TWI783013B - Apparatus and method for adjusting the angle of rotation of the magnet system of a tubular magnetron - Google Patents

Apparatus and method for adjusting the angle of rotation of the magnet system of a tubular magnetron Download PDF

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TWI783013B
TWI783013B TW107125743A TW107125743A TWI783013B TW I783013 B TWI783013 B TW I783013B TW 107125743 A TW107125743 A TW 107125743A TW 107125743 A TW107125743 A TW 107125743A TW I783013 B TWI783013 B TW I783013B
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scale
vernier
flange unit
main scale
rotation angle
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TW201909224A (en
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阿爾明 休布納
詹 約翰森
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德商索萊爾有限責任公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/24Measuring arrangements characterised by the use of mechanical techniques for measuring angles or tapers; for testing the alignment of axes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405Magnetron sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3435Target holders (includes backing plates and endblocks)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/345Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455Movable magnets

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Microwave Tubes (AREA)

Abstract

The invention concerns a flange unit (11) for rotatably holding a magnet system (36) of a tubular magnetron, such a tubular magnetron and a method for adjusting the angle of the magnet system (36). The flange unit comprises a main scale (1) and a nonius (2), which are designed as discs and each have a rotation angle scale (13). Main scale (1) and nonius (2) are arranged concentrically and adjacent to each other, whereby nonius (2) can be rotated about its common axis (40) relative to main scale (1). The rotation angle scales (13) of main scale (1) and nonius (2) have different scale divisions. Main scale (1) and nonius (2) have connecting means with which the main scale (1) can be mechanically connected to a static component of the tubular magnetron and the nonius (2) to the magnet system (36). The set angle of rotation of the nonius (2) can be locked relative to the main scale (1) by means of a locking device (5).

Description

用於調節管狀磁控管的磁體系統的旋轉角度的裝置和方法 Device and method for adjusting the angle of rotation of a magnet system of a tubular magnetron

本發明有關於用於調節管狀磁控管的磁體系統相對於管狀磁控管的端塊處的管狀磁控管的支撐件的旋轉角度的裝置和方法。本發明特別有關於一種用於調節這種管狀磁控管的磁體系統的旋轉角度的方法。 The invention relates to a device and a method for adjusting the angle of rotation of a magnet system of a tubular magnetron relative to a support of the tubular magnetron at an end block of the tubular magnetron. The invention relates in particular to a method for adjusting the angle of rotation of the magnet system of such a tubular magnetron.

在真空塗覆技術中,所謂的管狀磁控管用於濺射,其中管狀靶(也稱為管靶)包圍磁體裝置。管靶通常包括承載管,其具有施加到側表面的靶材或完全由靶材製成的管。 In vacuum coating technology, so-called tubular magnetrons are used for sputtering, in which a tubular target (also called tube target) surrounds a magnet arrangement. Tube targets generally comprise carrier tubes with target material applied to side surfaces or tubes made entirely of target material.

管靶相對於磁體結構可旋轉,使得管靶在塗覆操作期間可以旋轉,同時磁體結構在塗覆室中均勻地對準。藉由在穩態磁場下均勻地旋轉管靶,整個圓柱形靶表面穿過跑道區域並實現靶材的均勻腐蝕。 The tube target is rotatable relative to the magnet structure such that the tube target can be rotated during the coating operation while the magnet structure is uniformly aligned in the coating chamber. By rotating the tube target uniformly under a steady state magnetic field, the entire cylindrical target surface crosses the raceway area and achieves uniform erosion of the target material.

這種旋轉管靶通常安裝在端塊和支座之間的真空塗層設備的真空室中,有時也安裝在兩個端塊之間,其設計成使得它們可以在兩側封閉管靶並且將管靶與磁體系統保持在其內部,使得磁體系統可以在限定的角度範圍內圍繞管靶的軸線旋轉。術語「可旋轉」與「旋轉」可區別開來。關於角度調節,「可旋轉」意味著安裝磁體系統使得它可以旋轉至少一定角度以便調節其角度。磁鐵 系統不像管靶那樣旋轉。 Such rotating tube targets are usually installed in the vacuum chamber of the vacuum coating plant between the end block and the support, sometimes also between two end blocks, which are designed so that they can close the tube target on both sides and The tube target is held inside it with the magnet system such that the magnet system can rotate about the axis of the tube target within a defined angular range. The term "rotatable" is distinguishable from "rotatable". With respect to angle adjustment, "rotatable" means that the magnet system is mounted such that it can be rotated by at least a certain angle in order to adjust its angle. The magnet system does not rotate like a tube target.

端塊是多功能的,除上述外,它還用於驅動管靶、電源和冷卻劑供應。 The end block is multi-functional, in addition to the above, it is also used to drive the tube target, power and coolant supply.

為了支援濺射,在管靶中佈置具有局部交替極性的相鄰磁體的磁體系統,也稱為磁棒。用於磁控濺射的這種磁體系統通常包括中心磁極,該中心磁極以環形方式圍繞第二相對磁極。由於由此形成環隧道形磁場,靶材移除到兩個磁極之間的間隙上的特定程度,其中磁場線平行於靶表面延伸,從而在該區域形成環形濺射溝槽,由於材料去除的增加,也稱為侵蝕溝槽形式。 To support sputtering, a magnet system with adjacent magnets of locally alternating polarity, also called bar magnets, is arranged in the tube target. Such magnet systems for magnetron sputtering generally comprise a central pole which surrounds a second opposing pole in an annular manner. Due to the thus formed annular tunnel-shaped magnetic field, the target material is removed to a certain extent over the gap between the two magnetic poles, where the magnetic field lines run parallel to the target surface, so that an annular sputtering groove is formed in this area, due to the material removal Increased, also known as erosion trench form.

為了優化真空塗層管磁控管的功能,必須以有針對性和可重複的方式將磁體系統的磁棒角度調整並改變到待塗覆的表面。已知這樣的解決方案,其中磁棒的角度以15°遞增並可調節到打開的塗層室。然而,對於不同的應用,這些步驟不足以可重複地建立具有屬性定義的層。精密塗層在+/-15°或更大的範圍內需要幾乎無限的可調節性角度,重複精度為+/-0.1°。現有的管狀磁控管不能滿足這一要求。 In order to optimize the function of the vacuum coating tube magnetron, the magnet bar angle of the magnet system must be adjusted and changed to the surface to be coated in a targeted and repeatable manner. Solutions are known in which the angle of the magnet bar is adjusted in 15° increments to an open coating chamber. However, these steps are not sufficient to reproducibly build layers with property definitions for different applications. Precision coatings require nearly infinite angles of adjustability over a range of +/-15° or more with a repeatability of +/-0.1°. Existing tubular magnetrons cannot meet this requirement.

這裡重複使用的術語表示當從一個相同的起始位置重複接近目標位置時,接近的位置在彼此之間展開的距離。 The term repeated here refers to the distance that approached locations spread out from each other when repeatedly approaching a target location from one and the same starting location.

