M335008 八、新型說明： 【新型所屬之技術領域】 本創作是有關於一種晶圓置放架之結構改良，尤指一 種可藉由抗酸洗材質之晶圓置放架，使晶圓於處理過程中 不受其他物質之影響，而讓晶圓達到穩定之功效者。 【先前技術】 按，一般習用之晶圓置放架5 (如第一圖所示），其係 由呈相對應設置之二侧板5 1，各侧板5 1間隙分別設有 多數支撐桿5 2及固定桿5 3，且各支撐桿5 2及固定桿 5 3之二端係分別配合固定元件5 4與側板5 1固接，並 於各固定桿5 3相對應之内侧緣配合固定元件5 4固接多 數具有嵌槽5 5 1之承載單元5 5 ;藉此，可將多數晶圓 分別設置於承載單元5 5之嵌槽5 5 1中，而達到集中置 放晶圓之功效。 雖然上述習用之晶圓置放架5可達到集中置放晶圓之 功效；但是由於各侧板5 1、支撐桿5 2、固定桿5 3以 及固定元件5 4皆為金屬材質所製成，因此，當晶圓需要 進行酸洗處理而將晶圓置放架5連同晶圓放入酸洗槽中 時，該金屬材質之侧板5 1、支撐桿5 2、固定桿5 3以 及固定元件5 4則會一併參與酸洗反應，而影響晶圓進行 酸洗時之穩定性，使酸洗後之晶圓特性受到影響。 【新型内容】 M335008 因此，本創作之主要目的係在於，可將所需之晶圓集 中置放於晶圓置放架上，並直接置入酸洗槽中進行處理， 可藉由抗酸洗材質之晶圓置放架，使晶圓於處理過程中不 受其他物質之影響，而讓晶圓達到穩定之功效。 為達上述之目的，本創作係一種晶圓置放架之結構改 . 良，包含二呈相對應設置之侧板，且各側板係為抗酸洗之 材質；多數二端係分別設於侧板相對應之一面上且鄰近各 _ 侧板之二側及底緣之支撐桿，且各支撐桿係為抗酸洗之材 質’而各支撐桿之内側緣係設有多數相對應之嵌槽；以及 多數二端分別設於二侧板底部相對應一面上之固定桿，而 各固定桿係為抗酸洗之材質。 【實施方式】 請參閱『第二及第三圖』所示，係分別為本創作之立 體分解示意圖及本創作之立體外觀示意圖。如圖所示：本 _ 創作係一種晶圓置放架之結構改良，其至少係由二側板 .1、多數支撐桿2以及多數固定桿3所構成。 各側板1係呈相對應設置，且各侧板1係為抗酸洗之 材質，並於各側板1相對應之一面上係設有多數定位槽1 1 〇 各支撐桿2係分別設於上述二側板1相對應之一面上 且鄰近各侧板1之二侧及底緣，並於各支稽桿2之二端係 分別具有一與侧板1所設定位槽1 1結合之插接部2 1， 而各支撐桿2係為抗酸洗之材質，另於各支撐桿2之内侧 M335008 緣係設有多數相對應之嵌槽2 2。 各固定桿3係分別設於上述二侧板i底部相對應之一 面上而各固疋_干3之二端係分別具有一與侧板1所設定 位If合之插接部3 1，且各固定桿3係為抗酸洗之 材貝。如疋，藉由上述之結構構成一全新之晶圓置放架之 結構改良。 當本創作於運用時，係可以自動化之工具夾取晶圓（圖 未示），並逐一放置於各支撐桿2内側緣相對應之多數嵌槽 2 2中，藉以完成晶圓之集中置放，以防止晶圓於存放時 產生破裂及污損之外；而清洗時，係可將本創作之晶圓置 放架連同晶®直接置放於所需之酸洗射進行所需之酸洗 處理’而由於各侧板1、支撐桿2以及岐桿3係為抗酸 洗材質所製成，因此，於酸洗過程中並不會參與反應，如 此，即可使晶圓於處理過程中不受其他物f之影響，而達 到較佳之穩定性。 • 請參閱『第四及第五圖』所示，係分別為本創作另- 實施例之立體分解示意圖及本創作另一實施例之使用狀態 .示意囷。如圖所示：當本創作於運用時，係可於該側板1 之外侧面上係設有-容置槽12，該容置槽12中係具有 .-晶片且該谷置槽2之開σ處係以超音波熱溶之 方式蓋設有一封閉板1 4 ;其中該晶片1 3係可為RF晶 片，且該晶片1 3中係可儲存有該晶圓置放架上所承載之 各晶圓編號或其他建立檔案訊息，可 取機構4讀取晶片13中之各曰圓: 貝-己口 °貝 各日日圓編號或其他建立檔案訊 M335008 息，以供操作人員判別欲處理之晶圓為何。 綜上所述，本創作晶圓置放架之結構改良可有效改善 習用之種種缺點，可將所需之晶圓集中置放於晶圓置放架 上，並直接置入酸洗槽中進行處理，可藉由抗酸洗材質之 晶圓置放架，使晶圓於處理過程中不受其他物質之影響， 而讓晶圓達到穩定之功效，進而使本創作之產生能更進 步、更實用、更符合使用者之所須，確已符合創作專利申 請之要件，爰依法提出專利申請。 惟以上所述者，僅為本創作之較佳實施例而已，當不 能以此限定本創作實施之範圍；故，凡依本創作申請專利 範圍及創作說明書内容所作之簡單的等效變化與修飾，皆 應仍屬本創作專利涵蓋之範圍内。 【圖式簡單說明】 第一圖，係習用之立體外觀示意圖。 第二圖，係本創作之立體分解示意圖。 第三圖，係本創作之立體外觀示意圖。 第四圖，係本創作另一實施例之立體分解示意圖。 第五圖，係本創作另一實施例之使用狀態示意圖。 【主要元件符號說明】 (習用部分） 晶圓置放架5 侧板5 1M335008 VIII. New Description: [New Technology Field] This creation is about the improvement of the structure of a wafer rack, especially a wafer rack that can be treated with acid-resistant materials. The process is not affected by other substances, but the wafer is stable. [Prior Art] According to the conventional wafer placing rack 5 (as shown in the first figure), the two side plates 5 1 are correspondingly disposed, and the side plates 51 are respectively provided with a plurality of support bars. 5 2 and the fixing rod 5 3 , and the two ends of each of the supporting rods 5 2 and the fixing rods 5 3 are respectively fixed with the fixing member 5 4 and the side plates 5 1 , and are fixed and fixed on the inner edges of the corresponding fixing rods 5 3 . The component 5 4 is fixed to a plurality of carrying units 5 5 having the recessed grooves 515; thereby, a plurality of wafers can be respectively disposed in the recessed grooves 515 of the carrying unit 55, thereby achieving the effect of centrally placing the wafers. . Although the above-mentioned conventional wafer rack 5 can achieve the effect of centrally placing the wafer, since each side plate 5 1 , the support rod 5 2 , the fixing rod 5 3 and the fixing member 514 are made of metal