TWI847986B - Reinforcement film - Google Patents

Reinforcement film Download PDF

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TWI847986B
TWI847986B TW108122529A TW108122529A TWI847986B TW I847986 B TWI847986 B TW I847986B TW 108122529 A TW108122529 A TW 108122529A TW 108122529 A TW108122529 A TW 108122529A TW I847986 B TWI847986 B TW I847986B
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adhesive layer
film
weight
reinforcing film
photocuring
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TW108122529A
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TW202000830A (en
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仲野武史
片岡賢一
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日商日東電工股份有限公司
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Abstract

本發明之補強膜(10)具備固著積層於膜基材(1)之一主面上之黏著劑層(2)。黏著劑層包含含有基礎聚合物、光硬化劑、光自由基起始劑、及抗氧化劑之光硬化性組合物,且相對於基礎聚合物100重量份包含光硬化劑10~50重量份、光自由基起始劑0.01~1重量份、抗氧化劑0.01~2重量份。本發明之補強膜可任意地設定與被黏著體之貼合後至接著力提昇前之時間。The reinforcing film (10) of the present invention has an adhesive layer (2) fixedly laminated on one main surface of the film substrate (1). The adhesive layer comprises a photocurable composition containing a base polymer, a photocuring agent, a photoradical initiator, and an antioxidant, and the adhesive layer comprises 10 to 50 parts by weight of the photocuring agent, 0.01 to 1 part by weight of the photoradical initiator, and 0.01 to 2 parts by weight of the antioxidant relative to 100 parts by weight of the base polymer. The reinforcing film of the present invention can arbitrarily set the time from the bonding with the adherend to the enhanced bonding strength.

Description

補強膜Reinforcement film

本發明係關於一種黏貼設置於裝置表面之補強膜。The present invention relates to a reinforcing film which is pasted on the surface of a device.

於顯示器等光學裝置或電子裝置之表面,存在為了表面保護或耐衝擊性賦予等而貼合黏著性膜之情況。此種黏著性膜通常係於膜基材之主面固著積層黏著劑層,且經由該黏著劑層貼合於裝置表面。An adhesive film is sometimes attached to the surface of an optical device or electronic device such as a display for the purpose of surface protection or impact resistance. Such an adhesive film is usually formed by a laminate of an adhesive layer fixed on the main surface of a film substrate and attached to the device surface via the adhesive layer.

於裝置之組裝、加工、輸送等使用前之狀態下,可藉由於裝置或裝置構成零件之表面暫黏黏著性膜而抑制被黏著體之損傷或破損。如此為了暫時性地保護表面而暫黏之黏著性膜可容易地自被黏著體剝離,且不產生向被黏著體之糊劑殘留。Before the device is assembled, processed, transported, etc., it is possible to temporarily adhere an adhesive film to the surface of the device or its components to prevent damage or destruction of the adherend. The adhesive film temporarily adhered to temporarily protect the surface can be easily peeled off from the adherend without leaving any adhesive residue on the adherend.

於專利文獻1中揭示有一種黏著性膜,其除裝置之組裝、加工、輸送等以外,於裝置之使用時亦於貼合於裝置表面不變之狀態下使用。此種黏著性膜由於表面保護、以及對裝置之衝擊之分散、對撓性裝置之剛性賦予等而具有對裝置進行補強之功能。Patent document 1 discloses an adhesive film which is used for assembly, processing, transportation, etc. of a device and is also used in a state of being adhered to the surface of the device when the device is used. This adhesive film has the function of reinforcing the device by protecting the surface, dispersing the impact of the device, and imparting rigidity to the flexible device.

於將黏著性膜貼合於被黏著體時,存在產生氣泡之混入或黏貼位置之偏移等貼合不良之情況。於產生貼合不良之情形時,進行如下作業(二次加工):自被黏著體將黏著性膜剝離並貼合另一黏著性膜。用作工程材料之黏著性膜由於係以自被黏著體之剝離為前提進行設計,因此容易二次加工。另一方面,以永久接著為前提之補強膜一般而言不假定自裝置剝離而是牢固地接著於裝置之表面,因此難以二次加工。When an adhesive film is attached to an adherend, there is a possibility of poor attachment, such as bubbles being mixed in or the attachment position being offset. When poor attachment occurs, the following operation (secondary processing) is performed: the adhesive film is peeled off from the adherend and another adhesive film is attached. Adhesive films used as engineering materials are designed based on the premise of peeling off from the adherend, so they are easy to process secondary. On the other hand, reinforcing films based on permanent attachment are generally not assumed to be peeled off from the device but are firmly attached to the surface of the device, so they are difficult to process secondary.

專利文獻2中揭示有一種以剛與被黏著體貼合後為低黏著性且接著力經時性地上升之方式而設計的黏著片(黏著劑層)。於膜基材上固著積層有此種黏著劑層之黏著性膜由於剛與被黏著體貼合後容易自被黏著體剝離且於經過特定時間後牢固地接著於被黏著體,因此可作為具有二次加工性之補強膜而利用。 [先前技術文獻] [專利文獻]Patent document 2 discloses an adhesive sheet (adhesive layer) designed to have low adhesion immediately after being bonded to an adherend and to increase adhesion over time. The adhesive film having such an adhesive layer fixedly laminated on a film substrate can be easily peeled off from the adherend immediately after being bonded to the adherend and can be firmly bonded to the adherend after a certain period of time, so it can be used as a reinforcing film with secondary processability. [Prior technical document] [Patent document]

[專利文獻1]日本專利特開2017-132977號公報 [專利文獻2]WO2015/163115號說明書[Patent document 1] Japanese Patent Publication No. 2017-132977 [Patent document 2] WO2015/163115 Specification

[發明所欲解決之問題][The problem the invention is trying to solve]

關於與被黏著體之接著力經時性地變化之補強膜,很難說對步驟之準備時間(lead time)之靈活性是充分的。例如,接著力經時性地上升之具備黏著劑層之補強膜必須於與被黏著體之貼合後至接著力上升之前之特定時間內實施貼合狀態之檢查及二次加工。又,於在裝置或裝置零件之整個面貼合補強膜之後進行自一部分區域將補強膜去除等加工之情形時,必須於接著力上升之前之期間進行加工。Regarding the reinforcing film whose adhesion to the adherend changes over time, it is difficult to say that the flexibility of the lead time of the step is sufficient. For example, the reinforcing film with an adhesive layer whose adhesion increases over time must be inspected and processed for adhesion status within a specific time after bonding to the adherend and before the adhesion increases. In addition, when the reinforcing film is removed from a part of the device or device part after the reinforcing film is bonded to the entire surface, the processing must be performed before the adhesion increases.

鑒於上述情況,本發明之目的在於提供一種剛與被黏著體貼合後容易二次加工、可任意地設定與被黏著體之貼合後至接著力提昇前之時間、且藉由接著力提昇可與被黏著體牢固地接著的補強膜。 [解決問題之技術手段]In view of the above situation, the purpose of the present invention is to provide a reinforcing film that is easy to process after being bonded to an adherend, can arbitrarily set the time from bonding to the adhesion enhancement, and can be firmly bonded to the adherend by enhancing the adhesion. [Technical means to solve the problem]

本發明之補強膜具備固著積層於膜基材之一主面上之黏著劑層。黏著劑層包含含有基礎聚合物、光硬化劑、光自由基起始劑及抗氧化劑之光硬化性組合物。構成黏著劑層之光硬化性組合物較佳為相對於基礎聚合物100重量份包含光硬化劑10~50重量份、光自由基起始劑0.01~1重量份、抗氧化劑0.01~2重量份。光硬化性組合物中之抗氧化劑之含量較佳為光自由基起始劑之含量之0.2~5倍。The reinforcing film of the present invention has an adhesive layer fixedly laminated on one main surface of the film substrate. The adhesive layer includes a photocurable composition containing a base polymer, a photocuring agent, a photoradical initiator, and an antioxidant. The photocurable composition constituting the adhesive layer preferably includes 10 to 50 parts by weight of the photocuring agent, 0.01 to 1 part by weight of the photoradical initiator, and 0.01 to 2 parts by weight of the antioxidant relative to 100 parts by weight of the base polymer. The content of the antioxidant in the photocurable composition is preferably 0.2 to 5 times the content of the photoradical initiator.

就抑制由螢光燈等之光引起自光自由基起始劑生成自由基之觀點而言,作為光自由基起始劑,可較佳地使用於波長310 nm~355 nm之範圍具有吸收極大且於長於360 nm之波長不顯示吸收極大者。From the viewpoint of inhibiting the generation of free radicals from the photoradical initiator by light of a fluorescent lamp or the like, it is preferable to use a photoradical initiator that has an absorption maximum in the wavelength range of 310 nm to 355 nm and does not show an absorption maximum at a wavelength longer than 360 nm.

作為黏著劑層之基礎聚合物,例如可使用丙烯酸系聚合物。丙烯酸系聚合物較佳為含有均聚物之玻璃轉移溫度為40℃以上之單體成分5~50重量%。As the base polymer of the adhesive layer, for example, an acrylic polymer can be used. The acrylic polymer preferably contains 5 to 50% by weight of a monomer component having a glass transition temperature of 40° C. or higher as a homopolymer.

黏著劑層之基礎聚合物中較佳為導入有交聯結構。例如,基礎聚合物含有含羥基單體及/或含羧基單體作為單體單元,且藉由多官能異氰酸酯化合物或多官能環氧化合物等交聯劑與該等之官能基鍵結而被導入交聯結構。The base polymer of the adhesive layer preferably has a cross-linked structure introduced therein. For example, the base polymer contains hydroxyl-containing monomers and/or carboxyl-containing monomers as monomer units, and the cross-linked structure is introduced by bonding a cross-linking agent such as a multifunctional isocyanate compound or a multifunctional epoxy compound to the functional groups thereof.

黏著劑層之光硬化劑例如為多官能(甲基)丙烯酸酯。光硬化劑之官能基當量較佳為100~500 g/eq左右。The photocuring agent of the adhesive layer is, for example, a multifunctional (meth)acrylate, and the functional group equivalent of the photocuring agent is preferably about 100 to 500 g/eq.

補強膜較佳為與聚醯亞胺膜之接著力為0.005~5 N/25 mm。於使黏著劑層光硬化後,較佳為補強膜與聚醯亞胺膜之接著力為6 N/25 mm以上。 [發明之效果]The reinforcement film preferably has a bonding strength of 0.005 to 5 N/25 mm with the polyimide film. After the adhesive layer is photocured, the bonding strength of the reinforcement film with the polyimide film is preferably 6 N/25 mm or more. [Effect of the invention]

本發明之補強膜係藉由使黏著劑層包含光硬化性組合物且於與被黏著體之接著後使黏著劑層進行光硬化,而使與被黏著體之接著力上升。由於光硬化前與被黏著體之接著力較小,因此容易二次加工,且由於光硬化後會表現出較高之接著力,因此有助於裝置之補強及可靠性之提昇。光硬化性之黏著劑可任意地設定與被黏著體貼合後之硬化之時點。又,黏著劑組合物藉由除了基礎聚合物、光硬化劑及光自由基起始劑以外含有抗氧化劑,從而抑制保管環境下之起因於螢光燈等之光之光硬化反應。因此,於與被黏著體貼合前、及與被黏著體貼合後且光硬化前之狀態下,補強膜能夠長時間保管。因此,本發明之補強膜具有可靈活地應對步驟之準備時間之優勢。The reinforcing film of the present invention increases the adhesion to the adherend by making the adhesive layer contain a photocurable composition and photocuring the adhesive layer after bonding to the adherend. Since the adhesion to the adherend is small before photocuring, secondary processing is easy, and since a higher adhesion is exhibited after photocuring, it helps to reinforce the device and improve reliability. The photocurable adhesive can arbitrarily set the curing time after bonding to the adherend. In addition, the adhesive composition contains an antioxidant in addition to the base polymer, the photocuring agent and the photoradical initiator, thereby suppressing the photocuring reaction caused by light such as fluorescent lamps in the storage environment. Therefore, the reinforcing film can be stored for a long time before being attached to the adherend and before being light-cured after being attached to the adherend. Therefore, the reinforcing film of the present invention has the advantage of being able to flexibly cope with the preparation time of the steps.

圖1係表示補強膜之一實施形態之剖視圖。補強膜10於膜基材1之一主面上具備黏著劑層2。黏著劑層2固著積層於基材膜1之一主面上。黏著劑層2係包含光硬化性組合物之光硬化性黏著劑,且藉由紫外線等活性光線之照射進行硬化,從而與被黏著體之接著力上升。FIG1 is a cross-sectional view showing an embodiment of a reinforcing film. The reinforcing film 10 has an adhesive layer 2 on one main surface of a film substrate 1. The adhesive layer 2 is fixedly laminated on one main surface of the substrate film 1. The adhesive layer 2 is a photocurable adhesive containing a photocurable composition, and is cured by irradiation with active light such as ultraviolet rays, thereby increasing the bonding strength with the adherend.

圖2係於黏著劑層2之主面上暫黏有隔離件5之補強膜之剖視圖。圖3係表示於裝置20之表面黏貼設置有補強膜10之狀態之剖視圖。Fig. 2 is a cross-sectional view showing a reinforcing film with a separator 5 temporarily adhered to the main surface of the adhesive layer 2. Fig. 3 is a cross-sectional view showing a state where a reinforcing film 10 is adhered and provided on the surface of a device 20.

自黏著劑層2之表面將隔離件5剝離去除,將黏著劑層2之露出面貼合於裝置20之表面,藉此於裝置20之表面黏貼設置補強膜10。該狀態係黏著劑層2為光硬化前且於裝置20上暫黏有補強膜10(黏著劑層2)之狀態。藉由使黏著劑層2進行光硬化,而使於裝置20與黏著劑層2之界面之接著力上升,使裝置20與補強膜10固著。The spacer 5 is peeled off from the surface of the adhesive layer 2, and the exposed surface of the adhesive layer 2 is attached to the surface of the device 20, thereby attaching the reinforcing film 10 to the surface of the device 20. This state is a state where the adhesive layer 2 is before light curing and the reinforcing film 10 (adhesive layer 2) is temporarily attached to the device 20. By light curing the adhesive layer 2, the bonding force at the interface between the device 20 and the adhesive layer 2 is increased, so that the device 20 and the reinforcing film 10 are fixed.

所謂「固著」,係指所積層之2層牢固地接著、不可能或難以於兩者之界面剝離之狀態。所謂「暫黏」,係指所積層之2層間之接著力較小、可容易地於兩者之界面剝離之狀態。The so-called "fixed" refers to the state where two layers of the stack are firmly attached and it is impossible or difficult to peel them off at the interface. The so-called "tentative adhesion" refers to the state where the adhesion between two layers of the stack is relatively small and they can be easily peeled off at the interface.

圖2所示之補強膜中,膜基材1與黏著劑層2固著,且隔離件5暫黏於黏著劑層2。若將膜基材1與隔離件5進行剝離,則於黏著劑層2與隔離件5之界面產生剝離,維持膜基材1上固著有黏著劑層2之狀態。於剝離後之隔離件5上不會殘存黏著劑。In the reinforcement film shown in FIG2 , the film substrate 1 and the adhesive layer 2 are fixed, and the separator 5 is temporarily adhered to the adhesive layer 2. If the film substrate 1 and the separator 5 are peeled off, peeling occurs at the interface between the adhesive layer 2 and the separator 5, and the state in which the adhesive layer 2 is fixed on the film substrate 1 is maintained. No adhesive remains on the separator 5 after peeling.

圖3所示之黏貼設置有補強膜10之裝置於黏著劑層2之光硬化前,裝置20與黏著劑層2為暫黏狀態。若對膜基材1與裝置20進行剝離,則於黏著劑層2與裝置20之界面產生剝離,維持膜基材1上固著有黏著劑層2之狀態。由於在裝置20上不會殘存黏著劑,故而容易二次加工。於使黏著劑層2光硬化後,由於黏著劑層2與裝置20之接著力上升,故而難以自裝置20剝離膜1,若將兩者剝離,則存在產生黏著劑層2之凝集破壞之情況。In the device with the reinforcement film 10 attached as shown in FIG. 3, before the light curing of the adhesive layer 2, the device 20 and the adhesive layer 2 are temporarily adhered. If the film substrate 1 and the device 20 are peeled off, peeling occurs at the interface between the adhesive layer 2 and the device 20, and the state of the adhesive layer 2 being fixed on the film substrate 1 is maintained. Since no adhesive remains on the device 20, secondary processing is easy. After the adhesive layer 2 is light cured, since the adhesion between the adhesive layer 2 and the device 20 increases, it is difficult to peel the film 1 from the device 20. If the two are peeled off, there is a possibility that the cohesion of the adhesive layer 2 will be destroyed.

[膜基材] 作為膜基材1,使用塑膠膜。為了使膜基材1及黏著劑層2固著,較佳為膜基材1之附設黏著劑層2之面未實施過脫模處理。[Film substrate] A plastic film is used as the film substrate 1. In order to fix the film substrate 1 and the adhesive layer 2, it is preferred that the surface of the film substrate 1 to which the adhesive layer 2 is attached is not subjected to mold release treatment.

