TWI794603B - Microfluidic devices and methods of making the same - Google Patents
Microfluidic devices and methods of making the same Download PDFInfo
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B19/00—Machines or pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B1/00 - F04B17/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502769—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements
- B01L3/502784—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements specially adapted for droplet or plug flow, e.g. digital microfluidics
- B01L3/502792—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements specially adapted for droplet or plug flow, e.g. digital microfluidics for moving individual droplets on a plate, e.g. by locally altering surface tension
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B17/00—Pumps characterised by combination with, or adaptation to, specific driving engines or motors
- F04B17/03—Pumps characterised by combination with, or adaptation to, specific driving engines or motors driven by electric motors
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01L2300/00—Additional constructional details
- B01L2300/06—Auxiliary integrated devices, integrated components
- B01L2300/0627—Sensor or part of a sensor is integrated
- B01L2300/0645—Electrodes
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/04—Moving fluids with specific forces or mechanical means
- B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
- B01L2400/0415—Moving fluids with specific forces or mechanical means specific forces electrical forces, e.g. electrokinetic
- B01L2400/0427—Electrowetting
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Abstract
Description
本申請案主張在2019年4月30日提出的美國專利申請案第62/840,443號之優先權,其全部在此納入作為參考。This application claims priority to US Patent Application Serial No. 62/840,443, filed April 30, 2019, which is hereby incorporated by reference in its entirety.
數位微流體裝置使用獨立電極移動圍阻環境中的液滴,因而提供「晶片實驗室」(“lab-on-a-chip”)。數位微流體裝置或被稱為介電濕潤,或“EWoD”,以進一步區別該方法與競爭的微流體系統,其依靠電泳流動及/或微泵。Wheeler在“Digital Microfluidics,” Annu. Rev. Anal. Chem. 2012, 5:413-40中,其全部在此納入此處作為參考,提供電濕潤技術之2012年回顧。該技術可以微量樣品及試劑實行樣品分離、檢測、及合成化學。近年來,在微流體胞元中使用電濕潤的受控液滴操控具有商業可行性;且現在已有得自大型生命科學公司的產品,如Oxford Nanopore。Digital microfluidic devices use independent electrodes to move droplets in a confined environment, thereby providing a "lab-on-a-chip." Digital microfluidic devices may be referred to as dielectric wetting, or "EWoD," to further differentiate the approach from competing microfluidic systems, which rely on electrophoretic flow and/or micropumps. Wheeler, in "Digital Microfluidics," Annu. Rev. Anal. Chem. 2012, 5:413-40, which is hereby incorporated by reference in its entirety, provides a 2012 review of electrowetting technology. This technology can implement sample separation, detection, and synthetic chemistry with trace samples and reagents. Controlled droplet manipulation using electrowetting in microfluidic cells has become commercially viable in recent years; and products are now available from large life science companies such as Oxford Nanopore.
大部分有關EWoD的文獻報告涉及所謂的「被動矩陣」裝置(又稱為「分段」裝置),其中以控制器直接驅動10至20個電極。雖然分段裝置易於製造,但電極數量受空間及驅動約束限制。因而在被動矩陣裝置中無法實行大規模的平行檢測、反應等。相較下,「主動矩陣」裝置(又稱為主動矩陣EWoD,又稱為AM-EWoD)可具有數千、數十萬個或甚至數百萬個可定址電極。該電極一般藉薄膜電晶體(TFT)切換且可設計液滴運動,而使AM-EWoD陣列可被作為控制多液滴及執行同時分析方法的自由度大之通用裝置。Most literature reports on EWoD involve so-called "passive matrix" devices (also known as "segmented" devices), in which 10 to 20 electrodes are directly driven by a controller. While segmented devices are easy to fabricate, the number of electrodes is limited by space and actuation constraints. Therefore, large-scale parallel detection, reaction, etc. cannot be implemented in passive matrix devices. In contrast, "active matrix" devices (also known as active matrix EWoD, also known as AM-EWoD) can have thousands, hundreds of thousands, or even millions of addressable electrodes. The electrodes are generally switched by thin-film transistors (TFTs) and the droplet motion can be programmed, so that the AM-EWoD array can be used as a general-purpose device with a large degree of freedom to control multiple droplets and perform simultaneous analysis methods.
