TWM457014U - Ultra-thin wafer suction plate - Google Patents

Ultra-thin wafer suction plate Download PDF

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Publication number
TWM457014U
TWM457014U TW102203657U TW102203657U TWM457014U TW M457014 U TWM457014 U TW M457014U TW 102203657 U TW102203657 U TW 102203657U TW 102203657 U TW102203657 U TW 102203657U TW M457014 U TWM457014 U TW M457014U
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Taiwan
Prior art keywords
ultra
thin wafer
adsorption
suction
vacuum
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TW102203657U
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Chinese (zh)
Inventor
Wen-Yang Chen
bo-hong Chen
nai-min Chen
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Wen-Yang Chen
bo-hong Chen
nai-min Chen
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Application filed by Wen-Yang Chen, bo-hong Chen, nai-min Chen filed Critical Wen-Yang Chen
Priority to TW102203657U priority Critical patent/TWM457014U/en
Publication of TWM457014U publication Critical patent/TWM457014U/en

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

超薄晶圓吸取盤Ultra-thin wafer pick-up tray

本創作係有關於一種超薄晶圓吸取盤,尤其涉及一種應用內外真空吸附吸引,驅使重力或自體翹曲變形之超薄晶圓呈現可完全平穩定位吸附快速移動領域者。This author is about an ultra-thin wafer pick-up disc, especially for an ultra-thin wafer that uses internal and external vacuum adsorption and suction to drive gravity or self-warping deformation to present a fully stable positioning and adsorption fast-moving field.

科技日新月異,傳統厚片晶圓生產已漸漸著向超薄片發展,查一般晶圓製作過程亦須藉由機械手臂前端吸挾運送轉換製程,而其吸挾方式則分靜電吸附ESC(Electro-Static chuck)構造,機械爪挾固構造及白努力定律之流體壓力(非接觸式)吸固構造三種,前者,靜電吸附因操作過程會有靜電破壞晶圓之缺點,中者,機械爪易施力過大而挾破晶圓之憾事,而後者參第1圖所示,如台灣發明專利證號第I331981號公告所揭示,於吸頭中央環形槽設切線導出孔產生瞬間極大壓力氣流拉力,進而強制下端晶圓片向上漂浮吸附於環形槽出風口處,然超薄晶圓片呈現漂浮狀態下,極易因晶圓片外環徑面重力下垂或自體翹曲變形而導致吸附不平整,與超 薄晶圓片隨導出孔氣流浮動自轉,及快速移動下易剝落與定位偏差情事,而導致報廢不良率提升,實不合業界所需,急待改進之必要也。With the rapid development of technology, traditional slab wafer production has gradually evolved into ultra-thin wafers. The general wafer fabrication process must also be carried out by the front end of the robot arm to transfer the conversion process, while the suction method is divided into electrostatic adsorption ESC (Electro- Static chuck) structure, mechanical claw tamping structure and white pressure law of fluid pressure (non-contact) suction structure three, the former, electrostatic adsorption due to the operation process will have the disadvantage of electrostatic damage to the wafer, the middle, the mechanical claw easy to apply The patience of breaking the wafer is too large, and the latter is shown in Figure 1. As disclosed in the Taiwan Invention Patent No. I331981, the tangential lead-out hole is formed in the central annular groove of the tip to generate an instantaneous maximum pressure airflow pulling force. The upper end wafer is forced to float upward and adsorbed on the air outlet of the annular groove. However, when the ultra-thin wafer is in a floating state, it is easy to cause uneven adsorption due to gravity sagging or self-warping deformation of the outer ring diameter of the wafer. And super The thin wafer piece floats and rotates with the airflow of the lead-out hole, and the easy peeling and positioning deviation under rapid movement, which leads to an increase in the defect rate of scrapping, which is not in need of the industry, and is urgently needed for improvement.

