TWI793559B - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

The present invention provides a substrate processing apparatus and a substrate processing method capable of suppressing reduction in productivity. A substrate processing apparatus according to an embodiment includes: a transfer robot disposed in a transfer chamber to transfer a substrate; a moving mechanism disposed in the transfer chamber to move the transfer robot; and a control unit (72). The control unit (72) includes: a recognition unit (73), which detects the position of a person in the transfer chamber; a setting unit (74), which sets an area including the position of the person detected by the recognition unit (73); a follower unit (75) The area set by the setting unit (74) is moved according to the movement of the person; and the robot controller (72d) controls the transfer robot and the moving mechanism so that the transfer robot avoids the area and transfers the substrate.

Description

Substrate processing apparatus and substrate processing method

The invention relates to a substrate processing device and a substrate processing method.

The substrate processing apparatus is a one-piece substrate processing apparatus that performs various processes (such as etching processing) one by one using a plurality of processing chambers for various substrates such as semiconductor wafers, glass substrates for photomasks, and glass substrates for liquid crystals. , cleaning treatment, rinse treatment, drying treatment, etc.). The substrate processing apparatus is an apparatus in which a plurality of processing chambers are arranged along a transfer chamber (robot chamber) in which a transfer robot that transfers substrates moves, and operators may perform maintenance work on the processing chambers from the transfer chamber side. The transfer chamber is a clean environment with down-flow. An operator enters the transfer chamber and moves to the processing chamber for maintenance objects on foot, and performs maintenance work on the processing chamber.

When the operator performs maintenance work on the processing chamber from the transfer chamber side, the operator needs to turn off the power supply of the transfer robot or substrate processing equipment before entering the transfer chamber so that the transfer robot does not interfere (collision, etc.) with the inside of the transfer chamber. Operators. At this time, since the power supply of the transfer robot or the substrate processing apparatus is cut off and maintenance work is performed, the substrate processing is also stopped. Therefore, productivity (for example, productivity=production amount/time) falls. [Prior art literature] [Patent Document]

[Patent Document 1] Japanese Patent No. 4101166

[Problem to be Solved by the Invention]

The problem to be solved by the present invention is to provide a substrate processing apparatus and a substrate processing method capable of suppressing a decrease in productivity. [Means to solve the problem]

The substrate processing apparatus according to the embodiment of the present invention includes: a transfer robot installed in the transfer chamber to transfer the substrate; a moving mechanism installed in the transfer chamber to move the transfer robot; a position; a setting unit that sets an area including the position of the person detected by the detection unit; a following unit that moves the area set by the setting unit in response to movement of the person; and The control unit controls the transfer robot and the moving mechanism so that the transfer robot avoids the area moved by the follower and transfers the substrate.

A substrate processing method according to an embodiment of the present invention includes the steps of: using a detection unit to detect the position of a person in a transfer chamber in which a transfer robot for transferring a substrate and a moving mechanism for moving the transfer robot are installed; a setting unit sets an area including the position of the person detected by the detection unit; moves the area set by the setting unit in response to movement of the person by a following unit; A part controls the transfer robot and the moving mechanism so that the transfer robot avoids the area moved by the follow-up part and transfers the substrate. [Effect of the invention]

According to the embodiment of the present invention, reduction in productivity can be suppressed.

<First Embodiment> A first embodiment will be described with reference to FIGS. 1 to 5 .

(basic structure) As shown in FIG. 1 , a substrate processing apparatus 10 according to the first embodiment includes a plurality of opening and closing units 20 , a first transfer unit 30 , a buffer unit 40 , a second transfer unit 50 , a plurality of substrate processing units 60 , and an attached unit 70 . The substrate processing apparatus 10 is a device that supplies a processing liquid (such as a resist stripping liquid, a rinse liquid, and a cleaning liquid) to the substrate surface to process the substrate surface, and each substrate processing unit 60 performs various processing steps (such as resist agent stripping process or rinse process, cleaning process).

Each switch unit 20 is arranged in a row. These opening and closing units 20 open and close doors of dedicated pods (for example, front-opening-unified-pods (FOUPs)) functioning as transfer containers. In addition, when the dedicated box is a FOUP, the opening and closing unit 20 is called a FOUP opener. In the dedicated box, the substrates W are stacked and stored at predetermined intervals.

The first transport unit 30 has a first moving mechanism 31 and a first transport robot 32 . The first moving mechanism 31 and the first transfer robot 32 are installed in the first transfer chamber 33 . The first transfer chamber 33 is a rectangular parallelepiped room extending parallel to the direction in which the opening and closing units 20 are aligned. The opening and closing units 20 are arranged beside the first transfer chamber 33 .

In the first transfer chamber 33, two entrances and exits 33a are provided. These entrances and exits 33 a are respectively provided on the wall surfaces at both ends in the extending direction of the first transfer chamber 33 . Persons (for example, workers) enter and exit the first transfer chamber 33 through the respective entrances and exits 33a. And in the 1st transfer chamber 33, the some imaging part 33b which images a room is installed. For example, in the ceiling part of the 1st transfer chamber 33, the imaging part 33b is provided in both ends of the extending direction, respectively. As the imaging unit 33b, for example, a video camera that takes pictures can be used. Also, in the first transfer chamber 33 , an air conditioner (not shown) that flows clean air downflow from the ceiling is arranged, and the clean air flows downward from above the substrate W to be transferred. Thereby, it is possible to suppress the dust or dust generated in the peripheral portion of the substrate or the like from adhering to the substrate W, and it is also possible to suppress the dust or dust generated by the first moving mechanism 31, the first transfer robot 32, etc. from flying up and adhering to the substrate W. .

The first moving mechanism 31 extends parallel to the extending direction of the first transfer chamber 33 and is a mechanism for moving the first transfer robot 32 on a straight line parallel to the extending direction of the first transfer chamber 33 . A first transfer robot 32 is provided on the first moving mechanism 31 , and the first moving mechanism 31 is configured to reciprocate the first transfer robot 32 from end to end of each opening and closing unit 20 arranged in a row. As the first moving mechanism 31 , for example, a moving mechanism having a linear guide can be used.

The first transfer robot 32 is movable along the extending direction of the first moving mechanism 31 and is installed on the first moving mechanism 31 via the swivel table 32 a. The swivel table 32a is formed so as to be able to swivel around a swivel shaft 32b located on a straight line of the first moving mechanism 31 . The first transfer robot 32 is placed on the end portion of the turning table 32a on the opposite side to the turning shaft 32b. The first transfer robot 32 is shifted from directly above the first moving mechanism 31 by turning the turning table 32a. That is, it is shifted to either the side of each switch unit 20 or the side of the buffer unit 40 . (Picture 1 is shifted to each switching unit side). While supporting the first transfer robot 32 , the swivel table 32 a moves together with the first transfer robot 32 by the first moving mechanism 31 along the extending direction of the first moving mechanism 31 . Accordingly, the first transfer robot 32 can move to a position where the substrate W can be delivered to and from the opening and closing unit 20 or the buffer unit 40 . Furthermore, the first transfer robot 32 can rotate while moving, and can transfer the substrate W through the passage of each opening and closing unit 20 and the buffer unit 40 through the shortest path. In addition, the swivel table 32a can swivel by a swivel mechanism (not shown).

