M398614 五、新型說明： 【新型所屬之技術領域】 本新型是有關於一種照明裝置，且特別β 明效果及減少污染等功用之照明裝置。 關於種提升照 【先前技術】M398614 V. New description: [New technical field] The present invention relates to a lighting device, which is particularly suitable for lighting effects and reducing pollution. About the promotion of photos [Prior Art]
般照明裝置，例如應用於生活中之燈管或咖 容易產生發光輝度、均勻度及污染等問 i等其係 室中的照明裝置 目前的黃光室主要是以高壓水銀 宮φ的昭昍验蒈。 於微影製程黃光 利用力昭明#偌(I)弧燈管作為光源並且 湘在照明攻備上配置黃色透明板以達到濾光的作用 色透明板喊光效果科，姉料Μ紫 : f程的良率不佳。此外，高壓水銀（旬弧燈管的管 谷易破裂，所以容易造成黃光室中的微极子污染。 【新型内容】General lighting devices, such as lamps or coffees used in life, are prone to produce luminous brightness, uniformity and pollution, etc. The current yellow light room in the room is mainly the high-pressure mercury palace φ Hey. In the lithography process, Huang Guang uses force Zhaoming #偌(I) arc tube as the light source and Xiang arranges the yellow transparent plate on the illumination attack to achieve the effect of filtering. The transparent plate screams the effect, and the material is purple: f Cheng's yield is not good. In addition, high-pressure mercury (the tube of the Xenon arc tube is easily broken, so it is easy to cause micro-polar contamination in the yellow room. [New content]
本創作提出-種照明裝置’包括至少一點光源、至少一透 鏡、-波長過濾塗層以及-反射層。點光源用以發出—第一光線。 透鏡對應配置於點光源旁，並位於第—光線的光徑上。波長過渡 塗層位於n線的光徑上。第—光線經過波長過隸層後轉換 為一第二光線，其中第二光線的波長介於為5〇〇 nm至7〇〇 nm之 間。點光源與透鏡位於反射層的同一側，以使反射層反射第二光 線至一出光方向。 本創作另提出一種照明裝置，包括一導光柱、至少一發光二 1598614 極體、至少-透鏡以及-波長過濾塗層。發光二極趙面向導光柱 之一端部。透鏡配置於發光二極體以及導先柱之間。波長過濾塗 層配置於發光二極體與導光柱之間，位於發光二極體所發出的一 第一光線的光徑上。波長過濾塗層的顏色為橘色，且第一光線經 過波長過遽、塗層後轉換為一第二光線，其中第二光線的波長介於 為500 nm至700 nm之間。 本創作又提出一種照明裝置，包括至少一點光源、一導光 件、一波長過濾件以及至少一透鏡。點光源發出一光線。導光件 配置於點光源旁以將光線導引出導光件的一出光面。透鏡配置於 導光件以及點光源之間，並位於光線的光徑上。波長過濾件配置 於導光件以及點光源之間，且位於光線的先徑上。 為讓本創作之上述特徵和優點能更明顯易懂，下文特舉實施 例，並配合所附圖式作詳細說明如下。 【實施方式】 圖1繪示為本創作之一實施例的照明裝置。請參照圖丨，照 明裝置100包括至少一點光源110、至少一透鏡120、—波長過波 塗層130、一導光柱140以及一反射層15〇。點光源110用以發出 一第一光線L1。透鏡120對應配置於點光源no旁，並位於第一 光線L1的光徑上。波長過濾塗層13〇位於第一光線L1的光徑上。 波長過濾塗層130的顏色為橘色》第一光線L1經過波長過波塗層 130後轉換為一第二光線L2,而使第二光線L2的波長實質上大於 500 nm。反射層150反射第二光線L2至一出光方向 具體而言，點光源110位於導光柱140的其中一喘部，且透 M398614 鏡120位於點光源no以及導光柱14〇之間。此外反射層I% 則例如是直接塗佈於導光柱14〇上。點光源11〇例如是一發光_ 極體點光源。點光源11〇所發出的第一光線L1例如為一白光戈— 紫外光。第一光線L1涵蓋了較短波長的光甚至是紫外光，可能使 光阻材料感光而無法直接作為黃光室的照明光線。因此，本實施 例將波長過濾、塗層1则&置於第-光線L1的光徑上以獲得普^ 所需的光源。The present invention proposes that the illumination device 'includes at least one light source, at least one lens, a wavelength filter coating, and a reflective layer. The point source is used to emit a first light. The lens is disposed adjacent to the point source and is located on the optical path of the first light. The wavelength transition coating is located on the n-line path. The first light passes through the wavelength crossing layer and is converted into a second light, wherein the second light has a wavelength between 5 〇〇 nm and 7 〇〇 nm. The point source and the lens are on the same side of the reflective layer such that the reflective layer reflects the second line to a light exiting direction. The present invention further provides an illumination device comprising a light guide, at least one light-emitting diode 1598614, at least a lens, and a wavelength filter coating. One end of the light-emitting diode Zhao Zhao guide light column. The lens is disposed between the light emitting diode and the lead post. The wavelength filter coating is disposed between the light