material, Therefore, when the wafer needs to be pickled to place the wafer placement rack 5 together with the wafer in the pickling tank, the metal side plate 5 1 , the support rod 5 2 , the fixing rod 5 3 and the fixing element 5 4 will participate in the pickling reaction, which will affect the stability of the wafer during pickling, which will affect the wafer characteristics after pickling. [New Content] M335008 Therefore, the main purpose of this creation is to place the required wafers on the wafer rack and directly put them into the pickling tank for treatment. The material is placed on the wafer shelf so that the wafer is not affected by other substances during processing, and the wafer is stabilized. In order to achieve the above purpose, the present invention is a structural modification of a wafer rack, which comprises two side panels which are correspondingly arranged, and each side panel is made of a material resistant to pickling; most of the two ends are respectively disposed on The side plates are corresponding to one side and adjacent to the support bars of the two sides and the bottom edge of each of the side plates, and each support bar is made of a material resistant to pickling, and the inner edge of each support bar is provided with a plurality of corresponding inlays a groove; and a plurality of fixing rods disposed on opposite sides of the bottom of the two side plates, and each of the fixing rods is made of acid-resistant material. [Embodiment] Please refer to the "Second and Third Diagrams" for the schematic diagram of the creation of the creation and the three-dimensional appearance of the creation. As shown in the figure: This _ creation is a structural improvement of a wafer rack, which is composed of at least two side panels, a plurality of support rods 2, and a plurality of fixed rods 3. Each of the side plates 1 is disposed correspondingly, and each of the side plates 1 is made of a material resistant to pickling, and a plurality of positioning grooves 1 1 are provided on one side of each side plate 1 respectively. The two side plates 1 are adjacent to one side of the side plate 1 and adjacent to the two sides and the bottom edge of each side plate 1 , and respectively have a plug portion which is combined with the position slot 1 1 of the side plate 1 at the two ends of each of the side bars 1 . 2, and each support rod 2 is made of acid-resistant material, and a plurality of corresponding grooves 2 2 are provided on the inner side of each support rod 2 on the edge of M335008. Each of the fixing rods 3 is respectively disposed on a corresponding one of the bottoms of the two side plates i, and each of the two ends of each of the fixing plates 3 has a plug portion 3 1 which is combined with the position If of the side plate 1 and Each of the fixing rods 3 is a material resistant to pickling. For example, the above structure constitutes a structural improvement of a brand new wafer rack. When the creation is in use, an automated tool can be used to take wafers (not shown) and placed one by one in a plurality of slots 2 2 corresponding to the inner edge of each support rod 2, thereby completing the centralized placement of the wafer. In order to prevent the wafer from being cracked and stained during storage; when cleaning, the wafer placement