TWI795903B - Photonics systems and methods - Google Patents

Photonics systems and methods Download PDF

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TWI795903B
TWI795903B TW110133471A TW110133471A TWI795903B TW I795903 B TWI795903 B TW I795903B TW 110133471 A TW110133471 A TW 110133471A TW 110133471 A TW110133471 A TW 110133471A TW I795903 B TWI795903 B TW I795903B
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pss
crystalline material
laser
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gain medium
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TW202211567A (en
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阿里爾 達南
俄梅爾 卡帕奇
烏利爾 利維
烏拉罕 巴卡爾
納達夫 梅拉穆德
約尼普羅斯珀 沙利波
羅尼 多布林斯基
希萊爾 希萊爾
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以色列商趣眼有限公司
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Abstract

Systems and methods for imaging in the short wave infrared (SWIR), photodetectors with low dark current and associated circuits for reducing dark currents and methods for generating image information based on data of a photodetector array. A SWIR imaging system may include a pulsed illumination source operative to emit radiation pulses in the SWIR band towards a target resulting in reflected radiation from the target; (b) an imaging receiver including a plurality of Ge PDs operative to detect the reflected SWIR radiation and a controller, operative to control activation of the receiver for an integration time during which the accumulated dark current noise does not exceed the time independent readout noise.

Description

光子系統及方法Photonic systems and methods

本發明涉及並要求美國臨時專利申請號的優先權:2020年9月8日提交的63/075,426、2020年10月20日提交的63/093,945和2020年10月22日提交的63/094,913,所有這些通過引用他們整體被併入本文。This application relates to and claims priority to U.S. Provisional Patent Application Numbers: 63/075,426, filed September 8, 2020, 63/093,945, filed October 20, 2020, and 63/094,913, filed October 22, 2020, All of these are hereby incorporated by reference in their entirety.

本發明涉及光子系統、方法及電腦程式產品。更具體地,本發明涉及在紅外(IR)光子中被使用的電光器件及雷射器。The invention relates to photonic systems, methods and computer program products. More specifically, the present invention relates to electro-optic devices and lasers used in infrared (IR) photonics.

光電檢測裝置諸如光電檢測器陣列(也稱為“光電感測器陣列(photosensor arrays)”)包括許多感光位點(a multitude of photosites),每個感光位點包括一個或多個光電二極體及電容,該一個或多個光電二極體用於檢測衝擊(impinging)的光,該電容用於儲存由該光電二極體提供的電荷。該電容可以被實現為一專用電容器及/或使用該光電二極體、電晶體及/或該PS的其它構件的寄生電容。此後,在本說明書中以及為了簡單起見,該術語“光電檢測裝置(photodetecting device)”經常被替換為縮寫詞“PDD”,該術語“光電檢測器陣列(photodetector array)”經常被替換為縮寫詞“PDA”,而術語“光電二極體(photodiode)”經常被替換為縮寫詞“PD”。Photodetection devices such as photodetector arrays (also referred to as "photosensor arrays") comprise a plurality of photosites, each comprising one or more photodiodes and a capacitor, the one or more photodiodes are used to detect impinging light, and the capacitor is used to store the charge provided by the photodiode. The capacitance can be implemented as a dedicated capacitor and/or using parasitic capacitance of the photodiode, transistor and/or other components of the PS. Hereafter, in this specification and for the sake of simplicity, the term "photodetecting device" is often replaced by the abbreviation "PDD" and the term "photodetector array" is often replaced by the abbreviation The word "PDA", while the term "photodiode" is often replaced by the acronym "PD".

該術語“感光位點(photosite)”涉及多個感測器的一陣列中的單個感測器元件(也被稱為“感官(sensel)”,如詞語“感測器(sensor)”及“細胞(cell)”或“感測器(sensor)”及“元件(element)”的組合),並且是也被稱為“感測器元件(sensor element)”、“光感測器元件(photosensor element)”、“光檢測器元件(photodetector element)”等。在下文中,“感光位點(photosite)”通常被替換為縮寫詞“PS”。每個PS可以包括:一個或多個PD(譬如如果彩色濾波器陣列被實現,則檢測光譜的不同部分的光的多個PD可以可選地被統稱為單個PS)。除該PD外,該PS還可以包括:一些電路或多個附加構件。The term "photosite" refers to a single sensor element (also known as a "sensor", as in the words "sensor" and "sensor") in an array of sensors. cell (cell)" or "sensor (sensor)" and "element (element)" combination), and is also known as "sensor element (sensor element)", "photosensor element (photosensor) element)", "photodetector element (photodetector element)", etc. In the following, "photosite" is generally replaced by the abbreviation "PS". Each PS may comprise: one or more PDs (eg, if a color filter array is implemented, multiple PDs detecting light of different parts of the spectrum may alternatively be collectively referred to as a single PS). Besides the PD, the PS may also include: some circuits or additional components.

暗電流是一種眾所周知的現象,當提及諸多PD時,它屬於流過該PD的電流,即使沒有光子進入該裝置也是如此。在諸多PD中的暗電流可能是由該PD的一消耗區中電子及空穴的隨機產生引起的。Dark current is a well-known phenomenon when referring to many PDs, it is the current flowing through the PD even though no photons enter the device. Dark current in many PDs may be caused by the random generation of electrons and holes in a depleted region of the PD.

在某些情況下,有需要向諸多光站點提供以一相對較高的暗電流為特徵的諸多光電二極體,同時實現尺寸受限的諸多電容器。在某些情況下,有需要向諸多PS提供以一相對高的暗電流為特徵的諸多PD,同時降低暗電流對一輸出檢測訊號的影響。在以高暗電流累積為特徵的諸多PS中,有需要並且克服暗電流對諸多電光系統的有害影響將是有益的。此後以及為了簡單起見,該術語“電光(electrooptical)”可以被替換為縮寫詞“EO”。In some cases, there is a need to provide optical sites with photodiodes characterized by a relatively high dark current, while implementing capacitors of limited size. In some cases, it is desirable to provide PSs with PDs characterized by a relatively high dark current while reducing the dark current's effect on an output detection signal. In many PSs characterized by high dark current accumulation, there is a need and it would be beneficial to overcome the detrimental effects of dark current on many electro-optic systems. Hereafter and for the sake of simplicity, the term "electrooptical" may be replaced by the abbreviation "EO".

短波紅外(SWIR)成像使得使用可見光成像難以進行的一系列的應用成為可能。諸多應用包括電子板檢查、太陽能電池檢查、產品檢查、門控成像、識別及分類、監視、防偽、過程質量控制以及更多。許多現存的基於砷化鎵銦(InGaAs)的SWIR成像系統製造成本昂貴,並且目前受制於有限的製造能力。Shortwave infrared (SWIR) imaging enables a range of applications that are difficult to perform using visible light imaging. Applications include electronic board inspection, solar cell inspection, product inspection, gated imaging, identification and classification, surveillance, anti-counterfeiting, process quality control and more. Many existing indium gallium arsenide (InGaAs) based SWIR imaging systems are expensive to manufacture and are currently subject to limited manufacturing capabilities.

因此,能夠基於更容易被集成到周圍電子器件中的諸多PD提供使用更具成本效益的諸多光接收器的SWIR成像系統將是有益的。Therefore, it would be beneficial to be able to provide a SWIR imaging system using a more cost-effective number of photoreceivers based on a number of PDs that are more easily integrated into the surrounding electronics.

根據本發明的一方面,公開一種SWIR光學系統,該SWIR系統包括一被動Q開關雷射器(在本文中也被稱為“P-QS雷射器”),該被動Q開關雷射器包括:一增益介質,包括一增益介質結晶(GMC)材料,該增益介質結晶材料是陶瓷摻釹的釔鋁石榴石(Nd:YAG);一可飽和吸收體(SA),被剛性連接到該增益介質,該SA包括一陶瓷SA結晶材料,該陶瓷SA結晶材料選自於由以下材料組成的多個摻雜陶瓷材料的一群組:V³⁺:YAG及多種摻二價鈷結晶材料;及一光腔,該增益介質和該SA位於該光腔中,該光腔包括一高反射率鏡及一輸出耦合器。According to an aspect of the present invention, a SWIR optical system is disclosed, the SWIR system includes a passive Q-switched laser (also referred to herein as a "P-QS laser"), the passive Q-switched laser includes : a gain medium comprising a gain medium crystalline (GMC) material which is ceramic neodymium-doped yttrium aluminum garnet (Nd:YAG); a saturable absorber (SA) rigidly attached to the gain medium, the SA comprising a ceramic SA crystalline material selected from the group of doped ceramic materials consisting of: V³⁺:YAG and cobalt-doped crystalline materials; and a The optical cavity, the gain medium and the SA are located in the optical cavity, the optical cavity includes a high reflectivity mirror and an output coupler.

此後在此說明書中以及為了簡單起見,該術語“可飽和吸收體(saturable absorber)”經常被替換為縮寫“SA”。Hereafter in this description and for the sake of simplicity, the term "saturated absorber" is frequently replaced by the abbreviation "SA".

根據本發明的一方面,公開一種SWIR光學系統,該SWIR系統包括一P-QS雷射器,該P-QS雷射器包括:一增益介質,包括一GMC材料,該GMC材料是陶瓷Nd:YAG;一SA,被剛性連接到該增益介質,該SA包括一陶瓷SA結晶材料,該陶瓷SA結晶材料選自於由以下材料組成的多個摻雜陶瓷材料的一群組:V³⁺:YAG及多種摻二價鈷結晶材料;及一光腔,該增益介質及該SA位於該光腔中,該光腔包括一高反射率鏡及一輸出耦合器。According to an aspect of the present invention, a kind of SWIR optical system is disclosed, and this SWIR system comprises a P-QS laser, and this P-QS laser comprises: A gain medium, comprises a GMC material, and this GMC material is ceramic Nd: YAG; a SA rigidly attached to the gain medium, the SA comprising a ceramic SA crystalline material selected from the group of doped ceramic materials consisting of: V³⁺:YAG and a plurality of divalent cobalt-doped crystalline materials; and an optical cavity, the gain medium and the SA are located in the optical cavity, the optical cavity includes a high reflectivity mirror and an output coupler.

根據本發明的一方面,公開一種SWIR光學系統,該SWIR系統包括一P-QS雷射器,該P-QS雷射器包括:一增益介質,該增益介質包括一陶瓷GMC材料,該陶瓷GMC材料是陶瓷摻釹稀土元素晶體;一個SA,被剛性連接到該增益介質,該SA包括一陶瓷SA結晶材料,該陶瓷SA結晶材料選自於由以下材料組成的多個摻雜結晶材料組成的一群組:V³⁺:YAG及多種摻鈷結晶材料;及一光腔,該增益介質及該SA位於該光腔中,該光腔包括一高反射率鏡及一輸出耦合器。According to an aspect of the present invention, a SWIR optical system is disclosed, the SWIR system includes a P-QS laser, the P-QS laser includes: a gain medium, the gain medium includes a ceramic GMC material, the ceramic GMC The material is a ceramic neodymium-doped rare earth element crystal; an SA, rigidly attached to the gain medium, the SA comprising a ceramic SA crystalline material selected from the group consisting of a plurality of doped crystalline materials consisting of A group: V³⁺:YAG and various cobalt-doped crystalline materials; and an optical cavity in which the gain medium and the SA are located, the optical cavity includes a high reflectivity mirror and an output coupler.

根據本發明的一方面,公開一種用於製造一P-QS雷射器的多個部件的方法,該方法包括:將至少一種第一粉末塞入一第一模具中;在該第一模具中壓實該至少一種第一粉末以產出一第一生坯;將不同於該至少一種第一粉末的至少一種第二粉末塞入一第二模具中;在該第二模具中壓實該至少一種第二粉末,從而產出一第二生坯;加熱該第一生坯以產出一第一結晶材料;加熱該第二生坯以產出一第二結晶材料;將該第二結晶材料連接到該第一結晶材料。在這樣的一情況下,該第一結晶材料及該第二結晶材料中的一種結晶材料是一摻釹結晶材料,並且是用於該P-QS雷射器的一增益介質,並且其中該第一結晶材料和第二結晶材料中的另一種結晶材料是用於該P-QS雷射器的一SA,並且選自於由以下材料組成的多個結晶材料的一群組:一摻釹結晶材料及一摻雜結晶材料,該後者選自於由以下材料組成的多個摻雜結晶材料的群組:V³⁺:YAG及多種摻鈷結晶材料。同樣,在這樣的一情況下,該增益介質及該SA中的至少一種是一陶瓷結晶材料(ceramic crystalline material)。According to an aspect of the present invention, a method for manufacturing a plurality of parts of a P-QS laser is disclosed, the method comprising: packing at least one first powder into a first mold; Compacting the at least one first powder to produce a first green body; filling at least one second powder different from the at least one first powder into a second mold; compacting the at least one powder in the second mold a second powder to produce a second green body; heating the first green body to produce a first crystalline material; heating the second green body to produce a second crystalline material; the second crystalline material connected to the first crystalline material. In such a case, one of the first crystalline material and the second crystalline material is a neodymium-doped crystalline material and is a gain medium for the P-QS laser, and wherein the first The other of a crystalline material and a second crystalline material is an SA for the P-QS laser and is selected from a group of crystalline materials consisting of: a neodymium-doped crystalline material and a doped crystalline material selected from the group of doped crystalline materials consisting of V³⁺:YAG and cobalt-doped crystalline materials. Also, in such a case, at least one of the gain medium and the SA is a ceramic crystalline material.

在以下詳細描述中,闡述許多具體細節以提供本發明的透徹理解。然而,本領域技術人員將理解的是,本發明可以在沒有這些具體細節的情況下被實踐。在其它情況下,公知方法、過程及構件未被詳細描述,以免混淆本發明。In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, it will be understood by those skilled in the art that the present invention may be practiced without these specific details. In other instances, well-known methods, procedures, and components have not been described in detail so as not to obscure the present invention.

在闡述的附圖及描述中,相同的附圖標記指示不同實施例或配置共有的那些構件。In the set forth figures and description, the same reference numerals designate those components common to different embodiments or configurations.

除非另有特別說明,否則從以下討論中可以明顯看出,被理解的是,在整個說明書討論中,使用諸如“處理(processing)”、“計算(calculating)”、“計算(computing)”、“決定(determining)”、“產生(generating)”、“設置(setting)”、“配置(configuring)”等術語、”選擇(selecting)”、“定義(defining)”等包括將資料操縱及/或變換為其它資料的一電腦的動作及/或過程,該資料被表示為物理量,譬如諸多電子量,及/或表示該諸多物理物體的資料。Unless specifically stated otherwise, as will be apparent from the following discussion, it is understood that throughout the discussion of the specification, terms such as "processing", "calculating", "computing", Terms such as "determining", "generating", "setting", "configuring", "selecting", "defining", etc. include the manipulation of data and/or An action and/or process of a computer transformed into other data expressed as physical quantities, such as electronic quantities, and/or data representing the physical objects.

該術語“電腦(computer)”、“處理器(processor)”及“控制器(controller)”應被廣義地解釋為涵蓋具備資料處理能力的任何種類的電子裝置,通過非限制的示例包括:一個人電腦、一伺服器、一計算系統、一通訊裝置、一處理器(譬如數位訊號處理器(DSP)、一微控制器、一現場可程式化化邏輯閘陣列(FPGA)、一特殊功能積體電路等)、任何其它電子計算裝置,或其任意組合。The terms "computer", "processor" and "controller" should be construed broadly to cover any kind of electronic device having data processing capabilities, including by way of non-limiting examples: a person Computer, a server, a computing system, a communication device, a processor (such as a digital signal processor (DSP), a microcontroller, a field programmable logic gate array (FPGA), a special function integrated circuit circuits, etc.), any other electronic computing device, or any combination thereof.

根據本文的教導的操作可以由為了期望目的而被特別建構的一電腦或由為了期望目的而被特別配置的一通用電腦通過被儲存在一電腦可讀儲存媒體中的一電腦程式被執行。Operations in accordance with the teachings herein can be performed by a computer specially constructed for the desired purpose or by a general purpose computer specially configured for the desired purpose by a computer program stored in a computer readable storage medium.

如本文中所使用的,該短語“例如(for example)”、“諸如(such as)”、“比如(for instance)”及其詞型變化描述目前公開的主題的諸多非限制性實施例。在說明書中對“一種情況(one case)”、“一些情況(some cases)”、“其它情況(other cases)”或其詞型變化的引用意謂著結合實施例被描述的一特定特徵、結構或特性被包括在目前公開的主題的至少一個實施例中。因此,該短語“一種情況(one case)”、“一些情況(some cases)”、“其它情況(other cases)”或其詞型變化的出現不一定意指相同的(多個)實施例。As used herein, the phrases "for example", "such as", "for instance" and their conjugations describe various non-limiting examples of the presently disclosed subject matter . References in the specification to "one case", "some cases", "other cases" or variations thereof mean that a particular feature is described in connection with the embodiment, A structure or characteristic is included in at least one embodiment of the presently disclosed subject matter. Thus, appearances of the phrase "one case," "some cases," "other cases," or variations thereof do not necessarily mean the same embodiment(s) .

應當理解的是,為了清楚起見,在諸多單獨的實施例的上下文中被描述的目前公開的主題的某些特徵也可以在單個實施例中以組合被提供。相反地,為了簡潔起見,在單個實施例的上下文中被描述的目前公開的主題的各種特徵也可以單獨地或以任何合適的子組合被提供。It is to be appreciated that certain features of the presently disclosed subject matter, which are, for clarity, described in the context of separate embodiments, may also be provided in combination in a single embodiment. Conversely, various features of presently disclosed subject matter that are, for brevity, described in the context of a single embodiment, may also be provided separately or in any suitable subcombination.

在目前公開的主題的諸多實施例中,在附圖中被以圖解說明的一個或多個階段或步驟可以用不同順序被執行及/或一個或多個階段群組可以同時被執行,反之亦然。該諸多附圖以圖解說明根據目前公開的主題的一實施例的系統架構的一總體示意圖。在諸多附圖中的每個模組可以由進行本文所定義及解釋的諸多功能的軟體、硬體及/或韌體的任何組合組成。在諸多附圖中的該諸多模組可以被集中在一個位置或被分散在一個以上的位置。In various embodiments of the presently disclosed subject matter, one or more stages or steps illustrated in the figures may be performed in a different order and/or one or more groups of stages may be performed simultaneously, and vice versa. Of course. The figures illustrate an overall schematic diagram of a system architecture according to an embodiment of the presently disclosed subject matter. Each module in the various figures may consist of any combination of software, hardware, and/or firmware to perform the functions defined and explained herein. The modules in the figures may be centralized in one location or dispersed in more than one location.

在說明書中對一方法的任何引用應被比照(mutatis mutandis)應用於能夠執行該方法的一系統,並且應該比照應用於儲存諸多指令的一非暫時性電腦可讀媒體,該指令一旦由一電腦執行,引起執行該方法。Any reference to a method in the specification shall be applied mutatis mutandis to a system capable of performing the method, and shall be mutatis mutandis to a non-transitory computer-readable medium storing instructions which, once executed by a computer Execute causes the method to be executed.

在說明書中對一系統的任何引用應被比照應用於能夠由該系統執行的一方法,並且應該比照應用於儲存諸多指令的一非暫時性電腦可讀媒體,該指令可由該系統執行。Any reference in the specification to a system should be mutated to a method executable by the system, and should be mutated to a non-transitory computer-readable medium storing instructions executable by the system.

在說明書中對一非暫時性電腦可讀媒體或類似術語的任何引用應被比照應用於能夠執行被儲存在該非暫時性電腦可讀媒體中的該諸多指令,並且應被比照應用於可由一電腦執行的方法,該電腦讀取被儲存在該非暫時性電腦可讀媒體中的該諸多指令。Any reference in this specification to a non-transitory computer-readable medium or similar terms shall be applied mutatis mutandis to being capable of executing the instructions stored on the non-transitory computer-readable medium, and shall be In a method of execution, the computer reads the plurality of instructions stored in the non-transitory computer readable medium.

除非另有定義,否則本文中使用的所有技術及科學術語具有與本發明所屬領域的普通技術人員通常所理解的相同含義。本文提供的材料、方法及示例僅是說明性的,並非意圖被限制。Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The materials, methods, and examples provided herein are illustrative only and not intended to be limiting.

本發明的方法及系統的實現涉及手動、自動或其一組合以進行或完成某些被選擇的任務或步驟。而且,根據本發明的方法及系統的優選實施例的實際儀器及設備,可以通過硬體或通過在任何韌體的任何作業系統上的軟體或其一組合以實現幾個被選擇的步驟。例如:作為硬體,本發明的多個被選擇的步驟可以被實現為一晶片或一電路。作為軟體,本發明的多個被選擇的步驟可以被實現為由一電腦使用任何合適的作業系統以執行的多個軟體指令。在任何情況下,本發明的方法及系統的多個被選擇的步驟可以被描述為由一資料處理器進行,諸如用於執行多個指令的一計算平臺。Implementation of the methods and systems of the present invention involves performing or completing certain selected tasks or steps manually, automatically, or a combination thereof. Moreover, according to the actual instrumentation and equipment of the preferred embodiments of the method and system of the present invention, several selected steps may be implemented by hardware or by software on any operating system of any firmware or a combination thereof. For example: as hardware, selected steps of the invention may be implemented as a chip or as a circuit. As software, selected steps of the invention could be implemented as software instructions being executed by a computer using any suitable operating system. In any case, selected steps of the methods and systems of the present invention may be described as being performed by a data processor, such as a computing platform for executing instructions.

第1A圖、第1B圖及第1C圖是分別以圖解說明根據目前公開的主題的多個示例的多個主動SWIR成像系統100、100’及100”的多個示意性框圖。1A, 1B, and 1C are schematic block diagrams illustrating active SWIR imaging systems 100, 100', and 100", respectively, according to examples of the presently disclosed subject matter.

如本文中被使用的,一“主動(active)”成像系統可操作以檢測從它的視場(FOV)到達該系統的光,由包括多個PD的一成像接收器對它進行檢測,並且處理該多個檢測訊號以提供該視場或其一部分的一個或多個影像。該術語“影像(image)”意指由該成像系統檢測的一場景的數字表徵,該成像系統儲存在該影像中的每個元件(像素)的一顏色值,每個像素顏色代表從該視場(譬如該FOV的一0.02°乘0.02°的部分,具體取決於接收器的光學器件)的不同部位到達該成像系統的光。要被注意的是,可選地,該成像系統還可被操作以產生在該FOV中的諸多物體或光的其它表徵(譬如一深度圖、3D模型、多邊形網格),但是該術語“影像”意指沒有深度資料的二維(2D)影像。As used herein, an "active" imaging system is operable to detect light reaching the system from its field of view (FOV), which is detected by an imaging receiver comprising a plurality of PDs, and The plurality of detection signals are processed to provide one or more images of the field of view or a portion thereof. The term "image" means a digital representation of a scene detected by the imaging system, which stores a color value for each element (pixel) in the image, each pixel color representing Different parts of the field (eg, a 0.02° by 0.02° portion of the FOV, depending on receiver optics) light reaches the imaging system. It is to be noted that, optionally, the imaging system can also be operated to generate other representations of objects or lights in the FOV (e.g. a depth map, 3D model, polygon mesh), but the term "image ” means a two-dimensional (2D) image without depth data.

系統100包括一照明源(IS)102,該照明源(IS)可操作以朝向一個或多個目標104發射在SWIR波段中的多個輻射脈衝,引起來自該物體的被反射輻射在系統100的方向上被反射回去。在第1A圖中,出射照明(outgoing illumination)被標示為106,並且朝向系統100被反射的照明被標示為108。該被發射的輻射的諸多部分也可能在其它方向上被反射、被偏轉或被該目標吸收。該術語“目標(target)”意指該成像感測器的該FOV中的任何物體(object),諸如固體、液體、柔性及剛性物體。這樣的物體的一些非限制性示例包括車輛、道路、人、動物、植物、建築物、電子設備、雲、微觀樣品、製造中的物品等。可以使用任何合適類型的照明源102,例如一個或多個雷射器、一個或多個發光二極體(LED)、一個或多個入射閃光燈、以上的任意組合等。如下面更詳細地討論的,照明源102可以可選地包括一個或多個主動雷射器,或一個或多個P-QS雷射器。The system 100 includes an illumination source (IS) 102 operable to emit a plurality of pulses of radiation in the SWIR band toward one or more targets 104, causing reflected radiation from the object to appear within the range of the system 100. direction is reflected back. In FIG. 1A , outgoing illumination is indicated at 106 , and illumination reflected toward system 100 is indicated at 108 . Portions of the emitted radiation may also be reflected in other directions, deflected or absorbed by the target. The term "target" means any object in the FOV of the imaging sensor, such as solid, liquid, flexible and rigid objects. Some non-limiting examples of such objects include vehicles, roads, people, animals, plants, buildings, electronic devices, clouds, microscopic samples, items in manufacture, and the like. Any suitable type of illumination source 102 may be used, such as one or more lasers, one or more light emitting diodes (LEDs), one or more incident flashlights, any combination of the above, or the like. As discussed in more detail below, illumination source 102 may optionally include one or more active lasers, or one or more P-QS lasers.

系統100還包括至少一個成像接收器(或簡稱為“接收器(receiver)”)110,該成像接收器110包括可操作用於檢測該被反射的SWIR輻射的多個鍺(Ge)PD。接收器為多個鍺PD中的每個產生一電訊號,該電訊號表示在它的可檢測光譜範圍內衝擊SWIR光量。該量包括從目標反射的SWIR輻射脈衝光量,並且還可以包括:附加的SWIR光(譬如從太陽或從外部光源抵達)。System 100 also includes at least one imaging receiver (or simply "receiver") 110 comprising a plurality of germanium (Ge) PDs operable to detect the reflected SWIR radiation. The receiver generates for each of the plurality of germanium PDs an electrical signal indicative of the amount of impinging SWIR light within its detectable spectral range. This amount includes the amount of SWIR radiation pulsed light reflected from the target, and may also include: additional SWIR light (eg arriving from the sun or from an external light source).

該術語“鍺PD(Ge PD)”涉及其中在該鍺內、在一鍺合金內(譬如SiGe)內或在鍺(或鍺合金)與另一種材料(譬如矽,SiGe)之間的界面上發生光誘導的電子激發(後來可檢測為光電流)的任何PD。具體地,該術語“鍺PD”既涉及純鍺PD,也適用於鍺-矽PD。當包含鍺及矽的鍺PD被使用時,可以使用不同濃度的天竺葵。例如:鍺PD中的鍺的相對部分(無論是以矽合金化還是與其相鄰)可以是在5%與99%的範圍內。例如:在多個鍺PD中鍺的相對部分可以是在15%與40%之間。要被注意的是,除了矽之外的材料也可以是鍺PD的一部分,例如鋁、鎳、矽化物或任何其它合適的材料。在本發明的一些實現方案中,該多個鍺PD可以是純鍺PD(包括大於99.0%的鍺)。The term "germanium PD (Ge PD)" refers to where within the germanium, within a germanium alloy (eg SiGe) or at the interface between germanium (or germanium alloy) and another material (eg silicon, SiGe) Any PD in which light-induced electronic excitation (later detectable as photocurrent) occurs. Specifically, the term "germanium PD" refers to both pure germanium PDs and applies to germanium-silicon PDs. When germanium PDs containing germanium and silicon are used, different concentrations of geranium can be used. For example, the relative portion of germanium in a germanium PD (whether alloyed with or adjacent to silicon) may be in the range of 5% and 99%. For example: the relative fraction of germanium in a plurality of germanium PDs may be between 15% and 40%. It is to be noted that materials other than silicon may also be part of the germanium PD, such as aluminum, nickel, silicide or any other suitable material. In some implementations of the invention, the plurality of germanium PDs can be pure germanium PDs (comprising greater than 99.0% germanium).

要被注意的是,該接收器可以被實現為在單個晶片上被製造的一PDA。遍及本發明被討論的任何該PD陣列都可以被用作接收器110。該鍺PD可以用任何合適的佈置被佈置,諸如一矩形矩陣(鍺PD的直行及直列)、蜂窩平鋪(honeycomb tiling),及甚至是不規則構造。優選地,在該接收器中的鍺PD的數量允許產生高分辨率影像。例如:諸多PD的數量可以在1兆像素、10兆像素或更多的規模的數量級上。It is to be noted that the receiver could be implemented as a PDA fabricated on a single wafer. Any such PD array discussed throughout this disclosure may be used as receiver 110 . The germanium PDs may be arranged in any suitable arrangement, such as a rectangular matrix (straight rows and columns of germanium PDs), honeycomb tiling, and even irregular configurations. Preferably, the number of germanium PDs in the receiver allows high resolution imagery to be produced. For example: the number of PDs can be on the order of 1 megapixel, 10 megapixels or more.

在一些實施例中,接收器110具有以下規格: a.        HFOV(水平視場) [m]:60 b.        WD(工作距離) [m]:150 c.        像素尺寸 [um]:10 d.        分辨率(在目標上) [mm]:58 e.        像素# [H]:1,050 f.         像素# [V]:1112 g.        長寬比:3:1 h.        視角[rad]:0.4 i.         目標的反射率[%]:10% j.         收集(假設目標反射率為100%並假設為朗伯反射率,被收集的光子與被發射的光子的比率):3e-9。In some embodiments, receiver 110 has the following specifications: a. HFOV (horizontal field of view) [m]: 60 b. WD (working distance) [m]: 150 c. Pixel size [um]: 10 d. Resolution (on target) [mm]: 58 e. Pixel # [H]: 1,050 f. Pixel#[V]: 1112 g. Aspect ratio: 3:1 h. Viewing angle [rad]: 0.4 i. Target reflectivity [%]: 10% j. Collection (ratio of collected photons to emitted photons assuming 100% target reflectivity and assumed Lambertian reflectivity): 3e-9.

除了如上所述的衝擊SWIR光以外,該多個鍺PD中的每個產生的該電訊號還代表: a.        讀出雜訊,是隨機的,它的幅度與積分時間無關(或實質上無關)。這種雜訊的示例包括奈奎斯特·約翰遜(Nyquist Johnson)雜訊(也稱為熱雜訊或kTC雜訊)。除了統計分量之外,該讀出過程還可以將一DC分量引入該訊號中,但是該術語“讀出雜訊(readout noise)”涉及由該讀出過程所引入的該訊號的該隨機分量。 b.        暗電流雜訊,是隨機的,並且在積分時間內會被累積(即,它取決於積分時間)。除了統計分量之外,暗電流還將一直流分量(其可以被消除或可以不被消除,譬如為如關於第12A圖至第22圖被討論的)引入該訊號,但是該術語“暗電流雜訊(dark current noise)”屬於由暗電流在該積分時間內被累積的該訊號的該隨機分量。In addition to impinging SWIR light as described above, the electrical signal generated by each of the plurality of germanium PDs also represents: a. Readout noise is random, and its magnitude has nothing to do with integration time (or substantially nothing to do). An example of such noise includes Nyquist Johnson noise (also known as thermal noise or kTC noise). In addition to statistical components, the readout process may also introduce a DC component into the signal, but the term "readout noise" relates to the random component of the signal introduced by the readout process. b. Dark current noise, which is random and accumulates during the integration time (ie, it depends on the integration time). In addition to the statistical component, dark current also introduces a DC component (which may or may not be canceled, such as discussed in relation to Figures 12A to 22) to the signal, but the term "dark current noise "dark current noise" belongs to the random component of the signal that is accumulated by dark current during the integration time.

一些鍺PD,尤其是將鍺與另一種材料(譬如諸如矽)結合在一起的某些PD,其特徵在於一相對較高級別的暗電流。例如:多個鍺PD的該暗電流可能大於50μA/cm²(與該PD的一表面積有關),甚至更大(譬如大於100μA/cm²、大於200μA/cm²或大於500μA/cm²)。取決於該PD的表面積,這樣多個級別的暗電流可以被轉換為每鍺PD為50皮安(pA)或更高(譬如每鍺PD超過100pA、每鍺PD超過200pA、每鍺PD超過500pA,或每鍺PD超過2nA)。要被注意的是,可以使用不同尺寸的多個PD,諸如大約10mm²、大約50mm²、大約100mm²、大約500mm²。要被注意的是,當該多個鍺PD經受不同級別的非零偏壓(nonzero bias)時,該多個鍺PD可能產生不同幅度的暗電流(這在該多個鍺PD中的每個上引起例如大於50皮安的暗電流)。Some germanium PDs, especially some PDs that combine germanium with another material such as silicon for example, are characterized by a relatively high level of dark current. For example, the dark current of multiple germanium PDs may be greater than 50 μA/cm² (related to a surface area of the PD), or even greater (eg greater than 100 μA/cm², greater than 200 μA/cm² or greater than 500 μA/cm²). Depending on the surface area of the PD, such multiple levels of dark current can be translated to 50 picoamperes (pA) per Ge PD or higher (e.g. over 100 pA per Ge PD, over 200 pA per Ge PD, over 500 pA per Ge PD , or more than 2nA per germanium PD). It is to be noted that multiple PDs of different sizes may be used, such as about 10 mm², about 50 mm², about 100 mm², about 500 mm². It should be noted that when the plurality of germanium PDs are subjected to different levels of nonzero bias (nonzero bias), the plurality of germanium PDs may generate dark currents of different magnitudes (this is the case in each of the plurality of germanium PDs). cause a dark current of, for example, greater than 50 pA).

系統100還包括一控制器112及影像處理器114,該控制器112控制接收器110(以及可選地還控制照明源(IS)102及/或其它構件)的操作。因此,控制器112被配置為在一相對短的積分時間內控制接收器110的啟用,從而限制暗電流雜訊的累積對訊號質量的影響。例如:控制器112可以操作為在一積分時間內控制接收器110的啟用,在該積分時間內該被累積的暗電流雜訊不超過該無關積分時間的讀出雜訊。System 100 also includes a controller 112 that controls the operation of receiver 110 (and optionally also illumination source (IS) 102 and/or other components) and image processor 114 . Therefore, the controller 112 is configured to control the activation of the receiver 110 within a relatively short integration time, thereby limiting the effect of the accumulation of dark current noise on the signal quality. For example, the controller 112 may be operable to control the activation of the receiver 110 for an integration time during which the accumulated dark current noise does not exceed the read noise of the irrelevant integration time.

現在參考第2圖,第2圖是以圖解說明根據本發明的主題的諸多示例的在多個積分時間的不同持續時間後的雜訊功率的相對幅度的一示例性圖形。對於一給定的雷射脈衝能量,訊號雜訊比(SNR)主要由雜訊級別決定,該雜訊級別包括該暗電流雜訊(該暗光電流的雜訊)及熱雜訊(也被稱為kTC雜訊)。如第2圖的示例性圖形所示,取決於基於鍺的接收器110的積分時間,該暗電流雜訊或該熱雜訊在影響該PD的該電訊號的該SNR中占主導地位。由於控制器112在一相對短的時間內(在第2圖中被指定為“A”的範圍內)限制該鍺光電檢測器的啟用時間,因此,沒有太多的來自暗電流雜訊的電子被收集,因此SNR被改善並且因此主要受熱雜訊影響。對於一更長的接收器積分時間,在影響該接收器的SNR時,源於該鍺光電檢測器的該暗電流的該雜訊將超過該熱雜訊,從而引起接收器性能下降。要被注意的是,第2圖的圖形僅是說明性的,並且該暗電流雜訊隨時間的累積通常隨著時間的平方根而增加

Figure 02_image001
。(替代地,將y軸視為在一匹配的非線性多項式比例上被繪製)。同樣,在零積分時間(在這樣的一情況下,累積的暗電流雜訊為零)時,該多個軸不會彼此交叉。Reference is now made to FIG. 2, which is an exemplary graph illustrating the relative magnitude of noise power after various durations of integration times in accordance with examples of the inventive subject matter. For a given laser pulse energy, the signal-to-noise ratio (SNR) is mainly determined by the noise level, which includes the dark current noise (noise of the dark photocurrent) and thermal noise (also referred to as called kTC noise). As shown in the exemplary graph of FIG. 2, depending on the integration time of the germanium-based receiver 110, either the dark current noise or the thermal noise dominates the SNR affecting the electrical signal of the PD. Since the controller 112 limits the activation time of the germanium photodetector for a relatively short time (within the range designated as "A" in FIG. 2), there is not much electron emission from dark current noise. is collected, so the SNR is improved and is therefore mainly affected by thermal noise. For a longer receiver integration time, the noise originating from the dark current of the germanium photodetector will exceed the thermal noise while affecting the SNR of the receiver, causing receiver performance degradation. It is to be noted that the graph of Figure 2 is illustrative only and that the accumulation of dark current noise over time generally increases with the square root of time
Figure 02_image001
. (Alternatively, consider the y-axis to be plotted on a matching non-linear polynomial scale). Also, at zero integration time (in which case the accumulated dark current noise is zero), the multiple axes do not cross each other.

回到系統100,要被注意的是,控制器112可以控制接收器110的啟用,以用於更短的積分時間(譬如積分時間,在該積分時間期間該被累積的暗電流雜訊不超過該讀出雜訊的一半或該讀出雜訊的四分之一)。要被注意的是,除非特別需要,否則將該積分時間限制在非常低的級別會限制可以被檢測的多個光感應訊號的數量,並且會使有關熱雜訊的SNR變差。要被注意的是,適合於讀取多個嘈雜訊號的多個讀出電路中的熱雜訊位準(需要收集相對較高的訊號位準)會引入不可忽略的讀出雜訊,這可能會嚴重降低該SNR。Returning to the system 100, it is to be noted that the controller 112 can control the activation of the receiver 110 for shorter integration times (such as integration times during which the accumulated dark current noise does not exceed half of the read noise or a quarter of the read noise). Note that unless specifically required, limiting this integration time to very low levels limits the number of multiple photosensitive signals that can be detected and degrades the SNR with respect to thermal noise. It is to be noted that thermal noise levels in multiple readout circuits suitable for reading multiple noisy signals (required to collect relatively high signal levels) introduce non-negligible readout noise, which may would severely degrade the SNR.

在一些實現方案中,控制器112可以應用稍長的積分時間(譬如積分時間,在該積分時間期間該被累積的暗電流雜訊不超過該讀出雜訊的兩倍或該讀出雜訊的×1.5)。In some implementations, the controller 112 may apply a slightly longer integration time (eg, an integration time during which the accumulated dark current noise does not exceed twice the read noise or the read noise of ×1.5).

本文公開的示例性實施例涉及用於使用包括基於鍺的多個PD的多個接收器的高SNR主動SWIR成像的多個系統及多個方法。與砷化鎵銦技術相比,鍺接收器技術的主要優勢是與CMOS工藝流程的兼容性,允許將該接收器作為一CMOS產出線的一部分進行製造。例如:通過在一矽(Si)基板上生長多個Ge外延層,諸如採用Si光子學,多個鍺PD可以被集成到CMOS工藝流程中。因此,諸多鍺PD也比等效的諸多砷化鎵銦(InGaAs)PD更具成本效益。Exemplary embodiments disclosed herein relate to systems and methods for high SNR active SWIR imaging using receivers including germanium-based PDs. The main advantage of germanium receiver technology over GaInAs technology is compatibility with CMOS process flows, allowing the receiver to be fabricated as part of a CMOS production line. For example, multiple Ge PDs can be integrated into a CMOS process flow by growing multiple Ge epitaxial layers on a silicon (Si) substrate, such as using Si photonics. Therefore, many germanium PDs are also more cost-effective than equivalent many indium gallium arsenide (InGaAs) PDs.

為了利用諸多鍺PD,在本文被公開的一示例性系統適於克服諸多鍺二極體的相對較高的暗電流的限制,通常在約50uA/cm^2的範圍內。通過使用具有短擷取時間及諸多高功率雷射脈衝的一組合的主動成像,該暗電流問題可以被克服。To utilize germanium PDs, an exemplary system disclosed herein is adapted to overcome the relatively high dark current limitation of germanium diodes, typically in the range of about 50 uA/cm^2. This dark current problem can be overcome by using active imaging with a combination of short acquisition times and many high power laser pulses.

與砷化鎵銦(InGaAs)技術相比,諸多鍺PD的使用-特別是但不限於使用CMOS工藝流程製造的諸多鍺PD,對於非冷卻SWIR成像而言,是一便宜得多的解決方案。與許多現有技術成像系統不同,主動成像系統100包括一脈衝照明源,該脈衝照明源具備一短照明持續時間(譬如低於1μS,譬如1至1000μS)及高峰值功率。儘管存在此類脈衝光源的缺點(譬如照明不均勻,更複雜的讀出電路可能引入更高級別的讀出雜訊)以及較短積分時間的缺點(譬如在單個採集週期無法擷取一大範圍的多個距離)。在下面的描述中,幾種方式被討論,用於克服這些缺點,以提供諸多有效的成像系統。The use of many germanium PDs - especially but not limited to many germanium PDs fabricated using a CMOS process flow - is a much cheaper solution for uncooled SWIR imaging compared to indium gallium arsenide (InGaAs) technology. Unlike many prior art imaging systems, active imaging system 100 includes a pulsed illumination source with a short illumination duration (eg, less than 1 μS, eg, 1 to 1000 μS) and high peak power. Despite the disadvantages of such pulsed sources (e.g. non-uniform illumination, more complex readout circuitry may introduce higher levels of readout noise) and short integration times (e.g. inability to capture a large range in a single acquisition cycle) multiple distances). In the following description, several approaches are discussed for overcoming these disadvantages to provide efficient imaging systems.

現在參考第1B圖及第1C圖,它們示意性地以圖解說明根據一些實施例的編號為100’及100’’的諸多其它SWIR成像系統。像系統100一樣,系統100’包括一主動照明源102A及接收器110。在一些實施例中,成像系統100、100’及100’’還包括控制器112及影像處理器114。在一些實施例中,接收器110的輸出的處理可以由影像處理器114進行,並且附加地或替代地由一外部影像處理器(未被示出)進行。多個成像系統100’及100’’可以是成像系統100的諸多變體。關於系統100被討論的任何構件或功能可以在系統100’及100’’中的任何一種中被實現,反之亦然。Reference is now made to Figures 1B and 1C, which schematically illustrate a number of other SWIR imaging systems, numbered 100' and 100'', according to some embodiments. Like system 100, system 100' includes an active illumination source 102A and receiver 110. In some embodiments, the imaging systems 100, 100′, and 100″ further include a controller 112 and an image processor 114. In some embodiments, processing of the output of receiver 110 may be performed by image processor 114, and additionally or alternatively by an external image processor (not shown). Multiple imaging systems 100' and 100" may be many variations of imaging system 100. Any component or function discussed with respect to system 100 may be implemented in either system 100' and 100'', and vice versa.

控制器112是一計算裝置(computing device)。在一些實施例中,控制器112的諸多功能在照明源102及接收器110內被提供,並且不需要控制器112作為一單獨的構件。在一些實施例中,成像系統100’及100’’的控制由控制器112、照明源102及接收器110共同作用而被進行。附加地或替代地,在一些實施例中,成像系統100’及100’’的控制可以由一外部控制器諸如一車輛電子控制單元(ECU)120(其可能屬於已被安裝該成像系統的一車輛)進行。The controller 112 is a computing device. In some embodiments, many of the functions of controller 112 are provided within illumination source 102 and receiver 110, and controller 112 is not required as a separate component. In some embodiments, the imaging systems 100' and 100'' are controlled by the controller 112, the illumination source 102 and the receiver 110 in cooperation. Additionally or alternatively, in some embodiments, the control of imaging systems 100' and 100'' may be provided by an external controller such as a vehicle electronic control unit (ECU) 120 (which may be part of a system in which the imaging system is installed). vehicle) is carried out.

照明源102被配置為在該電磁光譜的紅外(IR)區域中發射一光脈衝106。更具體地,光脈衝106在該SWIR光譜帶中,包括在大約1.3μm至3.0μm的一範圍內的波長。Illumination source 102 is configured to emit a pulse of light 106 in the infrared (IR) region of the electromagnetic spectrum. More specifically, the light pulses 106 are in the SWIR spectral band, including wavelengths in a range of approximately 1.3 μm to 3.0 μm.

在一些實施例中,諸如在第1B圖中示出的,該照明源(現在被標記為102A)是一主動Q開關雷射器(或“主動Q型開關”雷射器),其包括一增益介質(gain medium)122、一泵(pump)124、多個鏡(未被示出)及一主動QS元件126A。在一些實施例中,QS元件126A是一調變器(modulator)。在由泵124對該增益介質122進行電子式或光學式泵送(pumping)後,一光脈衝通過QS元件126A的主動觸發被釋放。In some embodiments, such as that shown in Figure 1B, the illumination source (now labeled 102A) is an active Q-switched laser (or "active Q-switched" laser) that includes a Gain medium 122, a pump 124, mirrors (not shown), and an active QS element 126A. In some embodiments, the QS element 126A is a modulator. After electronic or optical pumping of the gain medium 122 by the pump 124, an optical pulse is released by active triggering of the QS element 126A.

在一些實施例中,諸如在第1C圖中被示出的,照明源102P是一P-QS雷射器,該P-QS雷射器包括增益介質122、泵124、多個鏡(未示出)及一SA 126P。在一“被動QS(passive QS)”光脈衝被釋放後,SA 126P允許該雷射腔儲存光能(來自由泵124泵送的增益介質122),直到在SA 126P中達到一飽和級別。為了檢測該被動QS脈衝的釋放,一QS脈衝光電檢測器128被耦合到照明源102P。在一些實施例中,QS脈衝光電檢測器128是一鍺PD。來自QS脈衝光電檢測器128的該訊號被用來觸發在接收器110中的接收過程,使得接收器110將在適於要被成像的目標104距離的一時間段後被啟用。該時間段被衍生如以下參考第3B圖、第3C圖、第4B圖及第4C圖進一步描述的。In some embodiments, such as that shown in Figure 1C, the illumination source 102P is a P-QS laser comprising a gain medium 122, a pump 124, a plurality of mirrors (not shown out) and a SA 126P. After a "passive QS" optical pulse is released, SA 126P allows the laser cavity to store optical energy (from gain medium 122 pumped by pump 124) until a saturation level is reached in SA 126P. To detect the release of the passive QS pulse, a QS pulse photodetector 128 is coupled to illumination source 102P. In some embodiments, QS pulsed photodetector 128 is a germanium PD. This signal from the QS pulse photodetector 128 is used to trigger the reception process in the receiver 110 so that the receiver 110 will be enabled after a period of time appropriate to the distance of the target 104 to be imaged. This time period is derived as further described below with reference to Figures 3B, 3C, 4B and 4C.

在一些實施例中,來自照明源102的雷射脈衝持續時間在從100 ps到1微秒的範圍內。在一些實施例中,雷射脈衝能量在從10微焦耳到100毫焦耳的範圍內。在一些實施例中,該雷射脈衝週期為100微秒的量級。在一些實施例中,該雷射脈衝週期在從1微秒到100毫秒的範圍內。In some embodiments, the laser pulse duration from illumination source 102 ranges from 100 ps to 1 microsecond. In some embodiments, the laser pulse energy ranges from 10 microjoules to 100 millijoules. In some embodiments, the laser pulse period is on the order of 100 microseconds. In some embodiments, the laser pulse period ranges from 1 microsecond to 100 milliseconds.

增益介質122以一晶體的形式或替代地以一陶瓷形式被提供。可以用於增益介質122的多個材料的多個非限制性示例包括:Nd:YAG、Nd:YVO4、Nd:YLF、Nd:Glass、Nd:GdVO4、Nd:GGG、Nd:KGW、Nd:KYW、Nd:YALO、Nd:YAP、Nd:LSB、Nd:S-FAP、Nd:Cr:GSGG、Nd:Cr:YSGG、Nd:YSAG、Nd:Y2O3、Nd:Sc2O3、Er:Glass、Er:YAG,依此類推。在一些實施例中,該增益介質的多個摻雜級別可以基於對一特定增益的需求被改變。多個SA 126P的多個非限制性示例包括:Co2+:MgAl2O4、Co2+:尖晶石(Spinel)、Co2+:硒化鋅(ZnSe)與其它摻鈷晶體、V3+:YAG、被摻雜的玻璃、量子點、半導體SA鏡(SESAM)、Cr4+YAG SA,諸如此類。P-QS雷射器102P可以被實現的諸多附加方式參照第6圖至圖11被討論,關於一雷射器600被討論的任何變體也可以比照適用照明源102P。The gain medium 122 is provided in a crystalline form or alternatively in a ceramic form. Non-limiting examples of materials that may be used for gain medium 122 include: Nd:YAG, Nd:YVO4, Nd:YLF, Nd:Glass, Nd:GdVO4, Nd:GGG, Nd:KGW, Nd:KYW , Nd:YALO, Nd:YAP, Nd:LSB, Nd:S-FAP, Nd:Cr:GSGG, Nd:Cr:YSGG, Nd:YSAG, Nd:Y2O3, Nd:Sc2O3, Er:Glass, Er:YAG ,So on and so forth. In some embodiments, the doping levels of the gain medium can be changed based on the need for a particular gain. Non-limiting examples of SA 126P include: Co2+:MgAl2O4, Co2+:Spinel, Co2+:ZnSe and other cobalt-doped crystals, V3+:YAG, doped glass, Quantum dots, semiconductor SA mirrors (SESAM), Cr4+YAG SA, and the like. Many additional ways in which the P-QS laser 102P may be implemented are discussed with reference to FIGS. 6-11 , and any of the variations discussed with respect to a laser 600 may also be applied mutatis mutandis to the illumination source 102P.

關於照明源102,要被注意的是,具備足夠功率及足夠短脈衝的脈衝雷射比無脈衝照明更難獲得且更昂貴,尤其是在基於太陽吸收的人眼安全SWIR輻射被需要時。Regarding the illumination source 102, it is noted that pulsed lasers with sufficient power and sufficiently short pulses are more difficult and expensive to obtain than non-pulsed illumination, especially when eye-safe SWIR radiation based on solar absorption is required.

接收器110可以包括:一個或多個鍺PD 118及接收器的光學器件116。在一些實施例中,接收器110包括多個鍺PD 118的一2D陣列。接收器110被選擇以使其對紅外輻射敏感,該紅外輻射至少包括由照明源102發射的波長,從而致使得該接收器可以從反射輻射108形成該被照明的目標104的意象(imagery)。Receiver 110 may include one or more germanium PDs 118 and receiver optics 116 . In some embodiments, receiver 110 includes a 2D array of germanium PDs 118 . Receiver 110 is selected to be sensitive to infrared radiation including at least the wavelengths emitted by illumination source 102 such that the receiver can form an imagery of illuminated object 104 from reflected radiation 108 .

接收器的光學器件116可以包括:一個或多個光學元件,例如諸多鏡或諸多透鏡,其被佈置成收集、集中及可選地過濾該被反射的電磁輻射228,並將該電磁輻射聚焦到接收器110的一焦平面上。Receiver optics 116 may include one or more optical elements, such as mirrors or lenses, arranged to collect, concentrate and optionally filter the reflected electromagnetic radiation 228, and focus the electromagnetic radiation onto on a focal plane of the receiver 110 .

