TWM281590U - Improvement of cleaning rag structure - Google Patents

Improvement of cleaning rag structure Download PDF

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Publication number
TWM281590U
TWM281590U TW94206665U TW94206665U TWM281590U TW M281590 U TWM281590 U TW M281590U TW 94206665 U TW94206665 U TW 94206665U TW 94206665 U TW94206665 U TW 94206665U TW M281590 U TWM281590 U TW M281590U
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TW
Taiwan
Prior art keywords
rag
improvement
creation
gauze
desizing
Prior art date
Application number
TW94206665U
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Chinese (zh)
Inventor
Feng-Yu Yang
Original Assignee
Feng-Yu Yang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Feng-Yu Yang filed Critical Feng-Yu Yang
Priority to TW94206665U priority Critical patent/TWM281590U/en
Publication of TWM281590U publication Critical patent/TWM281590U/en

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  • Cleaning Implements For Floors, Carpets, Furniture, Walls, And The Like (AREA)

Description

M281590 四、創作說明(1) 【新型所屬之技術領域】 本創作係主要涉及一種抹布結構之創新設計者。 【先前技術】 按如第1圖所示係為一習式抹布結構之立體示意圖 ,該抹布1 0係由數層紗布層重疊而以縫線i丨縫結組合,並 在四邊車成布邊12組成,而其中各紗布層在製造過程中為 使其平整容易車縫施工,往往須先以漿料將各紗布層加工 成一平整的紗布層,俾可方便縫結組合之。 【新型内容】 鲁所欲解決的 然而如 的平整抹布 及化學物質 膚沾到漿料 其次, 質感,再加 清潔效果, 所以如 f布層釋出 P改良設計者 本創作 避免抹布釋 膚受到之刺 本創作 技術課題 上所述習 結構,往 慢慢釋出 也會受到 習式抹布 上習式抹 為其缺點 何針對以 漿液刺激 ,是為本 之主要目 出含有螢 激傷害, 之次—目 式由漿 往在抹 來,不 其刺激 釋出的 布平整 之二。 上習式 、傷害 創作所 的,係 光劑等 具較佳 的,係 料處理的紗布層疊 布沾水使用時漿料 但消費者在使用操 與傷害,為其缺點 漿液也將會使抹布 的紗布層都非常不 組縫結而成 中的螢光劑 作中手部肌 之一。 變得滑粘的 利於抹_ @ 抹布谷易造成消費 ,又不利清潔效果 欲行解決‘之困難點 者肌膚受Μ 的缺點加g 所在° 在提供一種抹布結構改良,< 化學物質的漿液造成消費者肌 的使用安全性者。 在提供一種抹布結構改良,其M281590 4. Creation Instructions (1) [Technical Field to which the New Type belongs] This creation mainly involves an innovative designer of a rag structure. [Prior art] As shown in Figure 1, it is a three-dimensional schematic diagram of a conventional wiper structure. The wiper 10 is composed of several layers of gauze layered and stitched with stitches i 丨, and turned into cloth edges on four sides. In order to make the gauze layers smooth and easy to sew during the manufacturing process, it is often necessary to first process each gauze layer into a flat gauze layer with slurry, which can be easily stitched and combined. [New content] However, the flat wipes and chemical skins that Lu wants to solve, however, are stained with the slurry, followed by the texture and the cleaning effect. Therefore, if the f cloth layer is released, P improves the designer. This creation prevents the wiper skin from being affected. The structure of the exercises described on the technical subject of the tattoo is slowly released, and it will also be affected by the practice wipes on the rags. The disadvantage is that the slurry is stimulated. The mesh is wiped from the pulp, and the cloth released by its irritation is flattened. The styling agents and creative studios are better for glazing agents. The gauze laminates treated by the materials are dipped in water when they are used, but the consumers are using and harming them. For their disadvantages, the slurry will also make the rags The gauze layers are very unstructured and sewn into a fluorescent agent as one of the middle hand muscles. It becomes slippery and easy to wipe _ @ 布布 谷 is easy to cause consumption, and it is unfavorable for cleaning. Those who have difficulty in solving the problem will suffer from the disadvantages of M plus g. ° In providing a rag structure improvement, < Consumer muscle safety. In providing a rag structure improvement, which