The first transfer robot 32 has, for example, a lifting shaft and a revolving shaft (both not shown), which can be lifted and lowered along the elevating shaft, and can revolve on the revolving platform 32a with the revolving shaft as the center, so that the two telescopic arms can move independently . A substrate hand for holding the substrate W is attached to the telescopic arm. The operation of replacing the substrate W is performed in a short time by causing the two arms to continuously perform the operation of holding the substrate W and the operation of placing the grasped substrate W on the installation place (hand opening). The first transfer robot 32 performs the replacement operation of the substrate W in the dedicated cassette while swiveling from the swivel table 32a to the side of the first moving mechanism 31 close to the opening and closing unit 20 around the swivel axis 32b. In addition, the first transfer robot 32 performs the buffer unit 40 in a state where the first transfer robot 32 is swiveled from the swivel table 32 a to the side farther from the opening and closing unit 20 (the side closer to the buffer unit 40 ) of the first moving mechanism 31 around the swivel axis 32 b. The replacement action of the substrate W in .

Here, as shown in FIG. 2 , the operating range (moving range) H1 of the first transfer robot 32 is the three-dimensional range of the first transfer robot 32 required for the replacement operation of the substrate W with each opening and closing unit 20 or buffer unit 40 . The range of movement of the region (also includes the range of movement of the arm or hand). The first transfer robot 32 can move back and forth from end to end of the first moving mechanism 31 along the extension direction of the first moving mechanism 31 in the state of being positioned at each opening and closing unit 20 side in the first transferring chamber 33, facing the opening and closing The unit 20 performs the replacement operation of the substrate W. In addition, the first transfer robot 32 faces the buffer unit 40 and performs the replacement operation of the substrate W in a state located on the second transfer unit 50 side in the first transfer chamber 33 .

The buffer unit 40 is located on the side of the second conveying unit 50 in the first conveying chamber 33 , and is provided slightly deviated from the center in the extending direction of the first moving mechanism 31 . This buffer unit 40 is a buffer table, and temporarily places the substrate W in order to transfer (replace) the substrate W between the first transfer unit 30 and the second transfer unit 50 . In the buffer unit 40 , unprocessed or processed substrates W are stacked and stored at predetermined intervals.

The second transport unit 50 has a second moving mechanism 51 and a second transport robot 52 . The second moving mechanism 51 and the second transfer robot 52 are installed in the second transfer chamber 53 . The second transfer chamber 53 is a rectangular parallelepiped room extending parallel to the direction perpendicular to the extending direction of the first moving mechanism 31 in the horizontal plane. The second transfer chamber 53 is connected to the vicinity of the center in the extending direction of the first transfer chamber 33 , and the first transfer chamber 33 and the second transfer chamber 53 form a T-shaped transfer chamber (substrate transfer chamber) in plan view. Four substrate processing units 60 are provided so as to face each other so as to sandwich the second transfer chamber 53 in the short-side direction.

In the second transfer chamber 53, an entrance and exit 53a for the unit with equipment 70 is provided. The entrance and exit 53 a are provided on the wall surface at one end in the extending direction of the second transfer chamber 53 . A person (for example, an operator) enters and exits the apparatus-attached unit 70 through the entrance and exit 53a. And in the 2nd transfer chamber 53, the some imaging part 53b which images a room is installed. For example, on the ceiling portion of the second transfer chamber 53, imaging units 53b are respectively provided at both ends in the extending direction. As the imaging unit 53b, for example, a video camera that takes pictures can be used. In addition, in the second transfer chamber 53, an air conditioning unit (not shown) that flows clean air downflow from the ceiling portion is arranged similarly to the first transfer chamber 33, and the clean air flows from above the substrate W to be transferred to the second transfer chamber 53. flow down. This prevents dust or dust generated at the periphery of the substrate or the like from adhering to the substrate W, and also prevents dust or dust blown up by the second moving mechanism 51 or the second transfer robot 52 from adhering to the substrate W.

The second moving mechanism 51 extends in a direction perpendicular to the extension direction of the first moving mechanism 31 in the horizontal plane, and is a mechanism for making the second transfer robot 52 move on a straight line, and the straight line is in line with the first moving mechanism in the horizontal plane. The direction perpendicular to the extending direction of 31 is parallel. The second transfer robot 52 is provided on the second moving mechanism 51 , and the second moving mechanism 51 is configured to reciprocate the second transfer robot 52 from end to end of each substrate processing unit 60 arranged in a row. As the second moving mechanism 51, for example, a moving mechanism having a linear guide can be used.

The second transfer robot 52 can move along the extending direction of the second moving mechanism 51 and is installed on the second moving mechanism 51 via the swivel table 52a. The swivel table 52a can swivel about the swivel axis 52b located on the straight line of the second moving mechanism 51 as a center. The second transfer robot 52 is placed on the end portion of the swivel table 52a on the opposite side to the swivel shaft 52b. The second transfer robot 52 deviates from directly above the second moving mechanism 51 by the swivel table 52 a turning. That is, it deviates to either one of both sides in the extending direction of the second moving mechanism 51 (see FIG. 1 ). While supporting the second transfer robot 52 , the swivel table 52 a moves together with the second transfer robot 52 by the second moving mechanism 51 along the extending direction of the second moving mechanism 51 . Accordingly, the second transfer robot 52 can move to a position where the substrate W can be delivered to and from the substrate processing unit 60 or the buffer unit 40 . Furthermore, the second transfer robot 52 can rotate while moving, and can transfer the substrate W through the passage between each processing chamber 61 and the buffer unit 40 through the shortest path. In addition, the swivel table 52a can swivel by a swivel mechanism (not shown).

The second transfer robot 52 is the same as the first transfer robot 32. For example, it has a lifting shaft and a revolving shaft (both are not shown in the figure), can be raised and lowered along the elevating shaft, and can revolve on the revolving platform 52a centering on the revolving shaft, and then The two telescopic arms can be moved independently. A substrate hand for holding the substrate W is attached to each telescopic arm. Substrate W can be exchanged in a short time by causing the two arms to successively perform the operation of holding the substrate W and the operation of placing the grasped substrate W on the installation site (hand opening). The second transfer robot 52 performs the substrate replacement of the substrate W in a state where the second transfer robot 52 is revolving from the revolving table 32a to the side of the substrate processing unit 60 close to the replacement object of the substrate W in the second moving mechanism 51. The replacement operation of the substrate W in the processing unit 60 . Furthermore, the second transfer robot 52 performs an operation of replacing the substrate W in the buffer unit 40 while moving to the buffer unit 40 side of the second moving mechanism 51 .

Here, as shown in FIG. 2 , the operating range (moving range) H2 of the second transfer robot 52 is the range of the second transfer robot 52 required for the replacement operation of the substrate W with each substrate processing unit 60 or buffer unit 40 . The range of movement of the three-dimensional area (also includes the range of movement of the arm or hand). The second transfer robot 52 can reciprocate from end to end of the second moving mechanism 51 along the extending direction of the second moving mechanism 51 in a state of being located on the side of the substrate processing units 60 aligned in a row in the second transferring chamber 53 . The substrate W is moved, and the substrate processing unit 60 is facing the replacement operation of the substrate W. Further, the second transfer robot 52 is positioned on the side of the buffer unit 40 in the second transfer chamber 53 , facing the buffer unit 40 and performing the replacement operation of the substrate W.

