Claims (1)
M368893 六、申請專利範圍: , Λ. 一種具反射及導體金屬層之塑料導線架結構,包括:基 . 座,該基座係於頂面往下傾斜形成一反射面,再於反射 面的外周緣形成有一呈交錯之載體嵌槽,該載體嵌槽内 再以射出技術形成一載體,其基座表面還沉積有一介面 層,該介面層為以化學鍍法形成於基座表面,亦再利用 雷射技術剝離部份介面層以形成一絕緣線路,最後施行 Φ 電鍍或化學沉積金屬層在基座上,以形成具反射金屬層 之塑料導線架結構者。 2.如中請專利範圍第!項所述之具反射及導體金屬層之塑 料導線架結構’其中該基座與載體可為不同塑料材質之 雙料射出所成型。M368893 VI. Patent application scope: Λ. A plastic lead frame structure with a reflective and conductive metal layer, comprising: a base, the base is inclined downwardly to form a reflecting surface on the top surface, and then on the outer periphery of the reflecting surface The edge is formed with a staggered carrier recess, and a carrier is formed by the injection technique in the carrier recess, and a surface layer is further deposited on the surface of the base. The interface layer is formed on the surface of the base by electroless plating, and is reused. The laser technique strips a portion of the interface layer to form an insulated line, and finally performs a Φ plating or chemical deposition of a metal layer on the pedestal to form a plastic leadframe structure having a reflective metal layer. 2. Please ask for the scope of patents! The plastic lead frame structure of the reflective and conductive metal layer is wherein the pedestal and the carrier are formed by two-shot injection of different plastic materials.
如申π專利㈣第i項所述之具反射及導體金屬層之塑 料導線架L構’其巾該基座與載體可為相同塑料材質之 射出所成型’又基座内摻雜有含金屬觸媒的塑料或 含有機物的塑料。 4. 5. 如申哨專利|&圍第!項所述之具反射及導體金屬層之塑 料導線架結構,其中該基座為由摻雜包含金屬觸媒的塑 ㈣料形成’並_與無金屬觸媒塑料或 無有機物塑料形成有—緊附於基座之載體,且基座係於 頂面往下傾斜形成—反射面,以構成一導線架胚料。 如申請專利範圍第1項所述之具反射及導體金屬層之塑 13 M368893 中該基座採用單一塑料射 ,所形成之基座利用蝕刻 出,此塑料 ’於其表面 料導線架結構,其 經過射出成型基座 均勻浸泡或塗佈觸媒,隨後將此具有整體觸媒浸泡或塗 佈之基座進行第二次使用相同塑料之射出成型製程,第 次射出成型時為嵌入式射出形成载體,其中基座係於 頂面往下傾斜形成一反射面,以構成一導線架胚料。 6_如申請專利範圍第3或4項所述之具反射及導體金屬層 之塑料導線架結構,其中該金屬觸媒或其有機物主要為 鈀、銅、銀等。 如申請專利範圍第1、4或5項所述之具反射及導體金 屬層之塑料導線架結構,其中該頂面與其反射面界定的 夾角是介於15度至85度之間,以提升發光二極體發光 效率。 8·如申請專利範圍第4項所述之具反射及導體金屬層之塑 料導線架結構,其中產生一導線架胚料後,隨後進行局 表面活化之電鍵浴前處理,並於基座表面以化學鑛法 沉積一介面層。 9_如申請專利範圍第5項所述之具反射及導體金屬層之塑 料導線架結構’其中產生一導線架胚料後,隨後進行局 部表面活化之電鍍浴前處理,並於基座表面以化學鑛法 沉積一介面層。 1〇_如申請專利範圍第8項所述之具反射及導體金屬層之塑 M368893 - 料導線架結構,其中該介面層之鍍設沉積後 進行局部之介面層的剝離以形成一絕緣線路 11·如申請專利範圍第9項所述之具反射及導體金屬層之塑 料導線架結構’其中該介面層之鍍設沉積後,利用雷射 進行局部之介面層的剝離以形成一絕緣線路。 12_如申請專利範圍第10項所述之具反射及導體金屬層之 塑料導線架結構,其中該絕緣線路的介面層上,再利用For example, the plastic lead frame L with reflection and conductor metal layer described in the item (4) of the π patent (4), the base and the carrier can be formed by the injection of the same plastic material, and the base is doped with metal. Catalyst plastic or plastic containing organic matter. 4. 5. Such as the whistle patent | & A plastic lead frame structure having a reflective and conductive metal layer, wherein the pedestal is formed by doping a plastic (tetra) material containing a metal catalyst, and is formed with a metal-free catalytic plastic or an organic-free plastic. A carrier attached to the base, and the base is inclined downwardly from the top surface to form a reflecting surface to constitute a lead frame blank. In the plastic 13 M368893 with a reflective and conductive metal layer as described in claim 1, the susceptor is formed by a single plastic shot, and the formed pedestal is etched out, and the plastic is in its surface material lead frame structure, After the injection molding base is uniformly immersed or coated with the catalyst, the base having the whole catalyst soaked or coated is then subjected to the second injection molding process using the same plastic, and the injection molding is carried out for the first injection molding. The body, wherein the base is inclined downward from the top surface to form a reflecting surface to form a lead frame blank. 