TWI782696B - Circuit board with multiple network through holes and manufacturing method - Google Patents
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本發明涉及線路板技術領域,尤其涉及一種具有多網路通孔的線路板及其製作方法。 The invention relates to the technical field of circuit boards, in particular to a circuit board with multi-network through holes and a manufacturing method thereof.
對於複雜的高速數位線路板,通常具有較多數量的導電線路層以及較高的厚度。當信號傳輸到線路板的內層時,僅有部分信號會直接進入該層,也有一部份信號會沿著導通孔傳往其他位置,如底層,再反射回信號,因此反射回來的信號和直接傳入的信號有了時間差異,易導致信號出錯。為此,業界主要採用背鑽的方法去除導通孔的部分孔長,以避免信號傳輸受到影響,從而保證信號傳輸的完整性。 For complex high-speed digital circuit boards, there are usually a large number of conductive circuit layers and a high thickness. When the signal is transmitted to the inner layer of the circuit board, only part of the signal will directly enter the layer, and part of the signal will be transmitted along the via hole to other locations, such as the bottom layer, and then reflected back to the signal, so the reflected signal and The directly incoming signal has a time difference, which can easily lead to signal errors. For this reason, the industry mainly adopts the method of back drilling to remove part of the hole length of the via hole, so as to avoid the signal transmission from being affected, thereby ensuring the integrity of the signal transmission.
然而,傳統的背鑽方法通常導致在導通孔的外圍無法布線,且隨著線路板厚度的增加,導通孔去除的長度也不易控制。同時,採用背鑽的方法只能單面進行鑽板,且成本較高。 However, the traditional back-drilling method usually leads to the failure of wiring around the via hole, and as the thickness of the circuit board increases, the length of the via hole removal is not easy to control. At the same time, the back-drilling method can only drill the board on one side, and the cost is relatively high.
有鑒於此,本發明提供一種能夠解決上述問題的具有多網路通孔的線路板的製作方法。 In view of this, the present invention provides a method for manufacturing a circuit board with multi-network through holes that can solve the above problems.
另,還有必要提供一種上述方法製作的具有多網路通孔的線路板。 In addition, it is also necessary to provide a circuit board with multi-network through holes manufactured by the above method.
本發明一實施例提供一種具有多網路通孔的線路板的製作方法,包括以下步驟:提供第一線路基板,所述第一線路基板包括絕緣層以及設於所述 絕緣層中的多個第一導電線路層,所述第一線路基板中設有至少一導通孔,每一所述導通孔包括第一通孔以及位於所述第一通孔內壁上的第一金屬層;在每一所述導通孔的內壁上形成第一光致抗蝕劑;將反射體放置在所述導通孔中;藉由外界光線照射所述反射體,並使所述反射體反射所述外界光線至部分所述第一光致抗蝕劑以進行曝光,得到第一圖形化光致抗蝕劑;去除所述反射體;對所述第一圖形化光致抗蝕劑進行顯影以形成第二圖形化光致抗蝕劑;在所述第一金屬層的表面上形成錫層,其中,所述錫層中設有第一開口,且所述第二圖形化光致抗蝕劑位於所述第一開口中;去除所述第二圖形化光致抗蝕劑,以使部分所述第一金屬層暴露於所述第一開口;去除與所述第一開口對應的所述第一金屬層,以在所述第一金屬層中形成孔環,從而使得所述導通孔形成第一網路通孔和第二網路通孔,且所述第一網路通孔和所述第二網路通孔由所述孔環間隔;以及去除所述錫層,從而得到所述線路板。 An embodiment of the present invention provides a method for manufacturing a circuit board with multiple network through holes, including the following steps: providing a first circuit substrate, the first circuit substrate includes an insulating layer and is arranged on the A plurality of first conductive circuit layers in the insulating layer, at least one via hole is provided in the first circuit substrate, and each via hole includes a first via hole and a first via hole located on the inner wall of the first via hole. A metal layer; forming a first photoresist on the inner wall of each via hole; placing a reflector in the via hole; irradiating the reflector with external light and causing the reflection Reflecting the external light to a part of the first photoresist for exposure to obtain a first patterned photoresist; removing the reflector; developing to form a second patterned photoresist; forming a tin layer on the surface of the first metal layer, wherein a first opening is provided in the tin layer, and the second patterned photoresist Resist is located in the first opening; remove the second patterned photoresist, so that part of the first metal layer is exposed to the first opening; remove the corresponding to the first opening the first metal layer to form an annular ring in the first metal layer, so that the via hole forms a first network via hole and a second network via hole, and the first network via hole and the second network via holes are separated by the annular ring; and the tin layer is removed, thereby obtaining the circuit board.
