TWI842957B - Electromagnetic wave shielding film - Google Patents

Electromagnetic wave shielding film Download PDF

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TWI842957B
TWI842957B TW109133414A TW109133414A TWI842957B TW I842957 B TWI842957 B TW I842957B TW 109133414 A TW109133414 A TW 109133414A TW 109133414 A TW109133414 A TW 109133414A TW I842957 B TWI842957 B TW I842957B
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shielding film
layer
adhesive layer
conductive adhesive
conductive particles
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TW109133414A
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TW202132514A (en
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梅村滋和
磯部修
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日商拓自達電線股份有限公司
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Abstract

本發明提供一種電磁波屏蔽膜,其即使於導電性接著劑層中大量調配導電性粒子時,透明性仍優異、且電性連接電阻值低。 本發明之電磁波屏蔽膜,其依序積層有第1絕緣層、奈米銀線層、第2絕緣層及導電性接著劑層;前述第2絕緣層之厚度為50~500nm;前述導電性接著劑層包含:黏結劑成分、與球狀或樹枝狀導電性粒子;前述導電性粒子之含有比率相對於前述導電性接著劑層100質量%為1~80質量%。The present invention provides an electromagnetic wave shielding film, which has excellent transparency and low electrical connection resistance even when a large amount of conductive particles are mixed in the conductive adhesive layer. The electromagnetic wave shielding film of the present invention is sequentially laminated with a first insulating layer, a nanosilver wire layer, a second insulating layer and a conductive adhesive layer; the thickness of the second insulating layer is 50-500 nm; the conductive adhesive layer contains: a binder component and spherical or branch-shaped conductive particles; the content ratio of the conductive particles is 1-80 mass % relative to 100 mass % of the conductive adhesive layer.

Description

電磁波屏蔽膜Electromagnetic wave shielding film

本發明係關於電磁波屏蔽膜。更詳細而言,本發明係關於用在印刷配線板之電磁波屏蔽膜。The present invention relates to an electromagnetic wave shielding film. More specifically, the present invention relates to an electromagnetic wave shielding film used in a printed wiring board.

背景技術Background Technology

在行動電話、照相機、筆記型電腦等電子設備中,印刷配線板多半是用來將電路組入機構中。亦還被利用於印表機打印頭等可動部與控制部的連接上。於此等電子設備中需要電磁波屏蔽對策,就連裝置內使用之印刷配線板,亦使用實施了電磁波屏蔽對策之屏蔽印刷配線板。In electronic devices such as mobile phones, cameras, and laptops, printed wiring boards are mostly used to integrate circuits into the mechanism. They are also used to connect the movable parts such as the print head of a printer and the control part. In these electronic devices, electromagnetic wave shielding measures are required, and even the printed wiring boards used in the devices use shielded printed wiring boards that implement electromagnetic wave shielding measures.

於屏蔽印刷配線板中,基於電磁波屏蔽對策之目的,使用電磁波屏蔽膜(以下有時簡稱為「屏蔽膜」)。例如,接著於印刷配線板來使用之屏蔽膜具有金屬層等屏蔽層、與設置於該屏蔽層表面之導電性接著片。In a shielded printed wiring board, an electromagnetic wave shielding film (hereinafter sometimes referred to as "shielding film") is used for the purpose of electromagnetic wave shielding. For example, the shielding film used in conjunction with the printed wiring board has a shielding layer such as a metal layer and a conductive adhesive sheet provided on the surface of the shielding layer.

至於具有導電性接著片之屏蔽膜方面,例如已知有專利文獻1及2所揭示者。上述屏蔽膜係以導電性接著片所露出之表面與印刷配線板表面、具體為設置於印刷配線板表面之覆蓋膜表面貼著之方式進行貼合而使用。此等導電性接著片通常是於高溫/高壓條件下進行熱壓接來接著及積層於印刷配線板。藉此,配置於印刷配線板上之屏蔽膜可發揮遮蔽來自印刷配線板外部的電磁波的性能(屏蔽性能)。 先行技術文獻 專利文獻As for the shielding film with a conductive adhesive sheet, for example, those disclosed in Patent Documents 1 and 2 are known. The shielding film is used by bonding the exposed surface of the conductive adhesive sheet to the surface of the printed wiring board, specifically, the surface of the covering film provided on the surface of the printed wiring board. Such conductive adhesive sheets are usually bonded and laminated on the printed wiring board by heat pressing under high temperature/high pressure conditions. Thus, the shielding film disposed on the printed wiring board can exert the performance of shielding electromagnetic waves from outside the printed wiring board (shielding performance). Prior Art Documents Patent Documents

[專利文獻1]日本特開2015-110769號公報 [專利文獻2]日本特開2012-28334號公報[Patent Document 1] Japanese Patent Publication No. 2015-110769 [Patent Document 2] Japanese Patent Publication No. 2012-28334

發明概要 發明欲解決之課題Summary of invention Problem to be solved by the invention

近年來,對於屏蔽膜,有要求黏貼於印刷配線板時容易進行對位之性能的情形。因此,對於屏蔽膜有要求透明性之傾向。關於使透明性提高之方法,考慮使用例如層厚度薄之透明導電層作為屏蔽膜之導電層。In recent years, there is a demand for shielding films to be easily aligned when attached to a printed wiring board. Therefore, there is a tendency to demand transparency for shielding films. As a method of improving transparency, for example, it is considered to use a thin transparent conductive layer as the conductive layer of the shielding film.

然而,於習知屏蔽膜中,越增加導電性接著劑層中之導電性粒子之調配量則導電性越提高,相對於此,就採用了透明導電層之屏蔽膜而言,於導電性接著劑層中大量調配導電性粒子時,則會有電性連接電阻值上升、導電性降低的問題。However, in conventional shielding films, the conductivity increases as the amount of conductive particles in the conductive adhesive layer increases. In contrast, in shielding films using a transparent conductive layer, when a large amount of conductive particles is mixed in the conductive adhesive layer, there is a problem of increased electrical connection resistance and decreased conductivity.

本發明係鑑於上述而完成者,本發明之目的在於提供一種電磁波屏蔽膜,其即使於導電性接著劑層中大量調配導電性粒子的情況下,透明性仍優異且電性連接電阻值偏低。 用以解決課題之手段The present invention is completed in view of the above, and the purpose of the present invention is to provide an electromagnetic wave shielding film, which has excellent transparency and low electrical connection resistance even when a large amount of conductive particles are mixed in the conductive adhesive layer. Means for solving the problem

本發明人等為了達成上述目的,專心致力於研究,結果發現:具有特定層構造之電磁波屏蔽膜,即使於導電性接著劑層中大量調配導電性粒子時,透明性仍優異且電性連接電阻值低。本發明係基於上述見解而完成者。The inventors of the present invention have devoted themselves to research to achieve the above-mentioned purpose and have found that an electromagnetic wave shielding film having a specific layer structure has excellent transparency and low electrical connection resistance even when a large amount of conductive particles are mixed in the conductive adhesive layer. The present invention is completed based on the above-mentioned findings.

即,本發明提供一種電磁波屏蔽膜,其依序積層有第1絕緣層、奈米銀線層、第2絕緣層及導電性接著劑層; 上述第2絕緣層之厚度為50~500nm; 上述導電性接著劑層包含:黏結劑成分、與球狀或樹枝狀導電性粒子; 上述導電性粒子之含有比率相對於上述導電性接著劑層100質量%為1~80質量%。That is, the present invention provides an electromagnetic wave shielding film, which is sequentially laminated with a first insulating layer, a nanosilver wire layer, a second insulating layer and a conductive adhesive layer; The thickness of the second insulating layer is 50-500 nm; The conductive adhesive layer contains: a binder component and spherical or branch-shaped conductive particles; The content ratio of the conductive particles is 1-80% by mass relative to 100% by mass of the conductive adhesive layer.

