TWM452439U - Low-temperature testing system for testing wafer-level integrated circuit - Google Patents

Low-temperature testing system for testing wafer-level integrated circuit Download PDF

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TWM452439U
TWM452439U TW101223619U TW101223619U TWM452439U TW M452439 U TWM452439 U TW M452439U TW 101223619 U TW101223619 U TW 101223619U TW 101223619 U TW101223619 U TW 101223619U TW M452439 U TWM452439 U TW M452439U
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Taiwan
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wafer
temperature
cryogenic
integrated circuit
test system
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TW101223619U
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Chinese (zh)
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chen-fang Wang
Yu-Jen Wang
Ding-Hung Chang
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Vate Technology Co Ltd
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Publication of TWM452439U publication Critical patent/TWM452439U/en

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Abstract

The invention discloses a low-temperature testing system for testing a wafer-level integrated circuit. The low-temperature testing system of the invention includes a carrying fixture and a press coupling apparatus. The carrying fixture includes a wafer pad and a liquid conduit. The wafer pad holds the wafer-level such that a plurality of chips on the wafer-level integrated circuit face upward. The liquid conduit supplies a low temperature liquid through, and is thermally coupled to the wafer pad. The low temperature liquid exchanges heat with the heat-conducting device to lower the temperature of the wafer-level integrated circuit to a predetermined temperature. The press coupling apparatus thereon includes a probe device. When the temperature of the wafer-level integrated circuit lowers to the predetermined temperature, the press coupling apparatus and/or the carrying fixture move so that the chips of the wafer-level integrated circuit contact the probe device in sequence to perform test.

Description

用以測試晶圓級積體電路之低溫測試系統Low temperature test system for testing wafer level integrated circuits

本創作係關於一種低溫測試系統(low-temperature testing system),用以在低溫狀態下測試晶圓級積體電路(wafer-level integrated circuit)。This creation is about a low-temperature testing system for testing wafer-level integrated circuits at low temperatures.

習知的半導體元件(包含半導體光電元件)製造,是在晶圓上製造成千上萬個晶片。在完成未切割前晶片之積體電路後,通常需要進行晶圓級積體電路的電性測試,以區分出良品與不良品。Conventional semiconductor devices (including semiconductor optoelectronic devices) are fabricated by fabricating tens of thousands of wafers on a wafer. After completing the integrated circuit of the uncut front wafer, it is usually necessary to perform electrical testing of the wafer level integrated circuit to distinguish between good and defective products.

某些類別的晶圓級積體電路須在低溫狀態下進行電路測試,例如,須在-40℃下進行測試,甚至須在-60℃更嚴苛的環境下進行測試。Certain types of wafer-level integrated circuits must be circuit tested at low temperatures, for example, at -40 ° C, or even at -60 ° C in more demanding environments.

現有低溫測試系統大多利用低溫氮氣與壓抵晶圓級積體電路之下壓治具進行熱交換,進而讓晶圓級積體電路在低溫環境下進行測試。然而,利用低溫氮氣達到低溫的方法,氮氣會流失無法回收。一旦當供應低溫氮氣供應源氮氣耗盡,即必須停止低溫測試,等待操作人員更換新的低溫氮氣供應源,方可再次執行低溫測試作業。因此,利用低溫氮氣達到低溫的方法會造成低溫測試系統的使用效能不佳,耗費作業時間,耗費氮氣能源成本高等缺點。Most of the existing cryogenic test systems use low temperature nitrogen gas to heat exchange with the pressure fixture under the wafer level integrated circuit, so that the wafer level integrated circuit can be tested in a low temperature environment. However, by using low-temperature nitrogen to reach a low temperature, nitrogen gas is lost and cannot be recovered. Once the nitrogen supply to the low temperature nitrogen supply is exhausted, the low temperature test must be stopped and the operator is replaced with a new low temperature nitrogen supply before the low temperature test can be performed again. Therefore, the method of using low-temperature nitrogen to achieve low temperature may cause disadvantages such as poor use efficiency of the low-temperature test system, costly operation time, and high cost of nitrogen energy.

此外,利用低溫氮氣達到低溫的方法,抵晶圓級積體電路之下壓治具的溫度不易控制在測試要求的溫度。現有的低溫測試系統尚未見到能控制在測試要求的溫度之設計,更未見到能控制在-60℃環境下測試的設計。In addition, the method of using low-temperature nitrogen to reach a low temperature is not easy to control the temperature required for testing under the wafer-level integrated circuit. The existing cryogenic test systems have not seen designs that can control the temperature required for testing, and have not seen designs that can be tested at -60 °C.

