TWI824040B - Crystallization of a compound having a fluorine skeleton and its production method - Google Patents
Crystallization of a compound having a fluorine skeleton and its production method Download PDFInfo
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- TWI824040B TWI824040B TW108137987A TW108137987A TWI824040B TW I824040 B TWI824040 B TW I824040B TW 108137987 A TW108137987 A TW 108137987A TW 108137987 A TW108137987 A TW 108137987A TW I824040 B TWI824040 B TW I824040B
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- compound
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- bis
- acid
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 84
- 238000002425 crystallisation Methods 0.000 title claims abstract description 41
- 230000008025 crystallization Effects 0.000 title claims abstract description 41
- 125000001153 fluoro group Chemical group F* 0.000 title claims description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 239000013078 crystal Substances 0.000 claims abstract description 81
- 125000003118 aryl group Chemical group 0.000 claims abstract description 26
- 125000005843 halogen group Chemical group 0.000 claims abstract description 18
- 239000002994 raw material Substances 0.000 claims abstract description 17
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 239000011347 resin Substances 0.000 claims abstract description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 14
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 12
- 125000001424 substituent group Chemical group 0.000 claims abstract description 10
- 238000000113 differential scanning calorimetry Methods 0.000 claims abstract description 6
- PJMPHNIQZUBGLI-UHFFFAOYSA-N fentanyl Chemical group C=1C=CC=CC=1N(C(=O)CC)C(CC1)CCN1CCC1=CC=CC=C1 PJMPHNIQZUBGLI-UHFFFAOYSA-N 0.000 claims abstract 4
- 229960002428 fentanyl Drugs 0.000 claims abstract 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 3
- 239000002904 solvent Substances 0.000 claims description 55
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 46
- -1 alcohol compound Chemical class 0.000 claims description 29
- 239000004327 boric acid Substances 0.000 claims description 24
- 239000003054 catalyst Substances 0.000 claims description 24
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 12
- 239000007810 chemical reaction solvent Substances 0.000 claims description 12
- 238000001953 recrystallisation Methods 0.000 claims description 9
- 239000003377 acid catalyst Substances 0.000 claims description 8
- 150000004053 quinones Chemical class 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 239000000376 reactant Substances 0.000 claims description 7
- 239000003513 alkali Substances 0.000 claims description 6
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 23
- 229910052799 carbon Inorganic materials 0.000 abstract description 5
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 90
- 239000004305 biphenyl Substances 0.000 description 42
- 238000006243 chemical reaction Methods 0.000 description 38
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 27
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 21
- 238000000034 method Methods 0.000 description 21
- 229910052763 palladium Inorganic materials 0.000 description 19
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 239000011549 crystallization solution Substances 0.000 description 18
- 239000011964 heteropoly acid Substances 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 16
- 150000002430 hydrocarbons Chemical group 0.000 description 15
- 238000002844 melting Methods 0.000 description 15
- 230000008018 melting Effects 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 14
- 235000010338 boric acid Nutrition 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 230000018044 dehydration Effects 0.000 description 12
- 238000006297 dehydration reaction Methods 0.000 description 12
- 239000002253 acid Substances 0.000 description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 11
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 150000008064 anhydrides Chemical class 0.000 description 9
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 9
- 208000005156 Dehydration Diseases 0.000 description 8
- 125000000753 cycloalkyl group Chemical group 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 8
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 150000001298 alcohols Chemical class 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000004128 high performance liquid chromatography Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 229960005323 phenoxyethanol Drugs 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- HXGPBZKGPPZSGX-UHFFFAOYSA-N 2,7-bis[fluoro(dipyridin-2-yl)methyl]-1,8-naphthyridine Chemical compound C=1C=CC=NC=1C(C=1N=C2N=C(C=CC2=CC=1)C(F)(C=1N=CC=CC=1)C=1N=CC=CC=1)(F)C1=CC=CC=N1 HXGPBZKGPPZSGX-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 6
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000001624 naphthyl group Chemical group 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 5
- 150000002221 fluorine Chemical class 0.000 description 5
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 4
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 4
- 125000006704 (C5-C6) cycloalkyl group Chemical group 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical group [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 125000002619 bicyclic group Chemical group 0.000 description 3
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 3
- 125000005619 boric acid group Chemical class 0.000 description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- XDRVAZAFNWDVOE-UHFFFAOYSA-N cyclohexylboronic acid Chemical compound OB(O)C1CCCCC1 XDRVAZAFNWDVOE-UHFFFAOYSA-N 0.000 description 3
- 229940117389 dichlorobenzene Drugs 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 150000002941 palladium compounds Chemical class 0.000 description 3
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- NQXNYVAALXGLQT-UHFFFAOYSA-N 2-[4-[9-[4-(2-hydroxyethoxy)phenyl]fluoren-9-yl]phenoxy]ethanol Chemical compound C1=CC(OCCO)=CC=C1C1(C=2C=CC(OCCO)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 NQXNYVAALXGLQT-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- ZSBDGXGICLIJGD-UHFFFAOYSA-N 4-phenoxyphenol Chemical compound C1=CC(O)=CC=C1OC1=CC=CC=C1 ZSBDGXGICLIJGD-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 125000005233 alkylalcohol group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 150000001543 aryl boronic acids Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 150000004292 cyclic ethers Chemical class 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- PAVZHTXVORCEHP-UHFFFAOYSA-N ethylboronic acid Chemical compound CCB(O)O PAVZHTXVORCEHP-UHFFFAOYSA-N 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- HUMMCEUVDBVXTQ-UHFFFAOYSA-N naphthalen-1-ylboronic acid Chemical compound C1=CC=C2C(B(O)O)=CC=CC2=C1 HUMMCEUVDBVXTQ-UHFFFAOYSA-N 0.000 description 2
- KPTRDYONBVUWPD-UHFFFAOYSA-N naphthalen-2-ylboronic acid Chemical compound C1=CC=CC2=CC(B(O)O)=CC=C21 KPTRDYONBVUWPD-UHFFFAOYSA-N 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- ABWPXVJNCQKYDR-UHFFFAOYSA-N pentylboronic acid Chemical compound CCCCCB(O)O ABWPXVJNCQKYDR-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000011403 purification operation Methods 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- ZYYANAWVBDFAHY-UHFFFAOYSA-N (2,3-dimethylphenyl)boronic acid Chemical compound CC1=CC=CC(B(O)O)=C1C ZYYANAWVBDFAHY-UHFFFAOYSA-N 0.000 description 1
- TYONHSPZXLFWKI-UHFFFAOYSA-N (2,4-dimethylphenyl)boronic acid Chemical compound CC1=CC=C(B(O)O)C(C)=C1 TYONHSPZXLFWKI-UHFFFAOYSA-N 0.000 description 1
- OOMZKLJLVGQZGV-UHFFFAOYSA-N (2,5-dimethylphenyl)boronic acid Chemical compound CC1=CC=C(C)C(B(O)O)=C1 OOMZKLJLVGQZGV-UHFFFAOYSA-N 0.000 description 1
- DGFCTCGCMKEILT-UHFFFAOYSA-N (2-ethoxyphenyl)boronic acid Chemical compound CCOC1=CC=CC=C1B(O)O DGFCTCGCMKEILT-UHFFFAOYSA-N 0.000 description 1
- NSJVYHOPHZMZPN-UHFFFAOYSA-N (2-methylphenyl)boronic acid Chemical compound CC1=CC=CC=C1B(O)O NSJVYHOPHZMZPN-UHFFFAOYSA-N 0.000 description 1
- KDVZJKOYSOFXRV-UHFFFAOYSA-N (3,4-dimethylphenyl)boronic acid Chemical compound CC1=CC=C(B(O)O)C=C1C KDVZJKOYSOFXRV-UHFFFAOYSA-N 0.000 description 1
- DJGHSJBYKIQHIK-UHFFFAOYSA-N (3,5-dimethylphenyl)boronic acid Chemical compound CC1=CC(C)=CC(B(O)O)=C1 DJGHSJBYKIQHIK-UHFFFAOYSA-N 0.000 description 1
- CHCWUTJYLUBETR-UHFFFAOYSA-N (3-ethoxyphenyl)boronic acid Chemical compound CCOC1=CC=CC(B(O)O)=C1 CHCWUTJYLUBETR-UHFFFAOYSA-N 0.000 description 1
- BJQCPCFFYBKRLM-UHFFFAOYSA-N (3-methylphenyl)boronic acid Chemical compound CC1=CC=CC(B(O)O)=C1 BJQCPCFFYBKRLM-UHFFFAOYSA-N 0.000 description 1
- UKZVUHVNTYDSOP-UHFFFAOYSA-N (3-propan-2-yloxyphenyl)boronic acid Chemical compound CC(C)OC1=CC=CC(B(O)O)=C1 UKZVUHVNTYDSOP-UHFFFAOYSA-N 0.000 description 1
- SRSWMXFANVKOFH-UHFFFAOYSA-N (3-propoxyphenyl)boronic acid Chemical compound CCCOC1=CC=CC(B(O)O)=C1 SRSWMXFANVKOFH-UHFFFAOYSA-N 0.000 description 1
- WRQNDLDUNQMTCL-UHFFFAOYSA-N (4-ethoxyphenyl)boronic acid Chemical compound CCOC1=CC=C(B(O)O)C=C1 WRQNDLDUNQMTCL-UHFFFAOYSA-N 0.000 description 1
- BIWQNIMLAISTBV-UHFFFAOYSA-N (4-methylphenyl)boronic acid Chemical compound CC1=CC=C(B(O)O)C=C1 BIWQNIMLAISTBV-UHFFFAOYSA-N 0.000 description 1
- CJUHQADBFQRIMC-UHFFFAOYSA-N (4-propan-2-yloxyphenyl)boronic acid Chemical compound CC(C)OC1=CC=C(B(O)O)C=C1 CJUHQADBFQRIMC-UHFFFAOYSA-N 0.000 description 1
- IAEUFBDMVKQCLU-UHFFFAOYSA-N (4-propan-2-ylphenyl)boronic acid Chemical compound CC(C)C1=CC=C(B(O)O)C=C1 IAEUFBDMVKQCLU-UHFFFAOYSA-N 0.000 description 1
- WLCGYIWOKVWFLB-UHFFFAOYSA-N (4-propylphenyl)boronic acid Chemical compound CCCC1=CC=C(B(O)O)C=C1 WLCGYIWOKVWFLB-UHFFFAOYSA-N 0.000 description 1
- GZFAVYWCPSMLCM-UHFFFAOYSA-N (6-methoxynaphthalen-2-yl)boronic acid Chemical compound C1=C(B(O)O)C=CC2=CC(OC)=CC=C21 GZFAVYWCPSMLCM-UHFFFAOYSA-N 0.000 description 1
- DPNIGJLGMQBNNY-UHFFFAOYSA-N 1-(2,3-dimethylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC(C)=C1C DPNIGJLGMQBNNY-UHFFFAOYSA-N 0.000 description 1
- GRCCRGZIGHCSEO-UHFFFAOYSA-N 1-(2,5-dimethylphenoxy)ethanol Chemical compound CC(O)OC1=CC(C)=CC=C1C GRCCRGZIGHCSEO-UHFFFAOYSA-N 0.000 description 1
- MPAYJGGBUYKVNE-UHFFFAOYSA-N 1-(2,6-dibutylphenoxy)ethanol Chemical compound CCCCC1=CC=CC(CCCC)=C1OC(C)O MPAYJGGBUYKVNE-UHFFFAOYSA-N 0.000 description 1
- MMLWQANUZJTBLY-UHFFFAOYSA-N 1-(2,6-dimethylphenoxy)ethanol Chemical compound CC(O)OC1=C(C)C=CC=C1C MMLWQANUZJTBLY-UHFFFAOYSA-N 0.000 description 1
- ZIGSNIWTQDNBSG-UHFFFAOYSA-N 1-(2-cyclohexylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC=C1C1CCCCC1 ZIGSNIWTQDNBSG-UHFFFAOYSA-N 0.000 description 1
- SADPEYKYRHAWLO-UHFFFAOYSA-N 1-(2-methoxyphenoxy)ethanol Chemical compound COC1=CC=CC=C1OC(C)O SADPEYKYRHAWLO-UHFFFAOYSA-N 0.000 description 1
- GJWUEORLYBSRLX-UHFFFAOYSA-N 1-(2-methylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC=C1C GJWUEORLYBSRLX-UHFFFAOYSA-N 0.000 description 1
- BVFULMNNRVECNI-UHFFFAOYSA-N 1-(2-methylphenoxy)propan-1-ol Chemical compound CCC(O)OC1=CC=CC=C1C BVFULMNNRVECNI-UHFFFAOYSA-N 0.000 description 1
- GSOBKKBOWPKAMP-UHFFFAOYSA-N 1-(2-phenylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC=C1C1=CC=CC=C1 GSOBKKBOWPKAMP-UHFFFAOYSA-N 0.000 description 1
- OPQCAIWFWZZCRH-UHFFFAOYSA-N 1-(3-butylphenoxy)ethanol Chemical compound CCCCC1=CC=CC(OC(C)O)=C1 OPQCAIWFWZZCRH-UHFFFAOYSA-N 0.000 description 1
- GUFGXAIZAAYYKA-UHFFFAOYSA-N 1-(3-ethylphenoxy)ethanol Chemical compound CCC1=CC=CC(OC(C)O)=C1 GUFGXAIZAAYYKA-UHFFFAOYSA-N 0.000 description 1
- QPKFVRWIISEVCW-UHFFFAOYSA-N 1-butane boronic acid Chemical compound CCCCB(O)O QPKFVRWIISEVCW-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- PCALKHSQMLZQEQ-UHFFFAOYSA-N 1-phenoxybutan-1-ol Chemical compound CCCC(O)OC1=CC=CC=C1 PCALKHSQMLZQEQ-UHFFFAOYSA-N 0.000 description 1
- OAAZUWWNSYWWHG-UHFFFAOYSA-N 1-phenoxypropan-1-ol Chemical compound CCC(O)OC1=CC=CC=C1 OAAZUWWNSYWWHG-UHFFFAOYSA-N 0.000 description 1
- VOXXGUAZBWSUSS-UHFFFAOYSA-N 2,4,6-triphenyl-1,3,5,2,4,6-trioxatriborinane Chemical compound O1B(C=2C=CC=CC=2)OB(C=2C=CC=CC=2)OB1C1=CC=CC=C1 VOXXGUAZBWSUSS-UHFFFAOYSA-N 0.000 description 1
- MOEFFSWKSMRFRQ-UHFFFAOYSA-N 2-ethoxyphenol Chemical compound CCOC1=CC=CC=C1O MOEFFSWKSMRFRQ-UHFFFAOYSA-N 0.000 description 1
- ZAZPDOYUCVFPOI-UHFFFAOYSA-N 2-methylpropylboronic acid Chemical compound CC(C)CB(O)O ZAZPDOYUCVFPOI-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 229940061334 2-phenylphenol Drugs 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- KIHCSOMVJQDKCN-UHFFFAOYSA-N 4-[2-tert-butylphosphanyl-1-[4-(dimethylamino)phenyl]-2-methylpropyl]-N,N-dimethylaniline Chemical compound CN(C)C1=CC=C(C=C1)C(C(C)(C)PC(C)(C)C)C1=CC=C(C=C1)N(C)C KIHCSOMVJQDKCN-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000002028 Biomass Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- BKXZLZVGNZNKGG-UHFFFAOYSA-N P(=O)(=O)[V] Chemical compound P(=O)(=O)[V] BKXZLZVGNZNKGG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 238000006069 Suzuki reaction reaction Methods 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- LXGQHDUCNDGTDB-PAMNCVQHSA-N [2-[(8s,9r,10s,13s,14s,16s,17r)-9-fluoro-11,17-dihydroxy-10,13,16-trimethyl-3-oxo-6,7,8,11,12,14,15,16-octahydrocyclopenta[a]phenanthren-17-yl]-2-oxoethyl] acetate;[2-[(8s,9r,10s,13s,14s,16s,17r)-9-fluoro-11,17-dihydroxy-10,13,16-trimethyl-3-oxo-6,7,8,11, Chemical compound C1CC2=CC(=O)C=C[C@]2(C)[C@]2(F)[C@@H]1[C@@H]1C[C@H](C)[C@@](C(=O)COC(C)=O)(O)[C@@]1(C)CC2O.C1CC2=CC(=O)C=C[C@]2(C)[C@]2(F)[C@@H]1[C@@H]1C[C@H](C)[C@@](C(=O)COP(O)(O)=O)(O)[C@@]1(C)CC2O LXGQHDUCNDGTDB-PAMNCVQHSA-N 0.000 description 1
