TWI788918B - Bonding structure and electronic device - Google Patents

Bonding structure and electronic device Download PDF

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TWI788918B
TWI788918B TW110126099A TW110126099A TWI788918B TW I788918 B TWI788918 B TW I788918B TW 110126099 A TW110126099 A TW 110126099A TW 110126099 A TW110126099 A TW 110126099A TW I788918 B TWI788918 B TW I788918B
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layer
sensing electrode
electrode layer
bonding
substrate
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TW202306448A (en
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許賢斌
張雄民
陳寶煌
盧慶輝
張振炘
洪博斌
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大陸商宸美(廈門)光電有限公司
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Abstract

A bonding structure includes a substrate, a first sensing electrode layer, a second sensing electrode layer, an optical film layer, and a protective layer. The substrate has opposite first and second surface. A sensing area and a bonding area are defined on the substrate. The first sensing electrode layer is disposed on the first surface. The second sensing electrode layer is disposed on the second surface. The optical film layer covers the first sensing electrode layer and has a first bonding opening located in the bonding area. The protective layer covers the second sensing electrode layer and has a second bonding opening located in the bonding area. The first and second bonding openings respectively expose a part of the first sensing electrode layer and a part of the second sensing electrode layer, and are misaligned in a direction perpendicular to the first surface or the second surface.

Description

接合結構及電子裝置Junction structure and electronic device

本揭露是有關於一種接合結構及電子裝置。The disclosure relates to a bonding structure and an electronic device.

近期,市場上已有可折疊螢幕的電子產品推出。為了達到可折疊效果,一些現有可折疊螢幕的觸控或壓感模組的基材是採用塑料薄膜(例如高分子薄膜)來實現。除了柔韌性,這層薄膜需要做到薄厚度、高硬度、耐高溫及高透光等特性。Recently, electronic products with foldable screens have been launched on the market. In order to achieve the foldable effect, the substrates of some existing touch or pressure-sensitive modules of foldable screens are realized by using plastic films (such as polymer films). In addition to flexibility, this layer of film needs to achieve thin thickness, high hardness, high temperature resistance and high light transmission.

然而,前述薄基材在其邊緣受到碰撞時,容易產生裂痕,進而可能導致設置於基材上的感測電極的感測功能受影響。不僅如此,當與可撓性電路板接合時,前述薄基材亦容易因壓合力而產生裂痕,進而可能導致設置於基材上的感測電極與可撓性電路板之間的訊號傳輸功能受到影響。先前技術CN101581995B雖揭示雙面接合技術,卻未教導如何克服薄基板因接合而產生裂痕之手法。However, when the edge of the thin substrate is bumped, cracks are likely to occur, which may affect the sensing function of the sensing electrodes disposed on the substrate. Not only that, when bonding with a flexible circuit board, the aforementioned thin substrate is also prone to cracks due to the pressing force, which may affect the signal transmission function between the sensing electrodes disposed on the substrate and the flexible circuit board . Although the prior art CN101581995B discloses double-sided bonding technology, it does not teach how to overcome cracks in thin substrates caused by bonding.

因此,如何提出一種可解決上述問題的接合結構與電子裝置,是目前業界亟欲投入研發資源解決的問題之一。Therefore, how to propose a joint structure and electronic device that can solve the above problems is one of the problems that the industry is eager to invest in research and development resources to solve.

有鑑於此,本揭露之一目的在於提出一種可有解決上述問題的接合結構與電子裝置。In view of this, one purpose of the present disclosure is to provide a bonding structure and an electronic device that can solve the above problems.

為了達到上述目的,依據本揭露之一實施方式,一種接合結構包含基材、第一感測電極層、第二感測電極層、光學膜層以及保護層。基材具有相對之第一表面以及第二表面。基材上定義感測區以及接合區。第一感測電極層設置於第一表面。第二感測電極層設置於第二表面。光學膜層覆蓋第一感測電極層,並具有第一接合開口位於接合區。保護層覆蓋第二感測電極層,並具有第二接合開口位於接合區。第一接合開口與第二接合開口分別暴露第一感測電極層的一部分與第二感測電極層的一部分,且在垂直於第一表面或第二表面之方向上錯位。In order to achieve the above object, according to an embodiment of the present disclosure, a bonding structure includes a substrate, a first sensing electrode layer, a second sensing electrode layer, an optical film layer, and a protective layer. The substrate has a first surface and a second surface opposite to each other. A sensing region and a bonding region are defined on the substrate. The first sensing electrode layer is disposed on the first surface. The second sensing electrode layer is disposed on the second surface. The optical film layer covers the first sensing electrode layer and has a first joint opening located in the joint area. The protection layer covers the second sensing electrode layer and has a second joint opening located in the joint area. The first joint opening and the second joint opening respectively expose a part of the first sensing electrode layer and a part of the second sensing electrode layer, and are dislocated in a direction perpendicular to the first surface or the second surface.

於本揭露的一或多個實施方式中,第一接合開口與第二接合開口於前述方向上的投影彼此分離。In one or more embodiments of the present disclosure, the projections of the first joint opening and the second joint opening in the aforementioned direction are separated from each other.

於本揭露的一或多個實施方式中,光學膜層與保護層分別具有位於第一接合開口與第二接合開口之間的部位。這些部位於前述方向上重疊。In one or more embodiments of the present disclosure, the optical film layer and the protective layer respectively have a portion located between the first joint opening and the second joint opening. These portions overlap in the aforementioned direction.

於本揭露的一或多個實施方式中,第一感測電極層與第二感測電極層中之至少一者為奈米銀線電極層。In one or more implementations of the present disclosure, at least one of the first sensing electrode layer and the second sensing electrode layer is a silver nanowire electrode layer.

