TWM479796U - Ammonia processing equipment - Google Patents

Ammonia processing equipment Download PDF

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Publication number
TWM479796U
TWM479796U TW103202256U TW103202256U TWM479796U TW M479796 U TWM479796 U TW M479796U TW 103202256 U TW103202256 U TW 103202256U TW 103202256 U TW103202256 U TW 103202256U TW M479796 U TWM479796 U TW M479796U
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Taiwan
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gas
treated
oxygen
ammonia
inlet
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TW103202256U
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Chinese (zh)
Inventor
zong-liang Zhang
zheng-xin Lai
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Eastern Rainbow Engineering Co Ltd
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Application filed by Eastern Rainbow Engineering Co Ltd filed Critical Eastern Rainbow Engineering Co Ltd
Priority to TW103202256U priority Critical patent/TWM479796U/en
Publication of TWM479796U publication Critical patent/TWM479796U/en
Priority to CN201410290249.0A priority patent/CN104772035B/en
Priority to CN201420344061.5U priority patent/CN203990301U/en

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Description

氨氣處理設備Ammonia treatment equipment

本新型係關於一種廢氣處理設備,特別係關於一種氨氣處理設備,其可適用於處理含高濃度氨氣的廢氣,亦可適用於處理同時含高濃度氨氣及氫氣的廢氣。The present invention relates to an exhaust gas treatment device, and more particularly to an ammonia gas treatment device which is suitable for treating exhaust gas containing a high concentration of ammonia gas, and is also suitable for treating exhaust gas containing a high concentration of ammonia gas and hydrogen gas.

部分工廠所排放的尾氣中含有高濃度的氨氣,常見處理氨氣的方法包括以硫酸水溶液吸收尾氣中的氨氣,這種處理方式需使用大量強酸,後續還需進行酸鹼中和操作,且會有產生氨氮廢水的問題。The exhaust gas emitted by some factories contains a high concentration of ammonia gas. The common method for treating ammonia gas includes the absorption of ammonia gas in the tail gas by a sulfuric acid aqueous solution. This treatment requires a large amount of strong acid, and subsequent acid-base neutralization is required. There is also the problem of producing ammonia nitrogen wastewater.

有人嘗試使用觸媒床來將氨氣及氧氣反應為氮氣及水,但是以往認為觸媒法不適於處理高濃度含氨尾氣,因為尾氣中的氨氣濃度高於其爆炸下限時,氨氣與空氣混合的過程便容易發生爆炸。除此之外,尾氣中也可能存在高濃度氫氣與銦、鎵、鉬等爆炸性物質,氫氣若不控制於爆炸下限,或這些爆炸性物質若不加以去除,也容易於混合空氣的過程中產生爆炸。因此,如何改善前述問題,實係本領域人士所思量的。Some people have tried to use a catalyst bed to react ammonia and oxygen into nitrogen and water. However, it has been considered that the catalyst method is not suitable for treating high-concentration ammonia-containing tail gas because the ammonia concentration in the tail gas is higher than the lower explosion limit, ammonia gas and The process of mixing air is prone to explosion. In addition, there may be high concentrations of hydrogen and explosives such as indium, gallium, and molybdenum in the exhaust gas. If the hydrogen is not controlled at the lower explosion limit, or if these explosive substances are not removed, it is easy to explode in the process of mixing air. . Therefore, how to improve the aforementioned problems is considered by those skilled in the art.

有鑑於此,本創作之主要目的係提供一種可應用於處理高濃度含氨尾氣的氨氣處理設備。In view of this, the main purpose of this creation is to provide an ammonia treatment equipment that can be applied to the treatment of high concentration ammonia-containing tail gas.

