TWI841064B - Device and method for spraying perovskite film - Google Patents

Device and method for spraying perovskite film Download PDF

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TWI841064B
TWI841064B TW111144196A TW111144196A TWI841064B TW I841064 B TWI841064 B TW I841064B TW 111144196 A TW111144196 A TW 111144196A TW 111144196 A TW111144196 A TW 111144196A TW I841064 B TWI841064 B TW I841064B
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calcium
spraying
titanium
ultrasonic
substrate
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TW111144196A
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TW202421281A (en
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林嘉彥
田偉辰
洪政源
黃玉君
林煒淳
王翊愷
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財團法人金屬工業研究發展中心
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Abstract

A device for spraying a perovskite film includes a chamber, a carrier, an XY axis moving platform, an ultrasonic spraying system, a feeding device, an auxiliary airflow element, and a heating device. The chamber has a spraying space. The carrier is disposed in the spraying space to carry a substrate. The XY axis moving platform is disposed in the spraying space above the substrate. The ultrasonic spraying system is disposed above the XY axis moving platform. The ultrasonic spraying system ultrasonically oscillates a perovskite precursor solution to spray plural perovskite precursor droplets in the spraying space. The feeding device is connected to the ultrasonic spraying system to supply the perovskite precursor solution to the ultrasonic spraying system. The auxiliary airflow element is adjacent to the ultrasonic spray system and sprays an airflow to blow the perovskite precursor droplets to a surface of the substrate. The heating device heats perovskite precursor droplets.

Description

鈣鈦礦薄膜之噴塗裝置與噴塗方法Calcium-titanium film spraying device and spraying method

本揭露是有關於一種鈣鈦礦(perovskite)薄膜之製作技術,且特別是有關於一種鈣鈦礦薄膜之噴塗裝置與噴塗方法。The present disclosure relates to a technology for manufacturing a perovskite film, and more particularly to a spraying device and a spraying method for the perovskite film.

鈣鈦礦材料係由有機物與無機物混合製成。鈣鈦礦材料之化學通式可以ABX 3表示,其中A代表有機陽離子,例如HC(NH 2) 2+及CH 3NH 3+,B代表金屬陽離子,例如Pb 2+、Ge 2+、及Sn 2+,X則代表一價的陰離子,例如鹵素的陰離子。 Calcium-titanium materials are made of a mixture of organic and inorganic substances. The general chemical formula of calcium-titanium materials can be represented by ABX 3 , where A represents organic cations, such as HC(NH 2 ) 2+ and CH 3 NH 3+ , B represents metal cations, such as Pb 2+ , Ge 2+ , and Sn 2+ , and X represents monovalent anions, such as halogen anions.

鈣鈦礦材料為直接能隙半導體材料,而具有極高的發光效率及載流子遷移率,且對可見光的吸收能力佳,吸光範圍廣。因此,鈣鈦礦薄膜常用來做為太陽能電池的主動層。鈣鈦礦材料可產生高短路電流,使太陽能電池具有高開路電壓,因此鈣鈦礦太陽能電池具有良好的光電轉換效率。Calcium-titanium material is a direct bandgap semiconductor material with extremely high luminescence efficiency and carrier mobility, and has good absorption capacity for visible light and a wide absorption range. Therefore, calcium-titanium thin films are often used as the active layer of solar cells. Calcium-titanium material can generate high short-circuit current, which makes solar cells have high open-circuit voltage, so calcium-titanium solar cells have good photoelectric conversion efficiency.

目前鈣鈦礦在製作上大都使用刮刀塗佈方式、旋轉旋塗方式、以及真空沉積方式。然而,刮刀塗佈方式與旋轉旋塗方式會浪費過多鈣鈦礦前驅液,塗佈面積有限,且薄膜均勻性不佳,造成製程成本提高,且無法應用於大面積製程,不易實現商業化。此外,真空沉積方式雖可製得高均勻度之鈣鈦礦薄膜,但沉積面積也是相當有限。At present, the production of calcium-titanium ore mostly uses the scraper coating method, the rotary coating method, and the vacuum deposition method. However, the scraper coating method and the rotary coating method will waste too much calcium-titanium ore precursor solution, the coating area is limited, and the film uniformity is poor, resulting in increased process costs, and it cannot be applied to large-area processes, making it difficult to achieve commercialization. In addition, although the vacuum deposition method can produce a highly uniform calcium-titanium ore film, the deposition area is also quite limited.

因此,亟需一種製造鈣鈦礦薄膜之技術,以改善習知製作鈣鈦礦薄膜之方式的缺點。Therefore, a technology for manufacturing calcium-titanium thin films is urgently needed to improve the shortcomings of the conventional methods for manufacturing calcium-titanium thin films.

本揭露之一目的是在提供一種鈣鈦礦薄膜之噴塗裝置與噴塗方法,其超音波噴塗系統可將鈣鈦礦前驅物溶液有效霧化成小粒徑的液滴,且輔助氣流元件可供應氣流將這些液滴塗覆在基板之表面上,而XY軸移動平台可帶動超音波噴頭在整個基板之表面上方移動。因此,不僅可大面積噴塗鈣鈦礦薄膜,且可提升鈣鈦礦薄膜之均勻度與晶粒尺寸,更可大幅降低鈣鈦礦的浪費,有效降低製程成本。One of the purposes of the present disclosure is to provide a calcium-titanium film spraying device and a spraying method, wherein the ultrasonic spraying system can effectively atomize the calcium-titanium precursor solution into droplets of small particle size, and the auxiliary airflow element can provide airflow to coat these droplets on the surface of the substrate, and the XY axis moving platform can drive the ultrasonic nozzle to move over the surface of the entire substrate. Therefore, not only can the calcium-titanium film be sprayed over a large area, but also the uniformity and grain size of the calcium-titanium film can be improved, and the waste of calcium-titanium can be greatly reduced, effectively reducing the process cost.

本揭露之另一目的是在提供一種鈣鈦礦薄膜之噴塗裝置與噴塗方法,其腔體可阻隔外界環境,而可使腔體之噴塗空間在噴塗時呈密閉狀態。因此,可避免因外界氣流場干擾而造成超音波震盪所形成之鈣鈦礦前驅物噴霧的不穩定,進而可避免薄膜不連續而造成薄膜晶粒成核的問題。故,應用本揭露可實現低缺陷之高品質鈣鈦礦薄膜。Another object of the present disclosure is to provide a spraying device and a spraying method for a calcium-titanium thin film, wherein the cavity can block the external environment, and the spraying space of the cavity can be in a closed state during spraying. Therefore, the instability of the calcium-titanium precursor spray caused by ultrasonic vibration due to external air flow field interference can be avoided, and the problem of film discontinuity and film grain nucleation can be avoided. Therefore, the application of the present disclosure can achieve a high-quality calcium-titanium thin film with low defects.

