TWI786941B - Display apparatus - Google Patents

Display apparatus Download PDF

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TWI786941B
TWI786941B TW110142013A TW110142013A TWI786941B TW I786941 B TWI786941 B TW I786941B TW 110142013 A TW110142013 A TW 110142013A TW 110142013 A TW110142013 A TW 110142013A TW I786941 B TWI786941 B TW I786941B
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layer
light
disposed
sub
opening
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TW202319818A (en
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黃子芩
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友達光電股份有限公司
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Priority to CN202210215253.5A priority patent/CN114551560A/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/85Arrangements for extracting light from the devices
    • H10K50/856Arrangements for extracting light from the devices comprising reflective means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/131Interconnections, e.g. wiring lines or terminals
    • H10K59/1315Interconnections, e.g. wiring lines or terminals comprising structures specially adapted for lowering the resistance
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/38Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Measuring Pulse, Heart Rate, Blood Pressure Or Blood Flow (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

A display apparatus includes a first substrate, a sub-pixel structure, a second substrate, a light-shielding pattern layer, a first insulating layer, a reflective layer and a second insulating layer. The sub-pixel structure is disposed on the first substrate. The light-shielding pattern layer is disposed on the second substrate and has an opening. The opening of the light-shielding pattern layer overlaps the sub-pixel structure. The first insulating layer is disposed on the light-shielding pattern layer and has an opening. The opening of the first insulating layer is disposed outside the opening of the light-shielding pattern layer. The first insulating layer has a sidewall defining the opening of the first insulating layer. The reflective layer is at least disposed on the sidewall of the first insulating layer. The second insulating layer is at least disposed in the opening of the first insulating layer and covers the reflective layer.

Description

顯示裝置display device

本發明是有關於一種光電裝置,且特別是有關於一種顯示裝置。The present invention relates to an optoelectronic device, and more particularly to a display device.

依照顯示介質的特性,顯示裝置分為非自發光顯示裝置及自發光顯示裝置。非自發光顯示裝置的顯示面板需搭配背光模組方能顯示。自發光顯示裝置則不需要搭配背光模組。因此,相較於非自發光顯示裝置,自發光顯示裝置具有輕薄的優勢,而更適合應用在某些產品中,例如:智慧型手錶、智慧型手機等。According to the characteristics of the display medium, display devices are classified into non-self-luminous display devices and self-luminous display devices. The display panel of the non-self-luminous display device needs to be equipped with a backlight module to display. The self-luminous display device does not need to be equipped with a backlight module. Therefore, compared with non-self-luminous display devices, self-luminous display devices have the advantage of being thinner and lighter, and are more suitable for application in certain products, such as smart watches and smart phones.

一般而言,自發光顯示裝置的對向基板具有遮光圖案層(或稱,黑矩陣),以防止用以顯示不同顏色的多個子畫素結構發生混光。然而,在避免混光的同時,遮光圖案層的設置卻使得自發光顯示裝置的視角受限,在大視角方向上的亮度低落。Generally speaking, the opposite substrate of the self-luminous display device has a light-shielding pattern layer (or called a black matrix) to prevent light mixing between multiple sub-pixel structures for displaying different colors. However, while avoiding light mixing, the arrangement of the light-shielding pattern layer restricts the viewing angle of the self-luminous display device, and the brightness in the direction of large viewing angle is reduced.

此外,以向上發光的自發光顯示裝置為例,其畫素陣列基板的共用電極的材質需使用透光導電材料。透光導電材料的導電率偏低。當自發光顯示裝置的尺寸較大時,各子畫素結構與共用電極的訊號輸入端的距離差異增大,造成電壓壓降(IR-drop)問題嚴重,影響顯示品質。In addition, taking an upward-emitting self-luminous display device as an example, the material of the common electrode of the pixel array substrate needs to use a light-transmitting conductive material. The conductivity of light-transmitting conductive materials is relatively low. When the size of the self-luminous display device is large, the difference in distance between each sub-pixel structure and the signal input end of the common electrode increases, resulting in a serious IR-drop problem and affecting display quality.

本發明提供一種顯示裝置,顯示品質佳。The invention provides a display device with good display quality.

本發明提供另一種顯示裝置,顯示品質也佳。The invention provides another display device with good display quality.

本發明一實施例的顯示裝置,包括第一基底、至少一子畫素結構、第二基底、遮光圖案層、第一絕緣層、反射層及第二絕緣層。至少一子畫素結構設置於第一基底上。第二基底設置於第一基底的對向。遮光圖案層設置於第二基底上,且具有至少一開口。遮光圖案層的至少一開口重疊於至少一子畫素結構。第一絕緣層設置於遮光圖案層上,且具有至少一開口。第一絕緣層的至少一開口設置於遮光圖案層的至少一開口外。第一絕緣層具有定義第一絕緣層之至少一開口的至少一側壁。反射層至少設置於第一絕緣層的至少一側壁上。第二絕緣層至少設置於第一絕緣層的至少一開口中,且覆蓋反射層。A display device according to an embodiment of the present invention includes a first substrate, at least one sub-pixel structure, a second substrate, a light-shielding pattern layer, a first insulating layer, a reflective layer and a second insulating layer. At least one sub-pixel structure is disposed on the first base. The second base is disposed opposite to the first base. The light-shielding pattern layer is disposed on the second base and has at least one opening. At least one opening of the light-shielding pattern layer overlaps at least one sub-pixel structure. The first insulating layer is disposed on the light-shielding pattern layer and has at least one opening. At least one opening of the first insulating layer is disposed outside the at least one opening of the light-shielding pattern layer. The first insulating layer has at least one sidewall defining at least one opening of the first insulating layer. The reflective layer is at least disposed on at least one side wall of the first insulating layer. The second insulating layer is at least disposed in at least one opening of the first insulating layer and covers the reflective layer.

在本發明的一實施例中,上述的反射層具有相連接的至少一第一部及至少一第二部,反射層的至少一第一部設置於第一絕緣層的至少一側壁上,且反射層的至少一第二部設置於遮光圖案層與第二絕緣層之間。In an embodiment of the present invention, the reflective layer has at least one first portion and at least one second portion connected to each other, the at least one first portion of the reflective layer is disposed on at least one side wall of the first insulating layer, and At least one second portion of the reflective layer is disposed between the light-shielding pattern layer and the second insulating layer.

在本發明的一實施例中,上述的反射層的至少一第二部直接接觸於遮光圖案層。In an embodiment of the present invention, at least a second portion of the reflective layer is in direct contact with the light-shielding pattern layer.

在本發明的一實施例中,上述的反射層具有相連接的至少一第一部及至少一第二部,反射層的至少一第一部設置於第一絕緣層的至少一側壁,反射層的至少一第二部設置於至少一第一部之靠近遮光圖案層的一側,反射層之至少一第二部的邊緣與遮光圖案層的邊緣相隔一距離。In an embodiment of the present invention, the above-mentioned reflective layer has at least one first portion and at least one second portion connected, at least one first portion of the reflective layer is disposed on at least one side wall of the first insulating layer, and the reflective layer At least one second portion of the at least one first portion is disposed on a side of the at least one first portion close to the light-shielding pattern layer, and the edge of the at least one second portion of the reflective layer is spaced a distance from the edge of the light-shielding pattern layer.

在本發明的一實施例中,上述的第二絕緣層具有設置於第一絕緣層之至少一開口中的第一部,第二絕緣層的第一部具有朝向第二基底的第一表面及朝向第一絕緣層之至少一側壁的第二表面,且第一表面與第二表面於第二絕緣層的材質內夾有一角度α,且α>90o。In an embodiment of the present invention, the above-mentioned second insulating layer has a first portion disposed in at least one opening of the first insulating layer, the first portion of the second insulating layer has a first surface facing the second substrate and The second surface facing at least one sidewall of the first insulating layer, and the first surface and the second surface form an angle α within the material of the second insulating layer, and α>90o.

在本發明的一實施例中,上述的至少一子畫素結構包括一共用電極,第二絕緣層具有設置於第一絕緣層之至少一開口中的至少一第一部,且顯示裝置更包括至少一凸起結構及第一導電層。至少一凸起結構設置於第二絕緣層的至少一第一部上。第一導電層設置於至少一凸起結構上,且電性連接至反射層及共用電極。In an embodiment of the present invention, the above-mentioned at least one sub-pixel structure includes a common electrode, the second insulating layer has at least one first portion disposed in at least one opening of the first insulating layer, and the display device further includes At least one protruding structure and the first conductive layer. At least one protruding structure is disposed on at least one first portion of the second insulating layer. The first conductive layer is disposed on at least one protruding structure, and is electrically connected to the reflective layer and the common electrode.

在本發明的一實施例中,設置於上述的至少一凸起結構上的部分第一導電層直接接觸於共用電極。In an embodiment of the present invention, a part of the first conductive layer disposed on the at least one protruding structure is directly in contact with the common electrode.

在本發明的一實施例中,上述的至少一子畫素結構更包括至少一第一電極、至少一發光圖案及一畫素定義層,畫素定義層設置於至少一第一電極上且具有重疊於至少一第一電極的至少一開口,至少一發光圖案設置於畫素定義層的至少一開口內且電性連接至第一電極,畫素定義層具有至少一凹陷,共用電極設置於畫素定義層的至少一凹陷內且電性連接到至少一發光圖案,且至少一凸起結構及至少一部分的第一導電層設置於畫素定義層的至少一凹陷中。In an embodiment of the present invention, the above-mentioned at least one sub-pixel structure further includes at least one first electrode, at least one light-emitting pattern, and a pixel definition layer. The pixel definition layer is disposed on the at least one first electrode and has Overlapping at least one opening of at least one first electrode, at least one light-emitting pattern is disposed in at least one opening of the pixel definition layer and electrically connected to the first electrode, the pixel definition layer has at least one depression, and the common electrode is disposed on the pixel definition layer The at least one recess of the pixel definition layer is electrically connected to at least one light-emitting pattern, and at least one protruding structure and at least a part of the first conductive layer are disposed in the at least one recess of the pixel definition layer.

在本發明的一實施例中,上述的顯示裝置更包括封裝層,設置於共用電極上,其中第一絕緣層與封裝層之間存在一空隙。In an embodiment of the present invention, the above display device further includes an encapsulation layer disposed on the common electrode, wherein a gap exists between the first insulating layer and the encapsulation layer.

在本發明的一實施例中,上述的顯示裝置更包括封裝層及黏著層。封裝層設置於共用電極上。黏著層設置於第一絕緣層與封裝層之間。至少一凸起結構凸出於黏著層。In an embodiment of the present invention, the above display device further includes an encapsulation layer and an adhesive layer. The encapsulation layer is disposed on the common electrode. The adhesive layer is disposed between the first insulating layer and the packaging layer. At least one protruding structure protrudes from the adhesive layer.

在本發明的一實施例中,上述的共用電極具有訊號輸入端,至少一凸起結構在遠離訊號輸入端的一處的設置密度大於靠近訊號輸入端的另一處的設置密度。In an embodiment of the present invention, the above-mentioned common electrode has a signal input end, and the arrangement density of at least one protruding structure at a place away from the signal input end is greater than that at another place close to the signal input end.