膜基材之厚度例如為4~500 μm左右。就藉由剛性賦予或衝擊緩和等對裝置進行補強之觀點而言,膜基材1之厚度較佳為20 μm以上,更佳為30 μm以上,進而較佳為45 μm以上。就使補強膜具有可撓性從而提高操作性之觀點而言,膜基材1之厚度較佳為300 μm以下,更佳為200 μm以下。就兼顧機械強度及可撓性之觀點而言,膜基材1之壓縮強度較佳為100~3000 kg/cm2 ,更佳為200~2900 kg/cm2 ,進而較佳為300~2800 kg/cm2 ,尤佳為400~2700 kg/cm2The thickness of the film substrate is, for example, about 4 to 500 μm. From the perspective of reinforcing the device by imparting rigidity or shock mitigation, the thickness of the film substrate 1 is preferably 20 μm or more, more preferably 30 μm or more, and further preferably 45 μm or more. From the perspective of making the reinforcing film flexible and thus improving operability, the thickness of the film substrate 1 is preferably 300 μm or less, and more preferably 200 μm or less. From the perspective of both mechanical strength and flexibility, the compressive strength of the film substrate 1 is preferably 100-3000 kg/cm 2 , more preferably 200-2900 kg/cm 2 , further preferably 300-2800 kg/cm 2 , and particularly preferably 400-2700 kg/cm 2 .

作為構成膜基材1之塑膠材料,可列舉聚酯系樹脂、聚烯烴系樹脂、環狀聚烯烴系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂等。於顯示器等光學裝置用之補強膜中,膜基材1較佳為透明膜。又,於自膜基材1側照射活性光線進行黏著劑層2之光硬化之情形時,膜基材1較佳為具有對黏著劑層之硬化所使用之活性光線之透明性。就兼備機械強度及透明性而言,可良好地使用聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯系樹脂。於自被黏著體側照射活性光線之情形時,被黏著體具有對活性光線之透明性即可,膜基材1對活性光線可不透明。As the plastic material constituting the film substrate 1, polyester resins, polyolefin resins, cyclic polyolefin resins, polyamide resins, polyimide resins, etc. can be listed. In the reinforcing film for optical devices such as displays, the film substrate 1 is preferably a transparent film. In addition, when the adhesive layer 2 is photocured by irradiating active light from the side of the film substrate 1, the film substrate 1 is preferably transparent to the active light used for curing the adhesive layer. In terms of both mechanical strength and transparency, polyester resins such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate can be used well. When the active light is irradiated from the adherend side, the adherend only needs to be transparent to the active light, and the film substrate 1 may not be transparent to the active light.

於膜基材1之表面亦可設置易接著層、易滑層、脫模層、抗靜電層、硬塗層、抗反射層等功能性塗層。再者,如上所述,為了使膜基材1及黏著劑層2固著,於膜基材1之附設黏著劑層2之面較佳為未設置脫模層。Functional coatings such as an easy-adhesion layer, an easy-slip layer, a release layer, an antistatic layer, a hard coating layer, and an antireflection layer may also be provided on the surface of the film substrate 1. Furthermore, as described above, in order to allow the film substrate 1 and the adhesive layer 2 to be fixed, it is preferred that the release layer is not provided on the surface of the film substrate 1 to which the adhesive layer 2 is attached.

[黏著劑層] 固著積層於膜基材1上之黏著劑層2係包含基礎聚合物、光硬化劑及光自由基起始劑之光硬化性組合物。於補強膜用於顯示器等光學裝置之情形時,黏著劑層2之全光線透過率較佳為80%以上,更佳為85%以上,進而較佳為90%以上。黏著劑層2之霧度較佳為2%以下,更佳為1%以下,進而較佳為0.7%以下,尤佳為0.5%以下。[Adhesive layer] The adhesive layer 2 fixedly laminated on the film substrate 1 is a photocurable composition comprising a base polymer, a photocuring agent, and a photoradical initiator. When the reinforcing film is used in an optical device such as a display, the total light transmittance of the adhesive layer 2 is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more. The haze of the adhesive layer 2 is preferably 2% or less, more preferably 1% or less, further preferably 0.7% or less, and particularly preferably 0.5% or less.

黏著劑層2由於光硬化前與被黏著體之接著力較小,故而容易二次加工。若對黏著劑層2照射紫外線等活性光線,則自光自由基起始劑生成自由基,藉由光硬化劑之自由基聚合反應(光硬化)而提昇與被黏著體之接著力。因此,於使用裝置時,補強膜不易自裝置表面剝離,接著可靠性優異。Since the adhesive layer 2 has a weak adhesion to the adherend before light curing, it is easy to perform secondary processing. If the adhesive layer 2 is irradiated with active light such as ultraviolet rays, free radicals are generated from the photo radical initiator, and the adhesion to the adherend is improved through the free radical polymerization reaction (light curing) of the light curing agent. Therefore, when the device is used, the reinforcement film is not easy to peel off from the device surface, and the adhesion reliability is excellent.

光硬化性之黏著劑藉由紫外線等之照射進行硬化。因此,包含光硬化性之黏著劑組合物之黏著劑層2具有可任意地設定硬化之時點、可靈活地應對步驟之準備時間等之優勢。另一方面,於補強膜之使用前、或將補強膜與被黏著體貼合後進行光硬化前之狀態下,存在因保管環境中之來自螢光燈等之光而自光自由基起始劑生成自由基之情況。Photocurable adhesives are cured by irradiation with ultraviolet rays or the like. Therefore, the adhesive layer 2 comprising a photocurable adhesive composition has the advantage that the curing time can be set arbitrarily and the preparation time of the steps can be flexibly coped with. On the other hand, before the use of the reinforcing film or before the light curing after the reinforcing film is attached to the adherend, there is a possibility that free radicals are generated from the photo-radical initiator due to light from fluorescent lamps or the like in the storage environment.

由於由螢光燈等之光引起之自由基之生成量充分地小於由光硬化時之紫外線照射引起之自由基生成量,因此即便於螢光燈下短時間放置,亦幾乎不會進行光硬化反應。然而,若將補強膜於螢光燈下長時間保管,則存在因螢光燈之光而自光自由基起始劑生成之自由基之累計量變大,其影響不可忽視之情況。具體而言,存在因自光自由基起始劑生成之自由基而進行光硬化劑之聚合,黏著劑之接著力上升,補強膜難以自被黏著體剝離之情況。又,存在起因於因長時間之保管引起之光自由基起始劑之失活,即便照射紫外線亦不會進行光硬化,接著力不會上升之情況。Since the amount of free radicals generated by light from fluorescent lamps is much smaller than the amount of free radicals generated by ultraviolet irradiation during photocuring, even if the film is left under fluorescent lamps for a short time, the photocuring reaction will hardly proceed. However, if the reinforcing film is kept under fluorescent lamps for a long time, the cumulative amount of free radicals generated from the photoradical initiator due to the light of the fluorescent lamp may increase, and its influence cannot be ignored. Specifically, the photocuring agent may polymerize due to the free radicals generated from the photoradical initiator, and the adhesive force of the adhesive may increase, making it difficult for the reinforcing film to be peeled off from the adherend. In addition, due to the deactivation of the photo-radical initiator caused by long-term storage, photocuring may not proceed even if irradiated with ultraviolet rays, and the bonding strength may not increase.

關於本發明之補強膜,構成黏著劑層2之光硬化性組合物除基礎聚合物、光硬化劑及光自由基起始劑以外,包含抗氧化劑。藉由將光自由基起始劑與抗氧化劑並用,即便於將補強膜於螢光燈下長時間保管之情形時,接著力之變化亦較小,且於光照射時能夠適當地使接著力上升。In the reinforcing film of the present invention, the photocurable composition constituting the adhesive layer 2 contains an antioxidant in addition to the base polymer, the photocuring agent and the photoradical initiator. By using the photoradical initiator and the antioxidant together, even when the reinforcing film is stored under a fluorescent lamp for a long time, the change in the adhesive force is small, and the adhesive force can be appropriately increased when irradiated with light.

<黏著劑之組成> 以下,針對構成光硬化性組合物之基礎聚合物、光硬化劑、光自由基起始劑及抗氧化劑之各者,依序說明較佳之形態。<Composition of Adhesive> The following describes the preferred forms of the base polymer, photocuring agent, photoradical initiator, and antioxidant that constitute the photocurable composition.

(基礎聚合物) 基礎聚合物係黏著劑組合物之主構成成分。基礎聚合物之種類並無特別限定,適當地選擇丙烯酸系聚合物、聚矽氧系聚合物、胺基甲酸酯系聚合物、橡膠系聚合物等即可。尤其是就光學透明性及接著性優異、且接著性之控制容易之方面而言,黏著劑組合物較佳為含有丙烯酸系聚合物作為基礎聚合物,且較佳為黏著劑組合物之50重量%以上為丙烯酸系聚合物。(Base polymer) The base polymer is the main component of the adhesive composition. The type of base polymer is not particularly limited, and an acrylic polymer, a silicone polymer, a urethane polymer, a rubber polymer, etc. can be appropriately selected. In particular, in terms of excellent optical transparency and adhesion, and easy control of adhesion, the adhesive composition preferably contains an acrylic polymer as the base polymer, and preferably more than 50% by weight of the adhesive composition is an acrylic polymer.

作為丙烯酸系聚合物,可較佳地使用包含(甲基)丙烯酸烷基酯作為主要單體成分者。再者,於本說明書中,「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。As the acrylic polymer, one containing an alkyl (meth)acrylate as a main monomer component can be preferably used. In addition, in this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid.

作為(甲基)丙烯酸烷基酯,可良好地使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。(甲基)丙烯酸烷基酯之烷基可為直鏈亦可具有支鏈。作為(甲基)丙烯酸烷基酯之例,可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸異三(十二烷基)酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸芳烷基酯等。As the alkyl (meth)acrylate, an alkyl (meth)acrylate having an alkyl group with a carbon number of 1 to 20 can be preferably used. The alkyl group of the alkyl (meth)acrylate may be a straight chain or may have a branched chain. Examples of the alkyl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, isopentyl (meth)acrylate, neopentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, 1,2-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1,1-dimethoxy-1 isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, isotridodecyl (meth)acrylate, tetradecyl (meth)acrylate, isotetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl (meth)acrylate, heptadecyl (meth)acrylate, octadecyl (meth)acrylate, isooctadecyl (meth)acrylate, nonadecyl (meth)acrylate, aralkyl (meth)acrylate, and the like.

關於(甲基)丙烯酸烷基酯之含量,相對於構成基礎聚合物之單體成分總量較佳為40重量%以上,更佳為50重量%以上,進而較佳為55重量%以上。The content of the alkyl (meth)acrylate is preferably 40% by weight or more, more preferably 50% by weight or more, and even more preferably 55% by weight or more, based on the total amount of monomer components constituting the base polymer.

丙烯酸系基礎聚合物較佳為含有具有可交聯之官能基之單體成分作為共聚成分。作為具有可交聯之官能基之單體,可列舉含羥基單體、或含羧基單體。基礎聚合物之羥基或羧基成為與後述交聯劑之反應點。例如,於使用異氰酸酯系交聯劑之情形時,較佳為含有含羥基單體作為基礎聚合物之共聚成分。於使用環氧系交聯劑之情形時,較佳為含有含羧基單體作為基礎聚合物之共聚成分。藉由於基礎聚合物中導入交聯結構,存在凝集力提昇,黏著劑層2之接著力提昇,並且二次加工時之於被黏著體之糊劑殘留減少的傾向。The acrylic base polymer preferably contains a monomer component having a crosslinkable functional group as a copolymer component. As the monomer having a crosslinkable functional group, a hydroxyl-containing monomer or a carboxyl-containing monomer can be listed. The hydroxyl group or carboxyl group of the base polymer becomes a reaction point with the crosslinking agent described below. For example, when an isocyanate crosslinking agent is used, it is preferred that the base polymer contains a hydroxyl-containing monomer as a copolymer component. When an epoxy crosslinking agent is used, it is preferred that the base polymer contains a carboxyl-containing monomer as a copolymer component. By introducing a cross-linked structure into the base polymer, the cohesive force is increased, the adhesion of the adhesive layer 2 is increased, and the amount of paste residue on the adherend during secondary processing tends to be reduced.

作為含羥基單體,可列舉(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、(甲基)丙烯酸4-(羥甲基)環己基甲酯等。作為含羧基單體,可列舉(甲基)丙烯酸、(甲基)丙烯酸2-羧基乙酯、(甲基)丙烯酸羧基戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸等。Examples of the hydroxyl group-containing monomer include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, and 4-(hydroxymethyl)cyclohexylmethyl (meth)acrylate. Examples of the carboxyl group-containing monomer include (meth)acrylic acid, 2-carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid.

關於丙烯酸系基礎聚合物,含羥基單體與含羧基單體之合計量相對於構成單體成分總量較佳為1~30重量%,更佳為3~25重量%,進而較佳為5~20重量%。尤佳為包含羥基之(甲基)丙烯酸酯之含量為上述範圍。Regarding the acrylic-based polymer, the total amount of the hydroxyl-containing monomer and the carboxyl-containing monomer is preferably 1 to 30% by weight, more preferably 3 to 25% by weight, and even more preferably 5 to 20% by weight relative to the total amount of the constituent monomer components. It is particularly preferred that the content of the (meth)acrylate containing a hydroxyl group is within the above range.

丙烯酸系基礎聚合物較佳為含有N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基𠰌啉、N-丙烯醯基𠰌啉、N-乙烯基羧酸醯胺類、N-乙烯基己內醯胺等含氮單體作為構成單體成分。含有含氮單體成分之丙烯酸系基礎聚合物由於在濕熱環境下表現出適度之吸水性且可抑制黏著劑之局部性吸水,因此有助於防止黏著劑層之局部性變白、局部膨潤、剝離等。The acrylic-based polymer preferably contains nitrogen-containing monomers such as N-vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperidone, vinylpyrrol, vinylimidazole, vinyloxazole, vinyloxaline, N-acryloyloxaline, N-vinylcarboxylic acid amides, and N-vinylcaprolactam as constituent monomer components. The acrylic-based polymer containing nitrogen-containing monomer components exhibits moderate water absorption in a humid and hot environment and can inhibit local water absorption of the adhesive, thereby helping to prevent local whitening, local swelling, and peeling of the adhesive layer.

關於丙烯酸系基礎聚合物,含氮單體之含量相對於構成單體成分總量較佳為1~30重量%,更佳為3~25重量%,進而較佳為5~20重量%。丙烯酸系基礎聚合物較佳為於上述範圍內含有N-乙烯基吡咯啶酮作為含氮單體。Regarding the acrylic base polymer, the content of the nitrogen-containing monomer is preferably 1 to 30 wt %, more preferably 3 to 25 wt %, and further preferably 5 to 20 wt % relative to the total amount of the constituent monomer components. The acrylic base polymer preferably contains N-vinyl pyrrolidone as the nitrogen-containing monomer within the above range.

於丙烯酸系基礎聚合物包含含羥基單體及含氮單體之兩者作為單體成分之情形時,存在可提高黏著劑之凝集力及透明性之傾向。關於丙烯酸系基礎聚合物,含羥基單體與含氮單體之合計量相對於構成單體成分總量較佳為5~50重量%,更佳為10~40重量%,進而較佳為15~35重量%。When the acrylic base polymer contains both a hydroxyl-containing monomer and a nitrogen-containing monomer as monomer components, the cohesive force and transparency of the adhesive tend to be improved. With respect to the acrylic base polymer, the total amount of the hydroxyl-containing monomer and the nitrogen-containing monomer is preferably 5 to 50% by weight, more preferably 10 to 40% by weight, and further preferably 15 to 35% by weight relative to the total amount of the constituent monomer components.

丙烯酸系基礎聚合物亦可包含除上述以外之單體成分。丙烯酸系基礎聚合物例如亦可包含含氰基單體、乙烯酯單體、芳香族乙烯基單體、含環氧基單體、乙烯醚單體、含磺基單體、含磷酸基單體、含酸酐基單體等作為單體成分。The acrylic-based polymer may also contain monomer components other than the above. For example, the acrylic-based polymer may also contain cyano-containing monomers, vinyl ester monomers, aromatic vinyl monomers, epoxy-containing monomers, vinyl ether monomers, sulfone-containing monomers, phosphoric acid-containing monomers, acid anhydride-containing monomers, etc. as monomer components.

光硬化前之黏著劑之接著特性容易受基礎聚合物之構成成分及分子量影響。有基礎聚合物之分子量越大則黏著劑變得越硬之傾向。丙烯酸系基礎聚合物之重量平均分子量較佳為10萬~500萬,更佳為30萬~300萬,進而較佳為50萬~200萬。再者,於向基礎聚合物中導入交聯結構之情形時,所謂基礎聚合物之分子量,係指交聯結構導入前之分子量。The bonding properties of the adhesive before light curing are easily affected by the composition and molecular weight of the base polymer. The larger the molecular weight of the base polymer, the harder the adhesive tends to become. The weight average molecular weight of the acrylic base polymer is preferably 100,000 to 5 million, more preferably 300,000 to 3 million, and even more preferably 500,000 to 2 million. Furthermore, when a cross-linking structure is introduced into the base polymer, the molecular weight of the base polymer refers to the molecular weight before the cross-linking structure is introduced.