基於上述現有技術,本發明的目的是改善磁體系統的旋轉角度的可調節性,特別是減小可調節的步長,較佳地小於1°。應至少在已知程度上確保重複精度。 Based on the prior art described above, the object of the present invention is to improve the adjustability of the rotation angle of the magnet system, in particular to reduce the adjustable step size, preferably less than 1°. Repeatability should be ensured at least to a known extent.

用於此目的的設備是可行的,其只需很少的技術工作量和維護。 Equipment for this purpose is available which requires little technical effort and maintenance.

此外可選的是,不打開真空腔的情況下磁體系統旋轉。 Furthermore, it is optional to rotate the magnet system without opening the vacuum chamber.

本發明的基本概念將描述為使用兩部分可移動的旋轉角度刻度,在這種情況下是可旋轉的刻度,藉由它們與磁體系統的旋轉磁系統的機械連接來旋轉。兩部分刻度的使用也適合於藉由第一和/或第二旋轉角度刻度的適當刻度來實現期望的步長。此外,選擇合適的鎖定裝置並結合刻度的設計可以實現所需的可重複性。 The basic concept of the invention will be described as the use of two part movable, in this case rotatable, rotating angle scales, which are rotated by their mechanical connection with the rotating magnetic system of the magnet system. The use of a two-part scale is also suitable for achieving the desired step size by appropriate graduations of the first and/or second rotation angle scale. In addition, proper selection of the locking device combined with the design of the scale can achieve the required repeatability.

具有兩部分旋轉角度刻度的裝置設置在管狀磁控管的兩個端塊中的一個處,並且由於可旋轉支撐而具有法蘭狀結構,並且磁體系統規則地佈置在管中。在此稱它為法蘭單元。法蘭單元可以佈置在管靶中並且可以關閉其中磁體系統佈置在其一側的管。替代配置取決於,例如,管狀磁控管的設計,可用安裝空間或磁體系統可調節的角度範圍。 The device with a two-part rotation angle scale is set at one of the two end blocks of the tubular magnetron, and has a flange-like structure due to the rotatable support, and the magnet system is regularly arranged in the tube. It is called a flange unit here. The flange unit can be arranged in the tube target and can close the tube with the magnet system arranged on its side. Alternative configurations depend, for example, on the design of the tubular magnetron, the available installation space or the adjustable angular range of the magnet system.

在下文中將描述用於實現該概念的特徵。這些將在各種實施例中以彼此不同的方式彼此組合,達到使其有意義並且適合於應用的程度。 Features for implementing this concept will be described below. These will in various embodiments be combined with each other in different ways to the extent that it makes sense and is suitable for the application.

一個特徵是使用具有至少兩個部分的刻度,其具有第一旋轉角度刻度的主刻度和具有第二旋轉角度的第一游標。它描述設備的物理元件的術語「刻度」和「刻度」或「旋轉角度刻度」之間有所區別,其中「刻度」或「旋轉角度刻度」表示例如旋轉角度,其應用於刻度的旋轉角度的描述。 One feature is the use of a scale with at least two parts, a main scale with a first angle of rotation scale and a first vernier with a second angle of rotation. A distinction is made between the term "scale" which describes a physical element of a device, and "scale" or "rotation angle scale", where "scale" or "rotation angle scale" means, for example, an angle of rotation, which applies to the degree of rotation of the scale describe.

通常,旋轉角度刻度對稱地劃分。從中心零標記開始,相同的刻度以順時針和逆時針方向延伸,其在一個方向上使用帶有正號,而在另一個方向上帶有負號。或者,可以使用其他旋轉 角度刻度。將用隨後所提到的實施例進行描述。以下將旋轉角度刻度的細分稱為「刻度部分」,因為術語「刻度線」並不總是與刻度部分的實際實現一致。刻度劃分的順序是「刻度劃分」。 Usually, the rotation angle scale is divided symmetrically. From the central zero mark, the same scale runs clockwise and counterclockwise, using a positive sign in one direction and a negative sign in the other. Alternatively, other rotation angle scales can be used. Description will be made using the examples mentioned later. The subdivision of the rotation angle scale is referred to below as the "scale part", since the term "tick marks" does not always coincide with the actual implementation of the scale part. The order of scale division is "scale division".

術語「游標」表示相對於主刻度的可旋轉刻度。根據本發明,佈置至少一個游標,其指定用於區分為「第一游標」。可選地,可以佈置至少一個另外的游標,其同樣可相對於主刻度旋轉。以這種方式,可以形成第三旋轉角度刻度。這可以應用於第一游標或第二游標。在第一種情況下,可以藉由與第一游標形成的相同的盤實現另外的游標。在這種情況下,另一個游標可以是在同一盤上平行於另一個旋轉角度刻度的額外旋轉角度的刻度,即第二旋轉角度刻度。在第二種情況下,另外的游標可以藉由具有其自己的旋轉角度刻度的單獨盤實現,該旋轉角度刻度與第一游標同心地佈置。為了更清楚,下面將僅參考一個游標來描述本發明。它們的屬性和實現可以類似地應用於其他游標。 The term "cursor" means a rotatable scale relative to the main scale. According to the invention, at least one cursor is arranged, which is designated for distinguishing as a "first cursor". Optionally, at least one further cursor can be arranged, which is likewise rotatable relative to the main scale. In this way, a third rotation angle scale can be formed. This can apply to either the first cursor or the second cursor. In the first case, the further sliders can be realized by the same disc as the first slider is formed. In this case, the other vernier can be an additional rotation angle scale on the same disc parallel to the other rotation angle scale, ie a second rotation angle scale. In the second case, the additional vernier can be realized by a separate disk with its own angle of rotation scale arranged concentrically to the first vernier. For greater clarity, the invention will be described below with reference to only one cursor. Their properties and implementation can be similarly applied to other cursors.

以下的主刻度和游標形成為圓形、環形或圓片狀盤並且同心地佈置並且彼此相鄰。這意味著兩個盤之間存在間隙或者兩個盤彼此直接相鄰。 The lower main scale and vernier are formed as circular, annular or disk-shaped discs and are arranged concentrically and adjacent to each other. This means that there is a gap between the two disks or that the two disks are directly adjacent to each other.

主刻度和游標彼此相鄰的位置可以,例如,藉由彼此頂部的層基於它們的公共軸的方向來形成。 The location of the main scale and the vernier next to each other may, for example, be formed by the orientation of layers on top of each other based on their common axis.

藉由形成游標刻度尺或大刻度尺的兩個環形盤可以實現與同心的公共軸佈置相結合的主刻度和游標並排位置,一個盤的外半徑略小於另一個盤的內半徑。因此,兩個碟片可以並排放置在一個平面中。或者,兩個盤中的一個可以形成為環形,而另一個盤具有厚度偏差,環形盤可以插入其中。相鄰盤的其他替代方案是 可能的。 The side-by-side position of the main scale and the vernier in combination with a concentric common axis arrangement can be achieved by means of two annular discs forming a vernier scale or major scale, the outer radius of one disc being slightly smaller than the inner radius of the other disc. Therefore, two discs can be placed side by side in a plane. Alternatively, one of the two disks can be formed in a ring shape, while the other disk has a thickness deviation into which the ring disk can be inserted. Other alternatives for adjacent discs are possible.