For example, four substrate processing units 60 are provided on both sides of the robot moving path where the second transfer robot 52 moves along the extending direction of the second moving mechanism 51 . The substrate processing unit 60 has a processing chamber 61 and is, for example, a monolithic substrate processing unit. The processing chamber 61 is formed in a rectangular parallelepiped shape, for example. In this processing chamber 61 , a substrate holding unit, a processing liquid supply unit (both are not shown), and the like are provided. As the substrate holding unit, for example, a turntable that holds and rotates the substrate W in a horizontal state can be used. Furthermore, as the processing liquid supply unit, for example, a processing liquid that supplies a processing liquid (such as a chemical liquid, a rinse liquid, or a cleaning liquid) from a nozzle (not shown) to the surface to be processed of the substrate W held by the substrate holding portion can be used. supply department.

The processing chamber 61 has a substrate shutter (not shown) serving as an entrance and exit for substrates. A substrate shutter is formed on a wall surface of the processing chamber 61 on the second transfer chamber 53 side so as to be openable and closable. In the processing chamber 61 , an air conditioner (not shown) that flows clean air downflow from the ceiling portion is arranged, and the clean air flows downward from above the substrate W to be transported. Thereby, dust or dust generated in the peripheral portion of the substrate or the like can be suppressed from adhering to the substrate W, and dust generated by the second transfer robot 52 or the like can be suppressed from flying up and adhering to the substrate W. In addition, the operator performing the maintenance work opens the substrate shutter, and performs the maintenance work on the processing chamber 61 from the second transfer chamber 53 side.

The device-attached unit 70 is located on the side opposite to the first transfer chamber 33 (first transfer unit 30 ) in the second transfer chamber 53 , and is provided beside the second transfer chamber 53 . The device-attached unit 70 has a liquid supply unit 71 and a control unit 72 . The liquid supply unit 71 is configured to supply various processing liquids to the respective substrate processing units 60 .

As shown in FIG. 3 , the control unit 72 includes a computer 72a, a memory unit 72b, an area controller 72c, and a robot controller (control unit) 72d. Each of these units is constituted by, for example, both or any one of hardware (such as an electric circuit) and software. The computer 72a is a main control unit (such as a microcomputer) that centrally controls each unit. The memory unit 72b stores various information, various programs, and the like.

The computer 72a controls each opening and closing unit 20 or the first transfer unit 30, the buffer unit 40, the second transfer unit 50, and each substrate processing unit 60 based on the substrate processing information or various programs stored in the memory unit 72b. Moreover, the computer 72a can obtain mechanical position information at any time from the first moving mechanism 31 or the first transport robot 32, the second mobile mechanism 51, the second transport robot 52, etc., for example, from a plurality of encoders included in these respective parts. etc. to obtain their respective location information (such as plane coordinates or spatial coordinates) at any time. Furthermore, the computer 72a can acquire respective image information from each imaging unit 33b and imaging unit 53b at any time. In addition, each imaging unit 33b and imaging unit 53b respectively take real-time images of the first transfer chamber 33 or the transfer chamber of the second transfer chamber 53, and send image information related to the images obtained by the images to the zone controller 72c. .

The area controller 72 c has a recognition unit (detection unit) 73 , a setting unit 74 , and a follower unit 75 . The recognition part 73 analyzes the image based on the image information obtained by each of the imaging parts 33b and 53b, and detects a person (presence or absence of a person) in the first transfer chamber 33 or the second transfer chamber 53, and the first transfer robot. 32. The second transfer robot 52 recognizes these positions or areas (three-dimensional areas). The setting unit 74 sets the region R1, which is a spatial region of a desired size including the position of the person detected by the recognition unit 73 (see FIGS. 4 and 5 ), and includes the shape, size, and position of the region R1. etc. are stored in the memory unit 72b. The region R1 is, for example, a cylindrical spatial region of a desired size including at least the detected person, and the region R1 is set by spatial coordinates. The following unit 75 moves the region R1 set by the setting unit 74 in accordance with the movement of the person. For example, the following unit 75 changes the position information of the region R1 among the information stored in the memory unit 72 b in accordance with the movement of the person.

When the recognition unit 73 detects the position of a person in the first transfer chamber 33 or the second transfer chamber 53 , the computer 72 a switches the operation mode from the normal operation mode to the maintenance work mode (an example of the work mode). The normal operation mode is a mode in which the substrate processing apparatus 10 performs normal operation and no person enters the first transfer chamber 33 or the second transfer chamber 53 . The maintenance work mode is a mode in which a person enters the first transfer chamber 33 or the second transfer chamber 53 for maintenance work. For example, if the recognition unit 73 detects the position of a person in the first transfer chamber 33 or the second transfer chamber 53, then the computer 72a grasps that the person has entered the first transfer chamber 33 or the second transfer chamber 53, and changes the operation mode from normal to normal. The operation mode is switched to the maintenance work mode. And if the identification part 73 does not detect the position of the person in the first transfer chamber 33 and the second transfer chamber 53, then the computer 72a grasps that the person is not in the first transfer chamber 33 or the second transfer chamber 53, and changes the operation mode from maintenance to maintenance. The work mode is switched to the normal operation mode. In this way, the computer 72a functions as a switching unit.

The robot controller 72d controls the first moving mechanism 31 and the first transport robot 32 ( Also includes the swivel table 32a, hereinafter the same), the second moving mechanism 51, the second transfer robot 52 (also includes the swivel table 52a, hereinafter the same), and the like. That is, the robot controller 72d recognizes the operation range H1 of the first transfer robot 32 or the operation range H2 of the second transfer robot 52 based on the operation range information related to the operation range H1 of the first transfer robot 32 or the operation range H2 of the second transfer robot 52 The recognized operating range H1 and H2 are changed according to the movement of the area R1 without touching the area R1, and the changed operating range H1 and H2 are stored in the memory unit 72b at any time. In addition, the robot controller 72d controls the first moving mechanism 31, the first moving mechanism 31, the first moving mechanism 52 so that the first moving robot 32 and the second moving robot 52 move the substrate W only within the operating range H1 and operating range H2 stored in the memory unit 72b. The transfer robot 32, the second moving mechanism 51, the second transfer robot 52, and the like. In addition, the motion range information mentioned above is, for example, information specifying the motion range H1 and the motion range H2 by spatial coordinates, and is stored in the memory unit 72b in advance.

(maintenance work) Next, maintenance work performed by an operator in the substrate processing apparatus 10 will be described. As an example, a case where an operator performs maintenance work on the processing chamber 61 of A1 in FIG. 4 and FIG. 5 will be described.

As shown in Figure 4, the operator enters the first transfer chamber 33 from the entrance 33a of the first transfer chamber 33, moves to the vicinity of the buffer unit 40, and as shown in Figure 5, enters the second transfer chamber 53 from the vicinity of the buffer unit 40 , move to the position facing the processing chamber 61 of A1 in FIG. 5 . Next, the operator performs maintenance work on each part in the processing chamber 61 of A1, and if the maintenance work is completed, the operator moves back to the position facing the processing chamber 61 of A1 from the entrance and exit 33a of the first transfer chamber 33 just now. to move to and exit from the entrance/exit 33a of the first transfer chamber 33 .

