體的色彩b值,b0表示沒有該凸起部的部分的該透明導電構造體的色彩b值。The transparent conductive structure according to claim 15, wherein the portion having the convex portion and the portion having the convex portion in the transparent conductive structure have a color b value of 0≦∣b1-b0∣≦1.0, B1 represents the color b value of the transparent conductive structure having the portion of the convex portion, and b0 represents the color b value of the transparent conductive structure without the portion of the convex portion. 如請求項12所記載之透明導電構造體,其中該複數個光調節結構各個包括:一第一折射部;及一第二折射部,該第一折射部的折射率高於該第二折射部的折射率。The transparent conductive structure of claim 12, wherein the plurality of light adjustment structures each comprise: a first refractive portion; and a second refractive portion, the first refractive portion having a higher refractive index than the second refractive portion Refractive index. 如請求項17所記載之透明導電構造體,其中該第一折射部的折射率為1.70~2.50,該第一折射部的膜厚在4~20nm之範圍,該第二折射部的折射率為1.30~1.60,該第二折射部的膜厚在20~50nm之範圍。The transparent conductive structure according to claim 17, wherein the refractive index of the first refractive portion is 1.70 to 2.50, the film thickness of the first refractive portion is in the range of 4 to 20 nm, and the refractive index of the second refractive portion is 1.30~1.60, the film thickness of the second refractive portion is in the range of 20 to 50 nm. 如請求項12至18中任一項所記載之透明導電構造體,其中該複數個光調節結構係包括至少二氧化矽(SiO2 )、二氧化鈦(TiO2 )或五氧化二鈮(Nb2 O5 )。The transparent conductive structure according to any one of claims 12 to 18, wherein the plurality of light-regulating structures comprise at least cerium oxide (SiO 2 ), titanium dioxide (TiO 2 ) or bismuth pentoxide (Nb 2 O). 5 ). 如請求項12至18中任一項所記載之透明導電構造體,其中該透明導電層包括奈米複合材。The transparent conductive structure according to any one of claims 12 to 18, wherein the transparent conductive layer comprises a nano composite. 如請求項20所記載之透明導電構造體,其中該透明導電層包括奈米銀。The transparent conductive structure of claim 20, wherein the transparent conductive layer comprises nano silver. 如請求項12至18中任一項所記載之透明導電構造體,其中該透明導電層包括金屬網格(metal mesh)。The transparent conductive structure according to any one of claims 12 to 18, wherein the transparent conductive layer comprises a metal mesh.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI688479B (en) * 2014-12-26 2020-03-21 日商木本股份有限公司 Base substrate sheet and transparent conductive laminate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI688479B (en) * 2014-12-26 2020-03-21 日商木本股份有限公司 Base substrate sheet and transparent conductive laminate

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