TWI784365B - Adhesive composition - Google Patents

Adhesive composition Download PDF

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Publication number
TWI784365B
TWI784365B TW109143611A TW109143611A TWI784365B TW I784365 B TWI784365 B TW I784365B TW 109143611 A TW109143611 A TW 109143611A TW 109143611 A TW109143611 A TW 109143611A TW I784365 B TWI784365 B TW I784365B
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Prior art keywords
adhesive composition
adhesive layer
adhesive
film
laminate
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TW109143611A
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Chinese (zh)
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TW202128929A (en
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片桐航
門間栞
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日商信越聚合物股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/38Layered products comprising a layer of synthetic resin comprising epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J125/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
    • C09J125/02Homopolymers or copolymers of hydrocarbons
    • C09J125/04Homopolymers or copolymers of styrene
    • C09J125/08Copolymers of styrene
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35Heat-activated
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)

Abstract

本發明提供一種黏接劑組成物,具有優異的電特性,且可形成加熱硬化後之密接性(黏接性)優異的黏接劑層,又可改善疊層步驟中之密接性(黏接性),可防止暫時固定、輥對輥時在作業中之層的剝離、浮起。 其係含有含羧基之苯乙烯系彈性體、不含羧基之苯乙烯系彈性體、及環氧樹脂之黏接劑組成物。The present invention provides an adhesive composition which has excellent electrical properties and can form an adhesive layer with excellent adhesiveness (adhesiveness) after heating and hardening, and can improve the adhesiveness (adhesion) in the lamination step. property) to prevent temporary fixation, peeling and floating of the layer during operation during roll-to-roll. It is an adhesive composition containing carboxyl-containing styrene elastomer, carboxyl-free styrene elastomer, and epoxy resin.

Description

黏接劑組成物Adhesive composition

本發明關於黏接劑組成物。詳細而言,關於可使用於電子零件等之黏接用途的黏接劑組成物。The present invention relates to adhesive compositions. Specifically, it relates to an adhesive composition that can be used for bonding electronic parts and the like.

伴隨電子設備之小型化、輕量化等,電子零件等之黏接用途係多樣化,附黏接劑層之疊層體的需求正在增加。 又,係電子零件中之一種的可撓性印刷電路板(以下,亦稱作FPC),需要以高速來處理大量數據,朝高頻率之應對正在進展。FPC欲高頻率化需要構成要素的低介電化,低介電之基材薄膜、低介電之黏接劑的開發正在進行。With the miniaturization and weight reduction of electronic equipment, the application of bonding electronic parts and the like is diversifying, and the demand for laminates with adhesive layers is increasing. In addition, flexible printed circuit boards (hereinafter also referred to as FPCs), which are one of electronic parts, need to process a large amount of data at high speed, and the response to high frequency is progressing. In order to increase the frequency of FPC, the low dielectric of the components is required, and the development of low dielectric base film and low dielectric adhesive is in progress.

但,低介電之黏接劑,因為分子的極性低,所以難以展現與基材薄膜、金屬層、及和電子零件有關聯之其他構成要素的密接性(黏接性),又低介電之基材薄膜亦同樣地會有與黏接劑的密接性(黏接性)差的情況。 因此,為了同時具有良好的電特性(低相對介電常數、及低介電正切),並對應高黏接性的需求,有人提出使用含有含羧基之苯乙烯系彈性體(A)、及環氧樹脂(B)的黏接劑組成物,並提出由該黏接劑組成物構成之黏接劑層與基材薄膜所構成之疊層體(例如,參照專利文獻1)。 [先前技術文獻] [專利文獻]However, low-dielectric adhesives have low molecular polarity, so it is difficult to exhibit adhesion (adhesion) to substrate films, metal layers, and other components related to electronic parts, and low dielectric Similarly, the base film may have poor adhesion (adhesiveness) to the adhesive. Therefore, in order to have good electrical properties (low relative permittivity, and low dielectric tangent) and to meet the needs of high adhesiveness, it was proposed to use carboxyl-containing styrene-based elastomer (A), and ring An adhesive composition of epoxy resin (B), and a laminate composed of an adhesive layer composed of the adhesive composition and a base film has been proposed (for example, refer to Patent Document 1). [Prior Art Literature] [Patent Document]

[專利文獻1]國際公開第2016/017473號[Patent Document 1] International Publication No. 2016/017473

[發明所欲解決之課題][Problem to be Solved by the Invention]

惟,雖然上述專利文獻1之黏接劑組成物會在加熱硬化後展現高的密接性(黏接性),但已知在例如疊層體之製造步驟中,用於加熱時間短的疊層步驟等的時候,會有對基材薄膜、電子零件相關之其他構成要素無法充分黏著的情況。 疊層步驟中,若黏接劑組成物對基材薄膜、電子零件相關之其他構成要素無法充分黏著,則在疊層體之製造中,以熱壓接進行疊層時的暫時固定、輥對輥之作業中,會發生層的剝離、浮起。因此,會產生如下之疊層體的各種瑕疵的情況;發生疊層不良、由於在層間產生之微細的凹凸所致之間隙而在之後的加熱步驟中發生層之膨起。However, although the adhesive composition of the above-mentioned Patent Document 1 exhibits high adhesiveness (adhesiveness) after heating and hardening, it is known that it is used for lamination with a short heating time in, for example, a manufacturing step of a laminate. During steps, etc., it may not be able to adhere sufficiently to the substrate film and other components related to electronic parts. In the lamination step, if the adhesive composition cannot sufficiently adhere to the base film and other components related to electronic parts, in the manufacture of the laminate, thermal compression is used for temporary fixation during lamination, and roller pairs During the operation of the roll, peeling and floating of the layer may occur. Therefore, various flaws in the laminated body may occur such as lamination defects, gaps caused by fine unevenness generated between layers, and swelling of the layers in the subsequent heating step.

因此,本發明之目的為提供一種黏接劑組成物,具有優異的電特性,且可形成加熱硬化後之密接性(黏接性)優異的黏接劑層,又可改善疊層步驟中之密接性(黏接性),可防止暫時固定、輥對輥時在作業中之層的剝離、浮起。 [解決課題之手段]Therefore, the object of the present invention is to provide an adhesive composition that has excellent electrical properties, and can form an adhesive layer with excellent adhesion (adhesiveness) after heating and hardening, and can improve the adhesion in the lamination step. Adhesiveness (adhesiveness) can prevent peeling and floating of layers during temporary fixation and roll-to-roll operation. [Means to solve the problem]

本案發明人們,為了解決上述課題而重複、努力研究,結果發現至少含有含羧基之苯乙烯系彈性體、不含羧基之苯乙烯系彈性體、及環氧樹脂之三種成分的黏接劑組成物,不只在加熱硬化後表現對基材薄膜之高的密接性(黏接性),亦可在疊層步驟中表現對基材薄膜之充分的密接性(黏接性),可解決上述課題,而完成本發明。The inventors of the present case have repeatedly and diligently studied in order to solve the above problems, and as a result, they have found an adhesive composition containing at least three components: a carboxyl-containing styrene-based elastomer, a carboxyl-free styrene-based elastomer, and an epoxy resin. , not only expresses high adhesion (adhesion) to the substrate film after heating and hardening, but also exhibits sufficient adhesion (adhesion) to the substrate film in the lamination step, which can solve the above problems, And complete the present invention.

本發明,亦包含以下態樣者。 [1]一種黏接劑組成物,含有含羧基之苯乙烯系彈性體、不含羧基之苯乙烯系彈性體、及環氧樹脂。 [2]如[1]之黏接劑組成物,其中,相對於黏接劑組成物100質量份,該環氧樹脂之含量為1~20質量份。 [3]如[1]或[2]之黏接劑組成物,其中,相對於該黏接劑組成物100質量份,該含羧基之苯乙烯系彈性體的含量未滿50質量份。 [4]如[1]至[3]中任一項之黏接劑組成物,該環氧樹脂之軟化點或熔點為90℃以下。 [5]如[1]至[4]中任一項之黏接劑組成物,更含有有機過氧化物。 [6]一種黏接劑層,係由如[1]至[5]中任一項之黏接劑組成物構成,該黏接劑層在硬化前於120℃時的儲存彈性模量為5×105 Pa以下。 [7]一種黏接劑層,係由如[1]至[5]中任一項之黏接劑組成物構成,該黏接劑層在硬化後於25℃時的儲存彈性模量為8×107 Pa以上。 [8]一種黏接劑層,以頻率28GHz之條件對由如[1]至[5]中任一項之黏接劑組成物硬化而成之黏接劑層測得之該黏接劑層的相對介電常數為3.5以下,且介電正切為0.01以下。 [9]一種疊層體,具有: 基材薄膜,及 由如[1]至[5]中任一項之黏接劑組成物構成之黏接劑層、或如[6]至[8]中任一項之黏接劑層。 [10]如[9]之疊層體,其中,該基材薄膜含有聚醚醚酮(PEEK)樹脂。 [11]一種附黏接劑層之表覆層薄膜,包含如[9]或[10]之疊層體。 [12]一種覆銅疊層板,包含如[9]或[10]之疊層體。 [13]一種印刷電路板,包含如[9]或[10]之疊層體。 [14]一種屏蔽薄膜,包含如[9]或[10]之疊層體。 [15]一種附屏蔽薄膜之印刷電路板,包含如[9]或[10]之疊層體。 [發明之效果]The present invention also includes the following aspects. [1] An adhesive composition comprising a carboxyl-containing styrene-based elastomer, a carboxyl-free styrene-based elastomer, and an epoxy resin. [2] The adhesive composition according to [1], wherein the content of the epoxy resin is 1 to 20 parts by mass based on 100 parts by mass of the adhesive composition. [3] The adhesive composition according to [1] or [2], wherein the content of the carboxyl group-containing styrene-based elastomer is less than 50 parts by mass based on 100 parts by mass of the adhesive composition. [4] The adhesive composition according to any one of [1] to [3], wherein the epoxy resin has a softening point or a melting point of 90°C or lower. [5] The adhesive composition according to any one of [1] to [4], which further contains an organic peroxide. [6] An adhesive layer comprising the adhesive composition according to any one of [1] to [5], the adhesive layer has a storage elastic modulus of 5 at 120°C before hardening ×10 5 Pa or less. [7] An adhesive layer consisting of the adhesive composition according to any one of [1] to [5], the adhesive layer has a storage elastic modulus of 8 at 25°C after hardening ×10 7 Pa or more. [8] An adhesive layer, measured at a frequency of 28 GHz on an adhesive layer formed by hardening the adhesive composition as described in any one of [1] to [5] The relative permittivity is 3.5 or less, and the dielectric tangent is 0.01 or less. [9] A laminate comprising: a base film, and an adhesive layer composed of the adhesive composition according to any one of [1] to [5], or any one of [6] to [8] Any one of the adhesive layers. [10] The laminate according to [9], wherein the base film contains a polyetheretherketone (PEEK) resin. [11] A cover layer film with an adhesive layer, comprising the laminate according to [9] or [10]. [12] A copper-clad laminate comprising the laminate according to [9] or [10]. [13] A printed circuit board comprising the laminate of [9] or [10]. [14] A shielding film comprising the laminate according to [9] or [10]. [15] A printed circuit board with a shielding film, comprising the laminate of [9] or [10]. [Effect of Invention]

根據本發明,可提供一種黏接劑組成物,具有優異的電特性,且可形成加熱硬化後之密接性(黏接性)優異的黏接劑層,又可改善疊層步驟中之密接性(黏接性),可防止暫時固定、輥對輥時在作業中之層的剝離、浮起。According to the present invention, it is possible to provide an adhesive composition which has excellent electrical characteristics and which can form an adhesive layer having excellent adhesiveness (adhesiveness) after heating and hardening, and which can also improve the adhesiveness in the lamination step. (Adhesiveness) can prevent temporary fixation, peeling and floating of layers during operation during roll-to-roll.