主刻度和游標的旋轉角度刻度根據其設計可以不同地實現和定位。例如,其可以應用在圓周上,即圓盤的外邊緣或平行其延伸的半圓弧和/或主刻度盤和游標的側向表面上。顯然,佈置和形成旋轉角度刻度,使得在特定情況下兩個旋轉角度刻度都是可見的。這可以藉由,例如,兩個刻度的上部的開口來實現。在全等盤的情況下,至少一個旋轉角度的佈置,例如,在一個盤的側表面上或在位於頂部的盤中的開口下方進行。或者,主刻度和游標不能一致。例如,後者可以藉由以下方式實現:兩個盤的上部外半徑小於下盤的外半徑,使得兩個盤可以一個位於另一個之上並且下盤的旋轉角度仍然可見。或者,主刻度和游標可以形成為相鄰的環形盤。 The rotation angle scales of the main scale and vernier can be realized and positioned differently depending on their design. For example, it can be applied on the circumference, ie on the outer edge of the disc or on the semicircular arcs extending parallel thereto and/or on the lateral surfaces of the main dial and vernier. Obviously, the angle of rotation scales are arranged and formed such that in certain cases both angle of rotation scales are visible. This can be achieved, for example, by means of openings in the upper part of the two scales. In the case of congruent disks, the arrangement of at least one angle of rotation takes place, for example, on the side surface of one disk or below the opening in the top-located disk. Or, the main scale and the vernier cannot be coincident. The latter can be achieved, for example, in that the upper outer radius of the two disks is smaller than the outer radius of the lower disk, so that the two disks can be positioned one above the other and the angle of rotation of the lower disk is still visible. Alternatively, the main scale and vernier may be formed as adjacent annular discs.

此外,主刻度和游標可相對於另一個旋轉,由於游標的旋轉,旋轉角度彼此移動並且可以相反地設置為不同的刻度值。 Furthermore, the main scale and the vernier are rotatable relative to each other, and due to the rotation of the vernier, the rotation angles are shifted relative to each other and can be oppositely set to different scale values.

接下來,兩個旋轉角度刻度具有不同的刻度分度,其適合於待設置的角度範圍和旋轉角度調整的步長。因此,主刻度的刻度涵蓋整個角度範圍,例如,從0°的位置(如垂直位置),磁體系統的中心軸順時針30°以及與之相反(+/-30°)。游標的游標分度具有步長,這裡也稱為游標步長,其根據主刻度的步長計算,這裡也稱為主步長,加上主步長的所需細分。例如,主步長為1°,游標步長為1.1°,導致磁體系統增加0.1°。因為游標的每次旋轉都會使前一個值增加0.1°的額外增量。設定角度由第一和第二旋轉角度刻度的兩個標度部分產生,這兩個標度部分恰好在彼此之上或彼此相對。任何其他角度範圍和增量或細分為度、分或秒都是可能的,適應於由於目前塗覆任務而導致的管狀磁控管的相應要求。 Next, the two rotation angle scales have different scale graduations, which are suitable for the angle range to be set and the step size of the rotation angle adjustment. Thus, the scale of the main scale covers the entire angular range, eg from a position of 0° (eg vertical position), 30° clockwise from the central axis of the magnet system and vice versa (+/−30°). The vernier graduations of the vernier have a step size, here also called vernier step, which is calculated from the step size of the main scale, also called here main step, plus the desired subdivision of the main step. For example, a main step size of 1° and a vernier step size of 1.1° result in a 0.1° increase in the magnet system. Because each rotation of the cursor adds an additional increment of 0.1° to the previous value. The set angle is produced by two scale portions of the first and second rotation angle scale, which are directly above or opposite each other. Any other angular range and increment or subdivision into degrees, minutes or seconds is possible, adapted to the corresponding requirements of the tubular magnetron due to the coating task at hand.

為了藉由上述法蘭單元實現磁體系統的旋轉,游標刻度設計為可旋轉的刻度,其中磁體系統和主刻度為不可旋轉(即靜態)的刻度。靜態刻度藉由合適的連接裝置機械連接到管狀磁控管的靜態組件。根據另一實施例的合適的連接裝置,銷相對於其公共軸同心地安裝在主刻度和/或第一游標上。該連接認為是機械的,以將其與電氣連接區分開,並且包括可拆卸和不可拆卸的連接。該連接用於藉由游標的旋轉來夾帶磁體系統。作為連接裝置,技術人員可以使用足夠替代方案來實現永久靜態和旋轉連接。 In order to realize the rotation of the magnet system through the above flange unit, the vernier scale is designed as a rotatable scale, wherein the magnet system and the main scale are non-rotatable (ie static) scales. The static scale is mechanically connected to the static assembly of the tubular magnetron by suitable connection means. According to another embodiment of a suitable connection means, the pins are mounted concentrically with respect to their common axis on the main scale and/or on the first vernier. The connection is considered mechanical to distinguish it from an electrical connection and includes both detachable and non-detachable connections. This connection is used to entrain the magnet system by the rotation of the vernier. As connection means, the skilled person has sufficient alternatives for permanent static and rotational connections.

此外,法蘭單元包括用於鎖定的裝置,利用該裝置,游標的旋轉角度相對於主刻度固定在設定的角度位置。可選地,鎖定裝置可以使用與主刻度和游標的形狀配合或摩擦連接或者直接在它們之間或者連接類型的組合。例如藉由壓製在一起或兩個盤的磁性支架可以實現摩擦連接。例如,可以藉由端子、銷等形成形狀配合連接,其接合在主刻度和游標上。後者限定主刻度和游標彼此明確定義的位置,並且取決於鎖定裝置的公差,允許具有非常高的可重複性。對於許多應用來說,0.1°的重複精度是可接受的,但也可以實現更低的值,例如0.5°的重複精度。 Furthermore, the flange unit comprises means for locking, with which means the angle of rotation of the vernier is fixed at a set angular position with respect to the main scale. Alternatively, the locking means may use a form fit or friction connection with the main scale and vernier or directly between them or a combination of connection types. A frictional connection can be achieved, for example, by pressing together or a magnetic mount of two discs. For example, a form-fit connection can be formed by means of terminals, pins, etc., which engage on the main scale and the vernier. The latter define the position of the main scale and the vernier in a well-defined relation to each other and, depending on the tolerances of the locking device, allows a very high repeatability. For many applications a repeatability of 0.1° is acceptable, but lower values such as 0.5° repeatability can also be achieved.