emitting diode and the light guide column, and is located on a light path of a first light emitted by the light emitting diode. The wavelength filter coating is orange in color, and the first light passes through the wavelength, and the coating is converted into a second light, wherein the second light has a wavelength between 500 nm and 700 nm. The present invention further provides an illumination device comprising at least one light source, a light guide, a wavelength filter, and at least one lens. The point source emits a light. The light guide is disposed beside the point source to guide the light out of a light exit surface of the light guide. The lens is disposed between the light guide and the point source and is located on the light path of the light. The wavelength filter is disposed between the light guide and the point source and is located on the first diameter of the light. In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following embodiments are described in detail with reference to the accompanying drawings. Embodiments FIG. 1 illustrates a lighting device according to an embodiment of the present invention. Referring to the drawing, the illumination device 100 includes at least one light source 110, at least one lens 120, a wavelength over-wave coating 130, a light guide 140, and a reflective layer 15A. The point source 110 is for emitting a first light L1. The lens 120 is disposed adjacent to the point light source no and is located on the optical path of the first light ray L1. The wavelength filter coating 13 is located on the optical path of the first light L1. The color of the wavelength filter coating 130 is orange. The first light L1 is converted into a second light L2 after passing through the wavelength over-wave coating 130, and the wavelength of the second light L2 is substantially greater than 500 nm. The reflective layer 150 reflects the second light L2 to a light exiting direction. Specifically, the point light source 110 is located at one of the breathing portions of the light guiding column 140, and the M398614 mirror 120 is located between the point light source no and the light guiding column 14A. Further, the reflective layer I% is applied, for example, directly onto the light guiding column 14A. The point source 11 is, for example, a illuminating _ pole point source. The first light L1 emitted by the point source 11 is, for example, a white light-ultraviolet light. The first light L1 covers shorter wavelengths of light or even ultraviolet light, which may make the photoresist material sensitive and cannot directly act as illumination light for the yellow light chamber. Therefore, in the present embodiment, the wavelength filtering, the coating 1 & is placed on the optical path of the first light ray L1 to obtain a desired light source.
在本實施例中，波長過濾塗層13〇例如是目前市場上之岳展 華玻璃公司的黃光玻璃UVCUT5GG的表面塗料，這樣的塗層㈣ 可以提供波長轉換的功能以及波長過濾的功能。所以，照明裝置 100所發出#第二光線L2僅侷限於特定的波長範圍之中，例如5〇〇 nm至700 nm。也就是說，無論是白光或紫外光，經過波長過濾塗 層130的過濾及轉換之後，都會產生波長大於5〇〇11111的黃光。 波長過濾塗層130至少塗佈於透鏡12〇接近點光源11〇之一In the present embodiment, the wavelength filter coating 13 is, for example, a surface coating of the yellow glass UVCUT 5GG of Yue Zhanhua Glass Co., Ltd. currently available on the market, such a coating (4) can provide a wavelength conversion function and a wavelength filtering function. Therefore, the second light L2 emitted by the illumination device 100 is limited to a specific wavelength range, for example, 5 〇〇 nm to 700 nm. That is to say, whether it is white light or ultraviolet light, after filtering and conversion by the wavelength filter coating layer 130, yellow light having a wavelength greater than 5〇〇11111 is generated. The wavelength filter coating 130 is applied to at least one of the lens 12 〇 close to the point source 11 〇