於本揭露的一或多個實施方式中,基材為可撓性基板。In one or more embodiments of the present disclosure, the substrate is a flexible substrate.

於本揭露的一或多個實施方式中,基材的材料包含環烯烴聚合物。基材的厚度等於或小於25微米。In one or more embodiments of the present disclosure, the material of the substrate includes cycloolefin polymer. The thickness of the substrate is equal to or less than 25 microns.

於本揭露的一或多個實施方式中,基材的材料包含無色聚醯亞胺。基材的厚度等於或小於12.5微米。In one or more embodiments of the present disclosure, the material of the substrate includes colorless polyimide. The thickness of the substrate is equal to or less than 12.5 microns.

於本揭露的一或多個實施方式中,光學膜層包含壓敏膠層、覆蓋層、至少一相位延遲片以及聚乙烯醇層。覆蓋層設置於壓敏膠層遠離基材的一側。相位延遲片設置於壓敏膠層與覆蓋層之間。聚乙烯醇層設置於覆蓋層與相位延遲片之間。In one or more embodiments of the present disclosure, the optical film layer includes a pressure-sensitive adhesive layer, a cover layer, at least one phase retarder, and a polyvinyl alcohol layer. The covering layer is arranged on the side of the pressure-sensitive adhesive layer away from the substrate. The phase retarder is arranged between the pressure-sensitive adhesive layer and the covering layer. The polyvinyl alcohol layer is arranged between the covering layer and the phase retarder.

為了達到上述目的,依據本揭露之一實施方式,一種電子裝置包含前述接合結構、可撓性電路板、顯示模組以及蓋板。可撓性電路板包含第一接合部以及第二接合部。第一接合部接合第一感測電極層由第一接合開口暴露的部分。第二接合部接合第二感測電極層由第二接合開口暴露的部分。顯示模組設置於保護層遠離基材的一側。蓋板設置於光學膜層遠離基材的一側。In order to achieve the above object, according to an embodiment of the present disclosure, an electronic device includes the aforementioned bonding structure, a flexible circuit board, a display module, and a cover plate. The flexible circuit board includes a first joint part and a second joint part. The first bonding part bonds a portion of the first sensing electrode layer exposed by the first bonding opening. The second bonding part bonds a portion of the second sensing electrode layer exposed by the second bonding opening. The display module is arranged on the side of the protective layer away from the substrate. The cover plate is arranged on the side of the optical film layer away from the base material.

於本揭露的一或多個實施方式中,電子裝置進一步包含補強層。補強層設置於保護層與顯示模組之間。In one or more embodiments of the present disclosure, the electronic device further includes a reinforcing layer. The reinforcing layer is arranged between the protective layer and the display module.

於本揭露的一或多個實施方式中,電子裝置進一步包含黏合層。黏合層設置於補強層與顯示模組之間。In one or more embodiments of the present disclosure, the electronic device further includes an adhesive layer. The adhesive layer is arranged between the reinforcement layer and the display module.

於本揭露的一或多個實施方式中,電子裝置進一步包含黏合層。黏合層設置於保護層與顯示模組之間,並與補強層併排。In one or more embodiments of the present disclosure, the electronic device further includes an adhesive layer. The adhesive layer is arranged between the protective layer and the display module, and is arranged side by side with the reinforcing layer.

綜上所述,於本揭露的接合結構與電子裝置中,藉由使光學膜層的第一接合開口與保護層的第二接合開口在實質上垂直於基材的方向上錯位,以達實質上局部錯位加厚,即可有效增加基材的接合區的結構強度。藉此,即可在基材的邊緣受到碰撞或接合區與可撓性電路板接合時有效地避免基材產生裂痕,進而可確保設置於基材上的第一感測電極層與第二感測電極層的感測功能與訊號傳輸功能。To sum up, in the joint structure and the electronic device of the present disclosure, the first joint opening of the optical film layer and the second joint opening of the protective layer are misaligned in a direction substantially perpendicular to the substrate to achieve substantial The upper local dislocation is thickened, which can effectively increase the structural strength of the bonding area of the base material. Thereby, when the edge of the substrate is hit or the bonding area is bonded with the flexible circuit board, cracks in the substrate can be effectively avoided, thereby ensuring that the first sensing electrode layer and the second sensing electrode layer disposed on the substrate are Measuring the sensing function and signal transmission function of the electrode layer.

以上所述僅係用以闡述本揭露所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本揭露之具體細節將在下文的實施方式及相關圖式中詳細介紹。The above description is only used to explain the problems to be solved by the present disclosure, the technical means to solve the problems, and the effects thereof, etc. The specific details of the present disclosure will be introduced in detail in the following implementation methods and related drawings.

以下將以圖式揭露本揭露之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本揭露。也就是說,在本揭露部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。The following will disclose multiple implementations of the present disclosure with diagrams, and for the sake of clarity, many practical details will be described together in the following description. However, it should be understood that these practical details should not be used to limit the present disclosure. That is to say, in some embodiments of the present disclosure, these practical details are unnecessary. In addition, for the sake of simplifying the drawings, some well-known structures and components will be shown in a simple and schematic manner in the drawings.