傳統EWoD裝置之基本操作描述於圖5之切面圖。EWoD 200包括填充油202與至少一個水滴204之胞元。如圖5所示,在基本組態中將複數個推進電極205配置在一基板上,且將單一上電極206配置在對立表面上。該胞元另外在接觸油層的表面上包括疏水性塗層207,及在推進電極205與疏水性塗層207之間的介電層208(上基板亦可包括介電層,但在圖5未示)。疏水性層防止液滴濕潤表面。當在相鄰電極間未施加電壓差時,液滴會維持球狀而將疏水性表面(油與疏水性層)接觸最小化。因為液滴未濕潤表面,故其較不易污染表面或與其他液滴交互作用,除非當希望有該行為時。當在相鄰電極間施加電壓差時,一電極上的電壓吸引介電層對液滴界面處液滴中的相反電荷,且該液滴朝向此電極移動。The basic operation of a conventional EWoD device is described in the cutaway view of FIG. 5 . EWoD 200 includes a cell filled with
如圖5所描述,EWoD裝置一般包含兩個平行基板。在兩個基板之間的間隙內移動液滴之操作通常為4個主要操作之一:運輸(即橫向移動液滴通過間隙)、分裂(即將一個液滴分開成為二個或以上體積較小的液滴)、分配(即從大流體貯器抽出一個液滴)、及混合/合併(即將兩個液滴組合成為一個體積較大之滴)。各操作的效率視許多因素而定。例如可接受的液滴推進所需電壓依介電層及疏水性層的性質而定。然而,另一重要因素為液滴的縱橫比(h/L)。液滴高度(“h”)會等於兩個平行基板之間的間隙高度,因為液滴會跨越此全部尺寸。長度(“L”)等於液滴垂直高度的寬度或尺寸。液滴依欲實行之操作而有最適的縱橫比。例如若在裝置之運輸專用區內的液滴縱橫比太低(即液滴長度太大),由於液滴與疏水性層之間的接觸面積大,則移動液滴可能需要較高的驅動電壓。對於縱橫比太高的液滴(即液滴長度太小)可能無法實行分裂操作。由於製造約束,EWoD裝置的設計通常具有均勻間隙高度,且包括尺寸均勻的電極;藉此對裝置各區域限制可得的縱橫比。因此,現在需要液滴推進操作可較有效率及其製造方法節省成本之改良EWoD裝置。As depicted in Figure 5, an EWoD device typically includes two parallel substrates. The operation of moving a droplet in the gap between two substrates is usually one of four main operations: transport (i.e. moving the droplet laterally through the gap), splitting (i.e. splitting a droplet into two or more smaller ones). droplet), dispensing (ie, drawing a droplet from a large fluid reservoir), and mixing/merging (ie, combining two droplets into one larger droplet). The efficiency of each operation depends on many factors. For example, the voltage required for acceptable droplet propulsion depends on the properties of the dielectric and hydrophobic layers. However, another important factor is the aspect ratio (h/L) of the droplet. The drop height ("h") will be equal to the gap height between the two parallel substrates since the drop will span this full dimension. The length ("L") is equal to the width or dimension of the vertical height of the droplet. Droplets have an optimal aspect ratio depending on the operation to be performed. For example, if the droplet aspect ratio is too low (i.e., the droplet length is too large) in the transport-dedicated region of the device, higher drive voltages may be required to move the droplet due to the large contact area between the droplet and the hydrophobic layer . Droplets with too high an aspect ratio (ie, too small a droplet length) may not be able to perform the splitting operation. Due to manufacturing constraints, EWoD device designs typically have uniform gap heights and include uniformly sized electrodes; thereby limiting the available aspect ratios for each region of the device. Accordingly, there is a need for improved EWoD devices with more efficient droplet propulsion operations and cost-effective fabrication methods.
在第一態樣中,本發明提供一種微流體裝置,其包含:(a)上板,其包含上基板、連結上基板表面之第一層疏水性材料、在第一層疏水性材料與上基板之間的連續電極;(b)下板,其包含下基板、複數個連結下基板之電極、連結第二基板且在該複數個電極上方之第二層疏水性材料。上板與下板係以間隔關係安置,因而界定在第一與第二層疏水性材料之間的間隙,以在施加推進電壓下液滴可在間隙內動作。下列之至少一者具有不均勻的厚度:上基板、第一層疏水性材料、第二層疏水性材料、下基板、及複數個電極,且該間隙具有複數個高度。In a first aspect, the present invention provides a microfluidic device, which includes: (a) an upper plate, which includes an upper substrate, a first layer of hydrophobic material connected to the surface of the upper substrate, and a layer between the first layer of hydrophobic material and the upper A continuous electrode between the substrates; (b) a lower plate comprising a lower substrate, a plurality of electrodes connected to the lower substrate, a second layer of hydrophobic material connected to the second substrate and over the plurality of electrodes. The upper plate and the lower plate are disposed in a spaced relationship thereby defining a gap between the first and second layers of hydrophobic material such that droplets can maneuver within the gap upon application of a propulsion voltage. At least one of the following has non-uniform thickness: the upper substrate, the first layer of hydrophobic material, the second layer of hydrophobic material, the lower substrate, and a plurality of electrodes, and the gap has a plurality of heights.