上述第2絕緣層與上述導電性接著劑層宜直接積層。The second insulating layer and the conductive adhesive layer are preferably directly laminated.

上述第2絕緣層宜分別以其中一面與上述導電性接著劑層直接積層、以另一面與上述奈米銀線層直接積層。The second insulating layer is preferably directly laminated with the conductive adhesive layer on one side and directly laminated with the silver nanowire layer on the other side.

上述導電性粒子之含有比率相對於上述導電性接著劑層100質量%宜為30~80質量%。The content ratio of the conductive particles is preferably 30-80 mass % relative to 100 mass % of the conductive adhesive layer.

上述電磁波屏蔽膜依循JIS K 7361-1之測定方法下的總透光率宜為10%以上。The total light transmittance of the electromagnetic wave shielding film is preferably 10% or more according to the measurement method of JIS K 7361-1.

又,本發明提供一種具備上述電磁波屏蔽膜之屏蔽印刷配線板。 發明效果Furthermore, the present invention provides a shielded printed wiring board having the above-mentioned electromagnetic wave shielding film. Effect of the invention

本發明之電磁波屏蔽膜,無論於導電性接著劑層中少量調配導電性粒子時或大量調配導電性粒子時,透明性均優異,且電性連接電阻值較低。The electromagnetic wave shielding film of the present invention has excellent transparency and low electrical connection resistance value regardless of whether a small amount of conductive particles are mixed in the conductive adhesive layer or a large amount of conductive particles are mixed in the conductive adhesive layer.

用以實施發明之形態The form used to implement the invention

[屏蔽膜] 本發明之屏蔽膜具有下述層構造:依序積層有第1絕緣層、奈米銀線層、第2絕緣層及導電性接著劑層。[Shielding film] The shielding film of the present invention has the following layer structure: a first insulating layer, a nanosilver wire layer, a second insulating layer and a conductive adhesive layer are sequentially layered.

以下,就本發明之屏蔽膜之一實施形態進行說明。圖1係顯示本發明之屏蔽膜之一實施形態的剖面示意圖。圖1所示之本發明之屏蔽膜1依序具有第1絕緣層11、奈米銀線層12、第2絕緣層13及導電性接著劑層14。The following is a description of an embodiment of the shielding film of the present invention. Fig. 1 is a cross-sectional schematic diagram showing an embodiment of the shielding film of the present invention. The shielding film 1 of the present invention shown in Fig. 1 has a first insulating layer 11, a nanosilver wire layer 12, a second insulating layer 13 and a conductive adhesive layer 14 in sequence.

(第1絕緣層) 第1絕緣層係透明基材,並於本發明之屏蔽膜中起著保護奈米銀線層及作為奈米銀線之支持體之功能。關於第1絕緣層,例如可列舉:塑膠基材(尤其是塑膠膜)、玻璃板等。第1絕緣層可為單層、亦可為相同種類或不同種類之積層體。(First insulating layer) The first insulating layer is a transparent substrate and plays the role of protecting the nanosilver wire layer and serving as a support for the nanosilver wire in the shielding film of the present invention. Examples of the first insulating layer include: a plastic substrate (especially a plastic film), a glass plate, etc. The first insulating layer may be a single layer or a laminate of the same type or different types.

關於構成上述塑膠基材之樹脂,例如可列舉:低密度聚乙烯、直鏈狀低密度聚乙烯、中密度聚乙烯、高密度聚乙烯、超低密度聚乙烯、無規共聚聚丙烯、嵌段共聚聚丙烯、均聚丙烯、聚丁烯、聚甲基戊烯、乙烯-乙酸乙烯酯共聚物(EVA)、離子聚合物、乙烯-(甲基)丙烯酸共聚物、乙烯-(甲基)丙烯酸酯(無規、交替)共聚物、乙烯-丁烯共聚物、乙烯-己烯共聚物等聚烯烴樹脂;聚胺基甲酸酯;聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯、聚對苯二甲酸丁二酯(PBT)等聚酯;聚碳酸酯(PC);聚醯亞胺(PI);聚醚醚酮(PEEK);聚醚醯亞胺;聚芳醯胺、全芳香族聚醯胺等聚醯胺;聚苯硫醚;聚碸(PS);聚醚碸(PES);聚甲基丙烯酸甲酯(PMMA)等丙烯酸樹脂;丙烯腈-丁二烯-苯乙烯共聚物(ABS);氟樹脂;聚氯乙烯;聚偏二氯乙烯;三醋酸纖維素(TAC)等纖維素樹脂;聚矽氧樹脂等。上述樹脂可僅使用一種、亦可使用二種以上。關於上述樹脂,由透明性更加優異之觀點,其中較佳為聚酯、纖維素樹脂,更佳為聚對苯二甲酸乙二酯、三醋酸纖維素。The resin constituting the above-mentioned plastic substrate may be, for example, low-density polyethylene, linear low-density polyethylene, medium-density polyethylene, high-density polyethylene, ultra-low-density polyethylene, random copolymer polypropylene, block copolymer polypropylene, homopolypropylene, polybutene, polymethylpentene, ethylene-vinyl acetate copolymer (EVA), ionic polymer, ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylate (random, alternating) copolymer, ethylene-butene copolymer, ethylene-hexene copolymer and other polyolefin resins; polyurethane; polyethylene terephthalate Polyesters such as PET, polyethylene naphthalate, and polybutylene terephthalate (PBT); polycarbonate (PC); polyimide (PI); polyetheretherketone (PEEK); polyetherimide; polyamides such as polyarylamide and wholly aromatic polyamide; polyphenylene sulfide; polysulfone (PS); polyethersulfone (PES); acrylic resins such as polymethyl methacrylate (PMMA); acrylonitrile-butadiene-styrene copolymer (ABS); fluororesin; polyvinyl chloride; polyvinylidene chloride; cellulose resins such as triacetate (TAC); silicone resins, etc. Only one type of the above resins may be used, or two or more types may be used. Among the above resins, polyester and cellulose resins are preferred from the viewpoint of having better transparency, and polyethylene terephthalate and cellulose triacetate are more preferred.

基於提高和奈米銀線層等鄰接層之密著性、保持性等目的,亦可對第1絕緣層表面(尤其是奈米銀線層側表面)實施例如:電暈放電處理、電漿處理、噴砂加工處理、臭氧暴露處理、火焰暴露處理、高壓電撃暴露處理、離子化放射線處理等物理性處理;鉻酸處理等化學性處理;利用塗佈劑(底塗劑)之易接著處理等表面處理。用以提高密著性之表面處理宜對第1絕緣層中之奈米銀線層側之表面整體實施。For the purpose of improving the adhesion and retention of the adjacent layers such as the nanosilver wire layer, the surface of the first insulating layer (especially the side surface of the nanosilver wire layer) can also be subjected to physical treatments such as: corona discharge treatment, plasma treatment, sandblasting treatment, ozone exposure treatment, flame exposure treatment, high-voltage electric shock exposure treatment, ionizing radiation treatment, etc.; chemical treatments such as chromic acid treatment; and surface treatments such as easy-to-adhesion treatment using a coating agent (primer). The surface treatment for improving adhesion is preferably applied to the entire surface of the side surface of the nanosilver wire layer in the first insulating layer.