本發明一實施例還提供一種具有多網路通孔的線路板,包括絕緣層以及設於所述絕緣層中的多個第一導電線路層,所述線路板中設有至少一導通孔,每一所述導通孔包括第一通孔以及位於所述第一通孔內壁上的第一金屬層,所述第一金屬層中設有孔環,所述孔環使得所述導通孔形成第一網路通孔和第二網路通孔,且所述第一網路通孔和所述第二網路通孔由所述孔環間隔。 An embodiment of the present invention also provides a circuit board with multiple network via holes, including an insulating layer and a plurality of first conductive circuit layers disposed in the insulating layer, at least one via hole is provided in the circuit board, Each via hole includes a first via hole and a first metal layer located on the inner wall of the first via hole, an annular ring is provided in the first metal layer, and the annular ring makes the via hole form A first network via hole and a second network via hole, and the first network via hole and the second network via hole are separated by the annular ring.
本發明將所述反射體放置在所述導通孔中,並藉由所述反射體的反射對部分所述第一光致抗蝕劑進行曝光、在線路板表面及導通孔覆蓋錫層、 以及後續採用蝕刻導通孔中暴露於所述錫層的所述第一金屬層以所述孔環,從而使得一個所述導通孔形成所述第一網路通孔和所述第二網路通孔,且所述第一網路通孔和所述第二網路通孔由所述孔環間隔,從而減少了所述導通孔的長度。另外,本發明中的一個所述導通孔能夠當作兩個以及兩個以上的導通孔來使用,從而實現了多種信號的傳輸,同時也降低了所述導通孔的數量,從而提高了所述線路板的布線密度。 In the present invention, the reflector is placed in the via hole, and part of the first photoresist is exposed through the reflection of the reflector, the surface of the circuit board and the via hole are covered with a tin layer, and subsequently etching the first metal layer exposed to the tin layer in the via hole to form the annular ring, so that one via hole forms the first network via hole and the second network via hole holes, and the first network via hole and the second network via hole are separated by the annular ring, thereby reducing the length of the via hole. In addition, one via hole in the present invention can be used as two or more via holes, thereby realizing the transmission of various signals and reducing the number of via holes, thereby improving the The wiring density of the circuit board.
100:線路板 100: circuit board
10:第二線路基板 10: Second circuit substrate
101:絕緣層 101: Insulation layer
102:第一導電線路層 102: the first conductive line layer
11:第一通孔 11: The first through hole
20:第一金屬層 20: The first metal layer
21:第二金屬層 21: Second metal layer
22:導通孔 22: Via hole
30:第一線路基板 30: The first circuit substrate
40:第一光致抗蝕劑 40: First photoresist
41:第一圖形化光致抗蝕劑 41: First patterned photoresist
42:第二圖形化光致抗蝕劑 42: Second patterned photoresist
50:反射體 50: reflector
51:遮光板 51: visor
60:第二光致抗蝕劑 60: Second photoresist
601:第二通孔 601: Second through hole
70:錫層 70: tin layer
701:第一開口 701: first opening
702:第二開口 702: second opening
80:孔環 80: grommet
81:第一網路通孔 81: The first network via
82:第二網路通孔 82: The second network through hole
90:第二導電線路層 90: Second conductive circuit layer
圖1為本發明一實施例提供的第二線路基板的結構示意圖。 FIG. 1 is a schematic structural diagram of a second circuit substrate provided by an embodiment of the present invention.