- PUMXDJNBUIVGOT-UHFFFAOYSA-K [O-]P([O-])([O-])=O.[W+6] Chemical compound [O-]P([O-])([O-])=O.[W+6] PUMXDJNBUIVGOT-UHFFFAOYSA-K 0.000 description 1
- FPWJLQXCGHQXLL-UHFFFAOYSA-N [P].OP(O)(O)=O Chemical compound [P].OP(O)(O)=O FPWJLQXCGHQXLL-UHFFFAOYSA-N 0.000 description 1
- BHTYXHCGQDYPIO-UHFFFAOYSA-N [Si].O[Si](O)(O)O Chemical compound [Si].O[Si](O)(O)O BHTYXHCGQDYPIO-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000001448 anilines Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UBXYXCRCOKCZIT-UHFFFAOYSA-N biphenyl-3-ol Chemical compound OC1=CC=CC(C=2C=CC=CC=2)=C1 UBXYXCRCOKCZIT-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- HHGAJIKAUQWFKH-UHFFFAOYSA-N cyclopentane;cyclopentylboronic acid;iron Chemical compound [Fe].[CH]1[CH][CH][CH][CH]1.OB(O)[C]1[CH][CH][CH][CH]1 HHGAJIKAUQWFKH-UHFFFAOYSA-N 0.000 description 1
- UZBHNSVUMGIKLU-UHFFFAOYSA-N cyclopenten-1-ylboronic acid Chemical compound OB(O)C1=CCCC1 UZBHNSVUMGIKLU-UHFFFAOYSA-N 0.000 description 1
- 238000005695 dehalogenation reaction Methods 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- VBXDEEVJTYBRJJ-UHFFFAOYSA-N diboronic acid Chemical compound OBOBO VBXDEEVJTYBRJJ-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- KHXJHUVTFLIYSV-UHFFFAOYSA-N ditert-butyl(3-methylbuta-1,3-dienyl)phosphane Chemical compound C(C)(C)(C)P(C=CC(C)=C)C(C)(C)C KHXJHUVTFLIYSV-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- IVLVTNPOHDFFCJ-UHFFFAOYSA-N fentanyl citrate Chemical class OC(=O)CC(O)(C(O)=O)CC(O)=O.C=1C=CC=CC=1N(C(=O)CC)C(CC1)CCN1CCC1=CC=CC=C1 IVLVTNPOHDFFCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229960001867 guaiacol Drugs 0.000 description 1
- 150000005171 halobenzenes Chemical class 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- CXSYDLCMCLCOCA-UHFFFAOYSA-N hexylboronic acid Chemical compound CCCCCCB(O)O CXSYDLCMCLCOCA-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XKEYHBLSCGBBGU-UHFFFAOYSA-N isoquinolin-5-ylboronic acid Chemical compound N1=CC=C2C(B(O)O)=CC=CC2=C1 XKEYHBLSCGBBGU-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- KTMKRRPZPWUYKK-UHFFFAOYSA-N methylboronic acid Chemical compound CB(O)O KTMKRRPZPWUYKK-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- GKFRVXOKPXCXAK-UHFFFAOYSA-N octylboronic acid Chemical compound CCCCCCCCB(O)O GKFRVXOKPXCXAK-UHFFFAOYSA-N 0.000 description 1
- 235000021453 onion ring Nutrition 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- JCDAUYWOHOLVMH-UHFFFAOYSA-N phenanthren-9-ylboronic acid Chemical compound C1=CC=C2C(B(O)O)=CC3=CC=CC=C3C2=C1 JCDAUYWOHOLVMH-UHFFFAOYSA-N 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical group C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- VPRUMANMDWQMNF-UHFFFAOYSA-N phenylethane boronic acid Chemical compound OB(O)CCC1=CC=CC=C1 VPRUMANMDWQMNF-UHFFFAOYSA-N 0.000 description 1
- CTXKJNCPTVBAAU-UHFFFAOYSA-N phenylmethoxyboronic acid Chemical compound OB(O)OCC1=CC=CC=C1 CTXKJNCPTVBAAU-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 1
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- QIPHSSYCQCBJAX-UHFFFAOYSA-N propan-2-ylboronic acid Chemical compound CC(C)B(O)O QIPHSSYCQCBJAX-UHFFFAOYSA-N 0.000 description 1
- JAQOMSTTXPGKTN-UHFFFAOYSA-N propylboronic acid Chemical compound CCCB(O)O JAQOMSTTXPGKTN-UHFFFAOYSA-N 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HZFPPBMKGYINDF-UHFFFAOYSA-N pyrimidin-5-ylboronic acid Chemical compound OB(O)C1=CN=CN=C1 HZFPPBMKGYINDF-UHFFFAOYSA-N 0.000 description 1
- KXJJSKYICDAICD-UHFFFAOYSA-N quinolin-8-ylboronic acid Chemical compound C1=CN=C2C(B(O)O)=CC=CC2=C1 KXJJSKYICDAICD-UHFFFAOYSA-N 0.000 description 1
- 125000004151 quinonyl group Chemical group 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001256 steam distillation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- MCZDHTKJGDCTAE-UHFFFAOYSA-M tetrabutylazanium;acetate Chemical compound CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC MCZDHTKJGDCTAE-UHFFFAOYSA-M 0.000 description 1
- ARYHTUPFQTUBBG-UHFFFAOYSA-N thiophen-2-ylboronic acid Chemical compound OB(O)C1=CC=CS1 ARYHTUPFQTUBBG-UHFFFAOYSA-N 0.000 description 1
- QNMBSXGYAQZCTN-UHFFFAOYSA-N thiophen-3-ylboronic acid Chemical compound OB(O)C=1C=CSC=1 QNMBSXGYAQZCTN-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/01—Preparation of ethers
- C07C41/18—Preparation of ethers by reactions not forming ether-oxygen bonds
- C07C41/30—Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
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- C—CHEMISTRY; METALLURGY
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/01—Preparation of ethers
- C07C41/34—Separation; Purification; Stabilisation; Use of additives
- C07C41/40—Separation; Purification; Stabilisation; Use of additives by change of physical state, e.g. by crystallisation
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
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- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
本發明為一種具有下述式(1)表示之茀骨架之化合物的結晶,其係於110~190℃的範圍至少具有一個藉由差示掃描熱量分析所得之吸熱峰值,此化合物的結晶係操作容易,將此化合物的結晶使用在原料所得之樹脂減少品質的變異。 (式中,環Z表示(相同或相異)芳香族基,R1 及R2 分別獨立表示氫原子、鹵素原子或可包含碳原子數1~12之芳香族基之烴基,Ar1 及Ar2 表示可具有碳數為6~10之取代基之芳香族基,L1 及L2 表示伸烷基,m及n分別獨立表示0~5之整數)。The present invention is a crystal of a compound having a fentanyl skeleton represented by the following formula (1), which has at least one endothermic peak obtained by differential scanning calorimetry in the range of 110 to 190°C. The crystallization of this compound is operated by It is easy to use the crystallization of this compound in the resin obtained from the raw material to reduce the quality variation. (In the formula, ring Z represents (the same or different) aromatic group, R 1 and R 2 independently represent a hydrogen atom, a halogen atom or a hydrocarbon group that may contain an aromatic group with 1 to 12 carbon atoms, Ar 1 and Ar 2 represents an aromatic group which may have a substituent having a carbon number of 6 to 10, L 1 and L 2 represent an alkylene group, and m and n each independently represent an integer of 0 to 5).
Description
本發明係關於適合作為形成構成光學鏡片或光學薄膜所代表之光學構件之樹脂(光學樹脂)之單體,且加工性、生產性優異之具有新穎茀骨架之化合物的結晶及其製造方法。The present invention relates to the crystallization of a compound having a novel fluorine skeleton that is suitable as a monomer for forming resins (optical resins) constituting optical components represented by optical lenses and optical films and has excellent processability and productivity, and a method for producing the same.
近年來,將具有9,9-雙(4-(2-羥基乙氧基)苯基)茀(BPEF)所代表之茀骨架之醇作為原料的聚碳酸酯、聚酯、聚酯碳酸酯等之熱塑性樹脂材料,由於光學特性、耐熱性、成形性等優異,故作為光學鏡片或光學薄片等之光學構件正受到注目。In recent years, polycarbonates, polyesters, polyester carbonates, etc., which use alcohols having a fluorine skeleton represented by 9,9-bis(4-(2-hydroxyethoxy)phenyl)quinone (BPEF) as raw materials Thermoplastic resin materials are attracting attention as optical components such as optical lenses and optical sheets due to their excellent optical properties, heat resistance, formability, etc.
作為9,9-雙(4-(2-羥基乙氧基)苯基)茀(BPEF)之製造方法,揭示有將硫酸與硫醇類作為觸媒使用,使茀酮與苯氧基乙醇脫水縮合之方法(非專利文獻1)。又,揭示有9,9-雙(4-(4-羥基苯基氧基)苯基)茀(OPBPEF)除了硫酸以外,並有使用氯化鋅等之金屬性酸觸媒,使茀酮與對苯氧基酚脫水縮合之方法(專利文獻1)。惟,任一種方法皆因製品中混入源自觸媒之硫成分或金屬成分,導致製品的著色或安定性的降低、純度的下降等之問題發生。進而,為了得到光學用樹脂材料等高純度之製品,有必要重複用以去除硫或金屬成分之純化操作,無法說是工業上有利之方法。As a method for producing 9,9-bis(4-(2-hydroxyethoxy)phenyl)quinone (BPEF), it is disclosed that sulfuric acid and mercaptans are used as catalysts to dehydrate quinone and phenoxyethanol. Condensation method (Non-Patent Document 1). In addition, it is disclosed that 9,9-bis(4-(4-hydroxyphenyloxy)phenyl)quinone (OPBPEF) uses a metallic acid catalyst such as zinc chloride in addition to sulfuric acid to combine quinone with Method for dehydration and condensation of p-phenoxyphenol (Patent Document 1). However, with either method, sulfur components or metal components derived from catalysts are mixed into the product, causing problems such as coloration of the product, a decrease in stability, and a decrease in purity. Furthermore, in order to obtain high-purity products such as optical resin materials, it is necessary to repeat the purification operation to remove sulfur or metal components, which cannot be said to be an industrially advantageous method.
又,揭示有9,9-雙(4-(4-羥基苯基氧基)苯基)茀(OPBPEF)具有源自醇化合物之多結晶,生成因反應或反應後之取出操作(晶析操作)而具有不同熔點之結晶(專利文獻2)。如此在茀骨架之醇化合物,由於生成物的形態變化,故提供一種品質安定之熱塑性樹脂材料變困難。 [先前技術文獻] [專利文獻]Furthermore, it is disclosed that 9,9-bis(4-(4-hydroxyphenyloxy)phenyl)benzoate (OPBPEF) has polycrystals derived from alcohol compounds, and is formed by reaction or removal operation after reaction (crystallization operation) ) and have crystals with different melting points (Patent Document 2). In this way, the alcohol compound in the fluorine skeleton changes in the form of the product, so it becomes difficult to provide a thermoplastic resin material with stable quality. [Prior technical literature] [Patent Document]
[專利文獻1] 日本特開2015-182970號公報 [專利文獻2] 日本特開2018-48086號公報 [非專利文獻][Patent Document 1] Japanese Patent Application Publication No. 2015-182970 [Patent Document 2] Japanese Patent Application Publication No. 2018-48086 [Non-patent literature]
[非專利文獻1] Chemistry Letters,1998年,1055-1056頁[Non-patent document 1] Chemistry Letters, 1998, pages 1055-1056
[發明欲解決之課題][Problem to be solved by the invention]
在本發明,經分子設計之下述式(1)的化合物之製造方法雖由2個步驟所成,但包含結晶或玻璃狀等各式各樣形態,有得不到具有一定品質之操作性優異之化合物的情況。In the present invention, although the method for producing the compound of the following formula (1) through molecular design consists of two steps, it includes various forms such as crystalline or glassy, and the operability with a certain quality cannot be obtained. Excellent compounds.
又,於步驟1使用之觸媒的量較多的情況,或活性炭處理或其他金屬的去除處理不夠充分的情況,於下述式(1)表示之化合物的結晶,已混入源自步驟1之反應使用之鈀觸媒的黑色粒子,導致該醇化合物之色相惡化。In addition, when the amount of catalyst used in step 1 is large, or when activated carbon treatment or other metal removal treatment is not sufficient, the crystals of the compound represented by the following formula (1) are mixed with the catalyst derived from step 1. The black particles of the palladium catalyst used in the reaction cause the color of the alcohol compound to deteriorate.
據此,本發明之目的為提供一種操作容易具有茀骨架之化合物的結晶及其製造方法。Accordingly, an object of the present invention is to provide a crystallization of a compound having a fluorine skeleton that is easy to handle and a method for producing the same.
又,作為其他目的,係提供一種原料中之鈀含量等之特定金屬含量少的結晶化合物,使用該原料之樹脂的色相或各種特性(光學特性、耐熱性、成形性等)優異之具有新穎茀骨架之化合物的結晶及其製造方法。 [用以解決課題之手段]Furthermore, as another object, it is to provide a crystalline compound with a low content of specific metals such as palladium content in the raw material, and a resin using the raw material that is excellent in hue or various properties (optical properties, heat resistance, formability, etc.) with novel properties. Crystallization of skeleton compounds and methods for their production. [Means used to solve problems]
本發明者們為了解決上述以往技術的問題點,進行努力・研究的結果發現,具有特定吸熱峰值之具有茀骨架之化合物的結晶操作容易,將此化合物的結晶使用在原料所得之樹脂的品質變異變少。The inventors of the present invention have made efforts and research in order to solve the above-mentioned problems of the conventional technology. As a result, they have found that the crystallization operation of a compound with a fluorine skeleton having a specific endothermic peak is easy, and the quality variation of the resin obtained by using the crystallization of this compound as a raw material has been found. become less.
進而,發現具有茀骨架且鈀含量足夠低之化合物的結晶,係將此化合物的結晶使用在原料所得之樹脂的色相或各種特性(光學特性、耐熱性、成形性等)優異。Furthermore, it was discovered that a crystal of a compound having a fluorine skeleton and a sufficiently low palladium content is excellent in hue and various properties (optical properties, heat resistance, moldability, etc.) of a resin obtained by using the crystal of this compound as a raw material.
亦即,根據本發明,發明之課題藉由下述達成。That is, according to the present invention, the subject of the invention is achieved as follows.
1. 一種具有下述式(1)表示之茀骨架之化合物的結晶,其係於110~190℃的範圍至少具有一個藉由差示掃描熱量分析所得之吸熱峰值。1. A crystal of a compound having a fluorine skeleton represented by the following formula (1), which has at least one endothermic peak in the range of 110 to 190°C as measured by differential scanning calorimetry.
(式中,環Z表示(相同或相異)芳香族基,R1 及R2 分別獨立表示氫原子、鹵素原子或可包含碳原子數1~12之芳香族基之烴基,Ar1 及Ar2 表示可具有碳數為6~10之取代基之芳香族基,L1 及L2 表示伸烷基,m及n分別獨立表示0~5之整數)。 2. 如前項1記載之具有茀骨架之化合物的結晶,其係包含95重量%以上之上述式(1)表示之茀衍生物。(In the formula, ring Z represents (the same or different) aromatic group, R 1 and R 2 independently represent a hydrogen atom, a halogen atom or a hydrocarbon group that may contain an aromatic group with 1 to 12 carbon atoms, Ar 1 and Ar 2 represents an aromatic group which may have a substituent having a carbon number of 6 to 10, L 1 and L 2 represent an alkylene group, and m and n each independently represent an integer of 0 to 5). 2. The crystal of the compound having a fluorine skeleton as described in the preceding paragraph 1, which contains 95% by weight or more of the fluorine derivative represented by the above formula (1).
3. 如前項1記載之具有茀骨架之化合物的結晶,其中,鈀元素的含量滿足下述式(2)。3. The crystal of the compound having a fluorine skeleton as described in the preceding item 1, wherein the palladium element content satisfies the following formula (2).
