TWI834553B - Aerosol deposition equipment - Google Patents

Abstract

This invention provides an aerosol deposition equipment, which comprises a chamber, a plasma device and a spray device. Said chamber defines a processing space and includes a carrier which is set in said processing space and has a carrying surface. Said spray device is used to generate aerosol and send said aerosol into said processing space, and includes an injection unit, an atomization unit and a valve unit. Said valve unit is connected with said chamber, and is used to control said aerosol to enter said processing space. Said valve unit defines a straight channel for said aerosol to pass through and has a contact surface which connected to said chamber. A value of a width of said carrying surface divided by a distance between said carrying surface and said contact surface is greater than 0.05 and less than 3. An angle between a normal direction of said carrying surface and said contact surface is 45 degrees to 135 degrees. A value of a length of said straight channel divided by a minimum equivalent diameter of said straight channel is greater than 0.125 and less than 15.

Description

Aerosol deposition equipment

The present invention relates to a surface treatment equipment, in particular to an aerosol deposition equipment.

Currently, when liquid chemical reagents are used to perform surface treatment such as coating, deposition, or modification on the surface of an object, in order to ensure that the surface of the object has a good surface treatment effect, most liquid chemical reagents are currently used. The reagent is soaked to completely cover the surface of the item. However, the soaking method uses a large amount of liquid chemicals and produces excessive surplus liquid chemical reagents, resulting in a waste of costs. In addition, when surface treatment is performed by immersion, it is mostly done in an atmosphere and normal pressure environment. Therefore, bubbles are easily generated on the surface of the object or dust from the environment falls on the surface of the object, causing the object to be damaged. Incomplete surface treatment affects the yield of subsequent products.

In view of the above-mentioned problems arising from the surface treatment using immersion, please refer to Figure 1. Taiwan Public Patent No. 200820325A discloses a method of using aerosol to treat objects. It is an equipment for surface treatment of the surface of the product. The equipment passes the carrier gas into the storage tank 91 containing the liquid chemical reagent, converts the liquid chemical reagent into an aerosol through the carrier gas, and then introduces the aerosol through the carrier gas. The aerosol is pushed along the conveying pipe 92 to a processing chamber 93 with a vacuum environment, and then the items placed in the processing chamber 93 are surface treated. The use of aerosols to treat the surface of objects can help reduce the use of liquid chemical reagents, and surface treatment in a vacuum environment can also avoid the problem of bubbles or dust falling, but existing equipment is used to transport aerosols The length of the conveying pipe 92 is relatively long, so when the equipment construction space is limited, the conveying pipe 92 usually needs to be bent due to space limitations. Therefore, during the aerosol pushing process, there is an aerosol that adheres to the conveying The inner tube wall of tube 92 causes the problem of waste of liquid chemical reagents. In addition, since the liquid chemical reagent needs to be contained in the storage tank 91 at a sufficient height to convert the liquid chemical reagent into an aerosol through the carrier gas, there is certainly liquid chemical reagent in the storage tank 91 that cannot be converted into an aerosol. Reagents produce a certain amount of redundancy.

Therefore, the first object of the present invention is to provide an aerosol deposition device that can shorten the transportation path of the aerosol, reduce the adhesion of the aerosol to the transportation pipe, and avoid redundant consumption.

Therefore, the aerosol deposition equipment of the present invention includes a cavity, a plasma device Install a spray device.

The cavity defines a processing space and is used to provide a vacuum environment, and includes at least one stage disposed in the processing space. The at least one carrier has a bearing surface.

The plasma device is connected to the cavity and used to generate plasma in the processing space.

The spray device is connected to the cavity and used to generate aerosol and send the aerosol into the processing space, and includes an injection unit, an atomization unit and a valve unit.

The injection unit is used to push the liquid component used to form the aerosol.

The atomization unit is spaced apart from the injection unit and is used to receive the liquid component and convert the liquid component into the aerosol.

The valve unit is disposed between the atomization unit and the cavity and is connected to the cavity, and is used to control the aerosol to enter the processing space, and defines an opening for the aerosol to pass and communicate with the processing space. The straight channel has a contact surface connected to the cavity.

Wherein, the bearing surface faces the contact surface of the valve unit, and the value range of the width of the bearing surface divided by the distance between the bearing surface and the contact surface is greater than 0.05 and less than 3, and the normal direction of the bearing surface is equal to The angle between the contact surfaces ranges from 45 degrees to 135 degrees, and the length of the linear channel divided by the minimum equivalent diameter of the linear channel ranges from greater than 0.125 to less than 15.

Furthermore, the second object of the present invention is to provide a device capable of shortening the aerosol delivery path and reduce aerosol adhesion to the delivery pipe and avoid redundant aerosol deposition equipment.

Therefore, the aerosol deposition equipment of the present invention includes a chamber, a plasma device and a plurality of spray devices.

The cavity defines a processing space and is used to provide a vacuum environment, and includes at least one stage disposed in the processing space. The at least one carrier has a bearing surface.

