TWI829700B - Substrate transport apparatus - Google Patents

Abstract

A substrate processing apparatus includes a frame and a transport apparatus connected to the frame. The transport apparatus has an upper arm link, a forearm link rotatably coupled to the upper arm link about an elbow axis, at least a third arm link rotatably coupled to the forearm about a wrist axis, and an end effector rotatably coupled to the third arm link about a knuckle axis. A two degree of freedom drive system is operably connected to at least one of the upper arm link, the forearm link, and the third arm link for effecting extension and retraction of the end effector wherein a height of the end effector is within the stack height profile of the wrist axis so that a total stack height of the end effector and wrist axis is sized to conform within a pass through of a slot valve.

Description

Substrate transport device

Exemplary embodiments relate generally to automated processing equipment, and more particularly to substrate transfer devices.

Generally speaking, the distance the substrate transfer device is allowed to extend through the transfer chamber gate valve into the processing module is limited by the size of the gate valve. Typically, only the end effector extends through the gate valve while the remainder of the substrate transfer arm remains within the transfer chamber.

It may be advantageous to transfer the substrate through the transfer chamber gate valve so that at least part of the arm link(s) supporting the end effector extends through the gate valve to provide greater reach for coupling to the transfer chamber. In the processing module of the gate valve.

According to one or more aspects of the disclosed embodiments, a substrate processing apparatus includes: a frame; a transfer device connected to the frame, the transfer device having an upper arm link, a forearm rotatably coupled to the upper arm link about an toggle axis a link, at least a third arm link rotatably coupled to the forearm about the wrist axis, an end effector rotatably coupled to the third arm about the finger axis; and a drive system with at least two degrees of freedom, operably connected to at least one of the upper arm link, the forearm link and the third arm link to effect extension and retraction of the end effector, wherein the height of the end effector is within the stack height profile of the wrist axis, The total stack height of the end effector and wrist is then sized to fit through the slot valve.

According to one or more aspects of the disclosed embodiments, the length of the third arm link is less than the length of the upper arm link, and the length of the upper arm link is less than the length of the forearm link.

According to one or more aspects of the disclosed embodiments, rotation of the end effector is driven by rotation of the forearm link and rotation of the third arm link is driven by rotation of the upper arm link.

According to one or more aspects of the disclosed embodiments, the upper arm is rotatably coupled to a two-degree-of-freedom drive system at a shoulder axis; the end effector is a double-ended end effector; and the transfer device is configured on an opposite side of the shoulder axis. It extends in both directions, and the entire transmission device does not rotate around the shoulder axis.

According to one or more aspects of the disclosed embodiments, the third arm link includes a slot configured to receive at least a portion of the end effector such that the end effector is rotatably coupled to the third arm link in the slot. Rod.

According to one or more aspects of the disclosed embodiments, the end effector is disposed above or below the third arm link.

According to one or more aspects of the disclosed embodiments, the forearm link is a tapered structure; and the upper arm link has a matching tapered structure configured to complement the tapered structure of the forearm link such that at least part of the upper arm link Coplanar with part of the forearm link.

According to one or more aspects of the disclosed embodiments, the third arm link is driven by the upper arm link through dual sets of forearm pulleys disposed in the forearm.

According to one or more aspects of the disclosed embodiments, the extension and retraction axes of the conveyor pass centrally over the rotational shoulder axis of the conveyor.

In accordance with one or more aspects of the disclosed embodiments, the conveyor is configured to extend bi-directionally on opposite sides of a shoulder axis of the conveyor, wherein the radial extensions of the conveyor arms are generally symmetrical on opposite sides of the shoulder axis.

According to one or more aspects of the disclosed embodiments, the end effector remains aligned with the extension and retraction axis throughout the range of extension and retraction of the delivery device.

According to one or more aspects of the disclosed embodiments, the third arm link is generally aligned with the forearm link in the initial posture of the conveyor.

In accordance with one or more aspects of the disclosed embodiments, the third arm link is driven by a belt drive having a single belt height.

According to one or more aspects of the disclosed embodiments, a substrate processing apparatus includes: a frame; a transfer device connected to the frame, the transfer device having an upper arm link, a forearm rotatably coupled to the upper arm link about an toggle axis a link, at least a third arm link rotatably coupled to the forearm about a wrist axis, an end effector rotatably coupled to the third arm link about a finger axis; and a drive system operable Groundly connected to at least one of the upper arm link, the forearm link and the third arm link to implement extension and retraction of the end effector, wherein the transmission device has an extension range that is the upper arm link, the forearm link, the third arm link The maximum extension range of the conveyor of the three-arm link and the end effector in the retracted configuration for the predetermined swing diameter of the conveyor, which maximum extension range allows the end effector, its finger shaft and at least part of the third arm link (including wrist shaft) extends through the slot valve of the substrate handling unit.

According to one or more aspects of the disclosed embodiments, the drive system is a two-degree-of-freedom drive system.

According to one or more aspects of the disclosed embodiments, rotation of the end effector is driven by rotation of the forearm link and rotation of the third arm link is driven by rotation of the upper arm link.

According to one or more aspects of the disclosed embodiments, the drive system is a three-degree-of-freedom drive system.

In accordance with one or more aspects of the disclosed embodiments, the drive system is a four-degree-of-freedom drive system.

According to one or more aspects of the disclosed embodiments, the length of the third arm link is less than the length of the upper arm link, and the length of the upper arm link is less than the length of the forearm link.

According to one or more aspects of the disclosed embodiments, the upper arm is rotatably coupled to a two-degree-of-freedom drive system at a shoulder axis; the end effector is a double-ended end effector; and the transfer device is configured on an opposite side of the shoulder axis. It extends in both directions, and the entire transmission device does not rotate around the shoulder axis.

According to one or more aspects of the disclosed embodiments, the third arm link includes a slot configured to receive at least a portion of the end effector such that the end effector is rotatably coupled to the third arm link in the slot. Rod.

According to one or more aspects of the disclosed embodiments, the end effector is disposed above or below the third arm link.

According to one or more aspects of the disclosed embodiments, the forearm link is a tapered structure; and the upper arm link has a matching tapered structure configured to complement the tapered structure of the forearm link such that at least part of the upper arm link Coplanar with part of the forearm link.

According to one or more aspects of the disclosed embodiments, the extension and retraction axes of the conveyor pass centrally over the rotational shoulder axis of the conveyor.

In accordance with one or more aspects of the disclosed embodiments, the conveyor is configured to extend bi-directionally on opposite sides of a shoulder axis of the conveyor, wherein the radial extensions of the conveyor arms are generally symmetrical on opposite sides of the shoulder axis.

According to one or more aspects of the disclosed embodiments, the end effector remains aligned with the extension and retraction axis throughout the range of extension and retraction of the delivery device.

According to one or more aspects of the disclosed embodiments, the third arm link is generally aligned with the forearm link in the initial posture of the conveyor.

In accordance with one or more aspects of the disclosed embodiments, the third arm link is driven by a belt drive having a single belt height.

According to one or more aspects of the disclosed embodiments, a method of transporting a substrate includes providing a transport device connected to a frame, the transport device having an upper arm link, a forearm link rotatably coupled to the upper arm link about an toggle axis. a rod, at least a third arm link rotatably coupled to the forearm about a wrist axis, an end effector rotatably coupled to the third arm link about a finger axis; and a drive system with two degrees of freedom to implement extension or retraction of the upper arm link, forearm link, third arm link, and end effector such that the wrist axis extends through the slot valve; where the height of the end effector is within the stack height profile of the wrist axis , so that the total stack height of the end effector and wrist shaft is sized to fit through the slot valve.

According to one or more aspects of the disclosed embodiments, the conveyor has an extension range that is one of the predetermined swing diameters of the upper arm link, forearm link, third arm link, and end effector in the retraction configuration for the conveyor. The maximum reach of the conveyor that allows the end effector, its finger shaft, and at least part of the third arm link (including the wrist shaft) to extend through the slot valve of the substrate processing apparatus.

According to one or more aspects of the disclosed embodiments, the method further includes bidirectionally extending the upper arm link, the forearm link, the third arm link, and the end effector on opposite sides of the shoulder axis without the transfer device entirely surrounding the shoulder axis. shoulder axis to rotate.

1A-1M are schematic diagrams of a substrate processing apparatus in accordance with various aspects of disclosed embodiments. Although aspects of the disclosed embodiments will be described with reference to the drawings, it should be understood that the aspects of the disclosed embodiments can be embodied in many forms. Incidentally, any suitable size, shape or type of components or materials may be used.

Aspects of the disclosed embodiments provide methods and apparatus for transferring substrates to and from a deep set substrate holding station of a processing module using a transfer arm, wherein at least a third arm link of the transfer arm ( Also called cut-off arm links, which have rotating fingers) provide the transfer arm with a longer reach than conventional transfer arms with equal or unequal arm links, as will be described in more detail below. The cutter arm linkage is coupled to the forearm of the transfer arm at the wrist axis (also called the wrist joint) and, together with the forearm and end effector, is sized to have a stacking height that allows the wrist axis to pass through the gate valve of the processing module Or port. The wrist provision through the gate port allows portions of the forearm, wrist shaft, cutter arm linkage and at least portions of the end effector to extend within the processing chamber to access the recessed substrate holding station of the processing module.