請參照第1A圖、第1B圖以及第1C圖。第1A圖為繪示根據本揭露一實施方式之電子裝置100的側面示意圖。第1B圖為繪示第1A圖中之電子裝置100的局部剖面圖,其係對應於第2圖中之線段1B-1B所指示之位置。第1C圖為繪示第1A圖中之電子裝置100的另一局部剖面圖,其係對應於第2圖中之線段1C-1C所指示之位置。如第1A圖至第1C圖所示,於本實施方式中,電子裝置100包含接合結構110、可撓性電路板120、顯示模組130以及蓋板140。可撓性電路板120接合至接合結構110。顯示模組130與蓋板140分別設置於接合結構110的相反兩側。具體來說,顯示模組130經由黏合層150a固定至接合結構110,而蓋板140經由黏合層150b固定至接合結構110。Please refer to Figure 1A, Figure 1B and Figure 1C. FIG. 1A is a schematic side view of an electronic device 100 according to an embodiment of the present disclosure. FIG. 1B is a partial cross-sectional view of the electronic device 100 in FIG. 1A , which corresponds to the position indicated by the line segment 1B-1B in FIG. 2 . FIG. 1C is another partial cross-sectional view of the electronic device 100 in FIG. 1A , which corresponds to the position indicated by the line segment 1C-1C in FIG. 2 . As shown in FIG. 1A to FIG. 1C , in this embodiment, the electronic device 100 includes a bonding structure 110 , a flexible circuit board 120 , a display module 130 and a cover plate 140 . The flexible circuit board 120 is bonded to the bonding structure 110 . The display module 130 and the cover plate 140 are respectively disposed on opposite sides of the joint structure 110 . Specifically, the display module 130 is fixed to the joint structure 110 through the adhesive layer 150a, and the cover plate 140 is fixed to the joint structure 110 through the adhesive layer 150b.

於一些實施方式中,黏合層150a、150b中之至少一者為光學膠(Optical Clear Adhesive, OCA),但本揭露並不以此為限。In some embodiments, at least one of the adhesive layers 150a, 150b is optical clear adhesive (OCA), but the present disclosure is not limited thereto.

詳細來說,接合結構110包含基材111、第一感測電極層112、第二感測電極層113、光學膜層114以及保護層115。基材111具有相對之第一表面111a以及第二表面111b。第一感測電極層112設置於第一表面111a。第二感測電極層113設置於第二表面111b。光學膜層114覆蓋第一感測電極層112。保護層115覆蓋第二感測電極層113。顯示模組130設置於保護層115遠離基材111的一側。蓋板140設置於光學膜層114遠離基材111的一側。In detail, the bonding structure 110 includes a substrate 111 , a first sensing electrode layer 112 , a second sensing electrode layer 113 , an optical film layer 114 and a protection layer 115 . The substrate 111 has a first surface 111a and a second surface 111b opposite to each other. The first sensing electrode layer 112 is disposed on the first surface 111a. The second sensing electrode layer 113 is disposed on the second surface 111b. The optical film layer 114 covers the first sensing electrode layer 112 . The protection layer 115 covers the second sensing electrode layer 113 . The display module 130 is disposed on a side of the protective layer 115 away from the substrate 111 . The cover plate 140 is disposed on a side of the optical film layer 114 away from the substrate 111 .

於一些實施方式中,第一感測電極層112與第二感測電極層113中之至少一者為可以是奈米銀線(silver nano wires, SNW;又稱AgNW)電極層、金屬網格或包含氧化銦錫(ITO)電極層所組成,但本揭露並不以此為限。在第一感測電極層112與第二感測電極層113中之前述至少一者為奈米銀線電極層的實施方式中,第一感測電極層112與第二感測電極層113中之前述至少一者為可包含基質和摻雜於其內之奈米銀線。奈米銀線於基質中相互搭接形成導電網路。基質是指含奈米銀線的溶液在經過塗佈與加熱烘乾等製程所形成的非奈米銀線物質。奈米銀線散佈或嵌入於基質中,且部分地從基質中突出。基質可以保護奈米銀線免受腐蝕、磨損等外界環境的影響。於一些實施方式中,基質係可壓縮的。In some embodiments, at least one of the first sensing electrode layer 112 and the second sensing electrode layer 113 may be a nano silver wire (silver nano wires, SNW; also known as AgNW) electrode layer, a metal grid Or include indium tin oxide (ITO) electrode layer, but the present disclosure is not limited thereto. In the embodiment in which at least one of the first sensing electrode layer 112 and the second sensing electrode layer 113 is a nano silver wire electrode layer, the first sensing electrode layer 112 and the second sensing electrode layer 113 At least one of the foregoing may include a matrix and silver nanowires doped therein. The silver nanowires overlap each other in the matrix to form a conductive network. The matrix refers to the non-nano-silver wire material formed by coating, heating and drying the solution containing the nano-silver wire. The silver nanowires are scattered or embedded in the matrix, and partly protrude from the matrix. The matrix can protect the silver nanowires from external environment such as corrosion and abrasion. In some embodiments, the matrix is compressible.

請參照第2圖至第4圖。第2圖為繪示根據本揭露一實施方式之接合結構110的局部立體圖。第3圖為繪示第2圖中之接合結構110的局部側視圖。第4圖為繪示第2圖中之接合結構110的局部上視圖。如第2圖至第4圖所示,於本實施方式中,基材111上定義感測區R1以及接合區R2。光學膜層114具有第一接合開口O1位於接合區R2。第一感測電極層112延伸於感測區R1的部分係受到光學膜層114覆蓋,而第一感測電極層112延伸於接合區R2的部分係由第一接合開口O1暴露出。保護層115具有第二接合開口O2位於接合區R2。第二感測電極層113延伸於感測區R1的部分係受到保護層115覆蓋,而第二感測電極層113延伸於接合區R2的部分係由保護層115的第二接合開口O2暴露出。Please refer to pictures 2 to 4. FIG. 2 is a partial perspective view illustrating a bonding structure 110 according to an embodiment of the present disclosure. FIG. 3 is a partial side view showing the bonding structure 110 in FIG. 2 . FIG. 4 is a partial top view showing the bonding structure 110 in FIG. 2 . As shown in FIG. 2 to FIG. 4 , in this embodiment, the sensing region R1 and the bonding region R2 are defined on the substrate 111 . The optical film layer 114 has a first bonding opening O1 located in the bonding region R2. The portion of the first sensing electrode layer 112 extending to the sensing region R1 is covered by the optical film layer 114 , and the portion of the first sensing electrode layer 112 extending to the bonding region R2 is exposed by the first bonding opening O1 . The passivation layer 115 has a second bonding opening O2 located in the bonding region R2. The portion of the second sensing electrode layer 113 extending to the sensing region R1 is covered by the protection layer 115 , and the portion of the second sensing electrode layer 113 extending to the bonding region R2 is exposed by the second joint opening O2 of the protection layer 115 .