側122或透鏡120遠離點光源11〇之一側124。在本實施例中，波 長過濾塗層130同時地塗佈於透鏡12〇接近點光源11〇之一側122 以及透鏡120遠離點光源110之一彻！ 124。實際上，波長過滤塗層 130的塗佈位置只要使點光源11〇所發出的第一光線li在沿出光 方向D射出導光柱140之前被轉換或過濾成第二光線^^就可以符 合本創作之設計。因此，在其他的實施方式中，波長過濾塗層13〇 也可以是塗佈於導光柱140鄰近於點光源11〇的其中一端部。 為了有較佳的過濾及轉換效果，波長過濾塗層13〇的一塗層 面積至少涵蓋第一光線L1照射於波長過濾塗層13〇上的一分佈面 積。所以’在黃光室巾進行雜塗佈的步驟時，不會有短波長的 5 M398614 光線先使光阻材料感光。亦即，本實施例的設計有助於提高微影 製程的製程良率。 在本實施例中，透鏡120雖以雙凸透鏡的形態表示。不過’ 透鏡120也可為一凸透鏡、一凹透鏡、一平凸透鏡、一平凹透鏡 或一雙凹透鏡等，以隨不同使用需求提供聚光或是散光的功能以 提高照明裝置100的使用便利性。 此外，本實施例的反射層150包括一第一部份152以及一第 二部份154»第一部份152塗佈於導光柱140之側壁上，而第二部 份154塗佈於導光柱140遠離點光源110的另一端部。反射層150 的設置使點光源110所發出的光線被反射至出光方向D上，而有 助於提高光線利用率。另外，照明裝置1〇〇更包括一微結構層 160。微結構層160配置於反射層150與導光柱140之間。微結構 層160實際上可以包括多個導光結構(未繪示），以使照明裝置100 具有均勻的出光效果。 此外’為了完成整體裝置的組裝，照明裝置100更可以包括 一套筒170 ’且套筒170包覆點光源110以及透鏡12〇，而導光柱 140套設於套筒no中。套筒170例如由不透光的材質製作而成， 以避免未被過濾與轉換的第一光線L1直接射出而照射於黃光室 中。另外，在一實施例中，透鏡12〇的面積例如恰可填滿套筒17〇 的内徑以更加降低第一光線L1照射於黃光室的機率。 在實際的設計上，照明裝置1〇〇可以更選擇性地設置有一透 明罩體180’且透明罩體180罩住導光柱14卜或是，照明裝置1〇〇 可選擇性地設置與反射層15〇的第一部份152相對的光學膜片 190。光學膜片1%例如為一擴散片、一增亮片或一極化偏振片， 以提升照明裝置100的出光效果。 圖2繪示為本創作之另—實施例的照明裳置。請參照圖卜 …、裝置200實際上疋照明裝置1〇〇的_種變化 昭 2:與照明裝置⑽之不同處在於:照明裝 白、量為一 ’且分別面向導光柱14〇的兩端部。另外，透鏡⑽ 的數量也為二q各透鏡12G位於其中—個點光源Μ與導光柱 套筒17〇的數量也是兩個，而導光柱14〇的兩端 #分別套設於兩套筒170中。 導光柱140的兩端皆設有點光源11〇，因此反射層15〇僅塗 佈於導光枝M0的觀上，而未塗佈於導光柱14()的端部。此外， 兩點光源110與導光柱14〇之間都設有波長過滤塗層13〇以將所 有的第-光線U過濾及轉換為第二光線另外，本實施例的 他構件，例如、微結構層16〇、透明罩體18〇 '光學族片等 的設置方式都與照明裝置100的設計相同。 ^值得一提的是，上述的元件配置關係僅是舉例說明。以本實 施例而各透鏡12〇鄰近與遠離導光柱⑽的兩侧都塗佈有波 長過;慮塗層13G。在其他的實施例巾，波長過濾塗廣13G也可以塗 佈於導光柱140的端部以轉換及過渡第—光線u。整禮而言，照 月裝置200與照明裝置1〇〇可以提供黃光室適當的照明光線以避 免紐波長的可見光或紫外光負面地影響微影製程的良率。此外， 在照明裝置200與照明裝置_中，導光柱14〇的材質可以是玻 填或是高分子材料。導光柱14G的材f是高分子材料時，照明裝 置200與照明裝置100更具有不易破碎的特性，而有助於降低黃 光室被微粒子汙染的機率。 M398614 圖3繪示為本創作之又一實施例的照明裝置的爆炸示意圖。 請參照圖3，照明裝置300包括多個點光源310、多個透鏡320、 多個波長過濾塗層330、一光學膜片340以及一反射層350。各點 光源310位於其中一個透鏡320以及反射層350之間。此外，照 明裝置300更包括一透明罩體360，且透明罩體360罩住點光源 310、透鏡320、光學膜片340以及反射層350。光學膜片340例 如為一擴散片、一增亮片或一極化偏振片。 在本實施例中，點光源310例如是多個白光發光二極體或是 多個紫外光發光二極體。由於點光源所發光的光線包含有短波長 的光線以及紫外光而無法直接使用於黃光室中所以，每一個點 光源310前都設置有一透鏡320,且透鏡320上都塗佈有波長過遽 塗層330以有效地將短波長的光過濾掉或是將短波長的光轉換為 長波長的光。換言之，照明裝置300沿出光方向D射出的光線可 以符合黃光室的需求。 詳言之’點光源所發出的第一光線L1經由波長過渡塗層330 的作用後會轉變成第二光線L2。第一光線L1的波長例如包含由 紫外光(小於400 nm)至紅外光(大於700 nm)的波長，而第二光線 L2的波長則實質上皆大於500 nm。在本實施例中，波長過濾塗層 330的一塗層面積至少涵蓋第一光線L1照射於波長過濾塗層33〇 上的一分佈面積。因此，僅有第二光線L2會沿出光方向d射出照 明裝置300,而使照明裝置300適合應用於黃光室中，不會影馨微 影製程的製程良率。 另外，本實施例是以應用於黃光室中的照明裝置3〇〇為例。 在其他的應用領域中，凡需將短波長光線濾除以射出長波長光線 M398614 的裝置都可以採用本創作的精神加以設計》 也就是說’本創作實質上提出一種照明裝置，其如圖4與圖 5所繪示的實施例所示。請先參照圖4，照明裝置400及400,包括 至少一點光源410、至少一透鏡420、一波長過濾件430以及一導 光件440。點光源410發出一光線L。導光件440配置於點光源 410旁以將光線L導引出導光件440的一出光面442»透鏡420配 置於導光件440以及點光源410之間，並位於光線l的光徑上。 另外’本實施例還設置一反射層450於導光件440上，且反射層 450與出光面442相對。在圖4中，波長過濾件430位於導光件 440以及透鏡420之間，而在圖5中，透鏡420位於導光件440 以及波長過濾件430之間。 在這樣的結構設計下，反射層450可與導光件440為一體成 型。除此之外，波長過濾件430例如為可旋轉的設計，且波長過 濾件430可具有不同的過濾區（未繪示）以濾出不同波長的光線。舉 例而言’波長過濾件430被旋轉時，光線l可穿過不同的過濾區（未 繪示）而使不同波長的光線被射出。如此一來，照明裝置4〇〇將可 以發出不同波長的光線。當然，波長過濾件43〇可以是前述實施 例所描述的塗料，並且直接塗佈於透鏡42〇上，不過波長過濾件 430也可以是塗有上述塗料的透光構件。