有基礎聚合物之構成成分中之高Tg單體成分之含量越多則黏著劑變得越硬之傾向。再者,所謂高Tg單體,意指均聚物之玻璃轉移溫度(Tg)較高之單體。作為均聚物之Tg為40℃以上之單體,可列舉:甲基丙烯酸雙環戊酯(Tg:175℃)、丙烯酸雙環戊酯(Tg:120℃)、甲基丙烯酸異𦯉酯(Tg:173℃)、丙烯酸異𦯉酯(Tg:97℃)、甲基丙烯酸甲酯(Tg:105℃)、甲基丙烯酸1-金剛烷基酯(Tg:250℃)、丙烯酸1-金剛烷基酯(Tg:153℃)等(甲基)丙烯酸系單體;丙烯醯基𠰌啉(Tg:145℃)、二甲基丙烯醯胺(Tg:119℃)、二乙基丙烯醯胺(Tg:81℃)、二甲胺基丙基丙烯醯胺(Tg:134℃)、異丙基丙烯醯胺(Tg:134℃)、羥乙基丙烯醯胺(Tg:98℃)等含有醯胺基之乙烯基單體;N-乙烯基吡咯啶酮(Tg:54℃)等。The higher the content of high Tg monomer components in the constituent components of the base polymer, the harder the adhesive tends to become. Furthermore, the so-called high Tg monomer refers to a monomer with a higher glass transition temperature (Tg) of the homopolymer. Examples of monomers with a homopolymer Tg of 40°C or above include: dicyclopentyl methacrylate (Tg: 175°C), dicyclopentyl acrylate (Tg: 120°C), isobutyl methacrylate (Tg: 173°C), isobutyl acrylate (Tg: 97°C), methyl methacrylate (Tg: 105°C), 1-adamantyl methacrylate (Tg: 250°C), 1-adamantyl acrylate (Tg: 153 ℃) and other (meth) acrylic monomers; vinyl monomers containing amide groups such as acrylamide (Tg: 145℃), dimethylacrylamide (Tg: 119℃), diethylacrylamide (Tg: 81℃), dimethylaminopropylacrylamide (Tg: 134℃), isopropylacrylamide (Tg: 134℃), hydroxyethylacrylamide (Tg: 98℃); N-vinylpyrrolidone (Tg: 54℃), etc.

關於丙烯酸系基礎聚合物,均聚物之Tg為40℃以上之單體之含量相對於構成單體成分總量較佳為5~50重量%,更佳為10~40重量%。為了形成具有適度之硬度且二次加工性優異之黏著劑層,作為基礎聚合物之單體成分,較佳為包含均聚物之Tg為80℃以上之單體成分,更佳為包含均聚物之Tg為100℃以上之單體成分。關於丙烯酸系基礎聚合物,均聚物之Tg為100℃以上之單體之含量相對於構成單體成分總量較佳為0.1重量%以上,更佳為0.5重量%以上,進而較佳為1重量%以上,尤佳為3重量%以上。尤佳為甲基丙烯酸甲酯之含量為上述範圍。Regarding the acrylic base polymer, the content of the monomer having a homopolymer Tg of 40°C or more is preferably 5 to 50% by weight, more preferably 10 to 40% by weight, relative to the total amount of the constituent monomer components. In order to form an adhesive layer having a moderate hardness and excellent secondary processability, as the monomer component of the base polymer, it is preferred to include a monomer component having a homopolymer Tg of 80°C or more, and more preferably a monomer component having a homopolymer Tg of 100°C or more. Regarding the acrylic base polymer, the content of the monomer having a homopolymer Tg of 100°C or more is preferably 0.1% by weight or more, more preferably 0.5% by weight or more, further preferably 1% by weight or more, and particularly preferably 3% by weight or more, relative to the total amount of the constituent monomer components. It is particularly preferred that the content of methyl methacrylate is within the above range.

藉由將上述單體成分利用溶液聚合、乳化聚合、塊狀聚合等各種公知之方法進行聚合可獲得作為基礎聚合物之丙烯酸系聚合物。就黏著劑之接著力、保持力等特性之平衡、或成本等觀點而言,較佳為溶液聚合法。作為溶液聚合之溶劑,使用乙酸乙酯、甲苯等。溶液濃度通常為20~80重量%左右。作為溶液聚合中所使用之聚合起始劑,可使用偶氮系、過氧化物系等各種公知者。為了對分子量進行調整,可使用鏈轉移劑。反應溫度通常為50~80℃左右,反應時間通常為1~8小時左右。By polymerizing the above-mentioned monomer components using various known methods such as solution polymerization, emulsion polymerization, and bulk polymerization, an acrylic polymer as a base polymer can be obtained. From the perspective of the balance of the adhesive's adhesion, retention, and other properties, or cost, solution polymerization is preferred. As a solvent for solution polymerization, ethyl acetate, toluene, etc. are used. The solution concentration is usually around 20 to 80% by weight. As a polymerization initiator used in solution polymerization, various known ones such as azo and peroxide can be used. In order to adjust the molecular weight, a chain transfer agent can be used. The reaction temperature is usually around 50 to 80°C, and the reaction time is usually around 1 to 8 hours.

(交聯劑) 就使黏著劑具有適度之凝聚力之觀點而言,基礎聚合物中較佳為導入交聯結構。例如,藉由於將基礎聚合物進行聚合後之溶液中添加交聯劑並視需要進行加熱,而導入交聯結構。作為交聯劑,可列舉異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、金屬螯合物系交聯劑等。該等交聯劑與導入至基礎聚合物中之羥基或羧基等官能基反應而形成交聯結構。就與基礎聚合物之羥基或羧基之反應性較高、交聯結構之導入容易之方面而言,較佳為異氰酸酯系交聯劑及環氧系交聯劑。(Crosslinking agent) From the perspective of giving the adhesive an appropriate cohesive force, it is preferred to introduce a crosslinking structure into the base polymer. For example, a crosslinking agent is added to a solution of the base polymer after polymerization and heated as necessary to introduce a crosslinking structure. Examples of the crosslinking agent include isocyanate crosslinking agents, epoxy crosslinking agents, oxazoline crosslinking agents, aziridine crosslinking agents, carbodiimide crosslinking agents, and metal chelate crosslinking agents. These crosslinking agents react with functional groups such as hydroxyl groups or carboxyl groups introduced into the base polymer to form a crosslinking structure. Isocyanate-based crosslinking agents and epoxy-based crosslinking agents are preferred because they have high reactivity with the hydroxyl or carboxyl groups of the base polymer and can easily introduce a crosslinked structure.

作為異氰酸酯系交聯劑,使用1分子中具有2個以上異氰酸酯基之聚異氰酸酯。作為異氰酸酯系交聯劑,例如可列舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族聚異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(例如,Tosoh製造之「Coronate L」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(例如,Tosoh製造之「Coronate HL」)、苯二甲基二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學製造之「Takenate D110N」、六亞甲基二異氰酸酯之三聚異氰酸酯物(例如,Tosoh製造之「Coronate HX」)等異氰酸酯加成物等。As the isocyanate-based crosslinking agent, a polyisocyanate having two or more isocyanate groups in one molecule is used. Examples of the isocyanate crosslinking agent include low-order aliphatic polyisocyanates such as butyl diisocyanate and hexamethylene diisocyanate; alicyclic isocyanates such as cyclopentyl diisocyanate, cyclohexyl diisocyanate, and isophorone diisocyanate; aromatic isocyanates such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, and xylylene diisocyanate; trihydroxymethylpropane/toluene diisocyanate trimer adducts (e.g., "Coronate L" manufactured by Tosoh), trihydroxymethylpropane/hexamethylene diisocyanate trimer adducts (e.g., "Coronate 1" manufactured by Tosoh); HL”), trihydroxymethylpropane adduct of xylylene diisocyanate (e.g., “Takenate D110N” manufactured by Mitsui Chemicals, isocyanate adduct of hexamethylene diisocyanate (e.g., “Coronate HX” manufactured by Tosoh), etc.

作為環氧系交聯劑,可使用1分子中具有2個以上環氧基之多官能環氧化合物。環氧系交聯劑之環氧基可為縮水甘油基。作為環氧系交聯劑,例如可列舉:N,N,N',N'-四縮水甘油基-間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷、1,6-己二醇二縮水甘油醚、新戊二醇二縮水甘油醚、乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、聚乙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、山梨糖醇聚縮水甘油醚、甘油聚縮水甘油醚、季戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚、山梨糖醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三(2-羥基乙基)三聚異氰酸三縮水甘油酯、間苯二酚二縮水甘油醚、雙酚-S-二縮水甘油醚等。作為環氧系交聯劑,亦可使用Nagase chemteX製造之「DENACOL」、Mitsubishi Gas Chemical製造之「Tetrad X」「Tetrad C」等市售品。As the epoxy crosslinking agent, a polyfunctional epoxy compound having two or more epoxy groups in one molecule can be used. The epoxy group of the epoxy crosslinking agent can be a glycidyl group. Examples of epoxy crosslinking agents include: N,N,N',N'-tetraglycidyl-m-xylylenediamine, diglycidylaniline, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and the like. Oleyl ether, sorbitol polyglycidyl ether, glycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether, sorbitan polyglycidyl ether, trihydroxymethylpropane polyglycidyl ether, adipate diglycidyl ester, phthalate diglycidyl ester, tri(2-hydroxyethyl)triisocyanate triglycidyl ester, resorcinol diglycidyl ether, bisphenol-S-diglycidyl ether, etc. As the epoxy-based crosslinking agent, commercially available products such as "DENACOL" manufactured by Nagase ChemteX, "Tetrad X" and "Tetrad C" manufactured by Mitsubishi Gas Chemical can also be used.

交聯劑之使用量根據基礎聚合物之組成或分子量等適當地調整即可。交聯劑之使用量相對於基礎聚合物100重量份為0.1~10重量份左右,較佳為0.3~7重量份,更佳為0.5~5重量份,進而較佳為1~4重量份。又,交聯劑相對於基礎聚合物100重量份之使用量(重量份)除以交聯劑之官能基當量(g/eq)所得之值較佳為0.00015~0.11,更佳為0.001~0.077,進而較佳為0.003~0.055,尤佳為0.0045~0.044。藉由使交聯劑之使用量大於普通之丙烯酸系之光學用透明黏著劑使黏著劑具有適度之硬度,存在二次加工時之於被黏著體之糊劑殘留減少、二次加工性提昇之傾向。The amount of the crosslinking agent used can be appropriately adjusted according to the composition or molecular weight of the base polymer. The amount of the crosslinking agent used is about 0.1 to 10 parts by weight relative to 100 parts by weight of the base polymer, preferably 0.3 to 7 parts by weight, more preferably 0.5 to 5 parts by weight, and further preferably 1 to 4 parts by weight. In addition, the value obtained by dividing the amount of the crosslinking agent used relative to 100 parts by weight of the base polymer (parts by weight) by the functional group equivalent (g/eq) of the crosslinking agent is preferably 0.00015 to 0.11, more preferably 0.001 to 0.077, further preferably 0.003 to 0.055, and particularly preferably 0.0045 to 0.044. By using a larger amount of crosslinking agent than that of a conventional acrylic optical transparent adhesive, the adhesive has a moderate hardness, and there is a tendency that the residual adhesive on the adherend during secondary processing is reduced and the secondary processing property is improved.

為了促進交聯結構之形成,亦可使用交聯觸媒。例如,作為異氰酸酯系交聯劑之交聯觸媒,可列舉鈦酸四正丁酯、鈦酸四異丙酯、乙醯丙酮鐵(III)、氧化丁基錫、二月桂酸二辛基錫等金屬系交聯觸媒(尤其是錫系交聯觸媒)等。交聯觸媒之使用量一般相對於基礎聚合物100重量份為0.05重量份以下。In order to promote the formation of the crosslinked structure, a crosslinking catalyst may also be used. For example, as a crosslinking catalyst of an isocyanate-based crosslinking agent, there can be cited metal-based crosslinking catalysts (especially tin-based crosslinking catalysts) such as tetrabutyl titanium, tetraisopropyl titanium, iron (III) acetylacetonate, butyltin oxide, and dioctyltin dilaurate. The amount of the crosslinking catalyst used is generally 0.05 parts by weight or less relative to 100 parts by weight of the base polymer.

(光硬化劑) 構成黏著劑層2之黏著劑組合物除基礎聚合物以外含有光硬化劑。包含光硬化性之黏著劑組合物之黏著劑層2若於與被黏著體貼合後進行光硬化,則與被黏著體之接著力提昇。(Photocuring agent) The adhesive composition constituting the adhesive layer 2 contains a photocuring agent in addition to the base polymer. If the adhesive layer 2 containing the photocurable adhesive composition is photocured after being attached to the adherend, the bonding strength with the adherend is improved.

作為光硬化劑,較佳為1分子中具有2個以上乙烯性不飽和鍵之化合物。又,光硬化劑較佳為表現出與基礎聚合物之相溶性之化合物。就表現出與基礎聚合物之適度之相溶性之方面而言,光硬化劑較佳為於常溫下為液體。藉由使光硬化劑與基礎聚合物相溶且於組合物中均勻地分散,能夠確保與被黏著體之接觸面積,且能夠形成透明性較高之黏著劑層2。又,藉由使基礎聚合物與光硬化劑表現出適度之相溶性,存在於光硬化後之黏著劑層2內容易均勻地導入交聯結構,與被黏著體之接著力適當地上升的傾向。As the photocuring agent, a compound having two or more ethylenic unsaturated bonds in one molecule is preferred. In addition, the photocuring agent is preferably a compound showing compatibility with the base polymer. In terms of showing appropriate compatibility with the base polymer, the photocuring agent is preferably a liquid at room temperature. By making the photocuring agent compatible with the base polymer and uniformly dispersed in the composition, the contact area with the adherend can be ensured, and an adhesive layer 2 with high transparency can be formed. Furthermore, by making the base polymer and the photocuring agent exhibit appropriate compatibility, a cross-linking structure can be easily and uniformly introduced into the adhesive layer 2 after photocuring, and the bonding strength with the adherend tends to be appropriately increased.

基礎聚合物與光硬化劑之相溶性主要受化合物之結構之影響。化合物之結構與相溶性例如可藉由Hansen溶解度參數進行評價,存在基礎聚合物與光硬化劑之溶解度參數之差越小,相溶性變得越高之傾向。The compatibility of the base polymer and the photocuring agent is mainly affected by the structure of the compound. The structure and compatibility of the compound can be evaluated by the Hansen solubility parameter, for example. The smaller the difference in the solubility parameters of the base polymer and the photocuring agent, the higher the compatibility tends to be.

就與丙烯酸系基礎聚合物之相溶性較高之方面而言,較佳為使用多官能(甲基)丙烯酸酯作為光硬化劑。作為多官能(甲基)丙烯酸酯,可列舉:聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚四亞甲基二醇二(甲基)丙烯酸酯、雙酚A環氧乙烷改性二(甲基)丙烯酸酯、雙酚A環氧丙烷改性二(甲基)丙烯酸酯、烷二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、乙氧化異三聚氰酸三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、乙氧化季戊四醇四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇聚(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、(甲基)丙烯酸胺基甲酸酯、環氧(甲基)丙烯酸酯、丁二烯(甲基)丙烯酸酯、異戊二烯(甲基)丙烯酸酯等。該等之中,就與丙烯酸系基礎聚合物之相溶性優異之方面而言,較佳為聚乙二醇二(甲基)丙烯酸酯或聚丙二醇二(甲基)丙烯酸酯,尤佳為聚乙二醇二(甲基)丙烯酸酯。In terms of high compatibility with acrylic-based polymers, it is preferred to use multifunctional (meth)acrylates as photocuring agents. Examples of multifunctional (meth)acrylates include polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, bisphenol A ethylene oxide-modified di(meth)acrylate, bisphenol A propylene oxide-modified di(meth)acrylate, alkanediol di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, ethoxylated isocyanuric acid tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol di(meth)acrylate, and the like. ester, trihydroxymethylpropane tri(meth)acrylate, di-trihydroxymethylpropane tetra(meth)acrylate, ethoxylated pentaerythritol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate, dipentaerythritol hexa(meth)acrylate, neopentyl glycol di(meth)acrylate, glycerol di(meth)acrylate, urethane (meth)acrylate, epoxy (meth)acrylate, butadiene (meth)acrylate, isoprene (meth)acrylate, etc. Among them, polyethylene glycol di(meth)acrylate or polypropylene glycol di(meth)acrylate is preferred, and polyethylene glycol di(meth)acrylate is particularly preferred, in terms of excellent compatibility with acrylic-based polymers.