在第二態樣中,本發明提供一種製造微流體裝置之方法,其包含:提供第一基板與第二基板,第一與第二基板至少之一具有複數個厚度;對第一基板表面施加第一層疏水性材料而形成上板;對第二基板表面施加複數個電極,且在該複數個電極上施加第二層疏水性材料,而形成下板;及將下板以間隔關係安置而界定在第一與第二層疏水性材料之間的間隙,以在施加推進電壓下液滴可在間隙內動作。In a second aspect, the present invention provides a method of manufacturing a microfluidic device, which includes: providing a first substrate and a second substrate, at least one of the first and second substrates has a plurality of thicknesses; A first layer of hydrophobic material is used to form an upper plate; a plurality of electrodes are applied to the surface of the second substrate, and a second layer of hydrophobic material is applied on the plurality of electrodes to form a lower plate; and the lower plate is arranged in a spaced relationship A gap is defined between the first and second layers of hydrophobic material, so that the droplet can move in the gap under the application of a driving voltage.
在第三態樣中,本發明提供一種製造微流體裝置之方法,其包含:提供第一基板與第二基板;對第一基板表面施加第一層疏水性材料而形成上板;對第二基板表面施加複數個電極,且在該複數個電極上施加第二層疏水性材料,而形成下板;及將下板以間隔關係安置而界定在第一與第二層疏水性材料之間具有複數個高度之間隙,以在施加推進電壓下液滴可在間隙內動作。In a third aspect, the present invention provides a method for manufacturing a microfluidic device, which includes: providing a first substrate and a second substrate; applying a first layer of hydrophobic material to the surface of the first substrate to form an upper plate; A plurality of electrodes are applied on the surface of the substrate, and a second layer of hydrophobic material is applied on the plurality of electrodes to form a lower plate; There are gaps of multiple heights, so that the droplet can move in the gaps under the application of a driving voltage.
本發明之這些及其他態樣基於以下說明而明白。These and other aspects of the present invention will be apparent from the following description.
在以下的詳細說明中,為了徹底了解相關教示而舉例敘述許多指定細節。然而,本教示無此細節即可實行對所屬技術領域者應為明白的。In the following detailed description, numerous specific details are set forth by way of example in order to provide a thorough understanding of the relevant teachings. However, it will be apparent to those skilled in the art that the present teachings can be practiced without such details.
本發明之各種具體實施例提供包括雙基板之EWoD裝置。在此敘述的「下」基板包括複數個電極以推動各液滴通過微流體區域。「上」基板包括導電性材料層,其作為共用導體。使用「上」及「下」僅為了方便,因為兩個基板的位置可互換,且該裝置可以許多方式定向,例如上及下基板可約略平行,而整體裝置為使基板正交作業表面而定向(與圖式中所示的平行作業表面相反)。上或下基板可包括額外功能,如電阻加熱及/或溫度感測。可用以形成上及/或下基板之各種材料包括但不限於玻璃及其他氧化物、半導體材料(例如矽)、塑膠(例如丙烯酸系)、及其組合。Various embodiments of the present invention provide EWoD devices that include dual substrates. The "lower" substrate described herein includes a plurality of electrodes to propel individual droplets through the microfluidic region. The "top" substrate includes a layer of conductive material that acts as a common conductor. The use of "upper" and "lower" is for convenience only, as the positions of the two substrates are interchangeable, and the device can be oriented in many ways, for example the upper and lower substrates can be roughly parallel, and the overall device is oriented so that the substrates are normal to the work surface (as opposed to parallel working surfaces shown in the drawings). The upper or lower substrate may include additional functionality, such as resistive heating and/or temperature sensing. Various materials that can be used to form the upper and/or lower substrates include, but are not limited to, glass and other oxides, semiconductor materials such as silicon, plastics such as acrylics, and combinations thereof.
術語「連結」表示裝置之二個或以上的部件之間的任何直接或間接結構性連結或連接,其中該部件可為直接物理性接觸或經由中間部件(例如中間層、構件或黏著劑)連結。舉例而言,一層「連結」至基板在特定情況可表示其中該層直接鄰接且為物理性接觸基板的組態。然而,依內文而定,可將一層或以上的額外層或其他部件插入層與基板之間。The term "bonding" means any direct or indirect structural link or connection between two or more parts of a device, where the parts may be in direct physical contact or connected via intermediate parts (such as intermediate layers, members or adhesives) . For example, a layer "bonded" to a substrate may, in certain instances, refer to a configuration in which the layer is directly adjacent and in physical contact with the substrate. However, one or more additional layers or other components may be interposed between the layers and the substrate, depending on the context.