4. 一種如前項1所記載的結晶之製造方法,其係包含下述步驟1、步驟2及結晶製造步驟。 步驟1:使下述式(3)表示之茀酮類與下述式(4)表示之硼酸於反應溶劑中,於鹼及觸媒的存在下進行反應之步驟、 4. A method for producing a crystal as described in the preceding paragraph 1, which includes the following steps 1, 2 and a crystal production step. Step 1: A step of reacting a quinone represented by the following formula (3) and a boric acid represented by the following formula (4) in a reaction solvent in the presence of an alkali and a catalyst,
(X1 、X2 表示鹵素原子)。(X 1 and X 2 represent halogen atoms).
(Y表示芳香族基,R3 表示氫原子、烷基、烯基、烷氧基或鹵素原子) 步驟2:使於步驟1製造之下述式(5)表示之反應物與下述式(6)表示之醇化合物於反應溶劑中,使用酸觸媒進行反應之步驟、(Y represents an aromatic group, and R 3 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group or a halogen atom) Step 2: The reactant represented by the following formula (5) produced in step 1 is mixed with the following formula ( 6) The step of reacting the alcohol compound represented in the reaction solvent using an acid catalyst,
(Ar1 及Ar2 與式(1)相同)。(Ar 1 and Ar 2 are the same as formula (1)).
(環Z與式(1)相同;R4 表示氫原子、鹵素原子或可包含碳原子數1~12之芳香族基之烴基,L3 表示伸烷基,l表示0~5之整數)。 結晶製造步驟:使用溶解步驟2所得之化合物的溶劑,進行再結晶操作,並取出結晶之步驟。 [發明效果](Ring Z is the same as formula (1); R 4 represents a hydrogen atom, a halogen atom or a hydrocarbon group that may contain an aromatic group with 1 to 12 carbon atoms, L 3 represents an alkylene group, and l represents an integer of 0 to 5). Crystallization production step: use a solvent to dissolve the compound obtained in step 2, perform a recrystallization operation, and take out the crystallization step. [Effects of the invention]
根據本發明,可得到操作容易且具有茀骨架之化合物的結晶,具有將此化合物的結晶使用在原料所得之樹脂品質的變異變少的效果。又,可得到鈀含量少之具有茀骨架之化合物的結晶,具有將此化合物的結晶使用在原料所得之樹脂的色相或各種特性(光學特性、耐熱性、成形性等)優異的效果。According to the present invention, it is possible to obtain a crystal of a compound that is easy to handle and has a fluorine skeleton, and has the effect of reducing the variation in the quality of a resin obtained by using the crystal of this compound as a raw material. In addition, it is possible to obtain crystals of a compound having a fluorine skeleton with a small palladium content, and the resin obtained by using the crystal of this compound as a raw material has the effect of being excellent in hue and various properties (optical properties, heat resistance, moldability, etc.).
雖詳細說明本發明,但以下所記載之構成要件的說明為本發明之實施態樣的代表例,並非被限定於此等之內容。 (具有茀骨架之化合物的結晶) 本案發明之具有茀骨架之化合物的結晶,為一種具有下述式(1)表示之茀骨架之化合物的結晶,其係於110~190℃的範圍至少具有一個藉由差示掃描熱量分析所得之吸熱峰值。Although the present invention has been described in detail, the descriptions of the constituent elements described below are representative examples of embodiments of the present invention and are not limited thereto. (Crystal of a compound with a fluorine skeleton) The crystal of a compound having a fluorine skeleton of the present invention is a crystal of a compound having a fluorine skeleton represented by the following formula (1), which has at least one temperature in the range of 110 to 190°C as determined by differential scanning calorimetry. Endothermic peak.
(式中,環Z表示(相同或相異)芳香族基,R1 及R2 分別獨立表示氫原子、鹵素原子或可包含碳原子數1~12之芳香族基之烴基,Ar1 及Ar2 表示可具有碳數為6~10之取代基之芳香族基,L1 及L2 表示伸烷基,m及n分別獨立表示0~5之整數)。 具有茀骨架之化合物的結晶較佳為於115~185℃的範圍至少具有一個藉由差示掃描熱量分析所得之吸熱峰值,更佳為於120~180℃的範圍至少具有一個。尚,吸熱峰值係表示具有茀骨架之化合物的結晶的熔點(Tm)者。(In the formula, ring Z represents (the same or different) aromatic group, R 1 and R 2 independently represent a hydrogen atom, a halogen atom or a hydrocarbon group that may contain an aromatic group with 1 to 12 carbon atoms, Ar 1 and Ar 2 represents an aromatic group which may have a substituent having a carbon number of 6 to 10, L 1 and L 2 represent an alkylene group, and m and n each independently represent an integer of 0 to 5). The crystal of the compound having a fluorine skeleton preferably has at least one endothermic peak obtained by differential scanning calorimetry in the range of 115 to 185°C, and more preferably has at least one endothermic peak in the range of 120 to 180°C. Note that the endothermic peak represents the melting point (Tm) of the crystal of a compound having a fluorine skeleton.
該具有茀骨架之化合物的結晶係容易操作,又,具有將此化合物的結晶使用在原料所得之樹脂的品質變異變少的效果。The crystallization of the compound having a fluorine skeleton is easy to handle, and has the effect of reducing the quality variation of the resin obtained by using the crystallization of the compound as a raw material.
又,以包含95重量%以上之上述式(1)表示之茀衍生物的化合物的結晶較佳,更佳為包含96重量%以上之化合物的結晶,再更佳為包含97重量%以上之化合物的結晶,特佳為包含98重量%以上之化合物的結晶,最佳為包含99重量%以上之化合物的結晶。純度係由HPLC純度求出。除了上述式(1)表示之茀衍生物成分以外,有時包含反應所使用之原料或溶劑、反應中所生成之副生成物。Furthermore, the crystal of the compound containing the fentanyl derivative represented by the above formula (1) is preferably 95 wt% or more, more preferably 96 wt% or more of the compound, and still more preferably 97 wt% or more of the compound. The crystal is preferably a crystal containing 98% by weight or more of the compound, and most preferably a crystal containing 99% by weight or more of the compound. Purity was determined from HPLC purity. In addition to the fluorine derivative component represented by the above formula (1), raw materials or solvents used in the reaction and by-products generated in the reaction may be included.
進而,上述式(1)表示之具有茀骨架之化合物的結晶較佳為鈀元素的含量滿足下述式(2)。Furthermore, the crystal of the compound having a fluorine skeleton represented by the above formula (1) is preferably such that the palladium element content satisfies the following formula (2).
較佳為滿足下述式(2-1)。 It is preferable to satisfy the following formula (2-1).
更佳為滿足下述式(2-2)。 More preferably, it satisfies the following formula (2-2).
再更佳為滿足下述式(2-3)。 More preferably, it satisfies the following formula (2-3).
特佳為滿足下述式(2-4)。 Particularly preferably, it satisfies the following formula (2-4).
最佳為滿足下述式(2-5)。 It is optimal to satisfy the following formula (2-5).
超過上述範圍的上限時,有對使用前述式(1)表示之化合物的樹脂的色相或使用該樹脂之光學構件帶來不良影響的情況。 When the upper limit of the above range is exceeded, the hue of the resin using the compound represented by the aforementioned formula (1) or the optical member using the resin may be adversely affected.
在上述式(1),作為環Z表示之芳香族基,除了苯環之外,可列舉至少具有苯環骨架之縮合多環式芳香族烴,例如較佳為縮合二環式烴、縮合三環式烴等之縮合二至四環式烴環等。In the above formula (1), examples of the aromatic group represented by ring Z include, in addition to a benzene ring, condensed polycyclic aromatic hydrocarbons having at least a benzene ring skeleton. For example, preferred are condensed bicyclic hydrocarbons and condensed tricyclic hydrocarbons. Condensation of cyclic hydrocarbons, etc. Two to four cyclic hydrocarbon rings, etc.
作為縮合二環式烴環,較佳為茚環、萘環等之碳原子數8-20(以下有時表示為C8-20)者,更佳為C10-16之縮合二環式烴環。又,作為縮合三環式烴環,較佳為蔥環、菲環等。The condensed bicyclic hydrocarbon ring is preferably a condensed bicyclic hydrocarbon ring having 8 to 20 carbon atoms (hereinafter sometimes expressed as C8-20) such as an indene ring or a naphthalene ring, and more preferably a condensed bicyclic hydrocarbon ring of C10-16. Moreover, as the condensed tricyclic hydrocarbon ring, an onion ring, a phenanthrene ring, etc. are preferable.
環Z當中,較佳為苯環、萘環,更佳為苯環。Among ring Z, a benzene ring and a naphthalene ring are preferred, and a benzene ring is more preferred.
在上述式(1),作為環Z表示之芳香族烴環之具體例,較佳為1,4-伸苯基、1,4-萘二基或2,6-萘二基,更佳為1,4-伸苯基。In the above formula (1), as a specific example of the aromatic hydrocarbon ring represented by ring Z, a 1,4-phenylene group, a 1,4-naphthylenediyl group or a 2,6-naphthylenediyl group is preferable, and a more preferable one is 1,4-phenylene.
尚,取代茀環之9位的2個環Z可彼此相同或亦可彼此相異,更佳為相同環的情況。尚,取代茀骨架之9位的環Z的取代基並未特別限定。例如,環Z為萘時,對應取代茀環之9位的環Z之基可為1-萘基、2-萘基等。Furthermore, the two rings Z replacing the 9-position of the fluorine ring may be the same as each other or may be different from each other, and more preferably, they are the same ring. Incidentally, the substituent substituting ring Z at position 9 of the fluorine skeleton is not particularly limited. For example, when ring Z is naphthalene, the group of ring Z corresponding to the 9-position substituted fluorine ring can be 1-naphthyl, 2-naphthyl, etc.
在上述式(1),R1 及R2 分別獨立表示氫原子、鹵素原子或可包含碳原子數1~12之芳香族基之烴基,較佳為氫原子、甲基或苯基。In the above formula (1), R 1 and R 2 each independently represent a hydrogen atom, a halogen atom or a hydrocarbon group which may contain an aromatic group having 1 to 12 carbon atoms, and is preferably a hydrogen atom, a methyl group or a phenyl group.
在上述式(1),作為R1 及R2 表示之烴基,可例示烷基、環烷基、芳基、萘基、芳烷基等。作為烷基之具體例,較佳為甲基、乙基、丙基、異丙基、丁基、t-丁基等之C1-6烷基、C1-4烷基、C1-3烷基,更佳為C1-3烷基,其中,再更佳為甲基或乙基。In the above formula (1), examples of the hydrocarbon group represented by R 1 and R 2 include an alkyl group, a cycloalkyl group, an aryl group, a naphthyl group, an aralkyl group, and the like. Specific examples of the alkyl group are preferably C1-6 alkyl groups, C1-4 alkyl groups, C1-3 alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, t-butyl, etc. More preferably, it is a C1-3 alkyl group, and even more preferably, it is a methyl or ethyl group.
又,作為環烷基之具體例,較佳為環戊基、環己基等之C5-8環烷基、C5-6環烷基等,更佳為C5-6環烷基。Moreover, as a specific example of a cycloalkyl group, a C5-8 cycloalkyl group, a C5-6 cycloalkyl group, etc. such as a cyclopentyl group, a cyclohexyl group, etc. are preferable, and a C5-6 cycloalkyl group is more preferable.
又,作為芳基之具體例,較佳為苯基、烷基苯基(單或二甲基苯基、甲苯基、2-甲基苯基、二甲苯基等)等,更佳為苯基。Moreover, as a specific example of an aryl group, a phenyl group, an alkylphenyl group (mono or dimethylphenyl, tolyl, 2-methylphenyl, xylyl, etc.) etc. are preferable, and a phenyl group is more preferable. .
又,作為芳烷基之具體例,較佳可例示苄基、苯乙基等之C6-10芳基-C1-4烷基等。Further, as specific examples of the aralkyl group, preferably C6-10 aryl-C1-4 alkyl groups such as benzyl group and phenethyl group can be exemplified.
又,作為鹵素原子,較佳為氟原子、氯原子、溴原子等。Moreover, as a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, etc. are preferable.
在上述式(1),取代基R1 及R2 之取代數可因應縮合烴之縮合環數等適當選擇,並未特別限定,較佳為分別獨立表示0以上,更佳為1以上之整數。又,較佳為6以下之整數,更佳為4以下之整數。尚,取代數在環Z,可相同或相異,通常以相同的情況較多。In the above formula (1), the substitution numbers of the substituents R 1 and R 2 can be appropriately selected according to the number of condensed rings of the condensed hydrocarbon, etc., and are not particularly limited. It is preferable that they independently represent an integer of 0 or more, and more preferably 1 or more. . Moreover, an integer of 6 or less is preferable, and an integer of 4 or less is more preferable. However, the number of substitutions in ring Z can be the same or different, and usually the same is the case.
在上述式(1),L1 及L2 分別獨立表示2價之連結基,較佳為碳數1~12之伸烷基,更佳為伸乙基。通常,L1 及L2 在同一環Z,可為相同之伸烷基。又,L1 及L2 在不同環Z,可彼此相同或彼此相異,通常可為相同。In the above formula (1), L 1 and L 2 each independently represent a divalent linking group, preferably an alkylene group having 1 to 12 carbon atoms, more preferably an ethylene group. Usually, L 1 and L 2 are in the same ring Z and can be the same alkylene group. In addition, L 1 and L 2 may be the same or different from each other in different rings Z, and usually they may be the same.
氧基伸烷基(OL1 )及(OL2 )之數(加成莫耳數)m及n可分別選自0~5之範圍,下限較佳為0以上,上限較佳為4以下,更佳為3以下,再更佳為2以下。特佳為0或1,最佳為1。尚,m及n可為整數亦可為平均值,在不同之環Z,可為相同亦可為相異。The numbers of the oxyalkylene groups (OL 1 ) and (OL 2 ) (addition molar number) m and n can be selected from the range of 0 to 5 respectively. The lower limit is preferably 0 or more, and the upper limit is preferably 4 or less, more preferably The best value is 3 or less, and even better is 2 or less. Excellent is 0 or 1, best is 1. Shang, m and n can be integers or average values, and they can be the same or different in different rings Z.
在上述式(1),Ar1 及Ar2 分別獨立表示碳原子數6~10之芳香族基,較佳為苯基或萘基。基Ar1 及Ar2 雖可彼此相異,亦可彼此相同,但通常為相同。又,Ar1 及Ar2 之個別的鍵結位置以茀骨架之1位與8位、2位與7位、3位與6位或4位與5位較佳,更佳為2位與7位、3位與6位或4位與5位,再更佳為2位與7位。In the above formula (1), Ar 1 and Ar 2 each independently represent an aromatic group having 6 to 10 carbon atoms, preferably a phenyl group or a naphthyl group. Although the groups Ar 1 and Ar 2 may be different from each other or the same as each other, they are usually the same. In addition, the respective bonding positions of Ar 1 and Ar 2 are preferably the 1st and 8th positions, the 2nd and 7th positions, the 3rd and 6th positions, or the 4th and 5th positions of the skeleton, and more preferably the 2nd and 7th positions. digits, 3 digits and 6 digits, or 4 digits and 5 digits, preferably 2 digits and 7 digits.
於以下雖表示前述式(1)表示之化合物的代表例,但作為本發明之前述式(1)所使用之化合物,並非藉由該等來限定者。Although representative examples of the compounds represented by the aforementioned formula (1) are shown below, the compounds used in the present invention by the aforementioned formula (1) are not limited thereto.