為了達成前述及其他目的,本創作提供一種氨氣處理設備,其包括一第一洗滌塔、一加熱器、一觸媒反應器及一循環管路,該第一洗滌塔係用以洗滌待處理氣體,該加熱器係用以加熱待處理氣體,該觸媒反應器係用以氧化待處理氣體中的氨氣,該循環管路包括一待處理氣體入口、一氧氣入口及一氣體出口,該待處理氣體入口係供導入待處理氣體,該氧氣入口係供導入氧氣,該氣體出口係供導出部分循環管路中的待處理氣體。其中,該循環管路係令待處理氣體依序循環流經該待處理氣體入口、 該氧氣入口、該加熱器、該觸媒反應器及該氣體出口,且該待處理氣體於導入循環管路之前係先經過該第一洗滌塔洗滌。In order to achieve the foregoing and other objects, the present invention provides an ammonia treatment apparatus including a first scrubber, a heater, a catalyst reactor, and a circulation line for washing the to-be-processed a gas for heating the gas to be treated, the catalyst reactor for oxidizing ammonia gas in the gas to be treated, the circulation line comprising a gas inlet to be treated, an oxygen inlet and a gas outlet, The gas inlet to be treated is for introducing a gas to be treated, and the oxygen inlet is for introducing oxygen, and the gas outlet is for discharging the gas to be treated in the partial circulation line. Wherein, the circulating pipeline is configured to sequentially circulate the gas to be treated through the inlet of the gas to be treated, The oxygen inlet, the heater, the catalyst reactor and the gas outlet, and the gas to be treated is washed through the first scrubber before being introduced into the circulation line.

基於前揭設計,由於待處理氣體導入循環管路時,會與管路中經觸媒處理後的氣體混合,如此一來,待處理氣體中的氨氣濃度即可被稀釋,使其保持於爆炸下限,後續與氧氣混合時即不會產生爆炸。除此之外,本創作的待處理氣體在進入循環管路之前,會先經由第一洗滌塔洗滌,此洗滌過程可以將氣體中的粉塵及爆炸性物質加以去除,增加操作上的安全性,兼可避免阻塞觸媒反應器。Based on the previous design, since the gas to be treated is introduced into the circulation line, it is mixed with the catalyst-treated gas in the pipeline, so that the ammonia concentration in the gas to be treated can be diluted and kept at The lower limit of the explosion, no subsequent explosion when mixed with oxygen. In addition, the gas to be treated of the present invention is first washed through the first washing tower before entering the circulation pipeline, and the washing process can remove the dust and explosive substances in the gas, thereby increasing the safety of operation, and Avoid blocking the catalyst reactor.

10‧‧‧第一洗滌塔10‧‧‧First Washing Tower

20‧‧‧加熱器20‧‧‧heater

30‧‧‧觸媒反應器30‧‧‧catalyst reactor

40‧‧‧循環管路40‧‧‧Circulation line

41‧‧‧待處理氣體入口41‧‧‧ gas inlet to be treated

42‧‧‧氧氣入口42‧‧‧Oxygen inlet

43‧‧‧氣體出口43‧‧‧ gas export

44‧‧‧第一閥體44‧‧‧First valve body

45‧‧‧第二閥體45‧‧‧Second body

50‧‧‧調整槽50‧‧‧Adjustment slot

60‧‧‧第一冷卻器60‧‧‧First cooler

70‧‧‧氧氣偵測器70‧‧‧Oxygen detector

80‧‧‧控制器80‧‧‧ controller

90‧‧‧第二冷卻器90‧‧‧Second cooler

100‧‧‧第二洗滌塔100‧‧‧Second Washing Tower

第1圖係本創作第一實施例之組成示意圖。Fig. 1 is a schematic view showing the composition of the first embodiment of the present creation.

第2圖係本創作第二實施例之組成示意圖。Fig. 2 is a schematic view showing the composition of the second embodiment of the present creation.