在本發明的一實施例中,上述的顯示裝置更包括第二導電層,設置於遮光圖案層上,位於遮光圖案層與第一絕緣層之間,且具有重疊於至少一子畫素結構的至少一開口。第二導電層、反射層、第一導電層及共用電極彼此電性連接。In an embodiment of the present invention, the above-mentioned display device further includes a second conductive layer disposed on the light-shielding pattern layer, between the light-shielding pattern layer and the first insulating layer, and has a structure overlapping at least one sub-pixel. At least one opening. The second conductive layer, the reflective layer, the first conductive layer and the common electrode are electrically connected to each other.

在本發明的一實施例中,上述的第二導電層在第二基底上的垂直投影的形狀與遮光圖案層在第二基底上的垂直投影的形狀實質上相同。In an embodiment of the present invention, the shape of the above-mentioned vertical projection of the second conductive layer on the second substrate is substantially the same as the shape of the vertical projection of the light-shielding pattern layer on the second substrate.

在本發明的一實施例中,上述的至少一子畫素結構包括電性連接至共用電極的多個第一發光圖案,遮光圖案層的至少一開口為遮光圖案層的多個開口,多個第一發光圖案彼此電性連接且分別重疊於遮光圖案層的多個開口。顯示裝置更包括封裝層及黏著層。封裝層設置於至少一子畫素結構上。黏著層設置於第一絕緣層與封裝層之間。一空隙存在於第一絕緣層與封裝層之間且重疊於多個第一發光圖案的一者,而黏著層重疊於多個第一發光圖案的另一者。In an embodiment of the present invention, the above-mentioned at least one sub-pixel structure includes a plurality of first light-emitting patterns electrically connected to the common electrode, at least one opening in the light-shielding pattern layer is a plurality of openings in the light-shielding pattern layer, and a plurality of The first light-emitting patterns are electrically connected to each other and respectively overlap the openings of the light-shielding pattern layer. The display device further includes an encapsulation layer and an adhesive layer. The encapsulation layer is disposed on at least one sub-pixel structure. The adhesive layer is disposed between the first insulating layer and the packaging layer. A gap exists between the first insulating layer and the encapsulation layer and overlaps one of the plurality of first light-emitting patterns, and the adhesive layer overlaps the other of the plurality of first light-emitting patterns.

在本發明的一實施例中,上述的共用電極具有訊號輸入端,空隙在遠離訊號輸入端的一處的設置密度大於靠近訊號輸入端的另一處的設置密度。In an embodiment of the present invention, the above-mentioned common electrode has a signal input end, and the arrangement density of the gaps at a place away from the signal input end is greater than that at another place close to the signal input end.

在本發明的一實施例中,上述的至少一子畫素結構包括第一子畫素結構及第二子畫素結構,第一子畫素結構及第二子畫素結構分別包括第一發光圖案及第二發光圖案,第一絕緣層的至少一開口包括分別對應第一發光圖案及第二發光圖案的第一開口及第二開口,第一絕緣層的至少一側壁包括分別定義第一絕緣層之第一開口及第二開口的第一側壁及第二側壁,反射層包括交替堆疊的多個第一折射率子層及多個第二折射率子層,多個第一折射率子層及多個第二折射率子層設置於第一側壁及第二側壁上。In an embodiment of the present invention, the above-mentioned at least one sub-pixel structure includes a first sub-pixel structure and a second sub-pixel structure, and the first sub-pixel structure and the second sub-pixel structure respectively include a first light-emitting pattern and a second light-emitting pattern, at least one opening of the first insulating layer includes a first opening and a second opening respectively corresponding to the first light-emitting pattern and the second light-emitting pattern, at least one side wall of the first insulating layer includes respectively defining the first insulating The first opening of the layer and the first side wall and the second side wall of the second opening, the reflective layer includes a plurality of first refractive index sub-layers and a plurality of second refractive index sub-layers stacked alternately, and the plurality of first refractive index sub-layers and a plurality of second refractive index sub-layers are disposed on the first sidewall and the second sidewall.

在本發明的一實施例中,上述的至少一子畫素結構包括第一子畫素結構及第二子畫素結構,第一子畫素結構及第二子畫素結構分別包括第一發光圖案及第二發光圖案,第一絕緣層的至少一開口包括分別對應於第一子畫素結構及第二子畫素結構的第一開口及第二開口,第一絕緣層的至少一側壁包括分別定義第一絕緣層之第一開口及第二開口的第一側壁及第二側壁。反射層包括多個第一折射率子層及多個第二折射率子層,交替堆疊且設置於第一側壁上。反射層更包括多個第三折射率子層及多個第四折射率子層,交替堆疊,且設置於第二側壁上。In an embodiment of the present invention, the above-mentioned at least one sub-pixel structure includes a first sub-pixel structure and a second sub-pixel structure, and the first sub-pixel structure and the second sub-pixel structure respectively include a first light-emitting pattern and the second light-emitting pattern, at least one opening of the first insulating layer includes a first opening and a second opening respectively corresponding to the first sub-pixel structure and the second sub-pixel structure, and at least one side wall of the first insulating layer includes The first sidewall and the second sidewall of the first opening and the second opening of the first insulating layer are respectively defined. The reflective layer includes a plurality of first refractive index sub-layers and a plurality of second refractive index sub-layers, stacked alternately and arranged on the first sidewall. The reflective layer further includes a plurality of third refractive index sub-layers and a plurality of fourth refractive index sub-layers stacked alternately and disposed on the second sidewall.

在本發明的一實施例中,上述的第一發光圖案及第二發光圖案分別用以發出第一色光及第二色光,多個第一折射率子層及多個第二折射率子層對第一色光的反射率高於對第二色光的反射率。In an embodiment of the present invention, the above-mentioned first light-emitting pattern and second light-emitting pattern are used to emit the first color light and the second color light respectively, and the plurality of first refractive index sub-layers and the plurality of second refractive index sub-layers The reflectivity to the first color light is higher than the reflectivity to the second color light.

本發明一實施例的顯示裝置,包括第一基底、子畫素結構、第二基底、遮光圖案層、凸起物、反射層及第一絕緣層。子畫素結構設置於第一基底上。第二基底設置於第一基底的對向。遮光圖案層設置於第二基底上,且具有重疊於子畫素結構的開口。凸起物設置於遮光圖案層上,且由第二基底凸向第一基底,其中凸起物具有鄰接於遮光圖案層之開口的一側壁。反射層至少設置於凸起結構的側壁上。第一絕緣層覆蓋反射層,且重疊於遮光圖案層的開口。A display device according to an embodiment of the present invention includes a first substrate, a sub-pixel structure, a second substrate, a light-shielding pattern layer, protrusions, a reflective layer and a first insulating layer. The sub-pixel structure is disposed on the first base. The second base is disposed opposite to the first base. The light-shielding pattern layer is disposed on the second base and has an opening overlapping the sub-pixel structure. The protrusion is disposed on the light-shielding pattern layer and protrudes from the second base to the first base, wherein the protrusion has a side wall adjacent to the opening of the light-shielding pattern layer. The reflective layer is at least disposed on the sidewall of the protruding structure. The first insulating layer covers the reflective layer and overlaps the opening of the light-shielding pattern layer.

在本發明的一實施例中,上述的凸起物具有朝向第二基底的第一表面,凸起物的側壁朝向第一絕緣層,第一表面與側壁於凸起物的材質內夾有一角度β,且β≤90o。In an embodiment of the present invention, the above-mentioned protrusion has a first surface facing the second base, the side wall of the protrusion faces the first insulating layer, and the first surface and the side wall form an angle within the material of the protrusion. β, and β≤90o.

現將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於附圖中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and descriptions to refer to the same or like parts.

應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件“上”或“連接到”另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電性連接。再者,“電性連接”或“耦合”可以是二元件間存在其它元件。It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may mean that other elements exist between two elements.

本文使用的“約”、“近似”、或“實質上”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“約”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的“約”、“近似”或“實質上”可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about," "approximately," or "substantially" includes stated values and averages within acceptable deviations from a particular value as determined by one of ordinary skill in the art, taking into account the measurements in question and the relative A specific amount of measurement-related error (ie, the limit of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Moreover, "about", "approximately" or "substantially" used herein may select a more acceptable deviation range or standard deviation according to optical properties, etching properties or other properties, and may not use one standard deviation to apply to all properties .

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted to have meanings consistent with their meanings in the context of the relevant art and the present invention, and will not be interpreted as idealized or excessive formal meaning, unless expressly so defined herein.

圖1為本發明一實施例之顯示裝置10的剖面示意圖。FIG. 1 is a schematic cross-sectional view of a display device 10 according to an embodiment of the present invention.

圖2為本發明一實施例之顯示裝置10的上視示意圖。FIG. 2 is a schematic top view of a display device 10 according to an embodiment of the present invention.

圖1對應圖2的剖線I-I’。圖2繪示顯示裝置10的遮光圖案層220、多個發光圖案150及黏著層270,而省略顯示裝置10的其它構件。Fig. 1 corresponds to the section line I-I' of Fig. 2 . FIG. 2 shows the light-shielding pattern layer 220 , the plurality of light-emitting patterns 150 and the adhesive layer 270 of the display device 10 , while omitting other components of the display device 10 .

請參照圖1,顯示裝置10包括相對設置的畫素陣列基板100及對向基板200。畫素陣列基板100包括第一基底110。舉例而言,在本實施例中,第一基底110的材質可以是玻璃、石英、有機聚合物、或是不透光/反射材料(例如:晶圓、陶瓷、或其它可適用的材料)、或是其它可適用的材料。Referring to FIG. 1 , the display device 10 includes a pixel array substrate 100 and an opposite substrate 200 disposed opposite to each other. The pixel array substrate 100 includes a first base 110 . For example, in this embodiment, the material of the first substrate 110 can be glass, quartz, organic polymer, or opaque/reflective material (for example: wafer, ceramic, or other applicable materials), or other suitable materials.

畫素陣列基板100更包括設置於第一基底110上的多個子畫素結構SPX。每一子畫素結構SPX包括至少一第一電極130、一共用電極160及至少一發光圖案150,其中至少一第一電極130及共用電極160各自電性連接到至少一發光圖案150,且至少一發光圖案150用以發出光束L。The pixel array substrate 100 further includes a plurality of sub-pixel structures SPX disposed on the first substrate 110 . Each sub-pixel structure SPX includes at least one first electrode 130, a common electrode 160 and at least one light-emitting pattern 150, wherein at least one first electrode 130 and the common electrode 160 are electrically connected to at least one light-emitting pattern 150, and at least A light emitting pattern 150 is used to emit light beams L. Referring to FIG.