以下,針對本發明之黏接劑組成物、包含由該黏接劑組成物構成之黏接劑層的疊層體、及包含該疊層體之電子零件相關的構成構件進行詳細說明,但以下之構成要件的說明,係作為本發明之一實施態樣中的一例,並不特定於這些內容。Hereinafter, the adhesive composition of the present invention, a laminate including an adhesive layer composed of the adhesive composition, and components related to electronic components including the laminate will be described in detail, but the following The description of the constituent elements is an example of one embodiment of the present invention, and is not limited to these contents.

(黏接劑組成物) 本發明之黏接劑組成物,含有含羧基之苯乙烯系彈性體、不含羧基之苯乙烯系彈性體、及環氧樹脂。本發明之黏接劑組成物,視需要,亦可含有其他成分。(adhesive composition) The adhesive composition of the present invention contains carboxyl-containing styrene elastomer, carboxyl-free styrene elastomer, and epoxy resin. The adhesive composition of the present invention may contain other components as necessary.

<含羧基之苯乙烯系彈性體> 含羧基之苯乙烯系彈性體,除了作為賦予黏接性、硬化物之柔軟性的成分以外,作為賦予電特性的成分亦有效。 若在黏接劑組成物中含有含羧基之苯乙烯系彈性體,即便為電特性良好而極性低的基材薄膜,由於柔軟的黏接劑組成物仍能充分地隨附於基材薄膜的表面,因而能展現與極性低的骨架的密接性,即便為金屬層,因為極性高的羧基能展現密接性,所以黏接劑層的密接性會改善。又,因為含羧基之苯乙烯系彈性體具有反應性,藉由環氧硬化,黏接劑層的耐熱性、耐藥品性亦改善。 所謂含羧基之苯乙烯系彈性體,係指將以共軛二烯化合物與芳香族乙烯基化合物的嵌段及無規結構作為主體的共聚物、以及其氫化物,以不飽和羧酸予以改性所成者。 就芳香族乙烯基化合物而言,可列舉如苯乙烯、第三丁基苯乙烯、α-甲基苯乙烯、二乙烯苯、1,1-二苯基乙烯、N,N-二乙基-對-胺基乙基苯乙烯、乙烯基甲苯等。又,就共軛二烯化合物而言,可列舉如丁二烯、異戊二烯、1,3-戊二烯、2,3-二甲基-1,3-丁二烯等。<Styrene-based elastomers containing carboxyl groups> The carboxyl group-containing styrene-based elastomer is also effective as a component that imparts electrical characteristics in addition to adhesiveness and flexibility of the cured product. If the adhesive composition contains a carboxyl group-containing styrene-based elastomer, even a base film with good electrical characteristics and low polarity, the soft adhesive composition can still fully adhere to the substrate film. The surface, therefore, can exhibit adhesion to the low-polarity skeleton, even if it is a metal layer, because the highly polar carboxyl group can exhibit adhesion, so the adhesion of the adhesive layer will be improved. Also, since the carboxyl group-containing styrene-based elastomer is reactive, the heat resistance and chemical resistance of the adhesive layer are also improved by epoxy curing. The so-called carboxyl-containing styrene-based elastomers refer to copolymers with block and random structures of conjugated diene compounds and aromatic vinyl compounds as the main body, and their hydrogenated products, which are modified with unsaturated carboxylic acids. made by sex. In terms of aromatic vinyl compounds, examples include styrene, tert-butylstyrene, α-methylstyrene, divinylbenzene, 1,1-diphenylethylene, N,N-diethyl- p-Aminoethylstyrene, vinyltoluene, etc. Moreover, examples of the conjugated diene compound include butadiene, isoprene, 1,3-pentadiene, 2,3-dimethyl-1,3-butadiene, and the like.

含羧基之苯乙烯系彈性體的改性可藉由例如在苯乙烯系彈性體之聚合時,使不飽和羧酸與其進行共聚合來實施。又,可藉由將苯乙烯系彈性體與不飽和羧酸在有機過氧化物的存在下進行加熱、混練來實施。 就不飽和羧酸而言,可列舉如丙烯酸、甲基丙烯酸、馬來酸、衣康酸、富馬酸、馬來酸酐、衣康酸酐等。 利用不飽和羧酸所為之改性量,為0.1~10質量%較為理想。 含羧基之苯乙烯系彈性體的酸價,為0.1~30mg KOH/g較為理想,為0.5~25mg KOH/g更為理想。若此酸價為0.1mg KOH/g以上,則黏接劑組成物的硬化係充分,可獲得良好的黏接性、及耐熱性。另一方面,若上述酸價為25mg KOH/g以下,則因為黏接劑組成物的凝聚力被抑制,所以黏著性優異、電特性亦優異。The modification of the carboxyl group-containing styrene-based elastomer can be carried out, for example, by copolymerizing an unsaturated carboxylic acid with the styrene-based elastomer during polymerization. Moreover, it can implement by heating and kneading a styrene-type elastomer and an unsaturated carboxylic acid in presence of an organic peroxide. Examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, maleic anhydride, and itaconic anhydride. The amount of modification by unsaturated carboxylic acid is preferably 0.1 to 10% by mass. The acid value of the carboxyl group-containing styrene-based elastomer is preferably 0.1 to 30 mg KOH/g, more preferably 0.5 to 25 mg KOH/g. When the acid value is 0.1 mg KOH/g or more, the curing system of the adhesive composition is sufficient, and good adhesiveness and heat resistance can be obtained. On the other hand, if the above-mentioned acid value is 25 mg KOH/g or less, since the cohesive force of the adhesive composition is suppressed, the adhesion is excellent and the electrical characteristics are also excellent.

又,含羧基之苯乙烯系彈性體的重量平均分子量,為1~50萬較為理想,為3~30萬更為理想,為5~20萬更甚理想。若重量平均分子量為上述下限以上,則可展現優異的黏接性,且溶解於溶劑中並進行塗覆時的塗覆性也會變好。若重量平均分子量為上述上限以下,則與環氧樹脂的相容性會變好。 重量平均分子量,係將利用凝膠滲透層析法(以下,亦稱作「GPC」)測得之分子量以聚苯乙烯換算所得之數值。Furthermore, the weight average molecular weight of the carboxyl group-containing styrene-based elastomer is preferably 1 to 500,000, more preferably 30,000 to 300,000, and even more preferably 50,000 to 200,000. When the weight average molecular weight is more than the above-mentioned lower limit, excellent adhesiveness can be exhibited, and the coating property at the time of being melt|dissolved in a solvent and applying also becomes favorable. The compatibility with an epoxy resin will become favorable that a weight average molecular weight is below the said upper limit. The weight average molecular weight is a numerical value obtained by converting the molecular weight measured by gel permeation chromatography (hereinafter also referred to as "GPC") in terms of polystyrene.

就含羧基之苯乙烯系彈性體的具體例而言,可列舉如將苯乙烯-丁二烯嵌段共聚物、苯乙烯-乙烯丙烯嵌段共聚物、苯乙烯-丁二烯-苯乙烯嵌段共聚物、苯乙烯-異戊二烯-苯乙烯嵌段共聚物、苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物、及苯乙烯-乙烯丙烯-苯乙烯嵌段共聚物等,以不飽和羧酸予以改性所成者。 這些含羧基之苯乙烯系彈性體可僅使用一種,亦可將兩種以上予以併用。上述共聚物之中,考量黏接性及電特性的觀點,為苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物及苯乙烯-乙烯丙烯-苯乙烯嵌段共聚物較為理想。又,苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物中之苯乙烯/乙烯丁烯的質量比、及苯乙烯-乙烯丙烯-苯乙烯嵌段共聚物中之苯乙烯/乙烯丙烯的質量比,為10/90~50/50較為理想,為20/80~40/60更為理想。若該質量比落在此範圍內,則可獲得具有優異的黏接特性的黏接劑組成物。Specific examples of carboxyl-containing styrene-based elastomers include styrene-butadiene block copolymers, styrene-ethylene-propylene block copolymers, styrene-butadiene-styrene Segment copolymers, styrene-isoprene-styrene block copolymers, styrene-ethylene-butylene-styrene block copolymers, and styrene-ethylene-propylene-styrene block copolymers, etc. Modification of saturated carboxylic acid. These carboxyl group-containing styrene-based elastomers may be used alone or in combination of two or more. Among the above-mentioned copolymers, styrene-ethylene-butylene-styrene block copolymers and styrene-ethylene-propylene-styrene block copolymers are preferable from the viewpoint of adhesiveness and electrical characteristics. Also, the mass ratio of styrene/ethylene butene in the styrene-ethylene-butylene-styrene block copolymer, and the mass ratio of styrene/ethylene-propylene in the styrene-ethylene-propylene-styrene block copolymer , 10/90-50/50 is more ideal, and 20/80-40/60 is more ideal. If the mass ratio falls within this range, an adhesive composition with excellent adhesive properties can be obtained.

相對於黏接劑組成物之固體成分100質量份,含羧基之苯乙烯系彈性體的含量未滿50質量份較為理想。若含羧基之苯乙烯系彈性體的含量太多,則會無法達成疊層步驟中之密接性(黏著性)的改善。The content of the carboxyl group-containing styrene-based elastomer is preferably less than 50 parts by mass relative to 100 parts by mass of the solid content of the adhesive composition. If the content of the carboxyl group-containing styrene-based elastomer is too large, it will not be possible to improve the adhesion (adhesion) in the lamination step.

<不含羧基之苯乙烯系彈性體> 相較於上述含羧基之苯乙烯系彈性體,不含羧基之苯乙烯系彈性體因應沒有羧基的相互作用而凝聚力小,在比玻璃轉移點更高溫的範圍內的彈性模量低。因此,藉由在黏接劑組成物中含有不含羧基之苯乙烯系彈性體,可使黏接劑層的密接性改善,尤其是可達成在疊層步驟中之密接性(黏著性)的改善。 所謂不含羧基之苯乙烯系彈性體,係指將共軛二烯化合物與芳香族乙烯基化合物的嵌段及無規結構作為主體的共聚物、以及其氫化物。此彈性體,不以不飽和羧酸進行改性。 就構成苯乙烯系彈性體之芳香族乙烯基化合物、共軛二烯化合物的種類、或苯乙烯系彈性體的具體例而言,係如上述<含羧基之苯乙烯系彈性體>中所述。<Carboxyl-free styrene-based elastomer> Compared with the aforementioned carboxyl-containing styrene-based elastomers, carboxyl-free styrene-based elastomers have low cohesive force due to the absence of carboxyl-group interactions, and have a low elastic modulus at temperatures higher than the glass transition point. Therefore, by including a carboxyl-free styrene-based elastomer in the adhesive composition, the adhesiveness of the adhesive layer can be improved, especially the adhesiveness (adhesion) in the lamination step can be achieved. improve. The term "carboxyl-free styrene-based elastomer" refers to copolymers mainly composed of block and random structures of conjugated diene compounds and aromatic vinyl compounds, and hydrogenated products thereof. This elastomer is not modified with unsaturated carboxylic acid. The types of aromatic vinyl compounds and conjugated diene compounds constituting styrene-based elastomers, and specific examples of styrene-based elastomers are as described above in <Carboxyl-containing styrene-based elastomers> .

相對於黏接劑組成物的固體成分100質量份,不含羧基之苯乙烯系彈性體的含量為30質量份~70質量份較為理想。若不含羧基之苯乙烯系彈性體的含量為上述下限值以上,則在疊層中的密接性(黏著性)會改善。另一方面,若為上述上限值以下,則可充分地摻合待硬化之成分,且可確保耐熱性。The content of the carboxyl-free styrene-based elastomer is preferably 30 to 70 parts by mass with respect to 100 parts by mass of the solid content of the adhesive composition. Adhesiveness (adhesiveness) in lamination will improve that content of the styrene-type elastomer which does not contain a carboxyl group is more than the said lower limit. On the other hand, if it is below the said upper limit, the component to harden|cure can fully be blended, and heat resistance can be ensured.

<環氧樹脂> 環氧樹脂,係與上述含羧基之苯乙烯系彈性體中之羧基進行反應,並展現對被黏物之高黏接性、黏接劑硬化物之耐熱性的成分。<Epoxy resin> Epoxy resin is a component that reacts with the carboxyl group in the above-mentioned carboxyl group-containing styrene-based elastomer, and exhibits high adhesiveness to the adherend and heat resistance of the cured adhesive.

