TWI834103B - Filtration device - Google Patents

Filtration device Download PDF

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TWI834103B
TWI834103B TW111100498A TW111100498A TWI834103B TW I834103 B TWI834103 B TW I834103B TW 111100498 A TW111100498 A TW 111100498A TW 111100498 A TW111100498 A TW 111100498A TW I834103 B TWI834103 B TW I834103B
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electrode
filter
potential
filter chamber
particles
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TW111100498A
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TW202237257A (en
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大森一樹
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日商三菱化工機股份有限公司
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過濾裝置10係包括:水槽80,儲存有對象處理液;複數之過濾單元100,被沉入對象處理液之中;以及第2過濾室35,被配置於兩個過濾單元100之間,而且,與具有對象處理液之空間相隔開。在過濾單元100中,第1電極31係設有複數之第1開口31b。第2電極32,其設有複數之第2開口32b,而且,被設成與第1電極31的一邊之面相向。過濾介質34,其設有複數之開口34b,而且,被設於第1電極31與第2電極32之間。第1過濾室30,其被設成與第1電極31的另一邊之面相接,而且,供給有對象處理液。第3電極33,其被設於第1過濾室30,而且,與第1電極31相向。The filtration device 10 includes: a water tank 80 that stores the target treatment liquid; a plurality of filter units 100 that are submerged in the target treatment liquid; and a second filter chamber 35 that is arranged between the two filter units 100, and, Separate from the space containing the object treatment liquid. In the filter unit 100, the first electrode 31 is provided with a plurality of first openings 31b. The second electrode 32 is provided with a plurality of second openings 32b and is arranged to face one side of the first electrode 31 . The filter medium 34 is provided with a plurality of openings 34b and is provided between the first electrode 31 and the second electrode 32 . The first filter chamber 30 is provided in contact with the other surface of the first electrode 31 and is supplied with the target treatment liquid. The third electrode 33 is provided in the first filter chamber 30 and faces the first electrode 31 .

Description

過濾裝置Filtration device

本發明係關於一種過濾裝置。 The present invention relates to a filter device.

在粒子流體系統漿料之由過濾所做之固液分離中,利用電滲、電泳等以分離分離對象的粒子與液體之方法係被知曉(例如參照專利文獻1、2)。利用電滲之固液分離,其為施加電壓與壓力到被夾在電極間之濾餅層,使濾餅層中的水分,藉電滲作用而通過過濾介質以剔除之方法。又,利用電泳之固液分離,其為使漿料中的粒子藉電泳而移動,以直接接觸到過濾介質,以分離漿料中的粒子之方法。 In the solid-liquid separation by filtration of a particle fluid system slurry, a method of separating particles and liquid to be separated using electroosmosis, electrophoresis, etc. is known (see, for example, Patent Documents 1 and 2). Solid-liquid separation using electroosmosis is a method of applying voltage and pressure to the filter cake layer sandwiched between electrodes, so that the moisture in the filter cake layer is removed through the filter medium through electroosmosis. In addition, solid-liquid separation using electrophoresis is a method in which the particles in the slurry are moved by electrophoresis to directly contact the filter medium to separate the particles in the slurry.

[先行技術文獻] [Advanced technical documents]

[專利文獻] [Patent Document]

〔專利文獻1〕日本特開昭61-018410號公報 [Patent Document 1] Japanese Patent Application Publication No. Sho 61-018410

〔專利文獻2〕國際公開第2004/045748號公報 [Patent Document 2] International Publication No. 2004/045748

在直接接觸漿料中的粒子到過濾介質以固液分離之方法中,有可能產生由過濾介質之阻塞所致之過濾速度降低。 In the method of direct contact between the particles in the slurry and the filter medium for solid-liquid separation, it is possible to reduce the filtration speed due to clogging of the filter medium.

本發明之目的,其在於提供一種可提高過濾速度之過濾裝置。 The purpose of the present invention is to provide a filtration device that can increase the filtration speed.

本發明之一側面之過濾裝置,其具有:水槽,儲存有對象處理液;複數過濾單元,被沉入該對象處理液之中;以及第2過濾室,被配置於兩個該過濾單元之間,而且,與該對象處理液所在之空間相隔開;該過濾單元係包含:第1電極,設有複數第1開口;第2電極,設有複數第2開口,與該第1電極的一邊之面相向,而且,與該第2過濾室相接;過濾介質,設有複數開口,而且,被設於該第1電極與該第2電極之間;第1過濾室,被設成與該第1電極的另一邊之面相接,而且,供給有該對象處理液;以及第3電極,被設於該第1過濾室,而且,與該第1電極相向。 A filter device according to one aspect of the present invention has: a water tank storing a target treatment liquid; a plurality of filter units sunk into the target treatment liquid; and a second filter chamber arranged between two of the filter units. , and is separated from the space where the object treatment liquid is located; the filter unit includes: a first electrode provided with a plurality of first openings; a second electrode provided with a plurality of second openings between one side of the first electrode and The surfaces face each other and are connected to the second filter chamber; the filter medium is provided with a plurality of openings and is disposed between the first electrode and the second electrode; the first filter chamber is disposed to be connected to the second filter chamber. The other surface of the first electrode is in contact with the object processing liquid and is supplied with the object treatment liquid; and the third electrode is provided in the first filter chamber and faces the first electrode.

當依據本發明之過濾裝置時,可提高過濾速度。 When the filter device of the present invention is used, the filtration speed can be increased.

10:過濾裝置 10:Filtering device

13:空氣擴散器 13:Air diffuser

15,16:加壓裝置 15,16: Pressurizing device

17:減壓裝置 17: Pressure reducing device

20:框體 20:frame

30:第1過濾室 30: No. 1 filter chamber

31:第1電極 31: 1st electrode

31a,32a:導電細線 31a,32a: conductive thin wire

31b:第1開口 31b: Opening 1

32:第2電極 32: 2nd electrode

32b:第2開口 32b:The second opening

33:第3電極 33: 3rd electrode

34:過濾介質 34:Filter media

34b:開口 34b:Open your mouth

35:第2過濾室 35: 2nd filter chamber

51:第1電源 51: 1st power supply

52:第2電源 52: 2nd power supply

53:第3電源 53: 3rd power supply

70:漿料(對象處理液) 70: Slurry (target treatment liquid)

71:粒子(分離對象的粒子) 71: Particles (particles of separated objects)

72:液體 72:Liquid

73:水分子 73:Water molecules

74:色素蛋白質 74:Pigment protein

80:水槽 80:Sink

85:排出管 85: Discharge pipe

86:過濾液儲存器 86:Filtrate reservoir

100,101,102,103,104,105,106,107,108:過濾單元 100,101,102,103,104,105,106,107,108: Filter unit

圖1為實施形態之過濾裝置之示意圖。 FIG. 1 is a schematic diagram of the filter device according to the embodiment.

圖2為實施形態之過濾單元之示意圖。 Figure 2 is a schematic diagram of the filter unit of the embodiment.

圖3為概示第1電極、過濾介質及第2電極之構造之剖面圖。 FIG. 3 is a cross-sectional view schematically illustrating the structures of the first electrode, the filter medium, and the second electrode.

圖4為表示實施形態之過濾單元之等效電路圖。 FIG. 4 is an equivalent circuit diagram showing the filter unit of the embodiment.

圖5為表示實施形態之變形例1之過濾單元之等效電路圖。 FIG. 5 is an equivalent circuit diagram showing a filter unit according to Modification 1 of the embodiment.