請配合參照第1A圖,於本實施方式中,可撓性電路板120包含本體部121、第一接合部122以及第二接合部123。第一接合部122與第二接合部123由本體部121的邊緣延伸而出。第一接合部122接合第一感測電極層112由第一接合開口O1暴露的部分。第二接合部123接合第二感測電極層113由第二接合開口O2暴露的部分。Please refer to FIG. 1A , in this embodiment, the flexible circuit board 120 includes a main body portion 121 , a first joint portion 122 and a second joint portion 123 . The first joint part 122 and the second joint part 123 extend from the edge of the main body part 121 . The first bonding part 122 bonds a portion of the first sensing electrode layer 112 exposed by the first bonding opening O1. The second bonding part 123 bonds a portion of the second sensing electrode layer 113 exposed by the second bonding opening O2.

於一些實施方式中,第一感測電極層112包含彼此分隔的複數個第一軸導電單元(圖未示)。第二感測電極層113包含彼此分隔的複數個第二軸導電單元(圖未示)。藉由前述結構配置,第一感測電極層112與第二感測電極層113之間的觸控訊號(如互電容感應訊號)可經由可撓性電路板120提取。In some embodiments, the first sensing electrode layer 112 includes a plurality of first-axis conductive units (not shown) separated from each other. The second sensing electrode layer 113 includes a plurality of second-axis conductive units (not shown) separated from each other. With the aforementioned structural configuration, touch signals (such as mutual capacitance sensing signals) between the first sensing electrode layer 112 and the second sensing electrode layer 113 can be extracted through the flexible circuit board 120 .

特別來說,如第2圖至第4圖所示,於本實施方式中,光學膜層114的第一接合開口O1與保護層115的第二接合開口O2在垂直於基材111的第一表面111a或第二表面111b之方向D1上錯位。換句話說,第一接合開口O1與第二接合開口O2在方向D1上並未重疊。詳細來說,如第3圖所示,由於基材111的第二表面111b對應於第一接合開口O1的位置有保護層115支撐,且基材111的第一表面111a對應於第二接合開口O2的位置有光學膜層114支撐。藉由此結構配置,即可有效增加基材111的接合區R2的結構強度。藉此,本實施方式之接合結構110即可在基材111的邊緣受到碰撞時有效地避免基材111產生裂痕,進而可確保設置於基材111上的第一感測電極層112與第二感測電極層113的感測功能。In particular, as shown in FIG. 2 to FIG. 4 , in this embodiment, the first joint opening O1 of the optical film layer 114 and the second joint opening O2 of the protective layer 115 are perpendicular to the first joint opening O2 of the substrate 111 . The surface 111a or the second surface 111b is misaligned in the direction D1. In other words, the first joint opening O1 and the second joint opening O2 do not overlap in the direction D1. In detail, as shown in FIG. 3, since the second surface 111b of the base material 111 is supported by the protective layer 115 at the position corresponding to the first joint opening O1, and the first surface 111a of the base material 111 corresponds to the second joint opening. The position of O2 is supported by the optical film layer 114 . With this structural configuration, the structural strength of the bonding region R2 of the substrate 111 can be effectively increased. In this way, the bonding structure 110 of this embodiment can effectively avoid cracks in the substrate 111 when the edge of the substrate 111 is hit, thereby ensuring that the first sensing electrode layer 112 and the second sensing electrode layer 112 disposed on the substrate 111 are connected to each other. Sensing function of the sensing electrode layer 113 .

請參照第5圖,其為繪示利用壓頭300使可撓性電路板120與接合結構110接合的局部剖面圖。具體來說,第5圖繪示壓頭300將可撓性電路板120的第二接合部123壓合至位於基材111之第二表面111b上的第二感測電極層113。雖然未繪示,但可以理解可撓性電路板120的第一接合部122亦可藉由壓頭300壓合至位於基材111之第一表面111a上的第一感測電極層112。如前所述,由於基材111的第二表面111b對應於第一接合開口O1的位置有保護層115支撐,且基材111的第一表面111a對應於第二接合開口O2的位置有光學膜層114支撐,因此基材111的接合區R2可具有較大的結構強度以承受壓頭300的壓合力。藉此,本實施方式之接合結構110即可在基材111的接合區R2與可撓性電路板120接合時有效地避免基材111產生裂痕,進而可確保設置於基材111上的第一感測電極層112與第二感測電極層113的訊號傳輸功能。Please refer to FIG. 5 , which is a partial cross-sectional view illustrating the bonding of the flexible circuit board 120 and the bonding structure 110 by using the indenter 300 . Specifically, FIG. 5 shows that the indenter 300 presses the second bonding portion 123 of the flexible circuit board 120 to the second sensing electrode layer 113 on the second surface 111 b of the substrate 111 . Although not shown, it can be understood that the first bonding portion 122 of the flexible circuit board 120 can also be pressed to the first sensing electrode layer 112 on the first surface 111 a of the substrate 111 by the pressure head 300 . As mentioned above, because the second surface 111b of the base material 111 is supported by the protective layer 115 at the position corresponding to the first joint opening O1, and the first surface 111a of the base material 111 is provided with an optical film at the position corresponding to the second joint opening O2. The layer 114 is supported, so the bonding region R2 of the substrate 111 can have greater structural strength to withstand the pressing force of the pressing head 300 . Thereby, the bonding structure 110 of this embodiment can effectively prevent cracks in the substrate 111 when the bonding region R2 of the substrate 111 is bonded to the flexible circuit board 120 , thereby ensuring that the first The signal transmission function of the sensing electrode layer 112 and the second sensing electrode layer 113 .