In this way, the operator moves to perform maintenance work, and in the first transfer chamber 33 and the second transfer chamber 53 , the imaging units 33b and 53b capture images of the interior in real time. When an operator enters the first transfer chamber 33, the operator is detected by the recognition unit 73 based on the image information obtained by each imaging unit 33b, and the computer 72a switches the normal operation mode to the maintenance operation mode. On the other hand, if the operator finishes the maintenance work and exits from the first transfer chamber 33 and the second transfer chamber 53, the recognition unit 73 does not detect the operator based on the image information obtained by the respective imaging units 33b and 53b. , the maintenance work mode is switched to the normal operation mode by the computer 72a. In the normal operation mode, the identification operation of the identification part 73, the setting operation of the setting part 74, the following operation of the following part 75, and the avoidance control operation of the robot controller 72d (control operation for avoiding the second transfer robot 52 from the region R1) prohibited, the above-mentioned actions are allowed in the maintenance work mode.

And based on the image information obtained by each imaging unit 33b and imaging unit 53b, the recognition unit 73 detects the operator, the first transfer robot 32, and the second transfer robot 52, and recognizes the presence and position of the operator, the first transfer robot The position of the robot 32 and the position of the second transfer robot 52 . The area R1 including the position of the worker detected by the recognition unit 73 is set by the setting unit 74, and information including the shape, size, position, etc. of the area R1 is stored in the memory unit 72b. Based on the image information obtained by each of the imaging units 33b and 53b, the presence and location of the operator, the position of the first transfer robot 32, and the position of the second transfer robot 52 are recognized in real time. Therefore, among the information memorized in the memory unit 72b, the positional information of the region R1 is constantly changed according to the movement of the operator.

The robot controller 72d recognizes the motion range H1 of the first transfer robot 32 or the motion range H2 of the second transfer robot 52 based on the motion range information stored in the memory unit 72b, and makes the recognized motion range based on the information stored in the memory portion 72b. The range H1 and the operating range H2 change according to the movement of the region R1 so as not to touch the region R1. In FIG. 5, the robot controller 72d changes the recognized operation range H2 according to the movement of the region R1 so as not to touch the region R1, and based on the changed operation range H2, the second transfer robot 52 avoids the region R1 to transfer the substrate. In the W mode, that is, the second moving mechanism 51 and the second transport robot 52 are controlled in such a manner that the second transport robot 52 transports the substrate W only within the variable operating range H2.

Here, the first transfer robot 32 basically transfers the substrate between the switching units 20 and the buffer unit 40, but transfers the substrate so that the transfer path of the substrate W becomes the shortest distance within the operating range H1 of the first transfer robot 32. W. Furthermore, the second transfer robot 52 transfers the substrate between the processing chamber 61 and the buffer unit 40, and further transfers the substrate between the respective processing chambers 61, but the substrate W is transferred within the operating range H2 of the second transfer robot 52. The substrate W is conveyed so that the path becomes the shortest distance. Therefore, the transport path of the substrate W is set by the robot controller 72d so as to be the shortest distance within the operating range H1 of the first transport robot 32 or the operating range H2 of the second transport robot 52 . That is, the substrate transfer operation within the operating range H1 of the first transfer robot 32 or the operating range H2 of the second transfer robot 52 is realized based on the shortest distance (shortest path) of the transfer route of the substrate W.

For example, when the turning direction of the second transport robot 52 is the turning direction (for example, counterclockwise) in which the second transport robot 52 turns out of the operating range H2 due to the turning action, it is set to be the turning direction opposite to the turning direction. (for example, clockwise), that is, the direction of turning to the movement range H2 due to the turning action. Moreover, when only the turning direction is changed, when the second transport robot 52 turns out of the operating range H2 due to the turning action, the second transport robot 52 moves away from the operator by the second moving mechanism 51 (towards the same direction as the operator). The processing chamber where the operator works is in a state where the processing chamber side on the opposite side is shifted) and turns while moving, or turns while retracting the two telescopic arms. As the swiveling operation, there is an operation in which the second transfer robot 52 swivels on the swivel table 32 a, or an operation in which the second transfer robot 52 alone swivels on the swivel table 32 a (see FIG. 2 ). Various operations including those described above are appropriately selected and controlled by the robot controller 72d, but are selected so that the conveyance path of the substrate W between each processing chamber 61 and the buffer unit 40 becomes the shortest distance.

In addition, in the description above, it is assumed that the operator performs maintenance work on the processing chamber 61 of A1 in FIG. 4 and FIG. 5 , but it is not limited thereto. A transport room 33 and the situation of performing maintenance work on the nearest switch unit 20 . At this time, the robot controller 72d changes the operating range H1 of the first transfer robot 32 according to the movement of the region R1 so as not to touch the region R1. That is, the robot controller 72d changes the recognized operation range H1 according to the movement of the region R1 so as not to touch the region R1, and based on the changed operation range H1, the first transfer robot 32 transfers the substrate W so that the first transfer robot 32 avoids the region R1. , that is, the first moving mechanism 31 and the first transfer robot 32 are controlled so that the first transfer robot 32 transfers the substrate W only within the changing motion range H1.

Then, the robot controller 72d determines whether the distance between the first transfer robot 32 and the region R1 is equal to or less than a predetermined distance based on the position of the first transfer robot 32 and the position of the region R1 recognized by the recognition unit 73 . The predetermined distance is the distance that the first transfer robot 32 moves at a low speed. If the robot controller 72d determines that the distance between the first transfer robot 32 and the region R1 is less than a predetermined distance, it reduces the moving speed of the first transfer robot 32 and transitions the movement of the first transfer robot 32 to a low-speed operation. For example, when the first transfer robot 32 approaches the operator, the moving speed of the first transfer robot 32 is decreased from a predetermined speed. In addition, when the first transfer robot 32 is separated from the operator, the movement speed of the first transfer robot 32 may be maintained at a predetermined speed without reducing it. Furthermore, the robot controller 72d judges whether or not the separation distance between the second transfer robot 52 and the region R1 is less than or equal to a predetermined distance based on the position of the second transfer robot 52 recognized by the recognition unit 73 and the position of the region R1, and based on the judgment result The same processing as described above is performed on the second transfer robot 52 . The predetermined distance is the distance that the second transfer robot 52 moves at a low speed.

In FIG. 4 , the worker enters the first transfer chamber 33 from the entrance/exit 33 a of the first transfer chamber 33 and moves to the vicinity of the buffer unit 40 . The first transfer robot 32 deviates from directly above the first moving mechanism 31 to the side of each opening and closing unit 20, and the distance between the first transfer robot 32 and the region R1 does not become less than a predetermined distance, so the moving operation of the first transfer robot 32 Low-speed operation is not set. On the other hand, when the first transfer robot 32 operates to transfer the substrate to the buffer unit 40 while the operator is in the vicinity of the buffer unit 40, the distance between the first transfer robot 32 and the region R1 becomes a predetermined distance. Hereinafter, therefore, the movement operation of the first transfer robot 32 is set to a low-speed operation. In addition, in FIG. 5 , during the maintenance work, the operator is located at a position facing the processing chamber 61 of A1. Therefore, when the second transfer robot 52 performs an operation for transferring the substrate to the buffer unit 40, the distance between the second transfer robot 52 and the region R1 is equal to or less than a predetermined distance, and thus the moving operation of the second transfer robot 52 is as follows: Slow motion.