根據本揭露之上述目的,提出一種鈣鈦礦薄膜之噴塗裝置。此鈣鈦礦薄膜之噴塗裝置包含腔體、載台、XY軸移動平台、超音波噴塗系統、供料裝置、輔助氣流元件、以及加熱裝置。腔體具有噴塗空間。載台設於噴塗空間中,且配置以承載基板。XY軸移動平台設於噴塗空間中,且位於基板之上方。XY軸移動平台可在XY平面上移動。超音波噴塗系統設於XY軸移動平台上。超音波噴塗系統配置以對鈣鈦礦前驅物溶液進行超音波震盪而形成數個鈣鈦礦前驅物液滴、以及在噴塗空間中噴出這些鈣鈦礦前驅物液滴。供料裝置與超音波噴塗系統連接,且配置以供應鈣鈦礦前驅物溶液給超音波噴塗系統。輔助氣流元件鄰設於超音波噴塗系統,且配置以噴出氣流將鈣鈦礦前驅物液滴吹向基板之表面。加熱裝置配置以對基板之表面上之鈣鈦礦前驅物液滴進行加熱處理。According to the above-mentioned purpose of the present disclosure, a calcium-titanium thin film spraying device is proposed. This calcium-titanium thin film spraying device includes a chamber, a carrier, an XY axis moving platform, an ultrasonic spraying system, a feeding device, an auxiliary airflow element, and a heating device. The chamber has a spraying space. The carrier is disposed in the spraying space and is configured to carry a substrate. The XY axis moving platform is disposed in the spraying space and is located above the substrate. The XY axis moving platform can move on the XY plane. The ultrasonic spraying system is disposed on the XY axis moving platform. The ultrasonic spraying system is configured to ultrasonically vibrate the calcium-titanium precursor solution to form a plurality of calcium-titanium precursor droplets, and to spray the calcium-titanium precursor droplets in a spraying space. The feeding device is connected to the ultrasonic spraying system and is configured to supply the calcium-titanium precursor solution to the ultrasonic spraying system. The auxiliary airflow element is adjacent to the ultrasonic spraying system and is configured to spray airflow to blow the calcium-titanium precursor droplets toward the surface of the substrate. The heating device is configured to heat the calcium-titanium precursor droplets on the surface of the substrate.

依據本揭露之一實施例,上述之腔體更具有排氣口。此排氣口配置以排出腔體內之多餘氣體。According to an embodiment of the present disclosure, the cavity further has an exhaust port configured to exhaust excess gas in the cavity.

依據本揭露之一實施例,上述之超音波噴塗系統包含超音波噴頭、超音波震盪器、以及電源供應器。超音波噴頭與XY軸移動平台接合,且可為XY軸移動平台帶動。超音波震盪器設於超音波噴頭上,且配置以震盪超音波噴頭。電源供應器電性連接超音波震盪器,以提供超音波震盪器電力。According to one embodiment of the present disclosure, the ultrasonic spray coating system includes an ultrasonic spray head, an ultrasonic oscillator, and a power supply. The ultrasonic spray head is connected to the XY axis moving platform and can be driven by the XY axis moving platform. The ultrasonic oscillator is disposed on the ultrasonic spray head and is configured to vibrate the ultrasonic spray head. The power supply is electrically connected to the ultrasonic oscillator to provide power to the ultrasonic oscillator.

依據本揭露之一實施例,上述之供料裝置包含注射幫浦。According to one embodiment of the present disclosure, the feeding device comprises an injection pump.

依據本揭露之一實施例,上述之鈣鈦礦薄膜之噴塗裝置更包含調整機構。此調整機構設於XY軸移動平台中,且超音波噴頭設於調整機構之一端。此調整機構配置以帶動超音波噴頭沿Z軸方向移動,以調整超音波噴頭與基板之間之間距。According to an embodiment of the present disclosure, the above-mentioned calcium titanium thin film spray coating device further includes an adjustment mechanism. The adjustment mechanism is arranged in the XY axis moving platform, and the ultrasonic nozzle is arranged at one end of the adjustment mechanism. The adjustment mechanism is configured to drive the ultrasonic nozzle to move along the Z axis direction to adjust the distance between the ultrasonic nozzle and the substrate.

根據本揭露之上述目的,另提出一種鈣鈦礦薄膜之噴塗方法。在此方法中,將基板載入腔體之噴塗空間中,其中噴塗空間處於密閉狀態。供應鈣鈦礦前驅物溶液至噴塗空間中之超音波噴頭。利用超音波噴頭對鈣鈦礦前驅物溶液進行霧化步驟,以產生數個鈣鈦礦前驅物液滴。進行霧化步驟時,在XY平面上移動超音波噴頭。進行噴塗處理,以利用氣流將鈣鈦礦前驅物液滴吹向並塗覆在基板之表面上。對基板之表面上之鈣鈦礦前驅物液滴進行加熱處理,以使鈣鈦礦前驅物液滴形成鈣鈦礦薄膜。According to the above-mentioned purpose of the present disclosure, a method for spraying a calcium-titanium thin film is also proposed. In this method, a substrate is loaded into a spraying space of a cavity, wherein the spraying space is in a closed state. A calcium-titanium precursor solution is supplied to an ultrasonic nozzle in the spraying space. The calcium-titanium precursor solution is subjected to an atomization step by using the ultrasonic nozzle to generate a plurality of calcium-titanium precursor droplets. When performing the atomization step, the ultrasonic nozzle is moved in an XY plane. A spraying process is performed to use an airflow to blow the calcium-titanium precursor droplets toward and coat the surface of the substrate. The calcium-titanium precursor droplets on the surface of the substrate are heated to form a calcium-titanium film from the calcium-titanium precursor droplets.

依據本揭露之一實施例,上述之噴塗空間處於密閉狀態時,噴塗空間充滿氮氣,且噴塗空間內之水與氧小於5ppm。According to one embodiment of the present disclosure, when the above-mentioned spraying space is in a closed state, the spraying space is filled with nitrogen, and the water and oxygen in the spraying space are less than 5 ppm.

依據本揭露之一實施例,上述進行霧化步驟時,更包含利用電源供應器對超音波震盪器供應電力,以使超音波震盪器震盪超音波噴頭。此電源供應器之功率為0.1瓦至10瓦。According to an embodiment of the present disclosure, the atomization step further includes using a power supply to supply power to the ultrasonic oscillator so that the ultrasonic oscillator vibrates the ultrasonic nozzle. The power of the power supply is 0.1 watt to 10 watts.

依據本揭露之一實施例,上述之超音波噴頭之移動速率為1毫米/秒至50毫米/秒。According to one embodiment of the present disclosure, the moving speed of the ultrasonic nozzle is 1 mm/s to 50 mm/s.

依據本揭露之一實施例,上述之超音波噴頭與基板之間之間距為5公分至20公分。According to one embodiment of the present disclosure, the distance between the ultrasonic nozzle and the substrate is 5 cm to 20 cm.

依據本揭露之一實施例,上述進行加熱處理更包含控制加熱溫度為25℃至100℃。According to one embodiment of the present disclosure, the heating treatment further includes controlling the heating temperature to be 25°C to 100°C.

以下仔細討論本揭露的實施方式。然而,可理解的是,實施方式提供許多可應用的概念,其可實施於各式各樣的特定內容中。所討論與揭示的實施方式僅供說明,並非用以限定本揭露之範圍。本揭露之所有實施方式揭露多種不同特徵,但這些特徵可依需求而單獨實施或結合實施。The following is a detailed discussion of the embodiments of the present disclosure. However, it is understood that the embodiments provide many applicable concepts that can be implemented in a variety of specific contexts. The embodiments discussed and disclosed are for illustration only and are not intended to limit the scope of the present disclosure. All embodiments of the present disclosure disclose a variety of different features, but these features can be implemented separately or in combination as needed.

此外,關於本文中所使用之「第一」、「第二」、…等,並非特別指次序或順位的意思,其僅為了區別以相同技術用語描述的元件或操作。另外,本揭露所敘述之二元件之間的空間關係不僅適用於圖式所繪示之方位,亦適用於圖式所未呈現之方位,例如倒置之方位。In addition, the terms "first", "second", etc. used herein do not specifically refer to order or sequence, but are only used to distinguish between elements or operations described with the same technical terms. In addition, the spatial relationship between two elements described in the present disclosure is applicable not only to the orientations shown in the drawings, but also to orientations not shown in the drawings, such as inverted orientations.