圖2為在圖1所示的第一通孔的內壁上形成第一金屬層,以及在絕緣層相對的兩表面上分別形成第二金屬層後的結構示意圖。 FIG. 2 is a schematic diagram of the structure after the first metal layer is formed on the inner wall of the first through hole shown in FIG. 1 , and the second metal layer is respectively formed on the two opposite surfaces of the insulating layer.
圖3為在圖2所示的第一金屬層的表面和第二金屬層的表面上形成第一光致抗蝕劑後的結構示意圖。 FIG. 3 is a schematic structural diagram after forming a first photoresist on the surface of the first metal layer and the surface of the second metal layer shown in FIG. 2 .
圖4為在圖3所示的在位於第二金屬層表面的第一光致抗蝕劑上放置遮光板,以及在導通孔中放置反射體並進行曝光的結構示意圖。 FIG. 4 is a structural schematic view of placing a light shielding plate on the first photoresist on the surface of the second metal layer shown in FIG. 3 , and placing a reflector in the via hole for exposure.
圖5為將圖4所示的反射體和遮光板去除後,並對第一圖形化光致抗蝕劑進行顯影後的結構示意圖。 FIG. 5 is a schematic structural view after removing the reflector and the light-shielding plate shown in FIG. 4 and developing the first patterned photoresist.
圖6為在圖5所示的第二金屬層的表面形成第二光致抗蝕劑後的結構示意圖。 FIG. 6 is a schematic structural diagram after forming a second photoresist on the surface of the second metal layer shown in FIG. 5 .
圖7為在圖6所示的第一金屬層的表面以及第二金屬層的表面上形成錫層後的結構示意圖。 FIG. 7 is a schematic diagram of the structure after forming a tin layer on the surface of the first metal layer and the surface of the second metal layer shown in FIG. 6 .
圖8為將圖7所示的第二圖形化光致抗蝕劑以及第二光致抗蝕劑去除後的結構示意圖。 FIG. 8 is a schematic structural diagram after removing the second patterned photoresist and the second photoresist shown in FIG. 7 .
圖9為將圖8所示的與第一開口對應的第一金屬層以及與第二開口對應的第二金屬層均去除後的結構示意圖。 FIG. 9 is a schematic structural diagram after removing the first metal layer corresponding to the first opening and the second metal layer corresponding to the second opening shown in FIG. 8 .
圖10為將圖9所示的錫層去除後得到的線路板的結構示意圖。 FIG. 10 is a schematic structural diagram of a circuit board obtained after removing the tin layer shown in FIG. 9 .
下面將結合本發明實施例中的附圖,對本發明實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例僅僅為本發明一部分實施例,而不為全部的實施例。基於本發明中的實施例,本領域具有通常知識者在沒有作出創造性勞動前提下所獲得的所有其他實施例,都屬於本發明保護的範圍。 The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.
需要說明,當組件被稱為“固定於”另一個組件,它可以直接在另一個組件上或者也可以存在居中的組件。當一個組件被認為“連接”另一個組件,它可以為直接連接到另一個組件或者可能同時存在居中組件。當一個組件被認為“設置於”另一個組件,它可以為直接設置在另一個組件上或者可能同時存在居中組件。 It should be noted that when a component is said to be "fixed" to another component, it can be directly on the other component or there can also be an intervening component. When a component is said to be "connected" to another component, it may be directly connected to the other component or there may be intervening components at the same time. When a component is said to be "set on" another component, it can be set directly on another component or there may be an intervening component at the same time.
除非另有定義,本文所使用的所有的技術和科學術語與屬於本發明技術領域的具有通常知識者通常理解的含義相同。本文中在本發明的說明書中所使用的術語只為了描述具體的實施例的目的,不旨在於限制本發明。 Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terminology used herein in the description of the present invention is for the purpose of describing specific embodiments only, and is not intended to limit the present invention.
為能進一步闡述本發明達成預定目的所採取的技術手段及功效,以下結合附圖及較佳實施方式,對本發明作出如下詳細說明。 In order to further explain the technical means and effects adopted by the present invention to achieve the intended purpose, the present invention will be described in detail below in conjunction with the accompanying drawings and preferred embodiments.