鑒此,本案創作人乃認唯有就該晶圓片穩固定位改良俾能一解困境,乃埋首創研,並積極從事累月之實作實驗,終為本創作較往昔更增益實用效果之首創者。In view of this, the creator of this case believes that only the improvement of the wafer can be improved, and it is a solution to the dilemma. It is also a pioneering experiment, and is actively engaged in the experiment of the accumulation of months, which is more effective than the past. The pioneer.

本創作之主要目的係提供一種超薄晶圓吸取盤,尤指吸取盤本體包括有一中央真空吸附凹槽及數外側非真空渦漩吸附孔所組成,利用內外真空吸附吸引效應,驅使因重力或自體翹曲變形之超薄晶圓呈現可完全平穩定位吸附快速移動為其特徵者。The main purpose of the present invention is to provide an ultra-thin wafer suction tray, in particular, the suction tray body comprises a central vacuum adsorption groove and a plurality of outer non-vacuum vortex adsorption holes, and utilizes internal and external vacuum adsorption attraction effects to drive gravity or The self-warping deformation of the ultra-thin wafer exhibits a fully smooth positioning and adsorption fast movement.

本創作之次要目的係提供一種超薄晶圓吸取盤,特指該中央真空吸附凹槽設置於本體中央向外延伸微凸吸盤表面,予利超薄晶圓中央環面完全貼平於微凸吸盤表面,形成第一真空吸附超薄晶圓結構功能為其特徵者。The secondary objective of the present invention is to provide an ultra-thin wafer pick-up disc, in particular, the central vacuum suction groove is disposed at the center of the body to extend outwardly from the surface of the micro-convex chuck, and the central torus of the ultra-thin wafer is completely flattened. The surface of the convex chuck is characterized by the function of forming a first vacuum-adsorbing ultra-thin wafer structure.

本創作之另一目的係提供一種超薄晶圓吸取盤,乃指數外側非真空渦漩吸附孔設置圍繞中央微凸吸盤間形成第二吸附結構,得於外環產生低氣壓渦漩向上吸引功效,進而使超薄晶圓外環徑面吸引漂浮整平貼 附於吸盤表面功能為其特徵者。Another object of the present invention is to provide an ultra-thin wafer pick-up disc, wherein the outer non-vacuum vortex adsorption hole is arranged to form a second adsorption structure around the central micro-convex suction cup, and the outer ring generates a low-pressure vortex upward attraction effect. , so that the outer surface of the ultra-thin wafer is attracted to the floating flattening The function attached to the surface of the suction cup is characterized by it.

本創作之又一目的係提供一種超薄晶圓吸取盤,系指利用內外真空吸附吸引攤平,而達精準移吸取運送功能為其特徵者。Another object of the present invention is to provide an ultra-thin wafer pick-up tray, which is characterized by the use of internal and external vacuum adsorption to attract the flattening, and to achieve the precise movement of the suction and take-off function.

1‧‧‧本體1‧‧‧ Ontology

11‧‧‧真空吸附凹槽11‧‧‧ Vacuum suction groove

1A‧‧‧微凸吸盤表面1A‧‧‧Micro-convex suction cup surface

2‧‧‧非真空渦漩吸附孔2‧‧‧Non-vacuum vortex adsorption holes

21‧‧‧半圓形凹弧21‧‧‧ semicircular concave arc

211‧‧‧送風通道211‧‧‧Air supply passage

A‧‧‧超薄晶圓A‧‧‧Ultra-thin wafer

第1圖係習知吸頭易位移偏差或掉落之示意圖。Fig. 1 is a schematic diagram showing the deviation or drop of the tip of the conventional tip.

第2圖係本創作之立體圖。Figure 2 is a perspective view of the creation.

第3圖係本創作之上視圖。Figure 3 is a top view of the creation.

第4圖係本創作之非真空渦漩吸附孔吸引超薄晶圓攤平定位功能示意圖。The fourth figure is a schematic diagram of the non-vacuum vortex adsorption hole of the present invention to attract the ultra-thin wafer to level the positioning function.