因此,本創作所欲解決的技術問題在於提供一種低溫測試系統,用以在低溫狀態下測試晶圓級積體電路,並且具有效能佳、溫控佳、作業便利、大幅降低成本以及能控制在-60℃環境下測試等優點。Therefore, the technical problem to be solved by the present invention is to provide a low temperature test system for testing a wafer level integrated circuit at a low temperature state, and has good performance, good temperature control, convenient operation, greatly reduced cost, and controllable -Tested at -60 ° C environment and other advantages.

本創作之一較佳具體實施例之一種低溫測試系統,其用以測試一晶圓級積體電路。晶圓級積體電路其上包含多個晶片。本創作之低溫測試系統包含承載治具以及壓接裝置。承載治具包含晶圓墊片以及液體導管。晶圓墊片用以固定晶圓級積體電路,並且讓晶圓級積體電路上之多個晶片朝上。液體導管供低溫液體流通,並且係與晶圓墊片熱耦合。低溫液體與晶圓墊片進行熱交換,讓晶圓級積體電路之溫度降至預定溫度。壓接裝置其上包含探針元件。當晶圓級積體電路之溫度降至預定溫度時,壓接裝置及/或承載治具移動讓晶圓級積體電路之多個晶片依序接觸探針元件,進而進行測試。A cryogenic test system of a preferred embodiment of the present invention for testing a wafer level integrated circuit. The wafer level integrated circuit includes a plurality of wafers thereon. The low temperature test system of this creation includes a bearing fixture and a crimping device. The carrier fixture includes a wafer spacer and a liquid conduit. Wafer pads are used to hold the wafer level integrated circuit and have multiple wafers on the wafer level circuit facing up. The liquid conduit is for cryogenic liquid flow and is thermally coupled to the wafer spacer. The cryogenic liquid is heat exchanged with the wafer spacer to lower the temperature of the wafer level integrated circuit to a predetermined temperature. The crimping device includes a probe element thereon. When the temperature of the wafer level integrated circuit drops to a predetermined temperature, the crimping device and/or the carrier fixture move so that the plurality of wafers of the wafer level integrated circuit sequentially contact the probe elements for testing.

進一步,本創作之低溫測試系統並且包含測試室。承載治具以及壓接裝置係安置在測試室內。Further, the cryogenic test system of the present invention also includes a test room. The carrying fixture and the crimping device are placed in the test chamber.

進一步,本創作之低溫測試系統並且包含冷凍機。冷凍機係安置於測試室之外,並且與液體導管連接。冷凍機用以冷卻低溫液體。Further, the cryogenic test system of the present invention also includes a freezer. The freezer is placed outside the test chamber and is connected to the liquid conduit. The freezer is used to cool the cryogenic liquid.

於一具體實施例中,壓接裝置並且包含熱交換容器。熱交換容器係與液體導管連接,且供低溫液體流通。熱傳導元件部分安置於熱交換容器內。低溫液體在熱交換容器內與熱傳導元件進行熱交換。進一步,熱傳導元件安置於熱交換容器內之部分係成鰭片狀構件。In a specific embodiment, the crimping device comprises a heat exchange container. The heat exchange container is connected to the liquid conduit and is circulated for the cryogenic liquid. The heat conducting element portion is disposed within the heat exchange container. The cryogenic liquid exchanges heat with the heat conducting element within the heat exchange vessel. Further, the portion of the heat conducting member disposed in the heat exchange container is formed into a fin-like member.

於一具體實施例中,低溫液體可以是添加抗凍劑之水或油,或可以是冷媒。In one embodiment, the cryogenic liquid may be water or oil to which an antifreeze is added, or may be a refrigerant.

進一步,本創作之低溫測試系統並且包含溫度感測器。溫 度感測器係安置在晶圓墊片上,並且用以感測關於晶圓墊片之溫度。Further, the cryogenic test system of the present invention also includes a temperature sensor. temperature The sensor is placed on the wafer spacer and is used to sense the temperature of the wafer spacer.

