TWI807514B - Hydrogen Treatment System - Google Patents

Hydrogen Treatment System Download PDF

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TWI807514B
TWI807514B TW110145237A TW110145237A TWI807514B TW I807514 B TWI807514 B TW I807514B TW 110145237 A TW110145237 A TW 110145237A TW 110145237 A TW110145237 A TW 110145237A TW I807514 B TWI807514 B TW I807514B
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hydrogen
gas
containing air
channel
catalyst module
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TW110145237A
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TW202323734A (en
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閻明宇
張旭霖
史富洋
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鼎佳能源股份有限公司
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Abstract

本發明係提供一種氫氣處理系統,包括:一氣體處理裝置,該氣 體處理裝置具有相互連通之一進氣通道及一氣體處理通道及一出氣通道,該氣體處理通道內設置有至少一觸媒模組,另該氣體處理裝置內設置有一第一隔層及一第二隔層及至少一冷卻通道;一氣體加濕裝置係設置於所述進氣通道位置處;及一氣體抽取裝置連通所述氣體處理通道,而該氣體抽取裝置啟動時抽取密閉空間或非密閉空間內之含氫空氣,密閉空間或非密閉空間內之含氫空氣通過所述氣體加濕裝置及觸媒模組,並由觸媒模組進行催化氧化所述含氫空氣中的氫氣並排出,以降低空氣之氫氣濃度。 The present invention provides a hydrogen processing system, including: a gas processing device, the gas The gas processing device has an air inlet channel, a gas processing channel and a gas outlet channel that communicate with each other. At least one catalyst module is arranged in the gas processing channel, and a first interlayer, a second interlayer and at least one cooling channel are arranged in the gas processing device; a gas humidifying device is arranged at the position of the air inlet channel; A gas humidifier and a catalyst module, and the catalyst module catalyzes and oxidizes the hydrogen in the hydrogen-containing air and discharges it, so as to reduce the hydrogen concentration in the air.

Description

氫氣處理系統 Hydrogen Treatment System

本發明係有關於一種處理系統,尤指一種可降低密閉空間或非密閉空間之氫氣濃度以避免因為氫氣產生危險之氫氣處理系統。 The present invention relates to a treatment system, especially a hydrogen treatment system that can reduce the concentration of hydrogen gas in a closed space or a non-closed space to avoid danger caused by hydrogen.

按,目前許多工廠在某些製程中會使用氫氣來做為載流氣體或原料氣體,也有可能在某些製程反應中產生氫氣,而其氫氣為副產品或排出作為廢氣排放,但在製程或處理中,其製程環境仍然可能會有氫氣外洩的狀況發生,更且製程環境中大多都是密閉的環境或非密閉通風不良的環境,所以其密閉空間或非密閉通風不良的環境中若有氫氣外洩的狀況時,其密閉空間或非密閉通風不良的環境的氫氣濃度會越來越高,且眾所皆知的氫氣極易燃燒,所以當環境中的氫氣濃度到達一定程度即有爆炸的危險。 By the way, many factories currently use hydrogen as carrier gas or raw material gas in some processes, and it is also possible to produce hydrogen in some process reactions, and the hydrogen is a by-product or discharged as waste gas. However, in the process or treatment, the process environment may still have hydrogen leakage. Moreover, most of the process environments are closed environments or non-closed and poorly ventilated environments. The concentration of hydrogen in spaces or non-closed and poorly ventilated environments will become higher and higher, and hydrogen is known to be extremely flammable, so when the concentration of hydrogen in the environment reaches a certain level, there is a danger of explosion.

是以,要如何解決上述習用在密閉空間或非密閉空間中氫氣濃度增加所形成之問題與缺失,即為本發明之發明人與從事此行業之相關廠商所亟欲研究改善之方向所在者。 Therefore, how to solve the above-mentioned problems and deficiencies caused by the increase of hydrogen concentration in confined spaces or non-confined spaces is the direction that the inventors of the present invention and related manufacturers engaged in this industry want to study and improve.

爰此,為有效解決上述之問題,本發明之主要目的在於提供一種可降低密閉空間或非密閉空間之氫氣濃度以避免因為氫氣產生危險之氫氣處理系統。 Therefore, in order to effectively solve the above-mentioned problems, the main purpose of the present invention is to provide a hydrogen treatment system that can reduce the hydrogen concentration in a closed space or a non-closed space to avoid danger caused by hydrogen.