根據一個實施例,可以藉由至少一個旋轉角度刻度,較佳第一游標的旋轉角度刻度或兩個旋轉角度刻度,具有與刻度相關的凹槽或由凹槽形成,並且鎖定裝置設計成嵌入凹槽,產生形狀配合連接。凹槽可以是孔或通道,位於刻度邊緣的半孔、表面凹槽或類似的凹槽,其形狀為使得鎖定裝置接合在凹槽中以提供足夠的接觸表面。例如,來自側表面的突出孔適合於固定彼此相鄰的環形盤。在這種情況下,外盤藉由環延伸通道和內盤平行於表面,例如, 具有相應通道的孔。顯而易見且通常的是,主刻度和游標凹槽以及鎖定裝置的幾何形狀彼此適配,特別是以鎖定裝置相對於主刻度固定游標的方式。 According to one embodiment, it is possible by at least one angle of rotation scale, preferably that of the first vernier or two angle of rotation scales, having or being formed by a groove associated with the scale, and the locking means being designed to fit into the groove Groove, resulting in a form-fit connection. The groove may be a hole or channel, a half-hole at the edge of the scale, a surface groove or similar groove shaped such that the locking means engages in the groove to provide an adequate contact surface. For example, protruding holes from the side surfaces are suitable for securing annular disks adjacent to each other. In this case, the outer disc extends the channel by means of the ring and the inner disc is parallel to the surface, eg a hole with a corresponding channel. It is obvious and usual that the geometry of the main scale and vernier grooves and of the locking means are adapted to each other, in particular in the way that the locking means fix the vernier relative to the main scale.

在另一實施例中,法蘭單元具有讀取標記,該讀取標記設計成指示用游標設定的角度值,可選地還具有兩個游標。如果一個或多個旋轉角度刻度由凹槽形成或者旋轉角度調節發生在封閉的塗覆室內,則角度讀數的這種便利是有利的。讀取標記可以圍繞公共軸旋轉,主刻度和游標同心地佈置在該公共軸上,並且游標可以繞該公共軸旋轉。以這種方式,兩個旋轉角度刻度的疊加或相對標度部分可以藉由讀取標記來標記,並且可以提高可重複性。 In another embodiment, the flange unit has a readout mark designed to indicate the angular value set with a vernier, optionally also with two verniers. This facility for angle reading is advantageous if one or more rotation angle scales are formed by grooves or if the rotation angle adjustment takes place within a closed coating chamber. The read marks are rotatable about a common axis on which the main scale and the vernier are arranged concentrically and about which the vernier is rotatable. In this way, superimposed or relative scale portions of two rotational angle scales can be marked by a read mark and repeatability can be increased.

在法蘭單元的一個實施例中,法蘭單元具有讀取標記,鎖定裝置可以設置在其上。以這種方式,讀取標記可以設定為設定的旋轉角度而同時鎖定,例如,鎖定裝置是銷、凸起、彈簧或等同物。 In one embodiment of the flange unit, the flange unit has read markings on which the locking means can be arranged. In this way, the read mark can be set to a set angle of rotation while locking, for example, the locking means being pins, protrusions, springs or equivalent.

可選地,游標可以包括已經改進過的輔助旋轉角度刻度,例如,第二旋轉角度刻度的刻度擴展表示允許改善角度調整,尤其是以非常小的角度步長來改善。可選地,鎖定裝置也可以影響該輔助旋轉角度刻度,從而也可以提高重複性。 Optionally, the vernier may comprise an already improved secondary rotational angle scale, for example, a scaled representation of a second rotational angle scale allowing improved angular adjustment, especially in very small angular steps. Optionally, the locking device can also influence this auxiliary rotation angle scale, so that repeatability can also be improved.

主刻度和游標形成為圓形、環形或圓形段狀盤,並且都連接到管狀磁控管的兩個不同組件。為了永久地固定兩個刻度彼此的位置,主刻度和游標可以由圓環段或圓弧段保持,該圓環段或圓弧段安裝在主刻度或第一游標中的一個上面,並且分段地覆蓋兩個組件。這種設計支援使用主刻度盤和/或游標盤表面來佈置和實現如前所述的旋轉角度刻度。它還避免使用共同的同心軸,使得藉由 兩個盤的軸向通道保持自由以供給和/或冷卻磁體系統。 The main scale and vernier are formed as circular, annular or circular segmented disks and are both connected to two distinct components of the tubular magnetron. To permanently fix the position of the two scales relative to each other, the main scale and vernier may be held by a ring segment or arc segment mounted on either the main scale or the first vernier and segmented cover both components. This design supports the use of the main scale and/or vernier surfaces to arrange and implement the rotation angle scale as previously described. It also avoids the use of a common concentric shaft, so that the axial channels through the two disks remain free to feed and/or cool the magnet system.

根據本發明的管狀磁控管包括管靶、設置在管靶中用於在靶表面上形成侵蝕軌跡的磁體系統、用於保持和旋轉管靶的可旋轉安裝的靶軸以及佈置在靶軸中用於保持磁體系統的噴嘴,如上面對現有技術更詳細地描述。噴嘴將磁體系統保持在管靶內的適當位置並且不能旋轉,因此相對於其周圍的塗覆室是靜止的。 A tubular magnetron according to the invention comprises a tube target, a magnet system arranged in the tube target for forming erosion tracks on the target surface, a rotatably mounted target shaft for holding and rotating the tube target and a magnet system arranged in the target shaft Nozzles for retaining magnet systems, as described above in more detail for the prior art. The nozzle holds the magnet system in place within the tube target and cannot rotate and is therefore stationary relative to the coating chamber around it.

借助於法蘭單元實現磁體系統的旋轉,以便調節用於限定的塗覆任務的磁體系統的角度,該法蘭單元以及其各種配置已經在上詳細地描述。為了實現磁體系統相對於管靶並因此相對於塗覆室和基層的旋轉,具有噴嘴和游標的法蘭單元的主刻度機械地連接到磁體系統。 The rotation of the magnet system is effected by means of a flange unit, which flange unit and its various configurations have been described in detail above, in order to adjust the angle of the magnet system for a defined coating task. In order to achieve rotation of the magnet system relative to the tube target and thus relative to the coating chamber and the substrate, the main scale of the flange unit with nozzle and vernier is mechanically connected to the magnet system.

噴嘴佈置在靶軸內,因此它適合於保持法蘭單元和相關的磁體系統。法蘭單元及其支撐件的這種佈置防止法蘭單元暴露於塗層材料,從而可以避免相關的頻繁維護並且減少維護未塗覆的設備組件。 The nozzle is arranged inside the target shaft, so it is suitable for holding the flange unit and the associated magnet system. This arrangement of the flange unit and its support prevents the flange unit from being exposed to the coating material so that associated frequent maintenance can be avoided and maintenance of uncoated plant components reduced.

