TWI816302B - Liquid cell microchip and manufacturing method thereof - Google Patents
Liquid cell microchip and manufacturing method thereof Download PDFInfo
- Publication number
- TWI816302B TWI816302B TW111105632A TW111105632A TWI816302B TW I816302 B TWI816302 B TW I816302B TW 111105632 A TW111105632 A TW 111105632A TW 111105632 A TW111105632 A TW 111105632A TW I816302 B TWI816302 B TW I816302B
- Authority
- TW
- Taiwan
- Prior art keywords
- groove
- slide
- liquid
- electron microscope
- flow channel
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 94
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 230000005660 hydrophilic surface Effects 0.000 claims abstract description 23
- 239000005871 repellent Substances 0.000 claims abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 26
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 26
- 238000005259 measurement Methods 0.000 claims description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000009832 plasma treatment Methods 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000011800 void material Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 6
- 230000002940 repellent Effects 0.000 abstract description 3
- 238000012545 processing Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 230000005661 hydrophobic surface Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013060 biological fluid Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001493 electron microscopy Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen(.) Chemical compound [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Images
Landscapes
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
Description
本發明係有關於半導體製程領域,尤其是關於一種適用於電子顯微鏡的液體量測載片的結構以及其製作方法。 The present invention relates to the field of semiconductor manufacturing processes, and in particular to a structure of a liquid measurement slide suitable for electron microscopes and a manufacturing method thereof.
利用穿透式電子顯微鏡(Transmission electron microscope,縮寫為TEM)或掃瞄電子顯微鏡(Scanning electron microscope,縮寫為SEM)等電子顯微鏡對材料層的掃描是常見的製程之一。上述電子掃描除了用於固體的材料層之外,也能用於掃描液態的液膜以用於觀察各種溶液狀態,例如半導體領域中可用於觀察研磨液或溶劑中的粒子大小、或是生物科技領域中可用於觀察各種生物液中的細胞狀態等,都是目前已經發展中的應用方式。 Scanning material layers using electron microscopes such as a transmission electron microscope (TEM) or a scanning electron microscope (SEM) is one of the common processes. In addition to being used for solid material layers, the above-mentioned electronic scanning can also be used to scan liquid films to observe various solution states. For example, in the semiconductor field, it can be used to observe the particle size in grinding fluids or solvents, or in biotechnology. In the field, it can be used to observe the status of cells in various biological fluids, etc., which are currently developing applications.
由於電子顯微鏡發射高能量的電子束會導致液體揮發,因此以電子顯微鏡觀察液體時,必須將液體填充至一液體量測載片中再進行觀察。其中液體量測載片由上下兩層載片組合成,填入待掃描的液體至兩載片之間的流道空間後,再將液體量測載片封裝並送至電子顯微鏡中進行掃描。由於液體位於密封的液體量測載片之中,因此不會產生液體揮發情況。 Since the high-energy electron beam emitted by an electron microscope will cause the liquid to volatilize, when observing a liquid with an electron microscope, the liquid must be filled into a liquid measuring slide before observation. The liquid measurement slide is composed of an upper and lower slide. After filling the liquid to be scanned into the flow channel space between the two slides, the liquid measurement slide is packaged and sent to an electron microscope for scanning. Since the liquid is located in the sealed liquid measurement slide, there is no evaporation of the liquid.
然而目前的技術中,使用電子顯微鏡掃描液體的製程技術仍有提升 的空間,例如提高掃描的解析度、簡化掃描步驟或是降低掃描的成本等。上述技術發展是本領域的研發目標之一。 However, among current technologies, the process technology of using electron microscopes to scan liquids still needs to be improved. space, such as improving scanning resolution, simplifying scanning steps, or reducing scanning costs. The above-mentioned technological development is one of the research and development goals in this field.