Furthermore, the robot controller 72d determines whether or not the separation distance between the first transfer robot 32 and the region R1 is a predetermined stop distance (<predetermined separation distance) based on the position of the first transfer robot 32 recognized by the recognition unit 73 and the position of the region R1. the following. The predetermined stop distance is preset as a distance, that is, the distance between the first transfer robot 32 and the region R1 is shorter than the predetermined distance described above, and the first transfer robot 32 does not contact the region R1. If the operator is too close to the first transfer robot 32, the robot controller 72d determines that the distance between the first transfer robot 32 and the region R1 is below the predetermined stop distance, and prohibits the movement of the first transfer robot 32 until the distance between the first transfer robot 32 is less than the predetermined distance. until the stopping distance is longer. For example, if the operator passes by or stops around the buffer unit 40, and the robot controller 72d determines that the distance between the first transfer robot 32 and the region R1 is less than or equal to a predetermined stop distance, the first transport robot 32 is prohibited. The transfer robot 32 moves, interrupting the arrival of the first transfer robot 32 to the buffer unit 40 . Furthermore, the robot controller 72d judges whether the separation distance between the second transfer robot 52 and the region R1 is equal to or less than a predetermined stop distance based on the position of the second transfer robot 52 recognized by the recognition unit 73 and the position of the region R1, and judges accordingly. As a result, the same processing as described above is performed on the second transfer robot 52 . The predetermined stop distance is preset as a distance between the second transfer robot 52 and the region R1 is shorter than the above-mentioned predetermined distance, and the first transfer robot 32 does not come into contact with the region R1.

Here, if the flow of substrate transfer is described, two types of processing are performed on the substrate W, so the substrate W is sequentially transferred to the opening and closing unit 20, the buffer unit 40, the first processing chamber 61, the second processing chamber 61, and the buffer unit. 40. The opening and closing unit 20. In the first processing chamber 61 and the second processing chamber 61 , the substrate W is processed using different processing liquids. Specifically, as shown in FIGS. 4 and 5 , among the eight processing chambers 61 arranged across the second moving mechanism 51 , there are four processing chambers (first processing chambers) 61 arranged in a row on one side, And four processing chambers (second processing chambers) 61 arranged in a row on the other side. In the case of performing two kinds of processing on the substrate W, in the four first processing chambers 61 lined up on one side and the four second processing chambers 61 lined up on the other side, different processes are performed. Same deal. At this time, the first processing chamber 61 and the second processing chamber 61 facing each other through the second moving mechanism 51 form a group. The chamber transports the substrate W to the second processing chamber 61 . In addition, in FIG. 5 , based on the operating range H2 of the second transfer robot 52, it is prohibited to reach the processing chamber 61 of A1 which is the maintenance target, so the substrate transfer to the processing chamber 61 of A1 and the transfer of the substrate from the processing chamber of A1 (first The transfer of the substrate from the processing chamber 61 to the second processing chamber 61 as a group is also prohibited.

The first transfer robot 32 takes out the unprocessed substrate W from the dedicated cassette in the opening and closing unit 20 , and turns (or moves and turns) to set the unprocessed substrate W in the buffer unit 40 . The second transfer robot 52 takes out the unprocessed substrate W from the buffer unit 40 and turns (or turns and moves) to place the unprocessed substrate W in the desired first processing chamber 61 . Then, the substrate W is processed in the first processing chamber 61 . When the processing in the first processing chamber 61 is completed, the second transfer robot 52 takes out the substrate W from the first processing chamber 61 , turns around 180 degrees, and sets the substrate W in the second processing chamber 61 . Then, the substrate W is processed in the second processing chamber 61 . When the processing in the second processing chamber 61 is completed, the second transfer robot 52 takes out the substrate W from the second processing chamber 61 , rotates (or rotates and moves), and places the substrate W in the buffer unit 40 . The first transfer robot 32 takes out the processed substrate W from the buffer unit 40 , turns (or turns and moves) and sets the processed substrate W in a desired dedicated cassette.

However, the substrate transfer process performed by the second transfer robot 52 is performed for each group of the first processing chamber 61 and the second processing chamber 61 facing it, but in the first processing chamber 61 and the second processing chamber 61 , the processing content is different, so the processing time is also different. In order to improve productivity, the second transfer robot 52 uses one of the arms to take out the processed substrate W in each of the buffer unit 40, the first processing chamber 61, and the second processing chamber 61, and uses the other arm to place the unprocessed substrate W. Substrate W. That is, the second transfer robot 52 performs the taking-out operation of the processed substrate W and the transfer operation of the unprocessed substrate W (substrate replacement) in each of the buffer unit 40, the first processing chamber 61, and the second processing chamber 61. actions) as a set of actions. Furthermore, the first transfer robot 32 also performs an operation of taking out processed substrates W and a delivery operation of unprocessed substrates W (substrate replacement operation) in the buffer unit 40 as a set of operations. Further, in order to improve productivity, unprocessed substrates W are respectively set in the first processing chambers 61 and processed simultaneously in the first processing chambers 61, and the processed substrates are taken out from the first processing chambers 61 where the processing is completed. W, is set in the corresponding second processing chamber 61 and is processed in each second processing chamber 61 simultaneously. Therefore, the actual substrate transfer process is more complicated than the substrate transfer process described above.

In this substrate transfer, the operator can move to the front of the processing chamber 61 of A1 in FIG. 4 and FIG. and perform maintenance work on the processing chamber 61 of A1. That is, even if an operator enters the transfer chamber (the first transfer chamber 33 , the second transfer chamber 53 ), the transfer robot (the first transfer robot 32 , the second transfer robot 52 ) can continue the transfer operation. When it is recognized that the operator is in the transport chamber, the operating range H1 and H2 of the transport robot and the area R1 of the operator are identified, and the transport robot is controlled so as to avoid the operator and move. The transfer robot continues the transfer operation of the substrate W while avoiding contact with the operator performing the maintenance work. Even without stopping the transfer operation by stopping the power supply of the transfer robot or the substrate processing apparatus 10 , the operator and the transfer robot can share the transfer room and perform their respective operations (implementation of collaborative work). Therefore, even when an operator enters the transfer chamber, the transfer robot can continue the transfer operation without stopping the substrate transfer, and the substrate processing apparatus 10 can continue the substrate processing. Thereby, it is possible to suppress the substrate processing from being stopped due to maintenance work, and to suppress a decrease in productivity. Furthermore, since the transfer robot continues the transfer operation even if the maintenance operation is prolonged, the substrate processing apparatus 10 can continue processing the substrate, thereby suppressing a decrease in productivity.

Furthermore, since the first transfer robot 32 is shifted from directly above the first moving mechanism 31 by the swivel table 32a, approximately half of the first transfer chamber 33 (the area on the second transfer chamber 53 side of the first transfer chamber 33 ) It becomes out of the movement range of the 1st transfer robot 32. Therefore, a person can move on foot outside the operating range of the first transfer robot 32, which is different from the case where the first transfer robot 32 is located directly above the first moving mechanism 31 (the situation in which the person enters the operating range of the first transfer robot 32 and moves) ), contact with the first transfer robot 32 can be suppressed. Therefore, by adding a swivel table 32a between the first transfer robot 32 and the first moving mechanism 31, the first transfer robot 32 is offset from directly above the first moving mechanism 31, and a space that does not interfere with people can be provided. Even if a person enters the first transfer chamber 33 due to maintenance work, etc., the first transfer robot 32 can continue to transfer the substrate.