就環氧樹脂之例子而言,可列舉如雙酚A型環氧樹脂、雙酚F型環氧樹脂、或將它們予以氫化所成者;鄰苯二甲酸二縮水甘油酯、間苯二甲酸二縮水甘油酯、對苯二甲酸二縮水甘油酯、對羥基苯甲酸縮水甘油酯、四氫鄰苯二甲酸二縮水甘油酯、琥珀酸二縮水甘油酯、己二酸二縮水甘油酯、癸二酸二縮水甘油酯、偏苯三甲酸三縮水甘油酯等縮水甘油酯系環氧樹脂;乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、1,4-丁二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚、三羥甲基丙烷三縮水甘油醚、新戊四醇四縮水甘油醚、四苯基縮水甘油醚乙烷、三苯基縮水甘油醚乙烷、山梨醇之多縮水甘油醚、聚甘油之多縮水甘油醚等縮水甘油醚系環氧樹脂;異氰尿酸三縮水甘油酯、四縮水甘油基二胺基二苯甲烷等縮水甘油胺系環氧樹脂;環氧化聚丁二烯、環氧化大豆油等線狀脂肪族環氧樹脂等,但不限定於這些。又,亦可使用含有二甲苯結構之酚醛清漆環氧樹脂、萘酚酚醛清漆型環氧樹脂、苯酚酚醛清漆環氧樹脂、鄰甲酚酚醛清漆環氧樹脂、雙酚A酚醛清漆環氧樹脂等酚醛清漆型環氧樹脂。In terms of examples of epoxy resins, such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, or those obtained by hydrogenating them; diglycidyl phthalate, isophthalic acid Diglycidyl Ester, Diglycidyl Terephthalate, Glycidyl Paraben, Diglycidyl Tetrahydrophthalate, Diglycidyl Succinate, Diglycidyl Adipate, Sebis glycidyl acid diglycidyl ester, trimellitic acid triglycidyl ester and other glycidyl ester epoxy resins; ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, 1 ,6-Hexanediol diglycidyl ether, trimethylolpropane triglycidyl ether, neopentylthritol tetraglycidyl ether, tetraphenyl glycidyl ether ethane, triphenyl glycidyl ether ethane, sorbitol Glycidyl ether-based epoxy resins such as polyglycidyl ether and polyglycidyl ether of polyglycerol; glycidylamine-based epoxy resins such as triglycidyl isocyanurate and tetraglycidyl diaminodiphenylmethane; Linear aliphatic epoxy resins such as oxidized polybutadiene and epoxidized soybean oil, etc., but are not limited to these. In addition, novolac epoxy resins containing xylene structures, naphthol novolac epoxy resins, phenol novolak epoxy resins, o-cresol novolak epoxy resins, bisphenol A novolac epoxy resins, etc. can also be used. Novolak type epoxy resin.

又,就環氧樹脂之例子而言,可使用溴化雙酚A型環氧樹脂、含磷環氧樹脂、含氟環氧樹脂、含二環戊二烯骨架之環氧樹脂、含萘骨架之環氧樹脂、蒽型環氧樹脂、第三丁基鄰苯二酚型環氧樹脂、三聯苯甲烷型環氧樹脂、四苯基乙烷型環氧樹脂、聯苯型環氧樹脂、雙酚S型環氧樹脂等。這些環氧樹脂可僅使用1種,亦可併用2種以上。 上述環氧樹脂中,考量能獲得電特性優異的黏接劑組成物,且與苯乙烯系彈性體的相容性良好之觀點,不具有羥基之環氧樹脂較為理想。尤其,酚醛清漆環氧樹脂、如下列結構之環氧樹脂,因為係具有適當柔軟的骨架的環氧樹脂,所以不容易引起硬化物之脆性破壊,對於黏接劑組成物之硬化物之長期使用之性能的安定性會改善,也因為官能基數量高,所以耐熱性亦改善,因此更為理想。Also, as examples of epoxy resins, brominated bisphenol A type epoxy resins, phosphorus-containing epoxy resins, fluorine-containing epoxy resins, dicyclopentadiene-skeleton-containing epoxy resins, naphthalene-skeleton-containing Epoxy resins, anthracene epoxy resins, tertiary catechol epoxy resins, terphenylmethane epoxy resins, tetraphenylethane epoxy resins, biphenyl epoxy resins, biphenyl epoxy resins, Phenol S-type epoxy resin, etc. These epoxy resins may use only 1 type, and may use 2 or more types together. Among the above-mentioned epoxy resins, an epoxy resin not having a hydroxyl group is preferable in view of obtaining an adhesive composition having excellent electrical properties and having good compatibility with styrene-based elastomers. In particular, novolac epoxy resins, such as epoxy resins with the following structure, are epoxy resins with a suitable soft skeleton, so they are not easy to cause brittle fracture of the hardened product. For long-term use of the hardened product of the adhesive composition The stability of the performance will be improved, and because the number of functional groups is high, the heat resistance will also be improved, so it is more ideal.

[化1]

Figure 02_image001
R為包含亞甲基-芳基-亞甲基的結構、或包含碳數為6以上之脂肪族烴結構的結構,就芳基而言,可列舉如苯、二甲苯、萘、聯苯等,就脂肪族烴而言,可列舉如己烷、二甲基環己烷、二環戊二烯等。 就酚醛清漆型之環氧樹脂的具體例而言,可列舉如三菱化學(股)公司製脂「YX7700」(含二甲苯結構之酚醛清漆型環氧樹脂)、日本化藥(股)公司製之「NC7000L」(萘酚酚醛清漆型環氧樹脂)、新日鐵住金化學(股)公司製之「ESN485」(萘酚酚醛清漆型環氧樹脂)、DIC(股)公司製之「N-690」(甲酚酚醛清漆型環氧樹脂)、DIC(股)公司製之「N-695」(甲酚酚醛清漆型環氧樹脂)等。[chemical 1]
Figure 02_image001
R is a structure containing methylene-aryl-methylene, or a structure containing an aliphatic hydrocarbon structure with a carbon number of 6 or more. Examples of the aryl group include benzene, xylene, naphthalene, biphenyl, etc. , As for aliphatic hydrocarbons, for example, hexane, dimethylcyclohexane, dicyclopentadiene and the like can be cited. Specific examples of novolac-type epoxy resins include Mitsubishi Chemical Co., Ltd. resin "YX7700" (a novolak-type epoxy resin containing a xylene structure), Nippon Kayaku Co., Ltd. "NC7000L" (naphthol novolac epoxy resin), "ESN485" (naphthol novolac epoxy resin) manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., "N- 690" (cresol novolak-type epoxy resin), "N-695" (cresol novolac-type epoxy resin) manufactured by DIC Co., Ltd., and the like.

又,具有胺基之環氧樹脂,因為藉由胺基之觸媒作用而可縮短硬化時間、或下降硬化溫度,所以可使作業性改善。又,因為含有胺基所以與金屬層的密接性改善。 尤其若環氧樹脂為縮水甘油胺型環氧樹脂更為理想。因為縮水甘油胺型環氧樹脂係多官能,所以能以少量進行硬化,又因為分子骨架中含有胺,所以與含胺基之苯乙烯系彈性體的相容性良好,且亦有反應促進之效果。又,因為含有胺基所以與金屬層的密接性改善。 就縮水甘油胺型之環氧樹脂的具體例而言,例如就四縮水甘油基二胺基二苯甲烷而言,可列舉如三菱化學(股)公司製之「jER604」、住友化學(股)公司製之「SUMI-EPOXY ELM434」、Huntsman Advanced Materials(股)公司製之「Araldite MY720」、「Araldite MY721」、「Araldite MY9512」、「Araldite MY9612」、「Araldite MY9634」、「Araldite MY9663」、三菱瓦斯化學(股)公司製之「TETRAD-X」、「TETRAD-C」等。In addition, the epoxy resin having amine groups can shorten the curing time or lower the curing temperature due to the catalytic action of the amine groups, so that the workability can be improved. Moreover, since it contains an amine group, the adhesiveness with a metal layer improves. In particular, it is more desirable if the epoxy resin is a glycidylamine type epoxy resin. Because the glycidyl amine type epoxy resin is multifunctional, it can be cured in a small amount, and because the molecular skeleton contains amine, it has good compatibility with amine-containing styrene-based elastomers, and it also has the effect of accelerating the reaction. Effect. Moreover, since it contains an amine group, the adhesiveness with a metal layer improves. Specific examples of glycidylamine-type epoxy resins include, for example, tetraglycidyldiaminodiphenylmethane, "jER604" manufactured by Mitsubishi Chemical Co., Ltd., Sumitomo Chemical Co., Ltd. "SUMI-EPOXY ELM434" manufactured by a company, "Araldite MY720", "Araldite MY721", "Araldite MY9512", "Araldite MY9612", "Araldite MY9634", "Araldite MY9663" manufactured by Huntsman Advanced Materials Co., Ltd. "TETRAD-X" and "TETRAD-C" manufactured by Gas Chemical Co., Ltd.

就本發明中使用之環氧樹脂而言,為一分子中具有兩個以上的環氧基者較為理想。因為能藉由與含羧基之苯乙烯系彈性體的反應來形成交聯結構,而展現高的耐熱性。又,使用環氧基為兩個以上之環氧樹脂時,與含羧基之苯乙烯系彈性體的交聯度係充分,可獲得充分的耐熱性。The epoxy resin used in the present invention preferably has two or more epoxy groups in one molecule. Because it can form a cross-linked structure by reacting with carboxyl-containing styrene-based elastomers, it exhibits high heat resistance. Also, when an epoxy resin having two or more epoxy groups is used, the degree of crosslinking with the carboxyl group-containing styrene-based elastomer is sufficient, and sufficient heat resistance can be obtained.

相對於黏接劑組成物之固體成分100質量份,上述環氧樹脂之含量為1~20質量份較為理想。若上述環氧樹脂之含量為上述下限值以上,則黏接劑組成物可充分硬化,並保證良好的耐熱性、耐藥品性。另一方面,因為環氧樹脂的含量太多的話密接性會降低,所以若為上述上限值以下,則可保證良好的密接性。若環氧樹脂的含量太多,則會無法達成在疊層步驟中之密接性(黏著性)的改善。The content of the epoxy resin is preferably 1 to 20 parts by mass with respect to 100 parts by mass of the solid content of the adhesive composition. If the content of the above-mentioned epoxy resin is more than the above-mentioned lower limit, the adhesive composition can be fully cured, and good heat resistance and chemical resistance can be ensured. On the other hand, since adhesiveness will fall when there is too much content of an epoxy resin, favorable adhesiveness can be securable if it is below the said upper limit. If the content of the epoxy resin is too large, the improvement of the adhesion (adhesion) in the lamination step cannot be achieved.

上述環氧樹脂之軟化點或熔點,為90℃以下較為理想。若環氧樹脂之軟化點或熔點為90℃以下,則可使硬化前之黏接劑組成物在高溫領域的彈性模量下降,並使硬化後之黏接劑組成物在常溫領域(室溫)的彈性模量上昇。The softening point or melting point of the above-mentioned epoxy resin is preferably below 90°C. If the softening point or melting point of the epoxy resin is below 90°C, the elastic modulus of the adhesive composition before hardening can be reduced in the high temperature range, and the adhesive composition after hardening can be reduced in the normal temperature range (room temperature) ) modulus of elasticity increases.

<其他成分> 黏接劑組成物中,除了含有上述含羧基之苯乙烯系彈性體、不含羧基之苯乙烯系彈性體、及環氧樹脂以外,能以不對黏接劑組成物之功能造成影響的程度含有含羧基之苯乙烯系彈性體及不含羧基之苯乙烯系彈性體以外的其他熱塑性樹脂、賦黏劑、阻燃劑、硬化劑、硬化促進劑、偶聯劑、抗熱老化劑、勻塗劑、消泡劑、無機填充劑、顔料、及溶劑等。<Other ingredients> In the adhesive composition, in addition to the above-mentioned carboxyl-containing styrene-based elastomer, carboxyl-free styrene-based elastomer, and epoxy resin, it can be contained in an amount that does not affect the function of the adhesive composition. Carboxyl-containing styrene-based elastomers and other thermoplastic resins other than carboxyl-free styrene-based elastomers, tackifiers, flame retardants, hardeners, hardening accelerators, coupling agents, heat-resistant aging agents, leveling Agents, defoamers, inorganic fillers, pigments, and solvents.