請參考第1圖,在本創作的第一實施例中,一種氨氣處理設備包括一第一洗滌塔10、一加熱器20、一觸媒反應器30、一循環管路40、一調整槽50、一第一冷卻器60、一氧氣偵測器70、一控制器80、一第二冷卻器90及一第二洗滌塔100。Referring to FIG. 1 , in a first embodiment of the present invention, an ammonia treatment apparatus includes a first scrubber 10, a heater 20, a catalyst reactor 30, a circulation line 40, and an adjustment tank. 50. A first cooler 60, an oxygen detector 70, a controller 80, a second cooler 90, and a second scrubber 100.

該第一洗滌塔10係用以洗滌待處理氣體,將待處理氣體中的粉塵及諸如鎵、銦、鉬等可能存在的爆炸性物質洗除,洗滌液於塔內反覆循環而不排出第一洗滌塔10,同時為了安全上的考量,第一洗滌塔10較佳是在無氧環境下進行洗滌,以避免氨氣或爆炸性物質接觸氧氣後產生爆炸。經第一洗滌塔10處理後的待處理氣體含有氨氣,此外也可能含有氫氣、氮氣及少部分的水。待處理氣體經第一洗滌塔10洗滌後,將被進一步導入循環管路40進行處理。The first washing tower 10 is used for washing the gas to be treated, and the dust in the gas to be treated and the explosive substances such as gallium, indium, molybdenum and the like may be washed out, and the washing liquid is repeatedly circulated in the tower without discharging the first washing. Tower 10, and for safety reasons, the first scrubber 10 is preferably scrubbed in an oxygen-free environment to prevent ammonia or explosive materials from exploding upon contact with oxygen. The gas to be treated treated by the first scrubber 10 contains ammonia gas, and may also contain hydrogen, nitrogen, and a small portion of water. After the gas to be treated is washed by the first scrubber 10, it is further introduced into the circulation line 40 for treatment.

由於工廠不同時間所產生的尾氣,其壓力及氨氣濃度可能會有相當幅度的變化,因此待處理氣體於進入第一洗滌塔10之前,還可先被導入該調整槽50以調整待處理氣體之壓力及氨氣濃度,所述調整可藉由額外添加氮氣來實現。然而,在尾氣的壓力及氨氣濃度變化幅度不大的場合,調整槽50也可被省略。Due to the exhaust gas generated by the factory at different times, the pressure and the ammonia concentration may vary considerably. Therefore, the gas to be treated may be introduced into the adjusting tank 50 to adjust the gas to be treated before entering the first washing tower 10. The pressure and ammonia concentration can be achieved by additional nitrogen addition. However, in the case where the pressure of the exhaust gas and the ammonia gas concentration change are not large, the adjustment groove 50 may be omitted.

該加熱器20是用以加熱待處理氣體,其可為但不限於熱電式或燃料式加熱器,讓待處理氣體升溫至適合進行觸媒反應的較佳溫度。The heater 20 is for heating the gas to be treated, which may be, but not limited to, a pyroelectric or fuel heater, and the temperature of the gas to be treated is raised to a temperature suitable for the catalyst reaction.

另一方面,待處理氣體的溫度也不宜過高,否則待處理氣體進行觸媒反應時可能會產生有害的副產物,因此在待處理氣體溫度過高的場合,可藉由該第一冷卻器60進行冷卻,所述第一冷卻器60可為但不限於水冷式冷卻器。On the other hand, the temperature of the gas to be treated should not be too high, otherwise harmful by-products may be generated when the gas to be treated undergoes a catalyst reaction, so when the temperature of the gas to be treated is too high, the first cooler can be used. The cooling is performed 60, which may be, but not limited to, a water-cooled chiller.