另外，上述實施例中的塗 料也可以僅塗佈於透光構件的局部區域，而透光構件的其他區域 可以塗佈或是配置有其他的濾光材料。 綜上所述，本創作將波長過濾塗層塗佈於點光源前的元件上 或疋將波長過;慮件配置於點光源的出光路徑上以有效過濾及轉換 點光源所發出的光線。如此__來，本裝置的卿裝置應用於黃光 9 室時，照 500 nm ^ 用點光源作為發光㈣ 程的製作良率。此外，本創作採 舞透==:光源相較於燈管而言，不容易碎裂， 波長過慮件的設置，以增加照明的均勻性及穩定性。 本創作已以實施例揭露如上，然其並非用以限定本創 作任何所屬技術領域中具有通常知識者，在不脫離本創作之椅 神和範圍内，當可作些許之更動與潤飾，故本創作之保護範圍當 視後附之申請專利範圍所界定者為準。 田 【圖式簡單說明】 圖1繪示為本創作之一實施例的照明裝置。 圖2繪示為本創作之另一實施例的照明裝置。 圖3繪示為本創作之又一實施例的照明裝置的爆炸示意圖。 圖4繪示為本創作之再一實施例的照明裝置。 圖5繪示為本創作之又一實施例的照明裝置。 【主要元件符號說明】 100、200、300、400、400,：照明裝置 110、310、410 :點光源 122、124 :-側 140:導光柱 152 :第一部份 160 :微結構層 180、360 :透光罩體 120、320、420 :透鏡 130、330 :波長過慮塗層 150、350、450 :反射層 154 :第二部份 Π0 :套筒 M398614 190、340 :光學膜片 442 :出光面 D :出光方向 L1 :第一光線 430 :波長過濾件 440 :導光件 L :光線 L2 :第二光線Side 122 or lens 120 is remote from one side 124 of point source 11 . In this embodiment, the wavelength filter coating 130 is simultaneously applied to the lens 12, close to one side 122 of the point source 11 and the lens 120 is away from the point source 110. 124. In fact, the coating position of the wavelength filter coating layer 130 can be converted or filtered into a second light beam before the first light ray li emitted by the point light source 11 射 is emitted in the light exiting direction D. The design. Therefore, in other embodiments, the wavelength filter coating 13 can also be applied to one end of the light guide column 140 adjacent to the point source 11A. In order to have a better filtering and conversion effect, a coating area of the wavelength filter coating 13 至少 covers at least a distribution area of the first light ray L1 on the wavelength filter coating 13 。. Therefore, in the step of performing the hetero-coating on the yellow light room towel, there is no short-wavelength 5 M398614 light to first sensitize the photoresist material. That is, the design of this embodiment contributes to the improvement of the process yield of the lithography process. In the present embodiment, the lens 120 is shown in the form of a lenticular lens. However, the lens 120 can also be a convex lens, a concave lens, a plano-convex lens, a plano-concave lens or a double concave lens, etc., to provide a function of collecting or astigmatizing according to different use requirements to improve the usability of the illumination device 100. In addition, the reflective layer 150 of the present embodiment includes a first portion 152 and a second portion 154»the first portion 152 is coated on the sidewall of the light guiding column 140, and the second portion 154 is coated on the light guiding column. 140 is away from the other end of the point source 110. The arrangement of the reflective layer 150 causes the light emitted by the point source 110 to be reflected to the light exiting direction D, which helps to improve light utilization. Additionally, the illumination device 1 further includes a microstructure layer 160. The microstructure layer 160 is disposed between the reflective layer 150 and the light guide bar 140. The microstructure layer 160 may actually include a plurality of light guiding structures (not shown) to provide the illumination device 100 with a uniform light extraction effect. In addition, in order to complete the assembly of the overall device, the illumination device 100 may further include a sleeve 170' and the sleeve 170 covers