在本實施例中,每一子畫素結構SPX更包括一子畫素電路120,電性連接到至少一第一電極130。舉例而言,在本實施例中,子畫素電路120可包括資料線(未繪示)、掃描線(未繪示)、電源線(未繪示)、第一電晶體(未繪示)、第二電晶體(未繪示)及電容(未繪示),其中第一電晶體的第一端電性連接至資料線,第一電晶體的控制端電性連接至掃描線,第一電晶體的第二端電性連接至第二電晶體的控制端,第二電晶體的第一端電性連接至電源線,電容電性連接於第一電晶體的第二端及第二電晶體的第一端,且第二電晶體的第二端電性連接到至少一第一電極130。然而,本發明不以此為限,在其它實施例中,子畫素電路120也可以是其它種電路。In this embodiment, each sub-pixel structure SPX further includes a sub-pixel circuit 120 electrically connected to at least one first electrode 130 . For example, in this embodiment, the sub-pixel circuit 120 may include a data line (not shown), a scan line (not shown), a power line (not shown), a first transistor (not shown) , a second transistor (not shown) and a capacitor (not shown), wherein the first end of the first transistor is electrically connected to the data line, the control end of the first transistor is electrically connected to the scan line, and the first The second terminal of the transistor is electrically connected to the control terminal of the second transistor, the first terminal of the second transistor is electrically connected to the power line, and the capacitor is electrically connected to the second terminal of the first transistor and the second terminal. The first end of the crystal, and the second end of the second transistor are electrically connected to at least one first electrode 130 . However, the present invention is not limited thereto, and in other embodiments, the sub-pixel circuit 120 may also be other types of circuits.

此外,在本實施例中,每一子畫素結構SPX更可選擇性地包括畫素定義層140。畫素定義層140具有至少一開口140a,重疊於至少一第一電極130。至少一發光圖案150可設置於畫素定義層140的至少一開口140a中。舉例而言,在本實施例中,發光圖案150的材質例如是有機發光材料,而顯示裝置10可以是有機電致發光顯示器。然而,本發明不限於此,在其它實施例中,發光圖案150的材質也可以是無機發光材料,而顯示裝置10也可以是無機電致發光顯示器,例如但不限於:微型發光二極體(μLED)顯示器。In addition, in this embodiment, each sub-pixel structure SPX further optionally includes a pixel definition layer 140 . The pixel definition layer 140 has at least one opening 140 a overlapping at least one first electrode 130 . At least one light emitting pattern 150 can be disposed in at least one opening 140 a of the pixel definition layer 140 . For example, in this embodiment, the material of the light emitting pattern 150 is, for example, an organic light emitting material, and the display device 10 may be an organic electroluminescence display. However, the present invention is not limited thereto. In other embodiments, the material of the light-emitting pattern 150 can also be an inorganic light-emitting material, and the display device 10 can also be an inorganic electroluminescent display, such as but not limited to: micro light-emitting diodes ( μLED) display.

在本實施例中,共用電極160是透光電極,其包括金屬氧化物,例如:銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、或其它合適的氧化物、或者是上述至少二者的堆疊層,但本發明不以此為限。In this embodiment, the common electrode 160 is a light-transmitting electrode, which includes metal oxides, such as: indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide, or other A suitable oxide, or a stacked layer of at least two of the above, but the present invention is not limited thereto.

請參照圖1及圖2,在本實施例中,多個子畫素結構SPX可包括分別用以發出第一色光L1、第二色光L2及第三色光L3的第一子畫素結構SPX1、第二子畫素結構SPX2及第三子畫素結構SPX3。彼此相鄰的第一子畫素結構SPX1、第二子畫素結構SPX2及第三子畫素結構SPX3可組成一畫素結構PX。舉例而言,在本實施例中,第一色光L1、第二色光L2及第三色光L3例如分別是紅色光束、綠色光束及藍色光束,但本發明不以此為限。Please refer to FIG. 1 and FIG. 2. In this embodiment, the plurality of sub-pixel structures SPX may include first sub-pixel structures SPX1, SPX1, The second sub-pixel structure SPX2 and the third sub-pixel structure SPX3. The adjacent first sub-pixel structure SPX1, second sub-pixel structure SPX2 and third sub-pixel structure SPX3 can form a pixel structure PX. For example, in this embodiment, the first color light L1 , the second color light L2 and the third color light L3 are red light beams, green light beams and blue light beams respectively, but the invention is not limited thereto.

請參照圖1,在本實施例中,畫素陣列基板100更包括封裝層170,設置於子畫素結構SPX的共用電極160上。舉例而言,在本實施例中,封裝層170可以是具封裝薄膜(Thin Film Encapsulation, TFE)的高分子聚合物,但本發明不以此為限。Please refer to FIG. 1 , in this embodiment, the pixel array substrate 100 further includes an encapsulation layer 170 disposed on the common electrode 160 of the sub-pixel structure SPX. For example, in this embodiment, the encapsulation layer 170 may be a high molecular polymer with an encapsulation film (Thin Film Encapsulation, TFE), but the invention is not limited thereto.

對向基板200包括第二基底210,設置於第一基底110的對向。舉例而言,在本實施例中,第二基底210的材質可以是玻璃、石英、有機聚合物、或是其它可適用的材料。The opposite substrate 200 includes a second base 210 disposed opposite to the first base 110 . For example, in this embodiment, the material of the second substrate 210 may be glass, quartz, organic polymer, or other applicable materials.

對向基板200更包括遮光圖案層220。遮光圖案層220又可稱為黑矩陣(black matrix,BM)。遮光圖案層220設置於第二基底210上,且具有開口220a。遮光圖案層220的開口220a重疊於子畫素結構SPX。詳細而言,遮光圖案層220的開口220a重疊於子畫素結構SPX的發光圖案150。The opposite substrate 200 further includes a light-shielding pattern layer 220 . The light-shielding pattern layer 220 can also be called a black matrix (black matrix, BM). The light-shielding pattern layer 220 is disposed on the second base 210 and has an opening 220a. The opening 220 a of the light-shielding pattern layer 220 overlaps the sub-pixel structure SPX. In detail, the opening 220 a of the light-shielding pattern layer 220 overlaps the light emitting pattern 150 of the sub-pixel structure SPX.

在本實施例中,對向基板200更可選擇性地包括多個彩 色濾光圖案230,設置於第二基底210上,且重疊於遮光圖案層220的開口220a。在本實施例中,多個彩色濾光圖案230可包括分別設置於第一子畫素結構SPX1之第一發光圖案150R、第二子畫素結構SPX2之第二發光圖案150G及第三子畫素結構SPX3之第三發光圖案150B上方的第一彩色濾光圖案230R、第二彩色濾光圖案230G及第三彩色濾光圖案230B。舉例而言,在本實施例中,第一彩色濾光圖案230R、第二彩色濾光圖案230G及第三彩色濾光圖案230B可分別是紅色濾光圖案、綠色濾光圖案及藍色濾光圖案,但本發明不以此為限。 In this embodiment, the opposite substrate 200 may optionally include a plurality of color The color filter pattern 230 is disposed on the second substrate 210 and overlaps the opening 220 a of the light-shielding pattern layer 220 . In this embodiment, the plurality of color filter patterns 230 may include the first light-emitting pattern 150R disposed in the first sub-pixel structure SPX1, the second light-emitting pattern 150G and the third sub-pixel structure SPX2 respectively. The first color filter pattern 230R, the second color filter pattern 230G and the third color filter pattern 230B above the third light emitting pattern 150B of the pixel structure SPX3. For example, in this embodiment, the first color filter pattern 230R, the second color filter pattern 230G, and the third color filter pattern 230B can be red filter patterns, green filter patterns, and blue filter patterns, respectively. pattern, but the present invention is not limited thereto.

對向基板200更包括第一絕緣層240,設置於遮光圖案層220上,且具有開口240a。第一絕緣層240的開口240a設置於遮光圖案層220的開口220a外。第一絕緣層240的開口240a重疊於遮光圖案層220的實體。第一絕緣層240具有定義開口240a的側壁242。The opposite substrate 200 further includes a first insulating layer 240 disposed on the light-shielding pattern layer 220 and having an opening 240a. The opening 240 a of the first insulating layer 240 is disposed outside the opening 220 a of the light-shielding pattern layer 220 . The opening 240 a of the first insulating layer 240 is overlapped with the body of the light-shielding pattern layer 220 . The first insulating layer 240 has a sidewall 242 defining an opening 240a.

對向基板200更包括反射層250,至少設置於定義第一絕緣層240之開口240a的側壁242上。詳細而言,在本實施例中,反射層250具有相連接的第一部251及第二部252。反射層250的第一部251設置於第一絕緣層240的側壁242上。反射層250的第二部252設置於遮光圖案層220與第二絕緣層260(的第一部261)之間。簡言之,反射層250是共形地設置於第一絕緣層240的開口240a中。此外,在本實施例中,反射層250的第二部252可直接接觸於遮光圖案層220,但本發明不以此為限。The opposite substrate 200 further includes a reflective layer 250 disposed at least on the sidewall 242 of the opening 240 a defining the first insulating layer 240 . In detail, in this embodiment, the reflective layer 250 has a connected first portion 251 and a second portion 252 . The first portion 251 of the reflective layer 250 is disposed on the sidewall 242 of the first insulating layer 240 . The second portion 252 of the reflective layer 250 is disposed between the light-shielding pattern layer 220 and (the first portion 261 of) the second insulating layer 260 . In short, the reflective layer 250 is conformally disposed in the opening 240 a of the first insulating layer 240 . In addition, in this embodiment, the second portion 252 of the reflective layer 250 may directly contact the light-shielding pattern layer 220 , but the invention is not limited thereto.

在本實施例中,反射層250的第二部252的邊緣252e與遮光圖案層220的邊緣220e相隔一距離D。反射層250於第二基底210上的垂直投影未超出遮光圖案層220於第二基底210上的垂直投影。換言之,反射層250設置於遮光圖案層220下,且未外露於遮光圖案層220。在本實施例中,反射層250的材質例如是金屬,但本發明不以此為限。In this embodiment, the edge 252e of the second portion 252 of the reflective layer 250 is separated by a distance D from the edge 220e of the light-shielding pattern layer 220 . The vertical projection of the reflective layer 250 on the second substrate 210 does not exceed the vertical projection of the light-shielding pattern layer 220 on the second substrate 210 . In other words, the reflective layer 250 is disposed under the light-shielding pattern layer 220 and is not exposed to the light-shielding pattern layer 220 . In this embodiment, the material of the reflective layer 250 is, for example, metal, but the present invention is not limited thereto.

