TWI810741B - Nickel-based detection substrate having high surface-enhanced raman scattering and manufacturing method thereof - Google Patents

Nickel-based detection substrate having high surface-enhanced raman scattering and manufacturing method thereof Download PDF

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TWI810741B
TWI810741B TW110146088A TW110146088A TWI810741B TW I810741 B TWI810741 B TW I810741B TW 110146088 A TW110146088 A TW 110146088A TW 110146088 A TW110146088 A TW 110146088A TW I810741 B TWI810741 B TW I810741B
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substrate
nickel
raman scattering
enhanced raman
detection
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TW202323798A (en
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王瑞琪
林嘉靚
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國立高雄大學
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Abstract

The present invention discloses a nickel-based detection substrate having high surface-enhanced raman scattering and its manufacturing method. A surface of a conductive substrate is roughen to obtain a rough surface, and a chemical nickel layer is disposed onto the rough surface to obtain the detection substrate having high surface-enhanced raman scattering. The chemical nickel layer comprises nickel and phosphorus. The conductive substrate is metal substrate or semiconductor substrate. The nickel-based detection substrate having high surface-enhanced raman scattering of present invention can be used to detect multiple substances and reused, and has high detection sensitivity. Thherefore, the present invention has excellent applicability.

Description

含鎳基之高表面增強拉曼散射檢測基板及其製作方法High surface-enhanced Raman scattering detection substrate containing nickel base and its manufacturing method

本發明關於一種含鎳基之高表面增強拉曼散射檢測基板及其製作方法,所製備的檢測基板具有高靈敏性以及廣泛的應用性。The invention relates to a nickel-based high-surface-enhanced Raman scattering detection substrate and a manufacturing method thereof. The prepared detection substrate has high sensitivity and wide applicability.

拉曼散射(Raman scattering)光譜是指當原子或分子吸收光子能量後,使原子或是分子之間發生能量轉移,導致散射後光子頻率改變的現象,因為不同的物質具有不同的拉曼光譜,因此拉曼光譜也可以應用於偵測不同的物質或是分子結構,但是物質的自發拉曼光譜通常較為微弱,進而提高物質檢測的難度;而表面增強拉曼散射(Surface-Enhanced Raman Scattering,SERS)是指通過吸附在粗糙金屬表面上的分子或電漿體磁性二氧化矽奈米管等奈米結構、以增強拉曼散射的表面敏感技術,因此可以放大拉曼訊號、以降低物質檢測的難度。目前表面增強拉曼散射可被應用於環境物質檢測或是生物分子檢測等不同領域,例如中華民國第TW I619938B號專利便是利用表面增強拉曼散射技術與體外偵測癌細胞。Raman scattering (Raman scattering) spectrum refers to the phenomenon that when atoms or molecules absorb photon energy, energy transfer occurs between atoms or molecules, resulting in the change of photon frequency after scattering, because different substances have different Raman spectra, Therefore, Raman spectroscopy can also be used to detect different substances or molecular structures, but the spontaneous Raman spectrum of substances is usually relatively weak, which increases the difficulty of substance detection; while Surface-Enhanced Raman Scattering (SERS) ) refers to a surface-sensitive technology that enhances Raman scattering by adsorbing molecules or nanostructures such as plasmonic magnetic silicon dioxide nanotubes on rough metal surfaces, so that Raman signals can be amplified to reduce the detection of substances difficulty. Currently, surface-enhanced Raman scattering can be used in different fields such as environmental substance detection or biomolecular detection. For example, the Republic of China Patent No. TW I619938B uses surface-enhanced Raman scattering technology to detect cancer cells in vitro.

然而,目前表面增強拉曼散射基板大多使用金或是銀等貴金屬製作,成本都相當高昂,且製作方法也較為繁複,例如中華民國專利第TW I612290B號專利揭露的製備方法,包含濺鍍一金屬奈米薄膜於一基底;再雷射轟擊金屬奈米薄膜成不連續密集排列的複數個金屬奈米粒子,其中的金屬奈米粒子便是使用金奈米粒子或者銀奈米粒子。因此目前表面增強拉曼散射基板的製備成本較高昂,也限制了表面增強拉曼散射基板的靈敏度以及被應用的廣泛性。However, at present, surface-enhanced Raman scattering substrates are mostly made of precious metals such as gold or silver, and the cost is quite high, and the manufacturing method is relatively complicated. Nano film on a substrate; then laser bombards the metal nano film to form a plurality of discontinuous and densely arranged metal nanoparticles, among which the metal nanoparticles are gold nanoparticles or silver nanoparticles. Therefore, the current preparation cost of surface-enhanced Raman scattering substrates is relatively high, which also limits the sensitivity and wide application of surface-enhanced Raman scattering substrates.

今,發明人有鑑於現有檢測基板於實際使用時仍有可改進之處,於是乃一本孜孜不倦之精神,並藉由其豐富專業知識及多年之實務經驗所輔佐,而加以改善,並據此研創出本發明。Today, in view of the fact that the existing detection substrates still have room for improvement in actual use, the inventor is a tireless spirit, assisted by his rich professional knowledge and many years of practical experience, and improved it, and based on this Research and create the present invention.

