TWI815139B - Projection apparatus and fabrication method thereof - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title description 2
- 238000000034 method Methods 0.000 title 1
- 230000005284 excitation Effects 0.000 claims abstract description 67
- 230000003287 optical effect Effects 0.000 claims description 32
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- 230000003068 static effect Effects 0.000 claims description 7
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- 238000000576 coating method Methods 0.000 description 20
- 239000000463 material Substances 0.000 description 15
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- 238000002834 transmittance Methods 0.000 description 12
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 11
- 238000002310 reflectometry Methods 0.000 description 8
- 230000003667 anti-reflective effect Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000005374 Kerr effect Effects 0.000 description 1
- 230000005697 Pockels effect Effects 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000000695 excitation spectrum Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
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- 230000001443 photoexcitation Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
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- 239000010453 quartz Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
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- 238000000926 separation method Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2006—Lamp housings characterised by the light source
- G03B21/2033—LED or laser light sources
- G03B21/204—LED or laser light sources using secondary light emission, e.g. luminescence or fluorescence
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- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
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Abstract
Description
本發明關於一種投影裝置及投影裝置製造方法。The invention relates to a projection device and a manufacturing method of the projection device.
目前利用紫外光投影機顯示單色或多色投影影像的設計,因螢光薄膜的激發效率並非百分之百,故部分紫外光可能會直接穿透螢光薄膜對人體造成危害。因此,亟須一種可避免不可見光(例如紫外光)對人體造成危害且可減少光損失的投影裝置設計。Currently, ultraviolet projectors are designed to display single-color or multi-color projection images. Since the excitation efficiency of the fluorescent film is not 100%, some ultraviolet light may directly penetrate the fluorescent film and cause harm to the human body. Therefore, there is an urgent need for a projection device design that can avoid invisible light (such as ultraviolet light) from causing harm to the human body and reduce light loss.
根據本發明的一個觀點,提供一種投影裝置,包括不可見光光源、光閥、投影鏡頭、螢光激發層及不可見光反射層。不可見光光源包含晶片和封裝體,光閥設於不可見光光源的光路下游,投影鏡頭設於光閥的光路下游,且螢光激發層設於投影鏡頭的光路下游。不可見光反射層設於螢光激發層的光路下游,且螢光激發層設於不可見光反射層的反射光路下游。According to one aspect of the present invention, a projection device is provided, including an invisible light source, a light valve, a projection lens, a fluorescent excitation layer and an invisible light reflection layer. The invisible light source includes a chip and a package. The light valve is located downstream of the light path of the invisible light source. The projection lens is located downstream of the light path of the light valve. The fluorescent excitation layer is located downstream of the light path of the projection lens. The invisible light reflective layer is located downstream of the optical path of the fluorescent excitation layer, and the fluorescent excitation layer is located downstream of the reflective optical path of the invisible light reflective layer.
根據本發明的上述觀點,穿透螢光激發層的部分紫外光可被不可見光反射層反射回螢光激發層,如此被反射的紫外光不會照射到人體且可被反射回螢光激發層再次激發出可見光,提高可見光顯像亮度且可避免紫外光對人體造成危害。According to the above viewpoint of the present invention, part of the ultraviolet light that penetrates the fluorescent excitation layer can be reflected back to the fluorescent excitation layer by the invisible light reflective layer. In this way, the reflected ultraviolet light will not irradiate the human body and can be reflected back to the fluorescent excitation layer. Visible light is excited again, improving the brightness of visible light imaging and preventing ultraviolet light from harming the human body.
為讓本發明更明顯易懂,以下用實施例,並配合所附圖式作詳細說明如下。In order to make the present invention more obvious and understandable, the following examples are used to describe the invention in detail with reference to the accompanying drawings.
有關本發明前述及其他技術內容、特點與功效,在以下配合參考圖式的多個實施例的詳細說明中,將可清楚的呈現。另外,下列實施例中所使用的用語「第一」、「第二」是為了辨識相同或相似的元件而使用,且方向用語例如「前」、「後」等,僅是參考附加圖式的方向,並非用以限定所述元件。The foregoing and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of multiple embodiments with reference to the drawings. In addition, the terms "first" and "second" used in the following embodiments are used to identify the same or similar components, and directional terms such as "front" and "rear" are only for reference to the attached drawings. Directions are not intended to limit the elements described.
