TWM267623U - Point test structure improvement for chip after dicing - Google Patents
Point test structure improvement for chip after dicing Download PDFInfo
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- TWM267623U TWM267623U TW93211411U TW93211411U TWM267623U TW M267623 U TWM267623 U TW M267623U TW 93211411 U TW93211411 U TW 93211411U TW 93211411 U TW93211411 U TW 93211411U TW M267623 U TWM267623 U TW M267623U
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M267623 四、創作說明α) 【新型所屬之技術領域】 本創作係關於一種「切割後晶粒點測結構改良」,尤 指一種晶粒點測的同時,進行誤差補償之晶粒點測結構創 作。 【先前技術】 按’習知晶圓之晶粒在切割之前均無問題,然而,經 過切割之後,晶圓上的晶粒大多會產生位移現象,造成後 續之點測偏位’甚至於離位,如此一來,便無法精確地檢 查出晶粒的精確度;M267623 IV. Creation Instructions α) [Technical Field to which the New Type belongs] This creation is about a "improvement of grain spot measurement structure after cutting", especially a kind of grain spot measurement structure creation that performs error compensation at the same time as grain spot measurement. . [Previous technology] According to 'the wafers of conventional wafers have no problems before dicing, however, after dicing, most of the crystals on the wafer will have a displacement phenomenon, which will cause subsequent spot measurement deviations' or even out of position. As a result, the accuracy of the crystal grains cannot be accurately checked;
而以往晶粒之測試機構,在作動時,時常因不能準確 且順暢的作動,尤其是切割後晶粒的相對位置會產生變 化,而失去產品的精準度,而因產品的品質下降,更致生 產效率無法提升,易生產出不良品;In the past, when the testing mechanism of the crystal grains was operated, they often failed to operate accurately and smoothly, especially the relative position of the crystal grains after cutting would change, and the accuracy of the product was lost. The production efficiency cannot be improved, and it is easy to produce defective products;
所以針對前述習知之問題,即有業者創作出一種晶粒 點測方式,請配合參閱第三圖及第四圖所示,其係先利用 攝影鏡頭6 0將晶圓8 〇掃描定位之後,使晶圓8 〇進入 點測區,再利用積分球7 〇進行點測晶圓8 〇上之晶粒點 測,雖然,其具有晶粒點測之效果,但是如此之操作方式 需經過兩次的操作,不僅麻煩、不便,且亦影響整體之大 量生產操作’再者,.該等操作模式無法同步進行誤差的補 償,使之無法即時作到誤差補正之效果,故其之精確度仍 然極為有限;是故,睽諸前述習用切割後晶粒點測方式之 缺失,實有將之作進一步改良之必要。 本創作人有鑑於目前習用晶粒點測方式仍有改進的地Therefore, in response to the aforementioned conventional problem, an industry has created a method for spot measurement of grains. Please refer to Figures 3 and 4 for reference. This is to first use a photographic lens 60 to scan and position a wafer 80, and then The wafer 80 enters the spot measurement area, and then uses the integrating sphere 70 to perform spot measurement on the wafer 80. Although it has the effect of spot measurement, this operation method needs to go through twice. The operation is not only cumbersome and inconvenient, but also affects the overall mass production operation. Moreover, these operation modes cannot perform error compensation synchronously, making it impossible to make immediate effect of error correction, so its accuracy is still extremely limited. Therefore, due to the lack of the conventional method of spot measurement after the conventional cutting, it is necessary to further improve it. In view of the fact that the current conventional grain spotting method still has an improvement
M267623M267623
四、創作說明(2)Fourth, creation instructions (2)