The plasma device is connected to the cavity and used to generate plasma in the processing space.

The spray devices are spaced apart from each other and connected to the chamber to generate aerosol and deliver the aerosol into the processing space. Each spray device includes an injection unit, an atomization unit and a valve unit.

The injection unit is used to push the liquid component used to form the aerosol.

The atomization unit is spaced apart from the injection unit and is used to receive the liquid component and convert the liquid component into the aerosol.

The valve unit is disposed between the atomization unit and the cavity, and is used to control the aerosol to enter the processing space, and defines a linear channel for the aerosol to pass and communicate with the processing space, and has a The contact surface where the cavity comes into contact.

Wherein, the bearing surface faces the contact surfaces of the valve units, and the value range of the width of the bearing surface divided by the distance between the bearing surface and any one of the contact surfaces is greater than 0.05 and less than 3 , the normal direction of the bearing surface is consistent with the The angle between any one of the contact surfaces ranges from 45 degrees to 135 degrees. In each valve unit, the length of the linear channel divided by the minimum equivalent diameter of the linear channel ranges from greater than 0.125 to less than 15.

Furthermore, the third object of the present invention is to provide an aerosol deposition device that can shorten the transportation path of the aerosol, reduce the adhesion of the aerosol to the transportation pipe, and avoid redundant consumption.

Therefore, the aerosol deposition equipment of the present invention includes a chamber, a plasma device and a spray device.

The cavity defines a processing space and is used to provide a vacuum environment, and includes at least one stage disposed in the processing space. The at least one carrier has a bearing surface.

The plasma device is connected to the cavity and used to generate plasma in the processing space.

The spray device is connected to the cavity and used to generate aerosol and send the aerosol into the processing space, and includes an injection unit, a plurality of atomization units and a plurality of valve units.

The injection unit is used to push the liquid component used to form the aerosol.

The atomization units are spaced apart from each other and from the injection unit, and are used to receive the liquid component and convert the liquid component into the aerosol.

The valve units are disposed correspondingly between the atomization units and the cavity, and are used to control the aerosol to enter the processing space, and each valve unit defines a space for The linear channel through which the aerosol passes and communicates with the processing space has a contact surface in contact with the cavity.

Wherein, the bearing surface faces the contact surfaces of the valve units, and the value range of the width of the bearing surface divided by the distance between the bearing surface and any one of the contact surfaces is greater than 0.05 and less than 3 , the angle between the normal direction of the load-bearing surface and any one of the contact surfaces ranges from 45 degrees to 135 degrees. In each valve unit, the length of the straight channel is divided by the minimum length of the straight channel. The numerical range of equivalent diameter is greater than 0.125 and less than 15.

The effect of the present invention is that through the design of the cavity and the spray device, especially the value range of the width of the bearing surface divided by the distance between the bearing surface and the contact surface of the valve unit is greater than 0.05 and less than 3, And the value range of the length of the linear channel divided by the minimum equivalent diameter of the linear channel is greater than 0.125 and less than 15. The aerosol deposition equipment can shorten the distance for the aerosol to enter the processing space and reduce the adhesion of the aerosol to the processing space. The inner side of the valve unit thus effectively solves the problem of chemical reagent waste. In addition, through the design of the injection unit and the atomization unit to generate the aerosol, the aerosol deposition equipment can also effectively convert the liquid component into the aerosol with almost no problem of redundancy.

1:Cavity

10: Processing space

11: Carrier platform

111: Bearing surface

2: Vacuum pump

3: Plasma device

31:Electrode

32:Plasma power supply parts

33:Gas delivery pipe

4: Spray device

40: Straight channel

401: First aperture part

402: Second aperture part

41:Injection unit

411:Syringe

42: Cover

43:Atomization unit

430:Atomization hole

431:Atomizer parts

432:Atomization power supply parts

433: Adsorption parts

44: Valve unit

441:Contact surface

442: Vacuum valve parts

443: Connecting parts

444:Seals

W: Width of bearing surface

H: distance between load-bearing surface and contact surface

t: length of straight channel

d: Minimum equivalent diameter of straight channel

X: normal direction

α: The angle between the normal direction of the bearing surface and the contact surface

Other features and effects of the present invention will be described with reference to the embodiments of the drawings. is clearly presented in, wherein: Figure 1 is a schematic diagram illustrating existing aerosol deposition equipment; Figure 2 is a schematic diagram illustrating a first embodiment of the aerosol deposition equipment of the present invention; Figure 3 is a schematic diagram illustrating the first embodiment of the aerosol deposition equipment. A variation of the stage in an embodiment; Figure 4 is a partially enlarged schematic diagram illustrating the filling of a plurality of chemical reagents in the syringe in the first embodiment; Figure 5 is a schematic diagram illustrating the first embodiment A variation of the valve unit in the first embodiment; Figure 6 is a schematic diagram illustrating another variation of the valve unit in the first embodiment; Figure 7 is a schematic diagram illustrating a first embodiment of the aerosol deposition equipment of the present invention. Two embodiments; Figure 8 is a schematic diagram illustrating a third embodiment of the aerosol deposition equipment of the present invention; Figure 9 is a schematic diagram illustrating a fourth embodiment of the aerosol deposition equipment of the present invention; Figure 10 is a fluorescent A micrograph illustrating the distribution of cancer cells on the surface of a surface-treated glass wafer substrate; and Figure 11 is a fluorescence micrograph illustrating the distribution of cancer cells on the surface of a non-surface-treated glass wafer substrate Distribution.