the point source 110 and the lens 12, and the light guide 140 is sleeved in the sleeve no. The sleeve 170 is made of, for example, a material that is opaque to prevent the first light L1 that is not filtered and converted from being directly emitted and irradiated into the yellow light chamber. Further, in an embodiment, the area of the lens 12A can, for example, just fill the inner diameter of the sleeve 17A to further reduce the probability of the first light L1 illuminating the yellow light chamber. In actual design, the illumination device 1 can be more selectively provided with a transparent cover 180' and the transparent cover 180 covers the light guide column 14 or the illumination device 1 can be selectively disposed and reflective. The first portion 152 of the 15 turns is opposite the optical film 190. The optical film 1% is, for example, a diffusion sheet, a brightness enhancement sheet or a polarizing polarizing sheet to enhance the light-emitting effect of the illumination device 100. FIG. 2 illustrates a lighting skirt of another embodiment of the present invention. Please refer to FIG. 2, the device 200 actually 疋 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明 照明unit. In addition, the number of the lenses (10) is also two. Each lens 12G is located therein - the number of the point light source Μ and the light guide column sleeve 17 也是 is also two, and the two ends of the light guide column 14 # are respectively sleeved on the two sleeves 170 in. Both ends of the light guiding column 140 are provided with a point light source 11A. Therefore, the reflecting layer 15〇 is only applied to the light guiding branch M0 and is not applied to the end of the light guiding column 14(). In addition, a wavelength filter coating 13 is disposed between the two-point light source 110 and the light guide column 14A to filter and convert all of the first light rays U into a second light. In addition, other components of the embodiment, for example, microstructures The arrangement of the layer 16A, the transparent cover 18', the optical family, and the like are the same as those of the illumination device 100. It is worth mentioning that the above component configuration relationship is merely an example. In the present embodiment, each lens 12 is coated with a wavelength longer than both sides of the light guide column (10) and the coating 13G. In other embodiments, the wavelength filter can also be applied to the end of the light guide 140 to convert and transition the first light u. For the sake of uniformity, the illumination device 200 and the illumination device 1 can provide appropriate illumination of the yellow light chamber to avoid the visible light or ultraviolet light of the New Wave wavelength negatively affecting the yield of the lithography process. Further, in the illumination device 200 and the illumination device, the material of the light guide column 14A may be a glass fill or a polymer material. When the material f of the light guide column 14G is a polymer material, the illumination device 200 and the illumination device 100 have characteristics that are less likely to be broken, and contribute to reducing the probability of the yellow light chamber being contaminated by the particles. M398614 FIG. 3 is a schematic exploded view of a lighting device