次改良測試後,終於創造出— 統相關設備的多年產銷經驗, ’深思改善的方法,在經過多 一種切割後晶粒點測結構改 良。 【新型内容】 緣此’本創作之主要目的係在於提供一種點測晶粒的 同時,可同步監看點測區之影像,進而達到即時補償誤差 之目的之切割後晶粒點測結構改良。 為了達到上述目的,本創作提出了一種切割後晶粒點 測結構改良,其具有一底座,該底座之底面固設一探針模 組’且該底座之頂面設有一固定座,該固定座固設一攝影 機’該攝影機具有一顯微鏡頭; 另該底座與該固定座之間固設一積分球,該積分球之 頂面設有一開孔部,該開孔部係與該顯微鏡頭呈同一袖 有利的是,該開孔部概呈倒錐狀。 以下茲配合本創作較佳實施例之圖式進一步說明如下 ,以期能使熟悉本創作相關技術之人士,得依本說明書之 陳述據以實施。 【實施方式】 首先,請配合參閱第一圖及第二圖所示,本創作為一 種切割後晶粒點測結構改良,其具有一底座1 〇,該底座 1 0之底面固設一探針模組2 0 ’且該底座1 〇之頂面設 有一固定座1 1,該固定座1 1固設一攝影機3 0,該攝After the second improvement test, we have finally created—many years of experience in production and sales of related equipment. ’Thinking about the improvement method, the structure of the spot measurement of the grain is improved after one more cut. [New content] For this reason, the main purpose of this creation is to provide a kind of spot measurement of grains, while simultaneously monitoring the image of the spot measurement area, so as to achieve the purpose of real-time compensation for the improvement of the structure of the grain measurement after cutting. In order to achieve the above purpose, the present invention proposes an improved grain spotting structure after cutting, which has a base, a probe module is fixed on the bottom surface of the base, and a fixing base is provided on the top surface of the base. A camera is fixed; the camera has a microscope head; an integrating sphere is fixed between the base and the fixed base; an opening portion is provided on the top surface of the integrating sphere, and the opening portion is the same as the microscope head. The sleeve is advantageous in that the opening portion is approximately inversely tapered. The following is further explained in conjunction with the drawings of the preferred embodiment of this creation in order to enable persons familiar with the relevant technology of this creation to implement it in accordance with the statements in this specification. [Embodiment] First, please refer to the first figure and the second figure. This creation is an improved structure of spot measurement after cutting, which has a base 10, and a probe is fixed on the bottom surface of the base 10. The module 2 0 ′ is provided with a fixed base 11 on the top surface of the base 10. The fixed base 11 is fixed with a camera 30.
第6頁 M267623Page 6 M267623
影機3 0具有一顯微鏡頭3 i ; 另該底座10與該固定座1 1之間固設一積分球4 0,該積分球4 0之頂面設有一概呈倒錐狀之開孔部4 1,該開孔部4 1係與該顯微鏡頭3 i呈同一轴線(如第 一圖及第二圖所示)。 一般之晶粒在切割前均無問題,然而切割後通常晶粒 會略微產生位移,造成點測偏位甚至離位的現象,因此就 無法精確地檢査晶粒的精確度; 而藉由本創作以上之組合構成,請續配合參閱第一圖 及第二圖所示,本創作係利用積分球4 〇在晶圓5 〇之晶 粒切割後’重新尋找新定位,定出其單一 iXY轴座標值, 同時,由於積分球4 0頂面具有一開孔部4 1,可利用攝 影機3 0之顔微鏡頭3 1將座標值傳至系統内,使之直接 移動晶圓5 0 ’並落於準確之探針模组2 〇的測試位置, 據此’以完成檢測及誤差補償之工作,整體之操作方式簡 單方便; 由於本創作係於晶粒切割後,可同步利用顯微鏡頭3 1檢查晶粒之位置’並補償其之偏差,以完成正確之點測 位置,使之作動順暢穩定,提高生產精準度,並確保產品 之品質,進而增加生產量,極具實用性者。 綜上所述,本創作切割後晶粒點測結構改良,不僅在 點測晶粒的同時,可同步監看點測區之影像,進而即時補 償誤差,且有效地改善習知所存在的種種缺點,且本創作 之主要技術手段並未見於任何相關之刊物中,誠符合新型The projector 30 has a microscope head 3 i; in addition, an integrating sphere 40 is fixed between the base 10 and the fixed base 11, and an approximately cone-shaped opening portion is provided on the top surface of the integrating sphere 40. 41. The opening 41 is in the same axis as the microscope head 3 i (as shown in the first and second figures). Generally, the grains are fine before cutting. However, after the cutting, the grains usually shift slightly, causing the phenomenon of spot deviation or even dislocation. Therefore, it is impossible to accurately check the accuracy of the grains. The combined composition, please continue to refer to the first and second figures, this creation is using the integrating sphere 4 〇 after the wafer 50 dicing of the wafer 're-search for a new positioning, determine its single