根據一個實施例,還包括用於移動以下組件之一的驅動器:第一游標、第二游標(如果存在)或鎖定裝置。在如上所述的第一和第二游標的情況下的運動是圍繞期望的限定角度的旋轉。鎖定裝置的運動取決於其實施例,並且可以是旋轉或平移運動或兩者的組合。例如,當銷或彈簧用於鎖定時,需要平移運動,該銷或彈簧接合在主刻度和/或游標上的凹槽中。對於用於實現這種運動的驅動器,本領域技術人員可以使用各種選擇,例如藉由啟動和停用磁場來觸發平移運動的各種電動機或磁性單元。 According to one embodiment, a drive for moving one of the following components is also included: the first slider, the second slider (if present) or the locking means. The movement in the case of the first and second cursors as described above is a rotation around a desired defined angle. The movement of the locking device depends on its embodiment and may be a rotational or translational movement or a combination of both. Translational movement is required, for example, when a pin or spring is used for locking, which engages in a groove on the main scale and/or vernier. Various options are available to the person skilled in the art for the drives used to achieve this movement, such as various electric motors or magnetic units that trigger the translational movement by activating and deactivating the magnetic field.

藉由首先旋轉游標,直到其刻度盤分度的中心零標記 與主刻度的旋轉角度刻度的刻度部分相反,實現具有上述法蘭單元的管狀磁控管的磁體系統的角度調節,它盡可能接近要設定的角度,也稱為所需角度。由可調節性產生的應該是主刻度的刻度部分到設定角度,其由游標提供。這是由角度量產生的,該角度量由游標的兩個半圈刻度中的每一個確定,即零標記兩側順時針或逆時針的刻度部分是可調節的。 The angular adjustment of the magnet system of the tubular magnetron with the flange unit described above is achieved by first rotating the vernier until the central zero mark of its dial graduation is opposite to the graduated portion of the rotational angle scale of the main scale, which is as close as possible to The angle to be set, also known as the desired angle. Produced by the adjustability should be the graduated portion of the main scale to the set angle, which is provided by the vernier. This results from the angular amount determined by each of the two half-turn scales of the vernier, ie the portion of the scale either side of the zero mark that is clockwise or counterclockwise is adjustable.

例如,如果游標的游標轉角刻度具有0.1°刻度,在零標記的任一側具有十五個刻度,則游標可以設置為+/-1.5°,即對於每半轉角刻度,角度可調節性為1.5°。因此,如果要設定的角度為+10.5°,則游標的零標記,例如,設定為主刻度的+9°或+10°。 For example, if a vernier has a vernier corner scale with 0.1° graduations and fifteen graduations either side of the zero mark, the vernier can be set to +/- 1.5°, ie, an angular adjustability of 1.5 for each half-turn angle graduation °. Therefore, if the angle to be set is +10.5°, the zero mark of the vernier is, for example, set to +9° or +10° of the main scale.

由此,正方向上的游標進一步旋轉十五個刻度部分,並且在先前設置為9°。如果第一個設置是10°,那麼第二個旋轉只有五個分區。 Thereby, the vernier in the positive direction is further rotated by fifteen scale parts, and was previously set to 9°. If the first setting is 10°, then the second rotation has only five divisions.

或者,也可以將游標的旋轉組合在正方向和負方向上,從而藉由簡單地加上主刻度和游標的旋轉角度來確定要設定的角度,同時考慮相應的半圈刻度的符號。 Alternatively, it is also possible to combine the rotation of the vernier in the positive and negative directions, thereby determining the angle to be set by simply adding the rotation angle of the main scale and the vernier, taking into account the sign of the corresponding half-turn scale.

如果佈置多個游標,則此方法步驟最初涉及第一游標。任何其他游標,用於進一步更細地細分前一游標的旋轉角度,以與第一游標就角度調整方面的描述相同的方式來應用,其中,代替主刻度的旋轉角度刻度是基於前一個游標的旋轉角度刻度。 If multiple cursors are arranged, this method step initially concerns the first cursor. Any other cursor for further finer subdivision of the angle of rotation of the previous cursor, applied in the same manner as described for the first cursor in terms of angle adjustment, where the angle of rotation scale instead of the main scale is based on that of the previous cursor Rotation angle scale.

在調節旋轉角度之後,藉由主刻度上的翻邊單元鎖定裝置來固定用於如上所述的角度調節的每個游標,從而鎖定調節。憑藉主刻度的機械連接,管狀磁控管的靜態組件和磁體系統的游標相對於管狀磁控管固定在後者上。 After the rotation angle is adjusted, each vernier for the angle adjustment as described above is fixed by the turn-up unit locking means on the main scale, thereby locking the adjustment. By virtue of the mechanical connection of the main scale, the static assembly of the tubular magnetron and the vernier of the magnet system are fixed on the latter relative to the tubular magnetron.

根據該方法的各種實施例,可以藉由讀取標記來完成鎖定。利用的是,將讀取標記設置到主刻度和游標的刻度部分相對的位置,從而增加靶角度。如果至少一個旋轉角度刻度,較佳地所有旋轉角度刻度,具有與刻度相關的凹槽或由凹槽形成並且鎖定裝置設計成接合在凹槽中,則這些凹槽可以同時用作刻度分度和固定。 According to various embodiments of the method, locking may be accomplished by reading a tag. The advantage is that the target angle is increased by setting the read mark to the opposite position of the main scale and the scale portion of the vernier. If at least one of the angle of rotation scales, preferably all of the angle of rotation scales, has or is formed by grooves associated with the scale and the locking means are designed to engage in the grooves, these grooves can be used both as scale graduations and fixed.

上述管狀磁控管的法蘭單元、管狀磁控管和可以因其實現的方法,使得可以以至少+/-0.1°和+/-0.05°可重複的磁體系統的最大0.1°的增量實現角度可調節性,其還考慮到管狀磁控管上和管狀磁控管內通常受限的空間條件。主刻度和游標旋轉刻度的刻度差異決定重複精度,可以根據要求實現。如果使用兩個以上的刻度,則第三刻度可以用作相對於第一游標的另一游標,其在該階段中用作主刻度。最後,可以進一步改進步長和可重複性。 The flange unit of the above-mentioned tubular magnetron, the tubular magnetron and the method by which it can be realized, make it possible to achieve at least +/-0.1° and +/-0.05° repeatable magnet system in increments of maximum 0.1° Angular adjustability, which also takes into account the often limited space conditions on and within the tubular magnetron. The scale difference between the main scale and the vernier rotation scale determines the repeatability and can be achieved upon request. If more than two scales are used, the third scale can be used as another vernier relative to the first vernier, which is used as the main scale in this phase. Finally, step size and repeatability can be further improved.

