TWI796218B - Carrier plate applied for load port - Google Patents

Carrier plate applied for load port Download PDF

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Publication number
TWI796218B
TWI796218B TW111117493A TW111117493A TWI796218B TW I796218 B TWI796218 B TW I796218B TW 111117493 A TW111117493 A TW 111117493A TW 111117493 A TW111117493 A TW 111117493A TW I796218 B TWI796218 B TW I796218B
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Taiwan
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air nozzle
guide groove
nozzle
distance
air
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TW111117493A
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Chinese (zh)
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TW202326917A (en
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許聖奇
古伊鈞
胡瀚承
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華景電通股份有限公司
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Priority to JP2022002663U priority Critical patent/JP3239901U/en
Priority to US18/076,237 priority patent/US20230207360A1/en
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Publication of TWI796218B publication Critical patent/TWI796218B/en
Publication of TW202326917A publication Critical patent/TW202326917A/en

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

A carrier plate applied for a load port is provided, which includes a main body is arranged on the load port, a first guide slot is arranged on the lower side of the main body, and the first guide slot is provided with a first switch to drive a first nozzle to move up and down to change the position, a second guide slot is arranged on the lower side of the main body opposite to the first guide slot, and the second guide slot is provided with a second switch to drive a second nozzle to move up and down to change the position, a third guide slot is arranged on the top side of the main body, and the third guide slot is provided with a third switch to drive a third nozzle to move obliquely to change the position, and a fourth guide slot is arranged on the top side of the main body opposite to the third guide slot, and the fourth guide slot is provided with a fourth nozzle to move obliquely to change the position, thereby, the first nozzle, the second nozzle, the third nozzle and the fourth nozzle move to the positions corresponding to the holes on the bottom of the wafer transfer cassette to inflate or exhaust for the wafer transfer cassette.

Description

應用於晶圓盒承載裝置的承載盤Carrying plate applied to wafer box carrying device

本發明是有關於一種應用於晶圓盒承載裝置的承載盤,特別是一種可以依據不同晶圓傳送盒的型式來切換氣嘴位置的承載盤。The present invention relates to a carrier tray used in a wafer cassette carrier device, in particular to a carrier tray capable of switching the positions of gas nozzles according to different types of FOUPs.

近年來晶圓的高度積體化或電路的微細化進展迅速,環境要求也有所提高,暴露於空氣氛圍而在晶圓表面容易附著水分或氧氣,而有產生腐蝕或氧化的可能性。因此需要將晶圓周邊微環境維持在高清潔度,避免微粒或水分附著於晶圓表面的情況發生,目前有效方法是使晶圓周邊成為惰性氣體之氮氣環境、或成為真空狀態或是乾燥空氣,以免晶圓表面氧化等表面的性狀變化。In recent years, the high integration of wafers or the miniaturization of circuits has progressed rapidly, and the environmental requirements have also increased. Exposure to the air atmosphere will easily attach moisture or oxygen to the surface of the wafer, which may cause corrosion or oxidation. Therefore, it is necessary to maintain the microenvironment around the wafer at a high degree of cleanliness to avoid the occurrence of particles or moisture adhering to the surface of the wafer. The current effective method is to make the surrounding of the wafer into a nitrogen environment of inert gas, or into a vacuum state or dry air , so as to avoid changes in surface properties such as wafer surface oxidation.

為了適當地維持這樣的晶圓周邊的微環境,晶圓會放入密閉式晶圓傳送盒的內部並受到管理,在其內部會充填氮氣或是乾燥空氣。In order to properly maintain such a micro-environment around the wafer, the wafer is put into the inside of a closed FOUP and managed, and the inside is filled with nitrogen or dry air.

近年來各家廠商及不同型號的晶圓傳送盒之間沒有統一的標準規格,進出氣孔的位置有所差異,各種不同型號的晶圓傳送盒需要搭配不同規格的承載盤,造成作業不便與成本增加。In recent years, there is no unified standard specification among various manufacturers and different types of FOUPs, and the positions of the air inlet and outlet holes are different. Various types of FOUPs need to be equipped with different specifications of carrier trays, resulting in inconvenience and cost. Increase.

因此,如何設計出一種兼容性高且可以快速切換使用的承載盤,能夠有效提升作業效率及節省設備成本已成為一個重要的課題。Therefore, how to design a carrier plate with high compatibility and fast switchability, which can effectively improve work efficiency and save equipment cost has become an important issue.

為了解決現有技術的缺陷,本發明的主要目的是提供了一種應用於晶圓盒承載裝置的承載盤,只需要一個承載盤,且調整承載盤上的氣嘴位置以對應各種不同型號的晶圓傳送盒,降低了目前需要配合各種不同型號的晶圓傳送盒而設計不同承載盤的成本,並且增加晶圓廠在使用上的便利性。從而也解決存放多個承載盤的空間問題。In order to solve the defects of the prior art, the main purpose of the present invention is to provide a carrier plate applied to the wafer cassette carrier device, only one carrier plate is needed, and the position of the gas nozzle on the carrier plate can be adjusted to correspond to various types of wafers The transfer box reduces the cost of designing different carrier trays to match various types of wafer transfer boxes, and increases the convenience of the fab in use. Thereby, the problem of space for storing multiple carrier disks is also solved.

本發明的另一目的在於藉由承載盤上的氣嘴可以依晶圓傳送盒的底部的氣孔位置分佈相應的移動切換位置,使得氣體可以透過切換後的氣嘴位置對晶圓傳送盒進行充氣或是排氣。Another object of the present invention is that the air nozzles on the susceptor can distribute corresponding moving and switching positions according to the positions of the air holes at the bottom of the FOUP, so that the gas can inflate the FOUP through the switched positions of the air nozzles Or exhaust.