第1絕緣層之厚度並無特別限定,宜為1~15μm、較佳為3~10μm。若上述厚度為1μm以上,可更充分地支持屏蔽膜及保護奈米銀線層。若上述厚度為15μm以下,透明性及柔軟性優異,且在經濟上也是有利的。再者,第1絕緣層為複數層構造時,上述第1絕緣層之厚度為全部層厚度的合計。The thickness of the first insulating layer is not particularly limited, and is preferably 1 to 15 μm, and more preferably 3 to 10 μm. If the thickness is 1 μm or more, the shielding film and the protective nanosilver wire layer can be more fully supported. If the thickness is 15 μm or less, the transparency and flexibility are excellent, and it is also economically advantageous. Furthermore, when the first insulating layer is a multi-layer structure, the thickness of the first insulating layer is the total thickness of all layers.

(奈米銀線層) 上述奈米銀線層係於本發明之屏蔽膜中作為屏蔽層而起作用的要件。上述奈米銀線層可為單層、亦可為相同種類或不同種類之積層體。(Nanosilver wire layer) The above-mentioned nanosilver wire layer is a necessary element for functioning as a shielding layer in the shielding film of the present invention. The above-mentioned nanosilver wire layer may be a single layer or a laminate of the same type or different types.

上述奈米銀線層之厚度宜為20~500nm、較佳為50~150nm。若上述厚度為20nm以上,可維持高屏蔽性能。若上述厚度為500nm以下,屏蔽膜之透明性優異。再者,奈米銀線層為複數層構造時,上述奈米銀線層之厚度為全部層厚度的合計。The thickness of the nanosilver wire layer is preferably 20-500nm, preferably 50-150nm. If the thickness is 20nm or more, high shielding performance can be maintained. If the thickness is 500nm or less, the transparency of the shielding film is excellent. Furthermore, when the nanosilver wire layer is a multi-layer structure, the thickness of the nanosilver wire layer is the total thickness of all layers.

(第2絕緣層) 第2絕緣層為保護奈米銀線層之透明層。藉由第2絕緣層介存於奈米銀線層與導電性接著劑層之間,可抑制透明性及連接穩定性降低。上述透明性及連接穩定性降低推測是奈米銀線層因與導電性接著劑層中之導電性粒子摩擦而損傷所致。第2絕緣層為單層或複數層均可。(Second insulating layer) The second insulating layer is a transparent layer that protects the nanosilver wire layer. By interposing the second insulating layer between the nanosilver wire layer and the conductive adhesive layer, the decrease in transparency and connection stability can be suppressed. The above-mentioned decrease in transparency and connection stability is presumed to be caused by the nanosilver wire layer being damaged by friction with the conductive particles in the conductive adhesive layer. The second insulating layer can be a single layer or multiple layers.

第2絕緣層宜包含黏結劑成分。關於上述黏結劑成分,可列舉:熱塑性樹脂、熱硬化性樹脂、活性能量線硬化性化合物等。關於上述熱塑性樹脂、熱硬化性樹脂及活性能量線硬化性化合物,分別可列舉後述作為導電性接著劑層能夠包含之黏結劑成分而例示者。上述黏結劑成分可僅使用一種、亦可使用二種以上。The second insulating layer preferably contains a binder component. The above-mentioned binder component may include thermoplastic resins, thermosetting resins, active energy ray-curable compounds, etc. The above-mentioned thermoplastic resins, thermosetting resins, and active energy ray-curable compounds may include the binder components that can be included in the conductive adhesive layer as described below. The above-mentioned binder component may be used alone or in combination of two or more.

第2絕緣層中之上述黏結劑成分之含量並無特別限定,但相對於第2絕緣層100質量%宜為70質量%以上、較佳為80質量%以上、更佳為90質量%以上。若上述含量為70質量%以上,柔軟性更加優異、朝小直徑孔洞之填埋性優異且連接穩定性更優異。The content of the above-mentioned binder component in the second insulating layer is not particularly limited, but is preferably 70% by mass or more, more preferably 80% by mass or more, and more preferably 90% by mass or more relative to 100% by mass of the second insulating layer. If the above-mentioned content is 70% by mass or more, the flexibility is better, the filling property of small diameter holes is better, and the connection stability is better.

於無損本發明效果之範圍內,第2絕緣層亦可含有上述黏結劑成分以外的其他成分。關於上述其他成分,例如可列舉:硬化劑、硬化促進劑、塑化劑、阻燃劑、消泡劑、黏度調整劑、抗氧化劑、稀釋劑、防沉劑、填充劑、調平劑、偶合劑、紫外線吸收劑、黏著賦予樹脂、抗結塊劑等。上述其他成分可僅使用一種、亦可使用二種以上。The second insulating layer may also contain other components other than the above-mentioned binder component within the scope of not impairing the effect of the present invention. The above-mentioned other components include, for example: hardener, hardening accelerator, plasticizer, flame retardant, defoamer, viscosity adjuster, antioxidant, diluent, anti-settling agent, filler, leveler, coupling agent, ultraviolet absorber, adhesion imparting resin, anti-caking agent, etc. The above-mentioned other components may be used alone or in combination of two or more.

第2絕緣層之厚度為50~500nm、較佳為100~300nm。藉由上述厚度為50nm以上,屏蔽性能及連接穩定性優異。藉由上述厚度為500nm以下,透明性及連接穩定性優異。再者,第2絕緣層為複數層構造時,上述第2絕緣層之厚度為全部層厚度的合計。The thickness of the second insulating layer is 50-500nm, preferably 100-300nm. When the thickness is 50nm or more, the shielding performance and connection stability are excellent. When the thickness is 500nm or less, the transparency and connection stability are excellent. Furthermore, when the second insulating layer is a multi-layer structure, the thickness of the second insulating layer is the total thickness of all layers.

由保護上述奈米銀線層之觀點,上述第2絕緣層宜與上述導電性接著劑層直接積層,尤佳為分別以其中一面與上述導電性接著劑層直接積層、以另一面與上述奈米銀線層直接積層。From the viewpoint of protecting the silver nanowire layer, the second insulating layer is preferably directly laminated with the conductive adhesive layer, and more preferably, one side of the second insulating layer is directly laminated with the conductive adhesive layer, and the other side of the second insulating layer is directly laminated with the silver nanowire layer.

(導電性接著劑層) 上述導電性接著劑層具有用以將例如本發明屏蔽膜接著於印刷配線板之接著性、與用以與上述奈米銀線層電性連接之導電性。又,亦與上述奈米銀線層一同作為發揮屏蔽性能之屏蔽層而起作用。上述導電性接著劑層為單層或複數層均可。(Conductive adhesive layer) The conductive adhesive layer has the properties of bonding the shielding film of the present invention to a printed wiring board, and the conductivity of being electrically connected to the nanosilver wire layer. In addition, the conductive adhesive layer also functions as a shielding layer that exhibits shielding properties together with the nanosilver wire layer. The conductive adhesive layer may be a single layer or multiple layers.

上述導電性接著劑層含有黏結劑成分與球狀或樹枝狀(枝晶形狀(dendrite))的導電性粒子。The conductive adhesive layer contains a binder component and spherical or branch-shaped (dendrite) conductive particles.

關於上述黏結劑成分,可列舉:熱塑性樹脂、熱硬化性樹脂、活性能量線硬化性化合物等。關於上述熱塑性樹脂,例如可列舉:聚苯乙烯系樹脂、乙酸乙烯酯系樹脂、聚酯系樹脂、聚烯烴系樹脂(例如聚乙烯系樹脂、聚丙烯系樹脂組成物等)、聚醯亞胺系樹脂、丙烯酸系樹脂等。上述熱塑性樹脂可僅使用一種、亦可使用二種以上。The above-mentioned binder components include thermoplastic resins, thermosetting resins, active energy ray-hardening compounds, etc. The above-mentioned thermoplastic resins include, for example, polystyrene resins, vinyl acetate resins, polyester resins, polyolefin resins (such as polyethylene resins, polypropylene resin compositions, etc.), polyimide resins, acrylic resins, etc. The above-mentioned thermoplastic resins may be used alone or in combination of two or more.