圖6為實施形態之變形例2之過濾裝置之示意圖。 FIG. 6 is a schematic diagram of a filter device according to Modification 2 of the embodiment.

[用以實施發明的形態] [Form used to implement the invention]

以下,參照圖面,詳細說明本發明。而且,本發明並不侷限於下 述之用於實施發明之形態(以下,稱做實施形態)。又,在下述實施形態中之構造元件中,其包含該業者可容易地假設者、實質上同一者、及所謂均等範圍者。而且,在下述實施形態所開示之構造元件,其可適宜組合。 Hereinafter, the present invention will be described in detail with reference to the drawings. Furthermore, the present invention is not limited to the following The above-mentioned embodiments for implementing the invention (hereinafter referred to as embodiments). In addition, the structural elements in the following embodiments include those that can be easily assumed by the industry, those that are substantially the same, and those within the so-called equal range. Furthermore, the structural elements disclosed in the following embodiments can be combined as appropriate.

圖1為實施形態之過濾裝置之示意圖。圖2為實施形態之過濾單元之示意圖。實施形態之過濾裝置10,其為自做為在液體72中,粒子71被分散之對象處理液之漿料70(原液),分離粒子71之裝置。具體來說,過濾裝置10,其可適用於生命科學領域、污水處理、排水處理領域等。在生命科學領域中,其可適用於進行培養細胞、微細藻類、細菌、細菌、病毒等之微生物體培養之生物產業、或培養微生物體生產於體外、體內之酵素、蛋白質、多糖類、脂質等之利用、做為應用領域之發現生物藥物、化妝品業界等、或處理釀造、發酵、搾汁、飲料等之飲料產業。在污水處理、排水處理領域中,於難過濾性之微細生物質水系統漿料中,可適用於生物質粒子之分離。或者,過濾裝置10,其於表面帶電之微粒子,以電氣性排斥作用而高度分散後之膠體粒子系統漿料中,可適用於膠體微粒子之濃縮回收用途。 FIG. 1 is a schematic diagram of the filter device according to the embodiment. Figure 2 is a schematic diagram of the filter unit of the embodiment. The filtration device 10 of the embodiment is a device that separates the particles 71 from the slurry 70 (original liquid) which is a target treatment liquid in which the particles 71 are dispersed in the liquid 72 . Specifically, the filtering device 10 can be applied in the fields of life sciences, sewage treatment, drainage treatment, etc. In the field of life sciences, it can be applied to the biological industry of cultivating microorganisms such as cells, microalgae, bacteria, bacteria, viruses, etc., or culturing microorganisms to produce enzymes, proteins, polysaccharides, lipids, etc. in vitro and in vivo. It is used as an application field in the discovery of biopharmaceuticals, cosmetics industry, etc., or in the beverage industry that handles brewing, fermentation, juice extraction, beverages, etc. In the fields of sewage treatment and drainage treatment, it can be applied to the separation of biomass particles in difficult-to-filter fine biomass water system slurries. Alternatively, the filter device 10 can be used for the concentration and recovery of colloidal particles in a colloidal particle system slurry in which surface-charged particles are highly dispersed through electrical repulsion.

如圖1所示,過濾裝置10係包括水槽80、複數之濾單元100、複數之第2過濾室35、排出管85、過濾液儲存器86、減壓裝置17、空氣擴散器13、及加壓裝置15。 As shown in Figure 1, the filtering device 10 includes a water tank 80, a plurality of filter units 100, a plurality of second filter chambers 35, a discharge pipe 85, a filtrate storage tank 86, a pressure reducing device 17, an air diffuser 13, and a filter. Pressure device 15.

水槽80係儲存有漿料(原液)70。被儲存於水槽80之漿料(原液)70,其為例如活性污泥。複數之過濾單元100,其沉入漿料(原液)70之中。水槽80中之漿料(原液)70之水面,其處於全部之過濾單元100之上。複數之過濾單元100,其被配置為在水平方向上排列。第2過濾室35,其被配置於在水平方向上排列之兩個過濾單元100間。第2過濾室35,其與水槽80內的漿料(原液)70所在之空間相隔開。兩個過濾單元100間之間隙係被密封,藉此,形成有自漿料(原液)70所處之空間隔開之第2過濾室35。 The water tank 80 stores the slurry (raw solution) 70 . The slurry (raw liquid) 70 stored in the water tank 80 is, for example, activated sludge. A plurality of filter units 100 are sunk into the slurry (raw liquid) 70 . The water surface of the slurry (raw liquid) 70 in the water tank 80 is above all the filter units 100 . A plurality of filter units 100 are configured to be arranged in a horizontal direction. The second filter chamber 35 is arranged between the two filter units 100 arranged in the horizontal direction. The second filter chamber 35 is separated from the space in the water tank 80 where the slurry (raw liquid) 70 is located. The gap between the two filter units 100 is sealed, thereby forming a second filter chamber 35 separated from the space in which the slurry (raw liquid) 70 is located.

排出管85,其為用於排出處於第2過濾室35之過濾液之配管。排出管85,其與複數之第2過濾室35相連接。過濾液儲存器86,其被設於排出管85之中途。自複數之第2過濾室35收集之過濾液,其被收集到過濾液儲存器86。排出管85係與減壓裝置17相連接。減壓裝置17係例如真空幫浦。減壓裝置17係賦予負壓到第2過濾室35。藉由減壓裝置17所產生之壓差,第2過濾室35的漿料(原液)70,其暫時收集到過濾液儲存器86後,排出到水槽80之外部。 The discharge pipe 85 is a pipe for discharging the filtrate liquid in the second filter chamber 35 . The discharge pipe 85 is connected to the plurality of second filter chambers 35 . The filtrate storage tank 86 is provided in the middle of the discharge pipe 85 . The filtrate collected from the plurality of second filter chambers 35 is collected into the filtrate storage 86 . The discharge pipe 85 is connected to the pressure reducing device 17 . The pressure reducing device 17 is, for example, a vacuum pump. The pressure reducing device 17 applies negative pressure to the second filter chamber 35 . Due to the pressure difference generated by the pressure reducing device 17 , the slurry (raw liquid) 70 in the second filter chamber 35 is temporarily collected in the filtrate storage tank 86 and then discharged to the outside of the water tank 80 .

空氣擴散器13係供給氣泡到漿料(原液)70之裝置。空氣擴散器13係被配置於過濾單元100之下方。空氣擴散器13釋出到漿料(原液)70之氣泡,其上昇而通過過濾單元100。加壓裝置15係與空氣擴散器13相連接。加壓裝置15係例如加壓幫浦。藉加壓裝置15之驅動,氣泡自空氣擴散器13釋出到漿料(原液)70內。 The air diffuser 13 is a device that supplies air bubbles to the slurry (raw liquid) 70 . The air diffuser 13 is arranged below the filter unit 100 . The air diffuser 13 releases bubbles to the slurry (raw liquid) 70 , which rise and pass through the filter unit 100 . The pressurizing device 15 is connected to the air diffuser 13 . The pressurizing device 15 is, for example, a pressurizing pump. Driven by the pressurizing device 15, bubbles are released from the air diffuser 13 into the slurry (raw liquid) 70.

