TWI814965B - Perovskite precursor solution and manufacturing method of perovskite light-absorbing layer - Google Patents
Perovskite precursor solution and manufacturing method of perovskite light-absorbing layer Download PDFInfo
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
Description
本發明是有關於一種鈣鈦礦(perovskite)前驅物溶液,更特別是關於一種製備高效率太陽能電池鈣鈦礦吸收層的前驅物溶液。 The present invention relates to a perovskite precursor solution, and more particularly to a precursor solution for preparing a perovskite absorption layer for high-efficiency solar cells.
在化石能源消耗殆盡與環境問題惡化的今天,太陽能來源取之不盡,用之不竭,逐漸成為競相投入的市場。傳統的矽基太陽能電池,因造價高、耗能大,嚴重限制其發展;鈣鈦礦太陽能電池,因具有可見光區全範圍響應、良好的光生載子傳輸及原料廉價豐富等優勢,故成為研究的焦點。 Today, with the exhaustion of fossil energy and worsening environmental problems, solar energy sources are inexhaustible and have gradually become a market for competing investments. Traditional silicon-based solar cells have serious limitations on their development due to their high cost and large energy consumption. Perovskite solar cells have become a research topic due to their full range response in the visible light region, good photogenerated carrier transmission and cheap and abundant raw materials. focus.
近年來鈣鈦礦太陽能電池(perovskite solar cell)光電轉換效率已迅速突破20%,目前全球最高效率已達24.2%(KRICT,2019)。此外,鈣鈦礦具有能隙可調、吸收係數高,以及優異的載流子產生和分離的能力,未來亦有機會推廣到鈣鈦礦相關應用技術,例如:鈣鈦礦發光二極體、鈣鈦礦雷射、鈣鈦礦場效電晶體。 In recent years, the photoelectric conversion efficiency of perovskite solar cells has rapidly exceeded 20%, and the current highest efficiency in the world has reached 24.2% (KRICT, 2019). In addition, perovskite has adjustable energy gap, high absorption coefficient, and excellent carrier generation and separation capabilities. In the future, it will also have the opportunity to be promoted to perovskite-related application technologies, such as: perovskite light-emitting diodes, Perovskite laser, perovskite field effect transistor.
然而,鈣鈦礦吸收層的微結構、晶粒尺寸、晶界、孔洞密度、結晶品質、結晶優選方向等因素,將顯著影響太陽能電池的性能,且在鈣鈦礦製備過程中,膜層均勻性與薄膜微結構的調控對太陽能電池效率影響甚鉅。因此,亟需一種鈣鈦礦製備方法以提供良好光電轉化效率的鈣鈦礦吸收層。 However, factors such as the microstructure, grain size, grain boundaries, hole density, crystal quality, and preferred direction of crystallization of the perovskite absorber layer will significantly affect the performance of the solar cell, and during the perovskite preparation process, the film layer must be uniform The regulation of properties and thin film microstructure has a huge impact on the efficiency of solar cells. Therefore, a perovskite preparation method is urgently needed to provide a perovskite absorption layer with good photoelectric conversion efficiency.
第1A~1C圖為實施例與比較例的掃描式電子顯微鏡(SEM)照片。 Figures 1A to 1C are scanning electron microscope (SEM) photos of Examples and Comparative Examples.
第2圖為實施例及比較例的X-射線繞射分析(XRD)圖譜。 Figure 2 shows the X-ray diffraction analysis (XRD) patterns of the examples and comparative examples.
第3圖為實施例及比較例的光致發光(PL)圖譜。 Figure 3 shows the photoluminescence (PL) spectra of Examples and Comparative Examples.
第4圖為實施例及比較例的時間解析光激螢光(TRPL)圖譜。 Figure 4 shows the time-resolved photofluorescence (TRPL) spectra of Examples and Comparative Examples.
本揭露提供一種鈣鈦礦前驅物溶液,包含複數種鹵化物,AX及BX2用以形成化學式為ABX3的鈣鈦礦;第一溶劑;其中A為一價陽離子,B為二價陽離子,X為鹵素離子,其中第一溶劑包含二甲基亞碸(Dimethyl sulfoxide,DMSO)、二甲基甲醯胺(Dimethylformamide,DMF)、γ-丁內酯(GBL)、、N-甲基吡咯烷酮(NMP)、乙腈(ACN)、或上述之組合,第二溶劑包含氯苯(Chlorobenzene,CB)、水、乙醇(Ethanol)、異丙醇(iso-propanol,IPA)、甲苯(Toluene)、乙酸乙酯(Ethyl Acetate,EA)、碳酸二甲酯(DMC)、碳酸二乙酯(DC)、或上述之 組合,且其中該第一溶劑與第二溶劑的體積比介於1:0.01至1:0.2之間。 The present disclosure provides a perovskite precursor solution, including a plurality of halides, AX and BX 2 , to form a perovskite with a chemical formula of ABX 3 ; a first solvent; where A is a monovalent cation and B is a divalent cation, Where NMP), acetonitrile (ACN), or a combination of the above, the second solvent includes chlorobenzene (CB), water, ethanol (Ethanol), iso-propanol (IPA), toluene (Toluene), ethyl acetate Ethyl Acetate (EA), dimethyl carbonate (DMC), diethyl carbonate (DC), or a combination of the above, and the volume ratio of the first solvent to the second solvent is between 1:0.01 and 1: between 0.2.