本發明關於一種含鎳基之高表面增強拉曼散射(Surface-enhanced Raman spectroscopy,縮寫為SERS)檢測基板及其製作方法,含鎳基之高表面增強拉曼散射檢測基板包含一導體基板以及設置於該導體基板上的一化學鎳層,導體基板具有一粗糙表面,且化學鎳層係設置於導體基板的粗糙表面上,其中該化學鎳層包含鎳與磷。The present invention relates to a nickel-based high surface-enhanced Raman scattering (Surface-enhanced Raman spectroscopy, abbreviated as SERS) detection substrate and a manufacturing method thereof. The nickel-based high surface-enhanced Raman scattering detection substrate includes a conductor substrate and a device An chemical nickel layer on the conductive substrate, the conductive substrate has a rough surface, and the chemical nickel layer is arranged on the rough surface of the conductive substrate, wherein the chemical nickel layer includes nickel and phosphorus.

於本發明之一實施例中,導體基板為金屬基板或是半導體基板。In one embodiment of the present invention, the conductive substrate is a metal substrate or a semiconductor substrate.

於本發明之一實施例中,金屬基板為黃銅基板。In one embodiment of the invention, the metal substrate is a brass substrate.

於本發明之一實施例中,金屬基板的粗糙表面,是以磨砂方法、噴砂方法或是氣相蝕刻方法所製作。In one embodiment of the present invention, the rough surface of the metal substrate is made by a frosting method, a sandblasting method or a vapor phase etching method.

於本發明之一實施例中,化學鎳層包含80-85 wt%的鎳與10-12 wt%的磷。In an embodiment of the present invention, the chemical nickel layer includes 80-85 wt% nickel and 10-12 wt% phosphorus.

本發明之含鎳基之高表面增強拉曼散射檢測基板的製作方法,包含:步驟一,取一導體基板,並在導體基板的一表面進行粗糙化處理,以使導體基板具有一粗糙表面;步驟二,於導體基板的該粗糙表面設置一化學鎳層,以獲得該高表面增強拉曼散射檢測基板。The manufacturing method of the high-surface-enhanced Raman scattering detection substrate containing nickel base of the present invention comprises: step 1, taking a conductor substrate, and performing roughening treatment on a surface of the conductor substrate, so that the conductor substrate has a rough surface; Step 2, disposing an electroless nickel layer on the rough surface of the conductive substrate to obtain the high surface enhanced Raman scattering detection substrate.

於本發明之一實施例中,導體基板為金屬基板或是半導體基板,當導體基板為金屬基板時,步驟一中使用磨砂方法、噴砂方法或是氣相蝕刻方法進行該金屬基板的粗糙化處理;又金屬基板為黃銅基板。In one embodiment of the present invention, the conductive substrate is a metal substrate or a semiconductor substrate. When the conductive substrate is a metal substrate, the roughening treatment of the metal substrate is performed in step 1 by using a sandblasting method, a sandblasting method or a vapor phase etching method. ; And the metal substrate is a brass substrate.

於本發明之一實施例中,步驟二中,係將具有粗糙表面的導體基板浸泡於一鍍液中,於溫度80-100℃條件下作用,以於導體基板的粗糙表面設置該化學鎳層,其中鍍液含有硫酸鎳、檸檬酸鈉以及次亞磷酸鈉,且酸鹼值介於pH4-6。In one embodiment of the present invention, in the second step, the conductive substrate with a rough surface is soaked in a plating solution, and the chemical nickel layer is provided on the rough surface of the conductive substrate at a temperature of 80-100°C. , wherein the plating solution contains nickel sulfate, sodium citrate and sodium hypophosphite, and the pH value is between pH4-6.

於本發明之一實施例中,步驟二的作用溫度為88℃,鍍液的酸鹼值為pH5。In one embodiment of the present invention, the action temperature of step 2 is 88° C., and the pH value of the plating solution is pH5.

藉此,本發明之含鎳基之高表面增強拉曼散射檢測基板及其製作方法,係先將導體基板的表面粗糙化,再利用自催化反應,在粗糙表面進行還原反應,並沉積一含磷的化學鎳層,因此鍍製上的化學鎳層可以均勻的設置於粗糙表面上,達到仿形的鍍層效果;此外,本發明鍍上的化學鎳層屬於高磷化學鎳,其磷含量大於10%,因此製備的檢測基板不會具磁性,而適合用於分析;又化學鎳的成本低且不具有毒性,也可降低檢測基板的製備成本以及提高安全性。Therefore, the nickel-based high surface-enhanced Raman scattering detection substrate and its manufacturing method of the present invention are to roughen the surface of the conductor substrate first, and then use the self-catalysis reaction to carry out the reduction reaction on the rough surface, and deposit a Phosphorous chemical nickel layer, so the electroless nickel layer on the plated system can be evenly arranged on the rough surface to achieve a profiling coating effect; in addition, the chemical nickel layer plated on the present invention belongs to high phosphorus chemical nickel, and its phosphorus content is greater than 10%, so the prepared detection substrate will not be magnetic and suitable for analysis; and the cost of chemical nickel is low and non-toxic, which can also reduce the preparation cost of the detection substrate and improve safety.