請參照圖1,其係繪示依照本揭露之一實施方式的一種鈣鈦礦薄膜之噴塗裝置的示意圖。鈣鈦礦薄膜之噴塗裝置100主要可包含腔體110、載台120、XY軸移動平台130、超音波噴塗系統140、供料裝置150、輔助氣流元件160、以及加熱裝置170。Please refer to FIG1 , which is a schematic diagram of a calcium-titanium thin film spraying device according to an embodiment of the present disclosure. The calcium-titanium thin film spraying device 100 mainly includes a chamber 110, a carrier 120, an XY axis moving platform 130, an ultrasonic spraying system 140, a feeding device 150, an auxiliary air flow element 160, and a heating device 170.

腔體110之內部具有噴塗空間112,以供鈣鈦礦之噴塗作業在此進行。腔體110可為具任意適合形狀之中空立體結構,例如中空矩形體。在一些實施例中,進行鈣鈦礦之噴塗作業時,腔體110之噴塗空間112處於密閉狀態。此時,可以氮氣充滿噴塗空間112,且可將噴塗空間112內之水與氧控制在小於5ppm。The cavity 110 has a spraying space 112 inside for the spraying operation of calcium-titanium ore. The cavity 110 can be a hollow three-dimensional structure with any suitable shape, such as a hollow rectangular body. In some embodiments, when the calcium-titanium ore is sprayed, the spraying space 112 of the cavity 110 is in a closed state. At this time, the spraying space 112 can be filled with nitrogen, and the water and oxygen in the spraying space 112 can be controlled to be less than 5 ppm.

腔體110可具有一或多個排氣口114。排氣口114可將腔體110內之多餘氣體排出腔體110。進行噴塗時,排氣口114僅被動排氣,以避免噴塗時氣流場因環境因素而造成異常。噴塗完成後,可以氮氣來淨化腔體110之噴塗空間112,此時排氣口114採主動排氣模式。The chamber 110 may have one or more exhaust ports 114. The exhaust ports 114 may exhaust the excess gas in the chamber 110 out of the chamber 110. During spraying, the exhaust ports 114 only exhaust air passively to avoid abnormalities in the air flow field during spraying due to environmental factors. After spraying is completed, nitrogen may be used to purify the spraying space 112 of the chamber 110, and the exhaust ports 114 are in active exhaust mode.

載台120設於腔體110之噴塗空間112中。載台120可用以承載欲塗佈鈣鈦礦薄膜之基板180。載台120可具有平坦之承載面122,以利平穩地承托基板180。舉例而言,載台120可為平板狀結構。The carrier 120 is disposed in the spraying space 112 of the chamber 110. The carrier 120 can be used to support the substrate 180 to be coated with a calcium titanium thin film. The carrier 120 can have a flat supporting surface 122 to stably support the substrate 180. For example, the carrier 120 can be a flat plate structure.

XY軸移動平台130設於噴塗空間112中,並位於載台120所承托之基板180的上方。XY軸移動平台130可在X軸A1與Y軸A2所定義出之XY平面上移動。舉例而言,X軸A1與Y軸A2可彼此垂直。此外,XY平面可平行水平面。The XY axis moving platform 130 is disposed in the spraying space 112 and is located above the substrate 180 supported by the stage 120. The XY axis moving platform 130 can move on the XY plane defined by the X axis A1 and the Y axis A2. For example, the X axis A1 and the Y axis A2 can be perpendicular to each other. In addition, the XY plane can be parallel to the horizontal plane.

超音波噴塗系統140可用以對鈣鈦礦前驅物溶液192進行超音波震盪,而形成許多鈣鈦礦前驅物液滴190,並可在腔體110之噴塗空間112中噴出這些鈣鈦礦前驅物液滴190。超音波噴塗系統140設於XY軸移動平台130上,而可為XY軸移動平台130所帶動。The ultrasonic spraying system 140 can be used to ultrasonically vibrate the calcium-titanium precursor solution 192 to form a plurality of calcium-titanium precursor droplets 190, and can spray these calcium-titanium precursor droplets 190 in the spraying space 112 of the chamber 110. The ultrasonic spraying system 140 is disposed on the XY axis moving platform 130 and can be driven by the XY axis moving platform 130.

在一些實施例中,超音波噴塗系統140包含超音波噴頭142、超音波震盪器144、以及電源供應器146。超音波噴頭142設於噴塗空間112中,且與XY軸移動平台130接合。XY軸移動平台130可帶動超音波噴頭142在基板180之上方的一XY平面上移動,而可以預定路徑行經基板180之整個表面182。超音波噴頭142之移動速率可例如為約1毫米/秒至約50毫米/秒。超音波震盪器144可例如以超音波震盪方式來震盪超音波噴頭142。超音波震盪器144可直接設置在超音波噴頭142上,而直接震盪超音波噴頭142。超音波震盪器144亦可與超音波噴頭142間接接合,而經由中間之結構以間接方式震盪超音波噴頭142。舉例而言,超音波震盪器144可包含超音波產生器、壓電元件、以及變幅桿。進行超音波震盪操作時,可先利用超音波產生器產生特定頻率之電子訊號,此電子訊號可使壓電元件產生相同頻率的機械振動,再藉由變幅桿來放大機械振動之振幅。超音波震盪器144之震盪頻率可為約60kHz至約120kHz。電源供應器146電性連接超音波震盪器144,以提供電力給超音波震盪器144。電源供應器146可設置在腔體110之外。電源供應器146之功率可例如為約0.1瓦至約10瓦。In some embodiments, the ultrasonic spray system 140 includes an ultrasonic nozzle 142, an ultrasonic oscillator 144, and a power supply 146. The ultrasonic nozzle 142 is disposed in the spraying space 112 and is coupled to the XY axis moving platform 130. The XY axis moving platform 130 can drive the ultrasonic nozzle 142 to move on an XY plane above the substrate 180, and can pass through the entire surface 182 of the substrate 180 in a predetermined path. The moving speed of the ultrasonic nozzle 142 can be, for example, about 1 mm/sec to about 50 mm/sec. The ultrasonic oscillator 144 can, for example, oscillate the ultrasonic nozzle 142 in an ultrasonic oscillation manner. The ultrasonic oscillator 144 can be directly mounted on the ultrasonic nozzle 142 to directly vibrate the ultrasonic nozzle 142. The ultrasonic oscillator 144 can also be indirectly connected to the ultrasonic nozzle 142 to indirectly vibrate the ultrasonic nozzle 142 via the intermediate structure. For example, the ultrasonic oscillator 144 can include an ultrasonic generator, a piezoelectric element, and an amplitude transformer. When performing an ultrasonic vibration operation, the ultrasonic generator can first generate an electronic signal of a specific frequency, and this electronic signal can cause the piezoelectric element to generate a mechanical vibration of the same frequency, and then the amplitude transformer can be used to amplify the amplitude of the mechanical vibration. The oscillation frequency of the ultrasonic oscillator 144 may be about 60 kHz to about 120 kHz. The power supply 146 is electrically connected to the ultrasonic oscillator 144 to provide power to the ultrasonic oscillator 144. The power supply 146 may be disposed outside the cavity 110. The power of the power supply 146 may be, for example, about 0.1 watt to about 10 watts.

鈣鈦礦薄膜之噴塗裝置100更可選擇性地包含調整機構200。調整機構200可設於XY軸移動平台130中,而超音波噴頭142則設於此調整機構200之一端。調整機構200可例如透過旋轉方式而沿Z軸A3移動。舉例而言,Z軸A3可垂直X軸A1與Y軸A2。調整機構200可帶動超音波噴頭142沿著Z軸A3移動,藉此可調整超音波噴頭142與基板180之間的間距P。在一些實施例中,可透過調整機構200將超音波噴頭142與基板180之間的間距P控制在約5公分至約20公分。The calcium titanium thin film spray coating device 100 may further optionally include an adjustment mechanism 200. The adjustment mechanism 200 may be disposed in the XY axis moving platform 130, and the ultrasonic nozzle 142 is disposed at one end of the adjustment mechanism 200. The adjustment mechanism 200 may be moved along the Z axis A3, for example, by rotation. For example, the Z axis A3 may be perpendicular to the X axis A1 and the Y axis A2. The adjustment mechanism 200 may drive the ultrasonic nozzle 142 to move along the Z axis A3, thereby adjusting the distance P between the ultrasonic nozzle 142 and the substrate 180. In some embodiments, the distance P between the ultrasonic nozzle 142 and the substrate 180 can be controlled to be between about 5 cm and about 20 cm by adjusting the mechanism 200 .