rack of the present invention can be directly placed on the desired acid pickling spray to perform the desired pickling. The treatment is made because the side plates 1, the support rods 2 and the masts 3 are made of an acid-resistant material, so that they do not participate in the reaction during the pickling process, so that the wafer can be processed during processing. It is not affected by other substances f, but achieves better stability. • Please refer to the “Fourth and Fifth Diagrams” for a perspective exploded view of another embodiment of the present invention and a state of use of another embodiment of the present creation. As shown in the figure, when the present invention is applied, a receiving groove 12 can be disposed on the outer side of the side plate 1, and the receiving groove 12 has a .-wafer and the valley is opened. The σ is covered with a closed plate 14 by means of ultrasonic heat-dissolving; wherein the wafer 13 can be an RF chip, and the wafer 13 can store each of the carried on the wafer shelf. For the wafer number or other file creation information, the optional mechanism 4 reads the respective circles in the wafer 13: the Bay-Happo Bay number or the other file ID M335008 for the operator to discriminate the wafer to be processed. Why? In summary, the structural improvement of the created wafer rack can effectively improve various disadvantages of the conventional use, and the required wafers can be placed on the wafer rack and placed directly in the pickling tank. The treatment can be carried out by the acid-resistant material of the wafer placement rack, so that the wafer is not affected by other substances during the processing, and the wafer is stabilized, thereby making the creation of the creation more advanced and more Practical and more in line with the needs of the user, it has indeed met the requirements for the creation of a patent application, and has filed a patent application in accordance with the law. However, the above is only the preferred embodiment of the present invention, and the scope of the creation of the present invention cannot be limited by this; therefore, the simple equivalent changes and modifications made by the scope of the patent application and the content of the creation specification are All should remain within the scope of this creation patent. [Simple description of the diagram] The first figure is a schematic diagram of the stereoscopic appearance of the application. The second picture is a three-dimensional exploded view of the creation. The third picture is a three-dimensional appearance of the creation. The fourth figure is a perspective exploded view of another embodiment of the present creation. The fifth figure is a schematic diagram of the state of use of another embodiment of the present creation. [Main component symbol description] (customized part) Wafer placement rack 5 Side panel 5 1
8 M335008 支撐桿5 2 固定桿5 3 固定元件5 4 承載單元5 5 嵌槽5 5 1 (本創作部分） 侧板1 定位槽1 1 容置槽1 2 晶片1 3 封閉板1 4 支撐桿2 插接部2 1 嵌槽2 2 固定桿3 插接部3 1 讀取機構48 M335008 Support rod 5 2 Fixing rod 5 3 Fixing element 5 4 Carrying unit 5 5 Inserting groove 5 5 1 (This creation part) Side plate 1 Positioning groove 1 1 Holding groove 1 2 Wafer 1 3 Closing plate 1 4 Support rod 2 Connector 2 1 slot 2 2 fixing rod 3 insertion portion 3 1 reading mechanism 4