接收器110響應於由代表該照明場景的意象的一個或多個鍺PD 118所檢測的電磁輻射而產生多個電訊號。由接收器110所檢測的多個訊號可以被傳輸到內部影像處理器114或一外部影像處理器(未被示出),以處理成該目標104的一SWIR影像。在一些實施例中,接收器110被多次啟用以創建“多個時間切片(time slices)”,每個時間切片覆蓋一特定距離範圍。在一些實施例中,影像處理器114結合這些切片以創建具備更大視覺深度的單個影像,諸如由格魯伯(Gruber)、托比亞斯(Tobias)等人提出的。“Gated2depth:來自門控影像的實時密集雷射雷達(LIDAR)”,arXiv預印本 arXiv:1902.04997(2019),在此全文引入作為參考。Receiver 110 generates electrical signals in response to electromagnetic radiation detected by one or more germanium PDs 118 representing the imagery of the lighting scene. The signals detected by the receiver 110 may be transmitted to the internal image processor 114 or an external image processor (not shown) for processing into a SWIR image of the target 104 . In some embodiments, the receiver 110 is activated multiple times to create "time slices," each time slice covering a specific distance range. In some embodiments, image processor 114 combines these slices to create a single image with greater visual depth, such as proposed by Gruber, Tobias, et al. "Gated2depth: Real-time dense lidar (LIDAR) from gated imagery", arXiv preprint arXiv:1902.04997 (2019), incorporated by reference in its entirety.

在汽車領域,由多個成像系統100’或100’’產生的接收器110的視場(FOV)內的該影像的目標104可以被處理,以提供各種駕駛人輔助及諸多安全功能,諸如:前向碰撞警告(FCW)、車道偏離警告(LDW)、交通標誌識別(TSR)以及對相關實體諸如行人或迎面而來車輛的檢測。該被產生的影像也可以被顯示給駕駛人,例如被投影在車輛擋風玻璃上的一平視顯示器(HUD)上。附加地或替代地,多個成像系統100’或100”可以介接到一車輛ECU 120,以提供諸多影像或視訊,以使得自動駕駛能夠在低光照級別或惡劣的可見性條件下進行。In the automotive field, this imaged object 104 within the field of view (FOV) of the receiver 110 produced by the plurality of imaging systems 100' or 100" may be processed to provide various driver assistance and safety functions, such as: Forward Collision Warning (FCW), Lane Departure Warning (LDW), Traffic Sign Recognition (TSR) and detection of relevant entities such as pedestrians or oncoming vehicles. The generated image may also be displayed to the driver, for example on a head-up display (HUD) projected on the vehicle windshield. Additionally or alternatively, multiple imaging systems 100' or 100" may be interfaced to a vehicle ECU 120 to provide multiple images or videos to enable autonomous driving in low light levels or poor visibility conditions.

在諸多主動成像場景中,一光源譬如雷射器與多個光接收器的一陣列被結合使用。由於該鍺PD在該SWIR波段操作,因此在不超出人眼安全規定的情況下,高功率光脈衝是可行的。對於汽車場景中的實現方案,一典型的脈衝長度為〜100奈秒(ns),儘管,在某些實施例中,也可以預期高達約1微秒的更長的脈衝持續時間。考慮到人眼的安全性,〜300千瓦(KW)的一峰值脈衝功率是被允許的,但是目前的雷射二極體實際上無法達到此級別。因此,在本系統中,該高功率脈衝是由一QS雷射器產生的。在一些實施例中,該雷射是一P-QS雷射器,以進一步降低成本。在一些實施例中,該雷射器是主動QS。In many active imaging scenarios, a light source, such as a laser, is used in combination with an array of light receivers. Since the germanium PD operates in this SWIR band, high power optical pulses are feasible without exceeding eye safety regulations. For implementations in automotive scenarios, a typical pulse length is ~100 nanoseconds (ns), although, in certain embodiments, longer pulse durations up to about 1 microsecond are also contemplated. Considering human eye safety, a peak pulse power of ~300 kilowatts (KW) is allowed, but current laser diodes are practically unable to reach this level. Therefore, in the present system, the high power pulse is generated by a QS laser. In some embodiments, the laser is a P-QS laser to further reduce cost. In some embodiments, the laser is an active QS.

如本文被使用的,該術語“目標(target)”意指任何的一被成像的實體、物體、區域或場景(an imaged entity, object, area, or scene)。在諸多汽車應用中的諸多目標的諸多非限制性示例包括諸多車輛、諸多行人、諸多物理障礙或其它物體。As used herein, the term "target" means any imaged entity, object, area, or scene. Non-limiting examples of objects in automotive applications include vehicles, pedestrians, physical obstacles, or other objects.

根據一些實施例,一種主動成像系統包括:一照明源,用於朝向一目標發射一輻射脈衝,從而引起從該目標反射輻射,其中該照明源包括一QS雷射器;及一接收器,包括一個或多個鍺PD,用於接收該反射輻射。在一些實施例中,該照明源在該SWIR光譜帶中操作。According to some embodiments, an active imaging system includes: an illumination source for emitting a pulse of radiation toward a target, thereby causing reflection of radiation from the target, wherein the illumination source includes a QS laser; and a receiver includes One or more germanium PDs for receiving the reflected radiation. In some embodiments, the illumination source operates in the SWIR spectral band.

在一些實施例中,該QS雷射器是一主動QS雷射器。在一些實施例中,該QS雷射器是一P-QS雷射器。在一些實施例中,該P-QS雷射器包括一SA。在一些實施例中,該SA被選自於由以下材料組成的群組:Co2+:MgAl2O4、Co2+:尖晶石、Co2+:ZnSe與其它摻鈷晶體、V3+:YAG、摻雜的玻璃、量子點、半導體SA鏡(SESAM)及Cr4+YAG SA。In some embodiments, the QS laser is an active QS laser. In some embodiments, the QS laser is a P-QS laser. In some embodiments, the P-QS laser includes a SA. In some embodiments, the SA is selected from the group consisting of Co2+:MgAl2O4, Co2+:Spinel, Co2+:ZnSe and other cobalt-doped crystals, V3+:YAG, doped glass, quantum dots , Semiconductor SA mirror (SESAM) and Cr4+YAG SA.

在一些實施例中,該系統還包括一QS脈衝光電檢測器,用於檢測由該P-QS雷射器發射的一輻射脈衝。在一些實施例中,該接收器被配置為在足以使該輻射脈衝行進到一目標並返回到該接收器的一時間被啟用。在一些實施例中,該接收器在一積分時間被啟用,在該積分時間內,該鍺PD的暗電流功率不超過該鍺PD的該kTC雜訊功率。In some embodiments, the system also includes a QS pulse photodetector for detecting a radiation pulse emitted by the P-QS laser. In some embodiments, the receiver is configured to be activated for a time sufficient for the radiation pulse to travel to a target and return to the receiver. In some embodiments, the receiver is enabled for an integration time during which the dark current power of the Ge PD does not exceed the kTC noise power of the Ge PD.

在一些實施例中,該接收器響應於由多個鍺PD接收的該反射輻射而產生多個電訊號,其中該多個電訊號代表由該輻射脈衝照射的該目標的意象。在一些實施例中,該多個電訊號由一內部影像處理器或一外部影像處理器中的一個處理成該目標的一影像。在一些實施例中,該目標的該影像被處理以提供前向碰撞警告、車道偏離警告、交通標誌識別以及對行人或迎面而來車輛的檢測中的一種或多種。In some embodiments, the receiver generates electrical signals in response to the reflected radiation received by germanium PDs, wherein the electrical signals represent an image of the target illuminated by the radiation pulse. In some embodiments, the electrical signals are processed by one of an internal image processor or an external image processor into an image of the object. In some embodiments, the imagery of the object is processed to provide one or more of forward collision warning, lane departure warning, traffic sign recognition, and detection of pedestrians or oncoming vehicles.

根據諸多另外的實施例,一種用於進行主動成像的方法包括步驟:通過一照明源釋放一光脈衝,該照明源包括一主動QS雷射器;以及在足以使該光脈衝行進到一目標並返回到該QS雷射器的時間後,在一有限的時間段內啟用一接收器,該接收器包括一個或多個鍺PD,以接收從該目標被反射的一反射光脈衝(reflected light pulse)。在一些實施例中,該照明源在短波紅外(SWIR)光譜帶中操作。在一些實施例中,該有限的時間段等於一積分時間,在該積分時間期間,該鍺PD的暗電流功率不超過該鍺PD的一kTC雜訊功率。According to further embodiments, a method for active imaging includes the steps of: delivering a pulse of light through an illumination source comprising an active QS laser; and After returning to the time of the QS laser, for a limited period of time, a receiver including one or more germanium PDs is enabled to receive a reflected light pulse reflected from the target ). In some embodiments, the illumination source operates in the short wave infrared (SWIR) spectral band. In some embodiments, the limited period of time is equal to an integration time during which the dark current power of the Ge PD does not exceed a kTC noise power of the Ge PD.

在一些實施例中,該接收器響應於由該多個鍺PD接收的該反射光脈衝而產生該多個電訊號,其中該多個電訊號代表由該光脈衝照射的該目標的意象。在一些實施例中,該多個電訊號由一內部影像處理器或一外部影像處理器中的一個處理成該目標的一影像。在一些實施例中,該目標的該影像被處理以提供前向碰撞警告、車道偏離警告、交通標誌識別以及對行人或迎面而來車輛的檢測中的一種或多種。In some embodiments, the receiver generates the plurality of electrical signals in response to the reflected light pulses received by the plurality of germanium PDs, wherein the plurality of electrical signals represent images of the target illuminated by the light pulses. In some embodiments, the electrical signals are processed by one of an internal image processor or an external image processor into an image of the object. In some embodiments, the imagery of the object is processed to provide one or more of forward collision warning, lane departure warning, traffic sign recognition, and detection of pedestrians or oncoming vehicles.

根據諸多另外的實施例,一種用於進行主動成像的方法包括步驟:泵送一P-QS雷射器,該P-QS雷射器包括一SA,以在該SA飽和時引起一光脈衝的釋放;通過一QS脈衝光電檢測器檢測該光脈衝的該釋放;基於該被檢測的光脈衝釋放,在足以使該光脈衝行進到一目標並返回到該QS雷射器的時間後,在一有限的時間段內啟用一接收器,該接收器包括一個或多個鍺PD,以接收該反射光脈衝。在一些實施例中,該QS雷射器在短波紅外(SWIR)光譜帶中操作。According to further embodiments, a method for active imaging includes the steps of: pumping a P-QS laser including a SA to induce a pulse of light when the SA is saturated release; detection of the release of the light pulse by a QS pulse photodetector; based on the detected release of the light pulse, after a time sufficient for the light pulse to travel to a target and return to the QS laser, at a A receiver, including one or more germanium PDs, is enabled for a limited period of time to receive the reflected light pulse. In some embodiments, the QS laser operates in the short-wave infrared (SWIR) spectral band.

在一些實施例中,該SA被選自於Co2+:MgAl2O4、Co2+:尖晶石、Co2+:ZnSe、其它被摻鈷晶體、V3+:YAG、被摻雜的玻璃、量子點、半導體SA鏡(SESAM)及Cr4+YAG SA。在一些實施例中,該有限的時間段等於一積分時間,在該積分時間期間,該鍺PD的暗電流功率不超過該鍺PD的該kTC雜訊功率。In some embodiments, the SA is selected from Co2+: MgAl2O4, Co2+: spinel, Co2+: ZnSe, other cobalt-doped crystals, V3+: YAG, doped glass, quantum dots, semiconductor SA mirrors (SESAM ) and Cr4+YAG SA. In some embodiments, the limited period of time is equal to an integration time during which the dark current power of the Ge PD does not exceed the kTC noise power of the Ge PD.

在一些實施例中,該接收器響應於由該多個鍺PD接收的該反射光脈衝而產生多個電訊號,其中該多個電訊號代表由該光脈衝照射的該目標的意象。在一些實施例中,該多個電訊號由一內部影像處理器或一外部影像處理器中的一個處理成該目標的一影像。在一些實施例中,該目標的該影像被處理以提供前向碰撞警告、車道偏離警告、交通標誌識別以及對行人或迎面而來車輛的檢測中的一種或多種。In some embodiments, the receiver generates electrical signals in response to the reflected light pulses received by the germanium PDs, wherein the plurality of electrical signals represent images of the target illuminated by the light pulses. In some embodiments, the electrical signals are processed by one of an internal image processor or an external image processor into an image of the object. In some embodiments, the imagery of the object is processed to provide one or more of forward collision warning, lane departure warning, traffic sign recognition, and detection of pedestrians or oncoming vehicles.

示例性實施例涉及一種用於使用多個基於鍺的PD的高SNR主動SWIR成像的系統及方法。在一些實施例中,該成像系統是一門控成像系統(gated imaging system)。在一些實施例中,該脈衝照明源是一主動或P-QS雷射器。Exemplary embodiments relate to a system and method for high SNR active SWIR imaging using multiple germanium-based PDs. In some embodiments, the imaging system is a gated imaging system. In some embodiments, the pulsed illumination source is an active or P-QS laser.

現在參考第3A圖、第3B圖及第3C圖,分別示出根據一些實施例的一主動SWIR成像系統的一操作方法的一流程圖及多個示意圖。在第3A圖中被示出的過程300是基於如參照第1B圖所描述的系統100’。在步驟302中,照明源102A的泵124被啟用以泵送增益介質122。在步驟304中,主動QS元件126A沿一目標104的方向釋放一光脈衝,該目標104位於一距離為D處。在步驟306中,在時間=T,該光脈衝衝擊目標104並產生朝向系統100’及接收器110返回的反射輻射。在步驟308中,在等待一時間=T2後,接收器110被啟用以接收該反射輻射。該返回傳播延遲T2由該脈衝從照明源102A到目標104的該飛行時間(flight time)加上從目標104被反射的該光訊號的飛行時間組成。因此,對於與照明源102A及接收器110相距一距離“D”處的一目標104而言,T2是已知的。接收器110的該啟用週期Δt是基於所需的景深(DoV)被決定。該DoV由2DoV=c*Δt給出,其中c是光速。一100ns的典型Δt提供一15米的景深。在步驟310中,該反射輻射以一Δt的時間段被接收器110接收。來自接收器110的該被接收的資料由影像處理器114(或外部影像處理器)處理以產生一接收影像(received image)。過程300可以在每個幀中被重複N次,其中一幀被定義為從接收器110被傳輸到影像處理器114(或一外部影像處理器)的該資料集。在一些實施例中,N是在1與10,000之間。Referring now to Figures 3A, 3B, and 3C, a flowchart and schematic diagrams, respectively, of a method of operation of an active SWIR imaging system according to some embodiments are shown. The process 300 shown in Figure 3A is based on the system 100' as described with reference to Figure 1B. In step 302 , pump 124 of illumination source 102A is activated to pump gain medium 122 . In step 304, the active QS element 126A emits a pulse of light in the direction of a target 104 located at a distance D. In step 306, at time = T, the light pulse strikes the target 104 and generates reflected radiation back towards the system 100' and receiver 110. In step 308, after waiting for a time=T2, the receiver 110 is enabled to receive the reflected radiation. The return propagation delay T2 consists of the flight time of the pulse from illumination source 102A to target 104 plus the flight time of the light signal reflected from target 104 . Thus, for a target 104 at a distance "D" from the illumination source 102A and the receiver 110, T2 is known. The activation period Δt of the receiver 110 is determined based on the desired depth of field (DoV). The DoV is given by 2DoV=c*Δt, where c is the speed of light. A typical Δt of 100 ns provides a depth of field of 15 meters. In step 310, the reflected radiation is received by the receiver 110 for a time period Δt. The received data from the receiver 110 is processed by the image processor 114 (or an external image processor) to generate a received image. Process 300 may be repeated N times per frame, where a frame is defined as the data set transmitted from receiver 110 to image processor 114 (or an external image processor). In some embodiments, N is between 1 and 10,000.

現在參考第4A圖、第4B圖及第4C圖分別示出根據一些實施例的一主動SWIR成像系統的一示例性操作方法的一流程圖及多個示意圖。在圖4中被示出的一過程400是基於如參考第1C圖所描述的系統100”。在步驟402中,照明源102P的泵124被啟用以泵送增益介質122並使SA 126P飽和。在步驟404中,在達到一飽和級別後,SA 126P沿一目標430的方向釋放一光脈衝,該目標430位於一距離為D處。在步驟406中,QS脈衝光電檢測器128檢測該被釋放光脈衝。在步驟408中,在時間=T,該光脈衝衝擊目標430,並產生朝向系統100”及接收器110返回的反射輻射。在步驟410中,在等待由QS脈衝光電檢測器128所檢測的一被釋放光脈衝後的一時間=T2後,接收器110被啟用以接收該反射輻射。該返回傳播延遲T2包括從照明源102P到目標430的脈衝的飛行時間加上從目標430被反射的光訊號的飛行時間。因此,對於與照明源102P及接收器110相距一距離“D”處的一目標430而言,T2是已知的。該Δt的啟用週期是根據所需的景深(DoV)被決定。在步驟412中,接收器110以一Δt的時間段接收該反射輻射。來自接收器110的該被接收的資料由影像處理器114(或由外部影像處理器)處理以產生一接收影像。過程400可以在每個幀中被重複N次。在一些實施例中,N是在1與10,000之間。Referring now to Figures 4A, 4B, and 4C, a flowchart and schematic diagrams, respectively, of an exemplary method of operation of an active SWIR imaging system according to some embodiments are shown. A process 400 shown in Figure 4 is based on the system 100" as described with reference to Figure 1C. In step 402, the pump 124 of the illumination source 102P is activated to pump the gain medium 122 and saturate the SA 126P. In step 404, after reaching a saturation level, SA 126P emits a pulse of light in the direction of a target 430, which is located at a distance D. In step 406, the QS pulse photodetector 128 detects the released pulse. Light pulse. In step 408, at time=T, the light pulse strikes the target 430 and generates reflected radiation back towards the system 100″ and receiver 110. In step 410, after waiting a time = T2 after a released light pulse detected by the QS pulse photodetector 128, the receiver 110 is enabled to receive the reflected radiation. The return propagation delay T2 includes the time-of-flight of the pulse from the illumination source 102P to the target 430 plus the time-of-flight of the light signal reflected from the target 430 . Thus, for a target 430 at a distance "D" from the illumination source 102P and the receiver 110, T2 is known. The activation period of Δt is determined according to the desired depth of field (DoV). In step 412, the receiver 110 receives the reflected radiation for a time period of Δt. The received data from receiver 110 is processed by image processor 114 (or by an external image processor) to generate a received image. Process 400 may be repeated N times in each frame. In some embodiments, N is between 1 and 10,000.

參照所有成像系統100、100’及100”,要被注意的是,那些成像系統中的任何一個都可以包括:讀出電路,用以在該積分時間後讀出由每個鍺PD收集的電荷的一累積,以提供該相應PD的該檢測訊號。這樣,與LIDARs或其它深度感測器不同,該讀出過程可以在該積分時間的震盪後被執行並且因此在該訊號從一大範圍的多個距離不可逆地求和(irreversibly summed)後被執行。With reference to all of the imaging systems 100, 100' and 100", it is to be noted that any of those imaging systems may include readout circuitry to readout the charge collected by each germanium PD after the integration time to provide the detection signal for the corresponding PD. Thus, unlike LIDARs or other depth sensors, the readout process can be performed after the oscillation of the integration time and thus after the signal has changed from a wide range of Performed after multiple distances are irreversibly summed.

參照所有成像系統100、100’及100”,可選地,接收器110輸出代表由多個鍺PD中的每個在該積分時間內累積的電荷的一檢測訊號組,其中該檢測訊號組代表由至少一個SWIR輻射脈衝所照射的該目標的意象。Referring to all imaging systems 100, 100' and 100", optionally, the receiver 110 outputs a set of detection signals representing the charge accumulated by each of the plurality of germanium PDs during the integration time, wherein the set of detection signals represents An image of the target illuminated by at least one pulse of SWIR radiation.

參照所有成像系統100、100’及100”,該成像系統可以可選地至少一個衍射光學元件(DOE),該衍射光學元件可操作以在朝向該目標發射光前改善該脈衝照明源的光的照明均勻性。如上所述,一高峰值功率脈衝光源102可能在該FOV的不同部分上發出一不夠均勻的照明分佈。該DOE(未被以圖解說明)可以改善該照明的均勻性以產生該FOV的多個高質量影像。要被注意的是,在諸多雷射雷達系統及其它深度感測器中通常不需要等效的照明均勻性,因此出於成本、系統複雜性、系統體積等原因,它們可能不包含諸多DOE元件。例如:在諸多LIDAR系統中,只要整個FOV接收到足夠的照明度(高於允許以一最小所需距離檢測目標的一閾值),在該FOV中的某些區域是否比該FOV的其它部分所接收的照明密度更多就無關緊要。該系統100的DOE,如果被實施,則可以例如被用於減少諸多斑點效應。要被注意的是,諸多成像系統100、100’及100”還可以包括:用於將光從光源102引導到該FOV的其它類型的光學器件,諸如諸多透鏡、諸多鏡、諸多棱鏡、諸多波導等。With reference to all imaging systems 100, 100' and 100", the imaging system may optionally have at least one diffractive optical element (DOE) operable to improve the intensity of the light from the pulsed illumination source prior to emitting light toward the target. Illumination uniformity. As mentioned above, a high peak power pulsed light source 102 may emit a less uniform illumination distribution on different parts of the FOV. The DOE (not illustrated) can improve the uniformity of the illumination to produce the Multiple high-quality images of the FOV. It should be noted that in many lidar systems and other depth sensors, equivalent illumination uniformity is usually not required, so for reasons of cost, system complexity, system volume, etc. , they may not contain many DOE elements. For example: in many LIDAR systems, as long as the entire FOV receives sufficient illumination (above a threshold that allows objects to be detected at a minimum required distance), certain parts of the FOV It doesn't matter if an area receives more illumination density than other parts of the FOV. The DOE of the system 100, if implemented, can be used, for example, to reduce speckle effects. It is to be noted that imaging systems 100 , 100' and 100" may also include other types of optics for directing light from the light source 102 to the FOV, such as lenses, mirrors, prisms, waveguides, etc.

參照所有成像系統100、100’及100’’,控制器112可以可選地被操作以啟用接收器110以順序獲取一系列門控影像,每個門控影像表示在一不同距離範圍內的不同鍺PD的檢測訊號,及一影像處理器可操作於將該系列影像組合成單個二維影像。例如:一第一影像可以獲取在0與50米(m)之間的來自該成像感測器的光,一第二影像可以獲取在50至100米之間的來自該成像感測器的光,一第三影像可以獲取在100至125米之間的來自該成像感測器的光,並且影像處理器114可以組合多個2D影像為單個2D影像。這樣,每個距離範圍都以被累積的暗電流雜訊被擷取,該被累積的暗電流雜訊仍小於由讀出電路引入的該讀出雜訊,以使用更多的光脈衝及更多的計算為代價。該最終影像的每個像素的該顏色值(譬如灰度值)可以根據該多個門控影像中的各個像素的一功能(譬如所有值中的一最大值或一加權平均值)被決定。As with all imaging systems 100, 100' and 100'', controller 112 may optionally be operable to enable receiver 110 to sequentially acquire a series of gated images, each gated image representing a different The detection signal of the germanium PD, and an image processor operable to combine the series of images into a single 2D image. For example: a first image can capture light from the imaging sensor between 0 and 50 meters (m), a second image can capture light from the imaging sensor between 50 and 100 meters A third image can be acquired between 100 to 125 meters of light from the imaging sensor, and the image processor 114 can combine multiple 2D images into a single 2D image. In this way, each range of distances is captured with accumulated dark current noise, which is still smaller than the readout noise introduced by the readout circuit, using more light pulses and more The cost of more calculations. The color value (eg, gray value) of each pixel of the final image may be determined according to a function (eg, a maximum value or a weighted average value) of each pixel in the plurality of gated images.

所有成像系統100、100’及100”,該成像系統可以是一未冷卻的基於鍺的SWIR成像系統,可操作在超過50(米)m的一距離處以一20%的SWIR反射率(在相關光譜範圍內)檢測一1m x 1m的目標。All imaging systems 100, 100', and 100", which may be an uncooled germanium-based SWIR imaging system, are operable at a distance in excess of 50 (meters) m with a 20% SWIR reflectivity (in the relevant spectral range) to detect a 1m x 1m target.

參照所有成像系統100、100’及100”,脈衝照明源102可以是一QS雷射器,該QS雷射器可操作以發射具有在10毫焦耳(millijoule)與100毫焦耳之間的脈衝能量的人眼安全的雷射脈衝。雖然不是必須的,但是該照明波長可以被選擇以匹配一太陽吸收帶(譬如該照明波長可以在1.3微米(μm)與1.4μm之間。Referring to all imaging systems 100, 100' and 100", the pulsed illumination source 102 may be a QS laser operable to emit pulses having an energy of between 10 millijoules and 100 millijoules Eye-safe laser pulses. Although not required, the illumination wavelength can be selected to match a solar absorption band (eg, the illumination wavelength can be between 1.3 micrometers (μm) and 1.4 μm.

參照所有成像系統100、100’及100”,用於影像產生的每個鍺PD的輸出訊號可以代表每個PD的單個標量(scalar)。參照所有成像系統100、100’及100”,每個PD可以輸出一累積訊號,該累積訊號代表一大範圍的多個距離。例如:接收器110的一些、大多數或全部鍺PD可以輸出多個檢測訊號,該多個檢測訊號代表從20m、40m及60m反射到相應PD的光中的每個。With reference to all imaging systems 100, 100' and 100", the output signal of each germanium PD used for image generation may represent a single scalar for each PD. With reference to all imaging systems 100, 100' and 100", each The PD can output an accumulated signal representing a wide range of distances. For example: some, most or all of the germanium PDs of the receiver 110 may output multiple detection signals representing each of the light reflected from 20m, 40m and 60m to the corresponding PD.

與許多已知技術系統相比,諸多成像系統100、100’及100”的另一個區別特徵是,該脈衝照明不被用於凍結物體在野外的快速運動(譬如與攝影閃光燈照明不同),並且同樣被用於靜態場景。與許多已知技術系統相比,諸多成像系統100、100’及100”的另一個區別特徵是,與外部雜訊相比,該影像的該門控並不是主要用以避免該系統中的內部雜訊,這對於某些已知技術(譬如陽光)而言是一麻煩事。Another distinguishing feature of many imaging systems 100, 100' and 100" compared to many known art systems is that the pulsed illumination is not used to freeze rapid motion of objects in the field (unlike, for example, photographic flash illumination), and Also used for static scenes. Another distinguishing feature of the imaging systems 100, 100' and 100" compared to many known art systems is that the gating of the image is not primarily used in comparison to external noise. To avoid internal noise in the system, which is a nuisance for some known technologies such as sunlight.

要被注意的是,以上關於諸多系統100、100’及100’’被討論的構件、特徵、操作模式、系統架構及內部關係中的任何一個都可以在必要的情況下在以下被討論的任何EO系統中被實現,諸如諸多系統700、1300、1300’、1600、1600’、1700、1800、1900、2300及3600。It is to be noted that any of the components, features, modes of operation, system architectures, and interrelationships discussed above with respect to the various systems 100, 100', and 100" may be discussed below if necessary. Implemented in EO systems, such as systems 700, 1300, 1300', 1600, 1600', 1700, 1800, 1900, 2300, and 3600.

第5圖是以圖解說明根據本發明主題的諸多示例的一種用以在一EO系統的一FOV中產生諸多物體的諸多SWIR影像的方法500的一流程圖。參考關於先前附圖闡述的諸多示例,方法500可以由諸多成像系統100、100’及100”中的任何一個執行。要被注意的是,方法500也可以由描述如下的任何主動成像系統(諸如諸多系統700、1300、1300’、1600、1600’、1700、1800、1900、2300及3600)實現。FIG. 5 is a flowchart illustrating a method 500 for generating SWIR images of objects in a FOV of an EO system, according to examples of the inventive subject matter. Referring to the examples set forth with respect to the previous figures, the method 500 may be performed by any of the imaging systems 100, 100', and 100″. It is to be noted that the method 500 may also be performed by any of the active imaging systems described below, such as Many systems 700, 1300, 1300', 1600, 1600', 1700, 1800, 1900, 2300, and 3600) are implemented.

方法500從朝向該FOV發射至少一個照明脈衝的一步驟(或“階段”)510開始,從而引起SWIR輻射從至少一個目標反射。在下文中,“步驟(step)”及“階段(stage)”可被互換使用。可選地,該一個或多個脈衝可以是高峰值功率脈衝。例如:與單個脈衝相比,多個照明脈衝可能需要被使用,以實現一總體上更高的照明級別(an overall higher level of illumination)。參考諸多附圖的諸多示例,步驟510可以可選地由控制器112執行。Method 500 begins with a step (or "stage") 510 of emitting at least one illumination pulse toward the FOV, causing SWIR radiation to reflect from at least one target. Hereinafter, "step" and "stage" may be used interchangeably. Optionally, the one or more pulses may be high peak power pulses. For example: multiple illumination pulses may need to be used to achieve an overall higher level of illumination compared to a single pulse. Referring to various examples in various figures, step 510 may optionally be performed by the controller 112 .

一步驟520包括由一成像接收器觸發連續訊號獲取的啟動,該成像接收器包括多個鍺PD(在以上關於接收器110被討論的意義上),該接收器110可操作以檢測該被反射的SWIR輻射。步驟520的連續訊號獲取意謂該電荷被連續且不可逆地收集(即,不可能獲悉在任何中間時間收集到什麼級別的電荷),而且不是以小增量方式收集。步驟520的該觸發可以在步驟510前被執行(譬如:如果該檢測陣列需要一加速時間),與步驟510同時被執行,或者在步驟510結束後(譬如在與系統相距一非零距離處開始檢測)被執行。參考附圖的示例,步驟520可以可選地由控制器112執行。A step 520 includes triggering the initiation of continuous signal acquisition by an imaging receiver comprising a plurality of germanium PDs (in the sense discussed above with respect to receiver 110) operable to detect the reflected of SWIR radiation. The continuous signal acquisition of step 520 means that the charge is collected continuously and irreversibly (ie, it is impossible to know what level of charge was collected at any intermediate time), and not in small increments. The triggering of step 520 can be performed before step 510 (for example: if the detection array requires an acceleration time), executed simultaneously with step 510, or after step 510 ends (for example, starting at a non-zero distance from the system) detection) is performed. Referring to the example of the drawings, step 520 may optionally be performed by the controller 112 .

步驟530在觸發步驟520後開始,並且包括對於多個鍺PD中的每個進行收集,以作為該觸發的一結果,至少由該SWIR反射輻射衝擊在該相應的鍺PD上引起的電荷、大於50μA/cm²的暗電流、有關積分時間的暗電流雜訊及無關積分時間的讀出雜訊。參考附圖的示例,步驟530可以可選地由接收器110執行。Step 530 begins after triggering step 520 and includes collecting, for each of a plurality of germanium PDs, that as a result of the triggering, at least a charge induced on the corresponding germanium PD by the SWIR reflected radiation impingement is greater than Dark current of 50 μA/cm², integration time dependent dark current noise and readout noise independent of integration time. Referring to the example of the figure, step 530 may optionally be performed by the receiver 110 .

步驟540包括:當由於暗電流雜訊而被收集的電荷量仍低於由於累積無關時間的讀出雜訊而被收集的電荷量時,觸發停止該電荷的收集。該積分時間是步驟530到步驟540停止為止的持續時間。參考附圖的示例,步驟540可以可選地由控制器112執行。Step 540 includes: when the amount of charge collected due to dark current noise is still lower than the amount of charge collected due to accumulating irrelevant time readout noise, triggering to stop the charge collection. The integration time is the duration from step 530 until step 540 stops. Referring to the example of the drawings, step 540 may optionally be performed by the controller 112 .

一步驟560在步驟540結束後被執行,並且步驟560包括基於由多個鍺PD中的每個收集的電荷級別以產生該FOV的一影像。如前述關於諸多成像系統100、100’及100”,在步驟560中被產生的該影像是沒有深度資訊的一2D影像。參考附圖的示例,步驟560可以可選地由成像處理器114執行。A step 560 is performed after step 540 ends, and step 560 includes generating an image of the FOV based on the charge levels collected by each of the plurality of Ge PDs. As previously described with respect to imaging systems 100, 100', and 100", the image generated in step 560 is a 2D image without depth information. Referring to the examples of the figures, step 560 may optionally be performed by imaging processor 114 .

可選地,作為步驟540的一結果的停止收集可以是接著可選的步驟550,由讀出電路讀取與該多個鍺PD中的每個鍺PD所收集的電荷量相關的一訊號,放大該讀取的訊號,並提供該被放大的訊號(可選地,在進一步處理後)到一影像處理器,該影像處理器執行如步驟560的該影像的該產生。參照附圖的示例,步驟550可以可選地由該讀出電路(未被圖解說明如上,但是可以等效於如下討論的任何讀出電路,諸如一讀出電路1610、2318及3630)執行。要被注意的是,步驟550是可選的,因為從該多個鍺PS中讀出該諸多檢測結果的其它合適的方法可以被實現。Optionally, cessation of collection as a result of step 540 may be followed by optional step 550 of reading, by readout circuitry, a signal related to the amount of charge collected by each germanium PD of the plurality of germanium PDs, The read signal is amplified and the amplified signal is provided (optionally after further processing) to an image processor which performs the generation of the image as step 560 . Referring to the example of the figures, step 550 may optionally be performed by the readout circuit (not illustrated as above, but may be equivalent to any readout circuit discussed below, such as a readout circuit 1610, 2318, and 3630). It is to be noted that step 550 is optional, as other suitable methods of reading out the plurality of detection results from the plurality of Ge PSs may be implemented.

可選地,多個鍺PD中的每個輸出的訊號是一標量,表示從20米被反射的光、從40米被反射的光及從60米被反射的光量。Optionally, the signal output by each of the plurality of germanium PDs is a scalar quantity representing the amount of light reflected from 20 meters, light reflected from 40 meters, and light reflected from 60 meters.

可選地,步驟560的該產生可以包括:基於對於該多個鍺PD中的每個所讀取的一標量值以產生該影像。可選地,步驟510的該發射可以包括:通過使脈衝雷射照明(通過一個或多個雷射器)穿過至少一個衍射光學元件(DOE),並將該被削弱的光發射到該FOV,以增加脈衝雷射照明的照明均勻性。可選地,該暗電流大於每鍺PD為50皮安(picoampere)。可選地,該多個鍺PD是多個矽鍺PD(Si-Ge PDs),每個矽鍺PD都包括矽及鍺。可選地,該發射通過至少一個主動QS雷射器被進行。可選地,該發射通過至少一個P-QS雷射器被進行。可選地,該收集是當該接收器在高於30℃的一溫度下操作時被執行,並且處理該FOV的該影像以檢測在50米與150米之間的多個範圍內的多個車輛及多個行人。可選地,該發射包括以小於1米的一距離發射具有在10毫焦耳與100毫焦耳之間的脈衝能量的多個照明脈衝到一人的未被保護的眼睛中,而不損害眼睛。Optionally, the generating of step 560 may include generating the image based on a scalar value read for each of the plurality of Ge PDs. Optionally, the emitting of step 510 may comprise passing pulsed laser illumination (via one or more lasers) through at least one diffractive optical element (DOE) and emitting the attenuated light into the FOV , to increase the illumination uniformity of pulsed laser illumination. Optionally, the dark current is greater than 50 picoamperes per germanium PD. Optionally, the plurality of germanium PDs are a plurality of silicon germanium PDs (Si-Ge PDs), each of which includes silicon and germanium. Optionally, the emission is performed by at least one active QS laser. Optionally, the emission is performed by at least one P-QS laser. Optionally, the collection is performed while the receiver is operating at a temperature above 30°C, and the image of the FOV is processed to detect vehicles and multiple pedestrians. Optionally, the transmitting comprises transmitting illumination pulses having a pulse energy between 10 millijoules and 100 millijoules into an unprotected eye of a person at a distance of less than 1 meter without damaging the eye.

如前述關於諸多主動成像系統100、100’及100”,幾個門控影像可以被組合為單個影像。可選地,方法500可以包括:重複多次發射、觸發、收集及停止(emitting, triggering, collecting and ceasing)的順序;觸發在每個順序的來自光發射的不同時間的該採集。在每個順序,方法500可以包括:從該接收器讀取一檢測值,該檢測值用於對應大於2米(譬如2.1米、5米、10米、25米、50米、100米)的不同距離範圍的該多個鍺PD中的每個鍺PD。在這樣的一情況下,在步驟560中的該影像的該產生包括基於以不同順序從不同鍺PD讀取的該多個檢測值以產生單個二維影像。要被注意的是,由於僅有幾個影像被拍攝,所以該多個門控影像不是稀疏的(即,在全部或大多數門控影像中,存在許多像素的檢測值)。還要被注意的是,該多個門控影像可以具有重疊的距離範圍。例如:一第一影像可以代表距離範圍為0至60米,一第二影像可以代表距離範圍為50至100米,一第三影像可以代表距離範圍為90至120米。As previously described with respect to many active imaging systems 100, 100', and 100", several gated images may be combined into a single image. Optionally, method 500 may include: repeating emitting, triggering, collecting, and stopping (emitting, triggering) multiple times , collecting and ceasing) sequence; triggering the collection at different times from light emission in each sequence. In each sequence, method 500 may include: reading a detection value from the receiver, the detection value for corresponding Each germanium PD in the plurality of germanium PDs of different distance ranges greater than 2 meters (eg, 2.1 meters, 5 meters, 10 meters, 25 meters, 50 meters, 100 meters). In such a case, in step 560 The generation of the image in includes generating a single two-dimensional image based on the multiple detection values read in different sequences from different germanium PDs. It should be noted that since only a few images are taken, the multiple The gated images are not sparse (i.e., there are many pixel detections in all or most of the gated images). It is also to be noted that the multiple gated images may have overlapping distance ranges. For example: a The first image may represent a distance ranging from 0 to 60 meters, a second image may represent a distance ranging from 50 to 100 meters, and a third image may represent a distance ranging from 90 to 120 meters.

第6圖至第11C圖演示諸多SWIR電光(EO)系統及諸多P-QS雷射器可以在這種系統中被使用,以及諸多用於這種雷射器的操作及製造的方法。Figures 6 through 11C demonstrate a number of SWIR electro-optic (EO) systems and a number of P-QS lasers that can be used in such systems, as well as a number of methods for the operation and fabrication of such lasers.

第10圖是以圖解說明根據本發明主題的諸多示例的SWIR光學系統700的一示例的一示意性功能框圖。系統700至少包括P-QS雷射器600,但是也可以如第10圖所示包括諸多附加部件,諸如一感測器702,可操作以感測來自系統700的該FOV的反射光,尤其是從諸多外部物體910被反射的雷射器600的反射照明。FIG. 10 is a schematic functional block diagram illustrating an example of a SWIR optical system 700 according to examples of the inventive subject matter. System 700 includes at least P-QS laser 600, but may also include additional components as shown in FIG. 10, such as a sensor 702 operable to sense reflected light from the FOV of system 700, especially Reflected illumination of laser 600 reflected from a number of external objects 910 .

參照其它示例,感測器702可以被實現為本發明中被討論的成像接收器、PDA或諸多光電檢測裝置,諸如諸多構件110、1300、1300’、1600、1600’、1700、1800、1900、2302及3610。Referring to other examples, the sensor 702 may be implemented as an imaging receiver, a PDA, or a number of photodetection devices discussed in the present invention, such as the number of components 110, 1300, 1300', 1600, 1600', 1700, 1800, 1900, 2302 and 3610.

一處理器710,可操作以處理感測器702的該諸多感測結果。該處理的該輸出可以是該FOV的一影像、該FOV的一深度模型、該FOV的一個或多個部分的光譜分析、在該FOV中的諸多被識別物體的資訊、在該FOV上的光統計或任何其它類型的輸出。參考諸多其它示例,處理器710可以被實現為在本發明中被討論的諸多處理器中的任何一個,諸如諸多處理器114、1908、2304及3620。A processor 710 is operable to process the sensing results of the sensor 702 . The output of the process may be an image of the FOV, a depth model of the FOV, spectral analysis of one or more portions of the FOV, information on identified objects in the FOV, light on the FOV Statistics or any other kind of output. With reference to many other examples, the processor 710 may be implemented as any of the many processors discussed in this disclosure, such as the many processors 114 , 1908 , 2304 and 3620 .

一控制器712,可操作以控制雷射器600及/或處理器710的活動。例如:控制器712可以包括:控制處理器710及/或雷射器600的時機、同步及其它操作參數。參照諸多其它示例,控制器712可以被實現為在本發明中被討論的諸多其它控制器中的任何一個,諸如控制器112、1338、2314及3640。A controller 712 operable to control the activities of the laser 600 and/or the processor 710 . For example, the controller 712 may include controlling timing, synchronization, and other operating parameters of the processor 710 and/or the laser 600 . With reference to many other examples, controller 712 may be implemented as any of many other controllers discussed in this disclosure, such as controllers 112 , 1338 , 2314 and 3640 .

可選地,系統700可以包括:對該雷射的波長敏感的一SWIR PDA 706。這樣,SWIR光學系統可以用作一主動SWIR攝像機、SWIR飛行時間(ToF)感測器、SWIR光檢測及測距(LIDAR)感測器等。該ToF感測器可能對該雷射的波長敏感。可選地,該PDA可以是對由雷射器600發射的諸多SWIR頻率敏感的一基於CMOS的PDA,諸如由以色列的特拉維夫的趣眼有限公司(TriEye LTD)設計及製造的一基於CMOS的PDA。Optionally, system 700 may include a SWIR PDA 706 that is sensitive to the wavelength of the laser. In this way, the SWIR optical system can be used as an active SWIR camera, SWIR time-of-flight (ToF) sensor, SWIR light detection and ranging (LIDAR) sensor, etc. The ToF sensor may be sensitive to the wavelength of the laser. Alternatively, the PDA may be a CMOS-based PDA sensitive to the SWIR frequencies emitted by the laser 600, such as a CMOS-based PDA designed and manufactured by TriEye LTD of Tel Aviv, Israel .

可選地,系統700可以包括:一處理器710,用於處理來自該SWIR PDA(或系統700的任何其它光敏感測器)的檢測資料。例如:該處理器可以處理該檢測資訊,以提供系統700的一視場(FOV)的一SWIR影像,以檢測在該FOV中的諸多物體,諸如此類。可選地,該SWIR光學系統可以包括:一飛行時間(ToF)SWIR感測器及一控制器,該飛行時間(ToF)SWIR感測器對該雷射的該波長敏感,該控制器可操作以將該ToF SWIR感測器及該P-QS SWIR雷射器的操作同步以檢測該SWIR光學系統的視野中的至少一個物體的一距離。可選地,系統700可以包括:控制器712,該控制器712可操作以控制雷射器600或系統的諸多其它構件諸如光電探測器陣列(譬如焦平面陣列,FPA)的一操作的一個或多個方面。例如:該雷射的一些參數可以由該控制器控制,包括時機、持續時間、強度、聚焦(timing, duration, intensity, focusing),諸如此類。儘管不是必須的,但是該控制器可以基於該PDA的諸多檢測結果(直接地,或者基於該處理器的處理)以控制該雷射器的操作。可選地,該控制器可以是可操作以控制該雷射泵或其它類型的光源以影響該雷射的諸多啟用參數。可選地,該控制器可以是可操作以動態地改變該脈衝重複率。可選地,該控制器可以是可操作以控制該光整形光學器件的動態修改,例如:用於改善視場中的諸多特定區域中的一訊號雜訊比(SNR)。可選地,該控制器可以是可操作以控制該照明模組以動態地改變脈衝能量及/或持續時間(譬如以諸多其它P-QS雷射器可能的相同方式,諸如改變泵送雷射的聚焦等)。Optionally, the system 700 may include: a processor 710 for processing detection data from the SWIR PDA (or any other light sensitive sensor of the system 700). For example, the processor can process the detection information to provide a SWIR image of a field of view (FOV) of the system 700 to detect objects within the FOV, and so on. Optionally, the SWIR optical system may include: a time-of-flight (ToF) SWIR sensor sensitive to the wavelength of the laser and a controller operable to synchronize the operation of the ToF SWIR sensor and the P-QS SWIR laser to detect a distance of at least one object in the field of view of the SWIR optical system. Optionally, system 700 may include a controller 712 operable to control one or more of the operations of laser 600 or a number of other components of the system, such as a photodetector array (e.g., focal plane array, FPA). Many aspects. For example: some parameters of the laser can be controlled by the controller, including timing, duration, intensity, focusing (timing, duration, intensity, focusing), and the like. Although not required, the controller can control the operation of the laser based on the PDA's detection results (directly, or based on processing by the processor). Optionally, the controller may be operable to control the laser pump or other type of light source to affect activation parameters of the laser. Optionally, the controller may be operable to dynamically vary the pulse repetition rate. Optionally, the controller may be operable to control dynamic modification of the light shaping optics, for example to improve a signal-to-noise ratio (SNR) in specific regions of the field of view. Optionally, the controller may be operable to control the illumination module to dynamically vary pulse energy and/or duration (e.g., in the same manner as many other P-QS lasers are possible, such as varying the pumping laser focus, etc.).

進一步並且可選地,系統700可以包括:溫度控制(譬如被動溫度控制、主動溫度控制),用於總體上控制該雷射或者其一個或多個構件(譬如該泵二極體)的一溫度。這樣的溫度控制可以包括:例如一熱電冷卻器(TEC)、一風扇、一散熱器、在泵二極體下的電阻加熱器,依此類推。Further and optionally, system 700 may include: temperature control (e.g., passive temperature control, active temperature control) for generally controlling a temperature of the laser or one or more components thereof (e.g., the pump diode) . Such temperature control may include, for example, a thermoelectric cooler (TEC), a fan, a heat sink, resistive heaters under pump diodes, and so on.

進一步並且可選地,系統700可以包括:被用於漂白GM 602及SA 604中的至少一個的另一雷射器。可選地,系統700可以包括:一內部光敏檢測器(譬如一個或多個PD,像PDA 706),該內部光敏檢測器可操作以測量由雷射器600(譬如如上所述的PD 226)產生一脈衝的一時間。在這樣的一情況下,控制器740可操作以基於從內部光敏檢測器706獲得的時機資訊發出一觸發訊號到PDA 706(或其它類型的照相機或感測器702),該PDA 706檢測來自系統700的視場中的諸多物體的雷射的光的反射。Further and optionally, system 700 may include another laser used to bleach at least one of GM 602 and SA 604 . Optionally, system 700 may include an internal photosensitive detector (such as one or more PDs, like PDA 706) operable to measure A time to generate a pulse. In such a case, the controller 740 is operable to send a trigger signal to the PDA 706 (or other type of camera or sensor 702) based on timing information obtained from the internal photosensitive detector 706 The reflection of laser light from many objects in the 700 field of view.

在上述光譜範圍(1.3至1.5μm)內需要大量雷射器的主要行業是用於光學資料儲存的電子行業,這使得該二極體雷射器的成本降低至每裝置、每瓦為數美元甚至更低。但是,這些雷射器不適用於其它行業,例如汽車行業,這些行業要求雷射具備相當高的峰值功率及光束亮度,並且將在惡劣的環境條件下被使用。The main industry that needs a lot of lasers in the above spectral range (1.3 to 1.5 μm) is the electronics industry for optical data storage, which brings the cost of this diode laser down to a few dollars per device, per watt or even lower. However, these lasers are not suitable for other industries, such as the automotive industry, which require lasers with relatively high peak power and beam brightness and will be used under harsh environmental conditions.

應當指出的是,關於被認為是該SWIR光譜的一部分的波長範圍,尚無科學共識。然而,出於本發明的目的,該SWIR光譜包括電磁輻射,該電磁輻射的波長大於可見光譜的波長,並且該電磁輻射至少包括在1300與1500nm之間的光譜範圍。It should be noted that there is no scientific consensus on the range of wavelengths considered to be part of this SWIR spectrum. However, for the purposes of the present invention, the SWIR spectrum includes electromagnetic radiation having wavelengths greater than those of the visible spectrum and which includes at least the spectral range between 1300 and 1500 nm.

儘管不限於這種用途,但是一個或多個P-QS雷射器600可以被用作成像系統100、100’及100”中的任何一個的照明源102。雷射器600可以被用在需要脈衝照明的SWIR範圍內的任何其它EO系統中,例如諸多雷射雷達、諸多光譜儀、諸多通訊系統,諸如此類。要被注意的是,該諸多被提出的雷射器600及用於製造這種雷射器的諸多方法允許以相對較低的產出成本進行大批量製造在該SWIR光譜範圍內操作的雷射器。Although not limited to such use, one or more P-QS lasers 600 may be used as illumination source 102 for any of imaging systems 100, 100', and 100". Lasers 600 may be used where desired In any other EO system within the SWIR range of pulsed illumination, such as many lidars, many spectrometers, many communication systems, etc. It is to be noted that the proposed laser 600 and the Various approaches to lasers allow high-volume fabrication of lasers operating in this SWIR spectral range at relatively low yield costs.

P-QS雷射器600至少包括一晶體增益介質(crystalline gain medium)602(在下文中也被稱為“GM”)、一晶體SA 604及一光腔606,上述結晶材料在該光腔606中被限制,以允許光在增益介質602中進行傳播,以增強趨向產生一雷射光束612(譬如在第8圖中示出)。該光腔也被眾所周知為該術語“光學諧振器(optical resonator)”及“諧振腔(resonating cavity)”,並且該光腔包括一高反射率鏡608(也稱為“高反射器(high reflector)”)及一輸出耦合器610。以下被討論的是幾種不同類型的結晶材料的獨特且新穎的組合,並且使用多種製造技術以製造雷射器,從而允許大批量製造價格合理的該SWIR光譜範圍的諸多雷射器。出於本發明內容的簡潔的原因,在此不提供關於P-QS雷射器的本領域中公知的一般細節,但是這些細節可以從各種各樣的資源中容易地獲得。如本領域中已知的,該雷射器的該可飽和吸收體(saturable absorber)用作該雷射器的該Q開關(Q-switch)。該術語“結晶材料(crystalline material)”廣泛地包括單晶形式或多晶形式的任何材料。The P-QS laser 600 includes at least a crystalline gain medium (crystalline gain medium) 602 (hereinafter also referred to as "GM"), a crystal SA 604 and an optical cavity 606, and the above-mentioned crystalline material is in the optical cavity 606 Confined to allow light to propagate in the gain medium 602, the enhanced tendency produces a laser beam 612 (such as shown in FIG. 8). The cavity is also known by the terms "optical resonator" and "resonating cavity" and includes a high reflectivity mirror 608 (also known as a "high reflector"). )”) and an output coupler 610. Discussed below is the unique and novel combination of several different types of crystalline materials, and the use of various fabrication techniques to fabricate the lasers, allowing the mass production of reasonably priced lasers in this SWIR spectral range. For reasons of brevity in the present disclosure, general details known in the art regarding P-QS lasers are not provided here, but such details are readily available from a variety of sources. As known in the art, the saturable absorber of the laser acts as the Q-switch of the laser. The term "crystalline material" broadly includes any material in single or polycrystalline form.