Shown are processing apparatuses 100A, 100B, 100C, 100D, 100E, 100F, 100G, 100H, such as, for example, a semiconductor tool station, in accordance with aspects of the disclosed embodiments. Although the drawings show a semiconductor tool station, aspects of the disclosed embodiments described herein may be applied to any tool station or application employing torque coupling. In one aspect, the processing devices 100A, 100B, 100C, 100D, 100E, 100F, 100G, 100H, 100I are shown with a clustered tool arrangement (eg, with substrate holding stations connected to a central chamber), but in other aspects, the processing devices The tools 100L, 100M may be linearly arranged, as described in U.S. Patent No. 8,398,355 entitled "Linearly Distributed Semiconductor Workpiece Processing Tool" issued on March 19, 2013 (which is disclosed in its entirety and is incorporated herein by reference); however, Aspects of the disclosed embodiments may be applied to any suitable tool station. Devices 100A, 100B, 100C, 100D, 100E, 100F, 100G, 100H, 100I generally include an atmospheric pressure front end 101, at least one vacuum load lock 102, 102A, 102B, 102C, and a vacuum back end 103. At least one vacuum load lock 102, 102A, 102B, 102C may be coupled to any suitable port(s) or opening(s) of front end 101 and/or rear end 103 in any suitable arrangement. For example, in one aspect, one or more load latches 102, 102A, 102B, 102C may be arranged side by side on a common horizontal plane, as can be seen in Figures 1B-1D and 1G-1K. In other aspects, one or more load locks may be arranged in a grid format such that at least two load locks 102A, 102B, 102C, 102D are arranged in columns (e.g., with separated horizontal planes) and columns (e.g., with separated vertical planes) as shown in Figure 1E. In other aspects, one or more load locks may be a single online load lock 102, as shown in Figure 1A. In yet another aspect, at least one load lock 102, 102E can be arranged in a stacked line arrangement, as shown in Figure 1F. It should be understood that although the load locks are illustrated on the ends 100E1 or facets 100F1 of the transfer chambers 125A, 125B, 125C, 125D, 125E, 125F, one or more load locks may otherwise be arranged on the transfer chamber. On any number of sides 100S1, 100S2, ends 100E1, 100E2 or facets 100F1~100F8 of chambers 125A, 125B, 125C, 125D, 125E, 125F. Each of the at least one load lock may also include one or more wafer/substrate rest planes WRP (FIG. IF), where the substrate is held on suitable supports within the individual load lock. Otherwise, the tool station may have any suitable architecture.

Components of each of the front end 101, at least one load lock 102, 102A, 102B, 102C, and the back end 103 may be connected to a controller 110, which may be any suitable control architecture (eg, a cluster architecture part of the control). The control system may be a closed circuit controller with a master controller (which in one aspect may be the controller 110), a cluster controller, an autonomous remote control, such as the one issued on March 8, 2011 titled "Scalable Motion" No. 7,904,182 "Control System", the disclosure of which is incorporated herein by reference in its entirety. Otherwise, any suitable controller and/or control system may be utilized.

In one aspect, the front end 101 generally includes a loadport module 105 and a mini-environment 106, such as an equipment front end module (EFEM). The load port module 105 may be a box opener/loader to tool standard (BOLTS) interface that is compliant for use with 300 mm load ports, front opening or bottom opening boxes/pods and SEMI standards E15.1, E47.1, E62, E19.5 or E1.9 for cassettes. In other aspects, the load port module can be configured as a 200mm wafer/substrate interface, a 450mm wafer/substrate interface, or any other suitable substrate interface, such as large or small semiconductor wafers/substrates, Flat screen display panels, solar panels, photo masks, or any other suitable object. Although a three-loadport module 105 is shown in FIGS. 1A-1D, 1J, and 1K, in other aspects, any suitable number of loadport modules may be incorporated into the front-end 101.

The load port module 105 may be configured to receive substrate carriers or cassettes C from an overhead conveyor system, an automated guided vehicle, a manually guided vehicle, a rail guided vehicle, or any other suitable transfer method. Load port module 105 may interface with mini-environment 106 through load port 107 . Load port 107 may allow substrates to pass between substrate cassettes and mini-environment 106 . Mini-environment 106 generally includes any suitable transfer robot 108 that may incorporate one or more aspects of the disclosed embodiments described herein. In one aspect, the robot 108 may be a track-mounted robot, such as U.S. Patent Nos. 6,002,840 issued on December 14, 1999, 8,419,341 issued on April 16, 2013, and U.S. Patent Nos. 8,419,341 issued on January 19, 2010. No. 7,648,327, which is disclosed in its entirety and is incorporated herein by reference. Otherwise, the robot 108 may be substantially similar to that described herein with respect to the backend 103 . Mini-environment 106 may provide a controlled clean area for substrate transfer between multiple load port modules.

At least one vacuum load lock 102, 102A, 102B, 102C may be located between and connected to the mini-environment 106 and the backend 103. In other aspects, the load port 105 may be generally directly coupled to at least one load lock 102, 102A, 102B, 102C or transfer chamber 125A, 125B, 125C, 125D, 125E, 125F into which the substrate carrier C is drawn. 125A, 125B, 125C, 125D, and the substrates are transferred directly between the substrate carrier C and the load lock or transfer chamber. In this regard, the substrate carrier C may function as a load lock such that the processing vacuum of the transfer chamber extends into the substrate carrier C. As can be appreciated, if the substrate carrier C is generally directly coupled to the load lock through a suitable load port, then any suitable transfer device may be provided in the load lock or otherwise have access to the carrier C, To transfer the substrate to and from the substrate carrier C. Note that the term vacuum as used herein may refer to a high vacuum in which substrates are processed, such as 10 ⁻⁵ Torr or less.

At least one load lock 102, 102A, 102B, 102C generally includes atmospheric pressure and vacuum slot valves. Slot valves for the load locks 102, 102A, 102B (and for the processing station 130) may provide environmental isolation for evacuating the load locks after front loading substrates from atmospheric pressure, and when filled with inert gas ( such as nitrogen) to maintain the vacuum in the transfer chamber while deflating the lock chamber. As will be described herein, the slot valves of processing devices 100A, 100B, 100C, 100D, 100E, 100F (and linear processing devices 100G, 100H) may be located in the same plane, different vertical stacking planes, or slot valve positions A combination of slot valve positions in the same plane and in different vertical stacking planes (as described above with respect to load ports) to accommodate substrate transfer to and from at least processing station 130 and coupling to transfer chambers 125A, 125B, 125C, 125D, 125E , 125F load locks 102, 102A, 102B, 102C. At least one load lock 102, 102A, 102B, 102C (and/or front end 101) may also include an aligner to align the datum of the substrate in a desired location for processing or any other suitable substrate metrology equipment. Among other aspects, the vacuum load lock may be located in any suitable location on the processing device and of any suitable construction.

Vacuum backend 103 generally includes transfer chambers 125A, 125B, 125C, 125D, 125E, 125F, one or more processing stations or modules 130, any suitable number of substrate transfer devices 104, including one or more A transfer robot, which may include one or more aspects of the disclosed embodiments described herein). Transfer chambers 125A, 125B, 125C, 125D, 125E, 125F may have any suitable shape and size, which, for example, conforms to SEMI Standard E72 guidelines. Substrate transfer device 104 and one or more transfer robots will be described below, which may be located at least partially within transfer chambers 125A, 125B, 125C, 125D, 125E, 125F to load locks 102, 102A, 102B, 120C. (or between cassette C located at the load port) and the various processing stations 130. In one aspect, the substrate transfer device 104 can be removed from the transfer chambers 125A, 125B, 125C, 125D, 125E, and 125F to form a modular unit, so that the substrate transfer device 104 complies with SEMI standard E72 guidelines.

The processing station 130 may operate on the substrate through various deposition, etching, or other types of processes to form circuits or other desired structures on the substrate. Typical processes include, but are not limited to, thin film processes using vacuum, such as plasma etching or other etching processes, chemical vapor deposition (CVD), plasma vapor deposition (PVD), such as ion cloth Plant placement, metering, rapid thermal processing (RTP), dry stripping, atomic layer deposition (ALD), oxidation/diffusion, nitride formation, vacuum lithography, epitaxy, EPI), wire bonding machines and evaporation, or other thin film processes using vacuum pressure. Processing station 130 is communicably connected to transfer chambers 125A, 125B, 125C, 125D, 125E, 125F in any suitable manner (eg, via slot valve SV) to allow substrates to pass from transfer chambers 125A, 125B, 125C, 125D, 125E , 125F to processing station 130 and vice versa. The slot valves SV of transfer chambers 125A, 125B, 125C, 125D, 125E, 125F can be arranged to allow connection of dual processing stations (for example, more than one substrate processing chamber located in a common housing) or side-by-side processing stations 130T1~130T8 , single processing station 130S and/or stacked processing modules/load locks (Figures 1E and 1F). As further described below, the substrate transfer device achieves reproducibility and accuracy over the entire range and variation of temperature and pressure/vacuum accepted by the substrate transfer device corresponding to the process of the individual processing device.