如圖2所示,複數之過濾單元100係包含過濾單元101、過濾單元102、過濾單元103、過濾單元104、過濾單元105、過濾單元106、過濾單元107、及過濾單元108。過濾單元101、過濾單元102、過濾單元103、及過濾單元104,其被配置為在一方向X上排列。過濾單元105、過濾單元106、過濾單元107、及過濾單元108,其被配置為在一方向X上排列。在本實施形態中,一方向X係水平方向。過濾單元101及過濾單元105,其被配置為在相對於一方向X而言直交之另一方向Y上排列。過濾單元102及過濾單元106,其被配置為在另一方向Y上排列。過濾單元103及過濾單元107,其被配置為在另一方向Y上排列。過濾單元104及過濾單元108,其被配置為在另一方向Y上排列。在本實施形態中,另一方向Y係鉛直方向。每一個過濾單元100係具有框體20、第1過濾室30、第1電極31、第2電極32、第3電極33、及過濾介質34。 As shown in FIG. 2 , the plurality of filter units 100 includes filter unit 101 , filter unit 102 , filter unit 103 , filter unit 104 , filter unit 105 , filter unit 106 , filter unit 107 , and filter unit 108 . The filter unit 101, the filter unit 102, the filter unit 103, and the filter unit 104 are configured to be arranged in one direction X. The filter unit 105, the filter unit 106, the filter unit 107, and the filter unit 108 are configured to be arranged in one direction X. In this embodiment, one direction X is a horizontal direction. The filter unit 101 and the filter unit 105 are arranged in another direction Y that is orthogonal to the one direction X. The filter unit 102 and the filter unit 106 are configured to be arranged in the other direction Y. The filter unit 103 and the filter unit 107 are configured to be arranged in the other direction Y. The filter unit 104 and the filter unit 108 are configured to be arranged in the other direction Y. In this embodiment, the other direction Y is the vertical direction. Each filter unit 100 has a frame 20 , a first filter chamber 30 , a first electrode 31 , a second electrode 32 , a third electrode 33 , and a filter medium 34 .

第1過濾室30,其為被第1電極31及第3電極33所包圍之空間。 第1過濾室30,其為鉛直方向(方向Y)之上表面及下表面係開口,與水槽80的內部空間相連接。漿料(原液)70係流入第1過濾室30。第1電極31及第2電極32係網目狀之電極。具體來說,第1電極31,其具有複數之導電細線31a,在複數之導電細線31a間,設有複數之第1開口31b。第2電極32,其具有複數之導電細線32a,於複數之導電細線32a間,設有複數之第2開口32b。第2電極32,其被設成透過過濾介質34,與第1電極31的一邊之面相向。換言之,過濾介質34,其被設於第1電極31與第2電極32之間。第1電極31及第2電極32,其被設成與過濾介質34直接相接。第1電極31、過濾介質34及第2電極32,其中介於第1過濾室30與第2過濾室35之間。第2過濾室35,其藉框體20而與水槽80的內部空間相隔離,但是,透過第1電極31、過濾介質34及第2電極32,以與第1過濾室30相連接。複數之導電細線31a及複數之導電細線32a,其可以為金屬,也可以為碳纖維。而且,第1電極31及第2電極32,其並不侷限於與過濾介質34直接相接之構造,其也可以被配置為在與過濾介質34之間具有間隙。 The first filter chamber 30 is a space surrounded by the first electrode 31 and the third electrode 33 . The first filter chamber 30 has openings on its upper surface and lower surface in the vertical direction (direction Y) and is connected to the internal space of the water tank 80 . The slurry (raw liquid) 70 flows into the first filter chamber 30 . The first electrode 31 and the second electrode 32 are mesh-shaped electrodes. Specifically, the first electrode 31 has a plurality of conductive thin wires 31a, and a plurality of first openings 31b are provided between the plurality of conductive thin wires 31a. The second electrode 32 has a plurality of conductive thin wires 32a, and a plurality of second openings 32b are provided between the plurality of conductive thin wires 32a. The second electrode 32 is provided through the filter medium 34 and faces one side of the first electrode 31 . In other words, the filter medium 34 is provided between the first electrode 31 and the second electrode 32 . The first electrode 31 and the second electrode 32 are provided in direct contact with the filter medium 34 . The first electrode 31, the filter medium 34 and the second electrode 32 are located between the first filter chamber 30 and the second filter chamber 35. The second filter chamber 35 is isolated from the internal space of the water tank 80 by the frame 20 , but is connected to the first filter chamber 30 through the first electrode 31 , the filter medium 34 and the second electrode 32 . The plurality of conductive thin wires 31a and the plurality of conductive thin wires 32a may be metal or carbon fiber. Furthermore, the first electrode 31 and the second electrode 32 are not limited to a structure in direct contact with the filter medium 34 , and may be arranged with a gap between the filter medium 34 and the first electrode 31 .

第3電極33,其為板狀之構件,被設成夾持第1過濾室30,以與第1電極31的另一邊之面相向。一個過濾單元100所包括之第1電極31、第2電極32、第3電極33及過濾介質34,其與在另一方向Y鄰接之過濾單元100共用。換言之,一個第1電極31、一個第2電極32、一個第3電極33及一個過濾介質34之每一個,其與在另一方向Y上鄰接之過濾單元100共用。 The third electrode 33 is a plate-shaped member and is provided to face the other surface of the first electrode 31 across the first filter chamber 30 . The first electrode 31, the second electrode 32, the third electrode 33 and the filter medium 34 included in one filter unit 100 are shared with the filter unit 100 adjacent in the other direction Y. In other words, each of a first electrode 31, a second electrode 32, a third electrode 33 and a filter medium 34 is shared with the filter unit 100 adjacent in the other direction Y.

在過濾單元101、過濾單元103、過濾單元105及過濾單元107中,於一方向X中(自圖2之左往右),複數電極係以第3電極33、第1電極31、第2電極32之順序排列。在過濾單元102、過濾單元104、過濾單元106及過濾單元108中,於一方向X中(自圖2之左往右),複數電極係以第2電極32、第1電極31、第3電極33之順序排列。 In the filter unit 101, the filter unit 103, the filter unit 105 and the filter unit 107, in one direction X (from left to right in Figure 2), the plurality of electrodes are the third electrode 33, the first electrode 31, the second electrode 32 in order. In the filter unit 102, the filter unit 104, the filter unit 106 and the filter unit 108, in one direction X (from left to right in FIG. 2), the plurality of electrodes are the second electrode 32, the first electrode 31, and the third electrode. 33 in order.

過濾單元102所包括之第3電極33,其與在一方向X上鄰接之過濾單元103共用。過濾單元106所包括之第3電極33,其與在一方向X上鄰接之過濾單元107共用。換言之,在一方向X上,兩個排列之第1過濾室30之間,其被在一方向X上鄰接之過濾單元100(過濾單元102及過濾單元103之組、及過濾單元106及過濾單元107之組)所共用之第3電極33所分割。 The third electrode 33 included in the filter unit 102 is shared with the filter units 103 adjacent in one direction X. The third electrode 33 included in the filter unit 106 is shared with the filter unit 107 adjacent in one direction X. In other words, between the two arranged first filter chambers 30 in one direction 107 group) are divided by the third electrode 33 shared by the group.