為令本發明之技術手段其所能達成之效果,能夠有更完整且清楚的揭露,茲詳細說明如下,請一併參閱揭露之圖式。In order to make the effect achieved by the technical means of the present invention more complete and clear, the detailed description is as follows. Please also refer to the disclosed drawings.

請參見第一圖,為本發明含鎳基之高表面增強拉曼散射檢測基板的結構示意圖,其具有一導體基板(1),導體基板(1)具有一粗糙表面(11),粗糙表面(11)上設置一化學鎳層(2);化學鎳層(2)包含鎳與磷,例如包含80-85 wt%的鎳與10-12 wt%的磷。導體基板(1)可為金屬基板或是半導體基板,又金屬基板可為黃銅基板。Please refer to the first figure, which is a schematic structural view of the nickel-based high surface-enhanced Raman scattering detection substrate of the present invention, which has a conductive substrate (1), and the conductive substrate (1) has a rough surface (11), and the rough surface ( 11) An chemical nickel layer (2) is provided on it; the chemical nickel layer (2) contains nickel and phosphorus, for example, contains 80-85 wt% nickel and 10-12 wt% phosphorus. The conductor substrate (1) can be a metal substrate or a semiconductor substrate, and the metal substrate can be a brass substrate.

此外,本發明含鎳基之高表面增強拉曼散射檢測基板的製備方法包含:步驟一,取一導體基板(1),並在導體基板(1)的一表面進行粗糙化處理;導體基板(1)可為金屬基板或是半導體基板,當導體基板(1)為金屬基板時,是以噴砂、磨砂或是氣相蝕刻方法進行粗糙化處理,以使導體基板(1)具有一粗糙表面(11);步驟二,於導體基板(1)的粗糙表面(11)設置一化學鎳層(2),以獲得該含鎳基之高表面增強拉曼散射檢測基板,其中化學鎳層(2)包含鎳與磷,例如包含80-85 wt%的鎳與10-12 wt%的磷;步驟二中,是將具有粗糙表面(11)的導體基板(1)浸泡於一鍍液中,於溫度80-100℃條件下作用,以於導體基板(1)的粗糙表面(11)設置化學鎳層(2),其中鍍液含有硫酸鎳、檸檬酸鈉以及次亞磷酸鈉,且酸鹼值介於pH4-6,於一較佳實施例中,步驟二的作用溫度為88℃,鍍液之酸鹼值為pH5。In addition, the preparation method of the nickel-based high surface-enhanced Raman scattering detection substrate of the present invention includes: step 1, take a conductive substrate (1), and roughen a surface of the conductive substrate (1); the conductive substrate ( 1) It can be a metal substrate or a semiconductor substrate. When the conductive substrate (1) is a metal substrate, it is roughened by sandblasting, frosting or vapor phase etching, so that the conductive substrate (1) has a rough surface ( 11); Step 2, setting an chemical nickel layer (2) on the rough surface (11) of the conductor substrate (1), so as to obtain the nickel-based high surface-enhanced Raman scattering detection substrate, wherein the chemical nickel layer (2) Contains nickel and phosphorus, such as nickel containing 80-85 wt% and phosphorus of 10-12 wt%; in step 2, the conductor substrate (1) with rough surface (11) is soaked in a plating solution, at temperature Under the condition of 80-100 ℃, to set the chemical nickel layer (2) on the rough surface (11) of the conductor substrate (1), wherein the plating solution contains nickel sulfate, sodium citrate and sodium hypophosphite, and the pH value is between At pH 4-6, in a preferred embodiment, the action temperature of step 2 is 88° C., and the pH value of the plating solution is pH 5.

此外,藉由下述具體實施例,進一步證明本發明可實際應用之範圍,但不意欲以任何形式限制本發明之範圍。In addition, the scope of practical application of the present invention is further proved by the following specific examples, but it is not intended to limit the scope of the present invention in any form.

實施例一、於基板上設置化學鎳層以提高檢測後得到的SERS訊號強度。Embodiment 1. An electroless nickel layer is provided on the substrate to increase the intensity of the SERS signal obtained after detection.

首先,取一黃銅基板,將其浸泡於一鍍液中,並於88℃條件下作用150-180秒,以於黃銅基板上鍍製一化學鎳層,而獲得一鍍鎳黃銅基板;此處所稱的黃銅為銅鋅合金,又使用的鍍液包含了鎳離子(Ni 2+)、還原劑以及絡合劑;於本案之實施例中,使用的鍍液可為Coventya公司的ENOVA 949 半光澤高磷化學鎳鍍液;又或者鍍液包含10g/L之醋酸鎳(nickel acetate)、23.5 g/L之檸檬酸鈉(sodium citrate)、與17.5 g/L的亞磷酸鈉(sodium hypophosphite),且其酸鹼值為pH5,醋酸鎳提供了鎳離子(Ni 2+),檸檬酸鈉作為還原劑,以及亞磷酸鈉作為絡合劑。 First, take a brass substrate, soak it in a plating solution, and act for 150-180 seconds at 88°C to plate an electroless nickel layer on the brass substrate to obtain a nickel-plated brass substrate ; The brass referred to here is a copper-zinc alloy, and the plating solution used includes nickel ions (Ni 2+ ), reducing agent and complexing agent; in the embodiment of this case, the plating solution used can be the ENOVA of Coventya company 949 Semi-gloss high phosphorus chemical nickel plating solution; or the plating solution contains 10g/L nickel acetate, 23.5 g/L sodium citrate, and 17.5 g/L sodium phosphite hypophosphite) with a pH value of pH 5, nickel acetate provides nickel ions (Ni 2+ ), sodium citrate acts as a reducing agent, and sodium phosphite acts as a complexing agent.