In this article, the directions defined between each element, such as upward, downward, Terms such as upper surface and lower surface are only used for clear explanation, but the actual implementation is not limited to the directions defined in this article.

Referring to Figure 2, a first embodiment of the aerosol deposition equipment of the present invention is suitable for surface treatment such as coating, plating or modification on the surface of an object to be processed. The object to be processed may be, but is not limited to, a semiconductor substrate or a biological wafer. The aerosol deposition equipment includes a chamber 1, a vacuum pump 2, a plasma device 3 and a spray device 4.

Referring to FIG. 2 , the cavity 1 defines a processing space 10 and is used to cooperate with the vacuum pump 2 to provide a vacuum environment for surface treatment of the object to be processed. In some embodiments of the present invention, the pressure of the vacuum environment ranges from 1.0×10 ^-3 torr to 1.0×10 ¹ torr. The cavity 1 includes a stage 11 disposed in the processing space 10 , and the stage 11 has a bearing surface 111 for placing the object to be processed. It should be noted that the number of the carriers 11 is not limited to one. The number of the carriers 11 can also be more than two. The number of the carriers 11 can be adjusted according to actual needs. Referring to FIG. 3 , in some embodiments of the present invention, the chamber 1 includes three stages 11 spaced apart from each other in the processing space 10 .

Referring to Figure 2, the vacuum pump 2 is connected to the chamber 1 and is used to control the processing space 10 to a vacuum environment of, for example, 1.0×10 ^-3 torr to 1.0×10 ¹ torr, thereby avoiding the generation of bubbles or dust.

Referring to Figure 2, the plasma device 3 is connected to the chamber 1 and used for the treatment. Space 10 generates plasma. In some embodiments of the present invention, the plasma device 3 includes two electrodes 31 disposed on two opposite sides of the cavity 1 , and an electrical circuit electrically connected to the electrodes 31 and used to control the operation of the electrodes 31 . Plasma power source 32, and a gas delivery pipe 33 connected to the processing space 10 and used to deliver gas used to generate plasma. The gas used to generate plasma includes, but is not limited to, oxygen, nitrogen, hydrogen, etc.

After the plasma device 3 converts the gas used to generate plasma into plasma through the electrodes 31 , the plasma can activate the surface of the object to be processed placed on the stage 11 to facilitate subsequent processing. Surface treatment is carried out. In addition, the plasma can also be used to selectively clean the surface of the object to be processed, thereby further improving the effect of the surface treatment.

Referring to FIG. 2 , the spray device 4 is disposed below the chamber 1 and connected to the chamber 1 , and is used to generate aerosol and send the aerosol into the processing space 10 . The spray device 4 includes an injection unit 41, a cover 42, an atomization unit 43 and a valve unit 44 arranged in sequence from bottom to top.

The injection unit 41 is used to push the liquid component used to form the aerosol. In some embodiments of the present invention, the injection unit 41 has a syringe 411 for filling the liquid component, and a push pump for cooperating with the syringe 411 to push the liquid component (not shown in the figure). ). The liquid component can be matched with one or more chemical reagents selected according to the needs of surface treatment. Referring to Figure 4, in some embodiments of the present invention, when the liquid component contains a plurality of chemical reagents, the chemical reagents can be The insulating gas is added to the syringe 411 to isolate the chemical reagents. Therefore, the chemical reagents are separated by the insulating gas in the syringe 411 without contacting each other, so that different types of chemical reagents can be continuously injected without replacing chemical reagents. The insulating gas is, for example, but not limited to nitrogen, argon, etc.

Referring to FIG. 2 , the cover 42 is connected to the atomization unit 43 and on the side opposite to the valve unit 44 , and is used to block air and water vapor from the outside from entering the processing space 10 , thereby maintaining the vacuum of the processing space 10 environment and prevent external dust from entering the processing space 10 and affecting the surface treatment. In addition, the cover 42 is also used to partially penetrate the syringe 411 so that the liquid component can come into contact with the atomization unit 43 .

Referring to FIG. 2 , the atomization unit 43 is spaced apart from the injection unit 41 and is used to receive the liquid component and convert the liquid component into the aerosol. In some embodiments of the present invention, the atomization unit 43 has an atomization member 431 that connects the valve unit 44 and the cover 42 and uses ultrasonic vibration to convert the liquid component into an aerosol, and an The atomization component 431 is electrically connected to the atomization power supply component 432 used to control the operation of the atomization component 431 . In the first embodiment, the atomization component 431 is a microporous atomization sheet having a plurality of atomization holes 430 arranged in an array.