根據上述目的,本發明揭露一種應用於晶圓盒承載裝置的承載盤,包含:本體,設置於晶圓盒承載裝置上;第一導槽,設置在本體的下側,於第一導槽內設有第一切換件及第一氣嘴,第一切換件帶動第一氣嘴上下移動切換位置;第二導槽,相對於第一導槽設置在本體的下側,第二導槽內設有第二切換件及第二氣嘴,第二切換件帶動第二氣嘴上下移動切換位置;第三導槽,相對於第一導槽設置於本體的上側,第三導槽內設有第三切換件及第三氣嘴,第三切換件帶動第三氣嘴斜向移動切換位置;以及第四導槽,相對於第三導槽設置於本體的上側,第四導槽內設有第四切換件及第四氣嘴,第四切換件帶動第四氣嘴斜向移動切換位置,其中,依據晶圓傳送盒的底部的多個氣孔位置,第一氣嘴、第二氣嘴、第三氣嘴及第四氣嘴移動至對應多個氣孔位置以對晶圓傳送盒進行充氣或是排氣。According to the above purpose, the present invention discloses a carrier tray applied to a wafer cassette carrier device, comprising: a body, arranged on the wafer cassette carrier device; a first guide groove, arranged on the lower side of the body, in the first guide groove There is a first switching piece and a first air nozzle, and the first switching piece drives the first air nozzle to move up and down to switch positions; the second guide groove is arranged on the lower side of the body relative to the first guide groove, and the second guide groove is provided with There is a second switching piece and a second air nozzle, and the second switching piece drives the second air nozzle to move up and down to switch positions; the third guide groove is arranged on the upper side of the body relative to the first guide groove, and the third guide groove is provided with a second Three switching parts and the third gas nozzle, the third switching part drives the third gas nozzle to move obliquely to the switching position; and the fourth guide groove is arranged on the upper side of the body relative to the third guide groove, and the fourth guide groove is provided with the first Four switching parts and the fourth gas nozzle, the fourth switching part drives the fourth gas nozzle to move obliquely to the switching position, wherein, according to the positions of the multiple air holes at the bottom of the FOUP, the first gas nozzle, the second gas nozzle, the fourth gas nozzle The third air nozzle and the fourth air nozzle are moved to positions corresponding to a plurality of air holes to inflate or exhaust the FOUP.

在本發明的較佳實施例中,應用於晶圓盒承載裝置的承載盤更包含第五氣嘴及第六氣嘴,分別設置於本體的上側,第五氣嘴與第六氣嘴之間的距離小於第三氣嘴與第四氣嘴之間的距離。In a preferred embodiment of the present invention, the carrying plate applied to the wafer cassette carrying device further includes a fifth air nozzle and a sixth air nozzle, which are respectively arranged on the upper side of the body, between the fifth air nozzle and the sixth air nozzle The distance is less than the distance between the third air nozzle and the fourth air nozzle.

在本發明的較佳實施例中,當第一氣嘴切換至第一導槽上側位置,且第二氣嘴切換至第二導槽上側位置時,第三氣嘴位於第三導槽最外側位置,且第四氣嘴位於第四導槽最外側位置,其中第一氣嘴的第一氣嘴孔的中心與第二氣嘴的第二氣嘴孔中心之間有第一距離,第三氣嘴的第三氣嘴孔的中心與第四氣嘴的第四氣嘴孔中心之間有第二距離,第二距離大於第一距離。In a preferred embodiment of the present invention, when the first air nozzle is switched to the upper side of the first guide groove, and the second air nozzle is switched to the upper side of the second guide groove, the third air nozzle is located at the outermost side of the third guide groove position, and the fourth air nozzle is located at the outermost position of the fourth guide groove, wherein there is a first distance between the center of the first air nozzle hole of the first air nozzle and the center of the second air nozzle hole of the second air nozzle, and the third There is a second distance between the center of the third gas nozzle hole of the gas nozzle and the center of the fourth gas nozzle hole of the fourth gas nozzle, and the second distance is greater than the first distance.

在本發明的較佳實施例中,當第一氣嘴切換至第一導槽上側位置,且第二氣嘴切換至第二導槽上側位置時,第三氣嘴位於第三導槽最上側位置,且第四氣嘴位於第四導槽最上側位置,其中第三氣嘴的第三氣嘴孔中心與第四氣嘴的第四氣嘴孔中心之間有第三距離,第三距離小於第二距離且大於第一距離。In a preferred embodiment of the present invention, when the first air nozzle is switched to the upper side of the first guide groove, and the second air nozzle is switched to the upper side of the second guide groove, the third air nozzle is located at the uppermost side of the third guide groove position, and the fourth air nozzle is located at the uppermost position of the fourth guide groove, wherein there is a third distance between the center of the third air nozzle hole of the third air nozzle and the center of the fourth air nozzle hole of the fourth air nozzle, and the third distance less than the second distance and greater than the first distance.

在本發明的較佳實施例中,當第一氣嘴切換至第一導槽下側位置,且第二氣嘴切換至第二導槽下側位置時,第三氣嘴位於第三導槽最內側位置,且第四氣嘴位於第四導槽最內側位置,其中第一氣嘴的第一氣嘴孔的中心與第二氣嘴的第二氣嘴孔的中心之間有第一距離,第三氣嘴的第三氣嘴孔的中心與第四氣嘴的第四氣嘴孔的中心之間有第四距離,第四距離小於第三距離且等於第一距離。In a preferred embodiment of the present invention, when the first air nozzle is switched to the lower side of the first guide groove, and the second air nozzle is switched to the lower side of the second guide groove, the third air nozzle is located in the third guide groove The innermost position, and the fourth air nozzle is located at the innermost position of the fourth guide groove, wherein there is a first distance between the center of the first air nozzle hole of the first air nozzle and the center of the second air nozzle hole of the second air nozzle , there is a fourth distance between the center of the third nozzle hole of the third nozzle and the center of the fourth nozzle hole of the fourth nozzle, and the fourth distance is smaller than the third distance and equal to the first distance.

在本發明的較佳實施例中,當第一氣嘴切換至第一導槽下側位置,且第二氣嘴切換至第二導槽下側位置時,第一氣嘴的第一氣嘴孔的中心與第二氣嘴的第二氣嘴孔的中心之間有一第一距離,第五氣嘴的第五氣嘴孔的中心與第六氣嘴的第六氣嘴孔的中心之間有第五距離,第五距離等於第一距離。In a preferred embodiment of the present invention, when the first air nozzle is switched to the position on the lower side of the first guide groove, and the second air nozzle is switched to the position on the lower side of the second guide groove, the first air nozzle of the first air nozzle There is a first distance between the center of the hole and the center of the second nozzle hole of the second nozzle, and between the center of the fifth nozzle hole of the fifth nozzle and the center of the sixth nozzle hole of the sixth nozzle. There is a fifth distance, which is equal to the first distance.

請參考圖1。圖1是表示應用於晶圓盒承載裝置的承載盤的第一實施例的示意圖。在圖1中,承載盤1a具有本體10a,設置於晶圓承載裝置(未在圖中表示)上。另外在圖1中,以笛卡兒座標系的Y方向表示本體10a的上側及下側,以X方向表示本體10a的左側及右側。承載盤1a的本體10a具有第一導槽12、第二導槽14、第三導槽16及第四導槽18,其結構及位置關係如下詳述。Please refer to Figure 1. FIG. 1 is a schematic diagram showing a first embodiment of a carrier tray applied to a wafer cassette carrier device. In FIG. 1 , a susceptor 1 a has a body 10 a and is disposed on a wafer carrier (not shown in the figure). In addition, in FIG. 1, the upper side and the lower side of the main body 10a are shown by the Y direction of the Cartesian coordinate system, and the left side and the right side of the main body 10a are shown by the X direction. The main body 10a of the carrier plate 1a has a first guide slot 12, a second guide slot 14, a third guide slot 16, and a fourth guide slot 18, and their structures and positions are described in detail below.