供料裝置150中容納有鈣鈦礦前驅物溶液192。供料裝置150與超音波噴頭142連接,以持續供應鈣鈦礦前驅物溶液192給超音波噴頭142。供料裝置150可例如為注射幫浦。在一些實施例中,可將供料裝置150供應鈣鈦礦前驅物溶液之速率控制在約0.1毫升/分鐘至約5毫升/分鐘。The feed device 150 contains a calcium-titanium precursor solution 192. The feed device 150 is connected to the ultrasonic nozzle 142 to continuously supply the calcium-titanium precursor solution 192 to the ultrasonic nozzle 142. The feed device 150 may be, for example, an injection pump. In some embodiments, the rate at which the feed device 150 supplies the calcium-titanium precursor solution may be controlled to be about 0.1 ml/min to about 5 ml/min.

輔助氣流元件160鄰設於超音波噴頭142。輔助氣流元件160可噴出氣體,以形成氣流來將超音波噴頭142所噴出之鈣鈦礦前驅物液滴190吹向基板180之表面182。輔助氣流元件160所噴出之氣體可為不會與鈣鈦礦前驅物液滴190發生反應的任何適合氣體。舉例而言,氣體可包含空氣及/或氮氣。在圖1所示之實施例中,輔助氣流元件160為氣流罩,此輔助氣流元件160圍繞在超音波噴頭142之側面之外。輔助氣流元件160與超音波噴頭142之側面之間形成流道,輔助氣流元件160所噴出之氣流經由此流道流出,同時帶動鈣鈦礦前驅物液滴190流向基板180之表面182。The auxiliary airflow element 160 is disposed adjacent to the ultrasonic nozzle 142. The auxiliary airflow element 160 can spray gas to form an airflow to blow the calcium-titanium precursor droplets 190 sprayed by the ultrasonic nozzle 142 toward the surface 182 of the substrate 180. The gas sprayed by the auxiliary airflow element 160 can be any suitable gas that does not react with the calcium-titanium precursor droplets 190. For example, the gas can include air and/or nitrogen. In the embodiment shown in FIG. 1 , the auxiliary airflow element 160 is an airflow hood, and the auxiliary airflow element 160 surrounds the side of the ultrasonic nozzle 142. A flow channel is formed between the auxiliary air flow element 160 and the side surface of the ultrasonic nozzle 142 , and the gas ejected by the auxiliary air flow element 160 flows out through the flow channel, while driving the calcium-titanium precursor droplets 190 to flow toward the surface 182 of the substrate 180 .

本揭露之輔助氣流元件可有不同型式。請參照圖2,其係繪示依照本揭露之另一實施方式的一種鈣鈦礦薄膜之噴塗裝置之超音波噴頭與輔助氣流元件的裝置示意圖。超音波噴頭142a係大致朝水平方向延伸,而非如超音波噴頭142呈向下延伸。因此,超音波噴頭142a之噴射口142a’係大致朝水平方向噴出鈣鈦礦前驅物液滴。輔助氣流元件160a鄰設於超音波噴頭142a之上方,以將超音波噴頭142a之噴射口142a’所噴出之鈣鈦礦前驅物液滴從上而下吹向基板180之表面182。The auxiliary airflow element disclosed in the present invention may have different types. Please refer to FIG. 2, which is a schematic diagram of an ultrasonic nozzle and an auxiliary airflow element of a calcium-titanium thin film spraying device according to another embodiment of the present invention. The ultrasonic nozzle 142a extends generally in a horizontal direction, rather than extending downward like the ultrasonic nozzle 142. Therefore, the nozzle 142a' of the ultrasonic nozzle 142a sprays calcium-titanium precursor droplets generally in a horizontal direction. The auxiliary air flow element 160a is disposed adjacent to the ultrasonic nozzle 142a to blow the calcium-titanium precursor droplets sprayed from the nozzle 142a' of the ultrasonic nozzle 142a toward the surface 182 of the substrate 180 from top to bottom.

請再次參照圖1,加熱裝置170可用以對基板180之表面182上之鈣鈦礦前驅物液滴190進行加熱處理。透過對鈣鈦礦前驅物液滴190加熱,可蒸發鈣鈦礦前驅物液滴190中的溶劑,使鈣鈦礦前驅物液滴190在基板180之表面182上形成鈣鈦礦薄膜並結晶。在圖1所示之實施例中,加熱裝置170直接設置在載台120之底面上並與載台120接觸。加熱裝置170透過直接熱傳方式經由載台120來加熱載台120上之基板180及其上之鈣鈦礦前驅物液滴190。加熱裝置170可對載台120均勻控溫。在一些示範實施例中,將加熱載台120之溫度設定於50℃,以熱顯像儀量測載台120之均溫性時,載台120之面積在1600cm 2下,溫度之不均勻性≤±2℃。 Referring again to FIG. 1 , the heating device 170 can be used to heat the calcium-titanium precursor droplets 190 on the surface 182 of the substrate 180. By heating the calcium-titanium precursor droplets 190, the solvent in the calcium-titanium precursor droplets 190 can be evaporated, so that the calcium-titanium precursor droplets 190 form a calcium-titanium film and crystallize on the surface 182 of the substrate 180. In the embodiment shown in FIG. 1 , the heating device 170 is directly disposed on the bottom surface of the carrier 120 and in contact with the carrier 120. The heating device 170 heats the substrate 180 on the carrier 120 and the calcium-titanium precursor droplet 190 thereon through the carrier 120 by direct heat transfer. The heating device 170 can uniformly control the temperature of the carrier 120. In some exemplary embodiments, the temperature of the heated carrier 120 is set at 50°C. When the temperature uniformity of the carrier 120 is measured by a thermal imager, the temperature non-uniformity of the carrier 120 is ≤±2°C under an area of 1600 cm2 .

在其他實施例中,可以照射裝置等非接觸的加熱裝置,來加熱基板180之表面182上的鈣鈦礦前驅物液滴190,其中加熱裝置並未與載台120接觸。舉例而言,可利用紅外線照射裝置從基板180之表面182的上方照射而加熱鈣鈦礦前驅物液滴190。In other embodiments, a non-contact heating device such as an irradiation device may be used to heat the calcium-titanium precursor droplets 190 on the surface 182 of the substrate 180, wherein the heating device is not in contact with the carrier 120. For example, the calcium-titanium precursor droplets 190 may be heated by irradiating the surface 182 of the substrate 180 from above using an infrared irradiation device.