本揭露另提供一種鈣鈦礦吸收層的製造方法,包括:提供一基板;添加一鈣鈦礦前驅物溶液於基板上;將鈣鈦礦前驅溶液進行第一次旋塗,以於基板上以形成鈣鈦礦薄膜;再將承載該鈣鈦礦薄膜的基板進行第二次旋塗,並添加反溶劑於該鈣鈦礦薄膜上;以及將承載鈣鈦礦薄膜的基板退火,以形成鈣鈦礦吸收層,其中該鈣鈦礦前驅溶液,包含:複數種鹵化物,AX及BX2用以形成化學式為ABX3的鈣鈦礦;第一溶劑;第二溶劑;以及其中A為一價陽離子,B為二價陽離子,X為鹵素離子,其中該第一溶劑包含二甲基甲醯胺、二甲基亞碸γ-丁內酯、)、、N-甲基吡咯烷酮、乙腈、或前述之組合,該第二溶劑包含氯苯、乙醇、異丙醇、甲苯、乙酸乙酯、碳酸二甲酯、碳酸二乙酯、或前述之組合,且其中該第一溶劑與第二溶劑的體積比介於1:0.01至1:0.20間。 The disclosure also provides a method for manufacturing a perovskite absorption layer, which includes: providing a substrate; adding a perovskite precursor solution on the substrate; spin-coating the perovskite precursor solution for the first time on the substrate. forming a perovskite film; then spin-coating the substrate carrying the perovskite film for a second time, and adding an antisolvent to the perovskite film; and annealing the substrate carrying the perovskite film to form a perovskite film Mineral absorption layer, wherein the perovskite precursor solution includes: a plurality of halides, AX and BX 2 to form a perovskite with a chemical formula of ABX 3 ; a first solvent; a second solvent; and wherein A is a monovalent cation , B is a divalent cation, and combination, the second solvent includes chlorobenzene, ethanol, isopropyl alcohol, toluene, ethyl acetate, dimethyl carbonate, diethyl carbonate, or a combination of the foregoing, and the volume ratio of the first solvent to the second solvent Between 1:0.01 and 1:0.20.
本揭露再提供一鈣鈦礦太陽能電池,包括具有導電層的基板;電子傳輸層,設置於基板上;鈣鈦礦吸收層,設置於電子傳輸層上;電洞傳輸層,設置於鈣鈦礦吸收層上,以及電極層,設置於電洞傳輸層上,其中鈣鈦礦吸收層的XRD圖譜在(220)結晶方向與(310)結晶方向的繞射峰強度比介於0.9至1.1之間。 The disclosure further provides a perovskite solar cell, including a substrate with a conductive layer; an electron transport layer disposed on the substrate; a perovskite absorption layer disposed on the electron transport layer; and a hole transport layer disposed on the perovskite The absorption layer and the electrode layer are arranged on the hole transport layer, in which the diffraction peak intensity ratio of the XRD pattern of the perovskite absorption layer in the (220) crystallization direction and the (310) crystallization direction is between 0.9 and 1.1. .
本揭露的一實施例提供一種鈣鈦礦吸收層的形成方法,包括:提供基板,添加包含複數種鹵化物、第一溶劑及第二溶劑的鈣鈦礦前驅物溶液於該玻璃基板上。在一實施例中,基板可為任何合適的基板,例如:玻璃基板、軟性基板或高分子基板,亦可為透明或不透明的硬性或軟性基板,但不限於此。複數種鹵化物包含AX及BX2,用以形成化學式為ABX3的鈣鈦礦。A為一價陽離子,例如:CH3NH3 +、CH3CH2NH3 +、CH(NH2)2 +、CH3(CH2)2NH3 +、CH3(CH2)3NH3 +、Cs+、或其組合,B為二價陽離子,例如:Pb2+、Sn2+、Ge2+、或前述組合,X為鹵素離子,例如:F-、Cl-、I-、Br-、或前述之組合。第一溶劑用於溶解鹵化物,第一溶劑可為γ-丁內酯、二甲基亞碸、二甲基甲醯胺、N-甲基吡咯烷酮、乙腈、或前述之組合,第二溶劑不與第一溶劑及鹵化物互溶,例如:包含氯苯、乙醇、異丙醇、甲苯、乙酸乙酯、碳酸二甲酯、碳酸二乙酯或前述之組合。 An embodiment of the present disclosure provides a method for forming a perovskite absorption layer, including: providing a substrate, and adding a perovskite precursor solution including a plurality of halides, a first solvent, and a second solvent on the glass substrate. In one embodiment, the substrate may be any suitable substrate, such as a glass substrate, a flexible substrate or a polymer substrate, or may be a transparent or opaque rigid or flexible substrate, but is not limited thereto. The plurality of halides include AX and BX 2 to form a perovskite with the chemical formula ABX 3 . A is a monovalent cation, for example: CH 3 NH 3 + , CH 3 CH 2 NH 3 + , CH(NH 2 ) 2 + , CH 3 (CH 2 ) 2 NH 3 + , CH 3 (CH 2 ) 3 NH 3 + , Cs + , or a combination thereof, B is a divalent cation, such as: Pb 2+ , Sn 2+ , Ge 2+ , or a combination thereof, and X is a halide ion, such as: F - , Cl - , I - , Br - , or a combination of the above. The first solvent is used to dissolve the halide. The first solvent can be γ-butyrolactone, dimethylsulfoxide, dimethylformamide, N-methylpyrrolidone, acetonitrile, or a combination of the above. The second solvent is not It is miscible with the first solvent and the halide, for example, it includes chlorobenzene, ethanol, isopropyl alcohol, toluene, ethyl acetate, dimethyl carbonate, diethyl carbonate or a combination of the above.