第一導槽12設置在本體10a的下側,在第一導槽12內設有第一切換件122及第一氣嘴124,第一切換件122帶動第一氣嘴124在第一導槽12內上下移動。第二導槽14相對於第一導槽12設置於本體10的下側,第二導槽14內設有第二切換件142及第二氣嘴144,第二切換件142帶動第二氣嘴144在第二導槽14內上下移動切換位置。要說明的是,第一導槽12與第二導槽14是分別相對地設置在本體10a的下側的左右兩側。其中,第一氣嘴124上下移動的方向與X方向之間的夾角為90度,第二氣嘴144上下移動的方向與X方向之間的夾角為90度。第三導槽16相對於第一導槽12設置於本體的10的上側,第三導槽16內設有第三切換件162及第三氣嘴164,第三切換件162帶動第三氣嘴164斜向移動切換位置。第四導槽18相對於第三導槽16設置在本體10的上側,第四導槽18內設有第四切換件182及第四氣嘴184,第四切換件182帶動第四氣嘴184斜向移動切換位置。其中,第三氣嘴164斜向移動的方向與X方向之間的夾角介於10度至35度,第四氣嘴184斜向移動的方向與X方向之間的夾角也介於10度至35度。在此要進一步說明的是,第三導槽16及第四導槽18分別設置在第一導槽12及第二導槽14的上方。另外,在第三導槽16及第四導槽18的外側分別定義有至少三個定位點20a、20b、20c,每 一個定位點20a、20b、20c分別對應不同型態的晶圓傳送盒(未在圖中表示)的底部的氣孔位置,因此,在第三切換件162可以帶動第三氣嘴164在第三導槽16內切換至其中一個定位點20a、20b或20c;第四切換件182可以帶動第四氣嘴184在第四導槽18內切換至其中一個定位點20a、20b或20c。根據上述,依據晶圓傳送盒(未在圖中表示)的底部(未在圖中表示)的多個氣孔位置(未在圖中表示),第一切換件122帶動第一氣嘴124、第二切換件142帶動第二氣嘴144、第三切換件162帶動第三氣嘴164及第四切換件182帶動第四氣嘴184移動切換位置,使得在切換後的位置可以對應不同型態晶圓傳送盒(未在圖中表示)的多個氣孔位置(未在圖中表示)並對晶圓傳送盒(未在圖中表示)進行充氣或是排氣。也就是說,不同型態的晶圓傳送盒的底部氣孔位置分佈也會有所不同,本發明實施例的承載盤藉由切換氣嘴的位置可以對應至少三種不同氣孔分佈的晶圓傳送盒,以下將舉例進行說明。The first guide groove 12 is arranged on the lower side of the main body 10a, and the first switch member 122 and the first air nozzle 124 are arranged in the first guide groove 12, and the first switch member 122 drives the first air nozzle 124 in the first guide groove. Move up and down within 12. The second guide groove 14 is arranged on the lower side of the main body 10 relative to the first guide groove 12, and the second guide groove 14 is provided with a second switching member 142 and a second air nozzle 144, and the second switching member 142 drives the second air nozzle. 144 moves the switching position up and down in the second guide groove 14 . It should be noted that, the first guide groove 12 and the second guide groove 14 are respectively disposed opposite to each other on the left and right sides of the lower side of the main body 10a. Wherein, the included angle between the direction in which the first air nozzle 124 moves up and down and the X direction is 90 degrees, and the included angle between the direction in which the second air nozzle 144 moves up and down and the X direction is 90 degrees. The third guide groove 16 is arranged on the upper side of the body 10 relative to the first guide groove 12, and the third guide groove 16 is provided with a third switching member 162 and a third air nozzle 164, and the third switching member 162 drives the third air nozzle 164 Diagonal movement to switch positions. The fourth guide groove 18 is arranged on the upper side of the main body 10 relative to the third guide groove 16, and the fourth guide groove 18 is provided with a fourth switching member 182 and a fourth air nozzle 184, and the fourth switching member 182 drives the fourth air nozzle 184 Move diagonally to toggle the position. Wherein, the angle between the obliquely moving direction of the third air nozzle 164 and the X direction is between 10° and 35°, and the angle between the obliquely moving direction of the fourth air nozzle 184 and the X direction is also between 10° and X direction. 35 degrees. It should be further explained here that the third guiding groove 16 and the fourth guiding groove 18 are respectively disposed above the first guiding groove 12 and the second guiding groove 14 . In addition, at least three positioning points 20a, 20b, 20c are respectively defined on the outside of the third guiding groove 16 and the fourth guiding groove 18, and each positioning point 20a, 20b, 20c corresponds to a different type of FOUP ( not shown in the figure), therefore, the third switching member 162 can drive the third air nozzle 164 to switch to one of the positioning points 20a, 20b or 20c in the third guide groove 16; the fourth switching member 182 can drive the fourth air nozzle 184 to switch to one of the positioning points 20a, 20b or 20c in the fourth guide groove 18 . According to the above, according to the positions (not shown) of the air holes (not shown in the figure) of the bottom (not shown in the figure) of the FOUP (not shown in the figure), the first switching member 122 drives the first air nozzle 124, the second The second switching part 142 drives the second gas nozzle 144, the third switching part 162 drives the third gas nozzle 164, and the fourth switching part 182 drives the fourth gas nozzle 184 to move the switching position, so that the switched position can correspond to different types of crystals. Multiple air hole positions (not shown in the figure) of the FOUP (not shown in the figure) are used to inflate or exhaust the FOUP (not shown in the figure). That is to say, the position distribution of air holes at the bottom of different types of FOUPs will also be different. The susceptor according to the embodiment of the present invention can correspond to at least three FOUPs with different air hole distributions by switching the positions of the air nozzles. An example will be described below.

在圖1中,當承載盤1a承載第一晶圓傳送盒(未在圖中表示),此時,承載盤1a為了對應第一晶圓傳送盒底部的氣孔位置分佈,承載盤1a的第一氣嘴124切換至第一導槽12的上側位置,第二氣嘴144切換至第二導槽14的上側位置,第三氣嘴164位於第三導槽16的最外側位置(定位點20a),第四氣嘴184位於第四導槽18的最外側位置(定位點20a),其中第一氣嘴124的第一氣嘴孔1242的中心與第二氣嘴14的第二氣嘴孔1442的中心之間有第一距離L1,第三氣嘴164的第三氣嘴孔1642的中心與第四氣嘴184的第四氣嘴孔1842的中心之心有第二距離L2,且第二距離L2大於第一距離L1。In FIG. 1, when the carrier tray 1a carries the first FOUP (not shown in the figure), at this time, in order to correspond to the position distribution of the air holes at the bottom of the first FOUP, the first FOUP of the carrier tray 1a The air nozzle 124 is switched to the upper side of the first guide groove 12, the second air nozzle 144 is switched to the upper side of the second guide groove 14, and the third air nozzle 164 is located at the outermost position of the third guide groove 16 (locating point 20a) , the fourth air nozzle 184 is located at the outermost position (locating point 20a) of the fourth guide groove 18, wherein the center of the first air nozzle hole 1242 of the first air nozzle 124 is aligned with the second air nozzle hole 1442 of the second air nozzle 14 There is a first distance L1 between the centers of the third valve hole 1642 of the third valve 164 and the center of the center of the fourth valve hole 1842 of the fourth valve 184 has a second distance L2, and the second The distance L2 is greater than the first distance L1.