為便 貴審查委員對本案創作構造功用及特徵目的有具體瞭解,茲列舉一較佳實施例佐示圖說如下:請參閱第2圖及第3圖,本創作係提供一種超薄晶圓吸取盤,吸取盤本體(1)包括:一中央真空吸附凹槽(11)及數外側非真空渦漩吸附孔(2)所組成;其吸取盤本體(1),為一圓形吸取盤設於機械抓前端;該中央真空吸附凹槽(1),為本體下方中央凸出向外延伸微凸吸盤表面(1A)設有相連之凹槽,與供後端抽真空通道相接形成 第一吸附結構;該數外側非真空渦漩吸附孔(2),為圍繞中央微凸吸盤間設有半圓形凹弧(21),其各半圓形凹弧(21)之弧壁亦設有相連之送風通道(211)相接形成第二吸附結構,且該送風通道與半圓形凹弧中心非呈直線者,為本創作主要之構造特徵者。In order to have a specific understanding of the purpose of the construction of the case and the purpose of the feature, a preferred embodiment is shown below: Please refer to Figure 2 and Figure 3. This creation provides an ultra-thin wafer pick-up disk. The suction tray body (1) comprises: a central vacuum adsorption groove (11) and a plurality of outer non-vacuum vortex adsorption holes (2); the suction disk body (1) is a circular suction disk disposed on the machine Grasping the front end; the central vacuum adsorption groove (1) is a central convex portion extending downwardly from the bottom of the body, and the surface of the micro-convex suction cup (1A) is provided with a connecting groove, which is formed to be connected with the vacuum passage for the rear end. a first adsorption structure; the outer non-vacuum vortex adsorption hole (2) is provided with a semicircular concave arc (21) around the central micro-convex suction cup, and the arc wall of each semicircular concave arc (21) is also The connecting air supply passages (211) are connected to form a second adsorption structure, and the air supply passage and the semicircular concave arc center are not straight, which is the main structural feature of the creation.

本創作之實施,請參閱第4圖,係於外環半圓形凹弧(21)之弧壁通道(211)送入氣流,以該送風通道與半圓形凹弧中心非呈直線設計,得產生氣流渦漩形成低氣壓呈現下方高氣壓往上方低氣壓匯流之吸引功效,進而使超薄晶圓(A)外環徑面吸引向上漂浮定位而不自轉,復利超薄晶圓中央環面完全攤平於中央真空吸附凹槽之微凸吸盤表面(1A),俾令重力或自體翹曲變形之超薄晶圓呈現可完全平穩定位吸附快速移動功能之構造者。For the implementation of this creation, please refer to Fig. 4, which is fed into the airflow through the arc wall passage (211) of the semicircular concave arc (21) of the outer ring, and the air supply passage and the semicircular concave arc center are not in a straight line design. The airflow vortex is formed to form a low air pressure, which exhibits the attraction effect of the lower high pressure to the upper low pressure, so that the outer ring diameter of the ultra-thin wafer (A) is attracted to the floating position without rotation, and the compound toroidal ultra-thin wafer central torus Fully flattened on the surface of the micro-convex chuck (1A) of the central vacuum suction groove, the ultra-thin wafer that makes gravity or self-warping deformation presents a constructor that can completely and smoothly locate the adsorption fast-moving function.

惟以上所述者,僅為本創作之較佳實施例而已,當不能以此限定本創作實施之範圍,故舉凡運用本創作申請專利範圍及說明書及圖式內容所作之簡單的等效變化與修飾,皆應仍屬本創作專利涵蓋之範圍內,合予陳明。However, the above is only the preferred embodiment of the present invention. When it is not possible to limit the scope of the creation of the present invention, the simple equivalent changes made by applying the scope of the patent application and the contents of the specification and the drawings are Modifications shall remain within the scope of this Creative Patent and shall be given to Chen Ming.