在本實施例中,對向基板200更包括第二絕緣層260,至少設置於第一絕緣層240的開口240a中,且覆蓋反射層250。在本實施例中,第二絕緣層260具有設置於第一絕緣層240之開口240a中的第一部261,第二絕緣層260的第一部261具有朝向第二基底210的第一表面261a及朝向第一絕緣層240之側壁242的第二表面261b,第一表面261a與第二表面261b於第二絕緣層260的材質內夾有角度α,且α>90o。在本實施例中,第二絕緣層260更可選擇性地具有第二部262,第二部262設置於第一絕緣層240上且重疊於遮光圖案層220的開口220a。In this embodiment, the opposite substrate 200 further includes a second insulating layer 260 disposed at least in the opening 240 a of the first insulating layer 240 and covering the reflective layer 250 . In this embodiment, the second insulating layer 260 has a first portion 261 disposed in the opening 240 a of the first insulating layer 240 , and the first portion 261 of the second insulating layer 260 has a first surface 261 a facing the second substrate 210 and the second surface 261b facing the sidewall 242 of the first insulating layer 240 , the first surface 261a and the second surface 261b form an angle α within the material of the second insulating layer 260 , and α>90o. In this embodiment, the second insulating layer 260 can optionally have a second portion 262 disposed on the first insulating layer 240 and overlapping the opening 220 a of the light-shielding pattern layer 220 .

在本實施例中,對向基板200更包括黏著層(filler)270,設置於第一絕緣層240與封裝層170之間。對向基板200與畫素陣列基板100透過黏著層270彼此連接。反射層250位於第一絕緣層240與第二絕緣層260之間。第二絕緣層260位於反射層250與黏著層270之間。黏著層270位於第二絕緣層260與封裝層170之間。In this embodiment, the opposite substrate 200 further includes an adhesive layer (filler) 270 disposed between the first insulating layer 240 and the encapsulation layer 170 . The opposite substrate 200 and the pixel array substrate 100 are connected to each other through the adhesive layer 270 . The reflective layer 250 is located between the first insulating layer 240 and the second insulating layer 260 . The second insulating layer 260 is located between the reflective layer 250 and the adhesive layer 270 . The adhesive layer 270 is located between the second insulating layer 260 and the encapsulation layer 170 .

值得一提的是,具有大發散角φ且向遮光圖案層220傳遞的光束L原本無法從顯示裝置10的內部出射,但透過反射層250的反射作用,光束L可被反射層250引導至遮光圖案層220的開口220a,並以大角度θ出射。藉此,顯示裝置10在大視角方向上的亮度可增加。It is worth mentioning that the light beam L having a large divergence angle φ and passing to the light-shielding pattern layer 220 cannot exit from the inside of the display device 10, but through the reflection of the reflective layer 250, the light beam L can be guided by the reflective layer 250 to the light-shielding pattern layer 220. The opening 220a of the pattern layer 220 is emitted at a large angle θ. Thereby, the brightness of the display device 10 in the direction of large viewing angle can be increased.

在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重述。It must be noted here that the following embodiments use the component numbers and part of the content of the previous embodiments, wherein the same numbers are used to denote the same or similar components, and descriptions of the same technical content are omitted. For the description of omitted parts, reference may be made to the aforementioned embodiments, and the following embodiments will not be repeated.

圖3為本發明一實施例之顯示裝置10A的剖面示意圖。FIG. 3 is a schematic cross-sectional view of a display device 10A according to an embodiment of the present invention.

圖4為本發明一實施例之顯示裝置10A的剖面示意圖。FIG. 4 is a schematic cross-sectional view of a display device 10A according to an embodiment of the present invention.

圖5為本發明一實施例之顯示裝置10A的上視示意圖。FIG. 5 is a schematic top view of a display device 10A according to an embodiment of the present invention.

圖3對應圖5的剖線II-II’。圖4對應圖5的剖線III-III’。圖5繪示顯示裝置10A的遮光圖案層220、第二導電層280、凸起結構290、多個發光圖案150及黏著層270,而省略顯示裝置10A的其它構件。Fig. 3 corresponds to the section line II-II' of Fig. 5 . Fig. 4 corresponds to section line III-III' of Fig. 5 . FIG. 5 shows the light-shielding pattern layer 220 , the second conductive layer 280 , the protrusion structure 290 , the plurality of light emitting patterns 150 and the adhesive layer 270 of the display device 10A, while omitting other components of the display device 10A.

圖3、圖4及圖5的顯示裝置10A與圖1及圖2的顯示裝置10類似,兩者主要的差異在於:圖3、圖4及圖5的顯示裝置10A更包括:第二導電層280、凸起結構290及第一導電層292。The display device 10A in FIG. 3 , FIG. 4 and FIG. 5 is similar to the display device 10 in FIG. 1 and FIG. 2 , and the main difference between the two is that the display device 10A in FIG. 3 , FIG. 4 and FIG. 5 further includes: a second conductive layer 280 , a protruding structure 290 and a first conductive layer 292 .

請參照圖3、圖4及圖5,對向基板200更包括凸起結構290及第一導電層292。凸起結構290設置於第二絕緣層260的第一部261上,且凸向畫素陣列基板100。第一導電層292設置於凸起結構290上,且電性連接至反射層250及共用電極160。換言之,凸起結構290上的部分第一導電層292是做為對向基板200的反射層250與畫素陣列基板100的共用電極160之間的橋接元件來使用。在本實施例中,設置於凸起結構290上之部分第一導電層292可直接接觸於共用電極160,但本發明不以此為限。Referring to FIG. 3 , FIG. 4 and FIG. 5 , the opposite substrate 200 further includes a protruding structure 290 and a first conductive layer 292 . The protruding structure 290 is disposed on the first portion 261 of the second insulating layer 260 and protrudes toward the pixel array substrate 100 . The first conductive layer 292 is disposed on the protruding structure 290 and is electrically connected to the reflective layer 250 and the common electrode 160 . In other words, part of the first conductive layer 292 on the protruding structure 290 is used as a bridging element between the reflective layer 250 of the opposite substrate 200 and the common electrode 160 of the pixel array substrate 100 . In this embodiment, a portion of the first conductive layer 292 disposed on the protruding structure 290 may directly contact the common electrode 160 , but the invention is not limited thereto.

請參照圖3及圖4,在本實施例中,畫素定義層140可具有凹陷142a,共用電極160設置於畫素定義層140的凹陷142a內且電性連接至發光圖案150,對向基板200的凸起結構290及設置於凸起結構290上的部分第一導電層292設置於凹陷142a中。畫素定義層140的凹陷142a有助於對向基板200的凸起結構290及設置於凸起結構290上的部分第一導電層292穩定地設置於畫素陣列基板100上,以良好地電性連接對向基板200的反射層250與畫素陣列基板100的共用電極160。3 and 4, in this embodiment, the pixel definition layer 140 may have a recess 142a, the common electrode 160 is disposed in the recess 142a of the pixel definition layer 140 and electrically connected to the light emitting pattern 150, opposite to the substrate The protruding structure 290 of 200 and part of the first conductive layer 292 disposed on the protruding structure 290 are disposed in the recess 142a. The depression 142a of the pixel definition layer 140 helps the raised structure 290 of the opposing substrate 200 and part of the first conductive layer 292 disposed on the raised structure 290 to be stably disposed on the pixel array substrate 100, so as to provide a good electrical connection. The reflective layer 250 of the opposite substrate 200 is connected with the common electrode 160 of the pixel array substrate 100 .

舉例而言,在本實施例中,畫素定義層140可包括第一子畫素定義層141及設置於第一子畫素定義層141上的第二子畫素定義層142,第一子畫素定義層141及第二子畫素定義層142共同定義重疊於第一電極130的開口140a,而第二子畫素定義層142具有重疊於凸起結構290的凹陷142a,但本發明不以此為限。For example, in this embodiment, the pixel definition layer 140 may include a first sub-pixel definition layer 141 and a second sub-pixel definition layer 142 disposed on the first sub-pixel definition layer 141, the first sub-pixel definition layer The pixel definition layer 141 and the second sub-pixel definition layer 142 jointly define the opening 140a overlapping the first electrode 130, and the second sub-pixel definition layer 142 has a recess 142a overlapping the protruding structure 290, but the present invention does not This is the limit.

值得一提的是,在本實施例中,共用電極160係透光,透光之共用電極160能選用的材質的電阻率偏高,但透過設置於凸起結構290上的部分第一導電層292,電阻率偏高的共用電極160可與電阻率低的反射層250電性連接。藉此,包括共用電極160及反射層250的複合式共用電極C的電阻值可降低,有助於改善因共用電極160的電阻值過高而導致的電壓壓降(IR-drop)問題,進而提升顯示品質。It is worth mentioning that, in this embodiment, the common electrode 160 is light-transmissive, and the resistivity of the material that can be selected for the light-transmissive common electrode 160 is relatively high, but through the part of the first conductive layer disposed on the protruding structure 290 292 , the common electrode 160 with relatively high resistivity can be electrically connected with the reflective layer 250 with low resistivity. Thereby, the resistance value of the composite common electrode C including the common electrode 160 and the reflective layer 250 can be reduced, which helps to improve the voltage drop (IR-drop) problem caused by the high resistance value of the common electrode 160, and further Improve display quality.

請參照圖3及圖5,在本實施例中,對向基板200更包括第二導電層280,設置於遮光圖案層220上,位於遮光圖案層220與第一絕緣層240之間,且具有重疊於子畫素結構SPX的開口280a。在本實施例中,第二導電層280在第二基底210上的垂直投影的形狀與遮光圖案層220在第二基底210上的垂直投影的形狀可選擇性地實質上相同。舉例而言,在本實施例中,第二導電層280在第二基底210上的垂直投影與遮光圖案層220在第二基底210上的垂直投影可皆為網狀圖形,但本發明不以此為限。3 and 5, in this embodiment, the opposite substrate 200 further includes a second conductive layer 280 disposed on the light-shielding pattern layer 220, between the light-shielding pattern layer 220 and the first insulating layer 240, and has Overlapping the opening 280a of the sub-pixel structure SPX. In this embodiment, the shape of the vertical projection of the second conductive layer 280 on the second substrate 210 and the shape of the vertical projection of the light-shielding pattern layer 220 on the second substrate 210 may optionally be substantially the same. For example, in this embodiment, the vertical projection of the second conductive layer 280 on the second substrate 210 and the vertical projection of the light-shielding pattern layer 220 on the second substrate 210 can both be mesh patterns, but the present invention does not rely on This is the limit.

請參照圖3,在本實施例中,反射層250可透過第一絕緣層240的開口240a電性連接至第二導電層280。在本實施例中,第二導電層280、反射層250、第一導電層292及共用電極160彼此電性連接,而形成一複合式共用電極C。在本實施例中,除了反射層250外,第二導電層280的電阻率也小於共用電極160的電阻率。透過與共用電極160電性連接的第二導電層280,複合式共用電極C的電阻值可進一步降低,而更顯著地改善電壓壓降(IR-drop)問題。Referring to FIG. 3 , in this embodiment, the reflective layer 250 can be electrically connected to the second conductive layer 280 through the opening 240 a of the first insulating layer 240 . In this embodiment, the second conductive layer 280 , the reflective layer 250 , the first conductive layer 292 and the common electrode 160 are electrically connected to each other to form a composite common electrode C. In this embodiment, in addition to the reflective layer 250 , the resistivity of the second conductive layer 280 is also smaller than that of the common electrode 160 . Through the second conductive layer 280 electrically connected to the common electrode 160 , the resistance value of the composite common electrode C can be further reduced, and the IR-drop problem can be significantly improved.