關於上述熱硬化性樹脂,例如可列舉:酚系樹脂、環氧系樹脂、胺基甲酸酯系樹脂、胺基甲酸酯脲系樹脂、三聚氰胺系樹脂、醇酸系樹脂等。上述熱硬化性樹脂可僅使用一種、亦可使用二種以上。Examples of the thermosetting resin include phenolic resins, epoxy resins, urethane resins, urethane urea resins, melamine resins, alkyd resins, etc. The thermosetting resins may be used alone or in combination of two or more.

關於上述環氧系樹脂,例如可列舉:雙酚型環氧系樹脂、螺環型環氧系樹脂、萘型環氧系樹脂、聯苯型環氧系樹脂、萜烯型環氧系樹脂、環氧丙基醚型環氧系樹脂、環氧丙基胺型環氧系樹脂、酚醛型環氧系樹脂等。Examples of the epoxy resins include bisphenol epoxy resins, spiro epoxy resins, naphthalene epoxy resins, biphenyl epoxy resins, terpene epoxy resins, glycidyl ether epoxy resins, glycidyl amine epoxy resins, and phenolic epoxy resins.

關於上述雙酚型環氧樹脂,例如可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、四溴雙酚A型環氧樹脂等。關於上述環氧丙基醚型環氧樹脂,例如可列舉:參(環氧丙氧基苯基)甲烷、肆(環氧丙氧基苯基)乙烷等。關於上述環氧丙基胺型環氧樹脂,可舉例:四環氧丙基二胺基二苯基甲烷等。關於上述酚醛型環氧樹脂,例如可列舉:甲酚酚醛型環氧樹脂、苯酚酚醛型環氧樹脂、α-萘酚酚醛型環氧樹脂、溴化苯酚酚醛型環氧樹脂等。Examples of the bisphenol type epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, and tetrabromobisphenol A type epoxy resin. Examples of the glycidyl ether type epoxy resin include tris(glycidoxyphenyl)methane and tetrakis(glycidoxyphenyl)ethane. Examples of the glycidyl amine type epoxy resin include tetraglycidyl diaminodiphenylmethane. Examples of the novolac epoxy resin include cresol novolac epoxy resin, phenol novolac epoxy resin, α-naphthol novolac epoxy resin, brominated phenol novolac epoxy resin, and the like.

關於活性能量線硬化型化合物,並無特別限定,可舉例:於分子中具有至少2個自由基反應性基(例如(甲基)丙烯醯基)之聚合性化合物等。上述活性能量線硬化型化合物可僅使用一種、亦可使用二種以上。The active energy ray-curable compound is not particularly limited, and examples thereof include polymerizable compounds having at least two radical reactive groups (such as (meth)acryloyl groups) in the molecule. The active energy ray-curable compound may be used alone or in combination of two or more.

關於上述黏結劑成分,其中較佳為熱硬化型樹脂。此時,為了接著於印刷配線板,可將本發明屏蔽膜配置於印刷配線板上後,藉由加壓及加熱使黏結劑成分硬化,而使與印刷配線板之接著性變得良好。The adhesive component is preferably a thermosetting resin. In order to bond to a printed wiring board, the shielding film of the present invention can be placed on the printed wiring board and then cured by applying pressure and heat to improve the bonding property with the printed wiring board.

上述黏結劑成分包含熱硬化型樹脂時,關於構成上述黏結劑成分之成分,亦可包含用以促進熱硬化反應的硬化劑。上述硬化劑可根據上述熱硬化性樹脂之種類而適當選擇。上述硬化劑可僅使用一種、亦可使用二種以上。When the binder component includes a thermosetting resin, the components constituting the binder component may also include a hardener for promoting a thermosetting reaction. The hardener may be appropriately selected according to the type of the thermosetting resin. The hardener may be used alone or in combination of two or more.

上述導電性接著劑層中之黏結劑成分之含有比率並無特別限定,但相對於導電性接著劑層之總量100質量%,宜為20~99質量%、較佳為30~80質量%、更佳為40~70質量%。若上述含有比率為20質量%以上,對於印刷配線板之密著性更優異。若上述含有比率為99質量%以下,可充分地含有導電性粒子。The content ratio of the binder component in the conductive adhesive layer is not particularly limited, but is preferably 20-99 mass%, preferably 30-80 mass%, and more preferably 40-70 mass%, relative to 100 mass% of the total amount of the conductive adhesive layer. If the content ratio is 20 mass% or more, the adhesion to the printed wiring board is better. If the content ratio is 99 mass% or less, the conductive particles can be sufficiently contained.

上述導電性粒子是採用球狀導電性粒子及/或樹枝狀導電性粒子。藉由採用上述球狀或樹枝狀導電性粒子,即使大量調配時,透明性仍優異且連接穩定性優異。關於上述導電性粒子,其中由連接穩定性更優異之觀點,上述導電性粒子宜為樹枝狀導電性粒子。又,由屏蔽膜之透明性優異之觀點,上述導電性粒子宜為球狀導電性粒子。The conductive particles are spherical conductive particles and/or dendrite conductive particles. By using the spherical or dendrite conductive particles, even when a large amount is prepared, the transparency is excellent and the connection stability is excellent. Regarding the conductive particles, the conductive particles are preferably dendrite conductive particles from the viewpoint of having a better connection stability. In addition, from the viewpoint of having an excellent transparency of the shielding film, the conductive particles are preferably spherical conductive particles.

關於上述導電性粒子,例如可列舉:金屬粒子、金屬被覆樹脂粒子、碳填料等。上述導電性粒子可僅使用一種、亦可使用二種以上。Examples of the conductive particles include metal particles, metal-coated resin particles, and carbon fillers. The conductive particles may be used alone or in combination of two or more.

關於構成上述金屬粒子及上述金屬被覆樹脂粒子之被覆部的金屬,例如可列舉:金、銀、銅、鎳、鋅等。上述金屬可僅使用一種、亦可使用二種以上。Examples of the metal constituting the metal particles and the coating of the metal-coated resin particles include gold, silver, copper, nickel, zinc, etc. Only one type of the metal may be used, or two or more types may be used.

關於上述金屬粒子,具體例如可列舉:銅粒子、銀粒子、鎳粒子、銀被覆銅粒子、金被覆銅粒子、銀被覆鎳粒子、金被覆鎳粒子、銀被覆合金粒子等。關於上述銀被覆合金粒子,可舉例:利用銀被覆包含銅之合金粒子(例如由銅、鎳及鋅之合金構成之銅合金粒子)的銀被覆銅合金粒子等。上述金屬粒子可藉由電解法、霧化法或還原法等來製作。Specific examples of the metal particles include copper particles, silver particles, nickel particles, silver-coated copper particles, gold-coated copper particles, silver-coated nickel particles, gold-coated nickel particles, and silver-coated alloy particles. Examples of the silver-coated alloy particles include silver-coated copper alloy particles in which alloy particles containing copper (e.g., copper alloy particles composed of an alloy of copper, nickel, and zinc) are coated with silver. The metal particles can be produced by electrolysis, atomization, reduction, and the like.