請參考圖2,圖2是表示應用於晶圓盒承載裝置的承載盤的第二實施例的示意圖。圖2所表示的承載盤1a的本體10a的第一導槽12、第二導槽14、第三導槽16、第四導槽18的結構及位置關與前述圖1相同,不多加陳述。如圖2所示,當承載盤1a承載第二晶圓傳送盒(未在圖中表示),此時,承載盤1a為了對應第二晶圓傳送盒底部(未在圖中表示)的氣孔位置分佈,承載盤1a的第一氣嘴124切換至第一導槽12的上側位置,且第二氣嘴144切換至第二導槽14的上側位置時,第三氣嘴164位於第三導槽16的最上側位置(定位點20b),且第四氣嘴184位於第四導槽18的最上側位置(定位點20b),其中第三氣嘴164的第三氣嘴孔1642的中心與第四氣嘴184的第四氣嘴孔1842的中心之間有第三距離L3,且第三距離L3小於第二距離L2(如圖1所示)且大於第一距離L1。Please refer to FIG. 2 . FIG. 2 is a schematic diagram showing a second embodiment of a carrier tray applied to a wafer cassette carrier device. The structures and positions of the first guide groove 12, the second guide groove 14, the third guide groove 16, and the fourth guide groove 18 of the main body 10a of the carrier plate 1a shown in FIG. As shown in FIG. 2, when the carrier tray 1a carries the second FOUP (not shown in the figure), at this time, the carrier tray 1a corresponds to the position of the air hole at the bottom of the second FOUP (not shown in the figure). Distribution, when the first air nozzle 124 of the carrier tray 1a is switched to the upper side position of the first guide groove 12, and the second air nozzle 144 is switched to the upper side position of the second guide groove 14, the third air nozzle 164 is located in the third guide groove 16 at the uppermost position (positioning point 20b), and the fourth air nozzle 184 is located at the uppermost position (positioning point 20b) of the fourth guide groove 18, wherein the center of the third air nozzle hole 1642 of the third air nozzle 164 is in line with the first There is a third distance L3 between centers of the fourth air nozzle holes 1842 of the four air nozzles 184, and the third distance L3 is smaller than the second distance L2 (as shown in FIG. 1 ) and larger than the first distance L1.

請參考圖3,圖3是表示應用於晶圓盒承載裝置的承載盤的第三實施例的示意圖。同樣的,圖3所表示的承載盤1a的本體10a的第一導槽12、第二導槽14、第三導槽16、第四導槽18的結構及位置關與前述圖1相同,不多加陳述。如圖3所示,當承載盤1a承載第三晶圓傳送盒(未在圖中表示),此時,承載盤1a為了對應第三晶圓傳送盒底部(未在圖中表示)的氣孔位置分佈,承載盤1的第一氣嘴124切換至第一導槽12的下側位置,且第二氣嘴144切換至第二導槽14的下側位置時,第三氣嘴164位於第三導槽16的最內側位置(定位點20c),且第四氣嘴184位於第四導槽18的最內側位置(定位點20c),其中第三氣嘴164的第三氣嘴孔1642的中心與第四氣嘴184的第四氣嘴孔1842的中心之間有第四距離L4,且第四距離L4小於第三距離L3(如圖2所示)且等於第一距離L1。Please refer to FIG. 3 . FIG. 3 is a schematic diagram showing a third embodiment of a carrier tray applied to a wafer cassette carrier device. Similarly, the structures and positions of the first guide groove 12, the second guide groove 14, the third guide groove 16, and the fourth guide groove 18 of the body 10a of the carrying tray 1a shown in FIG. Make more statements. As shown in FIG. 3, when the carrier tray 1a carries the third FOUP (not shown in the figure), at this time, the carrier tray 1a corresponds to the position of the air hole at the bottom of the third FOUP (not shown in the figure). Distribution, when the first air nozzle 124 of the carrier tray 1 is switched to the lower side of the first guide groove 12, and the second air nozzle 144 is switched to the lower side of the second guide groove 14, the third air nozzle 164 is located in the third The innermost position (positioning point 20c) of the guide groove 16, and the fourth air nozzle 184 is located at the innermost position (positioning point 20c) of the fourth guide groove 18, wherein the center of the third air nozzle hole 1642 of the third air nozzle 164 There is a fourth distance L4 between the center of the fourth nozzle hole 1842 of the fourth nozzle 184, and the fourth distance L4 is smaller than the third distance L3 (as shown in FIG. 2 ) and equal to the first distance L1.

請參考圖4,圖4是表示應用於晶圓盒承載裝置的承載盤的第四實施例的示意圖。在圖4中,承載盤1b具有本體10b,設置於晶圓承載裝置(未在圖中表示)上。另外在圖4中,以笛卡兒座標系的Y方向表示本體10b的上側及下側,以X方向表示本體10b的左側及右側。承載盤1b的本體10b具有第一導槽12、第二導槽14、第三導槽30、第四導槽32,其結構及位置關係如下詳述。Please refer to FIG. 4 . FIG. 4 is a schematic view showing a fourth embodiment of a carrier tray applied to a wafer cassette carrier device. In FIG. 4 , the susceptor 1 b has a body 10 b and is disposed on a wafer support device (not shown in the figure). In addition, in FIG. 4, the upper side and the lower side of the main body 10b are shown by the Y direction of the Cartesian coordinate system, and the left side and the right side of the main body 10b are shown by the X direction. The main body 10b of the carrier plate 1b has a first guide groove 12, a second guide groove 14, a third guide groove 30, and a fourth guide groove 32, and their structures and positional relationships are described in detail below.