請參照圖3、圖4及圖5,在本實施例中,為使對向基板200之凸起結構290上的部分第一導電層292更良好地與畫素陣列基板100的共用電極160電性連接,顯示裝置10的部分區域中可不設置黏著層270。也就是說,在部分區域中,對向基板200的第一絕緣層240與畫素陣列基板100的封裝層170之間可存在空隙(air gap)AG。此外,在另一部分區域中,對向基板200的第一絕緣層240與畫素陣列基板100的封裝層170之間仍可設有黏著層270,以維持畫素陣列基板100與對向基板200的連接。Please refer to FIG. 3 , FIG. 4 and FIG. 5 . In order to connect, the adhesive layer 270 may not be disposed in some areas of the display device 10 . That is to say, in some regions, there may be an air gap AG between the first insulating layer 240 of the opposite substrate 200 and the encapsulation layer 170 of the pixel array substrate 100 . In addition, in another part of the area, an adhesive layer 270 can still be provided between the first insulating layer 240 of the opposite substrate 200 and the encapsulation layer 170 of the pixel array substrate 100, so as to maintain the relationship between the pixel array substrate 100 and the opposite substrate 200. Connection.

舉例而言,在本實施例中,同一子畫素結構SPX可包括多個發光圖案150,同一子畫素結構SPX的多個發光圖案150分別重疊於遮光圖案層220的多個開口220a,同一子畫素結構SPX的多個發光圖案150彼此電性連接,同一子畫素結構SPX的多個發光圖案150電性連接至同一子畫素電路120,其中一個發光圖案150重疊於黏著層270,而另一個發光圖案150則重疊於空隙AG。For example, in this embodiment, the same sub-pixel structure SPX may include multiple light-emitting patterns 150, and the multiple light-emitting patterns 150 of the same sub-pixel structure SPX respectively overlap the multiple openings 220a of the light-shielding pattern layer 220, and the same The multiple light emitting patterns 150 of the sub-pixel structure SPX are electrically connected to each other, and the multiple light emitting patterns 150 of the same sub-pixel structure SPX are electrically connected to the same sub-pixel circuit 120, wherein one light emitting pattern 150 overlaps the adhesive layer 270, And another light emitting pattern 150 overlaps the gap AG.

黏著層270的設置可減少發光圖案150發出的光束L(請參考圖1)在顯示裝置10A內部的界面反射,增加子畫素結構SPX的出光效率。空隙AG可使對向基板200之凸起結構290上的部分第一導電層292與畫素陣列基板100的共用電極160良好地電性連接,而不被黏著層270阻礙。在同一子畫素結構SPX的多個發光圖案150上分別設置黏著層270及空隙AG,可使多個子畫素結構SPX具有相同或相近的出光效果,並兼顧反射層250(及/或第二導電層280)與共用電極160的電性連接。然而,本發明不限於此,在其它實施例中,也可採用其它方式配置空隙AG及黏著層270。此外,本發明也不限制同一子畫素結構SPX之重疊於空隙AG的面積與重疊於黏著層270的面積的比例,同一子畫素結構SPX之重疊於空隙AG的面積與重疊於黏著層270的面積的比例可視實際需求調整。The setting of the adhesive layer 270 can reduce the reflection of the light beam L (please refer to FIG. 1 ) emitted by the light emitting pattern 150 at the interface inside the display device 10A, and increase the light extraction efficiency of the sub-pixel structure SPX. The gap AG can make the portion of the first conductive layer 292 on the protruding structure 290 of the opposite substrate 200 electrically connected to the common electrode 160 of the pixel array substrate 100 without being hindered by the adhesive layer 270 . Adhesive layers 270 and gaps AG are respectively provided on multiple light-emitting patterns 150 of the same sub-pixel structure SPX, so that multiple sub-pixel structures SPX have the same or similar light-emitting effects, and take into account the reflective layer 250 (and/or the second The conductive layer 280 ) is electrically connected to the common electrode 160 . However, the present invention is not limited thereto, and in other embodiments, the gap AG and the adhesive layer 270 may also be configured in other ways. In addition, the present invention does not limit the ratio of the area of the same sub-pixel structure SPX overlapping the gap AG to the area overlapping the adhesive layer 270, and the area of the same sub-pixel structure SPX overlapping the gap AG The proportion of the area can be adjusted according to actual needs.

請參照圖3、圖4及圖5,舉例而言,共用電極160具有一訊號輸入端OVSS。在本實施例中,凸起結構290在遠離訊號輸入端OVSS的一處的設置密度可選擇性地大於靠近訊號輸入端OVSS的另一處的設置密度。在本實施例中,空隙AG在遠離訊號輸入端OVSS的一處的設置密度可選擇性地大於靠近訊號輸入端OVSS的另一處的設置密度。也就是說,在越遠離訊號輸入端OVSS處(即,電壓壓降較嚴重處),對向基板200之第一導電層292與畫素陣列基板100之共用電極160的電連接處的密度可越高,以更進一步地優化改善電壓壓降(IR-drop)的效果。Please refer to FIG. 3 , FIG. 4 and FIG. 5 , for example, the common electrode 160 has a signal input terminal OVSS. In this embodiment, the arrangement density of the protruding structures 290 at a place away from the signal input terminal OVSS may be selectively greater than that at another place close to the signal input terminal OVSS. In this embodiment, the arrangement density of the gaps AG at a place away from the signal input terminal OVSS can be selectively greater than that at another place close to the signal input terminal OVSS. That is to say, the density of the electrical connections between the first conductive layer 292 of the opposite substrate 200 and the common electrode 160 of the pixel array substrate 100 can The higher the value, the better the effect of improving the voltage drop (IR-drop).

請參照圖3,在本實施例中,設置於黏著層270旁的凸起結構290上的部分第一導電層292仍然可與共用電極160電性連接。在本實施例中,凸起結構290可凸出於黏著層270,而使凸起結構290上的部分第一導電層292電性連接至共用電極160。然而,本發明不限於此,在其它實施例中,黏著層270也可蓋過凸起結構290。Referring to FIG. 3 , in this embodiment, a portion of the first conductive layer 292 disposed on the protruding structure 290 next to the adhesive layer 270 can still be electrically connected to the common electrode 160 . In this embodiment, the protruding structure 290 can protrude from the adhesive layer 270 , so that part of the first conductive layer 292 on the protruding structure 290 is electrically connected to the common electrode 160 . However, the present invention is not limited thereto, and in other embodiments, the adhesive layer 270 may also cover the protruding structure 290 .

圖6為本發明一實施例之顯示裝置10B的上視示意圖。FIG. 6 is a schematic top view of a display device 10B according to an embodiment of the present invention.

圖6繪示顯示裝置10B的遮光圖案層220、第二導電層280、凸起結構290、多個發光圖案150及黏著層270,而省略顯示裝置10B的其它構件。6 shows the light-shielding pattern layer 220 , the second conductive layer 280 , the protrusion structure 290 , the plurality of light emitting patterns 150 and the adhesive layer 270 of the display device 10B, while omitting other components of the display device 10B.

圖6的顯示裝置10B與圖5的顯示裝置10A類似,兩者的差異在於:黏著層270的形成位置略有差異。請參照圖5及圖6,黏著層270可包括多個黏著圖案272。在圖5的實施例中,噴塗黏著圖案272的間距P約等於一個畫素結構PX的寬度W。在圖6的實施例中,噴塗黏著圖案272的間距P約等於n個畫素結構PX的寬度W,其中n為大於或等於2的正整數。圖6是以n=2(即,黏著圖案272的間距P約等於2個畫素結構PX的寬度W)為示例,但本發明不以此為限。The display device 10B in FIG. 6 is similar to the display device 10A in FIG. 5 , the difference between them is that the formation position of the adhesive layer 270 is slightly different. Referring to FIG. 5 and FIG. 6 , the adhesive layer 270 may include a plurality of adhesive patterns 272 . In the embodiment of FIG. 5 , the pitch P of the sprayed adhesive pattern 272 is approximately equal to the width W of one pixel structure PX. In the embodiment of FIG. 6 , the pitch P of the sprayed adhesive pattern 272 is approximately equal to the width W of n pixel structures PX, where n is a positive integer greater than or equal to 2. 6 is an example where n=2 (that is, the pitch P of the adhesive pattern 272 is approximately equal to the width W of two pixel structures PX), but the present invention is not limited thereto.

圖7為本發明一實施例之顯示裝置10C的剖面示意圖。FIG. 7 is a schematic cross-sectional view of a display device 10C according to an embodiment of the present invention.

圖8為本發明一實施例之顯示裝置10C的剖面示意圖。FIG. 8 is a schematic cross-sectional view of a display device 10C according to an embodiment of the present invention.

圖9為本發明一實施例之顯示裝置10C的上視示意圖。FIG. 9 is a schematic top view of a display device 10C according to an embodiment of the present invention.

圖7對應圖9的剖線IV-IV’。圖8對應圖9的剖線V-V’。圖9繪示圖7及圖8之顯示裝置10C的遮光圖案層220、第二導電層280、凸起結構290、多個發光圖案150及黏著層270,而省略圖7及圖8之顯示裝置10C的其它構件。Fig. 7 corresponds to section line IV-IV' of Fig. 9 . Fig. 8 corresponds to the section line V-V' of Fig. 9 . FIG. 9 shows the light-shielding pattern layer 220, the second conductive layer 280, the protrusion structure 290, the plurality of light emitting patterns 150 and the adhesive layer 270 of the display device 10C shown in FIG. 7 and FIG. 8, and the display device shown in FIG. 7 and FIG. 8 is omitted. Other components of 10C.

圖7、圖8及圖9的顯示裝置10C與圖3、圖4及圖5的顯示裝置10A類似,兩者的差異在於:顯示裝置10C的反射層250C與顯示裝置10A的反射層250不同。The display device 10C shown in FIGS. 7 , 8 and 9 is similar to the display device 10A shown in FIGS. 3 , 4 and 5 . The difference between them is that the reflective layer 250C of the display device 10C is different from the reflective layer 250 of the display device 10A.

請參照圖7、圖8及圖9,在本實施例中,多個子畫素結構SPX包括第一子畫素結構SPX1、第二子畫素結構SPX2及第三子畫素結構SPX3,第一子畫素結構SPX1、第二子畫素結構SPX2及第三子畫素結構SPX3分別包括第一發光圖案150R、第二發光圖案150G及第三發光圖案150B,第一絕緣層240的開口220a包括分別對應於第一子畫素結構SPX1、第二子畫素結構SPX2及第三子畫素結構SPX3的第一開口220a-1、第二開口220a-2及第三開口220a-3,第一絕緣層240的側壁242包括分別定義第一開口220a-1、第二開口220a-2及第三開口220a-3的第一側壁242-1、第二側壁242-2及第三側壁242-3。Please refer to FIG. 7, FIG. 8 and FIG. 9. In this embodiment, the multiple sub-pixel structures SPX include a first sub-pixel structure SPX1, a second sub-pixel structure SPX2, and a third sub-pixel structure SPX3. The sub-pixel structure SPX1, the second sub-pixel structure SPX2, and the third sub-pixel structure SPX3 respectively include a first light emitting pattern 150R, a second light emitting pattern 150G, and a third light emitting pattern 150B, and the opening 220a of the first insulating layer 240 includes Corresponding to the first opening 220a-1, the second opening 220a-2 and the third opening 220a-3 of the first sub-pixel structure SPX1, the second sub-pixel structure SPX2 and the third sub-pixel structure SPX3 respectively, the first The sidewall 242 of the insulating layer 240 includes a first sidewall 242-1, a second sidewall 242-2 and a third sidewall 242-3 respectively defining the first opening 220a-1, the second opening 220a-2 and the third opening 220a-3. .