作為二苯基茀型,較佳可列舉9,9-雙(4-(2-羥基乙氧基)苯基)-1,8-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-1,8-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-1,8-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-1,8-二苯基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-1,8-二苯基茀、9,9-雙(4-羥基苯基)-1,8-二苯基茀、9,9-雙(4-羥基-3-甲基苯基)-1,8-二苯基茀、9,9-雙(4-羥基-3-苯基苯基)-1,8-二苯基茀、9,9-雙(4-羥基-1-萘基)-1,8-二苯基茀、9,9-雙(6-羥基-2-萘基)-1,8-二苯基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-2,7-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-2,7-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-2,7-二苯基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-2,7-二苯基茀、9,9-雙(4-羥基苯基)-2,7-二苯基茀、9,9-雙(4-羥基-3-甲基苯基)-2,7-二苯基茀、9,9-雙(4-羥基-3-苯基苯基)-2,7-二苯基茀、9,9-雙(4-羥基-1-萘基)-2,7-二苯基茀、9,9-雙(6-羥基-2-萘基)-2,7-二苯基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-3,6-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-3,6-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-3,6-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-3,6-二苯基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-3,6-二苯基茀、9,9-雙(4-羥基苯基)-3,6-二苯基茀、9,9-雙(4-羥基-3-甲基苯基)-3,6-二苯基茀、9,9-雙(4-羥基-3-苯基苯基)-3,6-二苯基茀、9,9-雙(4-羥基-1-萘基)-3,6-二苯基茀、9,9-雙(6-羥基-2-萘基)-3,6-二苯基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-4,5-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-4,5-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-4,5-二苯基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-4,5-二苯基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-4,5-二苯基茀、9,9-雙(4-羥基苯基)-4,5-二苯基茀、9,9-雙(4-羥基-3-甲基苯基)-4,5-二苯基茀、9,9-雙(4-羥基-3-苯基苯基)-4,5-二苯基茀、9,9-雙(4-羥基-1-萘基)-4,5-二苯基茀、9,9-雙(6-羥基-2-萘基)-4,5-二苯基茀等。Preferable examples of diphenyl fluoride include 9,9-bis(4-(2-hydroxyethoxy)phenyl)-1,8-diphenyl fluoride and 9,9-bis(4-(2 -Hydroxyethoxy)-3-methylphenyl)-1,8-diphenylbenzene, 9,9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl)-1 ,8-diphenyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)-1-naphthyl)-1,8-diphenyl fluoride, 9,9-bis(6-(2 -Hydroxyethoxy)-2-naphthyl)-1,8-diphenyl fluoride, 9,9-bis(4-hydroxyphenyl)-1,8-diphenyl fluoride, 9,9-bis( 4-Hydroxy-3-methylphenyl)-1,8-diphenyl fluoride, 9,9-bis(4-hydroxy-3-phenylphenyl)-1,8-diphenyl fluoride, 9, 9-bis(4-hydroxy-1-naphthyl)-1,8-diphenyl fluoride, 9,9-bis(6-hydroxy-2-naphthyl)-1,8-diphenyl fluoride, 9, 9-bis(4-(2-hydroxyethoxy)phenyl)-2,7-diphenylfluoride, 9,9-bis(4-(2-hydroxyethoxy)-3-methylphenyl )-2,7-diphenyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl)-2,7-diphenyl fluoride, 9,9-bis (4-(2-hydroxyethoxy)-1-naphthyl)-2,7-diphenylfluoride, 9,9-bis(6-(2-hydroxyethoxy)-2-naphthyl)- 2,7-diphenyl fluoride, 9,9-bis(4-hydroxyphenyl)-2,7-diphenyl fluoride, 9,9-bis(4-hydroxy-3-methylphenyl)-2 ,7-Diphenyl fluoride, 9,9-bis(4-hydroxy-3-phenylphenyl)-2,7-diphenyl fluoride, 9,9-bis(4-hydroxy-1-naphthyl) -2,7-diphenyl fluoride, 9,9-bis(6-hydroxy-2-naphthyl)-2,7-diphenyl fluoride, 9,9-bis(4-(2-hydroxyethoxy) )phenyl)-3,6-diphenyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)-3-methylphenyl)-3,6-diphenyl fluoride, 9, 9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl)-3,6-diphenylfluoride, 9,9-bis(4-(2-hydroxyethoxy)-1 -Naphthyl)-3,6-diphenyl fluoride, 9,9-bis(6-(2-hydroxyethoxy)-2-naphthyl)-3,6-diphenyl fluoride, 9,9- Bis(4-hydroxyphenyl)-3,6-diphenyl fluoride, 9,9-bis(4-hydroxyphenyl)-3,6-diphenyl fluoride, 9,9-bis(4-hydroxyphenyl)-3,6-diphenyl fluoride (4-Hydroxy-3-phenylphenyl)-3,6-diphenyl fluoride, 9,9-bis(4-hydroxy-1-naphthyl)-3,6-diphenyl fluoride, 9,9 -Bis(6-hydroxy-2-naphthyl)-3,6-diphenyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)phenyl)-4,5-diphenyl fluoride , 9,9-bis(4-(2-hydroxyethoxy)-3-methylphenyl)-4,5-diphenylfluoride, 9,9-bis(4-(2-hydroxyethoxy) )-3-phenylphenyl)-4,5-diphenylbenzene, 9,9-bis(4-(2-hydroxyethoxy)-1-naphthyl)-4,5-diphenylbenzene , 9,9-bis(6-(2-hydroxyethoxy)-2-naphthyl)-4,5-diphenylfluoride, 9,9-bis(4-hydroxyphenyl)-4,5- Diphenyl fluoride, 9,9-bis(4-hydroxy-3-methylphenyl)-4,5-diphenyl fluoride, 9,9-bis(4-hydroxy-3-phenylphenyl)- 4,5-diphenyl fluoride, 9,9-bis(4-hydroxy-1-naphthyl)-4,5-diphenyl fluoride, 9,9-bis(6-hydroxy-2-naphthyl)- 4,5-diphenylbenzoate, etc.
其中,更佳為9,9-雙(4-(2-羥基乙氧基)苯基)-1,8-二苯基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二苯基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-3,6-二苯基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-4,5-二苯基茀、9,9-雙(4-羥基苯基)-1,8-二苯基茀、9,9-雙(4-羥基苯基)-2,7-二苯基茀、9,9-雙(4-羥基苯基)-3,6-二苯基茀、9,9-雙(4-羥基苯基)-4,5-二苯基茀,特佳為9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二苯基茀、9,9-雙(4-羥基苯基)-2,7-二苯基茀。Among them, 9,9-bis(4-(2-hydroxyethoxy)phenyl)-1,8-diphenylfluoride and 9,9-bis(4-(2-hydroxyethoxy)phenyl) Phenyl)-2,7-diphenyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)phenyl)-3,6-diphenyl fluoride, 9,9-bis(4- (2-Hydroxyethoxy)phenyl)-4,5-diphenyl fluoride, 9,9-bis(4-hydroxyphenyl)-1,8-diphenyl fluoride, 9,9-bis(4 -Hydroxyphenyl)-2,7-diphenyl fluoride, 9,9-bis(4-hydroxyphenyl)-3,6-diphenyl fluoride, 9,9-bis(4-hydroxyphenyl)- 4,5-diphenyl fluoride, particularly preferably 9,9-bis(4-(2-hydroxyethoxy)phenyl)-2,7-diphenyl fluoride, 9,9-bis(4-hydroxy Phenyl)-2,7-diphenyl fluoride.
作為二萘基茀型,較佳可列舉9,9-雙(4-(2-羥基乙氧基)苯基)-1,8-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-1,8-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-1,8-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-1,8-二萘基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-1,8-二萘基茀、9,9-雙(4-羥基苯基)-1,8-二萘基茀、9,9-雙(4-羥基-3-甲基苯基)-1,8-二萘基茀、9,9-雙(4-羥基-3-苯基苯基)-1,8-二萘基茀、9,9-雙(4-羥基-1-萘基)-1,8-二萘基茀、9,9-雙(6-羥基-2-萘基)-1,8-二萘基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-2,7-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-2,7-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-2,7-二萘基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-2,7-二萘基茀、9,9-雙(4-羥基苯基)-2,7-二萘基茀、9,9-雙(4-羥基-3-甲基苯基)-2,7-二萘基茀、9,9-雙(4-羥基-3-苯基苯基)-2,7-二萘基茀、9,9-雙(4-羥基-1-萘基)-2,7-二萘基茀、9,9-雙(6-羥基-2-萘基)-2,7-二萘基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-3,6-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-3,6-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-3,6-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-3,6-二萘基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-3,6-二萘基茀、9,9-雙(4-羥基苯基)-3,6-二萘基茀、9,9-雙(4-羥基-3-甲基苯基)-3,6-二萘基茀、9,9-雙(4-羥基-3-苯基苯基)-3,6-二萘基茀、9,9-雙(4-羥基-1-萘基)-3,6-二萘基茀、9,9-雙(6-羥基-2-萘基)-3,6-二萘基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-4,5-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)-4,5-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)-4,5-二萘基茀、9,9-雙(4-(2-羥基乙氧基)-1-萘基)-4,5-二萘基茀、9,9-雙(6-(2-羥基乙氧基)-2-萘基)-4,5-二萘基茀、9,9-雙(4-羥基苯基)-4,5-二萘基茀、9,9-雙(4-羥基-3-甲基苯基)-4,5-二萘基茀、9,9-雙(4-羥基-3-苯基苯基)-4,5-二萘基茀、9,9-雙(4-羥基-1-萘基)-4,5-二萘基茀、9,9-雙(6-羥基-2-萘基)-4,5-二萘基茀等。Preferable dinaphthyl fluoride types include 9,9-bis(4-(2-hydroxyethoxy)phenyl)-1,8-dinaphthyl fluoride and 9,9-bis(4-(2 -Hydroxyethoxy)-3-methylphenyl)-1,8-dinaphthylfluoride, 9,9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl)-1 ,8-dinaphthyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)-1-naphthyl)-1,8-dinaphthyl fluoride, 9,9-bis(6-(2 -Hydroxyethoxy)-2-naphthyl)-1,8-dinaphthylfluoride, 9,9-bis(4-hydroxyphenyl)-1,8-dinaphthylfluoride, 9,9-bis( 4-Hydroxy-3-methylphenyl)-1,8-dinaphthyl fluoride, 9,9-bis(4-hydroxy-3-phenylphenyl)-1,8-dinaphthyl fluoride, 9, 9-bis(4-hydroxy-1-naphthyl)-1,8-dinaphthyl fluoride, 9,9-bis(6-hydroxy-2-naphthyl)-1,8-dinaphthyl fluoride, 9, 9-bis(4-(2-hydroxyethoxy)phenyl)-2,7-dinaphthylfluoride, 9,9-bis(4-(2-hydroxyethoxy)-3-methylphenyl )-2,7-dinaphthyl fluorine, 9,9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl)-2,7-dinaphthyl fluorine, 9,9-bis (4-(2-hydroxyethoxy)-1-naphthyl)-2,7-dinaphthylfluoride, 9,9-bis(6-(2-hydroxyethoxy)-2-naphthyl)- 2,7-dinaphthyl fluoride, 9,9-bis(4-hydroxyphenyl)-2,7-dinaphthyl fluoride, 9,9-bis(4-hydroxy-3-methylphenyl)-2 ,7-dinaphthyl fluoride, 9,9-bis(4-hydroxy-3-phenylphenyl)-2,7-dinaphthyl fluoride, 9,9-bis(4-hydroxy-1-naphthyl) -2,7-dinaphthylfluoride, 9,9-bis(6-hydroxy-2-naphthyl)-2,7-dinaphthylfluoride, 9,9-bis(4-(2-hydroxyethoxy) )phenyl)-3,6-dinaphthylfluoride, 9,9-bis(4-(2-hydroxyethoxy)-3-methylphenyl)-3,6-dinaphthylfluoride, 9, 9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl)-3,6-dinaphthylfluoride, 9,9-bis(4-(2-hydroxyethoxy)-1 -naphthyl)-3,6-dinaphthylfluoride, 9,9-bis(6-(2-hydroxyethoxy)-2-naphthyl)-3,6-dinaphthylfluoride, 9,9- Bis(4-hydroxyphenyl)-3,6-dinaphthyl fluoride, 9,9-bis(4-hydroxy-3-methylphenyl)-3,6-dinaphthyl fluoride, 9,9-bis(4-hydroxyphenyl)-3,6-dinaphthyl fluoride (4-Hydroxy-3-phenylphenyl)-3,6-dinaphthyl fluoride, 9,9-bis(4-hydroxy-1-naphthyl)-3,6-dinaphthyl fluoride, 9,9 -Bis(6-hydroxy-2-naphthyl)-3,6-dinaphthyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)phenyl)-4,5-dinaphthyl fluoride , 9,9-bis(4-(2-hydroxyethoxy)-3-methylphenyl)-4,5-dinaphthylfluoride, 9,9-bis(4-(2-hydroxyethoxy) )-3-phenylphenyl)-4,5-dinaphthylfluoride, 9,9-bis(4-(2-hydroxyethoxy)-1-naphthyl)-4,5-dinaphthylfluoride , 9,9-bis(6-(2-hydroxyethoxy)-2-naphthyl)-4,5-dinaphthylfluoride, 9,9-bis(4-hydroxyphenyl)-4,5- Dinaphthyl fluoride, 9,9-bis(4-hydroxy-3-methylphenyl)-4,5-dinaphthyl fluoride, 9,9-bis(4-hydroxy-3-phenylphenyl)- 4,5-dinaphthylfluoride, 9,9-bis(4-hydroxy-1-naphthyl)-4,5-dinaphthylfluoride, 9,9-bis(6-hydroxy-2-naphthyl)- 4,5-dinaphthylfluoride, etc.
其中,更佳為9,9-雙(4-(2-羥基乙氧基)苯基)-1,8-二萘基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二萘基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-3,6-二萘基茀、9,9-雙(4-(2-羥基乙氧基)苯基)-4,5-二萘基茀、9,9-雙(4-羥基苯基)-1,8-二萘基茀、9,9-雙(4-羥基苯基)-2,7-二萘基茀、9,9-雙(4-羥基苯基)-3,6-二萘基茀、9,9-雙(4-羥基苯基)-4,5-二萘基茀,特佳為9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二萘基茀、9,9-雙(4-羥基苯基)-2,7-二萘基茀。 (具有茀骨架之化合物的結晶之製造方法) 本發明之上述式(1)表示之化合物的結晶,從結晶製造步驟為必要,且多聚體副生的抑制或色相提昇的觀點來看,較佳為在包含下述步驟1、步驟2及結晶製造步驟之方法製造。藉由在下述方法製造上述式(1)表示之化合物的結晶,可得到兼備上述特徵之化合物的結晶。 步驟1:使下述式(3)表示之茀酮類與下述式(4)表示之硼酸於反應溶劑中,於鹼及觸媒的存在下進行反應之步驟、Among them, more preferred are 9,9-bis(4-(2-hydroxyethoxy)phenyl)-1,8-dinaphthylfluoride and 9,9-bis(4-(2-hydroxyethoxy) Phenyl)-2,7-dinaphthyl fluoride, 9,9-bis(4-(2-hydroxyethoxy)phenyl)-3,6-dinaphthyl fluoride, 9,9-bis(4- (2-Hydroxyethoxy)phenyl)-4,5-dinaphthylfluoride, 9,9-bis(4-hydroxyphenyl)-1,8-dinaphthylfluoride, 9,9-bis(4 -Hydroxyphenyl)-2,7-dinaphthyl fluoride, 9,9-bis(4-hydroxyphenyl)-3,6-dinaphthyl fluoride, 9,9-bis(4-hydroxyphenyl)- 4,5-dinaphthyl fluoride, particularly preferably 9,9-bis(4-(2-hydroxyethoxy)phenyl)-2,7-dinaphthyl fluoride, 9,9-bis(4-hydroxyl) Phenyl)-2,7-dinaphthylfluoride. (Method for producing crystals of compounds having fluorine skeleton) The crystallization of the compound represented by the above formula (1) of the present invention is preferably a process including the following steps 1, 2 and The method of crystallization manufacturing steps is manufactured. By producing a crystal of the compound represented by the above formula (1) in the following method, a crystal of the compound having the above characteristics can be obtained. Step 1: A step of reacting a quinone represented by the following formula (3) and a boric acid represented by the following formula (4) in a reaction solvent in the presence of an alkali and a catalyst,
(X1 、X2 表示鹵素原子)。(X 1 and X 2 represent halogen atoms).
(Y表示芳香族基,R3 表示氫原子、烷基、烯基、烷氧基或鹵素原子)。 步驟2:使於步驟1製造之下述式(5)表示之反應物與下述式(6)表示之醇化合物於反應溶劑中,使用酸觸媒進行反應之步驟、(Y represents an aromatic group, and R 3 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group or a halogen atom). Step 2: A step of reacting the reactant represented by the following formula (5) produced in step 1 and the alcohol compound represented by the following formula (6) in a reaction solvent using an acid catalyst,
(Ar1 及Ar2 與式(1)相同)。(Ar 1 and Ar 2 are the same as formula (1)).