請參照第6圖,其為繪示另一種改良前的接合結構110’的局部側視圖。如第6圖所示,接合結構110’包含基材111、第一感測電極層112、第二感測電極層113、光學膜層114’以及保護層115’。第一感測電極層112設置於基材111的上表面。光學膜層114’覆蓋第一感測電極層112。第二感測電極層113設置於基材111的下表面。保護層115’覆蓋第二感測電極層113。相較於第3圖所示之實施方式,第6圖所示之接合結構110’的光學膜層114’用以暴露出第一感測電極層112的接合開口係重疊於保護層115’用以暴露出第二感測電極層113的接合開口。換句話說,光學膜層114’的接合開口並未與保護層115’重疊,且保護層115’的接合開口也未與光學膜層114’重疊。在分別與可撓性電路板120接合的實驗中,第6圖所示之接合結構110’由於在接合開口處並無局部加厚,因此出現裂紋的不良率達3.84%。反觀,第3圖所示之接合結構110由於基材111在對應於第一接合開口O1的另一側有保護層115加厚,且基材111在對應於第二接合開口O2的另一側有光學膜層114加厚,因此出現裂紋的不良率可降至0;是以,第3圖所繪示為較佳實施例。Please refer to FIG. 6 , which is a partial side view illustrating another joint structure 110' before improvement. As shown in FIG. 6, the bonding structure 110' includes a base material 111, a first sensing electrode layer 112, a second sensing electrode layer 113, an optical film layer 114' and a protective layer 115'. The first sensing electrode layer 112 is disposed on the upper surface of the substrate 111 . The optical film layer 114' covers the first sensing electrode layer 112. The second sensing electrode layer 113 is disposed on the lower surface of the substrate 111 . The protection layer 115' covers the second sensing electrode layer 113. Compared with the embodiment shown in FIG. 3 , the optical film layer 114 ′ of the bonding structure 110 ′ shown in FIG. 6 is used to expose the bonding opening of the first sensing electrode layer 112 to overlap the protective layer 115 ′. to expose the joint opening of the second sensing electrode layer 113 . In other words, the joint opening of the optical film layer 114' does not overlap with the protective layer 115', and the joint opening of the protective layer 115' does not overlap with the optical film layer 114' either. In the experiment of jointing with the flexible circuit board 120, the joint structure 110' shown in FIG. 6 has no local thickening at the joint opening, so the defect rate of cracks is 3.84%. In contrast, the bonding structure 110 shown in FIG. 3 is thickened by the protective layer 115 on the other side corresponding to the first bonding opening O1, and the substrate 111 is on the other side corresponding to the second bonding opening O2. The optical film layer 114 is thickened, so the defect rate of cracks can be reduced to zero; therefore, the preferred embodiment is shown in FIG. 3 .

於一些實施方式中,基材111為可撓性基板。於一些實施方式中,基材111的材料包含環烯烴聚合物(Cyclo Olefin Polymer, COP),且基材111的厚度等於或小於約25微米,但本實施方式並不以此為限。於一些實施方式中,基材111的材料包含無色聚醯亞胺(Colorless Polyimide, CPI),且基材111的厚度等於或小於約12.5微米,但本實施方式並不以此為限。在基材111具可撓性且厚度小的情況之下,藉由前述結構配置改善基材111的接合區R2的結構強度的效果更為顯著。In some embodiments, the substrate 111 is a flexible substrate. In some embodiments, the material of the substrate 111 includes Cyclo Olefin Polymer (COP), and the thickness of the substrate 111 is equal to or less than about 25 microns, but the present embodiment is not limited thereto. In some embodiments, the material of the substrate 111 includes colorless polyimide (CPI), and the thickness of the substrate 111 is equal to or less than about 12.5 microns, but the present embodiment is not limited thereto. In the case that the base material 111 is flexible and has a small thickness, the effect of improving the structural strength of the bonding region R2 of the base material 111 through the aforementioned structural configuration is more significant.

如第3圖所示,於本實施方式中,光學膜層114的第一接合開口O1在方向D1上的投影P1與保護層115的第二接合開口O2在方向D1上的投影P2彼此分離。從另一方面來看,光學膜層114與保護層115在方向D2上分別具有位於第一接合開口O1與第二接合開口O2之間的部位。這些部位於方向D1上重疊。舉例來說,方向D2實質上平行於方向D1,但本揭露並不以此為限。藉由設計使光學膜層114與保護層115在第一接合開口O1與第二接合開口O2之間具有相互重疊的部位(在方向D1上),即可更進一步增加基材111的接合區R2的結構強度。As shown in FIG. 3 , in this embodiment, the projection P1 of the first joint opening O1 of the optical film layer 114 in the direction D1 and the projection P2 of the second joint opening O2 of the protective layer 115 in the direction D1 are separated from each other. Viewed from another aspect, the optical film layer 114 and the protection layer 115 respectively have positions located between the first joint opening O1 and the second joint opening O2 in the direction D2 . These parts overlap in the direction D1. For example, the direction D2 is substantially parallel to the direction D1, but the disclosure is not limited thereto. By designing the optical film layer 114 and the protective layer 115 to have overlapping positions (in the direction D1) between the first joint opening O1 and the second joint opening O2, the joint region R2 of the substrate 111 can be further increased. structural strength.