第一導槽12設置在本體10b的下側,在第一導槽12內設有第一切換件122及第一氣嘴124,第一切換件122帶動第一氣嘴124在第一導槽12內上下移動。第二導槽14相對於第一導槽12設置於本體10b的下側,第二導槽14內設有第二切換件142及第二氣嘴144,第二切換件142帶動第二氣嘴144在第二導槽14內上下移動切換位置。要說明的是,第一導槽12與第二導槽14是分別相對地設置在本體10b的下側的左右兩側。第三導槽30相對於第一導槽12設置於本體10b的上側,第三導槽30內設有第三切換件302及第三氣嘴304,第三切換件302帶動第三氣嘴304斜向移動切換位置。第四導槽32相對於第三導槽30設置在本體10b的上側,第四導槽32內設有第四切換件322及第四氣嘴324,第四切換件322帶動第四氣嘴324斜向移動切換位置。另外,在第三導槽30及第四導槽32的外側定義有至少兩個定位點22a、22b,每 一個定位點22a、22b分別對應不同型態的晶圓傳送盒(未在圖中表示)的底部的氣孔位置,因此,在第三切換件302可以帶動第三氣嘴304在第三導槽30內切換至其中一個定位點22a或22b;第四切換件322可以帶動第四氣嘴324在第四導槽32內切換至其中一個定位點22a或22b。在本實施例中,第五氣嘴40及第六氣嘴42,分別設置於本體10b的上側,且第五氣嘴40與第六氣嘴42之間的距離L5小於第三氣嘴304與第四氣嘴324之間的第二距離L6,但等於第一距離L1。The first guide groove 12 is arranged on the lower side of the main body 10b, and the first switch member 122 and the first air nozzle 124 are arranged in the first guide groove 12, and the first switch member 122 drives the first air nozzle 124 in the first guide groove. Move up and down within 12. The second guide groove 14 is arranged on the lower side of the main body 10b relative to the first guide groove 12. The second guide groove 14 is provided with a second switching member 142 and a second air nozzle 144, and the second switching member 142 drives the second air nozzle. 144 moves the switching position up and down in the second guide groove 14 . It should be noted that, the first guide groove 12 and the second guide groove 14 are respectively disposed opposite to each other on the left and right sides of the lower side of the main body 10b. The third guide groove 30 is arranged on the upper side of the main body 10b relative to the first guide groove 12, and the third guide groove 30 is provided with a third switching member 302 and a third air nozzle 304, and the third switching member 302 drives the third air nozzle 304 Move diagonally to toggle the position. The fourth guide groove 32 is arranged on the upper side of the main body 10b relative to the third guide groove 30, and the fourth guide groove 32 is provided with a fourth switching member 322 and a fourth air nozzle 324, and the fourth switching member 322 drives the fourth air nozzle 324 Move diagonally to toggle the position. In addition, at least two positioning points 22a, 22b are defined outside the third guiding groove 30 and the fourth guiding groove 32, and each positioning point 22a, 22b corresponds to a different type of FOUP (not shown in the figure). ) at the bottom of the air hole position, therefore, the third switching member 302 can drive the third air nozzle 304 to switch to one of the positioning points 22a or 22b in the third guide groove 30; the fourth switching member 322 can drive the fourth air nozzle 324 switches to one of the positioning points 22a or 22b in the fourth guide groove 32 . In this embodiment, the fifth air nozzle 40 and the sixth air nozzle 42 are respectively arranged on the upper side of the main body 10b, and the distance L5 between the fifth air nozzle 40 and the sixth air nozzle 42 is smaller than the distance L5 between the third air nozzle 304 and the sixth air nozzle 42. The second distance L6 between the fourth air nozzles 324 is equal to the first distance L1.

在圖4中,當承載盤1b承載所述第一晶圓傳送盒(未在圖中表示),此時,承載盤1b為了對應第一晶圓傳送盒底部的氣孔位置分佈,承載盤1b的第一氣嘴124切換至第一導槽12的上側位置,第二氣嘴144切換至第二導槽14的上側位置,第三導槽30的第三氣嘴304及第四導槽32的第四氣嘴324在定位點22a的位置時,第三氣嘴304位於第三導槽30最外側位置(定位點22a),第四氣嘴32位於第四導槽30最外側位置(定位點22a),其中第一氣嘴124的第一氣嘴孔1242的中心與第二氣嘴14的第二氣嘴孔1442的中心之間有第一距離L1,第五氣嘴40及第六氣嘴42之間有第五距離L5,第一距離L1等於第五距離L5;第三氣嘴304的第三氣嘴孔3042的中心與第四氣嘴324的第四氣嘴孔3242的中心之間有第二距離L2,且第二距離L2大於第一距離L1,且大於第五距離L5。In FIG. 4, when the carrier tray 1b carries the first FOUP (not shown in the figure), at this time, in order to correspond to the air hole position distribution at the bottom of the first FOUP, the carrier tray 1b The first air nozzle 124 switches to the upper side position of the first guide groove 12, the second air nozzle 144 switches to the upper side position of the second guide groove 14, the third air nozzle 304 of the third guide groove 30 and the fourth guide groove 32 When the fourth air nozzle 324 is at the position of the anchor point 22a, the third air nozzle 304 is located at the outermost position of the third guide groove 30 (the anchor point 22a), and the fourth air nozzle 32 is located at the outermost position of the fourth guide groove 30 (the anchor point 22a), wherein there is a first distance L1 between the center of the first gas nozzle hole 1242 of the first gas nozzle 124 and the center of the second gas nozzle hole 1442 of the second gas nozzle 14, the fifth gas nozzle 40 and the sixth gas nozzle There is a fifth distance L5 between the nozzles 42, and the first distance L1 is equal to the fifth distance L5; between the center of the third nozzle hole 3042 of the third nozzle 304 and the center of the fourth nozzle hole 3242 of the fourth nozzle 324 There is a second distance L2 between them, and the second distance L2 is greater than the first distance L1 and greater than the fifth distance L5.

根據上述,依據第一晶圓傳送盒(未在圖中表示)的底部(未在圖中表示)的多個氣孔位置(未在圖中表示),第一切換件122帶動第一氣嘴124、第二切換件142帶動第二氣嘴144、第三切換件302帶動第三氣嘴304位於第三導槽30最外側位置(定位點22a)及第四切換件322帶動第四氣嘴324移動切換位於第四導槽18最外側位置(定位點22a),使得在切換後的位置可以對應晶圓傳送盒(未在圖中表示)的多個氣孔位置(未在圖中表示)並對第一晶圓傳送盒(未在圖中表示)進行充氣或是排氣。According to the above, according to the positions (not shown) of the air holes (not shown in the figure) of the bottom (not shown in the figure) of the first FOUP (not shown in the figure), the first switching member 122 drives the first air nozzle 124 , the second switching member 142 drives the second air nozzle 144, the third switching member 302 drives the third air nozzle 304 located at the outermost position of the third guide groove 30 (locating point 22a), and the fourth switching member 322 drives the fourth air nozzle 324 The mobile switch is located at the outermost position (locating point 22a) of the fourth guide groove 18, so that the switched position can correspond to a plurality of air hole positions (not shown in the figure) of the FOUP (not shown in the figure) and to The first FOUP (not shown) is inflated or deflated.