請參見第二圖,取一矽基板、一無鍍鎳黃銅基板、以及上述製備的鍍鎳黃銅基板,滴上硝酸鈉水溶液後,偵測其表面增強拉曼散射(SERS)的訊號強度;根據第二圖,三個基板在拉曼位移(Raman shift)1000-1200 1/cm處,都能偵測到一訊號,其中矽基板以及無鍍鎳黃銅基板的檢測極限濃度為10 -3M,而鍍鎳黃銅基板的檢測極限濃度為10 -4M,又鍍鎳黃銅基板的SERS訊號強度高於其他二組別。 Please refer to the second picture, take a silicon substrate, a nickel-free brass substrate, and the above-mentioned nickel-plated brass substrate, drop the sodium nitrate aqueous solution, and detect the signal intensity of the surface-enhanced Raman scattering (SERS) ;According to the second figure, the three substrates can detect a signal at the Raman shift (Raman shift) of 1000-1200 1/cm, and the detection limit concentration of the silicon substrate and the nickel-free brass substrate is 10 - 3 M, while the detection limit concentration of the nickel-plated brass substrate is 10 -4 M, and the SERS signal intensity of the nickel-plated brass substrate is higher than that of the other two groups.

實施例二、黃銅基板粗糙化處理增強表面增強拉曼散射強度Embodiment 2. Brass substrate roughening treatment enhances surface-enhanced Raman scattering intensity

此實施例中,將黃銅基板的表面分別以砂紙磨砂處理、或是以噴砂處理,或是利用氣相蝕刻法,於黃銅基板的表面粗糙化,以製造一粗糙表面;其中噴砂處理是將黃銅基板以乾式噴砂或濕式噴砂處理;又氣相蝕刻法是將黃銅基板裁切成1.45 X 4.4 cm 2,放置於裝設有3 mL氨水溶液的容器中,將容器密閉,於室溫下進行蝕刻,作用時間為1~3 hrs,蝕刻完成後將黃銅基板取出,已去離子水洗淨後烘乾,其中氨水溶液中的氨水與純水的比例介於1:1-1:5。 In this embodiment, the surface of the brass substrate is roughened with sandpaper, or with sandblasting, or by vapor phase etching, to produce a rough surface; wherein the sandblasting is The brass substrate is treated by dry sandblasting or wet sandblasting; and the vapor phase etching method is to cut the brass substrate into 1.45 X 4.4 cm 2 , place it in a container with 3 mL of ammonia solution, seal the container, and Etching is carried out at room temperature, and the action time is 1~3 hrs. After the etching is completed, the brass substrate is taken out, washed with deionized water and then dried. The ratio of ammonia water to pure water in the ammonia solution is between 1:1- 1:5.

接著將此具有粗糙表面的黃銅基板,以實施例一的方法鍍製一化學鎳層,以獲得鍍鎳的黃銅基板;最後,再於不同的黃銅基板表面分別滴上10 -4M以及10 -5M的硝酸鈉水溶液,並偵測各基板的SERS強度。 Then this brass substrate with a rough surface was plated with an electroless nickel layer by the method of Example 1 to obtain a nickel-plated brass substrate; finally, 10 -4 M was dropped on the surface of different brass substrates and 10 −5 M sodium nitrate aqueous solution, and detect the SERS intensity of each substrate.

請參見第三圖,所有的黃銅基板表面都已鍍製化學鎳層,而對照組的黃銅基板表面並未經過粗糙化處理;根據第三圖,對照組只有在滴上10 -4M硝酸鈉水溶液能測到SRES訊號,無法偵測10 -5M的硝酸鈉(NaNO 3)水溶液;其中,磨砂組以及噴砂組,二組都能測量到10 -4M以及10 -5M的硝酸鈉水溶液,且SERS訊號的強度皆高於對照組,但磨砂組的SERS訊號強度又高於噴砂組;氣象蝕刻組的鍍鎳黃銅基板,也都能偵測到10 -4M以及10 -5M的硝酸鈉水溶液,其SERS訊號強度高於對照組,但是低於磨砂組與噴砂組。因此,後續皆使用磨砂處理,將黃銅基板的表面粗糙化。 Please refer to the third picture, the surface of all the brass substrates has been plated with chemical nickel layer, while the surface of the brass substrate of the control group has not been roughened; according to the third picture, the control group only has 10 -4 M The sodium nitrate aqueous solution can detect the SRES signal, but cannot detect the 10 -5 M sodium nitrate (NaNO 3 ) aqueous solution; among them, both the frosted group and the sandblasting group can measure the 10 -4 M and 10 -5 M nitric acid Sodium aqueous solution, and the intensity of SERS signal is higher than that of the control group, but the SERS signal intensity of the frosted group is higher than that of the sandblasting group; the nickel-plated brass substrate of the meteorological etching group can also detect 10 -4 M and 10 - The SERS signal intensity of 5 M sodium nitrate aqueous solution was higher than that of the control group, but lower than that of the frosted and sandblasting groups. Therefore, frosting treatment is used in the subsequent steps to roughen the surface of the brass substrate.