現在參考圖1,微流體裝置10包含上板及下板。上板包括上基板12,及下板包括下基板14。二板通常彼此平行,且彼此相對而固定。在此使用「固定」表示裝置10不包括任何可變動調整上與下板之間的距離之機械或機電部件。在一具體實施例中,上及下板被壓合在一起而形成可逆性附接。或者該附接可經移動式或永久性緊固器固定。Referring now to FIG. 1 , a
上基板12包括內表面,其可對全部或大部分內表面施加導電性材料連續層16。然後可在連續電極16上施加疏水性材料層22a。連續電極16的全部區域較佳為塗有疏水性材料層22a。該連續電極之導電性材料包括但不限於金屬氧化物(例如氧化銦錫)及導電性聚合物(PEDOT:PSS)。疏水性層22a可由疏水性材料製造,其經由合適的技術沈積在表面上形成塗層。依欲施加之疏水性材料而定,沈積技術實例包括旋塗、分子氣相沈積、及化學氣相沈積。疏水性層可為或多或少可濕潤,其一般由各自的接觸角界定。除非另有指示,否則在此依照內文以度(°)或徑(rad)測量角度。為了測量表面的疏水性之目的,應了解術語「接觸角」表示表面相對去離子(DI)水的接觸角。如果水的接觸角在0°<θ<90°之間,則將該表面歸類為親水性,而將產生接觸角在90°<θ<180°之間的表面視為疏水性。通常將中接觸角視為在約90°至約120°之範圍,而一般將高接觸角視為在約120°至約150°之範圍。在接觸角為150°<θ的情況則公認該表面為超級疏水性或超高疏水性。表面濕潤力可藉所屬技術領域已知之分析方法測量,例如將液滴分配到表面上及使用接觸角測角計實行接觸角測量。異向性疏水性可藉由將沿圖樣橫軸具有梯度表面濕潤力的基板傾斜,及檢驗可移動液滴的最小傾斜角度而檢驗。The
中接觸角之疏水性層一般包括一種氟聚合物或氟聚合物之摻合物,如PTFE(聚四氟乙烯)、FEP(氟化乙烯丙烯)、PVF(聚氟乙烯)、PVDF(聚偏二氟乙烯)、PCTFE(聚氯三氟乙烯)、PFA(全氟烷氧基聚合物)、FEP(氟化乙烯丙烯)、ETFE(聚乙烯四氟乙烯)、與ECTFE(聚乙烯氯三氟乙烯)。市售氟聚合物包括Cytop® (AGC Chemicals,賓州Exton)及Teflon® AF(Chemours,德拉瓦州Wilmington)。氟聚合物膜的優點為其可為高惰性,且即使是在暴露於氧化處理(如電暈處理及電漿氧化)之後仍可維持疏水性。The hydrophobic layer of medium contact angle generally includes a fluoropolymer or a blend of fluoropolymers, such as PTFE (polytetrafluoroethylene), FEP (fluorinated ethylene propylene), PVF (polyvinyl fluoride), PVDF (polyylidene Difluoroethylene), PCTFE (polychlorotrifluoroethylene), PFA (perfluoroalkoxy polymer), FEP (fluorinated ethylene propylene), ETFE (polyethylene tetrafluoroethylene), and ECTFE (polyethylene chlorotrifluoroethylene) vinyl). Commercially available fluoropolymers include Cytop® (AGC Chemicals, Exton, PA) and Teflon® AF (Chemours, Wilmington, DE). An advantage of fluoropolymer membranes is that they can be highly inert and remain hydrophobic even after exposure to oxidative treatments such as corona treatment and plasma oxidation.
下基板14有可對其施加複數個電極18a、18b的內表面。該電極可為被動矩陣或主動矩陣,如TFT陣列。將一層介電材料20塗覆在該複數個電極上,較佳為遍布全部電極區域上,並將可為相同或類似疏水性材料層22a之組成物的疏水性材料層22b施加於上基板。該介電層可包含一層大約20-40奈米之SiO2
,其上覆以200-400奈米之電漿沈積氮化矽。或者該介電層可包含2至100奈米厚之間,較佳為20至60奈米厚之間的原子層沈積Al2
O3
。雖然為了介電及疏水性功能均可為單層,但此等層一般須為厚無機層(以防止針孔)而造成低介電常數,因而液滴移動需要超過100伏。為了得到低電壓致動,其較佳為具有薄介電無機層而為高電容且無針孔,其上覆以薄有機疏水性層。以此組合則可以+/-10至+/-50伏範圍內的電壓進行電濕潤操作,其為習知TFT陣列可供應之範圍。其使用AC驅動藉由各種電化學以減少液滴、介電體及電極之劣化。EWoD的操作頻率可在100 Hz至1 MHz之範圍,但是對於使用具有操作速度有限的TFT,其較佳為1 kHz或以下的低頻。電極及驅動方法的各種架構之實例揭示於美國專利申請案序號第16/161,548號,其全部內容納入此處作為參考。The
如前所述,上及與下板可彼此相對固定,例如藉由壓合在一起直到建立可逆性附接。為了提供基板12、14之間的間隙25,上板與下板之間的距離及分離可藉一個或以上的間隔體24a、24b維持。間隙25較佳為被填充間隙流體。在該裝置內推動的液滴樣品在間隙流體中應不互混。例如若使用該微流體裝置對水性液滴樣品實行分析,則一般較佳為間隙流體為疏水性流體,如聚矽氧油、十二烷、或其他的長鏈、非極性烴油。As before, the upper and lower plates may be fixed relative to each other, for example by pressing together until a reversible attachment is established. To provide a
如圖1所描述,上基板12不具有均勻厚度。而是在一橫切面區域26b內的上基板12厚度可小於在相鄰橫切面區域26a內的上基板12厚度。結果,區域26a中的間隙25高度小於區域26b中的間隙高度。各區域26a、26b可為指定操作區。例如間隙高度小之區域26a可為分裂操作專用之指定操作區,而間隙高度大之區域26b可為運輸區。各指定操作區(例如運輸區、分配區、分裂區、及混合區)的間隙高度可異於至少一個其他指定操作區的間隙高度。各間隙高度一般在50至200微米之範圍,但是該間隙可更大。As depicted in FIG. 1 , the