本發明之另一目的,在於提供一種可控制處理溫度以增加安全性之氫氣處理系統。 Another object of the present invention is to provide a hydrogen treatment system that can control the treatment temperature to increase safety.

本發明之另一目的,在於提供一種可增加處理壽命之氫氣處理系統。 Another object of the present invention is to provide a hydrogen treatment system that can increase the treatment life.

為達上述目的,本發明係提供一種氫氣處理系統,該氫氣處理系統包括:一氣體處理裝置,該氣體處理裝置具有相互連通之一進氣通道及一氣體處理通道及一出氣通道,該氣體處理通道內設置有至少一觸媒模組,另該氣體處理裝置內設置有一第一隔層及一第二隔層貼附所述觸媒模組,又該氣體處理裝置內更設置有至少一冷卻通道於該第一隔層與所述第二隔層相對該觸媒模組另一側;一氣體加濕裝置,該氣體加濕裝置係設置於所述進氣通道位置處;及一氣體抽取裝置,該氣體抽取裝置連通所述氣體處理通道,且該氣體抽取裝置啟動時抽取含氫空氣,而含氫空氣通過所述氣體加濕裝置及觸媒模組,並由觸媒模組進行催化氧化所述含氫空氣中的氫氣並排出,以降低空氣之氫氣濃度,所述觸媒模組係為白金觸媒或奈米級白金觸媒。 In order to achieve the above object, the present invention provides a hydrogen processing system, which comprises: a gas processing device, the gas processing device has an inlet channel, a gas processing channel and a gas outlet channel connected to each other, at least one catalyst module is arranged in the gas processing channel, and a first partition and a second partition are arranged in the gas processing device to attach the catalyst module, and at least one cooling channel is further provided in the gas processing device on the other side of the first partition and the second partition opposite to the catalyst module; A humidification device, the gas humidification device is arranged at the position of the air intake channel; and a gas extraction device, the gas extraction device communicates with the gas processing channel, and when the gas extraction device starts, it extracts hydrogen-containing air, and the hydrogen-containing air passes through the gas humidification device and the catalyst module, and the hydrogen in the hydrogen-containing air is catalyzed and oxidized by the catalyst module to reduce the hydrogen concentration of the air. The catalyst module is a platinum catalyst or a nanoscale platinum catalyst.

根據本發明氫氣處理系統之一實施例,其中所述第一隔層與第二隔層其一或兩者可為散熱材料或散熱板或金屬板其中之一者。 According to an embodiment of the hydrogen processing system of the present invention, one or both of the first spacer and the second spacer can be one of a heat dissipation material, a heat dissipation plate, or a metal plate.

根據本發明氫氣處理系統之一實施例,其中所述第一隔層與第二隔層其一或兩者可為散熱材料或石墨製程之板體其中之一者。 According to an embodiment of the hydrogen processing system of the present invention, one or both of the first spacer and the second spacer can be one of heat dissipation materials or graphite-processed plates.

根據本發明氫氣處理系統之一實施例,其中所述氣體抽取裝置係設置於所述出氣通道位置處,而其氣體抽取裝置啟動時抽取含氫空氣,而含氫空氣通過所述氣體加濕裝置及觸媒模組,該氣體加濕裝置對其含氫空氣 加濕,加濕後含氫空氣由觸媒模組吸附所述氫氣並通過所述氣體抽取裝置排出。 According to an embodiment of the hydrogen processing system of the present invention, wherein the gas extraction device is arranged at the position of the gas outlet channel, and when the gas extraction device is activated, the hydrogen-containing air is extracted, and the hydrogen-containing air passes through the gas humidification device and the catalyst module. Humidification, after humidification, the hydrogen-containing air is adsorbed by the catalyst module and discharged through the gas extraction device.

根據本發明氫氣處理系統之一實施例,其中所述冷卻通道內填充有冷卻液體,且該冷卻通道連通有一散熱裝置。 According to an embodiment of the hydrogen processing system of the present invention, the cooling channel is filled with cooling liquid, and the cooling channel communicates with a heat dissipation device.