一實施例中,鹵化物添加量相對於第一溶劑及第二溶劑總體積的比例介於500至1200mg/ml之間,例如:600至1000mg/ml之間、或700至900mg/ml之間。另一些實施例中,第一溶劑中DMF與DMSO的體積比介於3.5:1至4.5:1間、或3.8:1至4.3:1間。 In one embodiment, the proportion of the halide addition amount relative to the total volume of the first solvent and the second solvent is between 500 and 1200 mg/ml, for example: between 600 and 1000 mg/ml, or between 700 and 900 mg/ml. . In other embodiments, the volume ratio of DMF to DMSO in the first solvent is between 3.5:1 and 4.5:1, or between 3.8:1 and 4.3:1.
然後,將鈣鈦礦前驅溶液進行塗佈於基板上,再將承載鈣鈦礦溶液的基板進行第一階段較低轉速旋塗(spin coating),這個步驟可以使得鈣鈦礦溶液佈滿基板上以形成一鈣鈦礦薄膜,之後接續第二階段較高轉速旋塗並在旋塗的過程中滴入反 溶劑於承載鈣鈦礦薄膜的基板上。以旋塗方式塗佈鈣鈦礦溶液可使鈣鈦礦結晶性佳、薄膜成長均勻,並可藉由低溫加熱燒結,使晶界與晶格缺陷減少,藉此達到良好之結晶性,最後形成厚度約250-350nm的鈣鈦礦吸收層。在一實施例中,第一階段旋塗的轉速,例如可為1000-3000rpm,時間可為5-15秒;第二階段旋塗的轉速可為4000-7000rpm,時間可例如為25-35秒。第一階段旋塗先將前驅物溶液佈滿整個基板。第二階段旋塗過程中添加反溶劑清洗使鈣鈦礦過飽和析出,反溶劑滴入的時間點,例如:第二階段旋塗結束前5-20秒;或10-15秒。在一些實施例中,反溶劑可包括二甲基亞碸、二甲基甲醯胺、氯苯、甲苯、正己烷、碘苯、二級丁醇、苯甲醚、乙酸乙酯、乙酸甲酯、異丙醇、或前述之組合。在一些實施例中,反溶劑的添加量可例如為100-300μl、或150-250μl。最後,再將承載該鈣鈦礦薄膜的基板退火,以形成鈣鈦礦吸收層。在一些實施例中,退火的溫度可為100-200℃、120-180℃、或140-160℃,退火時間可例如為40-70分鐘、或55-65分鐘。退火溫度太低,會有結晶性不佳的問題;退火溫度太高,會有PbI2二次相析出的問題。退火時間太短,會有結晶性不佳的問題;退火時間太長,會有PbI2二次相析出的問題。 Then, the perovskite precursor solution is coated on the substrate, and then the substrate carrying the perovskite solution is subjected to the first stage of low-speed spin coating. This step can make the perovskite solution cover the substrate. To form a perovskite film, the second stage is followed by spin coating at a higher speed, and during the spin coating process, the anti-solvent is dropped onto the substrate carrying the perovskite film. Coating the perovskite solution by spin coating can make the perovskite have good crystallinity and uniform film growth. It can also be sintered by low-temperature heating to reduce grain boundaries and lattice defects, thereby achieving good crystallinity and finally forming Perovskite absorption layer with a thickness of about 250-350nm. In one embodiment, the rotation speed of the first stage of spin coating can be, for example, 1000-3000 rpm, and the time can be 5-15 seconds; the rotation speed of the second stage spin coating can be 4000-7000 rpm, and the time can be, for example, 25-35 seconds. . In the first stage of spin coating, the precursor solution is spread over the entire substrate. During the second stage of spin coating, antisolvent cleaning is added to supersaturate the perovskite. The time at which the antisolvent is dripped is, for example: 5-20 seconds before the end of the second stage of spin coating; or 10-15 seconds. In some embodiments, the antisolvent may include dimethylsulfoxide, dimethylformamide, chlorobenzene, toluene, n-hexane, iodobenzene, secondary butanol, anisole, ethyl acetate, methyl acetate , isopropyl alcohol, or a combination of the above. In some embodiments, the amount of antisolvent added may be, for example, 100-300 μl , or 150-250 μl. Finally, the substrate carrying the perovskite film is annealed to form a perovskite absorption layer. In some embodiments, the annealing temperature may be 100-200°C, 120-180°C, or 140-160°C, and the annealing time may be, for example, 40-70 minutes, or 55-65 minutes. If the annealing temperature is too low, there will be a problem of poor crystallinity; if the annealing temperature is too high, there will be a problem of PbI 2 secondary phase precipitation. If the annealing time is too short, there will be a problem of poor crystallinity; if the annealing time is too long, there will be a problem of PbI 2 secondary phase precipitation.