舉例來說,第1圖繪示一個習知液體量測載片的剖面示意圖,液體量測載片1由兩個載片基底2結合而成,其中兩個載片基底2分別都具有凹槽,將凹槽相互對準之後結合成為一流道空間3,再將欲觀察的液體4灌入流道空間3之中,之後再送至電子顯微鏡之中進行觀察。
For example, Figure 1 shows a schematic cross-sectional view of a conventional liquid measurement slide. The
申請人發現目前的液體量測載片具有一問題存在,那就是流道空間3的厚度影響到液體4的厚度(即液膜厚度),若流道空間3的厚度設計成較厚,會導致液膜變厚,在電子顯微鏡觀察之下解析度變差,但是若將流道空間3的厚度設計成較薄,雖然可提高液膜在電子顯微鏡觀察之下解析度,但是若流道空間的厚度過薄,有一些液體(例如細胞液、黏性較高的研磨液等)就不容易被灌入流道空間內,甚至可能會產生阻塞情況。因此上述問題仍有改善的空間。 The applicant found that the current liquid measurement slide has a problem, that is, the thickness of the flow channel space 3 affects the thickness of the liquid 4 (i.e., the thickness of the liquid film). If the thickness of the flow channel space 3 is designed to be thicker, it will cause As the liquid film becomes thicker, the resolution under electron microscope observation becomes worse. However, if the thickness of the flow channel space 3 is designed to be thinner, although the resolution of the liquid film under electron microscope observation can be improved, if the flow channel space is If the thickness is too thin, some liquids (such as cell fluids, highly viscous grinding fluids, etc.) will not be easily poured into the flow channel space, and may even cause blockage. Therefore, there is still room for improvement on the above problems.
因此,本發明提供一種改良的液體量測載片,可適用於各式電子顯微鏡的掃描步驟。本發明另外提供製作上述液體量測載片的方法。 Therefore, the present invention provides an improved liquid measurement slide that can be used in the scanning steps of various electron microscopes. The present invention also provides a method for producing the above-mentioned liquid measurement slide.
本發明提供一種用於電子顯微鏡中的液體量測載片,包含一第一載片,包含有一第一凹槽,一第二載片,包含有一第二凹槽,其中第一載片與第二載片結合,且第一凹槽與第二凹槽面對面設置,以定義出一流道空間,其中第一凹槽內包含有一斥水表面,而第二凹槽內包含有一親水表面。 The invention provides a liquid measuring slide used in an electron microscope, which includes a first slide including a first groove, a second slide including a second groove, wherein the first slide and the third slide are The two slides are combined, and the first groove and the second groove are arranged face to face to define a flow channel space, wherein the first groove includes a water-repellent surface, and the second groove includes a hydrophilic surface.
本發明另提供一種用於電子顯微鏡中的液體量測載片的製作方法,包含提供一第一載片,並在第一載片上形成一第一凹槽,提供一第二載片,並在第二載片上形成一第二凹槽,將第一載片與第二載片結合,且第一凹槽與第二凹槽面對面設置,以定義出一流道空間,其中第一凹槽內包含有一斥水表面,而第二凹槽內包含有一親水表面。 The present invention also provides a method for making a liquid measurement slide for use in an electron microscope, which includes providing a first slide, forming a first groove on the first slide, providing a second slide, and A second groove is formed on the second carrier chip to combine the first carrier chip and the second carrier chip, and the first groove and the second groove are arranged face to face to define a flow channel space, wherein the first groove contains There is a water-repellent surface, and the second groove contains a hydrophilic surface.
本發明的特徵在於,液體量測載片的兩個載片中的凹槽內表面分別由不同的製程處理,使得流道空間內產生親水性與斥水性差異。如此一來當液體灌入流道空間時,若液體本身為親水性,則液體僅會依附在親水性的那一側面,而不會附著於斥水性的那一側面。如此一來液膜的厚度可以明顯降低,使得電子顯微鏡量測液體時,解析度可以大幅度增加,又不容易造成液體阻塞的問題。 The characteristic of the present invention is that the inner surfaces of the grooves in the two slides of the liquid measurement slide are processed by different processes, resulting in a difference in hydrophilicity and hydrophobicity in the flow channel space. In this way, when the liquid is poured into the flow channel space, if the liquid itself is hydrophilic, the liquid will only adhere to the hydrophilic side and not the water-repellent side. In this way, the thickness of the liquid film can be significantly reduced, so that when measuring liquids with an electron microscope, the resolution can be greatly increased without causing the problem of liquid clogging.