Furthermore, when the operator needs to perform maintenance work on a specific processing chamber 61 among the plurality of processing chambers 61 for a long time, the substrate processing or substrate transfer can be continued without stopping the substrate processing apparatus 10. Maintenance work is performed in the transfer chamber 53 . Moreover, the operator can perform maintenance work in the second transfer chamber 53, so it is possible to omit the maintenance space sometimes provided on the side opposite to the second transfer chamber 53, that is, outside the transfer chamber (for the operator to process the substrate from the substrate). The outside of the device 10 reaches the space inside the processing chamber 61). Thereby, the maintenance area outside the apparatus can be reduced, and thus the space utilization efficiency of the clean room, which is expensive to maintain, can be improved. That is, there is no need to expand the area outside the substrate processing apparatus 10 as a maintenance space. Therefore, even when a plurality of substrate processing apparatuses 10 are installed in a clean room, the interval between these substrate processing apparatuses 10 can be narrowed, enabling Effective use of cleanrooms. Furthermore, as long as the maintenance work can be performed in the transfer room where the cleanliness required for substrate transfer can be maintained, the cleanliness of the space outside the device may be lower than the current situation, and the maintenance materials for maintaining the cleanliness of the clean room can be reduced. In addition, since the maintenance work is performed from the side of the transfer chamber where the influence of dust is less, the time taken to restore the cleanliness of the processing chamber after release can also be shortened, and a decrease in productivity can be suppressed.

In addition, in addition to controlling the first transfer robot 32 and the second transfer robot 52 based on mechanical position information (for example, position information from an encoder), the recognition unit 73 also uses images obtained by the respective imaging units 33b and 53b. By controlling the position information generated from the information, more accurate position control can be performed, and the first transfer robot 32 and the second transfer robot 52 can be reliably monitored. Furthermore, the actual positions of the first transfer robot 32 and the second transfer robot 52 can be grasped, and safety can be improved compared to control using only mechanical position information. In addition, in addition to controlling the first transfer robot 32 and the second transfer robot 52 based on mechanical position information (for example, position information from an encoder), the recognition unit 73 also uses images obtained by the respective imaging units 33b and 53b. By controlling the position information generated from the information, more accurate position control can be performed, and the first transfer robot 32 and the second transfer robot 52 can be reliably monitored. Furthermore, the actual positions of the first transfer robot 32 and the second transfer robot 52 can be grasped, and safety can be improved compared to control using only mechanical position information.

As described above, according to the first embodiment, the position of a person in the transfer chamber (the first transfer chamber 33 and the second transfer chamber 53 ) is detected and recognized, and the region R1 including the recognized position of the person is set to correspond to The movement of the person moves the set region R1, and the transfer robot (the first transfer robot 32, the second transfer robot 52) avoids the moving region R1 and transfers the substrate W, so that the transfer robot and the moving mechanism (the first transfer robot 32 and the second transfer robot 52) are controlled. a moving mechanism 31 and a second moving mechanism 51). Accordingly, even when an operator enters the transfer chamber, the transfer robot can continue the transfer operation without stopping the substrate transfer, and the substrate processing apparatus 10 can continue the substrate processing. Thereby, it is possible to suppress the substrate processing from being stopped due to maintenance work, and to suppress a decrease in productivity. Furthermore, since the transfer robot continues the transfer operation even if the maintenance operation is prolonged, the substrate processing apparatus 10 can continue processing the substrate, thereby suppressing a decrease in productivity.

<Second Embodiment> A second embodiment will be described with reference to FIGS. 6 and 7 . In addition, in the second embodiment, differences from the first embodiment (input unit and setting unit) will be described, and other descriptions will be omitted.

As shown in FIG. 6, in the 1st transfer chamber 33 of 2nd Embodiment, the input part 33c is provided. The input unit 33c is arranged near the entrance/exit 33a of the first transfer chamber 33, and accepts an input operation from a person (for example, an operator). As the input part 33c, a switch, a button, a touch panel, etc. can be used, for example. The input unit 33c is electrically connected to the domain controller 72c, and upon receiving an input operation from a human, sends an input signal to the domain controller 72c (see FIG. 3 ). For example, when the operator operates the input unit 33c and instructs to maintain the processing chamber 61 of the object, input information representing the processing chamber 61 of the maintenance object is input to the zone controller 72c as an input signal.

The setting unit 74 of the area controller 72c sets a work area R2 for people to work on in front of the processing chamber 61 indicated by the input information based on the input information input from the input unit 33c, and compares the set work area R2 with the set work area. The work area information related to the area R2 is stored in the storage unit 72b. For example, when the human operation input unit 33c designates the processing chamber 61 at A2 in FIG. 6 as the processing chamber for the maintenance object, the working area R2 is set in front of the designated processing chamber 61 for the maintenance object. The work area R2 is, for example, a cuboid-shaped spatial area of a desired size in which a detected person can safely perform maintenance work on the maintenance object in front of the treatment chamber 61 . The work area R2 is set by spatial coordinates in front of the processing chamber 61 for maintaining objects. In addition, the information input by the operator to set the work area R2 is not limited to information specifying the processing chamber 61 of the maintenance object as long as the area where the operator works can be specified. For example, if it is information indicating any place in the device that an operator can enter, it can be set as input information. Therefore, information specifying the work area R2 itself may be used as input information, or information indicating any place in the transfer area may be used as input information. Furthermore, the work area R2 is set separately from the area R1.

In the maintenance work, when the operator performs maintenance work on the processing chamber 61 of A2 in FIG. The processing chamber 61 of A2 in is designated as a maintenance object. Next, the operator moves from the vicinity of the entrance 33a of the first transfer chamber 33 to the vicinity of the buffer unit 40, enters the second transfer chamber 53 from the vicinity of the buffer unit 40, and moves to a position facing the processing chamber 61 of A2. Next, the operator performs maintenance work on each part in the processing chamber 61 of A2. If the maintenance work is completed, the operator will reverse the process in the path that has just moved from the entrance and exit 33a of the first transfer chamber 33 to the position facing the processing chamber 61 of A2. to move to and exit from the entrance/exit 33a of the first transfer chamber 33 .

If the processing chamber 61 of A2 in FIG. 6 is designated as a maintenance object by the operator operating the input unit 33c, input information indicating that the maintenance object is the processing chamber 61 of A2 is sent to the zone controller 72c. Based on the transmitted input information, the setting unit 74 sets the work area R2 in front of the processing chamber 61 of A2. Other processes are the same as those in the first embodiment, but the robot controller 72d controls the second transfer robot 52 to transfer the substrate W avoiding the regions R1 and R2 based on the work region information related to the set work region R2. The second transfer robot 52 and the second moving mechanism 51 .

During the substrate transfer, the operator can move to the front of the processing chamber 61 of A2 in FIG. 61 maintenance operations. That is, similarly to the first embodiment, even if an operator enters the transfer chamber (the first transfer chamber 33, the second transfer chamber 53), the transfer robot (the first transfer robot 32, the second transfer robot 52) can continue the transfer. action. Therefore, it is possible to suppress the substrate processing from being stopped due to maintenance work, and to suppress a decrease in productivity. Furthermore, since the transfer robot continues the transfer operation even if the maintenance operation is prolonged, the substrate processing apparatus 10 can continue processing the substrate, thereby suppressing a decrease in productivity. Further, a work area R2 is set in front of the processing chamber 61 to be maintained. As a result, the second transfer robot 52 moves away from the work area R2, so that the second transfer robot 52 can be reliably prevented from contacting the operator during the maintenance work, and the operator can perform the maintenance work more safely.