接著,以不同粗細度的砂紙,分別將黃銅基板表面磨砂、再將粗糙化的黃銅基板鍍製化學鎳層,以獲得不同的檢測基板;砂紙的粗細度以砂紙的號數呈現,號數越大的砂紙表示其單位面積的顆粒數越大,粗細度也越細。請參見第四圖,此實施例中分別使用#200、#400、#600、#800以及#1000的砂紙進行磨砂,並將最後獲得的檢測基板檢測濃度介於10 -4-10 -8M的硝酸鈉水溶液;根據第四圖的結果,只有以#600的砂紙磨砂製備的檢測基板,可以偵測到濃度介於10 -4-10 -8M的硝酸鈉水溶液,且SERS訊號強度也都高於其他組別,故後續以#600的砂紙進行黃銅基板的粗糙化處理。 Then, sand the surface of the brass substrate with different thicknesses of sandpaper, and then plate the roughened brass substrate with an electroless nickel layer to obtain different detection substrates; the thickness of the sandpaper is presented by the number of sandpaper, the number The sandpaper with a larger number means that the number of particles per unit area is larger and the thickness is finer. Please refer to the fourth picture. In this embodiment, #200, #400, #600, #800, and #1000 sandpaper are used for sanding, and the detection concentration of the finally obtained detection substrate is between 10 -4 -10 -8 M Sodium nitrate aqueous solution; according to the results in the fourth figure, only the detection substrate prepared by sanding with #600 sandpaper can detect the sodium nitrate aqueous solution with a concentration between 10 -4 -10 -8 M, and the SERS signal intensity is also all It is higher than other groups, so the brass substrate is roughened with #600 sandpaper.

再將以#600的砂紙進行磨砂的黃銅基板,以實施例一所述的化學鎳層鍍製方法進行鍍鎳,唯此實施例中以不同的鍍鎳時間,製備不同的檢測基板,鍍鎳時間分別為150秒、180秒、210秒以及240秒;再使用所製得的不同檢測基板,檢測濃度介於10 -4-10 -8M的硝酸鈉水溶液;請參見第五圖,只有鍍鎳時間為180秒的檢測基板可以測量到五種不同濃度的硝酸鈉水溶液,且其SERS訊號強度也高於其他組;故後續以#600的砂紙進行黃銅基板的粗糙化處理、並且以鍍鎳時間為180秒的製作條件,製備檢測基板。 Then, the brass substrate that is ground with #600 sandpaper is nickel-plated with the chemical nickel layer plating method described in Example 1, but in this embodiment, different detection substrates are prepared with different nickel-plating times, and then plated The nickel time is 150 seconds, 180 seconds, 210 seconds and 240 seconds respectively; then use different detection substrates prepared to detect sodium nitrate aqueous solution with a concentration between 10 -4 -10 -8 M; please refer to the fifth figure, only The detection substrate with a nickel plating time of 180 seconds can measure five different concentrations of sodium nitrate aqueous solution, and its SERS signal intensity is also higher than that of other groups; therefore, the brass substrate is roughened with #600 sandpaper and treated with The nickel plating time is the production condition of 180 seconds, and the detection substrate is prepared.

請參見第六圖,為鍍鎳黃銅檢測基板表面的掃描式電子顯微鏡照片,此檢測基板是以#600的砂紙進行黃銅基板的粗糙化處理、並且以鍍鎳時間為180秒的製作條件所製得,並於後續說明書中將其稱為高SERS檢測基板;進一步分析此檢測基板表面的化學鎳層元素含量(atomic %),其含有83.33 %的鎳與10.72 %的磷;此分析顯示本案所鍍製的化學鎳層為磷含量大於10%的高磷化學鎳,能使化學鎳層不具有磁性且更適合用於分析。Please refer to Figure 6, which is a scanning electron microscope photo of the surface of the nickel-plated brass inspection substrate. The inspection substrate is roughened with #600 sandpaper, and the nickel plating time is 180 seconds. Made, and it is referred to as high SERS detection substrate in follow-up specification; Further analysis this detection substrate surface chemical nickel layer element content (atomic %), it contains the nickel of 83.33% and the phosphorus of 10.72%; This analysis shows The electroless nickel layer plated in this case is high-phosphorus electroless nickel with a phosphorus content greater than 10%, which can make the electroless nickel layer non-magnetic and more suitable for analysis.

實施例三、高SERS檢測基板的檢測性質分析Example 3. Analysis of detection properties of high SERS detection substrate

將以#600的砂紙進行黃銅基板的粗糙化處理、並且以鍍鎳時間為180秒的製作條件所製得高SERS檢測基板,進行檢測性質的分析。The brass substrate was roughened with #600 sandpaper, and the high SERS detection substrate was prepared under the production conditions of nickel plating time of 180 seconds, and the detection properties were analyzed.