根據本發明氫氣處理系統之一實施例,更包括有一氫氣偵測單元,該氫氣偵測單元電性連接所述氣體抽取裝置。 According to an embodiment of the hydrogen processing system of the present invention, it further includes a hydrogen detection unit, and the hydrogen detection unit is electrically connected to the gas extraction device.

根據本發明氫氣處理系統之一實施例,更包括有一吸附裝置,該吸附裝置連通所述氣體加濕裝置,而其氣體抽取裝置啟動時抽取含氫空氣,而含氫空氣通過所述吸附裝置且由吸附裝置吸附含氫空氣之硫化氫,再將其含氫空氣送往氣體加濕裝置,而含氫空氣通過所述氣體加濕裝置及觸媒模組,該氣體加濕裝置對其含氫空氣加濕,加濕後含氫空氣由觸媒模組進行催化氧化所述氫氣並通過所述氣體抽取裝置排出。 According to an embodiment of the hydrogen treatment system of the present invention, it further includes an adsorption device, the adsorption device communicates with the gas humidification device, and when the gas extraction device starts, it extracts hydrogen-containing air, and the hydrogen-containing air passes through the adsorption device and is adsorbed by the adsorption device to absorb hydrogen sulfide in the hydrogen-containing air. The gas extraction device is exhausted.

根據本發明氫氣處理系統之一實施例,更包括有一處理水收集裝置,該處理水收集裝置連通所述氣體抽取裝置。 According to an embodiment of the hydrogen treatment system of the present invention, it further includes a treatment water collection device, and the treatment water collection device communicates with the gas extraction device.

1:氫氣處理系統 1: Hydrogen treatment system

2:氣體處理裝置 2: Gas treatment device

21:進氣通道 21: Intake channel

22:氣體處理通道 22: Gas processing channel

221:觸媒模組 221: Catalyst module

23:出氣通道 23: Outlet channel

24:第一隔層 24: The first compartment

25:第二隔層 25: second compartment

26:冷卻通道 26: cooling channel

261:散熱裝置 261: cooling device

3:氣體加濕裝置 3: Gas humidification device

4:氣體抽取裝置 4: Gas extraction device

5:氫氣偵測單元 5: Hydrogen detection unit

6:吸附裝置 6: Adsorption device

7:處理水收集裝置 7: Treated water collection device

第1圖係本發明氫氣處理系統之示意圖。 Fig. 1 is a schematic diagram of the hydrogen treatment system of the present invention.

第2圖係本發明氫氣處理系統之實施示意圖一。 Fig. 2 is an implementation schematic diagram of the hydrogen treatment system of the present invention.

第3圖係本發明氫氣處理系統之實施示意圖二。 Figure 3 is the second schematic diagram of the implementation of the hydrogen treatment system of the present invention.

第4圖係本發明氫氣處理系統之實施示意圖三。 Fig. 4 is the third schematic diagram of the implementation of the hydrogen treatment system of the present invention.

本發明之上述目的及其結構與功能上的特性,將依據所附圖式之較佳實施例予以說明。 The above-mentioned purpose of the present invention and its structural and functional characteristics will be described based on the preferred embodiments of the accompanying drawings.

在以下,針對本發明有關氫氣處理系統之構成及技術內容等,列舉各種適用的實例並配合參照隨文所附圖式而加以詳細地說明;然而,本發明當然不是限定於所列舉之該等的實施例、圖式或詳細說明內容而已。 In the following, for the composition and technical content of the hydrogen treatment system of the present invention, various applicable examples are listed and described in detail with reference to the accompanying drawings; however, the present invention is certainly not limited to the listed embodiments, drawings or detailed descriptions.

再者,熟悉此項技術之業者亦當明瞭:所列舉之實施例與所附之圖式僅提供參考與說明之用,並非用來對本發明加以限制者;能夠基於該等記載而容易實施之修飾或變更而完成之發明,亦皆視為不脫離本發明之精神與意旨的範圍內,當然該等發明亦均包括在本發明之申請專利範圍。 Furthermore, those who are familiar with this technology should also understand that the listed embodiments and the accompanying drawings are only for reference and illustration, and are not used to limit the present invention; inventions that can be easily implemented based on the modifications or changes based on the records are also considered to be within the scope of the spirit and intent of the present invention, and of course these inventions are also included in the scope of the patent application of the present invention.