於一具體實施例中,液體導管係穿過晶圓墊片。本創作之低溫測試系統進一步包含流量控制器。流量控制器係安裝在液體導管對晶圓墊片之入口處,並且電連接至溫度感測器。流量控制器用以根據溫度感測器所感測到之溫度來調節低溫液體流入晶圓墊片之流量。In one embodiment, the liquid conduit is passed through the wafer spacer. The cryogenic test system of this creation further includes a flow controller. The flow controller is mounted at the inlet of the liquid conduit to the wafer shim and is electrically connected to the temperature sensor. The flow controller is configured to adjust the flow rate of the cryogenic liquid into the wafer spacer according to the temperature sensed by the temperature sensor.

進一步,本創作之低溫測試系統並且包含空氣乾燥機。空氣乾燥機係安置於測試室之外,並且以氣體導管與測試室連接。空氣乾燥機用以經由氣體導管供應乾燥空氣至測試室。Further, the cryogenic test system of the present invention also includes an air dryer. The air dryer is placed outside the test chamber and is connected to the test chamber by a gas conduit. An air dryer is used to supply dry air to the test chamber via a gas conduit.

進一步,本創作之低溫測試系統並且包含靜電消除器。靜電消除器係耦合於空氣乾燥機以及測試室之間。靜電消除器用以消除供應至測試室之乾燥空氣的靜電。Further, the cryogenic test system of the present invention also includes a static eliminator. A static eliminator is coupled between the air dryer and the test chamber. A static eliminator is used to remove static electricity from the dry air supplied to the test chamber.

進一步,本創作之低溫測試系統包含熱電致冷晶片以及溫度控制器。熱電致冷晶片係安置在晶圓墊片內,並且位在晶圓級積體電路之下方。溫度控制器係電連接至熱電致冷晶片。溫度控制器用以控制熱電致冷晶片之溫度以微控晶圓級積體電路之溫度。Further, the cryogenic test system of the present invention includes a thermoelectrically cooled wafer and a temperature controller. The thermoelectrically cooled wafer is placed within the wafer spacer and is positioned below the wafer level integrated circuit. The temperature controller is electrically connected to the thermoelectrically cooled wafer. The temperature controller is used to control the temperature of the thermoelectrically cooled wafer to micro-control the temperature of the wafer-level integrated circuit.

與先前技術相較,本創作之低溫測試系統具有效能佳、溫控佳、作業便利以及大幅降低成本等優點。Compared with the prior art, the low temperature test system of the present invention has the advantages of good performance, good temperature control, convenient operation and greatly reduced cost.

關於本創作之優點與精神可以藉由以下的實施方式及所附圖式得到進一步的瞭解。The advantages and spirit of the present invention can be further understood by the following embodiments and the drawings.

請參閱圖1,為本創作之一較佳具體實施例的低溫測試系統1之架構示意圖。Please refer to FIG. 1 , which is a schematic structural diagram of a low temperature testing system 1 according to a preferred embodiment of the present invention.

如圖1所示,本創作之低溫測試系統1用以測試晶圓級積 體電路2。晶圓級積體電路2其上包含多個晶片(未繪示於圖1中)。本創作之低溫測試系統1包含承載治具11以及壓接裝置10。與現有用以測試晶圓級積體電路之測試系統相同,本創作之低溫測試系統1並且包含自動化裝置(未繪示於圖1中),在此不做贅述。As shown in Figure 1, the low temperature test system 1 of the present invention is used to test the wafer level product. Body circuit 2. The wafer level integrated circuit 2 includes a plurality of wafers thereon (not shown in FIG. 1). The cryogenic test system 1 of the present invention comprises a carrying fixture 11 and a crimping device 10. The cryogenic test system 1 of the present invention is the same as the existing test system for testing the wafer level integrated circuit, and includes an automation device (not shown in FIG. 1), which will not be described herein.

承載治具11包含晶圓墊片110以及液體導管10。晶圓墊片110用以固定晶圓級積體電路2並且讓晶圓級積體電路2上之多個晶片朝上。晶圓墊片110內可以具有真空管路,以真空吸附的方式吸住晶圓級積體電路2的背面。液體導管130供低溫液體流通,並且係與晶圓墊片110熱耦合。低溫液體與晶圓墊片110進行熱交換,讓晶圓級積體電路2之溫度降至預定溫度。The carrier jig 11 includes a wafer spacer 110 and a liquid conduit 10. The wafer spacer 110 is used to fix the wafer level integrated circuit 2 and to have a plurality of wafers on the wafer level circuit 2 facing upward. The wafer spacer 110 may have a vacuum line for sucking the back surface of the wafer level integrated circuit 2 in a vacuum adsorption manner. The liquid conduit 130 is for cryogenic liquid flow and is thermally coupled to the wafer shim 110. The cryogenic liquid is heat exchanged with the wafer spacer 110 to lower the temperature of the wafer level integrated circuit 2 to a predetermined temperature.