1:液體量測載片 1: Liquid measurement slide
2:載片基底 2: Slide base
3:流道空間 3:Flow channel space
4:液體 4: liquid
10:第一載片 10: First slide
12:第一凹槽 12: First groove
14:氮化矽層 14: Silicon nitride layer
16:氧化矽層 16: Silicon oxide layer
20:第二載片 20: Second slide
22:第二凹槽 22: Second groove
24:氮化矽層 24: Silicon nitride layer
30:流道空間 30:Flower space
40:液體 40:Liquid
41:液體 41:Liquid
42:空隙 42:gap
P1:第一處理步驟 P1: First processing step
P2:第二處理步驟 P2: Second processing step
T1:深度 T1: Depth
T2:深度 T2: Depth
W:水滴 W: water drop
θ1:接觸角 θ1: Contact angle
θ2:接觸角 θ2: Contact angle
第1圖繪示一個習知液體量測載片的剖面示意圖。 Figure 1 shows a schematic cross-sectional view of a conventional liquid measuring slide.
第2圖至第3圖繪示本發明的第一實施例的一液體量測載片的結構示意圖。 Figures 2 to 3 are schematic structural views of a liquid measurement slide according to the first embodiment of the present invention.
第4圖繪示一純水水滴位於一親水表面以及一斥水表面的示意圖。 Figure 4 shows a schematic diagram of a pure water droplet located on a hydrophilic surface and a water-repellent surface.
第5圖與第6圖繪示本發明的第一實施例的一液體量測載片的結構示意圖。 Figures 5 and 6 are schematic structural views of a liquid measurement slide according to the first embodiment of the present invention.
第7圖繪示本發明的第二實施例的一液體量測載片的結構示意圖。 Figure 7 is a schematic structural diagram of a liquid measurement slide according to the second embodiment of the present invention.
第8圖繪示本發明的第三實施例的一液體量測載片的結構示意圖。 Figure 8 is a schematic structural diagram of a liquid measurement slide according to the third embodiment of the present invention.
為使熟習本發明所屬技術領域之一般技藝者能更進一步了解本發 明,下文特列舉本發明之較佳實施例,並配合所附圖式,詳細說明本發明的構成內容及所欲達成之功效。 In order to enable those familiar with the technical field of the present invention to further understand the present invention Clearly, the preferred embodiments of the present invention are enumerated below, and the composition and intended effects of the present invention are described in detail with reference to the accompanying drawings.
為了方便說明,本發明之各圖式僅為示意以更容易了解本發明,其詳細的比例可依照設計的需求進行調整。在文中所描述對於圖形中相對元件之上下關係,在本領域之人皆應能理解其係指物件之相對位置而言,因此皆可以翻轉而呈現相同之構件,此皆應同屬本說明書所揭露之範圍,在此容先敘明。 For convenience of explanation, each drawing of the present invention is only schematic to make it easier to understand the present invention, and its detailed proportions can be adjusted according to design requirements. The upper and lower relationships between relative elements in the figures described in the text should be understood by those in the art to refer to the relative positions of the objects. Therefore, they can all be flipped over to present the same components, and these should all belong to the scope of this specification. The scope of disclosure will be explained here first.