在本實施例中,反射層250C包括多個第一折射率子層250a及多個第二折射率子層250b,交替堆疊且設置在第一側壁242-1上。多個第一折射率子層250a的折射率與多個第二折射率子層250b的折射率不同。交替堆疊的多個第一折射率子層250a及多個第二折射率子層250b可形成第一分散式布拉格反射器DBR1。第一分散式布拉格反射器DBR1用以反射第一子畫素結構SPX1發出的第一色光L1。In this embodiment, the reflective layer 250C includes a plurality of first refractive index sub-layers 250a and a plurality of second refractive index sub-layers 250b, which are alternately stacked and disposed on the first sidewall 242-1. The refractive index of the plurality of first refractive index sublayers 250a is different from the refractive index of the plurality of second refractive index sublayers 250b. A plurality of first refractive index sub-layers 250a and a plurality of second refractive index sub-layers 250b stacked alternately can form a first distributed Bragg reflector DBR1. The first distributed Bragg reflector DBR1 is used to reflect the first color light L1 emitted by the first sub-pixel structure SPX1.

在本實施例中,反射層250C更包括多個第三折射率子層250c及多個第四折射率子層250d,交替堆疊且設置在第二側壁242-2上。多個第三折射率子層250c的折射率與多個第四折射率子層250d的折射率不同。交替堆疊的多個第三折射率子層250c及多個第四折射率子層250d可形成第二分散式布拉格反射器DBR2。第二分散式布拉格反射器DBR2用以反射第二子畫素結構SPX2發出的第二色光L2。In this embodiment, the reflective layer 250C further includes a plurality of third refractive index sub-layers 250c and a plurality of fourth refractive index sub-layers 250d, which are alternately stacked and disposed on the second sidewall 242-2. A refractive index of the plurality of third refractive index sublayers 250c is different from a refractive index of the plurality of fourth refractive index sublayers 250d. A plurality of third refractive index sub-layers 250c and a plurality of fourth refractive index sub-layers 250d stacked alternately can form a second distributed Bragg reflector DBR2. The second distributed Bragg reflector DBR2 is used for reflecting the second color light L2 emitted by the second sub-pixel structure SPX2.

在本實施例中,反射層250C更包括多個第五折射率子層250e及多個第六折射率子層250f,交替堆疊且設置在第三側壁242-3上。多個第五折射率子層250e的折射率與多個第六折射率子層250f的折射率不同。交替堆疊的多個第五折射率子層250e及多個第六折射率子層250f可形成第三分散式布拉格反射器DBR3。第三分散式布拉格反射器DBR3用以反射第三子畫素結構SPX3發出的第三色光L3。In this embodiment, the reflective layer 250C further includes a plurality of fifth refractive index sub-layers 250e and a plurality of sixth refractive index sub-layers 250f, which are alternately stacked and disposed on the third sidewall 242-3. The plurality of fifth refractive index sublayers 250e has a different refractive index from the plurality of sixth refractive index sublayers 250f. A plurality of fifth refractive index sub-layers 250e and a plurality of sixth refractive index sub-layers 250f stacked alternately can form a third distributed Bragg reflector DBR3. The third distributed Bragg reflector DBR3 is used for reflecting the third color light L3 emitted by the third sub-pixel structure SPX3.

在本實施例中,第一折射率子層250a及多個第二折射率子層250b(即,第一分散式布拉格反射器DBR1)對第一色光L1的反射率高於對第二色光L2的反射率。在本實施例中,多個第三折射率子層250c及多個第四折射率子層250d(即,第二分散式布拉格反射器DBR2)對第二色光L2的反射率高於對第一色光L1的反射率。在本實施例中,多個第五折射率子層250e及多個第六折射率子層250f(即,第三分散式布拉格反射器DBR3)對第三色光L3的反射率高於對第二色光L2的反射率。In this embodiment, the first refractive index sublayer 250a and the plurality of second refractive index sublayers 250b (that is, the first distributed Bragg reflector DBR1) have a higher reflectivity for the first color light L1 than for the second color light Reflectivity of L2. In this embodiment, the multiple third refractive index sub-layers 250c and the multiple fourth refractive index sub-layers 250d (that is, the second distributed Bragg reflector DBR2) have higher reflectivity for the second color light L2 than for the first The reflectivity of the shade L1. In this embodiment, the multiple fifth refractive index sub-layers 250e and multiple sixth refractive index sub-layers 250f (that is, the third distributed Bragg reflector DBR3) have a higher reflectivity for the third color light L3 than for the second color light L3. Reflectance of shade L2.

在本實施例中,透過調整第一折射率子層250a、第二折射率子層250b、第三折射率子層250c、第四折射率子層250d、第五折射率子層250e及/或第六折射率子層250f的折射率及/或厚度,能使反射層250C針對不同波長的第一色光L1、第二色光L2及第三色光L3提高其反射率。In this embodiment, by adjusting the first refractive index sub-layer 250a, the second refractive index sub-layer 250b, the third refractive index sub-layer 250c, the fourth refractive index sub-layer 250d, the fifth refractive index sub-layer 250e and/or The refractive index and/or thickness of the sixth refractive index sub-layer 250f can increase the reflectivity of the reflective layer 250C for the first color light L1 , the second color light L2 and the third color light L3 of different wavelengths.

在本實施例中,第一折射率子層250a、第二折射率子層250b、第三折射率子層250c、第四折射率子層250d、第五折射率子層250e及第六折射率子層250f的材質具有導電性。舉例而言,第一折射率子層250a、第二折射率子層250b、第三折射率子層250c、第四折射率子層250d、第五折射率子層250e及第六折射率子層250f的材質可包括金屬氧化物,但本發明不以此為限。In this embodiment, the first refractive index sub-layer 250a, the second refractive index sub-layer 250b, the third refractive index sub-layer 250c, the fourth refractive index sub-layer 250d, the fifth refractive index sub-layer 250e and the sixth refractive index The material of the sub-layer 250f is conductive. For example, the first refractive index sub-layer 250a, the second refractive index sub-layer 250b, the third refractive index sub-layer 250c, the fourth refractive index sub-layer 250d, the fifth refractive index sub-layer 250e and the sixth refractive index sub-layer The material of 250f may include metal oxide, but the invention is not limited thereto.

圖10為本發明一實施例之顯示裝置10D的剖面示意圖。圖10的顯示裝置10D與圖7的顯示裝置10C類似,兩者的差異在於:在圖10的實施例中,多個第一折射率子層250a及多個第二折射率子層250b設置於分別對應於第一子畫素結構SPX1、第二子畫素結構SPX2及第三子畫素結構SPX3的第一側壁242-1、第二側壁242-2及第三側壁242-3上。換言之,在本實施例中,第一子畫素結構SPX1、第二子畫素結構SPX2及第三子畫素結構SPX3是共用同一種第一分散式布拉格反射器DBR1,而顯示裝置10D的對向基板200的製程較顯示裝置10C的對向基板200的製程簡單。FIG. 10 is a schematic cross-sectional view of a display device 10D according to an embodiment of the present invention. The display device 10D shown in FIG. 10 is similar to the display device 10C shown in FIG. 7 . The difference between them is that in the embodiment shown in FIG. Corresponding to the first sidewall 242-1, the second sidewall 242-2 and the third sidewall 242-3 of the first sub-pixel structure SPX1, the second sub-pixel structure SPX2 and the third sub-pixel structure SPX3 respectively. In other words, in this embodiment, the first sub-pixel structure SPX1, the second sub-pixel structure SPX2 and the third sub-pixel structure SPX3 share the same first distributed Bragg reflector DBR1, and the pair of the display device 10D The manufacturing process of the opposing substrate 200 is simpler than that of the opposing substrate 200 of the display device 10C.

圖11為本發明一實施例之顯示裝置10E的剖面示意圖。圖11的顯示裝置10E與圖1的顯示裝置10類似,兩者的差異在於:圖11的顯示裝置10E的對向基板200E與圖1的顯示裝置10的對向基板200不同。FIG. 11 is a schematic cross-sectional view of a display device 10E according to an embodiment of the present invention. The display device 10E of FIG. 11 is similar to the display device 10 of FIG. 1 , the difference between them is that the opposite substrate 200E of the display device 10E of FIG. 11 is different from the opposite substrate 200 of the display device 10 of FIG. 1 .

請參照圖11,具體而言,在本實施例中,對向基板200E包括第二基底210、遮光圖案層220、凸起物294、反射層250E及第一絕緣層240E。遮光圖案層220設置於第二基底210上,且具有重疊於子畫素結構SPX的開口220a。凸起物294設置於遮光圖案層220上,且由第二基底210凸向第一基底110。凸起物294具有鄰接於遮光圖案層220之開口220a的側壁294a。反射層250E至少設置凸起物294的側壁294a上。第一絕緣層240E覆蓋反射層250E,且重疊於遮光圖案層220的開口220a。在本實施例中,凸起物294具有朝向第二基底210的第一表面294b,凸起物294的側壁294a朝向第一絕緣層240E,第一表面294b與側壁294a於凸起物294的材質內夾有一角度β,且β<90o。Referring to FIG. 11 , specifically, in this embodiment, the opposite substrate 200E includes a second base 210 , a light-shielding pattern layer 220 , protrusions 294 , a reflective layer 250E, and a first insulating layer 240E. The light-shielding pattern layer 220 is disposed on the second substrate 210 and has an opening 220 a overlapping the sub-pixel structure SPX. The protrusion 294 is disposed on the light-shielding pattern layer 220 and protrudes from the second base 210 to the first base 110 . The protrusion 294 has a sidewall 294 a adjacent to the opening 220 a of the light-shielding pattern layer 220 . The reflective layer 250E is at least disposed on the sidewall 294 a of the protrusion 294 . The first insulating layer 240E covers the reflective layer 250E and overlaps the opening 220 a of the light-shielding pattern layer 220 . In this embodiment, the protrusion 294 has a first surface 294b facing the second base 210, the sidewall 294a of the protrusion 294 faces the first insulating layer 240E, and the material of the first surface 294b and the sidewall 294a is different from that of the protrusion 294. There is an angle β inside, and β<90o.