壓接裝置10其上包含探針元件102。當晶圓級積體電路2之溫度降至預定溫度時,壓接裝置10及/或承載治具11移動讓晶圓級積體電路2之多個晶片依序接觸探針元件102,進而進行測試。測試前,操作人員先行校正晶圓墊片110的初始座標,壓接裝置10上可以加裝影像擷取裝置(未繪示於圖1中)協助檢視晶圓墊片110的初始座標。由於晶圓級積體電路2其上包含數千甚至數萬顆晶片,而這些晶片都要逐一測試,因此,還要設定晶片間的間距,每測完一顆晶片,晶圓墊片110就要移動該間距之距離,並測試下一顆晶片。The crimping device 10 includes a probe element 102 thereon. When the temperature of the wafer level integrated circuit 2 drops to a predetermined temperature, the crimping device 10 and/or the carrier jig 11 are moved to cause the plurality of wafers of the wafer level integrated circuit 2 to sequentially contact the probe element 102, thereby performing test. Before the test, the operator first corrects the initial coordinates of the wafer spacer 110, and the image pickup device 10 (not shown in FIG. 1) can be attached to the crimping device 10 to assist in viewing the initial coordinates of the wafer spacer 110. Since the wafer level integrated circuit 2 includes thousands or even tens of thousands of wafers thereon, and these wafers are tested one by one, the spacing between the wafers is also set. After each wafer is measured, the wafer spacers 110 are To move the distance of the gap and test the next wafer.

於一具體實施例中,低溫液體可以是添加抗凍劑之水或油,或可以是冷媒。In one embodiment, the cryogenic liquid may be water or oil to which an antifreeze is added, or may be a refrigerant.

同樣如圖1所示,進一步,本創作之低溫測試系統1並且包含測試室12。承載治具11以及壓接裝置10係安置在測試室12內,藉此,讓測試室12內的測試環境容易維持在適當的溫度。As also shown in FIG. 1, further, the cryogenic test system 1 of the present invention also includes a test chamber 12. The load fixture 11 and the crimping device 10 are disposed within the test chamber 12, thereby allowing the test environment within the test chamber 12 to be easily maintained at an appropriate temperature.

同樣如圖1所示,進一步,本創作之低溫測試系統1並且 包含冷凍機13。冷凍機13係安置於測試室12之外,並且與液體導管130連接。冷凍機13用以冷卻低溫液體,再將經冷卻的低溫液體經由液體導管130輸送至承載治具11,與晶圓墊片110進行熱交換處。於實際應用中,液體導管130以能抵抗測試低溫的高分子材料製成者為佳,藉此,承載治具11運動過程中,液體導管130可隨之變形。Also as shown in Figure 1, further, the low temperature test system 1 of the present creation A freezer 13 is included. The freezer 13 is disposed outside the test chamber 12 and is connected to the liquid conduit 130. The refrigerator 13 is for cooling the cryogenic liquid, and then transporting the cooled cryogenic liquid to the carrier jig 11 via the liquid conduit 130 for heat exchange with the wafer spacer 110. In practical applications, the liquid conduit 130 is preferably made of a polymer material resistant to the test low temperature, whereby the liquid conduit 130 can be deformed during the movement of the load fixture 11.

同樣如圖1所示,進一步,本創作之低溫測試系統1並且包含溫度感測器14。溫度感測器14係安置在晶圓墊片110上。溫度感測器14用以感測關於晶圓墊片110之溫度。As also shown in FIG. 1, further, the cryogenic test system 1 of the present invention also includes a temperature sensor 14. The temperature sensor 14 is disposed on the wafer spacer 110. The temperature sensor 14 is used to sense the temperature of the wafer spacer 110.