而且,在過濾裝置10中,四個過濾單元100,其也可以未必在一方向X上排列。在一方向X上排列之過濾單元100之數量,其可以為三個以下,也可以為五個以上。又,在一方向X上,被配置於兩個排列之第1過濾室30間之第3電極33,其也可以未必被兩個過濾單元100所共用。亦即,在一方向X上,兩個排列之第1過濾室30之間,也可以配置有彼此絕緣之兩個第3電極33。 Furthermore, in the filter device 10, the four filter units 100 may not necessarily be arranged in one direction X. The number of filter units 100 arranged in one direction X may be less than three or more than five. In addition, the third electrode 33 arranged between two arranged first filter chambers 30 in one direction X may not necessarily be shared by the two filter units 100 . That is, in one direction X, two third electrodes 33 that are insulated from each other may be arranged between two arranged first filter chambers 30 .

複數之過濾單元100,其也可以被配置為在相對於一方向X及另一方向Y兩者而言,直交之方向(往圖2中之紙面之深處之方向)上排列。亦即,複數之過濾單元100,其也可以被配置為三維性地排列。 A plurality of filter units 100 may also be arranged in a direction orthogonal to both the one direction X and the other direction Y (the direction toward the depth of the paper in FIG. 2 ). That is, a plurality of filter units 100 may also be configured to be arranged three-dimensionally.

過濾介質34係包含過濾膜34a與開口34b。在過濾膜34a設有複數之開口34b。電場作用於過濾膜34a。過濾介質34係例如適用精密過濾膜(MF膜(Microfilation Membrane))。在實施形態中,過濾介質34,其以樹脂材料等絕緣材料所形成,藉過濾介質34,第1電極31與第2電極32係被絕緣。而且,在圖2中,第1電極31的第1開口31b、第2電極32的第2開口32b及過濾介質34的開口34b,其以相同大小表示,但是,其只不過係為了說明而示意性地表示者,第1開口31b、第2開口32b及開口34b之大小也可以為不同。 The filter medium 34 includes a filter membrane 34a and an opening 34b. The filter membrane 34a is provided with a plurality of openings 34b. The electric field acts on the filter membrane 34a. For example, a microfiltration membrane (MF membrane (Microfilation Membrane)) is used as the filter medium 34 . In the embodiment, the filter medium 34 is made of an insulating material such as a resin material, and the first electrode 31 and the second electrode 32 are insulated by the filter medium 34 . Furthermore, in FIG. 2 , the first opening 31 b of the first electrode 31 , the second opening 32 b of the second electrode 32 , and the opening 34 b of the filter medium 34 are shown with the same size. However, these are only for illustration. Specifically expressed, the sizes of the first opening 31b, the second opening 32b and the opening 34b may also be different.

而且,圖2所示之過濾單元100之構造,其只不過係一例,只要可形成以第1電極31、第2電極32及過濾介質34與第3電極33所夾持之第1過濾室30,其可以為任何構造。 Moreover, the structure of the filter unit 100 shown in FIG. 2 is just an example, as long as the first filter chamber 30 sandwiched by the first electrode 31, the second electrode 32, the filter medium 34 and the third electrode 33 can be formed. , which can be of any configuration.

圖3為概示第1電極、過濾介質及第2電極之構造之剖面圖。如圖3所示,被設於過濾介質34之開口34b之直徑D3,其小於第1電極31的第1開口31b之直徑D1,而且,小於第2電極32的第2開口32b之直徑D2。換言之,複數之導電細線31a之配置節距、複數之導電細線32a之配置節距、及過濾膜34a之配置節距,其被設成彼此不同。例如第1電極31的第1開口31b之直徑D1,其為0.5μm以上500μm以下,例如70μm左右。第2電極32的第2開口32b之直徑D2,其為0.5μm以上1000μm以下,例如100μm左右。被設於過濾介質34之複數之開口34b之直徑D3,其為0.1μm以上100μm以下,1μm以上7μm以下左右則更佳。 FIG. 3 is a cross-sectional view schematically illustrating the structures of the first electrode, the filter medium, and the second electrode. As shown in FIG. 3 , the diameter D3 of the opening 34 b provided in the filter medium 34 is smaller than the diameter D1 of the first opening 31 b of the first electrode 31 , and is smaller than the diameter D2 of the second opening 32 b of the second electrode 32 . In other words, the arrangement pitch of the plurality of conductive thin wires 31a, the arrangement pitch of the plurality of conductive thin wires 32a, and the arrangement pitch of the filter membrane 34a are set to be different from each other. For example, the diameter D1 of the first opening 31b of the first electrode 31 is 0.5 μm or more and 500 μm or less, for example, about 70 μm. The diameter D2 of the second opening 32b of the second electrode 32 is 0.5 μm or more and 1000 μm or less, for example, about 100 μm. The diameter D3 of the plurality of openings 34b provided in the filter medium 34 is preferably about 0.1 μm or more and 100 μm or less, and more preferably about 1 μm or more and 7 μm or less.

又,第1電極31的第1開口31b之直徑D1,其小於第2電極32的第2開口32b之直徑D2。但是,並不侷限於此,第1電極31的第1開口31b之直徑D1,其也可以被形成為與第2電極32的第2開口32b之直徑D2為相同大小。藉這種構造,在至少與第1開口31b及第2開口32b相重疊之領域中,過濾介質34的開口34b,其被設成與複數之導電細線31a及複數之導電細線32a不重疊。又,第1電極31與第2電極32間之距離,其以過濾介質34之厚度規定。 In addition, the diameter D1 of the first opening 31b of the first electrode 31 is smaller than the diameter D2 of the second opening 32b of the second electrode 32. However, it is not limited to this, and the diameter D1 of the first opening 31b of the first electrode 31 may be formed to be the same size as the diameter D2 of the second opening 32b of the second electrode 32. With this structure, the opening 34b of the filter medium 34 is set not to overlap with the plurality of conductive thin wires 31a and the plurality of conductive thin wires 32a in at least the area overlapping the first opening 31b and the second opening 32b. In addition, the distance between the first electrode 31 and the second electrode 32 is defined by the thickness of the filter medium 34 .

如圖2所示,過濾裝置10係包括複數之第1電源51、複數之第2電源52、及複數之第3電源53。第1電極31,其與第1電源51的第2端子51b電性連接。又,第1電極31,其與第2電源52的第1端子52a電性連接。第2電極32,其與第2電源52的第2端子52b電性連接。第3電極33,其與第3電源53的第1端子53a電性連接。第3電源53的第2端子53b及第1電源51的第1端子51a,其被連接於基準電位GND。基準電位GND係例如接地電位。但是,並不侷限於此,基準電位GND也可以為既定之固定電位。 As shown in FIG. 2 , the filtering device 10 includes a plurality of first power supplies 51 , a plurality of second power supplies 52 , and a plurality of third power supplies 53 . The first electrode 31 is electrically connected to the second terminal 51b of the first power supply 51 . In addition, the first electrode 31 is electrically connected to the first terminal 52a of the second power supply 52. The second electrode 32 is electrically connected to the second terminal 52b of the second power supply 52 . The third electrode 33 is electrically connected to the first terminal 53a of the third power supply 53 . The second terminal 53b of the third power supply 53 and the first terminal 51a of the first power supply 51 are connected to the reference potential GND. The reference potential GND is, for example, the ground potential. However, it is not limited to this, and the reference potential GND may be a predetermined fixed potential.