又,以下實施例所提到的方向用語,例如:「上」、「下」、「左」、「右」、「前」、「後」等,僅是參考附加圖示的方向。因此,使用的方向用語是用來說明,而並非用來限制本發明;再者,在下列各實施例中,相同或相似的元件將採用相同或相似的元件標號。 In addition, the directional terms mentioned in the following embodiments, such as "upper", "lower", "left", "right", "front", "rear", etc., are only referring to the directions attached to the drawings. Therefore, the used directional terms are used to illustrate rather than limit the present invention; moreover, in the following embodiments, the same or similar components will use the same or similar component numbers.

首先,請參閱第1圖所示,係為本發明氫氣處理系統之示意圖,由圖中可清楚看出,其中所述氫氣處理系統1係包括有一氣體處理裝置2及一氣體加濕裝置3及一氣體抽取裝置4。 First of all, please refer to shown in Fig. 1, which is a schematic diagram of the hydrogen treatment system of the present invention, as can be clearly seen from the figure, wherein the hydrogen treatment system 1 includes a gas treatment device 2, a gas humidification device 3 and a gas extraction device 4.

其中所述氣體處理裝置2具有一進氣通道21及一氣體處理通道22及一出氣通道23,該進氣通道21連通所述氣體處理通道22,該氣體處理通道22連通所述出氣通道23,使該進氣通道21連通所述出氣通道23,又該氣體處理通道22內設置有至少一觸媒模組221,該觸媒模組221係為白金觸媒,且該觸媒模 組221係可為塗佈成形或填充成形,更該觸媒模組221也可為奈米級白金觸媒,另該氣體處理裝置2內更設置有一第一隔層24及一第二隔層25,該第一隔層24相對設置於所述氣體處理通道22上側且貼附所述觸媒模組221,而該第二隔層25相對設置於所述氣體處理通道22下側且貼附所述觸媒模組221,且該第一隔層24係可為散熱材料製程或散熱板或石墨製程之板體或金屬板其中之一者,而該第二隔層25係可為散熱材料製程之板體或散熱板或石墨製程之板體或金屬板其中之一者,又該氣體處理裝置2內更設置有至少一冷卻通道26,其中該冷卻通道26內填充有冷卻液體且於本實施例中係為兩處,其一之冷卻通道26係形成於該第一隔層24上側,另一冷卻通道26係形成於該第二隔層25下側,且該兩處之冷卻通道26係可相互連通或不連通,於本實施例係以相互連通為實施方式。 Wherein said gas treatment device 2 has an air inlet channel 21, a gas treatment channel 22 and a gas outlet channel 23, the air inlet channel 21 is connected to the gas treatment channel 22, and the gas treatment channel 22 is connected to the gas outlet channel 23, so that the air inlet channel 21 is connected to the gas outlet channel 23, and at least one catalyst module 221 is arranged in the gas treatment channel 22, and the catalyst module 221 is a platinum catalyst, and the catalyst module The group 221 can be coating molding or filling molding, and the catalyst module 221 can also be a nanoscale platinum catalyst. In addition, the gas processing device 2 is further provided with a first spacer 24 and a second spacer 25. The first spacer 24 is relatively arranged on the upper side of the gas processing channel 22 and attached to the catalyst module 221, and the second spacer 25 is relatively arranged on the lower side of the gas processing channel 22 and attached to the catalyst module 221, and the first spacer 24 is It can be one of the plate body or metal plate of heat dissipation material process or heat dissipation plate or graphite process, and the second interlayer 25 can be one of the plate body of heat dissipation material process or heat dissipation plate or graphite process plate or metal plate, and at least one cooling channel 26 is further arranged in the gas processing device 2, wherein the cooling channel 26 is filled with cooling liquid and there are two places in this embodiment, one of which is formed on the upper side of the first interlayer 24, and the other cooling channel 26 is formed on the second The lower side of the interlayer 25, and the two cooling passages 26 can be connected to each other or not connected to each other. In this embodiment, they are connected to each other.