1‧‧‧主刻度 1‧‧‧main scale

2‧‧‧游標 2‧‧‧cursor

4‧‧‧讀取標記 4‧‧‧Reading mark

5‧‧‧鎖定裝置 5‧‧‧Locking device

6‧‧‧刻度部分 6‧‧‧Scale part

7‧‧‧標記 7‧‧‧Mark

8‧‧‧圓環段 8‧‧‧circular segment

9‧‧‧游標噴嘴 9‧‧‧Cursor nozzle

10‧‧‧法蘭噴嘴 10‧‧‧flange nozzle

11‧‧‧法蘭單元 11‧‧‧flange unit

12‧‧‧零標記 12‧‧‧Zero mark

13‧‧‧旋轉角度刻度 13‧‧‧rotation angle scale

14‧‧‧輔助旋轉角度刻度 14‧‧‧Auxiliary rotation angle scale

30‧‧‧端塊 30‧‧‧end block

31‧‧‧管靶 31‧‧‧Tube target

32‧‧‧靶軸 32‧‧‧Target axis

35‧‧‧磁控管 35‧‧‧magnetron

36‧‧‧磁體系統 36‧‧‧magnet system

37‧‧‧承載管 37‧‧‧carrying tube

38‧‧‧法蘭單元 38‧‧‧flange unit

39‧‧‧噴嘴 39‧‧‧Nozzle

40‧‧‧軸 40‧‧‧axis

將參考實施例更詳細地解釋本發明。在附圖中顯示圖1A和1B是角度調節器的第一增量的法蘭單元的實施例的立體圖和剖視圖;圖2A至2C是具有第二步長的角度調節的法蘭單元的另一實施例的立體圖、剖視圖和放大細節;和圖3示出具有法蘭單元的管狀磁控管的端塊。 The present invention will be explained in more detail with reference to Examples. 1A and 1B are perspective views and cross-sectional views of an embodiment of the flange unit of the first increment of the angle adjuster shown in the accompanying drawings; FIGS. 2A to 2C are another embodiment of the flange unit of the angle adjustment with the second step. Perspective view, cross-sectional view and enlarged detail of an embodiment; and Fig. 3 shows an end block of a tubular magnetron with a flange unit.

附圖僅示意性地示出在解釋本發明所必需的範圍內的裝置。其沒有要求完整性或按比例。 The figures only schematically show devices to the extent necessary to explain the invention. It is not claimed to be complete or to scale.

在圖1A中,法蘭單元11示出為具有圓形游標2,其 中刻度部分6由孔形成。在由第一圓盤形成的游標2上,其是第一也是唯一一個游標2,在零標記12的圓弧段上,分別從兩個方向開始各有六個刻度部分6,示例性但非限制性的半孔以8°的間隔形成。在主刻度1上,第二圓盤,六個刻度部分6也以半孔的形式佈置,間隔為10°。這導致步長為2°,重複精度為0.1°。 In Fig. 1A, the flange unit 11 is shown with a circular vernier 2 in which the scale portion 6 is formed by a hole. On the vernier 2 formed by the first disc, which is the first and only vernier 2, on the arc segment of the zero mark 12, there are six scale parts 6 each starting from two directions, illustrative but not Restrictive half-holes were formed at 8° intervals. On the main scale 1, the second disc, six scale portions 6 are also arranged in the form of half-holes at intervals of 10°. This results in a step size of 2° with a repeatability of 0.1°.

藉由面對兩個旋轉角度刻度13的不同刻度部分6並藉由合適的鎖定裝置5固定在該位置來實現不同的角度,在圖1A和1B中作為示例但不限於彈簧載入的銷。銷的懸掛藉由片簧實現,片簧也用作讀數標記4。 The different angles are achieved by facing the different scale portions 6 of the two rotation angle scales 13 and being fixed in this position by suitable locking means 5 , in FIGS. 1A and 1B by way of example but not limited to spring loaded pins. Suspension of the pin is achieved by means of leaf springs, which also serve as reading marks 4 .

圖1B是圖1A的法蘭單元的剖視圖,在該圖中可以看到主刻度1和游標2的兩個之間直接重疊的圓盤,它們具有不同的直徑並且藉由圓環段8互連。作為非限制性示例,游標2的直徑大於主刻度1的直徑。圓弧段8安裝在游標2上並且其內圓周覆蓋主刻度1的外邊緣,使得它可以自由旋轉。 FIG. 1B is a sectional view of the flange unit of FIG. 1A , in which it is possible to see two directly overlapping disks of the main scale 1 and the vernier 2 , which have different diameters and are interconnected by a ring segment 8 . As a non-limiting example, the diameter of the vernier 2 is greater than the diameter of the main scale 1 . The arc segment 8 is mounted on the vernier 2 and its inner circumference covers the outer edge of the main scale 1 so that it can rotate freely.

在游標2的背面,佈置有游標噴嘴9,其可連接到磁體系統36(圖3)。在主刻度1的前面還佈置有噴嘴,稱為法蘭噴嘴10,其用作主刻度1的連接裝置,其具有佈置在管狀磁控管的靶軸32(圖3)中的靜態噴嘴39(圖3),並因此將法蘭單元11組裝在管狀磁控管上。 On the back of the cursor 2, a cursor nozzle 9 is arranged, which can be connected to a magnet system 36 (Fig. 3). In front of the main scale 1 there is also arranged a nozzle, called a flange nozzle 10, which serves as a connection device for the main scale 1, which has a static nozzle 39 ( 3), and thus assemble the flange unit 11 on the tubular magnetron.

如果角度調節的步長小於2°,則可以以類似的方式使用具有其他刻度分度的其他旋轉角度刻度13。例如,為了獲得0.1°增量的角位移,可以佈置游標2的內部刻度6距離為3.1°和主刻度1的外部刻度6距離為3°(圖2A至圖2C)。由於游標2的刻度分度距離為3.1°,法蘭單元11的該實施例允許以0.1°的增量可重複地 設定精確的角度,重複精度至少為+/-0.1°。 Other rotational angle scales 13 with other scale divisions can be used in a similar manner if the angle adjustment is performed in steps of less than 2°. For example, to obtain an angular displacement of 0.1° increments, the inner scale 6 of the vernier 2 may be arranged at a distance of 3.1° and the outer scale 6 of the main scale 1 at a distance of 3° ( FIGS. 2A to 2C ). This embodiment of the flange unit 11 allows reproducible setting of precise angles in 0.1° increments with a repeatability of at least +/- 0.1° due to the graduated division distance of the vernier 2 at 3.1°.

圖2A至2C與圖1A和1B的不同之處在於輔助旋轉角度刻度14,其除了游標2的圓弧段之外還由半孔形成。輔助旋轉角度刻度14具有對應於游標2刻度的刻度。然而,它以垂直線的形式設計,使得結合讀取標記4的可選標記7(例如凹槽),可以提高讀取精度。 FIGS. 2A to 2C differ from FIGS. 1A and 1B by an auxiliary rotation angle scale 14 which, in addition to the arc segments of the cursor 2 , is also formed by a half hole. The auxiliary rotation angle scale 14 has a scale corresponding to the scale of the vernier 2 . However, it is designed in the form of a vertical line so that in combination with optional markings 7 (eg grooves) for reading markings 4, the reading accuracy can be increased.