為了提供厚度不均勻的上基板12,上基板12可由可蝕刻材料製成,如玻璃。蝕刻方法(如濕式蝕刻方法)可藉由首先對玻璃基板表面按所欲圖樣施加光阻而實行。然後可將圖樣化表面暴露於化學蝕刻劑經過指定量的時間而移除一部分的暴露玻璃。在足夠量的材料已被化學蝕刻掉之後,可將圖樣化表面清洗以移除光阻及任何殘餘蝕刻劑。亦可使用乾式蝕刻方法(例如電漿或光誘發蝕刻)提供厚度不均勻的上基板。In order to provide the
在依照本發明之一具體實施例之另一種方法中,可將微流體裝置之一或二基板模塑或成形而提供不均勻表面。例如可將具有基板表面所欲圖樣的反相之印模施加於一或二基板,較佳為在施加任何額外層之前。另一種提供厚度不均勻的一基板之方法為藉壓印。例如該基板可由可壓印材料製成,如塑膠膜,且可將具有所欲圖樣的反相之壓輥施加於基板材料表面。壓印方法可為輥對輥方法,如美國專利第6,930,818號所揭述者,其全部內容納入此處作為參考。壓印步驟可在基板表面被塗覆後(例如在將上基板塗覆導電性材料層或該疏水性材料層之後),使用來提供具有所欲表面地形的基板表面。然而,較佳為壓印係在施加這些層之前實行。In another method according to an embodiment of the present invention, one or both substrates of the microfluidic device may be molded or shaped to provide a non-uniform surface. For example, a stamp bearing the inverse of the desired pattern of the substrate surface may be applied to one or both substrates, preferably before any additional layers are applied. Another method of providing a substrate with non-uniform thickness is by embossing. For example, the substrate can be made of an imprintable material, such as a plastic film, and an inverse roller with the desired pattern can be applied to the surface of the substrate material. The embossing method can be a roll-to-roll method, as disclosed in US Patent No. 6,930,818, the entire contents of which are incorporated herein by reference. The embossing step may be used after the substrate surface has been coated, eg after coating the upper substrate with a layer of conductive material or the layer of hydrophobic material, to provide a substrate surface with a desired surface topography. However, it is preferred that embossing is carried out before applying the layers.
在一些具體實施例中,上及下基板均可具有不均勻厚度;然而,下基板具有不均勻表面地形較不佳,因為對不均勻表面施加電極陣列會比對上基板上的不均勻表面塗覆導電性材料連續層更為困難,因此成本較高。因此,較佳為二基板中僅載有連續導體的基板具有表面地形。在本發明之另一態樣中,上基板可變成另一表面地形不同的上基板。因此,本發明之各種具體實施例可為包含下基板、及被設計成可釋放地附接下基板(如使用緊固件)之複數個表面地形各不同的上基板之套件形式。如此使用者可依在該微流體裝置內欲實行的操作,來選擇各種上基板選項。In some embodiments, both the upper and lower substrates may have a non-uniform thickness; however, it is less favorable for the lower substrate to have a non-uniform surface topography because applying an array of electrodes to a non-uniform surface is less effective than coating a non-uniform surface on the top substrate. Applying a continuous layer of conductive material is more difficult and therefore more expensive. Therefore, it is preferred that only the one of the two substrates carrying the continuous conductor has a surface topography. In another aspect of the present invention, the upper substrate can be changed to another upper substrate with a different surface topography. Accordingly, various embodiments of the present invention may be in the form of a kit comprising a lower substrate, and a plurality of topographically varied upper substrates designed to be releasably attached to the lower substrate (eg, using fasteners). In this way, the user can select various upper substrate options according to the operations to be performed in the microfluidic device.