本發明一實施例提供一種具有多網路通孔的線路板的製作方法,包括如下步驟: An embodiment of the present invention provides a method for manufacturing a circuit board with multiple network through holes, including the following steps:
步驟S11,請參閱圖1,提供第二線路基板10。
Step S11 , please refer to FIG. 1 , providing a
在本實施例中,所述第二線路基板10包括絕緣層101以及設於所述絕緣層101中的多個第一導電線路層102。
In this embodiment, the
所述絕緣層101的材質可以選自環氧樹脂(epoxy resin)、聚丙烯(polypropylene,PP)、BT樹脂、聚苯醚(Polyphenylene Oxide,PPO)、聚醯亞胺(polyimide,PI)、聚對苯二甲酸乙二醇酯(Polyethylene Terephthalate,PET)以及聚萘二甲酸乙二醇酯(Polyethylene Naphthalate,PEN)等樹脂中的一種。在本實施例中,所述絕緣層101的材質為聚丙烯。
The material of the
在本實施例中,所述第二線路基板10包括六個所述第一導電線路層102。在其他實施例中,所述第二線路基板10中的所述第一導電線路層102的數量可根據需要進行變更。
In this embodiment, the
所述第二線路基板10中設有至少一第一通孔11。其中,每一所述第一通孔11均貫穿所述絕緣層101以及多個所述第一導電線路層102。在一實施例中,每一所述第一通孔11均可藉由機械鑽孔或激光鑽孔的方式形成。
At least one first through
步驟S12,請參閱圖2,在每一所述第一通孔11的內壁上形成第一金屬層20,以及在所述絕緣層101相對的兩表面上分別形成第二金屬層21,得到第一線路基板30。
Step S12, please refer to FIG. 2, forming a
具體地,所述第一金屬層20和所述第二金屬層21均可藉由電鍍的方式形成。在本實施例中,所述第一金屬層20和所述第二金屬層21的材質均為銅。其中,所述第一金屬層20和所述第二金屬層21可在一次電鍍的過程中同時形成。
Specifically, both the
其中,一個所述第一通孔11和所述第一通孔11內壁上的所述第一金屬層20共同組成一個導通孔22。
Wherein, one first through
步驟S13,請參閱圖3,在所述第一金屬層20的表面和所述第二金屬層21的表面上形成第一光致抗蝕劑40。
Step S13 , please refer to FIG. 3 , forming a
具體地,所述第一光致抗蝕劑40可藉由塗布的方式形成。
Specifically, the
可以理解,在所述第一金屬層20的表面上形成所述第一光致抗蝕劑40,即為在所述導通孔22的內壁上形成所述第一光致抗蝕劑40。
It can be understood that forming the
步驟S14,請參閱圖4,將多個反射體50分別放置在每一所述導通孔22中。
In step S14 , please refer to FIG. 4 , placing a plurality of
其中,所述反射體50的數量和所述導通孔22的數量相等。其中,所述反射體50在每一所述導通孔22中的位置均可移動。所述反射體50的直徑小於所述導通孔22的內徑,以避免所述反射體50損傷所述第一光致抗蝕劑40。
Wherein, the number of the
當一個所述第一線路基板30中的所述導通孔22的數量過多時,可建立一套治具(圖未示)。其中,所述治具可包括不同數量以及不同高度的所述反射體50,以實現後續在所述導通孔22不同的位置進行曝光。此外,所述反射體50的角度也可根據後續實際曝光的面積進行調整。
When the number of the via holes 22 in one of the
在一實施例中,所述反射體50可進行鏡面化處理,以滿足後續曝光的能量。在一實施例中,所述反射體50為折射鏡。具體地,所述折射鏡為探針。
In an embodiment, the
步驟S15,在位於所述第二金屬層21表面的所述第一光致抗蝕劑40上放置遮光板51。
Step S15 , placing a
其中,所述遮光板51用於防止後續位於所述第二金屬層21表面的所述第一光致抗蝕劑40的曝光。在一實施例中,所述遮光板51為底片。
Wherein, the
步驟S16,藉由外界光線照射所述反射體50和所述遮光板51,並使所述反射體50反射所述外界光線至部分所述第一光致抗蝕劑40以進行曝光,得到第一圖形化光致抗蝕劑41。
Step S16, irradiating the
其中,可移動所述反射體50在所述導通孔22的位置以實現對所述第一光致抗蝕劑40不同部位的曝光。
Wherein, the position of the
在一實施例中,所述外界光線可為紫外光。 In one embodiment, the ambient light may be ultraviolet light.