在一些實施例中,鈣鈦礦薄膜之噴塗裝置100的有效噴塗面積為1600cm 2。利用超音波噴塗系統140將鈣鈦礦前驅物溶液192有效霧化成小粒徑的鈣鈦礦前驅物液滴190,再利用輔助氣流元件160供應氣流將這些鈣鈦礦前驅物液滴190塗覆在基板180之表面182上,同時利用XY軸移動平台130來帶動超音波噴頭142在整個基板180之表面182上方移動。此外,腔體110可阻隔外界環境,而可避免因外界氣流場干擾而造成超音波噴頭142震盪所形成之鈣鈦礦前驅物噴霧的不穩定,進而可避免薄膜不連續而造成薄膜晶粒成核的問題。因此,應用鈣鈦礦薄膜之噴塗裝置100,不僅可大面積噴塗鈣鈦礦薄膜,更可提升鈣鈦礦薄膜之均勻度與晶粒尺寸,達到提高鈣鈦礦薄膜之品質的功效。 In some embodiments, the effective spraying area of the calcium-titanium film spraying device 100 is 1600 cm 2 . The ultrasonic spraying system 140 is used to effectively atomize the calcium-titanium precursor solution 192 into calcium-titanium precursor droplets 190 of small particle size, and then the auxiliary air flow element 160 is used to supply airflow to coat these calcium-titanium precursor droplets 190 on the surface 182 of the substrate 180, and the XY axis moving platform 130 is used to drive the ultrasonic nozzle 142 to move over the surface 182 of the entire substrate 180. In addition, the cavity 110 can block the external environment, and can avoid the instability of the calcium-titanium precursor spray caused by the vibration of the ultrasonic nozzle 142 due to the interference of the external air flow field, thereby avoiding the problem of film discontinuity and film grain nucleation. Therefore, the calcium-titanium film spraying device 100 can not only spray the calcium-titanium film on a large area, but also improve the uniformity and grain size of the calcium-titanium film, thereby achieving the effect of improving the quality of the calcium-titanium film.

請參照圖3,其係繪示依照本揭露之一實施方式的一種鈣鈦礦薄膜之噴塗方法的流程示意圖。可利用上述之鈣鈦礦薄膜之噴塗裝置100來噴塗製造鈣鈦礦薄膜,故請一併參照圖1。噴塗鈣鈦礦薄膜時,可先進行步驟300,以將基板180載入腔體110之噴塗空間112中,並可將基板180放置在載台120之承載面122上。將鈣鈦礦前驅物溶液192導入噴塗空間112前,可先使噴塗空間112處於密閉狀態。在一些實施例中,噴塗空間112在密閉狀態下,可以氮氣充滿噴塗空間112,並將噴塗空間112內之水與氧控制在小於約5ppm。Please refer to FIG. 3, which is a schematic flow diagram of a method for spraying a calcium-titanium thin film according to an embodiment of the present disclosure. The calcium-titanium thin film spraying device 100 described above can be used to spray and manufacture the calcium-titanium thin film, so please refer to FIG. 1 together. When spraying the calcium-titanium thin film, step 300 can be performed first to load the substrate 180 into the spraying space 112 of the chamber 110, and the substrate 180 can be placed on the supporting surface 122 of the carrier 120. Before the calcium-titanium precursor solution 192 is introduced into the spraying space 112, the spraying space 112 can be placed in a sealed state. In some embodiments, the spraying space 112 may be filled with nitrogen in a closed state, and the water and oxygen in the spraying space 112 may be controlled to be less than about 5 ppm.

在一些實施例中,於供應鈣鈦礦前驅物溶液192前,可先利用例如調整機構200沿Z軸A3的方向移動超音波噴頭142,以先根據製程需求來調整超音波噴頭142與基板180之間的間距P。在一些示範實施例中,將超音波噴頭142與基板180之間的間距P控制在約5公分至約20公分。In some embodiments, before supplying the calcium-titanium precursor solution 192, the ultrasonic nozzle 142 may be moved along the direction of the Z-axis A3 by, for example, the adjustment mechanism 200 to adjust the distance P between the ultrasonic nozzle 142 and the substrate 180 according to the process requirements. In some exemplary embodiments, the distance P between the ultrasonic nozzle 142 and the substrate 180 is controlled to be about 5 cm to about 20 cm.

接下來,可進行步驟310,以利用例如供料裝置150將鈣鈦礦前驅物溶液192供應至位在噴塗空間112中的超音波噴頭142。在一些實施例中,鈣鈦礦前驅物溶液192由鈣鈦礦溶液以及前驅液體合成而成,其中鈣鈦礦溶液可採用甲基三碘化鉛(MAPbI 3),前驅液體可採用二甲基甲醯胺(dimethylformamide,DMF)、二甲基亞碸(dimethylsulfoxide,DMSO)非質子性溶劑(polar aprotic solvent)。鈣鈦礦溶液以及前驅液體均可依需求濃度而調整組合。供料裝置150供應鈣鈦礦前驅物溶液192的速率可例如控制在約0.1毫升/分鐘至約5毫升/分鐘。 Next, step 310 may be performed to supply the calcium-titanium precursor solution 192 to the ultrasonic nozzle 142 located in the spraying space 112 by using, for example, the feeding device 150. In some embodiments, the calcium-titanium precursor solution 192 is synthesized from a calcium-titanium solution and a precursor liquid, wherein the calcium-titanium solution may be methyl lead triiodide (MAPbI 3 ), and the precursor liquid may be a polar aprotic solvent such as dimethylformamide (DMF) or dimethylsulfoxide (DMSO). The calcium-titanium solution and the precursor liquid may be adjusted according to the required concentration. The rate at which the feeding device 150 supplies the calcium-titanium ore precursor solution 192 can be controlled, for example, at about 0.1 ml/min to about 5 ml/min.

接著,進行步驟320,以利用超音波噴頭142對鈣鈦礦前驅物溶液192進行霧化步驟,藉以利用超音波震盪方式將鈣鈦礦前驅物溶液192霧化成許多小粒徑的鈣鈦礦前驅物液滴190。進行霧化步驟時,可先利用電源供應器146對超音波震盪器144供應電力,以使超音波震盪器144產生超音波震盪來震盪超音波噴頭142。對超音波震盪器144施加不同之震盪功率可達到不同的溶液霧化效果。在一些實施例中,電源供應器146之功率控制在約0.1瓦至約10瓦。此外,超音波震盪器144之震盪頻率可例如控制在約60kHz至約120kHz。Next, step 320 is performed to atomize the calcium-titanium precursor solution 192 using the ultrasonic nozzle 142, so as to atomize the calcium-titanium precursor solution 192 into a plurality of calcium-titanium precursor droplets 190 of small particle size by ultrasonic vibration. When performing the atomization step, the power supply 146 can first be used to supply power to the ultrasonic oscillator 144, so that the ultrasonic oscillator 144 generates ultrasonic vibration to vibrate the ultrasonic nozzle 142. Applying different vibration powers to the ultrasonic oscillator 144 can achieve different solution atomization effects. In some embodiments, the power of the power supply 146 is controlled to be about 0.1 W to about 10 W. In addition, the vibration frequency of the ultrasonic oscillator 144 can be controlled to be about 60 kHz to about 120 kHz, for example.

進行鈣鈦礦前驅物溶液192的霧化步驟時,可進行步驟330,以同時利用例如XY軸移動平台130在XY平面上移動超音波噴頭142。可以依預設路徑移動超音波噴頭142,使超音波噴頭142蜿蜒地掃過基板180的整個表面182。在一些實施例中,將超音波噴頭142之移動速率控制在約1毫米/秒至約50毫米/秒。透過移動超音波噴頭142,可提升後續生成之鈣鈦礦薄膜的均勻度,並增加鈣鈦礦薄膜之晶粒尺寸。When the atomization step of the calcium-titanium precursor solution 192 is performed, step 330 can be performed to simultaneously move the ultrasonic nozzle 142 in the XY plane using, for example, the XY axis moving platform 130. The ultrasonic nozzle 142 can be moved according to a preset path so that the ultrasonic nozzle 142 sweeps across the entire surface 182 of the substrate 180 in a zigzag manner. In some embodiments, the moving speed of the ultrasonic nozzle 142 is controlled to be about 1 mm/sec to about 50 mm/sec. By moving the ultrasonic nozzle 142, the uniformity of the calcium-titanium film generated subsequently can be improved, and the grain size of the calcium-titanium film can be increased.