圖4為表示實施形態之過濾單元之等效電路圖。如圖4所示,第 1電源51,其供給極性與粒子71相同之第1電位V1到第1電極31。第1電位V1係例如-30V。第2電源52,其供給極性與粒子71相同,而且,絕對值大於第1電位V1之絕對值之第2電位V2到第2電極32。第2電位V2係例如-40V。第3電源53,其供給極性與粒子71不同之第3電位V3到第3電極33。第3電位V3係例如+30V。第1電位V1、第2電位V2及第3電位,其可以絕對值設定在1mV以上1000V以下之範圍。 FIG. 4 is an equivalent circuit diagram showing the filter unit of the embodiment. As shown in Figure 4, the 1. The power supply 51 supplies the first potential V1 with the same polarity as that of the particles 71 to the first electrode 31. The first potential V1 is -30V, for example. The second power source 52 supplies the second potential V2 having the same polarity as the particles 71 and having an absolute value greater than the absolute value of the first potential V1 to the second electrode 32 . The second potential V2 is -40V, for example. The third power supply 53 supplies a third potential V3 having a different polarity from that of the particles 71 to the third electrode 33 . The third potential V3 is, for example, +30V. The first potential V1, the second potential V2 and the third potential can be set in the range of 1 mV or more and 1000 V or less in absolute value.

如圖4所示,第1電源51及第3電源53係定電壓源,第2電源52係定電流源。在第1電極31與第2電極32之間,電阻成分R1與電容成分C係並列連接。電阻成分R1及電容成分C,其為藉設有多數之開口34b之過濾介質34,等效表示之成分。又,於第1電極31與第3電極33之間,連接有電阻成分R2。電阻成分R2,其為藉第1過濾室30之漿料(原液)70,等效表示之電阻成分。 As shown in FIG. 4 , the first power supply 51 and the third power supply 53 are constant voltage sources, and the second power supply 52 is a constant current source. Between the first electrode 31 and the second electrode 32, the resistance component R1 and the capacitance component C are connected in parallel. The resistance component R1 and the capacitance component C are components equivalently represented by the filter medium 34 provided with a plurality of openings 34b. Furthermore, a resistance component R2 is connected between the first electrode 31 and the third electrode 33 . The resistance component R2 is equivalent to the resistance component expressed by the slurry (raw liquid) 70 in the first filter chamber 30 .

第2電源52,其可為定電壓電源,也可為定電流電源。在本實施形態中,第2電源52係定電流源,所以,因應過濾裝置10之過濾之狀態,亦即,因應過濾介質34之電阻成分R1及第1過濾室30之電阻成分R2之變動,第2電位V2係改變。但是,第2電位V2之極性係與粒子71之極性相同,其維持比第1電位V1之絕對值還要大之值。 The second power supply 52 may be a constant voltage power supply or a constant current power supply. In this embodiment, the second power supply 52 is a constant current source. Therefore, in response to the filtering state of the filter device 10, that is, in response to changes in the resistance component R1 of the filter medium 34 and the resistance component R2 of the first filter chamber 30, The second potential V2 changes. However, the polarity of the second potential V2 is the same as the polarity of the particle 71, and maintains a value greater than the absolute value of the first potential V1.

藉各電極之驅動,粒子71係自水槽80漿料(原液)70分離。粒子71被分離後之液體72,其通過第1電極31、第2電極32及過濾介質34,流到第2過濾室35。粒子71被分離後之液體72,其透過排出管85以被排出到水槽80之外部。 Driven by each electrode, the particles 71 are separated from the slurry (stock solution) 70 in the water tank 80 . The liquid 72 after the particles 71 are separated passes through the first electrode 31 , the second electrode 32 and the filter medium 34 , and flows to the second filter chamber 35 . The liquid 72 after the particles 71 are separated is discharged to the outside of the water tank 80 through the discharge pipe 85 .

粒子71,其為例如生物質粒子、膠體粒子等,粒子表面係帶負電。具體來說,粒子71在本實施形態中,其為污水活性污泥,但是,其也可以為例如小球藻、微細藻類螺旋藻、膠體二氧化矽、大腸菌等。粒子71之直徑, 其因應適用之技術領域、分離對象之種類而不同,但是,其為5nm以上2000μm以下,例如20nm以上500μm以下左右。 Particles 71 are, for example, biomass particles, colloidal particles, etc., and the surface of the particles is negatively charged. Specifically, the particles 71 are sewage activated sludge in this embodiment, but they may be, for example, chlorella, microalgae Spirulina, colloidal silica, coliform bacteria, or the like. The diameter of particle 71, It differs depending on the technical field to which it is applied and the type of separation object. However, it is about 5 nm to 2000 μm, for example, about 20 nm to 500 μm.

粒子71被分散後之液體72,其為水,一部份之水分子73係帶正電。藉此,漿料(原液)70之全體,其成為被電性中和後之狀態。液體72並不侷限於水,其也可以為酒精等。亦即,液體72只要係極性溶媒即可。 The liquid 72 after the particles 71 are dispersed is water, and part of the water molecules 73 are positively charged. Thereby, the entire slurry (original solution) 70 is in an electrically neutralized state. The liquid 72 is not limited to water, and may also be alcohol or the like. That is, the liquid 72 only needs to be a polar solvent.

又,漿料(原液)70還包含色素蛋白質74。色素蛋白質74,其帶電與粒子71之極性(負)相同,具有小於粒子71之粒徑。色素蛋白質74,其為10nm以上300nm以下,例如30nm左右。而且,也可以沒有色素蛋白質74。 Moreover, the slurry (original solution) 70 further contains the pigment protein 74. The pigment protein 74 has the same electric charge as the polarity (negative) of the particle 71 and has a smaller particle size than the particle 71 . The pigment protein 74 has a diameter of not less than 10 nm and not more than 300 nm, for example, about 30 nm. Moreover, it is also possible to have no pigment protein74.

當漿料(原液)70被供給到第1過濾室30時,依據庫侖定律,帶負電之粒子71與第1電極31之間,產生排斥力。又,於帶負電之粒子71與第3電極33之間,產生吸引力。 When the slurry (raw solution) 70 is supplied to the first filter chamber 30, a repulsive force is generated between the negatively charged particles 71 and the first electrode 31 according to Coulomb's law. Furthermore, an attractive force is generated between the negatively charged particles 71 and the third electrode 33 .

在此,庫侖定律係以下述之公式(1)表示。 Here, Coulomb's law is expressed by the following formula (1).

F=k×(q1×q2/s2)...(1) F=k×(q1×q2/s 2 ). . . (1)

在此,k係常數,以k=4πε表示。q1及q2係電荷,s係電荷間之距離。亦即,距離s愈小,則愈大之庫侖力F作用於粒子71。具體來說,於位於接近第1電極31之位置之粒子71,產生較強力之排斥力,位於接近第3電極33之位置之粒子71,產生較強力之吸引力。在粒子71產生之排斥力及吸引力,其作用於箭頭F1所示之方向,亦即,作用於遠離第1電極31,而接近第3電極33之方向。帶負電之粒子71係藉電泳,移動到第3電極33側。 Here, k is a constant, represented by k=4πε. q1 and q2 are charges, and s is the distance between charges. That is, the smaller the distance s, the greater the Coulomb force F acts on the particle 71. Specifically, the particles 71 located close to the first electrode 31 generate a relatively strong repulsive force, and the particles 71 located close to the third electrode 33 generate a relatively strong attractive force. The repulsive force and attractive force generated by the particles 71 act in the direction indicated by the arrow F1 , that is, in the direction away from the first electrode 31 and closer to the third electrode 33 . The negatively charged particles 71 move to the third electrode 33 side by electrophoresis.