本揭露另一實施例提供一鈣鈦礦太陽能電池,包括:一基板,具有一導電層;一電子傳輸層,設置於基板上。一實施例中,該基板可為任何合適的基板,例如:玻璃基板、軟性基板 或高分子基板,亦可為透明或不透明的硬性或軟性基板,但不限於此。另一實施例中,具有導電層的基板可為FTO基板、ITO基板、柔性導電基板、或前述組合。一實施例中,電子傳輸層的材料,包括TiO2、SnO2、PCBM、或前述組合。 Another embodiment of the present disclosure provides a perovskite solar cell, including: a substrate having a conductive layer; and an electron transport layer disposed on the substrate. In one embodiment, the substrate can be any suitable substrate, such as a glass substrate, a flexible substrate or a polymer substrate, or a transparent or opaque rigid or flexible substrate, but is not limited thereto. In another embodiment, the substrate with the conductive layer may be an FTO substrate, an ITO substrate, a flexible conductive substrate, or a combination of the foregoing. In one embodiment, the material of the electron transport layer includes TiO 2 , SnO 2 , PCBM, or a combination of the above.
並且,將鈣鈦礦吸收層,設置於該電子傳輸層上。 Furthermore, a perovskite absorption layer is provided on the electron transport layer.
一實施例中,鈣鈦礦吸收層的XRD圖譜在(220)結晶方向與(310)結晶方向的繞射峰強度比介於0.9至1.1之間。另一實施例中,該鈣鈦礦吸收層的XRD圖譜的2θ角在28.2度至28.8度及31.2至31.8度的繞射峰強度具有強吸收峰,且其在28.2度至28.8度與31.2度至31.8度繞射峰峰強度的比值介於0.95至1.05之間。再另一實施例中,該鈣鈦礦吸收層的XRD圖譜的2θ角在28.5度及31.8度的繞射峰強度有強吸收峰,且其在28.5度與31.8度繞射峰強度的比值介於0.97至1.03間。 In one embodiment, the intensity ratio of the diffraction peaks in the (220) crystallographic direction and the (310) crystallographic direction of the XRD pattern of the perovskite absorption layer is between 0.9 and 1.1. In another embodiment, the 2θ angle of the XRD pattern of the perovskite absorption layer has strong absorption peaks at 28.2 to 28.8 degrees and 31.2 to 31.8 degrees. The ratio of the peak intensity to the 31.8 degree diffraction peak is between 0.95 and 1.05. In another embodiment, the XRD pattern of the perovskite absorption layer has strong absorption peaks at 2θ angles at 28.5 degrees and 31.8 degrees, and the ratio of the diffraction peak intensities at 28.5 degrees and 31.8 degrees is between Between 0.97 and 1.03.
再將電洞傳輸層,設置於鈣鈦礦吸收層上,一實施例中,電洞傳輸層的材料,包括Spiro-MeOTAD、PEDOT:PSS、NiOx或前述組合。 The hole transport layer is then disposed on the perovskite absorption layer. In one embodiment, the material of the hole transport layer includes Spiro-MeOTAD, PEDOT:PSS, NiOx or a combination of the above.
最後,將電極層,設置於電洞傳輸層上。一實施例中,電極層的材料,包括Au、Ag、Cu、或前述組合。 Finally, the electrode layer is placed on the hole transport layer. In one embodiment, the material of the electrode layer includes Au, Ag, Cu, or a combination of the foregoing.
為讓本揭露之上述內容和其他目的、特徵、和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下: In order to make the above content and other objects, features, and advantages of the present disclosure more obvious and understandable, preferred embodiments are listed below and described in detail with the accompanying drawings:
實施例1 Example 1
將CH3NH3Br(MABr)11.9mg、PbBr2 39mg、HC(NH2)2I(FAI)98.59mg、PbI2 277.6mg、CsI 9.74mg加入溶劑組成DMF、DMSO及CB體積比為800:200:20的溶劑中,以配置鈣鈦礦溶液520μl。 Add CH 3 NH 3 Br (MABr) 11.9 mg, PbBr 2 39 mg, HC (NH 2 ) 2 I (FAI) 98.59 mg, PbI 2 277.6 mg, and CsI 9.74 mg to the solvent to form DMF, DMSO, and CB. The volume ratio is 800: 200:20 solvent to prepare 520 μl of perovskite solution.
實施例2 Example 2
以實施例1的步驟配置鈣鈦礦前驅溶液,但溶劑組成調整為DMF、DMSO及CB體積比為800:200:40。 The perovskite precursor solution was prepared according to the steps of Example 1, but the solvent composition was adjusted to a volume ratio of DMF, DMSO and CB of 800:200:40.
實施例3 Example 3
以實施例1的步驟配置鈣鈦礦前驅溶液,但溶劑組成調整為DMF、DMSO及CB體積比為800:200:80。 The perovskite precursor solution was prepared according to the steps of Example 1, but the solvent composition was adjusted to a volume ratio of DMF, DMSO and CB of 800:200:80.
實施例4 Example 4
以實施例1的步驟配置鈣鈦礦前驅溶液,但溶劑組成調整為DMF、DMSO及CB體積比為800:200:120。 The perovskite precursor solution was prepared according to the steps of Example 1, but the solvent composition was adjusted to a volume ratio of DMF, DMSO and CB of 800:200:120.
比較例1 Comparative example 1
以實施例1的步驟配置鈣鈦礦前驅溶液,但是不添加氯苯。 The perovskite precursor solution was prepared according to the steps of Example 1, but no chlorobenzene was added.