其中,關於上述金屬粒子,較佳為銀粒子、銀被覆銅粒子、銀被覆銅合金粒子。由導電性優異、抑制金屬粒子之氧化及凝集且可降低金屬粒子成本之觀點,尤宜為銀被覆銅粒子、銀被覆銅合金粒子。Among them, the metal particles are preferably silver particles, silver-coated copper particles, and silver-coated copper alloy particles. Silver-coated copper particles and silver-coated copper alloy particles are particularly preferred from the viewpoints of excellent electrical conductivity, suppression of oxidation and aggregation of metal particles, and reduction of metal particle costs.

上述導電性粒子之中值粒徑(D50)並無特別限定,但宜為5~15μm、較佳為5~10μm。上述中值粒徑,是指:上述導電性接著劑層中之所有球狀導電性粒子及/或樹枝狀導電性粒子之中值粒徑,且是利用雷射繞射散射法求得的粒度分布中的累計值50%的粒徑。藉由上述中值粒徑為上述範圍內,於使用導電性粒子之本發明中,連接穩定性更優異。上述中值粒徑可藉由例如雷射繞射式粒徑分布測定裝置(商品名「SALD-2200」、島津製作所股份有限公司製)測定。The median particle size (D50) of the conductive particles is not particularly limited, but is preferably 5 to 15 μm, and more preferably 5 to 10 μm. The median particle size refers to the median particle size of all spherical conductive particles and/or dendrite-shaped conductive particles in the conductive adhesive layer, and is the particle size of 50% of the cumulative value in the particle size distribution obtained by the laser diffraction scattering method. When the median particle size is within the above range, the connection stability is better in the present invention using conductive particles. The median particle size can be measured, for example, by a laser diffraction particle size distribution measuring device (trade name "SALD-2200", manufactured by Shimadzu Corporation).

上述導電性接著劑層中之上述導電性粒子之含有比率相對於導電性接著劑層100質量%為1~80質量%、較佳為20~70質量%、更佳為30~60質量%。於本發明之屏蔽膜中,無論導電性接著劑層包含少量的上述導電性粒子1質量%左右之情形、或包含大量的上述導電性粒子80質量%之情形,連接電阻值均較低、連接穩定性優異。The content ratio of the conductive particles in the conductive adhesive layer is 1-80 mass%, preferably 20-70 mass%, and more preferably 30-60 mass%, relative to 100 mass% of the conductive adhesive layer. In the shielding film of the present invention, whether the conductive adhesive layer contains a small amount of the conductive particles of about 1 mass% or a large amount of the conductive particles of 80 mass%, the connection resistance value is low and the connection stability is excellent.

於無損本發明效果之範圍內,上述導電性接著劑層亦可含有上述各成分以外的其他成分。關於上述其他成分,可舉例公知乃至慣用的接著劑層中所含的成分。關於上述其他成分,例如可列舉:硬化促進劑、塑化劑、阻燃劑、消泡劑、黏度調整劑、抗氧化劑、稀釋劑、防沉劑、填充劑、調平劑、偶合劑、紫外線吸收劑、黏著賦予樹脂、抗結塊劑等。上述其他成分可僅使用一種、亦可使用二種以上。再者,球狀導電性粒子及樹枝狀導電性粒子以外的導電性粒子的含量,相對於球狀導電性粒子及/或樹枝狀導電性粒子100質量份為例如小於10質量份、較佳為小於5質量份、更佳為小於1質量份。The conductive adhesive layer may contain other components other than the above components within the scope of not impairing the effect of the present invention. As for the above other components, the components contained in the known or even conventional adhesive layer can be cited. As for the above other components, for example, hardening accelerators, plasticizers, flame retardants, defoaming agents, viscosity regulators, antioxidants, diluents, anti-settling agents, fillers, leveling agents, coupling agents, ultraviolet absorbers, adhesion-imparting resins, anti-caking agents, etc. The above other components may be used alone or in combination of two or more. The content of the conductive particles other than the spherical conductive particles and the dendrite-shaped conductive particles is, for example, less than 10 parts by mass, preferably less than 5 parts by mass, and more preferably less than 1 part by mass, based on 100 parts by mass of the spherical conductive particles and/or the dendrite-shaped conductive particles.

上述導電性接著劑層之厚度並無特別限定,但宜為3~20μm、較佳為5~15μm。若上述厚度為3μm以上,屏蔽性能更優異。若上述厚度為20μm以下,則有導電性粒子表面傾向於更靠近層表面或從表面露出,連接穩定性更加優異。The thickness of the conductive adhesive layer is not particularly limited, but is preferably 3 to 20 μm, preferably 5 to 15 μm. If the thickness is 3 μm or more, the shielding performance is better. If the thickness is 20 μm or less, the surface of the conductive particles tends to be closer to the layer surface or exposed from the surface, and the connection stability is better.

上述導電性接著劑層厚度與導電性粒子之D50之比[接著劑層厚度/D50]並無特別限制,但宜為0.2~1.5、較佳為0.5~1.0。若上述比為0.2以上,對印刷配線板等被接著體之接著性更良好。若上述比為1.5以下,從導電性接著劑層表面露出之導電性粒子之量變多,連接穩定性更加優異。The ratio of the thickness of the conductive adhesive layer to the D50 of the conductive particles [adhesive layer thickness/D50] is not particularly limited, but is preferably 0.2 to 1.5, more preferably 0.5 to 1.0. If the ratio is 0.2 or more, the adhesion to the adherend such as a printed wiring board is better. If the ratio is 1.5 or less, the amount of conductive particles exposed from the surface of the conductive adhesive layer increases, and the connection stability is better.

本發明之屏蔽膜亦可於導電性接著劑層側具有分離件(剝離膜)。分離件係以可從本發明屏蔽膜剝離之方式積層。分離件為用以被覆並保護導電性接著劑層之要件,於使用本發明屏蔽膜時被剝離。The shielding film of the present invention may also have a separator (peeling film) on the conductive adhesive layer side. The separator is laminated in a manner that it can be peeled off from the shielding film of the present invention. The separator is a component for covering and protecting the conductive adhesive layer and is peeled off when the shielding film of the present invention is used.

關於上述分離件,例如可列舉:聚對苯二甲酸乙二酯(PET)膜、聚乙烯膜、聚丙烯膜、利用氟系剝離劑或丙烯酸長鏈烷基酯系剝離劑等剝離劑進行表面塗層之塑膠膜或紙類等。Examples of the above-mentioned separation material include polyethylene terephthalate (PET) films, polyethylene films, polypropylene films, plastic films or papers coated with a stripping agent such as a fluorine-based stripping agent or a long-chain alkyl acrylate-based stripping agent, etc.

上述分離件之厚度宜為10~200μm、較佳為15~150μm。若上述厚度為10μm以上,保護性能更加優異。若上述厚度為200μm以下,於使用時容易剝離分離件。The thickness of the separation piece is preferably 10-200 μm, preferably 15-150 μm. If the thickness is 10 μm or more, the protective performance is more excellent. If the thickness is 200 μm or less, the separation piece is easy to peel off during use.

本發明之屏蔽膜亦可具有第1絕緣層、奈米銀線層、第2絕緣層及導電性接著劑層以外的其他層。關於上述其他層,例如可列舉:其他絕緣層、抗反射層、防眩層、防污層、硬塗層、紫外線吸收層、防牛頓環層等。The shielding film of the present invention may also have other layers besides the first insulating layer, the nanosilver wire layer, the second insulating layer and the conductive adhesive layer. The other layers include, for example: other insulating layers, anti-reflection layers, anti-glare layers, anti-fouling layers, hard coating layers, ultraviolet absorption layers, anti-Newton ring layers, etc.