圖2B以剖面圖示出圖2A的法蘭單元的截面。在此可以看到主刻度1和游標2的可選類似實施例,與其法蘭噴嘴10和游標噴嘴9、讀取標記4和銷一起,其用作鎖定裝置5。這也藉由主刻度1和游標2的兩個相對的半孔接合並且相對於彼此固定。 FIG. 2B shows a section through the flange unit of FIG. 2A in a sectional view. An alternative analogous embodiment of main scale 1 and vernier 2 can be seen here, together with its flange nozzle 10 and vernier nozzle 9 , reading mark 4 and pin, which serves as locking device 5 . This is also engaged and fixed relative to each other by two opposing halves of main scale 1 and vernier 2 .

圖2C示出三個旋轉角度刻度的俯視圖,主刻度1的旋轉角度刻度13和游標2的旋轉角度刻度13和輔助旋轉角度刻度14,以及它們的刻度部分6彼此的位置。 FIG. 2C shows a top view of the three rotation angle scales, the rotation angle scale 13 of the main scale 1 and the rotation angle scale 13 and the auxiliary rotation angle scale 14 of the vernier 2 , and the positions of their scale parts 6 relative to each other.

借助於凹槽(例如半孔或不同形狀的開口)形成旋轉角度刻度13有助於固定設置。如果孔被凹槽替換,則角位置的固定也可以藉由彈簧安裝的金屬板網完成。兩排孔的合適標記是有意義的。或者,旋轉角度刻度13和調節的固定也可以以其他方式完成。 Forming the rotation angle scale 13 by means of a groove (eg a half hole or an opening of a different shape) facilitates a fixed setting. If the holes are replaced by grooves, the fixation of the angular position can also be done by means of spring-mounted expanded metal. Appropriate labeling of the two rows of holes is meaningful. Alternatively, the fixing of the rotation angle scale 13 and the adjustment can also be done in other ways.

圖3示出根據圖1A的法蘭單元11,其在安裝狀態下示意性地示出在管狀磁控管的端塊30中。管狀磁控管包括管靶31,管靶31由塗層設備(未示出)中的端塊30安裝和操作。在管靶31中,佈置有用於在靶表面上形成侵蝕軌跡的磁體系統36。管靶31由可旋轉地安裝的靶軸32保持並旋轉。在靶軸32中,佈置有用於安裝磁體系統36的噴嘴39,如上面相對於現有技術更詳細地描述。噴嘴39將磁體系統36保持在管靶31內的適當位置,並且不 能旋轉,因此相對於周圍的塗覆室是靜止的。 FIG. 3 shows the flange unit 11 according to FIG. 1A schematically shown in the end piece 30 of the tubular magnetron in the installed state. The tubular magnetron comprises a tube target 31 mounted and operated by an end block 30 in a coating plant (not shown). In the tube target 31 a magnet system 36 for forming erosion tracks on the target surface is arranged. The tube target 31 is held and rotated by a rotatably mounted target shaft 32 . In the target shaft 32 a nozzle 39 for mounting a magnet system 36 is arranged, as described in more detail above with respect to the prior art. The nozzle 39 holds the magnet system 36 in place within the tube target 31 and is non-rotatable and therefore stationary relative to the surrounding coating chamber.

法蘭單元11借助於其法蘭噴嘴10與噴嘴39機械連接並且因此安裝在端塊30上。 The flange unit 11 is mechanically connected by means of its flange nozzle 10 to the nozzle 39 and is thus mounted on the end piece 30 .

借助於游標噴嘴9將游標2與磁體系統36連接起來。該機械連接到保持磁體系統36的承載管37,使得承載管37和磁體系統36跟隨游標2每次圍繞主刻度和游標2的公共軸40的旋轉。 The slider 2 is connected to the magnet system 36 by means of the slider nozzle 9 . This mechanical connection is to the carrier tube 37 holding the magnet system 36 such that the carrier tube 37 and the magnet system 36 follow each rotation of the vernier 2 about the common axis 40 of the main scale and the vernier 2 .

1‧‧‧主刻度 1‧‧‧main scale

2‧‧‧游標 2‧‧‧cursor

4‧‧‧讀取標記 4‧‧‧Reading mark

5‧‧‧鎖定裝置 5‧‧‧Locking device

9‧‧‧游標噴嘴 9‧‧‧Cursor nozzle

10‧‧‧法蘭噴嘴 10‧‧‧flange nozzle

11‧‧‧法蘭單元 11‧‧‧flange unit

30‧‧‧端塊 30‧‧‧end block

31‧‧‧管靶 31‧‧‧Tube target

32‧‧‧靶軸 32‧‧‧Target axis

35‧‧‧磁控管 35‧‧‧magnetron

36‧‧‧磁體系統 36‧‧‧magnet system

37‧‧‧承載管 37‧‧‧carrying tube

39‧‧‧噴嘴 39‧‧‧Nozzle

40‧‧‧軸 40‧‧‧axis

Claims (16)