進行霧化步驟時,可進行步驟340,以利用例如輔助氣流元件160提供氣流來進行噴塗處理,而將超音波噴頭142所噴出之鈣鈦礦前驅物液滴190吹向基板180之表面182上,使鈣鈦礦前驅物液滴190塗覆在基板180之表面182上。可根據實際製程需求,來調整輔助氣流元件160所噴出之氣流的角度。此外,亦可利用輔助氣流元件160來提供多股不同方向的氣流,以調整鈣鈦礦前驅物液滴190之噴塗範圍與噴塗均勻度。在一些實施例中,輔助氣流元件160所噴出之氣流的流速控制在約10公升/分鐘至約25公升/分鐘。When the atomization step is performed, step 340 can be performed to perform spraying treatment by using, for example, the auxiliary airflow element 160 to provide airflow, and the calcium-titanium precursor droplets 190 sprayed by the ultrasonic nozzle 142 are blown onto the surface 182 of the substrate 180, so that the calcium-titanium precursor droplets 190 are coated on the surface 182 of the substrate 180. The angle of the airflow sprayed by the auxiliary airflow element 160 can be adjusted according to actual process requirements. In addition, the auxiliary airflow element 160 can also be used to provide multiple airflows in different directions to adjust the spraying range and spraying uniformity of the calcium-titanium precursor droplets 190. In some embodiments, the flow rate of the airflow ejected by the auxiliary airflow element 160 is controlled to be about 10 liters/minute to about 25 liters/minute.

隨後,可進行步驟350,以利用例如加熱裝置170對基板180之表面182上的鈣鈦礦前驅物液滴190進行加熱處理。在加熱處理時,可將鈣鈦礦前驅物液滴190中的溶劑蒸發,而使得鈣鈦礦前驅物液滴190形成鈣鈦礦薄膜,並可進一步使鈣鈦礦薄膜結晶,增加鈣鈦礦薄膜之晶粒的尺寸。在一些實施例中,進行加熱處理時可將加熱溫度控制在約25℃至約100℃,使載台120之溫度為約25℃至約100℃。Then, step 350 may be performed to heat the calcium-titanium precursor droplets 190 on the surface 182 of the substrate 180 using, for example, a heating device 170. During the heat treatment, the solvent in the calcium-titanium precursor droplets 190 may be evaporated, so that the calcium-titanium precursor droplets 190 form a calcium-titanium film, and the calcium-titanium film may be further crystallized to increase the grain size of the calcium-titanium film. In some embodiments, the heating temperature may be controlled at about 25° C. to about 100° C. during the heat treatment, so that the temperature of the carrier 120 is about 25° C. to about 100° C.

以下利用比較例與實施例,來更具體說明利用本揭露之實施方式的技術內容與功效。比較例與實施例使用相同之鈣鈦礦前驅物溶液。完成噴塗後,若鈣鈦礦薄膜具有明顯缺陷,肉眼即可辨識出鈣鈦礦薄膜之噴塗均勻度與緻密度;而若鈣鈦礦薄膜的表面不明顯,則可使用光學顯微鏡對鈣鈦礦薄膜進行區域性檢查。另外,利用X光繞射儀量測鈣鈦礦薄膜之結晶性。圖4之圖譜(a)與圖譜(b)分別為比較例與實施例之鈣鈦礦薄膜的X光繞射圖譜。The following uses comparative examples and embodiments to more specifically illustrate the technical content and efficacy of the embodiments disclosed herein. The comparative examples and embodiments use the same calcium-titanium precursor solution. After spraying, if the calcium-titanium film has obvious defects, the spraying uniformity and density of the calcium-titanium film can be identified by naked eyes; and if the surface of the calcium-titanium film is not obvious, an optical microscope can be used to perform regional inspection of the calcium-titanium film. In addition, an X-ray diffraction instrument is used to measure the crystallinity of the calcium-titanium film. Spectra (a) and (b) of FIG. 4 are X-ray diffraction spectra of the calcium-titanium thin film of the comparative example and the embodiment, respectively.

在比較例中,供料裝置的供料速率為0.25毫升/分鐘,超音波噴塗系統之超音波震盪器的電源功率為3.2瓦,超音波震盪器之震盪頻率為60kHz,輔助氣流元件之噴塗氣流的流速為19公升/分鐘,超音波噴頭至基板之間的間距為10公分,超音波噴頭的移動速率為5毫米/秒鐘,載台的溫度為100℃,噴塗來回次數2次。In the comparative example, the feeding rate of the feeding device is 0.25 ml/min, the power of the ultrasonic oscillator of the ultrasonic spraying system is 3.2 W, the oscillation frequency of the ultrasonic oscillator is 60 kHz, the flow rate of the spraying airflow of the auxiliary airflow element is 19 liters/min, the distance between the ultrasonic nozzle and the substrate is 10 cm, the moving speed of the ultrasonic nozzle is 5 mm/s, the temperature of the carrier is 100°C, and the number of spraying back and forth times is 2 times.

在實施例中,供料裝置之供料速率調整為0.75毫升/分鐘,而超音波噴塗系統之超音波震盪器的電源功率為3.2瓦,超音波震盪器之震盪頻率為60KHz,輔助氣流元件之噴塗氣流的流速為19公升/分鐘,超音波噴頭至基板之間的間距為10公分,超音波噴頭的移動速率為5毫米/秒鐘,載台的溫度為100℃,噴塗來回次數2次。In the embodiment, the feeding rate of the feeding device is adjusted to 0.75 ml/min, the power of the ultrasonic oscillator of the ultrasonic spraying system is 3.2 watts, the oscillation frequency of the ultrasonic oscillator is 60 kHz, the flow rate of the spraying airflow of the auxiliary airflow element is 19 liters/min, the distance between the ultrasonic nozzle and the substrate is 10 cm, the moving speed of the ultrasonic nozzle is 5 mm/sec, the temperature of the carrier is 100°C, and the number of spraying back and forth times is 2 times.

比較例之噴塗結果顯示其所形成之鈣鈦礦薄膜厚度較薄。而實施例將供料裝置之供料速率從比較例的0.25毫升/分鐘提高為0.75毫升/分鐘後,肉眼可觀察到實施例之鈣鈦礦薄膜均勻覆蓋在基板之表面上,且鈣鈦礦薄膜之表面皆無孔洞。即,相較於比較例之鈣鈦礦薄膜,實施例之鈣鈦礦薄膜增厚且較為緻密。經判斷,比較例因供料裝置之供料速率過低,而造成鈣鈦礦薄膜厚度較薄。The spraying result of the comparative example shows that the calcium-titanium film formed therein is thinner. After the feeding rate of the feeding device of the embodiment is increased from 0.25 ml/min of the comparative example to 0.75 ml/min, it can be observed with the naked eye that the calcium-titanium film of the embodiment is evenly covered on the surface of the substrate, and there are no holes on the surface of the calcium-titanium film. That is, compared with the calcium-titanium film of the comparative example, the calcium-titanium film of the embodiment is thicker and denser. It is judged that the calcium-titanium film of the comparative example is thinner because the feeding rate of the feeding device is too low.

此外,根據圖4之X光繞射儀的圖譜(a)與圖譜(b)可知,實施例之鈣鈦礦薄膜的結晶性較比較例高。In addition, according to the X-ray diffraction spectra (a) and (b) of FIG. 4 , it can be seen that the crystallinity of the calcium-titanium thin film of the embodiment is higher than that of the comparative example.

另外,對實施例之鈣鈦礦薄膜進行退火實驗,其掃描式電子顯微鏡照片如圖5所示。從圖5可知,在退火溫度100℃下,退火時間30分鐘後,鈣鈦礦薄膜有較高的成核狀態。In addition, the calcium-titanium film of the embodiment was subjected to an annealing experiment, and its scanning electron microscope photograph is shown in Figure 5. As can be seen from Figure 5, at an annealing temperature of 100°C and an annealing time of 30 minutes, the calcium-titanium film has a higher nucleation state.