第2圖至第3圖繪示製作本發明的一液體量測載片的結構示意圖,本發明所提供的液體量測載片,由兩個結構基本相同或類似的載片所結合而成。首先請參考第2圖,提供一第一載片10與一第二載片20,其中第一載片10與第二載片20的材質例如為矽。接著以蝕刻等方式分別在第一載片10上形成第一凹槽12以及在第二載片20上形成第二凹槽22。本實施例中,第一凹槽12與第二凹槽22的深度均約為1微米,但不限於此。然後在第一載片10與第二載片20上分別形成氮化矽層14與氮化矽層24。此處形成氮化矽層14的目的在於氮化矽層14可當作後續步驟中形成觀測窗的蝕刻停止層,關於這部分的技術內容屬於本領域的習知技術,在此不多贅述。
Figures 2 to 3 illustrate the structural schematic diagram of making a liquid measurement slide of the present invention. The liquid measurement slide provided by the present invention is composed of two slides with basically the same or similar structure. First, please refer to FIG. 2 , which provides a
接著,如第3圖所示,分別對第一載片10以及第二載片20的凹槽進行不同的處理步驟,包含對第一載片10進行一第一處理步驟P1、以及對第二載片進行一第二處理步驟P2。其中第一處理步驟P1例如是對氮化矽層14施加氧氣電漿,使得氮化矽層14表面再生成一氧化矽層16,其中氧化矽層16的厚度約為12埃,但不限於此,其中在氧化矽層16形成後,表面富含有矽-氧鍵。另一方面,第二處理步驟P2則是對氮化矽層24施加一含氮氣/氫氣電漿,使得氮化矽層24表
面的矽-氮鍵數量提高。此處進行第一處理步驟P1以及第二處理步驟P2的目的在於,對氮化矽層14以及氮化矽層24分別進行不同的表面處理,以改變氮化矽層14、24的親水性或斥水性。更進一步而言,在第一處理步驟P1進行後,氮化矽層14表面再生成氧化矽層16且親水性提高,而在第二處理步驟P2進行後,氮化矽層24表面的矽-氮鍵數量提高且斥水性提高。
Next, as shown in FIG. 3 , different processing steps are performed on the grooves of the
此處所述的親水性與斥水性的定義可以參考第4圖,第4圖繪示一純水水滴位於一親水表面以及一斥水表面的示意圖。其中當一純水水滴W落於一親水表面(第4圖左側)時,水滴W與親水表面之間的接觸角θ1較佳小於5度;相對於此,當純水水滴W落於一斥水表面(第4圖右側)時,水滴W與斥水表面之間的接觸角θ2較佳大於35度。 The definitions of hydrophilicity and hydrophobicity described here can be referred to Figure 4. Figure 4 shows a schematic diagram of a pure water droplet located on a hydrophilic surface and a water-repellent surface. When a pure water droplet W falls on a hydrophilic surface (left side of Figure 4), the contact angle θ1 between the water droplet W and the hydrophilic surface is preferably less than 5 degrees; in contrast, when the pure water droplet W falls on a repellent surface On the water surface (right side of Figure 4), the contact angle θ2 between the water droplet W and the water-repellent surface is preferably greater than 35 degrees.
另外補充,雖然有部分習知技術中將接觸角小於90度的表面定義為親水表面,接觸角大於90度的表面稱為斥水表面(例如荷葉表面)。但本發明中所述的“親水”與“斥水”為比較之下相對性的概念,並不受上述習知認知所限制。舉例來說,本實施例中的親水表面接觸角θ1較佳小於5度,屬於較為親水的表面,而斥水表面之間的接觸角θ2較佳大於35度,相對於上述親水表面,屬於“較不親水”表面。只要本發明的親水表面與斥水表面的接觸角差距能達30度以上,就能在後續步驟中,達到液體僅附著於其中一邊的效果。另外,選擇接觸角較小的親水表面,有利於降低液膜的厚度,因此能提高電子顯微鏡觀察下的解析度。 In addition, although some conventional techniques define surfaces with contact angles less than 90 degrees as hydrophilic surfaces, and surfaces with contact angles greater than 90 degrees are called hydrophobic surfaces (such as lotus leaf surfaces). However, "hydrophilic" and "water-repellent" described in the present invention are relative concepts in comparison and are not limited by the above common understanding. For example, the contact angle θ1 of the hydrophilic surface in this embodiment is preferably less than 5 degrees, which is a relatively hydrophilic surface, while the contact angle θ2 between the water-repellent surfaces is preferably greater than 35 degrees, which is " Less hydrophilic” surface. As long as the contact angle difference between the hydrophilic surface and the water-repellent surface of the present invention can reach more than 30 degrees, the effect of liquid only adhering to one side can be achieved in subsequent steps. In addition, choosing a hydrophilic surface with a smaller contact angle will help reduce the thickness of the liquid film, thus improving the resolution under electron microscopy.