Note that substrate transfer to and from the processing station 130 and coupling to the transfer chamber 125A may occur when one or more arms of the substrate transfer device 104 are aligned with a predetermined processing station 130 along the extension and retraction axis R of the substrate transfer device 104 , 125B, 125C, 125D, 125E, 125F loading locks 102, 102A, 102B, 102C (or cassette C). In accordance with various aspects of the disclosed embodiments, such as when picking/placing substrates from side-by-side or tandem processing stations, as shown in Figures 1B, 1C, 1D, 1G-1K, one or more substrates may be individually or transferred to individual predetermined processing stations 130 at approximately the same time. On the one hand, the substrate transfer device 104 can be installed on a sleeve arm 143 (see, for example, FIGS. 1D and 1G~1I), wherein the sleeve arm 143 has a single sleeve rod or multiple sleeve rods 121, 122 or a linear conveyor 144, such as 2013 U.S. Patent Provisional Application Nos. 61/892,849, filed on October 18, 2013, and entitled “Processing Device”; U.S. Patent Provisional Application Nos. 61/904,908, filed on November 15, 2013, and entitled “Processing Device”; and February 2013. The entire disclosure of the International Patent Application No. PCT/US13/25513 titled "Substrate Processing Apparatus" was filed on the 11th and is hereby incorporated by reference.

Referring now to FIG. 1L , shown is a schematic plan view of linear wafer processing system 100G in which tool interface area 2012 is mounted on transfer chamber module 3018 such that tool interface area 2012 will generally face (eg, inwardly) but be offset. on the longitudinal axis X of the transfer chamber module 3018. Transfer chamber module 3018 may be extended in any suitable direction by attaching other transfer chamber modules 3018A, 3018I, 3018J to interfaces 2050, 2060, 2070, as described in U.S. Pat. No. 8,398,355, previously and described in This is for reference. Each transfer chamber module 3018, 3018A, 3018I, 3018J includes any suitable wafer transfer 2080, which may include one or more aspects of the disclosed embodiments described herein, to transfer wafers throughout the processing system 100G and in and out e.g. processing module PM. As can be appreciated, each chamber module may be capable of maintaining an isolated or controlled gas (eg, _N2 , clean air, vacuum).

Referring to FIG. 1M, shown is a schematic diagram of an exemplary processing tool 100H that may be along the longitudinal axis X of a linear transfer chamber 416, for example. In the aspect of the disclosed embodiment shown in FIG. 1M, tool interface area 12 may representatively be connected to linear transfer chamber 416. In this regard, interface region 12 may define an end of linear transfer chamber 416 . As seen in FIG. 1M , the linear transfer chamber 416 may have another workpiece entry/exit station 412 , for example at an end opposite the interface station 12 . In other aspects, other entry/exit stations may be provided to insert/remove workpieces from the transfer chamber. In one aspect, interface area 12 and entry/exit station 412 may allow workpieces to be loaded and unloaded from the tool. In other aspects, the workpiece can be loaded into the tool from one end and removed from the other end. In one aspect, linear transfer chamber 416 may have one or more transfer chamber modules 18B, 18i. Each chamber module may be capable of maintaining isolated or controlled gases (eg N ₂ , clean air, vacuum). As previously noted, the architecture/arrangement of transfer chamber modules 18B, 18i, load lock modules 56A, 56, and workpiece stations forming linear transfer chamber 416 shown in FIG. 1M is exemplary only, and in other respects, The transfer chamber can have more or less modules configured in any desired modular arrangement. In the aspect shown, station 412 may be a load lock. Otherwise, load lock modules may be located between end entry/exit stations (similar to station 412), or adjacent transfer chamber modules (similar to module 18i) may be constructed to operate as load locks .

As also noted previously, transfer chamber modules 18B, 18i have one or more corresponding substrate transfer devices 26B, 26i located therein, which may include one or more aspects of the disclosed embodiments described herein. . The substrate transfer devices 26B, 26i of the individual transfer chamber modules 18B, 18i may operate together to provide a linearly distributed workpiece transfer system 420 within the transfer chamber. In this regard, substrate transfer device 26B may have a generally selective compliant articulation robot arm (SCARA) architecture (although in other respects, the transfer arm may have any other desired arrangement as described below ).

In the aspect of the disclosed embodiment shown in FIG. 1M, the arms and/or end effectors of transfer device 26B can be arranged to provide what may be called a fast switching arrangement, which allows the transfer to quickly switch wafers from a pick/place position. The substrate transfer device 26B may have any suitable drive area (e.g., coaxially arranged drive shafts, side-by-side drive shafts, horizontally adjacent motors, vertically stacked motors, etc.) to provide any suitable number of degrees of freedom. Each arm (e.g. has Z-axis motion around independent rotation of the shoulder and elbow joints). As seen in Figure 1M, in this regard, modules 56A, 56, 30i may be interposed between transfer chamber modules 18B, 18i and define appropriate processing modules, load lock(s), load lock(s), ) buffer station(s), metering station(s) or any other desired station(s). For example, intervening modules (such as load locks 56A, 56 and workpiece station 30i) each have stationary workpiece supports/shelf 56S1, 56S2, 30S1, 30S2 that operate in conjunction with the substrate transfer device to implement edge processing. The length of the transfer chamber through which the workpiece is transferred along the linear axis X of the transfer chamber. For example, workpiece(s) may be loaded into linear transfer chamber 416 via interface area 12 . The workpiece(s) may be positioned on the support(s) of the load lock module 56A using the substrate transfer device 15 of the interface area. Workpiece(s) in load lock module 56A may be moved between load lock module 56A and load lock module 56 by substrate transfer 26B in module 18B, and in a manner similar to and in a continuous manner by means of substrate transfer device 26i (in module 18i) between the load lock 56 and the workpiece station 30i, and by means of the substrate transfer device 26i in the module 18i between stations 30i and Move between stations 412. This process can be reversed in whole or in part to move the workpiece(s) in the opposite direction. Thus, in one aspect, workpieces can be moved in any direction along axis thing). In other aspects, an intervening transfer chamber module with a stationary workpiece support or shelf may not be disposed between the transfer chamber modules 18B, 18i. In these aspects, the substrate transfer device of the adjacent transfer chamber module can pass the workpiece directly from one end effector or transfer arm to the end effector or transfer arm of another substrate transfer device to move the workpiece through the transfer chamber. . Processing station modules may operate on the wafer through a variety of deposition, etching or other types of processes to form circuits or other desired structures on the wafer. The process station module is connected to the transfer chamber module to allow wafers to pass from the transfer chamber to the process station and vice versa. A suitable example of a processing tool having general features similar to the processing device shown in Figure ID is described in U.S. Patent No. 8,398,355, which was previously incorporated by reference in its entirety.

Referring now to FIGS. 2A, 2B, 2C, and 2D, in one aspect, the substrate transfer device 104 includes at least one drive area (which may also be referred to as a drive system) 200, 200A, 200B, 200C and at least one robot arm 300 (see FIG. 3A ). Note that the exemplary substrate transfer device 104 is exemplary and may otherwise have any configuration substantially similar to that described in U.S. Patent Application No. 14/568,742 entitled "Substrate Transfer Device" filed on December 12, 2014. Fits the architecture, which reveals the whole and is used as a reference. One or more robotic arms 300 may be coupled at any suitable connection CNX to individual drive shafts of a drive region 200, 200A-200C as described herein, such that rotation of the drive shaft(s) is effected Movement of individual transfer arm(s) 300 . As will be described below, in one aspect the transfer arm 300 can be exchanged with a number of different exchangeable transfer arms 300 such that one transfer arm is switched into another transfer arm with a connection CNX in the drive area.

At least one driving area 200, 200A, 200B, 200C is mounted on any suitable frame of the processing devices 100A~100H. In one aspect, as noted above, the substrate transfer device 104 may be mounted to the linear slider 144 (FIG. 1C) or the sleeve arm 143 in any suitable manner, wherein the linear slider 144 and/or the sleeve arm 143 have a structure substantially similar to that in This is the driving area of the driving areas 200, 200A, 200B, and 200C. At least one drive area 200, 200A, 200B, 200C may include a common drive area including a frame 200F housing one or more of the Z-axis drive 270 and the rotational drive area 282. The interior 200FI of the frame 200F may be sealed in any suitable manner, as will be described below. In one aspect, the Z-axis drive may be any suitable drive configured to move transfer arms 314, 315, 316, 317, 318 along the Z-axis. The Z-axis driver is illustrated as a screw driver in Figure 2A, but in other respects, the driver can be any suitable linear driver, such as a linear actuator, a piezoelectric motor, etc. Rotary drive zone 282 may be constructed as any suitable drive zone, such as, for example, a harmonic drive zone. For example, the rotary drive zone 282 may include any suitable number of coaxially arranged harmonic drive motors 280, such as can be seen in FIG. 2B, where the drive zone 282 may include, for example, three coaxially arranged harmonic drive motors 280, 280A, 280B. . In other aspects, the drivers in the drive area 282 may be positioned side by side and/or in a coaxial arrangement. In one aspect, the rotary drive zone 282 shown in FIG. 2A includes a harmonic drive motor 280 for driving the shaft 280S; however, in other aspects, the drive zone may include any suitable number of harmonic drive motors 280, 280A, 280B (Fig. 2B), which corresponds, for example, to any suitable number of drive shafts 280S, 280AS, 280BS (Fig. 2B) in a coaxial drive system.