In addition, as shown in FIG. 7, the working area R2 may be surrounded by the partition member R2a. As the partition member R2a, for example, a curtain can be used. In the case of using this curtain, a curtain rail is provided on the ceiling portion of the work area R2 located in front of each processing chamber 61 . After the worker moves to the work area R2, the partition member R2a is installed in the work area R2 (for example, a curtain is attached to a curtain rail), and the work area R2 is surrounded by the partition member R2a. Moreover, if it is set as a gate etc., it can become a protective wall. Thus, the inside of the processing chamber 61 and the operation area R2 can be distinguished from the second transfer chamber 53 (transfer area), and the spread of contamination from the processing chamber 61 and the operation area R2 to the second transfer chamber 53 can be suppressed. The operator's maintenance work causes dust to spread around.

As described above, according to the second embodiment, the same effects as those of the first embodiment can be obtained. And by setting the work area R2 in front of the processing chamber 61 used as maintenance object, the 2nd transfer robot 52 avoids the work area R2 and moves. This can reliably prevent the second transfer robot 52 from coming into contact with the operator during the maintenance work, so that the operator can perform the maintenance work more safely.

＜Other Embodiments＞ In the above description, it was exemplified that the first moving mechanism 31 and the swivel table 32a with one axis are used for the movement of the first transport robot 32, and the second moving mechanism with one axis is used for the movement of the second transport robot 52. 51 and the swivel table 52a, but not limited thereto, for example, a moving table and a two-axis moving mechanism supporting the first transfer robot 32 or the second transfer robot 52 may also be provided, and the two-axis moving mechanism is used to make the moving table move along the Move in two orthogonal directions (such as X direction and Y direction) in the plane. The first transfer robot 32 or the second transfer robot 52 can simultaneously move in two directions through a two-axis moving mechanism, and can transfer the substrate W by the shortest path.

Moreover, in the above-mentioned description, the use of the imaging unit 33b and the imaging unit 53b was exemplified as a component for grasping the presence or position of a person, but it is not limited thereto. Foot pad switches on the ground (contact sensor, weight sensor, strain sensor, etc.), thermal camera, sound (sound for attention), etc.

Furthermore, as such a member, a transmitter that emits radio waves can also be used. A person holds or wears this transmitter, and the recognition unit (detection unit) 73 recognizes (detects) the position of the person based on the emitted radio waves. Thus, a predetermined area centered on the transmitter, that is, an area R1 including the position of the person is set. For example, a receiver installed in advance in the substrate processing apparatus 10 and registered with location information receives radio waves transmitted from the transmitter. Thus, the recognition unit 73 can set the position of the receiver with the strongest radio wave intensity from the transmitter as the person's position, and calculate the person's position based on the radio wave intensities received by the plurality of receivers. More specifically, an information communication terminal such as a mobile phone, a smart phone, a wearable device, a tablet terminal, and an identification (ID) card can be used as a transmitter, and the signal of a beacon (beacon) transmitted from the transmitter can be received. Terminals such as access points and routers serve as receivers.

Moreover, in the above-mentioned description, it was exemplified that a cylindrical space region is used as the region R1, but it is not limited thereto. For example, a rectangular parallelepiped space of a required size that can contain at least a detected person may also be used. Area or spindle-shaped space area, human-shaped space area. In addition, the use of a cuboid-shaped space area as the work area R2 was exemplified, but it is not limited thereto. For example, a cylindrical-shaped space area or a spindle of a required size that can also include detected people during work may also be used. The spatial region of the shape. When the area R1 overlaps with the work area R2, either one may be prioritized. For example, a larger one of the area R1 and the work area R2 may be prioritized. Moreover, when a person walks out of the operation area R2, the operator can be recognized by the imaging unit 33b and the imaging unit 53b and immediately set as the area R1, and the first transport robot 32 and the second transport robot 52 avoid the set area. R1 way control.

Moreover, in the above-mentioned description, it was exemplified that one person performs the maintenance work, but the present invention is not limited thereto, and for example, a plurality of persons may perform the maintenance work. When maintenance work is performed by multiple persons, a region R1 is set for each person, and the first transfer robot 32 or the second transfer robot 52 transfers the substrate W avoiding the region R1 (regions R1 ) set for each person.

Moreover, in the above description, it was exemplified that the moving speed of the first transfer robot 32 or the second transfer robot 52 is reduced based on the distance between the first transfer robot 32 or the second transfer robot 52 and the region R1, but it is not limited to Here, for example, when the operator moves, the moving speed of the first transfer robot 32 or the second transfer robot 52 can also be reduced. Furthermore, the moving speed of the first transfer robot 32 or the second transfer robot 52 may be changed according to the moving speed of the worker. For example, if the moving speed of the operator increases, the robot controller 72d decreases the moving speed of the first transfer robot 32 or the second transfer robot 52, and vice versa if the moving speed of the operator decreases, then increases the speed of the first transfer robot 32 or the second transfer robot. The moving speed of the transfer robot 52. In addition, the tracking unit 75 changes the position information of the area R1 among the information stored in the memory unit 72b in accordance with the movement of the person, but may also obtain the moving speed of the operator based on the change of the position information of the area R1.

Moreover, in the above-mentioned description, it was exemplified that the moving speed is reduced when the first transport robot 32 or the second transport robot 52 approaches the operator, but it is not limited thereto. When the robot 32 or the second transfer robot 52 approaches the operator, the moving speed is not reduced, and the moving speed may be reduced when the first transfer robot 32 or the second transfer robot 52 moves away from the operator. In addition, in the above description, the transport route is selected so that the transport route for the first transport robot 32 and the second transport robot 52 transports the substrate W becomes the shortest distance, but it may be prioritized according to the distance from the region R1. Select a conveyance path with low speed and short distance. Thereby, the board|substrate transfer time is shortened.

Moreover, in the description above, it was exemplified that the working area R2 was set in front of the processing chamber 61 of the maintenance object (refer to FIG. 6 or FIG. 7 ), but it is not limited to this, and it may also be set by setting The part 74 is set for the movement of the worker detected by the recognition part 73 (the worker entering the first transfer chamber 33 from the entrance 33 a of the first transfer chamber 33 ) from the entrance 33 a of the first transfer chamber 33 to the work area R2 . area (not shown). The movement area is a space area of a desired size in which an operator can enter the transfer room and move to the work area R2 without contacting the first transfer robot 32 and the second transfer robot 52 . The robot controller 72d controls the first moving mechanism 31, the first transferring robot 32, and the second moving mechanism 51 so that the first transferring robot 32 or the second transferring robot 52 transfers the substrate W while avoiding the work area R2 and the moving area. , the actions of the second transfer robot 52 and the like. In the processing described above, processing such as setting and tracking of the region R1 may not be performed. Then, when the recognition unit 73 detects that the operator has moved and is within the work area R2, the setting unit 74 deletes the movement area. When the operator performs work in the work area R2, the robot controller 72d controls the first moving mechanism 31 so that the first transport robot 32 or the second transport robot 52 transports the substrate W while avoiding the work area R2. , the actions of the first transfer robot 32, the second moving mechanism 51, the second transfer robot 52, and the like.