接著請參考圖5。圖5是表示應用於晶圓盒承載裝置的承載盤的第五實施例的示意圖。圖5所表示的承載盤1b的本體10b的第一導槽12、第二導槽14、第三導槽30、第四導槽32的結構及位置關與前述圖4相同,不多加陳述。在圖5中,當承載盤1b承載所述第二晶圓傳送盒(未在圖中表示),此時,承載盤1b為了對應第二晶圓傳送盒底部的氣孔位置分佈,承載盤1b的第一氣嘴124切換至第一導槽12的上側位置,第二氣嘴144切換至第二導槽14上側位置,第三氣嘴304位於第三導槽30最上側位置(定位點22b),第四氣嘴32位於第四導槽30最上側位置(定位點22b),其中第一氣嘴124的第一氣嘴孔1242的中心與第二氣嘴144的第二氣嘴孔1442的中心之間有第一距離L1,第五氣嘴40的第五氣嘴孔402的中心及第六氣嘴42的第六氣嘴孔422的中心之間有第五距離L5,第一距離L1等於第五距離L5;第三氣嘴304的第三氣嘴孔3042的中心與第四氣嘴324的第四氣嘴孔3242的中心之間有第三距離L3,其中第三距離L3小於第二距離L2但大於第一距離L1,且大於第五距離L5。Please refer to Figure 5 next. FIG. 5 is a schematic diagram showing a fifth embodiment of a carrier tray applied to a wafer cassette carrier device. The structures and positions of the first guide groove 12, the second guide groove 14, the third guide groove 30, and the fourth guide groove 32 of the main body 10b of the carrier plate 1b shown in FIG. 5 are the same as those in FIG. In FIG. 5, when the carrier tray 1b carries the second FOUP (not shown in the figure), at this time, in order to correspond to the air hole position distribution at the bottom of the second FOUP, the carrier tray 1b The first air nozzle 124 is switched to the upper side of the first guide groove 12, the second air nozzle 144 is switched to the upper side of the second guide groove 14, and the third air nozzle 304 is located at the uppermost position of the third guide groove 30 (locating point 22b) , the fourth air nozzle 32 is located at the uppermost position of the fourth guide groove 30 (locating point 22b), wherein the center of the first air nozzle hole 1242 of the first air nozzle 124 and the center of the second air nozzle hole 1442 of the second air nozzle 144 There is a first distance L1 between the centers, there is a fifth distance L5 between the center of the fifth nozzle hole 402 of the fifth nozzle 40 and the center of the sixth nozzle hole 422 of the sixth nozzle 42, and the first distance L1 Equal to the fifth distance L5; there is a third distance L3 between the center of the third nozzle hole 3042 of the third nozzle 304 and the center of the fourth nozzle hole 3242 of the fourth nozzle 324, wherein the third distance L3 is less than the first The second distance L2 is greater than the first distance L1 and greater than the fifth distance L5.

接著請參考圖6。圖6是表示應用於晶圓盒承載裝置的承載盤的第六實施例的示意圖。同樣的,圖6所表示的承載盤1b的本體10b的第一導槽12、第二導槽14、第三導槽16、第四導槽18的結構及位置關與前述圖4相同,不多加陳述。在圖6中,當承載盤1b承載所述第三晶圓傳送盒(未在圖中表示),此時,承載盤1b為了對應第三晶圓傳送盒底部的氣孔位置分佈,承載盤1b的第一氣嘴124切換至第一導槽12下側位置,第二氣嘴144切換至第二導槽14下側位置,第三氣嘴304可位於第三導槽30內的任意位置,例如最外側位置(定位點22a),第四氣嘴32可位於第四導槽30內的任意位置,例如最外側位置(定位點22a),其中第一氣嘴124的第一氣嘴孔1242的中心與第二氣嘴14的第二氣嘴孔1442的中心之間有第一距離L1,第五氣嘴40的第五氣嘴孔402的中心及第六氣嘴42的第六氣嘴孔422的中心之間有第五距離L5,第一距離L1等於第五距離L5;第三氣嘴304的第三氣嘴孔3042的中心與第四氣嘴324的第四氣嘴孔3242的中心之間有第二距離L2,且第二距離L2大於第一距離L1,且大於第五距離L5。Please refer to Figure 6 next. FIG. 6 is a schematic diagram showing a sixth embodiment of a carrier tray applied to a wafer cassette carrier device. Similarly, the structures and positions of the first guide groove 12, the second guide groove 14, the third guide groove 16, and the fourth guide groove 18 of the body 10b of the carrying tray 1b shown in FIG. Make more statements. In FIG. 6, when the carrier tray 1b carries the third FOUP (not shown in the figure), at this time, in order to correspond to the air hole position distribution at the bottom of the third FOUP, the carrier tray 1b The first air nozzle 124 is switched to the position on the lower side of the first guide groove 12, the second air nozzle 144 is switched to the position on the lower side of the second guide groove 14, and the third air nozzle 304 can be located at any position in the third guide groove 30, for example The outermost position (locating point 22a), the fourth air nozzle 32 can be located at any position in the fourth guide groove 30, such as the outermost position (locating point 22a), wherein the first air nozzle hole 1242 of the first air nozzle 124 There is a first distance L1 between the center and the center of the second nozzle hole 1442 of the second nozzle 14, the center of the fifth nozzle hole 402 of the fifth nozzle 40 and the sixth nozzle hole of the sixth nozzle 42 There is a fifth distance L5 between the centers of 422, and the first distance L1 is equal to the fifth distance L5; the center of the third valve hole 3042 of the third valve 304 and the center of the fourth valve hole 3242 of the fourth valve 324 There is a second distance L2 between them, and the second distance L2 is greater than the first distance L1 and greater than the fifth distance L5.

在前述的實施例中,第一氣嘴124與第二氣嘴144通常是用於對晶圓傳送盒(未在圖中表示)進行充氣使用的氣嘴,第三氣嘴164、第四氣嘴184、第五氣嘴40及第六氣嘴孔422通常是用於對晶圓傳送盒(未在圖中表示)進行排氣使用的氣嘴。但是,在另一實施例中,可以是第三氣嘴164是用於對晶圓傳送盒(未在圖中表示)進行充氣使用的氣嘴,第四氣嘴184是用於對晶圓傳送盒(未在圖中表示)進行排氣使用的氣嘴。在本發明中並不予以限制各個氣嘴的充氣或排氣功能,只要氣嘴位置能對應各種不同型態的晶圓傳送盒即可。In the foregoing embodiments, the first air nozzle 124 and the second air nozzle 144 are generally used to inflate the FOUP (not shown in the figure), the third air nozzle 164, the fourth air nozzle The nozzle 184 , the fifth nozzle 40 and the sixth nozzle hole 422 are generally nozzles used for exhausting the FOUP (not shown in the figure). But, in another embodiment, it may be that the third gas nozzle 164 is used to inflate the FOUP (not shown in the figure), and the fourth gas nozzle 184 is used to transfer the wafers. Air nozzle used for exhausting the cartridge (not shown in the figure). In the present invention, the inflation or exhaust function of each air nozzle is not limited, as long as the positions of the air nozzles can correspond to various types of FOUPs.