如圖1所描述,一橫切面區域26a內的下基板14上的電極的側面長度可比另一橫切面區域26b內的下基板14上的電極更短。因此,依照本發明之一具體實施例製造的裝置可依電極所在的橫切面區域的間隙高度25而具有指定電極寬度。如此對於裝置10之特定區域內的液滴如何得到所欲縱橫比有較大的控制。由於形成大小不同的電極陣列的困難度,較佳為提供具有側面長度實質上均勻的陣列的下基板14。對於具有大小類似的驅動電極陣列之微流體裝置,藉將一組電極結合在一起使得該組電極一致操作,可得到希望電極側面長度較大之橫切面區域。為了有效實行各推進操作,通常應維持大約1:2,更佳為約1:3的縱橫比。因此,由電極或電極組形成的滴液寬度應比高度大大約3倍。As depicted in FIG. 1 , the side lengths of the electrodes on the
至於移除或蝕刻材料的替代方案,依照本發明之各種具體實施例,間隙具有複數個高度之微流體裝置可藉由對一或二基板的內表面施加附加材料的圖樣而製造。例如參考圖2,其描述特徵與前述具體實施例相同的微流體裝置30。裝置30之上板可包含上基板32,其具有一層導電性材料形成連續電極38、及一層疏水性材料42a施加於上基板32的內表面,且下板包含下基板34、複數個電極40、介電層41、及一層疏水性材料42b亦施加於內表面。一個或以上的間隔體44a、44b將上下基板32、34維持分開而提供在疏水性材料層42a、42b之間的間隙45。圖2描述的具體實施例異於前述具體實施例在於上下基板32、34具有實質上均勻的厚度,但是附加材料36已被施加於上基板32內表面上的指定位置,而降低鄰接附加材料36的間隙45高度。As an alternative to removing or etching material, according to various embodiments of the present invention, microfluidic devices with gaps of multiple heights can be fabricated by applying a pattern of additional material to the inner surfaces of one or both substrates. Referring to FIG. 2, for example, a
在一些具體實施例中,該附加材料可為與導電性材料或疏水性材料相同的材料。然而,關於上基板32,附加材料36為與連續電極38之導電性材料相同的材料較不佳,因為厚度不均勻的導電性材料層會造成電性質橫越裝置30而變動。附加材料36可在施加該層導電性材料38之前或之後被施加於基板,較佳為之前。如果附加材料36不為疏水性,則亦較佳為在疏水性材料42a層之前施加附加材料36。附加材料36亦可在下基板34的內表面上或遍布複數個電極40被圖樣化。然而,使用介電材料41的圖樣提供表面地形為較不佳的選項,因為其可能造成電性質橫越下基板34內表面為不均勻。可用以形成基板表面地形之附加材料型式包括但不限於光阻材料(例如SU-8)、聚合材料(例如PMMA)、及介電材料(例如無機氧化物)。In some embodiments, the additional material can be the same material as the conductive material or the hydrophobic material. However, with respect to
其可能希望依照本發明之各種具體實施例製造的微流體裝置在一些應用中具有透光性的上基板及/或下基板以及對其施加之層,以對裝置間隙內的液滴樣品實行特定的分析步驟。例如通過上基板將液滴以光源照明,然後使用偵測器、視情況及彩色濾光器,通過上基板觀察生成的螢光,則可觀察到螢光標記。在其他具體實施例中,該光可通過上下基板而可進行IR、UV或可見光波長的吸收性測量。或者可使用衰減(受抑)全內反射光譜術探測系統中的液滴含量及/或位置。It may be desirable in some applications for microfluidic devices fabricated in accordance with various embodiments of the present invention to have optically transmissive upper and/or lower substrates and layers applied thereto to perform specific tests on droplet samples within the device gap. analysis steps. Fluorescent markers can be observed, for example, by illuminating the droplet with a light source through the upper substrate and then observing the resulting fluorescent light through the upper substrate using a detector, optionally and a color filter. In other embodiments, the light can be passed through the upper and lower substrates to allow for absorbance measurements at IR, UV or visible wavelengths. Alternatively attenuated (frustrated) total internal reflection spectroscopy may be used to detect droplet content and/or position in the system.
對於如何可在微流體裝置的基板之一的表面上形成附加材料的圖樣並無限制。例如若附加材料包含疏水性材料,則可對導電層施加最初之疏水性材料均勻塗層,繼而為加成的疏水性材料圖樣,或反之亦可。在另一種方法中,其可在以附加材料塗覆基板表面之前,對基板施加一個或以上的具有所欲圖樣之模板或遮罩。然後可將遮罩提高以顯現所欲圖樣。如果使用多個遮罩,則較佳為在施加之間將附加材料塗層乾燥。一旦形成圖樣,則可將導電性材料及疏水性材料之層施加於圖樣化附加材料上。在另一種方法中,其可將均勻的附加材料層施加在基板的全部表面上。其可使用雷射蝕刻附加材料,以形成表面地形。或者可在使用化學蝕刻劑移除任何暴露材料之前,將一個或以上的遮罩或光阻以圖樣施加於均勻的附加材料塗層。再度在蝕刻及清洗表面圖樣之後,可施加導電性材料及疏水性材料之層於附加材料上。There is no limitation as to how the additional material may be patterned on the surface of one of the substrates of the microfluidic device. For example, if the additional material comprises a hydrophobic material, an initial uniform coating of hydrophobic material followed by a pattern of added hydrophobic material, or vice versa, may be applied to the conductive layer. In another approach, one or more stencils or masks with the desired pattern may be applied to the substrate prior to coating the surface of the substrate with the additional material. The mask can then be raised to reveal the desired pattern. If multiple masks are used, it is preferred to allow the additional coat of material to dry between applications. Once patterned, layers of conductive material and hydrophobic material can be applied over the patterned add-on material. In another approach, it is possible to apply a uniform layer of additional material over the entire surface of the substrate. It uses lasers to etch additional material to create surface topography. Alternatively, one or more masks or photoresists may be applied in a pattern to the uniform coating of additional material before using a chemical etchant to remove any exposed material. Again after etching and cleaning the surface pattern, a layer of conductive material and hydrophobic material can be applied on top of the additional material.