就含有其他成分之黏接劑組成物的更理想的實施態樣而言,可列舉如含有有機過氧化物的黏接劑組成物。藉此,不含羧基之苯乙烯系彈性體亦可交聯,可更改善黏接劑層之耐熱性、耐藥品性。 就有機過氧化物而言,可使用一般作為自由基聚合起始劑而習知者,可列舉如過氧化苯甲醯、過氧化月桂醯、過氧化新戊酸第三丁酯、過氧化乙基己酸第三丁酯、1,1’-雙-(第三丁基過氧基)環己烷、過氧化-2-乙基己酸三級戊酯、過氧化-2-乙基己酸三級己酯等有機過氧化物。A more desirable embodiment of the adhesive composition containing other components includes, for example, an adhesive composition containing an organic peroxide. Thereby, the styrene-based elastomer without carboxyl group can also be cross-linked, which can further improve the heat resistance and chemical resistance of the adhesive layer. As far as organic peroxides are concerned, those generally known as radical polymerization initiators can be used, such as benzoyl peroxide, lauryl peroxide, tert-butyl peroxypivalate, ethyl peroxide, etc. tert-butyl hexanoate, 1,1'-bis-(tert-butylperoxy)cyclohexane, tertiary pentyl peroxy-2-ethylhexanoate, 2-ethylhexyl peroxide Organic peroxides such as tertiary hexyl ester.

上述其他成分之中,就上述其他熱塑性樹脂而言,可列舉如苯氧基樹脂、聚醯胺樹脂、聚酯樹脂、聚碳酸酯樹脂、聚伸苯基氧化樹脂、聚胺甲酸酯樹脂、聚縮醛樹脂、聚伸乙基(polyethylene)系樹脂、聚丙烯系樹脂及聚乙烯(polyvinyl)系樹脂等。這些熱塑性樹脂可單獨使用,亦可併用兩種以上。Among the above-mentioned other components, the above-mentioned other thermoplastic resins include, for example, phenoxy resins, polyamide resins, polyester resins, polycarbonate resins, polyphenylene oxide resins, polyurethane resins, Polyacetal resins, polyethylene-based resins, polypropylene-based resins, polyvinyl-based resins, and the like. These thermoplastic resins may be used alone or in combination of two or more.

就上述賦黏劑而言,可列舉如香豆酮-茚樹脂、萜烯樹脂、萜烯-酚醛樹脂、松香樹脂、對-第三丁基苯酚-乙炔樹脂、苯酚-甲醛樹脂、二甲苯-甲醛樹脂、石油系烴樹脂、氫化烴樹脂、松脂系樹脂等。這些賦黏劑可單獨使用,亦可併用兩種以上。In terms of the above-mentioned tackifiers, for example, coumarone-indene resins, terpene resins, terpene-phenolic resins, rosin resins, p-tert-butylphenol-acetylene resins, phenol-formaldehyde resins, xylene- Formaldehyde resin, petroleum-based hydrocarbon resin, hydrogenated hydrocarbon resin, turpentine-based resin, etc. These tackifiers may be used alone or in combination of two or more.

上述阻燃劑,可為有機系阻燃劑及無機系阻燃劑中之任意者。就有機系阻燃劑而言,可列舉如磷酸三聚氰胺、聚磷酸三聚氰胺、磷酸胍、聚磷酸胍、磷酸銨、聚磷酸銨、磷醯胺銨、聚磷醯胺銨、磷酸胺甲酸酯、聚磷酸胺甲酸酯、參(二乙基次膦酸)鋁、參(甲基乙基次膦酸)鋁、參(二苯基次膦酸)鋁、雙(二乙基次膦酸)鋅、雙(甲基乙基次膦酸)鋅、雙(二苯基次膦酸)鋅、雙(二乙基次膦酸)氧鈦、肆(二乙基次膦酸)鈦、雙(甲基乙基次膦酸)氧鈦、肆(甲基乙基次膦酸)鈦、雙(二苯基次膦酸)氧鈦、肆(二苯基次膦酸)鈦等磷系阻燃劑;三聚氰胺、蜜白胺、三聚氰胺氰尿酸酯等三𠯤系化合物、三聚氰酸化合物、異三聚氰酸化合物、三唑系化合物、四唑化合物、重氮化合物、尿素等氮系阻燃劑;聚矽氧化合物、矽烷化合物等矽系阻燃劑等。又,就無機系阻燃劑而言,可列舉如氫氧化鋁、氫氧化鎂、氫氧化鋯、氫氧化鋇、氫氧化鈣等金屬氫氧化物;氧化錫、氧化鋁、氧化鎂、氧化鋯、氧化鋅、氧化鉬、氧化鎳等金屬氧化物;碳酸鋅、碳酸鎂、碳酸鋇、硼酸鋅、水合玻璃等。可將這些阻燃劑中之兩種以上予以併用。The above-mentioned flame retardant may be any of organic flame retardants and inorganic flame retardants. Examples of organic flame retardants include melamine phosphate, melamine polyphosphate, guanidine phosphate, guanidine polyphosphate, ammonium phosphate, ammonium polyphosphate, ammonium phosphatamide, ammonium polyphosphate amide, urethane formate, Polyphosphate urethane formate, ginseng (diethylphosphinate) aluminum, ginseng (methylethylphosphinate) aluminum, ginseng (diphenylphosphinate) aluminum, bis(diethylphosphinate) Zinc, bis(methylethylphosphinate)zinc, bis(diphenylphosphinate)zinc, bis(diethylphosphinate)oxytitanium, tetrakis(diethylphosphinate)titanium, bis( Phosphorous flame retardants such as methyl ethyl phosphinate) oxytitanium, tetrakis (methylethyl phosphinate) titanium, bis(diphenylphosphinate) oxytitanium, tetrakis (diphenylphosphinate) titanium, etc. Nitrogen series compounds such as melamine, melam, melamine cyanurate, etc., cyanuric acid compounds, isocyanuric acid compounds, triazole compounds, tetrazole compounds, diazo compounds, urea, etc. Flame retardants; silicon-based flame retardants such as polysiloxane compounds and silane compounds. In addition, in terms of inorganic flame retardants, metal hydroxides such as aluminum hydroxide, magnesium hydroxide, zirconium hydroxide, barium hydroxide, calcium hydroxide; tin oxide, aluminum oxide, magnesium oxide, zirconium oxide, etc. , zinc oxide, molybdenum oxide, nickel oxide and other metal oxides; zinc carbonate, magnesium carbonate, barium carbonate, zinc borate, hydrated glass, etc. Two or more of these flame retardants may be used in combination.

就上述硬化劑而言,可列舉如胺系硬化劑、酸酐系硬化劑等,但不限定於這些。就胺系硬化劑而言,可列舉如甲基化三聚氰胺樹脂、丁基化三聚氰胺樹脂、苯胍胺樹脂等三聚氰胺樹脂、二氰二胺、4,4’-二苯基二胺基碸等。又,就酸酐而言,可列舉如芳香族系酸酐、及脂肪族系酸酐。這些硬化劑可單獨使用,亦可將兩種以上予以併用。 相對於黏接劑組成物100質量份,硬化劑之含量為0.5~100質量份較為理想,為5~70質量份更為理想。Examples of the curing agent include amine-based curing agents and acid anhydride-based curing agents, but are not limited thereto. Examples of the amine-based curing agent include melamine resins such as methylated melamine resins, butylated melamine resins, and benzoguanamine resins, dicyandiamine, and 4,4'-diphenyldiaminosulfone. Moreover, as an acid anhydride, an aromatic acid anhydride and an aliphatic acid anhydride are mentioned, for example. These curing agents may be used alone or in combination of two or more. The content of the curing agent is preferably 0.5 to 100 parts by mass, more preferably 5 to 70 parts by mass, relative to 100 parts by mass of the adhesive composition.

上述硬化促進劑,係為了促進含羧基之苯乙烯系彈性體與環氧樹脂的反應而使用,可使用第三級胺系硬化促進劑、第三級銨鹽系硬化促進劑及咪唑系硬化促進劑等。The above-mentioned hardening accelerators are used to accelerate the reaction between carboxyl-containing styrene-based elastomers and epoxy resins. Tertiary amine-based hardening accelerators, third-level ammonium salt-based hardening accelerators, and imidazole-based hardening accelerators can be used. agent etc.

就第三級胺系硬化促進劑而言,可列舉如苄基二甲基胺、2-(二甲胺基甲基)苯酚、2,4,6-參(二甲胺基甲基)苯酚、四甲基胍、三乙醇胺、N,N’-二甲基哌𠯤、三伸乙二胺、1,8-二氮雜雙環[5.4.0]十一碳烯等。As for the tertiary amine hardening accelerator, examples include benzyldimethylamine, 2-(dimethylaminomethyl)phenol, 2,4,6-paraffin(dimethylaminomethyl)phenol , tetramethylguanidine, triethanolamine, N,N'-dimethylpiperone, triethylenediamine, 1,8-diazabicyclo[5.4.0]undecene, etc.

就第三級銨鹽系硬化促進劑而言,可列舉如1,8-二氮雜雙環[5.4.0]十一碳烯之甲酸鹽、辛酸鹽、對甲苯磺酸鹽、鄰苯二甲酸鹽、苯酚鹽或苯酚酚醛清漆樹脂鹽、1,5-二氮雜雙環[4.3.0]壬烯之甲酸鹽、辛酸鹽、對甲苯磺酸鹽、鄰苯二甲酸鹽、苯酚鹽或苯酚酚醛清漆樹脂鹽等。As for the tertiary ammonium salt-based hardening accelerator, formate, octanoate, p-toluenesulfonate, phthalate, 1,8-diazabicyclo[5.4.0]undecene Formate, phenate or phenol novolac resin salt, 1,5-diazabicyclo[4.3.0]nonene formate, octanoate, p-toluenesulfonate, phthalate, phenol Salt or phenol novolak resin salt etc.

就咪唑系硬化促進劑而言,可列舉如2-甲基咪唑、2-十一烷基咪唑、2-十七烷基咪唑、1,2-二甲基咪唑、2-甲基-4-乙基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]乙基-s-三𠯤、2,4-二胺基-6-[2’-十一烷基咪唑基-(1’)]乙基-s-三𠯤、2,4-二胺基-6-[2’-乙基-4’-甲基咪唑基-(1’)]乙基-s-三𠯤、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]乙基-s-三𠯤異三聚氰酸加成物、2-苯基咪唑異三聚氰酸加成物、2-苯基-4,5-二羥甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑等。這些硬化促進劑可單獨使用,亦可將兩種以上予以併用。Examples of imidazole-based hardening accelerators include 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-methyl-4- Ethylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 2,4-diamino -6-[2'-methylimidazolyl-(1')]ethyl-s-trimethazolium, 2,4-diamino-6-[2'-undecylimidazolyl-(1') ]Ethyl-s-trimethazolium, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]ethyl-s-trimethazolium, 2,4 -Diamino-6-[2'-methylimidazolyl-(1')]ethyl-s-tri-isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct , 2-phenyl-4,5-dimethylolimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, etc. These curing accelerators may be used alone or in combination of two or more.

黏接劑組成物含有硬化促進劑時,相對於黏接劑組成物100質量份,硬化促進劑之含量為0.05~10質量份較為理想,為0.1~5質量份更為理想。若硬化促進劑之含量落在上述範圍內,則含羧基之苯乙烯系彈性體與環氧樹脂的反應、環氧樹脂之間的反應可輕易地進行,可輕易地確保黏接性及耐熱性。When the adhesive composition contains a hardening accelerator, the content of the hardening accelerator is preferably 0.05 to 10 parts by mass, more preferably 0.1 to 5 parts by mass, based on 100 parts by mass of the adhesive composition. If the content of the hardening accelerator falls within the above range, the reaction between the carboxyl group-containing styrene-based elastomer and the epoxy resin, and the reaction between the epoxy resins can be easily carried out, and the adhesion and heat resistance can be easily ensured. .