本發明之屏蔽膜之透明性優異。本發明之屏蔽膜依循JIS K 7361-1之測定方法下的總透光率宜為10%以上、較佳為20%以上、更佳為50%以上、特佳為65%以上。上述總透光率可使用公知之光譜儀進行測定。再者,上述總透光率係就以第1絕緣層與上述導電性接著劑層作為兩端層之積層體進行測定。The shielding film of the present invention has excellent transparency. The total light transmittance of the shielding film of the present invention according to the measurement method of JIS K 7361-1 is preferably 10% or more, preferably 20% or more, more preferably 50% or more, and particularly preferably 65% or more. The above total light transmittance can be measured using a known spectrometer. Furthermore, the above total light transmittance is measured for a laminate having the first insulating layer and the above conductive adhesive layer as the two end layers.

本發明之屏蔽膜依循JIS K 7361-1之測定方法下的霧度值宜為95%以下、較佳為92%以下、更佳為90%以下。上述霧度值可使用公知之光譜儀進行測定。再者,上述霧度值係就以第1絕緣層與上述導電性接著劑層作為兩端層之積層體進行測定。The haze value of the shielding film of the present invention is preferably 95% or less, preferably 92% or less, and more preferably 90% or less according to the measurement method of JIS K 7361-1. The haze value can be measured using a known spectrometer. Furthermore, the haze value is measured for a laminate having the first insulating layer and the conductive adhesive layer as both end layers.

本發明之屏蔽膜宜用於印刷配線板之用途、尤佳為用於可撓式印刷配線板(FPC)之用途。本發明之屏蔽膜,無論於導電性接著劑層中少量調配導電性粒子時及大量調配導電性粒子時,電性連接電阻值均較低。又,透明性優異,容易於印刷配線板上進行對位。因此,本發明之屏蔽膜可適宜作為可撓性印刷配線板用的電磁波屏蔽膜來使用。The shielding film of the present invention is suitable for use in printed wiring boards, and is particularly suitable for use in flexible printed wiring boards (FPCs). The shielding film of the present invention has a low electrical connection resistance value regardless of whether a small amount of conductive particles are mixed in the conductive adhesive layer or a large amount of conductive particles are mixed. In addition, the shielding film has excellent transparency and is easy to align on the printed wiring board. Therefore, the shielding film of the present invention can be suitably used as an electromagnetic wave shielding film for flexible printed wiring boards.

(電磁波屏蔽膜之製造方法) 就本發明之屏蔽膜之製造方法進行說明。(Method for manufacturing electromagnetic wave shielding film) The method for manufacturing the shielding film of the present invention is described.

於圖1所示之本發明屏蔽膜1之製作上,首先於第1絕緣層11上形成奈米銀線層12。奈米銀線層12可藉由將奈米銀線層12層合於第1絕緣層11表面而形成。In the manufacturing of the shielding film 1 of the present invention shown in FIG1 , the nanosilver wire layer 12 is first formed on the first insulating layer 11 . The nanosilver wire layer 12 can be formed by laminating the nanosilver wire layer 12 on the surface of the first insulating layer 11 .

接著,可於所形成之奈米銀線層12表面,例如塗佈(塗敷)第2絕緣層13形成用樹脂組成物,並視需要而去除溶媒及/或使一部分硬化而形成。Next, the second insulating layer 13 may be formed by, for example, coating (applying) a resin composition for forming the second insulating layer 13 on the surface of the formed nanosilver wire layer 12, and removing the solvent and/or partially hardening the resin composition as necessary.

上述樹脂組成物例如除了上述第2絕緣層所包含之各成分外,還包含溶劑(溶媒)。關於溶劑,例如可列舉:甲苯、丙酮、甲乙酮、甲醇、乙醇、丙醇、乙酸乙酯、乙酸丙酯、乙酸丁酯及二甲基甲醯胺等。上述樹脂組成物之固體成分濃度係根據所欲形成之第2絕緣層之厚度等而適當設定。The resin composition, for example, includes a solvent in addition to the components included in the second insulating layer. Examples of the solvent include toluene, acetone, methyl ethyl ketone, methanol, ethanol, propanol, ethyl acetate, propyl acetate, butyl acetate, and dimethylformamide. The solid component concentration of the resin composition is appropriately set according to the thickness of the second insulating layer to be formed.

於塗佈上述樹脂組成物時,亦可使用公知之塗佈法。例如可使用:凹版輥塗佈機、反向輥塗佈機、接觸輥塗佈機、唇塗佈機浸漬輥塗佈機、棒塗佈機、刮刀塗佈(knife coat)機、噴塗佈機、缺角輪塗佈機、直接塗佈機、縫模塗佈機等塗佈機。When applying the resin composition, a known coating method may be used, such as a gravure roll coater, a reverse roll coater, a contact roll coater, a lip coater, a dip roll coater, a rod coater, a knife coater, a spray coater, a notch wheel coater, a direct coater, a slot die coater, and the like.

接著,可於所形成之第2絕緣層表面,塗佈(塗敷)導電性接著劑層14形成用接著劑組成物,並視需要而去除溶媒及/或使一部分硬化而形成。Next, the conductive adhesive layer 14 may be formed by coating (applying) an adhesive composition on the surface of the formed second insulating layer, and removing the solvent and/or partially curing the adhesive composition as necessary.

上述接著劑組成物例如除了上述導電性接著劑層所包含之各成分外,還包含溶劑(溶媒)。關於溶劑,可舉例上述作為樹脂組成物能包含之溶劑所例示者。上述接著劑組成物之固體成分濃度可根據所欲形成之導電性接著劑層之厚度等而適當設定。The adhesive composition may include, for example, a solvent in addition to the components included in the conductive adhesive layer. The solvent may be the solvents that can be included in the resin composition. The solid component concentration of the adhesive composition may be appropriately set according to the thickness of the conductive adhesive layer to be formed.

於塗佈上述接著劑組成物時,亦可使用公知之塗佈法。例如可列舉上述作為用以塗佈上述樹脂組成物之塗佈機而例示者。When applying the adhesive composition, a known coating method may be used. For example, the coating machine described above for applying the resin composition may be cited.

再者,於上述製造方法中,雖然就依序形成各層而製作之方法(直接塗佈法)進行說明,但並不限定於上述方法,例如亦可藉由於分離膜等暫時基材或基材上個別形成各層後,再將前述各層層合而依序貼合之方法(層合法)來製作。Furthermore, in the above-mentioned manufacturing method, although the method of forming each layer in sequence (direct coating method) is described, it is not limited to the above-mentioned method. For example, it can also be manufactured by a method of forming each layer individually on a temporary substrate such as a release film or a substrate, and then laminating the aforementioned layers and bonding them in sequence (lamination method).

可使用本發明之屏蔽膜來製作印刷配線板。例如藉由將本發明之屏蔽膜之導電性接著劑層貼合於印刷配線板(例如覆蓋膜),可獲得於印刷配線板貼合有本發明屏蔽膜之屏蔽印刷配線板。於上述屏蔽印刷配線板中,上述導電性接著劑層亦可進行熱硬化。The shielding film of the present invention can be used to manufacture a printed wiring board. For example, by laminating the conductive adhesive layer of the shielding film of the present invention to a printed wiring board (e.g., a cover film), a shielded printed wiring board having the shielding film of the present invention laminated to the printed wiring board can be obtained. In the above-mentioned shielded printed wiring board, the above-mentioned conductive adhesive layer can also be heat-cured.

[實施例] 以下,基於實施例更詳細地說明本發明,但本發明並不僅限定於此等實施例。再者,表中之導電性粒子之含有比率表示導電性接著劑層中之比率。[Examples] The present invention is described in more detail below based on examples, but the present invention is not limited to these examples. In addition, the content ratio of the conductive particles in the table represents the ratio in the conductive adhesive layer.