The harmonic drive motor 280 may have high capacity output bearings such that the components of the ferrofluid seals 276, 277 are centered and at least partially supported by the harmonic drive motor 280 during the intended rotation T and extension of the substrate transfer device 104 R has enough stability and clearance during movement. Note that ferrofluid seals 276, 277 may include several portions that form generally concentric coaxial seals, as will be described below. In this example, the rotary drive region 282 includes a housing 281 housing one or more drive motors 280, which may be generally similar to those described above and/or in U.S. Patent Nos. 6,845,250, 5,899,658, 5,813,823, and 5,720,590, which disclose This is the entire reference. The ferrofluid seals 276, 277 may allow tolerances to seal each drive shaft 280S, 280AS, 280BS in the drive shaft assembly. In one aspect, the ferrofluid seal may not be provided. For example, the drive region 282 may include a drive having a stator that is substantially sealed from the environment in which the transfer arm is operated, while its rotor and drive shaft share the environment in which the transfer arm is operated. Suitable examples of actuation zones that do not have ferrofluid seals and can be used to disclose aspects of the embodiments include the ^MagnaTran® 7 and ^MagnaTran® 8 robotic actuation zones from Brooks Automation, Inc., which may have a sealed can arrangement as follows will be described. Note that the drive shaft(s) 280S, 280AS, 280BS may also have a hollow structure (eg, with a longitudinal hole along the center of the drive shaft) to allow wires 290 or any other suitable object to pass through the drive assembly to connect to e.g. Another drive area, as described in U.S. Patent Application No. 15/110,130 filed on July 7, 2016 and published as U.S. Patent Publication No. 2016/0325440 on November 10, 2016, discloses the entire This is for reference. Any suitable position encoder, controller and/or at least one transfer arm 314, 315, 316, 317, 318 may be mounted to the drive area 200, 200A, 200B, 200C. As can be appreciated, each drive motor of the drive areas 200, 200A, 200B, 200C may include any suitable encoder configured to detect the position of the individual motor to determine each transfer arm 314, 315, 316, 317 , 318's end effector 314E, 315E, 316E, 317E1, 317E1, 318E1, 318E2 position.

In one aspect, housing 281 may be mounted to transporter 270C, which is coupled to Z-axis drive 270 such that Z-axis drive 270 moves the transport (and housing 281 thereon) along the Z-axis. As can be appreciated, in order for the control gases operating transfer arms 314, 315, 316, 317, 318 to be hermetically isolated from the interior 200FI of the drive area 200, 200A, 200B, 200C (which may operate in an atmospheric pressure ATM environment), the drive Zones 200, 200A, 200B, 200C may include one or more of the ferrofluid seals 276, 277 and bellows seals 275 described above. The bellows seal 275 may have one end coupled to the conveyor 270C and another end coupled to any suitable portion of the frame 200F such that the interior 200FI of the frame 200F is interoperable with the transfer arms 314, 315, 316, 317, 318 therein The control gas is somewhat isolated.

Otherwise, as noted above, drives have stators that are sealed against the gases operating the transfer arms within them without ferrofluid seals, such as the MagnaTran ^® 7 and MagnaTran ^® 8 robot drive areas from Brooks Automation, which can be configured On transporter 270C. For example, also referring to Figures 2C and 2D, the rotational drive region 282 is configured such that the motor stator is hermetically isolated from the environment in which the transfer arm is operated, while the motor rotor shares the environment in which the transfer arm is operated. Referring to Figure 2C, illustrated is a three-axis rotational drive zone 282. In this regard, there are three motors 280', 280A', 280B', each having a rotor 280R', 280AR', 280BR' coupled to a respective drive shaft 280S, 280AS, 280BS. Each motor 280', 280A', 280B' also includes an individual stator 280S', 280AS', 280BS' which may be hermetically isolated from the operating transfer arm(s) therein by individual can seals 280SC, 280ACS, 280BCS of gas. As will be appreciated, any suitable encoder/sensor may be provided to determine the position of the drive shaft and arm(s) operated by the drive shaft(s). As can be appreciated, in one aspect, the drive shaft of the motor illustrated in FIG. 2C may not allow feedthrough of wire 290; in other aspects, any suitable seal may be provided such that the wire, for example, can pass through FIG. 2C The hollow drive shaft of the motor demonstrated.

The drive area 200C illustrated in FIG. 2D includes a nested or concentric structure of four motors, such that the four drive shafts 126S1 ~ 126S4 are coaxially arranged, and the four motors 126M1 ~ 126M4 are arranged in a nested coaxial arrangement. For example, motor 126M1 is nested (eg, radially enclosed) within motor 126M2, and motor 126M3 is nested within motor 126M4. The nested motors 126M1 and 126M2 are coaxially arranged relative to the nested motors 126M3 and 126M4, so that the nested motors 126M1 and 126M2 are coaxially arranged above the nested motors 126M3 and 125M4. However, it should be understood that the motors 126M1 - 126M4 may have any suitable arrangement, such as a stacked arrangement, an edge-to-edge or a concentric arrangement, as shown in Figure 2D. In other aspects, the motors may be low-profile, flat or "pancake" type robot drive structures, in which the motors are concentrically nested with each other in a manner generally similar to that described in the following US patent issued August 30, 2011. U.S. Patent No. 8,008,884 titled "Substrate Processing Apparatus with Motor Integrated into Chamber Wall" and U.S. Patent No. 8,283,813 titled "Robot Drive with Magnetic Shaft Bearing" issued on October 9, 2012, disclose their disclosures This is the entire reference.

Although the motor is illustrated as a rotary motor, otherwise any suitable motor(s) and/or suitable drive actuator(s) may be used, such as, for example, direct drive linear motors, linear piezoelectric motors, linear Induction motor, linear synchronous motor, brush or brushless linear motor, linear stepper motor, linear servo motor, reluctance motor...etc. For example, an example of a suitable linear motor is described in U.S. Patent Application No. 13/286,186, filed on October 31, 2011, titled "Linear Vacuum Robot with Z-Motion and Articulated Arm", filed on June 13, 2011 Application No. 13/159,034 titled "Substrate Processing Apparatus" filed on March 8, 2011, and U.S. Patent No. 7,901,539 titled "Apparatus and Method for Conveying and Processing Substrates" issued on March 8, 2011, October 2012 U.S. Patent No. 8,293,066 titled "Apparatus and Method for Conveying and Processing Substrates" issued on the 23rd, and U.S. Patent No. 8,419,341 titled "Linear Vacuum Robot with Z-Motion and Articulated Arm" issued on April 16, 2013 No. 7,575,406, entitled "Substrate Processing Apparatus" issued on August 18, 2009, and US Patent No. 7,959,395, entitled "Substrate Processing Apparatus", issued on June 14, 2011, disclose the entire Use this as a reference.

Referring now to Figures 1D and 1G-1J, sleeve arm 143 may include any suitable arm linkage(s). Suitable examples of arm linkages can be found, for example, in U.S. Patent Nos. 7,578,649, issued August 25, 2009, U.S. Patent Nos. 5,794,487, issued August 18, 1998, and U.S. Patent Nos. 7,946,800, issued May 24, 2011. , No. 6,485,250 issued on November 26, 2002, No. 7,891,935 issued on February 22, 2011, No. 8,419,341 issued on April 16, 2013, application on November 10, 2011 titled "Double Arms" U.S. Patent Application No. 13/293,717 of "Robot" and U.S. Patent Application No. 13/861,693 titled "Linear Vacuum Robot with Z-Motion and Articulated Arm" filed on September 5, 2013, the disclosures of which are incorporated herein by reference in their entirety. refer to. In many aspects of the disclosed embodiments, at least one transfer arm 300, sleeve arm 143, and/or linear slider 144 of each substrate transfer device 104 may be derived from a conventional SCARA arm design, which includes an upper arm, a belt-driven forearm, End effector with confinement; or derived from a telescoping arm or any other suitable arm design, such as Cartesian linear sliding arm 314 (Fig. 3B). Suitable examples of transfer arms can be found, for example, in U.S. Patent Application No. 12/117,415, 100G, filed on May 8, 2008 and titled "Substrate Transfer Device Having Multiple Movable Arms Utilizing a Mechanical Switching Mechanism" No. 7,648,327, issued on January 19, 2017, the entire disclosure of which is incorporated herein by reference.

The transfer arms 300 (of which multiple arms are included in the substrate transfer apparatus 104) may operate independently of each other (e.g., extension/retraction of each arm is independent of the other arms), may operate via a lost motion switch, or may use any suitable and are operably connected in such a manner that the arms share at least one common drive axis. Suitable examples of free-range switching are described, for example, in U.S. Patent No. 7,946,800, issued on May 24, 2011, and U.S. Patent No. 8,752,449, issued on June 17, 2014, which are disclosed in their entirety and are incorporated herein by reference. Any suitable controller (eg, controller 110 ) is coupled to drive areas 200 , 200A, 200B, 200C in any suitable manner to drive drive areas 200 , 200A, 200B, 200C, thereby implementing transfer arm(s) 300 of articulation.