又,就上述偶聯劑而言,可列舉如乙烯基三甲氧基矽烷、3-環氧丙氧丙基三甲氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧丙基甲基二甲氧基矽烷、3-丙烯醯氧丙基三甲氧基矽烷、N-2-(胺乙基)-3-胺丙基甲基二甲氧基矽烷、3-脲基丙基三乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、雙(三乙氧基矽基丙基)四硫化物、3-異氰酸丙基三乙氧基矽烷、咪唑矽烷等矽烷系偶聯劑;鈦酸酯系偶聯劑;鋁酸酯系偶聯劑;鋯系偶聯劑等。這些可單獨使用,亦可將兩種以上組合使用。Also, in terms of the above-mentioned coupling agent, vinyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropyl Methyldimethoxysilane, 3-acryloxypropyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, 3-ureidopropyl Triethoxysilane, 3-mercaptopropylmethyldimethoxysilane, bis(triethoxysilylpropyl)tetrasulfide, 3-isocyanatopropyltriethoxysilane, imidazole silane, etc. Silane-based coupling agent; titanate-based coupling agent; aluminate-based coupling agent; zirconium-based coupling agent, etc. These may be used alone or in combination of two or more.

就上述抗熱老化劑而言,可列舉如2,6-二-第三丁基-4-甲基苯酚、正十八烷基-3-(3’,5’-二-第三丁基-4’-羥基苯基)丙酸酯、肆[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、新戊四醇肆[3-(3,5-二-第三丁基-4-羥基苯酚)]、三乙二醇-雙[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]等苯酚系抗氧化劑;硫二丙酸-3,3’-二月桂酯、硫二丙酸-3,3’-二肉豆蔻酯等硫系抗氧化劑;亞磷酸參壬基苯酯、亞磷酸參(2,4-二-第三丁基苯基)酯等磷系抗氧化劑等。這些可單獨使用,亦可將兩種以上組合使用。In terms of the above-mentioned anti-aging agents, such as 2,6-di-tert-butyl-4-methylphenol, n-octadecyl-3-(3',5'-di-tert-butyl -4'-hydroxyphenyl)propionate, tetrakis[methylene-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate]methane, neopentylthritol tetra[ 3-(3,5-di-tert-butyl-4-hydroxyphenol)], triethylene glycol-bis[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propane phenolic acid ester] and other phenol antioxidants; sulfur-based antioxidants such as 3,3'-dilauryl sulfur dipropionate and 3,3'-dimyristyl sulfur dipropionate; ginseng nonylphenyl phosphite Phosphorous antioxidants such as ginseng (2,4-di-tert-butylphenyl) phosphite, etc. These may be used alone or in combination of two or more.

就上述無機填充劑而言,可列舉如氧化鈦、氧化鋁、氧化鋅、碳黑、二氧化矽、滑石、銅、及銀等構成之粉體。這些可單獨使用,亦可將兩種以上組合使用。Examples of the inorganic fillers include powders made of titanium oxide, aluminum oxide, zinc oxide, carbon black, silicon dioxide, talc, copper, and silver. These may be used alone or in combination of two or more.

(黏接劑層) 本發明之黏接劑層,係由上述本發明之黏接劑組成物構成。 形成黏接劑層之黏接劑組成物,可以被硬化。 就硬化方法而言,並不特別限定,可根據目的適宜地選擇,可列舉如熱硬化等。 黏接劑層之厚度,並不特別限制,可根據目的適宜地選擇,例如為3~100μm較為理想,為5~70μm更為理想,為10~50μm更甚理想。(adhesive layer) The adhesive layer of the present invention is composed of the above-mentioned adhesive composition of the present invention. The adhesive composition forming the adhesive layer can be hardened. The curing method is not particularly limited, and can be appropriately selected according to the purpose, and examples thereof include thermal curing and the like. The thickness of the adhesive layer is not particularly limited and can be appropriately selected according to the purpose. For example, it is preferably 3-100 μm, more preferably 5-70 μm, and even more preferably 10-50 μm.

<黏接劑層之製造方法> 可藉由將上述黏接劑組成物進行成膜來製造黏接劑層。 上述黏接劑組成物,可藉由將含羧基之苯乙烯系彈性體、不含羧基之苯乙烯系彈性體、環氧樹脂及其他成分予以混合來進行製造。混合方法並不特別限定,只要使黏接劑組成物為均勻即可。黏接劑組成物考量以溶液或分散液的狀態可理想地使用之觀點,通常也會使用溶劑。 就溶劑而言,可列舉如甲醇、乙醇、異丙醇、正丙醇、異丁醇、正丁醇、苄醇、乙二醇單甲醚、丙二醇單甲醚、二乙二醇單甲醚、二丙酮醇等醇類;丙酮、甲基乙基酮、甲基異丁基酮、甲基戊基酮、環己酮、異佛酮等酮類;甲苯、二甲苯、乙基苯、均三甲苯等芳香族烴類;乙酸甲酯、乙酸乙酯、乙二醇單甲醚乙酸酯、3-甲氧基丁基乙酸酯等酯類;己烷、庚烷、環己烷、甲基環己烷等脂肪族烴類等。這些溶劑可單獨使用,亦可將兩種以上組合使用。 若黏接劑組成物為包含溶劑之溶液或分散液(樹脂清漆),則可順利地進行對基材薄膜之塗覆及黏接劑層之形成,可輕易地獲得所期望之厚度的黏接劑層。 黏接劑組成物包含溶劑時,考量包含黏接劑層之形成的作業性等的觀點,固體成分濃度較理想為3~80質量%,更理想為10~50質量%之範圍。若固體成分濃度為80質量%以下,則溶液之黏度適當,容易均勻地進行塗覆。 就黏接劑層之製造方法之更具體的實施態樣而言,可在將含有上述黏接劑組成物及溶劑之樹脂清漆塗布於基材薄膜之表面而形成樹脂清漆層之後,從該樹脂清漆層將溶劑除去,藉此形成B階段狀態的黏接劑層。在此,所謂黏接劑層係B階段狀態,係指黏接劑組成物為未硬化狀態、或一部分開始硬化之半硬化狀態,係指藉由加熱等會使黏接劑組成物之硬化更一步進行的狀態。 在此,就將樹脂清漆塗布於基材薄膜上之方法而言,並不特別限制,可根據目的適宜地選擇,可列舉如噴霧法、旋轉塗覆法、浸塗法、輥塗覆法、刀片塗覆法、刮刀輥法、刮刀法、簾塗布法、狹縫式塗覆法、網版印刷法、噴墨法、點膠法等。 上述B階段狀態之黏接劑層,可再實施加熱等,形成硬化之黏接劑層。<Manufacturing method of adhesive layer> The adhesive layer can be produced by forming a film of the above-mentioned adhesive composition. The above-mentioned adhesive composition can be produced by mixing a carboxyl group-containing styrene-based elastomer, a carboxyl-free styrene-based elastomer, an epoxy resin, and other components. The mixing method is not particularly limited, as long as the adhesive composition is uniform. The adhesive composition usually uses a solvent from the viewpoint of being ideally usable in the state of a solution or a dispersion. For the solvent, methanol, ethanol, isopropanol, n-propanol, isobutanol, n-butanol, benzyl alcohol, ethylene glycol monomethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, etc. , diacetone alcohol and other alcohols; acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl amyl ketone, cyclohexanone, isophorone and other ketones; toluene, xylene, ethylbenzene, homo Aromatic hydrocarbons such as trimethylbenzene; esters such as methyl acetate, ethyl acetate, ethylene glycol monomethyl ether acetate, 3-methoxybutyl acetate; hexane, heptane, cyclohexane, Aliphatic hydrocarbons such as methylcyclohexane, etc. These solvents may be used alone or in combination of two or more. If the adhesive composition is a solution or dispersion (resin varnish) containing a solvent, the coating of the substrate film and the formation of the adhesive layer can be carried out smoothly, and the adhesion of the desired thickness can be easily obtained agent layer. When the adhesive composition contains a solvent, the solid content concentration is preferably in the range of 3 to 80% by mass, more preferably in the range of 10 to 50% by mass, in consideration of workability including formation of the adhesive layer. If the solid content concentration is 80 mass % or less, the viscosity of a solution will be appropriate, and it will become easy to coat uniformly. In a more specific embodiment of the method for producing the adhesive layer, after the resin varnish layer is formed by applying the resin varnish containing the above-mentioned adhesive composition and solvent to the surface of the substrate film, the resin varnish layer can be formed from the resin The varnish layer removes the solvent, thereby forming a B-staged adhesive layer. Here, the B-stage state of the adhesive layer refers to an uncured state of the adhesive composition or a semi-hardened state where a part of the adhesive composition begins to harden. step-by-step status. Here, the method of coating the resin varnish on the substrate film is not particularly limited, and can be appropriately selected according to the purpose, such as spray method, spin coating method, dip coating method, roll coating method, Blade coating method, doctor roll method, doctor blade method, curtain coating method, slit coating method, screen printing method, inkjet method, dispensing method, etc. The adhesive layer in the above B-stage state can be further heated to form a hardened adhesive layer.

<黏接劑層之特性> 本發明之黏接劑層,在硬化前於120℃時的儲存彈性模量為1×103 Pa以上且5×105 Pa以下較為理想。 若儲存彈性模量為5×105 Pa以下,則在疊層步驟時之溫度中,因為儲存彈性模量低,所以黏接劑層會輕易地與基材薄膜、電子零件相關之其他構成要素進行黏著。<Characteristics of Adhesive Layer> The adhesive layer of the present invention preferably has a storage elastic modulus at 120° C. before hardening of 1×10 3 Pa or more and 5×10 5 Pa or less. If the storage elastic modulus is 5×10 5 Pa or less, the adhesive layer will be easily bonded to other components related to the base film and electronic parts because the storage elastic modulus is low at the temperature of the lamination step. Do sticking.

[儲存彈性模量(Pa)] 黏接劑層之儲存彈性模量,例如可針對由黏接劑層構成之試料,製作厚度100μm之黏接劑薄膜,並使用黏彈性測定裝置(TA Instruments公司製之RSA-G2),在測定頻率1Hz、昇溫速度5℃/min之條件下,依循JIS K7244進行測定,藉此求得。[Storage modulus of elasticity (Pa)] For the storage elastic modulus of the adhesive layer, for example, an adhesive film with a thickness of 100 μm can be prepared for a sample composed of the adhesive layer, and the viscoelasticity measurement device (RSA-G2 manufactured by TA Instruments) can be used for measurement. Under the conditions of frequency 1Hz and heating rate 5°C/min, it was measured in accordance with JIS K7244 and obtained.

本發明之黏接劑層,在硬化後於25℃時的儲存彈性模量為8×107 Pa以上且5×109 Pa以下較為理想。 若儲存彈性模量為8×107 Pa以上,因為在室溫中之儲存彈性模量高,所以黏接劑層可保持與基材薄膜、電子零件相關之其他構成要素的密接力。The adhesive layer of the present invention preferably has a storage elastic modulus of not less than 8×10 7 Pa and not more than 5×10 9 Pa at 25° C. after hardening. If the storage elastic modulus is 8×10 7 Pa or more, the adhesive layer can maintain the adhesive force with the base film and other components related to electronic parts because the storage elastic modulus at room temperature is high.

使黏接劑組成物硬化而成之本發明之黏接劑層,以頻率28GHz之條件測定之黏接劑層的相對介電常數(εr)為3.5以下、且介電正切(tanδ)為0.01以下較為理想。 若相對介電常數為3.5以下、且介電正切為0.01以下,則即便是在電特性之要求嚴格的FPC相關製品中仍能理想地使用。The adhesive layer of the present invention obtained by hardening the adhesive composition has a relative permittivity (εr) of 3.5 or less and a dielectric tangent (tanδ) of 0.01 measured at a frequency of 28 GHz. The following are ideal. If the relative permittivity is 3.5 or less and the dielectric tangent is 0.01 or less, it can be ideally used even in FPC-related products that require strict electrical characteristics.

