TWM391119U - Photo-mask having barcode - Google Patents

Photo-mask having barcode

Info

Publication number
TWM391119U
TWM391119U TW099210460U TW99210460U TWM391119U TW M391119 U TWM391119 U TW M391119U TW 099210460 U TW099210460 U TW 099210460U TW 99210460 U TW99210460 U TW 99210460U TW M391119 U TWM391119 U TW M391119U
Authority
TW
Taiwan
Prior art keywords
barcode
photo
mask
Prior art date
Application number
TW099210460U
Other languages
Chinese (zh)
Inventor
Ding-Cheng You
Original Assignee
Formosa Mask Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Formosa Mask Co Ltd filed Critical Formosa Mask Co Ltd
Priority to TW099210460U priority Critical patent/TWM391119U/en
Publication of TWM391119U publication Critical patent/TWM391119U/en

Links

TW099210460U 2010-06-02 2010-06-02 Photo-mask having barcode TWM391119U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW099210460U TWM391119U (en) 2010-06-02 2010-06-02 Photo-mask having barcode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW099210460U TWM391119U (en) 2010-06-02 2010-06-02 Photo-mask having barcode

Publications (1)

Publication Number Publication Date
TWM391119U true TWM391119U (en) 2010-10-21

Family

ID=60592306

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099210460U TWM391119U (en) 2010-06-02 2010-06-02 Photo-mask having barcode

Country Status (1)

Country Link
TW (1) TWM391119U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI624717B (en) * 2014-11-05 2018-05-21 聯華電子股份有限公司 Mask and method for forming multi-level images on wafer by using the same
US10061191B2 (en) 2016-06-01 2018-08-28 Taiwan Semiconductor Manufacturing Co., Ltd. High durability extreme ultraviolet photomask

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI624717B (en) * 2014-11-05 2018-05-21 聯華電子股份有限公司 Mask and method for forming multi-level images on wafer by using the same
US10061191B2 (en) 2016-06-01 2018-08-28 Taiwan Semiconductor Manufacturing Co., Ltd. High durability extreme ultraviolet photomask
TWI639883B (en) * 2016-06-01 2018-11-01 台灣積體電路製造股份有限公司 Reflective photomask and manufacture method thereof
US10642148B2 (en) 2016-06-01 2020-05-05 Taiwan Semiconductor Manufacturing Co., Ltd. High durability extreme ultraviolet photomask
US11003069B2 (en) 2016-06-01 2021-05-11 Taiwan Semiconductor Manufacturing Co., Ltd. High durability extreme ultraviolet photomask

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Legal Events

Date Code Title Description
MM4K Annulment or lapse of a utility model due to non-payment of fees
MM4K Annulment or lapse of a utility model due to non-payment of fees