M346788 八、新型說明： 【新型所屬之技術領域】 本創作係有關於一種以逆向工程方式，量測模型上三度空間關 線的座標位置，量測裝置，以此方式進行的逆向工程，最大的優點已“ 量測模型上標示出欲截取的點或曲線，並採用同中心轴線性計算‘了‘ 學量測鏡頭影像變形的干，，不但可大幅提高取點的精密度，取‘ 均為欲獲得的關鍵點，大幅減少在電腦中再選取資料，編輯物件 ^ ' 軌單容易，無論在技以理以面 測蕊的目標，另-方面可取得關鍵精確資料，參數簡要，符合逆向 =〒終目標。大部份的逆向工程最終目的並非在於取得原模型g 資料，而是在於取得局部關鍵精確資料，減少因點數過多的繁 大幅減少生產的成本，本創作由觀念上的改革 【先前技術】 >傳統逆向工程大致可分為接觸式與非接觸式，非接觸式經掃据掇德， 線^辨別到整理去除雜點及補點，實際 為觀令上^參料 整理去除雜點及補點的問題，但須接觸模型、‘ 二、、、％ 點又可獲传局部關鍵精轉資料，經濟的優點。 /、 觸式優 【新型内容】 f ^ ί線性雜上’攝雜於雜賴魅_1 ^汔欲截取的點或線所構成之量測裝置，其》動 圖），降极本與番、目丨丨供-s旦/你私用冋中心軸線性計算法（第三、四 么變d?量t巧何原理，精密計算 的三度空間座$ 出&不於量測模型上的點或曲線 幻i間鉢（第五圖）。另於外型較複雜的模型可加裝攝影機（第= 5 M346788 供輔_助計算資料。以此方式進行的逆向工程，最大的優點為已於模 1上先標示出欲截取的點或線，不但可大幅提高取點的精密度，取得“ μ鹭，為，獲得的關鍵點，一併完成物件編輯，不須要再進行複雜而不·易 的貳。人編輯及貳次人為資料處理，可運用於兩零件之間的準確組合、费 假牙、臉型辨識等。 衣w 【實施方式】 本創作主要在逆向工程，量測模型上三度空間關鍵點或線之量測裝置 ，其主要（第一圖）係由一攝影機及一線性軌道（τ)，將攝影機組裝 疋f線性滑軌上，攝影機於線性滑執作直線運動，配合於量測模型上 ， 標示出欲截取的點（MP)所構成者，其中，該攝影機於線性軌道上分別 於，個不同位置上（Cl) (C2)，對量測模型拍攝兩張圖像，以紀錄先前 - 標示於量測模型上的點或線，採用同中心軸線性計算法（第三、四 • 圖），降低光學量測鏡頭影像變形的干擾，再利用三角幾何原 理，精密計算出圖像中點與置物平台基準點（G〇)的垂直(h)與水 ^ 相關位置（第二圖）。 V^M346788 VIII. New description: [New technical field] This creation department is about a reverse engineering method, measuring the coordinate position of the three-dimensional space on the model, measuring device, reverse engineering in this way, the largest The advantages have been "measured on the measurement model to indicate the point or curve to be intercepted, and the use of the same central axis to calculate the 'measurement' lens image deformation, not only can greatly improve the precision of the point, take 'all For the key points to be obtained, greatly reduce the selection of data in the computer, edit the object ^ 'track order is easy, no matter in the goal of measuring the core with skill, the other can obtain key accurate information, the parameters are brief, in line with the reverse = The ultimate goal. The ultimate goal of most reverse engineering is not to obtain the original model g data, but to obtain local key accurate data, reduce the cost of production due to excessively large number of points, and the concept is reformed by concept. [Prior Art] > Traditional reverse engineering can be roughly divided into contact type and non-contact type, non-contact type scan according to Jude, line ^ identification to finishing removal The noise and the supplementary point are actually the problem of sorting and removing the noise and the supplementary point on the order, but it is necessary to contact the model, and the 'two, , and % points can also receive the key key information, and the economic advantages. /, Touch type excellent [new content] f ^ ί linear miscellaneous 'photographed in the misunderstanding _1 汔 ^ 汔 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截 截目 丨丨 s s s 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 你 s s s s s s s s s s s s s s s s s s s Point or curve illusion (fifth picture). Another model with more complicated appearance can be equipped with a camera (No. 5 M346788 for auxiliary _ aid calculation data. Reverse engineering in this way, the biggest advantage is The point or line to be intercepted has been marked on the modulo 1, which not only greatly improves the precision of the point, but also obtains the key points of the "Ilu, for, and the acquisition of the object, without the need for complicated ·Easy 贰.Man-edited and 人man-made data processing, can be applied to the exact combination between the two parts, the fee is false , face recognition, etc. Clothing w [Implementation] This creation is mainly in