[相對介電常數及介電正切] 黏接劑層之相對介電常數及介電正切,可使用Network Analyzers MS46122B(Anritsu公司製)與開放型共振器法布立-培若DPS-03(KEYCOM公司製),並以開放型共振器法,以溫度23℃、頻率28GHz的條件進行測定。[Relative permittivity and dielectric tangent] For the relative permittivity and dielectric tangent of the adhesive layer, Network Analyzers MS46122B (manufactured by Anritsu Corporation) and open resonator Fabry-Perro DPS-03 (manufactured by KEYCOM Corporation) can be used, and the open resonator According to the method, the temperature is 23°C and the frequency is 28GHz.

(疊層體) 本發明之疊層體,具備基材薄膜、以及在該基材薄膜之至少一表面上具備上述黏接劑層。(Laminate) The laminate of the present invention includes a base film, and the above-mentioned adhesive layer on at least one surface of the base film.

<基材薄膜> 本發明中使用之基材薄膜,可根據疊層體之用途進行選擇。例如在將疊層體作為表覆層薄膜、覆銅疊層板(CCL)使用時,可列舉如聚醯亞胺薄膜、聚醚醚酮薄膜、聚苯硫醚薄膜、芳香族聚醯胺薄膜、聚萘二甲酸乙二醇酯薄膜、及液晶聚合物薄膜等。這些當中,考量黏接性及電特性的觀點,為聚醯亞胺薄膜、聚醚醚酮(PEEK)薄膜、聚萘二甲酸乙二醇酯薄膜、及液晶聚合物薄膜較為理想。<Base Film> The base film used in the present invention can be selected according to the application of the laminate. For example, when the laminate is used as a cover layer film or a copper clad laminate (CCL), polyimide film, polyether ether ketone film, polyphenylene sulfide film, aramid film, etc. , polyethylene naphthalate film, and liquid crystal polymer film, etc. Among them, polyimide film, polyether ether ketone (PEEK) film, polyethylene naphthalate film, and liquid crystal polymer film are preferable from the viewpoint of adhesiveness and electrical characteristics.

又,將本發明之疊層體作為黏合片(bonding sheet)使用時,基材薄膜須為離型性薄膜,可列舉如聚對苯二甲酸乙二酯薄膜、聚乙烯薄膜、聚丙烯薄膜、聚矽氧離型處理紙、聚烯烴樹脂塗覆紙、TPX(聚甲基戊烯)薄膜、及氟系樹脂薄膜等。Also, when using the laminate of the present invention as an adhesive sheet (bonding sheet), the base film must be a release film, such as polyethylene terephthalate film, polyethylene film, polypropylene film, Silicone release paper, polyolefin resin coated paper, TPX (polymethylpentene) film, and fluorine resin film, etc.

將本發明之疊層體作為屏蔽薄膜使用時,基材薄膜須為具有電磁波遮蔽能力的薄膜,可列舉如保護絕緣層與金屬箔的疊層體等。When the laminate of the present invention is used as a shielding film, the base film must be a film having electromagnetic wave shielding capability, for example, a laminate of a protective insulating layer and a metal foil.

(表覆層薄膜) 就本發明之疊層體之較理想的一實施態樣而言,可列舉如表覆層薄膜。 製造FPC時,為了保護配線部分,通常會使用被稱作「表覆層薄膜」之具有黏接劑層的疊層體。此表覆層薄膜,具備絕緣樹脂層、及形成於該表面上之黏接劑層。 例如,表覆層薄膜,係於上述基材薄膜之至少一側的表面上形成有上述黏接劑層,且基材薄膜與黏接劑層的剝離一般而言係困難的疊層體。 表覆層薄膜中含有之基材薄膜的厚度為5~100μm較為理想,為5~50μm更為理想,為5~30μm更甚理想。若基材薄膜之厚度為上述上限以下,可將表覆層薄膜予以薄膜化。若基材薄膜之厚度為上述下限以上,可輕易地進行印刷電路板的設計,處理亦佳。 就製造表覆層薄膜之方法而言,例如可在將含有上述黏接劑組成物及溶劑之樹脂清漆塗布於上述基材薄膜之表面而形成樹脂清漆層之後,從該樹脂清漆層將溶劑除去,藉此製造形成有B階段狀態之黏接劑層的表覆層薄膜。 將溶劑除去時的乾燥溫度,為40~250℃較為理想,為70~170℃更為理想。 乾燥,係藉由使塗布有黏接劑組成物之疊層體通過會執行熱風乾燥、遠紅外線加熱、及高頻感應加熱等的爐中來進行。 另外,視需要,亦可為了保管等用途而將離型性薄膜疊層於黏接劑層之表面上。就離型性薄膜而言,可使用聚對苯二甲酸乙二酯薄膜、聚乙烯薄膜、聚丙烯薄膜、聚矽氧離型處理紙、聚烯烴樹脂塗覆紙、TPX薄膜、氟系樹脂薄膜等公知者。 本發明之表覆層薄膜,因為使用低介電的本發明之黏接劑組成物,所以係能達成電子設備的高速傳送,且與電子設備的黏接安定性亦優異者。(Surface film) A more desirable embodiment of the laminate of the present invention includes, for example, a cover layer film. When manufacturing FPC, in order to protect the wiring part, a laminate with an adhesive layer called "cover film" is usually used. This cover film has an insulating resin layer and an adhesive layer formed on the surface. For example, the cover layer film is a laminate in which the above-mentioned adhesive layer is formed on at least one surface of the above-mentioned base film, and the peeling of the base film and the adhesive layer is generally difficult. The thickness of the base film contained in the cover layer film is preferably 5 to 100 μm, more preferably 5 to 50 μm, even more preferably 5 to 30 μm. If the thickness of the base film is not more than the above-mentioned upper limit, the cover layer film can be thinned. If the thickness of the base film is more than the above-mentioned lower limit, the design of the printed circuit board can be easily carried out, and the handling is also preferable. In the method of producing a cover layer film, for example, after coating a resin varnish containing the above-mentioned adhesive composition and a solvent on the surface of the above-mentioned base film to form a resin varnish layer, the solvent may be removed from the resin varnish layer , thereby manufacturing a cover layer film having an adhesive layer in a B-stage state. The drying temperature when removing the solvent is preferably 40 to 250°C, more preferably 70 to 170°C. Drying is performed by passing the laminate coated with the adhesive composition through a furnace that performs hot air drying, far-infrared heating, and high-frequency induction heating. Moreover, a release film may be laminated|stacked on the surface of an adhesive bond layer for uses, such as storage, as needed. As the release film, polyethylene terephthalate film, polyethylene film, polypropylene film, silicone release-treated paper, polyolefin resin coated paper, TPX film, fluororesin film can be used Wait for the public. The cover layer film of the present invention uses the low-dielectric adhesive composition of the present invention, so it can achieve high-speed transmission of electronic devices and has excellent bonding stability with electronic devices.

(黏合片) 就本發明之疊層體之較理想的一實施態樣而言,可列舉如黏合片。 黏合片,係於離型性薄膜(基材薄膜)之表面上形成有上述黏接劑層者。又,黏合片,亦可為在兩枚離型性薄膜之間具有黏接劑層的態樣。使用黏合片時,係將離型性薄膜剝離而使用。離型性薄膜,可使用與上述(表覆層薄膜)中之記載相同者。 黏合片中含有之基材薄膜的厚度,為5~100μm較為理想,為25~75μm更為理想,為38~50μm更甚理想。若基材薄膜之厚度落在上述範圍內,則黏合片之製造係容易,操作處理亦佳。 就製造黏合片之方法而言,例如有將含上述黏接劑組成物及溶劑之樹脂清漆塗布於離型性薄膜之表面,並以與上述表覆層薄膜的情況同樣的作法進行乾燥的方法。 本發明之黏合片,因為使用低介電的本發明之黏接劑組成物,所以係能達成電子設備的高速傳送,且與電子設備的黏接安定性亦優異者。(adhesive sheet) As a more desirable embodiment of the laminate of the present invention, an adhesive sheet is exemplified. Adhesive sheet is one in which the above-mentioned adhesive layer is formed on the surface of a release film (substrate film). In addition, the adhesive sheet may have an adhesive layer between two release films. When using an adhesive sheet, it is used after peeling off the release film. As the release film, the same ones as described in the above (cover layer film) can be used. The thickness of the base film contained in the adhesive sheet is preferably 5 to 100 μm, more preferably 25 to 75 μm, and still more preferably 38 to 50 μm. If the thickness of the base film falls within the above-mentioned range, the production of the adhesive sheet is easy and the handling is also good. As for the method of producing the adhesive sheet, for example, there is a method of applying the resin varnish containing the above-mentioned adhesive composition and solvent to the surface of the release film, and drying it in the same way as the case of the above-mentioned surface layer film. . The adhesive sheet of the present invention uses the low-dielectric adhesive composition of the present invention, so it can achieve high-speed transmission of electronic devices and has excellent bonding stability with electronic devices.

(覆銅疊層板(CCL)) 就本發明之疊層體之較理想的一實施態樣而言,可列舉如在本發明之疊層體中之黏接劑層上貼合銅箔而成之覆銅疊層板。 覆銅疊層板,係使用上述疊層體,並貼合有銅箔,例如按基材薄膜、黏接劑層及銅箔的順序而構成。另外,黏接劑層及銅箔,亦可形成於基材薄膜的兩面上。 在本發明使用之黏接劑組成物,與包含銅之物品的黏接性亦優異。 本發明之覆銅疊層板,因為使用低介電的本發明之黏接劑組成物,所以係能達成電子設備的高速傳送,且黏接安定性優異者。(Copper Clad Laminates (CCL)) A more desirable embodiment of the laminate of the present invention includes a copper-clad laminate in which copper foil is bonded to the adhesive layer in the laminate of the present invention. A copper-clad laminate uses the above-mentioned laminate and bonds copper foil, for example, to a substrate film, an adhesive layer, and copper foil in this order. In addition, the adhesive layer and the copper foil may also be formed on both surfaces of the base film. The adhesive composition used in the present invention is also excellent in adhesion to objects containing copper. The copper-clad laminate of the present invention uses the low-dielectric adhesive composition of the present invention, so it can achieve high-speed transmission of electronic equipment and has excellent bonding stability.

就製造覆銅疊層板之方法而言,例如有使上述疊層體之黏接劑層與銅箔進行面接觸,並以80℃~150℃進行熱疊層,再進行後硬化,藉此將黏接劑層予以硬化的方法。後硬化之條件,例如可在鈍性氣體之環境下設定為100℃~200℃、及30分鐘~4小時。另外,上述銅箔,並不特別限定,可使用電解銅箔、壓延銅箔等。As for the method of manufacturing copper-clad laminates, for example, the adhesive layer of the above-mentioned laminate is brought into surface contact with the copper foil, and thermal lamination is performed at 80°C to 150°C, followed by post-hardening. A method of hardening an adhesive layer. The post-curing conditions can be set, for example, at 100° C. to 200° C. and 30 minutes to 4 hours in an inert gas environment. In addition, the said copper foil is not specifically limited, Electrolytic copper foil, rolled copper foil, etc. can be used.