請先參見第七圖,為使用上述高SERS檢測基板,分別檢測10 -4M、10 -5M、10 -6M、10 -7M以及10 -8M硝酸鈉水溶液所得到的SERS分析圖;自第七圖可觀察,即使硝酸鈉的濃度為10 -8M,高SERS檢測基板也都能偵測到訊號,即高SERS檢測基板的靈敏度高,可用於偵測低濃度的物質。 Please refer to Figure 7 first, which is the SERS analysis chart obtained by detecting 10 -4 M, 10 -5 M, 10 -6 M, 10 -7 M and 10 -8 M sodium nitrate aqueous solution using the above-mentioned high SERS detection substrate It can be observed from Figure 7 that even if the concentration of sodium nitrate is 10 -8 M, the high SERS detection substrate can detect signals, that is, the high SERS detection substrate has high sensitivity and can be used to detect low concentration substances.

再請參見第八圖,將以高SERS檢測基板測量不同濃度硝酸鈉水溶液所得到的SERS強度數值,進行迴歸分析,發現其迴歸係數(R 2)為0.96,具有良好的線性迴歸,即本發明高SERS檢測基板亦可用於製作檢量線以定量所偵測物質的濃度。 Please refer to the eighth figure again, the SERS intensity values obtained by measuring different concentrations of sodium nitrate aqueous solution with a high SERS detection substrate are subjected to regression analysis, and the regression coefficient (R 2 ) is found to be 0.96, which has a good linear regression, which is the present invention The high SERS detection substrate can also be used to make a calibration line to quantify the concentration of the detected substance.

又,請參見第九圖,為高SERS檢測基板測量10 -4M的硝酸鈉水溶液、10 -4M的硫酸鋅(ZnSO 4)溶液以及10 -4M的4-三磷酸腺苷(4-adenosine triphosphate,4-ATP)溶液的SERS分析圖;第九圖顯示高SERS檢測基板測量三種溶液時,在不同的拉曼位移處可以觀察到波峰,高SERS檢測基板確實能區別性的偵測三種溶液;同時參見第十圖,為高SERS檢測基板偵測三種溶液的SERS訊號強度;第九圖與第十圖的結果顯示高SERS檢測基板可以偵測多種不同的物質。 Also, please refer to Figure 9, measuring 10 -4 M sodium nitrate aqueous solution, 10 -4 M zinc sulfate (ZnSO 4 ) solution and 10 -4 M 4-adenosine triphosphate (4-adenosine triphosphate, 4-ATP) solution SERS analysis diagram; the ninth figure shows that when the high SERS detection substrate measures the three solutions, peaks can be observed at different Raman shifts, and the high SERS detection substrate can indeed distinguish the detection of the three solutions; at the same time See Figure 10, which is the SERS signal intensity of three solutions detected by the high SERS detection substrate; the results of Figures 9 and 10 show that the high SERS detection substrate can detect many different substances.

實施例四、高SERS檢測基板的可重複使用分析Example 4. Reusable Analysis of High SERS Detection Substrate

此實施例中,先使用高SERS檢測基板檢測10 -6M的硝酸鈉水溶液,以獲得一檢測數值,接著以清水洗淨高SERS檢測基板並陰乾後,再使用相同的高SERS檢測基板檢測10 -6M的硝酸鈉水溶液;重複進行上述的步驟,以獲得每一次的檢測數值,紀錄並比較重複使用高SERS檢測基板的狀況下,檢測結果的差異性,本實施例中,使用同一高SERS檢測基板以上述步驟重複10次的檢測流程。 In this embodiment, the high SERS detection substrate is first used to detect 10 -6 M sodium nitrate aqueous solution to obtain a detection value, then the high SERS detection substrate is washed with water and dried in the shade, and then the same high SERS detection substrate is used to detect 10 -6 M sodium nitrate aqueous solution; repeat the above steps to obtain the detection value each time, record and compare the difference in the detection results under the condition of repeatedly using the high SERS detection substrate, in this embodiment, use the same high SERS The detection process of the detection substrate was repeated 10 times by the above steps.

請參見第十一圖,為重複10次檢測所獲得的SERS分析圖,10次檢測的結果圖線型差異不大,在相同的拉曼位移處都能觀察到明顯的波峰;第十二圖為10次檢測結果、SERS訊號強度的分析圖,十次檢測結果的平均誤差值為3%,差異相當小,即本發明之含鎳基之高SERS檢測基板確實可以重複使用。Please refer to the eleventh figure, which is the SERS analysis chart obtained by repeating 10 times of detection. There is little difference in the line type of the results of the 10 tests, and obvious peaks can be observed at the same Raman shift; the twelfth picture is 10 test results and analysis diagrams of SERS signal intensity, the average error value of the ten test results is 3%, the difference is quite small, that is, the nickel-based high SERS detection substrate of the present invention can indeed be reused.