圖1為本發明一實施例的投影裝置的概要示意圖。如圖1所示,於本實施例的投影裝置1中,不可見光光源10發出不可見光(例如紫外光UV),且沿紫外光UV的行進路徑可依序包括光閥12、投影鏡頭14、螢光激發層16及不可見光反射層18。再者,準直透鏡(collimator lens)22可設於不可見光光源10的光路下游以準直不可見光光源10發出的光線,轉向鏡23可設於光源10與光閥12之間的光路,且轉向鏡25可設於投影鏡頭14與螢光激發層16之間的光路。FIG. 1 is a schematic diagram of a projection device according to an embodiment of the present invention. As shown in FIG. 1 , in the
於本實施例中,不可見光光源10可包含一晶片10a和一封裝體(package)10b且例如可為發光二極體或雷射發光二極體。不可見光光源10例如可發出紫外光UV,如圖1所示,紫外光UV可由光閥12調變為影像光,經由全反射稜鏡28反射至投影鏡頭14成像再入射至螢光激發層16。如圖1所示,當紫外光UV入射至螢光激發層16可激發螢光激發層16中的螢光材料而產生可見光IV,然而受限於螢光激發層16的激發效率無法達到100%,部分紫外光UV不會被轉換為可見光IV且會直接穿透螢光激發層16,導致可見光IV顯像亮度降低且漏出的紫外光UV對人體有害。因此,於本實施例中,不可見光反射層18可設於螢光激發層16的光路下游,不可見光反射層18可反射紫外光UV並讓可見光IV穿透,穿透螢光激發層16的部分紫外光UV可被不可見光反射層18反射回螢光激發層16,亦即螢光激發層16可設於不可見光反射層18的反射光路的下游,如此被反射的紫外光UV不會照射到人體且可被反射回螢光激發層16再次激發出可見光IV,以提高可見光顯像亮度且可避免紫外光對人體造成危害。In this embodiment, the
須注意上述發出紫外光的光源僅為例示,其他足以提供激發螢光材料產生可見光頻譜的激發光源亦可,且不可見光反射層18可依據對人體的危害性或其他目的反射預定波段範圍的入射光而不限定為紫外光。It should be noted that the above-mentioned light source emitting ultraviolet light is only an example. Other excitation light sources that are sufficient to excite the fluorescent material to produce visible light spectrum can also be used, and the invisible light
於本實施例中,不可見光反射層18可作為用以反射預定光波段的不可見光(例如紫外光UV)的分光元件,且不可見光反射層18可直接鍍於透明基板上或形成為一反射片均可。再者,不可見光反射層18於空間中相對不可見光光源10的配置位置及面積並不限定,且不可見光反射層18於不同區域的反射率亦可加以變化,以進一步提高畫面亮度均勻性。In this embodiment, the invisible light
圖2及圖3顯示不可見光反射層18與螢光激發層16的不同配置實施例。如圖2所示,螢光激發層16可配置於第一透明基板24與第二透明基板26之間,不可見光反射層18位於螢光激發層16的光路下游且可貼附於第二透明基板26的背向螢光激發層16的一側。於另一實施例中,如圖3所示,不可見光反射層18位於螢光激發層16的光路下游且可設置於螢光激發層16與第二透明基板26之間。亦即,上述實施例的不可見光反射層18與螢光激發層16的配置方式及位置完全不限定,可夾設於兩透明基板之間或外側,或者可設於單一透明基板的兩側等均可。再者,透明基板24、26 的材料例如可為玻璃、石英、藍寶石等而不限定,且螢光激發層16可視需求激發出單色或多色可見光。2 and 3 show different configuration embodiments of the invisible light
本發明所指的「光閥」一詞已為業界所廣泛使用,一般來說,係指數位微鏡元件(Digital Micro-mirror Device;DMD)、矽基液晶面板(liquid-crystal-on-silicon panel;LCOS Panel)或是穿透式液晶面板等空間光調變器之任一者。於本實施例中,光閥為數位微鏡元件。光閥為空間光調變器(Spatial Light Modulator;SLM)的一種,空間光調變器含有許多獨立單元,這些獨立單元在空間上排列成一維或二維陣列。每個單元都可獨立地接受光學信號或電學信號的控制,利用各種物理效應(泡克爾斯效應、克爾效應、聲光效應、磁光效應、半導體的自電光效應、光折變效應等)改變自身的光學特性,從而對照明在該複數個獨立單元的照明光束進行調製,並輸出影像光束。獨立單元為微型反射鏡或液晶單元等光學元件。The term "light valve" referred to in the present invention has been widely used in the industry. Generally speaking, it refers to digital micro-mirror device (DMD), silicon-based liquid crystal panel (liquid-crystal-on-silicon). panel; LCOS Panel) or any spatial light modulator such as a transmissive LCD panel. In this embodiment, the light valve is a digital micromirror device. The light valve is a type of spatial light modulator (Spatial Light Modulator; SLM). The spatial light modulator contains many independent units, and these independent units are arranged in a one-dimensional or two-dimensional array in space. Each unit can be independently controlled by optical signals or electrical signals, and use various physical effects (Pockels effect, Kerr effect, acousto-optic effect, magneto-optical effect, semiconductor self-electro-optical effect, photorefractive effect, etc.) to change itself The optical characteristics of the unit are used to modulate the illumination beams illuminating the plurality of independent units and output image beams. Independent units are optical components such as micro-mirrors or liquid crystal units.