旋塗鈣鈦礦薄膜 Spin-coated perovskite films
將實施例1~4及比較例1的鈣鈦礦前驅溶液以1950-2050rpm的轉速旋塗8-12秒以塗佈鈣鈦礦前驅溶液於FTO玻璃基板上,接著以5900-6100rpm連續旋塗28-33秒。並於旋塗製程結束前10-15秒,將反溶劑135-165μl氯苯滴在基板上,再將鈣鈦礦薄膜基板在100-200℃下退火55-65分鐘以進行長晶製程, 最後形成鈣鈦礦吸光層薄膜。 The perovskite precursor solutions of Examples 1 to 4 and Comparative Example 1 were spin-coated at a rotation speed of 1950-2050 rpm for 8-12 seconds to coat the perovskite precursor solution on the FTO glass substrate, and then continuously spin-coated at a speed of 5900-6100 rpm. 28-33 seconds. And 10-15 seconds before the end of the spin coating process, drop 135-165 μl chlorobenzene of the anti-solvent on the substrate, and then anneal the perovskite film substrate at 100-200°C for 55-65 minutes to perform the crystal growth process. , and finally form a perovskite light-absorbing layer film.
實施例與比較例的前驅液溶劑組成整理如表一。 The precursor solvent compositions of the examples and comparative examples are summarized in Table 1.
圖1A~C為以電子掃描顯微鏡(SEM)觀察實施例與比較例經兩階段旋塗及加熱處理後的鈣鈦礦薄膜,其晶粒成長狀況。圖1A顯示,比較例1中的晶粒尺寸約50-300nm,且晶粒尺寸分布較不均勻;圖1B顯示,實施例1其晶粒尺寸約介於200-500nm,且相較於比較例1,其晶粒成長狀況較佳且其大晶粒較多;圖1C顯示,實施例3,其晶粒尺寸約介於200-500nm且相較於實施例1,其晶粒成長狀更況較佳且呈現大晶粒成長趨勢。此為,前驅液溶劑中添加氯苯(CB)有助於預孕晶核,利於晶粒成長。當氯苯含量低時,效果不顯著;當氯苯含量提高至一定比例,可顯著地促進晶粒成核成長。 Figures 1A to 1C show the grain growth status of the perovskite films of the Examples and Comparative Examples after two-stage spin coating and heat treatment using a scanning electron microscope (SEM). Figure 1A shows that the grain size in Comparative Example 1 is about 50-300nm, and the grain size distribution is relatively uneven; Figure 1B shows that the grain size in Example 1 is about 200-500nm, and compared with the Comparative Example 1. The grain growth is better and there are more large grains; Figure 1C shows that the grain size of Example 3 is about 200-500nm and compared with Example 1, the grain growth is better It is better and shows a tendency of large grain growth. This is because adding chlorobenzene (CB) to the precursor solvent helps to pre-pregnate crystal nuclei and facilitate crystal grain growth. When the chlorobenzene content is low, the effect is not significant; when the chlorobenzene content is increased to a certain proportion, it can significantly promote grain nucleation and growth.
圖2為實施例1、3及比較例1的鈣鈦礦薄膜經兩階段旋塗及加熱處理後的XRD圖譜,XRD圖譜可用以判斷結晶方向與品質。圖2圖譜顯示,當溶劑中CB的含量增加,XRD圖譜的2θ角在28.2度至28.8度的繞射峰強度有強吸收,即在(220)結晶方向有強吸收,並且,在31.2至31.8度間的繞射峰強度有強吸收,即在 (310)結晶方向有強吸收。而且,(220)結晶方向與(310)結晶方向的繞射峰強度比值介0.9至1.1之間,XRD圖譜的2θ角在28.2度至28.8度的繞射峰強度與31.2度及31.8度的繞射峰強度的比值介於0.95至1.05之間。比較例1溶劑中不含氯苯,XRD圖譜中(220)/(310)兩結晶方向的繞射峰強度比小於0.9。此外,當溶劑中包含氯苯且含量提升時,如實施例3,其13.7度至14.3度的繞射峰,即(110)結晶方向,其訊號較為對稱,顯示其膜層品質較佳。 Figure 2 shows the XRD patterns of the perovskite films of Examples 1, 3 and Comparative Example 1 after two-stage spin coating and heat treatment. The XRD patterns can be used to determine the crystallization direction and quality. Figure 2 shows that when the CB content in the solvent increases, the 2θ angle of the XRD pattern has strong absorption at the diffraction peak intensity of 28.2 degrees to 28.8 degrees, that is, there is strong absorption in the (220) crystallographic direction, and, between 31.2 and 31.8 The diffraction peak intensity between degrees has strong absorption, that is, between (310) There is strong absorption in the crystallographic direction. Moreover, the ratio of the diffraction peak intensity of the (220) crystallographic direction to the (310) crystallographic direction is between 0.9 and 1.1. The diffraction peak intensity of the XRD pattern at a 2θ angle of 28.2 degrees to 28.8 degrees is consistent with the diffraction peak intensity of 31.2 degrees and 31.8 degrees. The ratio of emission peak intensities ranges from 0.95 to 1.05. The solvent of Comparative Example 1 does not contain chlorobenzene, and the intensity ratio of the diffraction peaks in the (220)/(310) crystallographic directions in the XRD pattern is less than 0.9. In addition, when the solvent contains chlorobenzene and the content is increased, as in Example 3, the diffraction peak of 13.7 degrees to 14.3 degrees, that is, the (110) crystallization direction, the signal is more symmetrical, indicating that the film quality is better.