Referring now to Figures 3A, 3B, and 3D, in one aspect, the transfer arm 300 of the transfer device 104 is a three-link arm having an end effector 310, which has, for example, two or three degrees of freedom, as shown in Figure 3D, where The transfer arm 300 has a compact structure with a compact footprint relative to the reach of the arm, as will be described herein. The transfer arm 300 includes an upper arm link 302, a forearm link 305, a third arm link 307 (also referred to as a cutter arm link), and an end effector 310, which are coupled in series with each other, as described below. Although the illustrations illustrate a three-arm link, otherwise the transfer arm 300 may have more than three arm links coupled in series, with the end effector coupled in a manner similar to that described with respect to the third arm link 307 The last series-coupled link (ie, the wrist link arm, which is generally similar to the third arm link 307 ) is and is supported by the last series-coupled link. The end effector 310 may be a double-headed end effector (for example, as shown in FIGS. 3B and 4A ), which has at least one substrate holding position 310H1 , 310H2 , and is configured on the rotation axis (such as the finger axis KX) of the end effector 310 on the opposite side. For example, at least the substrate holding position 310H1 of the end effector 310 is on one side of the finger axis KX, and at least the substrate holding position 310H2 of the end effector 310 is on the opposite side of the finger axis KX, where the finger axis KX At least one substrate holding position 310H1, 310H2 on the opposite side is on a common transfer plane TP (see Figure 3A). In this aspect of the disclosed embodiment, the conveyor 104 is driven by a two-axis (eg, two degrees of freedom) drive region 91400 (Fig. 3C) such that the rotation of the end effector 310 is driven by the rotation of the forearm link 305, and The rotation of the cut arm link 307 is driven by the rotation of the upper arm link 302, as will be described below; wherein one axis of the two-axis drive area 91400 drives the rotation of the upper arm link 302, and the other axis of the two-axis drive area 91400 drives the forearm Rotation of connecting rod 305. In other aspects, for example, if the conveyor 104 includes more than three arm links and the end effector is coupled thereto, the rotation of the arms may be driven in any suitable manner such that the arms use only two degrees of freedom actuation zone 91400 to extend, withdraw and rotate around the shoulder axis. Note that the two-axis drive area 91400 can be generally similar to the drive system described above but only have two drive shafts. For example, the drive zone 91400 may include a first motor 91403 and a second motor 91404, each including respective stators 91403S, 91404S and rotors 91403R, 91404R. The stators 91403S and 91404S are rotatably fixed and installed in the housing 91400H of the drive area 91400. Rotor 91403R can be mounted to drive shaft 91402, and rotor 91404R can be mounted to drive shaft 91401. Although the drive shaft is shown as a coaxial drive shaft and the motor is shown stacked one above the other, in other aspects of the disclosed embodiments, one or more of the drive shaft and motor may have an edge-to-edge arrangement. And coupled to each other through suitable transmissions (such as strips, belts, gears, etc.). The drive section 91400 may also include at least one Z-axis drive 91312 that vertically moves the entire arm assembly of the conveyor 90100 or, for example, vertically moves each end effector 85104, 85105 vertically independently of the other end effector 85104, 85105. 85105.

Referring also to Figures 3B and 4A-4C, the upper arm link 302, the forearm link 305 and the cut arm link 307 have unequal lengths. For example, the upper arm link 302 has a length L1 from the joint center to the joint center (for example, from the shoulder axis SX to the elbow axis EX), and the forearm link 305 has a length L1 from the joint center to the joint center (for example, from the elbow axis EX to the wrist axis WX), and the cut-off arm link 307 has a length L3 from the center of the joint to the center of the joint (for example, from the wrist axis EX to the finger axis KX), where the length L3 is less than the length L1, and the length L1 is less than the length L2. In other respects, the lengths L1 to L3 (from joint center to joint center) may be any suitable length. Note that although the shoulder axis SX and the finger axis KX can be demonstrated to be coaxial with the transmission arm 300 in the retracted configuration (for example, as shown in FIG. 3B ), in other respects, the shoulder axis SX and the finger axis KX may not be coaxial with the transmission arm 300 in the retracted configuration. 300 coaxial; note that the position of the finger axis KX relative to the shoulder axis SX may depend on the lengths L1~L3 of one or more of the upper arm link 302, the forearm link 305, and the truncated arm link 307. The arm link lengths L1 to L3 and the length L4 of the end effector (for example, the length L4 is from the finger axis KX to the substrate holding positions 310H1, 310H2 of the end effector 310) and the transfer arm 300 are constructed to provide a long reach. , which can access the recessed substrate holding station 500 of the processing module 590 (see FIGS. 3D and 5A ), where the recessed substrate holding station 500 is configured within the processing module 590 such that it is offset by a distance DIST (i.e. The distance DIST from the inner face 520 of the transfer chamber 580 gate (or slot) valve 521 (or pass) port 521P to the recessed substrate holding station 500 configured along the extension and withdrawal axis R) of the transfer arm 300 is At least part of the length L2 of the forearm link 305 holding the wrist joint (i.e., at the wrist axis WX), the length L3 of the truncated arm link 307, and the length L4 extending through the inside of the transfer chamber gate port 590P from the finger axis KX The extension of the end effector 310 (for a three-link with a small footprint of the transfer arm 300 having an end effector) is consistent and accommodated. The long reach of transfer arm 300 corresponds to a four-link SCARA arm whose joints couple the second and third links of the four-link SCARA arm across port 251P of slot valve 521 .

Unequal lengths of upper arm link 302, forearm link 305, and cutaway arm link 307 may, for example, allow the arm assembly to have a swing diameter while maintaining the same conventional arm with equal upper and forearm lengths in the retracted position. The swing diameter of the assembly. However, the unequal lengths of the upper arm link 302, the forearm link 305, and the truncated arm link 307 of the transfer arm 300 in the disclosed embodiment, for example, allow for a larger extension range (ie, extension) than with the same swing. diameter and have equal length links, thereby increasing the ratio of the reach to the containment range of the transfer arm 300. For example, the transfer arm 300 (and thus the substrate transfer device 104) has an reach that is optimal for having an upper arm link 302, a forearm link 305, a cutter arm link 307, and an end effector 310 in a retraction configuration ( For example, the predetermined swing diameter SD of the substrate transfer device 104 shown in FIG. 3D is the maximum extension range of the substrate transfer device 104. The maximum extension range allows the end effector 310, its finger axis KX and at least part of the cut The arm link (including wrist axis WX) extends through the gate (or slot) valve 521 of the substrate processing module or device 590 (see Figure 5A). FIG. 3D shows the swing diameter SD of the transfer arm 300 (ie, the footprint exemplified by the circle F). As can be appreciated, the swing diameter value of the SCARA arm is generally determined by a combination of substrate holder offset, wafer diameter, wrist radius, or elbow swing radius of the upper arm, for example. Thus, for the same length of substrate holder offset, a conventional SCARA arm and transfer arm 300 would have approximately the same footprint. For example, the forearm link 305 of the disclosed embodiments can be longer than the upper arm link 302 and truncated arm link 307 to the maximum proportion established by system constraints (eg, desired footprint). Incidentally, in various aspects of the disclosed embodiments, upper arm link 302 , forearm link 305 , cut arm link 307 and/or end effector 310 may be rotated independently and, for example, by drive regions 200B, 200C such as Driven by individual motors, as described below. In alternative embodiments, one or more of the arm assembly arm sections may not rotate independently, for example where one or more of the arm links are driven or driven by, for example, drive sections 200, 200A, 200B, 200C individual degrees of freedom. For example, in which all links can rotate independently, and referring to drive region 200C, upper arm link 302 can be coupled to drive shaft 12651 in a manner similar to that described herein. Coupled to drive shaft 12652 by any suitable actuator, cutter arm link 307 may be coupled to drive shaft 12653 by any suitable actuator similar to that described herein, and end effector 310 Coupling to drive shaft 12564 may be by any suitable actuator similar to that described herein.

Still referring to FIGS. 3A to 4C , the upper arm link 302 is coupled to the drive shaft 91402 about the shoulder axis SX, for example, so that the drive shaft 91402 and the upper arm link 302 rotate as a whole. The forearm link 305 is rotatably coupled to the upper arm link 302 about the toggle axis EX. A third or truncated arm link 307 is rotatably coupled to the forearm link 305 about wrist axis WX. End effector 310 is rotatably coupled to third or cut arm link 307 about finger axis KX (i.e., end effector 310 rotates relative to third link 307) and is aligned with extension and retraction axis R (For example, the central points of the substrate holding positions 310HA and 310H1 move along the extension and retraction axis R, see Figure 3B).

As described above, the end effector 310 is driven by rotation of the forearm link 305 via any suitable actuator 490 . For example, the first wrist pulley 470 is rotatably fixed to the forearm link 305 about the wrist axis WX. The second wrist pulley 471 is rotatably coupled to the tangential arm link 307 about the finger axis KX and is driven by the first wrist pulley 470 via one or more belts 472 . The straps 472 can be arranged at the same height/elevation (i.e., a single strap height) in a manner similar to that shown in Figure 4E, thus cutting the stacking of the arm link 307 and the forearm link 305 at and adjacent the wrist axis WX The height is less than the height of port 521P of slot valve 521 (see Figure 5A), such that the wrist axis extends through port 521P as described herein. The second wrist pulley 471 is rotationally fixed to the end effector 310, so that the second wrist pulley 471 and the end effector entirely rotate around the finger axis KX. The diameter ratio between the first wrist pulley 470 and the second wrist pulley 471 is around 1:2. Otherwise, the first and second wrist pulleys may have any suitable diameter ratio.