依據上述,使用者只需要將承載盤1a的第一氣嘴124、第二氣嘴144、第三氣嘴164及第四氣嘴184,承載盤1b的第一氣嘴124、第二氣嘴144、第三氣嘴304、第四氣嘴324依據晶圓傳送盒(未在圖中表示)的底部(未在圖中表示)的多個氣孔位置(未在圖中表示)對應調整即可以使用,增加了使用上的便利性及降低不同的晶圓傳送盒(未在圖中表示)的底部(未在圖中表示)的氣孔位置(未在圖中表示)需要使用不同的承載盤的成本及空間利用性。According to the above, the user only needs to connect the first air nozzle 124, the second air nozzle 144, the third air nozzle 164, and the fourth air nozzle 184 of the tray 1a, the first air nozzle 124, and the second air nozzle of the tray 1b. 144. The third air nozzle 304 and the fourth air nozzle 324 can be adjusted according to the position of multiple air holes (not shown in the figure) at the bottom (not shown in the figure) of the FOUP (not shown in the figure) Use, increase the convenience of use and reduce the air hole position (not shown in the figure) of the bottom (not shown in the figure) of different wafer transfer boxes (not shown in the figure) need to use different carrier trays cost and space utilization.

1a、1b:承載盤 10a、10b:本體 12:第一導槽 122:第一切換件 124:第一氣嘴 1242:第一氣嘴孔 14:第二導槽 142:第二切換件 144:第二氣嘴 1442:第二氣嘴孔 16、30:第三導槽 162、302:第三切換件 164、304:第三氣嘴 1642、3042:第三氣嘴孔 18、32:第四導槽 182、322:第四切換件 184、324:第四氣嘴 1842、3242:第四氣嘴孔 20a、20b、20c、22a、22b:定位點 L1:第一距離 L2:第二距離 L3:第三距離 L4:第四距離 L5:第五距離1a, 1b: carrying plate 10a, 10b: Ontology 12: The first guide groove 122: The first switch 124: The first valve 1242: The first valve hole 14: Second guide groove 142: The second switch 144:Second valve 1442: The second valve hole 16, 30: The third guide groove 162, 302: the third switch 164, 304: the third valve 1642, 3042: the third valve hole 18, 32: The fourth guide groove 182, 322: the fourth switch 184, 324: The fourth valve 1842, 3242: the fourth valve hole 20a, 20b, 20c, 22a, 22b: anchor points L1: first distance L2: second distance L3: third distance L4: fourth distance L5: fifth distance

圖1是根據本發明所揭露的技術,表示應用於晶圓盒承載裝置的承載盤的第一實施例的示意圖。 圖2是根據本發明所揭露的技術,表示應用於晶圓盒承載裝置的承載盤的第二實施例的示意圖。 圖3是根據本發明所揭露的技術,表示應用於晶圓盒承載裝置的承載盤的第三實施例的示意圖。 圖4是根據本發明所揭露的技術,表示應用於晶圓盒承載裝置的承載盤的第四實施例的示意圖。 圖5是根據本發明所揭露的技術,表示應用於晶圓盒承載裝置的承載盤的第五實施例的示意圖。 圖6是根據本發明所揭露的技術,表示應用於晶圓盒承載裝置的承載盤的第六實施例的示意圖。 FIG. 1 is a schematic diagram showing a first embodiment of a carrier tray applied to a wafer cassette carrier device according to the technology disclosed in the present invention. FIG. 2 is a schematic diagram showing a second embodiment of a carrier tray applied to a wafer cassette carrier device according to the technology disclosed in the present invention. FIG. 3 is a schematic diagram showing a third embodiment of a carrier tray applied to a wafer cassette carrier device according to the technology disclosed in the present invention. FIG. 4 is a schematic diagram showing a fourth embodiment of a carrier tray applied to a wafer cassette carrier device according to the technology disclosed in the present invention. FIG. 5 is a schematic diagram showing a fifth embodiment of a carrier tray applied to a wafer cassette carrier device according to the technology disclosed in the present invention. FIG. 6 is a schematic diagram showing a sixth embodiment of a carrier tray applied to a wafer cassette carrier device according to the technology disclosed in the present invention.

1a:承載盤 1a: carrier plate

10a:本體 10a: Ontology

12:第一導槽 12: The first guide groove

122:第一切換件 122: The first switch

124:第一氣嘴 124: The first valve

1242:第一氣嘴孔 1242: The first valve hole

14:第二導槽 14: Second guide groove

142:第二切換件 142: The second switch

144:第二氣嘴 144:Second valve

1442:第二氣嘴孔 1442: The second valve hole

16:第三導槽 16: The third guide groove

162:第三切換件 162: The third switch

164:第三氣嘴 164: The third valve

1642:第三氣嘴孔 1642: The third valve hole

18:第四導槽 18: The fourth guide groove

18:第四切換件 18: The fourth switching piece

184:第四氣嘴 184: The fourth valve

1842:第四氣嘴孔 1842: Fourth valve hole

20a、20b、20c、22a、22b:定位點 20a, 20b, 20c, 22a, 22b: anchor points

L1:第一距離 L1: first distance

L2:第二距離 L2: second distance

Claims (6)