步驟S17,請參閱圖5,去除所述反射體50和所述遮光板51。
Step S17 , please refer to FIG. 5 , remove the
步驟518,對所述第一圖形化光致抗蝕劑41進行顯影以形成第二圖形化光致抗蝕劑42。
Step 518 , developing the first
其中,所述第二圖形化光致抗蝕劑42位於所述導通孔22中。
Wherein, the second
步驟S19,請參閱圖6,在所述第二金屬層21的表面形成第二光致抗蝕劑60。
Step S19 , please refer to FIG. 6 , forming a
其中,所述第二光致抗蝕劑60中設有第二通孔601。
Wherein, the second through
步驟S20,請參閱圖7,在所述第一金屬層20的表面以及所述第二金屬層21的表面上形成錫層70。
Step S20 , please refer to FIG. 7 , forming a
其中,位於所述第一金屬層20表面上的所述錫層70還位於所述第二通孔601中。
Wherein, the
其中,所述錫層70中設有第一開口701和第二開口702,且所述第二圖形化光致抗蝕劑42位於所述第一開口701中,所述第二光致抗蝕劑60位於所述第二開口702中。
Wherein, the
步驟S21,請參閱圖8,去除所述第二圖形化光致抗蝕劑42和所述第二光致抗蝕劑60。
Step S21 , please refer to FIG. 8 , removing the second
具體地,可藉由蝕刻的方式去除所述第二圖形化光致抗蝕劑42和所述第二光致抗蝕劑60。
Specifically, the second
在去除所述第二圖形化光致抗蝕劑42和所述第二光致抗蝕劑60之後,部分所述第一金屬層20暴露於所述第一開口701,部分所述第二金屬層21暴露於所述第二開口702。
After removing the second
步驟S22,請參閱圖9,去除與所述第一開口701對應的所述第一金屬層20,以在所述第一金屬層20中形成孔環80,從而使得所述導通孔22形成第一網路通孔81和第二網路通孔82,且所述第一網路通孔81和所述第二網路通孔82由所述孔環80間隔,以及去除與所述第二開口702對應的所述第二金屬層21,以使所述第二金屬層21形成第二導電線路層90。
Step S22, please refer to FIG. 9 , removing the
具體地,可藉由蝕刻的方法形成所述孔環80以及所述第二導電線路層90。
Specifically, the
在本實施例中,一個所述第一金屬層20中的所述孔環80的數量為一個。在其他實施例中,一個所述第一金屬層20中的所述孔環80的數量可等於或大於兩個,且每一所述第一金屬層20中的多個所述孔環80相互平行。可以理解,在步驟S16中進行多次曝光即在一個所述第一金屬層20中形成多個孔環80,從而得到多個網路通孔。
In this embodiment, the number of the
步驟S23,請參閱圖10,去除所述錫層70,從而得到所述線路板100。
Step S23 , please refer to FIG. 10 , removes the
請參閱圖10,本發明一實施例還提供一種具有多網路通孔的線路板100,所述線路板100包括絕緣層101、多個第一導電線路層102以及兩個所述第二導電線路層90。
Please refer to FIG. 10 , an embodiment of the present invention also provides a
所述絕緣層101的材質可以選自環氧樹脂(epoxy resin)、聚丙烯(polypropylene,PP)、BT樹脂、聚苯醚(Polyphenylene Oxide,PPO)、聚醯亞胺(polyimide,PI)、聚對苯二甲酸乙二醇酯(Polyethylene Terephthalate,PET)以及聚萘二甲酸乙二醇酯(Polyethylene Naphthalate,PEN)等樹脂中的一種。在本實施例中,所述絕緣層101的材質為聚丙烯。
The material of the insulating
多個所述第一導電線路層102均設於所述絕緣層101中。在本實施例中,所述線路板100包括六個所述第一導電線路層102。在其他實施例中,所述線路板100中的所述第一導電線路層102的數量可根據需要進行變更。
A plurality of the first conductive circuit layers 102 are all disposed in the insulating
所述線路板100中設有至少一導通孔22。其中,每一所述導通孔22包括第一通孔11以及位於所述第一通孔11內壁上的第一金屬層20。其中,每一所述第一通孔11均貫穿所述絕緣層101以及多個所述第一導電線路層102。在本實施例中,所述第一金屬層20的材質為銅。
At least one via
所述第一金屬層20中設有孔環80。其中,所述孔環80使得所述導通孔22形成第一網路通孔81和第二網路通孔82,且所述第一網路通孔81和所述第二網路通孔82由所述孔環80間隔。
An
在本實施例中,一個所述第一金屬層20中的所述孔環80的數量為一個。在其他實施例中,一個所述第一金屬層20中的所述孔環80的數量可等於或大於兩個,且每一所述第一金屬層20中的多個所述孔環80相互平行。當所述孔環80的數量等於或大於兩個時,一個所述導通孔22可形成三個或三個以上的網路通孔。
In this embodiment, the number of the
兩個所述第二導電線路層90分別位於所述絕緣層101相對的兩表面上。