請參照第7圖,其為繪示根據本揭露一實施方式之光學膜層114的示意圖。如第7圖所示,於本實施方式中,光學膜層114包含壓敏膠層114a、覆蓋層114b、相位延遲片114c、114d以及聚乙烯醇層114e。覆蓋層114b設置於壓敏膠層114a遠離基材111的一側。相位延遲片114c設置於壓敏膠層114a與覆蓋層114b之間。相位延遲片114d設置於相位延遲片114c與壓敏膠層114a之間。聚乙烯醇層114e設置於覆蓋層114b與相位延遲片114c之間。Please refer to FIG. 7 , which is a schematic diagram illustrating an optical film layer 114 according to an embodiment of the present disclosure. As shown in FIG. 7, in this embodiment, the optical film layer 114 includes a pressure-sensitive adhesive layer 114a, a cover layer 114b, phase retarders 114c, 114d, and a polyvinyl alcohol layer 114e. The covering layer 114b is disposed on a side of the pressure-sensitive adhesive layer 114a away from the substrate 111 . The phase retarder 114c is disposed between the pressure-sensitive adhesive layer 114a and the covering layer 114b. The phase retarder 114d is disposed between the phase retarder 114c and the pressure-sensitive adhesive layer 114a. The polyvinyl alcohol layer 114e is disposed between the cover layer 114b and the phase retarder 114c.

於一些實施方式中,相位延遲片114c、114d分別為半波片與四分之一波片,但本揭露並不以此為限。In some implementations, the phase retarders 114c and 114d are half-wave plates and quarter-wave plates respectively, but the present disclosure is not limited thereto.

需說明的是,光學膜層114的常規厚度為約110微米至約150微米。於一些實施方式中,為了折疊需求,光學膜層114的厚度可減少至約60微米至約75微米(例如約66微米),但本揭露並不以此為限。於一些實施方式中,壓敏膠層114a的厚度為約10微米至約20微米(例如約15微米),但本揭露並不以此為限。於一些實施方式中,覆蓋層114b的厚度為約35微米至約45微米(例如約40微米),但本揭露並不以此為限。於一些實施方式中,聚乙烯醇層114e的厚度為約2微米至約8微米(例如約5微米),但本揭露並不以此為限。It should be noted that the conventional thickness of the optical film layer 114 is about 110 microns to about 150 microns. In some embodiments, the thickness of the optical film layer 114 can be reduced to about 60 microns to about 75 microns (eg, about 66 microns) for folding requirements, but the disclosure is not limited thereto. In some embodiments, the thickness of the pressure-sensitive adhesive layer 114 a is about 10 microns to about 20 microns (eg, about 15 microns), but the disclosure is not limited thereto. In some embodiments, the thickness of the covering layer 114b is about 35 microns to about 45 microns (eg, about 40 microns), but the disclosure is not limited thereto. In some embodiments, the thickness of the polyvinyl alcohol layer 114e is about 2 microns to about 8 microns (eg, about 5 microns), but the disclosure is not limited thereto.

請參照第8圖,其為繪示根據本揭露另一實施方式之電子裝置200的側面示意圖。如第8圖所示,於本實施方式中,電子裝置200包含接合結構110、可撓性電路板120、顯示模組130以及蓋板140,這些元件相同於第1A圖所示之實施方式,因此可參照上文中相關說明,在此恕不贅述。相較於第1A圖所示之實施方式,本實施方式之電子裝置200進一步包含補強層260。補強層260設置於接合結構110的保護層115與顯示模組130之間。具體來說,補強層260貼合至保護層115,並經由黏合層150a固定至顯示模組130。舉例來說,在基材111的厚度小於約12.5微米的實施方式中,補強層260可在光學膜層114與保護層115之外額外提供基材111支撐。Please refer to FIG. 8 , which is a schematic side view of an electronic device 200 according to another embodiment of the present disclosure. As shown in FIG. 8, in this embodiment, the electronic device 200 includes a bonding structure 110, a flexible circuit board 120, a display module 130, and a cover plate 140. These components are the same as those in the embodiment shown in FIG. 1A. Therefore, reference may be made to relevant descriptions above, and details are not repeated here. Compared with the embodiment shown in FIG. 1A , the electronic device 200 of this embodiment further includes a reinforcing layer 260 . The reinforcing layer 260 is disposed between the protective layer 115 of the bonding structure 110 and the display module 130 . Specifically, the reinforcement layer 260 is bonded to the protective layer 115 and fixed to the display module 130 through the adhesive layer 150a. For example, in an embodiment where the thickness of the substrate 111 is less than about 12.5 microns, the reinforcement layer 260 can additionally provide support for the substrate 111 in addition to the optical film layer 114 and the protective layer 115 .

請參照第9圖,其為繪示根據本揭露另一實施方式之電子裝置200’的側面示意圖。如第9圖所示,於本實施方式中,電子裝置200’包含接合結構110、可撓性電路板120、顯示模組130以及蓋板140,這些元件相同於第1A圖所示之實施方式,因此可參照上文中相關說明,在此恕不贅述。相較於第1A圖所示之實施方式,本實施方式之電子裝置200’進一步包含補強層260’。補強層260’設置於接合結構110的保護層115與顯示模組130之間。具體來說,補強層260’貼合至保護層115,並與黏合層150a併排且各別貼合至固定至保護層115的底面。換言之,相較於第8圖中採整面貼附至保護層115底面的補強層260,本實施方式的補強層260’僅局部地貼附至保護層115底面,並對接合區R1、R2進行結構強度的局部補強。Please refer to FIG. 9 , which is a schematic side view of an electronic device 200' according to another embodiment of the present disclosure. As shown in FIG. 9, in this embodiment, the electronic device 200' includes a bonding structure 110, a flexible circuit board 120, a display module 130, and a cover plate 140. These components are the same as those in the embodiment shown in FIG. 1A , so reference can be made to the relevant descriptions above, and details will not be repeated here. Compared with the embodiment shown in FIG. 1A, the electronic device 200' of this embodiment further includes a reinforcing layer 260'. The reinforcement layer 260' is disposed between the protective layer 115 of the bonding structure 110 and the display module 130. Specifically, the reinforcing layer 260' is attached to the protective layer 115, and is aligned with the adhesive layer 150a and attached to the bottom surface fixed to the protective layer 115 respectively. In other words, compared with the reinforcement layer 260 attached to the bottom surface of the protective layer 115 on the entire surface in FIG. Local reinforcement of structural strength.