圖4及圖5為顯示本發明一實施例的不可見光反射層於不同波長下的穿透率及反射率曲線圖。由圖4及圖5可清楚看出,上述實施例的不可見光反射層18對紫外光有極低的穿透率及極高的反射率,因此可有效避免紫外光照射到人體。4 and 5 are graphs showing the transmittance and reflectivity of the invisible light reflective layer at different wavelengths according to an embodiment of the present invention. It can be clearly seen from FIG. 4 and FIG. 5 that the invisible light
圖6為本發明另一實施例的投影裝置的概要示意圖。如圖6所示,於本實施例的投影裝置2中,不可見光光源10發出的紫外光UV 可通過靜態投影片32,靜態投影片32例如為具有灰階明暗及/或輪廓的人眼可識別的圖案投影片,或者為具有繞射結構的全像片、繞射片等等而不限定,通過靜態投影片32的紫外光UV可經由投影鏡頭14成像再入射至螢光激發層16,再由螢光激發層16激發出單色或多色的可見影像光。於本實施例中,不可見光反射層18同樣可設於螢光激發層16的光路下游,不可見光反射層18可反射紫外光UV並讓可見光IV穿透,因此被反射的紫外光UV不會照射到觀察者且可被反射回螢光激發層16再次激發出可見光IV。再者,於本實施例或圖1的實施例中,螢光激發層16與投影鏡頭14間的光路亦可設置一可見光反射層34,舉例而言,若觀察者(未圖示)位於螢光激發層16的右側,因螢光激發層16激發出的可見光IV會向各個方向發出,因此往螢光激發層16的左側發出的可見光IV可被可見光反射層34反射至觀察者的方向以進一步提高影像顯示亮度。FIG. 6 is a schematic diagram of a projection device according to another embodiment of the present invention. As shown in FIG. 6 , in the
圖7為本發明另一實施例的投影裝置的概要示意圖。如圖7所示,投影裝置3包含由不可見光光源10及可見光光源20構成的雙光源通道。於本實施例中,不可見光光源10可發出紫外光UV,可見光光源20可發出藍光IB,紫外光UV可被分色鏡36反射且藍光IB可直接穿透分色鏡36,形成兩個分離的不同光路,紫外光UV及藍光IB可經由光閥12調變及全反射稜鏡28反射後再經由投影鏡頭14成像並投射至螢光激發層16。請參考圖8,舉例而言,紫外光UV(例如405nm)入射至螢光激發層16可激發出紅光(例如620nm),藍光IB(例如459nm) 入射至螢光激發層16可激發出綠光(例如555nm),因此可顯示出紅光及綠光構成的雙色影像。FIG. 7 is a schematic diagram of a projection device according to another embodiment of the present invention. As shown in FIG. 7 , the
藉由上述實施例的設計,可使用不同波長的複數光通道分別激發出不同色光,例如上述包含一不可見光光通道(峰值波長405nm)和一可見光光通道(峰值波長459nm),因此可使用峰值波長相距較遠的光線以減少分色鏡鍍膜的反射和穿透光損失。再者,使用大於400nm的紫外光波長,可避免UV法規內的長波紫外光(UVA)危害並提高數位微鏡裝置(DMD)的可靠度。Through the design of the above embodiment, multiple optical channels of different wavelengths can be used to respectively excite different colors of light. For example, the above includes an invisible light optical channel (peak wavelength 405nm) and a visible light optical channel (peak wavelength 459nm), so the peak wavelength can be used The wavelengths are far apart to reduce the reflection and transmitted light loss of the dichroic mirror coating. Furthermore, using ultraviolet wavelengths greater than 400nm can avoid long-wave ultraviolet (UVA) hazards within UV regulations and improve the reliability of digital micromirror devices (DMD).