(印刷電路板) 就本發明之疊層體之較理想的一實施態樣而言,可列舉如在本發明之疊層體中之黏接劑層上貼合銅配線而成之印刷電路板。 印刷電路板,可藉由在上述覆銅疊層板形成電子電路而獲得。 印刷電路板,係使用上述疊層體,並將基材薄膜與銅配線貼合而成,且按基材薄膜、黏接劑層及銅配線的順序而構成。另外,黏接劑層及銅配線,亦可形成於基材薄膜的兩面上。 例如利用熱壓等,藉由黏接劑層將表覆層薄膜黏合於具有配線部分之面上,藉此製造印刷電路板。 本發明之印刷電路板,因為使用低介電的本發明之黏接劑組成物,所以係能達成電子設備的高速傳送,且黏接安定性優異者。 就製造本發明之印刷電路板的方法而言,例如有使上述疊層體之黏接劑層與銅配線進行接觸,並以80℃~150℃進行熱疊層,再進行後硬化,藉此將黏接劑層予以硬化的方法。後硬化之條件,例如可設定為100℃~200℃、及30分鐘~4小時。上述銅配線之形狀,並不特別限定,根據期望而適宜地選擇形狀等即可。(A printed circuit board) A preferred embodiment of the laminate of the present invention is, for example, a printed circuit board in which copper wiring is bonded to the adhesive layer in the laminate of the present invention. A printed circuit board can be obtained by forming an electronic circuit on the above-mentioned copper-clad laminated board. The printed circuit board is formed by bonding the base film and the copper wiring using the above-mentioned laminate, and is constructed in this order of the base film, the adhesive layer, and the copper wiring. In addition, the adhesive layer and copper wiring may be formed on both surfaces of the base film. For example, a printed circuit board is manufactured by bonding the cover layer film to the surface having the wiring portion through the adhesive layer by heat pressing or the like. The printed circuit board of the present invention uses the low-dielectric adhesive composition of the present invention, so it can achieve high-speed transmission of electronic equipment and has excellent bonding stability. In terms of the method of manufacturing the printed circuit board of the present invention, for example, the adhesive layer of the above-mentioned laminate is brought into contact with the copper wiring, and thermal lamination is performed at 80°C to 150°C, followed by post-curing, whereby A method of hardening an adhesive layer. The post-curing conditions can be set, for example, at 100° C. to 200° C. and 30 minutes to 4 hours. The shape of the said copper wiring is not specifically limited, What is necessary is just to select a shape etc. suitably as desired.

(屏蔽薄膜) 就本發明之疊層體之較理想的一實施態樣而言,可列舉如屏蔽薄膜。 屏蔽薄膜,係為了阻隔對電腦、行動電話、分析機器等各種電子設備造成影響並成為誤動作之原因的電磁波雜訊,而在各種電子設備中用於屏蔽之薄膜。亦稱作電磁波屏蔽薄膜。 電磁波屏蔽薄膜,係例如按絕緣樹脂層、金屬層、及本發明之黏接劑層的順序疊層而成。 本發明之屏蔽薄膜,因為使用低介電的本發明之黏接劑組成物,所以係能達成電子設備的高速傳送,且與電子設備的黏接安定性亦優異者。(shielding film) As a preferred embodiment of the laminate of the present invention, a masking film is exemplified. Shielding film is a film used for shielding in various electronic devices in order to block electromagnetic wave noise that affects various electronic devices such as computers, mobile phones, and analysis equipment and becomes the cause of malfunction. Also known as electromagnetic wave shielding film. The electromagnetic shielding film is formed by laminating, for example, an insulating resin layer, a metal layer, and the adhesive layer of the present invention in this order. The shielding film of the present invention uses the low-dielectric adhesive composition of the present invention, so it can achieve high-speed transmission of electronic devices and has excellent bonding stability with electronic devices.

(附屏蔽薄膜之印刷電路板) 就本發明之疊層體之較理想的一實施態樣而言,可列舉如附屏蔽薄膜之印刷電路板。 附屏蔽薄膜之印刷電路板,係在基板之至少單面上設有印刷電路的印刷電路板上貼附有上述電磁波屏蔽薄膜者。 附屏蔽薄膜之印刷電路板,例如具有印刷電路板、與印刷電路板之設有印刷電路側之面鄰接的絕緣薄膜、及上述電磁波屏蔽薄膜。 本發明之附屏蔽薄膜之印刷電路板,因為使用低介電的本發明之黏接劑組成物,所以係能達成電子設備的高速傳送,且黏接安定性優異者。 [實施例](printed circuit board with shielding film) A preferred embodiment of the laminate of the present invention includes, for example, a printed circuit board with a masking film. A printed circuit board with a shielding film is a printed circuit board with a printed circuit on at least one side of the substrate, and the above-mentioned electromagnetic wave shielding film is pasted on it. The printed circuit board with shielding film includes, for example, a printed circuit board, an insulating film adjacent to the surface of the printed circuit board on which the printed circuit is provided, and the above-mentioned electromagnetic wave shielding film. The printed circuit board with shielding film of the present invention uses the low-dielectric adhesive composition of the present invention, so it can achieve high-speed transmission of electronic equipment and has excellent adhesion stability. [Example]

列舉以下實施例對本發明進行更詳細的說明,但本發明的範圍並不限定於這些實施例。另外,於下述中,「份」及「%」,除非另有指明,否則係質量基準。Although the following examples are given and the present invention will be described in more detail, the scope of the present invention is not limited to these examples. In addition, in the following, "parts" and "%" are based on mass unless otherwise specified.

(含羧基之苯乙烯系彈性體) 使用旭化成(股)公司製之「Tuftec M1911(商品名)」(馬來酸改性苯乙烯-乙烯丁烯-苯乙烯嵌段共聚物)。此共聚物之酸價為2mg KOH/g、苯乙烯/乙烯丁烯比為30/70、重量平均分子量為69,000。 (不含羧基之苯乙烯系彈性體) 使用旭化成(股)公司製之「Tuftec P1500(商品名)」(氫化苯乙烯系彈性體)。此共聚物之酸價為0mg KOH/g、苯乙烯/乙烯丁烯比為30/70、重量平均分子量為67,000。 (環氧樹脂) 使用三菱化學(股)公司製之「YX7700(商品名)」(環氧樹脂、軟化點65℃)。 (Perbutyl E) 使用係日油(股)公司製之過氧酯之「Perbutyl E(商品名)」作為有機過氧化物。 (溶劑) 使用由甲苯及甲基乙基酮構成之混合溶劑(質量比=90:10)。 (基材薄膜) 使用信越聚合物公司製之「Shin-Etsu Sepla Film PEEK」(聚醚醚酮、厚度50μm)作為基材薄膜。 (電解銅箔) 使用三井金屬礦業製之「TQ-M7-VSP」(電解銅箔、厚度12μm、光澤面Rz 1.27μm、光澤面Ra 0.197μm、光澤面Rsm 12.95μm)作為電解銅箔。光澤面之表面粗糙度,係使用雷射顯微鏡測定粗糙度曲線,並從此粗糙度曲線依循JIS B 0601:2013(ISO 4287:1997 Amd.1:2009)而求得之數值。 (離型薄膜) 使用PANAC公司製之NP75SA(聚矽氧離型PET薄膜、50μm)作為離型薄膜。(Carboxyl-containing styrene-based elastomer) "Tuftec M1911 (trade name)" (maleic acid-modified styrene-ethylene-butylene-styrene block copolymer) manufactured by Asahi Kasei Co., Ltd. was used. The acid value of this copolymer was 2 mg KOH/g, the ratio of styrene/ethylene butene was 30/70, and the weight average molecular weight was 69,000. (Styrene-based elastomers without carboxyl groups) "Tuftec P1500 (trade name)" (hydrogenated styrene elastomer) manufactured by Asahi Kasei Co., Ltd. was used. The acid value of this copolymer was 0 mg KOH/g, the ratio of styrene/ethylene butene was 30/70, and the weight average molecular weight was 67,000. (epoxy resin) "YX7700 (trade name)" (epoxy resin, softening point: 65° C.) manufactured by Mitsubishi Chemical Co., Ltd. was used. (Perbutyl E) As the organic peroxide, "Perbutyl E (trade name)" which is a peroxyester manufactured by NOF Co., Ltd. was used. (solvent) A mixed solvent (mass ratio=90:10) composed of toluene and methyl ethyl ketone was used. (substrate film) "Shin-Etsu Sepla Film PEEK" (polyether ether ketone, thickness 50 μm) manufactured by Shin-Etsu Polymer Co., Ltd. was used as the base film. (electrolytic copper foil) "TQ-M7-VSP" (electrodeposited copper foil, thickness 12 μm, glossy surface Rz 1.27 μm, glossy surface Ra 0.197 μm, glossy surface Rsm 12.95 μm) manufactured by Mitsui Metal Mining Co., Ltd. was used as the electrodeposited copper foil. The surface roughness of the glossy surface is the value obtained by measuring the roughness curve using a laser microscope and following JIS B 0601:2013 (ISO 4287:1997 Amd.1:2009) from the roughness curve. (release film) As the release film, NP75SA (polysiloxane release PET film, 50 μm) manufactured by PANAC was used.

(實施例1) 以表1所示之比例含有表1所示之構成黏接劑層的各成分,並將這些成分溶於溶劑中,製作固體成分濃度為20質量%的樹脂清漆。 於基材薄膜之表面進行電暈處理。 將該樹脂清漆塗布於基材薄膜之表面,以110℃之烘箱使其乾燥4分鐘,並使甲苯揮發,藉此形成黏接劑層,獲得附黏接劑之基材薄膜。黏接劑疊層體之黏接劑層係以與電解銅箔之光澤面接觸的狀態進行重疊,並以120℃進行熱疊層,獲得硬化前之黏接劑疊層體。將硬化前之黏接劑疊層體再以150℃、60分鐘之條件進行後硬化,藉此將黏接劑層硬化,獲得硬化後之黏接劑疊層體。 測定實施例1之硬化前之黏接劑疊層體及硬化後之黏接劑疊層體之電解銅箔與基材薄膜之間的密接力(N/cm)。(Example 1) Each component constituting the adhesive layer shown in Table 1 was contained in the ratio shown in Table 1, and these components were dissolved in a solvent to prepare a resin varnish having a solid content concentration of 20% by mass. Corona treatment is performed on the surface of the substrate film. The resin varnish was coated on the surface of the substrate film, dried in an oven at 110°C for 4 minutes, and the toluene was volatilized to form an adhesive layer, and the substrate film with the adhesive was obtained. The adhesive layer of the adhesive laminate was superimposed in a state of being in contact with the glossy surface of the electrolytic copper foil, and thermally laminated at 120°C to obtain an adhesive laminate before hardening. The pre-cured adhesive laminate was post-cured at 150° C. for 60 minutes to harden the adhesive layer to obtain a cured adhesive laminate. The adhesion force (N/cm) between the electrodeposited copper foil and the base film of the adhesive laminated body before hardening and the adhesive laminated body after hardening of Example 1 was measured.

[密接力(N/cm)] 藉由將硬化前之黏接劑疊層體及硬化後之黏接劑疊層體裁切成寬25mm之試驗體,並依循JIS Z0237:2009(黏著膠帶、黏著片材試驗方法),測定以剝離速度0.3m/分鐘、剝離角180°之條件從固定於支持體的附黏接劑之基材薄膜將電解銅箔剝離時的剝離強度,來對密接力進行測定。[Adhesion force (N/cm)] By cutting the adhesive laminate before hardening and the adhesive laminate after hardening into a test body with a width of 25mm, and following JIS Z0237: 2009 (adhesive tape, adhesive sheet test method), measure the peeling The adhesion force was measured by the peel strength when the electrodeposited copper foil was peeled off from the adhesive-attached base film fixed on the support under the conditions of speed 0.3m/min and peel angle 180°.

然後,亦測定實施例1之黏接劑層在硬化前於120℃時的儲存彈性模量(Pa)、及在硬化後於25℃時的儲存彈性模量(Pa)。Then, the storage modulus (Pa) of the adhesive layer of Example 1 at 120° C. before hardening and the storage elastic modulus (Pa) at 25° C. after hardening were also measured.

[儲存彈性模量(Pa)] 黏接劑層之儲存彈性模量,係針對由黏接劑層構成之試料,製作厚度100μm之黏接劑薄膜,並使用黏彈性測定裝置(TA Instruments公司製之RSA-G2)在測定頻率1Hz、昇溫速度5℃/min之條件下依循JIS K7244進行測定。測定試料,係將樹脂清漆予以輥塗布於離型薄膜上,然後,將此附塗膜之薄膜靜置於烘箱內,以110℃使其乾燥4分鐘而形成B階段狀態的黏接劑層(厚度50μm)。然後,在將此黏接劑層以黏接面彼此接觸的狀態下,以120℃進行熱疊層而形成硬化前之黏接劑薄膜(厚度100μm)。將此硬化前之黏接劑薄膜(厚度100μm)靜置於烘箱內,以150℃進行60分鐘之加熱硬化處理,製作硬化後之黏接劑薄膜(100mm×100mm)。從黏接劑薄膜將離型薄膜予以剝離並測定黏接劑層之儲存彈性模量(Pa)。[Storage modulus of elasticity (Pa)] For the storage elastic modulus of the adhesive layer, an adhesive film with a thickness of 100 μm was made for the sample composed of the adhesive layer, and the measurement frequency was 1 Hz using a viscoelasticity measuring device (RSA-G2 manufactured by TA Instruments Co., Ltd.) , Measured in accordance with JIS K7244 at a heating rate of 5°C/min. The test sample is to roll-coat the resin varnish on the release film, then place the coated film in an oven and dry it at 110°C for 4 minutes to form a B-stage adhesive layer ( Thickness 50μm). Then, the adhesive layer was thermally laminated at 120° C. in a state where the adhesive surfaces were in contact with each other to form an adhesive film (thickness: 100 μm) before hardening. Put the unhardened adhesive film (thickness 100 μm) in an oven, heat and harden at 150°C for 60 minutes, and make a hardened adhesive film (100mm×100mm). The release film was peeled off from the adhesive film and the storage elastic modulus (Pa) of the adhesive layer was measured.