according to still another embodiment of the present invention. Referring to FIG. 3, the illumination device 300 includes a plurality of point light sources 310, a plurality of lenses 320, a plurality of wavelength filter coatings 330, an optical film 340, and a reflective layer 350. Each point source 310 is located between one of the lenses 320 and the reflective layer 350. In addition, the illumination device 300 further includes a transparent cover 360, and the transparent cover 360 covers the point light source 310, the lens 320, the optical film 340, and the reflective layer 350. The optical film 340 is, for example, a diffusion sheet, a brightness enhancement sheet or a polarizing polarizer. In the present embodiment, the point light source 310 is, for example, a plurality of white light emitting diodes or a plurality of ultraviolet light emitting diodes. Since the light emitted by the point source contains short-wavelength light and ultraviolet light and cannot be directly used in the yellow light chamber, each of the point light sources 310 is provided with a lens 320, and the lens 320 is coated with a wavelength excessively. The coating 330 is effective to filter out short-wavelength light or to convert short-wavelength light into long-wavelength light. In other words, the light emitted by the illumination device 300 along the light exiting direction D can meet the requirements of the yellow light chamber. In detail, the first light L1 emitted by the point light source is converted into the second light L2 by the action of the wavelength transition coating 330. The wavelength of the first light L1 includes, for example, a wavelength from ultraviolet light (less than 400 nm) to infrared light (greater than 700 nm), and the wavelength of the second light L2 is substantially greater than 500 nm. In the present embodiment, a coating area of the wavelength filter coating 330 covers at least a distribution area of the first light ray L1 irradiated on the wavelength filter coating 33'. Therefore, only the second light L2 will emit the illumination device 300 along the light exiting direction d, and the illumination device 300 can be suitably applied to the yellow light chamber without affecting the process yield of the lithography process. In addition, this embodiment is exemplified by the illumination device 3〇〇 applied to the yellow light chamber. In other applications, devices that need to filter short-wavelength light to emit long-wavelength light M398614 can be designed in the spirit of this creation. That is to say, 'this creation essentially proposes a lighting device, as shown in Figure 4. It is shown in the embodiment shown in FIG. Referring to FIG. 4, the illumination devices 400 and 400 include at least one light source 410, at least one lens 420, a wavelength filter 430, and a light guide 440. The point source 410 emits a light L. The light guide 440 is disposed beside the point light source 410 to guide the light L out of a light emitting surface 442 of the light guide 440. The lens 420 is disposed between the light guide 440 and the point light source 410, and is located on the light path of the light l. . In addition, the present embodiment further provides a reflective layer 450 on the light guide 440, and the reflective layer 450 is opposite to the light exit