圖9及圖10分別顯示未鍍膜的玻璃與鍍膜分色鏡36相對藍光的穿透率,比較圖9及圖10可知,鍍膜分色鏡36相對藍光的穿透率明顯較高。再者,由圖11可看出鍍膜分色鏡36相對紫外光有極高的反射率,因此鍍膜分色鏡36可提供針對紫外光及藍光的良好分光效率。再者,於一實施例中,如圖7所示,分色鏡36的紫外光入射面的背側表面可設一抗反射層36a以提高藍光穿透率,抗反射層36a於不同波長下的光穿透率的一例可如圖12所示。Figures 9 and 10 respectively show the transmittance of uncoated glass and the coated
圖13為本發明一實施例的投影鏡頭的示意圖。如圖13所示,投影鏡頭14包含一第一透鏡群110及一第二透鏡群120,第一透鏡群110包括沿光軸102從放大側OS往縮小側IS依序排列的第一透鏡L1以及第二透鏡L2,且第二透鏡群120包括從放大側OS往縮小側IS依序排列的第三透鏡L3、第四透鏡L4、第五透鏡L5、第六透鏡L6、第七透鏡L7、第七透鏡L8以及第九透鏡L9。第一透鏡L1至第九透鏡L9的屈光度分別為負、正、正、正、正、負、負、正、正。於本實施例中,第九透鏡L9為非球面透鏡,第五透鏡L5及第六透鏡L6可構成膠合透鏡,且光圈104可位於第二透鏡群120內的第三透鏡L3與第四透鏡L4之間。於本實施例中,投影鏡頭14的所有透鏡之中,於光閥106的光路上最靠近光閥106的透鏡為非球面透鏡(第九透鏡L9)。光閥106可將入射光調變成影像光,影像光依序通過玻璃蓋108及全反射稜鏡112、第二透鏡群120及第一透鏡群110。鏡頭14的透鏡及其周邊元件的設計參數如表一所示FIG. 13 is a schematic diagram of a projection lens according to an embodiment of the present invention. As shown in FIG. 13 , the
表一
表二列出本發明的鏡頭實施例中,非球面透鏡(第九透鏡L9)表面的各階非球面係數及二次曲面係數值。Table 2 lists the aspherical coefficients and quadratic coefficient values of each order on the surface of the aspherical lens (ninth lens L9) in the lens embodiment of the present invention.
表二
於本實施例中,投影鏡頭14的第九透鏡L9為具有鍍膜的玻璃模鑄透鏡,鍍膜例如可包含6層,下表三顯示依本發明一實施例的6層鍍膜的材料及個別厚度。In this embodiment, the ninth lens L9 of the
表 三
由上表可知,鍍膜材料為H4的鍍層厚度範圍為0.0138-0.0446微米(µm),且鍍膜材料為MgF2的鍍層厚度範圍為0.0127-0.0879微米(µm),且H4鍍層與MgF2鍍層可交替設置於最靠近縮小側IS的透鏡(例如第九透鏡L9)。As can be seen from the above table, the coating thickness range of H4 coating material is 0.0138-0.0446 microns (µm), and the coating thickness range of MgF2 coating material is 0.0127-0.0879 microns (µm), and H4 coating and MgF2 coating can be set alternately in The lens closest to the reduction side IS (for example, the ninth lens L9).
於本實施例中,具有表三的鍍膜結構的第九透鏡L9(非球面透鏡)於350nm-380nm 的波段的平均穿透率大於95.1%,於370nm-400nm的波段的平均穿透率大於98.3%,且於390nm-420nm 的波段平均穿透率大於98.6%。In this embodiment, the average transmittance of the ninth lens L9 (aspherical lens) with the coating structure in Table 3 is greater than 95.1% in the 350nm-380nm band, and the average transmittance in the 370nm-400nm band is greater than 98.3 %, and the average penetration rate in the 390nm-420nm band is greater than 98.6%.