比較例1 於PET膜(厚度6μm)之表面層合奈米銀線層(線徑30nm、線長20μm、厚度約70nm)而積層。然後,使用線棒將調配混合環氧樹脂溶液及導電性粒子A而獲得之接著劑組成物塗佈於上述奈米銀線層表面,於120℃下加熱1分鐘,藉此形成導電性接著劑層(厚度5μm)。如上施行而製作比較例1之屏蔽膜。又,環氧樹脂溶液及導電性粒子A之調配量設定為:導電性接著劑層中之環氧樹脂之比率為70質量%、導電性粒子A之比率為30質量%的量。Comparative Example 1 A nanosilver wire layer (wire diameter 30nm, wire length 20μm, thickness about 70nm) was laminated on the surface of a PET film (thickness 6μm). Then, a wire rod was used to apply an adhesive composition obtained by mixing an epoxy resin solution and conductive particles A on the surface of the nanosilver wire layer, and heated at 120°C for 1 minute to form a conductive adhesive layer (thickness 5μm). The shielding film of Comparative Example 1 was prepared as above. In addition, the mixing amount of the epoxy resin solution and the conductive particles A was set to: the ratio of the epoxy resin in the conductive adhesive layer was 70% by mass, and the ratio of the conductive particles A was 30% by mass.

比較例2、3 除了如表1所示地變更導電性粒子之種類及含有比率外,與比較例1同樣施行而製作各屏蔽膜。Comparative Examples 2 and 3 Except for changing the type and content ratio of the conductive particles as shown in Table 1, the same procedures as in Comparative Example 1 were followed to produce shielding films.

實施例1 於PET膜(厚度6μm)之表面層合奈米銀線層(線徑30nm、線長20μm、厚度約70nm)而積層。接著,於奈米銀線層表面,使用線棒塗佈聚酯系樹脂組成物,於100℃下加熱1分鐘,藉此形成樹脂層(厚度50nm)。然後,使用線棒將調配混合環氧樹脂溶液及導電性粒子A而獲得之接著劑組成物塗佈於上述樹脂層表面,於120℃下加熱1分鐘,藉此形成導電性接著劑層(厚度5μm)。如上施行而製作實施例1之屏蔽膜。又,環氧樹脂溶液及導電性粒子A之調配量設定為:導電性接著劑層中之環氧樹脂之比率為70質量%、導電性粒子A之比率為30質量%的量。Example 1 A nanosilver wire layer (wire diameter 30nm, wire length 20μm, thickness about 70nm) is laminated on the surface of a PET film (thickness 6μm). Then, a polyester resin composition is applied to the surface of the nanosilver wire layer using a wire rod, and heated at 100°C for 1 minute to form a resin layer (thickness 50nm). Then, an adhesive composition obtained by mixing an epoxy resin solution and conductive particles A is applied to the surface of the above resin layer using a wire rod, and heated at 120°C for 1 minute to form a conductive adhesive layer (thickness 5μm). The shielding film of Example 1 is prepared as above. The mixing amounts of the epoxy resin solution and the conductive particles A were set such that the ratio of the epoxy resin in the conductive adhesive layer was 70% by mass and the ratio of the conductive particles A was 30% by mass.

實施例2、3及比較例4 除了如表1所示地變更樹脂層之厚度外,與實施例1同樣施行而製作各屏蔽膜。Examples 2, 3 and Comparative Example 4 Except for changing the thickness of the resin layer as shown in Table 1, each shielding film was produced in the same manner as Example 1.

實施例4 除了如表1所示地變更導電性粒子之含有比率外,與實施例11同樣施行而製作屏蔽膜。Example 4 Except for changing the content ratio of the conductive particles as shown in Table 1, a shielding film was prepared in the same manner as Example 11.

實施例5、6及比較例5 除了如表1所示地變更樹脂層之厚度外,與實施例4同樣施行而製作各屏蔽膜。Examples 5, 6 and Comparative Example 5 Except for changing the thickness of the resin layer as shown in Table 1, each shielding film was produced in the same manner as Example 4.

實施例7 除了如表1所示地變更導電性粒子之種類外,與實施例1同樣施行而製作屏蔽膜。Example 7 Except for changing the type of conductive particles as shown in Table 1, a shielding film was prepared in the same manner as Example 1.

實施例8、9及比較例6 除了如表1所示地變更樹脂層之厚度外,與實施例4同樣施行而製作各屏蔽膜。Examples 8, 9 and Comparative Example 6 Except for changing the thickness of the resin layer as shown in Table 1, each shielding film was produced in the same manner as Example 4.

(評價) 針對於實施例及比較例獲得之各屏蔽膜如下所述進行評價。評價結果記載於表中。再者,採用僅PET膜(厚度6μm)作為參考例1之評價對象。又,表中之「OL」表示因為超載而超過作為測定極限之100Ω的值。(Evaluation) Each shielding film obtained in the embodiment and the comparative example was evaluated as follows. The evaluation results are recorded in the table. In addition, only PET film (thickness 6μm) was used as the evaluation object of reference example 1. In addition, "OL" in the table indicates a value exceeding 100Ω, which is the measurement limit, due to overload.

(1)連接電阻值 準備如下印刷配線基板:由聚醯亞胺膜構成之基材構件上形成有模擬接地圖案之2條銅箔圖案(4mm寬、1mm間距)且於其上形成有由絕緣性接著劑層及聚醯亞胺膜構成之覆蓋膜(絕緣膜)者。於銅箔圖案之表面設有鍍金層作為表面層。再者,於覆蓋膜形成有模擬直徑0.8mm之接地連接部的圓形開口部。利用加壓機,於溫度:170℃、時間:30分鐘、壓力:2~3MPa之條件下,接著各實施例及比較例製作之屏蔽膜與印刷配線基板。接著屏蔽膜後,以電阻計測定2條銅箔圖案間之電阻值,評價銅箔圖案與導電性接著片之連接性,作為連接電阻值。(1) Connection resistance value The following printed wiring board was prepared: a substrate member composed of a polyimide film was formed with two copper foil patterns (4 mm wide, 1 mm spacing) simulating a ground pattern, and a covering film (insulating film) composed of an insulating adhesive layer and a polyimide film was formed thereon. A gold-plated layer was provided on the surface of the copper foil pattern as a surface layer. Furthermore, a circular opening portion simulating a ground connection portion with a diameter of 0.8 mm was formed on the covering film. Using a press, the shielding film and the printed wiring board prepared in each embodiment and comparative example were connected under the conditions of temperature: 170°C, time: 30 minutes, and pressure: 2~3MPa. After the shielding film is applied, the resistance between the two copper foil patterns is measured with a resistance meter to evaluate the connectivity between the copper foil pattern and the conductive adhesive sheet as the connection resistance value.

(2)總透光率 針對於實施例及比較例獲得之屏蔽膜,依循JIS K7361-1使用霧度儀裝置(商品名「NDH4000」、日本電色工業股份有限公司製),以PET膜面成為積分球側之方式照射測定光進行測定。(2) Total light transmittance For the shielding films obtained in the embodiments and comparative examples, the light transmittance was measured by irradiating the PET film surface with the integrating sphere side using a haze meter (trade name "NDH4000", manufactured by Nippon Denshoku Industries Co., Ltd.) in accordance with JIS K7361-1.