6_ A plastic lead frame structure having a reflective and conductive metal layer as described in claim 3 or 4, wherein the metal catalyst or an organic substance thereof is mainly palladium, copper, silver or the like. The plastic lead frame structure having a reflective and conductive metal layer as described in claim 1, 4 or 5, wherein the top surface and the reflecting surface define an angle between 15 degrees and 85 degrees to enhance the illumination. Diode luminous efficiency. 8. A plastic lead frame structure having a reflective and conductive metal layer as described in claim 4, wherein a lead frame blank is produced, followed by a surface-activated key bath pretreatment, and is applied to the surface of the base. A mineral layer is deposited by a chemical ore method. 9_A plastic lead frame structure having a reflective and conductive metal layer as described in claim 5, wherein a lead frame blank is produced, followed by a partial surface activation plating bath pretreatment, and on the surface of the base A mineral layer is deposited by a chemical ore method. 1 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ A plastic lead frame structure having a reflective and conductive metal layer as described in claim 9 wherein after the plating of the interface layer is deposited, partial peeling of the interface layer is performed by laser to form an insulated line. 12_ A plastic lead frame structure having a reflective and conductive metal layer as described in claim 10, wherein the insulating layer is reused on the interface layer
電鍍或化學沉積金屬層,而完成該塑料導線架結構之製 作。 13_如申請專利範圍第11項所述之具反射及導體金屬層之 塑料導線架結構,其中該絕緣線路的介面層上,再利用 電錄或化學沉積金屬層,而完成該塑料導線架結構之製 作。 14.如申請專利範圍第1、8或9項所述之具反射及導體金 屬層之塑料導線架結構,其中該化學鍍法係成長化學鎳 或化學銅於基座表面以形成一介面層。 15·如申請專利範圍第1、12或13項所述之具反射及導體 金屬層之塑料導線架結構’其中該電鍍或化學沉積的金 屬層可選自銅、鎳、銀、金、鉻、化學置換金、銅/鎳/ 銀、銅/鎳/金所構成之群組之任一者所形成。 16_如申請專利範圍第4或5項所述之具反射及導體金屬層 之塑料導線架結構’其中該形成基座與載體之塑料可選 15The metal layer is electroplated or chemically deposited to complete the fabrication of the plastic leadframe structure. 13_ The plastic lead frame structure having a reflective and conductive metal layer according to claim 11 wherein the dielectric layer of the insulated circuit is electrically or chemically deposited on the interface layer of the insulated circuit to complete the plastic lead frame structure Production. 14. A plastic leadframe structure having a reflective and conductor metal layer as described in claim 1, 8 or 9, wherein the electroless plating process grows chemical nickel or chemical copper on the surface of the pedestal to form an interfacial layer. 15. A plastic leadframe structure having a reflective and conductor metal layer as described in claim 1, 12 or 13 wherein the plated or chemically deposited metal layer is selected from the group consisting of copper, nickel, silver, gold, chromium, It is formed by any of a group consisting of chemically substituted gold, copper/nickel/silver, and copper/nickel/gold. 16_ A plastic lead frame structure having a reflective and conductive metal layer as described in claim 4 or 5 wherein the plastic forming the pedestal and the carrier is optional.
需求。 M368893 » 擇能夠耐高溫大於260度的塑料,以符合回焊的 17.如申請專利範圍第1或10項所述之具反射及導體金屬 層之塑料導線架結構,其中該雷射源則可選自二氧化碳 雷射、铷雅鉻(Nd:YAG)雷射、掺鈥釩酸釔(Nd:YV04)晶體 雷射、準分子雷射等,該雷射絕緣步驟的雷射波長係選 自於 248 nm、308 nm、355 nm、532 nm、1064 nm 或 10600 nm中選用。demand. M368893 » A plastic lead frame structure with a reflective and conductive metal layer as described in claim 1 or 10, which is capable of withstanding a plastic having a high temperature resistance of more than 260 degrees, in accordance with the reflow process. Selecting from a carbon dioxide laser, a Nd:YAG laser, a Nd:YV04 crystal laser, a pseudo-laser, etc., the laser wavelength of the laser insulation step is selected from Used in 248 nm, 308 nm, 355 nm, 532 nm, 1064 nm or 10600 nm.
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