再者,於一實施例中,投影鏡頭14的第一至第八透鏡L1-L8的表面可鍍有抗反射層,抗反射層可包含4層鍍膜材料或者5層鍍膜材料。4層鍍膜材料實施例的各層材料及膜厚如下表四所示,且不同波長下的反射率曲線如圖14所示,5層鍍膜材料實施例的各層材料及膜厚如下表5所示,且不同波長下的反射率曲線如圖15所示。由圖14及圖15可看出表四及表五界定的抗反射層實施例的反射率極低。Furthermore, in one embodiment, the surfaces of the first to eighth lenses L1 - L8 of the
表 四
表 五
由表四及表五可知,鍍膜材料為H4的鍍層厚度範圍為0.011-0.1177微米(µm),且鍍膜材料為MgF2的鍍層厚度範圍為0.0291-0.0879微米(µm)。It can be seen from Table 4 and Table 5 that the coating thickness range of H4 is 0.011-0.1177 microns (µm), and the coating thickness range of MgF2 is 0.0291-0.0879 microns (µm).
圖16及圖17顯示本發明的投影裝置的一應用實例的示意圖。於本實施例中,投影裝置1例如可設置於車內並投射影像至車窗讓人觀看,且不可見光反射層18可貼附於車窗外側以確保避免紫外光危害周遭的行人38。投影裝置1於車內的設置位置並不限定,例如可如圖16所示搭配穿透式螢光激發層16設於車內的頂部,或如圖17所示搭配反射式螢光激發層16設於車內的底部。16 and 17 show schematic diagrams of an application example of the projection device of the present invention. In this embodiment, for example, the
再者,於一實施例中,亦可藉由投影裝置的光路偏移(offset)設計,加大紫外光與螢光激發層16間的入射角度,使得未被吸收的紫外光穿透螢光激發層16或被螢光激發層16反射後,遠離人眼42的視角,達到保護效果。舉例而言,圖18、圖19及圖20分別顯示投影裝置的穿透光路未偏移、偏移100%、及偏移200%的設計,於此偏移量百分比例如可藉由改變數位微鏡裝置的微鏡傾斜角度來設定。如圖18至圖20所示,經投影鏡頭14成像的影像光直接穿透螢光激發層16,藉由調整光閥12(例如數位微鏡裝置)相對光軸的位置,可使穿透螢光激發層16的光路從圖18的未偏移至產生不同程度的偏移,當光路偏移程度大於如圖19所示的100%時,已可提供減少紫外光進入人眼42可能性的效果,當光路偏移程度達到如圖20所示的200%時,幾乎可完全避免紫外光進入人眼42。於一實施例中,穿透光路偏移100%例如可代表成像頂點與光軸的垂直距離為100%像高(圖19),穿透光路偏移200%例如可代表成像頂點與光軸的垂直距離為200%像高(圖20)。圖21、圖22及圖23為依本發明另一實施例,分別顯示投影裝置的反射光路未偏移、偏移100%、及偏移200%的設計。如圖21至圖23所示,經投影鏡頭14成像的影像光被螢光激發層16反射,藉由調整光閥12(例如DMD)相對光軸的位置,可使被螢光激發層16的反射光的光路從圖21的未偏移至產生不同程度的偏移,於本實施例中,當光路偏移程度如圖23所示的200%時,可幾乎完全避免紫外光進入人眼42。因此,可藉由投影裝置的光路偏移設計省略不可見光反射層18,且投影裝置的光路偏移(offset)程度可視實際應用環境調整而不限定。另外,上述光路的偏移設計可運用於本發明的不同實施例而不限定。Furthermore, in one embodiment, the incident angle between the ultraviolet light and the
雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed above in terms of preferred embodiments, they are not intended to limit the present invention. Anyone skilled in the art may make some modifications and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be subject to the scope of the patent application attached.
1、2、3:投影裝置
10:不可見光光源
10a:晶片
10b:封裝體
12:光閥
14:投影鏡頭
16:螢光激發層
18:不可見光反射層
20:可見光光源
22:準直透鏡
23、25:轉向鏡
24、26:透明基板
28:全反射稜鏡
32:靜態投影片
34:可見光反射層
36:分色鏡
36a:抗反射層
38:行人
42:人眼
102:光軸
104:光圈
106:光閥
108:玻璃蓋
110:第一透鏡群
112:全反射稜鏡
120:第二透鏡群
IB:藍光
IV:可見光
UV:紫外光
L1-L9:透鏡
IS:縮小側
OS:放大側
S1-S21:表面
1, 2, 3: Projection device
10: Invisible
圖1為本發明一實施例的投影裝置的概要示意圖。FIG. 1 is a schematic diagram of a projection device according to an embodiment of the present invention.