一種應用於晶圓盒承載裝置的承載盤,包含: 一本體,設置於一晶圓盒承載裝置上; 一第一導槽,設置於該本體的下側,該第一導槽內設有一第一切換件及一第一氣嘴,該第一切換件帶動該第一氣嘴上下移動切換位置; 一第二導槽,相對於該第一導槽設置於該本體的下側,該第二導槽內設有一第二切換件及一第二氣嘴,該第二切換件帶動該第二氣嘴上下移動切換位置; 一第三導槽,相對於該第一導槽設置於該本體的上側,該第三導槽內設有一第三切換件及一第三氣嘴,該第三切換件帶動該第三氣嘴斜向移動切換位置;以及 一第四導槽,相對於該第三導槽設置於該本體的上側,該第四導槽內設有一第四切換件及一第四氣嘴,該第四切換件帶動該第四氣嘴斜向移動切換位置; 其中,依據一晶圓傳送盒的一底部的多個氣孔位置,該第一氣嘴、該第二氣嘴、該第三氣嘴及該第四氣嘴移動至對應該些氣孔位置以對該晶圓傳送盒進行充氣或是排氣。 A carrier plate applied to a wafer box carrier device, comprising: a body, set on a wafer cassette carrying device; A first guide groove is arranged on the lower side of the body, and a first switching member and a first gas nozzle are arranged in the first guide groove, and the first switching member drives the first gas nozzle to move up and down to switch positions; A second guide groove is arranged on the lower side of the body relative to the first guide groove, and a second switch piece and a second air nozzle are arranged in the second guide groove, and the second switch piece drives the second air nozzle Move the mouth up and down to switch positions; A third guide slot is arranged on the upper side of the body relative to the first guide slot, and a third switching member and a third air nozzle are arranged in the third guide slot, and the third switching member drives the third air nozzle Move the toggle position diagonally; and A fourth guide groove is arranged on the upper side of the body relative to the third guide groove, and a fourth switching member and a fourth air nozzle are arranged in the fourth guide groove, and the fourth switching member drives the fourth air nozzle Move diagonally to switch positions; Wherein, according to the position of a plurality of air holes at the bottom of a FOUP, the first air nozzle, the second air nozzle, the third air nozzle and the fourth air nozzle move to the positions corresponding to the air holes to The FOUP is inflated or deflated. 如請求項1所述的應用於晶圓承載裝置的承載盤,更包含一第五氣嘴及一第六氣嘴,分別設置於該本體的上側,該第五氣嘴與該第六氣嘴之間的距離小於該第三氣嘴與該第四氣嘴之間的距離。The carrier plate applied to the wafer carrier device as described in claim 1 further includes a fifth air nozzle and a sixth air nozzle, which are respectively arranged on the upper side of the body, the fifth air nozzle and the sixth air nozzle The distance between them is smaller than the distance between the third air nozzle and the fourth air nozzle. 如請求項1或2所述的應用於晶圓承載裝置的承載盤,其中當該第一氣嘴切換至該第一導槽上側位置,且該第二氣嘴切換至該第二導槽上側位置時,該第三氣嘴位於該第三導槽最外側位置,且該第四氣嘴位於該第四導槽最外側位置,其中該第一氣嘴的一第一氣嘴孔的中心與該第二氣嘴的一第二氣嘴孔的中心之間有一第一距離,該第三氣嘴的一第三氣嘴孔的中心與該第四氣嘴的一第四氣嘴孔的中心之間有一第二距離,該第二距離大於該第一距離。The carrier plate applied to the wafer carrier device as described in claim 1 or 2, wherein when the first air nozzle is switched to the upper side of the first guide groove, and the second air nozzle is switched to the upper side of the second guide groove position, the third air nozzle is located at the outermost position of the third guide groove, and the fourth air nozzle is located at the outermost position of the fourth guide groove, wherein the center of a first air nozzle hole of the first air nozzle and There is a first distance between the center of a second gas nozzle hole of the second gas nozzle, the center of a third gas nozzle hole of the third gas nozzle and the center of a fourth gas nozzle hole of the fourth gas nozzle There is a second distance between them, and the second distance is greater than the first distance. 如請求項1或2所述的應用於晶圓承載裝置的承載盤,其中當該第一氣嘴切換至該第一導槽上側位置,且該第二氣嘴切換至該第二導槽上側位置時,該第三氣嘴位於該第三導槽最上側位置,且該第四氣嘴位於該第四導槽最上側位置,其中該第三氣嘴的一第三氣嘴孔的中心與該第四氣嘴的一第四氣嘴孔的中心之間有一第三距離,該第三距離大於該第一距離。The carrier plate applied to the wafer carrier device as described in claim 1 or 2, wherein when the first air nozzle is switched to the upper side of the first guide groove, and the second air nozzle is switched to the upper side of the second guide groove position, the third air nozzle is located at the uppermost position of the third guide groove, and the fourth air nozzle is located at the uppermost position of the fourth guide groove, wherein the center of a third air nozzle hole of the third air nozzle and There is a third distance between centers of a fourth air nozzle hole of the fourth air nozzle, and the third distance is greater than the first distance. 如請求項1所述的應用於晶圓承載裝置的承載盤,其中當該第一氣嘴切換至該第一導槽下側位置,且該第二氣嘴切換至該第二導槽下側位置時,該第三氣嘴位於該第三導槽最內側位置,且該第四氣嘴位於該第四導槽最內側位置,其中該第一氣嘴的一第一氣嘴孔的中心與該第二氣嘴的一第二氣嘴孔的中心之間有一第一距離,該第三氣嘴的一第三氣嘴孔的中心與該第四氣嘴的一第四氣嘴孔的中心之間有一第四距離,該第四距離等於該第一距離。The carrier tray applied to the wafer carrier device as described in claim 1, wherein when the first air nozzle is switched to the lower side of the first guide groove, and the second air nozzle is switched to the lower side of the second guide groove position, the third air nozzle is located at the innermost position of the third guide groove, and the fourth air nozzle is located at the innermost position of the fourth guide groove, wherein the center of a first air nozzle hole of the first air nozzle and There is a first distance between the center of a second gas nozzle hole of the second gas nozzle, the center of a third gas nozzle hole of the third gas nozzle and the center of a fourth gas nozzle hole of the fourth gas nozzle There is a fourth distance between them, and the fourth distance is equal to the first distance. 如請求項2所述的應用於晶圓承載裝置的承載盤,其中當該第一氣嘴切換至該第一導槽下側位置,且該第二氣嘴切換至該第二導槽下側位置,該第一氣嘴的一第一氣嘴孔的中心與該第二氣嘴的一第二氣嘴孔的中心之間有一第一距離,該第五氣嘴的一第五氣嘴孔的中心與該第六氣嘴的一第六氣嘴孔的中心之間有一第五距離,該第五距離等於該第一距離。The carrier tray applied to the wafer carrier device as described in claim 2, wherein when the first air nozzle is switched to the lower side of the first guide groove, and the second air nozzle is switched to the lower side of the second guide groove Position, there is a first distance between the center of a first nozzle hole of the first nozzle and the center of a second nozzle hole of the second nozzle, a fifth nozzle hole of the fifth nozzle There is a fifth distance between the center of the sixth air nozzle and the center of a sixth air nozzle hole, and the fifth distance is equal to the first distance.
TW111117493A 2021-12-28 2022-05-10 Carrier plate applied for load port TWI796218B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201308425A (en) * 2011-08-05 2013-02-16 Tian-Xing Huang Mask cleaning device and mask cleaning method
TWM480159U (en) * 2013-12-20 2014-06-11 Jun-Long Wu Gas supply device of storage cassettes placement platform
CN112447571A (en) * 2019-08-30 2021-03-05 长鑫存储技术有限公司 Wafer bearing device and wafer cleaning device adopting same
CN112509970A (en) * 2020-12-15 2021-03-16 深圳中科飞测科技股份有限公司 Bearing device, semiconductor processing equipment and using method of bearing device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201308425A (en) * 2011-08-05 2013-02-16 Tian-Xing Huang Mask cleaning device and mask cleaning method
TWM480159U (en) * 2013-12-20 2014-06-11 Jun-Long Wu Gas supply device of storage cassettes placement platform
CN112447571A (en) * 2019-08-30 2021-03-05 长鑫存储技术有限公司 Wafer bearing device and wafer cleaning device adopting same
CN112509970A (en) * 2020-12-15 2021-03-16 深圳中科飞测科技股份有限公司 Bearing device, semiconductor processing equipment and using method of bearing device

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