基礎聚合物與光硬化劑之相溶性亦受化合物之分子量影響。存在光硬化性化合物之分子量越小,與基礎聚合物之相溶性變得越高之傾向。就與基礎聚合物之相溶性之觀點而言,光硬化劑之分子量較佳為1500以下,更佳為1000以下,進而較佳為500以下,尤佳為400以下。The compatibility between the base polymer and the photocuring agent is also affected by the molecular weight of the compound. There is a tendency that the smaller the molecular weight of the photocurable compound is, the higher the compatibility with the base polymer becomes. From the perspective of compatibility with the base polymer, the molecular weight of the photocuring agent is preferably 1500 or less, more preferably 1000 or less, further preferably 500 or less, and particularly preferably 400 or less.

於光硬化前之黏著劑層2中,基礎聚合物之特性為接著性之主要支配因素。因此,只要黏著劑組合物之基礎聚合物相同,則即便光硬化劑之種類不同,光硬化前之黏著劑層之接著特性之差異亦較小。光硬化劑之種類或含量主要對光硬化後之黏著劑層之接著力產生影響。官能基當量越小(即,每單位分子量之官能基數越大)且光硬化劑之含量越大,則越能夠於光硬化之前後對接著力設置差。In the adhesive layer 2 before photocuring, the properties of the base polymer are the main controlling factors of the adhesion. Therefore, as long as the base polymer of the adhesive composition is the same, the difference in the adhesion properties of the adhesive layer before photocuring is small even if the type of photocuring agent is different. The type or content of the photocuring agent mainly affects the adhesion of the adhesive layer after photocuring. The smaller the functional group equivalent (i.e., the larger the number of functional groups per unit molecular weight) and the larger the content of the photocuring agent, the greater the difference in the adhesion before and after photocuring can be set.

就與基礎聚合物之相溶性較高、且提昇光硬化後之接著力之觀點而言,光硬化劑之官能基當量(g/eq)較佳為500以下,更佳為400以下,進而較佳為300以下,尤佳為200以下。另一方面,若光硬化劑之官能基當量過小,則存在光硬化後之黏著劑層之交聯點密度變高、接著性降低之情況。因此,光硬化劑之官能基當量較佳為80以上,更佳為100以上,進而較佳為130以上。From the viewpoint of high compatibility with the base polymer and improved adhesion after photocuring, the functional group equivalent (g/eq) of the photocuring agent is preferably 500 or less, more preferably 400 or less, further preferably 300 or less, and particularly preferably 200 or less. On the other hand, if the functional group equivalent of the photocuring agent is too small, the crosslinking point density of the adhesive layer after photocuring may increase and the adhesion may decrease. Therefore, the functional group equivalent of the photocuring agent is preferably 80 or more, more preferably 100 or more, and further preferably 130 or more.

於丙烯酸系基礎聚合物與多官能丙烯酸酯光硬化劑之組合中,於光硬化劑之官能基當量較小之情形時,存在如下傾向:基礎聚合物與光硬化劑之相互作用較強,初期接著力上升。於本發明之用途中,存在初期接著力之過度之上升引起二次加工性之降低之情況。就使光硬化前之黏著劑層2與被黏著體之接著力保持適當之範圍之觀點而言,亦較佳為光硬化劑之官能基當量為上述範圍內。In the combination of acrylic base polymer and multifunctional acrylate photocuring agent, when the functional group equivalent weight of the photocuring agent is small, there is a tendency that the interaction between the base polymer and the photocuring agent is strong, and the initial adhesion is increased. In the use of the present invention, there is a case where an excessive increase in the initial adhesion leads to a decrease in secondary processability. From the perspective of maintaining the adhesion between the adhesive layer 2 and the adherend before photocuring within an appropriate range, it is also preferred that the functional group equivalent weight of the photocuring agent is within the above range.

黏著劑組合物中之光硬化劑之含量相對於基礎聚合物100重量份,較佳為10~50重量份。藉由將光硬化劑之調配量設為上述範圍,能夠將光硬化後之黏著劑層與被黏著體之接著性調整至適當之範圍。光硬化劑之含量相對於基礎聚合物100重量份,更佳為15~45重量份,進而較佳為20~40重量份。The content of the photocuring agent in the adhesive composition is preferably 10 to 50 parts by weight relative to 100 parts by weight of the base polymer. By setting the amount of the photocuring agent to the above range, the adhesion between the adhesive layer and the adherend after photocuring can be adjusted to an appropriate range. The content of the photocuring agent is more preferably 15 to 45 parts by weight relative to 100 parts by weight of the base polymer, and further preferably 20 to 40 parts by weight.

(光自由基起始劑) 光自由基起始劑係藉由活性光線之照射而生成自由基,並藉由自光自由基起始劑向光硬化劑之自由基轉移而促進光硬化劑之自由基聚合反應。作為光自由基起始劑(光自由基產生劑),較佳為藉由波長短於450 nm之可見光或紫外線之照射而生成自由基者,可列舉羥基酮類、苯偶醯二甲基縮酮類、胺基酮類、醯基氧化膦類、二苯甲酮類、含三氯甲基之三𠯤衍生物等。光自由基起始劑可單獨使用,亦可將2種以上混合使用。(Photoradical initiator) Photoradical initiators generate free radicals by irradiation with active light, and promote the free radical polymerization reaction of the photocuring agent by transferring free radicals from the photoradical initiator to the photocuring agent. As photoradical initiators (photoradical generators), preferably, free radicals are generated by irradiation with visible light or ultraviolet light with a wavelength shorter than 450 nm, and examples thereof include hydroxy ketones, benzoyl dimethyl ketal, amino ketones, acyl phosphine oxides, benzophenones, and trichloromethyl-containing tris derivatives. Photoradical initiators can be used alone or in combination of two or more.

於對黏著劑層2要求透明性之情形時,光自由基起始劑較佳為對波長長於400 nm之光(可見光)之感度較小,例如可較佳地使用波長405 nm下之吸光係數為1×102 [mLg-1 cm-1 ]以下之光自由基起始劑。又,若使用可見光之感度較小之光自由基起始劑,則起因於保管環境中之外界光之光自由基之生成量較小,因此能夠提昇補強膜之保管穩定性。When transparency is required for the adhesive layer 2, the photoradical initiator is preferably less sensitive to light with a wavelength longer than 400 nm (visible light). For example, a photoradical initiator with an absorbance of 1×10 2 [mLg -1 cm -1 ] or less at a wavelength of 405 nm is preferably used. In addition, if a photoradical initiator with a lower sensitivity to visible light is used, the amount of photoradicals generated due to external light in the storage environment is smaller, thereby improving the storage stability of the reinforcing film.

就提高補強膜之保管穩定性之觀點而言,較佳為使用於長於360 nm之波長不顯示吸收極大之光自由基起始劑。於長於360 nm之波長顯示吸收極大之光自由基起始劑容易吸收來自螢光燈之紫外線(主要為365 nm及405 nm之水銀明線),生成光自由基。若光自由基起始劑之光吸收之極大波長為360 nm以下,則起因於螢光燈等保管環境中之光之自由基之生成量較少。因此,即便於將補強膜長時間暴露於螢光燈下之情形時,亦能夠使光自由基起始劑之實效濃度維持得較高。又,起因於螢光燈等保管環境中之光所生成之少量之自由基由於會被抗氧化劑捕獲,因此可抑制保管環境下之光聚合。From the perspective of improving the storage stability of the reinforcing film, it is better to use a photo-radical initiator that does not show a maximum absorption at a wavelength longer than 360 nm. A photo-radical initiator that shows a maximum absorption at a wavelength longer than 360 nm easily absorbs ultraviolet light from fluorescent lamps (mainly mercury rays at 365 nm and 405 nm) to generate photo-radicals. If the maximum wavelength of light absorption of the photo-radical initiator is below 360 nm, the amount of free radicals generated due to light in the storage environment such as fluorescent lamps is less. Therefore, even when the reinforcing film is exposed to fluorescent lamps for a long time, the effective concentration of the photo-radical initiator can be maintained at a higher level. In addition, a small amount of free radicals generated by light in the storage environment such as fluorescent lamps will be captured by the antioxidant, thereby inhibiting photopolymerization in the storage environment.

為了使保管穩定性較高、且即便長期保管後亦能夠藉由光照射提昇與被黏著體之接著力,黏著劑層所包含之光自由基起始劑較佳為光吸收之極大波長為355 nm以下。另一方面,為了提高藉由紫外線照射之光硬化效率,光自由基起始劑較佳為於長於310 nm之波長具有光吸收極大。根據以上情況,為了提昇補強膜之保管穩定性,黏著劑層2所包含之光自由基起始劑較佳為於長於360 nm之波長不具有吸收極大、且於波長310~355 nm之範圍具有吸收極大者。光自由基起始劑之吸收極大波長更佳為315~350 nm,進而較佳為320~340 nm。In order to improve the storage stability and to improve the adhesion to the adherend by light irradiation even after long-term storage, the photo radical initiator contained in the adhesive layer is preferably one with a maximum wavelength of light absorption of 355 nm or less. On the other hand, in order to improve the light curing efficiency by ultraviolet irradiation, the photo radical initiator is preferably one with a maximum light absorption at a wavelength longer than 310 nm. Based on the above situation, in order to improve the storage stability of the reinforcing film, the photo radical initiator contained in the adhesive layer 2 is preferably one that does not have a maximum absorption at a wavelength longer than 360 nm and has a maximum absorption in the wavelength range of 310 to 355 nm. The maximum absorption wavelength of the photo-free radical initiator is more preferably 315 to 350 nm, and further preferably 320 to 340 nm.

黏著劑層2中之光自由基起始劑之含量相對於基礎聚合物100重量份,較佳為0.01~1重量份,更佳為0.02~0.7重量份,進而較佳為0.03~0.5重量份。黏著劑層2中之光自由基起始劑之含量相對於光硬化劑100重量份,較佳為0.005~0.5重量份,更佳為0.01~0.4重量份,進而較佳為0.02~0.3重量份。若黏著劑層中之光自由基起始劑之含量過小,則存在即便照射紫外線亦不會充分地進行光硬化反應之情況。若光自由基起始劑之含量過大,則存在即便於併用抗氧化劑之情形時,亦會進行保管環境下之光硬化反應,與被黏著體之接著力上升,補強膜之二次加工變得困難的情況。The content of the photo radical initiator in the adhesive layer 2 is preferably 0.01 to 1 part by weight, more preferably 0.02 to 0.7 part by weight, and further preferably 0.03 to 0.5 part by weight relative to 100 parts by weight of the base polymer. The content of the photo radical initiator in the adhesive layer 2 is preferably 0.005 to 0.5 part by weight, more preferably 0.01 to 0.4 part by weight, and further preferably 0.02 to 0.3 part by weight relative to 100 parts by weight of the photocuring agent. If the content of the photo radical initiator in the adhesive layer is too small, there is a possibility that the photocuring reaction will not be sufficiently performed even if irradiated with ultraviolet rays. If the content of the photo-radical initiator is too high, even when an antioxidant is used concurrently, the photocuring reaction may proceed under the storage environment, and the adhesion to the adherend may increase, making secondary processing of the reinforcement film difficult.

(抗氧化劑) 抗氧化劑具有抑制補強膜於保管環境中之光硬化反應之作用。除光自由基起始劑以外包含抗氧化劑之組合物即便於因來自螢光燈等之光而自光自由基起始劑生成少量之光自由基之情形時,抗氧化劑亦會捕獲自由基而生成穩定自由基,因此可抑制自由基向光硬化劑轉移。因此,可抑制因來自螢光燈等之光引起之光硬化(光硬化劑之自由基聚合反應)。(Antioxidant) Antioxidants have the function of inhibiting the photocuring reaction of the reinforced film in the storage environment. Even if a small amount of photoradicals are generated from the photoradical initiator due to light from a fluorescent lamp or the like, the antioxidant captures the free radicals to generate stable free radicals, thereby inhibiting the transfer of free radicals to the photocuring agent. Therefore, photocuring (radical polymerization reaction of the photocuring agent) caused by light from a fluorescent lamp or the like can be inhibited.

作為抗氧化劑,可列舉胺系抗氧化劑、硫系抗氧化劑、磷系抗氧化劑、酚系抗氧化劑等。As the antioxidant, there can be mentioned amine antioxidants, sulfur antioxidants, phosphorus antioxidants, phenol antioxidants and the like.

作為硫系抗氧化劑,可列舉:3,3'-硫代二丙酸二月桂酯、3,3'-硫代二丙酸二肉豆蔻酯、3,3'-硫代二丙酸二硬脂酯等。作為磷系抗氧化劑,可列舉亞磷酸三苯酯、亞磷酸二苯酯異癸酯、亞磷酸苯酯二異癸酯等。Examples of sulfur-based antioxidants include dilauryl 3,3'-thiodipropionate, dimyristyl 3,3'-thiodipropionate, distearyl 3,3'-thiodipropionate, etc. Examples of phosphorus-based antioxidants include triphenyl phosphite, isodecyl diphenyl phosphite, and diisodecyl phenyl phosphite.

作為胺系抗氧化劑,可列舉:單辛基二苯基胺、單壬基二苯基胺等單烷基二苯基胺類;4,4'-二丁基二苯基胺、4,4'-二戊基二苯基胺、4,4'-二己基二苯基胺、4,4'-二庚基二苯基胺、4,4'-二辛基二苯基胺、4,4'-二壬基二苯基胺等二烷基二苯基胺類;四丁基二苯基胺、四己基二苯基胺、四辛基二苯基胺、四壬基二苯基胺等多烷基二苯基胺類;α-萘胺、苯基-α-萘胺、丁基苯基-α-萘胺、戊基苯基-α-萘胺、己基苯基-α-萘胺、庚基苯基-α-萘胺、辛基苯基-α-萘胺、壬基苯基-α-萘胺等萘胺類等。As amine antioxidants, there can be listed: monoalkyldiphenylamines such as monooctyldiphenylamine and monononyldiphenylamine; dialkyldiphenylamines such as 4,4'-dibutyldiphenylamine, 4,4'-dipentyldiphenylamine, 4,4'-dihexyldiphenylamine, 4,4'-diheptyldiphenylamine, 4,4'-dioctyldiphenylamine, 4,4'-dinonyldiphenylamine; polyalkyldiphenylamines such as tetrabutyldiphenylamine, tetrahexyldiphenylamine, tetraoctyldiphenylamine, tetranonyldiphenylamine; naphthylamines such as α-naphthylamine, phenyl-α-naphthylamine, butylphenyl-α-naphthylamine, pentylphenyl-α-naphthylamine, hexylphenyl-α-naphthylamine, heptylphenyl-α-naphthylamine, octylphenyl-α-naphthylamine, nonylphenyl-α-naphthylamine, etc.

作為酚系抗氧化劑,可列舉:2,6-二第三丁基對甲酚(二丁基羥基甲苯;BHT)、丁基化羥基苯甲醚、2,6-二第三丁基-4-乙基苯酚、β-(3,5-二第三丁基-4-羥基苯基)丙酸硬脂酯等單酚系抗氧化劑;2,2'-亞甲基雙(4-甲基-6-第三丁基苯酚)、2,2'-亞甲基雙(4-乙基-6-第三丁基苯酚)、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)、4,4'-亞丁基雙(3-甲基-6-第三丁基苯酚)、3,9-雙[1,1-二甲基-2-[β-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基]乙基]2,4,8,10-四氧雜螺[5,5]十一烷等雙酚系抗氧化劑;1,1,3-三(2-甲基-4-羥基-5-第三丁基苯基)丁烷、1,3,5-三甲基-2,4,6-三(3,5-二第三丁基-4-羥基苄基)苯、四-[亞甲基-3-(3',5'-二第三丁基-4'-羥基苯基)丙酸酯]甲烷、雙[3,3'-雙-(4'-羥基-3'-第三丁基苯基)丁酸]二醇酯、1,3,5-三(3',5'-二第三丁基-4'-羥基苄基)-S-三𠯤-2,4,6-(1H,3H,5H)三酮、生育酚等高分子型酚系抗氧化劑等。As phenolic antioxidants, there are: 2,6-di-tert-butyl-p-cresol (dibutylhydroxytoluene; BHT), butylated hydroxyanisole, 2,6-di-tert-butyl-4-ethylphenol, β-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate stearyl and other monophenolic antioxidants; 2,2'-methylenebis(4-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-ethyl-6-tert-butylphenol), 4,4'-thiobis(3-methyl-6-tert-butylphenol), 4,4'-butylenebis(3-methyl-6-tert-butylphenol), 3,9-bis[1,1-dimethyl-2-[β-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionyloxy] Bisphenol antioxidants such as 2,4,8,10-tetraoxaspiro[5,5]undecane, 1,1,3-tris(2-methyl-4-hydroxy-5-tert-butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-tert-butyl-4-hydroxybenzyl)benzene, tetrakis-[methylene-3-(3',5'-di-tert-butyl)-4-hydroxybenzyl] High molecular weight phenolic antioxidants such as tributyl-4'-hydroxyphenyl) propionate] methane, bis[3,3'-bis-(4'-hydroxy-3'-tert-butylphenyl) butyrate] diol ester, 1,3,5-tris(3',5'-di-tert-butyl-4'-hydroxybenzyl)-S-trioxan-2,4,6-(1H,3H,5H)trione, tocopherol, etc.