該被連接的晶體增益介質及晶體SA的尺寸可以取決於設計一特定P-QS雷射器600的目的。在一非限制性示例中,該SA及該GM的一結合長度是在5與15毫米之間。在一非限制性示例中,該SA及該GM的該結合長度是在2與40毫米之間。在一非限制性示例中,該SA及該GM的該組合的一直徑(譬如如果是一圓柱體,或被局限在一虛構的此類圓柱體中)是在2與5毫米之間。在一非限制性示例中,SA及GM的該組合的一直徑是在0.5與10毫米之間。The dimensions of the connected crystal gain medium and crystal SA may depend on the purpose of designing a particular P-QS laser 600 . In a non-limiting example, a combined length of the SA and the GM is between 5 and 15 millimeters. In a non-limiting example, the combined length of the SA and the GM is between 2 and 40 mm. In a non-limiting example, a diameter of the combination of the SA and the GM (eg if a cylinder, or confined in an imaginary such cylinder) is between 2 and 5 millimeters. In a non-limiting example, a diameter of the combination of SA and GM is between 0.5 and 10 millimeters.

P-QS雷射器600包括一增益介質結晶材料(GMC),該增益介質結晶材料被剛性連接到一SA結晶材料(SAC)。該剛性耦合可以用本領域中已知的任何一種方式被實現,諸如使用黏合劑、擴散黏結、複合晶體黏結、生長一個在另一個的上部,諸如此類。然而,如下所述,以一陶瓷形式的剛性連接的結晶材料可以使用簡單且廉價的方法被實現。要被注意的是,該GMC及該SAC材料可以彼此直接剛性連接,但是可以可選地經由一中間物體(譬如另一晶體)彼此剛性連接。在一些實施方案中,該增益介質及該SA兩者可以在單片結晶材料上被實現,通過將不同摻雜劑(譬如下文關於SAC材料及GMC被討論的那些)摻雜在單片結晶材料的不同部分,或通過共摻雜單片結晶材料(a single piece of crystalline material),將兩種摻雜劑(譬如共摻雜有N³⁺及V³⁺的一陶瓷YAG)摻雜相同體積的結晶材料。可選地,該增益介質可以在一單晶飽和吸收基板(single crystal saturable absorbing substrate)上生長(譬如使用液相外延,LPE)。要被注意的是,在如下的揭露中被廣泛討論的分離的GMC材料及SA結晶材料,摻雜有兩種摻雜劑的單片陶瓷結晶材料也可以被比照使用於任何後列的實現方案中。The P-QS laser 600 includes a gain medium crystalline material (GMC) rigidly connected to an SA crystalline material (SAC). This rigid coupling can be achieved in any number of ways known in the art, such as using adhesives, diffusion bonding, composite crystal bonding, growing one on top of the other, and the like. However, as described below, a rigidly connected crystalline material in the form of a ceramic can be achieved using simple and inexpensive methods. It is to be noted that the GMC and the SAC material may be rigidly connected to each other directly, but may alternatively be rigidly connected to each other via an intermediate object such as another crystal. In some embodiments, both the gain medium and the SA can be realized on a monolithic crystalline material by doping different dopants (such as those discussed below with respect to SAC materials and GMCs) on the monolithic crystalline material. different parts of the crystalline material, or by co-doping a single piece of crystalline material, doping two dopants (such as a ceramic YAG co-doped with N³⁺ and V³⁺) into the same volume of crystal Material. Alternatively, the gain medium can be grown on a single crystal saturable absorbing substrate (eg, using liquid phase epitaxy, LPE). It is to be noted that the separated GMC material and SA crystalline material discussed extensively in the following disclosure, monolithic ceramic crystalline material doped with both dopants can also be used mutatis mutandis in any of the following implementations .

第7A圖、第7B圖及第7C圖是以圖解說明根據目前公開的主題的P-QS雷射器600的諸多示例的諸多示意性功能框圖。在第7A圖中,該兩種摻雜劑被實現在該普通結晶材料614的兩個部分上(既充當GM又充當SA),而在第7B圖中,該兩種摻雜劑被實現在普通結晶材料614(在被圖解說明的情況下-該普通晶體的整體)的普通體積上被可互換地實現。可選地,該GM及該SA可以在被摻雜有釹及至少一種其它材料的單片結晶材料上被實現。可選地(譬如如第7C圖所示),輸出耦合器610及高反射率鏡608中的任何一者或兩者可以被直接膠合到該多種結晶材料(譬如該GM或該SA,或將兩者結合的一晶體)中的一種。7A, 7B, and 7C are schematic functional block diagrams illustrating examples of P-QS lasers 600 in accordance with the presently disclosed subject matter. In Figure 7A, the two dopants are implemented on two portions of the general crystalline material 614 (serving as both GM and SA), while in Figure 7B the two dopants are implemented on Common volumes of common crystalline material 614 (where illustrated - the bulk of the common crystal) are implemented interchangeably. Alternatively, the GM and the SA may be implemented on a monolithic crystalline material doped with neodymium and at least one other material. Alternatively (such as shown in FIG. 7C), either or both of output coupler 610 and high reflectivity mirror 608 may be glued directly to the various crystalline materials (such as the GM or the SA, or the One of the two crystals).

SAC及GMC中的至少一種是一陶瓷結晶材料,該陶瓷結晶材料是以一陶瓷形式(譬如一多晶形式)的相關結晶材料(譬如被摻雜的釔鋁石榴石,YAG,被摻雜釩)。具有一種(尤其是兩種)陶瓷形式的結晶材料允許更高數量及更低成本的生產。例如:代替在一緩慢且有限的過程中生長單獨的單晶材料,通過粉末燒結(即,壓實並可能加熱一種粉末以形成一固體質量)、低溫燒結、真空燒結,諸如此類,多晶材料可以被製造。諸多結晶材料(SAC或GMC)中的一種可以被燒結在另一種的上部,從而消除進行複雜且昂貴的工藝程式,諸如拋光、擴散黏結或表面活化黏結。可選地,該GMC及SAC中的至少一個是多晶的。可選地,該GMC及該SAC都是多晶的。At least one of SAC and GMC is a ceramic crystalline material which is a related crystalline material (such as doped yttrium aluminum garnet, YAG, doped vanadium ). Having a crystalline material in one (especially two) ceramic forms allows higher quantity and lower cost production. For example: instead of growing individual monocrystalline materials in a slow and limited process, polycrystalline materials can be was manufactured. One of many crystalline materials (SAC or GMC) can be sintered on top of the other, eliminating the need for complex and expensive processes such as polishing, diffusion bonding or surface activated bonding. Optionally, at least one of the GMC and SAC is polycrystalline. Optionally, both the GMC and the SAC are polycrystalline.

提到該GMC及該SAC的諸多結晶材料的該諸多組合可以被製成,這樣的諸多組合可以包括: a. 該GMC是陶瓷摻釹的釔鋁石榴石(Nd:YAG),並且該SAC是(a)陶瓷摻三價釩的釔鋁石榴石(V³⁺:YAG)或(b)一陶瓷摻鈷結晶材料。可選地,該陶瓷摻鈷結晶材料可以是兩價陶瓷摻鈷結晶材料。在那些替代方案中,選自於上述群組的該Nd:YAG及該SAC兩者均為陶瓷形式。一摻鈷結晶材料是摻有鈷的一結晶材料。諸多示例包括摻鈷尖晶石(Co:鈷或Co²⁺:MgAl₂O₄)、摻鈷硒化鋅(Co²⁺:ZnSe),摻鈷YAG(Co²⁺:YAG)。儘管不是必須如此,但是在此選項中,高反射率鏡及該SA可以可選地被剛性連接到該增益介質及該SA,以使該P-QS雷射器是一單片微晶片P-QS雷射器(譬如如第8圖及第10圖所示)。 b. 該GMC是陶瓷摻釹的釔鋁石榴石(Nd:YAG),並且該SAC是一非陶瓷SAC,選自於由以下材料組成的多個摻雜陶瓷材料的一群組:(a)摻三價釩的釔鋁石榴石(V³⁺:YAG)及(b)摻鈷結晶材料。可選地,該摻鈷結晶材料可以是摻二價鈷結晶材料。在這樣的一情況下,高反射率鏡608及輸出耦合器610被剛性連接到該增益介質及該SA,使得P-QS雷射器600是一單片微晶片P-QS雷射器。 c. 該GMC是陶瓷摻釹稀土元素結晶材料,並且該SAC是一陶瓷結晶材料,選自於由以下組成的多個摻雜的結晶材料的一群組:(a)摻三價釩的釔鋁石榴石(V³⁺:YAG)及(b)諸多摻鈷結晶材料。可選地,該鈷摻雜結晶材料可以是二價鈷摻雜結晶材料。儘管不是必須的,但是在此選項中,高反射率鏡608及輸出耦合器610可以可選地被剛性連接到該增益介質及該SA,使得P-QS雷射器600是一單片微晶片P-QS雷射器。Referring to the combinations of crystalline materials of the GMC and the SAC that can be made, such combinations can include: a. The GMC is a ceramic neodymium-doped yttrium aluminum garnet (Nd:YAG), and the SAC is (a) a ceramic doped vanadium-doped yttrium aluminum garnet (V³⁺:YAG) or (b) a ceramic cobalt doped crystalline material. Optionally, the ceramic cobalt-doped crystalline material may be a divalent ceramic cobalt-doped crystalline material. In those alternatives, both the Nd:YAG and the SAC selected from the above group are in ceramic form. A cobalt-doped crystalline material is a crystalline material doped with cobalt. Examples include cobalt-doped spinel (Co:Co or Co²⁺:MgAl₂O₄), cobalt-doped zinc selenide (Co²⁺:ZnSe), cobalt-doped YAG (Co²⁺:YAG). Although not required, in this option the high reflectivity mirror and the SA can optionally be rigidly connected to the gain medium and the SA so that the P-QS laser is a monolithic microchip P- QS lasers (such as those shown in Figures 8 and 10). b. The GMC is ceramic neodymium-doped yttrium aluminum garnet (Nd:YAG), and the SAC is a non-ceramic SAC selected from the group of doped ceramic materials consisting of: (a) Trivalent vanadium-doped yttrium aluminum garnet (V³⁺:YAG) and (b) cobalt-doped crystalline materials. Optionally, the cobalt-doped crystalline material may be divalent cobalt-doped crystalline material. In such a case, high reflectivity mirror 608 and output coupler 610 are rigidly connected to the gain medium and the SA such that P-QS laser 600 is a monolithic microchip P-QS laser. c. The GMC is a ceramic neodymium doped rare earth element crystalline material and the SAC is a ceramic crystalline material selected from the group of doped crystalline materials consisting of: (a) trivalent vanadium doped yttrium Aluminum garnet (V³⁺:YAG) and (b) many cobalt-doped crystalline materials. Optionally, the cobalt-doped crystalline material may be divalent cobalt-doped crystalline material. Although not required, in this option the high reflectivity mirror 608 and output coupler 610 can optionally be rigidly connected to the gain medium and the SA so that the P-QS laser 600 is a monolithic microchip P-QS laser.

要被注意的是,在任何一種實現方案中,一種摻雜結晶材料可以摻雜有超過一種摻雜劑。例如:該SAC可以摻雜有以上公開的主摻雜劑以及至少一種其它摻雜材料(譬如以顯著更低的含量)。一種摻釹稀土元素結晶材料是一種結晶材料,該結晶材料的晶胞(unit cell)包含一稀土元素(一明決定義的15種化學元素群組中的一種,包括15種鑭系元素以及鈧及釔),並且其摻雜有釹(譬如三重離子化釹)可替代在該晶胞的一部分中的該稀土元素。可以在本發明中被使用的摻釹稀土元素結晶材料的幾個非限制性示例為: a. Nd:YAG(如上所述),摻釹鎢酸釔鉀(Nd:KYW)、摻釹氟化鋰釔(Nd:YLF)、摻釹原釩酸釔(YVO₄),在所有這些中的該稀土元素是釹,Nd; b. 摻釹原釩酸((Nd:GdVO₄)、摻釹鎵石榴石(Nd:GGG)、摻釹鎢酸釓鉀(Nd:KGW),所有這些中的該稀土元素是釓,Gd; c. 摻釹硼酸鈧鑭(Nd:LSB),其中的該稀土元素為鈧; d. 其它摻釹稀土元素結晶材料可以被使用,其中的稀土元素可以是釔、釓、鈧或任何其它稀土元素。It is to be noted that in any one implementation, one doped crystalline material may be doped with more than one dopant. For example: the SAC may be doped with the above-disclosed main dopant and at least one other dopant material (eg at significantly lower levels). A neodymium-doped rare earth element crystalline material is a crystalline material whose unit cell contains a rare earth element (one of a well-defined group of 15 chemical elements, including the 15 lanthanides and scandium and yttrium), and doped with neodymium (eg, triple ionized neodymium) can replace the rare earth element in a portion of the unit cell. A few non-limiting examples of neodymium-doped rare earth crystalline materials that can be used in the present invention are: a. Nd:YAG (as above), Neodymium doped Potassium Yttrium Tungstate (Nd:KYW), Neodymium Doped Lithium Yttrium Fluoride (Nd:YLF), Neodymium Doped Yttrium Orthovanadate (YVO₄), among all The rare earth element is neodymium, Nd; b. Nd-doped orthovanadate ((Nd:GdVO₄), Nd-doped gallium garnet (Nd:GGG), Nd-doped potassium tungstate (Nd:KGW), all of which the rare earth element is gadolinium, Gd; c. Neodymium doped scandium lanthanum borate (Nd:LSB), wherein the rare earth element is scandium; d. Other Nd-doped rare earth element crystalline materials can be used, where the rare earth element can be yttrium, gadolinium, scandium or any other rare earth element.

以下討論應用於諸多GMC及諸多SAC的任何可選的組合。The following discussion applies to any optional combination of GMCs and SACs.

可選地,該GMC被直接剛性連接到該SAC。替代地,該GMC及該SAC可以被間接連接(譬如該SAC及GMC中的每個經由一種或多種中間結晶材料的一群組及/或經由一種或多種其它對相關波長透明的固體材料被連接)。可選地,該SAC及該GMC中的一者或兩者對相關波長是透明的。Optionally, the GMC is rigidly connected directly to the SAC. Alternatively, the GMC and the SAC may be connected indirectly (e.g., each of the SAC and GMC is connected via a group of one or more intermediate crystalline materials and/or via one or more other solid materials transparent to the wavelength of interest ). Optionally, one or both of the SAC and the GMC are transparent to the wavelength of interest.

可選地,該SAC可以是摻鈷尖晶石(Co Co²⁺:MgAl2O4)。可選地,該SAC可以是摻鈷YAG(Co:YAG)。可選地,這可以使得鈷及釹Nd能夠共摻雜在相同YAG上。可選地,該SAC可以是摻鈷硒化鋅(Co2+ :ZnSe)。可選地,該GMC可以是一陶瓷摻鈷結晶材料。Alternatively, the SAC may be cobalt-doped spinel (Co Co²⁺:MgAl2O4). Alternatively, the SAC may be cobalt-doped YAG (Co:YAG). Optionally, this may enable co-doping of cobalt and neodymium Nd on the same YAG. Alternatively, the SAC may be cobalt-doped zinc selenide (Co 2+ :ZnSe). Alternatively, the GMC may be a ceramic cobalt-doped crystalline material.

可選地,該SA的一初始透射率(T₀)是在75%與90%之間。可選地,該SA的該初始透射率是在78%與82%之間。Optionally, an initial transmittance (T₀) of the SA is between 75% and 90%. Optionally, the initial transmittance of the SA is between 78% and 82%.

由該雷射發射的該諸多波長取決於被使用在它的構造中的材料,尤其取決於該GMC及該SAC的材料及摻雜劑。諸多輸出波長的一些示例包括在1,300nm及1,500nm範圍內的諸多波長。一些更具體的示例包括1.32μm或約1.32μm(譬如1.32μm±3nm)、1.34μm或約1.34μm(譬如1.34μm±3nm)、1.44μm或約1.44μm(譬如1.44μm±3nm)。對這些光頻率範圍中的一者或多者敏感的一對應成像器可以被包括在SWIR光學系統700中(譬如如第10圖所示)。The wavelengths emitted by the laser depend on the materials used in its construction, especially on the materials and dopants of the GMC and the SAC. Some examples of output wavelengths include wavelengths in the range of 1,300 nm and 1,500 nm. Some more specific examples include 1.32 μm or about 1.32 μm (eg, 1.32 μm±3 nm), 1.34 μm or about 1.34 μm (eg, 1.34 μm±3 nm), 1.44 μm or about 1.44 μm (eg, 1.44 μm±3 nm). A pair of corresponding imagers sensitive to one or more of these optical frequency ranges may be included in SWIR optical system 700 (eg, as shown in FIG. 10 ).

第8圖及第9圖是以圖解說明根據目前公開的主題的諸多示例的SWIR光學系統700的多個示意性功能圖。如在這些圖例中被示範的,雷射器600除了如上討論的那些構件之外,還可以包括:諸多附加的構件,諸如(但不限於): a. 一光源諸如一閃光燈616或一雷射二極體618,該雷射二極體618用作該雷射器的一泵。參考前面的諸多示例,該光源可以用作泵124。 b. 聚焦光學器件620(譬如透鏡),用於將光從該光源(譬如618)聚焦到該雷射器600的光軸上。 c. 一擴散器(diffuser)或其它光學器件622,用以在雷射光束612離開光腔606後操縱雷射光束612。8 and 9 are a number of schematic functional diagrams illustrating a SWIR optical system 700 according to examples of the presently disclosed subject matter. As exemplified in these figures, laser 600 may include, in addition to those components discussed above, a number of additional components, such as (but not limited to): a. A light source such as a flash lamp 616 or a laser diode 618 which acts as a pump for the laser. Referring to the previous examples, the light source can be used as the pump 124 . b. Focusing optics 620 (such as a lens) for focusing light from the light source (such as 618 ) onto the optical axis of the laser 600 . c. A diffuser or other optical device 622 to manipulate the laser beam 612 after it exits the optical cavity 606 .

可選地,SWIR光學系統700可以包括:光學器件708,以將該雷射散佈在一更寬的FOV上,以改善在該FOV中的眼睛安全性問題。可選地,SWIR光學系統700可以包括:光學器件704,以收集來自該FOV的反射雷射並將它引導到該感測器702上,例如:引導到光電探測器陣列(PDA)706上,參見第10圖。可選地,該P-QS雷射器600是一個二極體泵送的固態雷射器(DPSSL)。Optionally, SWIR optical system 700 may include optics 708 to spread the laser light over a wider FOV to improve eye safety issues in the FOV. Optionally, SWIR optical system 700 may include optics 704 to collect reflected laser light from the FOV and direct it onto the sensor 702, e.g. onto a photodetector array (PDA) 706, See Figure 10. Optionally, the P-QS laser 600 is a diode pumped solid state laser (DPSSL).

可選地,P-QS雷射器600包括至少一個二極體泵光源872及用於將該二極體泵光源的光聚焦到該光學諧振器(光腔)中的光學器件620。可選地,該光源位於該光軸上(作為一端泵)。可選地,該光源可以被剛性地連接到高反射率鏡608或SA 604,使得該光源是一單片微晶片P-QS雷射器的一部分。可選地,該雷射器的該光源可以包括:一個或多個垂直腔表面發射雷射器(VCSEL)陣列。可選地,P-QS雷射器600包括至少一個VCSEL陣列及用於將該VCSEL陣列的光聚焦到該光學諧振器中的光學器件。由該光源(譬如該雷射泵)發出的波長可能取決於該雷射中被使用的諸多結晶材料及/或諸多摻雜劑。可以由該泵發射的一些示例性泵送波長包括:808nm或約808nm、869nm或約869nm、約九百多(nine hundred and some)nm。Optionally, the P-QS laser 600 includes at least one diode pump light source 872 and an optical device 620 for focusing the light of the diode pump light source into the optical resonator (optical cavity). Optionally, the light source is located on the optical axis (as an end pump). Alternatively, the light source can be rigidly attached to the high reflectivity mirror 608 or SA 604 such that the light source is part of a monolithic microchip P-QS laser. Optionally, the light source of the laser may comprise: one or more vertical cavity surface emitting laser (VCSEL) arrays. Optionally, the P-QS laser 600 includes at least one VCSEL array and optics for focusing the light of the VCSEL array into the optical resonator. The wavelength emitted by the light source (eg, the laser pump) may depend on the crystalline materials and/or dopants used in the laser. Some exemplary pump wavelengths that may be emitted by the pump include: 808 nm or about 808 nm, 869 nm or about 869 nm, about nine hundred and some nm.

該雷射的該功率可能取決於它被設計的用途。例如:該雷射輸出功率可以是在1W與5W之間。例如:該雷射輸出功率可以是在5W與15W之間。例如:該雷射輸出功率可以是在15W與50W之間。例如:該雷射輸出功率可以是在50W與200W之間。例如:該雷射輸出功率可以是高於200W。The power of the laser may depend on what it is designed to do. For example: the laser output power can be between 1W and 5W. For example: the laser output power can be between 5W and 15W. For example: the laser output power can be between 15W and 50W. For example: the laser output power can be between 50W and 200W. For example: the laser output power can be higher than 200W.

QS雷射器600是一脈衝雷射器,並且可以具有不同的頻率(重複率)、不同的脈衝能量,及不同的脈衝持續時間,這可以取決於它被設計的用途。例如:該雷射的一重複率可以是在10Hz與50Hz之間。例如:該雷射的一重複率可以是在50Hz與150Hz之間。例如:該雷射的一脈衝能量可以是在0.1mJ與1mJ之間。例如:該雷射的一脈衝能量可以是在1mJ與2mJ之間。例如:該雷射的一脈衝能量可以是在2mJ與5mJ之間。例如:該雷射的一脈衝能量可以高於5mJ。例如:該雷射的一脈衝持續時間可以是在10ns與100ns之間。例如:該雷射的一脈衝持續時間可以是在0.1μs與100μs之間。例如:該雷射的一脈衝持續時間可以是在100μs與1ms之間。該雷射的尺寸也可以改變,例如取決於它的部件的尺寸。例如:該雷射的尺寸可以是X₁乘X₂乘X₃,其中每個尺寸(X₁、X₂及X₃)是在10mm與100mm之間、在20與200mm之間,依此類推。該輸出耦合鏡可以是平坦的、彎曲的或稍微彎曲的。QS laser 600 is a pulsed laser, and may have different frequencies (repetition rates), different pulse energies, and different pulse durations, which may depend on the use for which it is designed. For example: a repetition rate of the laser may be between 10 Hz and 50 Hz. For example: a repetition rate of the laser can be between 50Hz and 150Hz. For example: a pulse energy of the laser can be between 0.1 mJ and 1 mJ. For example: a pulse energy of the laser can be between 1mJ and 2mJ. For example: a pulse energy of the laser can be between 2mJ and 5mJ. For example: the pulse energy of the laser can be higher than 5mJ. For example, the duration of a pulse of the laser may be between 10 ns and 100 ns. For example: a pulse duration of the laser may be between 0.1 μs and 100 μs. For example: a pulse duration of the laser may be between 100 μs and 1 ms. The dimensions of the laser may also vary, eg depending on the dimensions of its components. For example: the dimensions of the laser may be X₁ by X₂ by X₃, where each dimension (X₁, X₂ and X₃) is between 10mm and 100mm, between 20 and 200mm, and so on. The output coupling mirror can be flat, curved or slightly curved.

可選地,除了該增益介質及該SA之外,雷射器600還可以包括:未摻雜YAG,用於防止熱量累積在該增益介質的一吸收區域中。該未摻雜YAG可以可選地被成形為包圍該增益介質及該SA的一圓柱體(譬如一同心圓柱體)。Optionally, besides the gain medium and the SA, the laser 600 may further include: undoped YAG for preventing heat from accumulating in an absorption region of the gain medium. The undoped YAG may optionally be shaped as a cylinder (eg, a concentric cylinder) surrounding the gain medium and the SA.

第11A圖是以圖解說明根據目前公開的主題的方法1100的一示例的一流程圖。方法1100是一種用於製造用於一P-QS雷射器的多個部件的方法,該P-QS雷射器例如但不限於上述P-QS雷射器600。參考關於先前附圖闡述的諸多示例,該P-QS雷射器可以是雷射器600。要被注意的是,關於雷射器600或關於其一構件被討論的任何變體也可以對於在方法1100中被製造的該P-QS雷射器的諸多部件或關於其一對應的構件被實施,反之亦然。FIG. 11A is a flowchart illustrating an example of a method 1100 in accordance with the presently disclosed subject matter. Method 1100 is a method for fabricating components for a P-QS laser, such as but not limited to P-QS laser 600 described above. Referring to the examples set forth with respect to the previous figures, the P-QS laser may be laser 600 . It is to be noted that any variation discussed with respect to laser 600 or with respect to a component thereof may also be discussed with respect to the components of the P-QS laser fabricated in method 1100 or with respect to a corresponding component thereof. implementation, and vice versa.

方法1100以將至少一種第一粉末塞入(inserting into)一第一模具中的步驟1102開始,該步驟1102隨後在方法1100中被處理以產出一第一結晶材料。該第一結晶材料用作該P-QS雷射器的該GM或該SA。在一些實現方案中,該雷射器的該增益介質首先被製造(譬如通過燒結的方式),然後該SA被製造在該先前製造的GM的頂部上(譬如通過燒結的方式)。在其它實現方案中,該雷射器的該SA首先被製成,然後該GM被製成在該先前製造的SA的頂部上。在其它實現方案中,該SA及該GM被彼此獨立地製成,並且被耦合以形成單個剛體。該耦合可以作為加熱、燒結或稍後的一部分被完成。The method 1100 begins with the step 1102 of inserting at least one first powder into a first mold, which is then processed in the method 1100 to produce a first crystalline material. The first crystalline material is used as the GM or the SA of the P-QS laser. In some implementations, the gain medium of the laser is first fabricated (eg, by sintering) and then the SA is fabricated (eg, by sintering) on top of the previously fabricated GM. In other implementations, the SA of the laser is fabricated first, and then the GM is fabricated on top of the previously fabricated SA. In other implementations, the SA and the GM are fabricated independently of each other and coupled to form a single rigid body. This coupling can be done as part of heating, sintering or later.

方法1100的步驟1104包括將至少一種第二粉末塞入一第二模具中,該至少一種第二粉末與該至少一種第一粉末不同。該至少一種第二粉末稍後在方法1100中被處理,以產出一第二結晶材料。該第二結晶材料用作該P-QS雷射器的該GM或該SA(以便該SA及該GM中的一者由該第一結晶材料製成,另一功能性由該第二結晶材料製成)。Step 1104 of method 1100 includes packing at least one second powder into a second mold, the at least one second powder different from the at least one first powder. The at least one second powder is later processed in method 1100 to produce a second crystalline material. The second crystalline material serves as the GM or the SA of the P-QS laser (so that one of the SA and the GM is made of the first crystalline material and the other is functionally made of the second crystalline material production).

該第二模具可以與該第一模具不同。替代地,該第二模具可以與該第一模具相同。在這樣的一情況下,該至少一種第二粉末可以被塞入,例如:在該至少一種第一粉末的頂部上(或者如果已經製成,則在該第一生坯的頂部上),在其旁邊、在其周圍,諸如此類。該將至少一種第二粉末塞入該至少一種第一粉末的相同模具(如果被實現)可以被執行在將該至少一種第一粉末處理成一第一生坯前、在將該至少一種第一粉末處理成該後第一生坯,或在將該至少一種第一粉末處理成該第一生坯的過程中的某個時間。The second mold can be different from the first mold. Alternatively, the second mold may be identical to the first mold. In such a case, the at least one second powder may be inserted, for example, on top of the at least one first powder (or if already made, on top of the first green body), in Next to it, around it, and so on. The same mold (if realized) of inserting the at least one second powder into the at least one first powder may be performed before processing the at least one first powder into a first green body, after the at least one first powder processed into the first green body, or sometime during processing of the at least one first powder into the first green body.

該第一粉末及/或該第二粉末可包括被壓碎的YAG(或任何其它前述材料,諸如尖晶石、MgAl₂O₄、ZnSe)及摻雜材料(譬如N³⁺、V³⁺、Co)。該第一粉末及/或該第二粉末可以包括:用以製成YAG的材料(或其它任何上述材料,例如尖晶石、MgAl₂O₄、ZnSe)及摻雜材料(譬如N³⁺、V³⁺、Co)。The first powder and/or the second powder may comprise crushed YAG (or any other of the aforementioned materials, such as spinel, MgAl₂O₄, ZnSe) and doped materials (eg N³⁺, V³⁺, Co). The first powder and/or the second powder may include: the material used to make YAG (or any of the above materials, such as spinel, MgAl₂O₄, ZnSe) and doping materials (such as N³⁺, V³⁺, Co ).

步驟1106在步驟1102後被執行,並且包括將在第一模具中的該至少一種第一粉末壓實以產出一第一生坯。步驟1104在步驟1108後被執行,其包括將在第二模具中的至少一種第二粉末壓實,從而產出一第二生坯。如果在步驟1102及1104中將該至少一種第一粉末及該至少一種第二粉末塞入相同模具中,則可以在步驟1106及1108中同時進行該諸多粉末的壓實(譬如按壓該至少一種第二粉末,該至少一種第二粉末轉而壓縮該至少一種第一粉末緊靠該模具),但這不是必須的。例如:步驟1104(以及因此也執行步驟1108)可以可選地在步驟1106的壓縮後被執行。Step 1106 is performed after step 1102 and includes compacting the at least one first powder in a first mold to produce a first green body. Step 1104 is performed after step 1108 and includes compacting at least one second powder in a second mold to produce a second green body. If the at least one first powder and the at least one second powder are stuffed into the same mold in steps 1102 and 1104, the compaction of the powders (such as pressing the at least one first powder) can be performed simultaneously in steps 1106 and 1108. two powders, the at least one second powder in turn compresses the at least one first powder against the mold), but this is not necessary. For example: step 1104 (and thus also step 1108 ) may optionally be performed after the compression of step 1106 .

步驟1110包括將該第一生坯加熱以產出(yield)一第一結晶材料。步驟1112包括將該第二生坯以產出一第二結晶材料。在不同的實施例中,該第一晶體的該加熱可以在步驟1106及1110中的每個以前、同時、部分同時或以後被執行。Step 1110 includes heating the first green body to yield a first crystalline material. Step 1112 includes the second green body to produce a second crystalline material. In various embodiments, the heating of the first crystal can be performed before, simultaneously, partly simultaneously, or after each of steps 1106 and 1110 .

可選地,在步驟1110處進行該第一生坯的加熱先於在步驟1108中(並且可能在步驟1104中)進行該至少一種第二粉末的壓實(並且還可能先於該塞入)。該第一生坯及該第二生坯可以分別被加熱(譬如在不同的時間、在不同的溫度、對於不同的持續時間)。該第一生坯及該第二生坯可以一起被加熱(譬如在相同烤箱中),或者在加熱中彼此連接或不這樣做。該第一生坯及該第二生坯可以經受不同的加熱制度(heating regimes),該加熱制度可以共享部分共加熱,同時在加熱制度的其它部分中被分別加熱。例如:該第一生坯及該第二生坯中的一者或兩個可以與另一生坯分開地加熱,然後該兩個生坯可以一起被加熱(譬如在耦合後,但不一定如此)。可選地,該第一生坯的加熱及該第二生坯的加熱包括在單個烤箱中同時加熱該第一生坯及該第二生坯。要被注意的是,可選地,該步驟1114的耦合是在單個烤箱中同時加熱該兩個生坯的一結果。要被注意的是,可選地,該步驟1114的耦合通過在物理上彼此連接後將兩個生坯共燒結被完成。Optionally, the heating of the first green body at step 1110 is performed prior to the compaction (and possibly also prior to the plugging) of the at least one second powder in step 1108 (and possibly in step 1104) . The first green body and the second green body may be heated separately (eg at different times, at different temperatures, for different durations). The first green body and the second green body may be heated together (eg in the same oven), or joined to each other during heating or not. The first green body and the second green body may be subjected to different heating regimes, which may share portions of the heating regime while being separately heated in other portions of the heating regime. For example: one or both of the first green body and the second green body can be heated separately from the other green body, and then the two green bodies can be heated together (such as after coupling, but not necessarily so) . Optionally, the heating of the first green body and the second green body comprises simultaneously heating the first green body and the second green body in a single oven. It is to be noted that, optionally, the coupling of this step 1114 is a result of simultaneous heating of the two green bodies in a single oven. It is to be noted that, optionally, the coupling of this step 1114 is accomplished by co-sintering the two green bodies after being physically connected to each other.

步驟1116包括將該第二結晶材料耦合到該第一結晶材料。該耦合可以用本領域中已知的任何耦合方式被執行,其幾個非限制性示例如上被討論關於P-QS雷射器600。要被注意的是,該耦合可以具有幾個子步驟,在不同的實施例中,其中一些子步驟可以用不同的方式與步驟1106、1108、1110及1112中的不同步驟交織(intertwine)。該耦合引起包括該GM及該SA的單個剛性結晶體(rigid crystalline body)。Step 1116 includes coupling the second crystalline material to the first crystalline material. This coupling may be performed with any coupling known in the art, several non-limiting examples of which are discussed above with respect to P-QS laser 600 . It is to be noted that this coupling may have several sub-steps, some of which may be intertwined with different steps in steps 1106, 1108, 1110 and 1112 in different ways in different embodiments. The coupling results in a single rigid crystalline body comprising the GM and the SA.

應當指出的是,方法1100可以包括:多個附加步驟,該多個附加步驟在諸多晶體的製造中(特別是在彼此黏結的多晶材料的陶瓷或非陶瓷多晶晶體化合物的製造中)被使用。少數非限制性示例包括粉末製備(powder preparation)、黏合劑燒盡(binder burn-out)、緻密化(densification)、退火(annealing)、拋光(polishing)(如果需要,如下所述),諸如此類。It should be noted that method 1100 may include a number of additional steps that are employed in the manufacture of crystals, particularly in the manufacture of ceramic or non-ceramic polycrystalline crystalline compounds of polycrystalline materials bonded to each other. use. A few non-limiting examples include powder preparation, binder burn-out, densification, annealing, polishing (if desired, as described below), and the like.

在方法1100中的該P-QS雷射器的該GM(如上所述,其可以是該第一結晶材料或該第二結晶材料)是一種摻釹結晶材料。在方法1100中的該P-QS雷射器的該SA(如上所述,其可以是該第一結晶材料或該第二結晶材料)選自於由以下材料組成的多個結晶材料的一群組:(a) 一種摻釹結晶材料,及(b) 一種摻雜結晶材料,該摻雜結晶材料選自於由摻三價釩的釔鋁石榴石(V³⁺:YAG)及摻鈷結晶材料組成的多個摻雜結晶材料的一群組。該GM及該SA中的至少一者是一陶瓷結晶材料。可選地,該GM及該SA都是陶瓷結晶材料。可選地,該GM及該SA中的至少一者是一多晶材料。可選地,該GM及該SA兩者均為多晶材料。The GM of the P-QS laser in method 1100 (which may be the first crystalline material or the second crystalline material as described above) is a neodymium doped crystalline material. The SA of the P-QS laser in method 1100 (which may be the first crystalline material or the second crystalline material, as described above) is selected from the group of crystalline materials consisting of Group: (a) a neodymium-doped crystalline material, and (b) a doped crystalline material selected from the group consisting of trivalent vanadium-doped yttrium aluminum garnet (V³⁺:YAG) and cobalt-doped crystalline material A group of multiple doped crystalline materials. At least one of the GM and the SA is a ceramic crystalline material. Optionally, both the GM and the SA are ceramic crystalline materials. Optionally, at least one of the GM and the SA is a polycrystalline material. Optionally, both the GM and the SA are polycrystalline materials.

儘管製造工藝程式的諸多附加步驟可以在方法1100的不同階段之間被進行,但是在至少一些實現方案中,不需要在燒結過程中在該第二材料黏結以前對該第一材料進行拋光。Although additional steps of the fabrication process recipe may be performed between different stages of the method 1100, in at least some implementations it is not necessary to polish the first material prior to bonding the second material during sintering.

關於可以在方法1100中製造該GMC及該SAC的結晶材料的諸多組合,這樣的諸多組合可以包括: a. 該GMC是陶瓷摻釹的釔鋁石榴石(Nd:YAG),並且該SAC是(a) 陶瓷摻三價釩的釔鋁石榴石(V³⁺:YAG),或(b) 一陶瓷摻鈷結晶材料。在此替代方案中,選自上述群組的Nd:YAG及SAC均為陶瓷形式。一摻鈷結晶材料是摻雜有鈷的一結晶材料。諸多示例包括摻鈷尖晶石(Co:Spinel或Co²⁺:MgAl₂O₄)、摻鈷硒化鋅(Co²⁺:ZnSe)。儘管不是必須的,但是在此選項中的該高反射率鏡及該輸出耦合器可以可選地被剛性連接到該GM及該SA,使得該P-QS雷射器是一單片微晶片P-QS雷射器。 b. 該GMC是一陶瓷摻釹的釔鋁石榴石(Nd:YAG),該SAC是一非陶瓷SAC,選自於由以下材料組成的多個摻雜陶瓷材料的一群組:(a) 摻三價釩的釔鋁石榴石(V³⁺:YAG)及(b) 多種摻鈷結晶材料。在這樣的一情況下,該高反射率鏡及該輸出耦合器被剛性連接到該GM及該SA,使得該P-QS雷射器是一單片微晶片P-QS雷射器。 c. 該GMC是陶瓷摻釹稀土元素結晶材料,並且該SAC是選自於由以下材料組成的多個摻雜結晶材料的一群組:(a) 摻三價釩的釔鋁石榴石(V³⁺:YAG)及(b) 多種摻鈷結晶材料。儘管不是必須的,但是在此選項中的該高反射率鏡及該輸出耦合器可以可選地被剛性連接到該GM及該SA,使得該P-QS雷射器是一單片微晶片P-QS雷射器。Regarding the combinations of crystalline materials that can be used to fabricate the GMC and the SAC in method 1100, such combinations can include: a. The GMC is ceramic neodymium doped yttrium aluminum garnet (Nd:YAG), and the SAC is (a) ceramic trivalent vanadium doped yttrium aluminum garnet (V³⁺:YAG), or (b) a ceramic doped Cobalt crystalline material. In this alternative, both Nd:YAG and SAC selected from the above group are in ceramic form. A cobalt-doped crystalline material is a crystalline material doped with cobalt. Examples include cobalt-doped spinel (Co:Spinel or Co²⁺:MgAl₂O₄), cobalt-doped zinc selenide (Co²⁺:ZnSe). Although not required, the high reflectivity mirror and the output coupler in this option can optionally be rigidly connected to the GM and the SA so that the P-QS laser is a monolithic microchip P -QS laser. b. The GMC is a ceramic neodymium-doped yttrium aluminum garnet (Nd:YAG) and the SAC is a non-ceramic SAC selected from the group of doped ceramic materials consisting of: (a) Trivalent vanadium-doped yttrium aluminum garnet (V³⁺:YAG) and (b) various cobalt-doped crystalline materials. In such a case, the high reflectivity mirror and the output coupler are rigidly connected to the GM and the SA such that the P-QS laser is a monolithic microchip P-QS laser. c. The GMC is a ceramic neodymium-doped rare earth element crystalline material, and the SAC is selected from the group of doped crystalline materials consisting of: (a) trivalent vanadium-doped yttrium aluminum garnet (V³ ⁺:YAG) and (b) various cobalt-doped crystalline materials. Although not required, the high reflectivity mirror and the output coupler in this option can optionally be rigidly connected to the GM and the SA so that the P-QS laser is a monolithic microchip P -QS laser.

整體上參照方法1100,要被注意的是,該SAC及該GMC中的一者或兩者(以及可選的一種或多種中間連接的結晶材料,如果有)對相關波長(譬如SWIR輻射)是透明的。Referring generally to method 1100, it is noted that one or both of the SAC and the GMC (and optionally one or more intervening crystalline materials, if any) are transparent.

第11B圖及第11C圖包括根據目前公開的主題的諸多示例的用於執行方法1100的幾個概念性時間軸。為了簡化附圖,假設該SA是至少一種第一粉末的該處理的一結果,並且該增益介質是至少一種第二粉末的該處理的一結果。如上所述,該作用可以互換。Figures 11B and 11C include several conceptual timelines for performing method 1100 in accordance with examples of the presently disclosed subject matter. To simplify the figures, it is assumed that the SA is a result of the processing of at least one first powder and the gain medium is a result of the processing of at least one second powder. As mentioned above, the roles are interchangeable.

第12A圖示意性地示出被編號為1200的一PS的一示例,包括由一電壓控制電流源(VCCS)1204控制的一光電檢測器(譬如PD)1202。要被注意的是,該電壓控制電流源1204可以可選地在PS 1200的外部(譬如如果單個VCCS 1204提供電流到多個PS)。VCCS 1204是一從屬電流源,遞送與一控制電壓(在圖中被標示為VCTRL )成比例的一電流。在本發明中被公開的該諸多PS及諸多PDD可以包括:任何合適類型的VCCS。PS 1200的其它(“附加的(additional)”)構件(未被示出)由一通用框1206集體地表示。當被用於感測時,PS 1200之類的諸多PS及光電探測器1202之類的諸多光電探測器在下文中也可以被稱為“主動”或“非參考”的諸多PS/諸多光電探測器(與用於決定該電流源的該控制電壓的輸入的諸多PS及諸多光電檢測器不同)。FIG. 12A schematically shows an example of a PS, numbered 1200 , comprising a photodetector (eg, PD) 1202 controlled by a voltage controlled current source (VCCS) 1204 . It is to be noted that the voltage controlled current source 1204 may optionally be external to the PS 1200 (eg if a single VCCS 1204 supplies current to multiple PSs). VCCS 1204 is a slave current source that delivers a current proportional to a control voltage (labeled V CTRL in the figure). The PSs and PDDs disclosed in this invention may include any suitable type of VCCS. Other (“additional”) components (not shown) of PS 1200 are collectively represented by a general block 1206 . When used for sensing, PSs such as PS 1200 and photodetectors such as photodetector 1202 may hereinafter also be referred to as "active" or "non-reference" PSs/photodetectors (Unlike PSs and photodetectors used to determine the input of the control voltage for the current source).

第12B圖示意性地示出編號為1200’的一PS的另一示例,它是PS 1200的一示例。在PS 1200’中,其它構件1206為一“3T”(三電晶體)結構的形式。任何其它合適的電路可以用作諸多附加構件1206。Another example of a PS, numbered 1200', which is an example of PS 1200, is schematically shown in Figure 12B. In PS 1200', other components 1206 are in the form of a "3T" (tri-transistor) structure. Any other suitable circuitry can be used as numerous additional components 1206 .

電流源1204可被用於提供與PD 1202所產生的該暗電流相同幅度但方向相反的一電流,從而消除該暗電流(或至少減少它)。如果PD 1202的特點是高暗電流特性,這將特別有用。這樣,從該PD流到一電容(如上所述,可以由一個或多個電容器、由該PS的寄生電容或其一組合提供)的該電荷,以及該暗電流引起的電荷可以被抵消。尤其是,由電流源1204提供幅度實質上等於該暗電流的一電流意謂該被提供的電流不會抵消由於被檢測的光衝擊在PD 1202上而由PD 1202產生的該實際電訊號。Current source 1204 may be used to provide a current of the same magnitude but opposite direction as the dark current generated by PD 1202, thereby eliminating the dark current (or at least reducing it). This is especially useful if the PD 1202 is characterized by high dark current characteristics. In this way, the charge flowing from the PD to a capacitance (which, as described above, may be provided by one or more capacitors, by the parasitic capacitance of the PS, or a combination thereof), and the charge caused by the dark current can be canceled out. In particular, providing a current by the current source 1204 with a magnitude substantially equal to the dark current means that the provided current does not cancel the actual electrical signal generated by the PD 1202 due to the detected light impinging on the PD 1202 .

第13A圖示出根據目前公開的主題的諸多示例的一PDD 1300。PDD 1300包括可將由電流源1204發出的該電流與由PD 1202產生的暗電流可控制地匹配的電路,即使在該被產生的暗電流不是恒定的(隨時間變化)的情況下亦然。要被注意的是,由PD 1202產生的該暗電流的級別可以取決於不同的參數,諸如操作溫度及被供應給該PD的該偏壓(其也可以不時改變)。Figure 13A shows a PDD 1300 according to examples of the presently disclosed subject matter. PDD 1300 includes circuitry that can controllably match the current sourced by current source 1204 to the dark current generated by PD 1202, even if the generated dark current is not constant (varies over time). It is to be noted that the level of the dark current generated by the PD 1202 may depend on different parameters such as operating temperature and the bias voltage supplied to the PD (which may also vary from time to time).

通過PDD 1300減少在PS 1200內的暗電流的影響(而不是在訊號處理的後期階段,無論是類比還是數位),使得能夠利用一相對較小的電容,而不會使該電容飽和或降低它對該被收集的電荷作出響應的線性度。Reducing the effect of dark current within the PS 1200 by the PDD 1300 (rather than in later stages of signal processing, whether analog or digital), enables the use of a relatively small capacitor without saturating the capacitor or degrading it The linearity of the response to the collected charge.

PDD 1300包括一PS 1200及一參考PS 1310,該PS 1200用於檢測衝擊的光,該參考PS 1310的輸出由附加電路(討論如下)使用,用於減少或消除在PS 1200中的暗電流的影響。像PS 1200(及1200’)一樣,參考PS 1310包括一PD 1302、一VCCS 1304及可選的其它電路(“其它構件(other components)”,被統稱為1306)。在一些示例中,PDD 1300的參考PS 1310可以與PDD 1300的PS 1200相同。可選地,PS 1310的任何一個或多個構件可以與PS 1200的一相應構件相同。例如:PD 1302可以與PD 1202實質相同。例如:VCCS 1304可以與VCCS 1204相同。可選地,PS 1310的任何一個或多個構件可以不同於諸多PS 1200的那些構件(譬如PD、電流源、附加電路)。要被注意的是,PS 1200及PS 1310的實質相同的構件(譬如PD、電流源、附加電路)可以在不同的操作條件下被操作。例如:不同的偏壓可以被供應給多個PD 1202及1302。例如:附加構件1206及1306的不同構件可以使用不同的參數被操作,或者選擇性地連接/斷開,即使當它們的結構實質相同時。為了簡單及清楚起見,PS 1310的諸多構件以數字1302(用於該PD)、1304(用於該VCCS)及1306(用於該附加電路)被編號,但不暗示此指示這些構件與構件1202、1204及1206不同。PDD 1300 includes a PS 1200 for detecting impinging light and a reference PS 1310, the output of which is used by additional circuitry (discussed below) to reduce or eliminate dark current in PS 1200. Influence. Like PS 1200 (and 1200'), reference PS 1310 includes a PD 1302, a VCCS 1304, and optional other circuitry ("other components", collectively referred to as 1306). In some examples, reference PS 1310 of PDD 1300 may be the same as PS 1200 of PDD 1300 . Optionally, any one or more components of PS 1310 may be identical to a corresponding component of PS 1200 . For example: PD 1302 may be substantially the same as PD 1202. For example: VCCS 1304 may be the same as VCCS 1204 . Optionally, any one or more components of PS 1310 may be different from those of PS 1200 (eg, PDs, current sources, additional circuitry). It is to be noted that substantially the same components of PS 1200 and PS 1310 (eg, PD, current source, additional circuitry) may be operated under different operating conditions. For example: different bias voltages can be supplied to multiple PDs 1202 and 1302 . For example, different components of additional components 1206 and 1306 may be manipulated using different parameters, or selectively connected/disconnected, even when their structures are substantially the same. For simplicity and clarity, the various components of PS 1310 are numbered with numbers 1302 (for the PD), 1304 (for the VCCS), and 1306 (for the additional circuitry), but this is not implied to indicate that these components are 1202, 1204 and 1206 are different.

在一些示例中,參考附加電路1306可以被省略或被斷開,以便不影響該暗電流的決定。PD 1202可以在以下任一條件下操作:反向偏壓、正向偏壓、零偏壓,或選擇性地在上述偏壓中的任意兩個或三個之間(譬如由一控制器諸如下面討論的控制器1338控制)。PD 1302可以在以下任一條件下操作:反向偏壓、正向偏壓、零偏壓,或選擇性地在上述偏壓中的任意兩個或三個之間(譬如由一控制器諸如下面討論的控制器1338控制)。諸多PD 1202及1302可以在實質相同的偏壓(譬如大約-5V、大約0V、大約+0.7V)下操作,這不是必須的(譬如當測試PDD 1300時,如下面更詳細地討論的)。可選地,PDD 1300的單個PS有時可以操作為PS 1200(從PDD 1300的一視場(FOV)檢測光),而有時操作為PS 1310(其檢測訊號輸出被用於決定對於該PDD的另一PS 1200的一VCCS的一控制電壓)。可選地,被用於檢測衝擊的光的“主動(active)”PS及參考PS的作用可以被交換。PDD 1300還包括一控制電壓產生電路(control-voltage generating circuitry)1340,該控制電壓產生電路1340至少包括放大器1318及與PDD 1300的多個PS的多個電連接。放大器1318具有至少兩個輸入:第一輸入1320及第二輸入1322。放大器1318的第一輸入1320被供應有一第一輸入電壓(VFI ),該第一輸入電壓可以由控制器(被實現在PDD 1300上、在一外部系統上或其組合)直接控制,或從該系統中的其它電壓被衍生(其轉而可以由該控制器控制)。放大器1318的第二輸入1322被連接到(參考PS 1310的)PD 1302的陰極。In some examples, reference additional circuitry 1306 may be omitted or disconnected so as not to affect the dark current determination. PD 1202 can be operated under any one of the following conditions: reverse bias, forward bias, zero bias, or selectively between any two or three of the above biases (for example, by a controller such as controller 1338 discussed below). PD 1302 can be operated under any of the following conditions: reverse bias, forward bias, zero bias, or selectively between any two or three of the above biases (for example, by a controller such as controller 1338 discussed below). It is not necessary that PDs 1202 and 1302 operate at substantially the same bias voltage (eg, about -5V, about 0V, about +0.7V) (such as when testing PDD 1300, as discussed in more detail below). Alternatively, a single PS of PDD 1300 may operate sometimes as PS 1200 (detecting light from a field of view (FOV) of PDD 1300) and sometimes as PS 1310 (whose detection signal output is used to determine A control voltage of a VCCS of another PS 1200). Alternatively, the roles of the "active" PS and the reference PS of the light used to detect the impact can be swapped. The PDD 1300 also includes a control-voltage generating circuit 1340 including at least an amplifier 1318 and a plurality of electrical connections to a plurality of PSs of the PDD 1300 . The amplifier 1318 has at least two inputs: a first input 1320 and a second input 1322 . A first input 1320 of amplifier 1318 is supplied with a first input voltage (V FI ), which may be directly controlled by a controller (implemented on PDD 1300, on an external system, or a combination thereof), or from Other voltages in the system are derived (which in turn can be controlled by the controller). A second input 1322 of amplifier 1318 is connected to the cathode of PD 1302 (referenced to PS 1310 ).