綜上所述,本揭露之鈣鈦礦薄膜之噴塗裝置的超音波噴塗系統可將鈣鈦礦前驅物溶液有效霧化成小粒徑的液滴,且輔助氣流元件可供應氣流將這些液滴塗覆在基板之表面上,而XY軸移動平台可帶動超音波噴頭在整個基板之表面上方移動。因此,不僅可大面積噴塗鈣鈦礦薄膜,且可提升鈣鈦礦薄膜之均勻度與晶粒尺寸,更可大幅降低鈣鈦礦的浪費,有效降低製程成本。In summary, the ultrasonic spraying system of the calcium-titanium film spraying device disclosed herein can effectively atomize the calcium-titanium precursor solution into droplets of small particle size, and the auxiliary airflow element can provide airflow to coat these droplets on the surface of the substrate, and the XY axis moving platform can drive the ultrasonic spray head to move over the surface of the entire substrate. Therefore, not only can the calcium-titanium film be sprayed over a large area, but also the uniformity and grain size of the calcium-titanium film can be improved, and the waste of calcium-titanium can be greatly reduced, effectively reducing the process cost.

此外,本揭露之鈣鈦礦薄膜之噴塗裝置的腔體可阻隔外界環境,而可使腔體之噴塗空間在噴塗時呈密閉狀態。因此,可避免因外界氣流場干擾而造成超音波震盪所形成之鈣鈦礦前驅物噴霧的不穩定,進而可避免薄膜不連續從而造成薄膜晶粒成核的問題。故,應用本揭露可實現低缺陷之高品質鈣鈦礦薄膜。In addition, the cavity of the spraying device for the calcium-titanium thin film disclosed in the present invention can block the external environment, and the spraying space of the cavity can be closed during spraying. Therefore, the instability of the calcium-titanium precursor spray caused by ultrasonic vibration due to the interference of the external air flow field can be avoided, and the problem of film discontinuity and thus film grain nucleation can be avoided. Therefore, the application of the present invention can achieve a high-quality calcium-titanium thin film with low defects.

再者,本揭露之鈣鈦礦薄膜之噴塗裝置的加熱裝置可對基板控溫,如此鈣鈦礦薄膜形成在基板上的溫度可被穩定地控制,進而鈣鈦礦薄膜的品質可較為穩定。Furthermore, the heating device of the calcium-titanium film spraying device disclosed in the present invention can control the temperature of the substrate, so that the temperature of the calcium-titanium film formed on the substrate can be stably controlled, and the quality of the calcium-titanium film can be more stable.

雖然本揭露已以實施例揭示如上,然其並非用以限定本揭露,任何在此技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作各種之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。Although the present disclosure has been disclosed as above by way of embodiments, it is not intended to limit the present disclosure. Anyone with ordinary knowledge in this technical field may make various changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the definition of the attached patent application scope.

100:噴塗裝置 110:腔體 112:噴塗空間 114:排氣口 120:載台 122:承載面 130:XY軸移動平台 140:超音波噴塗系統 142:超音波噴頭 142a:超音波噴頭 142a’:噴射口 144:超音波震盪器 146:電源供應器 150:供料裝置 160:輔助氣流元件 160a:輔助氣流元件 170:加熱裝置 180:基板 182:表面 190:鈣鈦礦前驅物液滴 192:鈣鈦礦前驅物溶液 200:調整機構 300:步驟 310:步驟 320:步驟 330:步驟 340:步驟 350:步驟 A1:X軸 A2:Y軸 A3:Z軸 P:間距 (a):圖譜 (b):圖譜 100: Spraying device 110: Cavity 112: Spraying space 114: Exhaust port 120: Carrier 122: Carrier surface 130: XY axis moving platform 140: Ultrasonic spraying system 142: Ultrasonic nozzle 142a: Ultrasonic nozzle 142a’: Nozzle 144: Ultrasonic oscillator 146: Power supply 150: Feeding device 160: Auxiliary airflow element 160a: Auxiliary airflow element 170: Heating device 180: Substrate 182: Surface 190: Calcium-titanium ore precursor droplets 192: Calcium-titanium ore precursor solution 200: Adjustment mechanism 300: Step 310: Step 320: Step 330: Step 340: Step 350: Step A1: X axis A2: Y axis A3: Z axis P: Pitch (a): Graph (b): Graph

從以下結合所附圖式所做的詳細描述,可對本揭露之態樣有更佳的了解。需注意的是,根據業界的標準實務,各特徵並未依比例繪示。事實上,為了使討論更為清楚,各特徵的尺寸都可任意地增加或減少。 [圖1]係繪示依照本揭露之一實施方式的一種鈣鈦礦薄膜之噴塗裝置的示意圖。 [圖2]係繪示依照本揭露之另一實施方式的一種鈣鈦礦薄膜之噴塗裝置之超音波噴頭與輔助氣流元件的裝置示意圖。 [圖3]係繪示依照本揭露之一實施方式的一種鈣鈦礦薄膜之噴塗方法的流程示意圖。 [圖4]為本揭露之實施例與比較例之鈣鈦礦薄膜的X光繞射(XRD)圖譜。 [圖5]為本揭露之實施例之鈣鈦礦薄膜的掃描式電子顯微鏡照片。 The following detailed description in conjunction with the attached drawings will provide a better understanding of the present disclosure. It should be noted that, in accordance with standard industry practice, the features are not drawn to scale. In fact, the dimensions of the features may be increased or decreased at will to make the discussion clearer. [Figure 1] is a schematic diagram of a spraying device for a calcium-titanium film according to one embodiment of the present disclosure. [Figure 2] is a schematic diagram of an ultrasonic nozzle and an auxiliary air flow element of a spraying device for a calcium-titanium film according to another embodiment of the present disclosure. [Figure 3] is a schematic diagram of a process of a spraying method for a calcium-titanium film according to one embodiment of the present disclosure. [Figure 4] is an X-ray diffraction (XRD) spectrum of the calcium-titanium film of the embodiment and the comparative example of the present disclosure. [Figure 5] is a scanning electron microscope photo of the calcium-titanium film of the embodiment of the present disclosure.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in the order of storage institution, date, and number) None Foreign storage information (please note in the order of storage country, institution, date, and number) None

100:噴塗裝置 100: Spraying device

110:腔體 110: Cavity

112:噴塗空間 112: Spraying space

114:排氣口 114: Exhaust port

120:載台 120: Carrier

122:承載面 122: Loading surface

130:XY軸移動平台 130: XY axis moving platform

140:超音波噴塗系統 140: Ultrasonic spraying system

142:超音波噴頭 142: Ultrasonic nozzle

144:超音波震盪器 144: Ultrasonic Oscillator

146:電源供應器 146: Power supply

150:供料裝置 150: Feeding device

160:輔助氣流元件 160: Auxiliary airflow element

170:加熱裝置 170: Heating device

180:基板 180: Substrate

182:表面 182: Surface

190:鈣鈦礦前驅物液滴 190: Calcium-titanium ore precursor droplets

192:鈣鈦礦前驅物溶液 192: Calcium-titanium ore precursor solution

200:調整機構 200: Adjustment mechanism

A1:X軸 A1:X axis

A2:Y軸 A2:Y axis

A3:Z軸 A3:Z axis

P:間距 P: Pitch

Claims (11)