圖3為實施例1~3及比較例1的鈣鈦礦薄膜經兩階段旋塗及加熱處理後的PL圖譜。實施例1圖譜顯示能隙中有其他缺陷存在,且存在sub-band,使得訊號紅移;實施例2,氯苯的添加量略微增加,膜層特性變好且能隙中的缺陷變少,因此PL訊號降低,顯示載子傳輸良好;實施例3,氯苯的添加量再增加,可確認缺陷大幅減少,推測為膜層晶粒變大,存在於晶界的缺陷變少,且晶粒內部較為完美,雜質存在較少,因此PL訊號大幅降低。 Figure 3 is the PL spectrum of the perovskite films of Examples 1 to 3 and Comparative Example 1 after two-stage spin coating and heat treatment. The spectrum of Example 1 shows that there are other defects in the energy gap, and there are sub-bands, which causes the signal to be red-shifted. In Example 2, the addition amount of chlorobenzene is slightly increased, the film properties become better and the defects in the energy gap become fewer. Therefore, the PL signal decreases, indicating that the carrier transmission is good; in Example 3, the addition amount of chlorobenzene is further increased, and it can be confirmed that the defects are significantly reduced. It is speculated that the film grains become larger, the defects existing in the grain boundaries decrease, and the grains The interior is more perfect and there are fewer impurities, so the PL signal is greatly reduced.
鈣鈦礦太陽能電池製作 Perovskite solar cell production
FTO玻璃清洗 FTO glass cleaning
將FTO玻璃(NSG-10)在超聲波裝置分別依序以Triton X100(1vol%/去離子水)、去離子水、丙酮和乙醇進行清洗,四步驟各20分鐘。再利用鋅粉和HCl溶液對FTO玻璃進行化學蝕刻以定義電極及鈣鈦礦吸收層的位置。 Clean the FTO glass (NSG-10) in an ultrasonic device with Triton X100 (1vol%/deionized water), deionized water, acetone and ethanol in sequence for 20 minutes each. Zinc powder and HCl solution are then used to chemically etch the FTO glass to define the positions of the electrodes and perovskite absorption layer.
TiO2/SnO2電子傳輸層 TiO 2 /SnO 2 electron transport layer
以噴霧熱解法在450~500℃下以二異丙醇鈦溶解 在乙醇中的溶液沉積c-TiO2層,並於450℃下退火。再以SnCl2.2H2O溶液以3500-4000rpm速率進行旋塗以形成TiO2/SnO2電子傳輸層,再將薄膜退火。在退火過程之後,立即將基板轉移到手套箱中以防止水分對結晶度和薄膜質量的影響。 A c-TiO 2 layer was deposited with a solution of titanium diisopropoxide dissolved in ethanol at 450~500°C by spray pyrolysis and annealed at 450°C. Then use SnCl 2 . The 2H 2 O solution is spin-coated at a speed of 3500-4000 rpm to form a TiO 2 /SnO 2 electron transport layer, and then the film is annealed. After the annealing process, the substrates were immediately transferred to the glove box to prevent the influence of moisture on the crystallinity and film quality.
旋塗鈣鈦礦吸收層 Spin-coated perovskite absorber layer
將不同組成的鈣鈦礦前驅物溶液以1950-2050rpm的轉速旋塗8-12秒以塗佈鈣鈦礦前驅溶液於FTO玻璃基板上,接著以5900-6100rpm連續旋塗28-33秒。並於旋塗製程結束前10-15秒,將反溶劑135-165μl氯苯滴在基板上,再將鈣鈦礦薄膜基板在100-200℃下退火55-65分鐘以進行長晶製程,最後形成鈣鈦礦吸光層薄膜。 Perovskite precursor solutions of different compositions were spin-coated at 1950-2050 rpm for 8-12 seconds to coat the perovskite precursor solution on the FTO glass substrate, and then continuously spin-coated at 5900-6100 rpm for 28-33 seconds. And 10-15 seconds before the end of the spin coating process, drop 135-165 μl chlorobenzene of the anti-solvent on the substrate, and then anneal the perovskite film substrate at 100-200°C for 55-65 minutes to perform the crystal growth process. , and finally form a perovskite light-absorbing layer film.
Spiro-OMeTAD電洞傳輸層 Spiro-OMeTAD hole transport layer
將Spiro-OMeTAD溶解在氯苯中並加入雙(三氟甲基磺酰基)亞胺鋰鹽(Li-TFSI,Sigma-Aldrich)的乙腈溶液和4-叔丁基吡啶(Sigma-Aldrich)溶液以製備電洞傳輸層溶液。再將Spiro溶液以3500-4000rpm旋塗20-30秒,以形成Spiro-OMeTAD電洞傳輸層。 Dissolve Spiro-OMeTAD in chlorobenzene and add a solution of lithium bis(trifluoromethylsulfonyl)imide (Li-TFSI, Sigma-Aldrich) in acetonitrile and 4-tert-butylpyridine (Sigma-Aldrich) to Prepare the hole transport layer solution. Then spin-coat the Spiro solution at 3500-4000rpm for 20-30 seconds to form the Spiro-OMeTAD hole transport layer.