其中所述氣體加濕裝置3包括噴霧式、薄膜式或氣泡式之加濕器,但不限於此三種加濕方式,僅要可以對其氣體進行加濕之裝置皆為本案之保護範圍,且該氣體加濕裝置3係設置於所述進氣通道21位置處,使該進氣通道21中連通所述氣體加濕裝置3。 Wherein the gas humidifier 3 includes spray type, film type or bubble type humidifiers, but is not limited to these three humidification methods, as long as the device that can humidify the gas is within the scope of protection of this case, and the gas humidifier 3 is arranged at the position of the air inlet passage 21, so that the air inlet passage 21 communicates with the gas humidifier 3.

其中所述氣體抽取裝置4係為抽氣泵浦,且該氣體抽取裝置4係可設置於所述出氣通道23或進氣通道21位置處,使該氣體抽取裝置4連通所述氣體處理通道22,而於本實施例中,該氣體抽取裝置4係設置於所述出氣通道23為實施方式。 Wherein the gas extraction device 4 is an air extraction pump, and the gas extraction device 4 can be arranged at the position of the gas outlet channel 23 or the inlet channel 21, so that the gas extraction device 4 is connected to the gas processing channel 22, and in this embodiment, the gas extraction device 4 is arranged at the gas outlet channel 23 as an embodiment.

再請參閱第2圖所示,係為本發明氫氣處理系統之實施示意圖一,以下舉例為應用於密閉空間的實施方式,非密閉空間使用方式僅應用場景之差異,其中所述氫氣處理系統1係設置於有外洩氫氣之一密閉空間內,且該密閉空間之空氣中係為含氫空氣,而該氫氣處理系統1使用時,係開啟所述氣 體抽取裝置4,該氣體抽取裝置4開啟時會對所述氣體處理通道22與進氣通道21進行抽氣,使該氫氣處理系統1外部之含氫空氣會進入到所述進氣通道21,進入到進氣通道21之含氫空氣會先通過所述氣體加濕裝置3,該氣體加濕裝置3對其含氫空氣進行加濕,使該含氫空氣呈現安全狀態,而加濕過後之含氫空氣再由進氣通道21進入到氣體處理通道22之觸媒模組221,該觸媒模組221則對其加濕之含氫空氣進行催化氧化之化學反應,以使其含氫空氣中的氫氣濃度降低,並同時其含氫空氣進行催化氧化之化學反應所產生之高溫可透過所述冷卻通道26內之冷卻液體進行降溫,以使其氫氣處理系統1處於安全之工作溫度,而該氣體抽取裝置4持續抽氣且將通過觸媒模組221且氫氣濃度降低之含氫空氣送往出氣通道23且排回密閉空間,以降低其密閉空間內之氫氣濃度,進而達到可降低密閉空間之氫氣濃度以避免因為氫氣產生危險之功效者。 Please refer to Figure 2 again, which is a schematic diagram of the implementation of the hydrogen treatment system of the present invention. The following examples are examples of applications in confined spaces. The use of non-confined spaces is only a difference in application scenarios. The hydrogen treatment system 1 is set in a closed space with hydrogen leakage, and the air in the closed space is hydrogen-containing air. When the hydrogen treatment system 1 is used, the gas is turned on. Body extracting device 4, when the gas extracting device 4 is opened, the gas processing channel 22 and the intake channel 21 will be pumped, so that the hydrogen-containing air outside the hydrogen processing system 1 will enter the intake channel 21, and the hydrogen-containing air entering the intake channel 21 will first pass through the gas humidification device 3, and the gas humidification device 3 will humidify the hydrogen-containing air, so that the hydrogen-containing air is in a safe state, and the humidified hydrogen-containing air enters the catalyst module of the gas processing channel 22 through the intake channel 21 221, the catalyst module 221 performs a chemical reaction of catalytic oxidation on the humidified hydrogen-containing air, so that the hydrogen concentration in the hydrogen-containing air is reduced, and at the same time, the high temperature generated by the chemical reaction of the hydrogen-containing air in the catalytic oxidation can be cooled through the cooling liquid in the cooling channel 26, so that the hydrogen treatment system 1 is at a safe working temperature, and the gas extraction device 4 continues to pump air and sends the hydrogen-containing air that has passed through the catalyst module 221 and has a reduced hydrogen concentration to the outlet channel 23 and discharged back Closed space, in order to reduce the concentration of hydrogen gas in the closed space, and then achieve the effect of reducing the concentration of hydrogen gas in the closed space to avoid the danger caused by hydrogen gas.