於一具體實施例中,如圖1所示,液體導管130係穿過晶圓墊片110。本創作之低溫測試系統1進一步包含流量控制器15。流量控制器15係安裝在晶圓墊片110之入口處,並且電連接至溫度感測器14。流量控制器15用以根據溫度感測器14所感測到之溫度來調節低溫液體流入晶圓墊片110之流量。In one embodiment, as shown in FIG. 1, liquid conduit 130 passes through wafer spacer 110. The cryogenic test system 1 of the present invention further includes a flow controller 15. The flow controller 15 is mounted at the inlet of the wafer shim 110 and is electrically connected to the temperature sensor 14. The flow controller 15 is configured to adjust the flow rate of the cryogenic liquid into the wafer spacer 110 according to the temperature sensed by the temperature sensor 14.

同樣如圖1所示,進一步,本創作之低溫測試系統1並且包含空氣乾燥機16。空氣乾燥機16係安置於測試室12之外,並且以氣體導管160與測試室12連接。空氣乾燥機16用以經由氣體導管160供應乾燥空氣至測試室12,以確保晶圓級積體電路2的安全。As also shown in FIG. 1, further, the inventive cryogenic test system 1 also includes an air dryer 16. The air dryer 16 is disposed outside the test chamber 12 and is coupled to the test chamber 12 by a gas conduit 160. The air dryer 16 is used to supply dry air to the test chamber 12 via the gas conduit 160 to ensure the safety of the wafer level integrated circuit 2.

同樣如圖1所示,進一步,本創作之低溫測試系統1並且包含靜電消除器17。靜電消除器17係耦合於空氣乾燥機16以及測試室12之間。靜電消除器17用以消除供應至測試室12之乾燥空氣的靜電,以確保晶圓級積體電路2的安全。As also shown in FIG. 1, further, the cryogenic test system 1 of the present invention also includes a static eliminator 17. A static eliminator 17 is coupled between the air dryer 16 and the test chamber 12. The static eliminator 17 serves to eliminate static electricity supplied to the dry air of the test chamber 12 to ensure the safety of the wafer level integrated circuit 2.

同樣如圖1所示,進一步,本創作之低溫測試系統1並且包含熱電致冷晶片18以及溫度控制器19。熱電致冷晶片18係安置在晶圓墊片110內,且位在晶圓級積體電路2之下方。熱電致冷晶片18的致熱表面朝向液體導管130,熱電致冷晶片18的致冷表面與晶圓墊片110的頂部接觸。溫度控制器19 係電連接至熱電致冷晶片18。溫度控制器19用以控制熱電致冷晶片18之溫度以微控晶圓級積體電路2之溫度,甚至能讓晶圓級積體電路2在-60℃環境下測試。As also shown in FIG. 1, further, the present cryogenic test system 1 also includes a thermoelectrically cooled wafer 18 and a temperature controller 19. The thermoelectrically cooled wafer 18 is disposed within the wafer spacer 110 and is positioned below the wafer level integrated circuit 2. The pyrogenic surface of the thermoelectrically cooled wafer 18 faces the liquid conduit 130, and the cooling surface of the thermoelectrically cooled wafer 18 is in contact with the top of the wafer spacer 110. Temperature controller 19 The system is electrically connected to the thermoelectrically cooled wafer 18. The temperature controller 19 is used to control the temperature of the thermoelectrically cooled wafer 18 to micro-control the temperature of the wafer-level integrated circuit 2, and even allows the wafer-level integrated circuit 2 to be tested at -60 ° C.

藉由以上對本創作之詳細說明,相信可以清楚了解本創作之低溫測試系統具有效能佳、溫控佳、作業便利以及大幅降低成本等優點,甚至能讓晶圓級積體電路在-60℃環境下測試。With the above detailed description of this creation, I believe that it can be clearly understood that the low temperature test system of this creation has the advantages of good performance, good temperature control, convenient operation and greatly reduced cost, and even allows the wafer level integrated circuit to be in the -60 ° C environment. Test it down.

藉由以上較佳具體實施例之詳述,係希望能更加清楚描述本創作之特徵與精神,而並非以上述所揭露的較佳具體實施例來對本創作之範疇加以限制。相反地,其目的是希望能涵蓋各種改變及具相等性的安排於本創作所欲申請之專利範圍的範疇內。因此,本創作所申請之專利範圍的範疇應該根據上述的說明作最寬廣的解釋,以致使其涵蓋所有可能的改變以及具相等性的安排。The features and spirit of the present invention are more clearly described in the above detailed description of the preferred embodiments, and the scope of the present invention is not limited by the preferred embodiments disclosed herein. On the contrary, it is intended to cover all kinds of changes and equivalences within the scope of the patent application to which the present invention is intended. Therefore, the scope of the patent scope applied for by this creation should be interpreted broadly based on the above description so that it covers all possible changes and equivalence arrangements.