背電極層 back electrode layer
蒸鍍80nm的金作為背電極。 80nm gold was evaporated as the back electrode.
實施例5 Example 5
將實施例1的鈣鈦礦前驅物溶液,依上述鈣鈦礦太陽能電池製法製作太陽能電池。 The perovskite precursor solution of Example 1 was used to prepare a solar cell according to the above-mentioned perovskite solar cell manufacturing method.
實施例6 Example 6
將實施例2的鈣鈦礦前驅物溶液,依上述鈣鈦礦太陽能電池製法製作太陽能電池。 The perovskite precursor solution of Example 2 was used to prepare a solar cell according to the above-mentioned perovskite solar cell manufacturing method.
實施例7 Example 7
將實施例3的鈣鈦礦前驅物溶液依,上述鈣鈦礦太陽能電池製法製作太陽能電池。 The perovskite precursor solution of Example 3 was used to prepare a solar cell according to the above-mentioned perovskite solar cell manufacturing method.
比較例2 Comparative example 2
將比較例1的鈣鈦礦前驅物溶液,依上述鈣鈦礦太陽能電池製法製作太陽能電池。 The perovskite precursor solution of Comparative Example 1 was used to prepare a solar cell according to the above-mentioned perovskite solar cell manufacturing method.
量測實施例5~7及比較例2的太陽能電池之短路電流密度Jsc、開路電壓Voc、填充因子FF及光電轉換效率PCE,並整理如表二。 The short-circuit current density Jsc, open-circuit voltage Voc, fill factor FF and photoelectric conversion efficiency PCE of the solar cells of Examples 5 to 7 and Comparative Example 2 were measured and summarized in Table 2.
表二結果顯示,隨著前驅物溶液中CB溶劑增加,短路電流密度Jsc、開路電壓Voc皆有微幅提升,此外,填充因子FF及光電轉換效率PCE有顯著增加趨勢,顯示前驅物溶液中CB溶劑增 加有助於提升薄膜整體品質,因而,提升光電轉換效率。 The results in Table 2 show that as the CB solvent in the precursor solution increases, the short-circuit current density Jsc and open-circuit voltage Voc increase slightly. In addition, the filling factor FF and the photoelectric conversion efficiency PCE have a significant increasing trend, showing that the CB in the precursor solution Solvent-increasing Adding helps to improve the overall quality of the film, thus improving the photoelectric conversion efficiency.
實施例8 Example 8
以DMF、DMSO及EA體積比為800:200:20的鈣鈦礦前驅物溶液,依上述鈣鈦礦太陽能電池製法製作太陽能電池。 Using a perovskite precursor solution with a volume ratio of DMF, DMSO and EA of 800:200:20, a solar cell was produced according to the above perovskite solar cell manufacturing method.
實施例9 Example 9
以DMF、DMSO及EA體積比為800:200:80的鈣鈦礦前驅物溶液,依上述鈣鈦礦太陽能電池製法製作太陽能電池。 Using a perovskite precursor solution with a volume ratio of DMF, DMSO and EA of 800:200:80, a solar cell was produced according to the above perovskite solar cell manufacturing method.
比較例3 Comparative example 3
以DMF、DMSO及EA體積比為800:200:0的鈣鈦礦前驅物溶液,依上述鈣鈦礦太陽能電池製法製作太陽能電池。 Using a perovskite precursor solution with a volume ratio of DMF, DMSO and EA of 800:200:0, a solar cell was produced according to the above perovskite solar cell manufacturing method.
量測實施例5及比較例2太陽能電池的短路電流密度Jsc、開路電壓Voc、填充因子FF及光電轉換效率PCE,接著,將實施例5及比較例2的樣品同時放入空氣環境乾燥箱內(濕度:30-40%),經過264hrs後,再重複量測其Voc、Jsc、F.F.及光電轉換效率PCE,結果如表三。結果顯示,未添加CB溶劑之傳統鈣鈦礦配方,其效率由12.75%提升至13.59%約提6.5%,而添加CB溶劑之鈣鈦礦元件,其效率由13.47%提升至15.73%約提升16.7%。 The short-circuit current density Jsc, open circuit voltage Voc, fill factor FF and photoelectric conversion efficiency PCE of the solar cells of Example 5 and Comparative Example 2 were measured. Then, the samples of Example 5 and Comparative Example 2 were placed into an air environment drying box at the same time. (Humidity: 30-40%), after 264hrs, repeat the measurement of Voc, Jsc, F.F. and photoelectric conversion efficiency PCE. The results are shown in Table 3. The results show that the efficiency of the traditional perovskite formula without adding CB solvent increased from 12.75% to 13.59% by about 6.5%, while the efficiency of the perovskite device adding CB solvent increased from 13.47% to 15.73% by about 16.7%. %.
表三
量測實施例8~9及比較例3太陽能電池的短路電流密度Jsc、開路電壓Voc、填充因子FF及光電轉換效率PCE,並整理如表四。 The short-circuit current density Jsc, open-circuit voltage Voc, fill factor FF and photoelectric conversion efficiency PCE of the solar cells of Examples 8 to 9 and Comparative Example 3 were measured and summarized in Table 4.