M281590 3、創作說明(2) 可以表面自然形 速抹除之較佳清 解決課題之技術 為達到上述 而加以車縫結合 漿處理,使抹布 者。 【實施方式】 餘下,茲配 |作之構造内容, 如第2圖所 由數層紗布層2 1 的抹布2 0,又將 布層21在脫漿處 上述組成本 程中為求平整而 整狀的前置作業 殘留含有螢光劑 消費者肌膚受到 、吉構21 1。 如第3圖所 抹布20在於脫漿 髒污表面3 0進行 凹空間恰可該髒 成的縐摺空間可供容置髒污雜質,達到 潔效果者。 手段: 之目的,本創作係主要由數層紗布層重疊 成一複數紗布層的抹布,該抹布再經過ς 各紗布層在脫漿處理中形成自然縐摺結構 合圖式列舉 及其所能達 不為本創作 重疊而以車 該抹布2 0施 理中形成自 創作抹布2 0 易於組合施 ,但本創作 等化學物質 之刺激與傷 示為本創作 過程中自然 清潔抹除作 污雜質容置 一具體 成之功 之立體 縫線2 2 以脫漿 然縐摺 的各紗工,而 再經脫 的漿料 害,同 實施例,詳 能效益如后 分解示意圖 縫結組成一 處理,而使 、结構2 1 1者< 布層21,雖 先經一以漿 漿處理可將 清除乾淨, 時自然形成 細介紹本創 ’其係主要 複數紗布層 抹布2 0各紗 > 然在製造過 料處理成平 各紗布層2 1 而避免造成 凹凸的縐摺 之使用操作示意圖,本創作在 形成的縐摺結構21 1,可在一 業時,則其縐摺結構211的内 ’而迅速抹除完成清潔工作,M281590 3. Creation instructions (2) Better cleaning that can be erased naturally on the surface. Techniques to solve the problem To achieve the above, the sewing and combining pulp treatment is used to make the wiper. [Embodiment] For the rest, the structure content is made as shown in Fig. 2. The cloth is composed of several layers of gauze layers 2 1 and the cloth layer 21 at the desizing position. Residual pre-treatment residues containing fluorescent agents on the skin of consumers. As shown in FIG. 3, the rag 20 is desizing, and the dirty surface 30 is recessed. The concave space is just the dirty crease space for accommodating the dirt and impurities to achieve the cleaning effect. Means: For the purpose, this creation is mainly a rag with several gauze layers superimposed into a plurality of gauze layers, and the rag is then passed through each gauze layer to form a natural crepe structure in the desizing process. For the overlapping of the creation, the rag 20 is formed in the treatment. The self-creation rag 2 0 is easy to combine, but the stimuli and wounds of the chemical substances such as the creation are naturally cleaned during the creation process. The three-dimensional suture of the work is the desizing and creasing of each yarn worker, and then the desizing is harmed. With the same embodiment, the details can be as follows. 1 1 < Cloth layer 21, although it can be cleaned up by a pulp treatment first, it will naturally form a detailed introduction. This is the main multiple gauze layer wipes. 2 Each yarn > The gauze layer 2 1 is used to prevent the creases from causing unevenness. The crepe structure 21 1 formed in this creation can be quickly wiped to complete the cleaning when it is in the industry. For,

第6頁 丨Hi M281590 四、創作說明(3) 達到較佳清潔效果者。 如上所述本創作「抹布結構改良」,藉由脫漿處理清 除抹布内含有螢光劑等化學物質的漿料,又使抹布自然形 成縐摺結構,可避免造成消費者肌膚受到之刺激傷害,具 較佳的使用安全性,又以縐摺空間可迅速抹除髒污之較佳 清潔效果者。 綜上所述,當知本創作具有產業上利用性與進步性, 且本創作未見於任何刊物,亦具新穎性,當符合專利法之 規定,爰依法提出新型專利申請,懇請 貴審查委員惠准 φ專利為禱。Page 6 丨 Hi M281590 4. Creative Instructions (3) Those who achieve better cleaning results. As mentioned above, this work "improving the structure of the rag" removes the slurry containing chemical substances such as fluorescent agents in the rag through the desizing treatment, and naturally forms the crepe structure of the rag, which can avoid causing irritation and damage to the consumer's skin. Those who have better use safety and can use crease space to quickly remove dirt and better cleaning effect. In summary, when this creation is known to have industrial applicability and advancement, and this creation has not been seen in any publications, it is also novel. When it complies with the provisions of the Patent Law, a new patent application is filed in accordance with the law. The quasi-phi patent is a prayer.

第7頁 M281590 圖式簡單說明 【圖式簡單說明】 第1圖:係習式抹布之立體圖。 第2圖:係本創作之立體示意圖。 第3圖:係本創作之使用實施例平面示意圖。 【主要元件符號說明】 1 0、2 0 · . . ·抹布 1 1....縫線 1 2....布邊 21____紗布層 211____縐摺結構 22____車縫線 3 0 ·…髒污表面Page 7 M281590 Simple illustration of the drawing [Simplified illustration of the drawing] Figure 1: A perspective view of the rag of the custom type. Figure 2: This is a three-dimensional illustration of this creation. Figure 3: is a schematic plan view of the embodiment of the use of this creation. [Description of Symbols of Main Components] 1 0, 2 0 ·.. · Wipe 1 1 .... Sew thread 1 2 .... Fabric edge 21____ Gauze layer 211____ Crepe folding structure 22____ Sewing thread 3 0 ... Dirty surface

Claims (1)

M281590 五、申請專利範圍 1. 一種抹布結構改良,其係主要由數層脫漿的紗布層 重疊,而加以車縫成具有自然縐摺結構之抹布者。 2. 如申請專利範圍第1項所述之抹布結構改良,其中 ,抹布之縐摺結構係於脫漿過程中自然形成者。 圓圓圓M281590 5. Scope of patent application 1. An improvement in the structure of a rag, which consists of several layers of desizing gauze layered and stitched into a rag with a natural crease structure. 2. The improvement of the wiper structure described in item 1 of the scope of the patent application, wherein the crepe structure of the wiper is naturally formed during the desizing process. Round
TW94206665U 2005-04-27 2005-04-27 Improvement of cleaning rag structure TWM281590U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94206665U TWM281590U (en) 2005-04-27 2005-04-27 Improvement of cleaning rag structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94206665U TWM281590U (en) 2005-04-27 2005-04-27 Improvement of cleaning rag structure

Publications (1)

Publication Number Publication Date
TWM281590U true TWM281590U (en) 2005-12-01

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW94206665U TWM281590U (en) 2005-04-27 2005-04-27 Improvement of cleaning rag structure

Country Status (1)

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TW (1) TWM281590U (en)

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