值得注意的是,經申請人觀察實驗,若形成氮化矽層24後不進行任何處理則直接測量接觸角,則氮化矽層24與純水水滴的接觸角約會在10-30度左右,也就是說,本發明經過氮氣/氫氣電漿處理,可以提高氮化矽層24表面矽-
氮鍵數量,雖然並未在氮化矽層24表面形成其他不同的材料層,但仍有助於提高斥水性(將接觸角提升到35度以上),有利於創造與第一凹槽12內的親水表面的差異性。
It is worth noting that according to the applicant's observation and experiment, if the contact angle is directly measured without any treatment after the
上述步驟中以表面處理的方式來改變氮化矽層14與氮化矽層24的表面條件,在本發明的其他實施例中,也可以藉由其他手段(例如鍍膜或沉積等)來達到改變親水性與斥水性的功效,以其他的方法來達成第一凹槽12與第二凹槽22的內表面具有親水性/斥水性差異,均屬於本發明的涵蓋範圍。
In the above steps, surface treatment is used to change the surface conditions of the
請繼續參考第5圖,將第3圖中分別經過第一處理步驟P1與第二處理步驟的第一載片10以及第二載片20相互結合,其中第一凹槽12與第二凹槽22面對面相互對齊,此處由第一凹槽12與第二凹槽22共同組成的密閉空間定義為流道空間30。本實施例中,流道空間30的厚度約為2微米,即第一凹槽12與第二凹槽22的深度相加值。本發明的特徵在於,流道空間30有一部份的內表面由親水性材質所構成(例如氧化矽層16),而另一部分的內表面則是由斥水性材質所構成(例如經過氮氣/氫氣電漿處理後的氮化矽層24)。也就是說流道空間30內部表面具有親水性或斥水性的差異性。
Please continue to refer to Figure 5. The
請參考第6圖,將觀察的液體40注入流道空間內之後,液體40若為水性液體或含有水性溶劑,則液體40會附著於親水表面上,而不容易附著於斥水表面上,因此液膜並不會充斥整個流道空間30,液膜的厚度可以明顯降低,並且有效提升電子顯微鏡觀察之下液膜的解析度,同時也因為部分流道空間30未被液膜灌滿且留有空隙42,因此若液體40本身黏性較高或是帶有粒子,液體40也不容易阻塞在流道空間30內。藉由本發明所提供的結構與製作方法,可解決
傳統技術中欲提高解析度而降低流道空間的厚度,卻又可能導致液體阻塞,或是將流道空間設計較厚以避免阻塞卻又降低解析度的兩難困境。
Please refer to Figure 6. After the liquid 40 under observation is injected into the flow channel space, if the liquid 40 is an aqueous liquid or contains an aqueous solvent, the liquid 40 will adhere to the hydrophilic surface and will not easily adhere to the water-repellent surface. Therefore, The liquid film does not fill the entire
另一方面,請參考第7圖,第7圖繪示本發明的第二實施例的一液體量測載片的結構示意圖。本實施例中,液體41不為水性液體(例如為油性溶劑),則液體41可能會不會附著於親水表面,但是此時液體41就會附著在斥水表面上。由於流道空間30內具有親水性/斥水性的差異,因此無論液體41本身是否為水性液體,均能達到降低液膜厚度的效果。
On the other hand, please refer to FIG. 7 , which is a schematic structural diagram of a liquid measurement slide according to the second embodiment of the present invention. In this embodiment, if the liquid 41 is not an aqueous liquid (for example, an oily solvent), the liquid 41 may not adhere to the hydrophilic surface, but in this case the liquid 41 will adhere to the water-repellent surface. Due to the difference in hydrophilicity/water repellency within the
在本發明的另一實施例中,可以將第一凹槽12與第二凹槽22的深度設計成不同深度,例如第8圖所示,第一凹槽12的深度T1與第二凹槽22的深度T2不相等,如此一來可以進一步控制液膜的厚度與空隙的厚度。舉例來說,若將第一凹槽12的深度T1設計得更小(低於1微米),則可以進一步降低親水性液體的膜厚,並且提高電子顯微鏡之下的液膜解析度。而將第二凹槽22的深度T2設計得更大(大於1微米),則液體灌入流道空間之後,流道空間剩餘的空隙42可增大,避免粒子等阻塞問題。
In another embodiment of the present invention, the depths of the
綜合以上說明書與圖式,本發明提供一種用於電子顯微鏡中的液體量測載片,包含一第一載片10,包含有一第一凹槽12,一第二載片20,包含有一第二凹槽22,其中第一載片10與第二載片20結合,且第一凹槽12與第二凹槽22面對面設置,以定義出一流道空間30,其中第一凹槽12內包含有一親水表面,而第二凹槽22內包含有一斥水表面。
Based on the above description and drawings, the present invention provides a liquid measuring slide for use in an electron microscope, which includes a
在本發明的一些實施例中,其中第一凹槽12的親水表面與一純水水
滴W之間的接觸角小於5度。
In some embodiments of the present invention, the hydrophilic surface of the
在本發明的一些實施例中,其中第二凹槽22的斥水表面與一純水水滴W之間的接觸角大於35度。
In some embodiments of the present invention, the contact angle between the water-repellent surface of the
在本發明的一些實施例中,其中親水表面的材質包含有氧化矽,斥水表面的材質包含有氮化矽。 In some embodiments of the present invention, the material of the hydrophilic surface includes silicon oxide, and the material of the water-repellent surface includes silicon nitride.