一種鈣鈦礦薄膜之噴塗裝置,包含:一腔體,具有一噴塗空間;一載台,設於該噴塗空間中,且配置以承載一基板;一XY軸移動平台,設於該噴塗空間中,且位於該基板之上方,其中該XY軸移動平台可在一XY平面上移動;一超音波噴塗系統,設於該XY軸移動平台上,且配置以對一鈣鈦礦前驅物溶液進行一超音波震盪而形成複數個鈣鈦礦前驅物液滴、以及在該噴塗空間中噴出該些鈣鈦礦前驅物液滴;一供料裝置,與該超音波噴塗系統連接,且配置以供應該鈣鈦礦前驅物溶液給該超音波噴塗系統;一輔助氣流元件,設於該噴塗空間中且設於該超音波噴塗系統之外,且配置以於該超音波噴塗系統噴出該些鈣鈦礦前驅物液滴後噴出一氣流將該些鈣鈦礦前驅物液滴吹向該基板之一表面;以及一加熱裝置,配置以對該基板之該表面上之該些鈣鈦礦前驅物液滴進行一加熱處理。 A calcium-titanium thin film spraying device comprises: a chamber having a spraying space; a carrier disposed in the spraying space and configured to carry a substrate; an XY axis moving platform disposed in the spraying space and above the substrate, wherein the XY axis moving platform can move on an XY plane; an ultrasonic spraying system disposed on the XY axis moving platform and configured to perform an ultrasonic vibration on a calcium-titanium precursor solution to form a plurality of calcium-titanium precursor droplets, and spray the calcium-titanium precursor droplets in the spraying space. Titanium precursor droplets; a feeding device connected to the ultrasonic spraying system and configured to supply the calcium-titanium precursor solution to the ultrasonic spraying system; an auxiliary airflow element, disposed in the spraying space and outside the ultrasonic spraying system, and configured to spray an airflow to blow the calcium-titanium precursor droplets toward a surface of the substrate after the ultrasonic spraying system sprays the calcium-titanium precursor droplets; and a heating device, configured to perform a heating treatment on the calcium-titanium precursor droplets on the surface of the substrate. 如請求項1所述之鈣鈦礦薄膜之噴塗裝置,其中該腔體更具有一排氣口,該排氣口配置以排出該腔體內之多餘氣體。 The calcium-titanium thin film spraying device as described in claim 1, wherein the chamber further has an exhaust port, and the exhaust port is configured to exhaust excess gas in the chamber. 如請求項1所述之鈣鈦礦薄膜之噴塗裝置, 其中該超音波噴塗系統包含:一超音波噴頭,與該XY軸移動平台接合,且可為該XY軸移動平台帶動;一超音波震盪器,設於該超音波噴頭上,且配置以震盪該超音波噴頭;以及一電源供應器,電性連接該超音波震盪器,以提供該超音波震盪器一電力。 The spray coating device of calcium-titanium thin film as described in claim 1, wherein the ultrasonic spray coating system comprises: an ultrasonic nozzle, which is connected to the XY axis moving platform and can be driven by the XY axis moving platform; an ultrasonic oscillator, which is disposed on the ultrasonic nozzle and configured to vibrate the ultrasonic nozzle; and a power supply, which is electrically connected to the ultrasonic oscillator to provide the ultrasonic oscillator with power. 如請求項3所述之鈣鈦礦薄膜之噴塗裝置,更包含一調整機構,其中該調整機構設於該XY軸移動平台中,且該超音波噴頭設於該調整機構之一端,該調整機構配置以帶動該超音波噴頭沿一Z軸方向移動,以調整該超音波噴頭與該基板之間之一間距。 The calcium-titanium thin film spray coating device as described in claim 3 further includes an adjustment mechanism, wherein the adjustment mechanism is arranged in the XY axis moving platform, and the ultrasonic nozzle is arranged at one end of the adjustment mechanism, and the adjustment mechanism is configured to drive the ultrasonic nozzle to move along a Z axis direction to adjust a distance between the ultrasonic nozzle and the substrate. 如請求項1所述之鈣鈦礦薄膜之噴塗裝置,其中該供料裝置包含一注射幫浦。 A calcium-titanium film spraying device as described in claim 1, wherein the feed device comprises an injection pump. 一種鈣鈦礦薄膜之噴塗方法,包含:將一基板載入一腔體之一噴塗空間中,其中該噴塗空間處於一密閉狀態;供應一鈣鈦礦前驅物溶液至該噴塗空間中之一超音波噴頭;利用該超音波噴頭對該鈣鈦礦前驅物溶液進行一霧化步驟,以產生複數個鈣鈦礦前驅物液滴並在該噴塗空間中噴 出該些鈣鈦礦前驅物液滴;進行該霧化步驟時,在一XY平面上移動該超音波噴頭;進行一噴塗處理,以於該超音波噴頭噴出該些鈣鈦礦前驅物液滴後利用一氣流將該些鈣鈦礦前驅物液滴吹向並塗覆在一基板之一表面上;以及對該基板之該表面上之該些鈣鈦礦前驅物液滴進行一加熱處理,以使該些鈣鈦礦前驅物液滴形成一鈣鈦礦薄膜。 A method for spraying a calcium-titanium thin film comprises: loading a substrate into a spraying space of a chamber, wherein the spraying space is in a closed state; supplying a calcium-titanium precursor solution to an ultrasonic nozzle in the spraying space; performing an atomization step on the calcium-titanium precursor solution by using the ultrasonic nozzle to generate a plurality of calcium-titanium precursor droplets and spraying the calcium-titanium precursor droplets in the spraying space; During the atomization step, the ultrasonic nozzle is moved on an XY plane; a spray coating process is performed to blow the calcium-titanium precursor droplets onto a surface of a substrate using an air flow after the ultrasonic nozzle sprays the calcium-titanium precursor droplets; and a heat treatment is performed on the calcium-titanium precursor droplets on the surface of the substrate so that the calcium-titanium precursor droplets form a calcium-titanium film. 如請求項6所述之鈣鈦礦薄膜之噴塗方法,其中該噴塗空間處於該密閉狀態時,該噴塗空間充滿氮氣,且該噴塗空間內之水與氧小於5ppm。 The method for spraying calcium-titanium thin film as described in claim 6, wherein when the spraying space is in the closed state, the spraying space is filled with nitrogen, and the water and oxygen in the spraying space are less than 5 ppm. 如請求項6所述之鈣鈦礦薄膜之噴塗方法,其中進行該霧化步驟時,更包含利用一電源供應器對一超音波震盪器供應一電力,以使該超音波震盪器震盪該超音波噴頭,其中該電源供應器之一功率為0.1瓦至10瓦。 The method for spraying a calcium-titanium thin film as described in claim 6, wherein the atomization step further includes using a power supply to supply power to an ultrasonic oscillator so that the ultrasonic oscillator vibrates the ultrasonic nozzle, wherein a power of the power supply is 0.1 watt to 10 watts. 如請求項6所述之鈣鈦礦薄膜之噴塗方法,其中該超音波噴頭之一移動速率為1毫米/秒至50毫米/秒。 A method for spraying a calcium-titanium thin film as described in claim 6, wherein a moving speed of the ultrasonic nozzle is 1 mm/s to 50 mm/s. 如請求項6所述之鈣鈦礦薄膜之噴塗方法,其中該超音波噴頭與該基板之間之一間距為5公分至20公分。 A method for spraying a calcium-titanium thin film as described in claim 6, wherein the distance between the ultrasonic nozzle and the substrate is 5 cm to 20 cm. 如請求項6所述之鈣鈦礦薄膜之噴塗方法,其中進行該加熱處理更包含控制一加熱溫度為25℃至100℃。 The method for spraying a calcium-titanium film as described in claim 6, wherein the heat treatment further includes controlling a heating temperature to be 25°C to 100°C.
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* Cited by examiner, † Cited by third party
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CN115318475A (en) 2022-08-27 2022-11-11 郭显群 Flush coater is used in metal guardrail spraying

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