圖12為本發明一實施例之顯示裝置10F的剖面示意圖。圖12的顯示裝置10F與圖11的顯示裝置10E類似,兩者的差異在於:在圖12的實施例中,第一表面294b與側壁294a於凸起物294的材質內夾有一角度β,且β實質上等於90o。FIG. 12 is a schematic cross-sectional view of a display device 10F according to an embodiment of the present invention. The display device 10F shown in FIG. 12 is similar to the display device 10E shown in FIG. 11 . The difference between the two is that in the embodiment shown in FIG. β is substantially equal to 90o.

類似地,圖11的顯示裝置10E及圖12的顯示裝置10F透過凸起物294上的反射層250E,能將具有大發散角φ且向遮光圖案層220傳遞的光束L引導至遮光圖案層220的開口220a,並以大角度θ出射。藉此,顯示裝置10E、10F在大視角方向上的亮度能增加。Similarly, the display device 10E of FIG. 11 and the display device 10F of FIG. 12 pass through the reflective layer 250E on the protrusion 294 to guide the light beam L having a large divergence angle φ and transmitted to the light-shielding pattern layer 220 to the light-shielding pattern layer 220 The opening 220a, and exit at a large angle θ. Thereby, the brightness of the display devices 10E, 10F can be increased in the direction of large viewing angle.

10、10A、10B、10C、10D、10E、10F:顯示裝置 100:畫素陣列基板 110:第一基底 120:子畫素電路 130:第一電極 140:畫素定義層 140a、220a、240a、280a:開口 141:第一子畫素定義層 142:第二子畫素定義層 142a:凹陷 150:發光圖案 150R:第一彩色濾光圖案 150G:第二彩色濾光圖案 150B:第三彩色濾光圖案 160:共用電極 170:封裝層 200:對向基板 210:第二基底 220:遮光圖案層 220e:邊緣 220a-1:第一開口 220a-2:第二開口 220a-3:第三開口 230:彩色濾光圖案 230R:第一彩色濾光圖案 230G:第二彩色濾光圖案 230B:第三彩色濾光圖案 240、240E:第一絕緣層 242、294a:側壁 242-1:第一側壁 242-2:第二側壁 242-3:第三側壁 250、250C、250E:反射層 250a:第一折射率子層 250b:第二折射率子層 250c:第三折射率子層 250d:第四折射率子層 250e:第五折射率子層 250f:第六折射率子層 251、261:第一部 252、262:第二部 252e:邊緣 260:第二絕緣層 261a:第一表面 261b:第二表面 270:黏著層 272:黏著圖案 280:第二導電層 290:凸起結構 292:第一導電層 294:凸起物 294b:第一表面 AG:空隙 C:複合式共用電極 D:距離 DBR1:第一分散式布拉格反射器 DBR2:第二分散式布拉格反射器 DBR3:第三分散式布拉格反射器 L:光束 L1:第一色光 L2:第二色光 L3:第三色光 OVSS:訊號輸入端 PX:畫素結構 P:間距 SPX:子畫素結構 SPX1:第一子畫素結構 SPX2:第二子畫素結構 SPX3:第三子畫素結構 W:寬度 α、β、θ:角度 φ:發散角 I-I’、II-II’、III-III’、IV-IV’、V-V’:剖線 10, 10A, 10B, 10C, 10D, 10E, 10F: display device 100:Pixel array substrate 110: First base 120: Sub-pixel circuit 130: first electrode 140:Pixel definition layer 140a, 220a, 240a, 280a: openings 141: The first sub-pixel definition layer 142: The second sub-pixel definition layer 142a: Depression 150: Luminous pattern 150R: The first color filter pattern 150G: Second color filter pattern 150B: the third color filter pattern 160: common electrode 170: encapsulation layer 200: opposite substrate 210:Second Base 220: shading pattern layer 220e: edge 220a-1: first opening 220a-2: second opening 220a-3: the third opening 230: Color filter pattern 230R: The first color filter pattern 230G: Second color filter pattern 230B: the third color filter pattern 240, 240E: the first insulating layer 242, 294a: side wall 242-1: first side wall 242-2: second side wall 242-3: third side wall 250, 250C, 250E: reflective layer 250a: the first refractive index sublayer 250b: second refractive index sublayer 250c: the third refractive index sublayer 250d: the fourth refractive index sublayer 250e: the fifth refractive index sublayer 250f: sixth refractive index sublayer 251, 261: Part 1 252, 262: Part Two 252e: edge 260: second insulating layer 261a: first surface 261b: second surface 270: Adhesive layer 272: Adhesive pattern 280: second conductive layer 290: Convex structure 292: The first conductive layer 294: bumps 294b: first surface AG: Gap C: Composite common electrode D: distance DBR1: First Distributed Bragg Reflector DBR2: Second Distributed Bragg Reflector DBR3: Third Distributed Bragg Reflector L: light beam L1: first color light L2: second color light L3: third color light OVSS: signal input terminal PX: pixel structure P: Pitch SPX: sub-pixel structure SPX1: The first sub-pixel structure SPX2: Second sub-pixel structure SPX3: The third sub-pixel structure W: width α, β, θ: angle φ: divergence angle I-I', II-II', III-III', IV-IV', V-V': broken line

圖1為本發明一實施例之顯示裝置10的剖面示意圖。 圖2為本發明一實施例之顯示裝置10的上視示意圖。 圖3為本發明一實施例之顯示裝置10A的剖面示意圖。 圖4為本發明一實施例之顯示裝置10A的剖面示意圖。 圖5為本發明一實施例之顯示裝置10A的上視示意圖。 圖6為本發明一實施例之顯示裝置10B的上視示意圖。 圖7為本發明一實施例之顯示裝置10C的剖面示意圖。 圖8為本發明一實施例之顯示裝置10C的剖面示意圖。 圖9為本發明一實施例之顯示裝置10C的上視示意圖。 圖10為本發明一實施例之顯示裝置10D的剖面示意圖。 圖11為本發明一實施例之顯示裝置10E的剖面示意圖。 圖12為本發明一實施例之顯示裝置10F的剖面示意圖。 FIG. 1 is a schematic cross-sectional view of a display device 10 according to an embodiment of the present invention. FIG. 2 is a schematic top view of a display device 10 according to an embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of a display device 10A according to an embodiment of the present invention. FIG. 4 is a schematic cross-sectional view of a display device 10A according to an embodiment of the present invention. FIG. 5 is a schematic top view of a display device 10A according to an embodiment of the present invention. FIG. 6 is a schematic top view of a display device 10B according to an embodiment of the present invention. FIG. 7 is a schematic cross-sectional view of a display device 10C according to an embodiment of the present invention. FIG. 8 is a schematic cross-sectional view of a display device 10C according to an embodiment of the present invention. FIG. 9 is a schematic top view of a display device 10C according to an embodiment of the present invention. FIG. 10 is a schematic cross-sectional view of a display device 10D according to an embodiment of the present invention. FIG. 11 is a schematic cross-sectional view of a display device 10E according to an embodiment of the present invention. FIG. 12 is a schematic cross-sectional view of a display device 10F according to an embodiment of the present invention.

10:顯示裝置 10: Display device

100:畫素陣列基板 100:Pixel array substrate

110:第一基底 110: First base

120:子畫素電路 120: Sub-pixel circuit

130:第一電極 130: first electrode

140:畫素定義層 140:Pixel definition layer

140a、220a、240a:開口 140a, 220a, 240a: openings

150:發光圖案 150: Luminous pattern

150R:第一彩色濾光圖案 150R: The first color filter pattern

150G:第二彩色濾光圖案 150G: Second color filter pattern

150B:第三彩色濾光圖案 150B: the third color filter pattern

160:共用電極 160: common electrode

170:封裝層 170: encapsulation layer

200:對向基板 200: opposite substrate

210:第二基底 210:Second Base

220:遮光圖案層 220: shading pattern layer

220e、252e:邊緣 220e, 252e: edge

230:彩色濾光圖案 230: Color filter pattern

230R:第一彩色濾光圖案 230R: The first color filter pattern

230G:第二彩色濾光圖案 230G: Second color filter pattern

230B:第三彩色濾光圖案 230B: the third color filter pattern

240:第一絕緣層 240: first insulating layer

242:側壁 242: side wall

250:反射層 250: reflective layer

251、261:第一部 251, 261: Part 1

252、262:第二部 252, 262: Part Two

260:第二絕緣層 260: second insulating layer

261a:第一表面 261a: first surface

261b:第二表面 261b: second surface

270:黏著層 270: Adhesive layer

D:距離 D: distance

L:光束 L: light beam

L1:第一色光 L1: first color light

L2:第二色光 L2: second color light

L3:第三色光 L3: third color light

SPX:子畫素結構 SPX: sub-pixel structure

SPX1:第一子畫素結構 SPX1: The first sub-pixel structure

SPX2:第二子畫素結構 SPX2: Second sub-pixel structure

SPX3:第三子畫素結構 SPX3: The third sub-pixel structure

α、θ:角度 α, θ: angle

φ:發散角 φ: divergence angle

I-I’:剖線 I-I': section line

Claims (17)