reverse engineering, measuring the three-dimensional space key points or line measurement device, the main (first picture) is a camera and a linear track ( τ), the camera is assembled on the linear slide of the ,f, and the camera performs a linear motion on the linear slider, which is matched with the measurement model to mark the point to be intercepted (MP), wherein the camera is on a linear orbit. At two different locations (Cl) (C2), two images were taken on the measurement model to record the points or lines previously marked on the measurement model, using the concentric linearity calculation method (third, 4.• Figure), reduce the interference of the image distortion of the optical measurement lens, and then use the principle of triangular geometry to accurately calculate the vertical (h) and water-related position of the reference point (G〇) of the image midpoint and the platform (second Figure). V^
ClP/f=d/(Clh-h) C2P/f- d/(C2h-h) 經計算得到 h=(ClP*Clh-C2P*C2h)/(ClP-C2P) (Clh-h)*ClP/f 由設備裝置，可得知使用鏡片或鏡片組的焦距(f)、第一位置點攝影機高 度（Clh)、第二位置點攝影機高度(C2h)資料（第二圖），配合攝影機在 第一位置點（C1)、第二位置點(C2)測量點（MP)於感光元件上投影點與 感光元件中心點（SO)距離值(C1P)與（C2P)(第三圖），再經由上述計算公 式可測量出標示於模型上的點（MP)與置物平台基準點（GO)的垂直(h)與 水平(d)距離，即該測量點（MP)與置物平台基準點（GO)的三度空間位置 關係，因在同一線性中心軸上為線性變形參數且可於計算法中抵消變形程 度，故採用同中心轴線性計算法，降低光學量測鏡頭影像變形的影響，經 由360度計算度即可得到三度空間曲線（ML1)與置物平台基準點（G〇)的 三度空間位置關係（第四圖）（第五圖），重複上述步驟，視精密度的需要 6 M346788 而定，對欲量測模型上已標示的不同曲線，實施操作，可獲得更多條的 曲線（如ML2與ML3)(第六圖），由兩條或以上不同曲線即可組成物件的數 位模型（第七圖）。另於外型較複雜的模型可加裝攝影機提供辅助計算資料 (#第八圖）。以此方式進行的逆向工程，最大的優點為已於欲量測模型上先 標不出欲截取的點或線，不但可大幅提高取點的精密度，取得的點資料均 為欲獲得的關鍵點，一併完成物件編輯。 【圖式簡單說明】 第一圖：為本創作結構之系統圖。 第二圖：為本創作單一測量點計算原理之示意圖。 第二圖：為本創作實施操作攝影機分別於Cl、C2位置拍攝量測模型上已標 不出欲截取的曲線，所得於感光元件上影像示意圖。 第四圖：為本創作實施操作360度同中心軸線性計算法示意圖。 第五圖·為本創作對量測模型上已標示一曲線（ML1)，實施操作獲得的三 度空間曲線示意圖。 第/、圖·為本創作對量測模型上已標示不同三曲線（MU、ML2、ML3)，實施 操作分別獲得的三度空間三曲線示意圖。 第七圖·為本創作實施操作由三條曲線組成的數位模型網狀圖。 第八圖·為本創作結構加裝攝影機提供辅助示意圖。 【主要元件符號說明】 C1攝影機於第一位置點 C2攝影機於第二位置點 C3輔助用攝影機 C1P攝影機於第一位置拍攝量測模型上標示出欲截取的測量點或曲線於感 7 M346788 光70件上投影點與感光元件中心點距離 C2P攝影機於第二位置拍攝量測模蜇上標示出欲截取的測量點或曲線於感 光元件上投影點與感光元件中心點距離 Clh第一位置攝影機的鏡片或鏡片組中心點與置物平台基準點的垂直距離 C2h第一位置攝影機的鏡片或鏡片組中心點與置物平台基準點的垂直距離 f攝影機鏡片或鏡片組的焦距 LENS鏡片或鏡片組 • GO置物平台基準點 SENSOR感光元件 MP量測模型上標不出的指定測量點 ML1量測模型上標示出的第一測量曲線 ML2量測模型上標示示出的第二測量曲線 ML3量測模型上標示出的第三測量曲線 SO感光元件中心點位置點 d指定測量點與置物平台基準點之水平方向距離 h指定測量點與置物平台基準點之垂直方向距離 T直線性軌道 8ClP/f=d/(Clh-h) C2P/f-d/(C2h-h) Calculated h=(ClP*Clh-C2P*C2h)/(ClP-C2P) (Clh-h)*ClP/ f From the equipment, it can be known that the focal length (f) of the lens or lens group, the camera height of the first position (Clh), the camera height of the second position (C2h) (second picture), and the first camera Position point (C1), second position point (C2) measurement point (MP) on the photosensitive element projection point and photosensitive element center point (SO) distance value (C1P) and (C2P) (third picture), and then through the above The calculation formula measures the vertical (h) and horizontal (d) distances of the point (MP) indicated on the model from the platform reference point (GO), that is, the measurement point (MP) and the platform reference point (GO). The positional relationship of the three degrees is linearly deformed on the same linear central axis and can be used to offset the degree of deformation in the calculation method. Therefore, the concentricity calculation method is used to reduce the influence of the image distortion of the optical measurement lens, and the calculation is performed via 360 degrees. Degree can obtain the three-dimensional spatial position relationship of the three-dimensional space curve (ML1) and the platform reference point (G〇) (fourth figure) (fifth figure), repeat the above steps According to the need of precision 6 M346788, the operation of different curves indicated on the model to be measured can obtain more curves (such as ML2 and ML3) (sixth figure), two or more Different curves form the digital model of the object (seventh image). In addition, the more complex model can be equipped with a camera to provide auxiliary calculation data (#8). The biggest advantage of reverse engineering in this way is that the points or lines that are to be intercepted are not marked on the model to be measured, which not only can greatly improve the precision of the points taken, but also the points obtained are the key points to be obtained. Click to complete the object editing. [Simple description of the diagram] The first picture: the system diagram of the creation structure. The second picture: a schematic diagram of the calculation principle of a single measurement point for the creation. The second picture: the operation of the camera for the creation of the camera, the C, C2 position shooting measurement model has not been marked on the curve to be intercepted, the image obtained on the photosensitive element. The fourth picture: a schematic diagram of the 360-degree central axis calculation method for the implementation of this creation. The fifth picture is a schematic diagram of the three-dimensional space curve obtained by performing the operation on the measurement model which has been marked with a curve (ML1). The third/space three-curve diagram obtained by the operation is respectively marked by the different three curves (MU, ML2, ML3) on the measurement model. The seventh figure is a digital model network diagram consisting of three curves for the implementation of this creation. The eighth picture provides an auxiliary diagram for the installation of the camera for the creation structure. [Main component symbol description] C1 camera at the first position point C2 camera at the second position point C3 auxiliary camera C1P camera on the first position shooting measurement model to indicate the measurement point or curve to be intercepted in the sense 7 M346788 light 70 The distance between the projection point on the piece and the center point of the photosensitive element C2P camera on the second position shooting measurement module is marked with the measurement point or curve to be intercepted on the photosensitive element and the distance between the projection point and the center point of the photosensitive element Clh lens of the first position camera Or the vertical distance between the center point of the lens group and the reference point of the platform C2h. The vertical distance of the lens or lens group center point of the first position camera and the platform reference point. The focal length of the camera lens or lens group LENS lens or lens group • GO storage platform The first measurement curve ML1 on the reference point SENSOR photosensitive element MP measurement model is not indicated. The first measurement curve ML2 on the measurement model is indicated on the second measurement curve ML3 on the measurement model. The third measurement curve SO photosensitive element center point position point d specifies the horizontal distance between the measurement point and the platform reference point h Specify the vertical distance between the measuring point and the reference point of the platform. T Linear orbital 8