在一第一使用例示例中,PD 1202被保持在一第一電壓(也被稱為“陽極電壓(anode voltage)”,被標示為VA )與一第二電壓(也被稱為“陰極電壓(cathode voltage)”,被標示為VC )之間的一工作偏壓。該陽極電壓可以由該控制器(被實現在PDD 1300上、在一外部系統上或其組合)直接控制,或從該系統中的其它電壓被衍生(又可以由控制器控制)。陰極電壓可以由控制器直接控制(在PDD 1300上,在外部系統上或其組合實現),或從系統中的其它電壓被衍生(其轉而可以由該控制器控制)。該陽極電壓VA 及該陰極電壓VC 中的每個在時間上可以保持恒定或不保持恒定。例如:該陽極電壓VA 可以由一恒定源(譬如經由一焊盤,從一外部控制器)被提供。取決於該實現方案,該陰極電壓VC 可以是實質恒定的或隨時間變化的。例如:當將一3T結構使用於PS 1200時,譬如由於諸多附加構件1206的操作及/或來自PD 1202的電流,使得VC 隨時間變化。VC 可以可選地由諸多附加構件1206(而不是由該參考電路)決定/控制/影響。In a first use case example, the PD 1202 is maintained at a first voltage (also referred to as the "anode voltage", denoted V A ) and a second voltage (also referred to as the "cathode voltage"). Cathode voltage (cathode voltage), denoted as an operating bias between V C ). The anode voltage can be directly controlled by the controller (implemented on the PDD 1300, on an external system, or a combination thereof), or derived from other voltages in the system (which in turn can be controlled by the controller). The cathode voltage can be directly controlled by the controller (implemented on the PDD 1300, on an external system, or a combination thereof), or derived from other voltages in the system (which in turn can be controlled by the controller). Each of the anode voltage V A and the cathode voltage V C may or may not remain constant over time. For example: the anode voltage V A can be provided by a constant source (eg from an external controller via a pad). Depending on the implementation, the cathode voltage VC can be substantially constant or vary with time. For example, when a 3T structure is used in PS 1200 , V C changes over time, eg due to the operation of various additional components 1206 and/or current flow from PD 1202 . VC may optionally be determined/controlled/influenced by a number of additional components 1206 (rather than by the reference circuit).

VCCS 1204被用於提供(饋送)一電流到PD 1202的該陰極端,以抵消由PD 1202產生的暗電流。要被注意的是,在其它時間,VCCS 1204可以饋送其它電流,以實現其它目的(譬如用於校準或測試PDD 1300)。由VCCS 1204產生的該電流的該位準響應於放大器1318的一輸出電壓被控制。用於控制VCCS 1204的該控制電壓,被標示為VCTRL ,可以與放大器1318的一輸出電壓相同(如圖所示)。替代地,VCTRL 可以從放大器1318的該輸出電壓被衍生(譬如由於在放大器1318的該輸出與VCCS 1204之間的電阻或阻抗)。VCCS 1204 is used to provide (feed) a current to the cathode terminal of PD 1202 to counteract the dark current generated by PD 1202 . It is to be noted that at other times, VCCS 1204 may feed other currents for other purposes (such as for calibrating or testing PDD 1300). The level of the current generated by VCCS 1204 is controlled in response to an output voltage of amplifier 1318 . The control voltage used to control VCCS 1204 , denoted as V CTRL , may be the same as an output voltage of amplifier 1318 (as shown). Alternatively, V CTRL may be derived from the output voltage of amplifier 1318 (eg, due to a resistance or impedance between the output of amplifier 1318 and VCCS 1204 ).

為了抵消(或至少減少)PD 1202的該暗電流對PS 1200的該輸出訊號的影響,PDD 1300可以使PD 1302經受與PD 1202所承受的實質相同的偏壓。例如:當PD 1302與PD 1202實質相同時,讓PD 1302及PD 1202經受相同偏壓可以被使用。對兩個PD(1202及1302)供應相同偏壓的一種方法是對PD 1302的該陽極供應電壓VA (其中被供應的電壓被標示為VRPA ,RPA代表“參考PD陽極(reference PD anode)”),並且對PD 1302的該陰極供應電壓VC (其中被施加的電壓被標示為VRPC ,RPC代表“參考PD陰極(reference PD cathode)”)。供應相同偏壓的另一種方式是將VRPA =VA +ΔV供應給PD 1302的該陽極,將VRPC =VC +ΔV供應給PD 1302的該陰極。可選地,陽極電壓VA 、參考陽極電壓VRPA 或兩者可以由一外部電源(譬如經由PDD 1300所連接的一印刷電路板(PCB))提供。In order to counteract (or at least reduce) the effect of the dark current of PD 1202 on the output signal of PS 1200 , PDD 1300 may subject PD 1302 to substantially the same bias voltage as PD 1202 is subjected to. For example, when PD 1302 and PD 1202 are substantially identical, subjecting PD 1302 and PD 1202 to the same bias may be used. One way to supply the same bias to both PDs (1202 and 1302) is to supply the anode of PD 1302 with a voltage V A (where the supplied voltage is denoted V RPA , RPA stands for "reference PD anode") ”), and the cathode of the PD 1302 is supplied with a voltage V C (where the applied voltage is denoted as V RPC , RPC stands for “reference PD cathode”). Another way to supply the same bias voltage is to supply V RPA =V A +ΔV to the anode of PD 1302 and V RPC =V C +ΔV to the cathode of PD 1302 . Alternatively, the anode voltage V A , the reference anode voltage V RPA or both can be provided by an external power source (eg, via a printed circuit board (PCB) connected to the PDD 1300 ).

如上所述,放大器1318的第一輸入1320被供應有第一輸入電壓VFI 。放大器1318的第二輸入1322被連接到PD 1302的該陰極。放大器1318的操作減少它的兩個輸入(1320及1322)之間的電壓差,從而促使在第二輸入1322上的電壓趨向被供應給該第一輸入(VFI )的相同受控電壓。現在參考第3B圖,其中PD 1302上的該暗電流(在下文中被標示為DC參考)由一箭頭1352表示(所述如圖所示的電路與第3A圖的電路相同)。在PD 1202保持黑暗情況的那段時間期間,PD 1302上的電流等於PD 1202的暗電流。PDD 1300(或被連接到它或與它相鄰的任何系統構件)都可能阻擋光線到PD 1302,因此它保持處於黑暗。該阻擋可以通過物理屏障(譬如不透明屏障)、通過光學器件(譬如諸多轉向透鏡)、通過電子快門及諸如此類被進行。在下面的說明中,假設在PD 1302上的所有電流是由PD 1302產生的暗電流。替代地,如果PD 1302經受光(譬如在該系統中的諸多低級別的已知雜散光),則一電流源可以被實現以偏移已知的光起源訊號,或者該第一輸入電壓VFI 可以被修改以補償(至少部分地)用於雜散照明。旨在使光遠離PD 1302的該屏障、光學器件或其它專用構件可以在該晶圓級上實現(在製造PDD 1300的同一晶圓上),可以被連接到那個晶圓(譬如使用黏合劑),可以被剛性連接到其中安裝有該晶圓的一殼體,諸如此類。As mentioned above, the first input 1320 of the amplifier 1318 is supplied with the first input voltage V FI . A second input 1322 of amplifier 1318 is connected to the cathode of PD 1302 . Operation of the amplifier 1318 reduces the voltage difference between its two inputs (1320 and 1322), thereby forcing the voltage on the second input 1322 towards the same controlled voltage supplied to the first input ( VFI ). Referring now to FIG. 3B, where this dark current (hereinafter denoted as DC reference) on PD 1302 is represented by an arrow 1352 (the circuit shown is the same as that of FIG. 3A). During the time that PD 1202 remains in a dark condition, the current on PD 1302 is equal to the dark current of PD 1202 . PDD 1300 (or any system component connected to it or adjacent to it) may block light from reaching PD 1302, so it remains in the dark. The blocking can be done by physical barriers such as opaque barriers, by optics such as turning lenses, by electronic shutters, and the like. In the following description, it is assumed that all current on PD 1302 is dark current generated by PD 1302 . Alternatively, if the PD 1302 is subjected to light (such as many low levels of known stray light in the system), a current source can be implemented to offset the known light origin signal, or the first input voltage V FI Can be modified to compensate (at least partially) for stray lighting. The barriers, optics, or other specialized components intended to keep light away from the PD 1302 can be implemented at the wafer level (on the same wafer on which the PDD 1300 is fabricated), can be attached to that wafer (e.g. using adhesives) , may be rigidly attached to a housing in which the wafer is mounted, and so on.

假設VFI 是恒定的(或緩慢變化),則VCCS 1304的該輸出(由箭頭1354表示)必須在幅度上與PD 1302的該暗電流相等(DC參考),這意謂VCCS 1304為PD 1302的該暗電流消耗提供電荷載體,從而允許該電壓保持在VFI 。由於VCCS 1304的該輸出由響應於放大器1318的該輸出的VCTRL 控制,所以放大器1318被操作以輸出所需的輸出,使得VCTRL 將控制VCCS 1304的輸出,其在幅度上將與在PD 1302上的該暗電流相同。Assuming V FI is constant (or slowly varying), the output of VCCS 1304 (represented by arrow 1354) must be equal in magnitude to the dark current of PD 1302 (DC reference), which means that VCCS 1304 is the This dark current drain provides charge carriers, allowing the voltage to remain at VFI . Since this output of VCCS 1304 is controlled by V CTRL in response to this output of amplifier 1318, amplifier 1318 is operated to output the desired output such that V CTRL will control the output of VCCS 1304, which will be comparable in magnitude to that at PD 1302 This dark current on is the same.

如果PD 1202與PD 1302實質相同並且VCCS 1204與VCCS 1304實質相同,則放大器1318的該輸出還將致使VCCS 1204對PD 1202的該陰極提供相同級別的電流(DC參考)。在這樣的一情況下,為了使VCCS 1204的輸出抵消由PD 1202產生的該暗電流(在下文中被標示為DC主動PD),要求PD 1202及PD 1302兩者將產生一相似級別的暗電流。為了使兩個PD(1202及1302)經受相同偏壓(這將引起兩個PD產生實質相同級別的暗電流,因為兩個PD都維持在實質相同的條件譬如溫度),被提供到放大器1318的第一輸入的該電壓響應於PD 1202的該陽極電壓及該陰極電壓以及PD 1302的該陽極電壓被決定。例如:如果VA 等於VRPA ,則等於VC 的VFI 可以被提供到第一輸入1320。要被注意的是,VC 可以隨時間改變,並且不一定由一控制器決定(譬如VC 可以被決定為諸多附加構件1206的結果)。如果PD 1202與PD 1302不同及/或如果VCCS 1204與VCCS 1304不同,則放大器1318的該輸出可以通過匹配在放大器1318與VCCS 1204之間的諸多電氣構件(未被示出)被修改,以提供相關的控制電壓到VCCS 1204(譬如如果已知PD 1202上的暗電流與PD 1302上的暗電流線性相關,則放大器1318的該輸出可以根據線性相關被修改)。供應相同偏壓的另一種方法是將VRPA =VA +ΔV供應給PD 1302的該陽極,並且將VRPC =VC +ΔV供應給PD 1302的該陰極。If PD 1202 is substantially the same as PD 1302 and VCCS 1204 is substantially the same as VCCS 1304 , then the output of amplifier 1318 will also cause VCCS 1204 to provide the same level of current (DC reference) to the cathode of PD 1202 . In such a case, it is required that both PD 1202 and PD 1302 will generate a similar level of dark current in order for the output of VCCS 1204 to cancel the dark current generated by PD 1202 (hereinafter denoted as DC active PD). In order to subject both PDs (1202 and 1302) to the same bias voltage (which would cause both PDs to generate substantially the same level of dark current since both PDs are maintained at substantially the same conditions, such as temperature), the The voltage of the first input is determined in response to the anode voltage and the cathode voltage of PD 1202 and the anode voltage of PD 1302 . For example: if V A is equal to V RPA , then V FI equal to V C may be provided to the first input 1320 . It is to be noted that VC can change over time and is not necessarily determined by a controller (eg VC can be determined as a result of a number of additional components 1206). If PD 1202 is different from PD 1302 and/or if VCCS 1204 is different from VCCS 1304, this output of amplifier 1318 may be modified by matching electrical components (not shown) between amplifier 1318 and VCCS 1204 to provide Associated control voltage to VCCS 1204 (eg if dark current on PD 1202 is known to be linearly related to dark current on PD 1302, this output of amplifier 1318 can be modified according to the linear correlation). Another way to supply the same bias voltage is to supply V RPA =V A +ΔV to the anode of PD 1302 and V RPC =V C +ΔV to the cathode of PD 1302 .

第13C圖示出根據目前公開的主題的諸多示例的一光電檢測裝置1300’包括多個PS 1200。PDD 1300’包括PDD 1300的所有構件,以及諸多附加PS 1200。PDD 1300’的不同PS彼此實質相同(譬如全部是一個二維PDA的一部分),因此不同PS 1200的該諸多PD 1302彼此產生相似的暗電流。因此,相同控制電壓VCTRL 被供應給PDD 1300’的不同PS 1200的所有VCCS 1204,致使這些VCCS 1204抵消(或至少減少)由各個PD 1202產生的該暗電流的影響。以上關於PDD 1300討論的任何選項都可以被比照應用於PDD 1300’。FIG. 13C shows a photodetection device 1300 ′ comprising a plurality of PS 1200 according to examples of the presently disclosed subject matter. PDD 1300' includes all components of PDD 1300, plus many additional PS 1200s. The different PSs of the PDD 1300' are substantially identical to each other (eg, all are part of a two-dimensional PDA), so the plurality of PDs 1302 of the different PSs 1200 generate similar dark currents to each other. Therefore, the same control voltage V CTRL is supplied to all VCCS 1204 of different PS 1200 of PDD 1300 ′, causing these VCCS 1204 to cancel (or at least reduce) the effect of the dark current generated by each PD 1202 . Any of the options discussed above with respect to PDD 1300 may be applied mutatis mutandis to PDD 1300'.

在某些情況下(譬如如果VC 不是恒定的及/或未知的),可以提供一第一輸入電壓VFI (譬如通過一控制器),該第一輸入電壓VFI 被選擇以在PD 1302上引起與PD 1202類似的暗電流。In some cases (such as if V C is not constant and/or unknown), a first input voltage V FI may be provided (such as by a controller) that is selected to be used at the PD 1302 causes dark current similar to that of PD 1202.

現在參考第14圖,其示出根據目前公開的主題的諸多示例的一示例性PD I-V曲線1400。為了便於說明,曲線1400代表PD 1302及PD 1202兩者的I-V曲線,出於本說明的目的,它們被假定為實質相同,並且經受相同的陽極電壓(即,對於本說明而言,VA =VRPA )。I-V曲線1400在電壓1402與1404之間相對平坦,這意謂被供應給該相關的PD的1402與1404之間的不同偏壓將產出相似級別的暗電流。如果VC 在一陰極電壓範圍內變化,給定一已知VA ,則意謂在PD 1202上的該偏壓被限制在電壓1402與1404之間,然後供應一VRPC 會致使在PD 1302上的該偏壓也位於電壓1402與1404之間,將致使VCCS 1204輸出足夠類似於DC主動PD的一電流,即使PD 1202及PD 1302經受不同的偏壓。在這樣的一情況下,VRPC 可以在該陰極電壓範圍內(如等效電壓1414所示),也可以在其外部(但仍將PD 1302上的偏壓保持在1402與1404之間),如等效電壓1412所示範的。對其它配置的修改,諸如如上討論的那些,可以被比照實現。要被注意的是,由於其它原因,不同的偏壓也可以被供應給不同的PD 1202及1302。例如:不同的偏壓可以被供應作為該PDA的測試或校準的一部分。Referring now to FIG. 14 , an exemplary PD IV curve 1400 is shown in accordance with examples of the presently disclosed subject matter. For ease of illustration, curve 1400 represents the IV curves for both PD 1302 and PD 1202, which for purposes of this description are assumed to be substantially identical and to experience the same anode voltage (i.e., for this description, VA = VRPA ). IV curve 1400 is relatively flat between voltages 1402 and 1404, which means that different bias voltages supplied to the associated PD between 1402 and 1404 will produce similar levels of dark current. If V C varies over a range of cathode voltages, given a known V A , meaning that the bias voltage on PD 1202 is limited between voltages 1402 and 1404, then supplying a V RPC will cause This bias on V is also between voltages 1402 and 1404, will cause VCCS 1204 to output a current that is sufficiently similar to a DC active PD even though PD 1202 and PD 1302 are biased differently. In such a case, V RPC can be within the cathode voltage range (as shown by the equivalent voltage 1414) or outside it (but still maintain the bias voltage on the PD 1302 between 1402 and 1404), As exemplified by equivalent voltage 1412 . Modifications to other configurations, such as those discussed above, may be implemented mutatis mutandis. It is to be noted that different bias voltages may also be supplied to different PDs 1202 and 1302 for other reasons. For example: different bias voltages may be supplied as part of testing or calibration of the PDA.

在現實生活中,單個PDD的不同PS的不同PD(或其它構件)被製成非確切相同,並且這些PS的操作也非彼此確切相同。在一PD陣列中,諸多PD可能彼此有些不同,並且暗電流可能有所不同(譬如由於製造差異,溫度略有差異等)。In real life, different PDs (or other components) of different PSs of a single PDD are not made exactly identical, and the operation of these PSs is not exactly identical to each other. In a PD array, the PDs may be somewhat different from each other, and the dark current may be different (eg, due to manufacturing differences, slight temperature differences, etc.).

第15圖示出根據本發明的諸多示例的一控制電壓產生電路1340,該控制電壓產生電路1340被連接到多個參考感光位點1310(統稱為1500)。第15圖的電路(也被稱為參考電路1500)可被用於決定對於多個PDD 1300、1300’的對應一個或多個PS 1310的一個或多個VCCS 1204及在本發明中被討論的任何PDD變化的一控制電壓(被標示為VCTRL )。特別地,參考電路1500可以被用於基於從在一定程度上有所不同(譬如由於製造不準確、操作條件有所不同等引起的一結果)的多個參考PS 1310收集的資料以決定一控制電壓,用於抵消(或限制)一PDD的一個或多個PS 1200中的暗電流的影響。如前所述,諸多PD的暗電流即使相似,也可能彼此不同。要被注意的是,在某些PD技術中,意圖相同的諸多PD可能以諸多暗電流為特色,這些暗電流相差x1.5、x2、x4甚至更多的一因數。在本文被討論的該平均機制甚至允許補償這樣的顯著差異(譬如在製造方面)。在放大器1318被連接到多個參考PS 1310以平均幾個PS 1310的諸多級別的暗電流的情況下,將這樣的諸多PS 1310保持在黑暗中,譬如使用如上討論的任何機制。被供應給各種PS 1310的不同VCCS 1304的該諸多電壓被短路,使得所有VCCS 1304接收實質相同控制電壓。該不同參考PD 1302的該諸多陰極電壓被短路到不同的網絡。這樣,儘管在不同的參考PS 1310中的電流彼此略有不同(由於參考諸多PS 1310彼此稍有不同),但是被供應給各個PDD的一個或多個PS 1200(其也可以彼此間且與參考PS 1310略有不同)的該平均控制電壓是足夠精確的,以一足夠均勻的方式抵消暗電流對不同PS 1200的影響。可選地,單個放大器1318的該輸出電壓被供應給所有PS 1200及所有參考PS 1310。可選地,用於該PDD的該諸多被選擇的PD具有一平坦的I-V響應(如上所述,譬如關於第14圖),使得關於參考電路1500被討論的該平均控制電壓抵消在不同PS1200中的該暗電流到一非常好的程度。在第16A圖及第16B圖中提供諸多PDD的諸多非限制性示例,其包括多個參考PS 1310,其平均輸出訊號被用於修改多個主動PS 1200的該多個輸出訊號(例如以減少輸出訊號的暗電流的影響)。不同的配置、幾何形狀及數值比率可以在單個PDD的該多個參考PS 1310與該多個主動PS 1200之間被實現。例如:在包括以多個行及多個列被佈置的多個PS的一矩形光檢測陣列中,一整個行的諸多PS(譬如1,000個PS)或幾行或列的諸多PS可以被用作多個參考PS 1310(並且可選地被保持在黑暗中),而該陣列的其餘部分接收基於對那些參考PS行的輸出進行平均的該控制訊號。這種產生控制電流的方法通過消除該平均暗電流,僅留下PS對PS(PS-to-PS)的變化,從而大幅降低暗電流的影響。FIG. 15 shows a control voltage generation circuit 1340 connected to a plurality of reference photosensitive sites 1310 (collectively 1500 ) according to examples of the invention. The circuit of FIG. 15 (also referred to as reference circuit 1500) can be used to determine one or more VCCS 1204 for one or more PS 1310 for multiple PDDs 1300, 1300' and the one or more VCCS 1204 discussed in this disclosure. A control voltage (denoted V CTRL ) for any PDD change. In particular, the reference circuit 1500 can be used to determine a control based on data collected from multiple reference PS 1310 that differ to some extent (e.g., as a result of manufacturing inaccuracies, varying operating conditions, etc.) Voltage to counteract (or limit) the effect of dark current in one or more PS 1200 of a PDD. As mentioned earlier, the dark currents of many PDs can be different from each other even if they are similar. It is to be noted that in certain PD technologies, PDs of the same intent may feature dark currents that differ by a factor of x1.5, x2, x4 or even more. The averaging mechanism discussed here even allows compensating for such significant differences (eg in manufacturing). Where amplifier 1318 is connected to multiple reference PSs 1310 to average levels of dark current for several PSs 1310, such PSs 1310 are kept in the dark, such as using any of the mechanisms discussed above. The many voltages supplied to the different VCCS 1304 of the various PSs 1310 are shorted such that all VCCS 1304 receive substantially the same control voltage. The cathode voltages of the different reference PDs 1302 are shorted to different nets. Thus, although the currents in different reference PS 1310 are slightly different from each other (because the reference PS 1310 is slightly different from each other), the one or more PS 1200 supplied to each PDD (which can also be different from each other and from the reference PS 1310 is slightly different) and this average control voltage is accurate enough to counteract the effect of dark current on different PS 1200 in a sufficiently uniform manner. Optionally, this output voltage of a single amplifier 1318 is supplied to all PS 1200 and all reference PS 1310 . Optionally, the selected PDs for the PDD have a flat IV response (as described above, e.g. with respect to FIG. of this dark current to a very good degree. Non-limiting examples of PDDs are provided in FIGS. 16A and 16B , which include multiple reference PSs 1310 whose average output signal is used to modify the multiple output signals of multiple active PSs 1200 (e.g., to reduce the effect of dark current on the output signal). Different configurations, geometries, and numerical ratios can be implemented between the reference PSs 1310 and the active PSs 1200 of a single PDD. For example: in a rectangular photodetection array comprising multiple PSs arranged in multiple rows and multiple columns, a whole row of PSs (eg, 1,000 PSs) or a few rows or columns of PSs can be used as A number of reference PSs 1310 are (and optionally kept in the dark), while the rest of the array receives the control signal based on averaging the output of those reference PS rows. This method of generating a control current greatly reduces the effect of dark current by eliminating this average dark current, leaving only the PS-to-PS variation.

第16A圖及第16B圖示出根據本發明的主題的諸多示例的多個光電檢測裝置,該多個光電檢測裝置包括多個PS的一陣列及基於多個PD的參考電路。PDD 1600(第16A圖所示)及PDD 1600’(第16B圖所示,是PDD 1600的一種變體)包括PDD 1300的所有構件,以及多個附加PS 1200及PS 1310。可選地,PDD 1600(以及分別為PDD 1600’)的不同PS彼此實質相同。上面關於多個PDD 1300及1300’以及關於電路1500被討論的任何選項可以被比照應用於PDD 1600及1600’。16A and 16B illustrate photodetection devices including an array of PSs and PD-based reference circuits according to examples of the present inventive subject matter. PDD 1600 (shown in FIG. 16A ) and PDD 1600′ (shown in FIG. 16B , which is a variant of PDD 1600 ) include all components of PDD 1300 , plus multiple additional PS 1200 and PS 1310 . Optionally, the different PSs of PDD 1600 (and respectively PDD 1600') are substantially identical to each other. Any of the options discussed above with respect to the plurality of PDDs 1300 and 1300' and with respect to the circuit 1500 may be applied mutatis mutandis to the PDDs 1600 and 1600'.

第16A圖示出一光檢測器裝置1600,該光檢測器裝置1600包括一感光區域1602(其在光檢測器裝置1600的操作中暴露於外部光)、一區域1604,及控制電壓產生電路1340,該感光區域1602具備多個(陣列)PS 1200,該區域1604具備被保持在黑暗中(至少在參考電流測量中,可選地在所有時間)的多個參考PS 1310,該控制電壓產生電路1340還包括控制器1338。控制器1338可以控制放大器1318的操作、被供應給放大器1318的電壓及/或多個參考PS 1310的操作。可選地,控制器1338還可以控制多個PS 1200及/或PDD 1600的其它構件的諸多操作。控制器1338可以控制多個主動PS 1200及多個參考PS 1310兩者在相同的操作條件(譬如偏壓、曝光時間、管理讀出制度)下操作。要被注意的是,控制器1338的任何功能可以由一外部控制器(譬如在被安裝該PDD的一EO系統的另一個處理器上被實現,或由諸如被安裝該PDD的一自動駕駛汽車的一控制器的一輔助系統)實現。可選地,控制器1338可以被實現為一個或多個處理器,該一個或多個處理器與PDD 1600的其它構件(譬如多個PS 1200及1310、放大器1318)被製造在同一晶圓上。可選地,控制器1338可以被實現為一個或多個處理器,該一個或多個處理器位於被連接到這樣的一晶圓的一PCB上。其它合適的控制器也可以被實現為控制器1338。FIG. 16A shows a photodetector device 1600 comprising a photosensitive region 1602 (which is exposed to external light during operation of the photodetector device 1600), a region 1604, and control voltage generation circuit 1340. , the photosensitive area 1602 is provided with a plurality (array) of PS 1200, the area 1604 is provided with a plurality of reference PS 1310 kept in the dark (at least during reference current measurements, optionally at all times), the control voltage generating circuit 1340 also includes controller 1338 . The controller 1338 may control the operation of the amplifier 1318 , the voltage supplied to the amplifier 1318 and/or the operation of the plurality of reference PSs 1310 . Optionally, the controller 1338 may also control various operations of multiple PSs 1200 and/or other components of the PDD 1600 . The controller 1338 can control both the plurality of active PSs 1200 and the plurality of reference PSs 1310 to operate under the same operating conditions (eg, bias voltage, exposure time, managed readout regime). It is to be noted that any of the functions of the controller 1338 may be implemented by an external controller, such as on another processor of an EO system on which the PDD is installed, or by an automatic driving vehicle such as the PDD on which the PDD is installed. An auxiliary system of a controller) realizes. Optionally, controller 1338 may be implemented as one or more processors fabricated on the same wafer as other components of PDD 1600 (e.g., multiple PSs 1200 and 1310, amplifier 1318) . Alternatively, controller 1338 may be implemented as one or more processors located on a PCB connected to such a die. Other suitable controllers may also be implemented as controller 1338 .

第16B圖示出根據目前公開的主題的諸多示例的一光電檢測器裝置1600’。光電檢測器裝置1600’類似於裝置1600,但是具備諸多構件以一不同的幾何形狀被佈置並且未示出諸多不同PS的內部細節。還被圖解說明的是讀出電路1610,該讀出電路1610被用於從多個PS 1200讀取該多個檢測訊號並提供它們以用於進一步處理(譬如以減少雜訊、用於影像處理),用於儲存或用於任何其它用途。例如:讀出電路1610可以順序地暫時排列不同PS 1200的該讀出值(可能在該PDD的一個或多個處理器的一些處理後,未被示出),在提供它們用於進一步處理、儲存或任何其它動作前。可選地,讀出電路1610可以被實現為一個或多個單元,該一個或多個單元與PDD 1600的其它構件(譬如多個PS 1200及1310、放大器1318)被製造在同一晶圓上。可選地,讀出電路1610可以被實現為連接到這種晶圓的PCB上的一個或多個單元。其它合適的讀出電路也可以被實現為讀出電路1610。要被注意的是,諸如讀出電路1610之類的一讀出電路可以在本發明中被討論的任何光電檢測裝置中被實現(譬如多個PDD 1300、1700、1800及1900)。在該訊號的一可選的數位化以前,對於類比訊號處理的諸多示例可以在該PDD中被執行(譬如通過讀出電路1610或相應PDD的一個或多個處理器),包括:修改增益(放大)、偏移及合併(結合來自兩個或更多PS的多個輸出訊號)。該讀出資料的數位化可以在該PDD上或其外部被實現。Figure 16B shows a photodetector device 1600' according to examples of the presently disclosed subject matter. Photodetector device 1600' is similar to device 1600, but has components arranged in a different geometry and internal details of the different PSs are not shown. Also illustrated is readout circuitry 1610, which is used to read the plurality of detection signals from the plurality of PSs 1200 and provide them for further processing (e.g., to reduce noise, for image processing ), for storage or for any other purpose. For example: readout circuitry 1610 may sequentially and temporarily arrange the readout values of different PS 1200 (possibly after some processing by one or more processors of the PDD, not shown), before providing them for further processing, before saving or any other action. Optionally, readout circuitry 1610 may be implemented as one or more units fabricated on the same wafer as other components of PDD 1600 (eg, multiple PSs 1200 and 1310 , amplifier 1318 ). Optionally, readout circuitry 1610 may be implemented as one or more units connected to the PCB of such a wafer. Other suitable readout circuits may also be implemented as readout circuit 1610 . It is to be noted that a readout circuit such as readout circuit 1610 may be implemented in any of the photodetection devices discussed in this disclosure (eg, PDDs 1300, 1700, 1800, and 1900). Prior to an optional digitization of the signal, numerous examples of analog signal processing can be performed in the PDD (e.g., by the readout circuit 1610 or one or more processors of the corresponding PDD), including: modifying the gain ( Amplify), offset and merge (combine multiple output signals from two or more PSs). Digitization of the read data can be performed on the PDD or externally.

可選地,PDD 1600(或本發明中被公開的任何其它PDD)可以包括:一採樣電路,該採樣電路用於採樣放大器1318的該輸出電壓及/或該控制電壓VCTRL (如果不同),並且用以在至少一指定的最短時間段保持該電壓位準。這樣的採樣電路可以位於放大器1318的輸出與至少一個VCCS 1204中的一者或多者之間的任何位置(譬如在位置1620處)。任何合適的採樣電路可以被使用;例如:在某些情況下,示範性電路可以包括:多個“採樣且保持(sample and hold)”開關。可選地,採樣電路可以僅在某些時間被使用,而在其它時間執行該控制電壓的直接實時讀出。例如:當在該系統中的諸多暗電流的諸多幅度緩慢變化,當僅在部分時間使PS 1310被遮光時,使用一採樣電路可能是有用的。Optionally, PDD 1600 (or any other PDD disclosed in this invention) may include: a sampling circuit for sampling the output voltage of amplifier 1318 and/or the control voltage V CTRL (if different), And to maintain the voltage level for at least a specified minimum time period. Such sampling circuitry may be located anywhere between the output of the amplifier 1318 and one or more of the at least one VCCS 1204 (such as at location 1620). Any suitable sampling circuitry may be used; for example, in some cases, exemplary circuitry may include multiple "sample and hold" switches. Alternatively, the sampling circuit may only be used at certain times, while performing a direct real-time readout of the control voltage at other times. For example, when the magnitudes of dark currents in the system vary slowly, it may be useful to use a sampling circuit when the PS 1310 is only shaded part of the time.

第17圖及第18圖示出根據目前公開的主題的諸多示例的更多的光電檢測裝置。在如上所述的光電檢測裝置(譬如1300、1300’、1600、1600’)中,一電壓控制電流源被用於該多個主動PS 1200及該多個參考PS 1310。一電流源是可以在該被公開的PDD中被使用的一電壓控制電流電路的一個示例。可以被使用的另一種類型的電壓控制電流電路是電壓控制電流汲取器(voltage-controlled current-sink),其吸收的電流在幅度上由供應給它的控制電壓控制。例如:一電流吸收器可以被使用,其中該多個PD(1202、1302)上的該偏壓在方向上與以上示範的該偏壓相反。更一般地,每當一電壓控制電流源(1204、1304)被討論如上時,此構件可以由一電壓控制電流汲取器(分別被標示為1704及1714)替換。要被注意的是,使用一電流吸收器代替一電流源可能需要在該相應的PDD的其它部分中使用不同類型的構件或電路。例如:與多個VCCS 1204及1304一起被使用的一放大器1318在功率、尺寸等方面不同於與多個電壓控制電流汲取器1704及1714一起被使用的放大器1718。為了區分包括多個電壓控制電流汲取器而不是多個VCCS的多個PS,多個標號1200’及1310’對應於如上討論的多個PS 1200及1300。Figures 17 and 18 illustrate further photodetection devices according to examples of the presently disclosed subject matter. In a photodetection device as described above (eg, 1300, 1300', 1600, 1600'), a voltage-controlled current source is used for the plurality of active PSs 1200 and the plurality of reference PSs 1310. A current source is one example of a voltage controlled current circuit that may be used in the disclosed PDD. Another type of voltage-controlled current circuit that can be used is a voltage-controlled current-sink whose current sink is controlled in magnitude by the control voltage supplied to it. For example: a current sink can be used where the bias voltage on the plurality of PDs (1202, 1302) is opposite in direction to the bias voltage exemplified above. More generally, whenever a voltage controlled current source (1204, 1304) is discussed above, this component may be replaced by a voltage controlled current sink (designated 1704 and 1714, respectively). It is to be noted that using a current sink instead of a current source may require the use of different types of components or circuits in other parts of the corresponding PDD. For example, an amplifier 1318 used with VCCS 1204 and 1304 is different from amplifier 1718 used with voltage controlled current sinks 1704 and 1714 in terms of power, size, etc. To distinguish multiple PSs that include multiple voltage-controlled current sinks instead of multiple VCCSs, reference numerals 1200' and 1310' correspond to PSs 1200 and 1300 as discussed above.

在第17圖中,一PDD 1700包括多個電壓控制電流電路,該多個電壓控制電流電路為多個電壓控制電流汲取器(在PS 1200’及PS 1310’兩者中),並且一合適的放大器1718被使用以代替放大器1318。如上討論的有關諸多電流源的所有變體同樣適用於諸多電流吸收器。In Figure 17, a PDD 1700 includes voltage-controlled current circuits that are voltage-controlled current drawers (in both PS 1200' and PS 1310'), and a suitable Amplifier 1718 is used instead of amplifier 1318 . All the variations discussed above for current sources apply equally to current sinks.

在第18圖中,一PDD 1800包括兩種類型的電壓控制電流電路,電壓控制電流源1204及1314以及電壓控制電流汲取器1704及1714,以及匹配的放大器1318及1718。這可以允許例如以正向或反向偏壓來操作PDD 1800的該多個PD。至少一個開關(或其它選擇機制)可以被使用以選擇哪個參考電路被啟用/停用,該一個基於多個VCCS或該一個基於多個電壓控制電流汲取器的參考電路。這樣的選擇機制可以被實現為例如防止兩個反饋調節器彼此“對抗(against)”工作(譬如如果在PD上以接近零的偏壓工作)。如上關於任何先前討論的多個PDD(譬如1300、1300’、1600、1600’)討論的任何選項、解釋或變化可以比照應用於多個PDD 1700及1800。特別地,多個PDD 1700及1800可以包括:多個PS 1200’及/或多個參考PS 1310’,類似於如上的討論(譬如關於第15、16A及16B圖)。In FIG. 18, a PDD 1800 includes two types of voltage-controlled current circuits, voltage-controlled current sources 1204 and 1314 and voltage-controlled current sinks 1704 and 1714, and matching amplifiers 1318 and 1718. This may allow the plurality of PDs of PDD 1800 to be operated, for example, with forward or reverse bias. At least one switch (or other selection mechanism) may be used to select which reference circuit is enabled/disabled, the one based on multiple VCCS or the one based on multiple voltage control current sink reference circuits. Such a selection mechanism may be implemented, for example, to prevent two feedback regulators from operating "against" each other (eg if operating with near zero bias on the PD). Any options, interpretations or variations discussed above with respect to any of the previously discussed PDDs (eg, 1300, 1300', 1600, 1600') may apply mutatis mutandis to PDDs 1700 and 1800. In particular, the plurality of PDDs 1700 and 1800 may include the plurality of PSs 1200' and/or the plurality of reference PSs 1310', similar to those discussed above (eg, with respect to Figures 15, 16A and 16B).

要被注意的是,在以上討論的多個任何光電檢測裝置中,一個或多個該PS(譬如一光電檢測陣列的PS)可以可選地可控制以選擇性地作為一參考PS 1310(譬如有時)或作為一常規PS 1200(譬如其它時間)。這樣的PS可能包括以兩種角色進行操作所需的電路。例如:如果在不同類型的電光系統中使用相同的PDD,則可以使用它。例如:一個系統可能需要在1,000與4,000個參考PS 1310之間進行精度的平均,而另一系統可能需要一較低的精度,這可以通過在1與1200個參考PS 1310之間進行平均被實現。在另一個示例中,如上所述,當整個PDA被變暗並被儲存在一採樣保持電路中時,基於一些(甚至全部)PS的控制電壓的平均可以被執行,並且所有PS可以被使用在一個或多個後續幀中使用該被決定的控制電壓對FOV資料進行檢測。It is to be noted that, in any of the photodetection devices discussed above, one or more of the PS (such as the PS of a photodetection array) may optionally be controllable to selectively act as a reference PS 1310 (such as sometimes) or as a regular PS 1200 (such as other times). Such a PS may include the circuitry required to operate in both roles. For example: It can be used if the same PDD is used in different types of electro-optical systems. Example: One system may require averaging of accuracy between 1,000 and 4,000 reference PS 1310, while another system may require a lower accuracy, which can be achieved by averaging between 1 and 1200 reference PS 1310 . In another example, as described above, when the entire PDA is dimmed and stored in a sample-and-hold circuit, averaging based on the control voltages of some (or even all) PSs can be performed, and all PSs can be used in The determined control voltage is used to detect FOV data in one or more subsequent frames.

要被注意的是,在如上討論中,為了簡單起見,假設各個PDA上所有PD的該陽極側被連接到一已知(並且可能是受控的)電壓,及該多個檢測訊號以及多個VCCS的連接,並且多個附加電路被實施在該陰極側。要被注意的是,可選地,該多個PD 1202及1302可以比照以相反的方式被連接(其中該讀出位於該陽極側,依此類推)。It is to be noted that in the above discussion, for the sake of simplicity, it is assumed that the anode side of all PDs on each PDA is connected to a known (and possibly controlled) voltage, and that the plurality of detection signals and the plurality of connection of a VCCS, and additional circuitry is implemented on the cathode side. It is to be noted that, alternatively, the plurality of PDs 1202 and 1302 may instead be connected in the opposite manner (with the readout on the anode side, and so on).

參考如上討論的所有PDD(譬如1300、1600、1700、1800),要被注意的是,該多個PS、該讀出電路、該參考電路及其它上述構件(以及可能需要的任何附加構件)可以被實現在單個晶圓上或在一個以上晶圓上、一個或多個PCB上或被連接到該多個PS的另一種合適類型的電路上,諸如此類。With reference to all of the PDDs discussed above (e.g., 1300, 1600, 1700, 1800), it is to be noted that the plurality of PSs, the readout circuitry, the reference circuitry, and other aforementioned components (and any additional components that may be required) may be implemented on a single wafer or on more than one wafer, on one or more PCBs or another suitable type of circuitry connected to the multiple PSs, or the like.

第19圖以圖解說明根據目前公開的主題的諸多示例的一PDD 1900。PDD 1900可以實現來自如上所述的一個或多個PDD的特徵的任意組合,並且進一步包括多個附加構件。例如:PDD 1900可以包括:以下任何一個或多個構件: a.        至少一個光源1902,可操作以將光發射到PDD 1900的該FOV上。光源1902的一些光從該FOV中的物體被反射,並被感光區域1602中的多個PS 1200擷取(其在光電探測器裝置1900的操作過程中暴露於外部光),並被用於產生一影像或該多個物體的其它模型。任何合適類型的光源(譬如脈衝的、連續的、調變的LED、雷射器)可以被使用。可選地,光源1902的操作可以由一控制器(譬如控制器1338)控制。 b.        一物理屏障1904用於將該檢測器陣列的區域1604保持在黑暗中。物理屏障1904可以是該檢測器陣列的一部分或在其外部。物理屏障1904可以是固定的或可移動的(譬如一移動的快門)。要被注意的是,其它類型的變暗機制也可以被使用。可選地,物理屏障1904(或其它變暗機制)可在不同時間使該檢測陣列的不同部分變暗。可選地,屏障1904的操作,如果可改變,可以由一控制器(譬如控制器1338)控制。 c.        被忽略的感光位點1906。要被注意的是,並非該PDA的所有PS都必須被用於檢測(多個PS 1200)或用作參考(多個PS 1310)。例如:一些PS可能位於未完全變暗且未完全點亮的一區域中,因此在該影像的產生(或響應於多個PS 1200的該多個檢測訊號而被產生的其它類型的輸出)中被忽略。可選地,PDD 1900可以在不同時間忽略不同的PS。 d.        至少一個處理器1908,用於處理多個PS 1200輸出的該多個檢測訊號。這樣的處理可以包括:例如訊號處理、影像處理、光譜分析等。可選地,處理器1908的諸多處理結果可以被用於修改控制器1338(或另一個控制器)的操作。可選地,控制器1338及處理器1908可以被實現為單個處理單元。可選地,處理器1908的處理結果可以被提供給以下的任何一個或多個:一有形記憶體模組1910,用於諸多外部系統(譬如一遠端伺服器或被安裝PDD 1900的一車輛的一車輛電腦),譬如經由一通訊模組1912、用於顯示影像或其它類型的結果(譬如圖形,光譜儀的文本結果)的一顯示器1914、另一種類型的輸出介面(譬如一揚聲器,未被示出),依此類推。要被注意的是,可選地,來自多個PS 1310的多個訊號也可以由處理器1908處理,例如以評估PDD 1900的一條件(譬如可操作性、溫度)。 e.        一記憶體模組(memory module)1910,用於儲存由該多個主動PS或由讀出電路1610(譬如如果不同)輸出的多個檢測訊號中的至少一個,以及由處理器1908通過處理該多個檢測訊號而產生的檢測資訊。 f.         電源1916(譬如電池、交流電(AC)力適配器、直流電(DC)力適配器)。該電源可以對該多個PS、該放大器或該PDD的任何其它構件提供電力。 g.        一硬殼(hard casing)1918(或任何其它類型的結構支撐)。 h.        光學器件1920,用於將光源1902的光(如果被實現)引導到該FOV及/或用於將來自該FOV的光引導到該多個主動PS 1200。這樣的光學器件可以包括:例如諸多透鏡、諸多鏡(固定的或可移動的)、諸多棱鏡、諸多濾光片,諸如此類。FIG. 19 illustrates a PDD 1900 according to examples of the presently disclosed subject matter. PDD 1900 may implement any combination of features from one or more PDDs described above, and further include a number of additional components. For example: PDD 1900 may include: any one or more of the following components: a. At least one light source 1902 operable to emit light onto the FOV of the PDD 1900. Some light from light source 1902 is reflected from objects in the FOV and picked up by PSs 1200 in photosensitive area 1602 (which are exposed to external light during operation of photodetector device 1900) and used to generate An image or other model of the plurality of objects. Any suitable type of light source (eg pulsed, continuous, modulated LEDs, lasers) may be used. Optionally, operation of light source 1902 may be controlled by a controller, such as controller 1338 . b. A physical barrier 1904 is used to keep the region 1604 of the detector array in darkness. Physical barrier 1904 may be part of or external to the detector array. Physical barrier 1904 may be fixed or movable (such as a moving shutter). It is to be noted that other types of dimming mechanisms may also be used. Optionally, physical barrier 1904 (or other dimming mechanism) may darken different portions of the detection array at different times. Optionally, the operation of barrier 1904, if variable, may be controlled by a controller, such as controller 1338. c. Neglected photosensitive site 1906. It is to be noted that not all PSs of the PDA have to be used for detection (PS 1200) or as reference (PS 1310). For example: some PSs may be located in an area that is not fully dimmed and not fully lit, and thus in the generation of the image (or other type of output that is produced in response to the detection signals of the PSs 1200) be ignored. Optionally, PDD 1900 can ignore different PSs at different times. d. At least one processor 1908 for processing the plurality of detection signals output by the plurality of PS 1200. Such processing may include, for example, signal processing, image processing, spectral analysis, and the like. Optionally, the results of the processing by processor 1908 may be used to modify the operation of controller 1338 (or another controller). Alternatively, controller 1338 and processor 1908 may be implemented as a single processing unit. Optionally, the processing results of the processor 1908 may be provided to any one or more of the following: a tangible memory module 1910 for external systems (such as a remote server or a vehicle in which the PDD 1900 is installed a vehicle computer) such as via a communication module 1912, a display 1914 for displaying images or other types of results (e.g. graphs, text results from a spectrometer), another type of output interface (e.g. a speaker, not shown), and so on. It is to be noted that optionally the signals from the PSs 1310 can also be processed by the processor 1908 , eg to evaluate a condition of the PDD 1900 (eg operability, temperature). e. a memory module (memory module) 1910 for storing at least one of a plurality of detection signals output by the plurality of active PSs or by the readout circuit 1610 (for example, if different), and passed by the processor 1908 Detection information generated by processing the plurality of detection signals. f. Power source 1916 (eg, battery, alternating current (AC) power adapter, direct current (DC) power adapter). The power supply may provide power to the PSs, the amplifier, or any other component of the PDD. g. A hard casing (or any other type of structural support) 1918. h. Optics 1920 for directing light from light source 1902 (if implemented) to the FOV and/or for directing light from the FOV to the plurality of active PSs 1200. Such optics may include, for example, lenses, mirrors (fixed or movable), prisms, filters, and the like.

如上所述,如上所述的多個PDD可被用於匹配該控制電壓,該控制電壓決定由該至少一個第一電壓控制電流電路(VCCC)1204提供的該電流級別,以負責該PDD的操作條件的差異,該差異改變由該至少一個PD 1202產生的暗電流的該多個級別的變化。例如:對於包括多個PS 1200及多個PS 1320的一PDD:當該PDD在一第一溫度下操作時,控制電壓產生電路1340響應於該多個參考PD 1302的暗電流,向該電壓控制電流電路提供一控制電壓,用以在一第一溫度下提供處於一第一級別的一電流,以減少該主動PD 1202的諸多暗電流對多個主動PS 1200的輸出的影響;以及當該PDD在一第二溫度(高於該第一溫度)下操作時,控制電壓產生電路1340響應於該多個參考PD 1302的暗電流,向該電壓控制電流電路提供一控制電壓,用於提供處於一第二位準的一電流,以減少該多個主動PD 1202的暗電流對多個主動PS 1200的輸出的影響,使得該第二位準在幅度上大於該第一位準。As mentioned above, a plurality of PDDs as described above can be used to match the control voltage that determines the current level provided by the at least one first voltage controlled current circuit (VCCC) 1204 responsible for the operation of the PDD A difference in conditions that changes the plurality of levels of dark current produced by the at least one PD 1202. For example: for a PDD including multiple PSs 1200 and multiple PSs 1320: when the PDD is operating at a first temperature, the control voltage generation circuit 1340 responds to the dark current of the multiple reference PDs 1302 to the voltage control the current circuit provides a control voltage for providing a current at a first level at a first temperature to reduce the influence of dark currents of the active PD 1202 on the outputs of the active PS 1200; and when the PDD When operating at a second temperature (higher than the first temperature), the control voltage generation circuit 1340 provides a control voltage to the voltage control current circuit responsive to the dark current of the plurality of reference PDs 1302 for providing a control voltage at a A current at a second level to reduce the influence of the dark current of the active PDs 1202 on the outputs of the active PSs 1200, so that the second level is greater in magnitude than the first level.

第20圖是根據本發明的主題的諸多示例的用於補償在一光電檢測器中的暗電流的方法2000的一流程圖。方法2000在一PDD中被執行,該PDD至少包括:(a) 多個主動PS,每個主動PS包括至少一個主動PD;(b) 至少一個參考PS,包括一參考PD;(c) 至少一個第一VCCC,被連接到一個或多個主動PD;(d) 至少一個參考VCCC,被連接到一個或多個參考PD;及(e) 一控制電壓產生電路,被連接到該主動VCCC及該參考VCCC。例如:方法2000可以被執行在多個PDD 1300’、1600、1600’、1700及1800(後兩個在多個實現方案中包括多個主動PS)中的任何一個中。要被注意的是,方法2000可以包括:執行以上關於各種前述PDD的任何構件被討論的任何動作或功能。FIG. 20 is a flowchart of a method 2000 for compensating for dark current in a photodetector, according to examples of the inventive subject matter. The method 2000 is executed in a PDD, and the PDD includes at least: (a) multiple active PSs, each active PS includes at least one active PD; (b) at least one reference PS, including a reference PD; (c) at least one a first VCCC connected to one or more active PDs; (d) at least one reference VCCC connected to one or more reference PDs; and (e) a control voltage generation circuit connected to the active VCCC and the Refer to VCCC. For example: method 2000 may be performed in any one of multiple PDDs 1300', 1600, 1600', 1700, and 1800 (the latter two include multiple active PSs in various implementations). It is to be noted that method 2000 may include performing any of the actions or functions discussed above with respect to any component of the various aforementioned PDDs.

方法2000至少包括多個階段(多個階段)2010及1020。階段2010包括:基於該至少一個參考PD中的暗電流的一級別,產生一控制電壓,當該控制電壓被提供給該至少一個參考VCCC時,致使該至少一個參考VCCC產生一電流,該電流減少該參考PD的暗電流對該參考PS的一輸出的一影響。階段2020包括向該至少一個第一VCCC提供該控制電壓,從而致使該至少一個第一VCCC產生一電流,該電流減少該多個主動PD的暗電流對該多個主動PS的多個輸出的一影響。VCCC代表“電壓控制電流電路(Voltage Controlled Current Circuit)”,並且它可被實現為一電壓控制電流源(voltage-controlled current source)或一電壓控制電流汲取器(voltage-controlled current sink)。The method 2000 includes at least a plurality of phase(s) 2010 and 1020 . Stage 2010 includes: based on a level of dark current in the at least one reference PD, generating a control voltage that, when provided to the at least one reference VCCC, causes the at least one reference VCCC to generate a current that decreases An effect of the dark current of the reference PD on an output of the reference PS. Stage 2020 includes providing the control voltage to the at least one first VCCC, thereby causing the at least one first VCCC to generate a current that reduces a dark current of the plurality of active PDs to a plurality of outputs of the plurality of active PSs. Influence. VCCC stands for "Voltage Controlled Current Circuit", and it can be implemented as a voltage-controlled current source or a voltage-controlled current sink.