藉此,過濾裝置10,其可抑制粒子71堆積在第1電極31的表面及過濾介質34的表面,以形成濾餅層之情事。亦即,可增大過濾介質34的開口34b之過濾電阻。 Thereby, the filter device 10 can prevent the particles 71 from being accumulated on the surface of the first electrode 31 and the surface of the filter medium 34 to form a filter cake layer. That is, the filter resistance of the opening 34b of the filter medium 34 can be increased.

又,帶正電之水分子73,其在與第1電極31之間,產生吸引力。 作用於帶正電之水分子73之吸引力,其作用於箭頭F2所示之方向,亦即,作用於自第3電極33往第1電極31之方向。帶正電之水分子73,其移動到第1電極31側。此時,藉第1電極31與第2電極32間之電位差,形成有自第1電極31往第2電極32之電場,使得在厚度方向上,貫穿過濾介質34。 In addition, the positively charged water molecules 73 generate an attractive force between the positively charged water molecules 73 and the first electrode 31 . The attractive force acting on the positively charged water molecules 73 acts in the direction indicated by arrow F2, that is, in the direction from the third electrode 33 to the first electrode 31. The positively charged water molecules 73 move to the first electrode 31 side. At this time, an electric field is formed from the first electrode 31 to the second electrode 32 by the potential difference between the first electrode 31 and the second electrode 32 so as to penetrate the filter medium 34 in the thickness direction.

移動到第1電極31側之水分子73,其藉電場而承受力量,以被拉引到第2電極32側,而通過過濾介質34。伴隨著帶正電之水分子73之移動,未帶電之水分子也被拖到第2電極32側,而形成電滲流。藉此,包含帶正電之水分子73之液體72,其流到第2過濾室35。如上所述,粒子71,其藉電泳而自第1電極31被拉離,而移動到第3電極33側,粒子71被分離後之液體72係被排出,藉此,可提高第1過濾室30內的漿料(原液)70的粒子71之濃度。 The water molecules 73 that move to the first electrode 31 side are forced by the electric field to be pulled to the second electrode 32 side and pass through the filter medium 34 . As the positively charged water molecules 73 move, the uncharged water molecules are also dragged to the second electrode 32 side, forming an electroosmotic flow. Thereby, the liquid 72 containing the positively charged water molecules 73 flows into the second filter chamber 35 . As mentioned above, the particles 71 are pulled away from the first electrode 31 by electrophoresis and move to the third electrode 33 side. The liquid 72 after the particles 71 are separated is discharged, thereby improving the first filter chamber. The concentration of particles 71 in the slurry (stock solution) 70 within 30.

如此一來,過濾裝置10,其組合在第1電極31與第3電極33之間,藉庫侖力F(產生於粒子71與第1電極31間之排斥力),而移動粒子71之電泳、及藉第1電極31與第2電極32間之電場,移動水分子73以通過過濾介質34之電滲,藉此,可分離粒子71。又,第1電極31係兼用為電泳之電極、及電滲之電極。藉此,其與單純地施加壓力於漿料(原液)70,而分離粒徑大於過濾介質34的開口34b之粒子71之方法相比較下,可抑制在第1電極31的表面及過濾介質34的表面,形成濾餅層之情事,可提高過濾速度到數倍~10倍以上。 In this way, the filter device 10 is assembled between the first electrode 31 and the third electrode 33, and uses the Coulomb force F (the repulsive force generated between the particles 71 and the first electrode 31) to move the particles 71 electrophoretically, And by utilizing the electric field between the first electrode 31 and the second electrode 32, the water molecules 73 are moved to pass through the electroosmosis of the filter medium 34, whereby the particles 71 can be separated. In addition, the first electrode 31 serves both as an electrophoresis electrode and an electroosmosis electrode. In this way, compared with the method of simply applying pressure to the slurry (original solution) 70 to separate the particles 71 with a particle size larger than the opening 34b of the filter medium 34, it is possible to suppress the formation of particles on the surface of the first electrode 31 and the filter medium 34. The surface of the filter cake layer forms a filter cake layer, which can increase the filtration speed to several times to more than 10 times.

換言之,其與單純地施加壓力於漿料(原液)70之方法相比較下,可提高在第1過濾室30內的漿料(原液)70的粒子71之濃縮度。又,可減少過濾介質34之清掃、更換之頻率,可高效地進行漿料(原液)70之過濾。或者,其與單純地施加壓力到漿料(原液)70,以進行過濾之情形相比較下,即使減少第1過濾室30之體積,減少過濾介質34之面積,也可以實現與先前相同程度之過濾速度。亦即,過濾裝置10係可謀求小型化。 In other words, compared with the method of simply applying pressure to the slurry (raw liquid) 70 , the degree of concentration of the particles 71 of the slurry (raw liquid) 70 in the first filter chamber 30 can be increased. In addition, the frequency of cleaning and replacement of the filter medium 34 can be reduced, and the slurry (raw liquid) 70 can be filtered efficiently. Alternatively, compared with simply applying pressure to the slurry (raw liquid) 70 to perform filtration, even if the volume of the first filter chamber 30 is reduced and the area of the filter medium 34 is reduced, the same level of filtering as before can be achieved. Filtration speed. That is, the filter device 10 can be downsized.

又,藉控制形成於第1電極31與第2電極32間之電場,也可控制通過過濾介質34之粒子等級(粒子直徑)。例如藉施加第1電位V1=-30V於第1電極31,施加第2電位V2=-40V於第2電極32,而於第1電極31與第2電極32之間,形成屏蔽之電場,可抑制粒徑小於過濾介質34的開口34b之色素蛋白質74,通過過濾介質34之情事。 In addition, by controlling the electric field formed between the first electrode 31 and the second electrode 32, the particle level (particle diameter) passing through the filter medium 34 can also be controlled. For example, by applying a first potential V1=-30V to the first electrode 31 and applying a second potential V2=-40V to the second electrode 32, a shielded electric field is formed between the first electrode 31 and the second electrode 32. The pigment protein 74 having a particle size smaller than the opening 34 b of the filter medium 34 is suppressed from passing through the filter medium 34 .

亦即,即使使用相當於精密過濾膜(MF膜)之過濾介質34時,藉在第1電源51、第2電源52及第3電源53之各電極間之電場控制,也可以變更分離對象的粒子直徑至相當於超過濾膜(UF膜)、或奈米過濾膜(NF膜)。超過濾膜(UF膜),其為開口之直徑係10nm以上100nm以下左右之過濾膜。奈米過濾膜(NF膜),其為開口之直徑係1nm以上10nm以下左右之過濾膜。 That is, even when the filter medium 34 equivalent to a precision filter membrane (MF membrane) is used, the separation target can be changed by electric field control between the electrodes of the first power supply 51, the second power supply 52, and the third power supply 53. The particle diameter is equivalent to ultrafiltration membrane (UF membrane) or nanofiltration membrane (NF membrane). Ultrafiltration membrane (UF membrane) is a filtration membrane with an opening diameter of about 10nm to 100nm. Nanofiltration membrane (NF membrane) is a filtration membrane with an opening diameter of about 1 nm to 10 nm.