該觸媒反應器30是用以氧化待處理氣體中的氨氣,所述觸媒反應器30中的觸媒可為但不限於矽、鋁、鈰、銅、鎳、鋯、銀、鈀、鉑、銠或其氧化物等無機材料,而主要將氨氣反應為氮氣及水。在待處理氣體含有氫氣的場合,氫氣也可藉由觸媒反應器30氧化為水。換言之,本創作的處理設備還可用於處理同時含有高濃度氨氣及高濃度氫氣的工廠尾氣。The catalyst reactor 30 is for oxidizing ammonia gas in the gas to be treated, and the catalyst in the catalyst reactor 30 may be, but not limited to, ruthenium, aluminum, ruthenium, copper, nickel, zirconium, silver, palladium, An inorganic material such as platinum, rhodium or its oxide, and mainly ammonia gas is reacted into nitrogen and water. Where the gas to be treated contains hydrogen, hydrogen may also be oxidized to water by the catalyst reactor 30. In other words, the inventive processing apparatus can also be used to treat plant exhaust gas containing both high concentration ammonia and high concentration hydrogen.

由於氨氣及氫氣氧化都需要氧氣,因此可進一步偵測循環管路40中是否具有足夠的氧氣。本實施例中,氨氣處理設備還設有氧氣偵測器70而用以偵測循環管路40中的氧氣濃度、分壓或流量。Since both oxygen and hydrogen are required to oxidize, it is possible to further detect whether there is sufficient oxygen in the circulation line 40. In this embodiment, the ammonia gas treatment device is further provided with an oxygen detector 70 for detecting the oxygen concentration, partial pressure or flow rate in the circulation line 40.

該循環管路40包括一待處理氣體入口41、一氧氣入口42及一氣體出口43,該待處理氣體入口41係供導入待處理氣體,該氧氣入口42係供導入氧氣,該氣體出口43係供導出部分循環管路中40的待處理氣體。需注意的是,由於空氣中含有氧氣,因此該氧氣入口42可直接導入空氣,即可於循環管路40中供給氨氣氧化所需的氧,氧氣入口42的進氣量及氣體出口43的排氣量可分別藉由第一、第二閥體44、45調節。The circulation line 40 includes a gas inlet 41 to be treated, an oxygen inlet 42 and a gas outlet 43 for introducing a gas to be treated, the oxygen inlet 42 is for introducing oxygen, and the gas outlet 43 is The gas to be treated in the partial circulation line is derived. It should be noted that since the air contains oxygen, the oxygen inlet 42 can be directly introduced into the air, that is, the oxygen required for the oxidation of the ammonia gas can be supplied in the circulation line 40, the intake amount of the oxygen inlet 42 and the gas outlet 43 can be The amount of exhaust gas can be adjusted by the first and second valve bodies 44, 45, respectively.

誠如前述,待處理氣體經第一洗滌塔10洗滌後,將被導入循環管路40,而循環管路40即令待處理氣體依序循環流經該待處理氣體入口41、該氧氣入口42、該第一冷卻器60、該加熱器20、該觸媒反應器30該氧氣偵測器70及該氣體出口43,部分待處理氣體於氣體出口43排出,餘份繼續依前述路徑循環。As described above, after the gas to be treated is washed by the first washing column 10, it is introduced into the circulation line 40, and the circulation line 40 sequentially circulates the gas to be treated through the gas inlet 41 to be treated, the oxygen inlet 42, The first cooler 60, the heater 20, the catalyst reactor 30, the oxygen detector 70 and the gas outlet 43, a portion of the gas to be treated is discharged at the gas outlet 43, and the remainder continues to circulate according to the aforementioned path.

