TWI825045B - 具有耐高溫鎳合金接頭的半導體處理設備及其製造方法 - Google Patents

具有耐高溫鎳合金接頭的半導體處理設備及其製造方法 Download PDF

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TWI825045B
TWI825045B TW107142769A TW107142769A TWI825045B TW I825045 B TWI825045 B TW I825045B TW 107142769 A TW107142769 A TW 107142769A TW 107142769 A TW107142769 A TW 107142769A TW I825045 B TWI825045 B TW I825045B
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Taiwan
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ceramic
layer
processing equipment
semiconductor processing
nickel
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TW107142769A
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Chinese (zh)
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TW201927726A (zh
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布蘭特 艾略特
吉列德 胡星
傑森 史蒂芬
麥克 帕格
艾弗瑞德 艾略特
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美商瓦特隆電子製造公司
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/70Forming laminates or joined articles comprising layers of a specific, unusual thickness
    • C04B2237/708Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the interlayers
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/76Forming laminates or joined articles comprising at least one member in the form other than a sheet or disc, e.g. two tubes or a tube and a sheet or disc
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    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
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    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/84Joining of a first substrate with a second substrate at least partially inside the first substrate, where the bonding area is at the inside of the first substrate, e.g. one tube inside another tube

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