surface 442. In FIG. 4, the wavelength filter 430 is located between the light guide 440 and the lens 420, and in FIG. 5, the lens 420 is located between the light guide 440 and the wavelength filter 430. Under such a structural design, the reflective layer 450 can be integrally formed with the light guide 440. In addition, the wavelength filter 430 is, for example, a rotatable design, and the wavelength filter 430 can have different filter zones (not shown) to filter out light of different wavelengths. For example, when the wavelength filter 430 is rotated, the light 1 can pass through different filter zones (not shown) to cause different wavelengths of light to be emitted. In this way, the illumination device 4 will emit light of different wavelengths. Of course, the wavelength filter 43A may be the coating described in the foregoing embodiments and applied directly to the lens 42. However, the wavelength filter 430 may also be a light transmissive member coated with the above coating. Further, the coating material in the above embodiment may be applied only to a partial region of the light transmitting member, and other regions of the light transmitting member may be coated or provided with other filter materials. In summary, the present invention applies a wavelength filter coating to the element in front of the point source or 波长 to pass the wavelength; the component is disposed on the light path of the point source to effectively filter and convert the light emitted by the point source. In this way, when the device of the device is applied to the room of the yellow light, the light source (four) is used as the production yield of the light source at the 500 nm ^. In addition, the creation of the dance through ==: the light source is not easy to be broken compared to the lamp, the wavelength of the filter is set to increase the uniformity and stability of the illumination. The present invention has been disclosed in the above embodiments, but it is not intended to limit the ordinary knowledge in the art of the present invention, and may be modified and retouched without departing from the scope of the present invention. The scope of protection of the creation shall be subject to the definition of the scope of the patent application attached. [Simplified Description of the Drawings] Fig. 1 illustrates a lighting device of one embodiment of the present invention. FIG. 2 illustrates a lighting device of another embodiment of the present invention. FIG. 3 is a schematic exploded view of a lighting device according to still another embodiment of the present invention. FIG. 4 illustrates a lighting device according to still another embodiment of the present invention. FIG. 5 illustrates a lighting device according to still another embodiment of the present invention. [Description of main component symbols] 100, 200, 300, 400, 400, illuminating devices 110, 310, 410: point light sources 122, 124: - side 140: light guiding column 152: first portion 160: microstructure layer 180, 360: light-transmitting cover 120, 320, 420: lens 130, 330: wavelength-passing coating 150, 350, 450: reflective layer 154: second part Π 0: sleeve M398614 190, 340: optical film 442: light Face D: Light exit direction L1: First light ray 430: Wavelength filter 440: Light guide L: Light L2: Second light