就抑制由因螢光燈等之光而自光自由基起始劑生成之自由基引起的光硬化之觀點而言,抗氧化劑之中,較佳為胺系抗氧化劑及酚系抗氧化劑等發揮作為自由基鏈抑制劑之作用者,尤佳為具有受阻酚結構之酚系抗氧化劑。From the viewpoint of inhibiting photohardening caused by free radicals generated from a photo-radical initiator by light of a fluorescent lamp or the like, among the antioxidants, those that function as free radical chain inhibitors, such as amine antioxidants and phenolic antioxidants, are preferred, and phenolic antioxidants having a hindered phenol structure are particularly preferred.

具有受阻酚結構之抗氧化劑係於苯酚之與鍵結有OH基之芳香族環上之碳原子鄰接之碳原子之至少一者鍵結有第三丁基等位阻較大之基者。作為具有受阻酚結構之抗氧化劑,可列舉:二丁基羥基甲苯(BHT)、季戊四醇四[3-(3,5-二第三丁基-4-羥基苯基)丙酸酯](BASF製造之「Irganox 1010」)、3-(3,5-二第三丁基-4-羥基苯基)丙酸十八烷基酯(BASF製造之「Irganox 1076」)、3,3',3'',5,5',5''-六第三丁基-a,a',a''-(1,3,5-三甲苯-2,4,6-三基)三對甲酚(BASF製造之「Irganox 1330」)、1,3,5-三(3,5-二第三丁基-4-羥基苄基)-1,3,5-三𠯤-2,4,6(1H,3H,5H)-三酮(BASF製造之「Irganox 3114」)、異三聚氰酸三[3-(3,5-二第三丁基-4-羥基苯基)丙醯氧基乙基]酯(BASF製造之「Irganox 3125」)、季戊四醇四[3-(3,5-二第三丁基-4-羥基苯基)丙酸酯](ADEKA製造之「Adekastab AO-60」)、3,9-雙{2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基]-1,1-二甲基乙基}-2,4,8,10-四氧雜螺[5.5]十一烷(ADEKA製造之「Adekastab AO-80」)、丙烯酸2-[1-(2-羥基-3,5-二第三戊基苯基)乙基]-4,6-二第三戊基苯基酯(住友化學製造之「Sumilizer GS」)、丙烯酸2-第三丁基-4-甲基-6-(2-羥基-3-第三丁基-5-甲基苄基)苯基酯(住友化學製造之「Sumilizer GM」)、2,2'-二甲基-2,2'-(2,4,8,10-四氧雜螺[5.5]十一烷-3,9-二基)二丙烷-1,1'-二基=雙[3-(3-第三丁基-4-羥基-5-甲基苯基)丙酸酯](住友化學製造之「Sumilizer GA-80」)、1,3,5-三(3-羥基-4-第三丁基-2,6-二甲基苄基)-1,3,5-三𠯤-2,4,6(1H,3H,5H)-三酮(Cytec製造之「Cyanox 1790」)等。The antioxidant having a hindered phenol structure is one in which at least one of the carbon atoms adjacent to the carbon atom on the aromatic ring to which the OH group of phenol is bonded is bonded to a group having a large steric hindrance such as a tert-butyl group. As antioxidants with hindered phenol structures, they include butylated hydroxytoluene (BHT), pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate] ("Irganox 1010" manufactured by BASF), octadecyl 3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate ("Irganox 1076" manufactured by BASF), 3,3',3'',5,5',5''-hexa-tert-butyl-a,a',a''-(1,3,5-trimethylbenzene-2,4,6-triyl) tri-p-cresol ("Irganox 1330”), 1,3,5-tris(3,5-di-tert-butyl-4-hydroxybenzyl)-1,3,5-tris-2,4,6(1H,3H,5H)-trione (“Irganox 3114” manufactured by BASF), isocyanuric acid tris[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionyloxyethyl]ester (“Irganox 3125” manufactured by BASF), pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate] (“Adekastab” manufactured by ADEKA), AO-60”), 3,9-bis{2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionyloxy]-1,1-dimethylethyl}-2,4,8,10-tetraoxaspiro[5.5]undecane (“Adekastab AO-80” manufactured by ADEKA), 2-[1-(2-hydroxy-3,5-di-tert-pentylphenyl)ethyl]-4,6-di-tert-pentylphenyl acrylate (“Sumilizer GS” manufactured by Sumitomo Chemical), 2-tert-butyl-4-methyl-6-(2-hydroxy-3-tert-butyl-5-methylbenzyl)phenyl acrylate (“Sumilizer GM”), 2,2'-dimethyl-2,2'-(2,4,8,10-tetraoxaspiro[5.5]undecane-3,9-diyl)dipropane-1,1'-diyl=bis[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionate] (Sumitomo Chemical’s “Sumilizer GA-80”), 1,3,5-tris(3-hydroxy-4-tert-butyl-2,6-dimethylbenzyl)-1,3,5-tris(2,4,6(1H,3H,5H)-trione) (Cyanox 1790, Cytec’s

黏著劑層2中之抗氧化劑之含量相對於基礎聚合物100重量份,較佳為0.01~2重量份,更佳為0.03~1重量份,進而較佳為0.04~0.7重量份,尤佳為0.05~0.5重量份。抗氧化劑之含量較佳為光自由基起始劑之含量之0.2~5倍,更佳為0.3~3倍,進而較佳為0.5~2倍。The content of the antioxidant in the adhesive layer 2 is preferably 0.01 to 2 parts by weight, more preferably 0.03 to 1 part by weight, further preferably 0.04 to 0.7 parts by weight, and particularly preferably 0.05 to 0.5 parts by weight relative to 100 parts by weight of the base polymer. The content of the antioxidant is preferably 0.2 to 5 times the content of the photo-radical initiator, more preferably 0.3 to 3 times, and further preferably 0.5 to 2 times.

(光自由基起始劑與抗氧化劑之併用效果) 於除光自由基起始劑以外包含抗氧化劑之組合物中,即便於因來自螢光燈等之光而自光自由基起始劑生成少量之光自由基之情形時,抗氧化劑亦會捕獲自由基而生成穩定自由基。因此,可抑制由來自螢光燈等之光引起之自由基聚合反應。就抑制補強膜之保管狀態下之聚合反應之觀點而言,較佳為抗氧化劑之含量較多。另一方面,若抗氧化劑之含量過大,則即便為了光硬化而進行紫外線照射,抗氧化劑亦會捕獲光生成自由基之大部分,因此會妨礙自由基自光自由基起始劑向光硬化劑轉移,存在光硬化不充分之情況。因此,為了抑制保管環境中之光聚合而防止接著力之上升,並於光照射時適當地進行光硬化反應使接著力上升,較佳為抗氧化劑之含量為上述範圍。(Effect of combined use of photoradical initiator and antioxidant) In a composition containing an antioxidant in addition to a photoradical initiator, even when a small amount of photoradicals are generated from the photoradical initiator due to light from a fluorescent lamp, the antioxidant captures the radicals to generate stable radicals. Therefore, the radical polymerization reaction caused by light from a fluorescent lamp can be suppressed. From the viewpoint of suppressing the polymerization reaction during storage of the reinforced film, a larger content of the antioxidant is preferred. On the other hand, if the content of the antioxidant is too large, even if ultraviolet light is irradiated for photocuring, the antioxidant captures most of the photogenerated radicals, thereby hindering the transfer of radicals from the photoradical initiator to the photocuring agent, resulting in insufficient photocuring. Therefore, in order to suppress photopolymerization in the storage environment and prevent the increase of adhesive strength, and to appropriately carry out the photocuring reaction during light irradiation to increase the adhesive strength, it is preferred that the content of the antioxidant is within the above range.

藉由將光自由基起始劑與抗氧化劑併用,抗氧化劑會捕獲因來自螢光燈等之光所生成之自由基,因此能夠抑制由保管環境下之光硬化反應引起之接著力之上升。因此,不論光自由基起始劑之種類如何,均能夠藉由抗氧化劑之作用抑制保管環境中之黏著劑層之光硬化。By using a photo-radical initiator together with an antioxidant, the antioxidant captures the free radicals generated by light from fluorescent lamps, etc., thereby inhibiting the increase in adhesion caused by the photocuring reaction in the storage environment. Therefore, regardless of the type of photo-radical initiator, the photocuring of the adhesive layer in the storage environment can be inhibited by the action of the antioxidant.

另一方面,若將具備包含光自由基起始劑及抗氧化劑之黏著劑層之補強膜長時間暴露於螢光燈下,則由於光自由基起始劑之失活,光自由基起始劑之實效濃度(能夠生成光自由基之光自由基起始劑之濃度)減小。因此,存在即便為了光硬化而進行紫外線照射,光自由基之生成量亦較少,光硬化反應未充分地進行之情況。On the other hand, if a reinforcing film having an adhesive layer containing a photoradical initiator and an antioxidant is exposed to a fluorescent lamp for a long time, the effective concentration of the photoradical initiator (the concentration of the photoradical initiator capable of generating photoradicals) decreases due to the inactivation of the photoradical initiator. Therefore, even if ultraviolet rays are irradiated for photocuring, the amount of photoradicals generated is small, and the photocuring reaction may not proceed sufficiently.

補強膜較佳為即便於長時間保管後,黏著劑亦不易因保管環境中之螢光燈等之光而產生光硬化,且於光照射時會生成充分量之自由基,藉由光硬化劑之自由基聚合反應,與被黏著體之接著力上升。為了於長時間保管後亦充分地進行光硬化反應,較佳為使用保管環境下之自由基生成量較小之光自由基起始劑。具體而言,較佳為使用如下光自由基起始劑:其如上所述,於360 nm以下具有吸收極大波長,且由螢光燈之水銀明線(尤其是波長365 nm)引起之光自由基生成量較小。It is preferred that the reinforcing film is not easily photocured by light from fluorescent lamps in the storage environment even after long-term storage, and that sufficient free radicals are generated when exposed to light, and the adhesion to the adherend is increased through the free radical polymerization reaction of the photocuring agent. In order to fully perform the photocuring reaction even after long-term storage, it is preferred to use a photoradical initiator with a small amount of free radicals generated in the storage environment. Specifically, it is preferred to use the following photoradical initiator: as described above, it has a maximum absorption wavelength below 360 nm, and the amount of photoradicals generated by the mercury line of fluorescent lamps (especially the wavelength of 365 nm) is small.

由螢光燈之光引起之來自光自由基起始劑之自由基生成量例如可藉由如後述之實施例所示於極低溫下照射波長365 nm之光並利用電子自旋共振(ESR)法對自由基量進行定量而進行評價。源自光自由基起始劑之自由基由於在常溫下之壽命極短,故而於自由基生成量之評價時適合極低溫。The amount of free radicals generated from the photo-radical initiator caused by the light of a fluorescent lamp can be evaluated by, for example, irradiating with light of a wavelength of 365 nm at extremely low temperature and quantifying the amount of free radicals using the electron spin resonance (ESR) method as shown in the examples described below. Since the free radicals from the photo-radical initiator have an extremely short life span at room temperature, extremely low temperatures are suitable for evaluating the amount of free radicals generated.

(其他添加劑) 除上述例示之各成分以外,黏著劑層中亦可於無損本發明之特性之範圍內含有矽烷偶合劑、黏著性賦予劑、塑化劑、軟化劑、抗劣化劑、填充劑、著色劑、紫外線吸收劑、界面活性劑、抗靜電劑等添加劑。(Other additives) In addition to the components listed above, the adhesive layer may also contain additives such as silane coupling agents, adhesion imparting agents, plasticizers, softeners, anti-degradation agents, fillers, colorants, ultraviolet absorbers, surfactants, antistatic agents, etc. within the range that does not impair the characteristics of the present invention.

[補強膜之製作] 藉由於膜基材1上積層光硬化性之黏著劑層2,而獲得補強膜。黏著劑層2可於膜基材1上直接形成,亦可將於其他基材上片狀地形成之黏著劑層轉印至膜基材1上。[Production of reinforcing film] The reinforcing film is obtained by laminating a photocurable adhesive layer 2 on a film substrate 1. The adhesive layer 2 can be formed directly on the film substrate 1, or an adhesive layer formed in a sheet form on another substrate can be transferred to the film substrate 1.

藉由將上述黏著劑組合物利用輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥式刷塗、噴塗、浸漬輥塗佈、棒式塗佈、刮塗、氣刀刮塗、淋幕式塗佈、唇板塗佈、模嘴塗佈等塗佈於基材上,並視需要將溶劑進行乾燥去除,而形成黏著劑層。作為乾燥方法,可酌情採用適當之方法。加熱乾燥溫度較佳為40℃~200℃,更佳為50℃~180℃,進而較佳為70℃~170℃。乾燥時間較佳為5秒~20分鐘,更佳為5秒~15分鐘,進而較佳為10秒~10分鐘。The adhesive composition is applied to the substrate by roller coating, contact roller coating, gravure coating, reverse coating, roller brush coating, spray coating, dip roller coating, rod coating, scraper coating, air knife scraper coating, curtain coating, lip plate coating, die nozzle coating, etc., and the solvent is dried and removed as needed to form an adhesive layer. As a drying method, an appropriate method can be used as appropriate. The heating drying temperature is preferably 40°C to 200°C, more preferably 50°C to 180°C, and further preferably 70°C to 170°C. The drying time is preferably 5 seconds to 20 minutes, more preferably 5 seconds to 15 minutes, and further preferably 10 seconds to 10 minutes.

黏著劑層2之厚度例如為1~300 μm左右。存在如下傾向:黏著劑層2之厚度越大,與被黏著體之接著性越會提昇。另一方面,於黏著劑層2之厚度過大之情形時,存在光硬化前之流動性較高、操作變得困難之情況。因此,黏著劑層2之厚度較佳為5~100 μm,更佳為8~50 μm,進而較佳為10~40 μm,尤佳為13~30 μm。The thickness of the adhesive layer 2 is, for example, about 1 to 300 μm. There is a tendency that the thicker the adhesive layer 2 is, the better the adhesion to the adherend. On the other hand, when the thickness of the adhesive layer 2 is too large, the fluidity before light curing is higher and the operation becomes difficult. Therefore, the thickness of the adhesive layer 2 is preferably 5 to 100 μm, more preferably 8 to 50 μm, further preferably 10 to 40 μm, and particularly preferably 13 to 30 μm.

於黏著劑組合物含有交聯劑之情形時,較佳為與溶劑之乾燥同時、或於溶劑之乾燥後藉由加熱或老化使交聯進行。加熱溫度或加熱時間係根據使用之交聯劑之種類適當地設定,通常於20℃~160℃之範圍藉由1分鐘至7天左右之加熱進行交聯。用以將溶劑進行乾燥去除之加熱亦可兼作用於交聯之加熱。When the adhesive composition contains a crosslinking agent, it is preferred to perform crosslinking simultaneously with the drying of the solvent or after the drying of the solvent by heating or aging. The heating temperature or heating time is appropriately set according to the type of crosslinking agent used, and crosslinking is usually performed by heating at a temperature of 20°C to 160°C for 1 minute to 7 days. The heating used to dry and remove the solvent can also serve as the heating for crosslinking.

藉由於基礎聚合物中導入交聯結構,凝膠分率上升。存在凝膠分率越高,黏著劑越硬,於因二次加工等而自被黏著體剝離補強膜時,可抑制向被黏著體之糊劑殘留的傾向。光硬化前之黏著劑層2之凝膠分率較佳為30%以上,更佳為50%以上,進而較佳為60%以上,尤佳為65%以上。黏著劑層2之光硬化前之凝膠分率亦可為70%以上或75%以上。By introducing a cross-linked structure into the base polymer, the gel fraction increases. The higher the gel fraction, the harder the adhesive is, and when the reinforcing film is peeled off from the adherend due to secondary processing, etc., the tendency of the adhesive residue to remain on the adherend can be suppressed. The gel fraction of the adhesive layer 2 before light curing is preferably 30% or more, more preferably 50% or more, further preferably 60% or more, and particularly preferably 65% or more. The gel fraction of the adhesive layer 2 before light curing can also be 70% or more or 75% or more.

由於黏著劑含有未反應之光硬化劑,故而光硬化前之黏著劑層2之凝膠分率一般為90%以下。若光硬化前之黏著劑層2之凝膠分率過大,則存在對被黏著體之抓固力降低、初期接著力變得不充分之情況。因此,光硬化前之黏著劑層2之凝膠分率較佳為85%以下,更佳為80%以下。Since the adhesive contains unreacted photocuring agent, the gel fraction of the adhesive layer 2 before photocuring is generally 90% or less. If the gel fraction of the adhesive layer 2 before photocuring is too large, the gripping force on the adherend is reduced and the initial adhesion becomes insufficient. Therefore, the gel fraction of the adhesive layer 2 before photocuring is preferably 85% or less, and more preferably 80% or less.