再請參閱第3圖所示,係為本發明氫氣處理系統之實施示意圖二,以下舉例為應用於密閉空間的實施方式,於非密閉空間的使用方式僅應用場景之差異,其中所述氫氣處理系統1更包括有一氫氣偵測單元5,該氫氣偵測單元5電性連接所述氣體抽取裝置4,而該冷卻通道26連通有一散熱裝置261,以當該氫氣處理系統1係設置於有外洩氫氣之一密閉空間內時,該氫氣偵測單元5係偵測其密閉空間內之氫氣濃度,而當該密閉空間內之氫氣濃度高於設定標準值時,其氫氣偵測單元5啟動所述氣體抽取裝置4,該氣體抽取裝置4開啟時會對所述氣體處理通道22與進氣通道21進行抽氣,使該氫氣處理系統1外部之含氫空氣會進入到所述進氣通道21且由氣體加濕裝置3進行加濕,而該觸媒模組221則對其加濕之含氫空氣進行催化氧化之化學反應,以使其含氫空氣中的氫氣濃度降低,另該冷卻通道26內之冷卻液體持續經由所述散熱裝置261進行降低其工作 溫度,以使其氫氣處理系統1處於安全之工作溫度,而該氣體抽取裝置4持續抽氣且將通過觸媒模組221且氫氣濃度降低之含氫空氣送往出氣通道23且排回密閉空間,以降低其密閉空間內之氫氣濃度,進而達到可降低密閉空間之氫氣濃度以避免因為氫氣產生危險之功效者。 Please refer to Figure 3 again, which is the implementation schematic diagram of the hydrogen processing system of the present invention II. The following example is an implementation mode applied to a confined space. The use in a non-confined space is only due to the difference in application scenarios. The hydrogen processing system 1 further includes a hydrogen detection unit 5. The hydrogen detection unit 5 is electrically connected to the gas extraction device 4, and the cooling channel 26 is connected to a heat sink 261. The unit 5 detects the hydrogen concentration in the enclosed space. When the hydrogen concentration in the enclosed space is higher than the set standard value, the hydrogen detection unit 5 activates the gas extraction device 4. When the gas extraction device 4 is opened, the gas processing passage 22 and the intake passage 21 are pumped, so that the hydrogen-containing air outside the hydrogen treatment system 1 enters the intake passage 21 and is humidified by the gas humidification device 3. The catalyst module 221 catalyzes and oxidizes the humidified hydrogen-containing air. chemical reaction, so that the hydrogen concentration in the hydrogen-containing air is reduced, and the cooling liquid in the cooling channel 26 continues to reduce its work through the cooling device 261 temperature, so that the hydrogen processing system 1 is at a safe working temperature, and the gas extraction device 4 continues to pump air and sends the hydrogen-containing air that passes through the catalyst module 221 and has a reduced hydrogen concentration to the gas outlet channel 23 and discharges it back to the closed space, so as to reduce the hydrogen concentration in the closed space, thereby achieving the effect of reducing the hydrogen concentration in the closed space to avoid danger caused by hydrogen.

再請參閱第4圖所示,係為本發明氫氣處理系統之實施示意圖三,其中所述氫氣處理系統1更包括有一吸附裝置6及一處理水收集裝置7,該吸附裝置6連通所述氣體加濕裝置3,而該處理水收集裝置7連通所述氣體抽取裝置4,而其氣體抽取裝置4啟動時抽取含氫空氣,而含氫空氣通過所述吸附裝置6且由吸附裝置6吸附含氫空氣之硫化氫,再將其含氫空氣送往氣體加濕裝置3,而含氫空氣通過所述氣體加濕裝置3及觸媒模組221,該氣體加濕裝置3對其含氫空氣加濕,加濕後含氫空氣由觸媒模組221進行催化氧化所述氫氣並通過所述氣體抽取裝置4將氣體排出,而該加濕後含氫空氣由觸媒模組221所轉換之水則由處理水收集裝置7收集,以降低氫氣濃度,進而達到可降低密閉空間之氫氣濃度以避免因為氫氣產生危險之功效者。 Please refer to Fig. 4 again, which is the third implementation schematic diagram of the hydrogen treatment system of the present invention, wherein the hydrogen treatment system 1 further includes an adsorption device 6 and a treated water collection device 7, the adsorption device 6 is connected to the gas humidification device 3, and the treated water collection device 7 is connected to the gas extraction device 4, and the gas extraction device 4 starts to extract hydrogen-containing air, and the hydrogen-containing air passes through the adsorption device 6 and is adsorbed by the adsorption device 6. The hydrogen air passes through the gas humidifying device 3 and the catalyst module 221. The gas humidifying device 3 humidifies the hydrogen-containing air. After the humidification, the hydrogen-containing air is catalyzed by the catalyst module 221 to oxidize the hydrogen and the gas is discharged through the gas extraction device 4. The water converted from the humidified hydrogen-containing air by the catalyst module 221 is collected by the treated water collection device 7 to reduce the hydrogen concentration.