綜上所述,本創作構造改良,改良傳統單一吸取頭缺失,且其功效確非昔技所能達到,故本創作誠為一進步性優異之創作,為符合新型專利之申請要件, 爰依法提出申請,盼 審委早日賜准本創作,以保障創作人之辛苦創作,實感德便。In summary, the creation of this creation is improved, the traditional single suction head is improved, and its efficacy is not achieved by the prior art. Therefore, this creation is a progressive and excellent creation, in order to meet the requirements of the new patent application. 提出 Submit an application in accordance with the law, and hope that the trial committee will grant this creation as soon as possible to protect the creators' hard work and feel good.

1‧‧‧本體1‧‧‧ Ontology

11‧‧‧真空吸附凹槽11‧‧‧ Vacuum suction groove

1A‧‧‧微凸吸盤表面1A‧‧‧Micro-convex suction cup surface

2‧‧‧非真空渦漩吸附孔2‧‧‧Non-vacuum vortex adsorption holes

21‧‧‧半圓形凹弧21‧‧‧ semicircular concave arc

211‧‧‧送風通道211‧‧‧Air supply passage

Claims (2)

一種超薄晶圓吸取盤,包括:一中央真空吸附凹槽,為吸取盤本體中央凸出向外延伸微凸吸盤表面設有相連之凹槽,可供後端送風通道相接形成第一吸附結構;以及數外側非真空渦漩吸附孔,為圍繞中央微凸吸盤間設有凹弧,其各凹弧之弧壁亦設有相連之送風通道相接形成第二吸附結構。An ultra-thin wafer suction tray comprises: a central vacuum adsorption groove, and a groove corresponding to the surface of the suction disk body protruding outwardly extending the micro convex suction cup, wherein the rear air supply passage is connected to form a first adsorption structure And a plurality of outer non-vacuum vortex adsorption holes, wherein concave arcs are arranged around the central micro-convex suction cups, and arc walls of each concave arc are also connected with the connected air supply channels to form a second adsorption structure. 如請求項1所述之超薄晶圓吸取盤,其中該送風通道與半圓形凹弧中心非呈直線者。The ultra-thin wafer pick-up disc of claim 1, wherein the air supply passage and the semicircular concave arc center are not in a straight line.
TW102203657U 2013-02-27 2013-02-27 Ultra-thin wafer suction plate TWM457014U (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109648507A (en) * 2019-01-04 2019-04-19 中国科学院西安光学精密机械研究所 A kind of adsorbent equipment and its application method of annular thin pieces
CN113479591A (en) * 2021-09-07 2021-10-08 中航锂电科技有限公司 Pole piece transfer device and cutting and stacking all-in-one machine
CN113998462A (en) * 2021-12-28 2022-02-01 三一技术装备有限公司 Pole piece conveying device and laminating machine
TWI755196B (en) * 2019-12-10 2022-02-11 南韓商圓益Ips股份有限公司 Substrate support frame and substrate processing device
TWI762590B (en) * 2017-03-31 2022-05-01 美商梭尼克斯公司 Wafer chuck and method for inspecting wafer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI762590B (en) * 2017-03-31 2022-05-01 美商梭尼克斯公司 Wafer chuck and method for inspecting wafer
CN109648507A (en) * 2019-01-04 2019-04-19 中国科学院西安光学精密机械研究所 A kind of adsorbent equipment and its application method of annular thin pieces
TWI755196B (en) * 2019-12-10 2022-02-11 南韓商圓益Ips股份有限公司 Substrate support frame and substrate processing device
US11292023B2 (en) 2019-12-10 2022-04-05 Wonik Ips Co., Ltd. Substrate processing apparatus
CN113479591A (en) * 2021-09-07 2021-10-08 中航锂电科技有限公司 Pole piece transfer device and cutting and stacking all-in-one machine
CN113479591B (en) * 2021-09-07 2021-11-19 中航锂电科技有限公司 Pole piece transfer device and cutting and stacking all-in-one machine
CN113998462A (en) * 2021-12-28 2022-02-01 三一技术装备有限公司 Pole piece conveying device and laminating machine
CN113998462B (en) * 2021-12-28 2022-05-03 三一技术装备有限公司 Pole piece conveying device and laminating machine

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