綜上,本發明含鎳基之高表面增強拉曼散射檢測基板,具有以下優點:To sum up, the nickel-based high surface-enhanced Raman scattering detection substrate of the present invention has the following advantages:

1.本發明含鎳基之高表面增強拉曼散射檢測基板,先將導體基板表面粗糙化後,再利用自催化反應,使化學鎳能均勻的沉積於導體基板的粗糙表面;導體基板表面的粗糙化處理可以提高導體基板表面的比表面積,而自催化反應所沉積的化學鎳層則能有效達到仿型的效果;此外,本發明的化學鎳層為磷含量大於10%的高磷化學鎳,不具磁性,能使含鎳基之高表面增強拉曼散射檢測基板更能應用於分析。1. The nickel-based high-surface-enhanced Raman scattering detection substrate of the present invention first roughens the surface of the conductor substrate, and then utilizes an autocatalytic reaction to uniformly deposit chemical nickel on the rough surface of the conductor substrate; the surface of the conductor substrate Roughening treatment can improve the specific surface area of the conductor substrate surface, and the chemical nickel layer deposited by the self-catalytic reaction can effectively achieve the effect of profiling; in addition, the chemical nickel layer of the present invention is a high-phosphorus chemical nickel layer with a phosphorus content greater than 10%. , non-magnetic, which can make the nickel-based high surface-enhanced Raman scattering detection substrate more applicable to analysis.

2.本發明含鎳基之高表面增強拉曼散射檢測基板可檢測多種不同的物質,應用廣泛,且可用於檢測低濃度的物質,其檢測的極限濃度可達到10 -8M;又,本發明含鎳基之高表面增強拉曼散射檢測基板所獲得的檢測結果具有良好的迴歸係數,亦可用於濃度定量。 2. The nickel-based high surface-enhanced Raman scattering detection substrate of the present invention can detect a variety of different substances, is widely used, and can be used to detect low-concentration substances, and its detection limit concentration can reach 10 -8 M; The detection results obtained by the invention of the nickel-based high surface-enhanced Raman scattering detection substrate have good regression coefficients and can also be used for concentration quantification.

3.本發明含鎳基之高表面增強拉曼散射檢測基板可以重複使用,且重複使用時所測量到的訊號強度誤差值極小,故即使重複使用時也不會影響到檢測結果。3. The nickel-based high surface-enhanced Raman scattering detection substrate of the present invention can be used repeatedly, and the error value of the signal intensity measured during repeated use is extremely small, so the detection result will not be affected even when it is used repeatedly.

綜上所述,本案含鎳基之高表面增強拉曼散射檢測基板及其製作方法,的確能藉由上述所揭露之實施例,達到所預期之使用功效,且本發明亦未曾公開於申請前,誠已完全符合專利法之規定與要求。爰依法提出發明專利之申請,懇請惠予審查,並賜准專利,則實感德便。In summary, the nickel-based high surface-enhanced Raman scattering detection substrate and its manufacturing method in this case can indeed achieve the expected use effect through the above disclosed embodiments, and the present invention has not been disclosed before the application , Sincerely has fully complied with the provisions and requirements of the Patent Law. ¢It is really convenient to file an application for a patent for invention according to the law, and ask for the review and approval of the patent.

惟,上述所揭之說明,僅為本發明之較佳實施例,非為限定本發明之保護範圍;其大凡熟悉該項技藝之人士,其所依本發明之特徵範疇,所作之其它等效變化或修飾,皆應視為不脫離本發明之設計範疇。However, the above-mentioned descriptions are only preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention; those who are familiar with the art generally make other equivalents according to the characteristic scope of the present invention Changes or modifications should be considered as not departing from the design scope of the present invention.

1:導體基板                 11:粗糙表面1: Conductor substrate 11: Rough surface

2:化學鎳層2: chemical nickel layer

第一圖:本發明高表面增強拉曼散射(SERS)檢測基板示意圖。Figure 1: A schematic diagram of a high surface-enhanced Raman scattering (SERS) detection substrate of the present invention.

第二圖:鍍鎳與無鍍鎳檢測基板的SERS訊號分析圖。Figure 2: SERS signal analysis diagram of nickel-plated and nickel-free detection substrates.

第三圖:不同粗糙化處理影響檢測基板SERS訊號強度分析圖。Figure 3: Analysis of the SERS signal intensity of the detection substrate affected by different roughening treatments.

第四圖:磨砂用砂紙粗細度影響檢測基板SERS訊號強度分析圖。Figure 4: The impact of the thickness of the sandpaper used for grinding on the SERS signal intensity analysis of the detection substrate.

第五圖:鍍鎳時間影響檢測基板SERS訊號強度分析圖。Figure 5: The impact of nickel plating time on the SERS signal intensity analysis of the detection substrate.

第六圖:本發明高SERS檢測基板表面掃描式電子顯微鏡照片。Figure 6: a scanning electron microscope photo of the surface of the high SERS detection substrate of the present invention.

第七圖:本發明高SERS檢測基板之檢測極限濃度分析圖。Figure 7: Analysis chart of the detection limit concentration of the high SERS detection substrate of the present invention.

第八圖:本發明高SERS射檢測基板檢測不同濃度物質之迴歸分析圖。Figure 8: The regression analysis chart of the detection of different concentrations of substances detected by the high SERS radiation detection substrate of the present invention.