由以上對於本揭露之具體實施方式之詳述,可以明顯地看出,於本揭露的接合結構與電子裝置中,藉由使光學膜層的第一接合開口與保護層的第二接合開口在實質上垂直於基材的方向上錯位,以達實質上局部錯位加厚,即可有效增加基材的接合區的結構強度。藉此,即可在基材的邊緣受到碰撞或接合區與可撓性電路板接合時有效地避免基材產生裂痕,進而可確保設置於基材上的第一感測電極層與第二感測電極層的感測功能與訊號傳輸功能。From the above detailed description of the specific embodiments of the present disclosure, it can be clearly seen that in the joint structure and the electronic device of the present disclosure, by making the first joint opening of the optical film layer and the second joint opening of the protective layer The dislocation is substantially perpendicular to the direction of the substrate to achieve substantially local dislocation thickening, which can effectively increase the structural strength of the bonding area of the substrate. Thereby, when the edge of the substrate is hit or the bonding area is bonded with the flexible circuit board, cracks in the substrate can be effectively avoided, thereby ensuring that the first sensing electrode layer and the second sensing electrode layer disposed on the substrate are Measuring the sensing function and signal transmission function of the electrode layer.

雖然本揭露已以實施方式揭露如上,然其並不用以限定本揭露,任何熟習此技藝者,在不脫離本揭露的精神和範圍內,當可作各種的更動與潤飾,因此本揭露的保護範圍當視後附的申請專利範圍所界定者為準。Although the present disclosure has been disclosed above in terms of implementation, it is not intended to limit this disclosure. Any person skilled in the art may make various changes and modifications without departing from the spirit and scope of this disclosure. Therefore, the protection of this disclosure The scope shall be defined by the scope of the appended patent application.

100,200,200’:電子裝置 110,100’:接合結構 111:基材 111a:第一表面 111b:第二表面 112:第一感測電極層 113:第二感測電極層 114,114’:光學膜層 114a:壓敏膠層 114b:覆蓋層 114c,114d:相位延遲片 114e:聚乙烯醇層 115,115’:保護層 120:可撓性電路板 121:本體部 122:第一接合部 123:第二接合部 130:顯示模組 140:蓋板 150a,150b:黏合層 260,260’:補強層 300:壓頭 D1,D2:方向 O1:第一接合開口 O2:第二接合開口 P1,P2:投影 R1:感測區 R2:接合區100, 200, 200': Electronics 110,100': joint structure 111: Substrate 111a: first surface 111b: second surface 112: the first sensing electrode layer 113: the second sensing electrode layer 114,114': optical film layer 114a: pressure-sensitive adhesive layer 114b: Overlay 114c, 114d: phase delay film 114e: polyvinyl alcohol layer 115,115': protective layer 120:Flexible circuit board 121: Body Department 122: the first junction 123: second junction 130: display module 140: cover plate 150a, 150b: adhesive layer 260,260': reinforcement layer 300: pressure head D1, D2: direction O1: first joint opening O2: second joint opening P1, P2: Projection R1: Sensing area R2: Junction region

為讓本揭露之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1A圖為繪示根據本揭露一實施方式之電子裝置的側面示意圖。 第1B圖為繪示第1A圖中之電子裝置的局部剖面圖,其係對應於第2圖中之線段1B-1B所指示之位置。 第1C圖為繪示第1A圖中之電子裝置的另一局部剖面圖,其係對應於第2圖中之線段1C-1C所指示之位置。 第2圖為繪示根據本揭露一實施方式之接合結構的局部立體圖。 第3圖為繪示第2圖中之接合結構的局部側視圖。 第4圖為繪示第2圖中之接合結構的局部上視圖。 第5圖為繪示利用壓頭使可撓性電路板與接合結構接合的局部剖面圖。 第6圖為繪示另一種接合結構的局部側視圖。 第7圖為繪示根據本揭露一實施方式之光學膜層的示意圖。 第8圖為繪示根據本揭露另一實施方式之電子裝置的側面示意圖。 第9圖為繪示根據本揭露另一實施方式之電子裝置的側面示意圖。 In order to make the above and other purposes, features, advantages and embodiments of the present disclosure more comprehensible, the accompanying drawings are described as follows: FIG. 1A is a schematic side view illustrating an electronic device according to an embodiment of the present disclosure. FIG. 1B is a partial cross-sectional view showing the electronic device in FIG. 1A , which corresponds to the position indicated by the line segment 1B-1B in FIG. 2 . FIG. 1C is another partial cross-sectional view of the electronic device in FIG. 1A , which corresponds to the position indicated by the line segment 1C-1C in FIG. 2 . FIG. 2 is a partial perspective view illustrating a bonding structure according to an embodiment of the present disclosure. FIG. 3 is a partial side view showing the bonding structure in FIG. 2 . FIG. 4 is a partial top view showing the bonding structure in FIG. 2 . FIG. 5 is a partial cross-sectional view illustrating the bonding of the flexible circuit board and the bonding structure by using a pressure head. FIG. 6 is a partial side view illustrating another bonding structure. FIG. 7 is a schematic diagram illustrating an optical film layer according to an embodiment of the present disclosure. FIG. 8 is a schematic side view of an electronic device according to another embodiment of the disclosure. FIG. 9 is a schematic side view of an electronic device according to another embodiment of the disclosure.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic deposit information (please note in order of depositor, date, and number) none Overseas storage information (please note in order of storage country, institution, date, and number) none