(環Z與式(1)相同;R4 表示氫原子、鹵素原子或可包含碳原子數1~12之芳香族基之烴基,L3 表示伸烷基,l表示0~5之整數)。 結晶製造步驟:使用溶解步驟2所得之化合物的溶劑,進行再結晶操作,並取出結晶之步驟 針對以下個別的步驟記載細節 (步驟1) 步驟1係使上述式(3)表示之茀酮類與上述式(4)表示之硼酸於反應溶劑中,於鹼及觸媒的存在下進行反應之步驟。(Ring Z is the same as formula (1); R 4 represents a hydrogen atom, a halogen atom or a hydrocarbon group that may contain an aromatic group with 1 to 12 carbon atoms, L 3 represents an alkylene group, and l represents an integer of 0 to 5). Crystallization production step: use a solvent that dissolves the compound obtained in step 2, perform a recrystallization operation, and take out the crystallization step. Describe the details of the following individual steps (step 1). Step 1 is to combine the quinones represented by the above formula (3) with The step of reacting boric acid represented by the above formula (4) in a reaction solvent in the presence of a base and a catalyst.
上述式(3)表示之化合物係在前述式(1),對應茀骨架之茀酮化合物,X1 為1位、2位、3位或4位之取代基,X2 為5位、6位、7位或8位之取代基,表示鹵素原子。The compound represented by the above formula (3) is a quinone compound corresponding to the quinone skeleton in the aforementioned formula ( 1 ), X 1 is a substituent at the 1-position, 2-position, 3-position or 4-position, and , the substituent at position 7 or 8 represents a halogen atom.
於以下雖表示上述式(3)表示之茀酮化合物的代表例,但作為本發明之前述式(1)所使用之原料,並非藉由該等來限定者。Although representative examples of the quinone compounds represented by the above-mentioned formula (3) are shown below, the raw materials used in the above-mentioned formula (1) of the present invention are not limited by these.
作為茀酮化合物之具體例,較佳可列舉1,8-二氟茀酮、2,7-二氟茀酮、3,6-二氟茀酮、4,5-二氟茀酮、1,8-二氯茀酮、2,7-二氯茀酮、3,6-二氯茀酮、4,5-二氯茀酮、1,8-二碘茀酮、2,7-二碘茀酮、3,6-二碘茀酮、4,5-二碘茀酮、1,8-二溴茀酮、2,7-二溴茀酮、3,6-二溴茀酮、4,5-二溴茀酮等。其中,較佳為1,8-二溴茀酮、2,7-二溴茀酮、3,6-二溴茀酮、4,5-二溴茀酮,特佳為2,7-二溴茀酮。Specific examples of the quinone compound include preferably 1,8-difluorofonone, 2,7-difluorofonone, 3,6-difluorofonone, 4,5-difluorofonone, and 1, 8-dichlorofluorinone, 2,7-dichlorofluorinone, 3,6-dichlorofluorinone, 4,5-dichlorofluorinone, 1,8-diiodofluorinone, 2,7-diiodofluorinone Ketone, 3,6-diiodoquinone, 4,5-diiodoquinone, 1,8-dibromoquinone, 2,7-dibromoquinone, 3,6-dibromoquinone, 4,5 -Dibromoquinone, etc. Among them, 1,8-dibromoquinone, 2,7-dibromoquinone, 3,6-dibromoquinone, and 4,5-dibromoquinone are preferred, and 2,7-dibromoquinone is particularly preferred. Filone.
此等可單獨使用,或亦可混合2種以上,可藉由目的任意選擇。於本發明較佳為2,7-二溴茀酮。These can be used alone, or two or more types can be mixed, and can be selected arbitrarily depending on the purpose. In the present invention, 2,7-dibromoquinone is preferred.
使用之前述式(3)表示之茀酮類的純度雖並未特別限定,但通常較佳為95%以上,更佳為99%以上。尚,茀酮類可使用市售品,亦可使用經合成者。The purity of the quinones represented by the aforementioned formula (3) is not particularly limited, but is generally preferably 95% or more, and more preferably 99% or more. However, commercially available quinones can also be used, or synthetic ones can be used.
上述式(4)表示之化合物的環Y對應在前述式(1)之基Ar1 及Ar2 。又,在前述式(4),基R3 之較佳的態樣係與前述R1 及R2 之較佳的態樣相同。The ring Y of the compound represented by the above formula (4) corresponds to the groups Ar 1 and Ar 2 of the above formula (1). In addition, in the aforementioned formula (4), the preferred aspect of the group R 3 is the same as the preferred aspect of the aforementioned R 1 and R 2 .
上述式(4)表示之硼酸類的純度雖並未特別限定,但通常較佳為95%以上,更佳為99%以上。尚,硼酸類可使用市售品,亦可使用經合成者。Although the purity of the boric acids represented by the above formula (4) is not particularly limited, it is generally preferably 95% or more, and more preferably 99% or more. However, commercially available boric acids can be used, or synthetic ones can be used.
本發明所使用之硼酸包含前述式(4)表示之烷基硼酸、烯基硼酸、芳基硼酸、雜芳基硼酸及其酐等,作為烷基硼酸,包含丁基硼酸、環己基硼酸、環戊基硼酸、2-乙基硼酸、4-乙基硼酸、己基硼酸、異丁基硼酸、異丙基硼酸、甲基硼酸、n-辛基硼酸、丙基硼酸、戊基硼酸、2-苯基乙基硼酸或此等之酐,作為烯基硼酸,包含1-環戊烯基硼酸、二茂鐵硼酸、1,1’-二茂鐵二硼酸或此等之酐,作為芳基硼酸,包含2-蔥硼酸、9-蔥硼酸、苄基硼酸、2-聯苯硼酸、3-聯苯硼酸、4-聯苯硼酸、2,3-二甲基苯基硼酸、2,4-二甲基苯基硼酸、2,5-二甲基苯基硼酸、2,6-二甲基苯基硼酸、3,4-二甲基苯基硼酸、3,5-二甲基苯基硼酸、2-乙氧基苯基硼酸、3-乙氧基苯基硼酸、4-乙氧基苯基硼酸、6-甲氧基-2-萘硼酸、2-甲基苯基硼酸、3-甲基苯基硼酸、4-甲基苯基硼酸、1-萘硼酸、2-萘硼酸、9-菲硼酸、10-苯基-9-蔥硼酸、苯基硼酸、苯基乙烷硼酸、4-苯基(萘-1-基)硼酸、3-丙氧基苯基硼酸、3-異-丙氧基苯基硼酸、4-異-丙氧基苯基硼酸、4-丙基苯基硼酸、4-異-丙基苯基硼酸、10-(萘-1-基)-9-蔥硼酸、10-(萘-2-基)-9-蔥硼酸或此等之酐,作為雜芳基硼酸,包含苯并呋喃-2-硼酸、二苯并呋喃-4-硼酸、5-甲醯基-2-呋喃硼酸、5-甲醯基噻吩-2-硼酸、呋喃-2-硼酸、呋喃-3-硼酸、吡啶-3-硼酸、吡啶-4-硼酸、喹啉-2-硼酸、喹啉-3-硼酸、喹啉-4-硼酸、喹啉-5-硼酸、喹啉-6-硼酸、喹啉-8-硼酸、異-喹啉-4-硼酸、2-噻吩硼酸、3-噻吩硼酸、5-嘧啶硼酸或此等之酐。The boric acid used in the present invention includes alkylboronic acid, alkenylboronic acid, arylboronic acid, heteroarylboronic acid and anhydride thereof represented by the aforementioned formula (4). Examples of alkylboronic acid include butylboronic acid, cyclohexylboronic acid, cyclohexylboronic acid, cyclohexylboronic acid, and anhydride. Pentylboronic acid, 2-ethylboronic acid, 4-ethylboronic acid, hexylboronic acid, isobutylboronic acid, isopropylboronic acid, methylboronic acid, n-octylboronic acid, propylboronic acid, amylboronic acid, 2-benzene Ethylboronic acid or these anhydrides, as alkenylboronic acid, including 1-cyclopentenylboronic acid, ferroceneboronic acid, 1,1'-ferrocene diboronic acid or these anhydrides, as arylboronic acid, Contains 2-onium boric acid, 9-ononium boric acid, benzylboric acid, 2-biphenylboric acid, 3-biphenylboric acid, 4-biphenylboric acid, 2,3-dimethylphenylboronic acid, 2,4-dimethyl phenylboronic acid, 2,5-dimethylphenylboronic acid, 2,6-dimethylphenylboronic acid, 3,4-dimethylphenylboronic acid, 3,5-dimethylphenylboronic acid, 2 -Ethoxyphenylboronic acid, 3-ethoxyphenylboronic acid, 4-ethoxyphenylboronic acid, 6-methoxy-2-naphthaleneboronic acid, 2-methylphenylboronic acid, 3-methylbenzene boronic acid, 4-methylphenylboronic acid, 1-naphthaleneboronic acid, 2-naphthylboronic acid, 9-phenanthreneboronic acid, 10-phenyl-9-onionboronic acid, phenylboronic acid, phenylethaneboronic acid, 4-phenylboronic acid (Naphthalen-1-yl)boronic acid, 3-propoxyphenylboronic acid, 3-iso-propoxyphenylboronic acid, 4-iso-propoxyphenylboronic acid, 4-propylphenylboronic acid, 4- Iso-propylphenylboronic acid, 10-(naphthyl-1-yl)-9-allium boronic acid, 10-(naphth-2-yl)-9-allium boronic acid or anhydrides thereof, as heteroarylboronic acids, include Benzofuran-2-boric acid, dibenzofuran-4-boric acid, 5-formyl-2-furanboric acid, 5-formylthiophene-2-boric acid, furan-2-boric acid, furan-3-boric acid , pyridine-3-boric acid, pyridine-4-boric acid, quinoline-2-boric acid, quinoline-3-boric acid, quinoline-4-boric acid, quinoline-5-boric acid, quinoline-6-boric acid, quinoline -8-boronic acid, iso-quinoline-4-boronic acid, 2-thiopheneboronic acid, 3-thiopheneboronic acid, 5-pyrimidineboronic acid or anhydrides of these.
此等可單獨使用,或亦可混合2種以上,可藉由目的任意選擇。於本發明較佳為苯基硼酸或其酐。These can be used alone, or two or more types can be mixed, and can be selected arbitrarily depending on the purpose. In the present invention, phenylboronic acid or anhydride thereof is preferred.
作為原料使用之前述式(4)表示之化合物的使用比率相對於前述式(3)表示之化合物(鹵素化茀酮化合物)1莫耳,較佳為2.0~5.0莫耳,更佳為2.0~3.0莫耳,再更佳為2.05~2.5莫耳。該硼酸類未滿2.0莫耳時,有前述式(6)表示之生成物的收率降低的情況。又,超過5.0莫耳時,雖反應速度增快且收率提高,但有提昇具有該茀骨架之化合物的製造成本的情況。The usage ratio of the compound represented by the aforementioned formula (4) when used as a raw material is preferably 2.0 to 5.0 moles, more preferably 2.0 to 1 mole of the compound represented by the aforementioned formula (3) (halogenated quinone compound). 3.0 moles, preferably 2.05~2.5 moles. When the boric acid content is less than 2.0 mol, the yield of the product represented by the aforementioned formula (6) may decrease. Moreover, when it exceeds 5.0 mol, although the reaction rate becomes faster and the yield improves, the manufacturing cost of the compound which has this fluorine skeleton may increase.
步驟1之前述式(3)與前述式(4)表示之化合物之反應(脫鹵素化反應)可於反應溶劑中,於鹼及觸媒的存在下進行。The reaction (dehalogenation reaction) of the compound represented by the aforementioned formula (3) and the aforementioned formula (4) in step 1 can be carried out in the reaction solvent in the presence of a base and a catalyst.
作為於步驟1之反應使用之鹼,例如可列舉氫氧化鈉、氫氧化鉀等之氫氧化物、碳酸鈉(Na2 CO3 )、碳酸鉀(K2 CO3 )、碳酸銫(Cs2 CO3 )等之碳酸鹽、乙酸鈉、乙酸鉀等之乙酸鹽、磷酸鈉(Na3 PO4 )、磷酸鉀(K3 PO4 )等之磷酸鹽等之無機鹽、三乙基胺類、吡啶、嗎啉、喹啉、哌啶、苯胺類、四n丁基銨乙酸酯等之銨鹽等之有機鹽等。其中,優選使用碳酸鹽,較佳為碳酸鉀及/或碳酸鈉。這般的鹼可單獨使用,又,亦可併用2種類以上。Examples of the base used in the reaction in step 1 include hydroxides such as sodium hydroxide and potassium hydroxide, sodium carbonate (Na 2 CO 3 ), potassium carbonate (K 2 CO 3 ), and cesium carbonate (Cs 2 CO 3 ) Inorganic salts such as carbonates, acetates such as sodium acetate and potassium acetate, phosphates such as sodium phosphate (Na 3 PO 4 ), potassium phosphate (K 3 PO 4 ), etc., triethylamines, pyridine , organic salts of ammonium salts such as morpholine, quinoline, piperidine, anilines, tetra-n-butylammonium acetate, etc. Among them, carbonates are preferably used, and potassium carbonate and/or sodium carbonate are preferred. Such bases may be used alone, or two or more types may be used in combination.
又,在步驟1之反應,上述之鹼的使用量雖並未特別限定,但相對於硼酸類1莫耳,較佳為添加1~30當量,更佳為添加1~10當量。In addition, in the reaction of step 1, the usage amount of the above-mentioned base is not particularly limited, but it is preferably 1 to 30 equivalents, and more preferably 1 to 10 equivalents per mole of boric acid.
作為於步驟1之反應使用之觸媒,較佳為於鈴木耦合使用之鈀化合物,例如可列舉肆(三苯基膦)鈀、雙(三苯基膦)二氯化鈀、乙酸鈀、參(二苯亞基丙酮)二鈀、雙(二苯亞基丙酮)鈀、雙[4-(N, N-二甲基胺基)苯基]二-tert-丁基膦二氯化鈀、雙(二-tert-丁基異戊二烯基膦)二氯化鈀、雙(二-tert-巴豆基膦)二氯化鈀。或將鈀固定在金屬之觸媒亦佳,例如可列舉二氧化矽載持鈀(PL觸媒)、Pd/C(碳載持鈀)等。其中,較佳為肆(三苯基膦)鈀及/或PL觸媒。這般的觸媒可單獨使用,又,亦可併用2種以上使用。As the catalyst used in the reaction in step 1, the palladium compound used in the Suzuki coupling is preferably (Diphenylideneacetone)dipalladium, bis(diphenylideneacetone)palladium, bis[4-(N, N-dimethylamino)phenyl]di-tert-butylphosphine palladium dichloride, Bis(di-tert-butylisoprenylphosphine)palladium dichloride, bis(di-tert-crotylphosphine)palladium dichloride. Or a catalyst that fixes palladium on metal is also preferable. Examples include palladium supported on silica (PL catalyst), Pd/C (palladium supported on carbon), and the like. Among them, quaternary (triphenylphosphine) palladium and/or PL catalyst are preferred. Such catalysts can be used alone, or two or more types can be used in combination.
在步驟1之反應,上述之觸媒的使用量雖並未特別限定,但相對於前述式(3)表示之茀酮化合物1莫耳,以鈀金屬原子換算較佳為0.005~0.5毫莫耳,更佳為0.1~0.3毫莫耳。鈀觸媒的使用量以鈀金屬原子換算未滿0.005毫莫耳時,有反應難以完成的情況。又,鈀觸媒的使用量以鈀金屬原子換算超過5毫莫耳時,反應雖完成,但將具有該茀骨架之化合物中之鈀元素含量定為式(2)的範圍內變困難,有使用該化合物使經製造之熱塑性樹脂的色相惡化之可能性。In the reaction of step 1, the usage amount of the above-mentioned catalyst is not particularly limited, but it is preferably 0.005 to 0.5 mmol in terms of palladium metal atoms relative to 1 mole of the quinone compound represented by the aforementioned formula (3). , more preferably 0.1~0.3 mmol. When the usage amount of the palladium catalyst is less than 0.005 mmol in terms of palladium metal atoms, the reaction may not be completed. In addition, when the usage amount of the palladium catalyst exceeds 5 millimoles in terms of palladium metal atoms, although the reaction is completed, it becomes difficult to set the palladium element content in the compound having the fluorine skeleton within the range of formula (2), and there is a problem. The possibility of using this compound to worsen the hue of the manufactured thermoplastic resin.