第九圖:本發明高SERS檢測基板檢測不同物質之SERS分析圖(一)。Figure 9: SERS analysis chart (1) of different substances detected by the high SERS detection substrate of the present invention.

第十圖:本發明高SERS檢測基板檢測不同物質之SERS分析圖(一)。Figure 10: SERS analysis chart (1) of different substances detected by the high SERS detection substrate of the present invention.

第十一圖:本發明高SERS檢測基板重複使用之SERS分析圖(一)。Fig. 11: SERS analysis diagram (1) of repeated use of the high SERS detection substrate of the present invention.

第十二圖:本發明高SERS檢測基板重複使用之SERS分析圖(二)。Figure 12: SERS analysis chart (2) of the reused high SERS detection substrate of the present invention.

none

1:導體基板               11:粗糙表面 2:化學鎳層 1: Conductor substrate 11: Rough surface 2: chemical nickel layer

Claims (10)

一種含鎳基之高表面增強拉曼散射檢測基板,係包含一導體基板以及設置於該導體基板上的一化學鎳層,其中該導體基板具有一粗糙表面,且該化學鎳層係設置於該粗糙表面上,其中該化學鎳層包含鎳與磷。 A nickel-based high-surface-enhanced Raman scattering detection substrate includes a conductive substrate and an chemical nickel layer disposed on the conductive substrate, wherein the conductive substrate has a rough surface, and the chemical nickel layer is disposed on the conductive substrate On rough surfaces, where the electroless nickel layer contains nickel and phosphorous. 如請求項1所述之含鎳基之高表面增強拉曼散射檢測基板,其中該導體基板為金屬基板或是半導體基板。 The nickel-based high surface-enhanced Raman scattering detection substrate as described in claim 1, wherein the conductive substrate is a metal substrate or a semiconductor substrate. 如請求項2所述之含鎳基之高表面增強拉曼散射檢測基板,其中該金屬基板為黃銅基板。 The nickel-based high surface-enhanced Raman scattering detection substrate as described in claim 2, wherein the metal substrate is a brass substrate. 如請求項2所述之含鎳基之高表面增強拉曼散射檢測基板,其中該金屬基板的該粗糙表面,係藉由磨砂方法、噴砂方法或是氣相蝕刻方法所產生。 The nickel-based high-surface-enhanced Raman scattering detection substrate as claimed in Claim 2, wherein the rough surface of the metal substrate is produced by a frosting method, a sandblasting method or a vapor phase etching method. 如請求項1所述之含鎳基之高表面增強拉曼散射檢測基板,其中該化學鎳層包含80-85wt%的鎳與10-12wt%的磷。 The nickel-based high surface-enhanced Raman scattering detection substrate as claimed in claim 1, wherein the chemical nickel layer contains 80-85wt% nickel and 10-12wt% phosphorus. 一種含鎳基之高表面增強拉曼散射檢測基板的製作方法,包含:步驟一:取一導體基板,並在該導體基板的一表面進行粗糙化處理,以使該導體基板具有一粗糙表面;步驟二:於該導體基板之該粗糙表面,設置一化學鎳層,以獲得該高表面增強拉曼散射檢測基板,其中該化學鎳層包含鎳與磷。 A method for manufacturing a nickel-based high-surface-enhanced Raman scattering detection substrate, comprising: step 1: taking a conductive substrate, and roughening a surface of the conductive substrate, so that the conductive substrate has a rough surface; Step 2: disposing an electroless nickel layer on the rough surface of the conductive substrate to obtain the high surface-enhanced Raman scattering detection substrate, wherein the electroless nickel layer includes nickel and phosphorus. 如請求項6所述之製作方法,其中該步驟一中的導體基板為金屬基板或是半導體基板。 The manufacturing method according to claim 6, wherein the conductive substrate in the step 1 is a metal substrate or a semiconductor substrate. 如請求項7所述之製作方法,其中該導體基板為金屬基板,且使用磨砂方法、噴砂方法或是氣相蝕刻方法進行該金屬基板的粗糙化處理。 The manufacturing method according to claim 7, wherein the conductive substrate is a metal substrate, and the roughening treatment of the metal substrate is performed by a sanding method, a sandblasting method or a vapor phase etching method. 如請求項7所述之製作方法,其中該金屬基板為黃銅基板。 The manufacturing method according to claim 7, wherein the metal substrate is a brass substrate. 如請求項6所述之製作方法,步驟二中,係將具有該粗糙表面的該導體基板浸泡於一鍍液中,於溫度80-100℃條件下作用,以於該導體基板之該粗糙表面設置該化學鎳層,其中該鍍液含有硫酸鎳、檸檬酸鈉以及次亞磷酸鈉,且酸鹼值介於pH4-6。 According to the manufacturing method described in claim 6, in step 2, the conductive substrate with the rough surface is soaked in a plating solution, and acted at a temperature of 80-100°C to coat the rough surface of the conductive substrate The chemical nickel layer is provided, wherein the plating solution contains nickel sulfate, sodium citrate and sodium hypophosphite, and the pH value is between pH4-6.
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