圖2及圖3顯示不可見光反射層與螢光激發層的不同配置實施例。Figures 2 and 3 show different configuration embodiments of the invisible light reflective layer and the fluorescent excitation layer.
圖4及圖5為顯示本發明一實施例的不可見光反射層於不同波長下的穿透率及反射率曲線圖。4 and 5 are graphs showing the transmittance and reflectivity of the invisible light reflective layer at different wavelengths according to an embodiment of the present invention.
圖6為本發明另一實施例的投影裝置的概要示意圖。FIG. 6 is a schematic diagram of a projection device according to another embodiment of the present invention.
圖7為本發明另一實施例的投影裝置的概要示意圖。FIG. 7 is a schematic diagram of a projection device according to another embodiment of the present invention.
圖8為本發明一實施例的紫外光通道及藍光通道的激發光譜示意圖。Figure 8 is a schematic diagram of the excitation spectra of the ultraviolet light channel and the blue light channel according to an embodiment of the present invention.
圖9顯示未鍍膜的玻璃相對藍光的穿透率曲線圖,圖10顯示鍍膜分色鏡相對藍光的穿透率曲線圖,圖11顯示鍍膜分色鏡相對紫外光的反射率曲線圖,圖12顯示抗反射層於不同波長下的光穿透率的一例。Figure 9 shows the transmittance curve of uncoated glass relative to blue light, Figure 10 shows the transmittance curve of coated dichroic mirror relative to blue light, Figure 11 shows the reflectivity curve of coated dichroic mirror relative to ultraviolet light, Figure 12 An example showing the light transmittance of the anti-reflection layer at different wavelengths.
圖13為本發明一實施例的投影鏡頭的示意圖。FIG. 13 is a schematic diagram of a projection lens according to an embodiment of the present invention.
圖14為本發明一實施例的透鏡抗反射層的反射率曲線圖。Figure 14 is a reflectivity curve of the anti-reflective layer of a lens according to an embodiment of the present invention.
圖15為本發明另一實施例的透鏡抗反射層的反射率曲線圖。FIG. 15 is a reflectance curve of a lens anti-reflection layer according to another embodiment of the present invention.
圖16及圖17顯示投影裝置的應用例的示意圖。16 and 17 show schematic diagrams of application examples of the projection device.
圖18、19及20分別顯示投影裝置的穿透光路未偏移、偏移100%、及偏移200%的設計實施例的示意圖。Figures 18, 19 and 20 respectively show schematic diagrams of design embodiments in which the transmitted light path of the projection device is not shifted, shifted by 100%, and shifted by 200%.
圖21、22及23分別顯示投影裝置的反射光路未偏移、偏移100%、及偏移200%的設計實施例的示意圖。Figures 21, 22 and 23 respectively show schematic diagrams of design embodiments in which the reflected light path of the projection device is not shifted, shifted by 100%, and shifted by 200%.
1:投影裝置 1: Projection device
10:不可見光光源 10:Invisible light source
10a:晶片 10a:wafer
10b:封裝體 10b:Package
12:光閥 12:Light valve
14:投影鏡頭 14:Projection lens
16:螢光激發層 16: Fluorescent excitation layer
18:不可見光反射層 18: Invisible light reflective layer
22:準直透鏡 22:Collimating lens
23、25:轉向鏡 23, 25: Steering mirror
IV:可見光 IV: visible light
UV:紫外光 UV: ultraviolet light
Claims (9)
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TW201329515A (en) * | 2012-01-10 | 2013-07-16 | Lite On Electronics Guangzhou | Mirror assembly for combining visible lights with filter function |
CN208255532U (en) * | 2018-05-31 | 2018-12-18 | 深圳疆程技术有限公司 | A kind of head up display based on laser light source |
US20200201156A1 (en) * | 2018-12-25 | 2020-06-25 | Seiko Epson Corporation | Light source apparatus and projector |
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TW201329515A (en) * | 2012-01-10 | 2013-07-16 | Lite On Electronics Guangzhou | Mirror assembly for combining visible lights with filter function |
CN208255532U (en) * | 2018-05-31 | 2018-12-18 | 深圳疆程技术有限公司 | A kind of head up display based on laser light source |
US20200201156A1 (en) * | 2018-12-25 | 2020-06-25 | Seiko Epson Corporation | Light source apparatus and projector |
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