可選地,階段2010使用一放大器被實現,該放大器為該控制電壓產生電路的一部分。在這樣的一情況下,階段2010包括當該放大器的一第二輸入被電連接在該參考PD與該參考電壓控制電流電路之間時,供應一第一輸入電壓到該放大器的一第一輸入。該放大器可被用於連續減少在該參考電壓控制電路的一輸出與該第一輸入電壓之間的一差異,從而產生該控制電壓。可選地,該(多個)第一VCCC及該(多個)參考VCCC兩者被連接到該放大器的一輸出。Optionally, stage 2010 is implemented using an amplifier that is part of the control voltage generation circuit. In such a case, stage 2010 comprises supplying a first input voltage to a first input of the amplifier when a second input of the amplifier is electrically connected between the reference PD and the reference voltage controlled current circuit . The amplifier can be used to continuously reduce a difference between an output of the reference voltage control circuit and the first input voltage to generate the control voltage. Optionally, both the first VCCC(s) and the reference VCCC(s) are connected to an output of the amplifier.

在該PDD包括產生不同級別的暗電流的多個不同參考PD的情況下,階段2010可以包括:基於該多個參考PD的不同暗電流的平均以產生單個控制電壓。Where the PDD includes a plurality of different reference PDs producing different levels of dark current, stage 2010 may include generating a single control voltage based on averaging of the different dark currents of the plurality of reference PDs.

方法2000可以包括:防止來自該PDD的一視野的光到達該多個參考PD(譬如使用一物理屏障或轉向光學器件)。Method 2000 may include preventing light from a field of view of the PDD from reaching the reference PDs (eg, using a physical barrier or turning optics).

方法2000可以包括:在降低該暗電流的諸多影響後採樣該多個主動PS的多個輸出,並且基於該多個被採樣的輸出以產生一影像。Method 2000 may include sampling outputs of the active PSs after reducing effects of the dark current, and generating an image based on the sampled outputs.

第21圖是示出根據本發明的主題的諸多示例的用於補償一光電檢測裝置中的暗電流的方法1020的一流程圖。方法1020具有兩個階段,該兩個階段在不同溫度制度中被執行;當該PDD在一第一溫度(T1)操作時,一第一階段群組(1110至1116)被執行,並且當該PDD在高於該第一溫度的一第二溫度(T2)操作時,一第二階段群組(1120至1126)被執行。該第一溫度及該第二溫度在不同的實現方案中或在方法1200的不同實例中的程度可以不同。例如:該溫度差可以為至少5℃;至少10°C;至少20°C;至少40°C;至少100°C,依此類推。尤其是,方法1020在甚至更小的諸多溫度差(譬如小於1℃)可能是有效的。要被注意的是,該第一溫度及該第二溫度中的每個可以被實現為一溫度範圍(譬如跨越0.1℃;1℃;5℃或更高)。在該第二溫度範圍內的任何溫度高於該第一溫度範圍內的任何溫度(譬如根據前面提到的該多個範圍)。方法2000可以可選地在以上討論的任何PDD中被執行(1300、1600等)。要被注意的是,方法1020可以包括:關於各種前述PDD的任何構件執行以上討論的任何動作或功能,並且方法1020的該PDD可以包括:以上關於前述多個PDD中的任何一者或多者被討論的該多個構件中的一者或多者的任何組合。FIG. 21 is a flowchart illustrating a method 1020 for compensating dark current in a photodetection device according to examples of the inventive subject matter. Method 1020 has two phases that are performed in different temperature regimes; a first group of phases (1110 to 1116) are performed when the PDD is operating at a first temperature (T1), and when the When the PDD is operating at a second temperature (T2) higher than the first temperature, a second group of stages (1120-1126) are performed. The extent of the first temperature and the second temperature may vary in different implementations or in different instances of method 1200 . For example: the temperature difference may be at least 5°C; at least 10°C; at least 20°C; at least 40°C; at least 100°C, and so on. In particular, method 1020 may be effective at even smaller temperature differences (eg, less than 1° C.). It is to be noted that each of the first temperature and the second temperature may be implemented as a temperature range (eg spanning 0.1° C.; 1° C.; 5° C. or more). Any temperature within the second temperature range is higher than any temperature within the first temperature range (eg according to the aforementioned ranges). Method 2000 may optionally be performed (1300, 1600, etc.) in any of the PDDs discussed above. It is to be noted that method 1020 may include performing any of the actions or functions discussed above with respect to any component of the various aforementioned PDDs, and that the PDD of method 1020 may include: Any combination of one or more of the plurality of components in question.

參考當該PDD在該第一溫度(其可以是一第一溫度範圍)操作時被執行的多個階段:階段2110包括基於該PDD的至少一個參考PD的暗電流決定一第一控制電壓。階段2112包括提供該第一控制電壓到一第一VCCC,該第一VCCC被耦合到該PDD的一主動PS的至少一個主動PD,從而致使該第一VCCC在該主動PS中施加一第一暗電流抵制電流(impose a first dark-current countering current)。步驟2114包括由該主動PD產生一第一檢測電流,以響應於:(a)源於該PDD的一視場中的一物體的衝擊該主動PD的光,以及(b) 由該主動PD產生的暗電流。階段2116包括響應於第一檢測電流及第一暗電流抵制電流,由該主動PS輸出一第一檢測訊號,該第一檢測訊號在幅度上小於該第一檢測電流,從而補償暗電流對該第一檢測訊號的影響。方法1020還可包括可選階段2118,基於來自該PDD的多個PS(以及可選地為全部)的多個第一檢測訊號以產生該PDD的一FOV的至少一個第一影像。當該PDD處於該第一溫度或在一隨後的階段時,階段2118可以被執行。Referring to the stages performed when the PDD operates at the first temperature (which may be a first temperature range): Stage 2110 includes determining a first control voltage based on the dark current of at least one reference PD of the PDD. Stage 2112 includes providing the first control voltage to a first VCCC coupled to at least one active PD of an active PS of the PDD, thereby causing the first VCCC to apply a first dark voltage in the active PS. The current resists the current (impose a first dark-current countering current). Step 2114 includes generating a first sense current by the active PD in response to: (a) light striking the active PD originating from an object in a field of view of the PDD, and (b) generated by the active PD the dark current. Stage 2116 includes outputting a first detection signal from the active PS in response to the first detection current and the first dark current rejection current, the first detection signal being smaller in magnitude than the first detection current, thereby compensating for the dark current against the first detection current. 1. The influence of detection signal. Method 1020 may also include an optional stage 2118 of generating at least a first image of a FOV of the PDD based on first detection signals from PSs (and optionally all) of the PDD. Stage 2118 may be performed while the PDD is at the first temperature or at a subsequent stage.

參考當該PDD在該第二溫度(其可以是一第二溫度範圍)中操作時被執行的多個階段:階段2120包括基於該PDD的至少一個參考PD的暗電流以決定一第二控制電壓。步驟2122包括將該第二控制電壓提供給該第一VCCC,從而致使該第一VCCC在該主動PS中施加一第二暗電流抵制電流;階段2124包括由該主動PD產生一第二檢測電流,以響應於:(a) 源於該物體的該主動PD的光衝擊,以及(b) 由該主動PD產生的暗電流。階段2126包括響應於該第二檢測電流及該第二暗電流抵制電流,由該主動PS輸出幅度小於該第二檢測電流的一第二檢測訊號,從而補償暗電流對該第二檢測訊號的影響。該第二暗電流抵制電流的一幅度大於該第一暗電流抵制電流的一幅度,並且可能通過大於一個的任何比率。例如:該比率可以是以至少兩倍或顯著更高(譬如以一個、兩個、三個(或更多)幅度的數量級)的一因數。方法1020還可包括可選階段2128,基於來自該PDD的多個PS(以及可選地為全部)的多個第二檢測訊號以產生該PDD的一FOV的至少一個第二影像。當該PDD處於該第二溫度或在隨後的階段時,階段2128可以被執行。Referring to the stages performed when the PDD is operating in the second temperature (which may be a second temperature range): Stage 2120 includes determining a second control voltage based on the dark current of at least one reference PD of the PDD . Step 2122 includes providing the second control voltage to the first VCCC, thereby causing the first VCCC to apply a second dark current suppression current in the active PS; stage 2124 includes generating a second detection current by the active PD, In response to: (a) the light impact of the active PD originating from the object, and (b) the dark current generated by the active PD. Stage 2126 includes responding to the second detection current and the second dark current resisting current, outputting a second detection signal whose amplitude is smaller than the second detection current from the active PS, thereby compensating the influence of dark current on the second detection signal . A magnitude of the second dark current rejection current is greater than a magnitude of the first dark current rejection current, and possibly by any ratio greater than one. For example: the ratio may be a factor of at least two times or significantly higher, such as in the order of one, two, three (or more) magnitudes. Method 1020 may also include an optional stage 2128 of generating at least a second image of a FOV of the PDD based on second detection signals from PSs (and optionally all) of the PDD. Stage 2128 may be performed while the PDD is at the second temperature or at a subsequent stage.

可選地,在該第一暗電流抵制電流被產生的一第一時間(t1)中從該物體衝擊在該主動PD上的一第一級別的輻射(L1)實質上等於在該第二暗電流抵制電流被產生的一第二時間(t2)中從該物體衝擊在該主動PD上的一第二級別的輻射(L2),其中該第二檢測訊號的一幅度實質上等於該第一檢測訊號的一幅度。應被注意的是,可選地,根據本發明的該PDD可以被用於檢測多個訊號位準,該多個訊號位準顯著低於它的PD處於某些操作溫度(譬如以一個、兩個或更多數量級的幅度)所產生的該多個位準的暗電流。因此,方法1020可被用以在兩個不同的溫度發出多個相似級別的多個輸出訊號,其中該多個暗電流比該多個檢測訊號大兩個或多個數量級,並且彼此之間顯著不同(譬如以一因數×2、×10)Optionally, a first level of radiation (L1) impinging on the active PD from the object at a first time (t1) when the first dark current countering current is generated is substantially equal to that at the second dark current The current resists a second level of radiation (L2) impinging on the active PD from the object during a second time (t2) when the current is generated, wherein an amplitude of the second detection signal is substantially equal to the first detection signal the amplitude of the signal. It should be noted that, optionally, the PDD according to the invention can be used to detect signal levels significantly lower than its PD at certain operating temperatures (e.g. at one, two The multiple levels of dark current generated by the amplitude of one or more orders of magnitude). Thus, method 1020 can be used to generate multiple output signals of similar levels at two different temperatures, wherein the multiple dark currents are two or more orders of magnitude larger than the multiple detection signals and are significantly different from each other. Different (for example, by a factor × 2, × 10)

可選地,該第一控制電壓的該決定及該第二控制電壓的該決定由一控制電壓產生電路執行,該控制電壓產生電路包括至少一個放大器,該放大器具有一輸入,該輸入被電連接在該參考PD與一參考電壓控制電流電路之間,該參考電壓控制電流電路被耦合到該參考PD。Optionally, the determination of the first control voltage and the determination of the second control voltage are performed by a control voltage generating circuit comprising at least one amplifier having an input electrically connected to Between the reference PD and a reference voltage controlled current circuit, the reference voltage controlled current circuit is coupled to the reference PD.

可選地,方法1020還可以包括:將一第一輸入電壓供應給該放大器的另一輸入,該第一輸入電壓的位準被決定為與在該主動PD上的一偏壓相對應。可選地,方法1020可以包括:供應該第一輸入電壓,使得在該參考PD上的一偏壓與在該主動PD上的一偏壓實質相同。可選地,方法1020可以包括:當該多個主動PD具有多個不同的暗電流時,基於該PDD的多個參考PD的不同暗電流以決定該第一控制電壓及該第二控制電壓,其中該第一控制電壓的該提供包括將相同的第一控制電壓提供給多個第一電壓控制電流電路,每個第一電壓控制電流電路被耦合到具有不同暗電流的該PDD的多個主動PD中的至少一個主動PD,其中該第二控制電壓的該提供包括將相同的第二控制電壓提供給該多個第一電壓控制電流電路。Optionally, method 1020 may further include: supplying a first input voltage to another input of the amplifier, the level of the first input voltage being determined to correspond to a bias voltage on the active PD. Optionally, method 1020 may include supplying the first input voltage such that a bias voltage on the reference PD is substantially the same as a bias voltage on the active PD. Optionally, method 1020 may include: when the multiple active PDs have multiple different dark currents, determining the first control voltage and the second control voltage based on different dark currents of multiple reference PDs of the PDD, wherein the providing of the first control voltage comprises providing the same first control voltage to a plurality of first voltage-controlled current circuits, each first voltage-controlled current circuit being coupled to a plurality of active devices of the PDD having different dark currents At least one active PD of the PDs, wherein the providing of the second control voltage includes providing the same second control voltage to the plurality of first voltage-controlled current circuits.

可選地,多個不同主動PD同時產生多個不同級別的暗電流,並且多個不同參考PD同時產生多個不同級別的暗電流,並且該控制電壓產生電路基於該第二PD的多個不同暗電流的平均向不同主動PD提供一相同控制電壓。可選地,方法1020可以包括:使用專用光學器件將來自該視場的光引導到該PDD的多個主動PS;以及防止來自該視場的光到達該PDD的多個參考PD。Optionally, multiple different active PDs simultaneously generate multiple different levels of dark current, and multiple different reference PDs simultaneously generate multiple different levels of dark current, and the control voltage generating circuit is based on multiple different levels of the second PD. The averaging of dark current provides a same control voltage to different active PDs. Optionally, method 1020 may include: using dedicated optics to direct light from the field of view to active PSs of the PDD; and reference PDs to prevent light from the field of view from reaching the PDD.

第22圖是示出根據本發明的主題的諸多示例的用於測試一光電檢測裝置的方法2200的一流程圖。例如:該測試可以通過任何前述的PDD被執行。即是,如上描述的可被用於減少暗電流的該影響的相同電路及架構可以被用於附加用途,以實時測試多個不同PS的多個檢測路徑。可選地,該測試可以在該PDD處於操作模式(即不處於測試模式)當時被完成。在一些實現方案中,一些PS可以在被暴露於來自該FOV的環境光當時被測試,甚至當相同PDD的多個其它PS擷取該FOV的一實際影像時(具備或不具備對於暗電流的補償)。儘管如此,要被注意的是,方法2200也可以可選地在多個其它類型的PDD中被實現。還要被注意的是,方法2200還可以可選地使用與上述關於前述多個PDD被討論的多個電路或多個架構相似的多個電路或多個架構被實現,但是當該多個PD非特徵在於高暗電流並且降低暗電流不被需要或被執行時。方法2200被描述為被應用於單個PS,但是它可以被應用於一PDD的一些或全部PS。FIG. 22 is a flowchart illustrating a method 2200 for testing a photodetection device according to examples of the present inventive subject matter. For example: the test can be performed by any of the aforementioned PDDs. That is, the same circuits and architectures that can be used to reduce this effect of dark current as described above can be used for additional purposes to test multiple detection paths of multiple different PSs in real time. Alternatively, the test can be done while the PDD is in operational mode (ie not in test mode). In some implementations, some PSs can be tested while being exposed to ambient light from the FOV, even when multiple other PSs of the same PDD capture an actual image of the FOV (with or without detection for dark current). compensate). Nonetheless, it is to be noted that method 2200 may optionally be implemented in a number of other types of PDDs as well. It should also be noted that method 2200 can also optionally be implemented using circuits or architectures similar to those discussed above with respect to the aforementioned PDDs, but when the multiple PDs Not characterized by high dark current and reducing dark current is not required or performed. Method 2200 is described as being applied to a single PS, but it could be applied to some or all PSs of a PDD.

方法2200的階段2210包括:向一控制電壓產生電路的一放大器的一第一輸入提供一第一電壓,其中該放大器的該第二輸入被連接到一參考PD及一第二電流電路,該第二電流電路供應電流,該電流以一級別被支配以響應於該放大器的一輸出電壓;從而致使該放大器產生用於該PDD的一PS的一第一電流電路的一第一控制電壓。參考關於先前附圖闡述的諸多示例,該放大器可以是放大器1318或放大器1718,並且該PS可以是PS 1310或PS 1310’。如下討論可以提供多個第一電壓給該第一輸入的多個示例。Stage 2210 of method 2200 includes providing a first voltage to a first input of an amplifier of a control voltage generation circuit, wherein the second input of the amplifier is connected to a reference PD and a second current circuit, the first Two current circuits supply current that is commanded at a level in response to an output voltage of the amplifier; thereby causing the amplifier to generate a first control voltage for a first current circuit of a PS of the PDD. Referring to the examples set forth with respect to the previous figures, the amplifier may be amplifier 1318 or amplifier 1718, and the PS may be PS 1310 or PS 1310'. Examples of where multiple first voltages may be provided to the first input are discussed below.

方法2200的階段2220包括讀取由該PS產生的該PS的一第一輸出訊號,以響應於由該第一電流電路產生的電流及由該PS的一PD產生的電流。Stage 2220 of method 2200 includes reading a first output signal of the PS generated by the PS in response to the current generated by the first current circuit and the current generated by a PD of the PS.

方法2200的階段2230包括向該放大器的該第一輸入提供與該第一輸入不同的一第二電壓,從而致使該放大器產生用於該第一電流電路的一第二控制電壓。這樣的多個第二電壓的諸多示例可以被討論如下。Stage 2230 of method 2200 includes providing to the first input of the amplifier a second voltage different from the first input, thereby causing the amplifier to generate a second control voltage for the first current circuit. Numerous examples of such multiple second voltages can be discussed as follows.

方法2200的階段2240包括讀取由該PS產生的該PS的一第二輸出訊號,以響應於由該第一電流電路產生的電流及由該PS的一PD產生的電流。Stage 2240 of method 2200 includes reading a second output signal of the PS generated by the PS in response to the current generated by the first current circuit and the current generated by a PD of the PS.

方法2200的階段2250包括基於該第一輸出訊號及該第二輸出訊號,決定該PDD的一檢測路徑的一缺陷狀態,該檢測路徑包括該PS及與該PS相關聯的讀出電路。在使用第一電壓及第二電壓的多個不同組合當時可以檢測哪種類型的缺陷的諸多示例被討論如下。Stage 2250 of method 2200 includes determining a defect status of a detection path of the PDD based on the first output signal and the second output signal, the detection path including the PS and readout circuitry associated with the PS. A number of examples of what types of defects can be detected when using a number of different combinations of the first and second voltages are discussed below.

一第一示例包括使用該第一電壓及該第二電壓中的至少一個電壓以嘗試使該PS飽和(譬如通過該VCCS向PS的該電容提供一非常高的電流,而與該實際檢測位準無關) 。未能使該PS飽和(譬如接收一檢測訊號,該檢測訊號不是白色的,可能是全黑的或半色調的),指示該相關PS或它的讀出路徑中的其它構件(譬如PS放大器、採樣器、模數轉換器)存在一問題。在這樣的一情況下,該第一電壓(例如)致使該放大器產生一控制電壓,該控制電壓致使該第一電流電路使該PS飽和。在這樣的一情況下,在階段2250處,該缺陷狀態的該決定可以包括:決定PS正在發生故障的該檢測路徑,以響應於決定該第一輸出訊號未飽和。在這樣的一情況下,該第二電壓可以是不引起該PS飽和的電壓(譬如它致使該VCCS不發出電流,僅補償該暗電流,以防止電流被該電容收集)。測試一PS檢測路徑是否可以飽和可以被實時實現。A first example includes using at least one of the first voltage and the second voltage to attempt to saturate the PS (such as supplying a very high current through the VCCS to the capacitance of the PS, which is different from the actual detection level irrelevant). Failure to saturate the PS (such as receiving a detection signal that is not white but may be completely black or half-tone) indicates that the associated PS or other components in its readout path (such as a PS amplifier, sampler, analog-to-digital converter) presents a problem. In such a case, the first voltage, for example, causes the amplifier to generate a control voltage that causes the first current circuit to saturate the PS. In such a case, at stage 2250, the determination of the defect status may include determining that the detection path of the PS is failing, in response to determining that the first output signal is not saturated. In such a case, the second voltage may be a voltage that does not cause the PS to saturate (eg it causes the VCCS to source no current, but only compensates for the dark current to prevent current from being collected by the capacitor). Testing whether a PS detection path can be saturated can be implemented in real time.

當嘗試使一個或多個PS飽和以測試該PDD時,方法2200可包括:在該PDD的一第一檢測幀期間在該PS被暴露於環境光當時讀取該第一輸出訊號,其中在先前決定該檢測路徑是可操作後,該故障狀態的該決定被執行,以響應於在早於該第一幀的一第二檢測幀讀取一飽和的輸出訊號。例如:在該PDD的一正在進行的操作中(譬如在擷取一視訊當時),如果飽和嘗試失敗,則它在相同操作中的前一時間成功後,一PS可以被決定為有缺陷或不可用。該測試可以在不是該視訊一部分的一測試幀(testing frame)被執行,或者對於飽和輸出被忽略的單個PS執行(譬如與這些PS相應的該像素顏色可以從對其進行測試的幀的多個相鄰像素完成) ,將這些PS視為不可用於此幀的跨度(span))。When attempting to saturate one or more PSs to test the PDD, method 2200 may include reading the first output signal while the PS is exposed to ambient light during a first detection frame of the PDD, where previously After determining that the detection path is operational, the determination of the fault status is performed in response to reading a saturated output signal at a second detection frame earlier than the first frame. For example: in an ongoing operation of the PDD (such as while retrieving a video), if the saturation attempt fails, a PS may be determined to be defective or unavailable after it succeeded a previous time in the same operation use. The test can be performed on a testing frame that is not part of the video, or for individual PSs where the saturated output is ignored (e.g. the pixel color corresponding to these PSs can be obtained from multiple Adjacent pixels are done), treat these PSs as spans that are not available for this frame).

一第二示例包括使用該第一電壓及該第二電壓中的至少一個電壓以嘗試消耗該PS(譬如通過該VCCS向該PS的該電容提供一非常高的反向電流(opposite current),而與該實際檢測位準無關)。未能消耗該PS(譬如接收一檢測訊號,該檢測訊號不是黑色的,可能是全白或半色調)表示相關PS或其讀取路徑中的其它構件存在一問題。在這樣的一情況下,該第二電壓(例如)致使該放大器產生一第二控制電壓,該第二控制電壓致使該第一電流電路消耗由於衝擊在該PS上的視場光而引起的一檢測訊號。在這樣的一情況下,在階段2250處,該缺陷狀態的該決定可以包括:決定該檢測路徑正在發生故障,以響應於決定該第二輸出訊號沒被消耗。在這樣的一情況下,該第一電壓可以是不會引起該PS飽和的電壓(譬如其會致使該VCCS不發出電流,僅補償該暗電流,從而使該電容飽和)。測試一PS檢測路徑是否可以被消耗(譬如無需使各個PS變暗)可以被實時實現。A second example includes using at least one of the first voltage and the second voltage to attempt to deplete the PS (such as providing a very high opposite current to the capacitor of the PS through the VCCS, and independent of the actual detection level). Failure to deplete the PS (such as receiving a detection signal that is not black, perhaps full white or halftone) indicates a problem with the associated PS or other components in its read path. In such a case, the second voltage, for example, causes the amplifier to generate a second control voltage that causes the first current circuit to consume a detection signal. In such a case, at stage 2250, the determination of the defect status may include determining that the detection path is failing in response to determining that the second output signal is not consumed. In such a case, the first voltage may be a voltage that does not cause the PS to saturate (eg, it causes the VCCS to emit no current, but only compensates for the dark current, thereby saturating the capacitor). Testing whether a PS detection path can be consumed (eg without dimming individual PSs) can be done in real-time.

當試圖消耗一個或多個PS以測試該PDD時,方法2200可包括在該PDD的一第三檢測幀中在該PS被暴露於環境光當時讀取該第二輸出訊號,其中在先前決定該檢測路徑是可操作後,該故障狀態的該決定被執行,以響應於在早於該第三幀的一第四檢測幀讀取一被消耗的輸出訊號。When attempting to consume one or more PSs to test the PDD, method 2200 can include reading the second output signal while the PS is exposed to ambient light in a third detection frame of the PDD, wherein the After the detection path is operational, the determination of the fault condition is performed in response to reading a consumed output signal at a fourth detection frame earlier than the third frame.

使用方法2200通過使用供應多個控制電壓以測試一PS的又一示例包括供應兩個以上的電壓。例如:可以在不同的時間(譬如在不同的幀)提供三個或更多個不同的電壓給放大器的第一輸入。在這樣的一情況下,階段2250可以包括:基於該第一輸出訊號、該第二輸出訊號及與被供應給該放大器的該第一輸入的該第三或更多電壓相應的至少一個其它輸出訊號,決定該PDD的該檢測路徑的該缺陷狀態。例如:在不同的時間(譬如單調地,其中每個電壓大於一先前的電壓),三個、四個或更多個不同的電壓可以被供應給該放大器的該第一輸入,並且對應於不同電壓的相同PS的該多個輸出訊號可以被測試以對應於該多個被供應的電壓(譬如該多個輸出訊號在幅度上也是單調地增加)。Yet another example of using method 2200 to test a PS by using supplying multiple control voltages includes supplying more than two voltages. For example: three or more different voltages may be provided to the first input of the amplifier at different times (eg in different frames). In such a case, stage 2250 may include: based on the first output signal, the second output signal and at least one other output corresponding to the third or more voltages supplied to the first input of the amplifier signal to determine the defect state of the detection path of the PDD. For example: at different times (eg, monotonically, where each voltage is greater than a previous voltage), three, four or more different voltages may be supplied to the first input of the amplifier and correspond to different The multiple output signals of the same PS of voltage may be tested to correspond to the multiple supplied voltages (eg the multiple output signals also monotonically increase in magnitude).

使用方法2200以測試該PDD的一部分(甚至全部)的一示例包括從該PDD的多個PS中的每個PS讀取至少兩個輸出訊號,以響應於被提供給該相應PS的該放大器的至少兩個不同電壓,基於與該相應的第一檢測路徑相關聯的至少一個PS輸出的至少兩個輸出訊號,對於至少一個第一檢測路徑決定一操作狀態,並基於與該相應的第二檢測路徑相關聯的至少一個其它PS輸出的該至少兩個輸出訊號,對於至少一個第二檢測路徑決定一故障狀態。An example of using method 2200 to test a portion (or even all) of the PDD includes reading at least two output signals from each of the PSs of the PDD in response to the output signal of the amplifier provided to the corresponding PS. at least two different voltages, an operating state is determined for at least one first detection path based on at least two output signals of at least one PS output associated with the corresponding first detection path, and based on the corresponding second detection path The at least two output signals of at least one other PS output associated with the path determine a fault status for the at least one second detection path.

可選地,當該PDD被遮蔽以免受環境光影響時,及/或當使用(譬如一已知幅度的、專用照明的,諸如此類)指定的照明時,方法2200可以與多個指定的測試目標(譬如黑色目標、白色目標)結合執行,但並非必須如此。Optionally, the method 2200 can be used with multiple specified test targets when the PDD is shaded from ambient light, and/or when specified lighting is used (e.g., of a known magnitude, dedicated lighting, etc.) (e.g. black target, white target) combined execution, but not necessarily so.

可選地,階段2250可以被替換為決定該檢測路徑的一操作狀態。例如:這可被用於將該PDD的多個不同PS校準到該相同級別。例如:當該PDD變暗並且沒有一專用目標或專用照明時,相同的電壓可以被供應給不同PS的VCCS。不同PS的不同輸出訊號可以被相互比較(在被供應給該放大器的該第一輸入的一個或多個不同電壓下)。基於該比較,多個校正值可以被分配給不同的PS檢測路徑,這樣它們將為相似的照明級別提供一相似的輸出訊號(由不同PS的該多個VCCS所包含的電流模擬)。例如:可以決定應將PS A的輸出乘以1.1,以將一校準後的輸出訊號輸出到PS B。例如:可以決定應將一增量訊號ΔS添加到PS C的輸出,以將一校準後的輸出訊號輸出到PS D。非線性校正還可以被實現。Optionally, stage 2250 can be replaced by determining an operating state of the detection path. For example: this can be used to calibrate different PSs of the PDD to the same level. For example: when the PDD is darkened and does not have a dedicated target or dedicated lighting, the same voltage can be supplied to the VCCS of different PSs. Different output signals of different PSs can be compared with each other (at one or more different voltages supplied to the first input of the amplifier). Based on this comparison, multiple correction values can be assigned to different PS detection paths such that they will provide a similar output signal for similar illumination levels (modeled by the currents contained in the multiple VCCSs of different PSs). For example, it may be determined that the output of PS A should be multiplied by 1.1 to output a calibrated output signal to PS B. For example, it may be determined that an incremental signal ΔS should be added to the output of PS C to output a calibrated output signal to PS D. Non-linear corrections can also be implemented.

第23圖以圖解說明根據目前公開的主題的諸多示例的一電光(EO)系統2300。EO系統2300包括至少一個PDA 2302及至少一個處理器2304,該至少一個處理器2304可操作以處理來自該PDA的多個PS 2306的多個檢測訊號。EO系統2300可以是使用PDA進行檢測的任何類型的EO系統,例如照相機、光譜儀、LIDAR,諸如此類。FIG. 23 illustrates an electro-optic (EO) system 2300 according to examples of the presently disclosed subject matter. EO system 2300 includes at least one PDA 2302 and at least one processor 2304 operable to process detection signals from PSs 2306 of the PDA. EO system 2300 may be any type of EO system that uses a PDA for detection, such as a camera, spectrometer, LIDAR, or the like.

該至少一個處理器2304可操作並配置用於處理由至少一個PDA 2302的多個PS 2306輸出的多個檢測訊號。這樣的處理可以包括:例如訊號處理、影像處理、光譜分析等。可選地,處理器2304的處理結果可以被提供給以下任何一個或多個:一有形記憶體模組(tangible memory module)2308(用於儲存或以後檢索),用於外部系統(譬如一遠端伺服器或安裝EO系統2300的一車輛的一車輛電腦)譬如經由一通訊模組2310、用於顯示一影像或其它類型的結果(譬如圖形、光譜儀的文本結果)的一顯示器2312,另一種類型的輸出介面(譬如一揚聲器,未被示出),諸如此類。The at least one processor 2304 is operable and configured to process the plurality of detection signals output by the plurality of PSs 2306 of the at least one PDA 2302 . Such processing may include, for example, signal processing, image processing, spectral analysis, and the like. Optionally, the processing results of processor 2304 may be provided to any one or more of the following: a tangible memory module (tangible memory module) 2308 (for storage or later retrieval), for external systems (such as a remote end server or a vehicle computer of a vehicle on which the EO system 2300 is installed) such as via a communication module 2310, a display 2312 for displaying an image or other type of results (such as graphs, text results of a spectrometer), another type of output interface (such as a speaker, not shown), and the like.

EO系統2300可以包括:一控制器2314,該控制器2314控制EO系統2300(譬如PDA 2302及一可選光源2316)的多個操作參數。特別地,控制器2314可以被配置為設置(或否則改變)由EO系統2300用於擷取不同幀的該多個幀曝光時間。可選地,處理器2304對多個光檢測訊號的多個處理結果可以被用於修改控制器2314的操作。可選地,控制器2314及處理器2304可以被實現為單個處理單元。EO system 2300 may include a controller 2314 that controls various operating parameters of EO system 2300 (eg, PDA 2302 and an optional light source 2316). In particular, controller 2314 may be configured to set (or otherwise change) the plurality of frame exposure times used by EO system 2300 to capture different frames. Optionally, multiple processing results of the multiple light detection signals by the processor 2304 may be used to modify the operation of the controller 2314 . Alternatively, the controller 2314 and the processor 2304 may be implemented as a single processing unit.

EO系統2300可以包括:至少一個光源2316,可操作以將光發射到EO系統2300的該視場(FOV)上。光源2316的一些光從該FOV中的物體被反射並且被PS 2306(至少那些在EO系統2300的多個幀曝光時間期間位於被暴露於外部光的一感光區域中的PS)擷取。檢測在該FOV中來自多個物體的光(無論是光源的光的反射、其它光源的反射,或是輻射光)被用於產生該多個物體的一影像或其它模型(譬如一個三維深度圖)。任何合適類型的光源可以被使用(譬如脈衝的、連續的、調變的、LED、雷射)。可選地,光源2316的操作可以由一控制器(譬如控制器2314)控制。EO system 2300 may include at least one light source 2316 operable to emit light onto the field of view (FOV) of EO system 2300 . Some light from light source 2316 is reflected from objects in the FOV and picked up by PS 2306 (at least those PSs located in a photosensitive region that were exposed to external light during the multiple frame exposure times of EO system 2300). Detecting light from objects in the FOV (whether reflections of light from light sources, reflections from other light sources, or radiated light) is used to generate an image or other model (such as a 3D depth map) of the objects in the FOV ). Any suitable type of light source may be used (eg pulsed, continuous, modulated, LED, laser). Optionally, operation of light source 2316 may be controlled by a controller, such as controller 2314.

EO系統2300可以包括:一讀出電路2318,用於從多個不同的PS 2306讀出多個電檢測訊號。可選地,讀出電路2318可以在將該多個電檢測訊號提供給處理器2304前對它們進行處理。這樣的預處理可以包括:例如:放大、採樣、加權、降噪、校正、數位化、設上限、位準調整、暗電流補償(amplification, sampling, weighting, denoising, correcting, digitalization, capping, level-adjustments, dark current compensation),諸如此類。EO system 2300 may include: a readout circuit 2318 for reading out multiple electrical detection signals from multiple different PSs 2306 . Optionally, readout circuitry 2318 may process the plurality of electrical detection signals before providing them to processor 2304 . Such preprocessing may include, for example: amplification, sampling, weighting, noise reduction, correction, digitization, capping, level adjustment, dark current compensation (amplification, sampling, weighting, denoising, correcting, digitalization, capping, level- adjustments, dark current compensation), and so on.

此外,EO系統2300可以包括:多個附加構件,諸如(但不限於)以下一個或多個可選的構件: a.        記憶體模組2308,用於儲存由該多個PS 2306或由讀出電路2318(譬如如果不同)輸出的多個檢測訊號中的至少一個,以及由處理器2304通過處理該多個檢測訊號而被產生的檢測資訊。 b.        一電源2320,諸如一電池、一AC電力適配器、DC電力適配器,諸如此類。電源2320可以向該PDA、讀出電路2318或EO系統2300的任何其它構件提供電力。 c.        一硬殼2322(或任何其它類型的結構支撐)。 d.        光學器件2324,用於將光源2316的光(如果被實現)引導到該FOV及/或用於將來自該FOV的光引導到PDA 2300。這樣的光學器件可以包括:例如:諸多透鏡、諸多鏡(固定的或可移動的)、諸多棱鏡、諸多濾光片,諸如此類。Additionally, EO system 2300 may include a number of additional components, such as, but not limited to, one or more of the following optional components: a. The memory module 2308 is used to store at least one of the plurality of detection signals output by the plurality of PS 2306 or by the readout circuit 2318 (if different), and is processed by the processor 2304 by processing the plurality of detection signals. The detection information generated by the signal. b. A power source 2320, such as a battery, an AC power adapter, DC power adapter, or the like. Power supply 2320 may provide power to the PDA, readout circuitry 2318 , or any other components of EO system 2300 . c. A hard shell 2322 (or any other type of structural support). d. Optics 2324 for directing light from light source 2316 (if implemented) to the FOV and/or for directing light from the FOV to PDA 2300. Such optics may include, for example, lenses, mirrors (fixed or movable), prisms, filters, and the like.

可選地,PDA 2302的特徵可能在於相對較高的暗電流(譬如由於它的PD的類型及特性所致的一結果)。由於該高級別的暗電流,收集檢測電荷的該各個PS 2306的該多個電容可能會被該暗電流變成飽和(部分或全部),幾乎沒有或沒有動態範圍用於檢測環境光(從FOV)。即使讀出電路系統2318或處理器2304(或系統2300的任何其它構件)從該檢測訊號減去多個暗電流級別(譬如對該檢測資料進行正規化),也缺乏用於檢測的動態範圍,這意謂該各個PS 2306的所得檢測訊號過於飽和,不足以用於有意義地檢測多個環境光級別。由於來自各個PS 2306的該PD的暗電流在該幀曝光時間(FET)的整個持續時間內被累積在該電容中(無論是該多個PS的其它構件的實際電容器還是寄生電容或剩餘電容),因此具備不同電容的多個不同的PS 2306在多個不同的FET可能被呈現為不可用。Alternatively, PDA 2302 may be characterized by a relatively high dark current (eg, a result due to the type and characteristics of its PD). Due to the high level of dark current, the capacitances of the respective PS 2306 that collect the detected charge may become saturated (partially or fully) by the dark current, with little or no dynamic range for detecting ambient light (from FOV) . Even if the readout circuitry 2318 or processor 2304 (or any other component of the system 2300) subtracts dark current levels from the detection signal (eg, normalizes the detection data), there is a lack of dynamic range for detection, This means that the resulting detection signal for each PS 2306 is too saturated to be useful for meaningfully detecting multiple ambient light levels. Since the dark current from the PD of each PS 2306 is accumulated in the capacitance (whether actual or parasitic or residual capacitance of other components of the PS) for the entire duration of the frame exposure time (FET) , thus multiple different PS 2306s with different capacitances may be rendered unusable by multiple different FETs.

第24圖以圖解說明根據目前公開的主題的用於基於一PDA的資料產生影像資訊的方法2400的一示例。參考關於先前附圖闡述的諸多示例,方法2400可以由EO系統2300(譬如由處理器2304、控制器2314等)執行。在這樣的一情況下,方法2400的該PDA可以可選地是PDA 2302。在方法2400中被討論的其它相關構件可以是EO系統2300的該多個相應構件。方法2400包括改變一幀FET(FET),在此中,該PDA從它的PD收集諸多電荷。這種被收集的電荷可能是由於對衝擊在該多個PD上的光的光電響應以及在該檢測系統內的多個內在來源,諸如由於該PD的暗電流引起的。衝擊的光可能會從譬如被安裝該PDA的一攝像機或其它EO系統的一視場(FOV)到達。該FET可以通過控制閃光照明持續時間,諸如此類,以電子式、機械式或其任意組合被控制。FIG. 24 illustrates an example of a method 2400 for generating image information based on data from a PDA in accordance with the presently disclosed subject matter. Referring to the examples set forth with respect to the previous figures, the method 2400 may be performed by the EO system 2300 (eg, by the processor 2304, the controller 2314, etc.). In such a case, the PDA of method 2400 may optionally be PDA 2302 . Other relevant components discussed in method 2400 may be the plurality of corresponding components of EO system 2300 . Method 2400 includes altering a frame of FETs (FETs) where the PDA collects charge from its PD. This collected charge may be due to the photoelectric response to light impinging on the PDs as well as intrinsic sources within the detection system, such as due to dark current of the PDs. The impinging light may arrive from, for example, a field of view (FOV) of a video camera or other EO system on which the PDA is mounted. The FET may be controlled electronically, mechanically, or any combination thereof by controlling flash illumination duration, and the like.

要被注意的是,該FET可以是一整體FET,其是多個不同的持續時間的一總和,在此中,該PDA收集由於該PDA的多個PS中的光電活動引起的電荷。在不同的多個不同的持續時間內收集的電荷被相加以提供單個輸出訊號的情況下,一整體FET被使用。這樣的整體FET可以例如與脈衝照明一起被使用,或者與主動照明一起被使用,在該主動照明中,該收集在短時間內被擱置(譬如以避免被該FOV中的一亮反射所飽和)。要被注意的是,可選地,在一些幀中,單個FET可以被使用,而在其它幀中,整個FET可以被使用。It is to be noted that the FET may be a bulk FET, which is a sum of different durations where the PDA collects charge due to photoelectric activity in the PDA's PSs. A bulk FET is used where the charges collected over different durations are summed to provide a single output signal. Such a monolithic FET could be used, for example, with pulsed illumination, or with active illumination where the collection is put on hold for a short time (eg to avoid being saturated by a bright reflection in the FOV) . It is to be noted that optionally in some frames a single FET may be used, while in other frames the entire FET may be used.

方法2400的階段2402包括接收第一幀資訊。對於一PDA的多個PS中的每個PS,該第一幀資訊包括一第一幀檢測級別,該第一幀檢測級別指示在一第一FET中由該各個PS檢測的光的一強度。該第一幀資訊的該接收可以包括:從該PDA的所有該PS接收多個讀出訊號,但這不是必須的。例如:某些PS可能有缺陷,無法提供一訊號。例如:可以為該幀定義一感興趣區域(ROI),指示資料僅從該幀的一部分被收集,依此類推。Stage 2402 of method 2400 includes receiving a first frame of information. For each PS of the plurality of PSs of a PDA, the first frame information includes a first frame detection level indicating an intensity of light detected by the respective PS in a first FET. The receiving of the first frame of information may include receiving readout signals from all the PSs of the PDA, but this is not required. For example: Some PSs may be defective and unable to provide a signal. For example: a region of interest (ROI) can be defined for the frame, indicating that data is only collected from a portion of the frame, and so on.

該幀資訊可以用任何格式被提供,諸如用於每個PS的一檢測級別(或多個級別)(譬如介於0與1024之間,三個RGB值,每個介於0與255之間,諸如此類),標量,矢量或任何其它格式。可選地,該幀資訊(對於該第一幀或諸多稍後的幀)可以可選地以間接方式指示多個檢測訊號(譬如關於一給定PS的該檢測級別的資訊可以相對於一相鄰PS的級別或者相對於一先前幀中的相同PS的級別被給出)。該幀資訊還可以包括:附加資訊(譬如順序號、時間戳、操作條件),其中的一些可以在方法2400的後續步驟中被使用。該第一幀資訊(以及在方法2400的稍後階段中被接收的用於諸多稍後幀的幀資訊)可以直接從該PDA被接收,或者從一個或多個中間單元(諸如一中間處理器、儲存器單元、資料聚合器,諸如此類)被接收。該第一幀資訊(以及在方法2400的稍後階段中被接收的用於稍後幀的幀資訊)可以包括:由各個PS獲取的該原始資料,但是還可以包括:預處理的資料(譬如在加權、去噪、校正、數位化、設上限、級別調整,諸如此類)。The frame information can be provided in any format, such as a detection level (or levels) for each PS (e.g. between 0 and 1024, three RGB values, each between 0 and 255 , and the like), scalar, vector, or any other format. Optionally, the frame information (for the first frame or subsequent frames) may optionally indicate detection signals in an indirect manner (eg, information about the detection level for a given PS may be relative to a phase The level of the neighboring PS or the level relative to the same PS in a previous frame is given). The frame information may also include: additional information (eg, sequence number, time stamp, operating condition), some of which may be used in subsequent steps of method 2400 . The first frame information (and frame information for subsequent frames received in later stages of method 2400) may be received directly from the PDA, or from one or more intermediate units, such as an intermediate processor , storage units, data aggregators, and the like) are received. The first frame information (and the frame information received in later stages of the method 2400 for later frames) may include the raw data acquired by the respective PS, but may also include pre-processed data (such as in weighting, denoising, rectifying, digitizing, capping, leveling, and the like).

階段2404包括基於該第一FET識別該PDD的該多個PS中的至少兩種類型的PS: a. 用於該第一幀的一可用PS群組(被稱為“第一可用PS群組(first group of usable PSs)”),至少包括該PDA的該多個PS中的一第一個PS、一第二個PS及一第三個PS。 b. 用於該第一幀的一不可用PS群組(被稱為“第一不可用PS群組(first group of unusable PSs)”),至少包括該PDA的多個PS中的一第四個PS。Stage 2404 includes identifying at least two types of PSs of the plurality of PSs of the PDD based on the first FET: a. an available PS group (referred to as "first group of usable PSs)" for the first frame, including at least a first one of the plurality of PSs of the PDA PS, a second PS and a third PS. b. an unusable PS group for the first frame (referred to as "the first unusable PS group (first group of unusable PSs)"), including at least a fourth of the plurality of PSs of the PDA PS.

階段2404的該識別可以用不同的方式被實現,並且可以可選地包括(顯式地或隱式地)識別該多個PS中的每個屬於上述至少兩個組中的一者。可選地,該PDA的每個PS(或其一預先決定的子組的每個PS,諸如ROI的所有PS)可以被分配給相對於該第一幀的兩個複數中的一者,該第一可用PS群組或該第一不可用PS群組。然而,這不一定是必須的,並且某些PS可能未被分配用於某些幀,或者可能被分配給其它多個(譬如多個PS的可用性基於該相應的該第一幀的該FET以外的諸多參數,諸如基於被收集的資料被決定)。可選地,階段2404的該識別可以包括:決定哪些PS符合該第一複數個PS中的一個,並自動將該PDA的其餘PS(或它的一預定子組,例如ROI)視為屬於該兩者中的其它複數個PS。This identification of stage 2404 may be implemented in different ways, and may optionally include (explicitly or implicitly) identifying (explicitly or implicitly) that each of the plurality of PSs belongs to one of the above-mentioned at least two groups. Optionally, each PS of the PDA (or each PS of a predetermined subset thereof, such as all PSs of a ROI) may be assigned to one of two complex numbers relative to the first frame, the The first available PS group or the first unavailable PS group. However, this is not necessarily required, and certain PSs may not be allocated for certain frames, or may be allocated to other multiples (such as the availability of multiple PSs based on the FET corresponding to the first frame other than parameters, such as are determined based on the collected data). Optionally, this identifying at stage 2404 may include: deciding which PSs qualify as one of the first plurality of PSs, and automatically treating the remaining PSs (or a predetermined subset thereof, such as an ROI) of the PDA as belonging to the PS. The other plural PSs of the two.

應被注意的是,階段2404(以及階段2412及2402)的該識別不必反映該各個PS的一實際可用性狀態(在某些實現方案中,也確實反映這些實際可用性狀態)。例如:被包括在該第一不可用PS群組中的一PS實際上可以在該第一幀的該多個條件下被使用,而被包括在該第一可用PS群組中的另一PS實際上可以在該第一幀的該多個情況下不被使用。階段2404的該識別是對該PDA的多個PS的該可用性的一估計或評估(estimation or assessment),而不是對各個PS的一測試。還要被注意的是,多個PS的可用性還可以基於其它因素在階段2404中被估計。例如:該缺陷PS的一預先存在的列表可被用於將此類PS排除在被認為可用之外。It should be noted that the identification of stage 2404 (and stages 2412 and 2402) does not necessarily reflect an actual availability state of the respective PS (in some implementations it does reflect these actual availability states). For example: a PS included in the first unavailable PS group can actually be used under the conditions of the first frame, while another PS included in the first available PS group may actually not be used in the multiple instances of the first frame. The identification of stage 2404 is an estimation or assessment of the usability of the PSs of the PDA, rather than a test of individual PSs. It is also to be noted that the availability of multiple PSs may also be estimated in stage 2404 based on other factors. For example: a pre-existing list of defective PSs can be used to exclude such PSs from being considered usable.

階段2404(以及階段2412及2420)的該識別可以包括:基於複合FET包括該PDD的多個採樣PS對光敏感的持續時間的一總和,並且不包括該PDD的多個採樣PS對光不敏感的多個持續時間之間的多個中間時間,識別該多個不可用PS群組中的至少一者(及/或該多個可用PS群組中的至少一者)。This identification of stage 2404 (as well as stages 2412 and 2420) may include a summation of time durations that sample PSs that include the PDD are sensitive to light based on composite FETs, and sample PS that do not include the PDD are insensitive to light A plurality of intermediate times between the plurality of durations, identifying at least one of the plurality of unavailable PS groups (and/or at least one of the plurality of available PS groups).

(在多個階段2404、2412及/或2420中)的多個可用及不可用PS群組的該識別可以部分地基於溫度的一評估。可選地,方法2400可以包括:處理一個或多個幀(特別是多個先前幀或該目前幀)用於決定一溫度評估(譬如通過評估在一暗幀中或在多個未映像成該FOV的變暗的PS中的暗電流級別)。然後,方法2400可以包括:使用該溫度評估以識別用於一稍後幀的一可用PS群組及一不可用PS群組,這影響相應影像的產生。該溫度評估可被用於評估該暗電流在該相關FET的該持續時間內飽和將多麼快速使一給定PS的該動態範圍飽和。可選地,該溫度評估可以被用於利用該PS的一可用性模型的一參數(譬如在方法2500中被產生的一者)。This identification of available and unavailable PS groups (in stages 2404, 2412, and/or 2420) may be based in part on an assessment of temperature. Optionally, method 2400 may include: processing one or more frames (particularly previous frames or the current frame) for determining a temperature estimate (e.g., by evaluating the dark current level in the dimmed PS of the FOV). Method 2400 may then include using the temperature estimate to identify an available PS group and an unavailable PS group for a later frame, which affects the generation of the corresponding image. The temperature estimate can be used to assess how quickly the dark current will saturate the dynamic range for a given PS within the duration of the associated FET. Optionally, the temperature estimate may be used to utilize a parameter of an availability model of the PS (such as the one generated in method 2500).

相對於階段2402的執行時機,階段2404的執行時機可以改變。例如:階段2404可以可選地在執行階段2402之前、同時、部分同時或之後被執行。參考附圖的示例,階段2404可以可選地由處理器2304及/或控制器2314執行。用於執行階段2404的該識別的諸多方法的諸多示例被討論關於方法1100。The timing of execution of stage 2404 may vary relative to the timing of execution of stage 2402 . For example: stage 2404 may optionally be performed before, at the same time, partly at the same time, or after performing stage 2402 . Referring to the examples of the figures, stage 2404 may optionally be performed by processor 2304 and/or controller 2314 . Examples of methods for performing this identification of stage 2404 are discussed with respect to method 1100 .

階段2406包括:不理會該第一不可用PS群組的該多個第一幀檢測級別,基於該第一可用PS群組的該多個第一幀檢測級別,以產生一第一影像。該第一影像的該產生可以使用任何合適的方法被實現,並且可以可選地基於附加資訊(譬如從一主動照明單元被接收的資料,如果被使用,來自諸多附加感測器諸如諸多濕度感測器的資料)。參考關於先前附圖闡述的諸多示例,要被注意的是,階段2406可以可選地由處理器2304實現。要被注意的是,該產生可以包括:處理該多個訊號的多個不同階段(譬如加權、降噪、校正、數位化、設上限、位準調整,諸如此類)。Stage 2406 includes generating a first image based on the first frame detection levels of the first usable PS group regardless of the first frame detection levels of the first unavailable PS group. The generation of the first image can be accomplished using any suitable method, and can optionally be based on additional information (such as data received from an active lighting unit, if used, from additional sensors such as humidity sensors instrument data). With reference to the examples set forth with respect to the previous figures, it is to be noted that stage 2406 may optionally be implemented by processor 2304 . It is to be noted that the generation may include various stages of processing the signals (eg weighting, noise reduction, correction, digitization, capping, level adjustment, etc.).