凝膠分率可以對乙酸乙酯等溶劑之不溶物之形式而求出,具體而言,以將黏著劑層於乙酸乙酯中於23℃下浸漬7天之後之不溶成分相對於浸漬前之試樣之重量分率(單位:重量%)之方式而求出。一般而言,聚合物之凝膠分率與交聯度相同,聚合物中之交聯之部分越多,凝膠分率變得越大。又,光硬化劑之量越多,凝膠分率變得越小。The gel fraction can be obtained in the form of insoluble matter in solvents such as ethyl acetate. Specifically, it is obtained by immersing the adhesive layer in ethyl acetate at 23°C for 7 days and the weight fraction (unit: weight %) of the sample before immersion. Generally speaking, the gel fraction of a polymer is the same as the degree of crosslinking. The more crosslinked parts in the polymer, the greater the gel fraction. In addition, the greater the amount of light curing agent, the smaller the gel fraction.

藉由交聯劑於聚合物中導入交聯結構後,光硬化劑亦維持未反應之狀態。因此,形成包含基礎聚合物及光硬化劑之光硬化性之黏著劑層2。於在膜基材1上形成黏著劑層2之情形時,較佳為以黏著劑層2之保護等為目的於黏著劑層2上附設隔離件5。亦可於黏著劑層2上附設隔離件5後進行交聯。After the crosslinking structure is introduced into the polymer by the crosslinking agent, the photocuring agent also remains in an unreacted state. Therefore, a photocurable adhesive layer 2 including the base polymer and the photocuring agent is formed. When the adhesive layer 2 is formed on the film substrate 1, it is preferred to attach a spacer 5 to the adhesive layer 2 for the purpose of protecting the adhesive layer 2. Alternatively, the crosslinking may be performed after attaching the spacer 5 to the adhesive layer 2.

於在其他基材上形成黏著劑層2之情形時,藉由於使溶劑乾燥後將黏著劑層2轉印至膜基材1上而獲得補強膜。亦可將黏著劑層之形成所使用之基材直接作為隔離件5。When the adhesive layer 2 is formed on another substrate, the reinforcing film is obtained by transferring the adhesive layer 2 onto the film substrate 1 after drying the solvent. The substrate used for forming the adhesive layer can also be directly used as the spacer 5.

作為隔離件5,可良好地使用聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯膜等塑膠膜。隔離件之厚度通常為3~200 μm,較佳為10~100 μm左右。較佳為對隔離件5之與黏著劑層2之接觸面實施藉由聚矽氧系、氟系、長鏈烷基系、或者脂肪醯胺系等脫模劑、或二氧化矽粉等進行之脫模處理。藉由對隔離件5之表面進行脫模處理,於將膜基材1與隔離件5剝離時,可維持於黏著劑層2與隔離件5之界面產生剝離、於膜基材1上固著黏著劑層2之狀態。As the isolating member 5, a plastic film such as polyethylene, polypropylene, polyethylene terephthalate, polyester film, etc. can be preferably used. The thickness of the isolating member is usually 3 to 200 μm, preferably about 10 to 100 μm. It is preferred that the contact surface of the isolating member 5 with the adhesive layer 2 is subjected to a mold release treatment using a mold release agent such as a polysilicone-based, fluorine-based, long-chain alkyl-based, or fatty amide-based release agent, or silicon dioxide powder, etc. By performing a release treatment on the surface of the isolating member 5, when the film substrate 1 and the isolating member 5 are peeled off, the state in which the adhesive layer 2 and the isolating member 5 are peeled off and the adhesive layer 2 is fixed on the film substrate 1 can be maintained.

[補強膜之使用] 本發明之補強膜係貼合於裝置或裝置構成零件而使用。補強膜10係黏著劑層2與膜基材1固著,於與被黏著體貼合後且光硬化前,對被黏著體之接著力較小。因此,光硬化前,補強膜自被黏著體之剝離較容易,且二次加工性優異。又,光硬化前,將補強膜切斷並將被黏著體表面之一部分之區域之補強膜去除等加工亦可容易地進行。[Use of reinforcing film] The reinforcing film of the present invention is used by being attached to a device or a component of a device. The reinforcing film 10 is a film substrate 1 fixed with an adhesive layer 2, and has a relatively small adhesion to the adherend after being attached to the adherend and before being photocured. Therefore, before photocuring, the reinforcing film is easy to peel off from the adherend and has excellent secondary processing properties. In addition, before photocuring, the reinforcing film can be cut and a portion of the surface of the adherend can be removed easily.

供補強膜貼合之被黏著體並無特別限定,可列舉各種電子裝置、光學裝置及其構成零件等。補強膜可貼合於被黏著體之整個面,亦可選擇性地僅貼合於需要補強之部分。又,亦可將補強膜貼合於被黏著體之整個面之後,將無需補強之部位之補強膜切斷,並將補強膜剝離去除。若為光硬化前,則補強膜係暫黏於被黏著體表面之狀態,因此能夠自被黏著體之表面容易地將補強膜剝離去除。The adherend to which the reinforcing film is applied is not particularly limited, and various electronic devices, optical devices and their components can be listed. The reinforcing film can be applied to the entire surface of the adherend, or selectively applied only to the portion that needs reinforcement. In addition, after the reinforcing film is applied to the entire surface of the adherend, the reinforcing film on the portion that does not need reinforcement can be cut off and the reinforcing film can be peeled off and removed. Before light curing, the reinforcing film is temporarily adhered to the surface of the adherend, so the reinforcing film can be easily peeled off and removed from the surface of the adherend.

<光硬化前之黏著劑層之特性> (接著力) 就使自被黏著體之剝離容易、防止補強膜於剝離後之被黏著體中之糊劑殘留之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力較佳為5 N/25 mm以下,更佳為2 N/25 mm以下,進而較佳為1.3 N/25 mm以下。就防止保管或操作時之補強片材之剝離之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力較佳為0.005 N/25 mm以上,更佳為0.01 N/25 mm以上,進而較佳為0.1 N/25 mm以上,尤佳為0.3 N/25 mm以上。<Characteristics of the adhesive layer before photocuring> (Adhesion) From the perspective of facilitating peeling from the adherend and preventing the adhesive residue of the reinforcing film from remaining in the adherend after peeling, the adhesion between the adhesive layer 2 and the adherend before photocuring is preferably 5 N/25 mm or less, more preferably 2 N/25 mm or less, and further preferably 1.3 N/25 mm or less. From the viewpoint of preventing the reinforcing sheet from peeling off during storage or handling, the adhesion between the adhesive layer 2 and the adherend before light curing is preferably 0.005 N/25 mm or more, more preferably 0.01 N/25 mm or more, further preferably 0.1 N/25 mm or more, and particularly preferably 0.3 N/25 mm or more.

補強膜較佳為於使黏著劑層光硬化前之狀態下對聚醯亞胺膜之接著力為上述範圍內。於撓性顯示面板、撓性印刷配線板(FPC)、將顯示面板與配線板一體化而成之裝置等中,使用可撓性之基板材料,就耐熱性或尺寸穩定性之觀點而言,一般使用聚醯亞胺膜。黏著劑層對作為基板之聚醯亞胺膜具有上述接著力之補強膜於黏著劑之光硬化前容易剝離,光硬化後接著可靠性優異。The reinforcing film preferably has a bonding strength to the polyimide film in the above range before the adhesive layer is photocured. In flexible display panels, flexible printed wiring boards (FPCs), devices integrating display panels and wiring boards, etc., flexible substrate materials are used, and polyimide films are generally used from the viewpoint of heat resistance or dimensional stability. The reinforcing film having the above bonding strength to the polyimide film as the substrate is easy to peel off before the adhesive is photocured, and has excellent bonding reliability after photocuring.

(儲存模數) 黏著劑層2較佳為光硬化前之25℃下之剪切儲存模數G'i 為1×104 ~1.2×105 Pa。剪切儲存模數(以下,僅記載為「儲存模數」)係藉由讀取依據JIS K7244-1「塑膠-動態機械特性之試驗方法」所記載之方法於頻率1 Hz之條件下於-50~150℃之範圍以升溫速度5℃/min進行測定時的特定溫度下之值而求出。(Storage modulus) The shear storage modulus G'i of the adhesive layer 2 at 25°C before light curing is preferably 1×10 4 to 1.2×10 5 Pa. The shear storage modulus (hereinafter simply referred to as "storage modulus") is obtained by reading the value at a specific temperature when measuring in accordance with the method described in JIS K7244-1 "Plastics - Test methods for dynamic mechanical properties" at a frequency of 1 Hz in the range of -50 to 150°C at a heating rate of 5°C/min.

於如黏著劑般表現出黏彈性之物質中,儲存模數G'用作表示硬度之程度之指標。黏著劑層之儲存模數與凝集力具有較高之關聯,存在如下傾向:黏著劑之凝集力越高,於被黏著體之抓固力變得越大。光硬化前之黏著劑層2之儲存模數只要為1×104 Pa以上,則黏著劑具有充分之硬度及凝集力,因此於自被黏著體將補強膜剝離時不易產生於被黏著體之糊劑殘留。又,於黏著劑層2之儲存模數較大之情形時,可抑制黏著劑自補強膜之端面溢出。光硬化前之黏著劑層2之儲存模數只要為1.2×105 Pa以下,則於黏著劑層2與被黏著體之界面之剝離容易,於進行二次加工之情形時,亦不易產生黏著劑層之凝集破壞或於被黏著體表面之糊劑殘留。In materials that exhibit viscoelastic properties such as adhesives, the storage modulus G' is used as an indicator of the degree of hardness. The storage modulus of the adhesive layer has a high correlation with the cohesive force, and there is a tendency that the higher the cohesive force of the adhesive, the greater the gripping force on the adherend. As long as the storage modulus of the adhesive layer 2 before photocuring is 1×10 4 Pa or more, the adhesive has sufficient hardness and cohesive force, so it is not easy to produce paste residues on the adherend when the reinforcing film is peeled off from the adherend. In addition, when the storage modulus of the adhesive layer 2 is large, the adhesive can be suppressed from overflowing from the end surface of the reinforcing film. As long as the storage modulus of the adhesive layer 2 before light curing is less than 1.2×10 5 Pa, the adhesive layer 2 and the adherend can be easily peeled off at the interface, and it is not easy to cause coagulation and destruction of the adhesive layer or paste residue on the surface of the adherend during secondary processing.

就提高補強片材之二次加工性從而抑制二次加工時之於被黏著體之糊劑殘留之觀點而言,黏著劑層2之光硬化前之25℃下之儲存模數G'i 更佳為3×104 ~1×105 Pa,進而較佳為4×104 ~9.5×104 Pa。From the viewpoint of improving the secondary processability of the reinforcing sheet and thereby suppressing the residual paste on the adherend during the secondary processing, the storage modulus G'i of the adhesive layer 2 at 25°C before light curing is more preferably 3×10 4 to 1×10 5 Pa, and further preferably 4×10 4 to 9.5×10 4 Pa.

<黏著劑層之光硬化> 藉由將補強膜貼合於被黏著體之後對黏著劑層2照射活性光線,而使黏著劑層光硬化。作為活性光線,可列舉紫外線、可見光、紅外線、X射線、α射線、β射線、及γ射線等。就能夠抑制保管狀態下之黏著劑層之硬化且容易硬化之方面而言,作為活性光線,較佳為紫外線。活性光線之照射強度或照射時間根據黏著劑層之組成或厚度等適當設定即可。對黏著劑層2之活性光線之照射可自膜基材1側及被黏著體側之任一面實施,亦可自兩面進行活性光線之照射。<Photocuring of adhesive layer> After the reinforcing film is attached to the adherend, the adhesive layer 2 is irradiated with active light to photocure the adhesive layer. Examples of active light include ultraviolet light, visible light, infrared light, X-rays, α-rays, β-rays, and γ-rays. Ultraviolet light is preferred as active light because it can inhibit the curing of the adhesive layer in storage and is easy to cure. The irradiation intensity or irradiation time of the active light can be appropriately set according to the composition or thickness of the adhesive layer. The irradiation of the adhesive layer 2 with active light can be carried out from either the film substrate 1 side or the adherend side, or from both sides.

<光硬化後之黏著劑層之特性> (接著力) 就裝置之實用時之接著可靠性之觀點而言,光硬化後之黏著劑層2與被黏著體之接著力較佳為6 N/25 mm以上,更佳為10 N/25 mm以上,進而較佳為12 N/25 mm以上,尤佳為14 N/25 mm以上。補強膜較佳為光硬化後之黏著劑層對聚醯亞胺膜具有上述範圍之接著力。光硬化後之黏著劑層2與被黏著體之接著力較佳為光硬化前之黏著劑層2與被黏著體之接著力之4倍以上,更佳為8倍以上,進而較佳為10倍以上。<Characteristics of the adhesive layer after photocuring> (Adhesion) From the perspective of adhesion reliability during practical use of the device, the adhesion between the adhesive layer 2 after photocuring and the adherend is preferably 6 N/25 mm or more, more preferably 10 N/25 mm or more, further preferably 12 N/25 mm or more, and particularly preferably 14 N/25 mm or more. The reinforcing film preferably has an adhesion within the above range for the adhesive layer after photocuring to the polyimide film. The adhesion between the adhesive layer 2 after photocuring and the adherend is preferably 4 times or more, more preferably 8 times or more, and further preferably 10 times or more of the adhesion between the adhesive layer 2 before photocuring and the adherend.

黏著劑層2較佳為光硬化後之25℃下之儲存模數G'f 為1.5×105 Pa以上。若光硬化後之黏著劑層2之儲存模數為1.5×105 Pa以上,則隨著凝聚力之增大,與被黏著體之接著力提昇,可獲得較高之接著可靠性。另一方面,於儲存模數過大之情形時,黏著劑難以潤濕擴展,與被黏著體之接觸面積變小。又,黏著劑之應力分散性降低,因此存在剝離力容易傳播至接著界面,與被黏著體之接著力降低之傾向。因此,黏著劑層2之光硬化後之25℃下之儲存模數G'f 較佳為2×106 Pa以下。就提高使黏著劑層光硬化後之補強片材之接著可靠性之觀點而言,G'f 更佳為1.8×105 ~1.2×106 Pa,進而較佳為2×105 ~1×106 Pa。The adhesive layer 2 preferably has a storage modulus G'f of 1.5×10 5 Pa or more at 25°C after light curing. If the storage modulus of the adhesive layer 2 after light curing is 1.5×10 5 Pa or more, as the cohesive force increases, the adhesion to the adherend increases, and a higher adhesion reliability can be obtained. On the other hand, when the storage modulus is too large, the adhesive is difficult to wet and expand, and the contact area with the adherend becomes smaller. In addition, the stress dispersibility of the adhesive is reduced, so there is a tendency for the peeling force to be easily transmitted to the bonding interface, and the adhesion to the adherend is reduced. Therefore, the storage modulus G'f of the adhesive layer 2 at 25°C after photocuring is preferably 2×10 6 Pa or less. From the viewpoint of improving the bonding reliability of the reinforcing sheet after photocuring the adhesive layer, G'f is more preferably 1.8×10 5 to 1.2×10 6 Pa, and further preferably 2×10 5 to 1×10 6 Pa.

黏著劑層2之光硬化前後之25℃下之儲存模數之比G'f /G'i 較佳為2以上。若G'f 為G'i 之2倍以上,則藉由光硬化而引起之G'之增加較大,可兼顧光硬化前之二次加工性及光硬化後之接著可靠性。G'f /G'i 更佳為4以上,進而較佳為8以上,尤佳為10以上。G'f /G'i 之上限並無特別限定,於G'f /G'i 過大之情形時,容易導致因光硬化前之G'較小而引起之初期接著不良、或因光硬化後之G'過大而引起之接著可靠性之降低。因此,G'f /G'i 較佳為100以下,更佳為40以下,進而較佳為30以下,尤佳為25以下。The ratio of the storage modulus of the adhesive layer 2 at 25°C before and after photocuring, G'f / G'i , is preferably 2 or more. If G'f is more than twice G'i , the increase in G' caused by photocuring is greater, and both the secondary processability before photocuring and the bonding reliability after photocuring can be taken into account. G'f / G'i is more preferably 4 or more, further preferably 8 or more, and particularly preferably 10 or more. There is no particular upper limit to G'f / G'i . When G'f /G'i is too large, it is easy to cause poor initial bonding due to small G' before photocuring, or reduce bonding reliability due to excessive G' after photocuring. Therefore, G'f / G'i is preferably 100 or less, more preferably 40 or less, further preferably 30 or less, and particularly preferably 25 or less.

附設補強膜後之被黏著體存在進行以複數個積層構件之積層界面之親和性提昇等為目的之高壓釜處理處理、或為了電路構件接合之熱壓著等加熱處理的情況。於進行此種加熱處理時,較佳為補強膜與被黏著體之間之黏著劑不自端面流動。The adherend with the reinforcement film may be subjected to a heat treatment such as autoclave treatment for the purpose of improving the affinity of the laminated interface of multiple laminated components, or heat pressing for bonding circuit components. When such a heat treatment is performed, it is preferred that the adhesive between the reinforcement film and the adherend does not flow from the end surface.

