TWM391119U - Photo-mask having barcode - Google Patents
Photo-mask having barcodeInfo
- Publication number
- TWM391119U TWM391119U TW099210460U TW99210460U TWM391119U TW M391119 U TWM391119 U TW M391119U TW 099210460 U TW099210460 U TW 099210460U TW 99210460 U TW99210460 U TW 99210460U TW M391119 U TWM391119 U TW M391119U
- Authority
- TW
- Taiwan
- Prior art keywords
- barcode
- photo
- mask
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW099210460U TWM391119U (en) | 2010-06-02 | 2010-06-02 | Photo-mask having barcode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW099210460U TWM391119U (en) | 2010-06-02 | 2010-06-02 | Photo-mask having barcode |
Publications (1)
Publication Number | Publication Date |
---|---|
TWM391119U true TWM391119U (en) | 2010-10-21 |
Family
ID=60592306
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099210460U TWM391119U (en) | 2010-06-02 | 2010-06-02 | Photo-mask having barcode |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWM391119U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI624717B (en) * | 2014-11-05 | 2018-05-21 | 聯華電子股份有限公司 | Mask and method for forming multi-level images on wafer by using the same |
US10061191B2 (en) | 2016-06-01 | 2018-08-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | High durability extreme ultraviolet photomask |
-
2010
- 2010-06-02 TW TW099210460U patent/TWM391119U/en not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI624717B (en) * | 2014-11-05 | 2018-05-21 | 聯華電子股份有限公司 | Mask and method for forming multi-level images on wafer by using the same |
US10061191B2 (en) | 2016-06-01 | 2018-08-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | High durability extreme ultraviolet photomask |
TWI639883B (en) * | 2016-06-01 | 2018-11-01 | 台灣積體電路製造股份有限公司 | Reflective photomask and manufacture method thereof |
US10642148B2 (en) | 2016-06-01 | 2020-05-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | High durability extreme ultraviolet photomask |
US11003069B2 (en) | 2016-06-01 | 2021-05-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | High durability extreme ultraviolet photomask |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4K | Annulment or lapse of a utility model due to non-payment of fees | ||
MM4K | Annulment or lapse of a utility model due to non-payment of fees |