作為於步驟1使用之反應溶劑,例如可單獨或併用甲苯、二甲苯等之芳香族烴系溶劑與甲醇、乙醇、異丙基醇、n-丁醇等之醇類使用。由於芳香族烴系溶劑為高沸點溶劑,可提高設定反應溫度,且由於藉由使用醇,與水之親和性良好且反應性變良好故可適合使用。這般的溶劑可單獨使用,或亦可併用2種以上使用。進而,亦可使用N,N-二甲基甲醯胺或N,N-二甲基乙醯胺等之非質子性溶劑、o-二氯苯等之鹵苯類。這般的溶劑可單獨使用,又,亦可併用2種以上使用。在本發明,更佳為使用甲苯與乙醇之混合溶劑或甲苯。As the reaction solvent used in step 1, for example, aromatic hydrocarbon solvents such as toluene and xylene can be used alone or in combination with alcohols such as methanol, ethanol, isopropyl alcohol, and n-butanol. Aromatic hydrocarbon-based solvents are high-boiling-point solvents and can be used to increase the set reaction temperature. Furthermore, by using alcohol, they have good affinity with water and have good reactivity, so they can be suitably used. Such solvents can be used alone, or two or more types can be used in combination. Furthermore, aprotic solvents such as N,N-dimethylformamide or N,N-dimethylacetamide, and halobenzenes such as o-dichlorobenzene can also be used. Such solvents can be used alone, or two or more types can be used in combination. In the present invention, it is more preferred to use a mixed solvent of toluene and ethanol or toluene.
前述反應溶劑(本發明的情況,較佳為甲苯與乙醇之混合溶劑或甲苯)的使用量雖並未特別限定,但相對於前述式(3)表示之茀酮類,甲苯較佳為0.1重量倍以上,更佳為0.5~100重量倍,再更佳為1~50重量倍。甲苯的使用量未滿0.1重量倍時,析出生成物有攪拌變困難的可能性。又,甲苯的使用量超過100重量倍時,無與使用量相稱之效果,且容積效率亦惡化,有提昇具有該茀骨架之化合物的製造成本的情況。又,乙醇的使用量雖亦並未特別限定,但相對於前述式(3)表示之茀酮類,較佳為0.1~50重量倍,更佳為1~20重量倍。乙醇的使用量未滿0.1重量倍時,有反應速度變遲緩收率降低的可能性。又,乙醇的使用量超過50重量倍時,與甲苯相同無與使用量相稱之效果,且容積效率亦惡化,有提昇具有該茀骨架之化合物的製造成本的情況。The usage amount of the reaction solvent (in the case of the present invention, preferably a mixed solvent of toluene and ethanol or toluene) is not particularly limited. However, toluene is preferably 0.1 wt. times or more, preferably 0.5 to 100 times by weight, still more preferably 1 to 50 times by weight. When the amount of toluene used is less than 0.1 times by weight, the precipitated product may become difficult to stir. In addition, when the usage amount of toluene exceeds 100 times by weight, there is no effect commensurate with the usage amount, and the volumetric efficiency is also deteriorated, which may increase the production cost of the compound having the fluorine skeleton. In addition, the usage amount of ethanol is not particularly limited, but it is preferably 0.1 to 50 times by weight, and more preferably 1 to 20 times by weight relative to the quinones represented by the aforementioned formula (3). When the amount of ethanol used is less than 0.1 times by weight, the reaction rate may be slowed down and the yield may be reduced. In addition, when the usage amount of ethanol exceeds 50 times by weight, there is no effect commensurate with the usage amount like toluene, and the volumetric efficiency is also deteriorated, which may increase the production cost of the compound having this fluorine skeleton.
反應溫度雖因使用之原料、溶劑的種類而異,但較佳為50~150℃,更佳為60~130℃,再更佳為70~120℃。反應可用液體層析等之分析手段追蹤。Although the reaction temperature varies depending on the types of raw materials and solvents used, it is preferably 50 to 150°C, more preferably 60 to 130°C, and still more preferably 70 to 120°C. The reaction can be followed by analytical means such as liquid chromatography.
反應結束後之反應混合物中,通常除了生成之前述式(5)表示之化合物以外,亦包含有未反應之茀酮類、未反應之硼酸類、鹼、觸媒、副反應生成物等。因此,可藉由慣用之方法,例如過濾、濃縮、萃取、晶析、再結晶、再沉澱、活性炭處理或與其極為相似之金屬的去除處理、管柱層析等之分離手段,或組合此等之分離手段進行分離純化。例如,藉由慣用之方法(加入鹼水溶液形成水溶性之複合體之方法等),去除硼酸類,進行活性炭處理或與其極為相似之金屬的去除處理,可藉由去除鈀化合物後,添加再結晶溶劑進行冷卻使其再結晶化,其次進行過濾分離來純化。 (步驟2) 步驟2係使於步驟1製造之上述式(5)表示之反應物與上述式(6)表示之醇化合物於反應溶劑中,使用酸觸媒進行反應之步驟。The reaction mixture after the reaction usually contains, in addition to the compound represented by the aforementioned formula (5), unreacted quinones, unreacted boric acids, bases, catalysts, side reaction products, etc. Therefore, it can be separated by conventional methods, such as filtration, concentration, extraction, crystallization, recrystallization, reprecipitation, activated carbon treatment or very similar metal removal treatment, column chromatography, etc., or a combination of these separation means for separation and purification. For example, boric acid can be removed by conventional methods (methods such as adding alkali aqueous solution to form a water-soluble complex, etc.), activated carbon treatment or metal removal treatment that is very similar to it can be performed by removing the palladium compound and then adding recrystallization. The solvent is cooled to recrystallize, and then filtered and separated for purification. (step 2) Step 2 is a step in which the reactant represented by the above formula (5) produced in step 1 and the alcohol compound represented by the above formula (6) are reacted in a reaction solvent using an acid catalyst.
在上述式(6),環Z對應在前述式(1)之環Z,L3 對應L1 及L2 ,l對應m及n,R4 對應R1 及R2 ,可例示前述例示之苯環或萘環。In the above formula (6), ring Z corresponds to ring Z in the above formula (1), L 3 corresponds to L 1 and L 2 , l corresponds to m and n, R 4 corresponds to R 1 and R 2 , and benzene exemplified above can be exemplified. ring or naphthalene ring.
作為L3 表示之伸烷基,雖並非被特別限定者,但例如可列舉伸乙基、伸丙基、三亞甲基、四亞甲基、六亞甲基等。較佳為碳數1~6之伸烷基,更佳為碳數2~3之伸烷基。L3 之取代位置並非特別被限定者。取代基數l為0或1以上,可為相同或相異。較佳為0~15,更佳為0~5。尚,l為2以上時,聚烷氧基雖可為以相同之烷氧基構成,且可混在不同種之烷氧基(例如乙氧基與伸丙基氧基)而構成,但通常以相同之烷氧基構成。The alkylene group represented by L 3 is not particularly limited, but examples thereof include ethylene, propylene, trimethylene, tetramethylene, hexamethylene, and the like. An alkylene group having 1 to 6 carbon atoms is preferred, and an alkylene group having 2 to 3 carbon atoms is more preferred. The replacement position of L 3 is not particularly limited. The number of substituents l is 0 or 1 or more, and may be the same or different. Preferably it is 0-15, More preferably, it is 0-5. Furthermore, when l is 2 or more, the polyalkoxy group may be composed of the same alkoxy group, and may be mixed with different types of alkoxy groups (such as ethoxy group and propyleneoxy group), but it is usually composed of The same alkoxy group composition.
R4 表示氫原子、鹵素原子或可包含碳原子數1~12之芳香族基之烴基,較佳為氫原子、甲基或苯基。R 4 represents a hydrogen atom, a halogen atom or a hydrocarbon group which may contain an aromatic group having 1 to 12 carbon atoms, and is preferably a hydrogen atom, a methyl group or a phenyl group.
作為R4 表示之烴基,可例示烷基、環烷基、芳基、萘基、芳烷基等。作為烷基之具體例,較佳為甲基、乙基、丙基、異丙基、丁基、t-丁基等之C1-6烷基、C1-4烷基、C1-3烷基,更佳為C1-3烷基,其中,再更佳為甲基或乙基。作為環烷基之具體例,較佳為環戊基、環己基等之C5-8環烷基、C5-6環烷基等,更佳為C5-6環烷基。作為芳基之具體例,較佳為苯基、烷基苯基(單或二甲基苯基、甲苯基、2-甲基苯基、二甲苯基等)等,更佳為苯基。作為芳烷基之具體例,較佳可例示苄基、苯乙基等之C6-10芳基-C1-4烷基等。作為鹵素原子,較佳為氟原子、氯原子、溴原子等。Examples of the hydrocarbon group represented by R 4 include an alkyl group, a cycloalkyl group, an aryl group, a naphthyl group, an aralkyl group, and the like. Specific examples of the alkyl group are preferably C1-6 alkyl groups, C1-4 alkyl groups, C1-3 alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, t-butyl, etc. More preferably, it is a C1-3 alkyl group, and even more preferably, it is a methyl or ethyl group. Specific examples of the cycloalkyl group are preferably C5-8 cycloalkyl groups such as cyclopentyl and cyclohexyl groups, C5-6 cycloalkyl groups, etc., and more preferably C5-6 cycloalkyl groups. Specific examples of the aryl group are preferably phenyl, alkylphenyl (mono- or dimethylphenyl, tolyl, 2-methylphenyl, xylyl, etc.), and more preferably phenyl. Specific examples of the aralkyl group include preferably C6-10 aryl-C1-4 alkyl groups such as benzyl and phenethyl groups. As the halogen atom, a fluorine atom, a chlorine atom, a bromine atom, etc. are preferred.
取代基R4 之取代數可因應縮合烴之縮合環數等適當選擇,並未特別限定,較佳為0以上,更佳為1以上之整數。又,較佳為6以下之整數,更佳為4以下之整數。The number of substitutions of the substituent R 4 can be appropriately selected according to the number of condensed rings of the condensed hydrocarbon, etc., and is not particularly limited. It is preferably an integer of 0 or more, more preferably 1 or more. Moreover, an integer of 6 or less is preferable, and an integer of 4 or less is more preferable.
作為前述式(6)表示之化合物之具體例,例如作為l=0之化合物,可列舉酚、2-甲基酚、3-甲基酚等之烷基酚、2,3-二甲酚、2,6-二甲酚、3,5-二甲酚等之二烷基酚、2-甲氧基酚、2-乙氧基酚等之烷氧基酚、2-苯基酚、3-苯基酚等之苯基酚等。作為l=1之化合物,可列舉苯氧基乙醇、苯氧基丙醇、苯氧基丁醇等之苯氧基烷基醇、(2-甲基-苯氧基)乙醇、(3-甲基-苯氧基)乙醇、(3-乙基-苯氧基)乙醇、(3-丁基-苯氧基)乙醇、(2-甲基-苯氧基)丙醇、(3-甲基-苯氧基)丙醇等之烷基苯氧基烷基醇、(2,3-二甲基苯氧基)乙醇、(2,5-二甲基苯氧基)乙醇、(2,6-二甲基苯氧基)乙醇、(2,6-二丁基苯氧基)乙醇等之二烷基苯氧基烷基醇、(2-甲氧基苯氧基)乙醇等之烷氧基苯氧基烷基醇、(2-環己基苯氧基)乙醇等之環烷基苯氧基烷基醇、聯苯基氧基乙醇等之芳基苯氧基烷基醇等。又,作為l為2以上之化合物,可列舉對應此等苯氧基烷基醇之聚氧化烯苯基醚等。較佳為苯氧基C2-6烷基醇或C1-4烷基苯氧基C2-6烷基醇,特佳為苯氧基乙醇。Specific examples of the compound represented by the formula (6) include alkylphenols such as phenol, 2-methylphenol, and 3-methylphenol; 2,3-xylenol; Dialkylphenols such as 2,6-xylenol and 3,5-xylenol, alkoxyphenols such as 2-methoxyphenol and 2-ethoxyphenol, 2-phenylphenol, 3- Phenylphenol, etc. Phenylphenol, etc. Examples of compounds in which l=1 include phenoxyalkyl alcohols such as phenoxyethanol, phenoxypropanol, and phenoxybutanol, (2-methyl-phenoxy)ethanol, (3-methyl (3-ethyl-phenoxy)ethanol, (3-ethyl-phenoxy)ethanol, (3-butyl-phenoxy)ethanol, (2-methyl-phenoxy)propanol, (3-methyl Alkylphenoxyalkyl alcohols such as -phenoxy) propanol, (2,3-dimethylphenoxy)ethanol, (2,5-dimethylphenoxy)ethanol, (2,6 - Dimethylphenoxy)ethanol, (2,6-dibutylphenoxy)ethanol, dialkylphenoxyalkyl alcohol, (2-methoxyphenoxy)ethanol, etc. alkoxy cycloalkylphenoxyalkyl alcohols such as (2-cyclohexylphenoxy)ethanol, etc., arylphenoxyalkyl alcohols such as biphenyloxyethanol, etc. Examples of compounds in which l is 2 or more include polyoxyalkylene phenyl ethers corresponding to these phenoxyalkyl alcohols. Preferably it is phenoxy C2-6 alkyl alcohol or C1-4 alkyl phenoxy C2-6 alkyl alcohol, particularly preferably phenoxyethanol.
前述式(6)表示之化合物的使用量雖並非被特別限定者,但從副反應抑制及經濟性的點來看,相對於上述式(5)表示之反應物即茀酮類1莫耳,較佳為2~50莫耳,更佳為2.5~20莫耳,再更佳為3~10莫耳。又,亦可將此等之化合物作為反應溶劑使用。Although the usage amount of the compound represented by the aforementioned formula (6) is not particularly limited, from the viewpoint of side reaction suppression and economical efficiency, relative to 1 mole of the quinones, which are the reactants represented by the aforementioned formula (5), It is preferably 2 to 50 moles, more preferably 2.5 to 20 moles, and still more preferably 3 to 10 moles. Moreover, these compounds can also be used as a reaction solvent.
此等之前述式(6)表示之化合物可使用市售品,亦可使用經合成者。These compounds represented by the aforementioned formula (6) may be commercially available or may be synthesized.
作為原料使用之前述式(6)表示之化合物的純度雖並未特別限定,但通常為95%以上,較佳為99%以上。The purity of the compound represented by the formula (6) used as a raw material is not particularly limited, but is usually 95% or more, preferably 99% or more.
步驟2之反應通常可於酸觸媒的存在下進行。作為酸觸媒,例如可列舉硫酸、硫醇酸、蒙脫石、雜多酸等,此等當中,由於特別是源自酸觸媒之雜質的生成較少,容易得到具有本發明之茀骨架的化合物,故較佳為雜多酸。The reaction in step 2 can usually be carried out in the presence of an acid catalyst. Examples of the acid catalyst include sulfuric acid, mercaptanic acid, montmorillonite, heteropoly acid, etc. Among these, impurities derived from the acid catalyst are particularly small, and it is easy to obtain the scaffold having the present invention. compounds, so heteropolyacids are preferred.
所謂在本發明較佳使用之雜多酸,一般而言係指縮合不同2種以上之無機氧酸而生成之化合物的總稱,藉由以中心之氧酸與其周圍縮合之其他種之氧酸的組合,各種之雜多酸為可能。將形成中心之氧酸之數目較少之元素稱為雜元素,將形成以其周圍縮合之氧酸的元素稱為聚元素。聚元素可為單一種類之元素,亦可為複數種類之元素。The so-called heteropoly acid preferably used in the present invention generally refers to the general name of compounds generated by condensation of two or more different inorganic oxyacids, by condensing the central oxyacid with other types of oxyacids around it. Combinations with various heteropolyacids are possible. The elements that form a smaller number of oxyacids in the center are called heteroelements, and the elements that form the oxyacids condensed around them are called polyelements. A poly element can be a single type of element or a plurality of types of elements.
構成雜多酸之氧酸的雜元素雖並非被特別限定者,但例如可列舉銅、鈹、硼、鋁、碳、矽、鍺、錫、鈦、鋯、鈰、釷、氮、磷、砷、銻、釩、鈮、鉭、鉻、鉬、鎢、鈾、硒、碲、錳、碘、鐵、鈷、鎳、銠、鋨、銥、白金。較佳為磷(磷酸)或矽(矽酸)。又,構成雜多酸之氧酸的聚元素雖並非被特別限定者,但例如可列舉釩、鉬、鎢、鈮、鉭。較佳為選自釩、鉬及鎢中之至少1個的元素。Although the heteroelement constituting the oxyacid of the heteropoly acid is not particularly limited, examples thereof include copper, beryllium, boron, aluminum, carbon, silicon, germanium, tin, titanium, zirconium, cerium, thorium, nitrogen, phosphorus, and arsenic. , antimony, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, uranium, selenium, tellurium, manganese, iodine, iron, cobalt, nickel, rhodium, osmium, iridium, platinum. Preferred are phosphorus (phosphoric acid) or silicon (silicic acid). In addition, the poly element constituting the oxyacid of the heteropoly acid is not particularly limited, but examples thereof include vanadium, molybdenum, tungsten, niobium, and tantalum. Preferably, it is at least one element selected from the group consisting of vanadium, molybdenum and tungsten.