如前所示,其可修改上及/或下基板以包括附加材料而提供具有複數個間隙高度之裝置。例如圖3描述本發明之較不佳具體實施例。微流體裝置31包括短電極40a及高電極40b在下基板34上的陣列。使用額外的導電性材料形成高電極40b,因而相對鄰接短電極40a的間隙高度,降低鄰接高電極40b之間隙45的高度。As previously indicated, it is possible to modify the upper and/or lower substrates to include additional materials to provide devices with multiple gap heights. Figure 3, for example, depicts a less preferred embodiment of the present invention. The
現在參考圖4,在施加介電材料60及疏水性層62b之後,微流體裝置50可藉由對下基板54施加複數個具有各種高度之間隔體64a、64b、64c而形成。然後可將具有共用電極層56及疏水性層62a之上基板52壓合及黏結在複數個間隔體64a、64b、64c上,使得藉間隔體64a、64b、64c維持高度不同的間隙66,且裝置50內任何位置的間隙高度依間隙66附近之間隔體64a、64b、64c的尺寸而定。在各變形方法中可使用熱及/或壓力提供更柔順及可變形基板,且利於將上基板黏結到間隔體。Referring now to FIG. 4, after application of the
由以上可知,為了更為有效地控制微流體裝置內相同液滴之推進操作,本發明提供製造裝置之改良方法,其在裝置之指定區域對於間隙高度符合電極尺寸可有較大的設計選擇。例如在試劑輸入貯器位置處的訂製化的間隙高度會改變將液滴分配到裝置中的摩擦及毛細力。較大的間隙高度製造較有利的毛細作用。較小的間隙高度連同較小的電極可改良液滴體積控制。一些操作亦被改良,如混合,其中液滴可從間隙高度大之區域移動到間隙高度小之區域。有效間隙高度較小亦可使用較少的試劑體積。一些分析用之試劑非常昂貴,故以減少的試劑體積有效實行反應及操作的能力提供潛在的成本優點。From the above, it can be seen that in order to more effectively control the propulsion operation of the same droplet in the microfluidic device, the present invention provides an improved method of manufacturing the device, which allows greater design options for the gap height to match the electrode size in a designated area of the device. For example, a customized gap height at the location of the reagent input reservoir changes the frictional and capillary forces that dispense the droplets into the device. A larger gap height produces a more favorable capillary action. Smaller gap heights in conjunction with smaller electrodes improve droplet volume control. Some operations are also improved, such as mixing, where droplets can move from areas with large gap heights to areas with small gap heights. A smaller effective gap height also allows for the use of less reagent volume. Reagents for some assays are very expensive, so the ability to efficiently perform reactions and manipulations with reduced reagent volumes offers a potential cost advantage.
現已在此顯示及揭述本發明之較佳具體實施例,應了解此具體實施例僅為了舉例而提供。所屬技術領域者可進行許多變化、改變及取代而不背離本發明之精神。因而意圖所附申請專利範圍涵蓋所有此種在本發明之精神及範圍內的變化。Having shown and described herein a preferred embodiment of the invention, it should be understood that this embodiment is provided by way of example only. Those skilled in the art can make many changes, changes and substitutions without departing from the spirit of the present invention. It is therefore intended that the appended claims cover all such variations as fall within the spirit and scope of the invention.
所有上述專利及申請案的內容全部納入此處作為參考。在本申請案的內容與任何納入此處作為參考的專利及申請案之間有任何不一致的情形,在解決此不一致所需的程度均應以本申請案的內容為主。The contents of all of the above patents and applications are incorporated herein by reference in their entirety. In the event of any inconsistency between the contents of this application and any patents and applications incorporated herein by reference, the contents of this application shall control to the extent necessary to resolve such inconsistency.