表四結果顯示,隨著前驅物溶液中EA溶劑增加,短路電流密度Jsc、開路電壓Voc皆有微幅提升,此外,填充因子FF有顯著增加趨勢,顯示前驅物溶液中CB溶劑增加有助於提升薄膜整體品質。另外,前驅物溶液中添加EA,亦有助於提升光電轉換效率。 The results in Table 4 show that as the EA solvent in the precursor solution increases, the short-circuit current density Jsc and open circuit voltage Voc increase slightly. In addition, the filling factor FF has a significant increasing trend, showing that the increase in CB solvent in the precursor solution helps Improve the overall quality of the film. In addition, adding EA to the precursor solution also helps to improve the photoelectric conversion efficiency.
製備時間解析光激螢光(Time-Resolved Photoluminescence,TRPL)試驗試片 Preparation of time-resolved photoluminescence (TRPL) test specimens
實施例10 Example 10
將實施例1的鈣鈦礦前驅溶液(DMF:DMSO:CB=800:200:20)以1950-2050rpm的轉速旋塗5-15秒以塗佈鈣鈦礦前驅溶液於透明石英基板上,並將承載鈣鈦礦吸收層薄膜的透明石英基板及鈣鈦礦吸收層薄膜進行封裝,以完成TRPL試片製備。 Spin-coat the perovskite precursor solution of Example 1 (DMF: DMSO: CB=800:200:20) at a rotation speed of 1950-2050 rpm for 5-15 seconds to coat the perovskite precursor solution on the transparent quartz substrate, and The transparent quartz substrate carrying the perovskite absorption layer film and the perovskite absorption layer film are encapsulated to complete the preparation of the TRPL test piece.
實施例11 Example 11
以實施例10的步驟製備TRPL試片,但將鈣鈦礦前驅溶液組成調整為DMF:DMSO:CB=800:200:80。 A TRPL test piece was prepared according to the steps of Example 10, but the composition of the perovskite precursor solution was adjusted to DMF:DMSO:CB=800:200:80.
比較例4 Comparative example 4
以實施例10的步驟製備TRPL試片,但將鈣鈦礦前驅溶液組成調整為DMF:DMSO:CB=800:200:0。 A TRPL test piece was prepared according to the steps of Example 10, but the composition of the perovskite precursor solution was adjusted to DMF:DMSO:CB=800:200:0.
時間解析光激螢光試驗 Time-resolved photofluorescence test
量測系統架設方式說明如下,從375nm脈衝雷射發出光源,經由光纖傳導進入雷射準直徑,雷射由側向斜射至試片,並調整焦距使其聚焦於試片表面,試片上的薄膜吸收雷射光後,放出較長波長的螢光,螢光進入光學顯微鏡後,經光纖傳導至光電倍增管,光電倍增管收到訊號後傳回電腦,若將光先導入分光儀後再進入光電倍增管,則可量測單一波長的螢光生命期。值得注意的是,此種量測方式採用時間相關單光子計數系統(Time-corrected Single Photon Counting System,TCSPC),因此雷射源也要與電腦連接,讓系統得知脈衝發出時的起始時間,接著系統測得脈衝 發出後多久收到光電子訊號,不斷重複後將所有訊息加總,即可得放光強度隨時間衰退圖。放光強度衰退圖可透過函數擬和計算出生命期。螢光生命期可用來判斷材料內部缺陷情況,一般生命期越長,代表載子因被陷阱態捕捉造成的再結合較少,而認為材料缺陷較少。 The measurement system is set up as follows. The light source is emitted from a 375nm pulse laser and transmitted through the optical fiber into the laser quasi-diameter. The laser is emitted obliquely from the side to the test piece, and the focal length is adjusted to focus on the surface of the test piece. The film on the test piece After absorbing the laser light, it emits fluorescent light with a longer wavelength. After the fluorescent light enters the optical microscope, it is transmitted to the photomultiplier tube through the optical fiber. The photomultiplier tube receives the signal and then transmits it back to the computer. If the light is first introduced into the spectrometer and then into the photoelectric A multiplier tube can measure the fluorescence lifetime of a single wavelength. It is worth noting that this measurement method uses a time-corrected single photon counting system (TCSPC), so the laser source must also be connected to the computer to allow the system to know the starting time when the pulse is emitted. , then the system measures the pulse How long does it take to receive the photoelectron signal after it is sent out? After repeated repetitions and adding up all the messages, you can get a graph of the decay of the light intensity over time. The lifetime of the luminous intensity decay diagram can be calculated by function fitting. The fluorescence lifetime can be used to judge the internal defects of the material. Generally, the longer the lifetime, it means that the carriers are less recombined due to being captured by the trap state, and it is considered that the material has fewer defects.
自由載子壽命分析結果,如第4圖所示,於前驅物溶液中添加不同CB含量(CB 20、CB 80),其光強度衰退相較於比較例(CB 0)較慢,意即,添加CB且隨著添加量的增加,自由載子壽命則越長。
The free carrier lifetime analysis results are shown in Figure 4. When different CB contents (
雖然本揭露已以數個較佳實施例揭露如上,然其並非用以限定本揭露,任何所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作任意之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present disclosure has been disclosed in several preferred embodiments, this is not intended to limit the disclosure. Anyone with ordinary knowledge in the art may make any changes without departing from the spirit and scope of the disclosure. and modifications, therefore the scope of protection of this disclosure shall be subject to the scope of the patent application attached.
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