The forearm link is driven by drive shaft 91401 through any suitable actuator 475. For example, the drive shaft 91401 is coupled to the first upper arm pulley 460, so that the first upper arm pulley 460 is entirely rotated by the drive shaft 91401. The second upper arm pulley 461 is rotatably coupled to the upper arm link 302 around the toggle axis EX, and is driven by the first upper arm pulley through the belt 462 . The second upper arm pulley 461 is rotationally fixed to the forearm link 305, so that the forearm link 305 and the second upper arm pulley are driven by the drive shaft 91401 and completely rotate around the elbow axis EX. The diameter ratio between the first upper arm pulley 460 and the second upper arm pulley 461 is approximately 1:1. In other aspects, the first upper arm pulley 460 and the second upper arm pulley 461 may have any suitable diameter ratio.

The cutter arm link 307 is driven from the upper arm by any suitable actuator 480. For example, the first forearm pulley 450 is rotatably fixed to the upper arm link 302 so that it is entirely moved by the upper arm link 302 . The second forearm pulley 451 (eg, the first intermediate pulley) is rotatably coupled to the forearm link 305 at the pulley axis PX (which is located between the elbow axis EX and the wrist axis WX). The second forearm pulley 451 is driven by the first forearm pulley 450 through the belt 454 . The third forearm pulley 452 (such as the second intermediate pulley) is coupled to the second forearm pulley 451, so that the second forearm pulley 451 completely rotates around the pulley axis PX. The fourth forearm pulley 453 is rotatably coupled to the forearm link 305 about the wrist axis and is driven by the third forearm pulley 452 via a belt 455 . The fourth forearm pulley 453 is coupled to the truncated arm link 307, so that the fourth forearm pulley 453 and the truncated arm link 307 entirely rotate around the wrist axis WX. In this way, the cut arm link 407 is driven by the upper arm link 302 through the double sets of forearm pulleys. In other respects, the dual sets of forearm pulleys may be coupled to the individual degrees of freedom of the drive regions 200A-200C in any suitable manner, such as independent rotation of the cutter arm link 307. Here, when the transfer arm 300 extends bi-directionally on opposite sides of the shoulder axis SX, the third or truncated arm link 307 is connected with the belt 455 (ie, it is configured at a single belt height) as described herein. Rotated 90° (eg +/-45° from the starting position), the radial extension of the transfer arm 300 is generally symmetrical on opposite sides of the shoulder axis SX. The diameter ratio between the first forearm pulley 450 and the second forearm pulley 451 is around 1:2. In other aspects, the first forearm pulley 450 and the second forearm pulley 451 may have any suitable diameter ratio. The diameter ratio between the third forearm pulley 452 and the fourth forearm pulley 453 is approximately 1:1. On the one hand, the diameter ratio between the first forearm pulley 450 and the fourth forearm pulley 453 is around 1:1, and the ratio of the rotation of the wrist around the wrist axis θ _WRA to the rotation of the forearm around the forearm axis θ _FA is In the vicinity of 1:2 (ie relative to extension and retraction along the extension and retraction axis R, for example with a two-degree-of-freedom drive). In other aspects, the third and fourth forearm pulleys 452, 453 may have any suitable diameter ratio. In other aspects, there may be only two forearm pulleys (such as a first forearm pulley 450 and a fourth forearm pulley 453, where the fourth forearm pulley 453 is driven by the first forearm pulley 450). The double set of forearm pulleys (for example, the first set is pulleys 450 and 451, and the second set is pulleys 452 and 453) provides at least a stiffer movement for the cutting arm link 307 (compared to using pulley 450 to directly drive pulley 453 ), and provides a single belt height using belts 454, 455 allowing the use of taller belts. The dual set of forearm pulleys also provide pulley deceleration (i.e., reduce rotational speed and increase torque) in forearm link 305, thereby reducing the height and width of cutter arm link 307 to allow end effector 310 to pass through port 521P, as in This is stated. Here, wrist joint stack height H3 is independent of (i.e., decoupled from) the lowered pulley heights (eg, the heights of pulleys 450, 451, 452), and wrist joint width 497 is independent (i.e., decoupled from) the lowered pulleys. Main radius/diameter (eg radius 496R/diameter 496D of pulley 496). Bands 454, 455, 462, and 472 may be broadly similar to U.S. Patent Nos. 5,682,795 issued on November 4, 1997, U.S. Patent Nos. 5,778,730 issued on July 14, 1998, and U.S. Patent Publications published on January 18, 2018. No. 2018/0019155 (Application No. 15/634,87), the entire disclosure of which is hereby incorporated by reference.

As can be seen in Figures 3A and 4A-4C, the tangential arm link 307 and the end effector 310 are constructed such that the height H1 of the end effector 310 and the height H2 of the tangential arm link 307 are the stack height profile at the wrist axis WX 366, for example, the wrist axis WX (or wrist joint) shares the same elevation with the arm link coupled to the wrist axis WX (i.e., the wrist link arm, which on the one hand is the third or tangential arm link 307) , so that the total stack height H3 of the end effector 310 and the wrist axis WX is sized to fit through the slot valve 521 (eg, port 520P) (eg, see Figures 4C, 5A, 5F). For example, the wrist axis WX is generally included in the height H2 of the wrist link arm (which in one aspect is the truncated arm link 307 ). Similarly, finger axis KX (or knuckle) is included into the wrist link arm and shares the same elevation as the wrist link arm (see, eg, Figure 4C). Referring to FIG. 4D , wrist axis WX may share (i.e., be at least partially included in) the width 498 of end effector 310 such that end effector 310 and wrist axis WX move at a common time (e.g., side by side) combined through the port 521P of the slot valve 521. For example, when the end effector 310 extends along the extension and retraction axis R, the combined width 499 of the end effector 310 and wrist axis WX is less than the width 521W of the port 521P (see Figures 5A and 5F).

In one aspect, the cutter arm link 307 includes tines 307T1, 307T2 (see Figures 4B and 4C) forming a slot 307S that is sized such that at least a portion of the end effector 310 is rotatably disposed within the slot 307S. (see Figure 4A) to achieve a total stack height H3. In other aspects, the end effector 310 may be mounted above or below the cutout arm link (see Figure 6A), so as to achieve a total stack height H3. As can also be seen, the rotation of the end effector 310 about the finger axis KX is limited by the cut arm link. Note that the split belts 454A, 454B, 455A, 455B, 462A, 462B, 472A, 472B driving individual common sets of pulleys for the individual belts 454, 455, 462, 472 are at the same height/rise (i.e. a single belt height ), as demonstrated in Figure 4E (also seen in Figure 4D). The exemplary belt 455 of Figure 4E has belt regions (eg, split belts) 455A, 455B configured at a common height (ie, a single belt height) on pulley 452 (and pulley 453) to provide stack height H3. The belts 454, 455, 462, 472 may have a similar arrangement, thus minimizing the stacking height of the transfer arm 300 and providing a smaller transfer chamber height compared to split belts of different heights arranged on a common pulley. .

For example, as demonstrated in FIG. 3A , the height of the forearm link 305 is tapered between the elbow axis EX and the wrist axis WX. For example, the forearm link 305 may have a height H10 adjacent or at the elbow axis EX and a height H11 adjacent or at the wrist axis WX. This taper of forearm link 305 along with the architecture of end effector 310 and cutter arm link 307 provides a height H3 that allows transfer arm 300 to conform through slot valve 521 (such as port 520P) (see Figure 5A), as above described. The upper arm link 302 may also have a tapered height between the shoulder axis SX and the toggle axis EX. For example, the upper arm link 302 may have a height H12 adjacent or at the shoulder axis SX and a height H13 adjacent or at the toggle axis EX such that the upper arm link 302 tapers in height. The taper of the upper arm link 302 (eg, matching the tapered structure) complements or is opposite to the taper of the forearm link 305 (eg, the tapered structure), such that at least part of the upper arm link 302 and part of the forearm link 305 are coplanar. , thus providing the transfer arm 300 with a compact overall height H20 compared to a transfer arm whose arm links are not tapered in height.

5A-5F are exemplary sequence diagrams for extending transfer arm 300 between recessed substrate holding stations 500 of processing modules 590, 590A disposed on opposite sides of shoulder axis SX. Here, the transfer arm 300 is configured to extend bi-directionally along an extension and retraction axis R (which may be aligned with the shoulder axis SX so as to extend/retract radially) on opposite sides of the shoulder axis SX (e.g., from one side of the shoulder axis) Fully extended on the side, through the starting position of the transfer arm, to fully extended on the opposite side of the shoulder axis, see Figures 5A to 5F (the starting position is demonstrated in Figures 3B and 5D), and the transfer arm 300 is not completely around The shoulder axis SX rotates (for example, in the θ (theta) direction). Bidirectional extension along the extension and retraction axis R on opposite sides of the shoulder axis occurs in a substantially continuous linear extension independent of rotation of the arm links 302, 305, 307 as a whole about the shoulder axis SX. With the transfer arm 300 extending bidirectionally on opposite sides of the shoulder axis SX, the finger axis KX passes above the center of the shoulder axis SX, and the arm links 302, 305, 307 do not entirely rotate about the shoulder axis SX (such that the transfer arm has a compact architecture). For example, also referring to FIG. 4C , to extend transfer arm 300 , drive shaft 91401 may be held stationary by drive zone 200 (or rotated in an opposite second direction RT2 relative to drive shaft 91402 ) while the drive shaft The rod 91402 rotates in the first rotation direction RT1, which causes the upper arm link 302 to rotate in the first rotation direction RT1. Maintaining the drive shaft 91401 stationary (or rotating the drive shaft 91401 in the second direction RT2) causes relative rotation between the forearm link 305 and the upper arm link 302. The relative rotation between the forearm link 305 and the upper arm link 302 causes the first forearm pulley 450 to drive the rotation of the second forearm pulley 451, thereby driving the rotation of the cutting arm link 307, as demonstrated in sequence in Figures 5A to 5F . Note that in the starting position (see Figure 3B), the third or cutaway link 307 is generally aligned with (eg, generally coincident with) the forearm link 305, such that the transfer arm 300 has a compact structure.