iXY axis coordinate value At the same time, since the top surface of the integrating sphere 40 has an opening 41, the camera can use the micro lens 31 of the camera 30 to transmit the coordinate values into the system, so that it can directly move the wafer 50 'and fall on the accurate The test position of the probe module 2 0 is based on this to complete the work of detection and error compensation. The overall operation method is simple and convenient; since this creation is based on the die cutting, the microscope head 31 can be used to check the die simultaneously. Position 'and compensate for its deviation, in order to complete the correct spot measurement position, make it operate smoothly and stably, improve production accuracy, and ensure the quality of the product, thereby increasing the production volume, which is extremely practical. To sum up, the structure of the spot measurement of the grain after cutting is improved. Not only the spot measurement of the grains, but also the image of the spot measurement area can be monitored synchronously, and the errors can be compensated in real time, and all kinds of existing knowledge can be effectively improved. Disadvantages, and the main technical means of this creation have not been found in any related publications, which is in line with the new
第7頁 M267623 四、創作說明(4) 專利之申請要件,爰依法提出申請,懇請 鈞局賜准本創 作專利權。Page 7 M267623 IV. Creation Instructions (4) The application requirements of the patent shall be filed in accordance with the law.
第8頁 M267623 圖式簡單說明 【圖示簡單說明】 第一圖係本創作之組合侧面示意圖。 第二圖係本創作之實施例晶粒點測示意圖。 第三圖係習用之組合侧面示意圖。Page 8 M267623 Simple illustration of the diagram [Simplified illustration of the diagram] The first picture is a schematic side view of the composition of this creation. The second figure is a schematic diagram of spot measurement of the embodiment of this creation. The third figure is a schematic side view of a conventional combination.
第 四圖 係 習 用 之實施例晶粒點 測 不意 圖。 [ 主要 元 件 符 號說明: I ( 本創 作 部 分 ) 底 座1 0 固 定 座1 1 探針模 組 2 0 攝 影機 3 0 顯 微 鏡頭 3 1 積 分球 4 0 開 孔 部4 1 晶 圓5 0 ( 習用 部 分 ) 攝 影鏡 頭 6 0 積 分球 7 0 晶 圓8 0The fourth figure is a conventional example of unintended grain spot measurement. [Explanation of main component symbols: I (this creative part) base 1 0 fixed base 1 1 probe module 2 0 camera 3 0 microscope head 3 1 integrating sphere 4 0 opening 4 4 wafer 5 0 (conventional part) photography Lens 6 0 Integrating sphere 7 0 Wafer 8 0
第9頁Page 9
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TW93211411U TWM267623U (en) | 2004-07-20 | 2004-07-20 | Point test structure improvement for chip after dicing |
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TW93211411U TWM267623U (en) | 2004-07-20 | 2004-07-20 | Point test structure improvement for chip after dicing |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN109297986A (en) * | 2018-11-05 | 2019-02-01 | 西安工业大学 | Laser gyro high reflection mirror beauty defects parameter characterization device and detection method |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN109297986A (en) * | 2018-11-05 | 2019-02-01 | 西安工业大学 | Laser gyro high reflection mirror beauty defects parameter characterization device and detection method |
CN109297986B (en) * | 2018-11-05 | 2023-02-24 | 西安工业大学 | Laser gyroscope high reflector surface defect parameter characterization device and detection method |
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