Referring to FIG. 2 , when the atomizing member 431 is the microporous atomizing sheet, the syringe 411 of the injection unit 41 is disposed below the atomizing member 431 . After the atomizing member 431 receives the liquid component pushed from the syringe 411 through its surface in contact with the cover 42, the atomizing member 431 converts the liquid component into a liquid component through ultrasonic vibration. Aerosol. Referring again to FIG. 2 , in some embodiments of the present invention, when the atomizing member 431 is the microporous atomizing sheet, the atomizing unit 43 further has an atomizing member 431 and the cover. 42 and covers the atomization holes 430 and is used to adsorb the adsorption member 433 of the liquid component. The arrangement of the adsorption member 433 helps to disperse the liquid component on the surface of the atomization member 431 in contact with the cover 42, thereby further helping the generation of aerosol. The adsorbent member 433 is made of, for example but not limited to, porous material made of polyvinyl alcohol (PVA) or melamine.

Referring to FIG. 2 , the valve unit 44 is disposed between the atomization unit 43 and the chamber 1 , is connected to the chamber 1 , and is used to control the aerosol to enter the processing space 10 . The valve unit 44 defines a linear channel 40 for the aerosol to pass and communicates with the processing space 10 , and has a contact surface 441 in contact with the cavity 1 .

In some embodiments of the present invention, the valve unit 44 has a vacuum valve component 442 connected to the atomizing component 431 and a connecting component 443 connecting the vacuum valve component 442 to the cavity 1 . The vacuum valve 442 can be controllably opened and closed to control whether the aerosol can enter the processing space 10 through the linear channel 40, and the vacuum valve 442 defines a first aperture portion for the aerosol to pass. 401. The connecting piece 443 is used to enable the spray device 4 to be tightly connected and fitted to the cavity 1 to avoid the problem of air leakage, and the connecting piece 443 defines a third hole for the aerosol to pass. Two aperture parts 402. The first aperture part 401 and the second aperture part 402 jointly form the linear channel 40 . The connecting member 443 is, for example, but not limited to a tenon or a magnetic buckle. Parts, screw and nut sets containing multiple screws and multiple nuts, etc., as long as the spray device 4 and the cavity 1 can be tightly connected and fitted without air leakage, suitable parts can be selected arbitrarily. It should be noted that in order to prevent the aerosol from adhering to the peripheral wall of the linear channel 40 defined by the valve unit 44 due to diffusion during the process of passing through the linear channel 40, thereby causing the aerosol entering the processing space 10 to become In order to reduce the problem of waste of liquid components, the present invention controls the numerical range of the length (t) of the linear channel 40 divided by the minimum equivalent diameter (d) of the linear channel 40 to be greater than 0.125 and less than 15. When the length (t) of the linear channel 40 divided by the minimum equivalent diameter (d) of the linear channel 40 is more than 15, a large amount of the aerosol will adhere to the processing space 10 before entering the treatment space 10 . On the peripheral wall of the valve unit 44, the effect of the surface treatment is poor.

In some embodiments of the present invention, the equivalent diameter of the linear channel 40 may be uniform or non-uniform depending on the actual shapes of the vacuum valve member 442 and the connecting member 443 . Referring to FIG. 2 , the equivalent diameter of the first aperture part 401 is equal to the equivalent diameter of the second aperture part 402 , so the equivalent diameter of the linear channel 40 is uniform. Referring to FIG. 5 , the equivalent diameter of the first aperture part 401 is smaller than the equivalent diameter of the second aperture part 402 , so the equivalent diameter of the linear channel 40 is not uniform. Referring to FIG. 6 , the equivalent diameter of the first aperture part 401 is larger than the equivalent diameter of the second aperture part 402 , so the equivalent diameter of the linear channel 40 is not uniform.

It should be noted again that, referring to FIG. 2 , in the first embodiment, the bearing surface 111 of the stage 11 is disposed toward the contact surface 441 of the valve unit 44 , thereby allowing the placement The object to be processed on the bearing surface 111 can be in contact with the aerosol for surface treatment. In order to enable the aerosol to evenly disperse and contact the object to be processed placed on the bearing surface 111 after entering the processing space 10, the present invention divides the width (W) of the bearing surface 111 by the bearing surface 111 and The value range of the distance (H) between the contact surfaces 441 of the valve unit 44 is controlled to be greater than 0.05 and less than 3. When the value of the width (W) of the bearing surface 111 divided by the distance (H) between the bearing surface 111 and the contact surface 441 of the valve unit 44 is less than 0.05, the aerosol will The aerosol is adhered to the inner surface of the cavity 1 due to lateral diffusion, so that the aerosol cannot effectively contact the object to be processed. When the value of the width (W) of the bearing surface 111 divided by the distance (H) between the bearing surface 111 and the contact surface 441 of the valve unit 44 is more than 3, the bearing surface 111 will be too close to the contact surface 441, So that after entering the processing space 10, the aerosol contacts the object to be processed in a state that is not uniformly dispersed, resulting in uneven distribution of the aerosol attached to the object to be processed. In addition, referring to Figure 3, in order to allow the aerosol to evenly contact the object to be processed placed on the bearing surface 111, the present invention is to adjust the angle between the normal direction X of the bearing surface 111 and the contact surface 441 (α) Range control is 45 degrees to 135 degrees. Referring again to FIG. 3 , when the cavity 1 includes multiple stages 11 , the angles (α1, α2, α3) between the normal direction X of the bearing surface 111 of each stage 11 and the contact surface 441 range from The angle is 45 degrees to 135 degrees, so that the objects to be processed placed on each bearing surface 111 can come into contact with the aerosol that is evenly distributed and has a consistent adhesion amount, thereby meeting the purpose of mass production.