以上已將本發明做一詳細說明,惟以上所述者,僅為本發明之一較佳實施例而已,當不能限定本發明實施之範圍,即凡依本發明申請範圍所作之均等變化與修飾等,皆應仍屬本發明之專利涵蓋範圍。 The present invention has been described in detail above, but the above is only a preferred embodiment of the present invention, and should not limit the scope of the present invention, that is, all equivalent changes and modifications made according to the scope of application of the present invention should still belong to the scope of patent coverage of the present invention.

1:氫氣處理系統 1: Hydrogen treatment system

2:氣體處理裝置 2: Gas treatment device

21:進氣通道 21: Intake channel

22:氣體處理通道 22: Gas processing channel

221:觸媒模組 221: Catalyst module

23:出氣通道 23: Outlet channel

24:第一隔層 24: The first compartment

25:第二隔層 25: second compartment

26:冷卻通道 26: cooling channel

3:氣體加濕裝置 3: Gas humidification device

4:氣體抽取裝置 4: Gas extraction device

Claims (8)

一種氫氣處理系統,係包括:一氣體處理裝置,該氣體處理裝置具有相互連通之一進氣通道及一氣體處理通道及一出氣通道,該氣體處理通道內設置有至少一觸媒模組,另該氣體處理裝置內設置有一第一隔層及一第二隔層貼附所述觸媒模組,又該氣體處理裝置內更設置有至少一冷卻通道於該第一隔層與所述第二隔層相對該觸媒模組另一側;一氣體加濕裝置,該氣體加濕裝置係設置於所述進氣通道位置處;及一氣體抽取裝置,該氣體抽取裝置連通所述氣體處理通道,且該氣體抽取裝置啟動時抽取含氫空氣且進入所述氣體通道,而含氫空氣會先通過所述氣體加濕裝置,該氣體加濕裝置對其含氫空氣進行加濕,使該含氫空氣呈現安全狀態,而加濕過後之含氫空氣再由進氣通道進入到氣體處理通道之觸媒模組,並由觸媒模組進行催化氧化所述加濕之含氫空氣中的氫氣並排出,以降低空氣之氫氣濃度,所述觸媒模組係為白金觸媒或奈米級白金觸媒。 A hydrogen processing system, comprising: a gas processing device, the gas processing device has an inlet channel, a gas processing channel and a gas outlet channel connected to each other, the gas processing channel is provided with at least one catalyst module, and the gas processing device is provided with a first partition and a second partition to attach the catalyst module, and the gas processing device is further provided with at least one cooling channel on the opposite side of the catalyst module between the first partition and the second partition; a gas humidifier, the gas humidification device is arranged on the intake air and a gas extraction device, the gas extraction device communicates with the gas processing channel, and when the gas extraction device is activated, it extracts hydrogen-containing air and enters the gas channel, and the hydrogen-containing air first passes through the gas humidification device, and the gas humidification device humidifies the hydrogen-containing air, so that the hydrogen-containing air is in a safe state, and the humidified hydrogen-containing air enters the catalyst module of the gas processing channel through the intake channel, and the hydrogen in the humidified hydrogen-containing air is catalyzed by the catalyst module and discharged, In order to reduce the hydrogen concentration in the air, the catalyst module is a platinum catalyst or a nanoscale platinum catalyst. 如請求項1所述之氫氣處理系統,其中所述第一隔層與第二隔層其一或兩者可為散熱材料或散熱板或金屬板其中之一者。 The hydrogen processing system according to claim 1, wherein one or both of the first spacer and the second spacer can be a heat dissipation material, a heat dissipation plate or a metal plate. 如請求項1所述之氫氣處理系統,其中所述第一隔層與第二隔層其一或兩者可為散熱材料或石墨製程之板體其中之一者。 The hydrogen processing system according to claim 1, wherein one or both of the first interlayer and the second interlayer can be one of heat dissipation materials or graphite-processed plates. 