而且,上述之過濾裝置10之構造僅係一例,而可適宜變更。例如積層第1電極31、過濾介質34及第2電極32以形成之負極過濾板、及第3電極33,其為平行平板狀地相向配置。並不侷限於此,積層第1電極31、過濾介質34及第2電極32以形成之負極過濾板、及第3電極33,其也可以被形成為分別具有曲面。負極過濾板及第3電極33之形狀、配置等,其可因應過濾裝置10之形狀、構造而適宜變更。又,做為被供給到第1過濾室30之對象處理液之漿料(原液)70之濃度,並未特別侷限,可因應過濾裝置10所適用之領域而變更。 Furthermore, the structure of the filter device 10 described above is just an example and can be changed as appropriate. For example, a negative electrode filter plate formed by laminating the first electrode 31, the filter medium 34, and the second electrode 32, and the third electrode 33 are arranged facing each other in parallel flat plates. The negative electrode filter plate and the third electrode 33 formed by laminating the first electrode 31, the filter medium 34 and the second electrode 32 may also be formed to have curved surfaces respectively. The shape and arrangement of the negative filter plate and the third electrode 33 can be appropriately changed according to the shape and structure of the filter device 10 . In addition, the concentration of the slurry (raw liquid) 70 as the target treatment liquid supplied to the first filter chamber 30 is not particularly limited, and can be changed according to the field to which the filter device 10 is applied.

又,第1電位V1、第2電位V2及第3電位V3,其最好因應分離對象的粒子71之種類、要求之過濾特性等,而適宜變更。 In addition, the first potential V1, the second potential V2, and the third potential V3 are preferably changed appropriately according to the type of the particles 71 to be separated, the required filtration characteristics, and the like.

過濾裝置10,其未必要包括加壓裝置16及減壓裝置17兩者。過濾裝置10,其也可以僅包括加壓裝置16及減壓裝置17之一者。 The filtering device 10 does not necessarily include both the pressurizing device 16 and the pressure reducing device 17 . The filtering device 10 may also include only one of a pressurizing device 16 and a pressure reducing device 17 .

在實施形態中,其於第2過濾室35賦予有負壓,第2過濾室35之內部壓力小於第1過濾室30之內部壓力。作為其他之態樣,也可以藉加壓水 槽80之水面,使第1過濾室30之內部壓力,大於第2過濾室35之內部壓力。 In the embodiment, a negative pressure is given to the second filter chamber 35, and the internal pressure of the second filter chamber 35 is smaller than the internal pressure of the first filter chamber 30. As an alternative, you can also use pressurized water The water surface of the tank 80 causes the internal pressure of the first filter chamber 30 to be greater than the internal pressure of the second filter chamber 35 .

過濾裝置10也可以不包括第3電源53。圖5為表示實施形態之變形例1之過濾單元之等效電路圖。如圖5所示,在實施形態之變形例1中,第3電極33係例如被連接於基準電位GND。當連接第3電極33到基準電位GND時,其與設置電源於第1電極31、第2電極32、第3電極33之每一個之情形相比較下,可謀求過濾裝置10之小型化。 The filter device 10 does not need to include the third power supply 53 . FIG. 5 is an equivalent circuit diagram showing a filter unit according to Modification 1 of the embodiment. As shown in FIG. 5 , in Modification 1 of the embodiment, the third electrode 33 is connected to the reference potential GND, for example. When the third electrode 33 is connected to the reference potential GND, compared with the case of providing a power supply to each of the first electrode 31, the second electrode 32, and the third electrode 33, the filter device 10 can be miniaturized.

過濾裝置10,其也可以不包括供給氣泡到對象處理液之空氣擴散器13。圖6為實施形態之變形例2之過濾裝置之示意圖。如上所述,帶負電之粒子71,其藉電泳而移動到第3電極33側(參照圖2)。因此,即使不作用來自空氣擴散器13之氣泡,粒子71也離開過濾介質34之機率較高,而浮遊於水槽80內。結果,較難形成阻塞過濾介質34之濾餅層,而可抑制過濾速度之降低。 The filter device 10 may not include the air diffuser 13 for supplying air bubbles to the target treatment liquid. FIG. 6 is a schematic diagram of a filter device according to Modification 2 of the embodiment. As described above, the negatively charged particles 71 move to the third electrode 33 side by electrophoresis (see FIG. 2 ). Therefore, even if the bubbles from the air diffuser 13 are not acted on, the probability that the particles 71 leave the filter medium 34 and float in the water tank 80 is high. As a result, it is difficult to form a filter cake layer that blocks the filter medium 34, and a decrease in the filtration speed can be suppressed.

如上所述,本實施形態之過濾裝置10係包括:水槽80,儲存有做為對象處理液之漿料70;複數之過濾單元100,沉入對象處理液之中;以及第2過濾室35,被配置於兩個過濾單元100之間,而且,與對象處理液所在之空間相隔開。過濾單元100係包含第1電極31、第2電極32、過濾介質34、第1過濾室30、及第3電極33。第1電極31係設有複數之第1開口31b。第2電極32係設有複數之第2開口32b,而且,被設成與第1電極31的一邊之面相向。過濾介質34,其設有複數之開口34b,而且,被設於第1電極31與第2電極32之間。第1過濾室30,其被設成與第1電極31的另一邊之面相接,而且,供給有對象處理液。第3電極33,其被設於第1過濾室30,而且,與第1電極31相向。 As mentioned above, the filtration device 10 of this embodiment includes: the water tank 80, which stores the slurry 70 as the target treatment liquid; a plurality of filter units 100, which are submerged in the target treatment liquid; and the second filter chamber 35. It is arranged between the two filter units 100 and is separated from the space where the target treatment liquid is located. The filter unit 100 includes a first electrode 31 , a second electrode 32 , a filter medium 34 , a first filter chamber 30 , and a third electrode 33 . The first electrode 31 is provided with a plurality of first openings 31b. The second electrode 32 is provided with a plurality of second openings 32b, and is provided to face one side of the first electrode 31. The filter medium 34 is provided with a plurality of openings 34b and is provided between the first electrode 31 and the second electrode 32 . The first filter chamber 30 is provided in contact with the other surface of the first electrode 31 and is supplied with the target treatment liquid. The third electrode 33 is provided in the first filter chamber 30 and faces the first electrode 31 .

當據此時,僅沉入過濾單元100到水槽80內的對象處理液中,而在過濾單元100浸漬於對象處理液中後之狀態下動作,藉此,可自水槽80內 之做為對象處理液之漿料70,分離液體72及粒子71。又,藉在第1過濾室30中,於第1電極31與第3電極33之間,在粒子71產生之庫侖力F(在粒子71與第1電極31間,所產生之排斥力),粒子71係自第1電極31往第3電極33之方向移動。藉這種電泳,可抑制在第1電極31的表面及過濾介質34的表面,形成濾餅層。又,藉由藉第1電極31與第2電極32間之電場,而移動水分子73,以透過過濾介質34之電滲,可分離粒子71,而可提高在第1過濾室30內的漿料(原液)70的粒子71之濃縮度。藉此,其與單純地施加壓力於漿料(原液)70,分離粒徑大於過濾介質34的開口34b之粒子71之方法相比較下,可提高過濾速度為數倍~10倍以上。 At this time, the filter unit 100 is only sunk into the target treatment liquid in the water tank 80 and operates in a state after the filter unit 100 is immersed in the target treatment liquid. Thereby, the filter unit 100 can be moved from the water tank 80 Using the slurry 70 as the target treatment liquid, the liquid 72 and the particles 71 are separated. In addition, by the Coulomb force F generated on the particles 71 between the first electrode 31 and the third electrode 33 in the first filter chamber 30 (the repulsive force generated between the particles 71 and the first electrode 31), The particles 71 move from the first electrode 31 to the third electrode 33 . This electrophoresis can suppress the formation of a filter cake layer on the surface of the first electrode 31 and the surface of the filter medium 34 . In addition, by using the electric field between the first electrode 31 and the second electrode 32 to move the water molecules 73 to pass through the electroosmosis of the filter medium 34, the particles 71 can be separated, and the slurry in the first filter chamber 30 can be improved. The concentration of the particles 71 of the material (original solution) 70. In this way, compared with the method of simply applying pressure to the slurry (raw liquid) 70 to separate the particles 71 with a particle size larger than the opening 34b of the filter medium 34, the filtration speed can be increased by several times to more than 10 times.