In the first embodiment, through the design of the cavity 1 and the spray device 4 , in particular, the width (W) of the bearing surface 111 is divided by the distance between the bearing surface 111 and the contact surface 441 of the valve unit 44 The numerical range of the distance (H) is controlled to be greater than 0.05 and less than 3, and the numerical range of the length (t) of the linear channel 40 divided by the minimum equivalent diameter (d) of the linear channel 40 is controlled to be greater than 0.125 and less than 15. The aerosol deposition equipment can effectively shorten the distance for the aerosol to enter the processing space 10 and reduce the risk of the aerosol adhering to the inside of the valve unit 44 (ie, on the peripheral wall of the valve unit 44) during the transportation process. opportunity, thereby effectively solving the problem of waste of chemical reagents in aerosol state that cannot be sent into the processing space 10 . On the other hand, compared with the existing technology that uses carrier gas to convert liquid chemical reagents into aerosols, the first embodiment pushes the liquid components through the injection unit 41 and cooperates with the atomization unit 43 to generate the aerosol. Therefore, the liquid component filled in the syringe 411 can be effectively converted into the aerosol, and there will be almost no unused liquid component. In addition, since the aerosol deposition equipment performs surface treatment by maintaining the processing space 10 in a vacuum environment and using the cover 42 to block external air and moisture from entering the processing space 10, the aerosol deposition The equipment can effectively prevent bubbles or dust from appearing on the surface of the object to be processed and affect the surface treatment, thereby improving the yield of subsequent products.

Referring to Figure 7, a second embodiment of the aerosol deposition equipment of the present invention is mainly different from the first embodiment in that: in the second embodiment, the spray device 4 includes a mist arranged sequentially from bottom to top. chemical unit 43, an injection unit 41 and an The valve unit 44 is provided without the cover 42 . The injection unit 41 is disposed between the atomization unit 43 and the valve unit 44 . The atomization unit 43 is connected to the valve unit 44, and the atomization member 431 of the atomization unit 43 is a non-porous ceramic atomization piece without atomization holes.

Referring to FIG. 7 , when the atomizing member 431 is the non-porous ceramic atomizing sheet, the syringe 411 of the injection unit 41 is disposed above the atomizing member 431 . After the atomizing component 431 receives the liquid component pushed from the syringe 411 through its surface in contact with the valve unit 44, the atomizing component 431 converts the liquid component into an aerosol through ultrasonic vibration. Referring again to FIG. 7 , in some embodiments of the present invention, when the atomizing member 431 is a non-porous ceramic atomizing sheet, the valve unit 44 also has an atomizing member 431 connected to the atomizing member 431 and used to isolate the outside air. A seal 444 is introduced to maintain the vacuum environment of the processing space 10 . In addition, the sealing member 444 is also used to partially penetrate the syringe 411 so that the liquid component can contact the surface of the atomizing member 431 that contacts the valve unit 44 .

Referring to FIG. 8 , a third embodiment of the aerosol deposition equipment of the present invention is mainly different from the first embodiment in that in the third embodiment, the aerosol deposition equipment includes multiple spray devices 4 .

The spray devices 4 are spaced apart from each other and connected to the chamber 1 to generate aerosol and send the aerosol into the processing space 10 . Referring to Figure 8, each spray device 4 includes an injection unit 41, a cover 42, an atomization unit 43 and a valve unit 44 arranged in sequence from bottom to top, wherein the atomization member 431 of the atomization unit 43 It is a microporous atomizer tablet. In each spray device 4, the injection unit 41, the cover 42, The relative position, function and operating relationship between the atomization unit 43 and the valve unit 44 are the same as those described for the injection unit 41, cover 42, atomization unit 43 and valve unit 44 in the first embodiment, so they will not be described again. . It should be noted that in the third embodiment, the injection units 41 of the spray devices 4 independently push the liquid component to the corresponding atomization unit 43, so that through the atomization units 43 each generates aerosol independently. Therefore, the injection units 41 can push the liquid component synchronously and generate aerosol at the same time, or they can push the liquid component asynchronously to generate aerosol according to actual needs.