In addition, in the above description, two kinds of treatments were performed on the substrate W as examples, but the present invention is not limited thereto. For example, one kind of treatment may be performed, and three kinds of treatments may be performed. When one type of processing is performed on the substrate W, the second transfer robot 52 transfers the substrate W in the order of the buffer unit 40 , the processing chamber 61 , and the buffer unit 40 . When three types of processing are performed on the substrate W, the second transfer robot 52 transfers the substrate W in the order of the buffer unit 40 , the first processing chamber 61 , the second processing chamber 61 , the third processing chamber 61 , and the buffer unit 40 . That is, it becomes an operation of returning the processed substrate to the buffer unit 40 after processing in the order of processing 1 → processing 2 → processing 3 . For example, the number of the first processing chamber 61 for processing 1 is two, the number of second processing chamber 61 for processing 2 is four, and the third processing chamber 61 for processing 3 is Two, the reason is that the number of sets is doubled assuming that processing 2 takes twice as long as processing 1 or 3 .

In addition, by using the sensors of the imaging unit 33b and the imaging unit 53b to detect that the operator is within the operating range H1 and H2 of the robot, the movement of the robot is restricted. Exit is set as the basic action. Therefore, even when an operator appears in or disappears from the operating range of the robot without entering or exiting the door, it can be regarded as an abnormal operation of the operator or an abnormality of the sensor, and the warning ( warning) or alarm (alarm) to confirm the operator's action.

Moreover, if two cameras are used to take pictures, and neither of the two cameras recognizes the operator, it can also be considered that the cameras are abnormal, and temporarily stopping means temporarily stopping the movement of the transfer robot.

Furthermore, when a plurality of sensors are used and an operator is recognized by any one of the sensors, the operation of the transfer robot may be temporarily stopped, or the maintenance work mode may not be returned to the normal work mode.

Furthermore, the operation of the transfer robot may be temporarily stopped and displayed on an operation screen such as a terminal held by the operator. In addition, the cause of stop such as abnormality of the camera can also be displayed on the terminal. In this case, if the operator can leave the device and ensure safety, the transfer robot can be started to operate by inputting an instruction to cancel the temporary stop from the terminal. Furthermore, in the case where an operator moves within the device, it is also possible to ensure safety by continuing to stop without inputting an instruction to cancel the temporary stop from the terminal.

Furthermore, depending on the activities of the operator, there may be a state where the transfer robot cannot avoid the operator and cannot continue the operation of the robot. It is also possible to pre-set the pattern of such a state that cannot continue to move, so that after the robot temporarily stops moving, as long as the state corresponding to the preset pattern is not eliminated, the robot will not start to move.

Some embodiments of the present invention have been described above, but these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in other various embodiments, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. These embodiments and modifications thereof are included in the scope or gist of the invention, and are included in the invention described in the claims and their equivalents.

10: Substrate processing device 20:Switching unit 30: The first transfer unit 31: The first mobile mechanism 32: The first transfer robot 32a: Turntable 32b: rotary axis 33: The first transfer room 33a: entrance and exit 33b: Camera department 33c: input part 40: buffer unit 50: The second transfer unit 51: Second mobile mechanism 52: Second transfer robot 52a: Turntable 52b: rotary axis 53: The second transfer room 53a: entrance and exit 53b: Camera Department 60: Substrate processing unit 61: Processing room 70: Unit attached to the device 71: Liquid supply unit 72: Control unit 72a: Computer 72b: memory department 72c: Zone Controller 72d: Robot controller (control department) 73: Recognition Department (Detection Department) 74: Setting department 75: Follow Ministry H1: Action range (moving range) H2: Action range R1: Region R2: operating area R2a: Separation member W: Substrate

FIG. 1 is a diagram showing a schematic configuration of a substrate processing apparatus according to a first embodiment. FIG. 2 is a diagram for explaining the operating range of the transfer robot according to the first embodiment. Fig. 3 is a diagram showing a schematic configuration of a control unit according to the first embodiment. Fig. 4 is a first diagram for explaining the adjustment of the operating range of the transfer robot according to the first embodiment. FIG. 5 is a second diagram for explaining the adjustment of the operating range of the transfer robot according to the first embodiment. FIG. 6 is a diagram for explaining the adjustment of the motion range of the transfer robot according to the second embodiment. FIG. 7 is a diagram for explaining a partition member of the second embodiment.

72: Control unit

72a: Computer

72b: memory department

72c: Area network controller

72d: Robot controller

73: Identification Department

74: Setting department

75: Follow Ministry

Claims (10)

A substrate processing device, comprising: The transfer robot is installed in the transfer room to transfer the substrate; A moving mechanism is installed in the transfer chamber to move the transfer robot; a detection unit that detects the position of a person in the transfer chamber; a setting unit that sets an area including the position of the person detected by the detection unit; a following unit that moves the area set by the setting unit in response to movement of the person; and The control unit controls the transfer robot and the moving mechanism so that the transfer robot avoids the area moved by the follower and transfers the substrate. The substrate processing apparatus as claimed in claim 1, wherein The control unit recognizes the motion range of the transfer robot, and changes the recognized motion range of the transfer robot so as not to touch the area moved by the follower, so that the transfer robot changes The transfer robot and the moving mechanism are controlled in such a manner that the substrate is transferred within the operating range of the transfer robot. The substrate processing apparatus as claimed in claim 1 or claim 2, wherein The setting unit sets a work area for people in the transfer chamber to work, The control unit controls the transfer robot and the moving mechanism so that the transfer robot transfers the substrate while avoiding the work area set by the setting unit. The substrate processing apparatus as claimed in claim 1 or claim 2, wherein the detection unit detects the transfer robot in the transfer chamber, The control unit obtains a separation distance between the transfer robot detected by the detection unit and the person detected by the detection unit, and changes the transfer robot based on the obtained separation distance. The speed at which the robot moves. The substrate processing device as described in claim 1 or claim 2, further comprising: a switching unit that switches the operation mode from the normal operation mode to the work mode when the person is detected by the detection unit, The control unit controls the transfer robot so that the transfer robot avoids the area moved by the follower and transfers the substrate only when the operation mode is the work mode. A robot and the moving mechanism. A substrate processing method, comprising the following steps: detecting a position of a person in a transfer chamber in which a transfer robot for transferring the substrate and a movement mechanism for moving the transfer robot are installed by using the detection unit; setting an area including the position of the person detected by the detection unit by the setting unit; moving the area set by the setting unit corresponding to the movement of the person by a following unit; and The transfer robot and the moving mechanism are controlled by the control unit so that the transfer robot avoids the area moved by the follower and transfers the substrate. The substrate processing method as described in claim 6, wherein The control unit recognizes the motion range of the transfer robot, and changes the recognized motion range of the transfer robot so as not to touch the area moved by the follower, so that the transfer robot changes The transfer robot and the moving mechanism are controlled in such a manner that the substrate is transferred within the operating range of the transfer robot. The substrate processing method as described in claim 6 or claim 7, wherein The setting unit sets a work area for people in the transfer chamber to work, The control unit controls the transfer robot and the moving mechanism so that the transfer robot transfers the substrate while avoiding the work area set by the setting unit. The substrate processing method as described in claim 6 or claim 7, wherein the detection unit detects the transfer robot in the transfer chamber, The control unit obtains a separation distance between the transfer robot detected by the detection unit and the person detected by the detection unit, and changes the distance of the transfer robot based on the obtained separation distance. Moving speed. The substrate processing method as described in claim 6 or claim 7, further comprising the following steps: When the person is detected by the detection unit, the operation mode is switched from the normal operation mode to the work mode, and The control unit controls the transfer robot so that the transfer robot avoids the area moved by the follower and transfers the substrate only when the operation mode is the work mode. A robot and the moving mechanism.

Images