必須說明的是,由於第一冷卻器60及加熱器20原則上會擇一作用,因此第一冷卻器60的位置只要介於氧氣入口42及觸媒反應器30之間即可,故第一冷卻器60及加熱器20的順序可以對調。此外,氧氣偵測器70是為了輔助判斷氨氣氧化時的需氧量,因此只要在待處理氣體循環的 路徑中,將氧氣偵測器70設於觸媒反應器20及氧氣入口42之間即可,不一定要設於氣體出口43之前。又,為了控制氧氣入口42所供給的氧氣量,可利用該控制器80實現,該控制器80可接受氧氣偵測器70之氧氣濃度訊號,並根據所得訊號控制第一閥體44,據此調節該氧氣入口42之氧氣導入量。It should be noted that since the first cooler 60 and the heater 20 are selected in principle, the position of the first cooler 60 is only required to be between the oxygen inlet 42 and the catalyst reactor 30, so the first The sequence of cooler 60 and heater 20 can be reversed. In addition, the oxygen detector 70 is for assisting in determining the oxygen demand when the ammonia gas is oxidized, so as long as the gas to be treated is circulated. In the path, the oxygen detector 70 may be disposed between the catalyst reactor 20 and the oxygen inlet 42 and does not have to be disposed before the gas outlet 43. Moreover, in order to control the amount of oxygen supplied by the oxygen inlet 42, the controller 80 can be implemented. The controller 80 can receive the oxygen concentration signal of the oxygen detector 70, and control the first valve body 44 according to the obtained signal. The oxygen introduction amount of the oxygen inlet 42 is adjusted.

待處理氣體離開循環管路後,可能處於較高的溫度,此時可藉由該第二冷卻器90進行冷卻;為了避免待處理氣體中還殘留有氨氣,還可將第二冷卻器90冷卻後之待處理氣體導入該第二洗滌塔100,利用第二洗滌塔100的洗滌液吸收待處理氣體中可能殘留的氨氣。After the gas to be treated leaves the circulation pipeline, it may be at a higher temperature, and the second cooler 90 may be used for cooling; in order to avoid ammonia remaining in the gas to be treated, the second cooler 90 may also be used. The cooled gas to be treated is introduced into the second scrubber 100, and the scrubbing liquid of the second scrubber 100 absorbs ammonia gas which may remain in the gas to be treated.

請參考第2圖,由於待處理氣體經觸媒反應器30處理後,會依序經過待處理氣體入口41及氧氣入口42而進一步補充待處理氣體及氧氣/空氣,此時待處理氣體的整體溫度即會下降,因此並不一定會有需要降溫的需求,因此在本創作的第二實施例中,第一冷卻器可以省略不設。除此之外,待處理氣體經觸媒反應器30處理後,會將絕大部分的氨氣轉化為氮氣及水,因此經由氣體出口43排出的待處理氣體也可不再透過第二冷卻器及第二洗滌塔進行後續處理。Referring to FIG. 2, after the gas to be treated is treated by the catalytic reactor 30, the gas to be treated 41 and the oxygen inlet 42 are sequentially passed through to further supplement the gas to be treated and oxygen/air, and the whole of the gas to be treated at this time. The temperature is lowered, so there is no need to cool down, so in the second embodiment of the present creation, the first cooler can be omitted. In addition, after the gas to be treated is treated by the catalytic reactor 30, most of the ammonia gas is converted into nitrogen gas and water, so that the gas to be treated discharged through the gas outlet 43 can no longer pass through the second cooler. The second scrubber is subjected to subsequent processing.

在其他可能的實施例中,只要氧氣入口42持續導入過量氧氣,氨氣皆可於觸媒反應器30氧化,因此氧氣偵測器70及控制器80也可省略不設,此時待處理氣體於循環管路40中僅依序流經待處理氣體入口41、氧氣入口42、加熱器20、觸媒反應器30及氣體出口43。In other possible embodiments, as long as the oxygen inlet 42 continuously introduces excess oxygen, the ammonia gas can be oxidized in the catalyst reactor 30, so the oxygen detector 70 and the controller 80 can also be omitted. Only the gas inlet 41 to be treated, the oxygen inlet 42, the heater 20, the catalyst reactor 30, and the gas outlet 43 are sequentially flowed through the circulation line 40.