在本發明的一些實施例中,其中第一凹槽12的一深度T1小於第二凹槽22的一深度T2。
In some embodiments of the present invention, a depth T1 of the
本發明另提供一種用於電子顯微鏡中的液體量測載片的製作方法,包含提供一第一載片10,並在第一載片10上形成一第一凹槽12,提供一第二載片20,並在第二載片20上形成一第二凹槽22,將第一載片10與第二載片20結合,且第一凹槽12與第二凹槽22面對面設置,以定義出一流道空間30,其中第一凹槽12內包含有一親水表面,而第二凹槽22內包含有一斥水表面。
The present invention also provides a method for manufacturing a liquid measurement slide for use in an electron microscope, which includes providing a
在本發明的一些實施例中,其中製作方法更包含對第一凹槽12進行一氧氣電漿處理,以使第一凹槽12的表面的親水性提高。
In some embodiments of the present invention, the manufacturing method further includes performing an oxygen plasma treatment on the
在本發明的一些實施例中,其中製作方法更包含對第二凹槽進行一氫氣與氮氣電漿處理,以使第二凹槽的表面的斥水性提高。 In some embodiments of the present invention, the manufacturing method further includes performing a hydrogen and nitrogen plasma treatment on the second groove to improve the water repellency of the surface of the second groove.
在本發明的一些實施例中,其中第一凹槽12的一深度與第二凹槽22
的一深度相等。
In some embodiments of the invention, a depth of the
在本發明的一些實施例中,其中第一凹槽12的一深度與第二凹槽22的一深度不相等。
In some embodiments of the present invention, a depth of the
本發明的特徵在於,液體量測載片的兩個載片基板中的凹槽表面分別由不同的製程處理,使得流道空間內產生親水性與斥水性差異。如此一來當液體灌入流道空間時,若液體本身為親水性,則液體僅會依附在親水性的那一側面,而不會附著於斥水性的那一側面。因此液膜的厚度可以明顯降低,使得電子顯微鏡量測液體時,解析度可以大幅度增加,又不容易造成液體阻塞的問題。 The characteristic of the present invention is that the groove surfaces in the two carrier substrates of the liquid measurement carrier are processed by different processes, resulting in a difference in hydrophilicity and hydrophobicity in the flow channel space. In this way, when the liquid is poured into the flow channel space, if the liquid itself is hydrophilic, the liquid will only adhere to the hydrophilic side and not the water-repellent side. Therefore, the thickness of the liquid film can be significantly reduced, so that when measuring liquids with an electron microscope, the resolution can be greatly increased without causing the problem of liquid clogging.
以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 The above are only preferred embodiments of the present invention, and all equivalent changes and modifications made in accordance with the patentable scope of the present invention shall fall within the scope of the present invention.