對於該第一不可用PS群組,要被注意的是,由於在該第一影像的該產生中被忽略那些PS的檢測資料,因此多個替換值可以用任何合適的方式(如果需要)被計算。這樣的多個替換值可以被計算,例如:基於多個相鄰PS的多個第一幀檢測級別、基於多個較早幀的多個較早檢測級別、基於相同PS(譬如如果在一前一幀中可用)或一個或多個相鄰PS(譬如基於該場景的運動學分析)。例如:可以使用一維納濾波器(Wiener filter)、局部均值算法(local mean algorithms)、非局部均值算法(non-local means algorithms),諸如此類。參照基於該PDA資料的多個影像的該產生,可選地,該產生的任何一個或多個這樣的影像(譬如該第一影像、該第二影像及該第三影像)可以包括:計算用於至少一個像素的一替換值,該至少一個像素與一PS相關聯,該PS基於被識別為可用於相應影像的至少一個其它相鄰PS的檢測級別而被識別為不可用於相應影像。在使用非二進制可用性評估的情況下(並且階段2404、2412及/或2420的該識別包括將至少一個PS識別為屬於一第三組部分可用性PS),每個這樣的PS的檢測訊號被部分識別為可用,可以將其與多個相鄰PS的多個檢測訊號及/或多個相同PS的多個其它讀數在其可用(或部分可用)的其它時間進行組合或平均。For the first group of unusable PSs, it is to be noted that since detection data for those PSs are ignored in the generation of the first image, replacement values may be replaced in any suitable manner (if desired). calculate. Such multiple replacement values may be calculated, for example: multiple first frame detection levels based on multiple neighboring PSs, multiple earlier detection levels based on multiple earlier frames, based on the same PS (e.g. available in one frame) or one or more neighboring PSs (eg based on kinematic analysis of the scene). For example: a Wiener filter (Wiener filter), local mean algorithms (local mean algorithms), non-local mean algorithms (non-local means algorithms), etc. can be used. With reference to the generation of a plurality of images based on the PDA data, optionally, any one or more of such images generated (such as the first image, the second image and the third image) may include: A replacement value for at least one pixel associated with a PS identified as unavailable for the corresponding image based on a detection level of at least one other adjacent PS identified as available for the corresponding image. Where non-binary availability assessments are used (and the identification of stages 2404, 2412 and/or 2420 includes identifying at least one PS as belonging to a third set of partial availability PSs), the detection signal of each such PS is partially identified To be available, it may be combined or averaged with multiple detection signals of multiple neighboring PSs and/or multiple other readings of multiple same PSs at other times when they are available (or partially available).

可選地,該第一影像的該產生(以及稍後的該第二影像及該第三影像的產生)還可以包括:不理會被決定為缺陷的、不起作用的或由於任何其它原因不可用的多個PS的多個輸出,或者被決定為具有一缺陷的、不起作用的或不可用的檢測路徑。用於檢測多個PS及/或多個相關的檢測路徑的缺陷的附加方法的一示例被討論關於方法2200,其可以與方法2400結合。方法2200的該輸出可被用於產生階段2406、2414及2422。在這樣的一情況下,方法2200可以被週期性地執行並提供用於產生該多個影像的多個輸出,或者可以根據方法2400被特定觸發以用於多個影像的該產生。Optionally, the generation of the first image (and later the generation of the second image and the third image) may also include disregarding The multiple outputs of the multiple PSs used, or are determined to have a defective, non-functional, or unusable detection path. An example of an additional method for detecting defects in multiple PSs and/or multiple associated detection paths is discussed with respect to method 2200 , which may be combined with method 2400 . This output of method 2200 may be used to generate stages 2406 , 2414 and 2422 . In such a case, the method 2200 may be performed periodically and provide outputs for generating the plurality of images, or may be specifically triggered according to the method 2400 for the generation of the plurality of images.

可選地,該第一影像(以及該第二影像及該第三影像,稍後)的該產生可以包括:當一PS被決定為可用時,基於被測量的該PS的一檢測級別,計算與該PS相關聯的至少一個像素的一替換值,該PS被識別為不可用於該相應的影像。此類資訊可以與多個相鄰PS的資訊一起被使用,也可以與其獨立使用。使用來自其它時間的一PS的多個檢測級別可能包括:例如:考慮來自多個先前幀(譬如用於多個靜止場景)的多個檢測級別、使用來自被用於產生一複合影像的一系列影像採集的另一快照的檢測資訊,諸如一高動態範圍影像(HDRI)或一多波長複合影像(其中幾個鏡頭使用不同的光譜濾鏡被拍攝,然後被組合為單個影像)。Optionally, the generation of the first image (and the second image and the third image, later) may include: when a PS is determined to be available, based on a detection level of the PS measured, calculating A replacement value for at least one pixel associated with the PS identified as unavailable for the corresponding image. Such information can be used together with or independently of the information of multiple neighboring PSs. Using multiple detection levels from a PS at other times may include, for example: considering multiple detection levels from multiple previous frames (e.g. for multiple still scenes), using Detection information of another snapshot of image acquisition, such as a high dynamic range image (HDRI) or a multi-wavelength composite image (where several shots are taken with different spectral filters and then combined into a single image).

要被注意的是,在該第一影像中(以及在基於該PDA的檢測資料所產生的任何其它幀中),單個像素可以基於來自單個PS或來自多個PS的一組合的該檢測資料;同樣地,來自單個PS的該資訊可被用於決定在該影像上的一個或多個像素的像素顏色。例如:Θ乘Φ度(degrees)的一視場可以被以多個X乘Y的PS覆蓋,並且可以被轉換為在該影像中的N乘N個像素。這些M×N個像素中的一者的一像素值可以被計算為用於一個或多個PS的Pixel-Value(i,j)=Σ(aₚ,ₛ·DLₚ,ₛ)的一總和,其中DLₚ,ₛ是用於該幀的PS (p,s)的該檢測級別,及aₚ,ₛ是該特定像素(i,j)的一平均係數。It is to be noted that in the first image (and in any other frame generated based on the detection data of the PDA), individual pixels may be based on the detection data from a single PS or from a combination of multiple PSs; Likewise, the information from a single PS can be used to determine the pixel color of one or more pixels on the image. For example: a field of view of Θ by Φ degrees can be covered by multiple X by Y PSs and can be converted to N by N pixels in the image. A pixel value for one of these M×N pixels can be computed as a sum of Pixel-Value(i,j)=Σ(aₚ,ₛ·DLₚ,ₛ) for one or more PSs, where DLₚ,ₛ is the detection level for PS (p,s) of the frame, and aₚ,ₛ is an averaging coefficient for the particular pixel (i,j).

在階段2406後,該第一影像然後可以被提供給一外部系統(譬如一螢幕監視器、一記憶體單元、一通訊系統、一影像處理電腦)。該第一影像然後可以使用該一個或多個影像處理算法被處理。在階段2406後,該第一影像然後可以按照期望以其它方式被處理。After stage 2406, the first image may then be provided to an external system (eg, a screen monitor, a memory unit, a communication system, an image processing computer). The first image can then be processed using the one or more image processing algorithms. After stage 2406, the first image can then be otherwise processed as desired.

對於由光檢測器感測器擷取的許多幀,無論是否為多個連續的幀,階段2402至2406都可以被重複進行數次(reiterated several times)。要被注意的是,在一些實現方案中,譬如如果高動態範圍(HDR)成像技術被實現,則該第一影像可以基於幾個幀的多個檢測級別被產生。在其它實現方案中,該第一影像通過單個幀的多個第一幀檢測級別被產生。階段2402及2406的多個實例可以跟隨階段2404的單個實例(譬如如果對於幾個幀使用相同的FET)。Stages 2402 to 2406 may be repeated several times for a number of frames captured by the photodetector sensor, whether consecutive or not. It is to be noted that in some implementations, such as if high dynamic range (HDR) imaging techniques are implemented, the first image may be generated based on multiple detection levels over several frames. In other implementations, the first image is generated with multiple first frame detection levels of a single frame. Multiple instances of stages 2402 and 2406 may follow a single instance of stage 2404 (eg, if the same FET is used for several frames).

階段2408在接收該第一幀資訊後被執行,並且包括:決定一第二FET,該第二FET比該第一FET更長。該第二FET的該決定包括決定多個相關PD的該暴露的一持續時間(譬如以毫秒、其諸多部分或其諸多倍數為單位)。階段2408還可以包括:決定多個附加的時機參數(additional timing parameters)(譬如該曝光的一開始時間),但這不是必須的。相對於該第一FET更長的該第二FET可以出於任何原因被選擇。這樣的一原因可以包括:例如:以下的任何一者或多者:在該FOV中的總體光強度、在該FOV的多個部分中的光強度、採用包圍曝光(bracketing)技術、採用高動態範圍攝影技術、光圈變化,諸如此類。該第二FET可以比該第一FET更長任何比率,無論是相對較低的值(譬如×1.1倍、×1.5倍),是超過幾倍的值(譬如×2、×5)還是更高的值(譬如×20、×100、×5,000)。參考附圖的諸多示例,階段2408可以可選地由控制器2314及/或處理器2304執行。可選地,一外部系統可以通過EO系統2300(譬如被安裝EO系統2300的一車輛的一控制系統)以決定該第一FET或影響該FET的設置。Stage 2408 is performed after receiving the first frame information and includes: determining a second FET, the second FET being longer than the first FET. The determination of the second FET includes determining a duration (eg, in milliseconds, fractions thereof, or multiples thereof) of the exposure of associated PDs. Stage 2408 may also include: determining a number of additional timing parameters (such as the start time of the exposure), but this is not required. The second FET, which is longer than the first FET, may be selected for any reason. Such a reason may include, for example: any one or more of the following: overall light intensity in the FOV, light intensity in portions of the FOV, use of bracketing techniques, use of high dynamic Range photography techniques, aperture changes, and the like. The second FET can be longer than the first FET by any ratio, whether it is a relatively low value (such as ×1.1 times, ×1.5 times), is more than a few times the value (such as ×2, ×5) or higher value (such as ×20, ×100, ×5,000). Referring to the examples of the figures, stage 2408 may optionally be performed by controller 2314 and/or processor 2304 . Optionally, an external system can determine the first FET or affect the setting of the FET through the EO system 2300 (eg, a control system of a vehicle on which the EO system 2300 is installed).

要被注意的是,可選地,階段2408及階段2416中的至少一個可以通過與這樣的一外部實體一起做決定一新FET(分別為該第二FET及/或該第三FET)而被替換。這樣的一外部實體可以是例如一外部控制器、一外部處理器、一外部系統。要被注意的是,可選地,階段2408及階段2416中的至少一個可以通過從一外部實體接收一新FET(分別為該第二FET及/或該第三FET)的指示而被替換。該FET的該指示可以是顯式的(譬如以毫秒為單位的持續時間)或隱式的(譬如與該FET相應的光圈開口及/或曝光值(EV)的變化的指示、閃光持續時間的指示)。要被注意的是,可選地,階段2408及階段2416中的至少一個可以通過從一外部實體接收對預期暗電流(或至少一部分暗電流被傳輸到該PS的該電容,譬如如果諸多暗電流緩解策略被實現)。It is to be noted that, optionally, at least one of stage 2408 and stage 2416 may be implemented by making a decision with such an external entity on a new FET (the second FET and/or the third FET, respectively). replace. Such an external entity may be, for example, an external controller, an external processor, an external system. It is to be noted that, optionally, at least one of stage 2408 and stage 2416 may be replaced by receiving an indication of a new FET (the second FET and/or the third FET, respectively) from an external entity. The indication of the FET may be explicit (such as a duration in milliseconds) or implicit (such as an indication of a change in aperture opening and/or exposure value (EV) corresponding to the FET, an indication of a flash duration instruct). It is to be noted that, optionally, at least one of stage 2408 and stage 2416 may be transferred to the capacitance of the PS by receiving a response to the expected dark current from an external entity (or at least a portion of the dark current, e.g. if many dark current Mitigation strategies are implemented).

階段2410包括接收第二幀資訊。該第二幀資訊包括對於該PDA的該多個PS中的每個PS的一第二幀檢測級別,該第二幀檢測級別指示在該第二FET中由相對應PS檢測的光的一強度。要被注意的是,該第二幀(在此中用於該第二幀資訊的該檢測資料被收集)可以直接跟隨在該第一幀後,但這不是必須的。在該第一幀與該第二幀之間的一個或多個中間幀(如果有任何的)中的任何一個的多個FET可以等於該第一FET、該第二FET或任何其它FET(更長的或更短的)。參考附圖的示例,階段2410可以可選地由處理器2304執行(譬如經由讀出電路2318)。Stage 2410 includes receiving a second frame of information. The second frame information includes a second frame detection level for each of the plurality of PSs of the PDA, the second frame detection level indicating an intensity of light detected in the second FET by the corresponding PS . It is to be noted that the second frame (in which the detection data for the second frame information is collected) may directly follow the first frame, but this is not required. The FETs of any one of one or more intermediate frames (if any) between the first frame and the second frame may be equal to the first FET, the second FET, or any other FET (more long or short). Referring to the example of the figure, stage 2410 may optionally be performed by processor 2304 (eg, via readout circuitry 2318).

階段2412包括基於該第二FET從該PDD的多個PS中識別該PDA的至少兩種類型的PS: a. 用於該第二幀的一可用PS群組(被稱為“第二可用PS群組(second group of usable PSs)”)包括該第一個PS。 b. 用於該第二幀的一不可用PS群組(被稱為“一第二不可用PS群組(a second group of unusable PSs)”)包括該第二個PS、該第三個PS及該第四個PS。Stage 2412 includes identifying at least two types of PSs of the PDA from the plurality of PSs of the PDD based on the second FET: a. A group of usable PSs (referred to as "second group of usable PSs") for the second frame includes the first PS. b. an unusable PS group (referred to as "a second group of unusable PSs)" for the second frame includes the second PS, the third PS and the fourth PS.

即是,由於該第二幀的該FET較長,在階段2404中被識別為屬於該第一可用PS群組的該第二個PS及該第三個PS(即,前述用於該第一幀的一可用PS群組)在階段2412中被識別為屬於該第二不可用PS群組(即,前述用於該第二幀的一不可用PS群組)。階段2412的該識別可以用不同的方式被實現,諸如以上關於階段2404被討論的那些中的任何一者或多者。出於各種原因,被認為可用於較短FET的多個PS可能在階段2412中被認為對於較長的FET是不可用的。例如:如果這種PS具有的電荷儲存能力(譬如電容)低於該PDA中的多個PS的平均電荷儲存能力,則可以認為這些PS的電荷儲存能力在更長的積分時間對於該檢測訊號及該累積暗電流均不足。如果該暗電流級別被維持(譬如該PD上的溫度及偏壓不變),則由於它無法維持足夠的動態範圍而在該第一FET中無法呈現的任何PS也將被識別為不可用於該較長的第二FET。That is, since the FET of the second frame is longer, the second PS and the third PS identified as belonging to the first available PS group in stage 2404 (i.e., the aforementioned An available PS group for the frame) is identified in stage 2412 as belonging to the second unavailable PS group (ie, the aforementioned unavailable PS group for the second frame). This identification of stage 2412 may be achieved in different ways, such as any one or more of those discussed above with respect to stage 2404 . For various reasons, multiple PSs considered available for shorter FETs may be considered unavailable for longer FETs in stage 2412 . For example, if the PS has a charge storage capacity (such as capacitance) that is lower than the average charge storage capacity of the PSs in the PDA, it can be considered that the charge storage capacity of the PSs is less effective for the detection signal and None of the accumulated dark currents are sufficient. If the dark current level is maintained (e.g. constant temperature and bias across the PD), any PS that cannot be present in the first FET due to its inability to maintain sufficient dynamic range will also be identified as unusable the longer second FET.

階段2412在階段2408後被執行(因為它基於階段2408的該多個輸出)。相對於階段2410的執行時機,階段2412的執行時機可以改變。例如:階段2412可以可選地在執行階段2410之前、同時、部分同時或之後被執行。參考附圖的示例,階段2412可以可選地由處理器2304執行。用於執行階段2412的該識別的諸多方法的諸多示例被討論關於方法2500。Stage 2412 is performed after stage 2408 (because it is based on the multiple outputs of stage 2408). The timing of execution of stage 2412 may vary relative to the timing of execution of stage 2410 . For example: stage 2412 may optionally be performed before, at the same time, partly at the same time, or after performing stage 2410 . Referring to the example of the figure, stage 2412 may optionally be performed by processor 2304 . Examples of methods for performing this identification of stage 2412 are discussed with respect to method 2500 .

階段2414包括:不理會該第二不可用PS群組的多個第二幀檢測級別,基於該第二可用PS群組的該多個第二幀檢測級別產生一第二影像。重要的是,階段2414包括產生該第二影像,同時忽略至少兩個PS的該多個輸出(多個檢測級別),至少兩個PS的多個輸出被用於產生該第一影像。基於該第一幀的該FET,這些至少兩個PS被識別為可用,並且被識別為可用於產生該第一影像(即,至少該第二個PS及該第三個PS)。該第二影像的該產生可以使用任何合適的方法被實現,包括上面關於該第一影像的該產生被討論的任何方法、技術及變體。關於該第二不可用PS群組,要被注意的是,由於在該第二影像的該產生中忽略那些PS的檢測資料,因此多個替換值可以用任何合適的方式(如果被需要)被計算。在階段2414後,該第二影像然後可以被提供給一外部系統(譬如一螢幕監視器、一記憶體單元、一通訊系統、一影像處理電腦),然後可以使用一個或多個影像處理算法進行處理,或者可以然後根據需要進行其它處理。Stage 2414 includes generating a second image based on the second frame detection levels of the second usable PS group regardless of the second frame detection levels of the second unavailable PS group. Importantly, stage 2414 includes generating the second image while ignoring the outputs (detection levels) of at least two PSs that were used to generate the first image. Based on the FET of the first frame, the at least two PSs are identified as available and identified as available for generating the first image (ie, at least the second PS and the third PS). The generation of the second image may be accomplished using any suitable method, including any of the methods, techniques and variations discussed above with respect to the generation of the first image. With respect to the second group of unusable PSs, it is to be noted that since detection data for those PSs are ignored in the generation of the second image, replacement values may be used in any suitable manner (if required). calculate. After stage 2414, the second image can then be provided to an external system (e.g., a screen monitor, a memory unit, a communication system, an image processing computer), which can then be processed using one or more image processing algorithms. processing, or may then perform other processing as desired.

對於由光電探測器感測器擷取的許多的幀,無論是否為多個連續的幀,階段2410至2414可以被重複執行多次。要被注意的是,在一些實現方案中,例如:如果高動態範圍(HDR)成像技術被實現,則該第二影像可以基於幾個幀的多個檢測級別被產生。在其它實現方案中,該第二影像是通過單個幀的多個第二幀檢測級別被產生。階段2410及2414的多個實例可以跟隨階段2412的單個實例(譬如如果對於幾個幀使用相同的第二FET)。Stages 2410 to 2414 may be repeated multiple times for a number of frames captured by the photodetector sensor, whether consecutive or not. It is to be noted that in some implementations, for example if high dynamic range (HDR) imaging techniques are implemented, the second image may be generated based on multiple detection levels over several frames. In other implementations, the second image is generated by a plurality of second frame detection levels of a single frame. Multiple instances of stages 2410 and 2414 may follow a single instance of stage 2412 (eg, if the same second FET is used for several frames).

步驟2416在接收到該第二幀資訊後被執行,並且包括:決定一第三FET,該第三FET比該第一FET更長並且比該第二FET更短。該第三FET的該決定包括:決定對於該多個相關PD的該暴露的一持續時間(譬如以毫秒、其諸多部分或諸多倍數為單位)。階段2416還可以包括:決定多個附加時機參數(譬如該曝光的一開始時間),但這不是必須的。該第三FET可以出於任何原因被選擇,例如以上關於階段2408中的該第二FET的該決定被討論的原因。該第三FET可以比第一FET更長任何比率,無論是相對較低的值(譬如×1.1倍、×1.5倍)、超過幾倍的值(譬如×2、×5),或是任何更高的值(譬如×20、×100、×5,000)。該第三FET可以比該第二FET更短任何比率,無論是相對較低的值(譬如×1.1倍、×1.5倍),超過幾倍(譬如×2、×5),或是任何更高的值(例如×20、×100、×5,000)。參考附圖的示例,階段2416可以可選地由控制器2314及/或處理器2304執行。可選地,一外部系統可以決定該第一FET或通過EO系統2300影響該FET的該設置。Step 2416 is executed after receiving the second frame information, and includes: determining a third FET, the third FET is longer than the first FET and shorter than the second FET. The determination of the third FET includes determining a duration (eg, in milliseconds, fractions, or multiples thereof) of the exposure to the associated PDs. Stage 2416 may also include determining a number of additional timing parameters (such as the start time of the exposure), but this is not required. The third FET may be selected for any reason, such as the reasons discussed above with respect to the decision of the second FET in stage 2408 . The third FET can be longer than the first FET by any ratio, whether it is a relatively low value (such as ×1.1 times, ×1.5 times), more than a few times the value (such as ×2, ×5), or any more High values (such as ×20, ×100, ×5,000). The third FET can be shorter than the second FET by any ratio, whether it is a relatively low value (such as ×1.1 times, ×1.5 times), more than a few times (such as ×2, ×5), or any higher value (eg ×20, ×100, ×5,000). Referring to the examples of the figures, stage 2416 may optionally be performed by controller 2314 and/or processor 2304 . Alternatively, an external system can determine the first FET or affect the setting of the FET through the EO system 2300 .

方法2400的階段2420包括接收第三幀資訊。該第三幀資訊包括對於該PDA的多個PS中的每個PS的一第三幀檢測級別,該第三幀檢測級別指示在該第三FET中由相對應PS檢測的光的一強度。要被注意的是,該第三幀(在此中用於該第三幀資訊的該檢測資料被收集)可以直接跟隨該第二幀,但這不是必須的。在該第二幀與該第三幀之間的一個或多個中間幀(如果有任何的)中的任何一個的多個FET可以等於該第二FET、該第三FET或任何其它FET(更長的或更短的)。參考附圖的示例,階段2420可以可選地由處理器2304執行(譬如經由讀出電路2318)。Stage 2420 of method 2400 includes receiving a third frame of information. The third frame information includes a third frame detection level for each of the PSs of the PDA, the third frame detection level indicating an intensity of light detected in the third FET by the corresponding PS. It is to be noted that the third frame (in which the detection data for the third frame information is collected) may directly follow the second frame, but this is not required. The FETs of any one of one or more intermediate frames (if any) between the second frame and the third frame may be equal to the second FET, the third FET, or any other FET (more long or short). Referring to the example of the figure, stage 2420 may optionally be performed by processor 2304 (eg, via readout circuitry 2318).

階段2420包括基於該第三FET從該PDD的多個PS中識別該PDA的至少兩種類型的PS: a. 用於該第三幀的一可用PS群組(被稱為“第三可用PS群組(third group of usable PSs)”)包括該第一個PS及該第二個PS。 b. 用於該第三幀的一不可用PS群組(被稱為“一第三不可用PS群組(a third group of unusable PSs)”)包括該第三個PS及該第四個PS。Stage 2420 includes identifying at least two types of PSs of the PDA from the plurality of PSs of the PDD based on the third FET: a. A usable PS group (referred to as "third group of usable PSs") for the third frame includes the first PS and the second PS. b. an unusable PS group (referred to as "a third group of unusable PSs)" for the third frame includes the third PS and the fourth PS .

即是,由於該第三幀相對於該第一幀的該FET更長,該第二個PS在階段2404中被識別為屬於該第一可用PS群組(即,前述用於該第一幀的一可用PS群組)在階段2420被識別為屬於該第三不可用PS群組(即,前述用於該第三幀的一不可用PS群組)。由於該第三幀相對於該第二幀的該FET更長,該第三個PS在階段2412中被識別為屬於該第二不可用PS群組(即,前述用於該第二幀的一不可用PS群組)在階段2420中被識別為屬於該第三可用PS群組(即,前述用於該第三幀的一可用PS群組)。That is, since the FET of the third frame is longer relative to the first frame, the second PS is identified in stage 2404 as belonging to the first group of available PSs (i.e., the aforementioned ) is identified as belonging to the third unavailable PS group (ie, the aforementioned unavailable PS group for the third frame) at stage 2420 . Since the third frame is longer than the FET of the second frame, the third PS is identified in stage 2412 as belonging to the second group of unavailable PSs (i.e., the one previously described for the second frame unavailable PS group) is identified in stage 2420 as belonging to the third available PS group (ie, the aforementioned available PS group for the third frame).

階段2420的該識別可以用不同的方式被實現,諸如以上關於階段2404被討論的那些中的任何一者或多者。出於各種原因,譬如:如以上關於階段2412被討論的,被認為可用於較短的FET的多個PS可能在階段2420中被認為對於較長的FET是不可用的。出於各種原因,被認為不可用於較長的FET的多個PS可能在階段2420中被認為對於該較短的FET是可用的。例如:如果這樣的多個PS具有的電荷儲存能力(譬如電容)大於該第二不可用PS群組中的一些PS的電荷儲存能力,則那些不同的PS的電荷儲存能力可以被認為在比該第二FET的一更短的積分時間內對於該檢測訊號及該被累積的暗電流是足夠的。This identification of stage 2420 may be achieved in different ways, such as any one or more of those discussed above with respect to stage 2404 . For various reasons, such as: as discussed above with respect to stage 2412 , multiple PSs considered available for shorter FETs may be considered unavailable for longer FETs in stage 2420 . For various reasons, multiple PSs that are considered unavailable for the longer FET may be considered available for the shorter FET in stage 2420 . For example: if such a plurality of PSs have charge storage capabilities (such as capacitance) that are greater than those of some of the PSs in the second group of unavailable PSs, the charge storage capabilities of those different PSs may be considered to be lower than the charge storage capabilities of the PSs. A shorter integration time of the second FET is sufficient for the detection signal and the accumulated dark current.

階段2420在階段2416後被執行(因為它基於階段2416的該多個輸出)。相對於階段2416的執行時機,階段2420的執行時機可以改變。例如:階段2420可以可選地在執行階段2416之前、同時、部分同時或之後被執行。參考附圖的示例,階段2420可以可選地由處理器2304及/或控制器2314執行。用於執行階段2420的識別的諸多方法的諸多示例被討論關於方法1100。Stage 2420 is performed after stage 2416 (because it is based on the multiple outputs of stage 2416). The timing of execution of stage 2420 may vary relative to the timing of execution of stage 2416 . For example: stage 2420 may optionally be performed before, at the same time, partly at the same time, or after performing stage 2416 . Referring to the examples of the figures, stage 2420 may optionally be performed by processor 2304 and/or controller 2314 . Examples of methods for performing the identification of stage 2420 are discussed with respect to method 1100 .

階段2422包括:不理會該第三不可用PS群組的多個第三幀檢測級別,基於該第三可用PS群組的該多個第三幀檢測級別以產生一第三影像。重要的是,階段2422包括產生該第三影像,同時忽略至少一個PS的該多個輸出(檢測級別),該至少一個PS的多個輸出被用於該第一影像的該產生(譬如該第二個PS),同時利用至少一個PS的該多個輸出,該至少一個PS的多個輸出在該第二影像的該產生(譬如該第三個PS)。該第三影像的該產生可以使用任何合適的方法被實現,包括以上關於該第一影像的該產生被討論的任何方法、技術及變體。關於該第三不可用PS群組,要被注意的是,由於這些PS的檢測資料在該第三影像的該產生被忽略,因此多個替換值可以用任何合適的方式(如果被需要)被計算。在階段2422之後,該第三影像可以被提供給一外部系統(譬如一螢幕監視器、一記憶體單元、一通訊系統、一影像處理電腦)。在階段2422後,該第三影像可以使用一個或多個影像處理算法被處理。在階段2422後,該第三影像然後可以按期望以其它方式被處理。Stage 2422 includes generating a third image based on the third frame detection levels of the third usable PS group regardless of the third frame detection levels of the third unavailable PS group. Importantly, stage 2422 includes generating the third image while ignoring the outputs (detection levels) of at least one PS that were used for the generation of the first image (such as the first two PSs), simultaneously utilizing the multiple outputs of at least one PS in the generation of the second image (eg, the third PS). The generation of the third image may be accomplished using any suitable method, including any of the methods, techniques and variations discussed above with respect to the generation of the first image. Regarding the third group of unusable PSs, it is to be noted that since the detection data of these PSs are ignored in the generation of the third image, replacement values can be used in any suitable way (if required). calculate. After stage 2422, the third image may be provided to an external system (eg, a screen monitor, a memory unit, a communication system, an image processing computer). After stage 2422, the third image may be processed using one or more image processing algorithms. After stage 2422, the third image can then be otherwise processed as desired.

可選地,在方法2400中的一個或多個影像(譬如該第一影像、該第二影像、該第三影像)的產生可以基於評估對於該相應的影像的至少一個PS的暗電流累積的一先前階段,譬如至少基於該相應的FET、在該擷取光訊號或接近光訊號中的電測量,諸如此類。例如:這種測量可以包括:在被保持在黑暗中的一參考PS上測量暗電流(或另一指示性測量)。該相應影像的該產生可以包括:從一個或多個PS的該檢測訊號減去與該PS的該暗電流評估有關的一幅度,以給出該PDA的該FOV的一更準確的表徵。可選地,此階段的補償暗電流累積僅對於該相應影像的多個可用PS執行。Optionally, the generation of one or more images (e.g., the first image, the second image, the third image) in method 2400 may be based on evaluating the cumulative dark current of at least one PS for the corresponding image. A previous stage, for example based at least on the corresponding FET, on electrical measurements in the extracted or near optical signal, and the like. For example: such measurements may include measuring dark current (or another indicative measurement) on a reference PS kept in the dark. The generation of the corresponding image may include subtracting a magnitude associated with the dark current estimate of the PS from the detection signal of one or more PSs to give a more accurate representation of the FOV of the PDA. Optionally, the compensation dark current accumulation at this stage is only performed for a plurality of available PSs of the corresponding image.

在以相對較高的暗電流為特徵的一PDA中(譬如由於它的多個PD的類型及特性的一結果),其中檢測電荷被收集的該各個PS的該電容可能因暗電流而變成飽和(部分或全部),幾乎沒有動態範圍用於檢測環境光(從該系統的一視野到達)。即使當從該多個檢測訊號減去多個暗電流級別的裝置被實現(譬如以對該檢測資料進行正規化)時,缺少用於檢測的動態範圍也意謂所得訊號完全飽和,或者不足以有意義地檢測多個環境光級別。由於來自該PD的暗電流在該FET被累積在該電容(無論該多個PS的實際電容器或其它構件的寄生電容或殘餘電容)中,因此該方法使用該FET以決定該PS可用於該相應的FET,在為整個FET收集該暗電流(或其至少相關部分)的該電荷後,在該電容中會留有足夠的動態範圍。用於一幀的一不可用PS群組的該識別可以包括:在給定該相應的幀的該FET的情況下,識別多個PS,該多個PS的動態範圍低於一可接受閾值(或否則被預期無法通過一動態範圍充分性標準)。同樣地,對於一幀的一可用PS群組的該識別可以包括:在給定該對應的幀的該FET的情況下,識別多個PS,該多個PS的動態範圍高於一可接受閾值(或者否則被預期滿足一動態範圍充足性標準)。前述的兩個可接受閾值可以是相同閾值或不同閾值(例如:如果多個PS的動態範圍在那些閾值之間被不同地對待,譬如被識別為屬於該相關的幀的一部分可用PS組)。In a PDA characterized by relatively high dark current (e.g. as a result of the type and characteristics of its PDs), the capacitance of the individual PS where the sense charge is collected may become saturated by dark current (Part or all), there is almost no dynamic range for detecting ambient light (reaching from a field of view of the system). Even when means are implemented to subtract dark current levels from the detected signals (e.g. to normalize the detected data), the lack of dynamic range for detection means that the resulting signal is fully saturated, or insufficient Meaningfully detect multiple ambient light levels. Since the dark current from the PD is accumulated in the capacitance at the FET (regardless of the actual capacitors of the PSs or the parasitic or residual capacitance of other components), the method uses the FET to determine the PS available for the corresponding After collecting the charge of the dark current (or at least a relevant part thereof) for the entire FET, there will be sufficient dynamic range left in the capacitance. The identification of an unavailable group of PSs for a frame may include identifying PSs whose dynamic range is below an acceptable threshold ( or otherwise expected to fail a dynamic range adequacy criterion). Likewise, the identification of an available group of PSs for a frame may include identifying PSs having a dynamic range above an acceptable threshold given the FET of the corresponding frame (or otherwise expected to meet a dynamic range sufficiency criterion). The aforementioned two acceptable thresholds may be the same threshold or different thresholds (eg if the dynamic ranges of multiple PSs are treated differently between those thresholds, eg identified as being part of the set of available PSs for the relevant frame).

總體上參考方法2400,要被注意的是,對於多個附加FET(譬如一第四FET,諸如此類),多個階段2416、2418、2420及2422的多個附加實例可以被重複。這樣的時間可以更長、更短或等於任何先前使用的FET。還要被注意的是,可選地,該第一FET、該第二FET及該第三FET是多個連續的FET(即在該第一FET與該第三FET之間該PDA不使用其它FET)。替代地,其它FET可以在第一FET及第三FET之間被使用。Referring generally to method 2400, it is noted that additional instances of stages 2416, 2418, 2420, and 2422 may be repeated for additional FETs (eg, a fourth FET, etc.). Such time can be longer, shorter or equal to any previously used FET. Also note that, optionally, the first FET, the second FET, and the third FET are consecutive FETs (i.e., the PDA uses no other FETs between the first FET and the third FET). FET). Alternatively, other FETs may be used between the first and third FETs.

要被注意的是,即使該曝光值(EV)保持相同,多個不同的可用PS群組及不可用PS也可以在方法2400中對於不同的FET被決定。例如:考慮一種情況,其中該第一FET以一因數q被擴展,以提供該第二FET,但該F數以一因數q被增加,使得由PDA接收的總照明度是實質相同。在這樣的一情況下,即使該EV保持恒定,該第二不可用PS群組將包括除在該第一不可用PS群組中被包括的那些PS之外的其它PS,因為該暗電流累積以一因數p增長。It is to be noted that multiple different groups of available PSs and unavailable PSs may be determined for different FETs in method 2400 even if the exposure value (EV) remains the same. For example: consider a situation where the first FET is expanded by a factor q to provide the second FET, but the F-number is increased by a factor q such that the total illuminance received by the PDA is substantially the same. In such a case, even if the EV remains constant, the second unavailable PS group will include PSs other than those included in the first unavailable PS group, because the dark current accumulates grows by a factor p.

一種非暫時性電腦可讀媒體被提供,用於基於一PDA的資料產生影像資訊,該非暫時性電腦可讀媒體包括被儲存在其上的多個指令,當該多個指令在一處理器上被執行時,進行以下步驟:接收第一幀資訊,該第一幀資訊包括對於該PDA的多個PS中的每個PS的一第一幀檢測級別,該第一幀檢測級別指示在一第一FET中由該各個PS所檢測的一光強度;基於該第一FET,從該PDD的該多個PS中識別:一第一可用PS群組,包括一第一個PS、一第二個PS及一第三個PS,以及一第一不可用PS群組,包括一第四個PS;不理會該第一不可用PS群組的多個第一幀檢測級別,基於該第一可用PS群組的該第一幀檢測級別產生一第一影像;在接收該第一幀資訊後,決定一第二FET,該FET比該第一FET更長;接收第二幀資訊,該第二幀資訊包括用於該PDA的該多個PS中的每個PS的一第二幀檢測級別,該第二幀檢測級別指示在一第二FET中由該各個PS所檢測的一光強度;基於第二FET,從該PDD的該多個PS中識別:一第二可用PS群組,包括該第一個PS,以及一第二不可用PS群組,包括該第二個PS、該第三個PS及該第四個PS;不理會該第二不可用PS群組的多個第二幀檢測級別,基於該第二可用PS群組的該多個第二幀檢測級別產生一第二影像;在接收該第二幀資訊後,決定一第三FET,該第三FET比該第一FET更長且比該第二FET更短;接收第三幀資訊,該第三幀資訊包括用於該PDA的該多個PS中的每個PS的一第三幀檢測級別,該第三幀檢測級別指示在一第三FET中由該各個PS所檢測的一光強度;基於該第三FET,從該PDD的多個PS中識別:一第三可用PS群組,包括該第一個PS及該第二個PS,以及一第三不可用PS群組,包括該第三個PS及該第四個PS;及不理會該第三不可用PS群組的多個第三幀檢測級別,基於該第三可用PS群組的該多個第三幀檢測級別產生一第三影像。A non-transitory computer-readable medium is provided for generating image information based on data from a PDA, the non-transitory computer-readable medium including instructions stored thereon when the instructions are executed on a processor When being executed, the following steps are performed: receiving first frame information, the first frame information includes a first frame detection level for each PS in a plurality of PSs of the PDA, and the first frame detection level indicates that in a first A light intensity detected by the individual PSs in a FET; based on the first FET, identifying from the plurality of PSs of the PDD: a first group of available PSs, comprising a first PS, a second PS and a third PS, and a first unavailable PS group, including a fourth PS; disregarding the multiple first frame detection levels of the first unavailable PS group, based on the first available PS The first frame detection level of the group generates a first image; after receiving the first frame information, a second FET is determined, and the FET is longer than the first FET; the second frame information is received, and the second frame The information includes a second frame detection level for each of the plurality of PSs of the PDA, the second frame detection level indicating a light intensity detected by the respective PS in a second FET; based on the first Two FETs identifying from the plurality of PSs of the PDD: a second group of available PSs, including the first PS, and a second group of unavailable PSs, including the second PS, the third PS PS and the fourth PS; disregarding the plurality of second frame detection levels of the second unavailable PS group, generating a second image based on the plurality of second frame detection levels of the second available PS group; After receiving the second frame information, determine a third FET, the third FET is longer than the first FET and shorter than the second FET; receive the third frame information, the third frame information includes information for the a third frame detection level of each PS in the plurality of PSs of the PDA, the third frame detection level indicating a light intensity detected by the respective PS in a third FET; based on the third FET, from Identify among the plurality of PSs of the PDD: a third group of available PSs, including the first PS and the second PS, and a third group of unavailable PSs, including the third PS and the fourth PS PS; and disregarding the plurality of third frame detection levels of the third unavailable PS group, generating a third image based on the plurality of third frame detection levels of the third usable PS group.

先前段落的該非暫時性電腦可讀媒體可以包括:被儲存在其上的多個附加指令,當該多個指令在一處理器上被執行時,執行以上相對於方法2400被討論的任何其它步驟或變體。The non-transitory computer-readable medium of the preceding paragraph may include additional instructions stored thereon that, when executed on a processor, perform any of the other steps discussed above with respect to method 2400 or variants.

第25圖是示出根據目前公開的主題的諸多示例的用以在不同的FET中產生用於PDA操作的模型的方法2500的一流程圖。識別該多個PS中的哪個PS屬於提供有一給定FET的一可用PS群組(以及諸多可能的附加參數,諸如溫度、在多個PD上的偏壓、多個PS的電容等)可以在不同的FET基於該多個PS中的每個PS的該行為的一模型。這樣的建模可以是方法2400的一部分,或者可以在它之前單獨執行。對於多個PDA(譬如PDA 1602)的多個PS中的每個PS,並且可能對於該光電探測器陣列的所有PS,執行方法2500的多個階段2502、2504及2506。FIG. 25 is a flowchart illustrating a method 2500 to generate models for PDA operation in different FETs, according to examples of the presently disclosed subject matter. Identifying which of the multiple PSs belongs to a group of available PSs that provide a given FET (and possibly many additional parameters such as temperature, bias voltage on multiple PDs, capacitance of multiple PSs, etc.) can be done in The different FETs are based on a model of the behavior of each of the plurality of PSs. Such modeling may be part of method 2400, or may be performed separately prior to it. Stages 2502, 2504, and 2506 of method 2500 are performed for each of PSs of multiple PDAs, such as PDA 1602, and possibly for all PSs of the photodetector array.

階段2502包括:決定多個不同的FET中的每個FET的該相應PS的可用性。該可用性的該決定可以用不同的方式被執行。例如:該PS的一檢測訊號可以與一期望值(譬如如果照明級別是已知的,可能是完全暗的,或者是一已知較高照明級別)進行比較、與在其它多個PS中的一平均值進行比較、與在其它多個PS中的多個檢測級別(譬如如果所有PS都在成像一個色均勻目標)進行比較、與在其它多個FET中的多個檢測結果(譬如決定在持續時間T例如200奈秒處的該檢測級別是否大約是在T/2處的該檢測級別的兩倍例如330奈秒)進行比較,諸如此類。該被決定的可用性可以是一個二進制值(譬如可用或不可用)、一個非二進制值(譬如一標量評估可用性級別或指示其可用性)、一組值(譬如一向量)或任何其它合適的格式。可選地,對於多個PS中的所有PS使用相同的多個幀FET,但這不是必須的。例如:在一個非二進制可用性評估中,介於完全不可用與完全可用之間的一中間值可能指示的是,在其它可用時間(或部分可用)的時間,該相應PS的該檢測訊號應與多個相鄰PS的多個檢測訊號及/或與相同的多個PS的其它讀數結合或平均。Stage 2502 includes determining availability of the corresponding PS for each of a plurality of different FETs. The determination of the availability can be performed in different ways. For example: a detection signal of the PS can be compared with an expected value (such as complete darkness if the lighting level is known, or a known higher lighting level), and a detection signal in other PSs. comparisons with multiple detection levels in other multiple PSs (e.g. if all PSs are imaging a color uniform target), with multiple detection results in other multiple FETs (e.g. to determine whether the detection level at time T, eg, 200 ns, is approximately double the detection level at T/2, eg, 330 ns), and so on. The determined availability may be a binary value (such as available or unavailable), a non-binary value (such as a scalar evaluating the availability level or indicating its availability), a set of values (such as a vector), or any other suitable format. Optionally, the same multiple frame FETs are used for all of the multiple PSs, but this is not required. For example, in a non-binary availability assessment, an intermediate value between fully unavailable and fully available may indicate that at other times of availability (or partial availability), the detection signal of the corresponding PS should be consistent with Multiple detection signals from multiple neighboring PSs are combined or averaged with other readings from the same multiple PSs.

方法2500可以包括:測量該相應PS的電荷累積容量及/或飽和參數的一可選階段2504。該電荷容量可以用任何合適的方式被測量,譬如使用來自該PD、來自該PS中其它電源(譬如電流源)、來自該PDA中的其它電源或來自一外部電源(譬如在製造光電檢測器的製造工廠中的校準機)。階段2504可以被省略,例如:在差異是在不同的PS之間的電容為可忽略或被簡單地忽略的情況下。Method 2500 may include an optional stage 2504 of measuring the charge accumulation capacity and/or saturation parameters of the corresponding PS. The charge capacity can be measured in any suitable manner, such as using a power source from the PD, from another power source in the PS (such as a current source), from another power source in the PDA, or from an external power source (such as in a photodetector fabrication process). Calibration machines in manufacturing plants). Stage 2504 may be omitted, for example, where the difference is that the capacitance between different PSs is negligible or simply ignored.

階段2506包括為相應PS創建一可用性預測模型(usability prediction model),該可用性預測模型提供在不同的FET操作時該PS的可用性的估計,這些不同FET未被包括在階段2502中被主動決定該可用性的該多個FET中。該多個不同的FET可以被包括在階段2502的該多個FET的相同持續時間跨度中,從它更長或從它更短。該被創建的可用性預測模型可以提供不同類型的可用性指示,諸如:一個二進制值(譬如可用或不可用)、一非二進制值(譬如一標量評估可用性或其指示性)、一組值(譬如一向量)或任何其它合適的格式。由該模型指示的該可用性類型可以是在階段2502中被決定的相同類型的可用性或其差異。例如:階段2502可以包括:評估在不同的FET中被收集的該暗電流,而階段2504可以包括:決定一時間閾值,該時間閾值指示此PS被認為是可用的最大允許FET。可選地,該可用性模型可以考慮各個PS的電荷累積容量。Stage 2506 includes creating a usability prediction model for the corresponding PS that provides an estimate of the availability of the PS while operating different FETs that were not included in stage 2502 to actively determine the availability of the multiple FETs. The plurality of different FETs may be included in the same time span of the plurality of FETs of stage 2502 , longer from it or shorter from it. The created availability prediction model can provide different types of availability indications, such as: a binary value (such as available or unavailable), a non-binary value (such as a scalar assessing availability or its indication), a set of values (such as a vector) or any other suitable format. The availability type indicated by the model may be the same type of availability as decided in stage 2502 or a difference thereof. For example, stage 2502 may include evaluating the dark current collected in different FETs, while stage 2504 may include determining a time threshold indicating the maximum allowable FET that the PS is considered usable. Optionally, the availability model may take into account the charge accumulation capacity of individual PSs.

任何合適的方式可以被使用以創建該可用性預測模型。例如:對於不同的FET,可以對於該PD測量或評估不同的暗電流,然後進行一回歸分析以決定可以評估其它多個FET中的該暗電流的一函數(多項式,指數等)。Any suitable approach can be used to create the availability prediction model. For example, for different FETs, different dark currents can be measured or evaluated for the PD, and then a regression analysis can be performed to determine a function (polynomial, exponential, etc.) that can evaluate the dark current in other FETs.

可選階段2508包括:對於PDA的至少一部分,至少包括該先前階段的該多個PS,進行編譯一可用性模型。例如:階段2508可以包括:產生一個或多個矩陣或其它類型的映射,該映射在它的多個單元中對於該各個PS儲存多個模型參數。例如:如果階段2506包括對於每個PS(p,s)創建一暗電流線性回歸函數,該暗電流線性回歸函數由DarkCurrent(p,s)=Aₚ,ₛ·τ+Bₚ,ₛ (其中τ是該FET,並且Aₚ,ₛ及Bₚ,ₛ是該線性回歸的該線性係數)提供,然後可以產生一矩陣A以儲存多個不同的Aₚ,ₛ值,並且可以產生一矩陣B以儲存多個不同的Bₚ,ₛ值。如果需要,一第三矩陣C可以被用於對於多個不同的PS儲存不同的電容值Cₚ,ₛ (或不同的飽和度值Sₚ,ₛ)。Optional stage 2508 includes compiling an usability model for at least a portion of the PDA, including at least the plurality of PSs of the previous stage. For example, stage 2508 may include generating one or more matrices or other types of maps that store, in its cells, a number of model parameters for the respective PS. For example: if stage 2506 includes creating a dark current linear regression function for each PS(p,s), the dark current linear regression function is given by DarkCurrent(p,s)=Aₚ,ₛ·τ+Bₚ,ₛ (where τ is the FET, and Aₚ,ₛ and Bₚ,ₛ are the linear coefficients of the linear regression), then a matrix A can be generated to store a number of different Aₚ,ₛ values, and a matrix B can be generated to store a number of different The value of Bₚ,ₛ. If desired, a third matrix C can be used to store different capacitance values Cₚ,ₛ (or different saturation values Sₚ,ₛ) for multiple different PSs.

階段2506(或階段2508,如果被實現)後續可以是可選階段2510,該可選階段2510包括基於階段2506(或階段2508,如果被實現)的該多個結果決定不是用於階段2502的該多個FET中的一FET的該多個PS的可用性。例如:階段2510可以包括:對於該光電檢測器陣列的多個不同PS創建不可用PS的一掩模(譬如一矩陣)。Stage 2506 (or stage 2508, if implemented) may be followed by optional stage 2510, which includes deciding not to use the multiple results of stage 2506 (or stage 2508, if implemented) for the phase 2502. Availability of the plurality of PSs for a FET of the plurality of FETs. For example, stage 2510 may include creating a mask (eg, a matrix) of unusable PSs for a plurality of different PSs of the photodetector array.

完整地參考方法2500,階段2502可以包括:決定在四個不同FET(譬如33ns、330ns、600ns及2000ns)的該PDA的每個PS的暗電流。階段2504可以包括:決定對於每個PS的一飽和度值,並且階段2506可以包括:對於每個PS的隨時間的暗電流累積創建一多項式回歸(polynomial regression)。在此示例中的階段2508可以包括:產生一矩陣,在每個單元中儲存該FET,其中該PS的該暗電流(根據回歸分析)將使該PS飽和。階段2510可以包括:接收一新FET,並通過產生一個二進制矩陣,該二進制矩陣儲存用於每個不可用PS(其中該FET高於該儲存值)的一第一值(譬如“0”)及用於每個可用PS(其中該FET低於該儲存值)的一第二值(譬如“1”),以決定該矩陣的每個單元是低於還是高於該儲存值。Referring to method 2500 in its entirety, stage 2502 may include determining the dark current for each PS of the PDA at four different FETs (eg, 33 ns, 330 ns, 600 ns, and 2000 ns). Stage 2504 may include determining a saturation value for each PS, and stage 2506 may include creating a polynomial regression for each PS of dark current accumulation over time. Stage 2508 in this example may include generating a matrix, storing in each cell the FETs where the dark current of the PS (according to regression analysis) will saturate the PS. Stage 2510 may include receiving a new FET and storing a first value (such as "0") for each unavailable PS (where the FET is above the stored value) by generating a binary matrix and A second value (such as "1") for each available PS (where the FET is below the stored value) to determine whether each cell of the matrix is below or above the stored value.

方法2500的任何階段都可以在該PDA的製造過程中(譬如在工廠校準中)、該系統的操作過程中(譬如在將包括該PDA的一EO系統安裝在它被指定的位置,諸如一車輛、監視系統等之後),或在這些時間之間或之後的任何其它合適的時間進行。可以在不同的時間執行不同的階段。Any stage of method 2500 can be during the manufacture of the PDA (such as during factory calibration), during the operation of the system (such as during installation of an EO system including the PDA in its intended location, such as a vehicle , monitoring system, etc.), or at any other suitable time between or after these times. Different phases can be performed at different times.

完整地參考方法2400,要被注意的是,可以比照在不同的階段以不同的操作條件(譬如當不同的經受不同的溫度時,當向多個PD供應多個不同的偏壓時)被擴展以測量暗電流對多個不同FET中的多個不同PS的影響。Referring to method 2400 in its entirety, it is to be noted that can be extended by referring to different operating conditions at different stages (such as when different PDs are subjected to different temperatures, when multiple different bias voltages are supplied to multiple PDs). to measure the effect of dark current on multiple different PSs in multiple different FETs.