作為構成雜多酸骨架之雜多酸陰離子,可使用各種組成者。例如可列舉XM12 O40 、XM12 O42 、XM18 O62 、XM6 O24 等。較佳為雜多酸陰離子的組成為XM12 O40 。各式中,X為雜元素,M為聚元素。作為具有此等之組成的雜多酸,具體而言,例示有磷鉬酸、磷鎢酸、矽鉬酸、矽鎢酸、磷釩鉬酸等。As the heteropolyacid anion constituting the heteropolyacid skeleton, those having various compositions can be used. Examples include XM 12 O 40 , XM 12 O 42 , XM 18 O 62 , XM 6 O 24 , and the like. Preferably, the composition of the heteropoly acid anion is XM 12 O 40 . In each formula, X is a hetero element and M is a poly element. Specific examples of the heteropoly acid having such a composition include phosphomolybdic acid, phosphotungstic acid, silicomolybdic acid, silicotungstic acid, phosphovanadium molybdic acid, and the like.
雜多酸可為游離之雜多酸,亦可將質子的一部分或全部以其他陽離子取代,作為雜多酸之鹽使用。據此,於本發明所謂雜多酸,亦包含此等之雜多酸之鹽。作為可被質子取代之陽離子,例如可列舉銨、鹼金屬、鹼土類金屬等。The heteropolyacid may be a free heteropolyacid, or a part or all of the protons may be replaced with other cations to be used as a salt of the heteropolyacid. Accordingly, the so-called heteropolyacid in the present invention also includes the salts of these heteropolyacids. Examples of cations that can be substituted by protons include ammonium, alkali metals, alkaline earth metals, and the like.
雜多酸雖可為酐,亦可為結晶水含有物,但以酐者反應更快,且抑制副生成物的生成故較佳。結晶水含有物的情況,藉由預先進行減壓乾燥或與溶劑之共沸脫水等之脫水處理,可得到與酐相同之效果。雜多酸可以載持在活性炭、氧化鋁、二氧化矽-氧化鋁、矽藻土等之載體的形態使用。此等之雜多酸可單獨使用,亦可組合2種以上使用。又,如有必要,於不損害本發明之目的的範圍可併用雜多酸以外之其他觸媒。The heteropolyacid may be an anhydride or a substance containing crystal water, but the anhydride is preferred because it reacts faster and suppresses the formation of by-products. In the case of a substance containing crystal water, the same effect as anhydride can be obtained by performing dehydration treatment in advance such as drying under reduced pressure or azeotropic dehydration with a solvent. Heteropoly acids can be used in the form of being supported on a carrier such as activated carbon, alumina, silica-alumina, diatomaceous earth, or the like. These heteropolyacids can be used alone or in combination of two or more kinds. Moreover, if necessary, a catalyst other than heteropolyacid may be used together within the scope which does not impair the object of the present invention.
雜多酸的使用量雖並非被特別限定者,但為了得到充分之反應速度,相對於茀酮,較佳為0.0001重量倍以上,更佳為0.001~30重量倍,再更佳為0.01~5重量倍。Although the usage amount of the heteropoly acid is not particularly limited, in order to obtain a sufficient reaction rate, it is preferably 0.0001 times or more by weight, more preferably 0.001 to 30 times by weight, and still more preferably 0.01 to 5 times the weight of the quinone. times the weight.
實施步驟2之反應之方法雖並非被特別限定者,但通常可藉由將前述式(5)表示之反應物與前述式(6)表示之化合物與雜多酸置入反應裝置,於空氣中或氮、氬氣等之惰性氣體環境下、甲苯、二甲苯等之惰性溶劑存在下或非存在下進行加熱攪拌來進行。此時,藉由於去除觸媒含有水或反應生成水等反應系統內之水分的脫水條件下進行反應,較未進行脫水時更快進行反應,抑制副生成物的生成,可用更高收率得到目的物。作為脫水方法,雖並非被特別限定者,但例如可列舉藉由脫水劑添加之脫水、藉由減壓之脫水、藉由常壓或減壓下與溶劑之共沸的脫水等。Although the method of carrying out the reaction in step 2 is not particularly limited, it can usually be achieved by placing the reactant represented by the aforementioned formula (5), the compound represented by the aforementioned formula (6), and the heteropoly acid in a reaction device in the air. Or it can be performed with heating and stirring in an inert gas environment such as nitrogen or argon, or in the presence or absence of an inert solvent such as toluene or xylene. At this time, by performing the reaction under dehydration conditions in which the water in the reaction system such as catalyst-containing water or reaction product water is removed, the reaction proceeds faster than when dehydration is not performed, suppresses the generation of by-products, and obtains the product with a higher yield. target object. Although the dehydration method is not particularly limited, examples thereof include dehydration by addition of a dehydrating agent, dehydration by reduced pressure, dehydration by azeotropy with a solvent under normal pressure or reduced pressure, and the like.
作為共沸脫水溶劑,雖並非被特別限定者,但可列舉甲苯、二甲苯等之芳香族烴溶劑、氯苯、二氯苯等之鹵素化芳香族烴溶劑、戊烷、己烷、庚烷等之脂肪族烴溶劑、二氯甲烷、1,2-二氯乙烷等之鹵素化脂肪族烴溶劑、二乙基醚、二-iso-丙基醚、甲基-t-丁基醚、二苯基醚、四氫呋喃、二噁烷等之脂肪族及環狀醚溶劑、乙酸乙酯、乙酸丁酯等之酯溶劑、乙腈、丙腈、丁腈、苯甲腈等之腈溶劑、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、1-甲基-2-吡咯啶酮等之醯胺溶劑等。較佳為芳香族烴溶劑、鹵素化芳香族烴溶劑,更佳為甲苯、二甲苯、氯苯、二氯苯,再更佳為甲苯。其使用量雖並非被特別限定者,但從經濟性的點來看,相對於上述式(5)表示之反應物即茀酮,較佳為0.1重量倍以上,更佳為0.5~100重量倍,再更佳為1~20重量倍。The azeotropic dehydration solvent is not particularly limited, but may include aromatic hydrocarbon solvents such as toluene and xylene, halogenated aromatic hydrocarbon solvents such as chlorobenzene and dichlorobenzene, pentane, hexane, and heptane. Aliphatic hydrocarbon solvents such as methylene chloride, 1,2-dichloroethane and other halogenated aliphatic hydrocarbon solvents, diethyl ether, di-iso-propyl ether, methyl-t-butyl ether, Aliphatic and cyclic ether solvents such as diphenyl ether, tetrahydrofuran, dioxane, etc., ester solvents such as ethyl acetate, butyl acetate, etc., nitrile solvents such as acetonitrile, propionitrile, butyronitrile, benzonitrile, etc., N, Amide solvents such as N-dimethylformamide, N,N-dimethylacetamide, 1-methyl-2-pyrrolidone, etc. Preferred are aromatic hydrocarbon solvents and halogenated aromatic hydrocarbon solvents, more preferred are toluene, xylene, chlorobenzene, and dichlorobenzene, and even more preferred are toluene. Although the usage amount is not particularly limited, from an economical point of view, it is preferably 0.1 times by weight or more, and more preferably 0.5 to 100 times by weight relative to the reactant represented by the above formula (5), i.e., quinone. , and preferably 1 to 20 times the weight.
反應溫度雖因使用之原料、溶劑的種類而異,但較佳為50~300℃,更佳為80~250℃,再更佳為120~180℃。反應可用液體層析等之分析手段追蹤。Although the reaction temperature varies depending on the types of raw materials and solvents used, it is preferably 50 to 300°C, more preferably 80 to 250°C, and still more preferably 120 to 180°C. The reaction can be followed by analytical means such as liquid chromatography.
反應結束後之反應混合物中,通常除了生成之前述式(1)表示之化合物以外,亦包含有未反應之茀類、未反應之硼酸類、未反應之醇化合物類、鹼、觸媒、副反應生成物等。因此,可藉由慣用之方法,例如過濾、濃縮、萃取、晶析、再結晶、再沉澱、活性炭處理或與其極為相似之金屬的去除處理、管柱層析等之分離手段,或組合此等之分離手段進行分離純化。例如,藉由慣用之方法(加入鹼水溶液形成水溶性之複合體之方法等),去除硼酸類,進行活性炭處理或與其極為相似之金屬的去除處理,可藉由去除鈀化合物後,添加再結晶溶劑進行冷卻使其再結晶化,其次進行過濾分離來純化。 (結晶製造方法) 藉由步驟1及步驟2所製造之上述式(1)表示之化合物,較佳為藉由下述的結晶製造步驟(i)、(ii)及(iii)製造。The reaction mixture after the reaction is completed usually contains, in addition to the compound represented by the aforementioned formula (1), unreacted hydrochloric acid, unreacted boric acid, unreacted alcohol compounds, alkali, catalyst, and by-products. Reaction products, etc. Therefore, it can be separated by conventional methods, such as filtration, concentration, extraction, crystallization, recrystallization, reprecipitation, activated carbon treatment or very similar metal removal treatment, column chromatography, etc., or a combination of these separation means for separation and purification. For example, boric acid can be removed by conventional methods (methods such as adding alkali aqueous solution to form a water-soluble complex, etc.), activated carbon treatment or metal removal treatment that is very similar to it can be performed by removing the palladium compound and then adding recrystallization. The solvent is cooled to recrystallize, and then filtered and separated for purification. (Crystal manufacturing method) The compound represented by the above formula (1) produced by steps 1 and 2 is preferably produced by the following crystallization production steps (i), (ii) and (iii).
(i)調製上述式(1)表示之化合物的溶液(晶析溶液)之步驟(以下,亦有稱為晶析溶液調製步驟的情況)。(i) A step of preparing a solution (crystallization solution) of the compound represented by the above formula (1) (hereinafter, may also be referred to as a crystallization solution preparation step).
(ii)從於(i)之步驟所得之晶析溶液,於0℃以上使前述式(1)表示之化合物的結晶析出,分離取得經析出之結晶之步驟(以下,亦有稱為晶析步驟的情況)。(ii) A step of precipitating the crystallization of the compound represented by the aforementioned formula (1) from the crystallization solution obtained in step (i) at a temperature above 0°C, and isolating the precipitated crystals (hereinafter also referred to as crystallization) steps).
(iii)將於(ii)之步驟所得之結晶定為80℃以上之步驟(以下,亦有稱為乾燥步驟的情況)。(iii) A step in which the crystal obtained in step (ii) is heated to 80°C or above (hereinafter, it may also be called a drying step).
以下,針對上述(i)、(ii)及(iii)之步驟進行詳述。Below, the above steps (i), (ii) and (iii) are described in detail.
<(i)晶析溶液調整步驟> 作為可於晶析溶液調整步驟使用之溶劑,可列舉甲苯、二甲苯等之芳香族烴溶劑、氯苯、二氯苯等鹵素化芳香族烴溶劑、二氯甲烷、1,2-二氯乙烷等之鹵素化脂肪族烴溶劑、二乙基醚、二-iso-丙基醚、甲基-t-丁基醚、二苯基醚、四氫呋喃、二噁烷等之脂肪族及環狀醚溶劑、乙酸乙酯、乙酸丁酯等之酯溶劑、乙腈、丙腈、丁腈、苯甲腈等之腈溶劑、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、1-甲基-2-吡咯啶酮等之醯胺溶劑。其中,優選使用上述式(1)的溶解性良好且沸點適當之氯仿、乙酸乙酯、甲苯。<(i) Crystallization solution adjustment step> Examples of solvents that can be used in the crystallization solution preparation step include aromatic hydrocarbon solvents such as toluene and xylene, halogenated aromatic hydrocarbon solvents such as chlorobenzene and dichlorobenzene, methylene chloride, and 1,2-dichloroethane. Halogenated aliphatic hydrocarbon solvents such as alkanes, aliphatic and cyclic ethers such as diethyl ether, di-iso-propyl ether, methyl-t-butyl ether, diphenyl ether, tetrahydrofuran, dioxane, etc. Solvents, ester solvents such as ethyl acetate and butyl acetate, nitrile solvents such as acetonitrile, propionitrile, butyronitrile, benzonitrile, etc., N,N-dimethylformamide, N,N-dimethylacetyl Amine, 1-methyl-2-pyrrolidinone, etc. amide solvent. Among them, chloroform, ethyl acetate, and toluene having good solubility and appropriate boiling points of the above formula (1) are preferably used.
晶析溶劑中,除了上述以外可包含其他溶劑。可列舉於上述之反應的步驟1或步驟2使用之溶劑。包含其他溶劑時之其溶劑量相對於晶析溶液,通常為0.5重量倍以下,較佳為0.3重量倍以下。The crystallization solvent may contain other solvents in addition to the above. Examples include solvents used in step 1 or step 2 of the above reaction. When other solvents are included, the solvent amount is usually 0.5 weight times or less, preferably 0.3 weight times or less relative to the crystallization solution.
晶析溶液所包含之溶劑的總量相對於晶析溶液所包含之上述式(1)之化合物的重量倍,通常為0.5~20重量倍,較佳為1~10重量倍。The total amount of solvent contained in the crystallization solution is usually 0.5 to 20 times by weight, preferably 1 to 10 times by weight relative to the weight times of the compound of formula (1) contained in the crystallization solution.
雖視晶析溶液所包含之雜質的含量而定,但藉由晶析溶液中之水分量,有得不到結晶狀之上述式(1)表示之化合物的情況。又,即使為得到結晶狀之上述式(1)表示之化合物的情況,由於有無法充分提昇純度或色相的情況,故晶析溶液中之水分較佳為定為5重量%以下,更佳為定為1重量%以下。Although it depends on the content of impurities contained in the crystallization solution, depending on the amount of water in the crystallization solution, a crystalline compound represented by the formula (1) may not be obtained. Furthermore, even when a crystalline compound represented by the above formula (1) is obtained, the purity or hue may not be sufficiently improved, so the water content in the crystallization solution is preferably 5% by weight or less, more preferably 5% by weight or less. Set it to 1% by weight or less.
<(ii)晶析步驟> 其次,針對晶析步驟進行詳述。藉由上述(i)之方法調製之晶析溶液,雖視使用之溶劑的沸點而定,但較佳為加熱至40℃以上,更佳為加熱至剛好低於晶析溶液的沸點的溫度為止,使結晶完全溶解後進行冷卻,較佳為於0℃以上,更佳為於0~40℃的溫度範圍使結晶析出。雖視使用之溶劑而定,但以較40℃更高的溫度使結晶析出時,由於接近溶劑的沸點,故難以析出結晶,且產生於安全面成為問題的情況。作為於前述之溫度範圍使結晶析出之方法,例示有至結晶析出為止,以成為上述溫度範圍的方式保持晶析溶液的溫度之方法、於上述溫度範圍接種晶種之方法等、追加難以溶解結晶之溶劑降低溶解度之方法等。又,結晶析出後,可實施以一定時間同溫度保持使結晶成長之操作。結晶析出後,如有必要可進一步進行冷卻,分離經析出之結晶。<(ii) Crystallization step> Next, the crystallization steps are described in detail. The crystallization solution prepared by the method (i) above depends on the boiling point of the solvent used, but it is preferably heated to 40°C or above, and more preferably heated to a temperature just below the boiling point of the crystallization solution. , the crystals are completely dissolved and then cooled, preferably above 0°C, more preferably in the temperature range of 0 to 40°C to precipitate the crystals. Although it depends on the solvent used, when the crystal is precipitated at a temperature higher than 40° C., it is close to the boiling point of the solvent, so it is difficult to precipitate the crystal, and this may cause safety issues. Examples of methods for precipitating crystals in the aforementioned temperature range include a method of maintaining the temperature of the crystallization solution so as to fall within the aforementioned temperature range until the crystals are precipitated, a method of inoculating seed crystals in the aforementioned temperature range, and the addition of hard-to-dissolve crystals. Methods to reduce the solubility of solvents, etc. In addition, after the crystals are precipitated, an operation of keeping the same temperature for a certain period of time to grow the crystals can be performed. After the crystals are precipitated, if necessary, further cooling can be performed to separate the precipitated crystals.