如請求項1所述之氫氣處理系統,其中所述氣體抽取裝置係設置於所述出氣通道位置處,而其氣體抽取裝置啟動時抽取含氫空氣,而含氫空氣通過所述氣體加濕裝置及觸媒模組,該氣體加濕裝置對其含氫空氣加 濕,加濕後含氫空氣由觸媒模組進行催化氧化所述氫氣並通過所述氣體抽取裝置排出。 The hydrogen processing system as described in claim 1, wherein the gas extraction device is arranged at the position of the gas outlet channel, and when the gas extraction device is activated, the hydrogen-containing air is extracted, and the hydrogen-containing air passes through the gas humidification device and the catalyst module, and the gas humidification device adds hydrogen to the hydrogen-containing air. After humidification, the hydrogen-containing air is catalyzed and oxidized by the catalyst module and discharged through the gas extraction device. 如請求項1所述之氫氣處理系統,其中所述冷卻通道內填充有冷卻液體,且該冷卻通道連通有一散熱裝置。 The hydrogen processing system according to claim 1, wherein the cooling channel is filled with cooling liquid, and the cooling channel is connected with a heat sink. 如請求項1所述之氫氣處理系統,更包括有一氫氣偵測單元,該氫氣偵測單元電性連接所述氣體抽取裝置。 The hydrogen processing system as described in claim 1 further includes a hydrogen detection unit electrically connected to the gas extraction device. 如請求項5所述之氫氣處理系統,更包括有一吸附裝置,該吸附裝置連通所述氣體加濕裝置,而其氣體抽取裝置啟動時抽取含氫空氣,而含氫空氣通過所述吸附裝置且由吸附裝置吸附含氫空氣之硫化氫,再將其含氫空氣送往氣體加濕裝置,而含氫空氣通過所述氣體加濕裝置及觸媒模組,該氣體加濕裝置對其含氫空氣加濕,加濕後含氫空氣由觸媒模組進行催化氧化所述氫氣並通過所述氣體抽取裝置排出。 The hydrogen treatment system as described in Claim 5 further includes an adsorption device, the adsorption device is connected to the gas humidification device, and when the gas extraction device starts, it extracts hydrogen-containing air, and the hydrogen-containing air passes through the adsorption device and is adsorbed by the adsorption device to absorb hydrogen sulfide in the hydrogen-containing air, and then sends the hydrogen-containing air to the gas humidification device, and the hydrogen-containing air passes through the gas humidification device and the catalyst module, and the gas humidification device humidifies the hydrogen-containing air. The gas extraction device is exhausted. 如請求項1所述之氫氣處理系統,更包括有一處理水收集裝置,該處理水收集裝置連通所述氣體抽取裝置。 The hydrogen treatment system as described in claim 1 further includes a treated water collection device, which is connected to the gas extraction device.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006322768A (en) * 2005-05-18 2006-11-30 Toshiba Corp Hydrogen remover and its removing method for reactor containment
CN104470848A (en) * 2012-07-24 2015-03-25 特拉华空气喷射火箭达因公司 Hydrogen recombiner
JP2015230267A (en) * 2014-06-06 2015-12-21 株式会社東芝 Hydrogen removal apparatus
JP5843688B2 (en) * 2012-04-24 2016-01-13 株式会社東芝 Hydrogen removal system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006322768A (en) * 2005-05-18 2006-11-30 Toshiba Corp Hydrogen remover and its removing method for reactor containment
JP5843688B2 (en) * 2012-04-24 2016-01-13 株式会社東芝 Hydrogen removal system
CN104470848A (en) * 2012-07-24 2015-03-25 特拉华空气喷射火箭达因公司 Hydrogen recombiner
JP2015230267A (en) * 2014-06-06 2015-12-21 株式会社東芝 Hydrogen removal apparatus

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