又,過濾裝置10,其包含被設於過濾單元100之下方,而且,供給氣泡到對象處理液之空氣擴散器13。 Furthermore, the filtration device 10 is provided below the filtration unit 100 and includes an air diffuser 13 that supplies air bubbles to the target treatment liquid.

當據此時,水槽80的對象處理液之攪拌係被促進。又,氣泡接觸到第1電極31的表面及過濾介質34的表面,藉此,可更加抑制形成濾餅層。因此,本實施形態之過濾裝置10,其可更加提高過濾速度。 At this time, stirring of the target treatment liquid in the water tank 80 is accelerated. In addition, the bubbles come into contact with the surface of the first electrode 31 and the surface of the filter medium 34, thereby further suppressing the formation of a filter cake layer. Therefore, the filtration device 10 of this embodiment can further increase the filtration speed.

又,過濾裝置10係包含:排出管85,用於排出處於第2過濾室35之過濾液;以及減壓裝置17,被連接於排出管85,賦予負壓到第2過濾室。 Furthermore, the filter device 10 includes a discharge pipe 85 for discharging the filtrate liquid in the second filter chamber 35, and a pressure reducing device 17 connected to the discharge pipe 85 for imparting negative pressure to the second filter chamber.

當據此時,過濾裝置10,其與加壓水槽80之水面之情形等相比較下,可更容易自第1過濾室30,導引對象處理液到第2過濾室35。 In this case, the filtration device 10 can more easily guide the target treatment liquid from the first filtration chamber 30 to the second filtration chamber 35 compared with the situation of the water surface of the pressurized water tank 80 .

又,在過濾裝置10中,於一個過濾單元100中,第2電極32之第2電位V2之絕對值,其大於第1電極31之第1電位V1之絕對值。第1電極31之第1電位V1與第3電極33之第3電位V3之電位差,其大於第1電位V1與第2電位V2之電位差。 Furthermore, in the filtering device 10 and in one filter unit 100, the absolute value of the second potential V2 of the second electrode 32 is greater than the absolute value of the first potential V1 of the first electrode 31. The potential difference between the first potential V1 of the first electrode 31 and the third potential V3 of the third electrode 33 is greater than the potential difference between the first potential V1 and the second potential V2.

當據此時,其與第1電極31與第2電極32之距離相比較下,即使夾持第1過濾室30以相向之第1電極31與第3電極33之距離較大時,藉電 泳,可良好地移動粒子71到第3電極33側。 At this time, compared with the distance between the first electrode 31 and the second electrode 32, even if the distance between the first electrode 31 and the third electrode 33 that sandwich the first filter chamber 30 and face each other is large, the electricity will be borrowed. By swimming, the particles 71 can be moved well to the third electrode 33 side.

而且,上述之實施形態,其為用於容易理解本發明者,並非用於侷限解釋本發明者。本發明係在不脫逸其旨趣下,可變更/改良,同時也包含本發明之等效物。 Furthermore, the above-described embodiments are provided to facilitate understanding of the present invention and are not intended to limit the interpretation of the present invention. The present invention can be changed/improved without departing from the spirit thereof, and equivalents of the present invention are also included.

10:過濾裝置 10:Filtering device

13:空氣擴散器 13:Air diffuser

15:加壓裝置 15: Pressurizing device

17:減壓裝置 17: Pressure reducing device

30:第1過濾室 30: No. 1 filter chamber

35:第2過濾室 35: 2nd filter chamber

80:水槽 80:Sink

85:排出管 85: Discharge pipe

86:過濾液儲存器 86:Filtrate reservoir

100:過濾單元 100:Filter unit

Claims (5)

一種過濾裝置,其具有:水槽,儲存有對象處理液;複數過濾單元,被沉入該對象處理液之中;以及第2過濾室,被配置於兩個該過濾單元間,而且,與具有該對象處理液之空間相隔開,該過濾單元係包含:第1電極,設有複數第1開口;第2電極,設有複數第2開口,與該第1電極的一邊之面相向,而且,與該第2過濾室相接;過濾介質,設有複數開口,而且,被設於該第1電極與該第2電極之間;第1過濾室,被設成與該第1電極的另一邊之面相接,而且,供給有該對象處理液;以及第3電極,被設於該第1過濾室,而且,與該第1電極相向。 A filtration device, which has: a water tank storing a target treatment liquid; a plurality of filter units sunk into the target treatment liquid; and a second filter chamber arranged between two of the filter units, and having the The target processing liquid is separated by space, and the filter unit includes: a first electrode provided with a plurality of first openings; a second electrode provided with a plurality of second openings, facing one side of the first electrode and facing one side of the first electrode; The second filter chamber is connected; the filter medium is provided with a plurality of openings and is disposed between the first electrode and the second electrode; the first filter chamber is disposed between the other side of the first electrode and The surfaces are in contact with each other and the object treatment liquid is supplied; and the third electrode is provided in the first filtration chamber and faces the first electrode. 如請求項1之過濾裝置,其中其包含被設於該過濾單元之下方,而且,供給氣泡到該對象處理液之空氣擴散器。 The filtration device of claim 1, which includes an air diffuser disposed below the filtration unit and supplying air bubbles to the target treatment liquid. 如請求項1之過濾裝置,其中其包含:排出管,用於排出處於該第2過濾室之過濾液;以及減壓裝置,連接於該排出管,以賦予負壓到該第2過濾室。 The filter device of claim 1, which includes: a discharge pipe for discharging the filtered liquid in the second filter chamber; and a pressure reducing device connected to the discharge pipe to impart negative pressure to the second filter chamber. 如請求項2之過濾裝置,其中其包含:排出管,用於排出處於該第2過濾室之過濾液;以及減壓裝置,連接於該排出管,以賦予負壓到該第2過濾室。 The filtration device of claim 2, which includes: a discharge pipe for discharging the filtered liquid in the second filter chamber; and a pressure reducing device connected to the discharge pipe to impart negative pressure to the second filter chamber. 如請求項1~請求項4中任一項之過濾裝置,其中該第2電極之第2電位之絕對值,其大於該第1電極之第1電位之絕對值, 該第1電位與該第3電極之第3電位之電位差,其大於該第1電位與該第2電位之電位差。 The filter device of any one of claims 1 to 4, wherein the absolute value of the second potential of the second electrode is greater than the absolute value of the first potential of the first electrode, The potential difference between the first potential and the third potential of the third electrode is greater than the potential difference between the first potential and the second potential.
TW111100498A 2021-01-14 2022-01-06 Filtration device TWI834103B (en)

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PCT/JP2021/001077 WO2022153446A1 (en) 2021-01-14 2021-01-14 Filtration device
WOPCT/JP2021/001077 2021-01-14

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TWI834103B true TWI834103B (en) 2024-03-01

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008142868A1 (en) 2007-05-24 2008-11-27 Basic Co., Ltd. Water purifier

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008142868A1 (en) 2007-05-24 2008-11-27 Basic Co., Ltd. Water purifier

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