基於上述說明,本創作的氨氣處理設備藉由第一洗滌塔將待處理氣體中的爆炸性物質去除,而且藉由循環管路的設計,待處理氣體進入循環管路時,會與循環管路中的其他氣體混合,此時即便工廠尾氣中含有高濃度的氨氣,這些氨氣也可在進入循環管路時被稀釋,使其濃度降低到爆炸下限以下,此後即可安全地與氧氣入口所導入的氧氣/空氣混合,也不至有爆炸之虞,使整體的安全性提高。Based on the above description, the ammonia treatment device of the present invention removes the explosive substances in the gas to be treated by the first washing tower, and by the design of the circulation pipeline, the gas to be treated enters the circulation pipeline, and the circulation pipeline The other gases in the mixture are mixed. At this time, even if the plant exhaust gas contains a high concentration of ammonia gas, the ammonia gas can be diluted when it enters the circulation line, so that the concentration is lowered below the lower explosion limit, and then the oxygen inlet can be safely connected. The introduced oxygen/air mixture does not cause an explosion, which improves the overall safety.

除此之外,本創作還有另一特點在於,處理過程中不會對外排出含氨氮廢水,而會將氨氣轉化為氮氣及水再對外排出,如此即可符合環保法規的要求。In addition, another feature of this creation is that the ammonia-containing wastewater will not be discharged to the outside during the treatment, and the ammonia gas will be converted into nitrogen and water and then discharged to the outside, so that it can meet the requirements of environmental protection regulations.

最後,必須再次說明的是,本新型於前揭實施例中所揭露的構成元件僅為舉例說明,並非用來限制本案之範圍,其他等效元件的替代或變化,亦應為本案之申請專利範圍所涵蓋。Finally, it must be stated that the constituent elements disclosed in the foregoing embodiments are merely illustrative and are not intended to limit the scope of the present invention. Alternatives or variations of other equivalent elements should also be applied for in this case. Covered by the scope.

10‧‧‧第一洗滌塔10‧‧‧First Washing Tower

20‧‧‧加熱器20‧‧‧heater

30‧‧‧觸媒反應器30‧‧‧catalyst reactor

40‧‧‧循環管路40‧‧‧Circulation line

41‧‧‧待處理氣體入口41‧‧‧ gas inlet to be treated

42‧‧‧氧氣入口42‧‧‧Oxygen inlet

43‧‧‧氣體出口43‧‧‧ gas export

44‧‧‧第一閥體44‧‧‧First valve body

45‧‧‧第二閥體45‧‧‧Second body

50‧‧‧調整槽50‧‧‧Adjustment slot

60‧‧‧第一冷卻器60‧‧‧First cooler

70‧‧‧氧氣偵測器70‧‧‧Oxygen detector

80‧‧‧控制器80‧‧‧ controller

90‧‧‧第二冷卻器90‧‧‧Second cooler

100‧‧‧第二洗滌塔100‧‧‧Second Washing Tower

Claims (10)