1‧‧‧低溫測試系統1‧‧‧Cryogenic test system

10‧‧‧壓接裝置10‧‧‧Crimping device

102‧‧‧探針元件102‧‧‧ probe components

11‧‧‧承載治具11‧‧‧bearing fixture

110‧‧‧晶圓墊片110‧‧‧ Wafer gasket

12‧‧‧測試室12‧‧‧Test room

13‧‧‧冷凍機13‧‧‧Freezer

130‧‧‧液體導管130‧‧‧Liquid conduit

14‧‧‧溫度感測器14‧‧‧Temperature Sensor

15‧‧‧流量控制器15‧‧‧Flow controller

16‧‧‧空氣乾燥機16‧‧‧Air dryer

160‧‧‧氣體導管160‧‧‧ gas conduit

17‧‧‧靜電消除器17‧‧‧Static eliminator

18‧‧‧熱電致冷晶片18‧‧‧Thermoelectric cooling chip

19‧‧‧溫度控制器19‧‧‧ Temperature Controller

2‧‧‧晶圓級積體電路2‧‧‧ Wafer-level integrated circuit

圖1係本創作之一較佳具體實施例之低溫測試系統的架構示意圖。1 is a schematic diagram showing the architecture of a low temperature test system according to a preferred embodiment of the present invention.

1‧‧‧低溫測試系統1‧‧‧Cryogenic test system

10‧‧‧壓接裝置10‧‧‧Crimping device

102‧‧‧探針元件102‧‧‧ probe components

11‧‧‧承載治具11‧‧‧bearing fixture

110‧‧‧晶圓墊片110‧‧‧ Wafer gasket

12‧‧‧測試室12‧‧‧Test room

13‧‧‧冷凍機13‧‧‧Freezer

130‧‧‧液體導管130‧‧‧Liquid conduit

14‧‧‧溫度感測器14‧‧‧Temperature Sensor

15‧‧‧流量控制器15‧‧‧Flow controller

16‧‧‧空氣乾燥機16‧‧‧Air dryer

160‧‧‧氣體導管160‧‧‧ gas conduit

17‧‧‧靜電消除器17‧‧‧Static eliminator

18‧‧‧熱電致冷晶片18‧‧‧Thermoelectric cooling chip

19‧‧‧溫度控制器19‧‧‧ Temperature Controller

2‧‧‧晶圓級積體電路2‧‧‧ Wafer-level integrated circuit

Claims (9)