110:接合結構 110: joint structure

111:基材 111: Substrate

112:第一感測電極層 112: the first sensing electrode layer

113:第二感測電極層 113: the second sensing electrode layer

114:光學膜層 114: Optical film layer

115:保護層 115: protective layer

O1:第一接合開口 O1: first joint opening

O2:第二接合開口 O2: second joint opening

R1:感測區 R1: Sensing area

R2:接合區 R2: Junction region

Claims (12)

一種接合結構,包含: 一基材,具有相對之一第一表面以及一第二表面,該基材上定義一感測區以及一接合區; 一第一感測電極層,設置於該第一表面; 一第二感測電極層,設置於該第二表面; 一光學膜層,覆蓋該第一感測電極層,並具有一第一接合開口位於該接合區;以及 一保護層,覆蓋該第二感測電極層,並具有一第二接合開口位於該接合區, 其中該第一接合開口與該第二接合開口分別暴露該第一感測電極層的一部分與該第二感測電極層的一部分,且在垂直於該第一表面或該第二表面之一方向上錯位。 A bonding structure, comprising: a substrate having a first surface and a second surface opposite to each other, a sensing region and a bonding region are defined on the substrate; a first sensing electrode layer disposed on the first surface; a second sensing electrode layer disposed on the second surface; an optical film layer covering the first sensing electrode layer and having a first joint opening located in the joint area; and a protective layer covering the second sensing electrode layer and having a second bonding opening located in the bonding region, Wherein the first joint opening and the second joint opening respectively expose a part of the first sensing electrode layer and a part of the second sensing electrode layer, and in a direction perpendicular to the first surface or the second surface dislocation. 如請求項1所述之接合結構,其中該第一接合開口與該第二接合開口於該方向上的投影彼此分離。The junction structure according to claim 1, wherein projections of the first junction opening and the second junction opening in the direction are separated from each other. 如請求項1所述之接合結構,其中該光學膜層與該保護層分別具有位於該第一接合開口與該第二接合開口之間的部位,且該些部位於該方向上重疊。The bonding structure according to claim 1, wherein the optical film layer and the protective layer respectively have portions located between the first bonding opening and the second bonding opening, and these portions overlap in the direction. 如請求項1所述之接合結構,其中該第一感測電極層與該第二感測電極層中之至少一者為一奈米銀線電極層。The bonding structure according to claim 1, wherein at least one of the first sensing electrode layer and the second sensing electrode layer is a nano silver wire electrode layer. 如請求項1所述之接合結構,其中該基材為一可撓性基板。The joint structure according to claim 1, wherein the substrate is a flexible substrate. 如請求項1所述之接合結構,其中該基材的材料包含環烯烴聚合物,且該基材的厚度等於或小於25微米。The bonding structure according to claim 1, wherein the material of the substrate comprises cycloolefin polymer, and the thickness of the substrate is equal to or less than 25 micrometers. 如請求項1所述之接合結構,其中該基材的材料包含無色聚醯亞胺,且該基材的厚度等於或小於12.5微米。The bonding structure according to claim 1, wherein the material of the substrate comprises colorless polyimide, and the thickness of the substrate is equal to or less than 12.5 microns. 如請求項1所述之接合結構,其中該光學膜層包含: 一壓敏膠層; 一覆蓋層,設置於該壓敏膠層遠離該基材的一側; 至少一相位延遲片,設置於該壓敏膠層與該覆蓋層之間;以及 一聚乙烯醇層,設置於該覆蓋層與該至少一相位延遲片之間。 The bonding structure as claimed in item 1, wherein the optical film layer comprises: a pressure-sensitive adhesive layer; a cover layer, disposed on the side of the pressure-sensitive adhesive layer away from the substrate; at least one phase retarder disposed between the pressure-sensitive adhesive layer and the cover layer; and A polyvinyl alcohol layer is disposed between the cover layer and the at least one phase retarder. 一種電子裝置,包含: 一如請求項1至8任一所述之接合結構; 一可撓性電路板,包含一第一接合部以及一第二接合部,該第一接合部接合該第一感測電極層由該第一接合開口暴露的該部分,且該第二接合部接合該第二感測電極層由該第二接合開口暴露的該部分; 一顯示模組,設置於該保護層遠離該基材的一側;以及 一蓋板,設置於該光學膜層遠離該基材的一側。 An electronic device comprising: A joint structure as described in any one of Claims 1 to 8; A flexible circuit board includes a first joint portion and a second joint portion, the first joint portion joints the portion of the first sensing electrode layer exposed by the first joint opening, and the second joint portion bonding the portion of the second sensing electrode layer exposed by the second bonding opening; a display module, disposed on the side of the protective layer away from the substrate; and A cover plate is arranged on the side of the optical film layer away from the base material. 如請求項9所述之電子裝置,進一步包含: 一補強層,設置於該保護層與該顯示模組之間。 The electronic device as described in Claim 9, further comprising: A reinforcement layer is arranged between the protective layer and the display module. 如請求項10所述之電子裝置,進一步包含: 一黏合層,設置於該補強層與該顯示模組之間。 The electronic device as described in claim 10, further comprising: An adhesive layer is arranged between the reinforcing layer and the display module. 如請求項10所述之電子裝置,進一步包含: 一黏合層,設置於該保護層與該顯示模組之間,並與該補強層併排。 The electronic device as described in claim 10, further comprising: An adhesive layer is arranged between the protective layer and the display module, and is arranged side by side with the reinforcing layer.
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