就抑制高溫加熱時之黏著劑之溢出之觀點而言,光硬化後之黏著劑層2之100℃下之儲存模數較佳為5×104 Pa以上,更佳為8×104 Pa以上,進而較佳為1×105 Pa以上。就防止加熱時之黏著劑之溢出、以及防止加熱時之接著力降低之觀點而言,光硬化後之黏著劑層2之100℃下之儲存模數較佳為50℃下之儲存模數之60%以上,更佳為65%以上,進而較佳為70%以上,尤佳為75%以上。From the viewpoint of suppressing the overflow of the adhesive during high temperature heating, the storage modulus of the adhesive layer 2 after light curing at 100°C is preferably 5×10 4 Pa or more, more preferably 8×10 4 Pa or more, and further preferably 1×10 5 Pa or more. From the viewpoint of preventing the overflow of the adhesive during heating and preventing the decrease in adhesion during heating, the storage modulus of the adhesive layer 2 after light curing at 100°C is preferably 60% or more of the storage modulus at 50°C, more preferably 65% or more, further preferably 70% or more, and particularly preferably 75% or more.

[補強膜之使用形態] 本發明之補強膜係貼合於各種裝置之構成構件(半成品)、或完成後之裝置而使用。由於藉由貼合補強膜可賦予適度之剛性,因此可期待操作性提昇或破損防止效果。於裝置之製造步驟中,於對半成品貼合補強膜之情形時,可對切斷成製品尺寸之前之大的半成品貼合補強膜。亦可將補強膜以卷對卷貼合於藉由卷對卷處理(role to role process)而製造之裝置之母輥。[Usage form of reinforcing film] The reinforcing film of the present invention is used by laminating components (semi-finished products) of various devices or finished devices. Since appropriate rigidity can be imparted by laminating the reinforcing film, it can be expected that the operability can be improved or the damage prevention effect can be achieved. In the manufacturing step of the device, when laminating the reinforcing film to the semi-finished product, the reinforcing film can be laminating to the semi-finished product that is large before being cut into the product size. The reinforcing film can also be laminating the reinforcing film roll-to-roll to the mother roll of the device manufactured by the roll-to-roll process (role to role process).

隨著裝置之高度積體化、小型輕量化及薄型化,存在構成裝置之構件之厚度變小之傾向。由於構成構件之薄型化,容易產生起因於積層界面之應力等而引起之彎曲或捲曲。又,由於薄型化,容易產生由自重引起之撓曲。由於藉由貼合補強膜能夠對被黏著體賦予剛性,因此可抑制由應力或自重等而引起之彎曲、捲曲、撓曲等,且操作性提昇。因此,可藉由於裝置之製造步驟中對半成品貼合補強膜而防止由自動化之裝置而引起之搬送或加工時之不良或不良情況。As devices become more highly integrated, smaller, lighter, and thinner, there is a tendency for the thickness of components that make up the devices to become smaller. As components become thinner, bending or curling due to stress at the layer interface is more likely to occur. Also, due to thinness, deflection due to its own weight is more likely to occur. Since the adherend can be given rigidity by laminating a reinforcing film, bending, curling, deflection, etc. caused by stress or its own weight can be suppressed, and operability is improved. Therefore, defects or adverse conditions during transportation or processing caused by automated equipment can be prevented by laminating a reinforcing film to the semi-finished product during the manufacturing step of the device.

於自動搬送中,作為搬送對象之半成品與搬送臂或銷等之接觸不可避免。又,存在為了形狀之調整或去除無用部分而進行半成品之切斷加工之情況。經高度積體化、小型輕量化及薄型化之裝置於與搬送裝置等之接觸或切斷加工時,容易產生因局部之應力之集中而引起之破損。於積層複數個構件而成之裝置之製造步驟中,不僅存在將構件依序積層之情況,而且存在自半成品將構件之一部分或工程材料等剝離去除之情況。於構件進行過薄型化之情形時,存在應力局部地集中於剝離部位及其附近而產生破損或尺寸變化之情況。由於補強膜具有藉由黏著劑層而得之應力分散性,因此可藉由對搬送對象物及加工對象物貼合補強膜,而賦予適度之剛性,並且使應力得到緩和、分散從而抑制龜裂、破裂、剝落、尺寸變化等不良情況。During automatic transport, it is inevitable that the semi-finished product being transported will come into contact with the transport arm or pins. In addition, there are cases where the semi-finished product is cut to adjust the shape or remove useless parts. When a highly integrated, small, light, and thin device comes into contact with a transport device or undergoes a cutting process, it is easy for damage caused by local stress concentration to occur. In the manufacturing process of a device formed by stacking multiple components, not only are the components stacked in sequence, but also a part of the component or engineering material is peeled off and removed from the semi-finished product. When the component is too thin, stress is locally concentrated on the peeled portion and its vicinity, causing damage or dimensional changes. Since the reinforcing film has stress dispersion properties obtained through the adhesive layer, it can be applied to the transported and processed objects to impart appropriate rigidity, and the stress can be relieved and dispersed, thereby suppressing undesirable conditions such as cracking, rupture, peeling, and dimensional changes.

如此,由於藉由貼合本發明之補強膜,可對作為被黏著體之半成品賦予適度之剛性,並且使應力得到緩和、分散,因此能夠抑制於製造步驟中有可能產生之各種不良情況,使生產效率提昇,改善良率。又,補強膜由於在使黏著劑層光硬化之前,自被黏著體之剝離較容易,因此於積層或產生貼合不良之情形時亦容易二次加工。Thus, by attaching the reinforcing film of the present invention, the semi-finished product as the adherend can be given appropriate rigidity, and the stress can be relieved and dispersed, so that various undesirable conditions that may occur in the manufacturing steps can be suppressed, so that the production efficiency is improved and the yield rate is improved. In addition, since the reinforcing film is easier to peel off from the adherend before the adhesive layer is light-cured, it is also easier to perform secondary processing during lamination or when poor lamination occurs.

本發明之補強膜其黏著劑層2為光硬化性,可任意地設定硬化之時點。二次加工或補強膜之加工等處理由於可於將被黏著體黏貼設置於補強膜之後至使黏著劑光硬化前之間之任意時點實施,因此可靈活地應對裝置之製造步驟之準備時間。如上所述,由於黏著劑層除光硬化劑及光自由基起始劑以外含有抗氧化劑,故而不易進行由螢光燈等之光而引起之光硬化。因此,即便於以將補強膜黏貼設置於被黏著體之狀態長時間保管之情形時,只要為光硬化之前,補強膜亦容易自被黏著體剝離。The adhesive layer 2 of the reinforcing film of the present invention is photocurable, and the curing time can be set arbitrarily. Since the secondary processing or processing of the reinforcing film can be carried out at any time between the time when the adherend is attached to the reinforcing film and before the adhesive is photocured, the preparation time of the manufacturing steps of the device can be flexibly coped with. As mentioned above, since the adhesive layer contains an antioxidant in addition to the photocuring agent and the photoradical initiator, it is not easy to be photocured by light such as a fluorescent lamp. Therefore, even if the reinforcing film is attached to the adherend and stored for a long time, the reinforcing film can be easily peeled off from the adherend before photocuring.

於完成後之裝置之使用中,於因裝置之掉落、重貨於裝置上之載置、飛來物對裝置之碰撞等而意外地負擔外力之情形時,亦可藉由貼合補強膜而防止裝置之破損。又,使黏著劑光硬化後之補強膜由於牢固地接著於裝置,因此於長期使用中,補強膜亦不易剝落,且可靠性優異。 [實施例]When the device is used after completion, if it is accidentally subjected to external forces due to the device falling, heavy goods being placed on the device, or flying objects colliding with the device, the device can be prevented from being damaged by affixing the reinforcing film. In addition, since the reinforcing film is firmly attached to the device after the adhesive is photocured, it is not easy to peel off during long-term use, and the reliability is excellent. [Example]

以下列舉實施例進一步進行說明,但本發明並不限定於該等實施例。The invention is further described with reference to the following embodiments, but the invention is not limited to these embodiments.

[補強膜之製作] <基礎聚合物之聚合> 於具備溫度計、攪拌機、回流冷凝管及氮氣導入管之反應容器中投入作為單體之丙烯酸2-乙基己酯(2EHA)63重量份、N-乙烯基吡咯啶酮(NVP)15重量份、甲基丙烯酸甲酯(MMA)9重量份、及丙烯酸羥基乙酯(HEA)13重量份、作為熱聚合起始劑之偶氮雙異丁腈0.2重量份、以及作為溶劑之乙酸乙酯233重量份,並流入氮氣,一面攪拌一面進行約1小時氮氣置換。其後,加熱至60℃,使之反應7小時,獲得重量平均分子量(Mw)為120萬之丙烯酸系聚合物之溶液。[Preparation of reinforcing film] <Polymerization of base polymer> In a reaction vessel equipped with a thermometer, a stirrer, a reflux condenser and a nitrogen inlet tube, 63 parts by weight of 2-ethylhexyl acrylate (2EHA) as monomers, 15 parts by weight of N-vinyl pyrrolidone (NVP), 9 parts by weight of methyl methacrylate (MMA), and 13 parts by weight of hydroxyethyl acrylate (HEA), 0.2 parts by weight of azobisisobutyronitrile as a thermal polymerization initiator, and 233 parts by weight of ethyl acetate as a solvent were added, and nitrogen was flowed in, and nitrogen replacement was performed for about 1 hour while stirring. Thereafter, the mixture was heated to 60°C and reacted for 7 hours to obtain a solution of an acrylic polymer with a weight average molecular weight (Mw) of 1.2 million.

<黏著劑組合物之製備> 於丙烯酸系聚合物溶液中添加作為交聯劑之三井化學製造之「Takenate D110N」(苯二甲基二異氰酸酯之三羥甲基丙烷加成物之75%乙酸乙酯溶液)、作為多官能丙烯酸系單體之新中村化學工業製造之「A-200」(聚乙二醇#200(n=4)二丙烯酸酯;分子量308,官能基當量154 g/eq)、光自由基起始劑、及抗氧化劑並均勻地混合,製備黏著劑組合物。交聯劑之調配量(固形物成分)設為相對於基礎聚合物100重量份為2.5重量份,多官能丙烯酸系單體之調配量設為相對於基礎聚合物100重量份為30重量份。作為抗氧化劑,以表1所示之量調配季戊四醇四[3-(3,5-二第三丁基-4-羥基苯基)丙酸酯](BASF製造之「Irganox 1010」)。作為光自由基起始劑,以表1所示之量調配以下所示者。<Preparation of adhesive composition> Mitsui Chemicals' "Takenate D110N" (75% ethyl acetate solution of trihydroxymethylpropane adduct of xylylene diisocyanate) as a crosslinking agent, Shin-Nakamura Chemical Industries' "A-200" (polyethylene glycol #200 (n=4) diacrylate; molecular weight 308, functional group equivalent 154 g/eq) as a multifunctional acrylic monomer, a photoradical initiator, and an antioxidant were added to the acrylic polymer solution and uniformly mixed to prepare an adhesive composition. The amount of the crosslinking agent (solid content) was set to 2.5 parts by weight relative to 100 parts by weight of the base polymer, and the amount of the multifunctional acrylic monomer was set to 30 parts by weight relative to 100 parts by weight of the base polymer. As an antioxidant, pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate] ("Irganox 1010" manufactured by BASF) was prepared in the amount shown in Table 1. As a photo-radical initiator, the following was prepared in the amount shown in Table 1.

(光自由基起始劑) IRG184:1-羥基環己基苯基酮(BASF製造之「Irgacure 184」,吸收極大波長:246 nm、280 nm、333 nm) IRG651:2,2-二甲氧基-1,2-二苯基乙烷-1-酮(BASF製造之「Irgacure 651」,吸收極大波長:250 nm、340 nm) IRG819:雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦(BASF製造之「Irgacure 819」,吸收極大波長:295 nm、370 nm)(Photoradical initiator) IRG184: 1-Hydroxycyclohexylphenyl ketone ("Irgacure 184" manufactured by BASF, absorption peak wavelengths: 246 nm, 280 nm, 333 nm) IRG651: 2,2-dimethoxy-1,2-diphenylethane-1-one ("Irgacure 651" manufactured by BASF, absorption peak wavelengths: 250 nm, 340 nm) IRG819: Bis(2,4,6-trimethylbenzyl)-phenylphosphine oxide ("Irgacure 819" manufactured by BASF, absorption peak wavelengths: 295 nm, 370 nm)

<黏著劑溶液之塗佈及交聯> 於未經表面處理之厚度75 μm之聚對苯二甲酸乙二酯膜(Toray製造之「Lumirror S10」)上以乾燥後之厚度成為25 μm之方式使用槽輥塗佈上述黏著劑組合物。於130℃下乾燥1分鐘將溶劑去除,其後,於黏著劑之塗佈面貼合隔離件(表面進行過聚矽氧脫模處理之厚度25 μm之聚對苯二甲酸乙二酯膜)之脫模處理面。其後,於25℃之環境下進行4天之老化處理,使交聯進行,而獲得於膜基材上固著積層有光硬化性黏著片且於其上暫黏有隔離件之補強膜。<Adhesive solution application and cross-linking> The adhesive composition was applied to a 75 μm thick polyethylene terephthalate film ("Lumirror S10" manufactured by Toray) without surface treatment using a slot roll so that the thickness after drying was 25 μm. The solvent was removed by drying at 130°C for 1 minute, and then the release-treated surface of the spacer (25 μm thick polyethylene terephthalate film with silicone release treatment) was attached to the adhesive-coated surface. Afterwards, an aging treatment was performed at 25° C. for 4 days to allow crosslinking to proceed, thereby obtaining a reinforcement film in which a photocurable adhesive sheet was fixedly laminated on a film substrate and a spacer was temporarily adhered thereon.

[接著力之測定] 將厚度12.5 μm之聚醯亞胺膜(DU PONT-TORAY製造之「Kapton 50EN」)經由雙面膠帶(日東電工製造之「No.531」)貼附於玻璃板,獲得測定用聚醯亞胺膜基板。自切取為寬度25 mm×長度100 mm之補強膜之表面將隔離件剝離去除,並使用手壓輥貼合於測定用聚醯亞胺膜基板,作為光硬化前之試驗樣品。自光硬化前之試驗樣品之補強膜側(PET膜側)使用波長365 nm之LED光源照射累計光量400 mJ/cm2 之紫外線使黏著劑層光硬化,將所得者作為光硬化後之試驗樣品。使用該等試驗樣品,利用夾頭保持作為補強膜之聚對苯二甲酸乙二酯膜之端部,以拉伸速度300 mm/min進行補強膜之180°剝離,並測定剝離強度。[Measurement of adhesion force] A polyimide film with a thickness of 12.5 μm ("Kapton 50EN" manufactured by DU PONT-TORAY) was attached to a glass plate via a double-sided tape ("No.531" manufactured by Nitto Denko) to obtain a polyimide film substrate for measurement. The isolation piece was peeled off from the surface of the reinforcement film cut to a width of 25 mm × a length of 100 mm, and then attached to the polyimide film substrate for measurement using a hand roller as a test sample before light curing. The reinforcing film side (PET film side) of the test sample before light curing was irradiated with ultraviolet light with a cumulative light amount of 400 mJ/ cm2 using a LED light source with a wavelength of 365 nm to light cure the adhesive layer, and the obtained product was used as the test sample after light curing. Using these test samples, the ends of the polyethylene terephthalate film as the reinforcing film were held by a chuck, and the reinforcing film was peeled off 180° at a tensile speed of 300 mm/min, and the peeling strength was measured.

<一定時間保管後之補強膜之接著力之評價> 將補強片材於常溫之明室下靜置,於1週後及4週後,與測定用聚醯亞胺膜基板貼合,針對光硬化前及光硬化後之試驗樣品,與上述相同地測定180°剝離強度。<Evaluation of the adhesion of the reinforcement film after storage for a certain period of time> The reinforcement sheet was placed in a bright room at room temperature, and after 1 week and 4 weeks, it was bonded to the polyimide film substrate for measurement. The 180° peel strength of the test samples before and after light curing was measured in the same way as above.

將各補強膜之黏著劑之組成、及光硬化前後之接著力之測定結果示於表1。The composition of the adhesive of each reinforcing film and the test results of the adhesion before and after light curing are shown in Table 1.

[表1] [Table 1]

任一試樣均於剛製作後,光硬化前之接著力為0.2~0.4 N/25 mm之範圍而容易自被黏著體剝離,光硬化後,接著力上升至15 N/25 mm以上,與被黏著體牢固地接著。For any sample, the adhesion force before light curing was in the range of 0.2 to 0.4 N/25 mm immediately after fabrication, and the sample was easily peeled off from the adherend. After light curing, the adhesion force increased to more than 15 N/25 mm, and the sample was firmly bonded to the adherend.

