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Priority claimed from CN202210319342.4Aexternal-prioritypatent/CN116925628A/en
Application filed by 大陸商江蘇菲沃泰納米科技股份有限公司filedCritical大陸商江蘇菲沃泰納米科技股份有限公司
Publication of TW202338061ApublicationCriticalpatent/TW202338061A/en
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Publication of TWI846402BpublicationCriticalpatent/TWI846402B/en
Composition for forming resist underlayer film, resist underlayer film and method for forming same, method for forming pattern, compound and method for producing same
Method and apparatus for manufacturing aerosol-generation rod, and aerosol-generation article comprising aerosol-generation rod manufactured by method and apparatus