一種氨氣處理設備,包括:一第一洗滌塔,用以洗滌待處理氣體;一加熱器,用以加熱待處理氣體;一觸媒反應器,用以氧化待處理氣體中的氨氣;以及一循環管路,包括一待處理氣體入口、一氧氣入口及一氣體出口,該待處理氣體入口係供導入待處理氣體,該氧氣入口係供導入氧氣,該氣體出口係供導出部分循環管路中的待處理氣體;其中,該循環管路係令待處理氣體依序循環流經該待處理氣體入口、該氧氣入口、該加熱器、該觸媒反應器及該氣體出口;其中,該待處理氣體於導入循環管路之前係先經過該第一洗滌塔洗滌。An ammonia treatment apparatus comprising: a first washing tower for washing a gas to be treated; a heater for heating the gas to be treated; and a catalyst reactor for oxidizing ammonia gas in the gas to be treated; a circulation line comprising a gas inlet to be treated, an oxygen inlet and a gas outlet, wherein the gas inlet to be treated is for introducing a gas to be treated, the oxygen inlet is for introducing oxygen, and the gas outlet is for exporting a partial circulation pipeline The gas to be treated; wherein the circulation pipeline sequentially circulates the gas to be treated through the inlet of the gas to be treated, the oxygen inlet, the heater, the catalyst reactor and the gas outlet; wherein The process gas is first washed through the first scrubber before being introduced into the recycle line. 如請求項1所述之氨氣處理設備,更包括一調整槽,待處理氣體於進入第一洗滌塔之前係先被導入該調整槽以調整待處理氣體之壓力。The ammonia gas treatment device of claim 1, further comprising an adjustment tank, wherein the gas to be treated is first introduced into the adjustment tank before entering the first scrubber to adjust the pressure of the gas to be treated. 如請求項1所述之氨氣處理設備,更包括一第一冷卻器,且在待處理氣體循環的路徑中,該第一冷卻器係位於氧氣入口與觸媒反應器之間,用以冷卻待處理氣體。The ammonia gas treatment device according to claim 1, further comprising a first cooler, and in the path of the gas to be treated, the first cooler is located between the oxygen inlet and the catalytic reactor for cooling Gas to be treated. 如請求項1所述之氨氣處理設備,更包括一第二冷卻器,其中待處理氣體由氣體出口離開循環管路後被導入第二冷卻器進行冷卻。The ammonia gas treatment device according to claim 1, further comprising a second cooler, wherein the gas to be treated is discharged from the circulation line by the gas outlet and then introduced into the second cooler for cooling. 如請求項4所述之氨氣處理設備,更包括一第二洗滌塔,用以導入經第二冷卻器冷卻後之待處理氣體。The ammonia gas treatment device according to claim 4, further comprising a second washing tower for introducing the gas to be treated cooled by the second cooler. 如請求項1至5中任一項所述之氨氣處理設備,更包括一氧氣偵測器,且在待處理氣體循環的路徑中,該氧氣偵測器係位於觸媒反應器與氧氣入口之間。The ammonia gas treatment device according to any one of claims 1 to 5, further comprising an oxygen detector, and in the path of the gas to be treated, the oxygen detector is located at the catalyst reactor and the oxygen inlet between. 如請求項6所述之氨氣處理設備,更包括一控制器用以接受氧氣偵測器之訊號,並根據所得訊號調節該氧氣入口之氧氣導入量。The ammonia gas treatment device of claim 6, further comprising a controller for receiving the signal of the oxygen detector, and adjusting the oxygen introduction amount of the oxygen inlet according to the obtained signal. 如請求項1至5中任一項所述之氨氣處理設備,其中該第一洗滌塔係用以在無氧環境下對待處理氣體進行洗滌。The ammonia gas treatment apparatus according to any one of claims 1 to 5, wherein the first scrubber is for washing the gas to be treated in an oxygen-free environment. 如請求項6所述之氨氣處理設備,其中該第一洗滌塔係用以在無氧環境下對待處理氣體進行洗滌。The ammonia gas treatment device of claim 6, wherein the first scrubber is for washing the gas to be treated in an oxygen-free environment. 如請求項9所述之氨氣處理設備,更包括一控制器用以接受氧氣偵測器之訊號,並根據所得訊號調節該氧氣入口之氧氣導入量。The ammonia treatment device of claim 9, further comprising a controller for receiving the signal of the oxygen detector, and adjusting the oxygen introduction amount of the oxygen inlet according to the obtained signal.
TW103202256U 2014-01-15 2014-02-07 Ammonia processing equipment TWM479796U (en)

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TW103202256U TWM479796U (en) 2014-02-07 2014-02-07 Ammonia processing equipment
CN201410290249.0A CN104772035B (en) 2014-01-15 2014-06-25 Volatile organic compound processing device
CN201420344061.5U CN203990301U (en) 2014-01-15 2014-06-25 Volatile organic compound processing device

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