一種顯示裝置,包括:一第一基底;至少一子畫素結構,設置於該第一基底上,其中該至少一子畫素結構包括一共用電極;一第二基底,設置於該第一基底的對向;一遮光圖案層,設置於該第二基底上,且具有至少一開口,其中該遮光圖案層的該至少一開口重疊於該至少一子畫素結構;一第一絕緣層,設置於該遮光圖案層上,且具有至少一開口,其中該第一絕緣層的該至少一開口設置於該遮光圖案層的該至少一開口外,且該第一絕緣層具有定義該第一絕緣層之該至少一開口的至少一側壁;一反射層,至少設置於該第一絕緣層的該至少一側壁上;一第二絕緣層,至少設置於該第一絕緣層的該至少一開口中,且覆蓋反射層,其中該第二絕緣層具有設置於該第一絕緣層之該至少一開口中的至少一第一部;至少一凸起結構,設置於該第二絕緣層的該至少一第一部上;以及一第一導電層,設置於該至少一凸起結構上,且電性連接至該反射層及該共用電極。 A display device, comprising: a first substrate; at least one sub-pixel structure disposed on the first substrate, wherein the at least one sub-pixel structure includes a common electrode; a second substrate disposed on the first substrate opposite to; a light-shielding pattern layer, disposed on the second substrate, and has at least one opening, wherein the at least one opening of the light-shielding pattern layer overlaps the at least one sub-pixel structure; a first insulating layer, set on the light-shielding pattern layer, and has at least one opening, wherein the at least one opening of the first insulating layer is disposed outside the at least one opening of the light-shielding pattern layer, and the first insulating layer has a at least one side wall of the at least one opening; a reflective layer disposed at least on the at least one side wall of the first insulating layer; a second insulating layer disposed at least in the at least one opening of the first insulating layer, and cover the reflective layer, wherein the second insulating layer has at least one first portion disposed in the at least one opening of the first insulating layer; at least one protruding structure is disposed in the at least one first portion of the second insulating layer and a first conductive layer disposed on the at least one protruding structure and electrically connected to the reflective layer and the common electrode. 如請求項1所述的顯示裝置,其中該反射層具有相連接的至少一第一部及至少一第二部,該反射層的該至少一第一 部設置於該第一絕緣層的該至少一側壁上,且該反射層的該至少一第二部設置於該遮光圖案層與該第二絕緣層之間。 The display device as claimed in claim 1, wherein the reflective layer has at least one first part and at least one second part connected, and the at least one first part of the reflective layer A portion is disposed on the at least one sidewall of the first insulating layer, and the at least one second portion of the reflective layer is disposed between the light-shielding pattern layer and the second insulating layer. 如請求項1所述的顯示裝置,其中該反射層的該至少一第二部直接接觸於該遮光圖案層。 The display device according to claim 1, wherein the at least one second portion of the reflective layer is directly in contact with the light-shielding pattern layer. 如請求項1所述的顯示裝置,其中該反射層具有相連接的至少一第一部及至少一第二部,該反射層的該至少一第一部設置於該第一絕緣層的該至少一側壁,該反射層的該至少一第二部設置於該至少一第一部之靠近該遮光圖案層的一側,該反射層之該至少一第二部的一邊緣與該遮光圖案層的一邊緣相隔一距離。 The display device according to claim 1, wherein the reflective layer has at least one first portion and at least one second portion connected to each other, and the at least one first portion of the reflective layer is disposed on the at least one portion of the first insulating layer. One side wall, the at least one second part of the reflective layer is disposed on the side of the at least one first part close to the light-shielding pattern layer, an edge of the at least one second part of the reflective layer is connected to the light-shielding pattern layer An edge is separated by a distance. 如請求項1所述的顯示裝置,其中該第二絕緣層具有設置於該第一絕緣層之該至少一開口中的一第一部,該第二絕緣層的該第一部具有朝向該第二基底的一第一表面及朝向該第一絕緣層之該至少一側壁的一第二表面,且該第一表面與該第二表面於該第二絕緣層的材質內夾有一角度α,且α>90o。 The display device according to claim 1, wherein the second insulating layer has a first portion disposed in the at least one opening of the first insulating layer, and the first portion of the second insulating layer has a a first surface of two bases and a second surface facing the at least one side wall of the first insulating layer, and the first surface and the second surface form an angle α within the material of the second insulating layer, and α>90o. 如請求項1所述的顯示裝置,其中設置於該至少一凸起結構上之部分的該第一導電層直接接觸於該共用電極。 The display device according to claim 1, wherein the portion of the first conductive layer disposed on the at least one protruding structure directly contacts the common electrode. 如請求項1所述的顯示裝置,其中該至少一子畫素結構更包括至少一第一電極、至少一發光圖案及一畫素定義層,該畫素定義層設置於該至少一第一電極上且具有重疊於該至少一第一電極的至少一開口,該至少一發光圖案設置於該畫素定義層的該至少一開口內且電性連接至該第一電極,該畫素定義層具有 至少一凹陷,該共用電極設置於該畫素定義層的該至少一凹陷內且電性連接至該至少一發光圖案,且該至少一凸起結構及至少一部分的該第一導電層設置於該畫素定義層的該至少一凹陷中。 The display device according to claim 1, wherein the at least one sub-pixel structure further includes at least one first electrode, at least one light-emitting pattern, and a pixel definition layer, and the pixel definition layer is disposed on the at least one first electrode and has at least one opening overlapping the at least one first electrode, the at least one light-emitting pattern is disposed in the at least one opening of the pixel definition layer and electrically connected to the first electrode, and the pixel definition layer has At least one recess, the common electrode is disposed in the at least one recess of the pixel definition layer and electrically connected to the at least one light emitting pattern, and the at least one protruding structure and at least a part of the first conductive layer are disposed in the at least one recess In the at least one recess of the pixel definition layer. 如請求項1所述的顯示裝置,更包括:一封裝層,設置於該共用電極上,其中該第一絕緣層與該封裝層之間存在一空隙。 The display device according to claim 1, further comprising: an encapsulation layer disposed on the common electrode, wherein a gap exists between the first insulating layer and the encapsulation layer. 如請求項1所述的顯示裝置,更包括:一封裝層,設置於該共用電極上;以及一黏著層,設置於該第一絕緣層與該封裝層之間;其中該至少一凸起結構凸出於該黏著層。 The display device according to claim 1, further comprising: an encapsulation layer disposed on the common electrode; and an adhesive layer disposed between the first insulating layer and the encapsulation layer; wherein the at least one protrusion structure protrude from the adhesive layer. 如請求項1所述的顯示裝置,其中該共用電極具有一訊號輸入端,該至少一凸起結構在遠離該訊號輸入端的一處的設置密度大於靠近該訊號輸入端的另一處的設置密度。 The display device according to claim 1, wherein the common electrode has a signal input end, and the arrangement density of the at least one protruding structure is greater at a place far from the signal input end than at another place close to the signal input end. 如請求項1所述的顯示裝置,更包括:一第二導電層,設置於該遮光圖案層上,位於該遮光圖案層與該第一絕緣層之間,且具有重疊於該至少一子畫素結構的至少一開口;其中,該第二導電層、該反射層、該第一導電層及該共用電極彼此電性連接。 The display device according to claim 1, further comprising: a second conductive layer disposed on the light-shielding pattern layer, between the light-shielding pattern layer and the first insulating layer, and having a At least one opening of the pixel structure; wherein, the second conductive layer, the reflective layer, the first conductive layer and the common electrode are electrically connected to each other. 如請求項11所述的顯示裝置,其中該第二導電層在該第二基底上的一垂直投影的形狀與該遮光圖案層在該第二基底上的一垂直投影的形狀實質上相同。 The display device according to claim 11, wherein a shape of a vertical projection of the second conductive layer on the second substrate is substantially the same as a shape of a vertical projection of the light-shielding pattern layer on the second substrate. 如請求項1所述的顯示裝置,其中該至少一子畫素結構包括電性連接至該共用電極的多個第一發光圖案,該遮光圖案層的該至少一開口為該遮光圖案層的多個開口,該些第一發光圖案彼此電性連接且分別重疊於該遮光圖案層的該些開口,該顯示裝置更包括:一封裝層,設置於該至少一子畫素結構上;以及一黏著層,設置於該第一絕緣層與該封裝層之間;其中一空隙存在於該第一絕緣層與該封裝層之間且重疊於該些第一發光圖案的一者,而該黏著層重疊於該些第一發光圖案的另一者。 The display device according to claim 1, wherein the at least one sub-pixel structure includes a plurality of first light-emitting patterns electrically connected to the common electrode, and the at least one opening of the light-shielding pattern layer is a plurality of the light-shielding pattern layer. The first light-emitting patterns are electrically connected to each other and respectively overlap the openings of the light-shielding pattern layer. The display device further includes: an encapsulation layer disposed on the at least one sub-pixel structure; and an adhesive layer, disposed between the first insulating layer and the encapsulation layer; wherein a gap exists between the first insulating layer and the encapsulation layer and overlaps one of the first light emitting patterns, and the adhesive layer overlaps on the other of the first light emitting patterns. 如請求項13所述的顯示裝置,其中該共用電極具有一訊號輸入端,該空隙在遠離該訊號輸入端的一處的設置密度大於靠近該訊號輸入端的另一處的設置密度。 The display device according to claim 13, wherein the common electrode has a signal input end, and the arrangement density of the gaps at a place far from the signal input end is greater than that at another place close to the signal input end. 如請求項1所述的顯示裝置,其中該至少一子畫素結構包括一第一子畫素結構及一第二子畫素結構,該第一子畫素結構及該第二子畫素結構分別包括一第一發光圖案及一第二發光圖案,該第一絕緣層的該至少一開口包括分別對應該第一發光圖案及該第二發光圖案的一第一開口及一第二開口,該第一絕緣層的該至少一側壁包括分別定義該第一絕緣層之該第一開口及該第二開口的一第一側壁及一第二側壁,該反射層包括交替堆疊的多個第一折射率子層及多個第二折射率子層,該些第一折射率子層及該些第二折射率子層設置於該第一側壁及該第二側壁上。 The display device as described in claim 1, wherein the at least one sub-pixel structure includes a first sub-pixel structure and a second sub-pixel structure, the first sub-pixel structure and the second sub-pixel structure respectively including a first light emitting pattern and a second light emitting pattern, the at least one opening of the first insulating layer includes a first opening and a second opening respectively corresponding to the first light emitting pattern and the second light emitting pattern, the The at least one sidewall of the first insulating layer includes a first sidewall and a second sidewall respectively defining the first opening and the second opening of the first insulating layer, and the reflective layer includes a plurality of alternately stacked first reflectors An index sublayer and a plurality of second index sublayers, the first index sublayers and the second index sublayers are disposed on the first sidewall and the second sidewall. 如請求項1所述的顯示裝置,其中該至少一子畫素結構包括一第一子畫素結構及一第二子畫素結構,該第一子畫素結構及該第二子畫素結構分別包括一第一發光圖案及一第二發光圖案,該第一絕緣層的該至少一開口包括分別對應於該第一子畫素結構及該第二子畫素結構的一第一開口及一第二開口,該第一絕緣層的該至少一側壁包括分別定義該第一絕緣層之該第一開口及該第二開口的一第一側壁及一第二側壁,該反射層包括:多個第一折射率子層及多個第二折射率子層,交替堆疊,且設置於該第一側壁上;以及多個第三折射率子層及多個第四折射率子層,交替堆疊,且設置於該第二側壁上。 The display device as described in claim 1, wherein the at least one sub-pixel structure includes a first sub-pixel structure and a second sub-pixel structure, the first sub-pixel structure and the second sub-pixel structure respectively including a first light-emitting pattern and a second light-emitting pattern, the at least one opening of the first insulating layer includes a first opening and a first opening respectively corresponding to the first sub-pixel structure and the second sub-pixel structure For the second opening, the at least one side wall of the first insulating layer includes a first side wall and a second side wall respectively defining the first opening and the second opening of the first insulating layer, and the reflective layer includes: a plurality of First refractive index sublayers and multiple second refractive index sublayers are alternately stacked and disposed on the first sidewall; and multiple third refractive index sublayers and multiple fourth refractive index sublayers are alternately stacked, And it is arranged on the second side wall. 如請求項16所述的顯示裝置,其中該第一發光圖案及一第二發光圖案分別用以發出一第一色光及一第二色光,該些第一折射率子層及該些第二折射率子層對該第一色光的反射率高於對該第二色光的反射率。 The display device according to claim 16, wherein the first light emitting pattern and a second light emitting pattern are used to emit a first color light and a second color light respectively, and the first refractive index sublayers and the second light emitting patterns are The reflectivity of the refractive index sublayer to the first color light is higher than the reflectivity to the second color light.
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CN113078180A (en) * 2021-06-07 2021-07-06 苏州华星光电技术有限公司 Display panel and display device

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TW201349482A (en) * 2012-03-30 2013-12-01 Dainippon Printing Co Ltd Color-filter substrate used in organic electroluminescence display, color filter for organic electroluminescence display, and organic electroluminescence display
CN113078180A (en) * 2021-06-07 2021-07-06 苏州华星光电技术有限公司 Display panel and display device

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