Referring to Figures 5A-5F, 7, and 8, an exemplary method of transferring a substrate will be described. A substrate transfer device 104 is provided (Figure 8, block 800). The extension or withdrawal of the upper arm link 302, forearm link 305, cut arm link 307 and end effector 310 is implemented by the drive system 200 (or any drive system 200A-200C), so that the wrist axis WX extends through Port 521P of slot valve 521 (Figure 8, block 810). For example, as shown in FIGS. 5A-5F , the drive region 200 (or, depending on the number of degrees of freedom, the transfer arm 300 is driven by the drive regions 200A-200C) is operated, as described herein, to rotate at the shoulder axis SX The transport arm 300 (FIG. 7, block 700) extends along the extension and retraction axis R on a first side of the transport arm 300 while picking or placing substrates S to and from the recessed substrate holding station 500. The transfer arm 300 extends through the drive area 200 such that the wrist axis WX passes through the port 521P of the gate valve 251 of the processing module 590 into the processing module 590, as shown in Figure 5B (Figure 7, block 710). Here, the cutting arm link 307 rotates about the finger axis KX to provide an extended reach of the transfer arm 300 in the processing module 590 to access at least the recessed substrate holding station 500 . Substrates are picked or placed to and from the recessed substrate holding station 500 of the processing module 590 in any suitable manner, such as relative Z-axis movement between the end effector 310 and the recessed substrate holding station 500 ( FIG. 7 , block 720). The drive section 200 is operated, as described herein, to withdraw the transfer arm 300 from the processing module 590 along the extension and withdrawal axis R, as shown in Figures 5B and 5C (Figure 7, block 730). The transfer arm 300 does not rotate entirely about the shoulder axis SX, and the drive area 200 can be operated to extend the transfer arm 300 along the extension and retraction axis R on the second opposite side of the shoulder axis SX, as shown in Figures 5D and 5E ( 7, block 740) to pick or place a substrate into the recessed substrate holding station 500 of the processing module 590A. Here, the processing module 590A is disposed on a side of the transfer chamber 580 relative to the processing module 590, so that the common extension and retraction axis R extends along a substantially straight path through the two processing modules 590, 590A. Deep recessed substrate holding station 500. The transfer arm 300 is extended from the drive area 200 such that the wrist axis WX passes through the port 521P of the gate valve 251 of the processing module 590A and enters the processing module 590A, as shown in Figure 5B (Figure 7, block 750). Here again, the cutting arm link 307 rotates about the finger axis KX to provide an extended reach of the transfer arm 300 within the processing module 590A to access at least the recessed substrate holding station 500 . Substrates are picked or placed to and from the recessed substrate holding station 500 of the processing module 590A (FIG. 7, Block 760). The drive section 200 is operated, as described herein, to withdraw the transfer arm 300 from the processing module 590A along the extension and withdrawal axis R in a manner similar to that shown in Figures 5B and 5C (Figure 7, block 770). The transfer arm 300 may be rotated entirely about the shoulder axis SX such that the transfer arm 300 extends along any other suitable extension and retraction axis, such as the extension and retraction axis R1 (see FIG. 5F ), which is aligned with the extension and retraction axis R Angle to transfer substrates to and from any desired location accessible from the transfer chamber 580 .

As noted above, the first wrist pulley 470 is rotationally fixed to the forearm link 305, and the relative rotation between the tangential arm link 307 and the forearm link 305 causes the first wrist pulley 470 to drive the rotation of the second wrist pulley 471, The rotation of the end effector 310 is thereby driven. Relative rotation between the upper arm link 302 , forearm link 305 and the cut arm link 307 positions the end effector 310 for rotation about the finger axis KS and along the extension and withdrawal axes such that the end effector 310 is held The substrate S is placed in the deep-recessed substrate station 500 with an intended predetermined rotation direction (for example, the substrate S does not need to be further rotated to process the substrate in the deep-recessed substrate station 500 ). To rotate the transfer arm about the theta axis, drive shafts 91401, 91402 rotate in the same direction at approximately the same speed to change the extension/retraction direction of the end effector 310.

Although the above example provides a two-degree-of-freedom drive system, it should be understood that a third degree of freedom (or more degrees of freedom) can be added to the drive area to actively drive the first wrist pulley 470, so that the end effector 310 can be driven with the third degree of freedom. degrees and are driven independently around the finger axis KX, as demonstrated in Figures 6A to 6E. Here, another actuator 670 is provided via the upper arm link 302 and the forearm link 305 (the actuator 480 is omitted in FIG. 6B for simplicity), which can be generally similar to the actuators 475 and 480 (however the pulley is not rotationally fixed to the Upper arm link 302 or forearm link 305) to couple the first wrist pulley 470, for example, to a third drive shaft (such as the drive shaft 280AS illustrated in Figure 2C, where the drive shaft 280BS is the same as the drive shaft) 91401, and drive shaft 280S is identical to drive shaft 91402). Here, the drive used to drive the cutter arm link 307 and the end effector 310 may include low profile pulleys and belts, as described in U.S. Patent Publication No. 2018/0019155 (Application No. 2018/0019155) published on January 18, 2018. 15/634,87), which is disclosed in its entirety and is incorporated herein by reference. In other aspects, each of upper arm link 302 , forearm link 305 , cutter link 307 and end effector 310 is independently rotationally driven with individual degrees of freedom of the drive zone (eg, drive zone 200C), as described above. narrate.

In one aspect, the transfer arm 300 may be generally similar to that described above, however the end effector may be mounted above or below the cut arm link 307 such that rotation of the end effector 310 is no longer determined by the cut arm link. 307 limitations.

It should be understood that the foregoing description is illustrative only of various aspects of the disclosed embodiments. Those skilled in the art can devise numerous alternatives and modifications without departing from aspects of the disclosed embodiments. Accordingly, the aspects of the disclosed embodiments are intended to embrace all such alternatives, modifications, and variations that fall within the scope of the appended claims. Furthermore, the recitation of different features in dependent or independent claims of different claims does not indicate that a combination of these features cannot be used to advantage, and such combinations still remain within the scope of various aspects of the invention.

12: Tool interface area 15: Substrate transfer device 18B, 18i: Transfer chamber module 26B, 26i: Substrate transfer device 30i: Module, workpiece station 30S1, 30S2: Workpiece support/shelf 56, 56A: Loading lock module Group 56S1, 56S2: Workpiece support/shelf 100A~100H: Processing device 100E1, 100E2: Transfer chamber end 100F1~100F8: Transfer chamber facet 100S1, 100S2: Transfer chamber side 101: Atmospheric pressure front end 102, 102A~102E: Vacuum load Input lock 103: Vacuum backend 104: Substrate transfer device 105: Loading port module 106: Mini environment 107: Loading port 108: Transfer robot 110: Controller 121, 122: Set rod 125A~125F: Transfer chamber 126m1 ~126m4: Motor 126S1~126S4: Driving shaft 130: Processing station 130S: Processing station 130T1~130T8: Processing station 143: Set arm 144: Linear transporter, linear slider 200, 200A~C: Drive area 200F: Frame 200F1 : Internal 270: Z-axis drive 270C: Transporter 275: Bellows seal 276, 277: Ferrofluid seal 280, 280': Harmonic drive motor 280A, 280A': Harmonic drive motor 280ACS: Tank seal 280AR': Rotor 280AS: Drive shaft 280AS': Stator 280B, 280B': Harmonic drive motor 280BCS: Tank seal 280BR': Rotor 280BS: Drive shaft 280BS': Stator 280CS: Tank seal 280R': Rotor 280S: Drive shaft 280S' :Stator 281: Shell 282: Rotary drive area 290: Wire 300: Robot arm, transmission arm 302: Upper arm link 305: Forearm link 307: Third arm link, cut arm link 307S: Slot 307T1, 307T2 :Tine 310: End effector 310H1, 310H2: Substrate holding position 366: Stacking height profile 412: Workpiece entry/exit station 416: Linear transfer chamber 450: First forearm pulley 451: Second forearm pulley 452: Third forearm pulley 453: Fourth forearm pulley 454: Belt 454A, 454B: Split belt 455: Belt 455A, 455B: Split belt 460: First upper arm pulley 461: Second upper arm pulley 462: Belt 462A, 462B: Split belt 470: First wrist Pulley 471: Second wrist pulley 472: Belt 472A, 472B: Split belt 475: Drive 480: Drive 490: Drive 497: Wrist joint width 496D: Diameter 496R: Radius 498: Width 499: Combined width 500: Deep depression Type substrate holding station 520: inner surface 521: gate (or slot) valve 521P: gate valve port 521W: width 580: transfer chamber 590, 590A: processing module 670: actuator 700~770: method of transferring substrate 800~ 810: Method of conveying substrate 2012: Tool interface area 2050, 2060, 2070: Interface 2080: Wafer conveyor 3018, 3018A, 3018I, 3018J: Transfer chamber module 91312: Z-axis driver 91400: Drive area 91400H: Housing 91401, 91402: Drive shaft 91403: First motor 91403R: Rotor 91403S: Stator 91404: Second motor 91404R: Rotor 91404S: Stator ATM: Atmospheric pressure C: Cassette, substrate carrier CNX: Connection DIST: Offset distance EX: Toggle shaft F: Floor area H1~H3, H10~H13, H20: Height KX: Finger axis L1~L4: Length PM: Processing module PX: Pulley shaft R, R1: Extension and retraction axis RT1: First rotation direction RT2: Second direction of rotation S: Substrate SD: Swing diameter SV: Slot valve SX: Shoulder axis T: Rotation TP: Transfer plane WRP: Wafer/substrate rest plane WX: Wrist axis X: Longitudinal axis Z: Vertical direction θ: Winding Rotation of the shoulder axis θ _FA : Rotation of the forearm around the forearm axis θ _WRA : Rotation of the wrist around the wrist axis