一種用於可旋轉地安裝管狀磁控管的磁體系統(36)的法蘭單元,包括以下組件:一主刻度(1),形成為圓形、環形或圓形段狀盤並包括一第一旋轉角度刻度(13),其形成在盤的側表面或該主刻度(1)的圓周或與其平行延伸的圓弧上,一第一游標(2),其形成為圓形、環形或圓形段狀盤並包括一第二旋轉角度刻度(13),其形成在盤的側表面或該第一游標(2)的圓周上或與其平行延伸的圓弧上,其中該主刻度(1)和該第一游標(2)同心地佈置並且彼此相鄰,其中該第一游標(2)可相對於該主刻度(1)繞其公共軸(40)旋轉,其中該第一旋轉角度刻度(13)與該第二旋轉角度刻度(13)具有不同的刻度分度,該主刻度(1)和該第一游標(2)具有一連接裝置,利用該連接裝置,具有一管狀磁控管的靜態組件的該主刻度(1)和具有一磁體系統(36)的該第一游標(2)可機械連接,並且至少一個鎖定裝置(5),用於鎖定該第一游標(2)相對於該主刻度(1)的設定旋轉角度。 A flange unit for rotatably mounting a magnet system (36) of a tubular magnetron, comprising the following components: a main scale (1) formed as a circular, annular or circular segmented disc and comprising a first Rotation angle scale (13) formed on the side surface of the disc or on the circumference of the main scale (1) or on an arc extending parallel thereto, a first vernier (2) formed in the form of a circle, ring or circle The segmented disk also includes a second rotation angle scale (13), which is formed on the side surface of the disk or on the circumference of the first vernier (2) or on an arc extending parallel to it, wherein the main scale (1) and The first vernier (2) is arranged concentrically and adjacent to each other, wherein the first vernier (2) is rotatable about its common axis (40) relative to the main scale (1), wherein the first rotation angle scale (13 ) and the second rotation angle scale (13) have different scale graduations, the main scale (1) and the first vernier (2) have a connection device, using the connection device, there is a static state of a tubular magnetron The main scale (1) of the assembly and the first vernier (2) with a magnet system (36) can be mechanically connected, and at least one locking device (5) for locking the first vernier (2) relative to the Set rotation angle of the main scale (1). 如請求項1之法蘭單元,其中,該第一旋轉角度刻度(13)與該第二旋轉角度刻度(13)中的至少一個具有與刻度相關的凹槽,或者該第一旋轉角度刻度(13)與該第二旋轉角度刻度(13)中的至少一個由凹槽形成,並且該至少一個鎖定裝置(5)設計成接合在凹槽中。 The flange unit according to claim 1, wherein at least one of the first rotation angle scale (13) and the second rotation angle scale (13) has a groove related to the scale, or the first rotation angle scale ( 13) At least one of the second rotation angle scale (13) is formed by a groove, and the at least one locking means (5) is designed to engage in the groove. 如請求項1或2之法蘭單元,其中,該法蘭單元(11)包括一讀取標記(4),該讀取標記可繞該第一游標(2)和該主刻度(1)的公共軸(40)旋轉。 The flange unit according to claim 1 or 2, wherein the flange unit (11) includes a reading mark (4), which can be around the first vernier (2) and the main scale (1) The common shaft (40) rotates. 如請求項1或2之法蘭單元,其中,該法蘭單元(11)具有該讀取標記(4),並且該至少一個鎖定裝置(5)佈置在該讀取標記(4)上。 The flange unit according to claim 1 or 2, wherein the flange unit (11) has the read mark (4), and the at least one locking device (5) is arranged on the read mark (4). 如請求項1或2之法蘭單元,其中,該第一游標(2)包括一輔助旋轉角度刻度(14),用於表示該第二旋轉角度刻度(13)的刻度。 The flange unit according to claim 1 or 2, wherein the first cursor (2) includes an auxiliary rotation angle scale (14) for indicating the scale of the second rotation angle scale (13). 如請求項1或2之法蘭單元,其中,該主刻度(1)或該第一游標(2)的該連接裝置中的至少一個是一噴嘴(9、10),相對於其公共軸(40)同心地安裝在該主刻度(1)或該第一游標(2)上。 Flange unit as claimed in claim 1 or 2, wherein at least one of the connection means of the main scale (1) or the first vernier (2) is a nozzle (9, 10), relative to its common axis ( 40) Concentrically mounted on the main scale (1) or the first vernier (2). 如請求項1或2之法蘭單元,其中,該主刻度(1)和該第一游標(2)的盤不一致。 The flange unit according to claim 1 or 2, wherein the main scale (1) is inconsistent with the disc of the first vernier (2). 如請求項1或2之法蘭單元,其中,藉由圓環或圓環段(8)將該主刻度(1)和該第一游標(2)保持在彼此的適當位置,其安裝在該主刻度(1)或該第一游標(2)的其中之一上,並且分段覆蓋兩個組件。 Flange unit according to claim 1 or 2, wherein the main scale (1) and the first vernier (2) are held in proper position with each other by a ring or ring segment (8), which is mounted on the on one of the main scale (1) or the first vernier (2), and the segments cover both components. 如請求項8之法蘭單元,其中,該法蘭單元(11)具有該讀取標記(4),並且該至少一個鎖定裝置(5)設置在該讀取標記(4)上。 The flange unit according to claim 8, wherein the flange unit (11) has the read mark (4), and the at least one locking device (5) is arranged on the read mark (4). 如請求項1或2之法蘭單元,其中,在該第一游標(2)上或在與該第一游標(2)同心設置一第二游標上,平行於該第二旋轉角度刻度(13)延伸形成一第三旋轉角度刻度。 The flange unit according to claim 1 or 2, wherein, on the first cursor (2) or on a second cursor concentric with the first cursor (2), parallel to the second rotation angle scale (13 ) is extended to form a third rotation angle scale. 一種管狀磁控管,包括以下組件:一管靶(31),一磁體系統(36),設置在該管靶(31)中,用於在靶表面上形成侵蝕痕跡, 可旋轉地安裝的一靶軸(32),用於保持和旋轉該管靶(31),一噴嘴(39),設置在該靶軸(32)中,用於保持該磁體系統(36),根據前述請求項中任一項之用於可旋轉地支撐所述磁體系統(36)的法蘭單元(11),該法蘭單元(11)的該主刻度(1)機械連接到一噴嘴(39),該第一游標(2)機械連接到該磁體系統(36)。 A tubular magnetron comprising the following components: a tube target (31), a magnet system (36) arranged in the tube target (31) for forming erosion marks on the target surface, a rotatably mounted target shaft (32) for holding and rotating the tube target (31), a nozzle (39) arranged in the target shaft (32) for holding the magnet system (36), A flange unit (11) for rotatably supporting said magnet system (36) according to any one of the preceding claims, the main scale (1) of the flange unit (11) being mechanically connected to a nozzle ( 39), the first slider (2) is mechanically connected to the magnet system (36). 一種請求項11之管狀磁控管,還包括用於從以下列表移動組件的驅動器:該第一游標(2)、該第二游標、該至少一個鎖定裝置(5)。 A tubular magnetron according to claim 11, further comprising a drive for moving components from the following list: the first slider (2), the second slider, the at least one locking device (5). 一種用於調節根據請求項11或12之管狀磁控管的磁體系統(36)的角度的方法,包括以下步驟:藉由至少該第一游標(2)相對於該主刻度(1)的旋轉使該磁體系統(36)旋轉期望的角度,該主刻度(1)的該第一旋轉角刻度(13)的刻度部分(6)和該第一游標(2)的該第二旋轉角度刻度(13)的刻度部分(6)是相反的,並且期望的角度來自相對刻度部分(6)的值的相加,以及藉由該法蘭單元(11)的該至少一個鎖定裝置(5)鎖定每個游標(,用於該主刻度(1)上的角度調整。 A method for adjusting the angle of a magnet system (36) of a tubular magnetron according to claim 11 or 12, comprising the steps of: by rotating at least the first vernier (2) relative to the main scale (1) Rotating the magnet system (36) by a desired angle, the scale portion (6) of the first angle of rotation scale (13) of the main scale (1) and the second angle of rotation scale ( The scale parts (6) of 13) are opposite, and the desired angle comes from the addition of the values of the opposite scale parts (6), and by the at least one locking device (5) of the flange unit (11) locking each A vernier (, for angle adjustment on the main scale (1). 如請求項13之方法,其中,該法蘭單元(11)包括該讀取標記(4),並且借助於該讀取標記(4)來鎖定。 The method of claim 13, wherein the flange unit (11) comprises the read mark (4) and is locked by means of the read mark (4). 如請求項13或14之方法,其中,至少該第一游標(2)的旋轉介由該驅動器進行。 The method according to claim 13 or 14, wherein at least the rotation of the first cursor (2) is performed through the driver. 如請求項13或14之方法,其中,該至少一個鎖定裝置(5)的運動藉由該驅動器進行。 The method according to claim 13 or 14, wherein the movement of the at least one locking device (5) is performed by the drive.
TW107125743A 2017-07-25 2018-07-25 Apparatus and method for adjusting the angle of rotation of the magnet system of a tubular magnetron TWI783013B (en)

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