可選地,作為方法2400的一部分的該決定一FET(譬如該第二FET、該第三FET)可以包括:最大化該對應FET,同時將用於該相應幀的不可用PS的一數量保持在一預定閾值以下。例如:為了最大程度地收集多個訊號,方法2400可以包括:設置接近一閾值的一FET,該閾值與一預定數量的不可用PS相關(譬如要求至少99%的該PDA的多個PS為可用,允許多達1%的該多個PS為不可用)。要被注意的是,在某些情況下,該最大化可能不會產出該確切最大持續時間,但一持續時間接近它(譬如在數學上的最大持續時間的320%以上或325%以上)。例如:可以選擇多個離散的預定義時間跨度中的該最大幀持續時間。Optionally, the determining a FET (e.g., the second FET, the third FET) as part of method 2400 may include maximizing the corresponding FET while maintaining a number of unavailable PSs for the corresponding frame below a predetermined threshold. For example, to maximize signal collection, method 2400 may include setting a FET close to a threshold associated with a predetermined number of unavailable PSs (e.g., requiring at least 99% of the PDA's PSs to be available) , allowing up to 1% of the multiple PSs to be unavailable). Note that in some cases the maximization may not yield the exact maximum duration, but a duration close to it (eg above 320% or above 325% of the mathematical maximum duration) . For example: the maximum frame duration may be selected in a number of discrete predefined time spans.

例如:作為方法2400的一部分的一決定一FET可以包括:決定一FET,該FET比其它多個可能的FET長,從而致使比一先前FET更多的多個PS,從而使得與這樣的其它可能的FET相比,一更高數量的多個PS被認為不可用,但改善在其餘多個PS中的影像質量。這可能會很有用,例如:在相對黑暗的條件下。要被注意的是,可選地,該FET的該決定(譬如通過嘗試使它最大化)可以考慮是在多個不同FET中被認為不可用的多個PS的該空間分佈。例如:知道在該PDA的某些區域中,一累積的多個PS具備高百分比的該PS,其將在某個FET之上被認為不可用,這可能會致使決定低於該閾值的一FET,尤其是如果這是該FOV的一重要部分(譬如在該FOV的一中心,或在一先前幀中被識別出行人或車輛的位置)。For example: determining a FET as part of method 2400 may include determining a FET that is longer than other possible FETs, thereby resulting in more PSs than a previous FET, thereby making a difference with such other possible FETs. A higher number of PSs is considered unusable compared to FETs, but improves image quality in the remaining PSs. This can be useful, for example: in relatively dark conditions. It is to be noted that optionally the decision of the FET (eg by trying to maximize it) may take into account the spatial distribution of PSs which are considered unavailable in different FETs. For example: knowing that in certain areas of the PDA, a cumulative number of PSs with a high percentage of the PS, which would be considered unusable above a certain FET, may lead to a decision on a FET below that threshold , especially if this is an important part of the FOV (eg in a center of the FOV, or where a pedestrian or vehicle was identified in a previous frame).

方法2400可以包括:基於在多個不同FET被檢測的兩個或更多個幀的多個檢測級別以創建單個影像,其中多個不同的不可用PS群組被用於不同的FET。例如:可以使用三個FET:×1、×10及×100。可以基於一個或多個PS的該多個檢測級別(譬如在其中該PS為可用、未飽和且檢測一不可忽略的訊號的FET)或多個相鄰PS的多個檢測級別(譬如如果不提供任何可用的檢測訊號,即使在該相應PS被決定為可用的情況下,諸如因為在這樣的一情況下該訊號可忽略不計),以決定對於該影像的每個像素決定的顏色。方法2400可以包括:決定用於組合對單個影像的不同曝光的多個FET(譬如使用高動態範圍成像技術,HDR)。此類FET的該決定可以基於多個不同FET中的不同PS可用性的建模,例如在方法2500中被產生的該模型。方法2400還可包括:決定在兩個或更多個不同的檢測實例中擷取單個影像(其中在每個實例中分別讀取該多個檢測訊號,然後將其相加),每個檢測實例提供足夠的可用PS。例如:代替使用2毫秒的FET進行一場景的單次擷取,方法2400可以包括:決定擷取該場景兩次(譬如兩個1 ms的FET、1.5 ms及0.5 ms的FET),使得每次曝光中的可用PS的數量將超過一預定閾值。Method 2400 may include creating a single image based on multiple detection levels in two or more frames with multiple different unavailable PS groups being detected for different FETs. For example: Three FETs can be used: ×1, ×10 and ×100. The multiple detection levels may be based on one or more PSs (eg, where the PS is available, unsaturated, and a FET detecting a non-negligible signal) or multiple detection levels of multiple neighboring PSs (eg, if no Any available detection signal, even if the corresponding PS is determined to be available, such as because the signal is negligible in such a case), is used to determine the determined color for each pixel of the image. Method 2400 may include determining multiple FETs for combining different exposures of a single image (eg, using high dynamic range imaging techniques, HDR). This determination of such FETs may be based on modeling of different PS availability in a number of different FETs, such as the model generated in method 2500 . Method 2400 may also include deciding to capture a single image in two or more different detection instances (where the plurality of detection signals are read separately in each instance and then summed), each detection instance Provide enough available PS. For example, instead of using a 2 ms FET for a single capture of a scene, method 2400 may include deciding to capture the scene twice (e.g., two 1 ms FETs, 1.5 ms and 0.5 ms FETs) such that each The number of available PSs in the exposure will exceed a predetermined threshold.

可選地,方法2400可以包括:基於不同FET中的不同PS的一可用性模型(譬如在方法2500中被產生的)以及由該PDA擷取的至少一個先前幀的飽和資料,以決定至少一個FET。該飽和資料包括關於在至少一個先前幀的至少一個FET中飽和的多個PS的資訊(譬如多個PS的數量、哪個PS、該PDA的哪些部分)及/或關於在至少前一幀的至少一個FET中幾乎飽和的多個PS的資訊。該飽和度資料可能與緊接在前的幀(或幾幀)有關,因此它指示一幕簾成像場景(curtain imaged scene)的飽和行為(saturation behavior)。Optionally, method 2400 may include determining at least one FET based on an availability model (such as generated in method 2500) of different PSs in different FETs and at least one previous frame of saturation data captured by the PDA. . The saturation data includes information about PSs saturated in at least one FET of at least one previous frame (e.g., number of PSs, which PS, which parts of the PDA) and/or information about at least one FET in at least one previous frame Information on multiple PSs that are nearly saturated in one FET. The saturation profile may relate to the immediately preceding frame (or frames), thus it indicates the saturation behavior of a curtain imaged scene.

方法2400可以進一步包括:對在多個不同FET的該PDA的多個PS的可用性進行建模(譬如通過實現方法2500或任何其它合適的建模方法)。提供在多個不同FET的該PDA的多個PS的一可用性模型(或是方法2400的一部分,或不是方法2400的一部分),方法2400可以包括:(a) 基於該建模的結果決定該第二FET及該第三FET中的至少一個FET;及/或(b) 基於該建模的結果,識別該多不可用PS群組中的至少一者。Method 2400 may further include modeling the availability of PSs of the PDA at different FETs (eg, by implementing method 2500 or any other suitable modeling method). Providing an availability model of PSs of the PDA at different FETs (either as part of method 2400 or not as part of method 2400), method 2400 may include: (a) determining the first at least one of the second FET and the third FET; and/or (b) identifying at least one of the multiple unavailable PS groups based on results of the modeling.

可選地,在決定任何一個或多個FET時,方法2400可包括:決定一FET,該FET在由於該FOV場景的黑暗引起的擴展該FET與該FET的減少之間進行平衡,以限制呈現不可用的PS數量,該數量隨著更長的FET而升高(譬如基於方法2500的模型)。例如:當在相同溫度下且偏壓在該PD上時(使得每個FET中的暗電流保持恒定),階段2408可包括:決定一更長的FET,因為該場景變得更暗(以大量不可用的PS為代價),以及階段2416可以包括:決定一較短的FET,因為該場景再次變亮(從而減少不可用PS的數量)。這在較暗的影像中尤為重要,在較暗的影像中,由暗電流累積(這是由溫度及工作條件而不是照明級別造成)引起的多個PS的可用性限制該FET的延長,這將被進行,如果暗電流累積不會顯著限制各個PS的該動態範圍。在另一示例中,在該場景照明保持恒定的一時間跨度內,階段2408可以包括:決定因溫度下降而被啟用的一更長的FET(從而降低暗電流,並降低每個FET上不可用PS的百分比),而階段2416可能包括:決定一較短的FET,因為該PDA的溫度再次上升。Optionally, in determining any one or more FETs, method 2400 may include determining a FET that balances extending the FET due to darkness of the FOV scene with reducing the FET to limit rendering The amount of unusable PS, which increases with longer FETs (eg, based on the method 2500 model). For example: when at the same temperature and biased across the PD (so that the dark current in each FET remains constant), stage 2408 may include deciding on a longer FET as the scene becomes darker (by a large amount) unusable PS), and stage 2416 may include deciding on a shorter FET as the scene becomes brighter again (thereby reducing the number of unusable PS). This is especially important in darker images where the availability of multiple PSs caused by dark current buildup (which is caused by temperature and operating conditions rather than lighting levels) limits the length of the FET, which will is performed if dark current accumulation does not significantly limit the dynamic range of the individual PS. In another example, during the span of time that the scene illumination remains constant, stage 2408 may include deciding to enable a longer FET due to temperature drop (thus reducing dark current and reducing the unavailable FET on each FET). PS), and stage 2416 may include: determining a shorter FET because the temperature of the PDA rises again.

第26圖是根據本發明的主題的諸多示例的對於在不同FET中的相同場景拍攝的三個幀的方法2400的執行的一圖形表徵。該示例場景包括四個同心矩形,每個矩形比周圍的矩形更暗。第26圖的不同圖對應於方法2400的一階段,並用帶一撇號的一等效參考數字進行編號。例如:圖2406’匹配階段2406的一執行,依此類推。較低的九個圖中的每個矩形代表單個PS,或直接映射到此類PS的一像素(在較低的三個圖中)。在所有圖中,該多個PS相對於該PDD的位置保持不變。FIG. 26 is a graphical representation of the execution of method 2400 for three frames taken of the same scene in different FETs, according to examples of the present inventive subject matter. The example scene consists of four concentric rectangles, each darker than the surrounding rectangles. The different figures of FIG. 26 correspond to a stage of method 2400 and are numbered with an equivalent reference numeral followed by a prime. For example: graph 2406' matches an execution of stage 2406, and so on. Each rectangle in the lower nine figures represents a single PS, or a pixel that maps directly to such a PS (in the lower three figures). In all figures, the positions of the PSs relative to the PDD remain unchanged.

如在許多類型的PDA中常見的那樣,從其接收幀資訊的該PDA可能包括不良的、有缺陷或其它行為異常的諸多PS(也被稱為不良的、有缺陷或其它行為異常的像素)。該術語“行為異常的PS(Misbehaving PS)”在廣義上與偏離它的預期響應的一PS有關,包括但不限於:卡住的、死機的、發熱的、點燃的、溫暖的、有缺陷的及閃爍的PS(stuck, dead, hot, lit, warm, defective, and flashing PSs)。行為異常的諸多PS可能是單個PS或多個PS的群集。可能引起一PS行為異常的諸多缺陷的諸多非限制性示例包括:PS凸點鍵連接性、解決多路多工器中的故障、漸暈、某些PS的嚴重靈敏度不足、非線性、訊號線性差、低滿阱、平均方差線性差、過多的雜訊及高暗電流(PS bump bond connectivity, addressing faults in the multiplexer, vignetting, severe sensitivity deficiency of some PSs, non-linearity, poor signal linearity, low full well, poor mean-variance linearity, excessive noise and high dark current)。在方法2400中被識別為一不可用PS的一個或多個PS可能是一永久性故障PS,或者是基於與FET不相關的條件(譬如由於高溫)而行為異常的PS。可以將此類PS識別為無法用於方法2400的所有FET(譬如PS 8012.5)。但是,要被注意的是,由於功能有限及足夠長的FET(譬如PS 8012.4),某些功能性PS(並非“行為異常(misbehaving)”)可能被認為在方法2400的所有FET中都不可用。可選地,方法2400可以包括:基於除了FET之外的其它參數(譬如溫度、諸多電參數、環境光級別)以決定該PDA的一個或多個PS的可用性。要被注意的是,在這樣的一情況下,由於其它考慮因素(譬如溫度),由於FET的理由而呈現不可用的一PS通常不能被認為是可用的,由於它的電容的限制。As is common in many types of PDAs, the PDA from which frame information is received may include bad, defective or otherwise misbehaving PSs (also known as bad, defective or otherwise misbehaving pixels) . The term "Misbehaving PS" is broadly related to a PS that deviates from its intended response, including but not limited to: stuck, dead, hot, ignited, warm, defective And flashing PSs (stuck, dead, hot, lit, warm, defective, and flashing PSs). The abnormally behaving PS may be a single PS or a cluster of multiple PSs. Non-limiting examples of defects that may cause a PS to misbehave include: PS bump bond connectivity, troubleshooting glitches in multiplexers, vignetting, severe insensitivity of some PSs, non-linearity, signal line PS bump bond connectivity, addressing faults in the multiplexer, vignetting, severe sensitivity deficiency of some PSs, non-linearity, poor signal linearity, low full well, poor mean-variance linearity, excessive noise and high dark current). The one or more PSs identified as an unavailable PS in method 2400 may be a permanently failed PS, or a PS that is behaving abnormally based on conditions unrelated to the FET, such as due to high temperature. Such PSs can be identified as all FETs that cannot be used in method 2400 (such as PS 8012.5). However, it is to be noted that due to limited functionality and sufficiently long FETs (such as PS 8012.4), certain functional PSs (not "misbehaving") may be considered unavailable in all FETs of method 2400 . Optionally, method 2400 may include determining availability of one or more PSs of the PDA based on parameters other than FETs (eg, temperature, electrical parameters, ambient light level). It is to be noted that in such a case, due to other considerations (such as temperature), a PS rendered unusable due to FET reasons cannot usually be considered usable due to its capacitive limitation.

在所示的示例中: a. 可能在所有條件下,PS 8012.5沒有輸出訊號,無論在所有三個FET(T₁、T₂、T₃)中衝擊到它的光量。 b. 可能在所有條件下,PS 8012.4輸出飽和訊號,無論在所有三個FET(T₁、T₂、T₃)中衝擊到它的光量。 c. PS 8012.3在最短的FET(T₁)輸出一可用訊號,但在更長的FET(T₂及T₃)輸出一不可用(飽和)訊號。 d. PS 8012.2在多個較短的FET(T₁及T₃)輸出一可用訊號,但在最長的FET(T₂)輸出一不可用(飽和)訊號。In the example shown: a. Probably under all conditions, the PS 8012.5 has no output signal, regardless of the amount of light hitting it in all three FETs (T₁, T₂, T₃). b. It is possible that under all conditions the PS 8012.4 outputs a saturated signal regardless of the amount of light hitting it in all three FETs (T₁, T₂, T₃). c. PS 8012.3 outputs a usable signal at the shortest FET (T₁), but an unusable (saturated) signal at the longer FETs (T₂ and T₃). d. PS 8012.2 outputs a usable signal on multiple shorter FETs (T₁ and T₃), but outputs an unusable (saturated) signal on the longest FET (T₂).

要被注意的是,也可能發生其它類型的缺陷及錯誤的輸出。舉例來說,此類錯誤可能包括:輸出一高度非線性的訊號響應、始終輸出太強的一訊號、始終輸出太弱的一訊號、輸出隨機或半隨機的輸出,諸如此類。同樣,許多PS(諸如第一個PS 8012.1)可被用於檢測中被使用的所有FET。It is to be noted that other types of defects and erroneous outputs may also occur. Such errors may include, for example, outputting a highly non-linear signal response, consistently outputting a signal that is too strong, consistently outputting a signal that is too weak, outputting random or semi-random outputs, and the like. Also, many PSs (such as the first PS 8012.1) can be used for all FETs used in detection.

回到第23圖,要被注意的是,可選地,系統2300可以是具有動態PS可用性評估能力的一EO系統。即是,EO系統2300可以能夠基於FET及可能的其它操作參數以交替地分配諸多不同PS為可用或不可用,並且僅當在擷取時被決定各個PS為可用時利用多個PS的多個檢測訊號(譬如根據一可用性模型)。Returning to FIG. 23, it is to be noted that, optionally, the system 2300 may be an EO system with dynamic PS availability assessment capability. That is, the EO system 2300 may be able to alternately assign a number of different PSs as available or unavailable based on FETs and possibly other operating parameters, and only utilize multiple Signals are detected (eg according to an availability model).

在這樣的一情況下,EO系統2300包括: a.        PDA 2302,其包括多個PS 2306,每個PS 2306可操作以在不同幀輸出多個檢測訊號。該相應PS 2306對一幀輸出的該檢測訊號指示在一相應幀中衝擊在該相應PS上的光量(並且可能還指示該相應PS的該PD的暗電流)。 b.        一可用性過濾模組(譬如被實現為處理器2304的一部分,或其單獨實現)。該可用性過濾模組可操作以基於一第一FET對於每個PS 2306以決定該PS是不可用(其在不同的PS 2306之間可能是不同的),並且稍後基於比該第一FET更短的一第二FET以決定相同的PS 2306是可用的。即是,在某一點為不可用的諸多PS 2306(並且其輸出在產生一個或多個影像時被忽略)可能稍後會再次變得可用(譬如如果該FET變短),並且這些PS 2306的該諸多輸出可能是有用於再次產生諸多後續影像。 c.        處理器2304可操作以基於該多個PS 2306的多個幀檢測級別以產生多個影像。在處理器2304的其它配置中,它被配置為:(a) 在基於多個第一幀檢測級別產生一第一影像時,排除一被濾波PS的一第一檢測訊號,該被濾波PS的第一檢測訊號由該可用性過濾模組決定為不可用於該第一影像,以及(b) 當在擷取該多個第一幀檢測級別後基於由該PDA擷取的多個第二幀檢測級別產生一第二影像時,包括由該可用性過濾模組決定為可用於該第二影像的該被濾波的PS的一第二檢測訊號。In such a case, EO system 2300 includes: a. PDA 2302, which includes a plurality of PS 2306, each PS 2306 is operable to output a plurality of detection signals in different frames. The detection signal output by the corresponding PS 2306 for a frame indicates the amount of light impinging on the corresponding PS (and possibly also indicates the dark current of the PD of the corresponding PS) in a corresponding frame. b. An availability filtering module (eg, implemented as part of processor 2304, or implemented separately). The availability filter module is operable to determine for each PS 2306 that the PS is unavailable based on a first FET (which may vary between different PSs 2306), and later based on Short a second FET to determine the same PS 2306 is available. That is, PS 2306s that were unavailable at one point (and whose output was ignored while generating one or more images) may later become available again (for example, if the FET is shortened), and those PS 2306's The outputs may be useful to regenerate subsequent images. c. The processor 2304 is operable to detect levels based on the plurality of frames of the plurality of PSs 2306 to generate a plurality of images. In other configurations of the processor 2304, it is configured to: (a) exclude a first detection signal of a filtered PS when generating a first image based on a plurality of first frame detection levels, the filtered PS A first detection signal is determined by the availability filtering module to be unavailable for the first image, and (b) when detected based on a plurality of second frames captured by the PDA after capturing the plurality of first frame detection levels When generating a second image, a second detection signal of the filtered PS determined by the availability filtering module to be available for the second image is included.

可選地,控制器2314可以基於該EO系統的該視野中的多個物體的不同照明級別,對於不同的幀決定不同的FET。Optionally, controller 2314 may determine different FETs for different frames based on different illumination levels of objects in the field of view of the EO system.

可選地,控制器2314可以被配置為通過使多個FET最大化同時將各個幀的不可用PS的數量保持低於一預定閾值以決定用於該EO系統的多個FET(譬如如關於方法2400被討論的)。Optionally, the controller 2314 may be configured to determine the number of FETs to use for the EO system by maximizing the number of FETs while keeping the number of unusable PSs for each frame below a predetermined threshold (e.g., as described in relation to method 2400 discussed).

可選地,EO系統2300可以包括:至少一個遮蔽PD,其被遮蔽(譬如通過一物理屏障或使用偏轉光學器件)免受環境照明;以及專用電路,其可操作以基於該至少一個遮蔽PD的訊號位準輸出指示暗電流的級別的電參數。處理器2304可以被配置為基於該電參數、基於相應FET,以及基於該PDA的該多個檢測訊號,以產生多個影像,從而對於不同幀中的暗電流累積的不同程度進行補償。Optionally, EO system 2300 may include: at least one shielded PD that is shielded (such as by a physical barrier or using deflection optics) from ambient illumination; and dedicated circuitry operable to The signal level outputs an electrical parameter indicating a level of dark current. The processor 2304 can be configured to generate a plurality of images based on the electrical parameters, based on the corresponding FETs, and based on the plurality of detection signals of the PDA, so as to compensate for different degrees of dark current accumulation in different frames.

可選地,處理器2304可被用於基於當該PS被識別為可用時所測量的該被濾波PS的一檢測級別以計算與該被濾波PS相關聯的該第一影像的至少一個像素的一替換值。可選地,處理器2304可以被配置為:基於多個相鄰PS的檢測級別,當各個PS的檢測訊號被排除在多個影像的該產生之外時,計算對於多個PS的多個替換值。可選地,處理器2304可以基於多個鄰近PS的一第一幀檢測級別被操作以與該被濾波PS相關聯的該第一影像的至少一個像素計算一替換值。Optionally, processor 2304 may be configured to calculate a detection level of at least one pixel of the first image associated with the filtered PS based on a detection level of the filtered PS measured when the PS is identified as available. a replacement value. Optionally, the processor 2304 may be configured to: based on the detection levels of the plurality of neighboring PSs, calculate a plurality of alternatives for the plurality of PSs when the detection signal of each PS is excluded from the generation of the plurality of images value. Optionally, processor 2304 may be operable to calculate a replacement value for at least one pixel of the first image associated with the filtered PS based on a first frame detection level of neighboring PSs.

可選地,處理器2304(或可用性過濾器模組,如果不是處理器的一部分)可以被操作以基於一FET決定對於多個PS的一可用性程度,該程度包括該PDD的採樣多個PS對光敏感的持續時間的一總和,並且不包括在採樣多個PS對光不敏感的多個持續時間之間的多個中間時間。Optionally, the processor 2304 (or availability filter module if not part of the processor) may be operable to determine a degree of availability for PSs based on a FET, the degree comprising the PDD's sampled PS pairs A sum of light-sensitive durations, excluding intermediate times between sampling durations for which PSs are light-insensitive.

可選地,處理器2304可以利用根據方法2500被產生的一可用性模型以決定何時包括及何時排除在不同FET被擷取的不同PS的多個檢測訊號。可選地,EO系統2300可以操作以執行方法2500。可選地,EO系統2300可以被配置為與一外部系統(譬如在EO系統2300的製造中被使用的一工廠校準機)一起參與方法2500的執行。Optionally, the processor 2304 can utilize an availability model generated according to the method 2500 to decide when to include and when to exclude multiple detection signals from different PSs captured at different FETs. Optionally, EO system 2300 is operable to perform method 2500 . Optionally, EO system 2300 may be configured to participate in the execution of method 2500 with an external system, such as a factory calibration machine used in the manufacture of EO system 2300 .

第27圖是示出根據目前公開的主題的方法3500的一示例的一流程圖。方法3500被用於基於在不同操作條件下的多個PS的不同子集產生多個影像。參考關於先前附圖闡述的諸多示例,方法3500可以由處理器1604執行,其中方法3500的該PDA可以可選地是PDA 1602。方法3500至少包括多個階段3510、3520、3530及3540,其對於由一光電檢測器陣列擷取的不同幀作為一順序重複進行。可以對於一流中的每個幀完整地執行該順序,但是不必如此,如下面更詳細地討論的。FIG. 27 is a flowchart illustrating an example of a method 3500 in accordance with the presently disclosed subject matter. Method 3500 is used to generate multiple images based on different subsets of multiple PSs under different operating conditions. Referring to the examples set forth with respect to the previous figures, the method 3500 may be performed by the processor 1604 , wherein the PDA of the method 3500 may optionally be the PDA 1602 . Method 3500 includes at least stages 3510, 3520, 3530, and 3540, which are repeated as a sequence for different frames captured by an array of photodetectors. This sequence can be performed entirely for every frame in a stream, but need not be, as discussed in more detail below.

該順序開始於階段3510,該階段從該PDA接收幀資訊,該幀資訊指示由該PDA的多個PS提供的用於該幀的多個檢測訊號。該幀資訊可以包括:每個PS的檢測級別(或多個級別)(譬如在0與1024之間,三個RGB值,每個在0與255之間,諸如此類),或任何其它格式。該幀資訊可以間接方式指示多個檢測訊號(譬如可以相對於一相鄰PS的該位準或相對於一先前幀中的相同PS的該位準以給出與一給定PS的該檢測位準有關的資訊。該幀資訊還可以包括:附加資訊(譬如順序號、時間戳、操作條件),其中一些可以在方法3500的後續步驟中使用。從該PDA接收的幀資訊的可能包括:不良的、有缺陷的或其它行為異常的PS。The sequence begins at stage 3510, which receives frame information from the PDA indicating detection signals provided by PSs of the PDA for the frame. The frame information may include: detection level (or levels) for each PS (eg between 0 and 1024, three RGB values each between 0 and 255, etc.), or any other format. The frame information may indicate detection signals in an indirect manner (e.g., the detection level for a given PS may be given relative to the level of a neighboring PS or relative to the level of the same PS in a previous frame) Quasi-related information. The frame information may also include: additional information (such as sequence numbers, time stamps, operating conditions), some of which may be used in subsequent steps of the method 3500. The frame information received from the PDA may include: bad defective, defective or otherwise misbehaving PS.

階段3520包括在該幀持續時間期間接收操作狀況資料,該操作狀況資料指示該PDA的多個操作狀況。該多個操作條件可以從不同類型的實體被接收,諸如以下實體中的任何一個或多個:該PDA、該PDA的一控制器、執行方法3500的該至少一個處理器、一個或多個感測器、執行方法3500的至少一個處理器的一個或多個控制器,諸如此類。在階段3520中可以提及的多個操作條件的多個非限制性示例包括該PDA的FET(譬如電子或機械快門、閃光照明持續時間,諸如此類),該PDA或所連接的電路的放大增益、被供應給該PDA的多個PD的偏壓、環境光級別、專用照明級別、下游影像處理器的影像處理模式、被應用於該光的過濾(譬如光譜過濾、偏振),諸如此類。Stage 3520 includes receiving, during the frame duration, operating condition data indicating a plurality of operating conditions of the PDA. The plurality of operating conditions may be received from different types of entities, such as any one or more of the PDA, a controller of the PDA, the at least one processor performing method 3500, one or more sensor A detector, one or more controllers of at least one processor executing method 3500, and the like. Non-limiting examples of operating conditions that may be mentioned in stage 3520 include the PDA's FETs (such as electronic or mechanical shutter, flash illumination duration, and the like), the amplification gain of the PDA or connected circuitry, Bias voltages supplied to the PDA's PDs, ambient light levels, dedicated lighting levels, image processing modes of downstream image processors, filters applied to the light (eg, spectral filtering, polarization), and the like.

階段3530包括基於該操作狀況資料決定一缺陷PS群組,其包括該多個PS中的至少一個並且排除多個其它PS。當在階段3520的不同對應實例中基於對於這些幀被接收的不同操作條件資料為不同幀執行階段3530時,對於操作條件彼此不同的不同幀選擇不同缺陷PS群組。然而,可以為具有不同操作條件的兩個幀選擇同一組缺陷像素(譬如當操作條件的差異相對較小時)。Stage 3530 includes determining a defective PS group based on the operating condition data that includes at least one of the plurality of PSs and excludes a plurality of other PSs. When stage 3530 is performed for different frames in different corresponding instances of stage 3520 based on different operating condition data received for those frames, different defective PS groups are selected for different frames whose operating conditions differ from each other. However, it is possible to select the same set of defective pixels for two frames with different operating conditions (such as when the difference in operating conditions is relatively small).

要被注意的是,該決定是基於該操作條件資料,而不是基於對該多個PS本身的評估,因此,被包括在不同組的各種PS的缺陷性是對它們條件的一估計,而不是對他們實際可操作性條件的一陳述。因此,在階段3530中被包括在該缺陷PS群組中的一PS在操作條件資料中指示的該多個操作條件下不一定是有缺陷的或不可操作的。階段3530的決定旨在盡可能準確地匹配該PDA的實際實際狀態。It is to be noted that this decision is based on the operating condition data and not on an evaluation of the PSs themselves, therefore, the defectivity of the various PSs included in different groups is an estimate of their condition, not A statement of their actual operability conditions. Accordingly, a PS included in the defective PS group in stage 3530 is not necessarily defective or inoperable under the operating conditions indicated in the operating condition data. The decision at stage 3530 is intended to match the actual physical state of the PDA as accurately as possible.

步驟3540包括處理該幀資訊以提供表示該幀的一影像。該處理基於該光電檢測器的多個PS的多個檢測訊號,但不包括在該缺陷PS群組中的多個PS。即是,來自該PDA的該多個PS的該多個檢測訊號被用於產生代表該視野(或其它場景、或光到達該PDA的一個或多個物體)的一影像,但避免所主動於多個PS的所有檢測訊號,其被包括在該缺陷PS群組(如前所述,它是基於被擷取的該相關幀資訊中的操作條件資料動態被決定的)。階段3540可以可選地包括計算多個替換值以補償多個被忽略的檢測訊號。這樣的計算可以包括:例如:基於多個相鄰PS的多個檢測訊號以決定一缺陷PS的一替換值。這樣的計算可以包括:例如:基於該影像的多個相鄰像素的該多個值以決定該影像的一像素的一替換值。以上關於方法2400中的影像產生被討論的任何技術也可以被用於階段3540中的影像產生。Step 3540 includes processing the frame information to provide an image representing the frame. The processing is based on detection signals of PSs of the photodetector excluding PSs in the group of defective PSs. That is, the detection signals from the PSs of the PDA are used to generate an image representative of the field of view (or other scene, or object or objects for which light reaches the PDA), but avoid being actively involved in All detection signals of multiple PSs included in the defective PS group (which is dynamically determined based on the operating condition data in the retrieved relevant frame information as described above). Stage 3540 may optionally include calculating a plurality of replacement values to compensate for a plurality of ignored detection signals. Such calculations may include, for example, determining a replacement value for a defective PS based on detection signals of neighboring PSs. Such calculations may include, for example, determining a replacement value for a pixel of the image based on the values of neighboring pixels of the image. Any of the techniques discussed above with respect to image generation in method 2400 may also be used for image generation in stage 3540 .

對於兩個幀(一第一幀及一第二幀)執行該方法的一示例可以包括:例如: a.        從該PDA接收指示由多個PS提供的並且與一第一幀持續時間有關的多個第一檢測訊號的第一幀資訊,該多個PS至少包括一第一個PS、一第二個PS及一第三個PS。一幀持續時間(frame duration)是由該PDA匯總的光到單個影像或一視訊的一幀的時間。不同的幀持續時間可以是互斥的,但是在一些實施例中可以可選地被部分重疊。 b.        接收第一操作條件資料,該第一操作條件資料指示在該第一幀持續時間期間的該PDA的操作條件。 c.        至少基於該第一操作條件資料以決定一第一缺陷PS群組,包括該第三個PS,但不包括該第一個PS及該第二個PS。該決定可以包括:直接決定該第一缺陷PS群組,或者決定其它資料,這些資料暗示哪些像素被認為是有缺陷的(譬如決定無缺陷像素的一補集,為每個像素分配一缺陷級別,然後設置一閾值或其它決定標準)。 d.        基於該第一缺陷PS群組以處理該第一幀資訊以提供一第一影像,使得該處理至少基於該第一個PS及該第二個PS的該多個第一檢測訊號(可選地,在先前的預處理後,諸如數位化、設上限、位準調整等),並忽略與該第三個PS的多個檢測訊號有關的資訊。 e.        從該PDA接收第二幀資訊,該第二幀資訊指示由多個檢測PS提供的多個第二檢測訊號。該第二幀資訊與該第一幀持續時間以外的一第二幀持續時間有關。 f.         接收第二操作條件資料,該第二操作條件資料指示在該第二幀持續時間期間的該PDA的多個操作條件,該第二操作條件資料與該第一操作條件資料不同。要被注意的是,可以從與接收該第一操作條件資料相同的源接收該第二操作條件資料,但這不是必須的。 g.        基於該多個第二操作條件,決定一第二缺陷PS群組的資料,包括該第二個PS及該第三個PS,但不包括該第一個PS。該決定可以包括:直接決定該第二缺陷PS群組,或者決定其它資料,這些資料暗示哪些像素被認為是有缺陷的(譬如決定無缺陷像素的一補集,為每個像素分配一缺陷級別,然後設置一閾值或其它決定標準)。 h.        基於該第二缺陷PS群組對該第二幀資訊進行處理以提供一第二影像,使得該第二影像資訊的該處理至少基於該第一個PS的該多個第二檢測訊號,並且忽略與該第二個PS及該第三個PS的多個檢測訊號有關的資訊。An example of performing the method for two frames (a first frame and a second frame) may include, for example: a. Receive from the PDA first frame information indicating a plurality of first detection signals provided by a plurality of PSs and related to a first frame duration, the plurality of PSs including at least a first PS, a second PS and a third PS. A frame duration is the time for light aggregated by the PDA into a single image or a frame of a video. The different frame durations may be mutually exclusive, but may optionally be partially overlapping in some embodiments. b. Receiving first operating condition data indicating an operating condition of the PDA during the first frame duration. c. Determining a first defective PS group based at least on the first operating condition data, including the third PS, but excluding the first PS and the second PS. This determination may include directly determining the first defective PS group, or determining other data that implies which pixels are considered defective (e.g. determining a complement of non-defective pixels, assigning each pixel a defect level , and then set a threshold or other decision criteria). d. Processing the first frame of information based on the first defective PS group to provide a first image, such that the processing is based at least on the plurality of first detection signals of the first PS and the second PS (may be Optionally, after previous preprocessing, such as digitization, capping, level adjustment, etc.), and ignore information related to the detected signals of the third PS. e. Receive a second frame of information from the PDA, the second frame of information indicating a plurality of second detection signals provided by a plurality of detection PSs. The second frame information is related to a second frame duration other than the first frame duration. f. Receiving second operating condition data indicating operating conditions of the PDA during the second frame duration, the second operating condition data being different from the first operating condition data. It is to be noted that the second operating condition data may be received from the same source as the first operating condition data, but this is not required. g. Based on the plurality of second operating conditions, determine data of a second defective PS group, including the second PS and the third PS, but excluding the first PS. This determination may include directly determining the second defective PS group, or determining other data that implies which pixels are considered defective (e.g. determining a complement of non-defective pixels, assigning each pixel a defect level , and then set a threshold or other decision criteria). h. Processing the second frame information based on the second defective PS group to provide a second image, such that the processing of the second image information is at least based on the plurality of second detection signals of the first PS, And ignore the information related to the plurality of detection signals of the second PS and the third PS.

第28A圖以圖解說明根據目前公開的主題的諸多示例的系統3600以及多個示例性目標物體3902及3904。EO系統3600至少包括處理器3620,該處理器可操作以處理來自至少一個PDA(可能是同一系統的一部分,但不一定如此)的多個檢測訊號,以產生表示系統3600的一視場中的多個物體的多個影像。系統3600可以由一系統2300實現,並且使用類似的附圖標記(譬如在這樣的一情況下,PDA 3610可以是PDA 2302,控制器3640可以是控制器2314,依此類推),但這不是必須的。為了簡潔起見,並非重複以上關於系統2300所提供的所有描述,並且要被注意的是,系統2300的一個或多個構件的任何組合可以比照在系統3600中被實現,反之亦然。系統3600可以是進一步包括PDA 3610及光學器件的一處理系統(譬如一電腦、一圖形處理單元)或一EO系統。在後一種情況下,系統3600可以是使用PDA進行檢測的任何類型的EO系統,諸如一照相機、一光譜儀、一LIDAR,諸如此類。可選地,系統2600可以包括:一個或多個照明源3650(譬如多個雷射器、多個LED),用於照明在該FOV中的多個物體(譬如至少為該第一FET及該第二FET照明該物體)。可選地,系統3600可包括控制器3640,該控制器3640可基於該EO系統的該視野中的多個物體的不同照明級別以決定對於不同幀的不同FET。可選地,那些不同的FET可以包括:該第一FET及/或該第二FET。FIG. 28A illustrates a system 3600 and a number of exemplary target objects 3902 and 3904 according to examples of the presently disclosed subject matter. EO system 3600 includes at least a processor 3620 operable to process a plurality of detection signals from at least one PDA (possibly, but not necessarily, part of the same system) to generate an Multiple images of multiple objects. System 3600 can be implemented by a system 2300, and similar reference numbers are used (for example, in such a case, PDA 3610 can be PDA 2302, controller 3640 can be controller 2314, and so on), but this is not required. of. For the sake of brevity, not all of the descriptions provided above with respect to system 2300 are repeated, and it is noted that any combination of one or more components of system 2300 may conversely be implemented in system 3600, and vice versa. System 3600 may be a processing system (eg, a computer, a graphics processing unit) or an EO system further including PDA 3610 and optics. In the latter case, system 3600 can be any type of EO system that uses a PDA for detection, such as a camera, a spectrometer, a LIDAR, and the like. Optionally, system 2600 may include: one or more illumination sources 3650 (such as multiple lasers, multiple LEDs) for illuminating multiple objects in the FOV (such as at least the first FET and the The second FET illuminates the object). Optionally, system 3600 can include a controller 3640 that can decide different FETs for different frames based on different illumination levels of objects in the field of view of the EO system. Optionally, those different FETs may include: the first FET and/or the second FET.

在第28A圖中示出兩個示例性目標:具備一高反射牌板的一深色汽車3902(具有低反射率的車身面板),以及在它上面的具備一白色補丁的一黑色矩形面板3904。要被注意的是,系統3600不必限於產生具備多個高反射率補丁的多個低反射率物體的多個影像。然而,系統3600產生這種目標的多個影像的方式是有趣的。Two exemplary objects are shown in Figure 28A: a dark car 3902 with a highly reflective fascia (body panels with low reflectivity), and a black rectangular panel 3904 with a white patch on top of it . It is to be noted that system 3600 is not necessarily limited to generating multiple images of multiple low reflectivity objects with multiple high reflectivity patches. However, the manner in which system 3600 generates multiple images of such objects is interesting.

處理器3620被配置為從一PDA(譬如PDA 3610,如果被實現)接收一物體的多個檢測結果,該物體包括在所有側面上被多個低反射率表面環繞的一高反射率表面(以多個目標3902及3904為例)。多種檢測結果包括:(a) 在一第一FET中由該PDA所檢測該物體的第一幀資訊,以及(b) 在比該第一FET更長的一第二FET中由該PDA所檢測的該物體的第二幀資訊。該第一幀資訊及該第二幀資訊指示由該PDA的不同PS輸出的多個檢測訊號,該多個檢測訊號轉而指示由該PDA所檢測的該目標的不同部分的多個光強度。一些PS檢測來自該多個物體的低反射率部分的光,而至少另一PS檢測來自該高反射率表面的光。Processor 3620 is configured to receive from a PDA (such as PDA 3610, if implemented) a plurality of detection results of an object comprising a high reflectivity surface surrounded on all sides by low reflectivity surfaces (indicated by multiple objects 3902 and 3904 as an example). Multiple detection results include: (a) first frame information of the object detected by the PDA in a first FET, and (b) detected by the PDA in a second FET longer than the first FET The second frame information of the object. The first frame of information and the second frame of information indicate a plurality of detection signals output by different PSs of the PDA, and the plurality of detection signals in turn indicate a plurality of light intensities of different portions of the object detected by the PDA. Some PSs detect light from low reflectivity portions of the plurality of objects, while at least one other PS detects light from the high reflectivity surface.

基於不同的FET,處理器3620以不同的方式處理該第一幀資訊及該第二幀資訊。第28B圖以圖解說明根據目前公開的主題的諸多示例的多個目標3902及3904的示例性第一影像及該第二影像。當處理該第一幀資訊時,處理器3620基於該第一FET以處理該第一幀資訊。它產生一第一影像,該第一影像包括代表該高反射率表面的一亮區域,其被代表該低反射率表面的一暗背景包圍。這在第28B圖中被以圖解說明作為多個第一影像3912及3914(對應於第28A圖的多個物體3902及3904)。當處理器3620基於該第二FET處理比該第一FET更長的該第二幀資訊時。Tt產生一第二影像,該第二影像包括沒有一亮區域的一暗背景。這在第28B圖被以圖解說明作為多個第二影像3922及3924(對應於第28A圖的多個物體3902及3904)。Based on different FETs, the processor 3620 processes the first frame information and the second frame information in different ways. FIG. 28B illustrates an exemplary first image and the second image of a plurality of objects 3902 and 3904 according to examples of the presently disclosed subject matter. When processing the first frame information, the processor 3620 processes the first frame information based on the first FET. It produces a first image comprising a bright region representing the high reflectivity surface surrounded by a dark background representing the low reflectivity surface. This is illustrated in Figure 28B as a plurality of first images 3912 and 3914 (corresponding to the plurality of objects 3902 and 3904 in Figure 28A). When the processor 3620 processes the second frame information longer than the first FET based on the second FET. Tt produces a second image that includes a dark background without a bright region. This is illustrated in Figure 28B as a plurality of second images 3922 and 3924 (corresponding to the plurality of objects 3902 and 3904 in Figure 28A).

即是,即使更多的高反射表面的光到達該第二幀的該光電檢測器的各個PS,該影像輸出不會更亮也不飽和,而是更暗。處理器3620可以通過使用相鄰PS的資訊以決定代表該第二影像中的該高反射率表面的該多個像素的較暗的顏色(其具有多個較低強度的訊號,由於它們擷取該物體的較低反射率的表面),因為它決定來自多個相關PS的該多個訊號在那個較長的第二FET中不可用。可選地,處理器3620可以被配置為當基於該第二FET(以及可選地還基於各個PS的可用性建模,譬如如關於方法2500被討論的)產生該第二影像時,丟棄與高反射率表面相應的被檢測的多個光訊號,以及被配置為對於該第二影像的至少一個對應像素計算一暗色,以響應於從多個相鄰PS被擷取的該多個物體的多個相鄰低反射率表面被檢測的多個光強度。可選地,由處理器3620決定丟棄該相應PS的資訊不是基於該檢測訊號位準,而是基於該相應PS對暗電流(譬如有限的電容)的敏感性。可選地,當處理該第二幀資訊時,處理器3620可以基於該第二FET,例如類似於方法2400的該多個識別階段,將檢測來自該高反射率表面的光的至少一個PS識別為不可用於該第二幀。That is, even if more light from the highly reflective surface reaches the respective PS of the photodetector in the second frame, the image output will not be brighter or saturated, but darker. Processor 3620 may determine darker colors (which have lower intensity signals, as they capture the lower reflectivity surface of the object), because it determines that the multiple signals from the multiple associated PSs are not available in that longer second FET. Optionally, the processor 3620 may be configured to discard and high The reflectivity surface corresponds to the detected light signals and is configured to calculate a dark color for at least one corresponding pixel of the second image in response to the plurality of objects captured from the plurality of neighboring PSs. Multiple light intensities detected for adjacent low-reflectivity surfaces. Optionally, the decision by the processor 3620 to discard the information of the corresponding PS is not based on the detection signal level, but based on the sensitivity of the corresponding PS to dark current (eg, limited capacitance). Optionally, when processing the second frame of information, processor 3620 may identify at least one PS that detects light from the high-reflectivity surface based on the second FET, for example similar to the plurality of identification stages of method 2400 is not available for this second frame.

要被注意的是,該高反射率表面可以小於該低反射率表面,並且可以在所有側面上都被該低反射率表面包圍,但這不是必須的。該高反射率表面的尺寸(譬如角度尺寸)可以對應於單個PS、小於一個PS,但是也可以對應於幾個PS。在該高反射率級別與該低反射率級別之間的差異可以變化。例如:該低反射率表面的反射率可以是在0%與15%之間,而該高反射率表面的反射率可以是在80%與100%之間。在另一個示例中,該低反射率表面可以具有在50%與55%之間的反射率,而該高反射率表面可以是在65%與70%之間的反射率。例如:該高反射率表面的該最小反射率可以是該低反射率表面的該最大反射率的×2、×3、×5、×10或×100。可選地,該高反射率表面在該多個PS可以檢測的該光譜範圍內具有大於95%的反射率(譬如白色表面),而該低反射率表面在該多個PS可以檢測的該光譜範圍內具有小於5%的反射率(譬如黑色表面)。要被注意的是,如上所述,一FET可以對應於一片段化的時間跨度(譬如對應於幾個照明脈衝)或單個連續的時間跨度。It is to be noted that the high reflectivity surface may be smaller than the low reflectivity surface and may be surrounded on all sides by the low reflectivity surface, but this is not required. The dimension (eg angular dimension) of the high reflectivity surface may correspond to a single PS, less than one PS, but may also correspond to several PS. The difference between the high reflectivity level and the low reflectivity level can vary. For example: the reflectivity of the low reflectivity surface can be between 0% and 15%, and the reflectivity of the high reflectivity surface can be between 80% and 100%. In another example, the low reflectivity surface may have a reflectivity between 50% and 55%, while the high reflectivity surface may be between 65% and 70% reflectivity. For example: the minimum reflectivity of the high reflectivity surface may be ×2, ×3, ×5, ×10 or ×100 of the maximum reflectivity of the low reflectivity surface. Optionally, the high reflectivity surface has a reflectivity greater than 95% in the spectral range detectable by the plurality of PSs (such as a white surface), and the low reflectivity surface has a reflectivity greater than 95% in the spectral range detectable by the plurality of PSs. The range has a reflectivity of less than 5% (such as a black surface). It is to be noted that, as mentioned above, a FET may correspond to a fragmented time span (eg corresponding to several illumination pulses) or to a single continuous time span.

要被注意的是,可選地,在該第一FET中及在該第二FET中從該高反射率表面到達相關PS的多個光訊號級別的量可以是相似的。這可以通過過濾進來的光,相應地改變檢測光學器件3670的一f數被實現(譬如將FET以一因數q增加,而將f數以一因數q增加)。可選地,在擷取該第一幀資訊中的該PDA的一第一曝光值(EV)與在擷取該第二幀資訊中的該PDA的該第二EV相差小於1%。可選地,FET的差異是在該第一幀與第二幀之間的操作條件之間的唯一主要差異。It is to be noted that, optionally, the amount of light signal levels reaching the associated PS from the high reflectivity surface in the first FET and in the second FET may be similar. This can be accomplished by filtering the incoming light, changing an f-number of the detection optics 3670 accordingly (eg increasing the FET by a factor q and increasing the f-number by a factor q). Optionally, a first exposure value (EV) of the PDA in retrieving the first frame of information differs by less than 1% from the second EV of the PDA in retrieving the second frame of information. Optionally, the difference in FETs is the only major difference between the operating conditions between the first frame and the second frame.

如上討論評估該PDA的溫度以將該可用性模型校準到不同級別的暗電流。可選地,處理器3620可以進一步被配置為:(a) 處理從該物體反射的檢測訊號,以在擷取該第一幀資訊中決定該光電檢測陣列的一第一溫度評估,以及在擷取該第一幀資訊中決定該光電檢測陣列的一第二溫度評估,以及(b) 基於該第二FET及該第二溫度評估,決定丟棄與該高反射率表面相應的多個檢測結果。The temperature of the PDA was evaluated to calibrate the usability model to different levels of dark current as discussed above. Optionally, processor 3620 may be further configured to: (a) process the detection signal reflected from the object to determine a first temperature estimate of the photodetection array in capturing the first frame of information, and Determining a second temperature estimate of the photodetection array from the first frame of information, and (b) determining to discard a plurality of detection results corresponding to the high reflectivity surface based on the second FET and the second temperature estimate.

第29圖是示出根據本發明的主題的諸多示例的用於基於一PDA的資料產生影像資訊的方法3700的一流程圖。參考關於先前附圖闡述的示例,要被注意的是,方法3700可以可選地由系統3600執行。上面關於系統3600被討論的任何變體可以比照應用於方法3700。特別地,方法3700(及其至少多個階段3710、3720、3730及3740)可以由處理器3620執行。FIG. 29 is a flow chart illustrating a method 3700 for generating image information based on data from a PDA according to examples of the inventive subject matter. Referring to the examples set forth with respect to the previous figures, it is to be noted that the method 3700 may optionally be performed by the system 3600 . Any of the variations discussed above with respect to system 3600 may apply mutatis mutandis to method 3700 . In particular, method 3700 (and at least a plurality of stages 3710 , 3720 , 3730 and 3740 ) may be performed by processor 3620 .

階段3710包括從該PDA接收包括一白色區域的一黑色目標的第一幀資訊,該第一幀資訊指示由該PDA在一第一FET中所檢測的該目標的不同部分的光強度。要被注意的是,該白色區域可以由一亮區域(或其它高反射區域)被替換。例如:任何反射率高於50%的區域可以被代替使用。要被注意的是,該黑色目標可以由一暗區域(或其它稍微反射的區域)被替換。例如:反射率低於10%的任何目標可以被代替使用。Stage 3710 includes receiving from the PDA a first frame of information of a black object including a white area, the first frame of information indicating the light intensity of different parts of the object detected by the PDA in a first FET. It is to be noted that the white area can be replaced by a bright area (or other highly reflective area). For example: any area with reflectivity higher than 50% can be used instead. Note that the black target could be replaced by a dark area (or other slightly reflective area). Example: Any target with a reflectivity below 10% can be used instead.

階段3720包括基於該第一FET以處理該第一幀資訊以提供一第一影像,該第一影像包括被一暗背景環繞的一亮區域。可選地,可以使用以上關於方法2400的階段2406、2414及2422中的任何一個討論的影像產生過程中的任何一個以實現階段3720。Stage 3720 includes processing the first frame of information based on the first FET to provide a first image including a bright area surrounded by a dark background. Optionally, any of the image generation processes discussed above with respect to any of stages 2406 , 2414 , and 2422 of method 2400 may be used to implement stage 3720 .

階段3730包括從PDA接收包括白色區域的黑色目標的第二幀資訊,該第二幀資訊是在比該第一FET更長的一第二FET中由該PDA所檢測的該目標的不同部分的指示多個光強度。Stage 3730 includes receiving from the PDA a second frame of information for a black object including white areas, the second frame information being a different portion of the object detected by the PDA in a second FET longer than the first FET Indicates multiple light intensities.