The two second conductive circuit layers 90 are respectively located on two opposite surfaces of the insulating
本發明將所述反射體50放置在所述導通孔22中,並藉由所述反射體50的反射對部分所述第一光致抗蝕劑40進行曝光、以及後續採用形成所述錫層70的方式在所述第一金屬層20中形成所述孔環80,從而使得一個所述導通孔22形成所述第一網路通孔81和所述第二網路通孔82,且所述第一網路通孔81和所述第二網路通孔82由所述孔環80間隔,從而減少了所述導通孔22的長度。另外,本發明中的一個所述導通孔22能夠當作兩個以及兩個以上的導通孔來使用,從而實現了多種信號的傳輸,同時也降低了所述導通孔22的數量,從而提高了所述線路板100的布線密度。此外,本發明的製作成本較低。
In the present invention, the
以上說明僅僅為對該發明一種優化的具體實施方式,但在實際的應用過程中不能僅僅局限於這種實施方式。對本領域具有通常知識者來說,根據本發明的技術構思做出的其他變形和改變,都應該屬於本發明的保護範圍。 The above description is only an optimized specific implementation manner of the present invention, but it cannot be limited to this implementation manner only in the actual application process. For those skilled in the art, other deformations and changes made according to the technical concept of the present invention should belong to the protection scope of the present invention.
100:線路板 100: circuit board
101:絕緣層 101: Insulation layer
102:第一導電線路層 102: the first conductive line layer
80:孔環 80: grommet
81:第一網路通孔 81: The first network via
82:第二網路通孔 82: The second network through hole
90:第二導電線路層 90: Second conductive line layer
Claims (7)
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TW200913840A (en) * | 2007-09-11 | 2009-03-16 | Phoenix Prec Technology Corp | Circuit board structure and fabrication method thereof |
TW201404267A (en) * | 2012-05-29 | 2014-01-16 | Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co Ltd | Multilayer electronic structures wit vias having different dimensions |
CN106982522A (en) * | 2017-03-14 | 2017-07-25 | 开平依利安达电子第三有限公司 | Multi net voting through hole circuit board and its manufacture method |
CN110710339A (en) * | 2017-06-28 | 2020-01-17 | 国际商业机器公司 | Forming conductive vias with light guides |
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TW200913840A (en) * | 2007-09-11 | 2009-03-16 | Phoenix Prec Technology Corp | Circuit board structure and fabrication method thereof |
TW201404267A (en) * | 2012-05-29 | 2014-01-16 | Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co Ltd | Multilayer electronic structures wit vias having different dimensions |
CN106982522A (en) * | 2017-03-14 | 2017-07-25 | 开平依利安达电子第三有限公司 | Multi net voting through hole circuit board and its manufacture method |
CN110710339A (en) * | 2017-06-28 | 2020-01-17 | 国际商业机器公司 | Forming conductive vias with light guides |
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