一種低溫測試系統,用以測試一晶圓級積體電路,該晶圓級積體電路其上包含多個晶片,該低溫測試系統包含:一承載治具,包含:一晶圓墊片,用以固定該晶圓級積體電路,且讓該晶圓級積體電路上之該多個晶片朝上;以及一液體導管,供一低溫液體流通,且係與該晶圓墊片熱耦合,其中該低溫液體與該晶圓墊片進行熱交換,讓該晶圓級積體電路之一溫度降至一預定溫度;以及一壓接裝置,其上包含一探針元件,其中當該晶圓級積體電路之該溫度降至該預定溫度時,該壓接裝置及/或該承載治具移動讓該晶圓級積體電路之該多個晶片依序接觸該探針元件,進而進行測試。A low temperature test system for testing a wafer level circuit comprising a plurality of wafers thereon, the low temperature test system comprising: a load fixture comprising: a wafer spacer Fixing the wafer-level integrated circuit with the plurality of wafers on the wafer-level integrated circuit facing upward; and a liquid conduit for circulating a cryogenic liquid and thermally coupled to the wafer spacer Wherein the cryogenic liquid exchanges heat with the wafer spacer to lower a temperature of the wafer level circuit to a predetermined temperature; and a crimping device including a probe element, wherein the wafer When the temperature of the quadrature circuit drops to the predetermined temperature, the crimping device and/or the carrying fixture move the plurality of wafers of the wafer level circuit to sequentially contact the probe element for testing . 如請求項1所述之低溫測試系統,進一步包含:一測試室,該承載治具以及該壓接裝置係安置在該測試室內。The cryogenic test system of claim 1, further comprising: a test chamber, the load fixture and the crimping device being disposed in the test chamber. 如請求項2所述之低溫測試系統,進一步包含:一冷凍機,係安置於該測試室之外且與該液體導管連接,用以冷卻該低溫液體。The cryogenic test system of claim 2, further comprising: a freezer disposed outside the test chamber and coupled to the liquid conduit for cooling the cryogenic liquid. 如請求項3所述之低溫測試系統,其中該低溫液體係一添加抗凍劑之水或油,或係一冷媒。The cryogenic test system of claim 3, wherein the cryogenic liquid system is a water or oil to which an antifreeze is added, or is a refrigerant. 如請求項3所述之低溫測試系統,進一步包含:一溫度感測器,係安置在該晶圓墊片上,用以感測關於該晶圓墊片之一溫度。The cryogenic test system of claim 3, further comprising: a temperature sensor disposed on the wafer spacer for sensing a temperature of the wafer spacer. 如請求項5所述之低溫測試系統,其中該液體導管係穿過該晶圓墊片,該低溫測試系統進一步包含: 一流量控制器,係安裝在該液體導管對該晶圓墊片之一入口處且電連接至該溫度感測器,用以根據該溫度感測器所感測到之該溫度來調節該低溫液體流入該晶圓墊片之流量。The cryogenic test system of claim 5, wherein the liquid conduit passes through the wafer spacer, the cryogenic test system further comprising: a flow controller mounted at an inlet of the liquid conduit to one of the wafer pads and electrically connected to the temperature sensor for adjusting the cryogenic liquid according to the temperature sensed by the temperature sensor The flow into the wafer shim. 如請求項3所述之低溫測試系統,進一步包含:一熱電致冷晶片,係安置在該晶圓墊片內且位在該晶圓級積體電路之下方;以及一溫度控制器,係電連接至該熱電致冷晶片,用以控制該熱電致冷晶片之溫度以微控該晶圓級積體電路之溫度。The cryogenic test system of claim 3, further comprising: a thermoelectrically cooled wafer disposed in the wafer spacer and located below the wafer level integrated circuit; and a temperature controller Connected to the thermoelectrically cooled wafer for controlling the temperature of the thermoelectrically cooled wafer to micro-control the temperature of the wafer-level integrated circuit. 如請求項3所述之低溫測試系統,進一步包含:一空氣乾燥機,係安置於該測試室之外且以一氣體導管與該測試室連接,用以經由該氣體導管供應一乾燥空氣至該測試室。The cryogenic test system of claim 3, further comprising: an air dryer disposed outside the test chamber and connected to the test chamber by a gas conduit for supplying a dry air to the gas conduit Test room. 如請求項8所述之低溫測試系統,進一步包含:一靜電消除器,係耦合於該空氣乾燥機以及該測試室之間,用以消除供應至該測試室之該乾燥空氣的靜電。The cryogenic test system of claim 8, further comprising: a static eliminator coupled between the air dryer and the test chamber for eliminating static electricity supplied to the dry air of the test chamber.
TW101223619U 2012-12-06 2012-12-06 Low-temperature testing system for testing wafer-level integrated circuit TWM452439U (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI684007B (en) * 2016-05-18 2020-02-01 佳思科技有限公司 Static dissipation structure of semiconductor test fixture
CN111458619A (en) * 2020-04-15 2020-07-28 长春长光辰芯光电技术有限公司 Low-temperature testing method of back-illuminated CMOS image sensor
CN113433359A (en) * 2021-08-25 2021-09-24 邳州众鑫机械有限公司 Clamping tool and method for testing low-temperature electrical properties of semiconductor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI684007B (en) * 2016-05-18 2020-02-01 佳思科技有限公司 Static dissipation structure of semiconductor test fixture
CN111458619A (en) * 2020-04-15 2020-07-28 长春长光辰芯光电技术有限公司 Low-temperature testing method of back-illuminated CMOS image sensor
CN113433359A (en) * 2021-08-25 2021-09-24 邳州众鑫机械有限公司 Clamping tool and method for testing low-temperature electrical properties of semiconductor
CN113433359B (en) * 2021-08-25 2021-11-26 邳州众鑫机械有限公司 Clamping tool and method for testing low-temperature electrical properties of semiconductor

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