10:第一載片 10: First slide
14:氮化矽層 14: Silicon nitride layer
16:氧化矽層 16: Silicon oxide layer
20:第二載片 20: Second slide
24:氮化矽層 24: Silicon nitride layer
30:流道空間 30:Flower space
40:液體 40:Liquid
42:空隙 42:gap
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111105632A TWI816302B (en) | 2022-02-16 | 2022-02-16 | Liquid cell microchip and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111105632A TWI816302B (en) | 2022-02-16 | 2022-02-16 | Liquid cell microchip and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202334629A TW202334629A (en) | 2023-09-01 |
TWI816302B true TWI816302B (en) | 2023-09-21 |
Family
ID=88927519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111105632A TWI816302B (en) | 2022-02-16 | 2022-02-16 | Liquid cell microchip and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI816302B (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080135778A1 (en) * | 2006-12-07 | 2008-06-12 | National Tsing Hua University | Specimen kit and fabricating method thereof |
TWI341557B (en) * | 2007-08-07 | 2011-05-01 | United Microelectronics Corp | Dielectric layer structure and manufacturing method thereof |
US9269534B2 (en) * | 2012-07-23 | 2016-02-23 | National Institute Of Advanced Industrial Science And Technology | Sample holder and method for observing electron microscopic image |
TW201723457A (en) * | 2015-12-22 | 2017-07-01 | 閤康生物科技股份有限公司 | Sample collection component and manufacturing method thereof |
US10373800B2 (en) * | 2014-06-03 | 2019-08-06 | Protochips, Inc. | Method for optimizing fluid flow across a sample within an electron microscope sample holder |
-
2022
- 2022-02-16 TW TW111105632A patent/TWI816302B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080135778A1 (en) * | 2006-12-07 | 2008-06-12 | National Tsing Hua University | Specimen kit and fabricating method thereof |
TWI341557B (en) * | 2007-08-07 | 2011-05-01 | United Microelectronics Corp | Dielectric layer structure and manufacturing method thereof |
US9269534B2 (en) * | 2012-07-23 | 2016-02-23 | National Institute Of Advanced Industrial Science And Technology | Sample holder and method for observing electron microscopic image |
US10373800B2 (en) * | 2014-06-03 | 2019-08-06 | Protochips, Inc. | Method for optimizing fluid flow across a sample within an electron microscope sample holder |
TW201723457A (en) * | 2015-12-22 | 2017-07-01 | 閤康生物科技股份有限公司 | Sample collection component and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
TW202334629A (en) | 2023-09-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Kim et al. | Transparent hybrid inorganic/organic barrier coatings for plastic organic light-emitting diode substrates | |
US8563076B2 (en) | Substrate structure and method of forming the same | |
TWI699820B (en) | Method for permanent bonding of wafers | |
JPH03149817A (en) | Eletrochemical etching of silicon plate | |
US10825793B2 (en) | Method for permanently bonding wafers | |
Wang et al. | Recycled low-temperature direct bonding of Si/glass and glass/glass chips for detachable micro/nanofluidic devices | |
TWI816302B (en) | Liquid cell microchip and manufacturing method thereof | |
CN110736760A (en) | transmission electron microscope in-situ electrochemical detection chip and manufacturing method thereof | |
US20090081384A1 (en) | Low Wetting Hysteresis Polysiloxane-Based Material and Method for Depositing Same | |
Son et al. | Characteristics of plasma-activated dielectric film surfaces for direct wafer bonding | |
TWI433195B (en) | Specimen supporting device for electron microscope and fabrication method thereof | |
Ishizaki et al. | Fabrication and characterization of ultra-water-repellent alumina–silica composite films | |
US20200312889A1 (en) | Active matrix substrate, microfluidic device including active matrix substrate, and method of manufacturing active matrix substrate and microfluidic device | |
US9514936B2 (en) | Particle and method for manufacturing same | |
Yamazaki et al. | Electron beam lithography on vertical side faces of micrometer-order Si block | |
CN114755074A (en) | Method for analyzing physical properties, physical property analysis specimen and method for producing the same | |
TWI809717B (en) | Liquid cell microchip and measuring method thereof | |
Tinku et al. | Surface characterization of polydimethylsiloxane: an AFM study | |
JP7065706B2 (en) | Applyer and application method | |
CN114682314B (en) | Manufacturing method of self-sealing nano flow channel | |
US10804071B2 (en) | Transmission electron microscope specimen and method of manufacturing the same | |
JP7022639B2 (en) | Resin members for fluid devices and their manufacturing methods | |
Garoli et al. | Optical and structural properties of low thickness lead zirconate titanate films on sapphire substrates prepared via sol-gel method | |
Lakhdari et al. | Comparison of Copper and Cobalt Surface Reactivity for Advanced Interconnects | |
JP5412635B2 (en) | Insulating film forming method, insulating film forming apparatus, and semiconductor device |