使用不含抗氧化劑之接著劑之試樣10於保管4週後之試樣中,光硬化前之接著力大幅上升,難以自被黏著體剝離。另一方面,添加0.1重量份之抗氧化劑之試樣11於保管4週後之試樣中,光硬化前之接著力稍有上升,但充分可自被黏著體剝離。又,試樣11保管4週後之試樣之光硬化後之接著力與剛製作後之試樣同等。In the case of sample 10 using an adhesive without an antioxidant, the adhesive strength before light curing increased significantly after 4 weeks of storage, and it was difficult to peel off from the adherend. On the other hand, in the case of sample 11 to which 0.1 parts by weight of an antioxidant was added, the adhesive strength before light curing increased slightly after 4 weeks of storage, but it was sufficient to peel off from the adherend. In addition, the adhesive strength after light curing of sample 11 after 4 weeks of storage was equivalent to that of the sample just after production.

使用不含抗氧化劑之接著劑之試樣20及試樣30與試樣10同樣地,於保管4週後之試樣中,可觀察到光硬化前之接著力大幅上升。試樣20及試樣30於保管1週後之試樣中,光硬化前之接著力亦上升至10 N/25 mm以上。添加0.1重量份之抗氧化劑之試樣21及試樣31於保管1週後之試樣中,亦光硬化前接著力較低,且光硬化後表現出較高之接著力。Samples 20 and 30 using adhesives without antioxidants showed a significant increase in adhesion before light curing after 4 weeks of storage, similar to Sample 10. The adhesion before light curing also increased to more than 10 N/25 mm for Samples 20 and 30 after 1 week of storage. Samples 21 and 31 to which 0.1 parts by weight of antioxidants were added also showed lower adhesion before light curing after 1 week of storage, and showed higher adhesion after light curing.

根據以上結果之對比,可知:藉由將光自由基起始劑與抗氧化劑併用,可獲得如下補強膜,其即便於在螢光燈下長時間保管之情形時,光硬化前自被黏著體剝離之二次加工性亦優異,且藉由光硬化對被黏著體表現出較高之接著力。According to the comparison of the above results, it can be seen that by using the photo-radical initiator and the antioxidant together, the following reinforced film can be obtained, which has excellent secondary processability of being peeled off from the adherend before photocuring even when stored under fluorescent light for a long time, and exhibits higher adhesion to the adherend through photocuring.

添加抗氧化劑0.5重量份之試樣12保管1週後,藉由光硬化而得之接著力之上升率降低,保管4週後,即便照射紫外線,接著力亦幾乎未上升。添加抗氧化劑1重量份之試樣13於保管1週後,藉由紫外線照射而得之接著力之上升亦不充分。於試樣21~23之對比、及試樣31~33之對比中,亦可見隨著抗氧化劑之添加量之增加,即便進行紫外線照射,接著力亦不會上升之傾向。After one week of storage, the rate of increase in adhesion obtained by light curing of sample 12 with 0.5 parts by weight of antioxidant added decreased, and after four weeks of storage, the adhesion hardly increased even after UV irradiation. After one week of storage, the adhesion of sample 13 with 1 part by weight of antioxidant added was not sufficiently increased by UV irradiation. In the comparison of samples 21 to 23 and samples 31 to 33, it can be seen that as the amount of antioxidant added increases, the adhesion does not increase even after UV irradiation.

根據該等結果,可謂於抗氧化劑之添加量較大之情形時,存在隨著距製備試樣之保管時間變長而難以進行光硬化之傾向。認為其原因在於:隨著距製備試樣之螢光燈下之保管時間變長,光自由基起始劑失活,即便進行紫外線照射,自由基生成量亦較小。According to these results, when the amount of antioxidant added is large, there is a tendency for light curing to be difficult as the storage time from the preparation sample increases. The reason is believed to be that as the storage time from the preparation sample under the fluorescent lamp increases, the photo-free radical initiator is inactivated, and even if ultraviolet irradiation is performed, the amount of free radicals generated is small.

若於螢光燈下之保管時間變長,光自由基起始劑之實效濃度降低,則於紫外線照射時生成之自由基量減少。抗氧化劑具有捕獲因保管環境之螢光燈等之光而自光自由基起始劑生成之自由基,阻礙不期望之光自由基聚合的作用,但於為了光硬化而照射紫外線之情形時,亦具有捕獲自由基之作用。因此,於在螢光燈下之保管時間變長,光自由基起始劑之實效濃度較低之情形時,自光自由基起始劑生成之光自由基中被抗氧化劑捕獲之自由基之比率變高,有助於光自由基聚合之自由基之比率變低。由於抗氧化劑之含量越大,聚合抑制效果(聚合阻礙)越大,故而認為:即便照射紫外線亦不易進行光硬化劑之光自由基反應,接著力不會充分地上升。If the storage time under fluorescent lamps increases, the effective concentration of photoradical initiators decreases, and the amount of free radicals generated during ultraviolet irradiation decreases. Antioxidants have the function of capturing free radicals generated from photoradical initiators due to light from fluorescent lamps in the storage environment, and inhibiting undesired photoradical polymerization. However, they also have the function of capturing free radicals when irradiating ultraviolet rays for photocuring. Therefore, when the storage time under fluorescent lamps increases and the effective concentration of photoradical initiators is low, the ratio of free radicals captured by antioxidants among the photoradicals generated from photoradical initiators increases, and the ratio of free radicals that contribute to photoradical polymerization decreases. Since the greater the content of the antioxidant, the greater the polymerization inhibition effect (polymerization barrier), it is considered that even if irradiated with ultraviolet rays, the photo radical reaction of the photocuring agent is not easy to proceed, and the bonding strength will not be sufficiently increased.

根據以上結果,可知:藉由適當地調整與光自由基起始劑併用之抗氧化劑之量,可獲得如下補強膜:其即便於在螢光燈下之保管時間較長之情形時,光硬化前自被黏著體剝離之二次加工性亦優異,且藉由紫外線照射適當地進行光硬化,能夠實現較高之接著力。Based on the above results, it can be seen that by properly adjusting the amount of antioxidant used in combination with the photo-radical initiator, the following reinforced film can be obtained: even when stored under fluorescent light for a long time, the secondary processability of peeling off from the adherend before photocuring is excellent, and by properly performing photocuring by ultraviolet irradiation, a higher adhesion can be achieved.

[藉由電子自旋共振而進行之自由基濃度之測定及探討] 為了驗證上述實施例中所使用之光自由基起始劑之自由基生成量及抗氧化劑之效果,以極低溫照射光,並藉由ESR評價自由基生成量。[Determination and discussion of free radical concentration by electron spin resonance] In order to verify the free radical generation amount and antioxidant effect of the photo-free radical initiator used in the above-mentioned embodiment, light was irradiated at extremely low temperature and the free radical generation amount was evaluated by ESR.

針對單獨使用光自由基起始劑(IRG184、IRG651或IRG819)、單獨使用抗氧化劑(Irganox 1010)、及光自由基起始劑(Irg651或Irg819)與抗氧化劑之併用體系之各者,製備濃度0.2莫耳/L之乙酸乙酯溶液(併用體系中係將各者之濃度設為0.2莫耳/L)。將試樣溶液0.1 mL裝填於ESR試樣管(約3.5 mmϕ之石英管),並設置於ESR之腔內,以溫度40 K實施光照射ESR測定。光照射之燈使用超高壓水銀燈(Ushio製造),藉由玻璃濾波器截斷波長290 nm以下之短波長光,並藉由水濾波器截斷熱線。於腔之正面所測得之照度(波長365 nm)為18 mW/cm2 。將裝置及主要測定條件示於以下。For each of the systems using a photoradical initiator (IRG184, IRG651 or IRG819) alone, an antioxidant (Irganox 1010) alone, and a combination of a photoradical initiator (Irg651 or Irg819) and an antioxidant, a 0.2 mol/L ethyl acetate solution was prepared (the concentration of each in the combination system was set to 0.2 mol/L). 0.1 mL of the sample solution was filled into an ESR sample tube (quartz tube of about 3.5 mmφ), and placed in the ESR chamber, and light irradiation ESR measurement was performed at a temperature of 40 K. The light irradiation lamp used was an ultra-high pressure mercury lamp (manufactured by Ushio), and short wavelength light below 290 nm was cut off by a glass filter, and heat radiation was cut off by a water filter. The illuminance measured at the front of the cavity (wavelength 365 nm) was 18 mW/cm 2 . The apparatus and main measurement conditions are shown below.

裝置:ESP350E(BRUKER製造) 附屬裝置:HP5351B微波頻率計數器(HEWLETT PACKARD製造) ER035M高斯計(BRUKER製造) ESR910低溫恆溫器(BRUKER製造) 腔:TM110,圓筒型 測定溫度:40 K 中心磁場:3385 G 磁場掃描寬度:400 G 調變:100 kHz,10 G 微波:9.49 GHz,0.16 mW 掃描時間:83.89秒×2次 時間常數:327.68毫秒 資料點數:1024Device: ESP350E (BRUKER) Accessories: HP5351B microwave frequency counter (HEWLETT PACKARD) ER035M Gaussmeter (BRUKER) ESR910 cryostat (BRUKER) Cavity: TM110, cylindrical Measurement temperature: 40 K Central magnetic field: 3385 G Magnetic field scan width: 400 G Modulation: 100 kHz, 10 G Microwave: 9.49 GHz, 0.16 mW Scan time: 83.89 seconds × 2 times Time constant: 327.68 milliseconds Number of data points: 1024

根據距光照射開始5分鐘後、10分鐘後、20分鐘後、30分鐘後、40分鐘後、50分鐘後及60分鐘後之ESR光譜,藉由校準曲線法對自由基量進行定量。針對各試樣,將對光照射時間及自由基濃度進行繪製而得之曲線圖示於圖4。The amount of free radicals was quantified by the calibration curve method based on the ESR spectra at 5 minutes, 10 minutes, 20 minutes, 30 minutes, 40 minutes, 50 minutes, and 60 minutes after the start of light irradiation. For each sample, the light irradiation time and free radical concentration were plotted and the curves are shown in Figure 4.

針對3種光自由基起始劑進行觀察,Irgacure 819(IRG819)顯示出最高之自由基生成量。認為其原因在於:IRG819於波長370 nm顯示吸收極大,對照射光(波長365 nm)之感度較高。Irgacure 184(IRG184)及Irgacure 651(IRG651)中,Irgacure 651顯示較大之自由基生成量。Among the three photo-radical initiators, Irgacure 819 (IRG819) showed the highest amount of free radical generation. The reason is believed to be that IRG819 shows a high absorption at a wavelength of 370 nm and is more sensitive to irradiated light (wavelength 365 nm). Among Irgacure 184 (IRG184) and Irgacure 651 (IRG651), Irgacure 651 showed a greater amount of free radical generation.

可見該等之自由基生成量與試樣10、試樣20及試樣30於螢光燈下保管時之光硬化前之接著力之變化之間存在關聯。即,認為:Irgacure 184由於由來自螢光燈之光引起之自由基之生成量較小,故而試樣10於保管1週後未見到光硬化前之接著力之上升,相對於此,使用Irgacure 651之試樣20及使用Irgacure 819之試樣30由於由來自螢光燈之光引起之光自由基生成量相對較大,故而於保管1週後之試樣中,光硬化前之接著力上升。It can be seen that there is a correlation between the amount of free radicals generated and the change in the adhesion before light curing when samples 10, 20, and 30 were stored under fluorescent lamps. That is, it is considered that since the amount of free radicals generated by the light from the fluorescent lamp is small for Irgacure 184, the adhesion before light curing did not increase after one week of storage for sample 10. In contrast, since the amount of photo free radicals generated by the light from the fluorescent lamp is relatively large for sample 20 using Irgacure 651 and sample 30 using Irgacure 819, the adhesion before light curing increased in the samples after one week of storage.

抗氧化劑(Irganox 1010)顯示出高於3種光自由基起始劑之自由基濃度。認為其原因在於自抗氧化劑生成之自由基之穩定性較高,與光自由基起始劑相比,自由基消失量較小,因此隨著光照射時間之增加,體系中累積之自由基量較多。The antioxidant (Irganox 1010) showed a higher free radical concentration than the three photo-radical initiators. The reason is believed to be that the free radicals generated by the antioxidant are more stable and disappear less than those of the photo-radical initiators. Therefore, as the light irradiation time increases, the amount of free radicals accumulated in the system is greater.

於光自由基起始劑(IRG651或IRG819)與抗氧化劑之併用體系中,顯示出低於抗氧化劑單獨使用之情形時之自由基濃度。由於併用體系之自由基濃度小於單獨使用光自由基起始劑之情形及單獨使用抗氧化劑之情形之合計,故而認為自光自由基起始劑生成之自由基被抗氧化劑捕獲。In the system of using a photo-radical initiator (IRG651 or IRG819) and an antioxidant together, the free radical concentration was lower than that when the antioxidant was used alone. Since the free radical concentration of the combined system was lower than the sum of the cases of using a photo-radical initiator alone and the case of using an antioxidant alone, it is believed that the free radicals generated from the photo-radical initiator were captured by the antioxidant.

1‧‧‧膜基材 2‧‧‧黏著劑層 5‧‧‧隔離件 10‧‧‧補強膜 20‧‧‧裝置1. Film substrate 2. Adhesive layer 5. Isolation element 10. Reinforcement film 20. Device

圖1係表示補強膜之積層構成之剖視圖。 圖2係表示補強膜之積層構成之剖視圖。 圖3係表示黏貼設置有補強膜之裝置之剖視圖。 圖4係表示由極低溫下之光照射引起之自由基生成量之測定結果的曲線圖。FIG1 is a cross-sectional view showing the laminated structure of the reinforcing film. FIG2 is a cross-sectional view showing the laminated structure of the reinforcing film. FIG3 is a cross-sectional view showing a device with the reinforcing film attached thereto. FIG4 is a graph showing the results of measuring the amount of free radicals generated by light irradiation at extremely low temperatures.

Claims (8)

一種補強膜,其具備膜基材、及固著積層於上述膜基材之一主面上之黏著劑層;上述黏著劑層包含含有基礎聚合物、光硬化劑、光自由基起始劑、及抗氧化劑之光硬化性組合物,且相對於上述基礎聚合物100重量份包含上述光硬化劑10~50重量份、上述光自由基起始劑0.01~1重量份、及上述抗氧化劑0.01~2重量份,上述抗氧化劑之含量為上述光自由基起始劑之含量之0.2~3倍。 A reinforcing film comprises a film substrate and an adhesive layer fixedly laminated on one main surface of the film substrate; the adhesive layer comprises a photocurable composition containing a base polymer, a photocuring agent, a photoradical initiator, and an antioxidant, and the adhesive layer comprises 10 to 50 parts by weight of the photocuring agent, 0.01 to 1 part by weight of the photoradical initiator, and 0.01 to 2 parts by weight of the antioxidant relative to 100 parts by weight of the base polymer, and the content of the antioxidant is 0.2 to 3 times the content of the photoradical initiator. 如請求項1之補強膜,其中上述光自由基起始劑於波長310nm~355nm之範圍具有吸收極大,且於長於360nm之波長不顯示吸收極大。 As in claim 1, the photo-radical initiator has an absorption peak in the wavelength range of 310nm to 355nm, and does not show an absorption peak at wavelengths longer than 360nm. 如請求項1或2之補強膜,其中上述基礎聚合物含有選自由含羥基單體及含羧基單體所組成之群中之1種以上作為單體單元,且藉由與羥基或羧基鍵結之交聯劑導入有交聯結構。 As in claim 1 or 2, the reinforcing film, wherein the base polymer contains one or more monomer units selected from the group consisting of hydroxyl-containing monomers and carboxyl-containing monomers, and a cross-linking structure is introduced by a cross-linking agent bonded to a hydroxyl group or a carboxyl group. 如請求項1或2之補強膜,其含有丙烯酸系聚合物作為上述基礎聚合物。 The reinforcing film of claim 1 or 2 contains an acrylic polymer as the above-mentioned base polymer. 如請求項4之補強膜,其中上述丙烯酸系聚合物含有均聚物之玻璃轉移溫度為40℃以上之單體成分5~50重量%。 As in claim 4, the reinforcing film, wherein the acrylic polymer contains 5 to 50% by weight of a monomer component whose homopolymer glass transition temperature is above 40°C. 如請求項1或2之補強膜,其中上述光硬化劑為多官能(甲基)丙烯酸酯。 As in the reinforcing film of claim 1 or 2, the photocuring agent is a multifunctional (meth)acrylate. 如請求項1或2之補強膜,其中上述光硬化劑之官能基當量為100~500g/eq。 For the reinforcing film of claim 1 or 2, the functional group equivalent of the above-mentioned photocuring agent is 100~500g/eq. 如請求項1或2之補強膜,其中光硬化前之上述黏著劑層與聚醯亞胺膜之接著力為0.005~5N/25mm,且上述黏著劑層光硬化後與聚醯亞胺膜之接著力為6N/25mm以上。 For the reinforcing film of claim 1 or 2, the adhesion between the adhesive layer and the polyimide film before light curing is 0.005~5N/25mm, and the adhesion between the adhesive layer and the polyimide film after light curing is 6N/25mm or more.
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