[表1]   樹脂層 厚度 [nm] 導電性粒子 總透光率 [%] 連接電阻值 [Ω] 種類 形狀 含有比率 [質量%] 比較例1 - 導電性粒子A 球狀 30 82.4 OL 比較例2 - 導電性粒子A 球狀 50 75.5 OL 比較例3 - 導電性粒子B 樹枝狀 30 76.1 15.0 實施例1 50 導電性粒子A 球狀 30 82.9 25.7 實施例2 100 導電性粒子A 球狀 30 83.4 26.1 實施例3 200 導電性粒子A 球狀 30 80.8 28.0 比較例4 1000 導電性粒子A 球狀 30 80.6 OL 實施例4 50 導電性粒子A 球狀 50 75.5 27.3 實施例5 100 導電性粒子A 球狀 50 74.4 22.9 實施例6 200 導電性粒子A 球狀 50 77.2 23.4 比較例5 1000 導電性粒子A 球狀 50 73.4 OL 實施例7 50 導電性粒子B 樹枝狀 30 67.1 13.6 實施例8 100 導電性粒子B 樹枝狀 30 70.1 14.5 實施例9 200 導電性粒子B 樹枝狀 30 66.2 13.8 比較例6 1000 導電性粒子B 樹枝狀 30 65.7 OL 參考例1 - - - - 82.3 OL [Table 1] Resin layer thickness [nm] Conductive particles Total light transmittance[%] Connection resistance [Ω] Type Shape Content ratio [mass %] Comparison Example 1 - Conductive particles A Spherical 30 82.4 OL Comparison Example 2 - Conductive particles A Spherical 50 75.5 OL Comparison Example 3 - Conductive particles B Branch 30 76.1 15.0 Embodiment 1 50 Conductive particles A Spherical 30 82.9 25.7 Embodiment 2 100 Conductive particles A Spherical 30 83.4 26.1 Embodiment 3 200 Conductive particles A Spherical 30 80.8 28.0 Comparison Example 4 1000 Conductive particles A Spherical 30 80.6 OL Embodiment 4 50 Conductive particles A Spherical 50 75.5 27.3 Embodiment 5 100 Conductive particles A Spherical 50 74.4 22.9 Embodiment 6 200 Conductive particles A Spherical 50 77.2 23.4 Comparison Example 5 1000 Conductive particles A Spherical 50 73.4 OL Embodiment 7 50 Conductive particles B Branch 30 67.1 13.6 Embodiment 8 100 Conductive particles B Branch 30 70.1 14.5 Embodiment 9 200 Conductive particles B Branch 30 66.2 13.8 Comparative Example 6 1000 Conductive particles B Branch 30 65.7 OL Reference Example 1 - - - - 82.3 OL

於使用奈米銀線層作為透明導電層的情況下,本發明之屏蔽膜即使大量調配導電性粒子30~50質量%時,總透光率仍高而透明性優異、連接電阻值低而連接穩定性優異(實施例1~9)。又,以使用球狀導電性粒子之情形(實施例1~6)而言,相對於使用樹枝狀導電性粒子之情形(實施例7~9),有總透光率高而透明性優異之傾向。另一方面,以使用樹枝狀導電性粒子之情形(實施例7~9)而言,相對於使用球狀導電性粒子之情形(實施例1~6),有連接電阻值低而連接穩定性優異之傾向。又,於30質量%以上之大量調配條件下,當奈米銀線層與導電性接著劑層之間不具有樹脂層時(比較例1~3),相對於以相同比率使用相同種類導電性粒子之情形(實施例1~9),結果連接電阻值變高。When the nanosilver wire layer is used as the transparent conductive layer, the shielding film of the present invention has a high total light transmittance and excellent transparency, a low connection resistance and excellent connection stability even when the conductive particles are mixed in a large amount of 30-50 mass % (Examples 1-9). In addition, in the case of using spherical conductive particles (Examples 1-6), there is a tendency for the total light transmittance to be high and the transparency to be excellent compared to the case of using dendrite-shaped conductive particles (Examples 7-9). On the other hand, in the case of using dendrite-shaped conductive particles (Examples 7-9), there is a tendency for the connection resistance to be low and the connection stability to be excellent compared to the case of using spherical conductive particles (Examples 1-6). Furthermore, under the condition of a large amount of 30 mass % or more, when there is no resin layer between the nanosilver wire layer and the conductive adhesive layer (Comparative Examples 1-3), the connection resistance value becomes higher compared to the case where the same type of conductive particles are used at the same ratio (Examples 1-9).

1:屏蔽膜 11:第1絕緣層 12:奈米銀線層 13:第2絕緣層 14:導電性接著劑層1: Shielding film 11: 1st insulating layer 12: Nanosilver wire layer 13: 2nd insulating layer 14: Conductive adhesive layer

圖1係顯示本發明之電磁波屏蔽膜之一實施形態的剖面示意圖。FIG. 1 is a schematic cross-sectional view showing an embodiment of the electromagnetic wave shielding film of the present invention.

1:屏蔽膜1: Shielding film

11:第1絕緣層11: First insulating layer

12:奈米銀線層12: Nanosilver wire layer

13:第2絕緣層13: Second insulation layer

14:導電性接著劑層14: Conductive adhesive layer

Claims (7)

一種電磁波屏蔽膜,依序積層有第1絕緣層、奈米銀線層、第2絕緣層及導電性接著劑層;前述第2絕緣層之厚度為50~500nm;前述導電性接著劑層包含:黏結劑成分、與球狀或樹枝狀導電性粒子;前述導電性粒子之含有比率相對於前述導電性接著劑層100質量%為1~80質量%。 An electromagnetic wave shielding film is sequentially laminated with a first insulating layer, a nanosilver wire layer, a second insulating layer and a conductive adhesive layer; the thickness of the second insulating layer is 50-500nm; the conductive adhesive layer comprises: a binder component and spherical or branch-shaped conductive particles; the content ratio of the conductive particles is 1-80% by mass relative to 100% by mass of the conductive adhesive layer. 如請求項1之電磁波屏蔽膜,其中前述第2絕緣層與前述導電性接著劑層係直接積層。 The electromagnetic wave shielding film of claim 1, wherein the second insulating layer and the conductive adhesive layer are directly laminated. 如請求項1之電磁波屏蔽膜,其中前述第2絕緣層係分別以其中一面與前述導電性接著劑層直接積層、以另一面與前述奈米銀線層直接積層。 As in claim 1, the electromagnetic wave shielding film, wherein the second insulating layer is directly laminated with the conductive adhesive layer on one side and directly laminated with the nanosilver wire layer on the other side. 如請求項1至3中任一項之電磁波屏蔽膜,其中前述導電性粒子之含有比率相對於前述導電性接著劑層100質量%為30~80質量%。 An electromagnetic wave shielding film as claimed in any one of claims 1 to 3, wherein the content ratio of the conductive particles is 30-80% by mass relative to 100% by mass of the conductive adhesive layer. 如請求項1至3中任一項之電磁波屏蔽膜,其依循JIS K 7361-1之測定方法下的總透光率為10%以上。 For the electromagnetic wave shielding film of any one of claim items 1 to 3, the total light transmittance thereof is 10% or more in accordance with the measurement method of JIS K 7361-1. 如請求項4之電磁波屏蔽膜,其依循JIS K 7361-1之測定方法下的總透光率為10%以上。 For example, the electromagnetic wave shielding film in claim 4 has a total light transmittance of 10% or more in accordance with the measurement method of JIS K 7361-1. 一種屏蔽印刷配線板,具備如請求項1至6中任一項之電磁波屏蔽膜。 A shielded printed wiring board having an electromagnetic wave shielding film as described in any one of claims 1 to 6.
TW109133414A 2020-02-26 2020-09-25 Electromagnetic wave shielding film TWI842957B (en)

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