步驟3740包括基於該第二FET處理該第二幀資訊,以提供一第二影像,該第二影像包括沒有一亮區域的一暗背景。可選地,階段3740可以使用以上相對於方法2400的階段2406、2414及2422中的任何一個討論的影像產生過程中的任何一個以及識別多個可用及不可用PS群組的先前階段被實現。Step 3740 includes processing the second frame of information based on the second FET to provide a second image including a dark background without a bright region. Optionally, stage 3740 may be implemented using any of the image generation processes discussed above with respect to any of stages 2406, 2414, and 2422 of method 2400 and the previous stage of identifying a plurality of usable and unavailable PS groups.

關於方法3700的執行順序,階段3720在階段3710後執行,階段3740在階段3730後執行。除此之外,可以使用任何合適的階段順序。方法3700還可以可選地包括經由一PDA擷取該第一幀資訊及/或該第二幀資訊。Regarding the execution order of method 3700 , stage 3720 is executed after stage 3710 , and stage 3740 is executed after stage 3730 . Otherwise, any suitable sequence of stages may be used. Method 3700 may also optionally include retrieving the first frame information and/or the second frame information via a PDA.

可選地,在接收該第一幀資訊後,該第二FET可以在接收該第二幀資訊前被決定,該第二FET比該第一FET更長。可選地,該第二幀資訊的該處理可以包括:基於該第二FET,丟棄被檢測的該白色區域的光強度資訊;決定該第二影像的至少一個對應像素的一暗色,以響應於該第二幀資訊所檢測的多個相鄰區域的多個光強度。可選地,該第二幀資訊的該處理可以包括:基於該第二FET,識別至少一個PS,該至少一個PS檢測來自該白色區域的光為不可用於該第二幀。可選地,在擷取該第一幀資訊中的該PDA的一第一曝光值(EV)可以與在擷取該第二幀資訊中的該PDA的一第二EV相差小於1%。Optionally, after receiving the first frame information, the second FET can be determined before receiving the second frame information, and the second FET is longer than the first FET. Optionally, the processing of the second frame information may include: discarding the detected light intensity information of the white area based on the second FET; determining a dark color of at least one corresponding pixel of the second image in response to Multiple light intensities of multiple adjacent areas detected by the second frame information. Optionally, the processing of the second frame information may include: based on the second FET, identifying at least one PS that detects light from the white region as unavailable for the second frame. Optionally, a first exposure value (EV) of the PDA in retrieving the first frame of information may differ from a second EV of the PDA in retrieving the second frame of information by less than 1%.

可選地,在該第一幀曝光時間期間,與該低反射率資料相關聯的該PS上的暗電流累積為該PS留下一可用動態範圍,而在該第二幀曝光時間期間,那個PS上的暗電流累積為PS留下一不足動態範圍。在這樣的一情況下,不能將與該高反射率區域相應PS用於該第二影像中的影像產生,並且可以計算替換色值以替換該丟失的檢測級別。Optionally, during the first frame exposure time, the accumulation of dark current on the PS associated with the low reflectivity profile leaves a usable dynamic range for the PS, and during the second frame exposure time, that The accumulation of dark current on the PS leaves an insufficient dynamic range for the PS. In such a case, the PS corresponding to the high reflectivity region cannot be used for image generation in the second image, and replacement color values can be calculated to replace the missing detection level.

一種非暫時性電腦可讀媒體被提供,用於基於一PDA的資料(包括儲存在其上的多個指令)產生影像資訊,該影像資訊在一處理器上執行時,將執行以下步驟:(a) 從一PDA接收一黑色目標的第一幀資訊,該黑色目標包括一白色區域,該第一幀資訊指示在一第一FET中由該PDA所檢測的該目標的不同部分的光強度;(b) 基於該第一FET處理該第一幀資訊,以提供一第一影像,該第一影像包括被一暗背景環繞的一亮區域;(c) 從該PDA接收該黑色目標的第二幀資訊,該黑色目標包括該白色區域,該第二幀資訊指示在比該第一FET更長的一第二FET中由該PDA所檢測的該目標的不同部分的光強度;(d) 基於該第二FET處理該第二幀資訊,以提供一第二影像,該第二影像包括沒有一亮區域的一暗背景。A non-transitory computer readable medium is provided for generating image information based on data of a PDA (including instructions stored thereon), the image information when executed on a processor will perform the following steps: ( a) receiving a first frame of information from a PDA for a black target, the black target including a white area, the first frame of information indicating light intensities of different portions of the target detected by the PDA in a first FET; (b) processing the first frame of information based on the first FET to provide a first image including a bright area surrounded by a dark background; (c) receiving a second image of the black object from the PDA frame information, the black object includes the white area, the second frame information indicates the light intensity of different parts of the object detected by the PDA in a second FET longer than the first FET; (d) based on The second FET processes the second frame of information to provide a second image including a dark background without a bright area.

前段的該非暫時性電腦可讀媒體可以包括:被儲存在其上的其它指令,該多個指令在一處理器上被執行時,進行以上關於方法3700所討論的任何其它步驟或變體。The non-transitory computer-readable medium of the preceding paragraph may include other instructions stored thereon that, when executed on a processor, perform any of the other steps or variations discussed above with respect to method 3700 .

在上面的揭露中,描述多個系統、方法及電腦代碼產品,以及利用它們以光電擷取及產生高質量影像的方式。特別地,在高PD暗電流的存在下,這樣的系統、方法及電腦代碼產品可以被利用以產生多個高質量的SWIR影像(或其它SWIR感測資料)。這樣的諸多PD可以是諸多鍺PD,但是並非在所有情況下都是如此。如上討論以協同方式使用這樣的系統、方法及電腦程式產品的一些方式,並且許多其它方式是可能的,並且被認為是本發明的創新主題的一部分。如上討論的任何系統都可以合併如上討論的任何一個或多個其它系統中的任何一個或多個構件,以實現更高質量的結果,以更有效或更具成本效益的方式,或出於任何其它原因而獲得相似的結果。同樣,以上討論的任何方法都可以合併以上討論的任何一種或多種其它方法的任何一個或多個階段,以實現更高質量的結果,以更有效或更具成本效益的方式實現相似的結果,或用於任何其它原因。In the above disclosure, various systems, methods and computer code products are described, as well as the manner in which they are used to optically capture and generate high quality images. In particular, such systems, methods and computer code products can be utilized to generate multiple high quality SWIR images (or other SWIR sensing data) in the presence of high PD dark current. Such a number of PDs may be a number of germanium PDs, but not in all cases. Some of the ways in which such systems, methods and computer program products are used in a synergistic manner are discussed above, and many others are possible and considered part of the innovative subject matter of the present invention. Any of the systems discussed above may incorporate any one or more components of any one or more of the other systems discussed above to achieve higher quality results, in a more efficient or cost-effective manner, or for any Similar results were obtained for other reasons. Likewise, any of the methods discussed above may incorporate any one or more stages of any one or more of the other methods discussed above to achieve a higher quality result, achieve a similar result in a more efficient or cost-effective manner, or for any other reason.

在下面的段落中,提供這種組合的一些非限制性示例,以證明某些可能的協同作用。In the following paragraphs, some non-limiting examples of such combinations are provided to demonstrate some possible synergy.

例如:該積分時間足夠短以克服暗電流雜訊的過度影響的成像系統100、100’及100”可以實現多個PDD,諸如多個PDD 1300、1300’、1600、1600’、1700、1800被包括在接收器110中以減少該暗雜訊的非時變(直流,DC)部分。這樣,該多個PS的該電容不會被未累積在檢測訊號中的暗電流的非時變部分壓垮,並且該暗電流的該雜訊不會使該檢測訊號蒙上陰影。在多個成像系統100、100’及100’’中的任何一個中實現多個PDD 1300、1300’、1600、1600’、1700、1800中的任何一個可以被用於將該幀曝光時間延長到一明顯的程度(因為該暗電流的該DC部分不會被累積在該電容中),同時仍會檢測有意義的訊號。For example: imaging systems 100, 100', and 100" whose integration time is short enough to overcome the undue influence of dark current noise can implement multiple PDDs, such as multiple PDDs 1300, 1300', 1600, 1600', 1700, 1800 Included in the receiver 110 to reduce the time-invariant (direct current, DC) portion of the dark noise. In this way, the capacitance of the PSs is not overwhelmed by the time-invariant portion of the dark current not accumulated in the detection signal collapse, and the noise of the dark current does not cloud the detection signal. Multiple PDDs 1300, 1300', 1600, 1600 are implemented in any of multiple imaging systems 100, 100' and 100'' ', 1700, 1800 can be used to extend the frame exposure time to a significant degree (since the DC portion of the dark current will not be accumulated in the capacitor), while still detecting meaningful signals .

例如:該積分時間被設置得足夠短以克服暗電流雜訊的過度影響的成像系統100、100’及100”可以實現方法2400、2500及3500中的任何一者或多者,以決定在那個幀曝光時間可用的多個PS,並且可能減少該幀曝光時間(其對應於該積分時間),以進一步決定一足夠數量的PS是可用的。同樣,在一給定FET的該讀出雜訊與該預期累積暗電流雜訊位準之間的該預期比率以及在這樣的一PS中的不同PS的該預期可用性可以被該控制器使用,以設置在該被檢測的訊號的質量、可用像素的數量與該光源(譬如雷射器600)所需的該照明級別之間的一平衡。當適用時,在不同FET的該可用性模型還可被用於決定範圍由成像系統100、100’及100”所產生的該多個門控影像的該距離。將多個PDD 1300、1300’、1600、1600’、1700、1800中的任何一個進一步併入作為這種成像系統的該感測器將增加前段中討論的益處。For example: imaging systems 100, 100', and 100" where the integration time is set short enough to overcome the undue influence of dark current noise may implement any one or more of methods 2400, 2500, and 3500 to determine at which Multiple PSs available for the frame exposure time, and possibly reducing the frame exposure time (which corresponds to the integration time), to further determine that a sufficient number of PSs are available. Likewise, the readout noise at a given FET The expected ratio between the expected cumulative dark current noise level and the expected availability of different PSs in such a PS can be used by the controller to set the quality of the detected signal, available pixels A balance between the number of FETs and the level of illumination required by the light source, such as laser 600. When applicable, the availability model at different FETs can also be used to determine the range of imaging systems 100, 100' and The distance of the plurality of gated images generated by 100". Further incorporation of any of the plurality of PDDs 1300, 1300', 1600, 1600', 1700, 1800 into this sensor as such an imaging system would add to the benefits discussed in the preceding paragraph.

例如:方法2400、2500及3500中的任何一種或多種可以由系統1900(或由包括多個PDD 1300、1300’、1600、1600’、1700、1800中的任何一個的任何EO系統)實現。如關於系統1900(或所提及的任何PDD)被討論的該暗電流累積的該諸多影響的減少允許利用諸多更長的FET。實現任何一種方法都可以用以促進更長的FET,因為決定哪些PS是在一相對較長的FET中暫時不可用,能使系統1900(或具備被提及的該多個PDD中的一個的另一EO系統)忽略這些PS,並可選地將它們的檢測輸出以多個相鄰PS的資料進行替換。For example: any one or more of methods 2400, 2500, and 3500 may be implemented by system 1900 (or by any EO system including any of multiple PDDs 1300, 1300', 1600, 1600', 1700, 1800). The reduction of the effects of the dark current buildup as discussed with respect to system 1900 (or any PDD mentioned) allows longer FETs to be utilized. Either method can be implemented to facilitate longer FETs, since determining which PSs are temporarily unavailable in a relatively longer FET enables the system 1900 (or one of the PDDs mentioned Another EO system) ignores these PSs and optionally replaces their detection output with data from multiple neighboring PSs.

前述方法的某些階段也可以在運行在一電腦系統上的一電腦程式中被實現,該電腦程式至少包括諸多代碼部分,該諸多代碼部分用以在諸如一電腦系統的一可程式化裝置上運行或啟用一可程式化裝置時進行相關方法的諸多步驟,以進行根據本發明的一裝置或系統的諸多功能。這樣的方法也可以在運行在一電腦系統上的一電腦程式中被實現,該電腦程式至少包括諸多代碼部分,該諸多代碼部分使一電腦執行根據本發明的一方法的該諸多步驟。Certain stages of the aforementioned methods may also be implemented in a computer program running on a computer system, the computer program comprising at least code portions for executing on a programmable device such as a computer system Steps of related methods are carried out when running or enabling a programmable device to perform functions of a device or system according to the present invention. Such a method can also be implemented in a computer program running on a computer system, the computer program comprising at least code parts that cause a computer to execute the steps of a method according to the invention.

一電腦程式是諸多指令的一列表,諸如一特定的應用程式及/或一作業系統。該電腦程式可以例如包括以下一項或多項:一子例程、一函數、一過程、一方法、一實現方案、一可執行應用程式、一小應用程式、一小服務程式、一源代碼、一代碼、一共享庫/動態加載庫及/或被設計用以在一電腦系統上執行的其它指令順序。A computer program is a list of instructions, such as a specific application and/or an operating system. The computer program may, for example, include one or more of the following: a subroutine, a function, a procedure, a method, an implementation, an executable application, an applet, a server, a source code, A code, a shared library/dynamically loaded library and/or other sequence of instructions designed to be executed on a computer system.

該電腦程式可以被內部儲存在一非暫時性電腦可讀媒體上。所有或一些電腦程式可以在電腦可讀媒體上被提供,該電腦可讀媒體永久地、可移除地或遠端地耦合到一資訊處理系統。該電腦可讀媒體可以包括例如但不限於以下任意數量:磁儲存媒體,包括磁盤及磁帶儲存媒體;光學儲存媒體,諸如光盤介質(譬如CD‑ROM、CD‑R等)及數位視訊磁盤儲存媒體;非易失性儲存媒體,包括基於半導體的記憶體單元,諸如快閃記憶體、EEPROM、EPROM、ROM;鐵磁數位記憶體;MRAM;易失性儲存媒體,包括諸多暫存器、諸多緩衝器或諸多高速緩衝記憶體、主記憶體、RAM等。The computer program can be stored internally on a non-transitory computer readable medium. All or some of the computer programs may be provided on a computer readable medium permanently, removably or remotely coupled to an information handling system. The computer readable medium may include, for example but not limited to, any number of: magnetic storage media, including magnetic disk and magnetic tape storage media; optical storage media, such as optical disk media (e.g., CD-ROM, CD-R, etc.) ; non-volatile storage media, including semiconductor-based memory units, such as flash memory, EEPROM, EPROM, ROM; ferromagnetic digital memory; MRAM; volatile storage media, including many scratchpads, many buffers cache memory, main memory, RAM, etc.

一電腦進程通常包括一執行(運行)程式或一程式的一部分、諸多目前程式值及狀態資訊,以及由該作業系統所使用以管理該進程的執行。一作業系統(OS)是管理一電腦的諸多資源共享並為諸多程式員提供被用於訪問這些資源的一介面的軟體。一作業系統處理系統資料及用戶輸入,並通過分配及管理任務及內部系統資源作為對該系統的諸多用戶及諸多程式的一服務進行響應。A computer process generally includes an executable (running) program or a portion of a program, various current program values and state information, and is used by the operating system to manage the execution of the process. An operating system (OS) is software that manages the shared resources of a computer and provides programmers with an interface used to access those resources. An operating system processes system data and user input, and responds as a service to users and programs of the system by allocating and managing tasks and internal system resources.

該電腦系統可以例如包括至少一個處理單元、相關聯的儲存器及多個輸入/輸出(I/O)裝置。當執行該電腦程式時,該電腦系統根據該電腦程式處理資訊,並經由諸多I/O裝置產生結果輸出資訊。The computer system may, for example, include at least one processing unit, associated memory, and a plurality of input/output (I/O) devices. When the computer program is executed, the computer system processes information according to the computer program, and generates results and outputs information through many I/O devices.

在本文被討論的該諸多連接可以是適合於例如經由諸多中間裝置從各個節點、單元或裝置傳輸訊號或向各個節點、單元或裝置傳輸訊號的任何類型的連接。因此,除非另有暗示或說明,否則該諸多連接可以例如是直接連接或間接連接。該諸多連接可以參考單個連接、多個連接、單向連接或雙向連接被圖解說明或描述。然而,不同的實施例可以改變該諸多連接的實現方案。例如:可以使用單獨的單向連接而不是雙向連接,反之亦然。而且,可以用單個連接替換多個連接,該單個連接串行地或以一時間多工(time multiplexed)的方式傳輸多個訊號。同樣,承載多個訊號的諸多單個連接可以被分離為承載這些訊號的子集的各種不同的連接。因此,存在許多用於傳輸訊號的選項。The connections discussed herein may be any type of connection suitable for transmitting signals from or to various nodes, units or devices, for example via intermediate devices. Accordingly, unless implied or stated otherwise, the connections may be, for example, direct connections or indirect connections. The plurality of connections may be illustrated or described with reference to a single connection, a plurality of connections, a unidirectional connection, or a bidirectional connection. However, different embodiments may vary the implementation of these connections. For example: separate unidirectional connections can be used instead of bidirectional and vice versa. Also, multiple connections can be replaced by a single connection that transmits multiple signals serially or in a time multiplexed manner. Likewise, individual connections carrying multiple signals may be separated into various connections carrying subsets of these signals. Therefore, there are many options for transmitting signals.

可選地,所述以圖解說明的諸多示例可以被實現為位於單個積體電路上或在同一裝置內的電路。替代地,該諸多示例可以被實現為以合適的方式彼此互連的任何數量的分離的積體電路或分離的裝置。可選地,該諸多方法的適當部分可以被實現為物理電路的軟或代碼表現形式或可轉換為物理電路的邏輯表現形式,諸如以任何適當類型的一硬體描述語言。Alternatively, the illustrated examples may be implemented as circuits on a single integrated circuit or within the same device. Alternatively, the various examples may be implemented as any number of separate integrated circuits or separate devices interconnected with each other in a suitable manner. Alternatively, appropriate portions of the methods may be implemented as soft or code representations of physical circuits or as logical representations convertible to physical circuits, such as in any suitable type of hardware description language.

其它修改、變化及替代也是可能的。因此,說明書及附圖應被認為是說明性的而不是限制性的。儘管在本文已經以圖解說明及描述本發明的某些特徵,但是本領域普通技術人員現在將閃現許多修改、替換、改變及等同物。因此,要被理解的是,所附申請專利範圍旨在涵蓋落入本發明的真實精神內的所有此類修改及改變。將被理解的是,上述實施例僅作為示例被引用,並且其各種特徵以及這些特徵的組合可以被改變及修改。儘管各種實施例已經被示出及描述,但是應當理解的是,無意通過這樣的揭露以限制本發明,而是旨在覆蓋落入本發明的範圍內的所有修改及替代構造,如在所附請求項中所定義。Other modifications, changes, and substitutions are also possible. Accordingly, the specification and drawings are to be regarded as illustrative rather than restrictive. While certain features of the invention have been illustrated and described herein, many modifications, substitutions, changes and equivalents will now occur to those skilled in the art. It is therefore to be understood that the appended claims are intended to cover all such modifications and changes as fall within the true spirit of the invention. It will be understood that the above-described embodiments are cited as examples only, and that various features thereof and combinations of these features may be changed and modified. While various embodiments have been shown and described, it should be understood that there is no intention to limit the invention by such disclosure, but the intention is to cover all modifications and alternative constructions falling within the scope of the invention, as described in the appended as defined in the request item.

在本發明的申請專利範圍或說明書中,除非另有說明,否則形容詞,諸如“實質上(substantially)”及“大約(about)”修飾一個實施例的一個或多個特徵的一條件或關係特性,被理解為意指該條件或特性被定義為對於一被預期的應用的該實施例的操作的可接受的公差範圍內。應被理解的是,在申請專利範圍或說明書中提及“一(a)”或“一(an)”元件的情況下,這種引用不應被解釋為僅存在該元件中的一者。In the claims or specification of the present invention, unless otherwise stated, adjectives such as "substantially" and "about" modify a condition or relational characteristic of one or more features of an embodiment , is understood to mean that the condition or characteristic is defined as being within acceptable tolerances for operation of the embodiment for an intended application. It should be understood that where reference is made in the claims or specification to "a" or "an" element, such reference should not be construed as that there is only one of that element.

本發明的受讓人及/或以色列特拉維夫市的趣眼有限公司(TriEye LTD.)發佈的所有專利申請、白皮書及其它可公開獲得的資料,通過引用整體併入本文。在本文被提及的參考文獻沒有被承認是現有技術。All patent applications, white papers, and other publicly available materials issued by the assignee of the present invention and/or TriEye LTD., Tel Aviv, Israel, are hereby incorporated by reference in their entirety. References mentioned herein are not admitted to be prior art.

100:成像系統 100’:成像系統 100’’:成像系統 102:照明源 102A:照明源 102P:照明源 104:目標 106:光脈衝 108:反射輻射 110:接收器 112:控制器 114:影像處理器 116:光學器件 118:鍺光電二極體(PD) 120:電子控制單元(ECU) 122:增益介質 124:泵 126A:Q開關(QS)元件 126P:可飽和吸收體(SA) 128:Q開關(QS)脈衝光電檢測器(PD) 226:光電檢測器(PD) 228:電磁輻射 300:過程 302:步驟 304:步驟 306:步驟 308:步驟 310:步驟 400:過程 402:步驟 404:步驟 406:步驟 408:步驟 410:步驟 412:步驟 430:目標 500:方法 510:步驟 520:步驟 530:步驟 540:步驟 550:步驟 560:步驟 600:雷射器 602:晶體增益介質(GM) 604:可飽和吸收體(SA) 606:光腔 608:高反射率鏡 610:輸出耦合器 612:雷射光束 614:普通結晶材料 616:閃光燈 618:雷射二極體 620:聚焦光學器件 622:擴散器或其它光學器件 700:短波紅外(SWIR)光學系統 702:感測器 704:光學器件 706:光電探測器陣列(PDA) 708:光學器件 710:處理器 712:控制器 910:物體 1100:方法 1102:步驟 1104:步驟 1106:步驟 1108:步驟 1110:步驟 1112:步驟 1114:步驟 1200:感光位點(PS) 1200’:感光位點(PS) 1202:光電檢測器(PD) 1204:電壓控制電流源(VCCS) 1206:其它構件 1300:光電檢測裝置(PDD) 1300’:光電檢測裝置(PDD) 1302:光電檢測器(PD) 1304:電壓控制電流源(VCCS) 1306:其它構件 1310:感光位點(PS) 1310’:感光位點(PS) 1318:放大器 1320:第一輸入 1322:第二輸入 1338:控制器 1340:控制電壓產生電路 1400:曲線 1402:電壓 1404:電壓 1412:等效電壓 1414:等效電壓 1500:參考電路 1600:光電檢測裝置(PDD) 1600’:光電檢測裝置(PDD) 1602:感光區域 1604:區域 1610:讀出電路 1620:位置 1700:光電檢測裝置(PDD) 1704:電壓控制電流汲取器 1714:電壓控制電流汲取器 1718:放大器 1800:光電檢測裝置(PDD) 1900:光電檢測裝置(PDD) 1902:光源 1904:物理屏障 1906:被忽略的感光位點 1908:處理器 1910:記憶體模組 1912:通訊模組 1914:顯示器 1916:電源 1918:硬殼 1920:光學器件 2000:方法 2010:階段 2020:階段 2100:方法 2112:階段 2114:階段 2116:階段 2118:階段 2120:階段 2122:步驟 2124:階段 2126:階段 2128:階段 2200:方法 2210:階段 2220:階段 2230:階段 2240:階段 2250:階段 2300:電光(EO)系統 2302:光電探測器陣列(PDA) 2304:處理器 2306:感光位點(PS) 2308:記憶體模組 2310:通訊模組 2312:顯示器 2314:控制器 2316:光源 2318:讀出電路 2320:電源 2322:硬殼 2324:光學器件 2400:方法 2402:階段 2402’:圖 2404:階段 2404’:圖 2406:階段 2406’:圖 2408:階段 2408’:圖 2410:階段 2410’:圖 2412:階段 2412’:圖 2414:階段 2414’:圖 2416:階段 2416’:圖 2418:階段 2418’:圖 2420:階段 2420’:圖 2422:階段 2422’:圖 2500:方法 2502:階段 2504:階段 2506:階段 2508:階段 2510:階段 3500:方法 3510:階段 3520:階段 3530:階段 3540:階段 3600:系統 3610:光電探測器陣列(PDA) 3620:處理器 3630:讀出電路 3640:控制器 3650:照明源 3662:記憶體 3670:檢測光學器件 3700:方法 3710:階段 3720:階段 3730:階段 3740:階段 3902:示例性目標物體 3904:示例性目標物體 3912:第一影像 3914:第一影像 3922:第二影像 3924:第二影像 8012(1):第1個感光位點 8012(2):第2個感光位點 8012(3):第3個感光位點 8012(4):第4個感光位點 8012(5):第5個感光位點 A:範圍 D:距離 DoV:景深 FOV:視場 T:時間 T2 :時間 VA :陽極供應電壓 VC :陰極供應電壓 VCTRL :控制電壓 VFI :第一輸入電壓 VRPA :參考陽極電壓 Δt:啟用週期100: imaging system 100': imaging system 100'': imaging system 102: illumination source 102A: illumination source 102P: illumination source 104: target 106: light pulse 108: reflected radiation 110: receiver 112: controller 114: image processing 116: Optics 118: Germanium Photodiode (PD) 120: Electronic Control Unit (ECU) 122: Gain Medium 124: Pump 126A: Q Switch (QS) Element 126P: Saturable Absorber (SA) 128: Q Switch (QS) Pulse Photodetector (PD) 226: Photodetector (PD) 228: Electromagnetic Radiation 300: Process 302: Step 304: Step 306: Step 308: Step 310: Step 400: Process 402: Step 404: Step 406: Step 408: Step 410: Step 412: Step 430: Target 500: Method 510: Step 520: Step 530: Step 540: Step 550: Step 560: Step 600: Laser 602: Crystal Gain Medium (GM) 604 : Saturable Absorber (SA) 606: Optical Cavity 608: High Reflectivity Mirror 610: Output Coupler 612: Laser Beam 614: Common Crystalline Material 616: Flash Lamp 618: Laser Diode 620: Focusing Optics 622: Diffuser or other optics 700: shortwave infrared (SWIR) optical system 702: sensor 704: optics 706: photodetector array (PDA) 708: optics 710: processor 712: controller 910: object 1100: Method 1102: Step 1104: Step 1106: Step 1108: Step 1110: Step 1112: Step 1114: Step 1200: Photosensitive Site (PS) 1200': Photosensitive Site (PS) 1202: Photodetector (PD) 1204: Voltage Controlled Current Source (VCCS) 1206: Other Components 1300: Photodetection Device (PDD) 1300': Photodetection Device (PDD) 1302: Photodetector (PD) 1304: Voltage Controlled Current Source (VCCS) 1306: Other Components 1310: Photosensitive point (PS) 1310': photosensitive point (PS) 1318: amplifier 1320: first input 1322: second input 1338: controller 1340: control voltage generation circuit 1400: curve 1402: voltage 1404: voltage 1412: etc. Effective voltage 1414: equivalent voltage 1500: reference circuit 1600: photoelectric detection device (PDD) 1600': photoelectric detection device (PDD) 1602: photosensitive area 1604: area 1610: readout circuit 1620: position 1700: photoelectric detection device (PDD ) 1704: Voltage controlled current drawer 1714: Voltage controlled current drawer 1718: Amplifier 1800: Photodetection device (PDD) 1900: Photodetection device (PDD) 1902: Light source 1904: Physical barrier 1906: Ignored photosensitive site 1908 : Processor 1910: Memory Module 1912: Communication Module 1914: Display 1916: Power Supply 1918: Hard Case 1920: Optics 2000: Method 2010: Stage 2020: Stage 2100: Method 2112: Stage 2114: Stage 2116: Stage 2118 : stage 2120: stage 2122: step 2124: stage 2126: stage 2128: stage 2200: method 2210: stage 2220: stage 2230: stage 2240: stage 2250: stage 2300: electro-optic (EO) system 2302: photodetector array (PDA ) 2304: processor 2306: photosensitive site (PS) 2308: memory module 2310: communication module 2312: display 2314: controller 2316: light source 2318: readout circuit 2320: power supply 2322: hard case 2324: optical device 2400: method 2402: stage 2402': graph 2404: stage 2404': graph 2406: stage 2406': graph 2408: stage 2408': graph 2410: stage 2410': graph 2412: stage 2412': graph 2414: stage 2414' :image 2416:stage 2416':image 2418:stage 2418':image 2420:stage 2420':image 2422:stage 2422':image 2500:method 2502:stage 2504:stage 2506:stage 2508:stage 2510:stage 3500: Method 3510: Stage 3520: Stage 3530: Stage 3540: Stage 3600: System 3610: Photodetector Array (PDA) 3620: Processor 3630: Readout Circuitry 3640: Controller 3650: Illumination Source 3662: Memory 3670: Detection Optics Device 3700: Method 3710: Stage 3720: Stage 3730: Stage 3740: Stage 3902: Exemplary Target Object 3904: Exemplary Target Object 3912: First Image 3914: First Image 3922: Second Image 3924: Second Image 8012( 1): 1st photosensitive site 8012 (2): 2nd photosensitive site 8012 (3): 3rd photosensitive site 8012 (4): 4th photosensitive site 8012 (5): 5th Photosensitive site A: range D: distance DoV: depth of field FOV: field of view T: time T2 : time V A : anode supply voltage V C : cathode supply voltage V CTRL : control voltage V FI : first input voltage V RPA : Reference anode voltage Δt: enable period

下面參考在此段落後被列出的附圖以描述本文公開的實施例的非限制性示例。在一個以上的圖中出現的相同結構、元件或部件可以在它們出現的所有圖中用相同的數字被標記。該附圖及描述意在說明及闡明本文公開的實施例,並且不應被認為以任何方式進行限制。所有附圖示出根據目前公開的主題的諸多示例的裝置或流程圖。在附圖中: [第1A圖]:是以圖解說明一主動SWIR成像系統的一示意性框圖。 [第1B圖];是以圖解說明一主動SWIR成像系統的一示意性框圖。 [第1C圖]:是以圖解說明一主動SWIR成像系統的一示意性框圖。 [第2圖]:是以圖解說明在一SWIR成像系統中在多個積分時間的不同持續時間後的雜訊功率的相對幅度的一示例性圖形。 [第3A圖]:示出根據一些實施例的一主動SWIR成像系統的一操作方法的一流程圖。 [第3B圖]:示出根據一些實施例的一主動SWIR成像系統的一操作方法的一示意圖。 [第3C圖]:示出根據一些實施例的一主動SWIR成像系統的一操作方法的一示意圖。 [第4A圖]:示出一主動SWIR成像系統的一示例性操作方法的一流程圖。 [第4B圖]:示出一主動SWIR成像系統的一示例性操作方法的一示意圖。 [第4C圖]:示出一主動SWIR成像系統的一示例性操作方法的一示意圖。 [第5圖]:是以圖解說明用於一種在一EO系統的一FOV中產生多個物體的多個SWIR影像的方法的一流程圖; [第6圖]:是示出一SWIR光學系統的一示例的一示意性功能框圖。 [第7A圖]:是以圖解說明P-QS雷射器的一示例的一示意性功能框圖。 [第7B圖]:是以圖解說明P-QS雷射器的一示例的一示意性功能框圖。 [第7C圖]:是以圖解說明P-QS雷射器的一示例的一示意性功能框圖。 [第8圖]:是以圖解說明一SWIR光學系統的一示意性功能圖。 [第9圖]:是以圖解說明一SWIR光學系統的一示意性功能圖。 [第10圖]:是以圖解說明一SWIR光學系統的一示例的一示意性功能框圖。 [第11A圖]:是以圖解說明一種用於製造一P-QS雷射器的多個部件的方法的一示例的一流程圖。 [第11B圖]:是以圖解說明一種用於製造一P-QS雷射器的多個部件的方法的用於執行該方法的一概念性時間軸。 [第11C圖]:是以圖解說明一種用於製造一P-QS雷射器的多個部件的方法的用於執行該方法的一概念性時間軸。 [第12A圖]:示意性地示出一PS包括一PD,該PD由一電壓控制電流源控制。 [第12B圖]:示意性地示出一PS包括一PD,該PD以一“3T”結構由一電壓控制電流源控制。 [第13A圖]:示出一光電檢測裝置(PDD),該PDD包括一PS及可操作以降低暗電流影響的電路。 [第13B圖]:示出一光電檢測裝置(PDD),該PDD包括一PS及可操作以降低暗電流影響的電路。 [第13C圖]:示出一PDD,該PDD包括多個PS及可操作以降低暗電流影響的電路。 [第14圖]:示出一PDD的一示例性PD IV曲線及可能的工作電壓。 [第15圖]:示出一控制電壓產生電路,該控制電壓產生電路被連接到多個參考光站點。 [第16A圖]:示出一PDD,該PDD包括多個PS的一陣列及基於多個PD的參考電路。 [第16B圖]:示出一PDD,該PDD包括多個PS的一陣列及基於多個PD的參考電路。 [第17圖]:示出一PDD,每個PDD包括一PS及可操作用於降低暗電流影響的電路。 [第18圖]:示出一PDD,每個PDD包括一PS及可操作用於降低暗電流影響的電路。 [第19圖]:是以圖解說明一PDD,該PDD包括光學器件、一處理器及多個附加構件。 [第20圖]:是以圖解說明一種用於補償在一光電檢測器中的暗電流的方法的一流程圖。 [第21圖]:是以圖解說明一種用於補償在一光電檢測器中的暗電流的方法的一流程圖。 [第22圖]:是以圖解說明一種用於測試一光電檢測器的方法的一流程圖。 [第23圖]:是以圖解說明根據一些實施例的一EO系統。 [第24圖]:是以圖解說明一種基於一光電探測器陣列(PDA)的資料產生影像資訊的方法的一示例。 [第25圖]:是以圖解說明一種用以在不同幀曝光時間對於PDA操作產生一模型的方法的一流程圖。 [第26圖]:是以圖解說明一種用以在不同幀曝光時間對於PDA操作產生一模型的方法對於在不同幀曝光時間拍攝相同場景的不同幀執行該方法的一圖形表徵。 [第27圖]:是以圖解說明一種用以在不同操作條件基於多個PS的不同子集產生多個影像的方法的一示例的一流程圖。 [第28A圖]:是以圖解說明一EO系統及多個示例性目標物體。 [第28B圖]:是以圖解說明一EO系統及多個示例性目標物體。 [第29圖]:是以圖解說明一種基於一PDA的資料產生影像資訊的方法的一流程圖。Non-limiting examples of embodiments disclosed herein are described below with reference to the figures listed following this paragraph. Identical structures, elements or parts that appear in more than one figure may be labeled with the same numerals in all the figures in which they appear. The drawings and descriptions are intended to illustrate and illustrate the embodiments disclosed herein and should not be considered limiting in any way. All figures show apparatuses or flowcharts according to various examples of the presently disclosed subject matter. In the attached picture: [FIG. 1A]: Is a schematic block diagram illustrating an active SWIR imaging system. [FIG. 1B]; is a schematic block diagram illustrating an active SWIR imaging system. [FIG. 1C]: Is a schematic block diagram illustrating an active SWIR imaging system. [FIG. 2]: is an exemplary graph illustrating the relative magnitude of noise power after different durations of integration times in a SWIR imaging system. [FIG. 3A]: A flowchart illustrating a method of operation of an active SWIR imaging system according to some embodiments. [FIG. 3B]: A schematic diagram showing a method of operation of an active SWIR imaging system according to some embodiments. [FIG. 3C]: A schematic diagram showing a method of operation of an active SWIR imaging system according to some embodiments. [FIG. 4A]: A flowchart illustrating an exemplary method of operation of an active SWIR imaging system. [Fig. 4B]: A schematic diagram illustrating an exemplary method of operation of an active SWIR imaging system. [Fig. 4C]: A schematic diagram illustrating an exemplary method of operation of an active SWIR imaging system. [FIG. 5]: is a flowchart illustrating a method for generating multiple SWIR images of multiple objects in a FOV of an EO system; [FIG. 6]: is a schematic functional block diagram showing an example of a SWIR optical system. [FIG. 7A]: is a schematic functional block diagram illustrating an example of a P-QS laser. [FIG. 7B]: is a schematic functional block diagram illustrating an example of a P-QS laser. [FIG. 7C]: is a schematic functional block diagram illustrating an example of a P-QS laser. [Fig. 8]: is a schematic functional diagram illustrating a SWIR optical system. [Fig. 9]: is a schematic functional diagram illustrating a SWIR optical system. [FIG. 10]: is a schematic functional block diagram illustrating an example of a SWIR optical system. [FIG. 11A]: is a flowchart illustrating an example of a method for manufacturing components of a P-QS laser. [FIG. 11B]: Is a conceptual timeline for performing a method for making components of a P-QS laser is illustrated. [FIG. 11C]: Is a conceptual timeline for performing a method for making components of a P-QS laser is illustrated. [FIG. 12A]: Schematically shows that a PS includes a PD controlled by a voltage-controlled current source. [FIG. 12B]: Schematically shows a PS including a PD controlled by a voltage-controlled current source in a "3T" configuration. [FIG. 13A]: Shows a photodetection device (PDD) including a PS and circuitry operable to reduce the effects of dark current. [FIG. 13B]: Shows a photodetection device (PDD) including a PS and circuitry operable to reduce the effects of dark current. [FIG. 13C]: Shows a PDD including a plurality of PSs and circuits operable to reduce the influence of dark current. [Fig. 14]: Shows an exemplary PD IV curve and possible operating voltage of a PDD. [FIG. 15]: Shows a control voltage generating circuit connected to a plurality of reference optical sites. [FIG. 16A]: Shows a PDD including an array of PSs and a reference circuit based on the PDs. [FIG. 16B]: Shows a PDD including an array of PSs and a reference circuit based on the PDs. [FIG. 17]: Shows a PDD each including a PS and circuits operable to reduce the influence of dark current. [FIG. 18]: Shows a PDD each including a PS and circuits operable to reduce the influence of dark current. [Fig. 19]: This diagram illustrates a PDD, which includes optical devices, a processor, and multiple additional components. [FIG. 20]: Is a flowchart illustrating a method for compensating dark current in a photodetector. [FIG. 21]: Is a flowchart illustrating a method for compensating dark current in a photodetector. [FIG. 22]: Is a flowchart illustrating a method for testing a photodetector. [FIG. 23]: Is a diagram illustrating an EO system according to some embodiments. [Fig. 24]: It is an example of a method for generating image information based on data from a photodetector array (PDA). [FIG. 25]: Is a flowchart illustrating a method for generating a model for PDA operation at different frame exposure times. [FIG. 26]: Is a graphical representation illustrating a method for generating a model for PDA operation at different frame exposure times performed on different frames of the same scene captured at different frame exposure times. [FIG. 27]: is a flowchart illustrating an example of a method for generating multiple images based on different subsets of multiple PSs under different operating conditions. [FIG. 28A]: Is a diagram illustrating an EO system and exemplary target objects. [FIG. 28B]: Is a diagram illustrating an EO system and exemplary target objects. [Fig. 29]: It is a flowchart illustrating a method for generating image information based on data from a PDA.

將被理解的是,為了圖例的簡化及清楚起見,在附圖中被示出的諸多元件未必按比例繪製。例如:為了清楚起見,一些元件的尺寸可能相對於其它元件被放大。此外,在被認為適當的情況下,諸多附圖標記可以在諸多附圖之間被重複以指示諸多對應或相似的元件。It will be understood that for simplicity and clarity of illustration, various elements shown in the drawings have not necessarily been drawn to scale. For example, the dimensions of some of the elements may be exaggerated relative to other elements for clarity. Further, where considered appropriate, reference numerals may be repeated among the figures to indicate corresponding or analogous elements.

600:雷射器600:Laser

602:晶體增益介質(GM)602: Crystal Gain Media (GM)

604:可飽和吸收體(SA)604: Saturable absorber (SA)

608:高反射率鏡608: high reflectivity mirror

610:輸出耦合器610: output coupler

612:雷射光束612:Laser Beam

618:雷射二極體618:Laser diode

700:短波紅外(SWIR)光學系統700:Short Wave Infrared (SWIR) Optical System

702:感測器702: sensor

704:光學器件704: Optics

706:光電探測器陣列(PDA)706: Photodetector Array (PDA)

708:光學器件708: Optics

710:處理器710: Processor

712:控制器712: Controller

910:物體910: object

Claims (27)

一種被動Q開關(P-QS)雷射器,包括:一增益介質,包括一增益介質結晶(GMC)材料,該增益介質結晶材料包括一陶瓷摻釹的釔鋁石榴石(Nd:YAG);一可飽和吸收體(SA),被剛性耦合到該增益介質,該可飽和吸收體包括一燒結陶瓷的可飽和吸收體結晶(SAC)材料,該燒結陶瓷的可飽和吸收體結晶材料選自於由以下材料組成的多種摻雜陶瓷材料的一群組:一種摻三價釩的釔鋁石榴石(V3+:YAG)及多種摻二價鈷結晶材料;及一光腔,該增益介質及該可飽和吸收體位於該光腔中,該光腔包括一高反射率鏡及一輸出耦合器。 A passive Q-switched (P-QS) laser comprising: a gain medium comprising a gain medium crystalline (GMC) material comprising a ceramic neodymium-doped yttrium aluminum garnet (Nd:YAG); a saturable absorber (SA) rigidly coupled to the gain medium, the saturable absorber comprising a sintered ceramic saturable absorber crystalline (SAC) material selected from A group of doped ceramic materials consisting of: a trivalent vanadium-doped yttrium aluminum garnet (V 3+ : YAG) and divalent cobalt-doped crystalline materials; and an optical cavity, the gain medium and The saturable absorber is located in the optical cavity, which includes a high reflectivity mirror and an output coupler. 如請求項1所述的被動Q開關雷射器,除了該增益介質及該可飽和吸收體之外,還包括未摻雜的釔鋁石榴石,用於防止熱量累積在該增益介質的一吸收區域中。 The passive Q-switched laser of claim 1, in addition to the gain medium and the saturable absorber, also includes undoped yttrium aluminum garnet for preventing heat accumulation in an absorption of the gain medium in the area. 如請求項2所述的被動Q開關雷射器,其中該未摻雜的釔鋁石榴石被成形為一圓柱體,該圓柱體包圍該增益介質及該可飽和吸收體。 The passive Q-switched laser of claim 2, wherein the undoped yttrium aluminum garnet is shaped as a cylinder surrounding the gain medium and the saturable absorber. 如請求項1所述的被動Q開關雷射器,其中該增益介質結晶材料及該可飽和吸收體結晶材料中的至少一種是多晶的。 The passive Q-switched laser of claim 1, wherein at least one of the gain medium crystalline material and the saturable absorber crystalline material is polycrystalline. 如請求項1所述的被動Q開關雷射器,其中該增益介質結晶及該可飽和吸收體結晶材料都是多晶的。 The passive Q-switched laser of claim 1, wherein both the gain medium crystal and the saturable absorber crystal material are polycrystalline. 如請求項1所述的被動Q開關雷射器,其中該高反射率鏡及該輸出耦合器被剛性耦合到該增益介質及該可飽和吸收體,使得該被動Q開關雷射器是一單片微晶片被動Q開關雷射器。 The passive Q-switched laser of claim 1, wherein the high reflectivity mirror and the output coupler are rigidly coupled to the gain medium and the saturable absorber such that the passive Q-switched laser is a single On-chip Microchip Passive Q-Switched Lasers. 如請求項1所述的被動Q開關雷射器,其中該增益介質結晶材料是摻釹原釩酸釔(Nd:YVO4)。 The passive Q-switched laser as claimed in claim 1, wherein the crystalline material of the gain medium is neodymium-doped yttrium orthovanadate (Nd: YVO 4 ). 如請求項1所述的被動Q開關雷射器,其中該可飽和吸收體結晶材料是摻鈷尖晶石(Co2+:MgAl2O4)。 The passive Q-switched laser as claimed in claim 1, wherein the saturable absorber crystalline material is cobalt-doped spinel (Co 2+ :MgAl 2 O 4 ). 如請求項1所述的被動Q開關雷射器,其中該可飽和吸收體結晶材料是Co2+:YAG。 The passive Q-switched laser as claimed in claim 1, wherein the saturable absorber crystalline material is Co 2+ : YAG. 如請求項1所述的被動Q開關雷射器,其中該可飽和吸收體結晶材料是摻鈷硒化鋅(Co2+:ZnSe)。 The passive Q-switched laser as claimed in claim 1, wherein the saturable absorber crystalline material is cobalt-doped zinc selenide (Co 2+ : ZnSe). 如請求項1所述的被動Q開關雷射器,其中該增益介質結晶材料是一陶瓷摻鈷結晶材料。 The passive Q-switched laser as claimed in claim 1, wherein the gain medium crystalline material is a ceramic cobalt-doped crystalline material. 如請求項1所述的被動Q開關雷射器,其中該增益介質及該可飽和吸收體被實現在摻雜有釹及至少一種其它材料的一單片結晶材料上。 2. The passive Q-switched laser of claim 1, wherein the gain medium and the saturable absorber are implemented on a monolithic crystalline material doped with neodymium and at least one other material. 如請求項1所述的被動Q開關雷射器,其中該可飽和吸收體的初始透射率(T0)是在78%與82%之間。 The passive Q-switched laser of claim 1, wherein the initial transmittance (T 0 ) of the saturable absorber is between 78% and 82%. 一種電光系統,包括:如請求項1所述的被動Q開關雷射器,被配置為照明一目標;以及一感測器,被配置為感測從該被照明的目標反射的輻射並將該反射的照明轉換成影像資料。 An electro-optic system comprising: the passive Q-switched laser of claim 1 configured to illuminate a target; and a sensor configured to sense radiation reflected from the illuminated target and Reflected lighting is converted into image data. 如請求項14所述的電光系統,還包括一處理器,該處理器可操作以處理由該感測器提供的該影像資料,以決定一物體在該電光系統的一視場中的存在。 The electro-optic system of claim 14, further comprising a processor operable to process the image data provided by the sensor to determine the presence of an object in a field of view of the electro-optic system. 一種用於製造一被動Q開關(P-QS)雷射器的多個部件的方法,該方法包括:將至少一種第一粉末塞入一第一模具中; 在該第一模具中壓實該至少一種第一粉末以產出一第一生坯。將不同於該至少一種第一粉末的至少一種第二粉末塞入一第二模具中;在該第二模具中壓實該至少一種第二粉末,從而產出一第二生坯;加熱該第一生坯以產出一第一結晶材料;加熱該第二生坯以產出一第二結晶材料;及將該第二結晶材料耦合到該第一結晶材料,其中該第一結晶材料及該第二結晶材料中的一種是一摻釹結晶材料並且是用於該被動Q開關雷射器的一增益介質,其中該第一結晶材料及該第二結晶材料中的另一種是用於該被動Q開關雷射器的一可飽和吸收體(SA)並且是選自於由一摻釹結晶材料及一摻雜結晶材料組成的群組的一材料,其中該摻雜結晶材料選自於由一摻三價釩的釔鋁石榴石(V3+:YAG)及一摻鈷結晶材料組成的群組,以及其中該增益介質及該可飽和吸收體中的至少一種是一陶瓷結晶材料。 A method for manufacturing components of a passive Q-switch (P-QS) laser, the method comprising: packing at least one first powder into a first mold; compacting the powder in the first mold At least one first powder to produce a first green body. packing at least one second powder different from the at least one first powder into a second mold; compacting the at least one second powder in the second mold to produce a second green body; heating the first a green body to produce a first crystalline material; heating the second green body to produce a second crystalline material; and coupling the second crystalline material to the first crystalline material, wherein the first crystalline material and the One of the second crystalline materials is a neodymium doped crystalline material and is a gain medium for the passive Q-switched laser, wherein the other of the first crystalline material and the second crystalline material is used for the passive A saturable absorber (SA) of the Q-switched laser is also a material selected from the group consisting of a neodymium-doped crystalline material and a doped crystalline material selected from a A group consisting of trivalent vanadium-doped yttrium aluminum garnet (V 3+ : YAG) and a cobalt-doped crystalline material, and wherein at least one of the gain medium and the saturable absorber is a ceramic crystalline material. 如請求項16所述的方法,其中該第一模具不同於該第二模具。 The method of claim 16, wherein the first mold is different from the second mold. 如請求項16所述的方法,其中該第一模具及該第二模具是相同模具。 The method of claim 16, wherein the first mold and the second mold are the same mold. 如請求項16所述的方法,其中進行該第一生坯的該加熱先於進行該至少一種第二粉末的該壓實,其中該增益介質及該可飽和吸收體都是多晶材料。 The method of claim 16, wherein the heating of the first green body is performed prior to the compacting of the at least one second powder, wherein both the gain medium and the saturable absorber are polycrystalline materials. 如請求項17所述的方法,其中進行該第一生坯的該加熱先於進行該至少一種第二粉末的該壓實,其中該增益介質及該可飽和吸收 體都是多晶材料。 The method of claim 17, wherein the heating of the first green body is performed prior to the compaction of the at least one second powder, wherein the gain medium and the saturable absorber are polycrystalline materials. 如請求項18所述的方法,其中進行該第一生坯的該加熱先於進行該至少一種第二粉末的該壓實,其中該增益介質及該可飽和吸收體都是多晶材料。 The method of claim 18, wherein the heating of the first green body is performed prior to the compacting of the at least one second powder, wherein both the gain medium and the saturable absorber are polycrystalline materials. 如請求項16所述的方法,其中該第一生坯的加熱及該第二生坯的加熱包括在單個烤箱中同時加熱該第一生坯及該第二生坯,其中該增益介質及該可飽和吸收體都是多晶材料。 The method of claim 16, wherein heating the first green body and heating the second green body comprises simultaneously heating the first green body and the second green body in a single oven, wherein the gain medium and the Saturable absorbers are all polycrystalline materials. 如請求項17所述的方法,其中該第一生坯的加熱及該第二生坯的加熱包括在單個烤箱中同時加熱該第一生坯及該第二生坯,其中該增益介質及該可飽和吸收體都是多晶材料。 The method of claim 17, wherein heating the first green body and heating the second green body comprises simultaneously heating the first green body and the second green body in a single oven, wherein the gain medium and the Saturable absorbers are all polycrystalline materials. 如請求項18所述的方法,其中該第一生坯的加熱及該第二生坯的加熱包括在單個烤箱中同時加熱該第一生坯及該第二生坯,其中該增益介質及該可飽和吸收體都是多晶材料。 The method of claim 18, wherein heating the first green body and heating the second green body comprises simultaneously heating the first green body and the second green body in a single oven, wherein the gain medium and the Saturable absorbers are all polycrystalline materials. 如請求項16所述的方法,其中該耦合是該單個烤箱的該加熱的一結果。 The method of claim 16, wherein the coupling is a result of the heating of the single oven. 如請求項17所述的方法,其中該耦合是該單個烤箱的該加熱的一結果。 The method of claim 17, wherein the coupling is a result of the heating of the single oven. 如請求項18所述的方法,其中該耦合是該單個烤箱的該加熱的一結果。 The method of claim 18, wherein the coupling is a result of the heating of the single oven.
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