In addition, in a variation of the third embodiment, when the atomizing members 431 of the atomizing units 43 are non-porous ceramic atomizing sheets, each spray device 4 is as in the second embodiment. That is to say, each spray device 4 includes an atomization unit 43, an injection unit 41 and a valve unit 44 arranged in sequence from bottom to top, without the cover 42 being provided.

In the third embodiment, the bearing surface 111 of the stage 11 of the cavity 1 faces the contact surfaces 441 of the valve units 44 , and the width of the bearing surface 111 is divided by the bearing surface 111 and the contact surfaces 441 The value range of the distance between any one of the contact surfaces 441 is greater than 0.05 and less than 3. The included angle between the normal direction X of the bearing surface 111 and any one of the contact surfaces 441 ranges from 45 degrees to 135 degrees. In each valve unit 44 , the length of the linear channel 40 divided by the minimum equivalent diameter of the linear channel 40 ranges from greater than 0.125 to less than 15.

Referring to Figure 9, a fourth embodiment of the aerosol deposition equipment of the present invention is shown. The main difference of the first embodiment is that in the fourth embodiment, the spray device 4 includes an injection unit 41, a plurality of covers 42, a plurality of atomization units 43 and a plurality of valve units 44, wherein the injection unit 41 The unit 41 is spaced apart from the covers 42 , the atomizing units 43 , and the valve units 44 , and the covers 42 , the atomizing units 43 , and the valve units 44 correspond in number and are respectively composed of a plurality of units. spray groups spaced apart from each other. Each spray group has a cover 42, an atomization unit 43 and a valve unit 44 arranged in sequence from bottom to top, and the atomization member 431 of the atomization unit 43 is a microporous atomization sheet. In each spray group, the relative position, function and operating relationship between the cover 42, the atomization unit 43 and the valve unit 44 are the same as the cover 42, the atomization unit 43 and the valve unit 44 of the first embodiment. mentioned, so I won’t go into details again.

The injection unit 41 is connected to the spray groups and is used to push the liquid component so that the atomization units 43 in the spray groups receive the liquid component synchronously, so that the atomization units 43 The liquid component is simultaneously converted into an aerosol.

It should be noted that in a variation of the fourth embodiment, when the atomizing members 431 of the atomizing units 43 are non-porous ceramic atomizing sheets, the atomizing device 4 is like the second atomizing piece. As described in the spray device 4 in the embodiment, that is to say, the spray device 4 is not provided with the covers 42 , that is, each spray group has an atomization unit 43 and a valve unit 44 arranged in sequence from bottom to top. .

In the fourth embodiment, the bearing surface 111 of the stage 11 of the cavity 1 faces the contact surface 441 of the valve units 44 of the spray groups, and the width of the bearing surface 111 is divided by The numerical range of the distance between the bearing surface 111 and any one of the contact surfaces 441 is greater than 0.05 and less than 3, and the normal direction X of the bearing surface 111 is in contact with any one of the contact surfaces 441 The included angle between the surfaces 441 ranges from 45 degrees to 135 degrees. In each valve unit 44 , the length of the linear channel 40 divided by the minimum equivalent diameter of the linear channel 40 ranges from greater than 0.125 to less than 15.

The present invention will be further described with reference to the following embodiments, but it should be understood that the embodiments are only for illustrative purposes and should not be construed as limitations on the implementation of the present invention.

[Example 1]

The aerosol deposition equipment of the first embodiment is used to perform surface treatment on a 4-inch glass wafer substrate, wherein the glass wafer substrate is placed on the bearing surface 111 of the stage 11, and then the vacuum is used to help Pu 2 controls the pressure of the processing space 10 in the range of 1.0×10 ^-3 torr to 1.0×10 ¹ torr. Then, oxygen is introduced into the processing space 10 and the plasma power supply 32 is turned on to allow the oxygen to pass through The electrodes 31 form oxygen plasma and activate the surface of the glass wafer substrate to obtain an activated glass wafer substrate. The width (W) of the bearing surface 111 divided by the distance (H) between the bearing surface 111 and the contact surface 441 of the valve unit 44 is 1.5. The normal direction X of the bearing surface 111 is in contact with the contact surface 111 . The angle (α) between the surfaces 441 is 90 degrees.

Fill the syringe 411 with 0.5 ml of a polylysine aqueous solution containing poly-L-lysine, and push the polylysine aqueous solution into the syringe 411. It is sent to the surface of the atomizing member 431 that is in contact with the cover 42 and comes into contact with the atomizing member 431. Then, the atomizing power supply unit 432 is turned on so that the polylysine aqueous solution is transformed into At the same time, the vacuum valve 442 is opened so that the aerosol can enter the processing space 10 through the linear channel 40 and be deposited on the surface of the activated glass wafer substrate, thereby obtaining a surface-treated glass wafer substrate. . The length (t) of the linear channel 40 divided by the minimum equivalent diameter (d) of the linear channel 40 is 3.7.