使用難以溶解上述之結晶的溶劑,降低溶解度時,作為溶劑,可列舉戊烷、己烷、庚烷等之脂肪族烴溶劑。本溶劑的使用量相對於晶析溶液所包含之溶劑的總量,較佳為0.5~50重量倍,更佳為10~30重量倍。When using a solvent that is difficult to dissolve the above-mentioned crystals and reducing the solubility, examples of the solvent include aliphatic hydrocarbon solvents such as pentane, hexane, and heptane. The usage amount of this solvent is preferably 0.5 to 50 times by weight, more preferably 10 to 30 times by weight relative to the total amount of solvents contained in the crystallization solution.
<(iii)加熱步驟> 加熱步驟雖視使用之溶劑而定,但可藉由將所得之結晶較佳為從60℃以上至結晶的熔點以下,更佳為加熱至100℃以下來實施。尚,本發明所謂結晶的溫度,係於乾燥所使用之裝置的內部內插溫度計,於該溫度計接觸結晶時所觀測到之溫度。 供於加熱步驟之結晶可包含於晶析步驟使用之溶劑,實施加熱步驟時,亦可同時去除結晶所包含之溶劑。實施加熱步驟時,同時去除於結晶所包含之晶析步驟使用之溶劑時,藉由定為減壓下,實施加熱步驟時,由於可有效率地從結晶去除於晶析步驟使用之溶劑故較佳。<(iii) Heating step> Although the heating step depends on the solvent used, it can be implemented by heating the obtained crystal to a temperature of preferably from 60°C or higher to below the melting point of the crystal, more preferably 100°C or lower. Furthermore, the temperature of crystallization in the present invention refers to the temperature observed when a thermometer is inserted inside the device used for drying and the thermometer comes into contact with the crystallization. The crystals used in the heating step may include the solvent used in the crystallization step. When the heating step is performed, the solvent included in the crystals may also be removed at the same time. When performing the heating step, the solvent used in the crystallization step included in the crystallization is removed at the same time. By setting the heating step under reduced pressure, the solvent used in the crystallization step can be efficiently removed from the crystallization, so it is more efficient. good.
如此進行所得之本發明的結晶如有必要,雖亦可重複進行吸附、水蒸氣蒸餾、再結晶等之通常純化操作,但即使不實施這般的操作,亦足夠為高純度,故可適合作為聚碳酸酯、聚酯、聚丙烯酸酯、聚胺基甲酸酯、環氧等之樹脂材料使用。 [實施例]The crystal of the present invention thus obtained can be subjected to ordinary purification operations such as adsorption, steam distillation, recrystallization, etc. if necessary. However, even if such operations are not performed, it is sufficiently high-purity and therefore can be suitably used as Resin materials such as polycarbonate, polyester, polyacrylate, polyurethane, and epoxy are used. [Example]
於以下雖列舉實施例等具體說明本發明,但本發明並非被限定在實施例者。尚,例中,各種測定係以下述之方法實施。又,以下實施例、比較例所記載之各成分的生成率(殘存率)及純度為以下述條件所測定之HPLC的面積百分率值(去除反應液中之溶劑的有機化合物之峰值的修正面積百分率值)。The present invention will be described in detail below using examples, etc., but the present invention is not limited to the examples. Furthermore, in the examples, various measurements were carried out by the following methods. In addition, the production rate (residual rate) and purity of each component described in the following examples and comparative examples are the area percentage values of HPLC measured under the following conditions (corrected area percentage of the peak of the organic compound after removing the solvent in the reaction solution). value).
(1)HPLC純度
將於實施例、比較例所得之化合物在下述之裝置測定,算出HPLC純度。
裝置:日立製作所製
管柱:野村化學 Develosil ODS-MG-5
移動相:乙腈、0.1三氟乙酸、超純水
流量:1.0ml/min、管柱溫度:40℃、檢出波長:UV253nm
(2)ICP測定
將於實施例、比較例所得之化合物在下述之裝置測定Pd量。
使用機器:Agilent Technologies
裝置:Agilent5100 ICP-OES
(3)熔點(Tm)測定
使用於實施例所得之樹脂5mg,在下述之裝置、條件,測定藉由差示掃描熱量分析之吸熱峰值(熔點)。
裝置:(股)島津製作所公司製 DSC-60A
條件:昇溫速度20℃/min
[實施例1]
<步驟1>
藉由於具備攪拌機、冷卻器、進而具備溫度計之3L三口燒瓶,將2,7-二溴茀酮(以下有時簡稱為DBFN)25.25g (74.7毫莫耳)、苯基硼酸19.13g(156.9毫莫耳)溶解在甲苯/乙醇之混合溶劑(混合比=4/1)920mL,進而,添加肆(三苯基膦)鈀0.15g(0.13毫莫耳)、2M碳酸鉀水溶液85mL後,於80℃攪拌4小時進行反應。反應的進行情況在HPLC確認,確認DBFN的殘存量為0.1重量%以下,並結束反應。減壓濃縮所得之反應液,去除甲苯/乙醇後,於殘渣加入1M氫氧化鈉水溶液並以氯仿萃取。將氯仿層以活性炭進行脫鈀觸媒處理,去除殘存在系統內之鈀觸媒後進行濃縮,以析出黃色結晶的時間點停止濃縮並直接進行再結晶。藉由濾取經析出之黃色結晶,並於85℃乾燥24小時,而以收率81%得到目的物之2,7-二苯基茀酮(以下有時簡稱為DPFN)的白色結晶20g。
<步驟2>
藉由於具備攪拌機、冷卻器、水分離器、進而具備溫度計之1L三口燒瓶,置入作為溶劑之甲苯340g、12鎢(VI)磷酸n水合物(H3
[PW12
O40
]・nH2
O)2.94g,甲苯回流下共沸脫水30分鐘。冷卻內容物後,加入於步驟1合成之DPFN99.72g(0.3莫耳)及2-苯氧基乙醇165.80g(1.2莫耳)及甲苯50g,甲苯回流下邊藉由反應將生成之水對系統外排出邊攪拌12小時。反應的進行情況適當在HPLC確認,以DPFN的殘存量成為0.1重量%以下的時間點作為反應的終點。將所得之反應液調整至70℃,並以水200g洗淨3次。藉由減壓濃縮所得之有機層,去除甲苯及過剩之2-苯氧基乙醇。使所得之混合物溶解在甲苯500g,以活性炭進行脫色處理,濃縮其處理液時,由於開始析出結晶,停止濃縮並直接進行再結晶。將經析出之白色結晶藉由過濾取出,並藉由使該結晶乾燥,而得到9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二苯基茀之粗純化物(以下有時簡稱為BPDP)的白色結晶140g(收率70%、純度95.2%)。藉由ICP測定殘存金屬量時,Pd為0.4ppm。
<結晶製造步驟>
將於步驟2所得之BPDP的白色結晶10g(0.016莫耳)與氯仿100g置入燒瓶,於50℃使BPDP溶解(晶析溶液調製步驟)。BPDP完全溶解後,加入己烷30g,然後冷卻至0℃(晶析步驟)。藉由過濾經析出之結晶,將該結晶以80℃乾燥,而得到BPDP之白色結晶5.5g(收率55%、純度99.5%)(乾燥步驟)。藉由以DSC測定熔點時,熔點為137℃與178℃(參照圖1)。
[實施例2]
除了將結晶製造步驟之溶劑從氯仿變更為乙酸乙酯之外,其他與實施例1同樣進行,而得到BPDP之白色結晶2.6g(收率26%、純度99.5%)。藉由DSC測定之熔點為168℃(參照圖2)。
[實施例3]
除了將在結晶製造步驟,將溶解溫度定為40℃之外,其他與實施例1同樣進行,而得到BPDP之白色結晶3.1g(收率31%、純度97.5%)。藉由DSC測定之熔點為131℃與175℃。
[實施例4]
將與步驟2相同操作所得之BPDP的粗成生物(95.2%、Pd量0.4ppm)10g與甲苯100g置入燒瓶,於70℃溶解。BPDP完全溶解後,藉由冷卻至25℃,過濾經析出之結晶,將該結晶以80℃乾燥,而得到BPDP白色結晶3.2g(收率32%、純度96.2%)。測定DSC時,熔點為161℃。
[實施例5]
將於實施例4所得之BPDP白色結晶以100℃乾燥後,冷卻至25℃。再度測定DSC時,熔點為166℃。
[實施例6]
除了將步驟1之苯基硼酸變更為2-萘硼酸26.99g(156.9毫莫耳)之外,其他同樣進行,而以收率75%得到2,7-二萘基茀酮(以下有時簡稱為DNFN)的結晶24g。除了將步驟2之DPFN變更為DNFN129.75g(0.3莫耳)之外,其他同樣進行,而得到9,9-雙(4-(2-羥基乙氧基)苯基)-2,7-二萘基茀之粗生成物(以下有時簡稱為BPDN2)的白色結晶124g(收率60%、純度94.0%)。藉由ICP測定殘存金屬量時,Pd為1.0ppm。(1) HPLC Purity The compounds obtained in the Examples and Comparative Examples were measured with the following equipment and the HPLC purity was calculated. Device: Hitachi Co., Ltd. Column: Nomura Chemical Develosil ODS-MG-5 Mobile phase: acetonitrile, 0.1 trifluoroacetic acid, ultrapure water flow rate: 1.0ml/min, column temperature: 40°C, detection wavelength: UV253nm (2 )ICP measurement The Pd content of the compounds obtained in Examples and Comparative Examples was measured using the following equipment. Machine used: Agilent Technologies Equipment: Agilent5100 ICP-OES (3) Melting point (Tm) measurement Using 5 mg of the resin obtained in the example, the endothermic peak (melting point) by differential scanning calorimetry was measured under the following equipment and conditions. Apparatus: (Co., Ltd.) DSC-60A manufactured by Shimadzu Corporation Conditions: Temperature rise
結晶製造步驟係將BPDN2之白色結晶10g(0.014莫耳)與乙酸乙酯100g置入燒瓶,於75℃使BPDN2溶解(晶析溶液調整步驟)。BPDN2完全溶解後,加入己烷30g,然後冷卻至40℃(晶析步驟)。藉由過濾經析出之結晶,將該結晶以80℃乾燥,而得到BPDN2之白色結晶5.9g(收率59%、純度98.7%)(乾燥步驟)。測定DSC時,熔點為123℃與175℃(參照圖3)。 [實施例7] 在實施例6之晶析溶液調整步驟,除了將乙酸乙酯變更為氯仿,以50℃溶解之外,其他同樣進行,而得到BPDN2之白色結晶4.0g(收率40%、純度97.3%)。測定DSC時,熔點為165℃(參照圖4)。 [比較例1] 將於實施例4所得之BPDP白色結晶於170℃乾燥後,冷卻至25℃。再度測定DSC時,未觀察到熔點。 [比較例2] 與實施例1同樣實施步驟1。然後,於具備攪拌機、冷卻器、水分離器,進而具備溫度計之1L三口燒瓶,置入作為溶劑之甲苯340g、12鎢(VI)磷酸n水合物(H3[PW12O40]・nH2O)2.94g,甲苯回流下共沸脫水30分鐘。冷卻內容物後,加入於步驟1合成之DPFN99.72g(0.3莫耳)及2-苯氧基乙醇165.80g(1.2莫耳)及甲苯50g,甲苯回流下邊將藉由反應生成之水對系統外排出邊攪拌12小時。反應之進行情況適當在HPLC確認,以DPFN的殘存量成為0.1重量%以下的時間點作為反應的終點。將所得之反應液調整至70℃,以水200g洗淨3次。藉由減壓濃縮所得之有機層,去除甲苯及過剩之2-苯氧基乙醇,而得到BPDP之粗純化物186g(收率90%、純度91%)。The crystallization production step is to put 10g (0.014 mol) of white crystals of BPDN2 and 100g of ethyl acetate into a flask, and dissolve BPDN2 at 75°C (crystallization solution adjustment step). After BPDN2 is completely dissolved, add 30g of hexane and then cool to 40°C (crystallization step). The precipitated crystals were filtered and dried at 80°C to obtain 5.9 g of white crystals of BPDN2 (yield 59%, purity 98.7%) (drying step). When DSC was measured, the melting points were 123°C and 175°C (see Figure 3). [Example 7] The crystallization solution adjustment step of Example 6 was carried out in the same manner except that the ethyl acetate was changed to chloroform and dissolved at 50°C, and 4.0 g of white crystals of BPDN2 were obtained (yield 40%, purity 97.3%). When DSC was measured, the melting point was 165°C (see Figure 4). [Comparative example 1] The BPDP white crystals obtained in Example 4 were dried at 170°C and then cooled to 25°C. When DSC was measured again, no melting point was observed. [Comparative example 2] Step 1 is carried out in the same manner as in Example 1. Then, in a 1L three-necked flask equipped with a stirrer, a cooler, a water separator, and a thermometer, 340g of toluene as a solvent, 2.94g of 12tungsten (VI) phosphoric acid n-hydrate (H3[PW12O40]・nH2O), and toluene were placed Azeotropic dehydration under reflux for 30 minutes. After cooling the contents, add 99.72g (0.3 mole) of DPFN synthesized in step 1, 165.80g (1.2 mole) of 2-phenoxyethanol, and 50g of toluene. The toluene is refluxed and the water generated by the reaction is discharged to the outside of the system. Discharge and stir for 12 hours. The progress of the reaction was appropriately confirmed by HPLC, and the time point when the remaining amount of DPFN became 0.1% by weight or less was regarded as the end point of the reaction. The obtained reaction liquid was adjusted to 70°C and washed three times with 200 g of water. The obtained organic layer was concentrated under reduced pressure, and toluene and excess 2-phenoxyethanol were removed to obtain 186 g of crudely purified BPDP (yield 90%, purity 91%).
將所得之BPDP的黃色結晶10g(0.016莫耳)與氯仿100g置入燒瓶,於50℃使BPDP溶解。BPDP完全溶解後,加入己烷30g,然後冷卻至0℃。藉由過濾經析出之結晶,將該結晶以80℃乾燥,而得到BPDP之白色結晶5.5g(收率55%、純度99.5%)。將所得之BPDP溶解在甲苯,以活性炭進行脫色處理,濃縮該處理液,而得到BPDP之白色固體5.3g(純度99.5%、Pd3.0ppm)。未實施結晶製造步驟。測定DSC時,未觀察到熔點。10 g (0.016 mol) of the obtained yellow crystals of BPDP and 100 g of chloroform were placed in a flask, and BPDP was dissolved at 50°C. After BPDP is completely dissolved, add 30 g of hexane and then cool to 0°C. The precipitated crystals were filtered and dried at 80°C to obtain 5.5 g of white crystals of BPDP (yield 55%, purity 99.5%). The obtained BPDP was dissolved in toluene, decolorized with activated carbon, and the treatment liquid was concentrated to obtain 5.3 g of a white solid of BPDP (purity 99.5%, Pd 3.0 ppm). No crystallization manufacturing step was performed. When measuring DSC, no melting point was observed.
[產業上之可利用性] [Industrial availability]
將具有本發明之茀骨架之化合物的結晶定為原料(單體)之樹脂,例如,使用在薄膜、鏡片、棱鏡、光碟、透明導電性基板、光卡(Optical card)、薄片、光纖、光學膜、光學過濾器、硬塗膜等之光學構件,尤其是於鏡片極為有用。A resin in which a crystal of a compound having a fluorine skeleton of the present invention is used as a raw material (monomer) is used, for example, in films, lenses, prisms, optical discs, transparent conductive substrates, optical cards, sheets, optical fibers, optics It is extremely useful for optical components such as membranes, optical filters, and hard coating films, especially lenses.
[圖1]於實施例1所得之具有茀骨架之化合物的DSC圖表。 [圖2]於實施例2所得之具有茀骨架之化合物的DSC圖表。 [圖3]於實施例6所得之具有茀骨架之化合物的DSC圖表。 [圖4]於實施例7所得之具有茀骨架之化合物的DSC圖表。[Fig. 1] DSC chart of the compound having a fluorine skeleton obtained in Example 1. [Fig. 2] DSC chart of the compound having a fluorine skeleton obtained in Example 2. [Fig. 3] DSC chart of the compound having a fluorine skeleton obtained in Example 6. [Fig. 4] DSC chart of the compound having a fluorine skeleton obtained in Example 7.
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