10:微流體裝置
12:上基板
14:下基板
16:連續電極
18a:電極
18b:電極
20:介電材料
22a:疏水性材料層
22b:疏水性材料層
24a:間隔體
24b:間隔體
25:間隙
26a:橫切面區域
26b:橫切面區域
30:微流體裝置
31:連續電極
32:上基板
34:下基板
36:附加材料
38:連續電極
40:電極
40a:短電極
40b:高電極
41:介電層
42a:疏水性材料層
42b:疏水性材料層
44a:間隔體
44b:間隔體
45:間隙
50:微流體裝置
52:上基板
54:下基板
56:共用電極層
60:介電材料
62a:疏水性層
62b:疏水性層
64a:間隔體
64b:間隔體
64c:間隔體
66:間隙10: Microfluidic devices
12: Upper substrate
14: Lower substrate
16:
200:介電濕潤(EWoD) 200: Dielectric Wetting (EWoD)
202:油 202: oil
204:水滴 204: water drop
205:推進電極 205:Propulsion electrode
206:上電極 206: Upper electrode
207:疏水性塗層 207: Hydrophobic coating
208:介電層 208: dielectric layer
210:在接收AC信號之電極上方的液體/介電界面處液體中誘發負電荷 210: Negative charge induced in a liquid at the liquid/dielectric interface above an electrode receiving an AC signal
212:此像素始終具有滴液界面處誘發電荷之相反電荷 212: This pixel always has the opposite charge of the charge induced at the droplet interface
214:對電極施加AC電壓,此圖顯示電極帶正電荷之例 214: Apply AC voltage to the electrode, this figure shows an example of positive charge on the electrode
216:當對電極施加負電壓時誘發的正電荷 216: Positive charge induced when a negative voltage is applied to the electrode
218:液滴按此方向移動 218: Droplets move in this direction
圖式說明依照本發明概念之一種或以上的實作,其僅為舉例而絕非限制。圖式未按比例。在圖式中,同樣的元件符號指相同或類似的元件。The drawings illustrate one or more implementations in accordance with the concepts of the present invention, which are presented by way of example only and not by way of limitation. Drawings are not to scale. In the drawings, the same reference numerals refer to the same or similar elements.
圖1為依照本發明之第一具體實施例的EWoD裝置之示意橫切面側視圖。FIG. 1 is a schematic cross-sectional side view of an EWoD device according to a first embodiment of the present invention.
圖2為依照本發明之第二具體實施例的EWoD裝置之示意橫切面側視圖。2 is a schematic cross-sectional side view of an EWoD device according to a second embodiment of the present invention.
圖3為依照本發明之第三具體實施例的EWoD裝置之示意橫切面側視圖。3 is a schematic cross-sectional side view of an EWoD device according to a third embodiment of the present invention.
圖4為依照本發明之第四具體實施例的EWoD裝置之示意橫切面側視圖。4 is a schematic cross-sectional side view of an EWoD device according to a fourth embodiment of the present invention.
圖5為傳統EWoD裝置之示意橫切面側視圖。Fig. 5 is a schematic cross-sectional side view of a conventional EWoD device.
10:微流體裝置 10: Microfluidic devices
12:上基板 12: Upper substrate
14:下基板 14: Lower substrate
16:連續電極 16: Continuous electrode
18a:電極 18a: electrode
18b:電極 18b: electrode
20:介電材料 20: Dielectric material
22a:疏水性材料層 22a: Hydrophobic material layer
22b:疏水性材料層 22b: Hydrophobic material layer
24a:間隔體 24a: spacer
24b:間隔體 24b: spacer
25:間隙 25: Clearance
26a:橫切面區域 26a: Cross section area
26b:橫切面區域 26b: Cross section area
Claims (9)
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EP3980184A4 (en) * | 2019-06-07 | 2023-06-14 | Nuclera Nucleics Ltd | Microfluidic devices containing reversibly pinned droplet samples and methods |
US11927740B2 (en) | 2019-11-20 | 2024-03-12 | Nuclera Ltd | Spatially variable hydrophobic layers for digital microfluidics |
WO2021146573A1 (en) | 2020-01-17 | 2021-07-22 | E Ink Corporation | Spatially variable dielectric layers for digital microfluidics |
US11946901B2 (en) | 2020-01-27 | 2024-04-02 | Nuclera Ltd | Method for degassing liquid droplets by electrical actuation at higher temperatures |
CN115175764A (en) | 2020-02-18 | 2022-10-11 | 核酸有限公司 | Adaptive gate drive for high frequency AC drive of EWoD array |
JP2023514278A (en) | 2020-02-19 | 2023-04-05 | ヌークレラ ヌクリークス, リミテッド | Latched Transistor Drive for High Frequency AC Drive of EWoD Arrays |
WO2021222061A1 (en) | 2020-04-27 | 2021-11-04 | Nuclera Nucleics Ltd. | Segmented top plate for variable driving and short protection for digital microfluidics |
CN114534805B (en) * | 2022-02-09 | 2024-08-06 | 上海天马微电子有限公司 | Microfluidic device, driving method thereof and manufacturing method thereof |
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US10543466B2 (en) * | 2016-06-29 | 2020-01-28 | Digital Biosystems | High resolution temperature profile creation in a digital microfluidic device |
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US20150377831A1 (en) * | 2014-06-27 | 2015-12-31 | The Governing Council Of The University Of Toronto | Digital microfluidic devices and methods employing integrated nanostructured electrodeposited electrodes |
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