Two cell solutions containing cancer cells stained with 5-chloromethylfluorescein diacetate (CMFDA) were placed on the surface of the surface-treated glass wafer substrate and an untreated cell solution respectively. After 5 minutes, the surface of the surface-treated glass wafer substrate and the surface of the non-surface-treated glass wafer substrate were respectively cleaned with phosphate buffered saline, and then, using A contact angle measuring instrument (Brand: First Ten Ångström; Model: FTA-1000) measured the water content on the surface of the surface-treated glass wafer substrate and the surface of the unsurface-treated glass wafer substrate. Contact angle, and use a fluorescence microscope (Brand: OLYMPUS; Model: IX71) to observe the distribution of cancer cells on the surface of the surface-treated glass wafer substrate and the surface of the non-surface-treated glass wafer substrate . Wherein, the water contact angle on the surface of the surface-treated glass wafer substrate is 30 degrees, the water contact angle on the surface of the unsurface-treated glass wafer substrate is 77.5 degrees, and the observation results of the fluorescence microscope The result is shown in Figure 10 to Figure 11.

Referring to Figures 10 and 11, compared with the surface of the unsurface-treated glass wafer substrate, a large amount of fluorescent signals can be observed on the surface of the surface-treated glass wafer substrate, which indicates that due to the polylysine It was successfully plated on the surface of the glass wafer substrate, so that more cancer cells could be attached to the surface-treated glass wafer substrate.

To sum up, the aerosol deposition equipment of the present invention is achieved through the mutual matching of the cavity 1 and the spray device 4, especially by dividing the width (W) of the bearing surface 111 by the distance between the bearing surface 111 and the valve unit 44. The numerical range of the distance (H) between the contact surfaces 441 is controlled to be greater than 0.05 and less than 3, and the numerical range of the length (t) of the linear channel 40 divided by the minimum equivalent diameter (d) of the linear channel 40 is controlled to be It is greater than 0.125 and less than 15, so that the distance for the aerosol to enter the processing space 10 can be shortened, and at the same time, the chance of the aerosol adhering to the inside of the valve unit 44 (equivalent to the delivery pipe in the prior art) can be reduced. Therefore, The aerosol deposition equipment can effectively solve the problem of chemical reagent waste caused by the aerosol adhering to the delivery pipe. In addition, through the design of the injection unit 41 and the atomization unit 43 to generate the aerosol, the aerosol deposition The equipment can also effectively convert the liquid component into the aerosol and there will be almost no unused liquid component, thereby avoiding problems caused by redundant consumption, so the purpose of the present invention can indeed be achieved. In addition, through the design of the cavity 1 and the spray device 4, the aerosol deposition equipment can also effectively prevent bubbles or dust from appearing on the surface of the object to be processed, thereby improving The yield rate of subsequent products.

It is worth mentioning that compared to using the traditional soaking method for surface treatment, the surface treatment of the 4-inch glass wafer substrate in Example 1 usually requires the use of 50 ml of polylysine acid aqueous solution. The surface of the glass wafer substrate is completely covered, and the aerosol deposition equipment of the present invention only needs to use 0.5 ml of polylysine aqueous solution to complete the surface treatment, which is equivalent to saving 100 times the use of polylysine aqueous solution. quantity, which means that the aerosol deposition equipment of the present invention has the advantage of saving costs.

However, the above are only examples of the present invention. They cannot be used to limit the scope of the present invention. All simple equivalent changes and modifications made based on the patent scope of the present invention and the contents of the patent specification are still within the scope of the present invention. within the scope covered by the patent of this invention.

1:Cavity

10: Processing space

11: Carrier platform

111: Bearing surface

2: Vacuum pump

3: Plasma device

31:Electrode

32:Plasma power supply parts

33:Gas delivery pipe

4: Spray device

40: Straight channel

401: First aperture part

402: Second aperture part

41:Injection unit

411:Syringe

42: Cover

43:Atomization unit

430:Atomization hole

431:Atomizer parts

432:Atomization power supply parts

433: Adsorption parts

44: Valve unit

441:Contact surface

442: Vacuum valve parts

443: Connecting parts

W: Width of bearing surface

H: distance between load-bearing surface and contact surface

t: length of straight channel

d: Minimum equivalent diameter of straight channel

Claims (12)