The following description, along with the accompanying drawings, explains the foregoing aspects and other features of the disclosed embodiments, in which: 1A-1D are schematic diagrams of a substrate processing apparatus according to various aspects of disclosed embodiments; 1E and 1F are schematic diagrams of portions of the substrate processing apparatus of FIGS. 1A-1D according to various aspects of disclosed embodiments; 1G-1M are schematic diagrams of a substrate processing apparatus according to various aspects of disclosed embodiments; 2A to 2D are schematic diagrams of portions of a substrate transfer drive area in accordance with various aspects of disclosed embodiments; 3A to 3D are schematic diagrams of a substrate transfer device according to various aspects of disclosed embodiments; 4A-4E are schematic diagrams of portions of a substrate transfer device according to various aspects of disclosed embodiments; 5A-5F are exemplary illustrations of extension/retraction sequences of a substrate transfer device in accordance with various aspects of disclosed embodiments; 6A to 6E are schematic diagrams of a substrate transfer device according to various aspects of disclosed embodiments; 7 is an exemplary operational flow diagram of a substrate transfer apparatus in accordance with aspects of the disclosed embodiments; and Figure 8 is a flowchart of an exemplary method in accordance with various aspects of the disclosed embodiments.

104:Substrate transfer device

200:Drive area

300: Robot arm, transfer arm

302: Upper arm link

305: Forearm link

307: Third arm connecting rod, cut arm connecting rod

310: End implementer

499:Combined width

500: Deep recessed substrate holding station

520:Inside

521: Gate (or slot) valve

521P: Gate valve port

521W: Width

580:Teleport room

590: Processing module

DIST:offset distance

EX: elbow shaft

R: Extend and retract axis

RT1: first rotation direction

RT2: Second rotation direction

S:Substrate

SX: shoulder axis

WX: wrist axis

θ: rotation around the shoulder axis

Claims (26)

A substrate processing apparatus includes: a frame; a transfer device connected to the frame, the transfer device having: an upper arm link; a forearm link rotatably coupled to the upper arm link about an elbow axis; at least a third arm link rotatably coupled to the forearm link; and an end effector rotatably coupled to the third arm link about the finger axis; and a drive system with at least two degrees of freedom. , which is operably connected to at least one of the upper arm link, the forearm link and the third arm link to implement extension and retraction of the end effector in the horizontal plane through the two-degree-of-freedom drive system , wherein the height of the end effector is within a total stack height profile defined by the stack height of the forearm link and at least the third arm link at and adjacent the wrist axis, such that at the wrist axis The total stack height profile at and adjacent the wrist axis is at least partially coincident with the end effector, and the total stack height profile is sized to fit through the slot valve. For example, in the substrate processing device of claim 1 of the patent application, the length of the third arm link is less than the length of the upper arm link, and the length of the upper arm link is less than the length of the forearm link. For example, in the substrate processing device of claim 1, the rotation of the end effector is driven by the rotation of the forearm link, and the third arm link The rotation of the rod is driven by the rotation of the upper arm link. For example, the substrate processing device of claim 1, wherein: the upper arm link is rotatably coupled to the two-degree-of-freedom drive system at the shoulder axis; the end effector is a double-headed end effector; and the transfer device Constructed to extend bidirectionally on opposite sides of the shoulder, the conveyor as a whole does not rotate about the shoulder. The substrate processing apparatus of claim 1, wherein the third arm link includes a slot configured to receive at least part of the end effector, such that the end effector is rotatably coupled in the slot on the third arm link. For example, in the substrate processing device of claim 1, the end effector is disposed above or below the third arm link. For example, in the substrate processing device of Item 1 of the patent application, wherein: the forearm link is a tapered structure; and the upper arm link has a matching tapered structure constructed to complement the tapered structure of the forearm link, then At least a portion of the upper arm link and a portion of the forearm link are coplanar. For example, if the substrate processing device of item 1 of the patent scope is applied for, the third The arm link is driven by the upper arm link through the double sets of forearm pulleys arranged in the forearm link. For example, in the substrate processing device of claim 1, the extension and retraction axes of the conveyor pass through the center of the rotation shoulder axis of the conveyor. For example, the substrate processing device of claim 1, wherein the conveying device is configured to extend bidirectionally on opposite sides of a shoulder axis of the conveying device, wherein the radial extension of the conveying arm substantially extends on the opposite sides of the shoulder axis. Symmetry. For example, the substrate processing apparatus of claim 1, wherein the end effector remains aligned with the extension and retraction axis throughout the entire extension and retraction range of the conveyor. For example, in the substrate processing device of claim 1, the third arm link is generally aligned with the forearm link in the initial posture of the conveyor. For example, in the substrate processing device of claim 1, the third arm link is driven by a belt drive with a single belt height. A substrate processing device, which includes: a frame; A transmission device connected to the frame, the transmission device having: an upper arm link; a forearm link rotatably coupled to the upper arm link about an elbow axis; and a forearm link rotatably coupled to the forearm link about a wrist axis. at least a third arm link of the rod; and an end effector rotatably coupled to the third arm link about a finger axis; and a drive system operatively connected to the upper arm link, the forearm link At least one of the rod and the third arm link is used to implement extension and retraction of the end effector, wherein the transmission device has an extension range, which is the upper arm link, the forearm link, the third arm link and The maximum extension range of the conveyor of the end effector in the retracted configuration for a predetermined swing diameter of the conveyor, the maximum extension range of the end effector, its finger shaft and at least part of the third arm link ( including the wrist shaft) extending through the slot valve of the substrate processing apparatus. For example, in the substrate processing device of Item 14 of the patent application, the driving system is a two-degree-of-freedom driving system. For example, in the substrate processing apparatus of claim 15, the rotation of the end effector is driven by the rotation of the forearm link, and the rotation of the third arm link is driven by the rotation of the upper arm link. For example, in the substrate processing device of Item 14 of the patent application, the driving system is a three-degree-of-freedom driving system. For example, in the substrate processing device of Item 14 of the patent application, the driving system is a four-degree-of-freedom driving system. For example, in the substrate processing device of claim 14, the length of the third arm link is less than the length of the upper arm link, and the length of the upper arm link is less than the length of the forearm link. For example, the substrate processing device of claim 14, wherein: the upper arm link is rotatably coupled to the drive system at the shoulder axis; the end effector is a double-headed end effector; and the transfer device is constructed in the The shoulder axis extends bidirectionally on opposite sides, and the conveyor does not rotate entirely about the shoulder axis. The substrate processing apparatus of claim 14, wherein the third arm link includes a slot configured to receive at least part of the end effector, such that the end effector is rotatably coupled in the slot on the third arm link. For example, in the substrate processing device of claim 14, the end effector is disposed above or below the third arm link. For example, the substrate processing device of claim 14, wherein: the forearm link is a tapered structure; and the upper arm link has a matching tapered structure constructed to complement the forearm The tapered configuration of the link is such that at least part of the upper arm link and part of the forearm link are coplanar. A method of transporting a substrate, comprising: providing a transport device connected to a frame, the transport device having: an upper arm link; a forearm link rotatably coupled to the upper arm link about an elbow axis; at least a third arm link rotatably coupled to the forearm link; and an end effector rotatably coupled to the third arm link about a finger axis; and two drive systems with two degrees of freedom. freedom to effect extension or retraction of the upper arm link, the forearm link, the third arm link and the end effector in the horizontal plane on opposite sides of the shoulder axis of the conveyor and beyond the shoulder axis above, such that the wrist axis extends through the slot valve of a substrate processing apparatus located on each of opposite sides of one or more pick and place substrates; wherein the height of the end effector is the stack of the wrist axis height profile such that the total stack height of the end effector and wrist shaft is sized to fit through the slot valve. For example, the method of claim 24, wherein the transmission device has an extension range, which is the predetermined swing of the upper arm link, forearm link, third arm link and end effector with respect to the transmission device in the retracted structure diameter of the transmission device, the maximum extension range extends the end effector, its finger shaft and at least part of the third arm link (including the wrist shaft) The slot valve extends through the substrate processing apparatus. For example, the method of claim 24 further includes: bidirectionally extending the upper arm link, the forearm link, the third arm link and the end effector on opposite sides of the shoulder axis of the transmission device, The entire conveyor device does not rotate around the shoulder axis.