亦測定實施例1之疊層體中之黏接劑層於頻率28GHz時之相對介電常數、及介電正切。The relative permittivity and dielectric tangent of the adhesive layer in the laminate of Example 1 were also measured at a frequency of 28 GHz.

[相對介電常數及介電正切] 黏接劑層之相對介電常數及介電正切,係使用Network Analyzers MS46122B(Anritsu公司製)與開放型共振器法布立-培若DPS-03(KEYCOM公司製),並以開放型共振器法,以溫度23℃、頻率28GHz的條件進行測定。測定試料,係將樹脂清漆予以輥塗布於離型薄膜上,然後,將此附塗膜之薄膜靜置於烘箱內,以110℃使其乾燥4分鐘而形成B階段狀態的黏接劑層(厚度50μm)。然後,在將此黏接劑層以黏接面彼此接觸的狀態下,以120℃進行熱疊層而形成硬化前之黏接劑薄膜(厚度100μm)。將此硬化前之黏接劑薄膜(厚度100μm)靜置於烘箱內,以150℃進行60分鐘之加熱硬化處理,製作硬化後之黏接劑薄膜(100mm×100mm)。從硬化後之黏接劑薄膜將離型薄膜予以剝離並測定黏接劑層之相對介電常數及介電正切。[Relative permittivity and dielectric tangent] For the relative permittivity and dielectric tangent of the adhesive layer, Network Analyzers MS46122B (manufactured by Anritsu Corporation) and an open resonator Fabry-Pero DPS-03 (manufactured by KEYCOM Corporation) were used, and the open resonator According to the method, the temperature is 23°C and the frequency is 28GHz. The test sample is to roll-coat the resin varnish on the release film, then place the coated film in an oven and dry it at 110°C for 4 minutes to form a B-stage adhesive layer ( Thickness 50μm). Then, the adhesive layer was thermally laminated at 120° C. in a state where the adhesive surfaces were in contact with each other to form an adhesive film (thickness: 100 μm) before hardening. Put the unhardened adhesive film (thickness 100 μm) in an oven, heat and harden at 150°C for 60 minutes, and make a hardened adhesive film (100mm×100mm). The release film was peeled off from the hardened adhesive film and the relative dielectric constant and dielectric tangent of the adhesive layer were measured.

將各測定結果顯示於表1。Each measurement result is shown in Table 1.

(實施例2~實施例5) 將實施例1中構成黏接劑層之成分的種類及摻合量變更為如表1所示,除此以外,以與實施例1同樣的方式製作實施例2~實施例5之疊層體。 針對製得之疊層體,進行與實施例1相同的評價。 將結果顯示於表1。(Example 2 to Example 5) In Example 1, the types and blending amounts of the components constituting the adhesive layer were changed as shown in Table 1, and the laminates of Examples 2 to 5 were produced in the same manner as in Example 1. . The evaluation similar to Example 1 was performed about the obtained laminated body. The results are shown in Table 1.

(比較例1~比較例4) 將實施例1中構成黏接劑層之成分的種類及摻合量變更為如表1所示,除此以外,以與實施例1同樣的方式製作比較例1~比較例4之疊層體。 針對製得之疊層體,進行與實施例1相同的評價。 將結果顯示於表1。(Comparative example 1 to comparative example 4) In Example 1, except that the types and blending amounts of the components constituting the adhesive layer were changed as shown in Table 1, laminates of Comparative Examples 1 to 4 were produced in the same manner as in Example 1. . The evaluation similar to Example 1 was performed about the obtained laminated body. The results are shown in Table 1.

[表1]   構成黏接劑層之成分 密接力(N/cm) 儲存彈性模量(Pa) 電特性   M1911 P1500 YX7700 Perbutyl  E 120℃疊層 150℃後硬化 25℃ 120℃ 相對介電常數 介電正切 實施例1 45.0 45.0 10 0 3.0 8.0 1.3E+08 2.0E+05 2.43 0.0070 實施例2 45.0 45.0 10 3 3.1 9.0 1.3E+08 2.3E+05 2.45 0.0075 實施例3 47.5 47.5 5 0 3.0 8.0 1.3E+08 2.0E+05 2.46 0.0045 實施例4 40.0 55.0 5 0 3.1 8.3 9.0E+07 4.0E+05 2.45 0.0041 實施例5 40.0 55.0 5 3 3.1 8.8 9.1E+07 4.5E+05 2.47 0.0047 比較例1 95.0 0 5 0 2.1 9.5 7.2E+07 1.1E+06 2.45 0.0047 比較例2 0 95.0 5 0 3.7 3.3 9.0E+07 2.6E+05 2.44 0.0045 比較例3 0 100 0 0 3.6 3.6 6.2E+07 3.1E+05 2.45 0.0009 比較例4 50.0 50.0 0 0 3.1 6.9 6.5E+07 5.5E+05 2.46 0.0010 如實施例1~5所示,由本發明之黏接劑組成物構成之黏接劑層,其加熱硬化後之密接性(黏接性)優異,同時在疊層步驟時之密接性(黏接性)亦優異。[Table 1] Components of the adhesive layer Adhesive force(N/cm) Storage modulus of elasticity (Pa) electrical characteristics M1911 P1500 YX7700 Perbutyl E 120°C lamination Hardening after 150°C 25°C 120°C Relative permittivity Dielectric tangent Example 1 45.0 45.0 10 0 3.0 8.0 1.3E+08 2.0E+05 2.43 0.0070 Example 2 45.0 45.0 10 3 3.1 9.0 1.3E+08 2.3E+05 2.45 0.0075 Example 3 47.5 47.5 5 0 3.0 8.0 1.3E+08 2.0E+05 2.46 0.0045 Example 4 40.0 55.0 5 0 3.1 8.3 9.0E+07 4.0E+05 2.45 0.0041 Example 5 40.0 55.0 5 3 3.1 8.8 9.1E+07 4.5E+05 2.47 0.0047 Comparative example 1 95.0 0 5 0 2.1 9.5 7.2E+07 1.1E+06 2.45 0.0047 Comparative example 2 0 95.0 5 0 3.7 3.3 9.0E+07 2.6E+05 2.44 0.0045 Comparative example 3 0 100 0 0 3.6 3.6 6.2E+07 3.1E+05 2.45 0.0009 Comparative example 4 50.0 50.0 0 0 3.1 6.9 6.5E+07 5.5E+05 2.46 0.0010 As shown in Examples 1 to 5, the adhesive layer composed of the adhesive composition of the present invention has excellent adhesiveness (adhesiveness) after heating and hardening, and the adhesiveness (adhesiveness) during the lamination step is excellent. properties) are also excellent.

本申請案係主張於2019年12月20日提申之日本專利申請案之特願2019-230539號為基礎之優先權,並援用該日本專利申請案之所有記載內容。 [產業上利用性]This application claims priority based on Japanese Patent Application No. 2019-230539 filed on December 20, 2019, and uses all the contents of the Japanese patent application. [industrial availability]

具有由本發明之黏接劑組成物構成之黏接劑層的疊層體,可理想地使用於智慧型手機、行動電話、光學模組、數位相機、遊戲機、筆記型電腦、醫療器具等電子設備用之FPC相關製品的製造中。A laminate having an adhesive layer composed of the adhesive composition of the present invention can be ideally used in electronic devices such as smart phones, mobile phones, optical modules, digital cameras, game machines, notebook computers, and medical appliances. Manufacturing of FPC-related products for equipment.

none

Claims (13)

一種黏接劑組成物,含有含羧基之苯乙烯系彈性體、不含羧基之苯乙烯系彈性體、及環氧樹脂,相對於該黏接劑組成物100質量份,該含羧基之苯乙烯系彈性體的含量未滿50質量份,相對於該黏接劑組成物100質量份,該不含羧基之苯乙烯系彈性體的含量為30~70質量份,相對於該黏接劑組成物100質量份,該環氧樹脂之含量為1~20質量份。 An adhesive composition, containing carboxyl-containing styrene-based elastomers, carboxyl-free styrene-based elastomers, and epoxy resins, with respect to 100 parts by mass of the adhesive composition, the carboxyl-containing styrene The content of the elastomer is less than 50 parts by mass, and the content of the carboxyl-free styrene-based elastomer is 30 to 70 parts by mass relative to 100 parts by mass of the adhesive composition. 100 parts by mass, the content of the epoxy resin is 1-20 parts by mass. 如請求項1之黏接劑組成物,其中,該環氧樹脂之軟化點或熔點為90℃以下。 The adhesive composition according to claim 1, wherein the epoxy resin has a softening point or a melting point of 90°C or lower. 如請求項1至2中任一項之黏接劑組成物,更含有有機過氧化物。 The adhesive composition according to any one of Claims 1 to 2 further contains an organic peroxide. 一種黏接劑層,係由如請求項1至3中任一項之黏接劑組成物構成,該黏接劑層在硬化前於120℃時的儲存彈性模量為5×105Pa以下。 An adhesive layer consisting of the adhesive composition according to any one of claims 1 to 3, the adhesive layer has a storage elastic modulus of 5×10 5 Pa or less at 120°C before hardening . 一種黏接劑層,係由如請求項1至3中任一項之黏接劑組成物構成,該黏接劑層在硬化後於25℃時的儲存彈性模量為8×107Pa以上。 An adhesive layer consisting of the adhesive composition according to any one of claims 1 to 3, the adhesive layer has a storage elastic modulus of 8×10 7 Pa or more at 25°C after hardening . 一種黏接劑層,以頻率28GHz之條件對由如請求項1至3中任一項之黏接劑組成物硬化而成之黏接劑層測得之該黏接劑層的相對介電常數為3.5以下,且介電正切為0.01以下。 An adhesive layer, the relative dielectric constant of the adhesive layer measured by the adhesive layer formed by hardening the adhesive composition according to any one of claims 1 to 3 at a frequency of 28 GHz 3.5 or less, and a dielectric tangent of 0.01 or less. 一種疊層體,具有:基材薄膜,及由如請求項1至3中任一項之黏接劑組成物構成之黏接劑層、或如請求項4至6中任一項之黏接劑層。 A laminate comprising: a base film, and an adhesive layer composed of the adhesive composition according to any one of claims 1 to 3, or the adhesive according to any one of claims 4 to 6 agent layer. 如請求項7之疊層體,其中,該基材薄膜含有聚醚醚酮(PEEK)樹脂。 The laminate according to claim 7, wherein the base film contains polyetheretherketone (PEEK) resin. 一種附黏接劑層之表覆層薄膜,包含如請求項7或8之疊層體。 A surface coating film with an adhesive layer, comprising the laminate according to claim 7 or 8. 一種覆銅疊層板,包含如請求項7或8之疊層體。 A copper-clad laminate, comprising the laminate according to claim 7 or 8. 一種印刷電路板,包含如請求項7或8之疊層體。 A printed circuit board comprising the laminate according to claim 7 or 8. 一種屏蔽薄膜,包含如請求項7或8之疊層體。 A shielding film comprising the laminate according to claim 7 or 8. 一種附屏蔽薄膜之印刷電路板,包含如請求項7或8之疊層體。 A printed circuit board with a shielding film, comprising the laminate according to claim 7 or 8.
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