An aerosol deposition equipment includes: a cavity that defines a processing space and is used to provide a vacuum environment, and includes at least one carrier disposed in the processing space, the at least one carrier having a bearing surface; a plasma A device connected to the cavity and used to generate plasma in the processing space; and a spray device connected to the cavity and used to generate aerosol and send the aerosol into the processing space, and including an injection unit, To push the liquid component used to form the aerosol, an atomization unit is provided at a distance from the injection unit, and is used to receive the liquid component and convert the liquid component into the aerosol, and a valve unit is provided Between the atomization unit and the cavity, it is used to control the aerosol to enter the processing space, and defines a straight channel for the aerosol to pass and communicate with the processing space, and has a contact with the cavity The contact surface of The angle between the normal direction and the contact surface ranges from 45 degrees to 135 degrees, and the length of the straight channel divided by the minimum equivalent diameter of the straight channel ranges from greater than 0.125 to less than 15. The aerosol deposition device according to claim 1, wherein the valve unit has A vacuum valve connected to the atomization unit and a connecting piece connecting the vacuum valve and the cavity, the vacuum valve defining a first aperture part, the connecting piece defining a second aperture part, and the third aperture part An aperture part and the second aperture part jointly form the linear channel. The aerosol deposition device according to claim 2, wherein the equivalent diameter of the first aperture part is not equal to the equivalent diameter of the second aperture part. The aerosol deposition equipment of claim 1, wherein the atomization unit has an atomization member connected to the valve unit and used to convert the liquid component into the aerosol. The aerosol deposition equipment of claim 4, wherein the atomization member is a microporous atomization sheet with a plurality of atomization holes arranged in an array or a non-porous ceramic atomization sheet without atomization holes. The aerosol deposition equipment according to claim 5, wherein when the atomizing member is a microporous atomizing sheet, the atomizing device further includes a side connected to the atomizing unit and opposite to the valve unit. A cover body is used to maintain the vacuum environment of the processing space, and the atomizing member receives the liquid component pushed out from the injection unit with a surface in contact with the cover body. The aerosol deposition equipment according to claim 6, wherein when the atomization member is a microporous atomization sheet, the atomization unit also has an atomization unit that is accommodated between the atomization member and the cover and covers the An adsorption member such as atomization holes and used to adsorb the liquid component. The aerosol deposition device as claimed in claim 5, wherein when the atomizing member is a non-porous ceramic atomizing sheet, the atomizing member receives the air pushed from the injection unit with a surface in contact with the valve unit. the liquid component. The aerosol deposition equipment of claim 5, wherein when the atomizing member is a non-porous ceramic atomizing sheet, the valve unit also has a valve that is connected to the atomizing member and used to maintain a vacuum environment in the processing space. Seals. The aerosol deposition equipment as claimed in claim 1, wherein the cavity includes a plurality of stages spaced apart from each other, and the width of the bearing surface of each stage is divided by the distance between the bearing surface and the contact surface. The value range is greater than 0.05 and less than 3, and the angle range between the normal direction of the bearing surface and the contact surface is 45 degrees to 135 degrees. An aerosol deposition equipment includes: a cavity that defines a processing space and is used to provide a vacuum environment, and includes at least one carrier disposed in the processing space, the at least one carrier having a bearing surface; a plasma A device connected to the cavity and used to generate plasma in the processing space; and a plurality of spray devices, spaced apart from each other and connected to the cavity and used to generate aerosol and send the aerosol into the processing space, each of which The spray device includes an injection unit for pushing the liquid component used to form the aerosol, and an atomization unit spaced apart from the injection unit for receiving the liquid component and converting the liquid component into the gas. The aerosol and a valve unit are disposed between the atomization unit and the cavity, and are used to control the aerosol to enter the processing space, and define a straight channel for the aerosol to pass and communicate with the processing space. and have A contact surface in contact with the cavity; wherein the load-bearing surface faces the contact surfaces of the valve units, and the width of the load-bearing surface is divided by the distance between the load-bearing surface and any one of the contact surfaces The numerical range of the distance is greater than 0.05 and less than 3. The angle range between the normal direction of the bearing surface and any one of the contact surfaces is 45 degrees to 135 degrees. In each valve unit, the straight line The length of the channel divided by the minimum equivalent diameter of the straight channel ranges from greater than 0.125 to less than 15. An aerosol deposition equipment includes: a cavity that defines a processing space and is used to provide a vacuum environment, and includes at least one carrier disposed in the processing space, the at least one carrier having a bearing surface; a plasma A device connected to the cavity and used to generate plasma in the processing space; and a spray device connected to the cavity and used to generate aerosol and send the aerosol into the processing space, and including an injection unit, To push the liquid component used to form the aerosol, a plurality of atomization units are spaced apart from each other and from the injection unit, and are used to receive the liquid component and convert the liquid component into the aerosol, and A plurality of valve units are correspondingly disposed between the atomization units and the cavity, and are used to control the aerosol to enter the processing space, and each valve unit defines a space for the aerosol to pass and communicate with the processing space. The connected linear channel has a contact surface in contact with the cavity; wherein, the load-bearing surface faces the contact surfaces of the valve units, and the width of the load-bearing surface is divided by the distance between the load-bearing surface and the contact surfaces. The value range of the distance between any contact surfaces is greater than 0.05 and less than 3, and the angle range between the normal direction of the load-bearing surface and any one of the contact surfaces is 45 degrees to 135 degrees, in each In the valve unit, the length of the linear channel divided by the minimum equivalent diameter of the linear channel ranges from greater than 0.125 to less than 15.